WO2024000708A1 - 工件批量曝光方法及设备 - Google Patents
工件批量曝光方法及设备 Download PDFInfo
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- WO2024000708A1 WO2024000708A1 PCT/CN2022/107937 CN2022107937W WO2024000708A1 WO 2024000708 A1 WO2024000708 A1 WO 2024000708A1 CN 2022107937 W CN2022107937 W CN 2022107937W WO 2024000708 A1 WO2024000708 A1 WO 2024000708A1
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- workpiece
- camera
- exposure
- positioning marks
- workpieces
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- 238000000034 method Methods 0.000 title claims abstract description 39
- 230000009471 action Effects 0.000 claims description 23
- 238000004364 calculation method Methods 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000001514 detection method Methods 0.000 abstract description 10
- 230000006872 improvement Effects 0.000 description 14
- 230000008569 process Effects 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 238000007689 inspection Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Definitions
- the invention relates to the field of photovoltaic processing technology, and specifically to a workpiece batch exposure method and equipment.
- Solar photovoltaic cell automatic exposure equipment is an equipment system that automatically images and exposes the surface of photovoltaic panels through laser based on optical detection.
- the current automatic exposure equipment is mainly used in the field of circuit boards. Its application in the photovoltaic field is not mature.
- the circuit board Field and existing photovoltaic automatic exposure equipment can only process one workpiece at a time in the workflow, which results in low work efficiency.
- the surface of the circuit board is equipped with easily identifiable through holes and other structures that can be used for positioning marks.
- photovoltaic There are no easily identifiable marks such as through holes on the surface of the solar panel. Therefore, mature optical inspection methods used in the circuit board field cannot be applied in the photovoltaic field.
- the object of the present invention is to provide a method and equipment for batch exposure of workpieces.
- the invention provides a method for batch exposure of workpieces, which includes the steps:
- the edge contour information of each workpiece is obtained simultaneously through multiple fixed cameras, and the offset distance and deflection angle of each workpiece relative to the preset standard position are calculated under the coordinate system;
- the exposure pattern is adjusted based on the offset distance and deflection angle of each workpiece, and multiple workpieces are simultaneously exposed through the adjusted exposure pattern.
- the position information of multiple fixed cameras will be unified into the same coordinate system, specifically including:
- controlling the action camera to capture and acquire the positions of multiple positioning marks provided on the workpiece stage specifically includes:
- the motion camera is controlled to capture and capture the positions of a plurality of positioning marks evenly spaced along the X-axis direction on the workpiece stage.
- controlling the action camera to capture and acquire the positions of multiple positioning marks provided on the workpiece stage also includes:
- the two motion cameras respectively provided at opposite ends of the gantry are controlled to move relative to each other at the same time, and the positions of multiple positioning marks provided on the workpiece stage are photographed and acquired.
- controlling multiple fixed cameras to capture and obtain the positions of the positioning marks within their corresponding lens fields of view specifically includes:
- Each of the fixed cameras is used to capture one of the positioning marks.
- the simultaneous acquisition of edge contour information of each workpiece through multiple fixed cameras specifically includes:
- the light of the light source device is blocked by the workpiece, and a brightness difference is formed between the workpiece surface and the edge peripheral area, and the fixed camera is controlled to capture the workpiece image;
- the edge contour information of each workpiece is detected and obtained in the workpiece image.
- calculating the offset distance and deflection angle of each workpiece relative to the preset standard position in the coordinate system specifically includes:
- the angle between the edge contour of the workpiece and the edge contour of the workpiece in the standard exposure pattern is calculated to obtain the deflection angle of the workpiece.
- An image of the exposed workpiece is captured, and the exposure pattern of the workpiece is compared with a standard exposure pattern.
- the invention also provides a workpiece batch exposure equipment, including:
- the workpiece carrier can at least move along the Y-axis direction, and the surface of the workpiece carrier can simultaneously place multiple workpieces arranged in an array on the XY-axis plane;
- a fixed camera group includes a plurality of fixed cameras disposed above the workpiece stage, which are configured to capture images of the workpiece on the workpiece stage. When combined, the fields of view of the plurality of fixed cameras at least cover the workpiece stage.
- a processor coordinate calculation unit configured to unify multiple fixed camera position information into the same coordinate system
- a processor image processing unit configured to calculate the offset distance and deflection angle of each workpiece relative to the preset standard position in the coordinate system based on the workpiece image captured by the fixed camera, and based on each Describe the offset distance and deflection angle of the workpiece, and adjust the exposure pattern;
- An exposure device is configured to simultaneously expose a plurality of workpieces distributed in an array on the workpiece stage according to the adjusted exposure pattern.
- the surface of the workpiece carrier is provided with a plurality of positioning marks, and the positioning marks are evenly spaced along the X-axis direction of the surface of the workpiece carrier.
- the field of view of each fixed camera covers at least one of the positioning marks.
- the present invention also includes: at least one action camera.
- the action camera is arranged above the workpiece stage and can move at least along the X-axis direction. It is configured to move and photograph the workpiece stage in sequence. positioning marks on.
- a gantry which includes a crossbeam erected above the workpiece carrier, and vertical beams arranged downward along both ends of the crossbeam, and the crossbeam is arranged along the X-axis direction. Extending, the fixed cameras are evenly spaced on the crossbeam, and the moving cameras are disposed on the crossbeam and can reciprocate along the crossbeam.
- the present invention includes two motion cameras arranged on the crossbeam, and the two motion cameras are added to move relatively reciprocally along the crossbeam.
- the present invention also includes: a light source device, which is disposed on the surface of the workpiece stage. After being opened, the light source device can emit light toward the fixed camera lens.
- a processor recheck unit configured to acquire a post-exposure workpiece image and compare the post-exposure workpiece image with a standard exposure pattern.
- the workpiece batch exposure method and equipment provided by the present invention can simultaneously photograph and image detect workpieces arranged in batches in an array through a fixed camera group. After obtaining the edge contour information of the workpiece based on image information detection, The offset information and deflection angle of the workpiece are provided to the exposure device, and the exposure pattern is adjusted before exposure processing is performed.
- the method and equipment are suitable for workpieces without positioning marks on the surface, and can accurately perform coordinate position detection and exposure processing on large batches of workpieces at the same time.
- the workpiece pattern exposure accuracy is high while the work efficiency is high.
- Fig. 1 is a left side view of a workpiece batch exposure equipment in one embodiment of the present invention.
- FIG 2 is a top view of the workpiece stage in one embodiment of the present invention (a gantry, a fixed camera group, and a motion camera are shown for convenience of explanation).
- Figure 3 is a left view of a workpiece batch exposure equipment (including two workpiece stages) in another embodiment of the present invention.
