CN101949692A - Microstructure topography test system and method based on white light phase shift interferometry - Google Patents
Microstructure topography test system and method based on white light phase shift interferometry Download PDFInfo
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Abstract
The invention relates to microstructure topography test system and method based on a white light phase shift interferometry. The system is sequentially provided with a digital CCD (Charge Coupled Device) camera, a microscopic optical system, a piezoelectric ceramic driver, an interference objective and a piezoelectric ceramic controller connected with the piezoelectric ceramic driver; and the system is also provided with a white light source supplying a light source and a PC (Personal Computer) machine, wherein the PC machine is connected with the digital CCD camera and the piezoelectric ceramic controller through an image collection card; and the input end of the interference objective corresponds to a sample to be tested arranged on a vibration isolation platform. The method comprises the following steps of: driving the interference objective to vertically scan an object to be tested through a phase shifter and recording a collected image; determining the center of gravity through a center of gravity method; solving an error of the gravity center position and a zero order fringe position through calculating phase information at the last position of a zero order stripe; and determining the position of a zero order interference fringe through comprehensively interfering the intensity information and the phase information of a signal. The invention has high measurement efficiency, widens measuring range and improves measurement resolution.
Description
Technical field
The present invention relates to a kind of microstructure appearance test method.Particularly relate to a kind of combine intensity signal and phase information in the interference signal, be applied to the microstructure appearance test macro and the method for testing based on white light phase shift interference art of large-scale micro-structural 3 D pattern non-cpntact measurement.
Background technology
(microelectromechanical system MEMS) is meant sensor, processor, actuator is combined into a complete system with the form of microstructure, and makes it to have perception, the ability of analysis and judgement and reaction MEMS (micro electro mechanical system).Between three more than ten years in the past, MEMS (micro electro mechanical system) and correlation technique obtain develops rapidly and makes its Related product be penetrated into each field of human lives almost and bringing into play tremendous influence.From microsensor, micromechanical parts, to Medical Instruments, electron device or the like, micro-electromechanical technology is in size that constantly reduces traditional Mechatronic Systems and cost, thousands of times raising the performance of system, also as auto industry, fundamental research, information communication, new market is being opened up in fields such as national defence space flight, and constantly shows great potential.
The MEMS technology relates to a plurality of fields such as physics, chemistry, biology, machinery, electricity, optics, material, is a typical comprehensive cross discipline.Its corresponding product also is in the range scale of micron or nanometer usually, and present a lot of and macroscopical different physical phenomenons, this also gives the quality control of MEMS device production and detects the very big difficulty of bringing, and traditional contact detection method has been difficult to satisfy the demands.
At present, the detection of MEMS device mainly comprises mainly based on optical means: confocal laser scanning microscope, trigonometry, automatic focus method, methods such as micro-interference art.This wherein, the micro-interference art is paid attention to more and more widely owing to can realize fast full visual field test.Usually, the micro-interference art is divided into monochromatic light micro-interference and white light micro-interference again.The monochromatic light micro-interference uses monochromatic light as lighting source, uses phase-shift method to measure usually, and measurement resolution can reach 0.1nm.But, because monochromatic coherent length is longer, can bring phase fuzzy problem again, make it and can't carry out the correct parcel computing of separating obtained phase diagram.For fear of this problem, just require the difference in height of adjacent position point on the sample surface can not be long greater than 1/4th lighting light waves.This drawbacks limit the application of monochromatic light phase-shift method, make it to be applied to smooth or continually varying is surperficial.Yet along with the development of IC integrated technique and MEMS technology, the depth-to-width ratio that device itself requires is increasing, and the monochromatic light phase-shift method just seems powerless to this structure.So white light micro-interference art has become to be applied to the main method of this class formation test.It uses the white light of wide spectrum as lighting source, thereby has shorter coherent length, thereby has avoided the phase fuzzy problem in the monochromatic light interference.But reduced measurement resolution simultaneously, and when measuring some height less than the structure of used white light centre wavelength, the edge can produce because the overshoot phenomenon that diffraction brought.Therefore, monochromatic light phase shift interference art and white light interference art respectively have the scope of application, only just can obtain desirable measurement result in corresponding scope.
