CN105789059B - The method detached after wafer bonding - Google Patents
The method detached after wafer bonding Download PDFInfo
- Publication number
- CN105789059B CN105789059B CN201610247519.9A CN201610247519A CN105789059B CN 105789059 B CN105789059 B CN 105789059B CN 201610247519 A CN201610247519 A CN 201610247519A CN 105789059 B CN105789059 B CN 105789059B
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- CN
- China
- Prior art keywords
- slide glass
- wafer
- bonding
- isolation film
- glue
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/98—Methods for disconnecting semiconductor or solid-state bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/98—Methods for disconnecting semiconductor or solid-state bodies
Abstract
The present invention provides a kind of method detached after wafer bonding, it includes the following steps:Step 1: the slide glass of the wafer after bonding is placed up, then tool is utilized to destroy slide glass;Step 2: the slide glass after destruction is taken away, it is left with isolation film and is bonded the wafer of glue;Step 3: tearing isolation film, it is left bonding glue and wafer, then cleaning bonding glue, completes the separation of wafer.The above method is used, although destroying slide glass, the cost of slide glass wants much lower, within tolerance interval, and the device detached can be very simple, and the cost of device can substantially reduce, and need not be aligned, then the time spent can also reduce very much, improve production efficiency.
Description
Technical field:
It is especially a kind of method detached after wafer bonding the present invention relates to microelectronics technology.
Background technology:
Direction with the people requirement to electronic product towards miniaturization is developed, and electronic chip is also towards more and more thinner
Direction is developed, if but when being thinned to 100 microns or less as the thickness of the wafer of material using silicon, being very easy to occur
Fragment or be when being processed to wafer due to stress cause wafer bow deformation etc., this ultra-thin wafers can not be carried out
Direct working process.Therefore, in order to this kind of ultra-thin wafers of working process, need by this ultra-thin wafer first with a slide glass
Interim bonding, after bonding, wafer is integrated with the viscous section of slide glass, so that it may wafer to be thinned, the manufacture of TSV, be connected up again
The manufacture of layer forms the making of the techniques such as intraconnection.Then wafer is detached with slide glass again, and to be thinned after wafer into
The techniques such as row cleaning, cutting, complete the processing technology to this ultra-thin wafer.
Currently, the patent application of Publication No. CN104485294A discloses a kind of wafer bonding method, this method is
It is surface-treated on slide glass, forms one layer of isolation film, the bond degree between isolation film and slide glass is moderate, deliberately do not go to tear
In the case of, film will not be detached from from slide glass, but when force is torn, can be removed film from slide glass, when being then bonded
Coating between the front of slide glass with isolation film and wafer be bonded glue, wafer and slide glass are bonded together, elder generation when separation
Certain gap is separated between the isolation film and slide glass of the side of wafer after bonding, slide glass is then adsorbed on using vacuum cup
The back side, force remove slide glass from isolation film.Although more convenient than the prior art using this separation method, however, there remains
It is exerted a force by sucker and removes from isolation film slide glass, operation or trouble, and also if to be suitable for industrialized production also need
Manipulator is wanted, complicated, cost is higher.
For this purpose, the patent application of Publication No. CN104979262A has also been proposed a kind of method detached after wafer bonding,
It produces the air-flow of the junction towards wafer and slide glass bonding using air-stream generating device, makes wafer and slide glass by air-flow
Separation.In this way, the junction that gas nozzle is aligned to wafer and slide glass is needed, and in order to make wafer and slide glass be easier
Separation, generally can also produce a gap in the isolation film of the junction of wafer and slide glass, then by air-flow against gap
It blows so that wafer and slide glass are easier to detach, and using this structure, need an air-stream generating device, still can be more complicated,
If manufacturing gap or the junction of gas nozzle alignment wafer and slide glass being made to need more accurate aligning equipment, cost
Still relatively high.
