WO2023286872A1 - Laminate and electronic device provided with laminate - Google Patents
Laminate and electronic device provided with laminate Download PDFInfo
- Publication number
- WO2023286872A1 WO2023286872A1 PCT/JP2022/027941 JP2022027941W WO2023286872A1 WO 2023286872 A1 WO2023286872 A1 WO 2023286872A1 JP 2022027941 W JP2022027941 W JP 2022027941W WO 2023286872 A1 WO2023286872 A1 WO 2023286872A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin
- primer layer
- layer
- laminate
- compound
- Prior art date
Links
- 239000002923 metal particle Substances 0.000 claims abstract description 61
- 239000013034 phenoxy resin Substances 0.000 claims abstract description 58
- 229920006287 phenoxy resin Polymers 0.000 claims abstract description 58
- 238000007747 plating Methods 0.000 claims abstract description 52
- 229910052751 metal Inorganic materials 0.000 claims abstract description 47
- 239000002184 metal Substances 0.000 claims abstract description 47
- 239000003822 epoxy resin Substances 0.000 claims description 62
- 229920000647 polyepoxide Polymers 0.000 claims description 62
- 150000001875 compounds Chemical class 0.000 claims description 41
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- QQOWHRYOXYEMTL-UHFFFAOYSA-N triazin-4-amine Chemical group N=C1C=CN=NN1 QQOWHRYOXYEMTL-UHFFFAOYSA-N 0.000 claims description 19
- 125000002091 cationic group Chemical group 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 36
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- 238000000034 method Methods 0.000 description 26
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- 238000002360 preparation method Methods 0.000 description 19
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- 230000007774 longterm Effects 0.000 description 15
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
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- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 8
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
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- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
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- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
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- 239000000654 additive Substances 0.000 description 4
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- 239000010409 thin film Substances 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 3
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
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Classifications
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C—CHEMISTRY; METALLURGY
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/001—Conductive additives
Definitions
- the present invention relates to laminates, and more particularly to laminates that can be suitably used in electronic devices such as electromagnetic wave shields, printed wiring boards, integrated circuits, and organic transistors, and electronic devices using the laminates.
- FCCL flexible copper-clad laminate
- Patent Document 2 discloses that inorganic nanoparticles and a phthalocyanine-based ligand are used as a plating underlayer provided between a support and a metal plating layer. It has been proposed to improve the adhesion between the support and the plating layer by using a composition containing a solvent (dispersion medium). Further, in Patent Document 3, a layer containing a compound having an aminotriazine ring is provided as a primer layer on a support, and a metal nanoparticle layer is provided on the primer layer, whereby the support and the metal plating layer are formed.
- Patent Document 4 a metal particle layer containing metal particles and a reaction product of a specific epoxy compound and a blocked polyisocyanate is interposed between the support and the plating layer, thereby It has been proposed that the adhesion to is improved.
- an object of the present invention is to provide a laminate that can maintain the adhesion of the plating layer not only in normal conditions but also after a long-term heat resistance test.
- the present inventors have found that by using a high-molecular-weight phenoxy resin in the primer layer, the elongation of the primer layer is increased and the elastic modulus is improved, so that the plating immediately after plating (normal state) It has been found that the layer adhesion can be improved.
- a high-molecular-weight phenoxy resin by using a high-molecular-weight phenoxy resin, deterioration such as decomposition of the polymer in the primer layer is suppressed during the long-term heat resistance test, so that the adhesion of the plating layer can be maintained even after the long-term heat resistance test. I have learned that I can.
- the present invention has been completed based on such findings. That is, the gist of the present invention is as follows.
- a laminate comprising a support, a primer layer, a metal particle layer and a metal plating layer on the support in this order, wherein the primer layer has a weight average molecular weight of 10,000 to 100,000.
- the primer layer further contains an epoxy resin.
- the primer layer contains the phenoxy resin and the epoxy resin in a mass ratio of 90:10 to 10:90.
- the present invention in a laminate sequentially comprising a support, a primer layer, a metal particle layer, and a metal plating layer, by using a phenoxy resin having a weight average molecular weight of 10,000 to 100,000 as the primer layer, the adhesion of the metal plating layer can be maintained not only in the normal state but also after the long-term heat resistance test.
- a laminate according to the present invention comprises a support and, on the support, a primer layer, a metal particle layer and a metal plating layer in this order. Each element constituting the laminate of the present invention will be described below.
- any material can be used without particular limitation as long as it has mechanical strength that allows successive lamination of a primer layer, a metal particle layer, and a metal plating layer, which will be described later.
- Examples include polyimide resin and polyamide.
- Imid resin polyamide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polycarbonate resin, acrylonitrile-butadiene-styrene (ABS) resin, polystyrene, cycloolefin polymer, liquid crystal polymer, polyether ether ketone, polyphenylene sulfide resin , acrylic resins such as polyphenylsulfone, polyphenylene ether, polymethyl(meth)acrylate, polyvinylidene fluoride resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl alcohol resin, polyethylene resin, polypropylene resin, urethane resin, silicon, Silicon carbide, gallium nitride, sapphire, ceramics, glass, glass epoxy resin, glass polyimide, paper phenol, diamond-like carbon, alumina, polyester fiber, polyamide fiber, synthetic fiber such as polyaramid fiber, inorganic fiber such as
- a base material made of synthetic fibers such as polyester fibers, polyamide fibers, aramid fibers, etc., natural fibers such as cotton, hemp, etc. can be used.
- the fibers may be processed in advance.
- the support is preferably made of a flexible resin material in order to impart flexibility to the laminate and obtain a bendable final product. Specifically, it is preferably in the form of a film or sheet formed by uniaxial or biaxial stretching.
- film-like or sheet-like supports include polyimide film, polyethylene terephthalate film, polyethylene naphthalate film, polybutylene terephthalate film and the like.
- the thickness is not particularly limited. More preferably 1 to 200 ⁇ m.
- the surface of the support may, if necessary, have fine irregularities that do not lose its smoothness, or may have functional groups such as hydroxyl, carbonyl, and carboxyl groups.
- the primer layer has the function of improving the adhesion between the support and the metal particle layer described later.
- the primer layer contains, as an essential component, a phenoxy resin having a weight average molecular weight in the range of 10,000 to 100,000.
- a high-molecular-weight phenoxy resin in the primer layer by using a high-molecular-weight phenoxy resin in the primer layer, the elongation of the polymer is improved, and furthermore the elastic modulus is improved, thereby improving the adhesion between the support and the metal plating layer. can.
- the use of a high-molecular-weight phenoxy resin can suppress deterioration such as decomposition of the polymer due to heat during the long-term heat resistance test, so the adhesion of the metal plating layer can be maintained even after the long-term heat resistance test.
- a phenoxy resin is a polyhydroxy polyether obtained by reacting a dihydric phenol compound and epichlorohydrin or by reacting a dihydric epoxy compound and a dihydric phenol compound.
- dihydric phenol compounds include bisphenols.
- phenoxy resins include phenoxy resins having a bisphenol A structure (skeleton), phenoxy resins having a bisphenol F structure, phenoxy resins having a bisphenol S structure, phenoxy resins having a bisphenol M structure, phenoxy resins having a bisphenol P structure, Examples include phenoxy resins having a bisphenol Z structure.
- phenoxy resins having a skeletal structure such as a novolac structure, anthracene structure, fluorene structure, dicyclopentadiene structure, norbornene structure, naphthalene structure, biphenyl structure, and adamantane structure are also included. These phenoxy resins may be used singly or in combination of two or more. Among these, those having a bisphenol structure are preferred, and bisphenol A skeleton, bisphenol F skeleton, and bisphenol S skeleton are more preferred. Moreover, the terminal of the phenoxy resin may be any functional group such as a phenolic hydroxyl group or an epoxy group.
- the weight average molecular weight of the phenoxy resin used in the present invention is in the range of 10,000 to 100,000. If the molecular weight is 10,000 or more, the plating adhesion after a long-term heat resistance test will be high. Since the viscosity of the working fluid becomes appropriate, the handling is improved.
- the weight average molecular weight of the phenoxy resin is preferably 20,000-50,000, more preferably 22,000-50,000.
- the weight average molecular weight of the phenoxy resin can be adjusted by the molar ratio of the epoxy resin and the phenol resin and the reaction time in the above reaction. In addition, in this specification, the weight average molecular weight employ
- a high-speed GPC device (HLC-8420GPC, manufactured by Tosoh Corporation) is used as a measurement device, and columns TSKgelG5000HxL / G4000HxL / G3000HxL / G2000HxL (manufactured by Tosoh Corporation) are used in series and used for elution. Tetrahydrofuran was used as a liquid, and the measurement was performed using an RI detector.
- phenoxy resin generally means a high molecular weight epoxy resin. It shall be distinguished from resin.
- phenoxy resins may be used, for example, Mitsubishi Chemical Corporation 1256, 4250 (both bisphenol A skeleton-containing phenoxy resins), 4275 (bis A/bis F mixed type), YL6794, YL7213, YL7290, YL7482, YL7553, YX8100 (phenoxy resin containing bisphenol S skeleton), X6954 (phenoxy resin containing bisphenolacetophenone skeleton, YX7200 (phenoxy resin containing cyclohexane skeleton), YP-70 (bisphenol F-type phenoxy resin), ZX-1356-2 (phenoxy resin containing bisphenol A and bisphenol F skeleton), YPB-40PXM40 (bromine-containing phenoxy resin), ERF-001M30 (phosphorus-containing phenoxy resin), FX-280, FX-293 , FX-310 (fluorene skeleton-containing phenoxy resin), PKHA, PKHB, PKHB+,
- the primer layer preferably contains an epoxy resin in combination with the phenoxy resin described above.