Competitive list coloured light phase shift interference art and white light phase shift interference art, two kinds of methods respectively have quality, thereby and how the advantage of comprehensive two kinds of methods can be with higher measurement resolution to an important research field in MEMS device measurement the becoming micro-interference art of different sizes.
Summary of the invention
Technical matters to be solved by this invention is, a kind of measuring accuracy that not only can improve the white light interference art is provided, and in to the structure measurement of height, can effectively reduce the microstructure appearance test macro and the method for testing based on white light phase shift interference art of diffraction influence less than white light source centre wavelength.
The technical solution adopted in the present invention is: a kind of microstructure appearance test macro and method of testing based on white light phase shift interference art, its test macro, include the digital ccd video camera that sets gradually, micro optical system, piezoelectric ceramic actuator, interference objective and the piezoelectric ceramics controller that links to each other with piezoelectric ceramic actuator, also be provided with white light source and PC that light source is provided to micro optical system, described PC is connected with digital ccd video camera by image pick-up card, described PC also connects the piezoelectric ceramics controller by image pick-up card, and the input end of described interference objective is corresponding to the sample that is arranged on the vibration-isolating platform.
Be used for method of testing based on the microstructure appearance test macro of white light phase shift interference art, by phase shifter drive interference objective with etc. step-length testee is carried out vertical scanning, make the inswept tested zone of interference fringe, and by the image of digital ccd video camera record acquisition; What PC extracted single pixel after to scan image filtering obtains the white light interference signal, to the interference fringe of gained, at first will deduct its background light intensity value, and determine its center of gravity by gravity model appoach; Determine to carry out the data set of phase calculation then based on centre of gravity place, try to achieve the phase value of corresponding position, phase calculation is positioned on the zero order fringe,, tries to achieve the deviation of this position and zero order fringe position by calculating the phase information of a position on the zero order fringe; Strength information by comprehensive interference signal and phase information to be determining the position of zero order interference fringe, thereby realize the extraction of surface elevation information.
Step-length phase-shift methods such as four steps in the process that the white light interference zero order fringe that extracts is positioned, have been used.
After step-lengths such as use four step, the phase shift interference method was tried to achieve phase value, this phase value is launched operation, it is expanded to four-quadrant.
After trying to achieve phase value, be converted into by phase information in the process of range information, consider the influence of interference objective numerical aperture, and introduced numerical-aperture parameters.
Microstructure appearance test macro and method of testing based on white light phase shift interference art of the present invention have following technical characterstic and technique effect:
1, the present invention is a kind of contactless measurement, and measuring process is minimum to the influence of sample;
2, the present invention is that a kind of formula measured, and measurement range is by the visual field decision of CCD target surface size and object lens, efficiency of measurement height;
3, the present invention uses gravity model appoach to determine to carry out the data set of phase calculation, thereby has avoided phase place to separate the parcel process;
4, the present invention has used the strength information and the phase information of interference signal, and diffraction is had good restraining ability, can effectively measure the structure that common use monochromatic light phase shift interference art is measured, and has expanded measurement range, and has improved measurement resolution.
Description of drawings
Fig. 1 is that test macro of the present invention constitutes synoptic diagram;
Fig. 2 is the white light interference signal location figure that gathers gained;
Fig. 3 is the schematic diagram of white light phase shift interference;
Fig. 4 is the signal processing flow figure of white light phase shift interference.
Wherein:
1:PC machine 2: image pick-up card
3: white light source 4: digital ccd video camera
5: micro optical system 6: piezoelectric ceramics (PZT) phase shifter
7: interference objective 8: sample
9: vibration-isolating platform 10: piezoelectric ceramics (PZT) driver
11: the discrete signal of being gathered 12: continuous interference signal
13: the interference signal 14 that removes the background light intensity: the centre of gravity place of continuous interference signal
15: apart from the nearest location point of the centre of gravity place of continuous interference signal
16: the actual position z that removes the interference signal zero order fringe of background light intensity
17: the correspondence position d of phase value
18: the alternate position spike Δ of the correspondence position d of actual position z and phase value
Embodiment
Below in conjunction with embodiment and accompanying drawing microstructure appearance test macro and the method for testing based on white light phase shift interference art of the present invention made a detailed description.