Invention content:
Present invention solves the technical problem that being to overcome existing technological deficiency, a kind of, separation letter simple using equipment is provided
The method detached after single and lower-cost wafer bonding.
Technical solution provided by the invention is:The present invention provides a kind of method detached after wafer bonding, it includes following
Step:
Step 1: the slide glass of the wafer after bonding is placed up, then tool is utilized to destroy slide glass;
Step 2: the slide glass after destruction is taken away, it is left with isolation film and is bonded the wafer of glue;
Step 3: tearing isolation film, it is left bonding glue and wafer, then cleaning bonding glue, completes the separation of wafer.
After the above method, needed brokenly in this way in the way of destruction slide glass to detach slide glass and wafer
Then slide glass after destruction is taken away from wafer since the bonding force between slide glass and isolation film is weaker, takes it away by bad slide glass
Afterwards, so that it may directly isolation film to tear it down from wafer, it is left with bonding glue and wafer, at this time when cleaning bonding glue, one
As the mode impregnated clean bonding glue, due to the one side exposure of bonding glue, bonding glue can come into full contact with cleaning solution, clearly
It is more much higher than the prior art to wash efficiency.The above method is used, although destroying slide glass, the cost of slide glass wants much lower,
Within tolerance interval, and the device detached can be very simple, and the cost of device can substantially reduce, and does not need pair
Standard improves production efficiency then the time spent can also reduce very much.
In the step 1, the destruction slide glass is to be cut slide glass open from centre using cutter, is cut in the centre of slide glass
Go out opening.In this way, from centre cut slide glass after, due to the bonding force between slide glass and isolation film be largely
The bond degree of edge, slide glass middle section is relatively low, therefore, it is very easy to slide glass can be taken away from isolation film, and no longer
The equipment of the forces such as air blowing or sucker is needed, and does not allow destructible to be bonded together with slide glass by the way of cutting slide glass
Wafer.
Description of the drawings:
Attached drawing 1 is the schematic diagram of the separated wafer of the method for the present invention;
Attached drawing 2 is the structural schematic diagram of the embodiment of the present invention
The structural schematic diagram of 3 another embodiment of the present invention of attached drawing;
As shown in the figure:1, slide glass, 2 wafers, 3, isolation film, 4, bonding glue.
Specific implementation mode
It elaborates in the following with reference to the drawings and specific embodiments to the present invention:
As shown in Figure 1-Figure 3:The method of the present invention wafer after bonding to be separated be structure shown in FIG. 1, on slide glass 1
It is surface-treated, forms one layer of isolation film 3, the bond degree between isolation film 3 and slide glass 1 is moderate, the case where deliberately not going to tear
Under, film will not be detached from from slide glass, but when force is torn, can be removed film from slide glass, by band when being then bonded
There is coating between the front of the slide glass 1 of isolation film 3 and wafer 2 to be bonded glue 4, wafer and slide glass are bonded together, that is, work as slide glass
When placing up, it is followed successively by slide glass 1, isolation film 3, bonding glue 4 and wafer 2 from top to bottom.Between isolation film and slide glass
Bonding force mostlys come from the marginal portion of slide glass and isolation film contact.
Technical solution provided by the invention is:The present invention provides a kind of method detached after wafer bonding, it includes following
Step:
Step 1: the slide glass of the wafer after bonding is placed up, then tool is utilized to destroy slide glass;
Step 2: the slide glass after destruction is taken away, it is left with isolation film and is bonded the wafer of glue;
Step 3: tearing isolation film, it is left bonding glue and wafer, then cleaning bonding glue, completes the separation of wafer.
