ZA891006B - Method and apparatus for temperature treatment of semiconductor materials - Google Patents

Method and apparatus for temperature treatment of semiconductor materials

Info

Publication number
ZA891006B
ZA891006B ZA891006A ZA891006A ZA891006B ZA 891006 B ZA891006 B ZA 891006B ZA 891006 A ZA891006 A ZA 891006A ZA 891006 A ZA891006 A ZA 891006A ZA 891006 B ZA891006 B ZA 891006B
Authority
ZA
South Africa
Prior art keywords
semiconductor materials
temperature treatment
treatment
temperature
semiconductor
Prior art date
Application number
ZA891006A
Other languages
English (en)
Inventor
Heinrich Dr Soehlbrand
Soehlbrand Dr Heinrich
Original Assignee
Soehlbrand Heinrich
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soehlbrand Heinrich filed Critical Soehlbrand Heinrich
Publication of ZA891006B publication Critical patent/ZA891006B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/12—Heating of the reaction chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
ZA891006A 1988-02-11 1989-02-09 Method and apparatus for temperature treatment of semiconductor materials ZA891006B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE8801785U DE8801785U1 (de) 1988-02-11 1988-02-11 Vorrichtung zur Temperaturbehandlung von Halbleitermaterialien

Publications (1)

Publication Number Publication Date
ZA891006B true ZA891006B (en) 1989-10-25

Family

ID=6820582

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA891006A ZA891006B (en) 1988-02-11 1989-02-09 Method and apparatus for temperature treatment of semiconductor materials

Country Status (12)

Country Link
US (1) US4943234A (fr)
EP (1) EP0327718A3 (fr)
JP (1) JPH01273311A (fr)
KR (1) KR890013761A (fr)
CN (1) CN1018111B (fr)
AR (1) AR242315A1 (fr)
AU (1) AU644775B2 (fr)
BR (1) BR8900589A (fr)
DD (1) DD279113A5 (fr)
DE (1) DE8801785U1 (fr)
IL (1) IL89234A0 (fr)
ZA (1) ZA891006B (fr)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3922833A1 (de) * 1989-07-09 1991-01-10 Heinrich Dr Soehlbrand Ofen zur waermebehandlung von halbleiterscheiben und verfahren zum betrieb desselben
US5088922A (en) * 1990-01-23 1992-02-18 Tokyo Electron Sagami Limited Heat-treatment apparatus having exhaust system
JP3007432B2 (ja) * 1991-02-19 2000-02-07 東京エレクトロン株式会社 熱処理装置
US5249960A (en) * 1991-06-14 1993-10-05 Tokyo Electron Sagami Kabushiki Kaisha Forced cooling apparatus for heat treatment apparatus
US5536918A (en) * 1991-08-16 1996-07-16 Tokyo Electron Sagami Kabushiki Kaisha Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers
US5256060A (en) * 1992-01-28 1993-10-26 Digital Equipment Corporation Reducing gas recirculation in thermal processing furnace
US5208961A (en) * 1992-02-28 1993-05-11 National Semiconductor Corporation Semiconductor processing furnace door alignment apparatus and method
US5330842A (en) * 1992-03-17 1994-07-19 David M. Volz Surface treated vestibule block and process of making the same
JP3230836B2 (ja) * 1992-04-09 2001-11-19 東京エレクトロン株式会社 熱処理装置
JP3218164B2 (ja) * 1995-05-31 2001-10-15 東京エレクトロン株式会社 被処理体の支持ボート、熱処理装置及び熱処理方法
US6002109A (en) * 1995-07-10 1999-12-14 Mattson Technology, Inc. System and method for thermal processing of a semiconductor substrate
US5605454A (en) * 1995-10-12 1997-02-25 Vlsi Technology, Inc. Four port tube to extend the life of quartz tubes used for the well drive process
JP3971810B2 (ja) * 1995-11-30 2007-09-05 三星電子株式会社 縦型拡散炉
US6133550A (en) * 1996-03-22 2000-10-17 Sandia Corporation Method and apparatus for thermal processing of semiconductor substrates
US6198074B1 (en) 1996-09-06 2001-03-06 Mattson Technology, Inc. System and method for rapid thermal processing with transitional heater
JPH1197446A (ja) * 1997-09-18 1999-04-09 Tokyo Electron Ltd 縦型熱処理装置
US6252202B1 (en) * 1998-02-10 2001-06-26 Jeneric/Pentron, Inc. Furnace for heat treatment of dental materials
US6631934B1 (en) * 2000-06-02 2003-10-14 Saint-Gobain Ceramics & Plastics, Inc. Silicon carbide cantilever paddle
JP3910151B2 (ja) * 2003-04-01 2007-04-25 東京エレクトロン株式会社 熱処理方法及び熱処理装置
CN100347507C (zh) * 2003-06-10 2007-11-07 山东大学 用于制备氧化锆连续纤维的烧结炉
JP4404620B2 (ja) * 2003-12-22 2010-01-27 株式会社日立国際電気 基板処理装置および半導体装置の製造方法
JP4503397B2 (ja) * 2004-08-26 2010-07-14 東京エレクトロン株式会社 縦型熱処理装置及びその処理容器急速降温方法
JP4495717B2 (ja) * 2006-12-08 2010-07-07 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法
CN101395705B (zh) * 2007-02-09 2011-08-10 株式会社日立国际电气 隔热构造体、加热装置、基板处理设备以及半导体器件的制造方法
US20090214999A1 (en) * 2008-02-21 2009-08-27 Saint-Gobain Ceramics & Plastics, Inc. Ceramic Paddle
JP2012174782A (ja) * 2011-02-18 2012-09-10 Hitachi Kokusai Electric Inc 基板処理装置及び半導体装置の製造方法
JP5770042B2 (ja) * 2011-08-04 2015-08-26 東京エレクトロン株式会社 熱処理装置
CN103762164B (zh) * 2014-02-20 2016-11-23 北京七星华创电子股份有限公司 可快速风冷的热处理装置
CN106148878B (zh) * 2016-06-24 2018-06-08 中南大学 一种模拟高温喷镀过程的装置及其使用方法
KR102127130B1 (ko) * 2017-02-17 2020-06-26 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램
CN107564852B (zh) * 2017-08-31 2019-10-18 长江存储科技有限责任公司 铜结构的热处理方法及三维存储器的形成方法
JP7374899B2 (ja) 2017-12-11 2023-11-07 グラクソスミスクライン、インテレクチュアル、プロパティー、ディベロップメント、リミテッド モジュール式無菌生産システム
CN113380672B (zh) * 2021-06-08 2024-05-17 北京北方华创微电子装备有限公司 半导体热处理设备
CN117542767B (zh) * 2024-01-10 2024-03-26 合肥费舍罗热工装备有限公司 一种半导体立式熔接炉
CN118129476B (zh) * 2024-04-30 2024-07-09 四川朗晟新材料科技有限公司 一种磷酸铁锂粉料烧结窑炉