- the combined use of the phenoxy resin and the epoxy resin further improves the adhesion of the metal plating layer under normal conditions and after the long-term heat resistance test.
- Epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, cresol novolak type epoxy resin, phenol novolak type epoxy resin, bisphenol A novolak type epoxy resin, alcohol ether type epoxy resin, tetrabromobisphenol.
- epoxy resin to be used in combination with the phenoxy resin bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, cresol novolac type epoxy resin, and phenol novolac type epoxy resin can be used because they can further improve the adhesion of the metal plating layer.
- Aromatic epoxy resins such as bisphenol A novolac type epoxy resins are preferred, and bisphenol A type epoxy resins are particularly preferred.
- the epoxy equivalent of the epoxy resin is preferably 100 to 5,000 g/equivalent, more preferably 120 to 2,000 g/equivalent, and 120 to 250 g/equivalent, because it can further improve adhesion. is more preferred.
- the mixing ratio of the phenoxy resin and the epoxy resin is preferably 90:10 to 10:90, preferably 85:15 to 15:10 by mass. 80 is more preferred.
- the primer layer preferably contains a compound having an aminotriazine ring.
- a compound having an aminotriazine ring may be a low molecular weight compound or a higher molecular weight compound such as a resin.
- Various additives having an aminotriazine ring can be used as the low-molecular-weight compound having an aminotriazine ring.
- Commercially available products include VT, VD-3 and VD-4 (all of which are from Shikoku Kasei Co., Ltd.), which are compounds having an aminotriazine ring and a hydroxyl group, and VD-5 (which is a compound having an aminotriazine ring and an ethoxysilyl group). Shikoku Kasei Co., Ltd.) and the like. These may be used individually by 1 type, and may be used together 2 or more types.
- the amount of the low-molecular-weight compound having an aminotriazine ring is preferably 0.1 to 50 parts by mass, more preferably 0.5 to 10 parts by mass, based on 100 parts by mass of the resin component.
- resins having aminotriazine rings include resins in which aminotriazine rings are covalently introduced into the polymer chain of the resin. Specifically, an aminotriazine-modified novolak resin is preferred.
- Aminotriazine-modified novolak resin is a novolac resin in which an aminotriazine ring structure and a phenol structure are bonded via a methylene group.
- Aminotriazine-modified novolak resins are prepared, for example, by combining aminotriazine compounds such as melamine, benzoguanamine and acetoguanamine; In the presence or absence of a weakly alkaline catalyst, a co-condensation reaction is carried out near neutrality, or an alkyl etherified product of an aminotriazine compound such as methyl-etherified melamine is reacted with a phenol compound.
- the aminotriazine-modified novolac resin preferably has substantially no methylol groups.
- the aminotriazine-modified novolac resin may also contain molecules in which only the aminotriazine structure is methylene-bonded, molecules in which only the phenol structure is methylene-bonded, and the like, which are produced as by-products during the production of the aminotriazine-modified novolac resin. In addition, it may contain some unreacted raw materials.
- Phenolic structures include, for example, phenol residues, cresol residues, butylphenol residues, bisphenol A residues, phenylphenol residues, naphthol residues, resorcin residues, and the like.
- the term "residue” as used herein means a structure in which at least one hydrogen atom bonded to a carbon atom of an aromatic ring is removed.
- phenol means a hydroxyphenyl group.
- triazine structures include structures derived from aminotriazine compounds such as melamine, benzoguanamine, and acetoguanamine.
- the phenol structure and triazine structure may be used singly or in combination of two or more. Further, the phenol structure is preferably a phenol residue, and the triazine structure is preferably a melamine-derived structure, since the adhesion can be further improved.
- the hydroxyl value of the aminotriazine-modified novolac resin is preferably 50 to 200 mgKOH/g, more preferably 80 to 180 mgKOH/g, because it can further improve adhesion.
- the aminotriazine-modified novolak resin may be used singly or in combination of two or more.
- the phenolic hydroxyl group (x) in the aminotriazine-modified novolak resin and the epoxy group (y) in the epoxy resin is preferably in the range of 0.1-5, more preferably in the range of 0.2-3.
- the primer layer may further contain a cross-linking agent, if necessary, in addition to the epoxy resin and the compound having an aminotriazine ring described above.
- a cross-linking agent it is preferable to use a polyvalent carboxylic acid.
- polycarboxylic acids include trimellitic anhydride, pyromellitic anhydride, maleic anhydride, and succinic acid.
- These crosslinking agents may be used individually by 1 type, and may use 2 or more types together. Among these cross-linking agents, trimellitic anhydride is preferable because it can further improve adhesion.
- a curing catalyst may also be used to promote the reaction between the epoxy group and various curing agents.
- the curing catalyst include tertiary amines, imidazole compounds, organic phosphines, and Lewis acid catalysts.
- Tertiary amines include, for example, trimethylamine, triethylamine, tripropylamine, tributylamine, triamylamine, trihexylamine, trioctylamine, trilaurylamine, dimethylethylamine, dimethylpropylamine, dimethylbutylamine, dimethylamylamine, dimethylhexylamine, dimethylcyclohexylamine, dimethyloctylamine, dimethyllaurylamine, triallylamine, tetramethylethylenediamine, triethylenediamine (triethylenetetramine: TETA), N-methylmorpholine, 4,4'-(oxydi-2,1 -ethanediyl)bis-morpholine, N,N-dimethylbenzylamine, pyridine, picoline, dimethylaminomethylphenol, trisdimethylaminomethylphenol, triethanolamine, N,N'-dimethylpiperazine, tetramethylbutanediamine
- imidazole compounds include 1-benzyl-2-imidazole (1B2MZ), 2-ethyl-4-imidazole, 2-undelimidazole, 1,2-dimethylimidazole, 1-benzyl-2-phenylimidazole, 2- Methylimidazole, 2-ethyl-4-methylimidazole (2E4MZ), 2-phenyl-4-methyl-5-hydroxymethylimidazole (2P4MHZ), 2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole (TBZ) and the like.
- organic phosphines examples include triphenylphosphine (TPP), triphenylphosphine-triphenylborate, tris(p-methoxyphenyl)phosphine, tetraphenylphosphonium/tetraphenylborate, and the like.
- Lewis acid catalysts include Lewis acid catalysts such as boron trifluoride amine complexes, boron trichloride amine complexes, and boron trifluoride ethylamine complexes.
- these curing catalysts it is preferable to use tertiary amines and imidazole compounds, and more preferably to use imidazole compounds, because the adhesion can be further improved.
- these curing catalysts can be used alone or in combination of two or more.
- the preferred amount of the curing catalyst is 0.3 to 20 parts by mass, preferably 0.5 to 15 parts by mass, based on the total amount of 100 parts by mass of all the resins contained in the primer layer, in terms of solid content. part is more preferred.
- the primer layer may contain other resins as components other than those described above, if necessary.
- Other resins include, for example, urethane resins, acrylic resins, imide resins, amide resins, melamine resins, phenol resins, urea-formaldehyde resins, blocked polyisocyanates using phenol as a blocking agent, polyvinyl alcohol, polyvinylpyrrolidone, and the like. be done.
- These binder resins may be used individually by 1 type, and may use 2 or more types together.
- organic solvent examples include toluene, ethyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and isopropyl alcohol.
- the amount of the organic solvent used can be appropriately adjusted according to the coating method used when coating the support and the desired thickness of the primer layer.
- the coating solution for forming the primer layer may contain known additives such as film-forming aids, leveling agents, thickeners, water repellents, antifoaming agents, antioxidants, etc., as necessary. You may add and use it.
- the primer layer can be formed by applying a coating liquid containing the above-described components to part or all of the surface of the support, and removing the organic solvent contained in the coating liquid by heating or drying. .
- the coating method is not particularly limited, and conventionally known coating methods can be applied. Examples thereof include gravure, coating, screen, roller, rotary, spray, and capillary methods. .
- the method for removing the organic solvent contained in the coating film is generally, for example, drying with a dryer to volatilize the organic solvent.
- the drying temperature may be set within a range in which the organic solvent used can be volatilized and the support is not adversely affected by heat deformation or the like.
- the thickness of the primer layer may be appropriately adjusted depending on the use of the laminate of the present invention, but it is preferably within a range that further improves the adhesion between the support and the metal particle layer described later, and the thickness of the primer layer is 10 nm. It is preferably ⁇ 1 ⁇ m, more preferably 10 nm to 500 nm. The thickness of the primer layer can be adjusted by the amount of the coating liquid applied to the support.
- the surface of the primer layer may be treated, if necessary, by a plasma discharge treatment method such as a corona discharge treatment method, a dry treatment method such as an ultraviolet treatment method, water or an acidic or alkaline chemical solution.
- a plasma discharge treatment method such as a corona discharge treatment method, a dry treatment method such as an ultraviolet treatment method, water or an acidic or alkaline chemical solution.
- the surface treatment may be performed by a wet treatment method using an organic solvent or the like.
- the metal particle layer is provided on the primer layer described above, and is a layer provided for forming the metal plating layer described later.
- the metal particle layer is preferably a layer containing a composite of metal particles and an organic compound.
- the metal particle layer more preferably contains metal particles and a compound having a cationic group.
- the metals that make up the metal particles include transition metals and their compounds, and among these, ionic transition metals are preferred.
