ZA912203B - Arc diverter - Google Patents
Arc diverterInfo
- Publication number
- ZA912203B ZA912203B ZA912203A ZA912203A ZA912203B ZA 912203 B ZA912203 B ZA 912203B ZA 912203 A ZA912203 A ZA 912203A ZA 912203 A ZA912203 A ZA 912203A ZA 912203 B ZA912203 B ZA 912203B
- Authority
- ZA
- South Africa
- Prior art keywords
- resonant
- discharge
- diverting
- capacitor
- arc
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02H—EMERGENCY PROTECTIVE CIRCUIT ARRANGEMENTS
- H02H7/00—Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from normal working conditions
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Arc-Extinguishing Devices That Are Switches (AREA)
- Testing Relating To Insulation (AREA)
- Current-Collector Devices For Electrically Propelled Vehicles (AREA)
- Emergency Protection Circuit Devices (AREA)
- Thermistors And Varistors (AREA)
- Curing Cements, Concrete, And Artificial Stone (AREA)
- Sorting Of Articles (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/498,343 US5241152A (en) | 1990-03-23 | 1990-03-23 | Circuit for detecting and diverting an electrical arc in a glow discharge apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA912203B true ZA912203B (en) | 1992-01-29 |
Family
ID=23980682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA912203A ZA912203B (en) | 1990-03-23 | 1991-03-22 | Arc diverter |
Country Status (12)
Country | Link |
---|---|
US (1) | US5241152A (xx) |
EP (1) | EP0521017B1 (xx) |
JP (1) | JP3073011B2 (xx) |
KR (1) | KR100204450B1 (xx) |
AT (1) | ATE127614T1 (xx) |
AU (1) | AU645792B2 (xx) |
CA (1) | CA2077902C (xx) |
DE (1) | DE69112820T2 (xx) |
DK (1) | DK0521017T3 (xx) |
ES (1) | ES2080301T3 (xx) |
WO (1) | WO1991015027A1 (xx) |
ZA (1) | ZA912203B (xx) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4127504A1 (de) * | 1991-08-20 | 1993-02-25 | Leybold Ag | Einrichtung zur unterdrueckung von lichtboegen |
CH689767A5 (de) * | 1992-03-24 | 1999-10-15 | Balzers Hochvakuum | Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage. |
JP3631246B2 (ja) * | 1992-09-30 | 2005-03-23 | アドバンスド エナージィ インダストリーズ,インコーポレイテッド | 形状的に精密な薄膜フィルムコーティングシステム |
US5427669A (en) * | 1992-12-30 | 1995-06-27 | Advanced Energy Industries, Inc. | Thin film DC plasma processing system |
US6217717B1 (en) | 1992-12-30 | 2001-04-17 | Advanced Energy Industries, Inc. | Periodically clearing thin film plasma processing system |
US5718813A (en) * | 1992-12-30 | 1998-02-17 | Advanced Energy Industries, Inc. | Enhanced reactive DC sputtering system |
SG74667A1 (en) * | 1993-07-28 | 2000-08-22 | Asahi Glass Co Ltd | Method of an apparatus for sputtering |
US5698082A (en) * | 1993-08-04 | 1997-12-16 | Balzers Und Leybold | Method and apparatus for coating substrates in a vacuum chamber, with a system for the detection and suppression of undesirable arcing |
US5651865A (en) * | 1994-06-17 | 1997-07-29 | Eni | Preferential sputtering of insulators from conductive targets |
DE4441206C2 (de) * | 1994-11-19 | 1996-09-26 | Leybold Ag | Einrichtung für die Unterdrückung von Überschlägen in Kathoden-Zerstäubungseinrichtungen |
DE69509046T2 (de) * | 1994-11-30 | 1999-10-21 | Applied Materials, Inc. | Plasmareaktoren zur Behandlung von Halbleiterscheiben |
US5584972A (en) * | 1995-02-01 | 1996-12-17 | Sony Corporation | Plasma noise and arcing suppressor apparatus and method for sputter deposition |
WO1996031899A1 (en) | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
US5576939A (en) * | 1995-05-05 | 1996-11-19 | Drummond; Geoffrey N. | Enhanced thin film DC plasma power supply |