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3737282A (en) * 1971-10-01 1973-06-05 Ibm Method for reducing crystallographic defects in semiconductor structures
US3811825A (en) * 1972-11-03 1974-05-21 Sowell J Semiconductor wafer transport device
DE3142589A1 (de) * 1981-10-27 1983-05-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zum tempern von aus metall, silizium und aus metall/silizium bestehenden schichten auf substraten in extrem trockener inertgasatmosphaere
US4412812A (en) * 1981-12-28 1983-11-01 Mostek Corporation Vertical semiconductor furnace
JPS59208824A (ja) * 1983-05-12 1984-11-27 ノ−トン・カンパニ− 半導体部材等の加熱装置
DE3539981C1 (de) * 1985-11-11 1987-06-11 Telog Systems Gmbh Verfahren und Vorrichtung zur Behandlung von Halbleitermaterialien
US4767251A (en) * 1986-05-06 1988-08-30 Amtech Systems, Inc. Cantilever apparatus and method for loading wafer boats into cantilever diffusion tubes

Also Published As

Publication number Publication date
JPH01273311A (ja) 1989-11-01
IL89234A0 (en) 1989-09-10
AU2987089A (en) 1989-08-17
BR8900589A (pt) 1989-10-10
CN1018111B (zh) 1992-09-02
DD279113A5 (de) 1990-05-23
EP0327718A2 (fr) 1989-08-16
AR242315A1 (es) 1993-03-31
KR890013761A (ko) 1989-09-25
US4943234A (en) 1990-07-24
DE8801785U1 (de) 1988-11-10
CN1036296A (zh) 1989-10-11
EP0327718A3 (fr) 1989-11-23
AU644775B2 (en) 1993-12-23

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