ZA857714B - Vapour deposition of tin - Google Patents

Vapour deposition of tin

Info

Publication number
ZA857714B
ZA857714B ZA857714A ZA857714A ZA857714B ZA 857714 B ZA857714 B ZA 857714B ZA 857714 A ZA857714 A ZA 857714A ZA 857714 A ZA857714 A ZA 857714A ZA 857714 B ZA857714 B ZA 857714B
Authority
ZA
South Africa
Prior art keywords
tin
vapour deposition
vapour
deposition
Prior art date
Application number
ZA857714A
Other languages
English (en)
Inventor
Peter John Heyes
Original Assignee
Metal Box Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metal Box Plc filed Critical Metal Box Plc
Publication of ZA857714B publication Critical patent/ZA857714B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
ZA857714A 1984-10-13 1985-10-07 Vapour deposition of tin ZA857714B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB848425917A GB8425917D0 (en) 1984-10-13 1984-10-13 Evaporating metal

Publications (1)

Publication Number Publication Date
ZA857714B true ZA857714B (en) 1987-05-27

Family

ID=10568155

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA857714A ZA857714B (en) 1984-10-13 1985-10-07 Vapour deposition of tin

Country Status (17)

Country Link
US (1) US4810531A (da)
EP (1) EP0197110B1 (da)
JP (1) JPS62500528A (da)
CN (1) CN1005067B (da)
AU (1) AU579680B2 (da)
BR (1) BR8506978A (da)
CA (1) CA1254801A (da)
DE (1) DE3564292D1 (da)
DK (1) DK275686A (da)
ES (1) ES8703532A1 (da)
GB (2) GB8425917D0 (da)
GR (1) GR852470B (da)
IN (1) IN166278B (da)
NZ (1) NZ213784A (da)
PT (1) PT81292B (da)
WO (1) WO1986002387A1 (da)
ZA (1) ZA857714B (da)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8608023D0 (en) * 1986-04-02 1986-05-08 Secr Defence Consolidation of deposited metal
SE502384C2 (sv) * 1991-02-06 1995-10-09 Applied Vacuum Tech Förfarande för styckvis metallbeläggning av CD-skivor
US5858456A (en) * 1991-02-06 1999-01-12 Applied Vacuum Technologies 1 Ab Method for metal coating discrete objects by vapor deposition
DE4211956C1 (da) * 1992-04-09 1993-05-06 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE19539986A1 (de) * 1995-10-27 1997-04-30 Leybold Ag Vakuumbeschichtungsanlage mit einem in der Vakuumkammer angeordneten Tiegel zur Aufnahme von zu verdampfendem Material
US6461667B1 (en) * 2000-04-04 2002-10-08 Eastman Kodak Company Apparatus and method for vapor depositing lubricant coating on a web
DE102005030862B4 (de) * 2005-07-01 2009-12-24 Sintec Keramik Gmbh Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper
CN103028901B (zh) * 2012-11-16 2014-12-24 中国航空工业集团公司北京航空制造工程研究所 一种盘类零件的包覆/轧制成形方法
DE102013218322B4 (de) 2013-09-12 2021-11-18 Kennametal Inc. Verdampferkörper für eine PVD-Beschichtungsanlage sowie Verfahren zum Bereitstellen eines derartigen Verdampferkörpers
DE102015112135B4 (de) * 2015-07-24 2023-04-06 Kennametal Inc. Verdampferkörper mit Titanhydridbeschichtung, Verfahren zu dessen Herstellung und Verwendung
CN105296939A (zh) * 2015-10-10 2016-02-03 江苏新思达电子有限公司 一种稳定的不连续蒸发镀锡方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL79321C (da) * 1950-09-07
US2860075A (en) * 1951-01-27 1958-11-11 Continental Can Co Method of making a heater for vacuum deposition
US2996412A (en) * 1958-10-10 1961-08-15 Continental Can Co Art of depositing metals
US3205086A (en) * 1960-02-04 1965-09-07 Continental Can Co Method and apparatus for continuous vacuum metal coating of metal strip
US3227132A (en) * 1962-12-31 1966-01-04 Nat Res Corp Apparatus for depositing coatings of tin on a flexible substrate
US3457784A (en) * 1966-04-06 1969-07-29 Jones & Laughlin Steel Corp Evaporation rate monitor
GB1354702A (en) * 1970-02-12 1974-06-05 Baxter Ltd Alexander Methods of and means for vacuum deposition
US3730507A (en) * 1971-01-18 1973-05-01 Union Carbide Corp Boron nitride base evaporation vessel having a surface coating of titanium-silicon thereon
US3649734A (en) * 1971-01-29 1972-03-14 Motorola Inc Crucible electron beam evaporation of aluminum

Also Published As

Publication number Publication date
AU579680B2 (en) 1988-12-01
GB2165554A (en) 1986-04-16
CN1005067B (zh) 1989-08-30
GB2165554B (en) 1988-06-08
IN166278B (da) 1990-04-07
CA1254801A (en) 1989-05-30
PT81292A (en) 1985-11-01
CN85108596A (zh) 1986-07-16
GB8525025D0 (en) 1985-11-13
JPS62500528A (ja) 1987-03-05
DE3564292D1 (en) 1988-09-15
EP0197110B1 (en) 1988-08-10
AU4950885A (en) 1986-05-02
PT81292B (pt) 1987-10-20
ES8703532A1 (es) 1987-02-16
US4810531A (en) 1989-03-07
JPH0377874B2 (da) 1991-12-11
DK275686D0 (da) 1986-06-11
EP0197110A1 (en) 1986-10-15
GR852470B (da) 1986-02-12
GB8425917D0 (en) 1984-11-21
ES547792A0 (es) 1987-02-16
WO1986002387A1 (en) 1986-04-24
BR8506978A (pt) 1987-01-06
DK275686A (da) 1986-06-11
NZ213784A (en) 1989-02-24

Similar Documents

Publication Publication Date Title
GB2156578B (en) Vapour deposition apparatus
GB8420797D0 (en) Reactive vapour deposition of compounds
DE3572200D1 (en) A method of homogeneous chemical vapour deposition
GB8525789D0 (en) Chemical vapour deposition
AU582767B2 (en) A vapour deposition process
AU543668B2 (en) High-velocity dip-coating of filament-like-materials
GB8512700D0 (en) Deposition of borophosphosilicate glass
GB8531424D0 (en) Coating glass
GB8403456D0 (en) Vapor deposition of material
GB8528217D0 (en) Vapour deposition
GB8507458D0 (en) Coating glass
GB8531425D0 (en) Pyrolytically coating glass
GB8531423D0 (en) Coating glass
DE3564292D1 (en) Vapour deposition of tin
GB8623978D0 (en) Chemical vapour deposition
IL77287A (en) Chemical vapor deposition of fluorine-doped tin oxide coatings
AU8745282A (en) Vapor deposition
GB8529157D0 (en) Vapour deposition apparatus
GB8328858D0 (en) Metal vapour deposition
DE3272503D1 (en) Plasma deposition of amorphous materials
AU4044185A (en) Coating glass
GB8619057D0 (en) Whisker resistant tin coatings
ZA8532B (en) Coated glass
GB2155959B (en) Chemical vapour deposition
GB8603544D0 (en) Chemical vapour deposition