ATA34291A - Reinigung von werkstuecken mit organischen rueckstaenden - Google Patents

Reinigung von werkstuecken mit organischen rueckstaenden

Info

Publication number
ATA34291A
ATA34291A AT91342A AT34291A ATA34291A AT A34291 A ATA34291 A AT A34291A AT 91342 A AT91342 A AT 91342A AT 34291 A AT34291 A AT 34291A AT A34291 A ATA34291 A AT A34291A
Authority
AT
Austria
Prior art keywords
organic residues
cleaning workpieces
workpieces
cleaning
residues
Prior art date
Application number
AT91342A
Other languages
English (en)
Other versions
AT395951B (de
Original Assignee
Union Ind Compr Gase Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to AT0034291A priority Critical patent/AT395951B/de
Application filed by Union Ind Compr Gase Gmbh filed Critical Union Ind Compr Gase Gmbh
Priority to ES92904002T priority patent/ES2062889T3/es
Priority to DK92904002.0T priority patent/DK0571426T3/da
Priority to CS931676A priority patent/CZ282595B6/cs
Priority to PCT/EP1992/000322 priority patent/WO1992014558A1/de
Priority to US08/107,696 priority patent/US5980648A/en
Priority to AU12268/92A priority patent/AU1226892A/en
Priority to DE59200370T priority patent/DE59200370D1/de
Priority to JP4503987A priority patent/JPH06505189A/ja
Priority to EP92904002A priority patent/EP0571426B1/de
Priority to CA002103909A priority patent/CA2103909A1/en
Publication of ATA34291A publication Critical patent/ATA34291A/de
Application granted granted Critical
Publication of AT395951B publication Critical patent/AT395951B/de
Priority to NO932938A priority patent/NO180003C/no

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • B08B3/104—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid using propellers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
AT0034291A 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden AT395951B (de)

Priority Applications (12)

Application Number Priority Date Filing Date Title
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden
JP4503987A JPH06505189A (ja) 1991-02-19 1992-02-14 有機残さいを含む加工片の清掃
CS931676A CZ282595B6 (cs) 1991-02-19 1992-02-14 Způsob a zařízení pro čištění obrobků s organickými zbytky
PCT/EP1992/000322 WO1992014558A1 (de) 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen
US08/107,696 US5980648A (en) 1991-02-19 1992-02-14 Cleaning of workpieces having organic residues
AU12268/92A AU1226892A (en) 1991-02-19 1992-02-14 Process for cleaning workpieces contaminated with organic matter
ES92904002T ES2062889T3 (es) 1991-02-19 1992-02-14 Procedimiento y dispositivo para la limpieza de piezas de trabajo que llevan residuos organicos.
DK92904002.0T DK0571426T3 (da) 1991-02-19 1992-02-14 Fremgangsmåde til rengøring af emner, som har organiske rester
EP92904002A EP0571426B1 (de) 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen
CA002103909A CA2103909A1 (en) 1991-02-19 1992-02-14 Cleaning of workpieces having organic residues
DE59200370T DE59200370D1 (de) 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen.
NO932938A NO180003C (no) 1991-02-19 1993-08-18 Fremgangsmåte og innretning for rengjöring av arbeidsstykker med organiske residua

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden

Publications (2)

Publication Number Publication Date
ATA34291A true ATA34291A (de) 1992-09-15
AT395951B AT395951B (de) 1993-04-26

Family

ID=3488054

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden

Country Status (12)

Country Link
US (1) US5980648A (de)
EP (1) EP0571426B1 (de)
JP (1) JPH06505189A (de)
AT (1) AT395951B (de)
AU (1) AU1226892A (de)
CA (1) CA2103909A1 (de)
CZ (1) CZ282595B6 (de)
DE (1) DE59200370D1 (de)
DK (1) DK0571426T3 (de)
ES (1) ES2062889T3 (de)
NO (1) NO180003C (de)
WO (1) WO1992014558A1 (de)

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DE4230486A1 (de) * 1992-09-11 1994-03-17 Linde Ag Reinigung von Gegenständen mit verflüssigten oder überkritischen Gasen
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DE4408784C3 (de) * 1994-03-15 2000-01-27 Linde Ag Reinigung von Materialien mit verflüssigten oder überkritischen Gasen
DE4423188C2 (de) * 1994-07-01 1999-03-11 Linde Ag Reinigung von Druckgasbehältern
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US6924086B1 (en) 2002-02-15 2005-08-02 Tokyo Electron Limited Developing photoresist with supercritical fluid and developer
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US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
US7270941B2 (en) 2002-03-04 2007-09-18 Tokyo Electron Limited Method of passivating of low dielectric materials in wafer processing
US7169540B2 (en) 2002-04-12 2007-01-30 Tokyo Electron Limited Method of treatment of porous dielectric films to reduce damage during cleaning
US6764552B1 (en) 2002-04-18 2004-07-20 Novellus Systems, Inc. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
US20040011386A1 (en) * 2002-07-17 2004-01-22 Scp Global Technologies Inc. Composition and method for removing photoresist and/or resist residue using supercritical fluids
US20040050406A1 (en) * 2002-07-17 2004-03-18 Akshey Sehgal Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
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US7163380B2 (en) 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US7186093B2 (en) 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
CN101048448A (zh) 2004-10-25 2007-10-03 南农股份公司 制备硅橡胶物品的方法和通过这种方法获得的产品
US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US7550075B2 (en) 2005-03-23 2009-06-23 Tokyo Electron Ltd. Removal of contaminants from a fluid
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
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US9027609B2 (en) 2011-05-03 2015-05-12 United Technologies Corporation Argon gas level controller
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Also Published As

Publication number Publication date
AU1226892A (en) 1992-09-15
US5980648A (en) 1999-11-09
JPH06505189A (ja) 1994-06-16
CA2103909A1 (en) 1992-08-20
ES2062889T3 (es) 1994-12-16
NO180003B (no) 1996-10-21
NO180003C (no) 1997-01-29
CZ282595B6 (cs) 1997-08-13
EP0571426A1 (de) 1993-12-01
NO932938L (no) 1993-08-18
DK0571426T3 (da) 1994-09-26
DE59200370D1 (de) 1994-09-15
EP0571426B1 (de) 1994-08-10
AT395951B (de) 1993-04-26
NO932938D0 (no) 1993-08-18
CZ167693A3 (en) 1994-03-16
WO1992014558A1 (de) 1992-09-03

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Legal Events

Date Code Title Description
EIH Change in the person of patent owner
ELJ Ceased due to non-payment of the annual fee