JPS5121937B1 - - Google Patents

Info

Publication number
JPS5121937B1
JPS5121937B1 JP6442970A JP6442970A JPS5121937B1 JP S5121937 B1 JPS5121937 B1 JP S5121937B1 JP 6442970 A JP6442970 A JP 6442970A JP 6442970 A JP6442970 A JP 6442970A JP S5121937 B1 JPS5121937 B1 JP S5121937B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6442970A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5121937B1 publication Critical patent/JPS5121937B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP6442970A 1970-04-06 1970-07-24 Pending JPS5121937B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702016339 DE2016339C3 (en) 1970-04-06 1970-04-06 Method for producing a hollow body from semiconductor material

Publications (1)

Publication Number Publication Date
JPS5121937B1 true JPS5121937B1 (en) 1976-07-06

Family

ID=5767232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6442970A Pending JPS5121937B1 (en) 1970-04-06 1970-07-24

Country Status (10)

Country Link
JP (1) JPS5121937B1 (en)
AT (1) AT338874B (en)
CA (1) CA942639A (en)
CH (1) CH537985A (en)
CS (1) CS172916B2 (en)
DE (1) DE2016339C3 (en)
FR (1) FR2092249A5 (en)
GB (1) GB1320416A (en)
NL (1) NL7014606A (en)
SE (1) SE354975B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5331407A (en) * 1976-09-02 1978-03-24 Canon Kk Printer
JP2014028747A (en) * 2012-06-29 2014-02-13 Mitsubishi Materials Corp Polycrystalline silicon rod

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491604A (en) * 1982-12-27 1985-01-01 Lesk Israel A Silicon deposition process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5331407A (en) * 1976-09-02 1978-03-24 Canon Kk Printer
JP2014028747A (en) * 2012-06-29 2014-02-13 Mitsubishi Materials Corp Polycrystalline silicon rod

Also Published As

Publication number Publication date
CH537985A (en) 1973-06-15
AT338874B (en) 1977-09-26
NL7014606A (en) 1971-10-08
GB1320416A (en) 1973-06-13
CA942639A (en) 1974-02-26
CS172916B2 (en) 1977-01-28
SE354975B (en) 1973-04-02
DE2016339A1 (en) 1971-10-21
FR2092249A5 (en) 1971-01-21
DE2016339B2 (en) 1979-04-19
DE2016339C3 (en) 1979-12-13
ATA869470A (en) 1977-01-15

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