WO2024113397A1 - Detection apparatus, detection method, machining device, and machining method - Google Patents

Detection apparatus, detection method, machining device, and machining method Download PDF

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Publication number
WO2024113397A1
WO2024113397A1 PCT/CN2022/136839 CN2022136839W WO2024113397A1 WO 2024113397 A1 WO2024113397 A1 WO 2024113397A1 CN 2022136839 W CN2022136839 W CN 2022136839W WO 2024113397 A1 WO2024113397 A1 WO 2024113397A1
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WIPO (PCT)
Prior art keywords
processed
data
component
processing
detection
Prior art date
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PCT/CN2022/136839
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French (fr)
Chinese (zh)
Inventor
罗先刚
张逸云
赵承伟
龚天诚
张文豪
王彦钦
王长涛
Original Assignee
中国科学院光电技术研究所
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Publication of WO2024113397A1 publication Critical patent/WO2024113397A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25HWORKSHOP EQUIPMENT, e.g. FOR MARKING-OUT WORK; STORAGE MEANS FOR WORKSHOPS
    • B25H1/00Work benches; Portable stands or supports for positioning portable tools or work to be operated on thereby
    • B25H1/06Work benches; Portable stands or supports for positioning portable tools or work to be operated on thereby of trestle type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25HWORKSHOP EQUIPMENT, e.g. FOR MARKING-OUT WORK; STORAGE MEANS FOR WORKSHOPS
    • B25H1/00Work benches; Portable stands or supports for positioning portable tools or work to be operated on thereby
    • B25H1/10Work benches; Portable stands or supports for positioning portable tools or work to be operated on thereby with provision for adjusting holders for tool or work
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02027Two or more interferometric channels or interferometers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present disclosure relates to the field of detection and processing technology, and in particular to a detection device, a detection method, a processing device and a processing method.
  • the flatness of the substrate is determined by the substrate holder that supports the substrate.
  • the main feature of the holder is the presence of a large number of periodically arranged discrete microstructures on the surface. When in use, the back of the substrate is supported by these raised surface microstructures.
  • the duty cycle of the microstructure pattern on the holder surface is usually very small (less than 5%).
  • the present disclosure provides a detection device, a detection method, a processing equipment and a processing method, which are used to at least partially solve the above technical problems.
  • the first aspect of the present disclosure provides a detection device, including: a laser interferometer, used to emit a laser beam to form interference fringes with the surface of the component to be processed, drive the interference fringes to shift the phase, collect the phase information of the interference fringes, and obtain continuous surface data based on the phase information of the interference fringes; a white light interference detection head, used to vertically scan the surface of the component to be processed to obtain the morphology data of discrete microstructures.
  • a laser interferometer used to emit a laser beam to form interference fringes with the surface of the component to be processed, drive the interference fringes to shift the phase, collect the phase information of the interference fringes, and obtain continuous surface data based on the phase information of the interference fringes
  • a white light interference detection head used to vertically scan the surface of the component to be processed to obtain the morphology data of discrete microstructures.
  • the detection device also includes: a first mounting bracket for mounting a laser interferometer; a second mounting bracket for mounting a white light interference detection head; a workbench mounted on one side of the laser interferometer and the white light interference detection head where light exits; a detection sample table mounted on the workbench for placing the component to be processed, wherein the workbench is used to drive the detection sample table to switch between the measurement position of the laser interferometer and the measurement position of the white light interference detection head, and to move the component to be processed to different positions for measuring continuous surface data or discrete microstructure morphology data; and a detection packaging cover for sealing the laser interferometer, the white light interference detection head, the first mounting bracket, the second mounting bracket, the workbench and the detection sample table.
  • the second aspect of the present disclosure provides a detection method based on the above-mentioned detection device, including: emitting a laser beam through a laser interferometer to form interference fringes with the surface of the component to be processed, driving the interference fringes to shift phase, collecting the phase information of the interference fringes, and obtaining continuous surface data based on the phase information of the interference fringes; vertically scanning the surface of the component to be processed by a white light interference detection head to obtain the morphology data of discrete microstructures; matching the continuous surface data and the morphology data of the discrete microstructures to generate full-view data of the surface of the component to be processed.
  • continuous surface data and topographic data of discrete microstructures are matched to generate full-view data of the surface of the component to be processed, which specifically includes: interpolating the continuous surface data; calculating the height of a single microstructure based on the topographic data of the discrete microstructure using a step height method; and superimposing the interpolated continuous surface data with the height of a single microstructure to obtain full-view data.
  • the third aspect of the present disclosure provides a processing device, including: a detection device as described above, used to measure the continuous surface data of the surface of the component to be processed and the morphology data of the discrete microstructure, and match the continuous surface data and the morphology data of the discrete microstructure to generate the overall data of the surface of the component to be processed; a processing device, used to generate processing parameters according to the overall data, and perform single-point non-coupled processing on the surface of the component to be processed according to the processing parameters.
  • the processing device includes: a vertical polishing machine, which is a single-spindle combined with a three-dimensional translation table structure, and is used to perform single-point non-coupled processing on the surface of the component to be processed; a processing sample table, which is used to carry the component to be processed; and a processing packaging cover, which is used to seal the vertical polishing machine and the processing sample table.
  • a vertical polishing machine which is a single-spindle combined with a three-dimensional translation table structure, and is used to perform single-point non-coupled processing on the surface of the component to be processed
  • a processing sample table which is used to carry the component to be processed
  • a processing packaging cover which is used to seal the vertical polishing machine and the processing sample table.
  • the vertical polishing machine includes a machining spindle, an X-axis translation table, a Y-axis translation table, a Z-axis translation table, a transmission box, and a polishing disc, wherein: the torque output by the machining spindle drives the polishing disc to rotate through the transmission box to grind and polish the component to be processed, and the X-axis translation table, the Y-axis translation table, and the Z-axis translation table work together to drive the polishing disc to move to different positions on the surface of the component to be processed for grinding and polishing.
  • the diameter of the polishing disk is smaller than the arrangement period of the discrete microstructures on the surface of the component to be processed.
  • the fourth aspect of the present disclosure provides a processing method based on the above-mentioned processing equipment, including: emitting a laser beam through a laser interferometer to form interference fringes with the surface of a component to be processed, driving the interference fringes to shift phase, collecting the phase information of the interference fringes, and obtaining continuous surface data based on the phase information of the interference fringes; vertically scanning the surface of the component to be processed through a white light interference detection head to obtain the morphology data of discrete microstructures; matching the continuous surface data with the morphology data of discrete microstructures to generate full-view data of the surface of the component to be processed; generating processing parameters based on the full-view data, and performing single-point non-coupled processing on the surface of the component to be processed based on the processing parameters.
  • processing parameters are generated based on the overall data, specifically including: generating the position and processing removal amount of each microstructure on the surface of the component to be processed based on the overall data; converting the position and processing removal amount into processing parameters, wherein the processing parameters include spindle speed, feed rate and processing time.
  • the processing method also includes: after the processing is completed, determining whether the flatness of the surface of the component to be processed is greater than or equal to a preset accuracy threshold; if the flatness of the surface of the component to be processed is less than the preset accuracy threshold, repeatedly executing the processing method until the flatness of the surface of the component to be processed is greater than or equal to the preset accuracy threshold.
  • the detection device, detection method, processing equipment and processing method provided by the embodiments of the present disclosure have at least the following beneficial effects:
  • the detection device and detection method provided by the present invention are as follows: a laser interferometer measures continuous surface shape data of the surface of the component to be processed based on the principle of laser interference, and a white light interference detection head measures the morphology data of discrete microstructures on the surface of the component to be processed based on the principle of white light interference.
  • the two complement each other and simultaneously realize the measurement of continuous surface shape data and morphology data of discrete microstructures, thereby realizing high-precision detection of the surface flatness of the component to be processed.
  • the processing equipment and processing method provided by the present invention realize high-precision detection of the surface flatness of the component to be processed based on the detection device, and can obtain accurate processing parameters. On this basis, considering the differences in the processing removal amounts of various microstructures, a single spindle combined with a three-dimensional translation stage structure is set, thereby achieving a non-coupled single-point processing effect covering the entire surface of the component to be processed, which solves the technical problem that the existing optical processing methods cannot process non-continuous discrete surfaces or there is a coupling effect during processing.
  • FIG1 schematically shows a structural diagram of a detection device provided in an embodiment of the present disclosure.
  • FIG2 schematically shows a structural diagram of a laser interferometer provided in an embodiment of the present disclosure.
  • FIG3 schematically shows a structural diagram of a white light interferometric detection head provided in an embodiment of the present disclosure.
  • FIG4 schematically shows a cross-sectional view of the structure of a detection device provided in an embodiment of the present disclosure.
  • FIG5 schematically shows a flow chart of a detection method provided by an embodiment of the present disclosure.
  • FIG. 6 schematically shows a surface structure diagram of a retainer provided by an embodiment of the present disclosure.
  • FIG. 7 schematically shows a schematic diagram of the principle of solving the bottom surface shape data of the retainer microstructure position provided by an embodiment of the present disclosure.
  • FIG8 schematically shows a schematic diagram of a solution principle of the holder microstructure height data provided by an embodiment of the present disclosure.
  • FIG9 schematically shows a principle diagram of superposition of surface shape data and three-dimensional shape data provided by an embodiment of the present disclosure.
  • FIG10 schematically shows an overall structural diagram of the processing equipment provided by an embodiment of the present disclosure.
  • FIG. 11 schematically shows a structural diagram of a processing device provided in an embodiment of the present disclosure.
  • FIG. 12 schematically shows a dimensional diagram of a polishing disk provided in an embodiment of the present disclosure.
  • FIG. 13 schematically shows a flow chart of a processing method provided in an embodiment of the present disclosure.
  • FIG. 14 schematically shows a flow chart of a processing method provided by another embodiment of the present disclosure.
  • FIG. 15 schematically shows a structural diagram of a holder to be inspected and processed provided in an embodiment of the present disclosure.
  • FIG. 16 schematically shows an interference fringe pattern obtained by detection provided by an embodiment of the present disclosure.
  • FIG. 17 schematically shows a three-dimensional topography of a single microstructure on the surface of a retainer obtained by detection according to an embodiment of the present disclosure.
  • the terms “installed”, “connected”, “connected”, “fixed” and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or can communicate with each other; it can be a direct connection, or it can be indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements.
  • installed installed
  • connected connected
  • a detachable connection or an integral connection
  • it can be a mechanical connection, an electrical connection, or can communicate with each other
  • it can be a direct connection, or it can be indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements.
  • first and second are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, a feature defined as “first” or “second” may explicitly or implicitly include one or more of the feature. In the description of the present disclosure, the meaning of "plurality” is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.
  • FIG1 schematically shows a structural diagram of a detection device provided in an embodiment of the present disclosure.
  • the detection device may include, for example, a laser interferometer 12 and a white light interference detection head 14 .
  • the laser interferometer 12 is used to emit a laser beam to form interference fringes with the surface of the component to be processed, drive the interference fringes to shift phase, collect phase information of the interference fringes, and obtain continuous surface data based on the phase information of the interference fringes.
  • the white light interference detection head 14 is used to vertically scan the surface of the component to be processed to obtain the morphological data of the discrete microstructure.
  • FIG2 schematically shows a structural diagram of a laser interferometer provided in an embodiment of the present disclosure.
  • the laser interferometer 12 may be, for example, a Fizeau interferometer, including a laser light source, a collimator, a beam splitter, a phase shifter, a standard mirror, and a CCD (Charge Coupled Device) camera.
  • a Fizeau interferometer including a laser light source, a collimator, a beam splitter, a phase shifter, a standard mirror, and a CCD (Charge Coupled Device) camera.
