ZA716445B - Improvements in and relating to the manufacture of reprographic materials - Google Patents

Improvements in and relating to the manufacture of reprographic materials

Info

Publication number
ZA716445B
ZA716445B ZA716445A ZA716445A ZA716445B ZA 716445 B ZA716445 B ZA 716445B ZA 716445 A ZA716445 A ZA 716445A ZA 716445 A ZA716445 A ZA 716445A ZA 716445 B ZA716445 B ZA 716445B
Authority
ZA
South Africa
Prior art keywords
relating
manufacture
reprographic materials
reprographic
materials
Prior art date
Application number
ZA716445A
Other languages
English (en)
Inventor
G Augstein
H Ruckert
H Kraemer
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702047816 external-priority patent/DE2047816C3/de
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of ZA716445B publication Critical patent/ZA716445B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
ZA716445A 1970-09-29 1971-09-27 Improvements in and relating to the manufacture of reprographic materials ZA716445B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702047816 DE2047816C3 (de) 1970-09-29 Verfahren zur Herstellung reprographischer Materialien durch Aufdampfen einer lichtempfindlichen Schicht

Publications (1)

Publication Number Publication Date
ZA716445B true ZA716445B (en) 1972-05-31

Family

ID=5783684

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA716445A ZA716445B (en) 1970-09-29 1971-09-27 Improvements in and relating to the manufacture of reprographic materials

Country Status (11)

Country Link
US (1) US3751285A (cs)
JP (1) JPS5420884B1 (cs)
AT (1) AT321102B (cs)
BE (1) BE773146A (cs)
CA (1) CA991003A (cs)
CH (1) CH566033A5 (cs)
FR (1) FR2108683A5 (cs)
GB (1) GB1361786A (cs)
NL (1) NL165852C (cs)
SE (1) SE363909B (cs)
ZA (1) ZA716445B (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645127B2 (cs) * 1974-02-25 1981-10-24
GB1588417A (en) * 1977-03-15 1981-04-23 Agfa Gevaert Photoresist materials
DE2826122A1 (de) * 1977-06-14 1978-12-21 Fuji Photo Film Co Ltd Aufzeichnungsmaterial
US4263392A (en) * 1979-06-01 1981-04-21 Richardson Graphics Company Ultra high speed presensitized lithographic plates
US4334003A (en) * 1979-06-01 1982-06-08 Richardson Graphics Company Ultra high speed presensitized lithographic plates
US4423137A (en) * 1980-10-28 1983-12-27 Quixote Corporation Contact printing and etching method of making high density recording medium
US4587198A (en) * 1984-07-16 1986-05-06 Minnesota Mining And Manufacturing Company Dye transfer image process

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3026218A (en) * 1956-12-21 1962-03-20 Eastman Kodak Co Procedure for forming photosensitive lead sulfide layers by vacuum evaporation
US3276869A (en) * 1961-05-09 1966-10-04 Polaroid Corp Capsular product coated with silver halide and containing a color-providing substance
US3219451A (en) * 1962-12-11 1965-11-23 Technical Operations Inc Sensitizing photographic media
DE1202292B (de) * 1963-10-04 1965-10-07 Kalle Ag Aluminiumtraeger fuer Flachdruckformen
US3440959A (en) * 1966-02-18 1969-04-29 Hercules Inc Coated polymer
GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
NL6703090A (cs) * 1966-03-12 1967-09-13
US3551344A (en) * 1967-03-20 1970-12-29 Gen Motors Corp Photochromic plastic and method of making
US3650743A (en) * 1967-10-06 1972-03-21 Teeg Research Inc Methods for making lithographic offset plates by means of electromagnetic radiation sensitive elements
US3639250A (en) * 1968-08-01 1972-02-01 Nasa Phototropic composition of matter
US3627599A (en) * 1969-04-25 1971-12-14 Rca Corp Method of applying an n,n{40 diallylmelamine resist to a surface
US3669658A (en) * 1969-06-11 1972-06-13 Fuji Photo Film Co Ltd Photosensitive printing plate
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof

Also Published As

Publication number Publication date
BE773146A (fr) 1972-03-27
SE363909B (cs) 1974-02-04
GB1361786A (en) 1974-07-30
CH566033A5 (cs) 1975-08-29
JPS5420884B1 (cs) 1979-07-26
DE2047816A1 (de) 1972-03-30
NL165852C (nl) 1981-05-15
DE2047816B2 (de) 1976-07-08
NL7112806A (cs) 1972-04-04
US3751285A (en) 1973-08-07
CA991003A (en) 1976-06-15
FR2108683A5 (cs) 1972-05-19
NL165852B (nl) 1980-12-15
AT321102B (de) 1975-03-10

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