US5584974A (en) * | 1995-10-20 | 1996-12-17 | Eni | Arc control and switching element protection for pulsed dc cathode sputtering power supply |
US5917286A (en) * | 1996-05-08 | 1999-06-29 | Advanced Energy Industries, Inc. | Pulsed direct current power supply configurations for generating plasmas |
BE1010420A3 (fr) * | 1996-07-12 | 1998-07-07 | Cockerill Rech & Dev | Procede pour la formation d'un revetement sur un substrat et installation pour la mise en oeuvre de ce procede. |
DE19651615C1 (de) * | 1996-12-12 | 1997-07-10 | Fraunhofer Ges Forschung | Verfahren zum Aufbringen von Kohlenstoffschichten durch reaktives Magnetron-Sputtern |
DE19651811B4 (de) * | 1996-12-13 | 2006-08-31 | Unaxis Deutschland Holding Gmbh | Vorrichtung zum Belegen eines Substrats mit dünnen Schichten |
WO1998037257A1 (fr) * | 1997-02-20 | 1998-08-27 | Shibaura Mechatronics Corporation | Bloc d'alimentation pour dispositif de pulverisation cathodique |
US5897753A (en) * | 1997-05-28 | 1999-04-27 | Advanced Energy Industries, Inc. | Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages |
EP1025276A1 (en) | 1997-09-17 | 2000-08-09 | Tokyo Electron Limited | Device and method for detecting and preventing arcing in rf plasma systems |
US6051113A (en) * | 1998-04-27 | 2000-04-18 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing |
US6905578B1 (en) * | 1998-04-27 | 2005-06-14 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
US6162332A (en) * | 1998-05-07 | 2000-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for preventing arcing in sputter chamber |
US6818103B1 (en) | 1999-10-15 | 2004-11-16 | Advanced Energy Industries, Inc. | Method and apparatus for substrate biasing in multiple electrode sputtering systems |
US6350960B1 (en) | 2000-11-28 | 2002-02-26 | Thermal Dynamics Corporation | Parts-in-place safety reset circuit and method for contact start plasma-arc torch |
US7988833B2 (en) * | 2002-04-12 | 2011-08-02 | Schneider Electric USA, Inc. | System and method for detecting non-cathode arcing in a plasma generation apparatus |
US7981257B2 (en) | 2002-04-12 | 2011-07-19 | Schneider Electric USA, Inc. | Current-based method and apparatus for detecting and classifying arcs |
WO2004001094A1 (en) * | 2002-06-19 | 2003-12-31 | Tosoh Smd, Inc. | Sputter target monitoring system |
CN100360704C (zh) * | 2002-06-28 | 2008-01-09 | 东京电子株式会社 | 用于在等离子体加工系统中电弧抑制的方法和系统 |
US6808607B2 (en) * | 2002-09-25 | 2004-10-26 | Advanced Energy Industries, Inc. | High peak power plasma pulsed supply with arc handling |
US6967305B2 (en) * | 2003-08-18 | 2005-11-22 | Mks Instruments, Inc. | Control of plasma transitions in sputter processing systems |
US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
US9771648B2 (en) * | 2004-08-13 | 2017-09-26 | Zond, Inc. | Method of ionized physical vapor deposition sputter coating high aspect-ratio structures |
DE102004015090A1 (de) * | 2004-03-25 | 2005-11-03 | Hüttinger Elektronik Gmbh + Co. Kg | Bogenentladungserkennungseinrichtung |
US6943317B1 (en) * | 2004-07-02 | 2005-09-13 | Advanced Energy Industries, Inc. | Apparatus and method for fast arc extinction with early shunting of arc current in plasma |
EP2477207A3 (en) * | 2004-09-24 | 2014-09-03 | Zond, Inc. | Apparatus for generating high-current electrical discharges |
US7305311B2 (en) * | 2005-04-22 | 2007-12-04 | Advanced Energy Industries, Inc. | Arc detection and handling in radio frequency power applications |
US20060260938A1 (en) * | 2005-05-20 | 2006-11-23 | Petrach Philip M | Module for Coating System and Associated Technology |
