ZA95660B - Methods of synthesizing and polishing a flat diamond film and free-standing diamond film - Google Patents

Methods of synthesizing and polishing a flat diamond film and free-standing diamond film

Info

Publication number
ZA95660B
ZA95660B ZA95660A ZA95660A ZA95660B ZA 95660 B ZA95660 B ZA 95660B ZA 95660 A ZA95660 A ZA 95660A ZA 95660 A ZA95660 A ZA 95660A ZA 95660 B ZA95660 B ZA 95660B
Authority
ZA
South Africa
Prior art keywords
diamond film
synthesizing
polishing
free
methods
Prior art date
Application number
ZA95660A
Other languages
English (en)
Inventor
Akihiko Ikegaya
Keiichiro Tanabe
Naoji Fujimori
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of ZA95660B publication Critical patent/ZA95660B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/279—Diamond only control of diamond crystallography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/16—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of diamonds; of jewels or the like; Diamond grinders' dops; Dop holders or tongs
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/271—Diamond only using hot filaments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
ZA95660A 1994-01-27 1995-01-27 Methods of synthesizing and polishing a flat diamond film and free-standing diamond film ZA95660B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02635394A JP3774904B2 (ja) 1994-01-27 1994-01-27 平坦なダイヤモンド膜の合成法とダイヤモンド自立膜及びダイヤモンド膜の研磨方法

Publications (1)

Publication Number Publication Date
ZA95660B true ZA95660B (en) 1995-09-29

Family

ID=12191114

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA95660A ZA95660B (en) 1994-01-27 1995-01-27 Methods of synthesizing and polishing a flat diamond film and free-standing diamond film

Country Status (5)

Country Link
US (1) US5587013A (fr)
EP (1) EP0666338B1 (fr)
JP (1) JP3774904B2 (fr)
DE (1) DE69509564T2 (fr)
ZA (1) ZA95660B (fr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0676485B1 (fr) * 1994-04-07 1998-07-08 Sumitomo Electric Industries, Limited Plaquette de diamant et procédé de fabrication d'une plaquette de diamant
EP0878268B1 (fr) 1994-05-23 2002-03-27 Sumitomo Electric Industries, Ltd. Procédé et appareil pour la production d'un semi-conducteur couvert d'une couche dure
EP0699776B1 (fr) * 1994-06-09 1999-03-31 Sumitomo Electric Industries, Limited Plaquette et procédé de fabrication d'une plaquette
WO1998046812A1 (fr) * 1997-04-16 1998-10-22 Ooo 'vysokie Tekhnologii' Procede de production de pellicules de diamant selon la methode de synthese en phase vapeur
JP3168961B2 (ja) * 1997-10-06 2001-05-21 住友電気工業株式会社 ダイヤモンド基板及びダイヤモンド基板の評価方法並びにダイヤモンド表面弾性波フィルタ
US6858080B2 (en) * 1998-05-15 2005-02-22 Apollo Diamond, Inc. Tunable CVD diamond structures
US6582513B1 (en) * 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
US8591856B2 (en) * 1998-05-15 2013-11-26 SCIO Diamond Technology Corporation Single crystal diamond electrochemical electrode
US6416865B1 (en) 1998-10-30 2002-07-09 Sumitomo Electric Industries, Ltd. Hard carbon film and surface acoustic-wave substrate
KR100352985B1 (ko) 1999-04-30 2002-09-18 한국과학기술연구원 균열이 없고 평탄한 다이아몬드막 합성 방법
AU1348901A (en) * 1999-10-28 2001-05-08 P1 Diamond, Inc. Improved diamond thermal management components
JP3648112B2 (ja) * 1999-11-26 2005-05-18 東芝セラミックス株式会社 ＣＶＤ−ＳｉＣ自立膜構造体、及びその製造方法
US6641767B2 (en) * 2000-03-10 2003-11-04 3M Innovative Properties Company Methods for replication, replicated articles, and replication tools
US7147810B2 (en) * 2003-10-31 2006-12-12 Fraunhofer Usa, Inc. Drapable diamond thin films and method for the preparation thereof
US20050181210A1 (en) * 2004-02-13 2005-08-18 Doering Patrick J. Diamond structure separation
CN1313244C (zh) * 2004-09-03 2007-05-02 沈阳理工大学 金刚石膜高速精密抛光装置及抛光方法
TW200702302A (en) * 2005-07-01 2007-01-16 Kinik Co Method of manufacturing diamond film and application thereof
JP4816888B2 (ja) * 2005-08-18 2011-11-16 栗田工業株式会社 硫酸リサイクル型洗浄システム
US7833581B2 (en) * 2006-09-11 2010-11-16 The Hong Kong University Of Science And Technology Method for making a highly stable diamond film on a substrate
EP2403974B1 (fr) 2009-03-06 2015-04-22 DiaCCon GmbH Procédé de fabrication d'une feuille de diamant autoporteuse et feuille de diamant autoporteuse
JP6112485B2 (ja) 2013-09-19 2017-04-12 国立研究開発法人産業技術総合研究所 単結晶ダイヤモンドの製造方法
CN105705683B (zh) * 2014-02-05 2019-05-17 安达满纳米奇精密宝石有限公司 金刚石基板及金刚石基板的制造方法
GB201610053D0 (en) * 2016-06-09 2016-07-27 Element Six Tech Ltd Synthetic diamond heat spreaders
JPWO2021200203A1 (fr) * 2020-03-30 2021-10-07
CN114318287B (zh) * 2021-12-23 2023-11-03 深圳技术大学 金刚石自支撑膜的制备方法和金刚石自支撑膜
DE102022205081A1 (de) 2022-05-20 2023-11-23 Universität Augsburg, Körperschaft des öffentlichen Rechts Verfahren, Substrat, Vorrichtung und deren Verwendung zur Synthese von ebenen einkristallinen Diamanten
CN114921766B (zh) * 2022-05-26 2023-10-13 太原理工大学 一种金刚石/金属复合散热片及其制备方法
CN115287623B (zh) * 2022-08-11 2023-05-16 太原理工大学 一种曲面形金刚石膜片的制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0757039B2 (ja) * 1988-05-09 1995-06-14 株式会社ケンウッド 音響用振動板及びその製造法
US5273731A (en) * 1989-09-14 1993-12-28 General Electric Company Substantially transparent free standing diamond films
JPH03145900A (ja) * 1989-11-01 1991-06-21 Yamaha Corp スピーカー用振動板
US5225366A (en) * 1990-06-22 1993-07-06 The United States Of America As Represented By The Secretary Of The Navy Apparatus for and a method of growing thin films of elemental semiconductors
JPH0492890A (ja) * 1990-08-07 1992-03-25 Sumitomo Electric Ind Ltd ダイヤモンド合成方法
CA2044543C (fr) * 1990-08-10 1999-12-14 Louis Kimball Bigelow Pellicule multicouche ultra-dure
JP2938552B2 (ja) * 1990-10-17 1999-08-23 富士通株式会社 コーティング膜の製造方法およびコーティング膜の製造装置
US5270077A (en) * 1991-12-13 1993-12-14 General Electric Company Method for producing flat CVD diamond film

Also Published As

Publication number Publication date
JPH07215796A (ja) 1995-08-15
EP0666338B1 (fr) 1999-05-12
JP3774904B2 (ja) 2006-05-17
DE69509564T2 (de) 1999-09-09
DE69509564D1 (de) 1999-06-17
US5587013A (en) 1996-12-24
EP0666338A1 (fr) 1995-08-09

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