WO2024032836A1 - Procédé de matage d'une surface d'un dispositif de gaufrage ou d'impression, et dispositif - Google Patents

Procédé de matage d'une surface d'un dispositif de gaufrage ou d'impression, et dispositif Download PDF

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Publication number
WO2024032836A1
WO2024032836A1 PCT/DE2022/100595 DE2022100595W WO2024032836A1 WO 2024032836 A1 WO2024032836 A1 WO 2024032836A1 DE 2022100595 W DE2022100595 W DE 2022100595W WO 2024032836 A1 WO2024032836 A1 WO 2024032836A1
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WO
WIPO (PCT)
Prior art keywords
points
structured
structures
laser
macrostructures
Prior art date
Application number
PCT/DE2022/100595
Other languages
German (de)
English (en)
Inventor
Ronny Schlegel
Roman STOLL
Original Assignee
Matthews International GmbH
Matthews International Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matthews International GmbH, Matthews International Corporation filed Critical Matthews International GmbH
Priority to PCT/DE2022/100595 priority Critical patent/WO2024032836A1/fr
Publication of WO2024032836A1 publication Critical patent/WO2024032836A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06—Platens or press rams
    • B30B15/062—Press plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B3/00—Presses characterised by the use of rotary pressing members, e.g. rollers, rings, discs
    • B30B3/005—Roll constructions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B5/00—Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/02—Dies; Accessories
    • B44B5/026—Dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/06—Printing plates or foils; Materials therefor metallic for relief printing or intaglio printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B41N1/18—Curved printing plates, especially cylinders made of stone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/16—Curved printing plates, especially cylinders
    • B41N1/20—Curved printing plates, especially cylinders made of metal or similar inorganic compounds, e.g. plasma coated ceramics, carbides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/228—Removing surface-material, e.g. by engraving, by etching by laser radiation

Definitions

  • the invention relates to a method for matting a surface of a device for embossing or printing, and to a device.
  • Such devices may be embossing devices or printing devices and are used, for example, to create decorative patterns or the like on a substrate.
  • Corresponding devices can be or include rollers, for example embossing rollers, counter rollers or pressure rollers, or embossing plates or printing plates.
  • the embossing device can, for example, have a macrostructure that can emboss a pattern.
  • the surface of the device has different degrees of gloss (e.g. matt-gloss, matt, high-gloss, etc.) in a location-selective manner, i.e. the degree of gloss varies so that a decorative print or imprint produced with the device has a can have the desired optical effect.
  • degrees of gloss e.g. matt-gloss, matt, high-gloss, etc.
  • nanosecond lasers have also proven to be insufficient as this creates sharp edges on the lasered surface.
  • these edges prevent clean embossing or imprinting in the production process, and on the other hand, the sharp edges can cause the substrate to be printed or embossed to adhere. Corresponding sharp edges should therefore be avoided.
  • These known methods are not suitable, particularly if the surface is made of chromium or nickel or has chromium or nickel.
  • a first aspect of the invention relates to a method for matting a surface of a device for embossing or printing, with the following steps:
  • Structuring preferably laser direct structuring, the surface with a laser, with structures being formed at the points to be structured during structuring, the structures being set up to locally diffusely scatter incident light, with a laser being set up to do so during structuring Delivering pulses with a pulse duration of less than 30 ps (30 picoseconds) is used.
  • structures can be formed in a location-selective manner, which can also define a level of gloss of the surface in a location-selective manner. Because the structures are set up to locally diffusely scatter incident light, the matting of the surface can be predetermined or set in a location-selective manner. “Gloss”, “shining” or the like can mean that incident light is completely or partially reflected in a mirror-like manner, for example from the surface. If a surface (locally or selectively) is “shiny” or the like, this can mean that incident light is reflected in a specular manner (locally or selectively).
  • matt By “matt”, “matting” or the like can be meant that the surface is less shiny compared to an unmatt surface. If a surface (locally or selectively) is “matt” or the like, this can mean that something incident Light (locally or selectively) is diffusely scattered or diffusely reflected. “Dulling” may be or include a surface treatment that causes the surface to be less shiny. Because the laser emits pulses with a pulse duration of less than 30 ps (30 picoseconds), the corresponding structures can be smaller than structures produced with nanosecond lasers or sand steel, and have fewer or no sharp edges or the like.