ATE421791T1 (de) * | 2005-12-22 | 2009-02-15 | Huettinger Elektronik Gmbh | Verfahren und vorrichtung zur arcerkennung in einem plasmaprozess |
US20080000768A1 (en) * | 2006-06-30 | 2008-01-03 | Stimson Bradley O | Electrically Coupled Target Panels |
US7514935B2 (en) * | 2006-09-13 | 2009-04-07 | Advanced Energy Industries, Inc. | System and method for managing power supplied to a plasma chamber |
DE502006005363D1 (de) * | 2006-11-23 | 2009-12-24 | Huettinger Elektronik Gmbh | Verfahren zum Erkennen einer Bogenentladung in einem Plasmaprozess und Bogenentladungserkennungsvorrichtung |
US7795817B2 (en) * | 2006-11-24 | 2010-09-14 | Huettinger Elektronik Gmbh + Co. Kg | Controlled plasma power supply |
EP1928009B1 (de) * | 2006-11-28 | 2013-04-10 | HÜTTINGER Elektronik GmbH + Co. KG | Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen |
EP2102889B1 (en) | 2006-12-12 | 2020-10-07 | Evatec AG | Rf substrate bias with high power impulse magnetron sputtering (hipims) |
EP1933362B1 (de) * | 2006-12-14 | 2011-04-13 | HÜTTINGER Elektronik GmbH + Co. KG | Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen |
US8217299B2 (en) * | 2007-02-22 | 2012-07-10 | Advanced Energy Industries, Inc. | Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch |
ATE493749T1 (de) | 2007-03-08 | 2011-01-15 | Huettinger Elektronik Gmbh | Verfahren und vorrichtung zum unterdrücken von bogenentladungen beim betreiben eines plasmaprozesses |
EP1995818A1 (en) | 2007-05-12 | 2008-11-26 | Huettinger Electronic Sp. z o. o | Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs |
US8207812B2 (en) * | 2008-01-09 | 2012-06-26 | Siemens Industry, Inc. | System for isolating a medium voltage |
US8158017B2 (en) * | 2008-05-12 | 2012-04-17 | Lam Research Corporation | Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrations |
US9613784B2 (en) | 2008-07-17 | 2017-04-04 | Mks Instruments, Inc. | Sputtering system and method including an arc detection |
US8044594B2 (en) * | 2008-07-31 | 2011-10-25 | Advanced Energy Industries, Inc. | Power supply ignition system and method |
US8395078B2 (en) | 2008-12-05 | 2013-03-12 | Advanced Energy Industries, Inc | Arc recovery with over-voltage protection for plasma-chamber power supplies |
PL2648209T3 (pl) | 2009-02-17 | 2018-06-29 | Solvix Gmbh | Urządzenie zasilające do obróbki plazmowej |
US8619395B2 (en) | 2010-03-12 | 2013-12-31 | Arc Suppression Technologies, Llc | Two terminal arc suppressor |
DE102010031568B4 (de) | 2010-07-20 | 2014-12-11 | TRUMPF Hüttinger GmbH + Co. KG | Arclöschanordnung und Verfahren zum Löschen von Arcs |
US8552665B2 (en) | 2010-08-20 | 2013-10-08 | Advanced Energy Industries, Inc. | Proactive arc management of a plasma load |
EP2891388B1 (en) * | 2012-08-31 | 2021-07-21 | AES Global Holdings, Pte. Ltd. | Arc management with voltage reversal and improved recovery |
CN103981493B (zh) * | 2014-05-30 | 2016-04-27 | 大连理工常州研究院有限公司 | 一种等离子镀膜设备用引弧装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH389797A (de) * | 1959-08-17 | 1965-03-31 | Berghaus Elektrophysik Anst | Vorrichtung zur Vermeidung von plötzlichen Änderungen des Entladungszustandes für mit stromstarken Glimmentladungen betriebene Entladungsgefässe |
US3437784A (en) * | 1966-02-16 | 1969-04-08 | Gen Electric | Power supply for reducing arcing damage in glow discharge apparatus |
US3702962A (en) * | 1971-01-07 | 1972-11-14 | Bosch Gmbh Robert | Ac to dc rectifier circuit with rapid turn-off in case of overcurrent through the load circuit |
CH561285A5 (xx) * | 1973-02-19 | 1975-04-30 | Berghaus Bernhard Elektrophysi | |
