ZA954295B - Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon - Google Patents

Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon

Info

Publication number
ZA954295B
ZA954295B ZA954295A ZA954295A ZA954295B ZA 954295 B ZA954295 B ZA 954295B ZA 954295 A ZA954295 A ZA 954295A ZA 954295 A ZA954295 A ZA 954295A ZA 954295 B ZA954295 B ZA 954295B
Authority
ZA
South Africa
Prior art keywords
carbon
tetrahedrally
barrier films
increased concentration
coordinated
Prior art date
Application number
ZA954295A
Other languages
English (en)
Inventor
Wagner John Ralph Jr
Original Assignee
Mobil Oil Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mobil Oil Corp filed Critical Mobil Oil Corp
Publication of ZA954295B publication Critical patent/ZA954295B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/048—Forming gas barrier coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Laminated Bodies (AREA)
ZA954295A 1994-06-03 1995-05-25 Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon ZA954295B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25399194A 1994-06-03 1994-06-03

Publications (1)

Publication Number Publication Date
ZA954295B true ZA954295B (en) 1996-11-25

Family

ID=22962504

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA954295A ZA954295B (en) 1994-06-03 1995-05-25 Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon

Country Status (11)

Country Link
EP (1) EP0763144B1 (zh)
JP (1) JPH10501302A (zh)
KR (1) KR970702388A (zh)
CN (1) CN1150461A (zh)
AU (1) AU2661595A (zh)
DE (1) DE69522107T2 (zh)
ES (1) ES2161294T3 (zh)
NZ (1) NZ287784A (zh)
TW (1) TW335415B (zh)
WO (1) WO1995033864A1 (zh)
ZA (1) ZA954295B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030090619A (ko) * 2001-01-19 2003-11-28 셰브런 유.에스.에이.인크. 마이크로전자공학에서의 다이아몬드형 함유 물질
US7867578B2 (en) * 2006-06-28 2011-01-11 Applied Materials, Inc. Method for depositing an amorphous carbon film with improved density and step coverage
JP2008056955A (ja) * 2006-08-29 2008-03-13 Masayoshi Umeno 炭素膜形成方法
JP2008201982A (ja) * 2007-02-22 2008-09-04 Idemitsu Kosan Co Ltd 多環脂環式化合物を前駆体物質とする薄膜、及びその製造方法
US8105660B2 (en) * 2007-06-28 2012-01-31 Andrew W Tudhope Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
CN105839071B (zh) * 2016-04-19 2018-01-02 中国科学院大学 双频电感耦合射频等离子体喷射沉积金刚石的方法
WO2023102273A1 (en) * 2021-12-05 2023-06-08 Applied Materials, Inc. Vapor-phase precursor seeding for diamond film deposition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62103367A (ja) * 1985-10-28 1987-05-13 Nippon Telegr & Teleph Corp <Ntt> 炭素膜の合成方法
US4756964A (en) * 1986-09-29 1988-07-12 The Dow Chemical Company Barrier films having an amorphous carbon coating and methods of making
US5041201A (en) * 1988-09-16 1991-08-20 Semiconductor Energy Laboratory Co., Ltd. Plasma processing method and apparatus
US4919974A (en) * 1989-01-12 1990-04-24 Ford Motor Company Making diamond composite coated cutting tools
US5132105A (en) * 1990-02-02 1992-07-21 Quantametrics, Inc. Materials with diamond-like properties and method and means for manufacturing them

Also Published As

Publication number Publication date
CN1150461A (zh) 1997-05-21
EP0763144A4 (en) 1998-05-20
DE69522107T2 (de) 2001-11-22
ES2161294T3 (es) 2001-12-01
EP0763144B1 (en) 2001-08-08
JPH10501302A (ja) 1998-02-03
WO1995033864A1 (en) 1995-12-14
TW335415B (en) 1998-07-01
NZ287784A (en) 1997-05-26
KR970702388A (ko) 1997-05-13
AU2661595A (en) 1996-01-04
EP0763144A1 (en) 1997-03-19
DE69522107D1 (de) 2001-09-13

Similar Documents

Publication Publication Date Title
EP0686847A3 (en) Oxygen concentration detector
AU1754195A (en) Electrochemical sensor to determine the oxygen concentration in gaz mixtures
AU2245095A (en) Mouthpiece with oxygen receiving and directing structure
IL115032A0 (en) Rechargable battery structure and its manufacture
SG125044A1 (en) Oxygen absorption composition
AU3401895A (en) Spiro-azabicyclic compounds useful in therapy
PL327610A1 (en) Quinoline and quinozoline compounds useful in therapy
AU4234096A (en) Permeable polymeric compositions and blood gas sensor overcoats
AU2358895A (en) Medical electrode and method
AU1485795A (en) Improved coveralls and method of manufacture
AU4009795A (en) Heterocyclic compounds and their use
AU2246595A (en) Improved method of detecting the permeability of an object to oxygen
AU2618397A (en) Chemical treatment and packaging system to improve the appearance and shelf life of fresh pork
AU4062695A (en) Oxygen absorber
AU3786895A (en) Vinylidene chloride composition and film with controlled gas permeability
GB2318186B (en) Oxygen concentration detection
AU1850695A (en) Treatment of diabetic nephropathy with valsartan
ZA954295B (en) Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon
GB9419678D0 (en) Improvements in and relating to headphones
GB9310206D0 (en) Absorbent carbon
PL333021A1 (en) Absorptive structure of improved absorption properties
GB2309729A8 (en) Seal with intumescent body and flexible smoke seal
AUPM424894A0 (en) Treatment of electrolyte solutions
EP0799225A4 (en) COMPOUNDS AND RELATED METHODS
AU2154695A (en) Thioprostaglandins and -prostaglandin-like compounds and therapeutic uses thereof