  • a device can be or be laser-treated in such a way that an imprint or impression produced with the treated device can have a predetermined degree of gloss at a predetermined viewing angle.
  • the surface of the device can be structured in such a way that a selected level of gloss of an imprint or imprint created with the device can result from a selected viewing angle.
  • the device can be or have a roller, in particular an embossing roller, a counter roller or a pressure roller, or an embossing plate or printing plate.
  • the laser can be or have a picosecond laser.
  • the counter roller can be arranged opposite, for example, an embossing roller or a printing roller.
  • the embossing roller and/or embossing plate can be designed to produce an embossing or an engraving in or on a substrate, and/or to be or be used when engraving a substrate.
  • the printing roller and/or printing plate can be designed to print on a substrate and/or can be used when printing a substrate.
  • the laser can be or have a picosecond laser or a femtosecond laser.
  • the surface can have chrome or consist of chrome. Alternatively or additionally, the surface can have nickel or consist of nickel. It can be provided that the surface is arranged on a core of the device. It can be provided that the surface is multi-layered.
  • the surface may have an outer layer made of or including chromium. The method can be particularly suitable if the surface has chromium and/or nickel or consists of chromium and/or nickel.
  • at least one of the structures can be formed by at least partially removing the surface. The surface can be removed using laser ablation. The laser can vaporize at least part of the surface.
  • the structure can be or have a depression.
  • At least one of the structures can be formed by melting the surface.
  • the structure may be a spherical structure.
  • At least one of the structures may be formed by at least partially removing the surface, and at least one other of the structures may be formed by melting the surface.
  • all of the structures are or will be formed by at least partially removing the surface or are or will be formed by melting the surface.
  • the structure can be formed such that it can have a characteristic dimension of less than to pm.
  • the structure may have a structure height of up to 2 pm.
  • the structure can have a structure width of up to 3 pm.
  • the characteristic dimension may be or include a height, a depth, a width, a thickness, a length or a diameter.
  • the points can be arranged in a grid.
  • the points can be arranged at a distance of less than 50 pm. In some embodiments it can also be provided that the points can be arranged at a distance of less than 20 pm or less than 10 pm. Alternatively or additionally, a grid spacing of the grid can be less than 50 pm, in some embodiments less than 20 pm or less than 10 pm.
  • the points to be structured can be chosen randomly. Each point can have a probability of 10% or more of being assigned to a point to be structured.
  • the points can be divided in such a way that a ratio of points to be structured to the total number of points can be between 10% and 100%. The ratio can be 10%, 20%, 30%, 50%, 80% or 100%.
  • the points of a first part of the surface can be divided into points to be structured and points not to be structured, unlike points of a second part of the surface.
  • the first part and the second part can each have a different ratio of points to be structured to the total number of points per part of the surface, or the points of the first part and the second part can be divided accordingly. This means that when structuring the surface, the first part can be structured differently than the second part.
  • the method may include forming one or more macrostructures.
  • the macrostructures can be formed such that they are designed to emboss or print a pattern.
  • the macrostructures can be formed before structuring the surface. In some embodiments, forming the macrostructures may occur before dividing the points.
  • at least one structure can be formed on or over at least one of the macrostructures.
  • the macrostructure can include, or be formed by, an elevation and/or depression of the surface.
  • the macrostructures may be formed by a polishing process.
  • the surface can be or will be polished selectively or completely, possibly with different intensity.
  • the macrostructure may be formed by engraving the surface and/or have an engraving.
  • the macrostructure may be formed with a laser, for example by laser engraving.
  • the laser may be the laser used to form the structures.
  • the macrostructures may be formed with a laser that differs from the laser used to form the structures, for example in its pulse duration, pulse frequency, power or the like.
  • the formation of the macrostructure is not limited to laser engraving; other engraving processes, polishing processes and/or general processes for forming corresponding elevations and/or depressions can also be used.