- FIG. 4 is a front view of a workpiece batch exposure equipment (including two workpiece stages) in another embodiment of the present invention.
- Figure 5 is a front view of a workpiece batch exposure equipment (including two oppositely arranged workpiece stages) in another embodiment of the present invention.
- FIG. 6 is a front view of the workpiece stage in one embodiment of the present invention (a gantry and a fixed camera group are shown for convenience of explanation).
- FIG. 7 is a schematic flowchart of a batch exposure method of workpieces in an embodiment of the present invention.
- this article uses terms indicating relative positions in space, such as “upper”, “lower”, “back”, “front”, etc., to describe one unit or feature shown in the drawings relative to another.
- Spatially relative terms may refer to different orientations of the device in use or operation in addition to the orientation illustrated in the figures. For example, if the device in the diagram is turned over, elements described as “below” or “above” other elements or features would then be oriented “below” or “above” the other elements or features.
- the exemplary term “below” may encompass both spatial orientations, below and above.
- this embodiment provides a method and equipment 1 for batch exposure of workpieces.
- the exposure equipment 1 performs batch exposure processing on workpieces 2 through the method, and is particularly suitable for surfaces without obvious positioning marks 113. Exposure processing of workpiece 2.
- it is specifically used to expose photovoltaic panels 2a, which is different from the existing technical solution in which only one photovoltaic panel 2a can be exposed at a time, or the photovoltaic panels can be exposed in turn by rotating the workpiece stage.
- the battery panel 2a is exposed.
- the equipment 1 and the method provided by this embodiment can batch expose multiple photovoltaic battery panels 2a at the same time, thereby significantly improving the efficiency of the exposure process of the workpiece 2, and the method provided has accurate image recognition. The efficiency is high and the exposure pattern formed has high precision.
- this embodiment introduces the exposure method based on a specific exposure equipment 1.
- the exposure equipment 1 is first introduced below.
- the present invention provides a workpiece batch exposure equipment 1, which includes: a workpiece stage 11, a fixed camera group 12, a motion camera 13, a gantry 14, an exposure device 15 and a processor.
- the workpiece carrier 11 is used to carry the workpiece 2;
- the fixed camera group 12 includes multiple cameras for photographing the workpiece 2;
- the action camera 13 is used to unify the coordinate system of the auxiliary fixed camera group 12;
- the gantry 14 is erected on the workpiece Above the stage 11, it is used to place the fixed camera group 12 and the action camera 13;
- the exposure device 15 is used to expose the workpiece 2;
- the processor includes multiple computing units for processing the captured image data and based on the data Issue work orders.
- the exposure equipment 1 is roughly divided into a loading area a, an automatic optical detection area b, an exposure area c, and a discharging area d.
- the gantry 14 and its fixed camera group 12 and action camera 13 are located in the automatic optical detection area b, and the packaging device is located in the exposure area c.
- the workpiece carrier 11 can at least move along the Y-axis direction, and the surface of the workpiece carrier 11 can simultaneously place multiple workpieces 2 arranged in an array on the XY-axis plane.
- the surface area of the workpiece carrier 11 is larger than that of the same type of workpiece carrier in the prior art, which can only place one workpiece 2, so that it can be used to place a batch of workpieces 2 arranged in an array.
- multiple workpieces 2 can be processed in batches at the same time, thereby improving equipment work efficiency.
- the outer contour of the photovoltaic cell panel 2a is rectangular, and 21 photovoltaic cell panels 2a can be placed on the surface of the workpiece carrier 11.
- the photovoltaic cell panels 2a are arranged in a 3 ⁇ 7 array.
- the size of the workpiece carrier 11 can be specifically adjusted according to factors such as the size of the workpieces 2, the arrangement of the workpieces 2, the processing performance of the equipment 1, etc., so that it can place an appropriate amount of workpieces 2.
- the positioning marks are combined with the motion camera 13 and the fixed camera 12a. 113 to complete the calibration. Therefore, a plurality of positioning marks 113 are provided on the surface of the workpiece stage 11 .
- the positioning marks 113 are evenly spaced along the X-axis direction on the surface of the workpiece stage 11 .
- the positioning marks 113 are used to assist after being photographed by the fixed camera group 12 and the action camera 13 Calibrate the 12 positions of the fixed camera group.
- the fixed cameras 12a are distributed along the X-axis.
- the positioning marks 113 provided on the surface of the workpiece stage 11 are distributed along the X-axis direction.
- the positioning marks 113 can be set corresponding to the number of workpieces 2 arranged in the X-axis direction of the workpiece stage 11 in combination with the field of view of the fixed camera 12a.
- one positioning mark 113 is respectively set at a position corresponding to both ends of the workpiece 2. , so that the calibration accuracy of the fixed camera 12a is higher.
- positioning marks 113 are provided at one end of the surface of the workpiece stage 11.
- the shape of the positioning marks 113 may be symbols with a certain degree of identification, such as a cross shape.
- other numbers of positioning marks 113 can also be set in other areas of the workpiece 2 table surface, as long as the position calibration can be completed in combination with the field of view of the fixed camera 12a.
- the fixed camera group 12 can be calibrated directly through the workpiece stage 11 and the coordinate system can be unified. There is no need to calibrate through an additional calibration plate, which eliminates the possibility that the calibration plate itself may have It is simple and efficient and has high calibration accuracy.
- the workpiece carrier 11 can first complete the loading work in the loading area a, and at the same time, load multiple photovoltaic cell panels 2a onto the workpiece carrier 11 and move along the Y-axis to the automatic optical detection area b. After the photovoltaic panel 2a is identified by the fixed camera group 12, it continues to move along the Y-axis to the exposure device 15 for exposure, and finally moves along the Y-axis to the discharge area d, thus completing a complete process.
- the workpiece batch exposure equipment 1 includes at least two workpiece stages 11, and the workpiece stage 11 includes a driving base 111 and a
- the drive base 111 can drive the platform 112 to reciprocate along the Y-axis, and control the platform 112 to reciprocate up and down along the Z-axis.
- the equipment can be further improved. 1 work efficiency.
- two workpiece carriers 11 can be provided, namely a first workpiece carrier 11a and a second workpiece carrier 11b.
- the first workpiece carrier 11a is performing a work process
- the second workpiece carrier 11 11b is preparing for loading.
- the height of the carrier surface 112 is adjusted at the same time to avoid interference and collision with the second workpiece carrier 11b.
- the second workpiece carrier 11a Station 11b starts the workflow.
- the first workpiece carrier 11a and the second workpiece carrier 11b alternately perform a work process, thereby further improving work efficiency.
- the stage surface 112 is divided into a working area 1121 and a driving connection area 1122.
- the working area 1121 is used to place the workpiece 2, and the bottom surface of the driving connection area 1122 is connected to the driving base 111.
