DE59200370D1 - Reinigung von werkstücken mit organischen rückständen. - Google Patents

Reinigung von werkstücken mit organischen rückständen.

Info

Publication number
DE59200370D1
DE59200370D1 DE59200370T DE59200370T DE59200370D1 DE 59200370 D1 DE59200370 D1 DE 59200370D1 DE 59200370 T DE59200370 T DE 59200370T DE 59200370 T DE59200370 T DE 59200370T DE 59200370 D1 DE59200370 D1 DE 59200370D1
Authority
DE
Germany
Prior art keywords
workpieces
cleaning
organic residues
residues
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59200370T
Other languages
English (en)
Inventor
Robert Adler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Linde GmbH
Original Assignee
UNION IND COMPR GASE GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UNION IND COMPR GASE GmbH filed Critical UNION IND COMPR GASE GmbH
Application granted granted Critical
Publication of DE59200370D1 publication Critical patent/DE59200370D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • B08B3/104—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid using propellers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE59200370T 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen. Expired - Fee Related DE59200370D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden
PCT/EP1992/000322 WO1992014558A1 (de) 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen

Publications (1)

Publication Number Publication Date
DE59200370D1 true DE59200370D1 (de) 1994-09-15

Family

ID=3488054

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59200370T Expired - Fee Related DE59200370D1 (de) 1991-02-19 1992-02-14 Reinigung von werkstücken mit organischen rückständen.

Country Status (12)

Country Link
US (1) US5980648A (de)
EP (1) EP0571426B1 (de)
JP (1) JPH06505189A (de)
AT (1) AT395951B (de)
AU (1) AU1226892A (de)
CA (1) CA2103909A1 (de)
CZ (1) CZ282595B6 (de)
DE (1) DE59200370D1 (de)
DK (1) DK0571426T3 (de)
ES (1) ES2062889T3 (de)
NO (1) NO180003C (de)
WO (1) WO1992014558A1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5304253A (en) * 1990-09-12 1994-04-19 Baxter International Inc. Method for cleaning with a volatile solvent
EP0564396A1 (de) * 1992-04-01 1993-10-06 SULZER Medizinaltechnik AG Verfahren und Vorrichtung zur Reinigung und Keimverminderung von textilen medizinischen Implantaten
DE4230485A1 (de) * 1992-09-11 1994-03-17 Linde Ag Anlage zur Reinigung mit verflüssigten oder überkritischen Gasen
DE4230486A1 (de) * 1992-09-11 1994-03-17 Linde Ag Reinigung von Gegenständen mit verflüssigten oder überkritischen Gasen
DE4304495A1 (de) * 1993-02-15 1994-08-18 Duerr Gmbh & Co Verfahren und Reinigungsgerät zum industriellen Reinigen von Gegenständen
DE4408784C3 (de) * 1994-03-15 2000-01-27 Linde Ag Reinigung von Materialien mit verflüssigten oder überkritischen Gasen
DE4423188C2 (de) * 1994-07-01 1999-03-11 Linde Ag Reinigung von Druckgasbehältern
DE19509573C2 (de) * 1995-03-16 1998-07-16 Linde Ag Reinigung mit flüssigem Kohlendioxid
US5881577A (en) * 1996-09-09 1999-03-16 Air Liquide America Corporation Pressure-swing absorption based cleaning methods and systems
US6051421A (en) * 1996-09-09 2000-04-18 Air Liquide America Corporation Continuous processing apparatus and method for cleaning articles with liquified compressed gaseous solvents
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
DE19933034A1 (de) * 1999-07-15 2001-02-01 Fraunhofer Ges Forschung Verfahren zur Reinigung von technischen Oberflächen mit schwer zugänglicher und/oder gegenüber oxidativem Angriff empfindlicher Oberflächenstruktur
US6314601B1 (en) * 1999-09-24 2001-11-13 Mcclain James B. System for the control of a carbon dioxide cleaning apparatus
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US6764552B1 (en) 2002-04-18 2004-07-20 Novellus Systems, Inc. Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
US20040050406A1 (en) * 2002-07-17 2004-03-18 Akshey Sehgal Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US20040011386A1 (en) * 2002-07-17 2004-01-22 Scp Global Technologies Inc. Composition and method for removing photoresist and/or resist residue using supercritical fluids
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7270137B2 (en) * 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
WO2006045320A2 (en) 2004-10-25 2006-05-04 Nanon A/S A method of producing a silicone rubber item and the product obtainable by the method
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US8453665B2 (en) * 2007-03-15 2013-06-04 The University Of Akron Self-acting self-circulating fluid system without external pressure source and use in bearing system
KR101047862B1 (ko) * 2009-03-13 2011-07-08 주식회사 에이앤디코퍼레이션 고압 처리기를 이용한 기판처리장치 및 고압 처리기의 가스재활용방법
US9027609B2 (en) 2011-05-03 2015-05-12 United Technologies Corporation Argon gas level controller
DE102013206908A1 (de) * 2013-04-17 2014-10-23 Dürr Systems GmbH Verfahren und Vorrichtung zum Innenreinigen eines Fluidtanks