  • the macrostructure may be formed such that the macrostructure has a characteristic dimension that is larger than one or the characteristic dimension of the structure.
  • the macrostructure may have a characteristic dimension that is one or more orders of magnitude larger than the characteristic dimension of the structure.
  • the macrostructure or macrostructures can be arranged or formed in such a way that they correspond to and/or represent a pattern to be printed or embossed.
  • the macrostructures can also be a side effect of a surface treatment or the like, e.g. be or will be formed during a surface treatment prior to the process. In some embodiments, the macrostructures may not be configured to print or emboss a pattern onto a substrate.
  • the surface Before structuring the surface, the surface can be plated.
  • the surface can be or will be plated with chrome and/or nickel.
  • chrome and/or nickel are also conceivable, for example aluminum or copper.
  • plating the surface may occur after forming the macrostructure. Provision may be made to plate the macrostructures.
  • the macrostructures can be or will be plated with chromium and/or nickel. However, other materials for plating are also conceivable, for example aluminum or copper. Provision can be made to structure the plated surface and/or the plated macrostructures, or to form structures on the plated surface and/or on the plated macrostructures.
  • the structure can be formed with multiple pulses of the laser.
  • the structure can be formed with ten or more pulses, for example.
  • a second aspect of the invention relates to a device for embossing or printing, the device having a matt surface, the surface having a large number of structured points, a proportion of the structured points to the total area of the surface being between 10% and 100%, wherein the surface at the structured points each has a structure that is designed to locally diffusely scatter incident light.
  • the device can be manufactured and/or matted using a method described above. A method described above can be used to matt a surface of the device.
  • the device can be or have a roller, in particular an embossing roller, a pressure roller, a counter roller, an embossing plate or printing plate.
  • the counter roller can be arranged opposite an embossing roller or pressure roller, for example.
  • the embossing roller and/or embossing plate can be designed to produce an embossing or an engraving in or on a substrate, and/or to be or be used when engraving a substrate.
  • the printing roller and/or printing plate can be set up to print on a substrate and/or be used when printing a substrate.
  • the surface can have chrome and/or nickel, or consist of chrome and/or nickel. In some embodiments, the surface may be plated. The surface can be plated with chrome and/or nickel. But other materials are also conceivable, for example aluminum or copper.
  • At least one of the structures can involve removal and/or melting of the surface.
  • at least one of the structures can be spherical.
  • the structure can have a characteristic dimension of less than 10 pm.
  • the structure may have a structure height of up to 2 pm and/or a structure width of up to 3 pm.
  • the structured points and/or the structures can be arranged in a grid.
  • a grid spacing of the grid can be smaller than 50 pm. In some embodiments, the grid spacing of the grid may be less than 20 pm or less than 10 pm.
  • the surface may have a first part and a second part, wherein structures of the first part may be different from structures of the second part.
  • the first part may have a number of structures that may be different from the number of structures of the second part.
  • the structures of the first part can be distributed and/or arranged differently compared to the structures of the second part, or at least partially have a different shape or characteristic dimension.
  • the device can have one or more macrostructures.
  • the macrostructures can be arranged on or on the surface.
  • the macrostructures can be set up to print or emboss a pattern.
  • At least one of the structures is arranged on or above at least one of the macrostructures
  • Fig. 1 Arrangements of a laser and devices according to the invention for carrying out the method according to the invention
  • Fig. 2 further arrangements of a laser and according to the invention
  • Fig. 3 a grid with a division of a surface into those to be structured
  • Fig. 4 a top view of a surface of an inventive
  • Fig. 5 a top view of a surface with a macrostructure
  • Fig. 6 Embodiments of devices according to the invention with different matting.
  • Fig. 7 A level of gloss of embossed with the device according to the invention
  • FIG. 1 shows devices 2 according to the invention, in which a method according to the invention is carried out with a laser 5.
  • the device 2 can be or have, for example, a roller 11 or an embossing plate 12 or printing plate 12.
  • the device 2 has a surface 1 that is or is being processed by laser 5.
