ZA942634B - Photosensitive polymer composition for flexographic printing plates processable in aqueous media - Google Patents
Photosensitive polymer composition for flexographic printing plates processable in aqueous mediaInfo
- Publication number
- ZA942634B ZA942634B ZA942634A ZA942634A ZA942634B ZA 942634 B ZA942634 B ZA 942634B ZA 942634 A ZA942634 A ZA 942634A ZA 942634 A ZA942634 A ZA 942634A ZA 942634 B ZA942634 B ZA 942634B
- Authority
- ZA
- South Africa
- Prior art keywords
- processable
- polymer composition
- flexographic printing
- printing plates
- aqueous media
- Prior art date
Links
- 239000012736 aqueous medium Substances 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polyurethanes Or Polyureas (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/059,928 US5362605A (en) | 1993-05-10 | 1993-05-10 | Photosensitive polymer composition for flexographic printing plates processable in aqueous media |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA942634B true ZA942634B (en) | 1994-11-07 |
Family
ID=22026192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA942634A ZA942634B (en) | 1993-05-10 | 1994-04-18 | Photosensitive polymer composition for flexographic printing plates processable in aqueous media |
Country Status (9)
Country | Link |
---|---|
US (2) | US5362605A (xx) |
EP (1) | EP0624825B1 (xx) |
JP (1) | JP3446062B2 (xx) |
CN (1) | CN1095078A (xx) |
AU (1) | AU671529B2 (xx) |
CA (1) | CA2122744A1 (xx) |
DE (1) | DE69419069T2 (xx) |
ES (1) | ES2133480T3 (xx) |
ZA (1) | ZA942634B (xx) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5514522A (en) * | 1993-11-01 | 1996-05-07 | Polaroid Corporation | Synthesis of photoreactive polymeric binders |
JP3117394B2 (ja) * | 1994-11-29 | 2000-12-11 | 帝人製機株式会社 | 光学的立体造形用樹脂組成物 |
US5939239A (en) * | 1997-12-01 | 1999-08-17 | Nichigo-Morton Co., Ltd. | Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers |
SG79240A1 (en) * | 1997-12-01 | 2001-03-20 | Nichigo Morton Co Ltd | Photoimageable compositions containing photopolymerizable urethane oligomers and low tg binder polymers |
CA2249697A1 (en) * | 1997-12-01 | 1999-06-01 | Daniel E. Lundy | Photoimageable compositions for improved adhesion and processing times |
US5976765A (en) * | 1998-09-04 | 1999-11-02 | Polyfibron Technologies, Inc. | Solid-capped liquid photopolymer printing elements |
JP2004037713A (ja) * | 2002-07-02 | 2004-02-05 | Konica Minolta Holdings Inc | 感光性組成物および感光性平版印刷版 |
US20040146806A1 (en) * | 2003-01-29 | 2004-07-29 | Roberts David H. | Photo-imageable nanocomposites |
US6881533B2 (en) * | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
US7309550B2 (en) * | 2004-09-20 | 2007-12-18 | Chemence, Inc. | Photosensitive composition with low yellowing under UV-light and sunlight exposure |
US7318994B2 (en) * | 2004-10-14 | 2008-01-15 | Donald Long | Compressible flexographic printing plate construction |
US20090004579A1 (en) * | 2007-06-27 | 2009-01-01 | Dsm Ip Assets B.V. | Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
US8426484B2 (en) * | 2009-01-14 | 2013-04-23 | Basf Se | Liquid photoinitiator blend |
US8541482B2 (en) | 2009-10-05 | 2013-09-24 | Creative Nail Design, Inc. | Removable multilayer nail coating system and methods therefore |
US8492454B2 (en) * | 2009-10-05 | 2013-07-23 | Creative Nail Design, Inc. | Removable color layer for artificial nail coatings and methods therefore |
US8263677B2 (en) | 2009-09-08 | 2012-09-11 | Creative Nail Design, Inc. | Removable color gel basecoat for artificial nail coatings and methods therefore |
US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
BR112013023027A2 (pt) | 2011-03-07 | 2016-08-16 | Creative Neail Design Inc | composições e métodos para esmaltes de unha curáveis por uv |
JP6089426B2 (ja) * | 2011-03-28 | 2017-03-08 | 日立化成株式会社 | 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造の形成方法及び電子部品 |
CN102766428B (zh) * | 2012-08-08 | 2014-08-13 | 番禺南沙殷田化工有限公司 | 一种紫外光固化树脂组合物及其应用 |