- the working areas 1121 of the first workpiece stage 11a and the second workpiece stage 11b are overlapped and arranged under the fixed camera group 12 and the exposure device 15.
- the driving connection areas 1122 are respectively provided on opposite sides along the X-axis direction.
- the first The driving bases of the workpiece carrier 11a and the second workpiece carrier 11b are also respectively arranged on opposite sides along the X-axis direction, so that when the first workpiece carrier 11a and the second workpiece carrier 11b move relative to each other, through adjustment
- the height of the stage surface 112 can avoid interference and collision between the first workpiece stage 11a and the second workpiece stage 11b during relative movement, thereby realizing staggered movement of the two.
- the working areas 1121 are overlapped, the drive connection areas 1122 are arranged inwardly inward along the side positions, or other existing methods are provided by adjusting the carrier surface.
- the height of 112cm enables staggered movement between different stages.
- first workpiece carrier 1 a and the second workpiece carrier 1 b may also be respectively disposed on opposite sides along the X-axis direction.
- the relatively distributed first workpiece carrier 1a and the second workpiece carrier 1b do not need to adjust the height of the carrier surface 112, the structure is simpler, and the equipment reliability is high.
- the gantry 14 includes a cross beam 141 erected above the workpiece carrier 11 and vertical beams 142 provided downward along both ends of the cross beam 141.
- the cross beam 141 extends along the X-axis direction.
- the fixed camera group 12 includes a plurality of fixed cameras 12a disposed on the beam 141, which are configured to capture images of the workpiece 2 on the workpiece stage 11.
- the combined field of view of the plurality of fixed cameras 12a covers at least the edge X of the surface of the workpiece stage 11 A row of workpieces 2 arranged in the axial direction.
- each fixed camera 12a covers at least one positioning mark 113 to ensure that each fixed camera 12a can perform coordinate calibration based on the positioning mark 113 it captures.
- each fixed camera 12a corresponds to a positioning mark 113.
- the six fixed cameras 12a can completely take pictures along the X-axis.
- the number and distribution of the fixed cameras 12a can be adjusted. After being combined, the fixed camera group 12 can at least completely photograph the workpieces 2 distributed along the X-axis in a row on the workpiece stage 11.
- At least one motion camera 13 is disposed above the workpiece stage 11 and can move at least along the X-axis direction. It is configured to sequentially move and photograph the positioning marks 113 on the workpiece stage 11 .
- the action camera 13 moves along the X-axis and photographs each positioning mark 113 in sequence. Since it is a continuous motion shooting, the position coordinates of the positioning mark 113 photographed by it are compared and converted with the positioning position coordinates photographed by the multiple fixed cameras 12a, that is, The fixed cameras 12a can be unified to the same coordinate system.
- the processor coordinate calculation unit compares and converts the position of the positioning mark 113 shot by the action camera 13 and the fixed camera 12a, and unifies the action camera 13 and multiple fixed cameras 12a in the same coordinate system.
- the workpiece batch exposure equipment 1 includes two motion cameras 13 arranged on the beam 141 , and the two motion cameras move relatively reciprocally along the beam 141 .
- work efficiency and calibration accuracy can be further improved.
- the fixed camera 12a can also be calibrated by setting a fixed calibration ruler. In this case, there is no need to set the action camera 13 and the positioning mark 113.
- the calibration method is simpler, but compared with the action camera 13. Its calibration accuracy is low.
- the fixed camera 12a takes an image of the workpiece 2
- the processor image processing unit calculates the offset distance and deflection angle of each workpiece 2 relative to the preset standard position in the coordinate system based on the image of the workpiece 2 taken by the fixed camera 12a. , and adjust the exposure pattern based on the offset distance and deflection angle of each workpiece 2.
- the image processing unit of the processor calculates the center coordinate information of the workpiece 2 based on the edge contour position information of the workpiece 2, and compares it with the center position of the workpiece 2 in the preset standard exposure pattern to calculate the coordinate information of the workpiece 2. Offset distance; calculate the angle between the edge contour of workpiece 2 and the edge contour of workpiece 2 in the standard exposure pattern, and obtain the deflection angle of workpiece 2.
- the processor image processing unit may be configured to detect the deflection angle based on one side of the photovoltaic cell panel 2a, or to detect the deflection angle on multiple sides and then calculate an average value.
- the outer contour of the workpiece 2 is circular, it is only necessary to calculate the offset distance of the center of the circle after calculating the position of the center of the circle.
- the workpiece batch exposure equipment 1 also includes a light source device 114.
- the light source device 114 is disposed on the surface of the workpiece stage 11. After being opened, the light source device 114 can illuminate the fixed camera.
- the 12a lens shoots light. Since the photovoltaic panels 2a are opaque silicon wafers, the area between the photovoltaic panels 2a will be illuminated by the light source, and the light in the area of the photovoltaic panels 2a will be blocked, so that the fixed camera 12a can capture the area of the photovoltaic panels 2a.
- a high-contrast image is formed with the peripheral area. In the image captured by this method, the edge contour of the photovoltaic panel 2a is clear and easy to distinguish. Therefore, the edge contour information of the workpiece 2 can be accurately detected and identified in the image to calculate the offset distance and deflection angle.
- the surface of the workpiece stage 11 can also be set to a color that is significantly different from the surface color of the workpiece 2 based on the specific category of the workpiece 2 and based on its surface topography, thereby directly making the photographed image
- the edge contour information of workpiece 2 in the photo is easy to identify.
- the exposure device 15 simultaneously exposes multiple workpieces 2 distributed in an array on the workpiece stage 11 according to the adjusted exposure pattern, thereby completing the batch exposure process of the workpieces 2 .
- the workpiece batch exposure equipment 1 also includes a processor re-inspection unit.
- the re-inspection unit is configured to obtain an image of the exposed workpiece 2 and compare the image of the exposed workpiece 2 with a standard exposure pattern. Compare. Since the photosensitive material on the surface of the photovoltaic panel 2a will produce obvious color changes after the exposure is completed, the post-exposure image can be taken again to compare with the standard exposure pattern. When it is judged that there is a defective product, an alarm reminder will be issued, thereby reducing the production of defective products. out, and due to the large contrast differences in different color areas, the discrimination accuracy is high.
- this embodiment also provides a batch exposure method of workpieces, including the steps:
- S2 Place multiple workpieces 2 on the workpiece stage 11 so that the multiple workpieces 2 are arranged in an array on the surface of the stage.
- S3 Acquire edge contour information of each workpiece 2 simultaneously through multiple fixed cameras 12a, and calculate the offset distance and deflection angle of each workpiece 2 relative to the preset standard position in the coordinate system.