  • the laser beam emitted by the laser light source is collimated by a collimator, and then passes through a beam splitter and a standard mirror in sequence before irradiating the surface of the component to be processed.
  • the laser beam transmitted through the standard mirror forms interference fringes with the surface to be measured, and the phase shifter on the standard mirror is controlled by an actuator to generate a small displacement to drive the interference fringes to shift phase.
  • the interference fringes are photographed by a CCD camera, and the surface shape data of the surface to be measured can be calculated by analyzing the phase information of the interference fringes.
  • the component to be measured can be, for example, a substrate holder, and the specific component type is not limited in this disclosure.
  • the measurement principle of the Fizeau interferometer determines that the laser interferometer 12 is suitable for measuring the surface data of continuous surfaces, but is not suitable for measuring discrete microstructures on the surface of the component to be processed.
  • FIG3 schematically shows a structural diagram of a white light interferometric detection head provided in an embodiment of the present disclosure.
  • the white light interferometric detection head may include, for example, an illumination system, an imaging system, a vertical scanning mechanism, an interferometric objective lens, and a CCD camera.
  • the illumination system emits a light beam
  • the imaging system, the vertical scanning mechanism and the interference objective lens use the light beam to vertically scan and image the surface of the component to be processed, obtain the morphological data of the discrete microstructure on the surface of the component to be processed, and use a CCD camera to record the morphological data of the discrete microstructure.
  • the vertical scanning mechanism usually adopts a high-precision piezoelectric ceramic driver, which can achieve nanometer-level precise measurement of the three-dimensional morphology of the surface of the component to be processed.
  • the white light interference detection head 14 is used in the detection device to detect the discrete microstructure of the surface of the holder, and forms a functional complement with the laser interferometer 12.
  • FIG4 schematically shows a cross-sectional view of the structure of a detection device provided in an embodiment of the present disclosure.
  • the detection device for example, further includes a detection packaging housing 11 (not shown in FIG. 1 and FIG. 4 ), a first mounting bracket 13 , a second mounting bracket 15 , a workbench 16 and a detection sample table 17 .
  • a detection packaging housing 11 not shown in FIG. 1 and FIG. 4
  • a first mounting bracket 13 not shown in FIG. 1 and FIG. 4
  • a second mounting bracket 15 not shown in FIG. 1 and FIG. 4
  • a workbench 16 for example, further includes a detection sample table 17 .
  • the first mounting bracket 13 is used to mount the laser interferometer 12 .
  • the second mounting bracket 15 is used to mount the white light interference detection head 14. Furthermore, the main optical path structure of the white light interference detection head 14 can be encapsulated in the metal cover 141, with only the electric tower 142 exposed outside.
  • the electric tower 142 is equipped with interference objective lenses of different magnifications, and the detection of different sizes of fields of view can be achieved by switching the interference objective lenses.
  • the detection field size of the white light interference detection head 14 is usually 0.1mm ⁇ 0.1mm ⁇ 10mm ⁇ 10mm.
  • the workbench 16 is installed on the side (the lower side as shown in FIG. 1 and FIG. 4 ) where the laser interferometer 12 and the white light interference detection head 14 emit light.
  • the detection sample stage 17 is installed on the workbench 16 and is used to place the component to be processed, wherein the workbench 16 is used to drive the detection sample stage 17 to switch between the measurement position of the laser interferometer 12 and the measurement position of the white light interference detection head 14, and move the component to be processed to different positions to measure continuous surface data or discrete microstructure morphology data.
  • the detection package housing 11 is used to seal the laser interferometer 12, the white light interference detection head 14, the first mounting bracket 13, the second mounting bracket 15, the workbench 16 and the detection sample table 17.
  • the detection package housing 11 mainly serves to isolate external pollution and protect the internal precision optical instruments.
  • the housing is assembled together by riveting, threading, welding, etc., and is made of metal material. It can be a whole plate or a combination of multiple plates. Holes can be punched at required positions to facilitate disassembly and wiring.
  • the embodiment of the present disclosure also provides a detection method.
  • FIG5 schematically shows a flow chart of a detection method provided by an embodiment of the present disclosure.
  • the detection method may include, for example, operations S501 to S503 .
  • a laser interferometer is used to emit a laser beam to form interference fringes with the surface of the component to be processed, so as to shift the phase of the interference fringes, collect the phase information of the interference fringes, and obtain continuous surface data according to the phase information of the interference fringes.
  • a white light interferometric detection head is used to vertically scan the surface of the component to be processed to obtain topographic data of discrete microstructures.
  • the continuous surface shape data and the shape data of the discrete microstructures are matched to generate full shape data of the surface of the component to be processed.
  • the process of generating the full-view data may be: interpolating the continuous surface data, calculating the height of a single microstructure according to the morphological data of the discrete microstructures using the method of calculating the step height, and superimposing the interpolated continuous surface data with the height of the single microstructure to obtain the full-view data.
  • the component to be processed is a retainer.
  • FIG. 6 schematically shows a surface structure diagram of a retainer provided by an embodiment of the present disclosure.
  • the sliding door of the detection package cover 11 is opened, the holder is mounted on the detection sample stage 17 of the detection device, the sliding door is closed, and the detection is started.
  • the workpiece table 16 drives the retainer to move to the bottom of the laser interferometer 12, and performs the bottom surface shape detection of the retainer as shown in Figure 6. Since the area of the microstructure on the surface of the retainer is very small, effective interference fringes cannot be formed. Therefore, the surface shape data at this position (i.e., the microstructure) is missing.
  • FIG. 7 schematically shows a schematic diagram of the principle of solving the bottom surface shape data of the retainer microstructure position provided by an embodiment of the present disclosure.
  • the black circles in the figure represent the pixel point surface data of the retainer surface obtained by measurement
  • the white circles represent the pixel point surface data of the retainer surface obtained by interpolation. Since the surface microstructure has a small occupancy rate, the number of missing data points is usually small. Therefore, the surface data h1 of the bottom surface of the retainer microstructure position obtained by interpolation has higher accuracy.
  • the workpiece table 16 drives the holder to move to the bottom of the white light detection head 14, and the three-dimensional morphology detection of the microstructure on the surface of the holder is performed as shown in Figure 6.
  • the electric turret 142 switches to an interference objective lens with a suitable magnification according to the area size of the microstructure to ensure that the detection field of view is larger than the area size of the microstructure.
  • FIG8 schematically shows a schematic diagram of a solution principle of the holder microstructure height data provided by an embodiment of the present disclosure.
  • the workpiece stage 16 drives the holder to move to different positions for microstructure height detection until the three-dimensional morphology of all microstructures on the holder surface is completely detected.
  • the detected surface data and the three-dimensional shape data are superimposed to obtain the overall shape data of the retainer surface, which includes all shape data information of the entire retainer surface.
  • FIG9 schematically shows a principle diagram of superposition of surface shape data and three-dimensional shape data provided by an embodiment of the present disclosure.
  • the overall data h of the microstructure on the retainer surface is the sum of the surface data h 1 at that position and the height h 2 of a single microstructure.
  • the flatness of the retainer surface can be calculated using the overall data h.
  • the three-dimensional morphological data of the discrete microstructure may be detected first, and then the surface shape data of the retainer may be detected.
  • the specific order may be determined according to actual application requirements, and the present disclosure does not impose any limitation thereto.
  • the laser interferometer measures the continuous surface data of the surface of the component to be processed
  • the white light interferometer detection head measures the morphology data of the discrete microstructures on the surface of the component to be processed.
  • the two complement each other and simultaneously realize the measurement of the continuous surface data and the morphology data of the discrete microstructures, thereby realizing high-precision detection of the surface flatness of the component to be processed.
  • the embodiment of the present disclosure also provides a processing equipment.
  • FIG10 schematically shows an overall structural diagram of the processing equipment provided by an embodiment of the present disclosure.
  • the processing equipment may include:
  • the detection device 1 is used to measure the continuous surface shape data and the morphology data of the discrete microstructure on the surface of the component to be processed, and match the continuous surface shape data and the morphology data of the discrete microstructure to generate the overall shape data of the surface of the component to be processed.
  • the processing device 2 is used to generate processing parameters according to the overall data, and perform single-point non-coupled processing on the surface of the component to be processed according to the processing parameters.
  • the structure of the detection device 1 is the same as that shown in Figures 1 to 4. For details, please refer to the above description of the detection device, which will not be repeated here.
  • the processing device 2 is described in detail below.
  • FIG. 11 schematically shows a structural diagram of a processing device provided in an embodiment of the present disclosure.
  • the processing device 2 may include, for example, a processing packaging housing 21 , a vertical polishing machine 22 and a processing sample stage 23 , wherein:
  • the processing packaging housing 21 is used to seal the vertical polishing machine and the processing sample stage.
  • the purpose of the seal is to prevent the slurry, polishing powder, polishing liquid and other pollutants used in the processing process from leaking out and causing pollution.
  • the vertical polishing machine 22 is a single-spindle combined with a three-dimensional translation stage structure, which is used to use the full-view data transmitted by the detection device 1 as input data, generate processing parameters, and perform single-point non-coupled processing on the surface of the component to be processed to achieve the desired surface accuracy.
  • the processing sample stage 23 is used to carry the component to be processed.
  • Traditional small grinding head polishing equipment often uses a planetary gear train structure of a revolving motor + a self-rotating motor.
  • the processing equipment of the embodiment of the present disclosure processes a continuous structure on the surface of the component, but a series of discrete microstructures, the processing removal amount of each microstructure is different, and the processing removal function is relatively complex, which is not suitable for the traditional planetary gear train structure.
  • the diameter of the polishing disc of the revolving motor + the self-rotating motor is usually large (on the order of tens of millimeters to hundreds of millimeters), and the processing removal amount within the diameter of the polishing disc does not show differences, there is a coupling effect, and the single-point processing effect for the local microstructure on the surface of the retainer cannot be achieved.
  • the vertical polishing machine 22 provided in the embodiment of the present disclosure adopts a single spindle + XYZ translation table structure.
  • the vertical polishing machine 22 may include, for example, a processing spindle 221, an X-axis translation table 222, a Y-axis translation table 223, a Z-axis translation table 224, a transmission box 225, and a polishing disc 226.
  • the torque output by the processing spindle 221 drives the polishing disc 226 to rotate at a high speed through the transmission box 225, so as to grind and polish the surface of the holder to be processed;
  • the X-axis translation table 222, the Y-axis translation table 223, and the Z-axis translation table 224 drive the polishing disc 226 to move to different positions for processing, so that the processing area covers the entire surface of the sample to be processed.
  • the embodiment of the present disclosure also designs the size of the polishing disk 226 .
  • FIG. 12 schematically shows a dimensional diagram of a polishing disk provided in an embodiment of the present disclosure.
  • the diameter of the polishing disk is smaller than the arrangement period of the discrete microstructures on the surface of the component to be processed, so as to achieve a non-coupled single-point processing effect covering the entire retainer surface.
  • processing equipment may also include a platform 3 and a base 4, for example.
  • the platform 3 is used to install the detection device 1 and the processing device 2.
  • the platform 3 can be made of thicker marble granite material to improve the stability of the equipment.
  • the base 4 is used to contact the ground and bear the weight.
  • the base 4 is a hollow frame structure, which is convenient for placing control cabinets, chassis, waste liquid barrels and other components of the detection device 1 and the processing device 2, thereby ensuring the compactness of the structure.
  • the embodiment of the present disclosure also provides a processing method.
  • FIG. 13 schematically shows a flow chart of a processing method provided in an embodiment of the present disclosure.
  • the processing method may include, for example, operations S1301 to S1304 .