  • the device 2 and/or the roller 11 can be or have an embossing roller, a pressure roller or a counter roller.
  • the counter roller can be arranged opposite, for example, an embossing roller or a printing roller.
  • the embossing roller and/or embossing plate can be set up to produce an embossing or an engraving in or on a substrate, and/or be or be used when engraving a substrate.
  • the printing roller and/or printing plate can be designed to print on a substrate and/or can be used when printing a substrate.
  • the plate 12 shown in the figures may be or comprise a printing plate 12. In some embodiments, the plate 12 shown in the figures may be or have an embossing plate 12.
  • the surface 1 can have chrome and/or nickel. Alternatively or additionally, the surface can consist of chrome or nickel. In some embodiments, parts or sections of the surface may have different materials and/or the proportion of the respective materials may vary in sections. It can be provided that the surface 1 is arranged on a core of the device 2. It can be provided that the surface 1 is multi-layered. In some embodiments, surface 1 may be plated, for example with chromium and/or nickel. The surface 1 may have an outer layer consisting of chromium or nickel, or comprising chromium and/or nickel. The method can be particularly suitable if the surface 1 has chromium or nickel, or consists of chromium or nickel.
  • Pulses 10 emitted by the laser 5 can hit the surface 1 of the device 2 at a point 3 to be structured in order to form a structure 6 at the structuring point 3.
  • the surface 1 can be structured by or with the laser 5.
  • the laser 5 can matt the surface 1, or the surface 1 can be or have a matted surface.
  • “Gloss”, “shining” or the like can mean that incident light is completely or partially reflected in a mirror-like manner, for example from the surface. If a surface (locally or location-selective) is “shiny” or the like, this can mean that incident light (local or location-selective) is reflected specularly.
  • matt “matting” or the like can be meant that the surface is less shiny compared to an unmatt surface.
  • a surface locally or location-selective
  • incident light local or location-selective
  • a “matting” may be or include a surface treatment that causes the surface to be less shiny.
  • the surface 1 can be part of an outer surface of the device 2. In some embodiments, however, it can also be provided that the entire outer surface of the device 2 is or is structured. In some embodiments, the surface 1 may correspond to the entire external surface of the device 2. If the device 2 is, for example, a roller 11 and/or roller-shaped, the surface 1 can, for example, correspond to at least part of the cylindrical lateral surface, or be identical to the cylindrical lateral surface. If the device 2 is, for example, an embossing plate 12 and/or plate-shaped, the surface 1 can, for example, correspond to at least part of the end face or be identical to the end face.
  • the laser 5 is set up to emit one or more pulses 10 with a pulse duration of less than 30 picoseconds (ps).
  • Laser 5 can be, for example, a picosecond laser or a femtosecond laser.
  • a structure 6 is formed at points 3 of surface 1 to be structured.
  • No structure 6 is formed at points 4 on the surface 1 that do not require structuring.
  • the surface 1 can be structured using laser direct structuring.
  • the structure 6 can be achieved by at least partially removing the surface 1.
  • laser ablation can be carried out at a point 3 to be structured.
  • the surface 1 can at least partially evaporate at or near the point 3 to be structured.
  • the structure 6 may include a depression.
  • the structure 6 can be formed by locally melting the surface i at or near the point 3 to be structured. As a result of the melting, a substantially spherical structure 6 can be or will be formed on or near the point 3 to be structured.
  • the melting can take place without material removal, or no material can be removed from the surface 1 during melting. It can be envisaged to select a laser power of 60W for melting, for example with a pulse duration of 1 picosecond (1 ps).
  • At least one or all of the structure 6 may be formed by a single pulse 10.
  • at least one or all of the structure 6 can be formed by a plurality of pulses 10, i.e. the laser 5 can structure the point 3 to be structured by a plurality of pulses 10 or form the structure 6.
  • the structure 6 can be formed by two, five, ten, fifteen, twenty or fifty or more pulses 10, or a corresponding number of pulses 10 can be delivered to the point 3 to be structured.
  • the number of pulses 10 depends on the power of the laser 5, for example several pulses 10 with a lower power or fewer pulses 10 with a higher power are emitted.