- ionic transition metals include copper, silver, gold, nickel, palladium, platinum, cobalt, etc. From the viewpoint of formability of the metal plating layer described later, silver is preferable.
- the term "metal particles" refers to particulate or fibrous particles made of the metals described above.
- the average particle diameter is preferably 1 to 100 nm, more preferably 1 to 50 nm, from the viewpoint of further reducing the resistance value.
- the average particle diameter means the volume average value (D50) measured by the dynamic light scattering method after diluting the metal particles with a good dispersion solvent.
- the fiber diameter is preferably 5 to 100 nm, more preferably 5 to 50 nm, from the viewpoint of further reducing the resistance value.
- the fiber length is preferably 0.1 to 100 ⁇ m, more preferably 0.1 to 30 ⁇ m.
- a compound having a cationic group can be preferably used as the organic compound used in combination with the metal particles.
- the compound having a cationic group disperses the metal particles satisfactorily, and reacts with the functional groups contained in the components of the primer layer, such as the epoxy groups contained in the epoxy resin, to form the primer layer and the metal particle layer. It is preferable in that it has a function of further improving the adhesion of the interface.
- the compound having a cationic group may be a surface-treated metal particle contained in the metal particle layer.
- a compound having a basic nitrogen atom-containing group can be preferably used.
- polyalkyleneimine such as polyethyleneimine and polypropyleneimine, a compound obtained by adding polyoxyalkylene to polyalkyleneimine, and the like are used. can do.
- a compound in which polyoxyalkylene is added to polyalkyleneimine is preferable because it can improve the water dispersion stability of metal particles.
- polyoxyalkylene for example, a random structure or block structure such as polyoxyethylene and poly(oxyethylene-oxypropylene) can be used.
- polyoxyalkylene it is preferable to use one having an oxyethylene unit from the viewpoint of the water dispersion stability of the metal particles. It is preferred to use the one with
- polyoxyalkylene for example, a compound having a structure composed of polyethyleneimine and a polyoxyalkylene structure such as a polyethylene oxide structure can be used.
- the polyethyleneimine and the polyoxyalkylene may be linearly bonded, or may be a main chain composed of polyethyleneimine and a side chain grafted with the polyoxyalkylene.
- polyalkyleneimine examples include a copolymer of polyethyleneimine and polyoxyethylene, a part of the imino groups present in the main chain, and ethylene oxide.
- a compound or the like obtained by the reaction can be used. They preferably have a block structure.
- polyoxyalkylene As the compound in which polyoxyalkylene is added to polyalkyleneimine, those obtained by reacting the amino group of polyalkyleneimine, the hydroxyl group of polyoxyethylene glycol, and the epoxy group of epoxy resin are used. You can also
- polyalkyleneimine commercially available products may be used. 1000 (above, Nippon Shokubai Co., Ltd.) can be used.
- the metal particle layer may contain an epoxy resin in addition to the metal particles described above.
- the epoxy resin the same one as described in the primer layer can be used.
- the epoxy resin Aliphatic epoxy resins are preferably used, and alicyclic epoxy resins are more preferably used, from the viewpoint of suppressing reaction with a compound having a basic nitrogen atom-containing group.
- aliphatic epoxy resins include neopentyl glycol diglycidyl ether, dimethylolcyclohexanediglycidyl ether, 1,4-cyclohexanediglycidyl ether, 1,3-cyclohexanediglycidyl ether, 1,2-cyclohexanediglycidyl ether, Acyclic fatty acids such as dimethylol dicyclopentadiene diglycidyl ether, hexahydrophthalic acid diglycidyl ester, hexahydroterephthalic acid diglycidyl ester, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether group epoxy resins, 3′,4′-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate, ⁇ -caprolactone-modified 3′,4′-epoxycyclohexy
- alicyclic epoxy resins are preferred, particularly from the viewpoint of the suppression of reaction with compounds having basic nitrogen atom-containing groups in the metal particle layer-forming coating solution and the compatibility with solvents described later.
- 3′,4′-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, and ⁇ -caprolactone-modified 3′,4′-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate can be preferably used.
- the metal particle layer is formed by dissolving or dispersing the above components in an appropriate solvent to prepare a coating solution, coating the primer layer to form a coating film, and drying the coating film to remove the solvent. can be formed.
- Solvents used in the coating solution for forming the metal particle layer include aqueous media such as distilled water, ion-exchanged water, pure water, and ultrapure water, as well as organic solvents such as alcohols, ethers, esters, and ketones. can do.
- alcohols examples include methanol, ethanol, n-propanol, isopropyl alcohol, n-butanol, isobutyl alcohol, sec-butanol, tert-butanol, heptanol, hexanol, octanol, nonanol, decanol, undecanol, dodecanol, tridecanol, tetradecanol.
- pentadecanol stearyl alcohol, allyl alcohol, cyclohexanol, terpineol, terpineol, dihydroterpineol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, Tetraethylene glycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monobutyl ether, tripropylene glycol Monobutyl ether and the like can be used.
- the coating liquid can be used in combination with ketone solvents such as acetone, cyclohexanone, and methyl ethyl ketone to adjust physical properties.
- ketone solvents such as acetone, cyclohexanone, and methyl ethyl ketone to adjust physical properties.
- ester solvents such as ethyl acetate, butyl acetate, 3-methoxybutyl acetate, 3-methoxy-3-methyl-butyl acetate, etc.
- hydrocarbon solvents such as toluene, especially hydrocarbon solvents having 8 or more carbon atoms can be used. can be done.
- Hydrocarbon solvents having 8 or more carbon atoms include nonpolar solvents such as octane, nonane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, ethylbenzene, dodecylbenzene, tetralin, and trimethylbenzenecyclohexane. can also be used in combination depending on the Furthermore, mixed solvents such as mineral spirit and solvent naphtha can be used together.
- nonpolar solvents such as octane, nonane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, ethylbenzene, dodecylbenzene, tetralin, and trimethylbenzenecyclohexane.
- mixed solvents such as mineral spirit and solvent naphtha can be used together.
- solvents include, for example, 2-ethyl 1,3-hexanediol, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1,2-butanediol, 1,4-butanediol, 2,3-butanediol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl Ether acetate, diethylene glycol monobutyl ether acetate and the like can be used.
- the coating solution for forming the metal particle layer may contain surfactants, antifoaming agents, rheology modifiers, and the like as necessary from the viewpoint of improving the wettability and the like when applied to the primer layer. good.
- the content of the metal particles contained in the coating solution for forming the metal particle layer is preferably 1 to 90% by mass, more preferably 5 to 60% by mass, more preferably 10% by mass, based on the total coating solution. More preferably, it is up to 40% by mass.
- the content of the compound having a cationic group is preferably 0.01 to 10% by mass, more preferably 0.05 to 5% by mass, relative to the entire coating liquid.
- the epoxy resin is preferably contained in the metal particle layer in an amount of 0.01 to 10% by mass. , more preferably 0.05 to 5% by mass.
- the metal particle layer may be a layer provided on the entire surface of the primer layer, or may be a layer provided on part of the surface of the primer layer.
- a fine line-shaped layer formed by drawing lines on the surface of the primer layer can be mentioned.
- the fine line-shaped layer is suitable when the laminate according to the present invention is used for a printed wiring board or the like.
- the width (line width) of the fine line-shaped layer (pattern) is generally about 0.01 to 200 ⁇ m, preferably about 0.01 to 150 ⁇ m.
- the metal particle layer preferably has a thickness of 0.01 to 100 ⁇ m in order to form a conductive pattern with low resistance and excellent conductivity. Further, when the metal particle layer is in the form of thin wires, its thickness (height) is preferably in the range of 0.05 to 50 ⁇ m. The thickness of the metal particle layer can be adjusted by the amount of the coating liquid applied to the primer layer.
- Examples of methods for applying the metal particle layer-forming coating solution to the primer layer include reverse printing such as letterpress reverse printing, inkjet printing, screen printing, offset printing, gravure printing, and spin coating. , a spray coating method, a bar coating method, a die coating method, a slit coating method, a roll coating method, a dip coating method, and the like.
- reverse printing such as letterpress reverse printing, inkjet printing, screen printing, offset printing, gravure printing, and spin coating.
- a spray coating method a bar coating method, a die coating method, a slit coating method, a roll coating method, a dip coating method, and the like.
- inkjet printing method In the case of applying (printing) thin lines of approximately 0.01 to 100 ⁇ m, which is required when realizing high density electronic circuits, it is preferable to adopt an inkjet printing method.
- the metal plating layer constituting the laminate of the present invention has a reliability that can maintain good conductivity without causing disconnection or the like for a long period of time, for example, when the laminate is used for a printed wiring board, an electromagnetic wave shield, or the like. This layer is provided for the purpose of forming a wiring pattern with a high density.
- the metal plating layer is a layer formed on the metal particle layer described above, and the method of forming it is preferably a method of forming by plating.
- the plating treatment include wet plating methods such as electroplating and electroless plating, which can easily form a metal plating layer. Also, two or more of these plating methods may be combined. For example, after performing electroless plating, electroplating may be performed to form a metal plating layer.
- electroless plating method for example, by bringing an electroless plating solution into contact with the metal that constitutes the metal particle layer, a metal such as copper contained in the electroless plating solution is deposited to form an electroless plating layer consisting of a metal coating.
- electroless plating solutions include those containing metals such as copper, silver, gold, nickel, chromium, cobalt and tin, reducing agents, and solvents such as aqueous media and organic solvents.