  • a laser beam is emitted through a laser interferometer to form interference fringes with the surface of the component to be processed, the interference fringes are driven to shift phase, the phase information of the interference fringes is collected, and continuous surface data is obtained based on the phase information of the interference fringes.
  • a white light interferometric detection head is used to vertically scan the surface of the component to be processed to obtain topographic data of discrete microstructures.
  • processing parameters are generated according to the overall data, and single-point non-coupled processing is performed on the surface of the component to be processed according to the processing parameters.
  • Operations S1301 to S1303 are identical to operations S501 to S503 and are not described in detail here. Operation S1304 is described in detail below.
  • the processing device generates processing parameters according to the overall data, which may include: generating the position and processing removal amount of each microstructure on the surface of the component to be processed according to the overall data.
  • the position and processing removal amount are converted into processing parameters, wherein the processing parameters include spindle speed, feed rate and processing time, etc.
  • the processing is performed according to the processing parameters: during the processing, the X-axis displacement stage 222 and the Y-axis displacement stage 223 drive the polishing disc 226 to move to different positions according to the position information, the Z-axis displacement stage 224 performs the corresponding feed amount according to the processing removal amount, and the processing spindle 221 drives the polishing disc 226 to polish the microstructure on the surface of the component to be processed. Since the diameter of the polishing disc 226 is smaller than the microstructure arrangement period, the processing process can realize non-coupled single-point processing. The above processing process continues until all the microstructures on the surface of the component to be processed are processed.
  • FIG. 14 schematically shows a flow chart of a processing method provided by another embodiment of the present disclosure.
  • the processing method may further include, for example, operation S1305 based on operations S1301 to S1304 .
  • the processing of the component to be processed is completed. If the flatness of the surface of the component to be processed is less than the preset accuracy threshold, operations S1301 to S1304 are repeatedly performed until the flatness of the surface of the component to be processed is greater than or equal to the preset accuracy threshold.
  • the criterion for whether the accuracy meets the requirements can be the actual use effect of the retainer, or the overall data of the retainer measured by the detection device 1.
  • the processing equipment and processing method provided by the present invention high-precision detection of the surface flatness of the component to be processed is achieved based on the detection device, and accurate processing parameters can be obtained.
  • a single spindle combined with a three-dimensional translation stage structure is set, thereby achieving a non-coupled single-point processing effect covering the entire surface of the component to be processed, which solves the problem that existing optical processing methods cannot process non-continuous discrete surfaces or there is a coupling effect during processing.
  • FIG. 15 schematically shows a structural diagram of a holder to be inspected and processed provided in an embodiment of the present disclosure.
  • the holder is a typical substrate holder structure, made of silicon carbide, with a large number of regularly arranged cylindrical lattice structures on the surface, with a cylindrical diameter of 0.5 mm, a cylindrical height of 0.1 mm, a period of 5 mm, and an arrangement area within the range of ⁇ 298 mm, for adsorbing 12-inch substrates;
  • the characteristic of the holder is that it needs to ensure a very high surface flatness, and is very suitable for detection and processing using the detection device, detection method, processing equipment and processing method provided by the present disclosure.
  • the specific detection and processing process can be as follows:
  • the workpiece stage 16 drives the holder to move to the position directly below the laser interferometer 12 , and the laser interferometer 12 is used to measure an aperture of ⁇ 300 mm and a standard mirror shape accuracy of 1/20 ⁇ .
  • FIG. 16 schematically shows an interference fringe pattern obtained by detection provided by an embodiment of the present disclosure.
  • the workpiece stage 16 drives the holder to move to the bottom of the white light detection head 14 to detect the three-dimensional shape of the cylindrical dot matrix.
  • the electric tower 142 switches to the 10x interference objective lens, and the detection field size is 1mm ⁇ 1mm, which can cover a cylinder with a diameter of 0.5mm.
  • the workpiece stage 16 drives the holder to move to different positions for detection until all the three-dimensional shapes of the cylindrical structures on the surface of the holder are fully detected.
  • FIG. 17 schematically shows a three-dimensional topography of a single microstructure on the surface of a retainer obtained by detection according to an embodiment of the present disclosure.
  • the three-dimensional morphology of a single microstructure on the surface of the retainer detected is a cylinder.
  • the bottom surface data obtained is superimposed with the cylindrical lattice three-dimensional morphology data obtained to obtain the overall data of the retainer surface.
  • the superposition uses the least squares method to match the data of the edge of the cylindrical bottom surface with the surface data of the corresponding position to generate the overall data of the retainer, which contains the XYZ point cloud data information of all structures on the retainer surface.
  • processing preparation the inspected holder is taken out and mounted on the processing sample stage 23 of the processing device 2 to prepare for processing.
  • data is transferred: the generated overall data of the retainer is transferred to the processing device 2, and the processing device 2 generates processing data such as the position of each cylinder on the retainer surface and the processing removal amount based on the data, wherein the calculation of the processing removal amount is based on the minimum value of all cylinder heights.
  • the vertical polishing machine 22 receives the generated processing data and converts the processing removal amount into specific processing parameters such as spindle speed, feed rate, and processing time.
  • the spindle speed is 200r/min
  • the feed rate is 0.01um
  • the processing time is linearly related to the specific material removal amount, ranging from 60s to 280s
  • the polishing disc 26 has a diameter of 4mm, which is slightly smaller than the period of the cylindrical arrangement, and the abrasive is W20 corundum micro powder. Processing is performed according to the above processing parameters until all the cylinders on the surface are processed.
  • accuracy judgment judge whether the surface accuracy of the processed retainer meets the requirements. If it does, the sample is processed. If it does not, repeat the above process to re-test and iterate the processing until the accuracy meets the requirements.

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Abstract

A detection apparatus, a detection method, a machining device, and a machining method. The detection apparatus comprises: a laser interferometer, configured to emit a laser beam to form an interference fringe with the surface of an element to be processed, drive phase shift of the interference fringe, collect phase information of the interference fringe, and obtain continuous profile data according to the phase information of the interference fringe; and a white light interference measurement head, configured to perform vertical scanning on the surface of said element to obtain morphology data of a discrete microstructure. The machining device comprises: the detection apparatus, configured to measure the continuous profile data of the surface of said element and the morphology data of the discrete microstructure, and match the continuous profile data with the morphology data of the discrete microstructure to generate full-view data of the surface of said element; and a machining apparatus, configured to generate machining parameters according to the full-view data, and perform single-point non-coupling machining on the surface of said element according to the machining parameters. The apparatus, device and methods can realize high-precision detection and machining of the surface of a discrete microstructure.

Description

检测装置、检测方法、加工设备及加工方法Detection device, detection method, processing equipment and processing method
本公开要求于2022年12月01日提交的申请号为202211533112.4的中国专利申请的优先权,其全部内容通过引用结合在本公开中。This disclosure claims priority to Chinese patent application No. 202211533112.4 filed on December 1, 2022, the entire contents of which are incorporated by reference into this disclosure.
技术领域Technical Field
本公开涉及检测及加工技术领域,尤其涉及一种检测装置、检测方法、加工设备及加工方法。The present disclosure relates to the field of detection and processing technology, and in particular to a detection device, a detection method, a processing device and a processing method.
背景技术Background technique
基板平整度由承载基板的基板保持器决定,该保持器的主要特点是表面存在大量周期性排列的离散微结构,使用时依靠这些凸起的表面微结构支撑基板背部,为了降低颗粒等污染物对基板平整度的影响,保持器表面微结构图形的占空比通常很小(小于5%)。The flatness of the substrate is determined by the substrate holder that supports the substrate. The main feature of the holder is the presence of a large number of periodically arranged discrete microstructures on the surface. When in use, the back of the substrate is supported by these raised surface microstructures. In order to reduce the impact of contaminants such as particles on the flatness of the substrate, the duty cycle of the microstructure pattern on the holder surface is usually very small (less than 5%).
传统光学检测、加工方法主要针对连续表面开展。由于保持器表面存在大量离散的微结构,传统光学检测手段无法对这类保持器进行高精度的表面平整度检测,限制了该保持器精度的进一步提高,并且,现有的光学加工方法无法加工非连续的离散表面或加工时存在耦合效应,无法实现高精度的单点非耦合加工,从而无法满足先进制程的基板平整度要求。Traditional optical inspection and processing methods are mainly carried out for continuous surfaces. Due to the presence of a large number of discrete microstructures on the surface of the retainer, traditional optical inspection methods cannot perform high-precision surface flatness inspection on such retainers, which limits the further improvement of the retainer's accuracy. In addition, existing optical processing methods cannot process non-continuous discrete surfaces or there is a coupling effect during processing, and cannot achieve high-precision single-point non-coupled processing, thus failing to meet the substrate flatness requirements of advanced processes.
发明内容Summary of the invention
针对上述技术问题,本公开提供一种检测装置、检测方法、加工设备及加工方法,用于至少部分解决上述技术问题。In view of the above technical problems, the present disclosure provides a detection device, a detection method, a processing equipment and a processing method, which are used to at least partially solve the above technical problems.
基于此,本公开第一方面提供一种检测装置,包括:激光干涉仪,用于发射激光光束与待处理元件表面形成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,以及根据干涉条纹的相位信息获得连续面形数据;白光干涉检测头,用于对待处理元件表面进行垂直扫描, 获取离散微结构的形貌数据。Based on this, the first aspect of the present disclosure provides a detection device, including: a laser interferometer, used to emit a laser beam to form interference fringes with the surface of the component to be processed, drive the interference fringes to shift the phase, collect the phase information of the interference fringes, and obtain continuous surface data based on the phase information of the interference fringes; a white light interference detection head, used to vertically scan the surface of the component to be processed to obtain the morphology data of discrete microstructures.
根据本公开的实施例,检测装置还包括:第一安装支架,用于安装激光干涉仪;第二安装支架,用于安装白光干涉检测头;工作台,安装在激光干涉仪和白光干涉检测头出射光线的一侧;检测样品台,安装在工作台上,用于放置待处理元件,其中,工作台用于带动检测样品台在激光干涉仪的测量位置与白光干涉检测头的测量位置之间切换,以及将待处理元件移动到不同位置进行连续面形数据或离散微结构的形貌数据的测量;检测封装罩壳,用于对激光干涉仪、白光干涉检测头、第一安装支架、第二安装支架、工作台及检测样品台进行密封。According to an embodiment of the present disclosure, the detection device also includes: a first mounting bracket for mounting a laser interferometer; a second mounting bracket for mounting a white light interference detection head; a workbench mounted on one side of the laser interferometer and the white light interference detection head where light exits; a detection sample table mounted on the workbench for placing the component to be processed, wherein the workbench is used to drive the detection sample table to switch between the measurement position of the laser interferometer and the measurement position of the white light interference detection head, and to move the component to be processed to different positions for measuring continuous surface data or discrete microstructure morphology data; and a detection packaging cover for sealing the laser interferometer, the white light interference detection head, the first mounting bracket, the second mounting bracket, the workbench and the detection sample table.
本公开第二方面提供一种基于上述检测装置的检测方法,包括:通过激光干涉仪发射激光光束与待处理元件表面形成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,根据干涉条纹的相位信息获得连续面形数据;通过白光干涉检测头对待处理元件表面进行垂直扫描,获取离散微结构的形貌数据;将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据。The second aspect of the present disclosure provides a detection method based on the above-mentioned detection device, including: emitting a laser beam through a laser interferometer to form interference fringes with the surface of the component to be processed, driving the interference fringes to shift phase, collecting the phase information of the interference fringes, and obtaining continuous surface data based on the phase information of the interference fringes; vertically scanning the surface of the component to be processed by a white light interference detection head to obtain the morphology data of discrete microstructures; matching the continuous surface data and the morphology data of the discrete microstructures to generate full-view data of the surface of the component to be processed.