  • the number of pulses 10 can depend on the pulse duration, for example several pulses 10 with a shorter pulse duration or fewer pulses 10 with a higher pulse duration can be emitted.
  • At least one structure 6 can be provided to produce at least one structure 6 by at least partially removing the surface 1 and at least one other structure 6 by melting the surface 1.
  • all of the structures 6 can be formed either by at least partially removing the surface 1 or by melting the surface 1.
  • the structure 6 formed or to be formed at the point 3 to be structured can locally diffusely scatter or locally diffusely reflect incident light.
  • a directed light beam striking the structure 6 can, for example, be diffusely reflected by the structure 6, or non-directionally reflected, and/or non-directional and/or scattered and/or reflected in different spatial directions.
  • this can result in a matting the surface i can be or will be predetermined, or a predetermined matting can be or will be achieved or set.
  • a first part 8 of surface i can be spatially separated and/or spaced apart from a second part 9 of surface 1.
  • the surface 1 can be or will be divided into several parts, for example into a first part 8 and a second part 9.
  • First part 8 and second part 9 can be arranged directly next to one another (see, for example, FIG. 2 above), and/or be spatially separated from one another (see, for example, FIG. 2 below).
  • the surface 1 can be divided into more than two parts.
  • the first part 8 can have a different number of structures 6 than the second part 9, and/or the structures 6 of the respective parts can be distributed or shaped differently, or have different characteristic dimensions. Accordingly, the structures 6 of the first part 8 and the second part 9 can be or will be formed differently.
  • the points of the first part 8 are or will be divided differently than the points of the second part 9 into points to be structured and points not to be structured.
  • the number of points 3 to be structured, their distribution, and/or the ratio of points 3 to be structured to the area of the respective part of the surface 1 can differ.
  • Figure 3 shows an exemplary division of a section of a surface 1, and/or a section of a first part 8 or a second part 9 of the surface 1, into points 3 to be structured and points 4 not to be structured.
  • Points 3 to be structured are shown in Figure 3 as black grid cells and points that cannot be structured 4 shown as white grid cells. It can be provided that a point is represented by a grid cell or corresponds to a grid cell. A point can therefore have, encompass or represent an area. Even if a uniform grid or grid 7 is shown in Figure 3, in some other embodiments the grid 7 or the division into points 3 to be structured and points 4 not to be structured can be done with an irregular grid 7 or grid.
  • the grid 7 or its grid cells can completely cover the surface 1 and/or the first part 8 and/or the second part 9.
  • the grid points of the grid 7 do not necessarily have to be evenly spaced from one another.
  • the grid cells of the grid 7 do not necessarily have to be rectangular. It can be provided that the point 3 to be structured corresponds to the center and/or center of gravity of the grid cell. In some embodiments, however, it can also be provided that the point 3 to be structured essentially corresponds to the grid cell. In some embodiments, it can alternatively or additionally be provided that at least one, several or all of the points can be arranged at nodes of the grid.
  • the grid can have a grid spacing g.
  • the grid spacing g can be smaller than 50 pm.
  • the grid spacing g can be smaller than 20 pm.
  • the grid spacing g can be smaller than 10 pm.
  • exactly one point may be located in a grid cell.
  • the grid spacing g may substantially correspond to the characteristic dimension of the structure 6.
  • the division into points 3 to be structured and points 4 not to be structured can be done in such a way that after structuring the surface 1 has a predetermined marking and/or a predetermined gloss. It can be provided that the ratio of points 3 to be structured to points 4 not to be structured or the ratio of points to be structured 3 to the total number of points, to the area of the surface 1 and / or the total area of the grid cells with increasing predetermined matting and / or lower predetermined gloss increases, or is or will be chosen larger. In the example shown in Figure 3, the ratio can be 0.71 or 71%.