- reducing agents include dimethylaminoborane, hypophosphorous acid, sodium hypophosphite, dimethylamine borane, hydrazine, formaldehyde, sodium borohydride, and phenol.
- monocarboxylic acids such as acetic acid and formic acid
- dicarboxylic acid compounds such as malonic acid, succinic acid, adipic acid, maleic acid and fumaric acid
- malic acid lactic acid, glycolic acid and gluconate hydroxycarboxylic acid compounds such as acid and citric acid
- amino acid compounds such as glycine, alanine, iminodiacetic acid, arginine, aspartic acid, and glutamic acid
- Organic acids such as carboxylic acid compounds, soluble salts of these organic acids (sodium salts, potassium salts, ammonium salts, etc.), complexing agents such as amine compounds such as ethylenediamine, diethylenetriamine, and triethylenetetramine are used. be able to.
- the metal forming the metal particle layer or the surface of the electroless plated layer (coating) formed by the electroless treatment is energized while the electrolytic plating solution is in contact with the electroplating.
- a metal such as copper contained in a liquid is deposited on the surface of the metal particles constituting the metal particle layer placed on the cathode or on the surface of the electroless plated layer formed by electroless treatment to form an electrolytic plated layer.
- electrolytic plating solutions examples include those containing sulfides of metals such as copper, nickel, chromium, cobalt, and tin, sulfuric acid, and an aqueous medium. Specific examples include those containing copper sulfate, sulfuric acid, and an aqueous medium.
- the method of electroplating after electroless plating is preferable because it is easy to control the thickness of the metal plating layer to a desired thickness from a thin film to a thick film.
- the film thickness of the metal plating layer is preferably 1 to 50 ⁇ m.
- the film thickness of the metal plating layer can be adjusted by controlling the treatment time, current density, amount of plating additive used, etc. in the plating process for forming the metal plating layer.
- the metal plating layer formed on the surface does not peel off under normal conditions, and even when placed at a high temperature of 150 ° C. for a long time, the adhesion of the metal plating layer is maintained. maintained. Therefore, formation of circuit forming substrates used for electronic circuits, integrated circuits, etc., formation of peripheral wiring constituting organic solar cells, electronic book terminals, organic EL, organic transistors, flexible printed circuit boards, RFID, etc., plasma display It can be suitably used for applications in which durability is particularly required, such as wiring for electromagnetic shielding.
- the conductive pattern subjected to the plating treatment can form a highly reliable wiring pattern that can maintain good conductivity without causing disconnection or the like for a long period of time. It can be used for electronic equipment applications such as FPC) and electromagnetic wave shielding.
- a laminate in which a primer layer, a metal particle layer and a metal plating layer are sequentially provided on one surface of a support has been described as an example.
- a layered product may also be formed in which a primer layer, a metal particle layer and a metal plating layer are sequentially provided on the opposite side of the body.
- Phenoxy Resin (P-1) 100 mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100%, epoxy equivalent 173 g/eq) was placed in a reactor equipped with a stirrer, thermometer, nitrogen blowing tube, and cooling tube.
- Preparation Example 1 Preparation of Primer Layer Forming Coating Solution (1)
- the phenoxy resin (P-1) obtained in Synthesis Example 1 was diluted with cyclohexanone so that the nonvolatile content was 2% by mass, and mixed uniformly to obtain a primer layer forming coating solution (1). got
- Novolak resin B (DIC Corporation "PHENOLITE TD-2131", hydroxyl equivalent 104 g / equivalent) 3 parts by mass, and Shikoku Kasei Co., Ltd. as a curing catalyst 1 "TBZ" 0.5 parts by mass were mixed, and cyclohexanone was mixed. was used to dilute the non-volatile matter to 2% by mass, and mixed uniformly to obtain a primer layer-forming coating liquid (4).
- Preparation Example 5 Preparation of primer layer-forming coating liquid (5)] 267 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 2, and 60 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , And, as a curing catalyst 1, 0.5 parts by mass of “TBZ” manufactured by Shikoku Kasei Co., Ltd. is mixed, diluted with cyclohexanone so that the nonvolatile content is 2% by mass, and mixed uniformly to form a primer layer. A forming coating liquid (5) was obtained.
- Preparation Example 6 Preparation of primer layer-forming coating solution (6)] 133 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 1, and 70 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , 10 parts by mass of the modified novolak resin C obtained in Synthesis Example 4, and 5 parts by mass of "2E4MZ" manufactured by Shikoku Kasei Co., Ltd. as a curing catalyst 2, are mixed, and cyclohexanone is used so that the nonvolatile content is 2% by mass. By diluting and mixing uniformly, a primer layer-forming coating liquid (6) was obtained.
- Preparation Example 7 Preparation of primer layer-forming coating liquid (7)] 67 parts by mass of the phenoxy resin (P-3) obtained in Synthesis Example 3, and 76 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , Novolak resin B (DIC Corporation "PHENOLITE TD-2131", hydroxyl equivalent 104 g / equivalent) 14 parts by weight, and Shikoku Kasei Co., Ltd. as curing catalyst 1 "TBZ" 0.5 parts by weight were mixed, and cyclohexanone was mixed. was used to dilute the non-volatile matter to 2% by mass, and mixed uniformly to obtain a primer layer-forming coating liquid (7).
- Preparation Example 8 Preparation of Primer Layer Forming Coating Solution (8)
- modified novolak resin C obtained in Synthesis Example 4
- epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent weight: 188 g/equivalent)
- the mixed resin solution of the aminotriazine-modified novolac resin and the epoxy resin was obtained by diluting with methyl ethyl ketone so that the non-volatile content was 2% by mass and mixing uniformly.
- chloroform (30 ml) containing 9.6 parts by weight of p-toluenesulfonyl chloride was added to a mixture containing 20 parts by weight of methoxypolyethylene glycol (number average molecular weight of 2,000), 8.0 parts by weight of pyridine and 20 ml of chloroform.
- the solution was added dropwise for 30 minutes with ice-cooling and stirring, then stirred at a bath temperature of 40° C. for 4 hours, and mixed with 50 ml of chloroform.
- the obtained product is washed with 100 ml of 5% by mass hydrochloric acid aqueous solution, then with 100 ml of saturated sodium bicarbonate aqueous solution, then with 100 ml of saturated saline solution, dried with anhydrous magnesium sulfate, and filtered. , concentrated under reduced pressure, washed several times with hexane, filtered and dried at 80° C. under reduced pressure to obtain methoxypolyethylene glycol having a p-toluenesulfonyloxy group.
- a mixed solvent of 200 ml of isopropyl alcohol and 200 ml of hexane was added to the resulting silver dispersion, and after stirring for 2 minutes, centrifugal concentration was performed at 3000 rpm for 5 minutes. After removing the supernatant, a mixed solvent of 50 ml of isopropyl alcohol and 50 ml of hexane was added to the precipitate, stirred for 2 minutes, and concentrated by centrifugation at 3000 rpm for 5 minutes. After removing the supernatant, 20 parts by mass of water was added to the precipitate, and the mixture was stirred for 2 minutes to remove the organic solvent under reduced pressure.
- the obtained powder of cationic silver particles is dispersed in a mixed solvent of 45 parts by mass of ethylene glycol and 55 parts by mass of deionized water to form a metal particle layer containing 5% by mass of cationic silver particles.
- a coating solution was prepared.
- each primer layer forming coating solution (1) to (8) obtained above is applied to a desktop small coater ( Using a K printing prober (RK Print Coat Instrument Co., Ltd.), coating was performed so that the coating thickness after drying was 300 nm. Then, a primer layer was formed on the surface of the polyimide film by drying at 155° C. for 5 minutes using a hot air dryer.
- the coating solution for forming a metal particle layer obtained above was applied to the surface of the primer layer using a bar coater so that the coating thickness after drying was 100 nm.
- a metal particle layer was then formed by drying at 140° C. for 5 minutes.
- the metal particle layer formed as described above is set on the cathode side, the phosphorous copper is set on the anode side, and electrolytic plating is performed for 18 minutes at a current density of 2 A/dm 2 using an electrolytic plating solution containing copper sulfate.
- a copper plating layer (film thickness: 8 ⁇ m) was formed on the metal particle layer.
- As an electrolytic plating solution 70 g/L of copper sulfate, 200 g/L of sulfuric acid, 50 mg/L of chloride ion, and 5 ml/L of additive (Top Lucina SF-M, Okuno Chemical Industry Co., Ltd.) were used.
- laminates (1) to (8) were obtained in which the support, the primer layer, the metal particle layer, and the metal plating layer were sequentially laminated.
- the number of the primer layer forming coating liquid corresponds to the number of the laminate, for example, the primer layer forming coating liquid (1) corresponds to the laminate (1).
- Adhesion evaluation (under normal conditions)> For each laminate obtained above, the peel strength was measured using 4000Plus manufactured by Nordson DAGE in a room temperature environment. The lead width used for measurement was 5 mm, and the peel angle was 90°. In addition, the peel strength tends to show a higher value as the thickness of the metal plating layer increases. In this specification, the peel strength was measured based on the measurement value at a thickness of 8 ⁇ m of the metal plating layer. Adhesion was evaluated according to the following criteria from the measured peel strength before heating. A: The value of peel strength is 600 N/m or more. B: The peel strength value is 450 N/m or more and less than 600 N/m. C: The peel strength value is 250 N/m or more and less than 450 N/m. D: The peel strength value is less than 250 N/m. The evaluation results were as shown in Table 1 below.
- the laminates (laminates (1) to (7)) using a phenoxy resin having a specific molecular weight as the primer layer are all good at normal conditions.