根据本公开的实施例,将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据,具体包括:对连续面形数据进行插值;利用求台阶高度的方法根据离散微结构的形貌数据计算单个微结构的高度;将插值后的连续面形数据与单个微结构的高度叠加,得到全貌数据。According to an embodiment of the present disclosure, continuous surface data and topographic data of discrete microstructures are matched to generate full-view data of the surface of the component to be processed, which specifically includes: interpolating the continuous surface data; calculating the height of a single microstructure based on the topographic data of the discrete microstructure using a step height method; and superimposing the interpolated continuous surface data with the height of a single microstructure to obtain full-view data.
本公开第三方面提供一种加工设备,包括:如上述的检测装置,用于测量待处理元件表面的连续面形数据和离散微结构的形貌数据,并将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据;加工装置,用于根据全貌数据生成加工参数,根据加工参数对待处理元件表面进行单点非耦合加工。The third aspect of the present disclosure provides a processing device, including: a detection device as described above, used to measure the continuous surface data of the surface of the component to be processed and the morphology data of the discrete microstructure, and match the continuous surface data and the morphology data of the discrete microstructure to generate the overall data of the surface of the component to be processed; a processing device, used to generate processing parameters according to the overall data, and perform single-point non-coupled processing on the surface of the component to be processed according to the processing parameters.
根据本公开的实施例,加工装置包括:立式抛光机,立式抛光机为单主轴结合三维位移台结构,用于对待处理元件表面进行单点非耦合加工;加工样品台,用于承载待处理元件;加工封装罩壳,用于对 立式抛光机和加工样品台进行密封。According to an embodiment of the present disclosure, the processing device includes: a vertical polishing machine, which is a single-spindle combined with a three-dimensional translation table structure, and is used to perform single-point non-coupled processing on the surface of the component to be processed; a processing sample table, which is used to carry the component to be processed; and a processing packaging cover, which is used to seal the vertical polishing machine and the processing sample table.
根据本公开的实施例,立式抛光机包括加工主轴、X轴位移台、Y轴位移台、Z轴位移台、传动箱、抛光盘,其中:加工主轴输出的扭矩经过传动箱带动抛光盘旋转,对待处理元件进行研磨抛光,X轴位移台、Y轴位移台和Z轴位移台共同作用带动抛光盘移动至待处理元件表面的不同位置进行研磨抛光。According to an embodiment of the present disclosure, the vertical polishing machine includes a machining spindle, an X-axis translation table, a Y-axis translation table, a Z-axis translation table, a transmission box, and a polishing disc, wherein: the torque output by the machining spindle drives the polishing disc to rotate through the transmission box to grind and polish the component to be processed, and the X-axis translation table, the Y-axis translation table, and the Z-axis translation table work together to drive the polishing disc to move to different positions on the surface of the component to be processed for grinding and polishing.
根据本公开的实施例,抛光盘的直径小于待处理元件表面的离散微结构的排布周期。According to an embodiment of the present disclosure, the diameter of the polishing disk is smaller than the arrangement period of the discrete microstructures on the surface of the component to be processed.
本公开第四方面提供一种基于上述加工设备的加工方法,包括:通过激光干涉仪发射激光光束与待处理元件表面形成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,根据干涉条纹的相位信息获得连续面形数据;通过白光干涉检测头对待处理元件表面进行垂直扫描,获取离散微结构的形貌数据;将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据;根据全貌数据生成加工参数,根据加工参数对待处理元件表面进行单点非耦合加工。The fourth aspect of the present disclosure provides a processing method based on the above-mentioned processing equipment, including: emitting a laser beam through a laser interferometer to form interference fringes with the surface of a component to be processed, driving the interference fringes to shift phase, collecting the phase information of the interference fringes, and obtaining continuous surface data based on the phase information of the interference fringes; vertically scanning the surface of the component to be processed through a white light interference detection head to obtain the morphology data of discrete microstructures; matching the continuous surface data with the morphology data of discrete microstructures to generate full-view data of the surface of the component to be processed; generating processing parameters based on the full-view data, and performing single-point non-coupled processing on the surface of the component to be processed based on the processing parameters.
根据本公开的实施例,根据全貌数据生成加工参数,具体包括:根据全貌数据生成待处理元件表面每个微结构的位置、加工去除量;将位置和加工去除量转化为加工参数,其中,加工参数包括主轴转速、进给量和加工时间。According to an embodiment of the present disclosure, processing parameters are generated based on the overall data, specifically including: generating the position and processing removal amount of each microstructure on the surface of the component to be processed based on the overall data; converting the position and processing removal amount into processing parameters, wherein the processing parameters include spindle speed, feed rate and processing time.
根据本公开的实施例,加工方法还包括:在加工完成后,判断待处理元件表面的平整度是否大于等于预设精度阈值;在待处理元件表面的平整度是小于预设精度阈值的情况下,重复执行加工方法,直至待处理元件表面的平整度大于等于预设精度阈值。According to an embodiment of the present disclosure, the processing method also includes: after the processing is completed, determining whether the flatness of the surface of the component to be processed is greater than or equal to a preset accuracy threshold; if the flatness of the surface of the component to be processed is less than the preset accuracy threshold, repeatedly executing the processing method until the flatness of the surface of the component to be processed is greater than or equal to the preset accuracy threshold.
根据本公开实施例提供的检测装置、检测方法、加工设备及加工方法,至少包括以下有益效果:The detection device, detection method, processing equipment and processing method provided by the embodiments of the present disclosure have at least the following beneficial effects:
本公开提供的检测装置和检测方法,激光干涉仪基于激光干涉原理测量待处理元件表面的连续面形数据,白光干涉检测头基于白光干涉原理测量待处理元件表面离散微结构的形貌数据,两者形成互补,同时实现连续面形数据和离散微结构的形貌数据的测量,进而实现待 处理元件表面平整度的高精度检测。The detection device and detection method provided by the present invention are as follows: a laser interferometer measures continuous surface shape data of the surface of the component to be processed based on the principle of laser interference, and a white light interference detection head measures the morphology data of discrete microstructures on the surface of the component to be processed based on the principle of white light interference. The two complement each other and simultaneously realize the measurement of continuous surface shape data and morphology data of discrete microstructures, thereby realizing high-precision detection of the surface flatness of the component to be processed.
本公开提供的加工设备和加工方法,基于检测装置实现待处理元件表面平整度的高精度检测,能够获取精准的加工参数,在此基础上,考虑各个微结构的加工去除量存在差异,设置单主轴结合三维位移台结构,进而可以实现覆盖整个待处理元件表面的非耦合单点加工效果,解决了现有光学加工方法无法加工非连续的离散表面或加工时存在耦合效应的技术问题。The processing equipment and processing method provided by the present invention realize high-precision detection of the surface flatness of the component to be processed based on the detection device, and can obtain accurate processing parameters. On this basis, considering the differences in the processing removal amounts of various microstructures, a single spindle combined with a three-dimensional translation stage structure is set, thereby achieving a non-coupled single-point processing effect covering the entire surface of the component to be processed, which solves the technical problem that the existing optical processing methods cannot process non-continuous discrete surfaces or there is a coupling effect during processing.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
为了更清楚地说明本公开实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简要介绍,显而易见地,下面描述中的附图仅仅是本公开的一些实施例,对于本领域的普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.
图1示意性示出了本公开实施例提供的检测装置的结构图。FIG1 schematically shows a structural diagram of a detection device provided in an embodiment of the present disclosure.
图2示意性示出了本公开实施例提供的激光干涉仪的结构图。FIG2 schematically shows a structural diagram of a laser interferometer provided in an embodiment of the present disclosure.
图3示意性示出了本公开实施例提供的白光干涉检测头的结构图。FIG3 schematically shows a structural diagram of a white light interferometric detection head provided in an embodiment of the present disclosure.
图4示意性示出了本公开实施例提供的检测装置的结构剖面图。FIG4 schematically shows a cross-sectional view of the structure of a detection device provided in an embodiment of the present disclosure.
图5示意性示出了本公开实施例提供的检测方法的流程图。FIG5 schematically shows a flow chart of a detection method provided by an embodiment of the present disclosure.
图6示意性示出了本公开实施例提供的保持器表面结构图。FIG. 6 schematically shows a surface structure diagram of a retainer provided by an embodiment of the present disclosure.
图7示意性示出了本公开实施例提供的保持器微结构位置底面面形数据的求解原理图。FIG. 7 schematically shows a schematic diagram of the principle of solving the bottom surface shape data of the retainer microstructure position provided by an embodiment of the present disclosure.
图8示意性示出了本公开实施例提供的保持器微结构高度数据的求解原理图。FIG8 schematically shows a schematic diagram of a solution principle of the holder microstructure height data provided by an embodiment of the present disclosure.
图9示意性示出了本公开实施例提供的面形数据和三维形貌数据叠加的原理图。FIG9 schematically shows a principle diagram of superposition of surface shape data and three-dimensional shape data provided by an embodiment of the present disclosure.
图10示意性示出了本公开实施例提供的加工设备的整体结构图。FIG10 schematically shows an overall structural diagram of the processing equipment provided by an embodiment of the present disclosure.
图11示意性示出了本公开实施例提供的加工装置的结构图。FIG. 11 schematically shows a structural diagram of a processing device provided in an embodiment of the present disclosure.
图12示意性示出了本公开实施例提供的抛光盘的尺寸图。FIG. 12 schematically shows a dimensional diagram of a polishing disk provided in an embodiment of the present disclosure.
图13示意性示出了本公开一实施例提供的加工方法的流程图。FIG. 13 schematically shows a flow chart of a processing method provided in an embodiment of the present disclosure.
图14示意性示出了本公开另一实施例提供的加工方法的流程图。FIG. 14 schematically shows a flow chart of a processing method provided by another embodiment of the present disclosure.
图15示意性示出了本公开实施例提供的待检测及加工保持器的结构图。FIG. 15 schematically shows a structural diagram of a holder to be inspected and processed provided in an embodiment of the present disclosure.
图16示意性示出了本公开实施例提供的检测得到的干涉条纹图。FIG. 16 schematically shows an interference fringe pattern obtained by detection provided by an embodiment of the present disclosure.
图17示意性示出了本公开实施例提供的检测得到的保持器表面单个微结构三维形貌图。FIG. 17 schematically shows a three-dimensional topography of a single microstructure on the surface of a retainer obtained by detection according to an embodiment of the present disclosure.
具体实施方式Detailed ways
为使本公开的目的、技术方案和优点更加清楚明白,以下结合具体实施例,并参照附图,对本公开进一步详细说明。显然,所描述的实施例是本公开一部分实施例,而不是全部的实施例。基于本公开中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本公开保护的范围。In order to make the purpose, technical solutions and advantages of the present disclosure more clearly understood, the present disclosure is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present disclosure.
在此使用的术语仅仅是为了描述具体实施例,而并非意在限制本公开。在此使用的术语“包括”、“包含”等表明了所述特征、步骤、操作和/或部件的存在,但是并不排除存在或添加一个或多个其他特征、步骤、操作或部件。The terms used herein are only for describing specific embodiments and are not intended to limit the present disclosure. The terms "include", "comprising", etc. used herein indicate the existence of the features, steps, operations and/or components, but do not exclude the existence or addition of one or more other features, steps, operations or components.
在本公开中,除非另有明确的规定和限定,术语“安装”、“相连”“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接或可以互相通讯;可以是直接连接,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本公开中的具体含义。In the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or can communicate with each other; it can be a direct connection, or it can be indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances.