  • the division can take place in such a way that the surface 1 is first divided into grids 7 or grid cells of the grid 7. It can then be successively determined randomly for each grid cell of the grid 7 whether the corresponding grid cell corresponds to a point 3 to be structured or as such is or will be chosen. For example, a probability can be specified with which a corresponding grid cell corresponds to a point 3 to be structured or is or will be selected as such. The probability can be selected depending on the specified matting and/or the specified gloss of the surface 1. In some embodiments, the probability may be between 10% to 100%. In some embodiments, the probability may be 10%, 20%, 30%, 50%, 80%, or 100%.
  • At least one macrostructure 13, not shown in Figure 3, may be disposed on the surface.
  • the macrostructure 13 may have been formed before the points were divided. It can be provided that the grid 7 or grid extends at least partially over a macrostructure 13. In some embodiments, a macrostructure 13 may extend across multiple grid cells. It can be provided that at least one or more of the points 3 to be structured lie on or above a macrostructure 13, and/or at least one or more points lying on or above a macrostructure are assigned to structuring points 3. When the surface 1 is subsequently structured, one or more structures 6 can be or will be formed on or above the macrostructure 13.
  • the ratio of points 3 to be structured to the total number of points or grid cells can be between 10% and 100%. In some embodiments, the ratio may be 10%, 20%, 30%, 50%, 80%, or 100%.
  • the points 3 to be structured do not have to be chosen randomly. It can be provided that the points 3 to be structured and/or the points 4 not to be structured have a pattern and/or a regularity, and/or are or will be distributed according to a pattern and/or a regularity.
  • the division of the points can be done completely before structuring the surface 1. It can be provided to first divide all the points on the surface 1 accordingly, and then to form structures 6 at or near the points 3 to be structured using the laser 5. Accordingly, no structures 6 are added to or near those that are not to be structured Points 4 formed.
  • a plurality of devices 2 are or will be structured with the same distribution of points.
  • it can be provided that 2 points of the surface 1 are newly divided for each device, so that the distribution and/or number of structures 6 of two devices 2 can differ.
  • the division of the points into points 3 to be structured and points 4 not to be structured takes place “on the fly”. For example, it can first be decided for one or more points on the surface 1 whether this or these is or are a point 3 to be structured. A structure 6 with laser 5 can then be formed at the points 3 to be structured. It can then be decided for one or more further points 3 whether this is or are a point 3 to be structured, and then corresponding structures 6 can be or will be formed with laser 5. In this case it can be provided that the distribution and/or number of structures 6 of two devices 2 can differ.
  • the division of the points can be computer-aided and/or automated.
  • the division can be carried out by or with a computer and/or a control unit.
  • the control unit can control the laser 5.
  • Figure 4 shows an example of a matt surface 1 that has been structured by a method according to the invention.
  • the section along line AA is shown in Figure 4 below.
  • the surface 1 of the exemplary embodiment has a macrostructure 13.
  • the macrostructure 13 can be wavy, for example, as shown in Figure 4.
  • the macrostructure 13 can be set up to emboss or engrave a pattern when embossing with the device 2 if the device 2 is, for example, an embossing roller or an embossing plate. If the device 2 is a printing roller or a printing plate, the macrostructure 13 can be set up to produce an impression or the like.
  • a pattern can be embossed or printed onto a substrate using a macrostructure.
  • the macrostructure may 13 are generated during the manufacture of the roller or plate, for example when it is engraved or elevations and depressions are created on the surface for printing or embossing, or when its surface is otherwise treated.
  • the macrostructure 13 can also be a macrostructure 13 of a counter roller that is not designed to produce an impression, imprint, engraving or the like.
  • the macrostructure 13 may be a “side effect” of such treatment.
  • the macrostructure can have characteristic dimensions that can be smaller, possibly much smaller, than characteristic dimensions of an engraving, elevation or depression of the roller or plate.
  • the device 2 or the surface 1 has a macrostructure 13, it can be provided that this is or will be plated.
  • the macrostructure 13 can be or will be plated with chromium and/or nickel.
  • the structures 6 can be or will be superimposed on the macrostructure 13. Compared to the macrostructure 13, the structures 6 can have a smaller, in some cases significantly smaller, for example one or several orders of magnitude smaller, characteristic dimension d.