- the peel strength is 450 N/m or more, and even after the long-term heat resistance test, it has a retention rate of 80% or more of the peel strength in the normal state. In other words, it can be seen that the adhesion evaluation is excellent both in the normal state and after the long-term heat resistance test.
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Abstract
Description
[2] 前記プライマー層が、エポキシ樹脂をさらに含む、[1]に記載の積層体。
[3] 前記プライマー層が、前記フェノキシ樹脂と前記エポキシ樹脂とを、質量基準において90:10~10:90の割合で含む、[2]に記載の積層体。
[4] 前記プライマー層が、さらにアミノトリアジン環を有する化合物を含む、[1]~[3]のいずれかに記載の積層体。
[5] 前記アミノトリアジン環を有する化合物が、アミノトリアジン変性ノボラック樹脂である、[4]に記載の積層体。
[6] 前記金属粒子層が、金属粒子とカチオン性基を有する化合物とを含む、[1]~[5]のいずれかに記載の積層体。
[7] 前記カチオン性基を有する化合物は、塩基性窒素原子含有基を有する化合物である、[6]に記載の積層体。
[8] 前記支持体が可撓性樹脂材料からなる、[1]~[7]のいずれかに記載の積層体。
[9] 電子機器に使用される[1]~[8]のいずれかに記載の積層体。
[10] 電子機器がプリント配線板および電磁波シールドから選択される、[9]に記載の積層体。
[11] [1]~[10]のいずれかに記載の積層体を備えた電子機器。 [1] A laminate comprising a support, a primer layer, a metal particle layer and a metal plating layer on the support in this order, wherein the primer layer has a weight average molecular weight of 10,000 to 100,000. A laminate containing a phenoxy resin.
[2] The laminate according to [1], wherein the primer layer further contains an epoxy resin.
[3] The laminate according to [2], wherein the primer layer contains the phenoxy resin and the epoxy resin in a mass ratio of 90:10 to 10:90.
[4] The laminate according to any one of [1] to [3], wherein the primer layer further contains a compound having an aminotriazine ring.
[5] The laminate according to [4], wherein the compound having an aminotriazine ring is an aminotriazine-modified novolak resin.
[6] The laminate according to any one of [1] to [5], wherein the metal particle layer contains metal particles and a compound having a cationic group.
[7] The laminate according to [6], wherein the compound having a cationic group is a compound having a basic nitrogen atom-containing group.
[8] The laminate according to any one of [1] to [7], wherein the support is made of a flexible resin material.
[9] The laminate according to any one of [1] to [8], which is used for electronic equipment.
[10] The laminate according to [9], wherein the electronic device is selected from printed wiring boards and electromagnetic wave shields.
[11] An electronic device comprising the laminate according to any one of [1] to [10].
本発明による積層体は、支持体と、前記支持体上に、プライマー層、金属粒子層および金属めっき層とを順次備えている。以下、本発明の積層体を構成する各要素について説明する。 [Laminate]
A laminate according to the present invention comprises a support and, on the support, a primer layer, a metal particle layer and a metal plating layer in this order. Each element constituting the laminate of the present invention will be described below.
支持体としては、後記するプライマー層、金属粒子層、金属めっき層を順次積層し得る機械的強度を備えている材料であれば特に制限なく使用することができ、例えば、例えば、ポリイミド樹脂、ポリアミドイミド樹脂、ポリアミド樹脂、ポリエチレンテレフタレート樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンナフタレート樹脂、ポリカーボネート樹脂、アクリロニトリル-ブタジエン-スチレン(ABS)樹脂、ポリスチレン、シクロオレフィンポリマー、液晶ポリマー、ポリエーテルエーテルケトン、ポリフェニレンスルフィド樹脂、ポリフェニルスルホン、ポリフェニレンエーテル、ポリ(メタ)アクリル酸メチル等のアクリル樹脂、ポリフッ化ビニリデン樹脂、ポリ塩化ビニル樹脂、ポリ塩化ビニリデン樹脂、ポリビニルアルコール樹脂、ポリエチレン樹脂、ポリプロピレン樹脂、ウレタン樹脂、シリコン、シリコンカーバイド、窒化ガリウム、サファイア、セラミックス、ガラス、ガラスエポキシ樹脂、ガラスポリイミド、紙フェノール、ダイアモンドライクカーボン、アルミナ、ポリエステル繊維、ポリアミド繊維、ポリアラミド繊維等の合成繊維、カーボンファイバー等の無機繊維、セルロースナノファイバー等の天然繊維等が挙げられる。これらの支持体は、絶縁性のものが好ましく、多孔質のものを用いることができる。また、支持体は単一材料からなるものであってもよく、複数材料を積層したものであってもよい。 <Support>
As the support, any material can be used without particular limitation as long as it has mechanical strength that allows successive lamination of a primer layer, a metal particle layer, and a metal plating layer, which will be described later. Examples include polyimide resin and polyamide. Imid resin, polyamide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polycarbonate resin, acrylonitrile-butadiene-styrene (ABS) resin, polystyrene, cycloolefin polymer, liquid crystal polymer, polyether ether ketone, polyphenylene sulfide resin , acrylic resins such as polyphenylsulfone, polyphenylene ether, polymethyl(meth)acrylate, polyvinylidene fluoride resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl alcohol resin, polyethylene resin, polypropylene resin, urethane resin, silicon, Silicon carbide, gallium nitride, sapphire, ceramics, glass, glass epoxy resin, glass polyimide, paper phenol, diamond-like carbon, alumina, polyester fiber, polyamide fiber, synthetic fiber such as polyaramid fiber, inorganic fiber such as carbon fiber, cellulose nano Examples include natural fibers such as fibers. These supports are preferably insulating ones, and porous ones can be used. Moreover, the support may be made of a single material, or may be a laminate of a plurality of materials.
プライマー層は、上記した支持体と後記する金属粒子層との密着性を向上させる機能を有するものである。本発明において、プライマー層は、重量平均分子量が10,000~100,000の範囲にあるフェノキシ樹脂を必須成分として含む。本発明においては、プライマー層に高分子量のフェノキシ樹脂を用いることにより、ポリマーの伸度を向上させ、さらに弾性率を向上させることにより、支持体と金属めっき層との密着性を向上させることができる。さらに、高分子量のフェノキシ樹脂の使用により、長期耐熱試験中の熱によるポリマーの分解などの劣化を抑制できることから、長期耐熱試験後においても、金属めっき層の密着性を維持することができる。 <Primer layer>
The primer layer has the function of improving the adhesion between the support and the metal particle layer described later. In the present invention, the primer layer contains, as an essential component, a phenoxy resin having a weight average molecular weight in the range of 10,000 to 100,000. In the present invention, by using a high-molecular-weight phenoxy resin in the primer layer, the elongation of the polymer is improved, and furthermore the elastic modulus is improved, thereby improving the adhesion between the support and the metal plating layer. can. Furthermore, the use of a high-molecular-weight phenoxy resin can suppress deterioration such as decomposition of the polymer due to heat during the long-term heat resistance test, so the adhesion of the metal plating layer can be maintained even after the long-term heat resistance test.
金属粒子層は、上記したプライマー層上に設けられるものであり、後記する金属めっき層を形成するために設けられる層である。金属粒子層は、金属粒子と有機化合物との複合体を含む層であることが好ましい。本発明においては、金属粒子層は、金属粒子とカチオン性基を有する化合物とを含むことがより好ましい。 <Metal particle layer>
The metal particle layer is provided on the primer layer described above, and is a layer provided for forming the metal plating layer described later. The metal particle layer is preferably a layer containing a composite of metal particles and an organic compound. In the present invention, the metal particle layer more preferably contains metal particles and a compound having a cationic group.
本発明の積層体を構成する金属めっき層は、例えば、積層体をプリント配線板や電磁波シールド等に用いる場合に、長期間にわたり断線等を生じることなく、良好な通電性を維持可能な信頼性の高い配線パターンを形成することを目的として設けられる層である。 <Metal plating layer>
The metal plating layer constituting the laminate of the present invention has a reliability that can maintain good conductivity without causing disconnection or the like for a long period of time, for example, when the laminate is used for a printed wiring board, an electromagnetic wave shield, or the like. This layer is provided for the purpose of forming a wiring pattern with a high density.
本発明による積層体は、表面に形成された金属めっき層が常態下で剥離することがないばかりか、150℃といった高温下に長時間置かれた場合であっても金属めっき層の密着性が維持される。そのため、電子回路、集積回路等に使用される回路形成用基板の形成、有機太陽電池、電子書籍端末、有機EL、有機トランジスタ、フレキシブルプリント基板、RFID等を構成する周辺配線の形成、プラズマディスプレイの電磁波シールドの配線等のうち、特に耐久性の求められる用途に好適に使用することができる。特に、前記めっき処理の施された導電性パターンは、長期間にわたり断線等を引き起こすことなく、良好な通電性を維持可能な信頼性の高い配線パターンを形成できることから、例えば、フレキシブルプリント配線板(FPC)や電磁波シールド等の電子機器用途に使用することが可能である。 <Application of laminate>
In the laminate according to the present invention, the metal plating layer formed on the surface does not peel off under normal conditions, and even when placed at a high temperature of 150 ° C. for a long time, the adhesion of the metal plating layer is maintained. maintained. Therefore, formation of circuit forming substrates used for electronic circuits, integrated circuits, etc., formation of peripheral wiring constituting organic solar cells, electronic book terminals, organic EL, organic transistors, flexible printed circuit boards, RFID, etc., plasma display It can be suitably used for applications in which durability is particularly required, such as wiring for electromagnetic shielding. In particular, the conductive pattern subjected to the plating treatment can form a highly reliable wiring pattern that can maintain good conductivity without causing disconnection or the like for a long period of time. It can be used for electronic equipment applications such as FPC) and electromagnetic wave shielding.