在本公开的描述中,需要理解的是,术语“纵向”、“长度”、“周向”、“前”、“后”、“左”、“右”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本公开 和简化描述,而不是指示或暗示所指的子系统或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本公开的限制。In the description of the present disclosure, it is necessary to understand that the terms "longitudinal", "length", "circumferential", "front", "rear", "left", "right", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the subsystem or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure.
贯穿附图,相同的元素由相同或相近的附图标记来表示。可能导致本公开的理解造成混淆时,将省略常规结构或构造。并且图中各部件的形状、尺寸、位置关系不反映真实大小、比例和实际位置关系。另外,在权利要求中,不应将位于括号之间的任何参考符号构造成对权利要求的限制。Throughout the drawings, the same elements are represented by the same or similar reference numerals. Conventional structures or configurations will be omitted when they may cause confusion in the understanding of the present disclosure. The shapes, sizes, and positional relationships of the components in the drawings do not reflect the actual size, proportion, and actual positional relationship. In addition, in the claims, any reference symbol between brackets shall not be constructed as a limitation to the claims.
类似地,为了精简本公开并帮助理解各个公开方面中的一个或多个,在上面对本公开示例性实施例的描述中,本公开的各个特征有时被一起分到单个实施例、图或者对其描述中。参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本公开的至少一个实施例或示例中。本说明书中,对上述术语的示意性表述不一定指的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或者多个实施例或示例中以合适的方式结合。Similarly, in order to simplify the present disclosure and help understand one or more of the various disclosed aspects, in the above description of the exemplary embodiments of the present disclosure, the various features of the present disclosure are sometimes grouped together into a single embodiment, figure, or description thereof. The description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" and the like means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。因此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本公开的描述中,“多个”的含义是至少两个,例如两个、三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the feature. In the description of the present disclosure, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.
图1示意性示出了本公开实施例提供的检测装置的结构图。FIG1 schematically shows a structural diagram of a detection device provided in an embodiment of the present disclosure.
如图1所示,该检测装置例如可以包括激光干涉仪12和白光干涉检测头14。As shown in FIG. 1 , the detection device may include, for example, a laser interferometer 12 and a white light interference detection head 14 .
激光干涉仪12,用于发射激光光束与待处理元件表面形成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,以及根据干涉条纹的相位信息获得连续面形数据。The laser interferometer 12 is used to emit a laser beam to form interference fringes with the surface of the component to be processed, drive the interference fringes to shift phase, collect phase information of the interference fringes, and obtain continuous surface data based on the phase information of the interference fringes.
白光干涉检测头14,用于对待处理元件表面进行垂直扫描,获取离散微结构的形貌数据。The white light interference detection head 14 is used to vertically scan the surface of the component to be processed to obtain the morphological data of the discrete microstructure.
图2示意性示出了本公开实施例提供的激光干涉仪的结构图。FIG2 schematically shows a structural diagram of a laser interferometer provided in an embodiment of the present disclosure.
如图2所示,激光干涉仪12例如可以采用菲索型干涉仪,包括激光光源、准直镜、分光镜、移相器、标准镜和CCD(Charge Coupled Device)相机。As shown in FIG2 , the laser interferometer 12 may be, for example, a Fizeau interferometer, including a laser light source, a collimator, a beam splitter, a phase shifter, a standard mirror, and a CCD (Charge Coupled Device) camera.
激光光源发射的激光光束经过准直镜准直,依次经过分光镜和标准镜后照射到待处理元件表面,透射出标准镜的激光光束与待测表面形成干涉条纹,并通过促动器控制标准镜上的移相器产生微小位移带动干涉条纹进行移相,利用CCD相机拍摄干涉条纹,对干涉条纹相位信息进行解析即可计算出待测表面的面形数据。待测元件例如可以是基板保持器,具体元件类型本公开不做限制。The laser beam emitted by the laser light source is collimated by a collimator, and then passes through a beam splitter and a standard mirror in sequence before irradiating the surface of the component to be processed. The laser beam transmitted through the standard mirror forms interference fringes with the surface to be measured, and the phase shifter on the standard mirror is controlled by an actuator to generate a small displacement to drive the interference fringes to shift phase. The interference fringes are photographed by a CCD camera, and the surface shape data of the surface to be measured can be calculated by analyzing the phase information of the interference fringes. The component to be measured can be, for example, a substrate holder, and the specific component type is not limited in this disclosure.
菲索型干涉仪的测量原理决定激光干涉仪12适合测量连续表面的面形数据,不适合对待处理元件表面的离散微结构进行测量。The measurement principle of the Fizeau interferometer determines that the laser interferometer 12 is suitable for measuring the surface data of continuous surfaces, but is not suitable for measuring discrete microstructures on the surface of the component to be processed.
图3示意性示出了本公开实施例提供的白光干涉检测头的结构图。FIG3 schematically shows a structural diagram of a white light interferometric detection head provided in an embodiment of the present disclosure.
如图3所示,白光干涉检测头例如可以包括照明系统、成像系统、垂直扫描机构、干涉物镜和CCD相机。As shown in FIG. 3 , the white light interferometric detection head may include, for example, an illumination system, an imaging system, a vertical scanning mechanism, an interferometric objective lens, and a CCD camera.
照明系统发射光束,成像系统、垂直扫描机构和干涉物镜利用光束对待处理元件表面进行垂直扫描并成像,获取待处理元件表面的离散微结构的形貌数据,并利用CCD相机记录离散微结构的形貌数据。The illumination system emits a light beam, and the imaging system, the vertical scanning mechanism and the interference objective lens use the light beam to vertically scan and image the surface of the component to be processed, obtain the morphological data of the discrete microstructure on the surface of the component to be processed, and use a CCD camera to record the morphological data of the discrete microstructure.
垂直扫描机构通常采用高精度压电陶瓷驱动器,可实现待处理元件表面三维形貌的纳米级精确测量。白光干涉检测头14在检测装置中用于保持器表面离散微结构的检测,与激光干涉仪12形成功能互补。The vertical scanning mechanism usually adopts a high-precision piezoelectric ceramic driver, which can achieve nanometer-level precise measurement of the three-dimensional morphology of the surface of the component to be processed. The white light interference detection head 14 is used in the detection device to detect the discrete microstructure of the surface of the holder, and forms a functional complement with the laser interferometer 12.
图4示意性示出了本公开实施例提供的检测装置的结构剖面图。FIG4 schematically shows a cross-sectional view of the structure of a detection device provided in an embodiment of the present disclosure.
参阅图1及图4,检测装置例如还包括检测封装罩壳11(图1及图4中未示出)、第一安装支架13、第二安装支架15、工作台16和检测样品台17。其中:1 and 4 , the detection device, for example, further includes a detection packaging housing 11 (not shown in FIG. 1 and FIG. 4 ), a first mounting bracket 13 , a second mounting bracket 15 , a workbench 16 and a detection sample table 17 . Among them:
第一安装支架13,用于安装激光干涉仪12。The first mounting bracket 13 is used to mount the laser interferometer 12 .
第二安装支架15,用于安装白光干涉检测头14。进一步地,白光干涉检测头14的主体光路结构可以封装在金属罩壳141内,只露出电动塔台142在外部,该电动塔台142搭载不同倍率的干涉物镜,可以通过切换干涉物镜实现不同大小视场的检测,白光干涉检测头14的检测 视场大小通常在0.1mm×0.1mm~10mm×10mm。The second mounting bracket 15 is used to mount the white light interference detection head 14. Furthermore, the main optical path structure of the white light interference detection head 14 can be encapsulated in the metal cover 141, with only the electric tower 142 exposed outside. The electric tower 142 is equipped with interference objective lenses of different magnifications, and the detection of different sizes of fields of view can be achieved by switching the interference objective lenses. The detection field size of the white light interference detection head 14 is usually 0.1mm×0.1mm~10mm×10mm.
工作台16,安装在激光干涉仪12和白光干涉检测头14出射光线的一侧(图1和图4中所示的下方)。The workbench 16 is installed on the side (the lower side as shown in FIG. 1 and FIG. 4 ) where the laser interferometer 12 and the white light interference detection head 14 emit light.
检测样品台17,安装在工作台16上,用于放置待处理元件,其中,工作台16用于带动检测样品台17在激光干涉仪12的测量位置与白光干涉检测头14的测量位置之间切换,并将待处理元件移动到不同位置进行连续面形数据或离散微结构的形貌数据的测量。The detection sample stage 17 is installed on the workbench 16 and is used to place the component to be processed, wherein the workbench 16 is used to drive the detection sample stage 17 to switch between the measurement position of the laser interferometer 12 and the measurement position of the white light interference detection head 14, and move the component to be processed to different positions to measure continuous surface data or discrete microstructure morphology data.
检测封装罩壳11,用于对激光干涉仪12、白光干涉检测头14、第一安装支架13、第二安装支架15、工作台16及检测样品台17进行密封。检测封装罩壳11主要起隔绝外界污染、保护内部精密光学仪器的作用,该罩壳通过铆接、螺纹连接、焊接等方式组装在一起,采用金属材料,可以是一块整板或由多块板拼接组合而成,可以在需要位置打孔以方便拆装、走线。The detection package housing 11 is used to seal the laser interferometer 12, the white light interference detection head 14, the first mounting bracket 13, the second mounting bracket 15, the workbench 16 and the detection sample table 17. The detection package housing 11 mainly serves to isolate external pollution and protect the internal precision optical instruments. The housing is assembled together by riveting, threading, welding, etc., and is made of metal material. It can be a whole plate or a combination of multiple plates. Holes can be punched at required positions to facilitate disassembly and wiring.
基于上述检测装置,本公开实施例还提供一种检测方法。Based on the above detection device, the embodiment of the present disclosure also provides a detection method.
图5示意性示出了本公开实施例提供的检测方法的流程图。FIG5 schematically shows a flow chart of a detection method provided by an embodiment of the present disclosure.
如图5所示,该检测方法例如可以包括操作S501~操作S503。As shown in FIG. 5 , the detection method may include, for example, operations S501 to S503 .
在操作S501,通过激光干涉仪发射激光光束与待处理元件表面形成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,根据干涉条纹的相位信息获得连续面形数据。In operation S501, a laser interferometer is used to emit a laser beam to form interference fringes with the surface of the component to be processed, so as to shift the phase of the interference fringes, collect the phase information of the interference fringes, and obtain continuous surface data according to the phase information of the interference fringes.
在操作S502,通过白光干涉检测头对待处理元件表面进行垂直扫描,获取离散微结构的形貌数据。In operation S502, a white light interferometric detection head is used to vertically scan the surface of the component to be processed to obtain topographic data of discrete microstructures.
在操作S503,将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据。In operation S503, the continuous surface shape data and the shape data of the discrete microstructures are matched to generate full shape data of the surface of the component to be processed.
在本公开实施例中,生成全貌数据的过程可以为:对连续面形数据进行插值。利用求台阶高度的方法根据离散微结构的形貌数据计算单个微结构的高度。将插值后的连续面形数据与单个微结构的高度叠加,得到全貌数据。In the disclosed embodiment, the process of generating the full-view data may be: interpolating the continuous surface data, calculating the height of a single microstructure according to the morphological data of the discrete microstructures using the method of calculating the step height, and superimposing the interpolated continuous surface data with the height of the single microstructure to obtain the full-view data.
下面以待处理元件是保持器为例进行详细说明。The following detailed description is given by taking the example that the component to be processed is a retainer.
图6示意性示出了本公开实施例提供的保持器表面结构图。FIG. 6 schematically shows a surface structure diagram of a retainer provided by an embodiment of the present disclosure.
