ATE162306T1 - Verfahren und gerät zur inspektion - Google Patents
Verfahren und gerät zur inspektionInfo
- Publication number
- ATE162306T1 ATE162306T1 AT92305510T AT92305510T ATE162306T1 AT E162306 T1 ATE162306 T1 AT E162306T1 AT 92305510 T AT92305510 T AT 92305510T AT 92305510 T AT92305510 T AT 92305510T AT E162306 T1 ATE162306 T1 AT E162306T1
- Authority
- AT
- Austria
- Prior art keywords
- fault
- particle
- laser beam
- resulting
- light
- Prior art date
Links
- 238000007689 inspection Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 3
- 239000002245 particle Substances 0.000 abstract 3
- 230000028161 membrane depolarization Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J2009/0261—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods polarised
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/04—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by beating two waves of a same source but of different frequency and measuring the phase shift of the lower frequency obtained
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Epidemiology (AREA)
- Atmospheric Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10767892 | 1992-04-27 | ||
JP13698292 | 1992-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE162306T1 true ATE162306T1 (de) | 1998-01-15 |
Family
ID=26447703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT92305510T ATE162306T1 (de) | 1992-04-27 | 1992-06-16 | Verfahren und gerät zur inspektion |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0567701B1 (de) |
AT (1) | ATE162306T1 (de) |
DE (1) | DE69224060T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5486919A (en) * | 1992-04-27 | 1996-01-23 | Canon Kabushiki Kaisha | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
DE69331515D1 (de) * | 1992-11-16 | 2002-03-14 | Canon Kk | Inspektionsverfahren und -vorrichtung |
DE4343058A1 (de) * | 1993-12-19 | 1995-06-22 | Robert Prof Dr Ing Massen | Multisensorielle Kamera für die Qualitätssicherung |
JPH07209202A (ja) * | 1994-01-21 | 1995-08-11 | Canon Inc | 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法 |
US5796482A (en) * | 1995-10-31 | 1998-08-18 | Kyoto Daiichi Kagaku Co., Ltd. | Apparatus/method for optical measuring a physical amount of a specific component contained in a substance |
US6381356B1 (en) * | 1996-10-23 | 2002-04-30 | Nec Corporation | Method and apparatus for inspecting high-precision patterns |
US7078712B2 (en) * | 2004-03-18 | 2006-07-18 | Axcelis Technologies, Inc. | In-situ monitoring on an ion implanter |
DE102006042412B4 (de) * | 2006-09-06 | 2009-01-02 | Yara International Asa | Verfahren zum berührungslosen Bestimmen biophysikalischer Parameter von mit Tau benetzten Pflanzenbeständen |
CN109343068A (zh) * | 2018-12-13 | 2019-02-15 | 中国电子科技集团公司第三十四研究所 | 一种空间长度的测量装置及测量方法 |
CN114088734B (zh) * | 2021-11-18 | 2022-06-24 | 广东电网有限责任公司 | 一种复合绝缘子内部缺陷检测系统及方法 |
CN114509921B (zh) * | 2022-01-13 | 2023-06-16 | 华中科技大学 | 一种光刻缺陷衍射光强差分检测方法 |
CN115184413A (zh) * | 2022-06-22 | 2022-10-14 | 安徽巨一科技股份有限公司 | 点焊质量在线检测方法 |
CN114858755B (zh) * | 2022-07-05 | 2022-10-21 | 中国航发四川燃气涡轮研究院 | 一种航空发动机涂层变频原位激光检测系统 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4353650A (en) * | 1980-06-16 | 1982-10-12 | The United States Of America As Represented By The United States Department Of Energy | Laser heterodyne surface profiler |
CH678108A5 (de) * | 1987-04-28 | 1991-07-31 | Wild Leitz Ag | |
JPH0820371B2 (ja) * | 1988-01-21 | 1996-03-04 | 株式会社ニコン | 欠陥検査装置及び欠陥検査方法 |
-
1992
- 1992-06-16 DE DE69224060T patent/DE69224060T2/de not_active Expired - Lifetime
- 1992-06-16 AT AT92305510T patent/ATE162306T1/de not_active IP Right Cessation
- 1992-06-16 EP EP92305510A patent/EP0567701B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0567701A1 (de) | 1993-11-03 |
DE69224060T2 (de) | 1998-05-07 |
EP0567701B1 (de) | 1998-01-14 |
DE69224060D1 (de) | 1998-02-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE162306T1 (de) | Verfahren und gerät zur inspektion | |
ATE104430T1 (de) | Verfahren und geraet zur messung von vibrationen. | |
DE59908245D1 (de) | Vorrichtung und Verfahren zur Objektuntersuchung | |
EP0126492A3 (de) | Verfahren und Einrichtung zur Kontrolle von Plättchen gedruckter Schaltungen | |
DE59814252D1 (de) | Vorrichtung zur Erfassung oder Erzeugung optischer Signale | |
JPS60144648A (ja) | 欠陥を検出するためにマスクを検査する方法及び装置 | |
WO2002039099A3 (en) | Measurement of surface defects | |
US4719343A (en) | Phase retarding laser radiation detection system | |
JPS56164930A (en) | Apparatus for measuring amplitude of vibration at one point on object having light-diffusing surface | |
JPS61130887A (ja) | レ−ザ−ドツプラ−速度計 | |
ES2005965A6 (es) | Dispositivo para la verificacion de superficies. | |
JPS5454056A (en) | Photoelectric detector | |
US3914056A (en) | Apparatus for evaluating holographically reconstructed wave fields with two frequencies | |
JPH0310144A (ja) | 徴細粒子測定装置 | |
JPS55124008A (en) | Defect inspecting apparatus | |
JPS5572851A (en) | Defect detector | |
JPS5745230A (en) | Inspecting device for photomask dry plate | |
JPH1090158A (ja) | 浮遊粒子群の濃度及び粒度の測定装置 | |
JPS5684535A (en) | Automatic detecting device for alien substance | |
JPS56126745A (en) | Automatic inspecting device for surface of plate material | |
JPS56128407A (en) | Light interference device | |
JPS54105968A (en) | Defect corrector for pattern | |
JPH0637304Y2 (ja) | レーザー利用測定器の照射具 | |
SU601562A1 (ru) | Способ контрол дефектов фотошаблонов с пр моугольной топологией рисунка | |
DE69929624D1 (de) | Stereo-ophtalmoskop mit begrenzter kohärenz |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |