ATE189532T1 - Verfahren zur herstellung einer optischen membranabdeckung - Google Patents

Verfahren zur herstellung einer optischen membranabdeckung

Info

Publication number
ATE189532T1
ATE189532T1 AT96305026T AT96305026T ATE189532T1 AT E189532 T1 ATE189532 T1 AT E189532T1 AT 96305026 T AT96305026 T AT 96305026T AT 96305026 T AT96305026 T AT 96305026T AT E189532 T1 ATE189532 T1 AT E189532T1
Authority
AT
Austria
Prior art keywords
pellicle
adhesive
frame
membrane
dispenser
Prior art date
Application number
AT96305026T
Other languages
English (en)
Inventor
Qoang Rung Bih
Original Assignee
Micro Lithography Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micro Lithography Inc filed Critical Micro Lithography Inc
Application granted granted Critical
Publication of ATE189532T1 publication Critical patent/ATE189532T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Eyeglasses (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Making Paper Articles (AREA)
AT96305026T 1995-07-27 1996-07-08 Verfahren zur herstellung einer optischen membranabdeckung ATE189532T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/507,832 US5576125A (en) 1995-07-27 1995-07-27 Method for making an optical pellicle

Publications (1)

Publication Number Publication Date
ATE189532T1 true ATE189532T1 (de) 2000-02-15

Family

ID=24020320

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96305026T ATE189532T1 (de) 1995-07-27 1996-07-08 Verfahren zur herstellung einer optischen membranabdeckung

Country Status (7)

Country Link
US (1) US5576125A (de)
EP (1) EP0759576B1 (de)
JP (1) JP3709016B2 (de)
KR (1) KR970008255A (de)
AT (1) ATE189532T1 (de)
DE (1) DE69606476T2 (de)
TW (1) TW473652B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866790A (ja) * 1994-08-30 1996-03-12 Sony Corp レーザ加工装置
US6639650B2 (en) * 1999-12-21 2003-10-28 Shin-Etsu Chemical Co., Ltd. Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6833040B2 (en) * 2001-12-19 2004-12-21 Surface Logix Inc. Apparatus and method for handling membranes
US20040200572A1 (en) * 2003-04-08 2004-10-14 Edita Tejnil Assembling pellicle frames and photomasks
US7136152B2 (en) * 2004-11-23 2006-11-14 Asml Netherlands B.V. Method for bonding a pellicle to a patterning device and patterning device comprising a pellicle
US20070037067A1 (en) * 2005-08-15 2007-02-15 Ching-Bore Wang Optical pellicle with a filter and a vent
JP5731147B2 (ja) * 2010-09-01 2015-06-10 旭化成イーマテリアルズ株式会社 ペリクル用枠体及びペリクル
KR102108939B1 (ko) 2012-04-18 2020-05-12 어플라이드 머티어리얼스, 인코포레이티드 발전된 어닐링 프로세스에서 입자를 감소시키기 위한 장치 및 방법
JP5741561B2 (ja) * 2012-12-04 2015-07-01 日本軽金属株式会社 ペリクル枠及びその製造方法
JP6837433B2 (ja) * 2014-11-17 2021-03-03 エーエスエムエル ネザーランズ ビー．ブイ． ペリクル取り付け装置及びペリクル取り付け方法
US10571800B2 (en) * 2015-02-03 2020-02-25 Asml Netherlands B.V. Mask assembly and associated methods

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4470508A (en) * 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
US4759990A (en) * 1985-11-27 1988-07-26 Yen Yung Tsai Composite optical element including anti-reflective coating
US4737387A (en) * 1986-07-07 1988-04-12 Yen Yung Tsai Removable pellicle and method
DE3909688A1 (de) * 1989-03-23 1990-09-27 Espe Stiftung Verfahren zum kleben oder vergiessen von substraten und vorrichtung zur seiner durchfuehrung
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
US5254375A (en) * 1991-08-26 1993-10-19 Yen Yung Tsai Apparatus for controllably separating framed working area from remainder of the membrane
US5168993A (en) * 1991-08-26 1992-12-08 Yen Yung Tsai Optical pellicle holder
US5203961A (en) * 1991-09-20 1993-04-20 Yen Yung Tsai Wet die cutter assembly and method
US5271803A (en) * 1992-01-09 1993-12-21 Yen Yung Tsai Method of forming finished edge of plural-layer optical membrane
JPH05232689A (ja) * 1992-02-20 1993-09-10 Fujitsu Ltd ペリクル接着方法、ペリクル及びマスク
US5305878A (en) * 1993-04-01 1994-04-26 Yen Yung Tsai Packaged optical pellicle
US5332604A (en) * 1993-04-01 1994-07-26 Yen Yung Tsai Adhesive system for reducing the likelihood of particulate
US5314728A (en) * 1993-04-01 1994-05-24 Yen Yung Tsai Capture layer and method for delayed entrapment of contaminant particles
JP3429898B2 (ja) * 1994-07-11 2003-07-28 信越化学工業株式会社 ペリクルの製造方法
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle

Also Published As

Publication number Publication date
KR970008255A (ko) 1997-02-24
DE69606476D1 (de) 2000-03-09
US5576125A (en) 1996-11-19
EP0759576B1 (de) 2000-02-02
DE69606476T2 (de) 2000-10-12
EP0759576A2 (de) 1997-02-26
TW473652B (en) 2002-01-21
JP3709016B2 (ja) 2005-10-19
EP0759576A3 (de) 1998-04-29
JPH0943833A (ja) 1997-02-14

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Legal Events

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