- step S1 it specifically includes:
- S11 Move the workpiece stage 11 along the Y-axis direction, move the motion camera 13 along the X-axis direction, and control the movement camera 13 to capture the positions of multiple positioning marks 113 provided on the workpiece stage 11.
- two motion cameras 13 respectively located at opposite ends of the gantry 14 are controlled to move relative to each other at the same time, and a plurality of positioning marks evenly spaced along the X-axis direction on the workpiece stage 11 are captured. 113 position.
- S12 Control multiple fixed cameras 12a to capture and obtain the positions of the positioning marks 113 within the field of view of their corresponding lenses.
- a plurality of fixed cameras 12a evenly spaced along the X-axis direction on the gantry 14 are controlled to capture and obtain the position of the positioning mark 113 within the field of view of the corresponding lens; each fixed camera 12a is used for Photograph a positioning mark 113.
- S13 Compare and convert the positions of the positioning marks 113 captured by the action camera 13 and the fixed camera 12a, and unify the action camera 13 and the plurality of fixed cameras 12a in the same coordinate system.
- step S3 it specifically includes:
- S31 Turn on the light source device 114 located on the plane of the workpiece stage 11. The light of the light source device 114 is blocked by the workpiece 2. A brightness difference is formed between the surface of the workpiece 2 and the peripheral area of the edge.
- the fixed camera 12a is controlled to capture the image of the workpiece 2.
- step S4 it specifically includes:
- S42 Calculate the angle between the edge contour of the workpiece 2 and the edge contour of the workpiece 2 in the standard exposure pattern, and obtain the deflection angle of the workpiece 2.
- S5 Photograph and obtain the exposed workpiece 2, and compare the exposure pattern of the workpiece 2 with the standard exposure pattern.
- the workpiece batch exposure method and equipment provided by the present invention can simultaneously photograph and image detect workpieces arranged in batches in an array through a fixed camera group. After obtaining the edge contour information of the workpiece based on image information detection, the workpieces can be The offset information and deflection angle are provided to the exposure device, and the exposure pattern is adjusted before exposure processing is performed.
- the method and equipment are suitable for workpieces without positioning marks on the surface, and can accurately perform coordinate position detection and exposure processing on large batches of workpieces at the same time.
- the workpiece pattern exposure accuracy is high while the work efficiency is high.
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Abstract
一种工件批量曝光方法及设备（1），方法和设备（1）适用于表面没有定位标记的工件（2），所提供的工件批量曝光方法和设备（1）能够通过固定相机组（12）同时对批量呈阵列排布的工件（2）进行拍摄和图像检测，基于图像信息检测获得工件（2）边缘轮廓信息后，将工件（2）的偏移信息和偏转角度提供给曝光装置（15），对曝光图案调整后进行曝光处理。
Description
本申请要求了申请日为2022年6月29日，申请号为202210762452.8，发明名称为“工件批量曝光方法及设备”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
本发明涉及光伏加工技术领域，具体地涉及一种工件批量曝光方法及设备。