  • the characteristic dimension d may be less than 10 pm in some embodiments.
  • the characteristic dimension d may be less than 5 pm, less than 3 pm, or less than 2 pm in some embodiments.
  • the characteristic dimension d can be or have a height, width, depth, length, thickness and/or diameter.
  • the structure 6 can, for example, have a structure height of less than or up to 2 pm.
  • the structure 6 can, for example, have a structure width of less than or up to 3 pm.
  • the characteristic dimension of the macrostructure 13 ⁇ m may be one or more orders of magnitude larger than the grid spacing g.
  • the structure 6 can be spherical. “Spherical” can also include structures 6 that have an ellipsoidal shape, a cylindrical shape or a conical shape, and/or are rotationally symmetrical at least about an axis of symmetry. A spherical structure 6 may, in some embodiments, have at least one edge have, and/or does not necessarily have to be smooth. In some embodiments, the structure 6 may alternatively or additionally comprise a depression.
  • Figure 5 shows a surface i with macrostructures 13 formed thereon.
  • white areas correspond to elevations and black depressions.
  • At least one, several or all of the macrostructures 13 can be or will be formed by engraving. Alternatively or additionally, several or all of the macrostructures 13 can be formed, for example, by polishing. If the macrostructures 13 are formed by polishing, the ratio of the area of the macrostructures to the total area of the surface can be predetermined, set or selected, for example by selective polishing. However, the formation of the macrostructures 13 is not necessarily limited to engraving processes or polishing processes; Other methods for forming the macrostructures 13 are also applicable.
  • Structures 6 can thus be distributed over the entire surface 1 shown in FIG. Structures 6 can be formed in particular on or above the macrostructures 13.
  • the surface 1 can also be provided to structure only parts of the surface 1, for example only a first part 8, a second part 9 and a third part 14.
  • the characteristic dimensions and/or shapes of the structures 6 of the respective parts 8, 9 and/or 14 can differ.
  • the selection of the areas or parts of the surface 1 and/or their arrangement, area, the respective assignment of the points or grid 7, and/or the structures 6 to be formed can be or will be selected depending on a predetermined gloss.
  • Figure 5 shows the surface 1 after structuring or after forming the structures 6, but the characteristic dimensions of the structures 6 and/or the grid spacing g are so small compared to the characteristic dimensions of the macrostructures 13 that structures 6 in Figure 5 are not recognizable. In some other embodiments, Figure 5 shows a surface after forming the macrostructures 13, but before structuring the surface 1.
  • FIG. 6 shows exemplary embodiments of the device 2 according to the invention, or surfaces 1 matted using a method according to the invention.
  • the proportion of points 3 and/or structures 6 to be structured in relation to the area of the surface 1 is approximately 10% (top left), 30% (top right). ), 80% (bottom left) and 100% (bottom right).
  • the matting of surface 1 can increase accordingly or surface 1 can become less shiny.
  • Four separate devices 2 can be shown in FIG.
  • a device 2 can be shown viewed from four different sides in FIG. 6, so the device 2 or its surface 1 can have different parts or areas with different matting.
  • a silicone impression can, for example, have a silicone substrate with an impression generated by the device 2.
  • the degree of gloss is measured in “gloss units” (GU), each for a measuring angle of 20°, 6o° and 85°.
  • GUI gloss units
  • Methods for measuring gloss are known, for example, from ASTM D523 (e.g. ASTM D523 -14 (2016)) or DIN EN ISO 2813.
  • a value of 100 GU can correspond to a reference value, which can correspond to the value for a polished, black glass with a defined refractive index.
  • a value of o GU can be defined as the value of a perfect matt surface. Measured values do not necessarily have to be between o GU and 100 GU.
  • a value of more than 70 GU can correspond to a high gloss
  • a value of 10 GU - 70 GU can correspond to a medium gloss
  • a value of less than 10 GU can correspond to a low gloss.
  • gloss levels may be or may be measured greater than 100 GU.
  • a higher GU value can correspond to a higher gloss value. During a measurement, provision can be made to vary the measuring angle, possibly depending on the measured values.