下記のようにして、フェノキシ樹脂(P-1)~(P-3)の3種のフェノキシ樹脂を合成した。
[合成例1:フェノキシ樹脂(P-1)]
撹拌機、温度計、窒素吹き込み管、および冷却管を備えた反応装置に、ビスフェノールA型エポキシ樹脂(DIC株式会社製エピクロンEXA-850CRP、固形分100質量%、エポキシ当量173g/eq)を100質量部、ビスフェノールAを65質量部(エポキシ基のモル数(E1)とフェノール性水酸基のモル数(F1)の比(E1/F1)=1.01)、反応溶媒としてシクロヘキサノンを15部仕込み、窒素雰囲気下で100℃まで昇温させた。次いで、触媒としてメチルトリフェニルホスホニウムブロマイドを0.1部仕込んだ後、内温を140℃まで上昇させた。反応が進行するに伴い反応液が増粘し始めたので、シクロヘキサノン72部を数回に分けて適宜追加することで撹拌機のトルクを一定にしながら反応を行った。なお、反応温度は不揮発分が80%以上では140~145℃で行い、それ以降は還流温度で行った。反応途中でサンプルを採取し、GPCで平均分子量を測定した。重量平均分子量が20,000になるまで反応を続けた。前記分子量であることを確認した後、反応を終了した。次いで、シクロヘキサノンを添加し攪拌することで、固形分15質量%のフェノキシ樹脂(P-1)を得た。 <Preparation of phenoxy resin>
Three types of phenoxy resins (P-1) to (P-3) were synthesized in the following manner.
[Synthesis Example 1: Phenoxy Resin (P-1)]
100 mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100%, epoxy equivalent 173 g/eq) was placed in a reactor equipped with a stirrer, thermometer, nitrogen blowing tube, and cooling tube. 65 parts by mass of bisphenol A (the ratio of the number of moles of epoxy groups (E1) to the number of moles of phenolic hydroxyl groups (F1) (E1/F1) = 1.01), 15 parts of cyclohexanone as a reaction solvent, nitrogen The temperature was raised to 100° C. under the atmosphere. Then, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the viscosity of the reaction solution began to increase. Therefore, 72 parts of cyclohexanone was appropriately added in several portions to carry out the reaction while keeping the torque of the stirrer constant. The reaction temperature was 140 to 145° C. when the non-volatile content was 80% or more, and thereafter the reaction temperature was reflux temperature. A sample was taken during the reaction and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 20,000. After confirming the above molecular weight, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-1) having a solid content of 15% by mass.
撹拌機、温度計、窒素吹き込み管、および冷却管を備えた反応装置に、ビスフェノールA型エポキシ樹脂(DIC株式会社製エピクロンEXA-850CRP、固形分100質量%、エポキシ当量173g/eq)を100質量部、ビスフェノールAを65質量部(エポキシ基のモル数(E1)とフェノール性水酸基のモル数(F1)の比(E1/F1)=1.01)、反応溶媒としてシクロヘキサノンを15部仕込み、窒素雰囲気下で100℃まで昇温させた。次いで、触媒としてメチルトリフェニルホスホニウムブロマイドを0.1部仕込んだ後、内温を140℃まで上昇させた。反応が進行するに伴い反応液が増粘し始めたので、シクロヘキサノン72部を数回に分けて適宜追加することで撹拌機のトルクを一定にしながら反応を行った。なお、反応温度は不揮発分が80%以上では140~145℃で行い、それ以降は還流温度で行った。反応途中でサンプルを採取し、GPCで平均分子量を測定した。重量平均分子量が45,000になるまで反応を続けた。前記分子量であることを確認した後、反応を終了した。次いで、シクロヘキサノンを添加し攪拌することで、固形分15質量%のフェノキシ樹脂(P-2)を得た。 [Synthesis Example 2: Phenoxy resin (P-2)]
100 mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100%, epoxy equivalent 173 g/eq) was placed in a reactor equipped with a stirrer, thermometer, nitrogen blowing tube, and cooling tube. 65 parts by mass of bisphenol A (the ratio of the number of moles of epoxy groups (E1) to the number of moles of phenolic hydroxyl groups (F1) (E1/F1) = 1.01), 15 parts of cyclohexanone as a reaction solvent, nitrogen The temperature was raised to 100° C. under the atmosphere. Then, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the viscosity of the reaction solution began to increase. Therefore, 72 parts of cyclohexanone was appropriately added in several portions to carry out the reaction while keeping the torque of the stirrer constant. The reaction temperature was 140 to 145° C. when the non-volatile content was 80% or more, and thereafter the reaction temperature was reflux temperature. A sample was taken during the reaction and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 45,000. After confirming the above molecular weight, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-2) having a solid content of 15% by mass.
撹拌機、温度計、窒素吹き込み管、および冷却管を備えた反応装置に、ビスフェノールA型エポキシ樹脂(DIC株式会社製エピクロンEXA-850CRP、固形分100質量%、エポキシ当量173g/eq)を100質量部、ビスフェノールAを65質量部(エポキシ基のモル数(E1)とフェノール性水酸基のモル数(F1)の比(E1/F1)=1.01)、反応溶媒としてシクロヘキサノンを15部仕込み、窒素雰囲気下で100℃まで昇温させた。次いで、触媒としてメチルトリフェニルホスホニウムブロマイドを0.1部仕込んだ後、内温を140℃まで上昇させた。反応が進行するに伴い反応液が増粘し始めたので、シクロヘキサノン72部を数回に分けて適宜追加することで撹拌機のトルクを一定にしながら反応を行った。なお、反応温度は不揮発分が80%以上では140~145℃で行い、それ以降は還流温度で行った。反応途中でサンプルを採取し、GPCで平均分子量を測定した。重量平均分子量が100,000になるまで反応を続けた。前記分子量であることを確認した後、反応を終了した。次いで、シクロヘキサノンを添加し攪拌することで、固形分15質量%のフェノキシ樹脂(P-3)を得た。 [Synthesis Example 3: Phenoxy Resin (P-3)]
100 mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100%, epoxy equivalent 173 g/eq) was placed in a reactor equipped with a stirrer, thermometer, nitrogen blowing tube, and cooling tube. 65 parts by mass of bisphenol A (the ratio of the number of moles of epoxy groups (E1) to the number of moles of phenolic hydroxyl groups (F1) (E1/F1) = 1.01), 15 parts of cyclohexanone as a reaction solvent, nitrogen The temperature was raised to 100° C. under the atmosphere. Then, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the viscosity of the reaction solution began to increase. Therefore, 72 parts of cyclohexanone was appropriately added in several portions to carry out the reaction while keeping the torque of the stirrer constant. The reaction temperature was 140 to 145° C. when the non-volatile content was 80% or more, and thereafter the reaction temperature was reflux temperature. A sample was taken during the reaction and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 100,000. After confirming the above molecular weight, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-3) having a solid content of 15% by mass.
温度計、冷却管、分留管、攪拌器を取り付けたフラスコに、フェノール750質量部、メラミン75質量部、41.5質量%ホルマリン346質量部、およびトリエチルアミン1.5質量部を加え、発熱に注意しながら100℃まで昇温した。還流下100℃にて2時間反応させた後、常圧下にて水を除去しながら180℃まで2時間かけて昇温した。次いで、減圧下で未反応のフェノールを除去し、ノボラック樹脂Cとしてアミノトリアジン変性ノボラック樹脂を得た。水酸基当量は120g/当量であった。 [Synthesis Example 4: Modified Novolac Resin C]
750 parts by weight of phenol, 75 parts by weight of melamine, 346 parts by weight of 41.5% by weight formalin, and 1.5 parts by weight of triethylamine were added to a flask equipped with a thermometer, condenser, fractionating tube, and stirrer. The temperature was raised to 100°C with caution. After reacting at 100° C. for 2 hours under reflux, the temperature was raised to 180° C. over 2 hours while removing water under normal pressure. Next, unreacted phenol was removed under reduced pressure to obtain an aminotriazine-modified novolak resin as novolak resin C. The hydroxyl equivalent weight was 120 g/equivalent.
