CS172916B2 - - Google Patents
Info
- Publication number
- CS172916B2 CS172916B2 CS671870A CS671870A CS172916B2 CS 172916 B2 CS172916 B2 CS 172916B2 CS 671870 A CS671870 A CS 671870A CS 671870 A CS671870 A CS 671870A CS 172916 B2 CS172916 B2 CS 172916B2
- Authority
- CS
- Czechoslovakia
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702016339 DE2016339C3 (en) | 1970-04-06 | 1970-04-06 | Method for producing a hollow body from semiconductor material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS172916B2 true CS172916B2 (en) | 1977-01-28 |
Family
ID=5767232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS671870A CS172916B2 (en) | 1970-04-06 | 1970-10-05 |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS5121937B1 (en) |
| AT (1) | AT338874B (en) |
| CA (1) | CA942639A (en) |
| CH (1) | CH537985A (en) |
| CS (1) | CS172916B2 (en) |
| DE (1) | DE2016339C3 (en) |
| FR (1) | FR2092249A5 (en) |
| GB (1) | GB1320416A (en) |
| NL (1) | NL7014606A (en) |
| SE (1) | SE354975B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5331407A (en) * | 1976-09-02 | 1978-03-24 | Canon Kk | Printer |
| US4491604A (en) * | 1982-12-27 | 1985-01-01 | Lesk Israel A | Silicon deposition process |
| CN103510156A (en) | 2012-06-29 | 2014-01-15 | 三菱综合材料株式会社 | Polycrystalline silicon rod |
-
1970
- 1970-04-06 DE DE19702016339 patent/DE2016339C3/en not_active Expired
- 1970-07-24 JP JP6442970A patent/JPS5121937B1/ja active Pending
- 1970-09-25 AT AT869470A patent/AT338874B/en active
- 1970-09-25 CH CH1421770A patent/CH537985A/en not_active IP Right Cessation
- 1970-09-30 SE SE1329970A patent/SE354975B/xx unknown
- 1970-10-01 GB GB4663370A patent/GB1320416A/en not_active Expired
- 1970-10-05 NL NL7014606A patent/NL7014606A/xx unknown
- 1970-10-05 CS CS671870A patent/CS172916B2/cs unknown
- 1970-10-15 FR FR7037304A patent/FR2092249A5/fr not_active Expired
- 1970-10-23 CA CA096,382A patent/CA942639A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5121937B1 (en) | 1976-07-06 |
| FR2092249A5 (en) | 1971-01-21 |
| NL7014606A (en) | 1971-10-08 |
| ATA869470A (en) | 1977-01-15 |
| AT338874B (en) | 1977-09-26 |
| DE2016339A1 (en) | 1971-10-21 |
| CH537985A (en) | 1973-06-15 |
| DE2016339C3 (en) | 1979-12-13 |
| GB1320416A (en) | 1973-06-13 |
| SE354975B (en) | 1973-04-02 |
| DE2016339B2 (en) | 1979-04-19 |
| CA942639A (en) | 1974-02-26 |