Microstructure appearance test macro based on white light phase shift interference art of the present invention, include the digital ccd video camera 4 that sets gradually, micro optical system 5, piezoelectric ceramics (PZT) phase shifter 6, interference objective 7 and the white light source 3 that light source is provided to micro optical system 5, piezoelectric ceramics (PZT) driver 10 that links to each other with piezoelectric ceramics (PZT) phase shifter 6, also be provided with PC 1, described PC 1 is connected with digital ccd video camera 4 by image pick-up card 2, described PC 1 also connects piezoelectric ceramics (PZT) driver 10 by image pick-up card 2, and the input end of described interference objective 7 is corresponding to the sample 8 that is arranged on the vibration-isolating platform 9.
Total system can be positioned on the vibration-isolating platform 9, and is thrown light on by white light source 3; During test by PC 1 by piezoelectric ceramic actuator 10 control piezoelectric ceramics phase shifters 6 drive 7 pairs of samples of interference objectives 8 carry out from top to bottom etc. step-length vertical scanning, scanning step is no more than
Interference image is gathered by digital ccd video camera 4, and is sent to PC 1 by image pick-up card 2.
Above-mentioned hardware device used in the present invention all is based on existing business equipment.
The method of testing that is used for based on the microstructure appearance test macro of white light phase shift interference art of the present invention, be by phase shifter drive interference objective with etc. step-length testee is carried out vertical scanning, make the inswept tested zone of interference fringe, and by the image of digital ccd video camera record acquisition, and be sent to PC; What PC extracted single pixel after to scan image filtering obtains the white light interference signal, to the interference fringe of gained, at first will deduct its background light intensity value, and determine its center of gravity by gravity model appoach; Determine to carry out the data set of phase calculation then based on centre of gravity place, try to achieve the phase value of corresponding position, phase calculation is positioned on the zero order fringe, by calculating the phase information of a position on the zero order fringe, try to achieve the deviation of this position and zero order fringe position, separate the parcel process thereby saved phase place; Strength information by comprehensive interference signal and phase information to be determining the position of zero order interference fringe, thereby realize the extraction of surface elevation information.After trying to achieve phase value, be converted into by phase information in the process of range information, consider the influence of interference objective numerical aperture, and introduced numerical-aperture parameters.
Step-length phase-shift methods such as four steps in the process that the white light interference zero order fringe that extracts is positioned, have been used.After step-lengths such as use four step, the phase shift interference method was tried to achieve phase value, this phase value is launched operation, it is expanded to four-quadrant.
Less than the sample of used white light source centre wavelength, also can use this method to measure for height, and the overshoot phenomenon that occurs of suppression device structural edge effectively.
As shown in Figure 2, the process flow diagram for the present invention measures embodiment mainly is divided into following step:
Step 1: selected measured zone is also focused before measuring, and adjusts the inclined degree and the illumination light intensity of testee, makes illumination light comprise whole visible light wave range, to make full use of the resolving power of digital ccd video camera as far as possible; The selected bound of measuring is so that the abundant inswept tested zone of striped.
Step 2: use digital ccd video camera that scan image is gathered, and be sent to PC.
Step 3: to extracting the interference signal of single pixel after the scan image filtering, remove the centre of gravity place of DC component and signal calculated, carry out the data set of phase calculation and extract phase value based on focus point is selected afterwards, try to achieve the surface elevation information of testee in conjunction with numerical-aperture parameters.
As shown in Figure 3, the discrete interference signal of being gathered obtains the discrete signal of being gathered 11 through Filtering Processing.