After the above method, needed brokenly in this way in the way of destruction slide glass to detach slide glass and wafer
Then slide glass after destruction is taken away from wafer since the bonding force between slide glass and isolation film is weaker, takes it away by bad slide glass
Afterwards, so that it may directly isolation film to tear it down from wafer, it is left with bonding glue and wafer, at this time when cleaning bonding glue, one
As the mode impregnated clean bonding glue, due to the one side exposure of bonding glue, bonding glue can come into full contact with cleaning solution, clearly
It is more much higher than the prior art to wash efficiency.The above method is used, although destroying slide glass, the cost of slide glass wants much lower,
Within tolerance interval, and the device detached can be very simple, and the cost of device can substantially reduce, and does not need pair
Standard improves production efficiency then the time spent can also reduce very much.
In the step 1, the destruction slide glass is cut slide glass open from centre using cutter, is cut out in the centre of slide glass
Opening.In this way, after cutting slide glass from centre, since the bonding force between slide glass and isolation film is largely on side
At edge, the bond degree of slide glass middle section is relatively low, therefore, it is very easy to can take slide glass from isolation film away, and no longer needs
It blows or the equipment of the forces such as sucker, and does not allow destructible to be bonded together with slide glass by the way of cutting slide glass
Wafer.
Fig. 2 is one of embodiment, has cut two knives on slide glass by cutter, slide glass has been cut into 4 parts from centre, in this way from load
It is just easy to take away this 4 portions of slide glasses from isolation film among piece, certainly in cutting, the depth of cutting is controlled, not hinder
To subject to bonding glue, it thus will not more be damaged to wafer.
Fig. 3 is the two of embodiment, has cut three knives on slide glass by cutter, slide glass is divided into 6 parts.In this way in processing one
A bit when larger wafer, it may be used and cut the mode of several knives to destroy slide glass more.Certainly it is carried out either on slide glass any
Cutting mode, as long as in a manner of destroying slide glass then model should all be protected in the application by what slide glass was separated from isolation film
Within enclosing.
Claims (2)
1. a kind of method detached after wafer bonding, it is characterised in that:It includes the following steps:
Step 1: the slide glass of the wafer after bonding is placed up, then tool is utilized to destroy slide glass;
Step 2: the slide glass after destruction is taken away, it is left with isolation film and is bonded the wafer of glue;
Step 3: tearing isolation film, it is left bonding glue and wafer, then cleaning bonding glue, completes the separation of wafer.
2. the method detached after wafer bonding according to claim 1, it is characterised in that:It is described broken in the step 1
Bad slide glass is to be cut slide glass open from centre using cutter, and opening is cut out in the centre of slide glass.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610247519.9A CN105789059B (en) | 2016-04-19 | 2016-04-19 | The method detached after wafer bonding |
Applications Claiming Priority (1)
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CN201610247519.9A CN105789059B (en) | 2016-04-19 | 2016-04-19 | The method detached after wafer bonding |
Publications (2)
Publication Number | Publication Date |
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CN105789059A CN105789059A (en) | 2016-07-20 |
CN105789059B true CN105789059B (en) | 2018-08-03 |
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CN201610247519.9A Active CN105789059B (en) | 2016-04-19 | 2016-04-19 | The method detached after wafer bonding |
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Families Citing this family (1)
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CN111745531B (en) * | 2020-07-01 | 2021-08-27 | 长江存储科技有限责任公司 | Curved surface grinding device and chip extraction method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102460677A (en) * | 2009-04-16 | 2012-05-16 | 休斯微技术股份有限公司 | Improved apparatus for temporary wafer bonding and debonding |
CN104485294A (en) * | 2014-12-12 | 2015-04-01 | 浙江中纳晶微电子科技有限公司 | Temporary bonding and separation method for wafers |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5296386B2 (en) * | 2008-01-11 | 2013-09-25 | 株式会社ディスコ | Manufacturing method of laminated device |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102460677A (en) * | 2009-04-16 | 2012-05-16 | 休斯微技术股份有限公司 | Improved apparatus for temporary wafer bonding and debonding |
CN104485294A (en) * | 2014-12-12 | 2015-04-01 | 浙江中纳晶微电子科技有限公司 | Temporary bonding and separation method for wafers |
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CN105789059A (en) | 2016-07-20 |
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