  • the gloss can first be measured at a measuring angle of 6o°. If the measured value in this first measurement is above 70 GU, the measuring angle can be or will be reduced to 20°. If the measured value is below 10 GU, the measuring angle can be or will be increased to 85°. Otherwise, it can be planned to adopt the measured value.
  • the measurement angle can be 0° if it is perpendicular to the measured surface and 90° if it is parallel to the measured surface.
  • the “gloss impression” or measured or recorded gloss can depend on the measuring angle or viewing angle.
  • Figure 7 shows the degree of gloss of the silicone impression with increasing proportion of points 3 or structures 5 to be structured to the area of surface 1, corresponding to the proportion of the lasered area based on surface 1, measured for measuring angles of 20°, 6o° and 85°.
  • the degree of gloss of the silicone impression can decrease as the proportion of points 3 or structures 5 to be structured to the area of the surface 1 increases, corresponding to the proportion of the lasered area relative to the surface 1.
  • the gloss level of the silicone impression can be minimal, regardless of the measuring angle.
  • an exponentially decreasing relationship can occur, see Figure 7.
  • a gloss level of 0.9 GU can result with a proportion of 1 or 100%, i.e. completely lasered surface 1.
  • a very low gloss level of approximately 0.9 GU can also result, while with a steeper measuring angle of 85° there can be a gloss level of slightly more than 50 GU.
  • the silicone impression may appear essentially glossy only when viewed at a flat viewing angle (e.g., a viewing angle almost parallel to the surface), and may appear dull and/or non-glossy when viewed at a large angular range measured relative to the perpendicular to the surface.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

L'invention concerne un procédé de matage d'une surface (1) d'un dispositif (2) de gaufrage ou d'impression, de préférence d'un rouleau (11), d'une plaque de gaufrage (12) ou d'une plaque d'impression, ledit procédé comprenant les étapes suivantes consistant à : diviser des points (3, 4) sur la surface (1) à mater en points (3) à structurer et des points (4) à ne pas structurer ; structurer, de préférence par structuration directe par laser, la surface (1) à l'aide d'un laser (5), le processus de structuration impliquant la formation de structures (6) au niveau des points (3) à structurer, les structures (6) étant conçues pour diffuser la lumière incidente d'une manière localement diffuse, le processus de structuration utilisant un laser (5) qui est conçu pour émettre des impulsions (10) avec une durée d'impulsion inférieure à 30 ps, de préférence un laser picoseconde ou un laser femtoseconde. L'invention porte également sur un dispositif correspondant.
PCT/DE2022/100595 2022-08-12 2022-08-12 Procédé de matage d'une surface d'un dispositif de gaufrage ou d'impression, et dispositif WO2024032836A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/DE2022/100595 WO2024032836A1 (fr) 2022-08-12 2022-08-12 Procédé de matage d'une surface d'un dispositif de gaufrage ou d'impression, et dispositif

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/DE2022/100595 WO2024032836A1 (fr) 2022-08-12 2022-08-12 Procédé de matage d'une surface d'un dispositif de gaufrage ou d'impression, et dispositif

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WO2024032836A1 true WO2024032836A1 (fr) 2024-02-15

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010034085A1 (de) * 2010-08-12 2012-02-16 Giesecke & Devrient Gmbh Prägewerkzeuge für Mikrostrukturelemente
EP3251825A1 (fr) * 2016-05-31 2017-12-06 Boegli-Gravures S.A. Procédé et dispositif de gaufrage de matériau plan
US20180134059A1 (en) * 2015-05-28 2018-05-17 J P Imaging (Wuhan) Limited Improvements relating to printing

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010034085A1 (de) * 2010-08-12 2012-02-16 Giesecke & Devrient Gmbh Prägewerkzeuge für Mikrostrukturelemente
US20180134059A1 (en) * 2015-05-28 2018-05-17 J P Imaging (Wuhan) Limited Improvements relating to printing
EP3251825A1 (fr) * 2016-05-31 2017-12-06 Boegli-Gravures S.A. Procédé et dispositif de gaufrage de matériau plan

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