示例性地,首先,打开检测封装罩壳11的推拉门,将保持器安装在检测装置的检测样品台17上,关闭推拉门,开始进行检测。Exemplarily, first, the sliding door of the detection package cover 11 is opened, the holder is mounted on the detection sample stage 17 of the detection device, the sliding door is closed, and the detection is started.
其次,检测保持器表面面形数据:工件台16带动保持器移动至激光干涉仪12正下方,进行如图6所示的保持器底面面形检测,由于保持器表面微结构的面积占比很小,无法形成有效的干涉条纹,因此,在该位置(即微结构处)的面形数据缺失。Secondly, detect the surface shape data of the retainer: the workpiece table 16 drives the retainer to move to the bottom of the laser interferometer 12, and performs the bottom surface shape detection of the retainer as shown in Figure 6. Since the area of the microstructure on the surface of the retainer is very small, effective interference fringes cannot be formed. Therefore, the surface shape data at this position (i.e., the microstructure) is missing.
图7示意性示出了本公开实施例提供的保持器微结构位置底面面形数据的求解原理图。FIG. 7 schematically shows a schematic diagram of the principle of solving the bottom surface shape data of the retainer microstructure position provided by an embodiment of the present disclosure.
如图7所示,图中黑色圆圈代表测量得到的保持器表面的像素点面形数据,白色圆圈代表插值得到的保持器表面的像素点面形数据,由于表面微结构的占空比较小,缺失的数据点个数通常很少,因此,利用插值的方法求出的保持器微结构位置底面的面形数据h 1具备较高的精度。 As shown in Figure 7, the black circles in the figure represent the pixel point surface data of the retainer surface obtained by measurement, and the white circles represent the pixel point surface data of the retainer surface obtained by interpolation. Since the surface microstructure has a small occupancy rate, the number of missing data points is usually small. Therefore, the surface data h1 of the bottom surface of the retainer microstructure position obtained by interpolation has higher accuracy.
接下来,检测离散微结构的三维形貌数据:工件台16带动保持器移动至白光检测头14正下方,进行如图6所示的保持器表面微结构的三维形貌检测,检测前电动塔台142根据微结构的面积大小切换到合适倍率的干涉物镜,保证检测视场范围大于微结构的面积大小。Next, the three-dimensional morphology data of the discrete microstructure is detected: the workpiece table 16 drives the holder to move to the bottom of the white light detection head 14, and the three-dimensional morphology detection of the microstructure on the surface of the holder is performed as shown in Figure 6. Before the detection, the electric turret 142 switches to an interference objective lens with a suitable magnification according to the area size of the microstructure to ensure that the detection field of view is larger than the area size of the microstructure.
图8示意性示出了本公开实施例提供的保持器微结构高度数据的求解原理图。FIG8 schematically shows a schematic diagram of a solution principle of the holder microstructure height data provided by an embodiment of the present disclosure.
如图8所示,在测量得到散微结构的形貌数据后,利用求台阶高度的方法求出单个微结构高度h 2;工件台16带动保持器移动至不同位置进行微结构高度检测,直至保持器表面所有微结构的三维形貌全部检测完毕。 As shown in FIG8 , after obtaining the morphological data of the scattered microstructures, the height h 2 of a single microstructure is obtained by using the step height method; the workpiece stage 16 drives the holder to move to different positions for microstructure height detection until the three-dimensional morphology of all microstructures on the holder surface is completely detected.
最后,将检测得到的面形数据和三维形貌数据叠加,即可得到保持器表面的全貌数据,该全貌数据包含了整个保持器表面的所有形貌数据信息。Finally, the detected surface data and the three-dimensional shape data are superimposed to obtain the overall shape data of the retainer surface, which includes all shape data information of the entire retainer surface.
图9示意性示出了本公开实施例提供的面形数据和三维形貌数据叠加的原理图。FIG9 schematically shows a principle diagram of superposition of surface shape data and three-dimensional shape data provided by an embodiment of the present disclosure.
如图9所示,保持器表面微结构的全貌数据h为该位置面形数据h 1与单个微结构高度h 2相加,通过全貌数据h可以计算出保持器表面的平 整度。 As shown in FIG. 9 , the overall data h of the microstructure on the retainer surface is the sum of the surface data h 1 at that position and the height h 2 of a single microstructure. The flatness of the retainer surface can be calculated using the overall data h.
需要说明的是,也可以先进行离散微结构的三维形貌数据的检测,再进行保持器表面面形数据的检测,具体顺序可以根据实际应用需求确定,本公开不做限制。It should be noted that the three-dimensional morphological data of the discrete microstructure may be detected first, and then the surface shape data of the retainer may be detected. The specific order may be determined according to actual application requirements, and the present disclosure does not impose any limitation thereto.
根据本公开实施例提供的检测装置和检测方法,激光干涉仪测量待处理元件表面的连续面形数据,白光干涉检测头测量待处理元件表面离散微结构的形貌数据,两者形成互补,同时实现连续面形数据和离散微结构的形貌数据的测量,进而实现待处理元件表面平整度的高精度检测。According to the detection device and detection method provided by the embodiments of the present disclosure, the laser interferometer measures the continuous surface data of the surface of the component to be processed, and the white light interferometer detection head measures the morphology data of the discrete microstructures on the surface of the component to be processed. The two complement each other and simultaneously realize the measurement of the continuous surface data and the morphology data of the discrete microstructures, thereby realizing high-precision detection of the surface flatness of the component to be processed.
基于上述检测装置,本公开实施例还提供一种加工设备。Based on the above detection device, the embodiment of the present disclosure also provides a processing equipment.
图10示意性示出了本公开实施例提供的加工设备的整体结构图。FIG10 schematically shows an overall structural diagram of the processing equipment provided by an embodiment of the present disclosure.
如图10所示,该加工设备可以包括:As shown in FIG10 , the processing equipment may include:
检测装置1,用于测量待处理元件表面的连续面形数据和离散微结构的形貌数据,并将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据。The detection device 1 is used to measure the continuous surface shape data and the morphology data of the discrete microstructure on the surface of the component to be processed, and match the continuous surface shape data and the morphology data of the discrete microstructure to generate the overall shape data of the surface of the component to be processed.
加工装置2,用于根据全貌数据生成加工参数,根据加工参数对待处理元件表面进行单点非耦合加工。The processing device 2 is used to generate processing parameters according to the overall data, and perform single-point non-coupled processing on the surface of the component to be processed according to the processing parameters.
检测装置1的结构与图1-图4所示的结构相同,具体细节参见前述关于检测装置的介绍,此处不再赘述。下面具体介绍加工装置2。The structure of the detection device 1 is the same as that shown in Figures 1 to 4. For details, please refer to the above description of the detection device, which will not be repeated here. The processing device 2 is described in detail below.
图11示意性示出了本公开实施例提供的加工装置的结构图。FIG. 11 schematically shows a structural diagram of a processing device provided in an embodiment of the present disclosure.
如图11所示,加工装置2例如可以包括加工封装罩壳21、立式抛光机22和加工样品台23,其中:As shown in FIG. 11 , the processing device 2 may include, for example, a processing packaging housing 21 , a vertical polishing machine 22 and a processing sample stage 23 , wherein:
加工封装罩壳21,用于对立式抛光机和加工样品台进行密封。密封的作用是为了防止加工过程中使用的浆料、抛光粉、抛光液等污染物外泄,造成污染。The processing packaging housing 21 is used to seal the vertical polishing machine and the processing sample stage. The purpose of the seal is to prevent the slurry, polishing powder, polishing liquid and other pollutants used in the processing process from leaking out and causing pollution.
立式抛光机22,其为单主轴结合三维位移台结构,用于将检测装置1传送的全貌数据作为输入数据,生成加工参数对待处理元件表面进行单点非耦合加工,实现所期望达到表面精度。The vertical polishing machine 22 is a single-spindle combined with a three-dimensional translation stage structure, which is used to use the full-view data transmitted by the detection device 1 as input data, generate processing parameters, and perform single-point non-coupled processing on the surface of the component to be processed to achieve the desired surface accuracy.
加工样品台23,用于承载待处理元件。The processing sample stage 23 is used to carry the component to be processed.
传统的小磨头抛光设备常采用公转电机+自转电机的行星轮系结构, 但由于本公开实施例的加工设备加工元件表面部位连续结构,而是一系列离散微结构,各个微结构的加工去除量存在差异,加工去除函数比较复杂,不适合采传统行星轮系结构。并且,公转电机+自转电机的行星轮系结构为了覆盖较大的加工区域,抛光盘的直径通常较大(几十毫米到几百毫米量级),抛光盘直径内的加工去除量体现不出差异性,存在耦合效应,实现不了针对保持器表面局部微结构的单点加工效果。Traditional small grinding head polishing equipment often uses a planetary gear train structure of a revolving motor + a self-rotating motor. However, since the processing equipment of the embodiment of the present disclosure processes a continuous structure on the surface of the component, but a series of discrete microstructures, the processing removal amount of each microstructure is different, and the processing removal function is relatively complex, which is not suitable for the traditional planetary gear train structure. In addition, in order to cover a larger processing area, the diameter of the polishing disc of the revolving motor + the self-rotating motor is usually large (on the order of tens of millimeters to hundreds of millimeters), and the processing removal amount within the diameter of the polishing disc does not show differences, there is a coupling effect, and the single-point processing effect for the local microstructure on the surface of the retainer cannot be achieved.
基于此,本公开实施例提供的立式抛光机22采用了单主轴+XYZ位移台的结构。Based on this, the vertical polishing machine 22 provided in the embodiment of the present disclosure adopts a single spindle + XYZ translation table structure.
具体地,立式抛光机22例如可以包括工主轴221、X轴位移台222、Y轴位移台223、Z轴位移台224、传动箱225和抛光盘226。其中,加工主轴221输出的扭矩经过传动箱225带动抛光盘226高速旋转,对待加工保持器表面进行研磨抛光;X轴位移台222,Y轴位移台223,Z轴位移台224的作用是带动抛光盘226移动到不同位置进行加工,从而使加工区域覆盖整个待加工样品表面。Specifically, the vertical polishing machine 22 may include, for example, a processing spindle 221, an X-axis translation table 222, a Y-axis translation table 223, a Z-axis translation table 224, a transmission box 225, and a polishing disc 226. The torque output by the processing spindle 221 drives the polishing disc 226 to rotate at a high speed through the transmission box 225, so as to grind and polish the surface of the holder to be processed; the X-axis translation table 222, the Y-axis translation table 223, and the Z-axis translation table 224 drive the polishing disc 226 to move to different positions for processing, so that the processing area covers the entire surface of the sample to be processed.
进一步地,为了更好地体现出加工去除量的差异性,避免耦合效应,本公开实施例还对抛光盘226的尺寸进行相关设计。Furthermore, in order to better reflect the differences in machining removal amounts and avoid coupling effects, the embodiment of the present disclosure also designs the size of the polishing disk 226 .
图12示意性示出了本公开实施例提供的抛光盘的尺寸图。FIG. 12 schematically shows a dimensional diagram of a polishing disk provided in an embodiment of the present disclosure.
如图12所示,抛光盘的直径小于待处理元件表面的离散微结构的排布周期,以实现覆盖整个保持器表面的非耦合单点加工效果。As shown in FIG. 12 , the diameter of the polishing disk is smaller than the arrangement period of the discrete microstructures on the surface of the component to be processed, so as to achieve a non-coupled single-point processing effect covering the entire retainer surface.
更进一步地,加工设备例如还可以包括平台3和底座4。Furthermore, the processing equipment may also include a platform 3 and a base 4, for example.
平台3,用于安装检测装置1和加工装置2。平台3可以采用较厚的大理石花岗岩材质,以提高设备的稳定性。The platform 3 is used to install the detection device 1 and the processing device 2. The platform 3 can be made of thicker marble granite material to improve the stability of the equipment.
