ZA909158B - Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms - Google Patents

Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms

Info

Publication number
ZA909158B
ZA909158B ZA909158A ZA909158A ZA909158B ZA 909158 B ZA909158 B ZA 909158B ZA 909158 A ZA909158 A ZA 909158A ZA 909158 A ZA909158 A ZA 909158A ZA 909158 B ZA909158 B ZA 909158B
Authority
ZA
South Africa
Prior art keywords
developer
top layer
prepared therefrom
printing forms
exposed negative
Prior art date
Application number
ZA909158A
Other languages
English (en)
Inventor
Rudolf Zertani
Zertani Rudolf
Klaus Joerg
Joerg Klaus
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA909158B publication Critical patent/ZA909158B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ZA909158A 1989-11-16 1990-11-15 Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms ZA909158B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3938108A DE3938108A1 (de) 1989-11-16 1989-11-16 Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten mit deckschicht sowie verfahren zur herstellung von druckformen

Publications (1)

Publication Number Publication Date
ZA909158B true ZA909158B (en) 1991-08-28

Family

ID=6393650

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA909158A ZA909158B (en) 1989-11-16 1990-11-15 Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms

Country Status (9)

Country Link
US (1) US5155011A (xx)
EP (1) EP0432450B1 (xx)
JP (1) JP2578020B2 (xx)
KR (1) KR100195374B1 (xx)
BR (1) BR9005804A (xx)
CA (1) CA2029975A1 (xx)
DE (2) DE3938108A1 (xx)
FI (1) FI905638A (xx)
ZA (1) ZA909158B (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5264047A (en) * 1991-07-17 1993-11-23 Church & Dwight Co., Inc. Low foaming effective hydrotrope
US5433885A (en) * 1991-07-17 1995-07-18 Church & Dwight Co., Inc. Stabilization of silicate solutions
US5234506A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Aqueous electronic circuit assembly cleaner and method
US5431847A (en) * 1991-07-17 1995-07-11 Charles B. Barris Aqueous cleaning concentrates
US5234505A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Stabilization of silicate solutions
DE69430960T2 (de) * 1993-04-28 2003-02-20 Toray Industries Entwickler für positiv arbeitenden Elektronenstrahlresist
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
EP0732628A1 (en) * 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
ATE199929T1 (de) * 1996-05-31 2001-04-15 Atofina Abbeizmittelzusammensetzung auf basis von einem polaren, aprotischen lösungsmittel, einem ether und wasser
FR2749315B1 (fr) * 1996-05-31 1998-08-14 Atochem Elf Sa Composition decapante a base d'eau et d'anisole
US5955242A (en) * 1996-09-23 1999-09-21 International Business Machines Corporation High sensitivity, photo-active polymer and developers for high resolution resist applications
DE19811330A1 (de) * 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
DE19845605A1 (de) 1998-10-05 2000-04-06 Agfa Gevaert Ag Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien
US6756183B2 (en) * 2001-08-24 2004-06-29 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
US7335779B2 (en) * 2002-03-08 2008-02-26 Quonova, Llc Modulation of pathogenicity
US7338969B2 (en) * 2002-03-08 2008-03-04 Quonova, Llc Modulation of pathogenicity
US20070196340A1 (en) * 2003-05-06 2007-08-23 Aldo Ammendola Modulation of Pathogenicity
EP1751625B9 (en) * 2004-05-19 2012-03-14 Agfa Graphics N.V. Method of making a photopolymer printing plate
ATE473469T1 (de) * 2005-11-18 2010-07-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP2214056B1 (en) * 2005-11-18 2012-12-26 Agfa Graphics N.V. Method of making a lithographic printing plate
WO2012111238A1 (ja) * 2011-02-16 2012-08-23 東洋紡績株式会社 印刷版用現像液組成物、現像液および印刷原版の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854341A (ja) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4588836A (en) * 1982-09-01 1986-05-13 Toyo Jozo Kabushiki Kaisha Novel synthetic substrate and assay method using the same
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4851324A (en) * 1987-07-27 1989-07-25 Hoechst Celanese Corporation Phenoxy propanol containing developer compositions for lithographic plates having neutral pH

Also Published As

Publication number Publication date
KR100195374B1 (ko) 1999-06-15
EP0432450A2 (de) 1991-06-19
JP2578020B2 (ja) 1997-02-05
JPH03172851A (ja) 1991-07-26
DE3938108A1 (de) 1991-05-23
EP0432450B1 (de) 1996-04-10
KR910010242A (ko) 1991-06-29
CA2029975A1 (en) 1991-05-17
BR9005804A (pt) 1991-09-24
FI905638A0 (fi) 1990-11-14
FI905638A (fi) 1991-05-17
DE59010275D1 (de) 1996-05-15
EP0432450A3 (en) 1991-09-18
US5155011A (en) 1992-10-13

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