US3867669A (en) * | 1974-01-11 | 1975-02-18 | Yakov Lvovich Krasik | Power source with a sparkproof output |
DE2606395C3 (de) * | 1976-02-18 | 1979-01-18 | Ionit Anstalt Bernhard Berghaus, Vaduz | Verfahren und Vorrichtung zur Überwachung des elektrischen Verhaltens einer stromstarken Glimmentladung |
JPS5537769A (en) * | 1978-09-09 | 1980-03-15 | Tokyo Shibaura Electric Co | High voltage dc breaker |
US4331856A (en) * | 1978-10-06 | 1982-05-25 | Wellman Thermal Systems Corporation | Control system and method of controlling ion nitriding apparatus |
US4476373A (en) * | 1978-10-06 | 1984-10-09 | Wellman Thermal Systems Corporation | Control system and method of controlling ion nitriding apparatus |
FR2476143A1 (fr) * | 1980-02-20 | 1981-08-21 | Fours Indls Cie | Procede de traitement thermochimique de pieces par bombardement ionique et dispositif pour la mise en oeuvre du procede |
DE3010099A1 (de) * | 1980-02-25 | 1981-09-03 | BBC AG Brown, Boveri & Cie., Baden, Aargau | Elektronische schutzschaltung |
US4459629A (en) * | 1981-11-23 | 1984-07-10 | General Electric Company | Electric circuit breaker utilizing semiconductor diodes for facilitating interruption |
DE3330702A1 (de) * | 1983-08-25 | 1985-03-07 | Vsesojuznyj naučno-issledovatel'skij, proektno-konstruktorskij i technologičeskij institut elektrotermiČeskogo oborudovanija, Moskva | Verfahren zur chemisch-thermischen behandlung von erzeugnissen mit hilfe einer glimmentladung und anlage zu deren durchfuehrung |
IL71530A (en) * | 1984-04-12 | 1987-09-16 | Univ Ramot | Method and apparatus for surface-treating workpieces |
US4733137A (en) * | 1986-03-14 | 1988-03-22 | Walker Magnetics Group, Inc. | Ion nitriding power supply |
US4825029A (en) * | 1987-06-02 | 1989-04-25 | Wickes Companies, Inc. | Spark erosion system for reducing the height of a honeycomb seal |
US4853046A (en) * | 1987-09-04 | 1989-08-01 | Surface Combustion, Inc. | Ion carburizing |
-
1990
- 1990-03-23 US US07/498,343 patent/US5241152A/en not_active Expired - Fee Related
-
1991
- 1991-03-21 DK DK91905760.4T patent/DK0521017T3/da active
- 1991-03-21 EP EP91905760A patent/EP0521017B1/en not_active Expired - Lifetime
- 1991-03-21 JP JP03506240A patent/JP3073011B2/ja not_active Expired - Fee Related
- 1991-03-21 CA CA002077902A patent/CA2077902C/en not_active Expired - Fee Related
- 1991-03-21 ES ES91905760T patent/ES2080301T3/es not_active Expired - Lifetime
- 1991-03-21 AT AT91905760T patent/ATE127614T1/de not_active IP Right Cessation
- 1991-03-21 WO PCT/US1991/001895 patent/WO1991015027A1/en active IP Right Grant
- 1991-03-21 DE DE69112820T patent/DE69112820T2/de not_active Expired - Fee Related
- 1991-03-21 KR KR1019920702283A patent/KR100204450B1/ko not_active IP Right Cessation
- 1991-03-21 AU AU74658/91A patent/AU645792B2/en not_active Ceased
- 1991-03-22 ZA ZA912203A patent/ZA912203B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
AU645792B2 (en) | 1994-01-27 |
DK0521017T3 (da) | 1996-01-22 |
WO1991015027A1 (en) | 1991-10-03 |
ES2080301T3 (es) | 1996-02-01 |
KR100204450B1 (ko) | 1999-06-15 |
US5241152A (en) | 1993-08-31 |
JPH05506327A (ja) | 1993-09-16 |
CA2077902C (en) | 2000-05-02 |
AU7465891A (en) | 1991-10-21 |
JP3073011B2 (ja) | 2000-08-07 |
EP0521017A1 (en) | 1993-01-07 |
KR930700966A (ko) | 1993-03-16 |
DE69112820T2 (de) | 1996-05-30 |
CA2077902A1 (en) | 1991-09-24 |
EP0521017B1 (en) | 1995-09-06 |
ATE127614T1 (de) | 1995-09-15 |
DE69112820D1 (de) | 1995-10-12 |
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