JP6286085B1 (ja) * | 2017-03-30 | 2018-02-28 | 第一工業製薬株式会社 | ポリウレタン樹脂組成物および封止物 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL101499C (xx) * | 1951-08-20 | |||
US3975316A (en) * | 1972-05-04 | 1976-08-17 | Thiokol Corporation | Curing liquid polyurethane prepolymers |
JPS49103701A (xx) * | 1973-02-06 | 1974-10-01 | ||
AU476446B2 (en) * | 1974-04-18 | 1976-09-23 | Japan Synthetic Rubber Co., Ltd | Photosensitive composition |
DE2443786C2 (de) * | 1974-09-13 | 1984-01-19 | Basf Ag, 6700 Ludwigshafen | Flüssige, photovernetzbare Formmasse zur Herstellung von Reliefdruckplatten |
US4360438A (en) * | 1980-06-06 | 1982-11-23 | R. T. Vanderbilt Company, Inc. | Organomolybdenum based additives and lubricating compositions containing same |
DE3036694A1 (de) * | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
US4332716A (en) * | 1980-12-10 | 1982-06-01 | Union Carbide Corporation | Polymer/polyisocyanate compositions, processes for making same and processes for making polyurethane products therefrom |
DE3328285A1 (de) * | 1983-08-05 | 1985-02-21 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte |
DE3602472A1 (de) * | 1986-01-28 | 1987-07-30 | Basf Ag | Polymeranalog modifizierte polymerisate |
JPS63208035A (ja) * | 1987-02-25 | 1988-08-29 | Toray Ind Inc | フレキソ印刷版材 |
PT85756A (pt) * | 1986-09-22 | 1988-10-14 | Napp Systems Inc | Processo para a preparacao de chapas fotossensiveis e revelaveis com agua |
EP0273113B1 (en) * | 1986-12-26 | 1991-01-23 | Toray Industries, Inc. | Photosensitive polymer composition and master printing plate |
CA2019824A1 (en) * | 1989-06-28 | 1990-12-28 | Seiji Arimatsu | Polyether acrylamide derivatives and active energy ray curable resin composition |
US5122443A (en) * | 1989-11-01 | 1992-06-16 | Fuji Photo Film Co., Ltd. | Method of exposing and heating a light-sensitive material comprising polymerizable layer and light-sensitive layer provided on support |
JPH03161753A (ja) * | 1989-11-20 | 1991-07-11 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
US5236967A (en) * | 1990-01-12 | 1993-08-17 | Asahi Denka Kogyo K.K. | Optical molding resin composition comprising polythiol-polyene compounds |
US5238783A (en) * | 1990-04-16 | 1993-08-24 | Toray Industries, Inc. | Photosensitive polymer composition for water developable flexographic printing plate |
JPH0566560A (ja) * | 1991-09-10 | 1993-03-19 | Toray Ind Inc | フレキソ印刷版用感光性樹脂組成物 |
US5341799A (en) * | 1991-12-23 | 1994-08-30 | Hercules Incorporated | Urethane polymers for printing plate compositions |
US5328805A (en) * | 1992-08-28 | 1994-07-12 | W. R. Grace & Co.-Conn. | Aqueous developable photosensitive polyurethane-(meth)acrylate |
DE4230473A1 (de) * | 1992-09-14 | 1994-03-17 | Henkel Kgaa | Antislipmittel |
-
1993
- 1993-05-10 US US08/059,928 patent/US5362605A/en not_active Expired - Lifetime
-
1994
- 1994-04-12 AU AU59395/94A patent/AU671529B2/en not_active Ceased
- 1994-04-18 ZA ZA942634A patent/ZA942634B/xx unknown
- 1994-04-29 ES ES94250113T patent/ES2133480T3/es not_active Expired - Lifetime
- 1994-04-29 DE DE69419069T patent/DE69419069T2/de not_active Expired - Fee Related
- 1994-04-29 EP EP94250113A patent/EP0624825B1/en not_active Expired - Lifetime
- 1994-05-03 CA CA002122744A patent/CA2122744A1/en not_active Abandoned
- 1994-05-09 JP JP11958794A patent/JP3446062B2/ja not_active Expired - Fee Related
- 1994-05-10 CN CN94105357A patent/CN1095078A/zh active Pending
- 1994-05-16 US US08/242,818 patent/US5698371A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0624825B1 (en) | 1999-06-16 |
US5698371A (en) | 1997-12-16 |
CN1095078A (zh) | 1994-11-16 |
ES2133480T3 (es) | 1999-09-16 |
AU671529B2 (en) | 1996-08-29 |
AU5939594A (en) | 1994-11-17 |
JP3446062B2 (ja) | 2003-09-16 |
EP0624825A3 (en) | 1995-04-12 |
CA2122744A1 (en) | 1994-11-11 |
US5362605A (en) | 1994-11-08 |
DE69419069D1 (de) | 1999-07-22 |
DE69419069T2 (de) | 1999-11-11 |
EP0624825A2 (en) | 1994-11-17 |
JPH07325397A (ja) | 1995-12-12 |
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