太阳能光伏电池自动曝光设备是基于光学检测通过激光自动对光伏电池板表面成像曝光的设备系统，但目前的自动曝光设备主要应用于电路板领域，其在光伏领域的应用并不成熟，在电路板领域及现有的光伏自动曝光设备在工作流程中单次只能对一个工件进行处理，工作效率低下，并且电路板表面设置有易于识别的通孔等可以用于定位标记的结构，而在光伏电池板表面并没有诸如通孔等易于识别的标志，因此，在电路板领域应用成熟的光学检测方法也无法在光伏领域适用。
发明内容
本发明的目的在于提供一种工件批量曝光方法及设备。
本发明提供一种工件批量曝光方法，包括步骤：
将多个固定定相机位置信息统一至同一坐标系；
将多个工件置于工件载台，使多个所述工件于载台表面呈阵列排布；
通过多个所述固定相机同时获取每个工件边缘轮廓信息，在所述坐标系下计算每个工件相对于预设标准位置的偏移距离及偏转角度；
基于每个所述工件的偏移距离及偏转角度，对所述曝光图形进行调整，并经由调整后曝光图形对多个所述工件同时进行曝光处理。
作为本发明的进一步改进，将将多个固定定相机位置信息统一至同一坐标系，具体包括：
沿Y轴方向移动工件载台，沿X轴方向移动运动相机，控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置；
控制多个所述固定相机分别拍摄获取其对应镜头视野内的所述定位标记的位置；
比较换算所述运动相机和所述固定相机所拍摄的所述定位标记的位置，将所述运动相机和多个所述固定相机统一在同一坐标系内。
作为本发明的进一步改进，所述控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置，具体包括：
控制所述运动相机拍摄获取设于工件载台上沿X轴方向间隔均匀分布的多个所述定位标记的位置。
作为本发明的进一步改进，所述控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置，还包括：
控制分别设于龙门架上相对两端的两个所述运动相机同时相对运动，拍摄获取设设于所述工件载台上的多个定位标记位置。
作为本发明的进一步改进，所述控制多个所述固定相机分别拍摄获取其对应镜头视野内的所述定位标记的位置，具体包括：
控制多个于龙门架上沿X轴方向间隔均匀分布的固定相机分别拍摄获取其对应镜头视野内的所述定位标记位置；
每个所述固定相机分别用于拍摄一个所述定位标记。
作为本发明的进一步改进，所述通过多个所述固定相机同时获取每个工件边缘轮廓信息，具体包括：
开启位于所述工件载台平面的光源装置，所述光源装置光线被所述工件遮挡，所述工件表面与边缘周侧区域形成亮度差，控制所述固定相机拍摄所述工件图像；
于所述工件图像中检测获取各工件边缘轮廓信息。
作为本发明的进一步改进，所述在所述坐标系下计算每个工件相对于预设标准位置的偏移距离及偏转角度，具体包括：
基于所述工件边缘轮廓位置信息计算所述工件中心坐标信息，并与预设的所述标准曝光图案中工件中心位置进行比较，计算得到所述工件的偏移距离；
计算所述工件边缘轮廓与所述标准曝光图案中工件边缘轮廓之间的夹角，得到所述工件的偏转角度。
作为本发明的进一步改进，还包括步骤：
拍摄获取曝光后的工件图像，将所述工件的曝光图案与标准曝光图案进行比较。
本发明还提供一种工件批量曝光设备，包括：
工件载台，至少能够沿Y轴方向运动，所述工件载台表面能够同时放置在XY轴平面呈阵列排布的多个工件；
固定相机组，包括多个设置于所述工件载台上方的固定相机，其被配置用于拍摄所述工件载台上工件的图像，多个所述固定相机视野组合后至少覆盖所述工件载台表面沿X轴方向排布的一行工件；
处理器坐标计算单元，其被配置用于将多个所述固定相机位置信息统一至同一坐标系；
处理器图像处理单元，其被配置用于根据所述固定相机所拍摄的工件图像在所述坐标系下计 算每个工件相对于预设标准位置的偏移距离及偏转角度，并基于每个所述工件的偏移距离及偏转角度，对所述曝光图形进行调整；
曝光装置，其被配置用于根据调整后曝光图形对所述工件载台上阵列分布的多个所述工件同时进行曝光处理。
作为本发明的进一步改进，所述工件载台表面设置有多个定位标记，所述定位标记沿所述工件载台表面X轴方向均匀间隔分布。
作为本发明的进一步改进，每个所述固定相机的视野至少覆盖一个所述定位标记。
作为本发明的进一步改进，还包括：至少一个运动相机，所运动相机述设置于所述工件载台上方，且至少能够沿X轴方向运动，其被配置用于依次运动拍摄所述工件载台上的定位标记。
作为本发明的进一步改进，还包括：龙门架，所述龙门架包括架设于所述工件载台上方的横梁，和沿所述横梁两端向下设置的立梁，所述横梁沿X轴方向延伸，所述固定相机均匀间隔设置于所述横梁上，所述运动相机设置于所述横梁上，可沿所述横梁往复运动。
作为本发明的进一步改进，包括两个设于横梁上所述运动相机，两个所述运动相加沿所述横梁相对往复运动。
作为本发明的进一步改进，还包括：光源装置，所述光源装置设置于所述工件载台表面，被打开后，所述光源装置能够向所述固定相机镜头射出光线。
作为本发明的进一步改进，还包括：处理器复检单元，所述处理器复检单元被配置用于获取曝光后工件图像，并将所述曝光后工件图像与标准曝光图案进行比较。
本发明的有益效果是：本发明所提供的工件批量曝光方法和设备能够通过固定相机组同时对批量呈阵列排布的工件进行拍摄和图像检测，基于图像信息检测获得工件边缘轮廓信息后，将工件的偏移信息和偏转角度提供给曝光装置，对曝光图案调整后进行曝光处理。方法和设备适用于表面没有定位标记的工件，能够准确对大批量工件同时进行坐标位置检测和曝光处理，工作效率高的同时工件图案曝光准确率高。
图1是本发明一实施方式中的工件批量曝光设备的左视图。
图2是本发明一实施方式中的工件载台的俯视图(为便于说明示出龙门架、固定相机组和运动相机)。
图3是本发明另一实施方式中的工件批量曝光设备的左视图(包括两个工件载台)。
图4是本发明另一实施方式中的工件批量曝光设备的正视图(包括两个工件载台)。
图5是本发明另一实施方式中的工件批量曝光设备的正视图(包括两个相对设置的工件载台)。
图6是本发明一实施方式中的工件载台的正视图(为便于说明示出龙门架和固定相机组)。
图7是本发明一实施方式中的工件批量曝光方法的流程示意图。
为使本发明的目的、技术方案和优点更加清楚，下面将结合本发明具体实施方式及相应的附图对本发明技术方案进行清楚、完整地描述。显然，所描述的实施方式仅是本发明一部分实施方式，而不是全部的实施方式。基于本发明中的实施方式，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施方式，都属于本发明保护的范围。
下面详细描述本发明的实施方式，实施方式的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的，仅用于解释本发明，而不能理解为对本发明的限制。
为方便说明，本文使用表示空间相对位置的术语来进行描述，例如“上”、“下”、“后”、“前”等，用来描述附图中所示的一个单元或者特征相对于另一个单元或特征的关系。空间相对位置的术语可以包括设备在使用或工作中除了图中所示方位以外的不同方位。例如，如果将图中的装置翻转，则被描述为位于其他单元或特征“下方”或“上方”的单元将位于其他单元或特征“下方”或“上方”。因此，示例性术语“下方”可以囊括下方和上方这两种空间方位。