As shown in Figure 4, remove the DC component of the discrete signal of being gathered 11 after, obtain removing the interference signal 13 of background light intensity; Calculate the centre of gravity place 14 of continuous interference signal by the center of gravity formula, employed formula is:
Wherein P is the center, and i is the sequence number of data point, and x is discrete interference signal, because interference signal is symmetric form, so focus point will inevitably be positioned so just phase calculation to be positioned on the zero order fringe on the zero order fringe of interference signal, thereby has avoided phase place to separate the parcel process; Centre of gravity place 14 based on the continuous interference signal, choose apart from the C point of the nearest location point 15 of the centre of gravity place of continuous interference signal as phase calculation, 2 and afterwards the A that a bit is respectively phase calculation, B and D point before it, the respective phase computing formula is:
This phase value is expanded this phase value afterwards corresponding to the correspondence position d17 of phase value, carries out as follows
When (B-C)=0, (B+C)-(A+D)＜0 o'clock, rejected as particular point.(3)
Thereby can with its PHASE DISTRIBUTION by
Expand to (π, π).
As shown in Figure 3,16 for removing the actual position z of interference signal zero order fringe of background light intensity, and the alternate position spike Δ 18 of the correspondence position d17 of phase value and the actual position z16 of the interference signal zero order fringe that removes the background light intensity is expressed as:
Wherein λ is the centre wavelength of light source, and f is a numerical-aperture parameters, derives from the formula of Ingelstam:
N.A. wherein
EffBe numerical-aperture parameters; So the zero order fringe position of interference signal 13 can be expressed as:
z＝d+Δ (6)
Can obtain the surface topography of testee thus.
The present invention by the detailed narration of from top to bottom scanning sequency the measuring process of white light phase shift interference, but change the direction of scanning, or change the method for calculating center of gravity and all be applicable to similar white light interferometric.Although the present invention has carried out detailed statement by drawings and Examples, but those skilled in the art obviously can make amendment to the content in the present patent application in the scope that does not break away from content of the present invention and spirit, promptly all changes are conspicuous In the view of those skilled in the art person, and they are regarded as being included among spirit of the present invention and the content.
Claims (5)
1. microstructure appearance test macro based on white light phase shift interference art, include the digital ccd video camera (4) that sets gradually, micro optical system (5), piezoelectric ceramic actuator (6), interference objective (7) and the piezoelectric ceramics controller (10) that links to each other with piezoelectric ceramic actuator (6), it is characterized in that, also be provided with white light source (3) and PC (1) that light source is provided to micro optical system (5), described PC (1) is connected with digital ccd video camera (4) by image pick-up card (2), described PC (1) also connects piezoelectric ceramics controller (10) by image pick-up card (2), and the input end of described interference objective (7) is corresponding to the sample (8) that is arranged on the vibration-isolating platform (9).
2. method of testing that is used for the described microstructure appearance test macro based on white light phase shift interference art of claim 1, it is characterized in that, by phase shifter drive interference objective with etc. step-length testee is carried out vertical scanning, make the inswept tested zone of interference fringe, and by the image of digital ccd video camera record acquisition; What PC extracted single pixel after to scan image filtering obtains the white light interference signal, to the interference fringe of gained, at first will deduct its background light intensity value, and determine its center of gravity by gravity model appoach; Determine to carry out the data set of phase calculation then based on centre of gravity place, try to achieve the phase value of corresponding position, phase calculation is positioned on the zero order fringe,, tries to achieve the deviation of this position and zero order fringe position by calculating the phase information of a position on the zero order fringe; Strength information by comprehensive interference signal and phase information to be determining the position of zero order interference fringe, thereby realize the extraction of surface elevation information.
3. the method for testing that is used for based on the microstructure appearance test macro of white light phase shift interference art according to claim 2 is characterized in that, has used step-length phase-shift methods such as four steps in the process that the white light interference zero order fringe that extracts is positioned.
4. the method for testing that is used for based on the microstructure appearance test macro of white light phase shift interference art according to claim 3, it is characterized in that, after step-lengths such as use four step, the phase shift interference method was tried to achieve phase value, this phase value is launched operation, it is expanded to four-quadrant.
5. the method for testing that is used for based on the microstructure appearance test macro of white light phase shift interference art according to claim 2, it is characterized in that, after trying to achieve phase value, be converted into by phase information in the process of range information, consider the influence of interference objective numerical aperture, and introduced numerical-aperture parameters.
