SE354975B - - Google Patents

Info

Publication number
SE354975B
SE354975B SE1329970A SE1329970A SE354975B SE 354975 B SE354975 B SE 354975B SE 1329970 A SE1329970 A SE 1329970A SE 1329970 A SE1329970 A SE 1329970A SE 354975 B SE354975 B SE 354975B
Authority
SE
Sweden
Application number
SE1329970A
Inventor
K Reuschel
W Dietze
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of SE354975B publication Critical patent/SE354975B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24Deposition of silicon only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
SE1329970A 1970-04-06 1970-09-30 SE354975B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702016339 DE2016339C3 (en) 1970-04-06 1970-04-06 Method for producing a hollow body from semiconductor material

Publications (1)

Publication Number Publication Date
SE354975B true SE354975B (en) 1973-04-02

Family

ID=5767232

Family Applications (1)

Application Number Title Priority Date Filing Date
SE1329970A SE354975B (en) 1970-04-06 1970-09-30

Country Status (10)

Country Link
JP (1) JPS5121937B1 (en)
AT (1) AT338874B (en)
CA (1) CA942639A (en)
CH (1) CH537985A (en)
CS (1) CS172916B2 (en)
DE (1) DE2016339C3 (en)
FR (1) FR2092249A5 (en)
GB (1) GB1320416A (en)
NL (1) NL7014606A (en)
SE (1) SE354975B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5331407A (en) * 1976-09-02 1978-03-24 Canon Kk Printer
US4491604A (en) * 1982-12-27 1985-01-01 Lesk Israel A Silicon deposition process
CN111647943A (en) 2012-06-29 2020-09-11 三菱综合材料株式会社 Polycrystalline silicon rod

Also Published As

Publication number Publication date
GB1320416A (en) 1973-06-13
JPS5121937B1 (en) 1976-07-06
NL7014606A (en) 1971-10-08
AT338874B (en) 1977-09-26
DE2016339A1 (en) 1971-10-21
CH537985A (en) 1973-06-15
CS172916B2 (en) 1977-01-28
DE2016339B2 (en) 1979-04-19
ATA869470A (en) 1977-01-15
DE2016339C3 (en) 1979-12-13
CA942639A (en) 1974-02-26
FR2092249A5 (en) 1971-01-21

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