如图1和图2所示，本实施方式提供一种工件批量曝光方法和设备1，所述曝光设备1通过所述方法批量对工件2进行曝光处理，特别适用于针对表面无明显定位标记113的工件2的曝光处理。在本实施方式中，其具体用于对光伏电池板2a的曝光处理，区别于现有技术方案中的单次只能对一块光伏电池板2a进行曝光操作、或通过旋转工件载台轮流对光伏电池板2a进行曝光操作，本实施方式所提供的设备1和方法能够同时批量对多块光伏电池板2a进行曝光处理，从而显著提升工件2的曝光工序进行效率，并且所提供的方法图像识别准确率高，所形成的曝光图案精度高。
为便于说明，本实施方式基于一具体曝光设备1对曝光方法进行介绍，以下先对曝光设备1进行介绍。
如图1所示，本发明提供一种工件批量曝光设备1，包括：工件载台11、固定相机组12、运动相机13、龙门架14、曝光装置15和处理器。工件载台11用于承载工件2；固定相机组12包括多个相机，用于对工件2进行拍摄设别；运动相机13用于对辅助固定相机组12统一坐标系；龙门架14架设于工件载台11上方，用于放置固定相机组12和运动相机13；曝光装置15用于对工件2进行曝光；处理器包括多个计算单元，用于对所拍摄的图像数据进行处理，并基于数据发出工作指令。
沿Y轴方向，即沿曝光设备1内部工件2流水线运动方向，曝光设备1大致分为上料区a、 自动光学检测区b、曝光区c和出料区d。龙门架14及其上的固定相机组12和运动相机13位于自动光学检测区b，包装装置位于曝光区c。
如下对各部分进行具体介绍。
工件载台11至少能够沿Y轴方向运动，工件载台11表面能够同时放置在XY轴平面呈阵列排布的多个工件2。
具体的，工件载台11表面相较于现有技术中同类型只能放置一个工件2的工件载台，其表面积尺寸较大，从而能够用于放置批量呈阵列排布的工件2，以在后续的光学图像识别和曝光工序中能够对多个工件2同时进行批量处理，提高设备工作效率。
示例性的，在本实施方式中，光伏电池板2a外轮廓呈长方形，工件载台11表面能够放置21块光伏电池板2a，光伏电池板2a以3×7的阵列排布。
在本发明的其他实施方式中，可根据工件2尺寸大小、工件2排布方式、设备1处理性能等因素而对工件载台11尺寸进行具体调整，而使其能够放置适量的工件2。
进一步的，由于在进行对工件2进行图像处理之前，需要完成对固定相机组12之间不同固定相机12a之间的标定，而在本实施方式中，通过运动相机13和固定相机12a结合定位标记113来完成标定。因此，在工件载台11表面设置有多个定位标记113，定位标记113沿工件载台11表面X轴方向均匀间隔分布，定位标记113在被固定相机组12和运动相机13拍摄后用以辅助对固定相机组12位置进行标定。由于工件载台11相对于固定相机组12沿Y轴运动，为了使固定相机组12能够完整对工件载台11表面工件2进行拍摄，因此固定相机12a沿X轴向分布设置，相对应的，设置在工件载台11表面的定位标记113为沿X轴向分布。
进一步的，定位标记113可以结合固定相机12a的视野大小，而对应于工件2在工件载台11X轴向的排布数量而设置，如分别在对应于工件2两端的位置分别设置一个定位标记113，以使固定相机12a标定的准确率更高。
示例性的，在本实施方式中，在工件载台11表面一端处设置有6个定位标记113，定位标记113形状可以为具有一定标识度的符号，如十字形等。
在本发明的其他实施方式中，也可在工件2台面其他区域位置设置其他数量的定位标记113，只要能够结合固定相机12a视野完成位置标定即可。
通过直接在工件载台11表面设置定位标记113，可以直接通过工件载台11对固定相机组12完成标定而统一坐标系，无需在通过额外设置的标定板进行标定，排除了标定板本身可能带来的误差，简便高效的同时，标定准确率高。
工件载台11通过沿Y轴方向运动，可先在上料区a完成上料工作，同时将多个光伏电池板2a装载至工件载台11上，沿Y轴运动至自动光学检测区b，通过固定相机组12对光伏电池板2a进行识别后，继续沿Y轴运动至曝光装置15处进行曝光，最后沿Y轴运动至出料区d，从而 完成一次完整流程。
进一步的，如图3和图4所示，在本发明的一些实施方式中，工件批量曝光设备1包括至少两个工件载台11，工件载台11包括驱动基台111和设于驱动基台111上的载台面112，驱动基台111能够带动载台面112沿Y轴往复运动，并控制载台面112沿Z轴上下往复运动，通过至少两个工件载台11交替往复运动，能够进一步提高设备1工作效率。
比如在一实施方式中，可设置两个工件载台11，分别为第一工件载台11a和第二工件载台11b，当第一工件载台11a在进行工作流程时，第二工件载台11b在进行上料准备，当第一工件载台11a进行下料后沿Y轴运动返回，并同时调整载台面112高度，避免与第二工件载台11b发生干涉碰撞，此时第二工件载台11b开始进行工作流程。第一工件载台11a和第二工件载台11b交替往复进行工作流程从而可进一步提高工作效率。载台面112分为工作区1121和驱动连接区1122，工作区1121用以放置工件2，驱动连接区1122底面与驱动基台111相连。第一工件载台11a和第二工件载台11b的工作区1121重叠对位设于固定相机组12和曝光装置15下，驱动连接区1122分别设置于沿X轴方向相对的一侧，第一工件载台11a和第二工件载台11b的驱动基台也分别对应设置于沿X轴方向相对的一侧，从而当第一工件载台11a和第二工件载台11b相对运动时，通过调整载台面112的高度，即可避免第一工件载台11a和第二工件载台11b在相对运动时发生干涉碰撞，实现两者的交错运动。
当设置有3个或更多的工件载台11时，可以参考上述结构，工作区1121重叠设置，驱动连接区1122沿侧边位置依次向内缩进设置，或者其他现有的通过调节载台面112高度可使不同载台之间交错运动的结构。
如图5所示，在另一些实施方式中，第一工件载台1a和第二工件载台1b也可分别设置于沿X轴方向的相对两侧。相对分布的第一工件载台1a和第二工件载台1b无需对载台面112的高度进行调整，结构更加简单，设备可靠性高。
龙门架14包括架设于工件载台11上方的横梁141，和沿横梁141两端向下设置的立梁142，横梁141沿X轴方向延伸。
固定相机组12包括多个设置于横梁141上的固定相机12a，其被配置用于拍摄工件载台11上工件2的图像，多个固定相机12a视野组合后至少覆盖工件载台11表面沿X轴方向排布的一行工件2。通过固定相机组12可以完成对大面积工件载台11的快速拍摄，从而提高设备1运行效率。
进一步的，每个固定相机12a的视野至少覆盖一个定位标记113，以确保每个固定相机12a能够基于其所拍摄的定位标记113而进行坐标标定。
示例性的，在本实施方式中，在横梁141上设置有均匀间隔分布的6个固定相机12a，每个固定相机12a分别对应于一个定位标记113。6个固定相机12a能够完整拍摄沿X轴分布的一行 3个工件2，工件载台11沿X轴运动，完成沿Y轴分布的阵列工件2的拍摄。
在本发明的其他实施方式中，固定相机12a的数量及分布方式可进行调整，固定相机组12经组合后能够至少完整拍摄在工件载台11上一行沿X轴分布的工件2即可。
至少一个运动相机13设置于工件载台11上方，且至少能够沿X轴方向运动，其被配置用于依次运动拍摄工件载台11上的定位标记113。运动相机13沿X轴运动，依次拍摄每个定位标记113，由于其为连续运动拍摄，将其拍摄的定位标记113的位置坐标和多个固定相机12a所拍摄的定位位置坐标进行对比换算，即可将固定相机12a统一至同一坐标系。
在运动相机13进行拍摄后，处理器坐标计算单元比较换算运动相机13和固定相机12a所拍摄的定位标记113的位置，将运动相机13和多个固定相机12a统一在同一坐标系内。
