AT338874B - METHOD OF MANUFACTURING A HOLLOW BODY FROM SEMICONDUCTOR MATERIAL - Google Patents
METHOD OF MANUFACTURING A HOLLOW BODY FROM SEMICONDUCTOR MATERIALInfo
- Publication number
- AT338874B AT338874B AT869470A AT869470A AT338874B AT 338874 B AT338874 B AT 338874B AT 869470 A AT869470 A AT 869470A AT 869470 A AT869470 A AT 869470A AT 338874 B AT338874 B AT 338874B
- Authority
- AT
- Austria
- Prior art keywords
- manufacturing
- semiconductor material
- hollow body
- hollow
- semiconductor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702016339 DE2016339C3 (en) | 1970-04-06 | 1970-04-06 | Method for producing a hollow body from semiconductor material |
Publications (2)
Publication Number | Publication Date |
---|---|
ATA869470A ATA869470A (en) | 1977-01-15 |
AT338874B true AT338874B (en) | 1977-09-26 |
Family
ID=5767232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT869470A AT338874B (en) | 1970-04-06 | 1970-09-25 | METHOD OF MANUFACTURING A HOLLOW BODY FROM SEMICONDUCTOR MATERIAL |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS5121937B1 (en) |
AT (1) | AT338874B (en) |
CA (1) | CA942639A (en) |
CH (1) | CH537985A (en) |
CS (1) | CS172916B2 (en) |
DE (1) | DE2016339C3 (en) |
FR (1) | FR2092249A5 (en) |
GB (1) | GB1320416A (en) |
NL (1) | NL7014606A (en) |
SE (1) | SE354975B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5331407A (en) * | 1976-09-02 | 1978-03-24 | Canon Kk | Printer |
US4491604A (en) * | 1982-12-27 | 1985-01-01 | Lesk Israel A | Silicon deposition process |
CN111647943A (en) | 2012-06-29 | 2020-09-11 | 三菱综合材料株式会社 | Polycrystalline silicon rod |
-
1970
- 1970-04-06 DE DE19702016339 patent/DE2016339C3/en not_active Expired
- 1970-07-24 JP JP6442970A patent/JPS5121937B1/ja active Pending
- 1970-09-25 AT AT869470A patent/AT338874B/en active
- 1970-09-25 CH CH1421770A patent/CH537985A/en not_active IP Right Cessation
- 1970-09-30 SE SE1329970A patent/SE354975B/xx unknown
- 1970-10-01 GB GB4663370A patent/GB1320416A/en not_active Expired
- 1970-10-05 CS CS671870A patent/CS172916B2/cs unknown
- 1970-10-05 NL NL7014606A patent/NL7014606A/xx unknown
- 1970-10-15 FR FR7037304A patent/FR2092249A5/fr not_active Expired
- 1970-10-23 CA CA096,382A patent/CA942639A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1320416A (en) | 1973-06-13 |
JPS5121937B1 (en) | 1976-07-06 |
NL7014606A (en) | 1971-10-08 |
DE2016339A1 (en) | 1971-10-21 |
CH537985A (en) | 1973-06-15 |
CS172916B2 (en) | 1977-01-28 |
DE2016339B2 (en) | 1979-04-19 |
ATA869470A (en) | 1977-01-15 |
DE2016339C3 (en) | 1979-12-13 |
CA942639A (en) | 1974-02-26 |
SE354975B (en) | 1973-04-02 |
FR2092249A5 (en) | 1971-01-21 |
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