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| CN103791853A (en) * | 2014-01-20 | 2014-05-14 | 天津大学 | Microstructure measuring device and measuring method based on color strip information processing |
| CN103940334A (en) * | 2014-04-08 | 2014-07-23 | 天津大学 | Dynamic two-dimensional photoelectric microscope |
| CN105136019A (en) * | 2015-04-30 | 2015-12-09 | 天津大学 | Adaptive white light scanning interference measuring method based on nanometer measuring machine |
| CN106197257A (en) * | 2016-07-06 | 2016-12-07 | 中国科学院光电技术研究所 | Amplitude & Phase combined modulation super-resolution three-dimensional micro-nano structure topography measurement device |
| CN106197310A (en) * | 2016-06-29 | 2016-12-07 | 中国科学院光电技术研究所 | A kind of wide spectrum micro-nano structure three-dimensional appearance testing method based on modulation degree |
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| CN103940334A (en) * | 2014-04-08 | 2014-07-23 | 天津大学 | Dynamic two-dimensional photoelectric microscope |
| CN103940334B (en) * | 2014-04-08 | 2016-09-21 | 天津大学 | Dynamic Two-dimensional photoelectric microscope |
| CN105136019A (en) * | 2015-04-30 | 2015-12-09 | 天津大学 | Adaptive white light scanning interference measuring method based on nanometer measuring machine |
| CN106197310A (en) * | 2016-06-29 | 2016-12-07 | 中国科学院光电技术研究所 | A kind of wide spectrum micro-nano structure three-dimensional appearance testing method based on modulation degree |
| CN106197257A (en) * | 2016-07-06 | 2016-12-07 | 中国科学院光电技术研究所 | Amplitude & Phase combined modulation super-resolution three-dimensional micro-nano structure topography measurement device |
| CN110186388B (en) * | 2019-05-13 | 2021-04-06 | 天津大学 | Synchronous phase shift measurement system and method based on white light interference spectrum |
| CN110186388A (en) * | 2019-05-13 | 2019-08-30 | 天津大学 | Synchronization phase shift measurement system and method based on white light interference spectrum |
| CN111473742A (en) * | 2020-05-22 | 2020-07-31 | 大连理工大学 | Morphology simulation and compensation method for batwing effect of white light scanning interferometry |
| CN111964586A (en) * | 2020-08-10 | 2020-11-20 | 中国民航大学 | White light interference signal processing method based on random noise correction |
| CN113091634A (en) * | 2021-03-01 | 2021-07-09 | 南京理工大学 | Rapid micro-morphology measuring method suitable for white light scanning interference |
| CN112902846A (en) * | 2021-03-22 | 2021-06-04 | 天津大学 | Position coarse acquisition method applied to wavelength modulation anti-vibration interference system |
| CN113465534A (en) * | 2021-06-25 | 2021-10-01 | 浙江大学 | Micro-nano deep groove structure rapid measurement method based on white light interference |
| CN113465534B (en) * | 2021-06-25 | 2022-04-19 | 浙江大学 | Micro-nano deep groove structure rapid measurement method based on white light interference |
| CN113607084A (en) * | 2021-08-11 | 2021-11-05 | 浙江大学 | Method for measuring submillimeter groove structure based on white light interference and SPGD |
| CN115046469A (en) * | 2022-05-20 | 2022-09-13 | 浙江大学 | Interference fringe envelope extraction method for optical fiber white light interference |
| WO2024113397A1 (en) * | 2022-12-01 | 2024-06-06 | 中国科学院光电技术研究所 | Detection apparatus, detection method, machining device, and machining method |
| CN117870573A (en) * | 2024-03-12 | 2024-04-12 | 板石智能科技(深圳)有限公司 | White light interference three-dimensional morphology resolving method, device, equipment and storage medium |
| CN117870573B (en) * | 2024-03-12 | 2024-05-28 | 板石智能科技(深圳)有限公司 | White light interference three-dimensional morphology resolving method, device, equipment and storage medium |
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