进一步的，在本实施方式中，工件批量曝光设备1包括两个设于横梁141上运动相机13，两个运动相机沿横梁141相对往复运动。通过设置两个运动相机13可以进一步提高工作效率和提高标定准确率。
在本发明的其他实施方式中，也可通过设置固定的标定尺等方式来对固定相机12a进行标定，此时无需设置运动相机13以及定位标记113，标定方法更加简单，但相比于运动相机13，其标定精度较低。
在完成标定后，固定相机12a拍摄工件2图像，处理器图像处理单元根据固定相机12a所拍摄的工件2图像在坐标系下计算每个工件2相对于预设标准位置的偏移距离及偏转角度，并基于每个工件2的偏移距离及偏转角度，对曝光图案进行调整。
具体的，处理器图像处理单元完成对图像进行识别后，基于工件2边缘轮廓位置信息计算工件2中心坐标信息，并与预设的标准曝光图案中工件2中心位置进行比较，计算得到工件2的偏移距离；计算工件2边缘轮廓与标准曝光图案中工件2边缘轮廓之间的夹角，得到工件2的偏转角度。
处理器图像处理单元可被配置为基于光伏电池板2a一条边进行偏转角度的检测，或对多条边进行偏转角度检测后求取平均值。另外，当工件2的外轮廓呈圆形时，只需计算出圆心位置后，对圆心的偏移距离进行计算即可。
进一步的，如图6所示，在本发明一些实施方式中，工件批量曝光设备1还包括光源装置114，光源装置114设置于工件载台11表面，被打开后，光源装置114能够向固定相机12a镜头射出光线。由于光伏电池板2a为不透光的硅片，因此光伏电池板2a之间的区域会被光源照亮，而光伏电池板2a区域光线被遮蔽，从而使得固定相机12a拍摄得到光伏电池板2a区域与周侧区域形成高对比度差的图像。在通过该方法所拍摄的图像中，光伏电池板2a的边缘轮廓线清晰、容易分辨，因此可以准确在图像中检测识别出工件2边缘轮廓信息来进行偏移距离及偏转角度的计算。
在本发明的其他实施方式中，也可根据工件2的具体类别，基于其表面形貌，将工件载台11表面设置为与工件2表面颜色有较大差异的颜色，从而直接使所拍摄的照片中工件2边缘轮廓信息易于识别。
曝光装置15根据调整后曝光图案对工件载台11上阵列分布的多个工件2同时进行曝光处理，从而完成对工件2的批量曝光处理。
进一步的，在本发明一些实施方式中，工件批量曝光设备1还包括处理器复检单元，复检单元被配置用于获取曝光后工件2图像，并将曝光后工件2图像与标准曝光图案进行比较。由于光伏电池板2a表面感光材料在曝光完成后，会产生明显的颜色变化，因此可再次拍摄曝光后图像与标准曝光图案进行比较，当判断存在不良产品后，发出警报提醒，从而减少不良产品产出，并且由于不同颜色区域对比度差异大，因此判别准确率高。
如图7所示，本实施方式还提供一种工件批量曝光方法，包括步骤：
S1：将多个固定定相机位置信息统一至同一坐标系。
S2：将多个工件2置于工件载台11，使多个工件2于载台表面呈阵列排布。
S3：通过多个固定相机12a同时获取每个工件2边缘轮廓信息，在坐标系下计算每个工件2相对于预设标准位置的偏移距离及偏转角度。
S4：基于每个工件2的偏移距离及偏转角度，对曝光图案进行调整，并经由调整后曝光图案对多个工件2同时进行曝光处理。
在步骤S1中，其具体包括：
S11：沿Y轴方向移动工件载台11，沿X轴方向移动运动相机13，控制运动相机13拍摄获取设于工件载台11上的多个定位标记113的位置。
具体的，在本实施方式中，控制分别设于龙门架14上相对两端的两个运动相机13同时相对运动，拍摄获取设于工件载台11上沿X轴方向间隔均匀分布的多个定位标记113的位置。
S12：控制多个固定相机12a分别拍摄获取其对应镜头视野内的定位标记113的位置。
具体的，在本实施方式中，控制多个于龙门架14上沿X轴方向间隔均匀分布的固定相机12a分别拍摄获取其对应镜头视野内的定位标记113位置；每个固定相机12a分别用于拍摄一个定位标记113。
S13：比较换算运动相机13和固定相机12a所拍摄的定位标记113的位置，将运动相机13和多个固定相机12a统一在同一坐标系内。
在步骤S3中，其具体包括：
S31：开启位于工件载台11平面的光源装置114，光源装置114光线被工件2遮挡，工件2表面与边缘周侧区域形成亮度差，控制固定相机12a拍摄工件2图像。
S32：于工件2图像中检测获取各工件2边缘轮廓信息。
在步骤S4中，其具体包括：
S41：基于工件2边缘轮廓位置信息计算工件2中心坐标信息，并与预设的标准曝光图案中工件2中心位置进行比较，计算得到工件2的偏移距离。
S42：计算工件2边缘轮廓与标准曝光图案中工件2边缘轮廓之间的夹角，得到工件2的偏转角度。
进一步的，在本发明一些实施方式中，还包括步骤：
S5：拍摄获取曝光后工件2，将工件2曝光图案与标准曝光图案进行比较。
综上所述，本发明所提供的工件批量曝光方法和设备能够通过固定相机组同时对批量呈阵列排布的工件进行拍摄和图像检测，基于图像信息检测获得工件边缘轮廓信息后，将工件的偏移信息和偏转角度提供给曝光装置，对曝光图案调整后进行曝光处理。方法和设备适用于表面没有定位标记的工件，能够准确对大批量工件同时进行坐标位置检测和曝光处理，工作效率高的同时工件图案曝光准确率高。
应当理解，虽然本说明书按照实施方式加以描述，但并非每个实施方式仅包含一个独立的技术方案，说明书的这种叙述方式仅仅是为清楚起见，本领域技术人员应当将说明书作为一个整体，各实施方式中的技术方案也可以经适当组合，形成本领域技术人员可以理解的其他实施方式。
上文所列出的一系列的详细说明仅仅是针对本发明的可行性实施方式的具体说明，并非用以限制本发明的保护范围，凡未脱离本发明技艺精神所作的等效实施方式或变更均应包含在本发明的保护范围之内。
Claims (16)
- 一种工件批量曝光方法，其特征在于，包括步骤：将多个固定定相机位置信息统一至同一坐标系；将多个工件置于工件载台，使多个所述工件于载台表面呈阵列排布；通过多个所述固定相机同时获取每个工件边缘轮廓信息，在所述坐标系下计算每个工件相对于预设标准位置的偏移距离及偏转角度；基于每个所述工件的偏移距离及偏转角度，对所述曝光图形进行调整，并经由调整后曝光图形对多个所述工件同时进行曝光处理。
- 根据权利要求1所述的工件批量曝光方法，其特征在于，将将多个固定定相机位置信息统一至同一坐标系，具体包括：沿Y轴方向移动工件载台，沿X轴方向移动运动相机，控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置；控制多个所述固定相机分别拍摄获取其对应镜头视野内的所述定位标记的位置；比较换算所述运动相机和所述固定相机所拍摄的所述定位标记的位置，将所述运动相机和多个所述固定相机统一在同一坐标系内。
- 根据权利要求2所述的工件批量曝光方法，其特征在于，所述控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置，具体包括：控制所述运动相机拍摄获取设于工件载台上沿X轴方向间隔均匀分布的多个所述定位标记的位置。
- 根据权利要求3所述的工件批量曝光方法，其特征在于，所述控制所述运动相机拍摄获取设于所述工件载台上的多个定位标记的位置，还包括：控制分别设于龙门架上相对两端的两个所述运动相机同时相对运动，拍摄获取设设于所述工件载台上的多个定位标记位置。
- 根据权利要求3所述的工件批量曝光方法，其特征在于，所述控制多个所述固定相机分别拍摄获取其对应镜头视野内的所述定位标记的位置，具体包括：控制多个于龙门架上沿X轴方向间隔均匀分布的固定相机分别拍摄获取其对应镜头视野内的所述定位标记位置；每个所述固定相机分别用于拍摄一个所述定位标记。