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3100105A (en) * 1959-11-18 1963-08-06 Ramco Equipment Corp Degreaser
FR2128426B1 (de) * 1971-03-02 1980-03-07 Cnen
DE2255667C3 (de) * 1972-11-14 1982-05-06 Studiengesellschaft Kohle mbH, 4330 Mülheim Verfahren zur Herstellung einer fettfreien, lagerbeständigen Stärke
US4375819A (en) * 1981-04-17 1983-03-08 Hurri-Kleen Corporation Apparatus for cleaning machinery parts and the like
US4439243A (en) * 1982-08-03 1984-03-27 Texas Instruments Incorporated Apparatus and method of material removal with fluid flow within a slot
EP0127643A1 (de) * 1982-12-06 1984-12-12 Hughes Aircraft Company Verfahren zum reinigen von gegenständen mit überkritischen gasen
US4617064A (en) * 1984-07-31 1986-10-14 Cryoblast, Inc. Cleaning method and apparatus
US4759917A (en) * 1987-02-24 1988-07-26 Monsanto Company Oxidative dissolution of gallium arsenide and separation of gallium from arsenic
DE3725611A1 (de) * 1987-08-01 1989-02-09 Henkel Kgaa Verfahren zur gemeinsamen abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
JP2663483B2 (ja) * 1988-02-29 1997-10-15 勝 西川 レジストパターン形成方法
SE8900857L (sv) * 1988-03-15 1989-09-16 N Proizv Ob T Traktorn Foerfarande och anlaeggning foer rening av spaan av ferromagnetiskt material fraan en smoerj- och kylvaetska
DE3836731A1 (de) * 1988-10-28 1990-05-03 Henkel Kgaa Verfahren zur abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
US5013366A (en) * 1988-12-07 1991-05-07 Hughes Aircraft Company Cleaning process using phase shifting of dense phase gases
DE3915586A1 (de) * 1989-05-12 1990-11-15 Henkel Kgaa Verfahren zur zweiphasen-extraktion von metallionen aus feste metalloxide enthaltenden phasen, mittel und verwendung
US5213619A (en) * 1989-11-30 1993-05-25 Jackson David P Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids
US5306350A (en) * 1990-12-21 1994-04-26 Union Carbide Chemicals & Plastics Technology Corporation Methods for cleaning apparatus using compressed fluids
US5174917A (en) * 1991-07-19 1992-12-29 Monsanto Company Compositions containing n-ethyl hydroxamic acid chelants

Also Published As

Publication number Publication date
US5980648A (en) 1999-11-09
NO180003C (no) 1997-01-29
JPH06505189A (ja) 1994-06-16
NO932938D0 (no) 1993-08-18
WO1992014558A1 (de) 1992-09-03
ES2062889T3 (es) 1994-12-16
AT395951B (de) 1993-04-26
CZ167693A3 (en) 1994-03-16
NO932938L (no) 1993-08-18
DK0571426T3 (da) 1994-09-26
CA2103909A1 (en) 1992-08-20
EP0571426A1 (de) 1993-12-01
EP0571426B1 (de) 1994-08-10
CZ282595B6 (cs) 1997-08-13
AU1226892A (en) 1992-09-15
ATA34291A (de) 1992-09-15
NO180003B (no) 1996-10-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: LINDE AG, 65189 WIESBADEN, DE

8327 Change in the person/name/address of the patent owner

Owner name: LINDE AG, 80807 MUENCHEN, DE

8339 Ceased/non-payment of the annual fee