底座4,用于与地面接触,起承重作用,底座4为中空框架结构,方便放置检测装置1与加工装置2的控制机柜、机箱、废液桶等部件,保证了结构的紧凑性。The base 4 is used to contact the ground and bear the weight. The base 4 is a hollow frame structure, which is convenient for placing control cabinets, chassis, waste liquid barrels and other components of the detection device 1 and the processing device 2, thereby ensuring the compactness of the structure.
基于上述加工设备,本公开实施例还提供一种加工方法。Based on the above processing equipment, the embodiment of the present disclosure also provides a processing method.
图13示意性示出了本公开一实施例提供的加工方法的流程图。FIG. 13 schematically shows a flow chart of a processing method provided in an embodiment of the present disclosure.
如图13所示,该加工方法例如可以包括操作S1301~操作S1304。As shown in FIG. 13 , the processing method may include, for example, operations S1301 to S1304 .
在操作S1301,通过激光干涉仪发射激光光束与待处理元件表面形 成干涉条纹,带动干涉条纹移相,采集干涉条纹的相位信息,根据干涉条纹的相位信息获得连续面形数据。In operation S1301, a laser beam is emitted through a laser interferometer to form interference fringes with the surface of the component to be processed, the interference fringes are driven to shift phase, the phase information of the interference fringes is collected, and continuous surface data is obtained based on the phase information of the interference fringes.
在操作S1302,通过白光干涉检测头对待处理元件表面进行垂直扫描,获取离散微结构的形貌数据。In operation S1302, a white light interferometric detection head is used to vertically scan the surface of the component to be processed to obtain topographic data of discrete microstructures.
在操作S1303,将连续面形数据和离散微结构的形貌数据匹配生成待处理元件表面的全貌数据。In operation S1303, the continuous surface shape data and the shape data of the discrete microstructures are matched to generate full shape data of the surface of the component to be processed.
在操作S1304,根据全貌数据生成加工参数,根据所述加工参数对所述待处理元件表面进行单点非耦合加工。In operation S1304, processing parameters are generated according to the overall data, and single-point non-coupled processing is performed on the surface of the component to be processed according to the processing parameters.
操作S1301~操作S1303与操作S501~操作S503一一对应相同,此处不再赘述,下面详细介绍操作S1304。Operations S1301 to S1303 are identical to operations S501 to S503 and are not described in detail here. Operation S1304 is described in detail below.
首先,加工装置根据全貌数据生成加工参数,可以包括:根据全貌数据生成待处理元件表面每个微结构的位置、加工去除量。将位置和加工去除量转化为加工参数,其中,加工参数包括主轴转速、进给量和加工时间等。First, the processing device generates processing parameters according to the overall data, which may include: generating the position and processing removal amount of each microstructure on the surface of the component to be processed according to the overall data. The position and processing removal amount are converted into processing parameters, wherein the processing parameters include spindle speed, feed rate and processing time, etc.
其次,按加工参数执行加工:加工过程中X轴位移台222和Y轴位移台223根据位置信息带动抛光盘226移到不同位置,Z轴位移台224根据加工去除量执行相应的进给量,加工主轴221带动抛光盘226对待处理元件表面微结构进行抛光加工,由于抛光盘直径226小于微结构排布周期,加工过程可实现非耦合的单点加工。上述加工过程持续进行,直至待处理元件表面所有微结构都加工完毕。Secondly, the processing is performed according to the processing parameters: during the processing, the X-axis displacement stage 222 and the Y-axis displacement stage 223 drive the polishing disc 226 to move to different positions according to the position information, the Z-axis displacement stage 224 performs the corresponding feed amount according to the processing removal amount, and the processing spindle 221 drives the polishing disc 226 to polish the microstructure on the surface of the component to be processed. Since the diameter of the polishing disc 226 is smaller than the microstructure arrangement period, the processing process can realize non-coupled single-point processing. The above processing process continues until all the microstructures on the surface of the component to be processed are processed.
图14示意性示出了本公开另一实施例提供的加工方法的流程图。FIG. 14 schematically shows a flow chart of a processing method provided by another embodiment of the present disclosure.
如图14所示,该加工方法在操作S1301~操作S1304的基础上,例如还可以包括操作S1305。As shown in FIG. 14 , the processing method may further include, for example, operation S1305 based on operations S1301 to S1304 .
在操作S1305,判断加工后待处理元件表面的平整度是否大于等于预设精度阈值。In operation S1305, it is determined whether the flatness of the surface of the component to be processed after processing is greater than or equal to a preset accuracy threshold.
在加工后待处理元件表面的平整度大于等于预设精度阈值的情况下,则待处理元件加工完成。在待处理元件表面的平整度是小于预设精度阈值的情况下,重复执行操作S1301~操作S1304,直至待处理元件表面的平整度大于等于预设精度阈值。其中,精度是否满足要求的判据可 以是保持器的实际使用效果,也可以是检测装置1测量得到的保持器全貌数据。If the flatness of the surface of the component to be processed after processing is greater than or equal to the preset accuracy threshold, the processing of the component to be processed is completed. If the flatness of the surface of the component to be processed is less than the preset accuracy threshold, operations S1301 to S1304 are repeatedly performed until the flatness of the surface of the component to be processed is greater than or equal to the preset accuracy threshold. The criterion for whether the accuracy meets the requirements can be the actual use effect of the retainer, or the overall data of the retainer measured by the detection device 1.
根据本公开提供的加工设备和加工方法,基于检测装置实现待处理元件表面平整度的高精度检测,能够获取精准的加工参数,在此基础上,考虑各个微结构的加工去除量存在差异,设置单主轴结合三维位移台结构,进而可以实现覆盖整个待处理元件表面的非耦合单点加工效果,解决了现有光学加工方法无法加工非连续的离散表面或加工时存在耦合效应。According to the processing equipment and processing method provided by the present invention, high-precision detection of the surface flatness of the component to be processed is achieved based on the detection device, and accurate processing parameters can be obtained. On this basis, considering the differences in the processing removal amounts of various microstructures, a single spindle combined with a three-dimensional translation stage structure is set, thereby achieving a non-coupled single-point processing effect covering the entire surface of the component to be processed, which solves the problem that existing optical processing methods cannot process non-continuous discrete surfaces or there is a coupling effect during processing.
为了更清楚地阐述本公开实施例提供的检测装置、检测方法、加工设备及加工方法,下面列举对保持器进行检测及加工的具体示例。In order to more clearly illustrate the detection device, detection method, processing equipment and processing method provided by the embodiments of the present disclosure, specific examples of detecting and processing the retainer are listed below.
图15示意性示出了本公开实施例提供的待检测及加工保持器的结构图。FIG. 15 schematically shows a structural diagram of a holder to be inspected and processed provided in an embodiment of the present disclosure.
如图15所示,该保持器为典型的基板保持器结构,材质为碳化硅,表面为大量规则排列的圆柱点阵结构,圆柱直径尺寸为0.5mm,圆柱高度0.1mm,周期为5mm,排布区域为φ298mm范围内,用于吸附12寸基板;该保持器的特点在于需要保证很高的表面平面度,非常适合采用本公开的提供的检测装置、检测方法、加工设备及加工方法进行检测和加工。具体检测加工过程可以如下:As shown in FIG15 , the holder is a typical substrate holder structure, made of silicon carbide, with a large number of regularly arranged cylindrical lattice structures on the surface, with a cylindrical diameter of 0.5 mm, a cylindrical height of 0.1 mm, a period of 5 mm, and an arrangement area within the range of φ298 mm, for adsorbing 12-inch substrates; the characteristic of the holder is that it needs to ensure a very high surface flatness, and is very suitable for detection and processing using the detection device, detection method, processing equipment and processing method provided by the present disclosure. The specific detection and processing process can be as follows:
首先,安装样品:将待加工保持器样品安装至检测转1的检测样品台17上,关闭推拉门,准备开始检测。First, install the sample: install the holder sample to be processed on the test sample table 17 of the test turn 1, close the sliding door, and prepare to start the test.
然后,工件台16带动保持器移动至激光干涉仪12正下方,使用激光干涉仪12测量口径为φ300mm,标准镜面形精度1/20λ。Then, the workpiece stage 16 drives the holder to move to the position directly below the laser interferometer 12 , and the laser interferometer 12 is used to measure an aperture of φ300 mm and a standard mirror shape accuracy of 1/20λ.
图16示意性示出了本公开实施例提供的检测得到的干涉条纹图。FIG. 16 schematically shows an interference fringe pattern obtained by detection provided by an embodiment of the present disclosure.
如图16所示,由于圆柱直径较小且结构不连续,无法形成有效的干涉条纹,测量得到底面的面形数据,各圆柱处的数据暂时缺失。As shown in FIG16 , due to the small diameter of the cylinder and the discontinuous structure, effective interference fringes cannot be formed, and the surface data of the bottom surface is measured, and the data at each cylinder is temporarily missing.
接下来,检测圆柱三维形貌:工件台16带动保持器移动至白光检测头14正下方,进行圆柱点阵的三维形貌检测,检测前电动塔台142切换至10倍干涉物镜,检测视场大小为1mm×1mm,能够覆盖直径0.5mm的圆柱,检测过程中工件台16带动保持器移动至不同位置进行 检测,直至保持器表面所有圆柱结构三维形貌全部检测完毕.Next, the three-dimensional shape of the cylinder is detected: the workpiece stage 16 drives the holder to move to the bottom of the white light detection head 14 to detect the three-dimensional shape of the cylindrical dot matrix. Before the detection, the electric tower 142 switches to the 10x interference objective lens, and the detection field size is 1mm×1mm, which can cover a cylinder with a diameter of 0.5mm. During the detection process, the workpiece stage 16 drives the holder to move to different positions for detection until all the three-dimensional shapes of the cylindrical structures on the surface of the holder are fully detected.
图17示意性示出了本公开实施例提供的检测得到的保持器表面单个微结构三维形貌图。FIG. 17 schematically shows a three-dimensional topography of a single microstructure on the surface of a retainer obtained by detection according to an embodiment of the present disclosure.
如图17所示,检测得到的保持器表面单个微结构三维形貌图为圆柱体。As shown in FIG. 17 , the three-dimensional morphology of a single microstructure on the surface of the retainer detected is a cylinder.
接下来,数据叠加:将得到的底面数据与得到的圆柱点阵三维形貌数据叠加,得到保持器表面的全貌数据,叠加采用最小二乘法匹配圆柱底面边缘的数据与相应位置的面形数据,生成保持器的全貌数据,该数据包含保持器表面所有结构的XYZ点云数据信息。Next, data superposition: the bottom surface data obtained is superimposed with the cylindrical lattice three-dimensional morphology data obtained to obtain the overall data of the retainer surface. The superposition uses the least squares method to match the data of the edge of the cylindrical bottom surface with the surface data of the corresponding position to generate the overall data of the retainer, which contains the XYZ point cloud data information of all structures on the retainer surface.
接下来,加工准备:将检测完毕的保持器取出安装到加工装置2的加工样品台23上,准备进行加工。Next, processing preparation: the inspected holder is taken out and mounted on the processing sample stage 23 of the processing device 2 to prepare for processing.
接下来,数据传递:将生成的保持器全貌数据传递给加工装置2,加工装置2根据该数据生成保持器表面每个圆柱的位置、加工去除量等加工数据,其中,加工去除量的计算以所有圆柱高度的最小值为基准。Next, data is transferred: the generated overall data of the retainer is transferred to the processing device 2, and the processing device 2 generates processing data such as the position of each cylinder on the retainer surface and the processing removal amount based on the data, wherein the calculation of the processing removal amount is based on the minimum value of all cylinder heights.