- 根据权利要求1所述的工件批量曝光方法，其特征在于，所述通过多个所述固定相机同时获取每个工件边缘轮廓信息，具体包括：开启位于所述工件载台平面的光源装置，所述光源装置光线被所述工件遮挡，所述工件表面 与边缘周侧区域形成亮度差，控制所述固定相机拍摄所述工件图像；于所述工件图像中检测获取各工件边缘轮廓信息。
- 根据权利要求5所述的工件批量曝光方法，其特征在于，所述在所述坐标系下计算每个工件相对于预设标准位置的偏移距离及偏转角度，具体包括：基于所述工件边缘轮廓位置信息计算所述工件中心坐标信息，并与预设的所述标准曝光图案中工件中心位置进行比较，计算得到所述工件的偏移距离；计算所述工件边缘轮廓与所述标准曝光图案中工件边缘轮廓之间的夹角，得到所述工件的偏转角度。
- 根据权利要求1所述的工件批量曝光方法，其特征在于，还包括步骤：拍摄获取曝光后的工件图像，将所述工件的曝光图案与标准曝光图案进行比较。
- 一种工件批量曝光设备，其特征在于，包括：工件载台，至少能够沿Y轴方向运动，所述工件载台表面能够同时放置在XY轴平面呈阵列排布的多个工件；固定相机组，包括多个设置于所述工件载台上方的固定相机，其被配置用于拍摄所述工件载台上工件的图像，多个所述固定相机视野组合后至少覆盖所述工件载台表面沿X轴方向排布的一行工件；处理器坐标计算单元，其被配置用于将多个所述固定相机位置信息统一至同一坐标系；处理器图像处理单元，其被配置用于根据所述固定相机所拍摄的工件图像在所述坐标系下计算每个工件相对于预设标准位置的偏移距离及偏转角度，并基于每个所述工件的偏移距离及偏转角度，对所述曝光图形进行调整；曝光装置，其被配置用于根据调整后曝光图形对所述工件载台上阵列分布的多个所述工件同时进行曝光处理。
- 根据权利要求9所述的工件批量曝光设备，其特征在于，所述工件载台表面设置有多个定位标记，所述定位标记沿所述工件载台表面X轴方向均匀间隔分布。
- 根据权利要求10所述的工件批量曝光设备，其特征在于，每个所述固定相机的视野至少覆盖一个所述定位标记。
- 根据权利要求10所述的工件批量曝光设备，其特征在于，还包括：至少一个运动相机，所运动相机述设置于所述工件载台上方，且至少能够沿X轴方向运动，其被配置用于依次运动拍摄所述工件载台上的定位标记。
- 根据权利要求12所述的工件批量曝光设备，其特征在于，还包括：龙门架，所述龙门架包括架设于所述工件载台上方的横梁，和沿所述横梁两端向下设置的立梁，所述横梁沿X轴方向延伸，所述固定相机均匀间隔设置于所述横梁上，所述运动相机设置于所述横梁上，可沿所述横 梁往复运动。
- 根据权利要求12所述的工件批量曝光设备，其特征在于，包括两个设于横梁上所述运动相机，两个所述运动相加沿所述横梁相对往复运动。
- 根据权利要求9所述的工件批量曝光设备，其特征在于，还包括：光源装置，所述光源装置设置于所述工件载台表面，被打开后，所述光源装置能够向所述固定相机镜头射出光线。
- 根据权利要求9所述的工件批量曝光设备，其特征在于，还包括：处理器复检单元，所述处理器复检单元被配置用于获取曝光后工件图像，并将所述曝光后工件图像与标准曝光图案进行比较。
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1763614A (zh) * | 2004-10-18 | 2006-04-26 | 中华映管股份有限公司 | 曝光方法 |
| CN101986207A (zh) * | 2009-07-28 | 2011-03-16 | 日本精工株式会社 | 曝光装置以及曝光方法 |
| CN103616804A (zh) * | 2013-12-05 | 2014-03-05 | 中山新诺科技有限公司 | 一种拼贴法制备单片集成电容触摸屏的动态掩模板系统 |
| CN208270945U (zh) * | 2018-06-12 | 2018-12-21 | 深圳市盛德鑫智能科技有限公司 | 一种全自动曝光装置 |
| CN110333648A (zh) * | 2019-07-16 | 2019-10-15 | 中山新诺科技股份有限公司 | 在三维多面体上制备高精度线路图形的曝光系统及方法 |
| CN111965960A (zh) * | 2020-08-28 | 2020-11-20 | 合肥众群光电科技有限公司 | 基于线阵成像组件的3d手机盖板玻璃曝光装置及方法 |
| CN111999990A (zh) * | 2020-09-03 | 2020-11-27 | 苏州源卓光电科技有限公司 | 曝光方法及曝光系统 |
| JP2021021816A (ja) * | 2019-07-26 | 2021-02-18 | 株式会社ピーエムティー | 露光方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130006919A (ko) * | 2011-06-27 | 2013-01-18 | 삼성전기주식회사 | 노광시스템 및 노광방법 |
| CN114543667B (zh) * | 2022-01-21 | 2023-11-07 | 同济大学 | 一种基于神经网络的单相机-双棱镜三维测量系统及测量方法 |
| CN218728592U (zh) * | 2022-06-29 | 2023-03-24 | 深圳凯世光研股份有限公司 | 工件批量曝光设备 |
-
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- 2022-07-26 WO PCT/CN2022/107937 patent/WO2024000708A1/zh unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1763614A (zh) * | 2004-10-18 | 2006-04-26 | 中华映管股份有限公司 | 曝光方法 |
| CN101986207A (zh) * | 2009-07-28 | 2011-03-16 | 日本精工株式会社 | 曝光装置以及曝光方法 |
| CN103616804A (zh) * | 2013-12-05 | 2014-03-05 | 中山新诺科技有限公司 | 一种拼贴法制备单片集成电容触摸屏的动态掩模板系统 |
| CN208270945U (zh) * | 2018-06-12 | 2018-12-21 | 深圳市盛德鑫智能科技有限公司 | 一种全自动曝光装置 |
| CN110333648A (zh) * | 2019-07-16 | 2019-10-15 | 中山新诺科技股份有限公司 | 在三维多面体上制备高精度线路图形的曝光系统及方法 |
| JP2021021816A (ja) * | 2019-07-26 | 2021-02-18 | 株式会社ピーエムティー | 露光方法 |
| CN111965960A (zh) * | 2020-08-28 | 2020-11-20 | 合肥众群光电科技有限公司 | 基于线阵成像组件的3d手机盖板玻璃曝光装置及方法 |
| CN111999990A (zh) * | 2020-09-03 | 2020-11-27 | 苏州源卓光电科技有限公司 | 曝光方法及曝光系统 |
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