[調製例1:プライマー層形成用塗工液(1)の調製]
合成例1で得られたフェノキシ樹脂(P-1)を、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(1)を得た。 <Preparation of coating solution for forming primer layer>
[Preparation Example 1: Preparation of Primer Layer Forming Coating Solution (1)]
The phenoxy resin (P-1) obtained in Synthesis Example 1 was diluted with cyclohexanone so that the nonvolatile content was 2% by mass, and mixed uniformly to obtain a primer layer forming coating solution (1). got
合成例2で得られたフェノキシ樹脂(P-2)を、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(2)を得た。 [Preparation Example 2: Preparation of primer layer-forming coating solution (2)]
The phenoxy resin (P-2) obtained in Synthesis Example 2 was diluted with cyclohexanone so that the nonvolatile content was 2% by mass, and mixed uniformly to obtain a primer layer forming coating solution (2). got
合成例3で得られたフェノキシ樹脂(P-3)を、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(3)を得た。 [Preparation Example 3: Preparation of primer layer-forming coating liquid (3)]
The phenoxy resin (P-3) obtained in Synthesis Example 3 was diluted with cyclohexanone so that the nonvolatile content was 2% by mass, and mixed uniformly to obtain a primer layer forming coating solution (3). got
合成例1で得られたフェノキシ樹脂(P-1)を533質量部、エポキシ樹脂A(DIC株式会社製「EPICLON 850-S」;ビスフェノールA型エポキシ樹脂、エポキシ基当量188g/当量)17質量部、ノボラック樹脂B(DIC株式会社製「PHENOLITE TD-2131」、水酸基当量104g/当量)3質量部、および、硬化触媒1として四国化成株式会社製「TBZ」0.5質量部を混合し、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(4)を得た。 [Preparation Example 4: Preparation of primer layer-forming coating solution (4)]
533 parts by mass of the phenoxy resin (P-1) obtained in Synthesis Example 1, and 17 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , Novolak resin B (DIC Corporation "PHENOLITE TD-2131", hydroxyl equivalent 104 g / equivalent) 3 parts by mass, and Shikoku Kasei Co., Ltd. as a curing catalyst 1 "TBZ" 0.5 parts by mass were mixed, and cyclohexanone was mixed. was used to dilute the non-volatile matter to 2% by mass, and mixed uniformly to obtain a primer layer-forming coating liquid (4).
合成例2で得られたフェノキシ樹脂(P-2)を267質量部、エポキシ樹脂A(DIC株式会社製「EPICLON 850-S」;ビスフェノールA型エポキシ樹脂、エポキシ基当量188g/当量)60質量部、および、硬化触媒1として四国化成株式会社製「TBZ」0.5質量部を混合し、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(5)を得た。 [Preparation Example 5: Preparation of primer layer-forming coating liquid (5)]
267 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 2, and 60 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , And, as a curing catalyst 1, 0.5 parts by mass of “TBZ” manufactured by Shikoku Kasei Co., Ltd. is mixed, diluted with cyclohexanone so that the nonvolatile content is 2% by mass, and mixed uniformly to form a primer layer. A forming coating liquid (5) was obtained.
合成例1で得られたフェノキシ樹脂(P-2)を133質量部、エポキシ樹脂A(DIC株式会社製「EPICLON 850-S」;ビスフェノールA型エポキシ樹脂、エポキシ基当量188g/当量)70質量部、合成例4で得られた変性ノボラック樹脂C10質量部、および、硬化触媒2として四国化成株式会社製「2E4MZ」5質量部を混合し、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(6)を得た。 [Preparation Example 6: Preparation of primer layer-forming coating solution (6)]
133 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 1, and 70 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , 10 parts by mass of the modified novolak resin C obtained in Synthesis Example 4, and 5 parts by mass of "2E4MZ" manufactured by Shikoku Kasei Co., Ltd. as a curing catalyst 2, are mixed, and cyclohexanone is used so that the nonvolatile content is 2% by mass. By diluting and mixing uniformly, a primer layer-forming coating liquid (6) was obtained.
合成例3で得られたフェノキシ樹脂(P-3)を67質量部、エポキシ樹脂A(DIC株式会社製「EPICLON 850-S」;ビスフェノールA型エポキシ樹脂、エポキシ基当量188g/当量)76質量部、ノボラック樹脂B(DIC株式会社製「PHENOLITE TD-2131」、水酸基当量104g/当量)14質量部、および、硬化触媒1として四国化成株式会社製「TBZ」0.5質量部を混合し、シクロヘキサノンを用いて不揮発分が2質量%となるように希釈し、均一に混合することで、プライマー層形成用塗工液(7)を得た。 [Preparation Example 7: Preparation of primer layer-forming coating liquid (7)]
67 parts by mass of the phenoxy resin (P-3) obtained in Synthesis Example 3, and 76 parts by mass of epoxy resin A ("EPICLON 850-S" manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent: 188 g/equivalent). , Novolak resin B (DIC Corporation "PHENOLITE TD-2131", hydroxyl equivalent 104 g / equivalent) 14 parts by weight, and Shikoku Kasei Co., Ltd. as curing catalyst 1 "TBZ" 0.5 parts by weight were mixed, and cyclohexanone was mixed. was used to dilute the non-volatile matter to 2% by mass, and mixed uniformly to obtain a primer layer-forming coating liquid (7).
合成例4で得られた変性ノボラック樹脂C65質量部に、エポキシ樹脂A(DIC株式会社製「EPICLON 850-S」;ビスフェノールA型エポキシ樹脂、エポキシ基当量188g/当量)35質量部を混合後、メチルエチルケトンで不揮発分2質量%となるように希釈し、均一に混合することで、アミノトリアジン変性ノボラック樹脂とエポキシ樹脂の混合樹脂溶液を得た。 [Preparation Example 8: Preparation of Primer Layer Forming Coating Solution (8)]
After mixing 65 parts by mass of modified novolak resin C obtained in Synthesis Example 4 with 35 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent weight: 188 g/equivalent), The mixed resin solution of the aminotriazine-modified novolac resin and the epoxy resin was obtained by diluting with methyl ethyl ketone so that the non-volatile content was 2% by mass and mixing uniformly.
窒素雰囲気下、メトキシポリエチレングリコール(数平均分子量2,000)20質量部、ピリジン8.0質量部およびクロロホルム20mlを含む混合物に、p-トルエンスルホン酸クロライド9.6質量部を含むクロロホルム(30ml)溶液を、氷冷撹拌しながら30分間滴下した後、浴槽温度40℃で4時間攪拌し、クロロホルム50mlを混合した。
次いで、得られた生成物を、5質量%塩酸水溶液100mlで洗浄し、次いで飽和炭酸水素ナトリウム水溶液100mlで洗浄し、次いで飽和食塩水溶液100mlで洗浄した後、無水硫酸マグネシウムを用いて乾燥し、濾過、減圧濃縮し、ヘキサンで数回洗浄した後、濾過し、80℃で減圧乾燥することによって、p-トルエンスルホニルオキシ基を有するメトキシポリエチレングリコールを得た。 <Preparation of coating solution for forming metal particle layer>
Under a nitrogen atmosphere, chloroform (30 ml) containing 9.6 parts by weight of p-toluenesulfonyl chloride was added to a mixture containing 20 parts by weight of methoxypolyethylene glycol (number average molecular weight of 2,000), 8.0 parts by weight of pyridine and 20 ml of chloroform. The solution was added dropwise for 30 minutes with ice-cooling and stirring, then stirred at a bath temperature of 40° C. for 4 hours, and mixed with 50 ml of chloroform.
Next, the obtained product is washed with 100 ml of 5% by mass hydrochloric acid aqueous solution, then with 100 ml of saturated sodium bicarbonate aqueous solution, then with 100 ml of saturated saline solution, dried with anhydrous magnesium sulfate, and filtered. , concentrated under reduced pressure, washed several times with hexane, filtered and dried at 80° C. under reduced pressure to obtain methoxypolyethylene glycol having a p-toluenesulfonyloxy group.
次いで、酢酸エチルとヘキサンとの混合溶液(酢酸エチル/ヘキサンの体積比=1/2)300mlを加え、室温で強力攪拌した後、生成物の固形物を濾過した。その固形物を、酢酸エチルとヘキサンの混合溶液(酢酸エチル/ヘキサンの体積比=1/2)100mlを用いて洗浄した後、減圧乾燥することによって、ポリエチレンイミンにポリエチレングリコールが結合した化合物を得た。 5.39 parts by mass of methoxypolyethylene glycol having a p-toluenesulfonyloxy group, 20 parts by mass of polyethyleneimine (manufactured by Aldrich, molecular weight 25,000), 0.07 parts by mass of potassium carbonate and 100 ml of N,N-dimethylacetamide are mixed. and stirred at 100° C. for 6 hours under a nitrogen atmosphere.
Next, 300 ml of a mixed solution of ethyl acetate and hexane (volume ratio of ethyl acetate/hexane=1/2) was added, and the mixture was vigorously stirred at room temperature, and the solid product was filtered. The solid was washed with 100 ml of a mixed solution of ethyl acetate and hexane (volume ratio of ethyl acetate/hexane=1/2) and then dried under reduced pressure to obtain a compound in which polyethyleneimine was bound to polyethylene glycol. rice field.
ポリイミドフィルム(東レデュポン株式会社製「カプトン150EN-A」;厚さ38μm)の表面に、上記で得られた各プライマー層形成用塗工液(1)~(8)を、卓上型小型コーター(Kプリンティングプローファー、RKプリントコートインストルメント株式会社)を用いて、乾燥後の塗膜厚が300nmとなるように塗工した。次いで、熱風乾燥機を用いて155℃で5分間乾燥することによって、ポリイミドフィルムの表面にプライマー層を形成した。
続いて、プライマー層の表面に、上記で得られた金属粒子層形成用塗工液を、バーコーターを用いて、乾燥後の塗膜厚が100nmとなるように塗工した。次いで、140℃で5分間乾燥することによって、金属粒子層を形成した。 <Production of laminates (1) to (8)>
On the surface of a polyimide film (“Kapton 150EN-A” manufactured by Toray DuPont Co., Ltd.; thickness 38 μm), each primer layer forming coating solution (1) to (8) obtained above is applied to a desktop small coater ( Using a K printing prober (RK Print Coat Instrument Co., Ltd.), coating was performed so that the coating thickness after drying was 300 nm. Then, a primer layer was formed on the surface of the polyimide film by drying at 155° C. for 5 minutes using a hot air dryer.
