ZA909158B - Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms - Google Patents
Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing formsInfo
- Publication number
- ZA909158B ZA909158B ZA909158A ZA909158A ZA909158B ZA 909158 B ZA909158 B ZA 909158B ZA 909158 A ZA909158 A ZA 909158A ZA 909158 A ZA909158 A ZA 909158A ZA 909158 B ZA909158 B ZA 909158B
- Authority
- ZA
- South Africa
- Prior art keywords
- developer
- top layer
- prepared therefrom
- printing forms
- exposed negative
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3938108A DE3938108A1 (de) | 1989-11-16 | 1989-11-16 | Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten mit deckschicht sowie verfahren zur herstellung von druckformen |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA909158B true ZA909158B (en) | 1991-08-28 |
Family
ID=6393650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA909158A ZA909158B (en) | 1989-11-16 | 1990-11-15 | Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms |
Country Status (9)
Country | Link |
---|---|
US (1) | US5155011A (pt) |
EP (1) | EP0432450B1 (pt) |
JP (1) | JP2578020B2 (pt) |
KR (1) | KR100195374B1 (pt) |
BR (1) | BR9005804A (pt) |
CA (1) | CA2029975A1 (pt) |
DE (2) | DE3938108A1 (pt) |
FI (1) | FI905638A (pt) |
ZA (1) | ZA909158B (pt) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5264047A (en) * | 1991-07-17 | 1993-11-23 | Church & Dwight Co., Inc. | Low foaming effective hydrotrope |
US5433885A (en) * | 1991-07-17 | 1995-07-18 | Church & Dwight Co., Inc. | Stabilization of silicate solutions |
US5431847A (en) * | 1991-07-17 | 1995-07-11 | Charles B. Barris | Aqueous cleaning concentrates |
US5234506A (en) * | 1991-07-17 | 1993-08-10 | Church & Dwight Co., Inc. | Aqueous electronic circuit assembly cleaner and method |
US5234505A (en) * | 1991-07-17 | 1993-08-10 | Church & Dwight Co., Inc. | Stabilization of silicate solutions |
DE69430960T2 (de) * | 1993-04-28 | 2003-02-20 | Toray Industries, Inc. | Entwickler für positiv arbeitenden Elektronenstrahlresist |
US5753421A (en) * | 1994-03-31 | 1998-05-19 | Tokyo Ohka Kogya Co., Ltd. | Stock developer solutions for photoresists and developer solutions prepared by dilution thereof |
EP0732628A1 (en) * | 1995-03-07 | 1996-09-18 | Minnesota Mining And Manufacturing Company | Aqueous alkaline solution for developing offset printing plate |
DE69704298T2 (de) * | 1996-05-31 | 2001-09-27 | Atofina, Puteaux | Abbeizmittelzusammensetzung auf Basis von einem polaren, aprotischen Lösungsmittel, einem Ether und Wasser |
FR2749315B1 (fr) * | 1996-05-31 | 1998-08-14 | Atochem Elf Sa | Composition decapante a base d'eau et d'anisole |
US5955242A (en) * | 1996-09-23 | 1999-09-21 | International Business Machines Corporation | High sensitivity, photo-active polymer and developers for high resolution resist applications |
DE19811330A1 (de) * | 1998-03-16 | 1999-09-23 | Du Pont Deutschland | Entwickler und Verfahren zur Herstellung von flexographischen Druckformen |
DE19845605A1 (de) | 1998-10-05 | 2000-04-06 | Agfa Gevaert Ag | Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien |
US6756183B2 (en) * | 2001-08-24 | 2004-06-29 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
US7316891B2 (en) * | 2002-03-06 | 2008-01-08 | Agfa Graphics Nv | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
US7338969B2 (en) * | 2002-03-08 | 2008-03-04 | Quonova, Llc | Modulation of pathogenicity |
US7335779B2 (en) * | 2002-03-08 | 2008-02-26 | Quonova, Llc | Modulation of pathogenicity |
US20070196340A1 (en) * | 2003-05-06 | 2007-08-23 | Aldo Ammendola | Modulation of Pathogenicity |
WO2005111727A1 (en) * | 2004-05-19 | 2005-11-24 | Agfa-Gevaert | Method of making a photopolymer printing plate |
EP1788441B1 (en) * | 2005-11-18 | 2010-07-07 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
EP2214056B1 (en) * | 2005-11-18 | 2012-12-26 | Agfa Graphics N.V. | Method of making a lithographic printing plate |
EP2677365B1 (en) * | 2011-02-16 | 2019-01-23 | Toyobo Co., Ltd. | Developer composition for printing plate, developer and method for manufacturing printing plate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5854341A (ja) * | 1981-09-28 | 1983-03-31 | Fuji Photo Film Co Ltd | 現像方法および現像液 |
JPS58190952A (ja) * | 1982-04-30 | 1983-11-08 | Fuji Photo Film Co Ltd | 感光性印刷版の現像液 |
US4588836A (en) * | 1982-09-01 | 1986-05-13 | Toyo Jozo Kabushiki Kaisha | Novel synthetic substrate and assay method using the same |
DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
US4851324A (en) * | 1987-07-27 | 1989-07-25 | Hoechst Celanese Corporation | Phenoxy propanol containing developer compositions for lithographic plates having neutral pH |
-
1989
- 1989-11-16 DE DE3938108A patent/DE3938108A1/de not_active Withdrawn
-
1990
- 1990-11-07 DE DE59010275T patent/DE59010275D1/de not_active Expired - Fee Related
- 1990-11-07 EP EP90121282A patent/EP0432450B1/de not_active Expired - Lifetime
- 1990-11-14 CA CA002029975A patent/CA2029975A1/en not_active Abandoned
- 1990-11-14 FI FI905638A patent/FI905638A/fi not_active Application Discontinuation
- 1990-11-14 BR BR909005804A patent/BR9005804A/pt not_active IP Right Cessation
- 1990-11-14 KR KR1019900018395A patent/KR100195374B1/ko not_active IP Right Cessation
- 1990-11-15 JP JP2310161A patent/JP2578020B2/ja not_active Expired - Lifetime
- 1990-11-15 US US07/613,000 patent/US5155011A/en not_active Expired - Fee Related
- 1990-11-15 ZA ZA909158A patent/ZA909158B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
US5155011A (en) | 1992-10-13 |
JP2578020B2 (ja) | 1997-02-05 |
JPH03172851A (ja) | 1991-07-26 |
DE59010275D1 (de) | 1996-05-15 |
DE3938108A1 (de) | 1991-05-23 |
EP0432450A2 (de) | 1991-06-19 |
FI905638A (fi) | 1991-05-17 |
KR100195374B1 (ko) | 1999-06-15 |
EP0432450A3 (en) | 1991-09-18 |
EP0432450B1 (de) | 1996-04-10 |
BR9005804A (pt) | 1991-09-24 |
CA2029975A1 (en) | 1991-05-17 |
KR910010242A (ko) | 1991-06-29 |
FI905638A0 (fi) | 1990-11-14 |
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