ZA741332B - Photo-crosslinkable polymers and processes for the manufacture thereof - Google Patents

Photo-crosslinkable polymers and processes for the manufacture thereof

Info

Publication number
ZA741332B
ZA741332B ZA00741332A ZA741332A ZA741332B ZA 741332 B ZA741332 B ZA 741332B ZA 00741332 A ZA00741332 A ZA 00741332A ZA 741332 A ZA741332 A ZA 741332A ZA 741332 B ZA741332 B ZA 741332B
Authority
ZA
South Africa
Prior art keywords
photo
manufacture
processes
crosslinkable polymers
crosslinkable
Prior art date
Application number
ZA00741332A
Other languages
English (en)
Inventor
G Lohaus
H Furrer
H Steppan
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of ZA741332B publication Critical patent/ZA741332B/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F24/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • C08F8/16Lactonisation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/30Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
ZA00741332A 1973-03-01 1974-02-28 Photo-crosslinkable polymers and processes for the manufacture thereof ZA741332B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2310307A DE2310307C2 (de) 1973-03-01 1973-03-01 Lichtempfindliches Aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
ZA741332B true ZA741332B (en) 1975-02-26

Family

ID=5873550

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00741332A ZA741332B (en) 1973-03-01 1974-02-28 Photo-crosslinkable polymers and processes for the manufacture thereof

Country Status (10)

Country Link
US (1) US3969323A (xx)
JP (1) JPS5753583B2 (xx)
CA (1) CA1042701A (xx)
DE (1) DE2310307C2 (xx)
FR (1) FR2219954B1 (xx)
GB (1) GB1446981A (xx)
IT (1) IT1003608B (xx)
NL (1) NL7402247A (xx)
SE (1) SE399135B (xx)
ZA (1) ZA741332B (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4159202A (en) * 1973-12-20 1979-06-26 Hoechst Aktiengesellschaft Photopolymer having 2-pyridone side group
JPS5472237A (en) * 1977-11-21 1979-06-09 Toyo Ink Mfg Co Ltd Ultraviolet curable coating composition
US4175177A (en) * 1978-02-24 1979-11-20 Union Carbide Corporation Crosslinkable copolymer of a lactone and a polyfunctional acrylate
DE3061376D1 (en) * 1979-01-30 1983-01-27 Ciba Geigy Ag Light curable polymers with side groups derived from indenon, their production and utilization
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
US4568734A (en) * 1983-02-15 1986-02-04 Eastman Kodak Company Electron-beam and X-ray sensitive polymers and resists
JPS60134283U (ja) * 1984-02-17 1985-09-06 平河電線株式会社 ケ−ブルサポ−タ
US4539376A (en) * 1984-10-09 1985-09-03 Ashland Oil, Inc. Cross-linking of maleic anhydride polymers with bicyclic amide acetals
DE3644373A1 (de) * 1986-12-24 1988-07-07 Hoechst Ag Aminogruppenhaltige polymerisate, ihre herstellung und ihre verwendung
US4908381A (en) * 1988-12-05 1990-03-13 Ecolab Inc. Antimicrobial film-forming compositions
US5108740A (en) * 1988-12-05 1992-04-28 Ecolab Inc. Antimicrobial film-forming compositions containing polymers having pendant pyran groups
WO1996010049A1 (de) * 1994-09-29 1996-04-04 F. Hoffmann-La Roche Ag Cumarin- und chinolinon-derivate zur herstellung von orientierungsschichten für flüssigkristalle
US6303745B1 (en) * 1998-04-20 2001-10-16 Cosmo Research Institute Polyester and process for producing the same
JP2004505133A (ja) 2000-08-01 2004-02-19 ダウ グローバル テクノロジーズ インコーポレーテッド 優れた加工性をもつ高分子量モノビニリデン
WO2009038007A1 (ja) * 2007-09-19 2009-03-26 Kabushiki Kaisha Toyota Jidoshokki ポリウレタン及びポリウレア、並びにその製造法
JP6052207B2 (ja) * 2014-03-04 2016-12-27 信越化学工業株式会社 ポジ型レジスト材料及びこれを用いたパターン形成方法
JP6044566B2 (ja) * 2014-03-04 2016-12-14 信越化学工業株式会社 ポジ型レジスト材料及びこれを用いたパターン形成方法
US9606439B2 (en) * 2014-07-15 2017-03-28 Eastman Kodak Company Forming conductive metal patterns using water-soluble polymers

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB908281A (en) * 1958-01-20 1962-10-17 Styrene Co Polymers Ltd Improvements in or relating to the manufacture of copolymers of vinyl compounds
GB1087416A (en) * 1964-09-02 1967-10-18 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3743658A (en) * 1969-02-24 1973-07-03 Gen Electric Process for preparing alpha-pyrones

Also Published As

Publication number Publication date
JPS5753583B2 (xx) 1982-11-13
FR2219954B1 (xx) 1978-01-06
SE399135B (sv) 1978-01-30
IT1003608B (it) 1976-06-10
NL7402247A (xx) 1974-09-03
JPS49118785A (xx) 1974-11-13
CA1042701A (en) 1978-11-21
DE2310307C2 (de) 1983-12-29
GB1446981A (en) 1976-08-18
US3969323A (en) 1976-07-13
DE2310307A1 (de) 1974-09-05
FR2219954A1 (xx) 1974-09-27

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