BR9005804A - Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao contendo camada de cobertura,expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao - Google Patents

Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao contendo camada de cobertura,expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao

Info

Publication number
BR9005804A
BR9005804A BR909005804A BR9005804A BR9005804A BR 9005804 A BR9005804 A BR 9005804A BR 909005804 A BR909005804 A BR 909005804A BR 9005804 A BR9005804 A BR 9005804A BR 9005804 A BR9005804 A BR 9005804A
Authority
BR
Brazil
Prior art keywords
developer
exposed
processes
prepared
production
Prior art date
Application number
BR909005804A
Other languages
English (en)
Inventor
Rudolf Zertani
Klaus Joerg
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9005804A publication Critical patent/BR9005804A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BR909005804A 1989-11-16 1990-11-14 Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao contendo camada de cobertura,expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao BR9005804A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3938108A DE3938108A1 (de) 1989-11-16 1989-11-16 Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten mit deckschicht sowie verfahren zur herstellung von druckformen

Publications (1)

Publication Number Publication Date
BR9005804A true BR9005804A (pt) 1991-09-24

Family

ID=6393650

Family Applications (1)

Application Number Title Priority Date Filing Date
BR909005804A BR9005804A (pt) 1989-11-16 1990-11-14 Concentrado de revelador e revelador a partir dele preparado,para camadas de reproducao contendo camada de cobertura,expostas a luz,de atuacao negativa,bem como processos para producao de moldes de impressao

Country Status (9)

Country Link
US (1) US5155011A (pt)
EP (1) EP0432450B1 (pt)
JP (1) JP2578020B2 (pt)
KR (1) KR100195374B1 (pt)
BR (1) BR9005804A (pt)
CA (1) CA2029975A1 (pt)
DE (2) DE3938108A1 (pt)
FI (1) FI905638A (pt)
ZA (1) ZA909158B (pt)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234505A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Stabilization of silicate solutions
US5431847A (en) * 1991-07-17 1995-07-11 Charles B. Barris Aqueous cleaning concentrates
US5433885A (en) * 1991-07-17 1995-07-18 Church & Dwight Co., Inc. Stabilization of silicate solutions
US5234506A (en) * 1991-07-17 1993-08-10 Church & Dwight Co., Inc. Aqueous electronic circuit assembly cleaner and method
US5264047A (en) * 1991-07-17 1993-11-23 Church & Dwight Co., Inc. Low foaming effective hydrotrope
WO1994025904A1 (en) * 1993-04-28 1994-11-10 Toray Industries, Inc. Positive electron-beam resist composition and developer for positive electron-beam resist
US5753421A (en) * 1994-03-31 1998-05-19 Tokyo Ohka Kogya Co., Ltd. Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
EP0732628A1 (en) * 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
FR2749315B1 (fr) * 1996-05-31 1998-08-14 Atochem Elf Sa Composition decapante a base d'eau et d'anisole
DE69704298T2 (de) * 1996-05-31 2001-09-27 Atofina Abbeizmittelzusammensetzung auf Basis von einem polaren, aprotischen Lösungsmittel, einem Ether und Wasser
US5955242A (en) * 1996-09-23 1999-09-21 International Business Machines Corporation High sensitivity, photo-active polymer and developers for high resolution resist applications
DE19811330A1 (de) 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
DE19845605A1 (de) 1998-10-05 2000-04-06 Agfa Gevaert Ag Konzentrat und daraus hergestellter wäßriger Entwickler für bildmäßig bestrahlte Aufzeichnungsmaterialien
US6756183B2 (en) * 2001-08-24 2004-06-29 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
US7335779B2 (en) * 2002-03-08 2008-02-26 Quonova, Llc Modulation of pathogenicity
US7338969B2 (en) * 2002-03-08 2008-03-04 Quonova, Llc Modulation of pathogenicity
US20070196340A1 (en) * 2003-05-06 2007-08-23 Aldo Ammendola Modulation of Pathogenicity
DK1751625T3 (da) * 2004-05-19 2012-02-27 Agfa Graphics Nv Fremgangsmåde til fremstilling af fotopolymerplade
PL1788442T3 (pl) * 2005-11-18 2011-01-31 Agfa Graphics Nv Sposób wytwarzania litograficznej formy drukowej
ATE473469T1 (de) * 2005-11-18 2010-07-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
US9005884B2 (en) * 2011-02-16 2015-04-14 Toyobo Co., Ltd. Developer composition for printing plate, developer and method for manufacturing printing plate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854341A (ja) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4588836A (en) * 1982-09-01 1986-05-13 Toyo Jozo Kabushiki Kaisha Novel synthetic substrate and assay method using the same
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4851324A (en) * 1987-07-27 1989-07-25 Hoechst Celanese Corporation Phenoxy propanol containing developer compositions for lithographic plates having neutral pH

Also Published As

Publication number Publication date
DE59010275D1 (de) 1996-05-15
CA2029975A1 (en) 1991-05-17
KR910010242A (ko) 1991-06-29
FI905638A (fi) 1991-05-17
EP0432450B1 (de) 1996-04-10
ZA909158B (en) 1991-08-28
JP2578020B2 (ja) 1997-02-05
EP0432450A3 (en) 1991-09-18
JPH03172851A (ja) 1991-07-26
DE3938108A1 (de) 1991-05-23
KR100195374B1 (ko) 1999-06-15
EP0432450A2 (de) 1991-06-19
FI905638A0 (fi) 1990-11-14
US5155011A (en) 1992-10-13

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Legal Events

Date Code Title Description
FB19 Grant procedure suspended (art. 19)
FB19 Grant procedure suspended (art. 19)
FF Decision: intention to grant
PC Transfer
FG9A Patent or certificate of addition granted
B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 14/11/2010