再接下来,单点加工:立式抛光机22接收生成的加工数据,将加工去除量转为主轴转速、进给量、加工时间等具体加工参数,在本实施例中,主轴转速为200r/min,进给量0.01um,加工时间与具体材料去除量呈线性关系,从60s~280s不等;抛光盘26直径为4mm,略小于圆柱排列的周期,磨料采用W20的金刚砂微粉。按照上述加工参数进行加工,直至表面所有圆柱加工完毕。Next, single-point processing: the vertical polishing machine 22 receives the generated processing data and converts the processing removal amount into specific processing parameters such as spindle speed, feed rate, and processing time. In this embodiment, the spindle speed is 200r/min, the feed rate is 0.01um, and the processing time is linearly related to the specific material removal amount, ranging from 60s to 280s; the polishing disc 26 has a diameter of 4mm, which is slightly smaller than the period of the cylindrical arrangement, and the abrasive is W20 corundum micro powder. Processing is performed according to the above processing parameters until all the cylinders on the surface are processed.
最后,精度判断:判断加工完毕的保持器表面精度是否满足要求,若满足要求,则样品加工完毕;若不满足要求,则重复上述过程重新进行检测、加工迭代,直至精度满足要求为止。Finally, accuracy judgment: judge whether the surface accuracy of the processed retainer meets the requirements. If it does, the sample is processed. If it does not, repeat the above process to re-test and iterate the processing until the accuracy meets the requirements.
以上所述的具体实施例,对本公开的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本公开的具体实施例而已,并不用于限制本公开,凡在本公开的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本公开的保护范围之内。The specific embodiments described above further illustrate the purpose, technical solutions and beneficial effects of the present disclosure. It should be understood that the above description is only a specific embodiment of the present disclosure and is not intended to limit the present disclosure. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present disclosure should be included in the protection scope of the present disclosure.

Claims (11)

  1. 一种检测装置,其特征在于,包括:A detection device, characterized in that it comprises:
    激光干涉仪,用于发射激光光束与待处理元件表面形成干涉条纹,带动所述干涉条纹移相,采集所述干涉条纹的相位信息,以及根据所述干涉条纹的相位信息获得连续面形数据;A laser interferometer, used for emitting a laser beam to form interference fringes with the surface of the component to be processed, driving the interference fringes to shift phase, collecting phase information of the interference fringes, and obtaining continuous surface shape data according to the phase information of the interference fringes;
    白光干涉检测头,用于对所述待处理元件表面进行垂直扫描,获取离散微结构的形貌数据。The white light interference detection head is used to vertically scan the surface of the component to be processed to obtain the morphological data of the discrete microstructure.
  2. 根据权利要求1所述的检测装置,其特征在于,所述检测装置还包括:The detection device according to claim 1, characterized in that the detection device further comprises:
    第一安装支架,用于安装所述激光干涉仪;A first mounting bracket, used for mounting the laser interferometer;
    第二安装支架,用于安装所述白光干涉检测头;A second mounting bracket, used for mounting the white light interference detection head;
    工作台,安装在所述激光干涉仪和所述白光干涉检测头出射光线的一侧;A workbench, installed on one side of the laser interferometer and the white light interference detection head emitting light;
    检测样品台,安装在所述工作台上,用于放置所述待处理元件,其中,所述工作台用于带动所述检测样品台在所述激光干涉仪的测量位置与所述白光干涉检测头的测量位置之间切换,以及将待处理元件移动到不同位置进行连续面形数据或离散微结构的形貌数据的测量;A detection sample stage, mounted on the workbench, for placing the component to be processed, wherein the workbench is used to drive the detection sample stage to switch between the measurement position of the laser interferometer and the measurement position of the white light interferometric detection head, and to move the component to be processed to different positions to measure continuous surface data or discrete microstructure morphology data;
    检测封装罩壳,用于对所述激光干涉仪、所述白光干涉检测头、所述第一安装支架、所述第二安装支架、所述工作台及所述检测样品台进行密封。The detection packaging cover is used to seal the laser interferometer, the white light interference detection head, the first mounting bracket, the second mounting bracket, the workbench and the detection sample table.
  3. 一种基于权利要求1或2所述检测装置的检测方法,其特征在于,包括:A detection method based on the detection device according to claim 1 or 2, characterized in that it comprises:
    通过激光干涉仪发射激光光束与所述待处理元件表面形成干涉条纹,带动所述干涉条纹移相,采集所述干涉条纹的相位信息,根据所述干涉条纹的相位信息获得所述连续面形数据;The laser interferometer is used to emit a laser beam to form interference fringes with the surface of the component to be processed, so as to shift the phase of the interference fringes, collect the phase information of the interference fringes, and obtain the continuous surface shape data according to the phase information of the interference fringes;
    通过白光干涉检测头对所述待处理元件表面进行垂直扫描,获取所述离散微结构的形貌数据;Scanning the surface of the component to be processed vertically by a white light interferometric detection head to obtain the topographic data of the discrete microstructure;
    将所述连续面形数据和所述离散微结构的形貌数据匹配生成所 述待处理元件表面的全貌数据。The continuous surface shape data and the shape data of the discrete microstructure are matched to generate the overall shape data of the surface of the component to be processed.
  4. 根据权利要求3所述的检测方法,其特征在于,所述将所述连续面形数据和所述离散微结构的形貌数据匹配生成所述待处理元件表面的全貌数据,具体包括:The detection method according to claim 3 is characterized in that matching the continuous surface data with the morphology data of the discrete microstructure to generate the overall data of the surface of the component to be processed specifically includes:
    对所述连续面形数据进行插值;interpolating the continuous surface data;
    利用求台阶高度的方法根据所述离散微结构的形貌数据计算单个微结构的高度;Calculating the height of a single microstructure based on the topographic data of the discrete microstructures using a step height calculation method;
    将插值后的连续面形数据与单个微结构的高度叠加,得到所述全貌数据。The interpolated continuous surface data are superimposed with the height of a single microstructure to obtain the overall data.
  5. 一种加工设备,其特征在于,包括:A processing equipment, characterized in that it comprises:
    如权利要求1或2所述检测装置,用于测量待处理元件表面的连续面形数据和离散微结构的形貌数据,并将所述连续面形数据和所述离散微结构的形貌数据匹配生成所述待处理元件表面的全貌数据;The detection device according to claim 1 or 2, used to measure the continuous surface shape data and the topography data of the discrete microstructure of the surface of the component to be processed, and match the continuous surface shape data and the topography data of the discrete microstructure to generate the overall shape data of the surface of the component to be processed;
    加工装置,用于根据所述全貌数据生成加工参数,根据所述加工参数对所述待处理元件表面进行单点非耦合加工。A processing device is used to generate processing parameters according to the overall data, and perform single-point non-coupled processing on the surface of the component to be processed according to the processing parameters.
  6. 根据权利要求5所述的加工设备,其特征在于,所述加工装置包括:The processing equipment according to claim 5, characterized in that the processing device comprises:
    立式抛光机,所述立式抛光机为单主轴结合三维位移台结构,用于对所述待处理元件表面进行单点非耦合加工;A vertical polishing machine, which is a single-spindle combined with a three-dimensional translation stage structure, and is used for performing single-point non-coupled processing on the surface of the component to be processed;
    加工样品台,用于承载所述待处理元件;A processing sample stage, used for carrying the component to be processed;
    加工封装罩壳,用于对所述立式抛光机和所述加工样品台进行密封。A processing packaging cover is used to seal the vertical polishing machine and the processing sample stage.
  7. 根据权利要求6所述的加工设备,其特征在于,所述立式抛光机包括加工主轴、X轴位移台、Y轴位移台、Z轴位移台、传动箱、抛光盘,其中:The processing equipment according to claim 6 is characterized in that the vertical polishing machine includes a processing spindle, an X-axis translation table, a Y-axis translation table, a Z-axis translation table, a transmission box, and a polishing disc, wherein:
    所述加工主轴输出的扭矩经过所述传动箱带动所述抛光盘旋转,对所述待处理元件进行研磨抛光,所述X轴位移台、所述Y轴位移台和所述Z轴位移台共同作用带动所述抛光盘移动至所述待处理元件表面的不同位置进行研磨抛光。The torque output by the machining spindle drives the polishing disc to rotate through the transmission box to grind and polish the component to be processed. The X-axis translation table, the Y-axis translation table and the Z-axis translation table work together to drive the polishing disc to move to different positions on the surface of the component to be processed for grinding and polishing.
  8. 根据权利要求7所述的加工设备,其特征在于,所述抛光盘的直径小于所述待处理元件表面的离散微结构的排布周期。The processing equipment according to claim 7 is characterized in that the diameter of the polishing disk is smaller than the arrangement period of the discrete microstructures on the surface of the component to be processed.
  9. 一种基于权利要求5-8任一项所述加工设备的加工方法,其特征在于,包括:A processing method based on the processing equipment according to any one of claims 5 to 8, characterized in that it comprises:
    通过激光干涉仪发射激光光束与所述待处理元件表面形成干涉条纹,带动所述干涉条纹移相,采集所述干涉条纹的相位信息,根据所述干涉条纹的相位信息获得所述连续面形数据;The laser interferometer is used to emit a laser beam to form interference fringes with the surface of the component to be processed, so as to shift the phase of the interference fringes, collect the phase information of the interference fringes, and obtain the continuous surface shape data according to the phase information of the interference fringes;
    通过白光干涉检测头对所述待处理元件表面进行垂直扫描,获取所述离散微结构的形貌数据;Scanning the surface of the component to be processed vertically by a white light interferometric detection head to obtain the topographic data of the discrete microstructure;
    将所述连续面形数据和所述离散微结构的形貌数据匹配生成所述待处理元件表面的全貌数据;Matching the continuous surface shape data with the shape data of the discrete microstructure to generate full shape data of the surface of the component to be processed;
    根据所述全貌数据生成加工参数,根据所述加工参数对所述待处理元件表面进行单点非耦合加工。Processing parameters are generated according to the overall data, and single-point non-coupled processing is performed on the surface of the component to be processed according to the processing parameters.
  10. 根据权利要求9所述的加工方法,其特征在于,所述根据所述全貌数据生成加工参数,具体包括:The processing method according to claim 9 is characterized in that the step of generating processing parameters according to the overall data specifically comprises:
    根据所述全貌数据生成所述待处理元件表面每个微结构的位置、加工去除量;Generate the position and machining removal amount of each microstructure on the surface of the component to be processed according to the overall data;
    将所述位置和所述加工去除量转化为加工参数,其中,所述加工参数包括主轴转速、进给量和加工时间。The position and the machining removal amount are converted into machining parameters, wherein the machining parameters include spindle speed, feed rate and machining time.
  11. 根据权利要求9或10所述的加工方法,其特征在于,所述加工方法还包括:The processing method according to claim 9 or 10, characterized in that the processing method further comprises:
    在加工完成后,判断所述待处理元件表面的平整度是否大于等于预设精度阈值;After the processing is completed, determining whether the flatness of the surface of the component to be processed is greater than or equal to a preset accuracy threshold;
    在所述待处理元件表面的平整度是小于预设精度阈值的情况下,重复执行所述加工方法,直至所述待处理元件表面的平整度大于等于预设精度阈值。When the flatness of the surface of the component to be processed is less than a preset accuracy threshold, the processing method is repeatedly executed until the flatness of the surface of the component to be processed is greater than or equal to the preset accuracy threshold.
PCT/CN2022/136839 2022-12-01 2022-12-06 Detection apparatus, detection method, machining device, and machining method WO2024113397A1 (en)

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