Subsequently, the coating solution for forming a metal particle layer obtained above was applied to the surface of the primer layer using a bar coater so that the coating thickness after drying was 100 nm. A metal particle layer was then formed by drying at 140° C. for 5 minutes.
このようにして、支持体、プライマー層、金属粒子層、および金属めっき層が順次積層された積層体(1)~(8)を得た。なお、プライマー層形成用塗工液の番号と積層体の番号は対応しており、例えば、プライマー層形成用塗工液(1)は積層体(1)に対応する。 The metal particle layer formed as described above is set on the cathode side, the phosphorous copper is set on the anode side, and electrolytic plating is performed for 18 minutes at a current density of 2 A/dm 2 using an electrolytic plating solution containing copper sulfate. A copper plating layer (film thickness: 8 μm) was formed on the metal particle layer. As an electrolytic plating solution, 70 g/L of copper sulfate, 200 g/L of sulfuric acid, 50 mg/L of chloride ion, and 5 ml/L of additive (Top Lucina SF-M, Okuno Chemical Industry Co., Ltd.) were used.
Thus, laminates (1) to (8) were obtained in which the support, the primer layer, the metal particle layer, and the metal plating layer were sequentially laminated. The number of the primer layer forming coating liquid corresponds to the number of the laminate, for example, the primer layer forming coating liquid (1) corresponds to the laminate (1).
上記で得られた各積層体について、室温環境下において、Nordson DAGE社製4000Plusを用いて剥離強度を測定した。なお、測定に用いるリード幅は5mm、そのピールの角度は90°とした。また、ピール強度は、金属めっき層の厚さが厚くなるほど高い値を示す傾向にあるが、本明細書においてピール強度の測定は、金属めっき層の厚さ8μmにおける測定値を基準として実施した。
測定した加熱前の剥離強度の値から、下記の基準にしたがって密着性を評価した。
A:剥離強度の値が600N/m以上である。
B:剥離強度の値が450N/m以上、600N/m未満である。
C:剥離強度の値が250N/m以上、450N/m未満である。
D:剥離強度の値が250N/m未満である。
評価結果は、下記表1に示されるとおりであった。 <Adhesion evaluation (under normal conditions)>
For each laminate obtained above, the peel strength was measured using 4000Plus manufactured by Nordson DAGE in a room temperature environment. The lead width used for measurement was 5 mm, and the peel angle was 90°. In addition, the peel strength tends to show a higher value as the thickness of the metal plating layer increases. In this specification, the peel strength was measured based on the measurement value at a thickness of 8 μm of the metal plating layer.
Adhesion was evaluated according to the following criteria from the measured peel strength before heating.
A: The value of peel strength is 600 N/m or more.
B: The peel strength value is 450 N/m or more and less than 600 N/m.
C: The peel strength value is 250 N/m or more and less than 450 N/m.
D: The peel strength value is less than 250 N/m.
The evaluation results were as shown in Table 1 below.
上記で得られた各積層体について、それぞれ150℃に設定した乾燥機内に300時間保管して加熱した。加熱後、各積層体を室温まで冷却し、上記と同様の方法でピール強度を測定した。
測定した加熱前後のピール強度値を用いて、加熱前後での保持率を算出し、下記の基準にしたがって耐熱性の保持度合いを評価した。
A:保持率が80%以上である。
B:保持率が60%以上80%未満である。
C:保持率が30%以上60%未満である。
D:保持率が30%未満である。
評価結果は、下記表1に示されるとおりであった。 <Adhesion evaluation (long-term heat resistance test)>
Each laminate obtained above was stored in a dryer set at 150° C. for 300 hours and heated. After heating, each laminate was cooled to room temperature, and the peel strength was measured in the same manner as above.
Using the measured peel strength values before and after heating, the retention rate before and after heating was calculated, and the degree of retention of heat resistance was evaluated according to the following criteria.
A: The retention rate is 80% or more.
B: The retention rate is 60% or more and less than 80%.
C: The retention rate is 30% or more and less than 60%.
D: The retention rate is less than 30%.
The evaluation results were as shown in Table 1 below.
Claims (11)
- 支持体と、前記支持体上に、プライマー層、金属粒子層および金属めっき層とを順次備えた積層体であって、前記プライマー層が、重量平均分子量が10,000~100,000のフェノキシ樹脂を含む、積層体。 A laminate comprising a support, a primer layer, a metal particle layer and a metal plating layer on the support in this order, wherein the primer layer is a phenoxy resin having a weight average molecular weight of 10,000 to 100,000. A laminate comprising:
- 前記プライマー層が、エポキシ樹脂をさらに含む、請求項1に記載の積層体。 The laminate according to claim 1, wherein the primer layer further contains an epoxy resin.
- 前記プライマー層が、前記フェノキシ樹脂と前記エポキシ樹脂とを、質量基準において90:10~10:90の割合で含む、請求項2に記載の積層体。 The laminate according to claim 2, wherein the primer layer contains the phenoxy resin and the epoxy resin in a mass ratio of 90:10 to 10:90.
- 前記プライマー層が、さらにアミノトリアジン環を有する化合物を含む、請求項1に記載の積層体。 The laminate according to claim 1, wherein the primer layer further contains a compound having an aminotriazine ring.
- 前記アミノトリアジン環を有する化合物が、アミノトリアジン変性ノボラック樹脂である、請求項4に記載の積層体。 The laminate according to claim 4, wherein the compound having an aminotriazine ring is an aminotriazine-modified novolac resin.
- 前記金属粒子層が、金属粒子とカチオン性基を有する化合物とを含む、請求項1に記載の積層体。 The laminate according to claim 1, wherein the metal particle layer contains metal particles and a compound having a cationic group.
- 前記カチオン性基を有する化合物は、塩基性窒素原子含有基を有する化合物である、請求項6に記載の積層体。 The laminate according to claim 6, wherein the compound having a cationic group is a compound having a basic nitrogen atom-containing group.
- 前記支持体が可撓性樹脂材料からなる、請求項1に記載の積層体。 The laminate according to claim 1, wherein the support is made of a flexible resin material.
- 電子機器に使用される、請求項1~8のいずれか一項に記載の積層体。 The laminate according to any one of claims 1 to 8, which is used in electronic equipment.
- 電子機器がプリント配線板および電磁波シールドから選択される、請求項9に記載の積層体。 The laminate according to claim 9, wherein the electronic device is selected from printed wiring boards and electromagnetic wave shields.
- 請求項1~8のいずれか一項に記載の積層体を備えた電子機器。 An electronic device comprising the laminate according to any one of claims 1 to 8.
Priority Applications (3)
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JP2023534876A JPWO2023286872A1 (en) | 2021-07-15 | 2022-07-15 | |
KR1020237043520A KR20240037880A (en) | 2021-07-15 | 2022-07-15 | Laminates and electronic devices having laminates |
CN202280042830.3A CN117561164A (en) | 2021-07-15 | 2022-07-15 | Laminate and electronic device provided with laminate |
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JP (1) | JPWO2023286872A1 (en) |
KR (1) | KR20240037880A (en) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2015156459A (en) * | 2014-02-21 | 2015-08-27 | Dic株式会社 | Laminate, conductive pattern, and electronic circuit |
JP2016112704A (en) * | 2014-12-11 | 2016-06-23 | Dic株式会社 | Conductive laminate and method for manufacturing the same |
WO2019013040A1 (en) * | 2017-07-10 | 2019-01-17 | Dic株式会社 | Laminate, printed wiring board in which same is used, flexible printed wiring board, and molded article |
JP2019014188A (en) * | 2017-07-10 | 2019-01-31 | Dic株式会社 | Laminate, and printed wiring board, flexible printed wiring board and molded article using the same |
JP2020059185A (en) * | 2018-10-09 | 2020-04-16 | Dic株式会社 | Laminate, electronic device, and manufacturing method therefor |
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JP6090148B2 (en) | 2013-12-19 | 2017-03-08 | 住友金属鉱山株式会社 | Method for determining adhesion strength of metal thin film / polyimide laminate, and metallized polyimide film substrate using the same |
JP6775240B2 (en) | 2016-06-10 | 2020-10-28 | 株式会社C−Ink | Composition for plating base, method for forming plating base and metal film by it |
CN110753617A (en) | 2017-07-10 | 2020-02-04 | Dic株式会社 | Laminate, printed wiring board using same, flexible printed wiring board, and molded article |
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2022
- 2022-07-15 WO PCT/JP2022/027941 patent/WO2023286872A1/en active Application Filing
- 2022-07-15 TW TW111126625A patent/TW202327876A/en unknown
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- 2022-07-15 JP JP2023534876A patent/JPWO2023286872A1/ja active Pending
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2015156459A (en) * | 2014-02-21 | 2015-08-27 | Dic株式会社 | Laminate, conductive pattern, and electronic circuit |
JP2016112704A (en) * | 2014-12-11 | 2016-06-23 | Dic株式会社 | Conductive laminate and method for manufacturing the same |
WO2019013040A1 (en) * | 2017-07-10 | 2019-01-17 | Dic株式会社 | Laminate, printed wiring board in which same is used, flexible printed wiring board, and molded article |
JP2019014188A (en) * | 2017-07-10 | 2019-01-31 | Dic株式会社 | Laminate, and printed wiring board, flexible printed wiring board and molded article using the same |
JP2020059185A (en) * | 2018-10-09 | 2020-04-16 | Dic株式会社 | Laminate, electronic device, and manufacturing method therefor |
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TW202327876A (en) | 2023-07-16 |
JPWO2023286872A1 (en) | 2023-01-19 |
CN117561164A (en) | 2024-02-13 |
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