KR20240037880A - Laminates and electronic devices having laminates - Google Patents
Laminates and electronic devices having laminates Download PDFInfo
- Publication number
- KR20240037880A KR20240037880A KR1020237043520A KR20237043520A KR20240037880A KR 20240037880 A KR20240037880 A KR 20240037880A KR 1020237043520 A KR1020237043520 A KR 1020237043520A KR 20237043520 A KR20237043520 A KR 20237043520A KR 20240037880 A KR20240037880 A KR 20240037880A
- Authority
- KR
- South Korea
- Prior art keywords
- laminate
- resin
- primer layer
- layer
- mass
- Prior art date
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J7/04—Coating
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- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/092—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
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- C08K3/08—Metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
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- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08L71/12—Polyphenylene oxides
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- C—CHEMISTRY; METALLURGY
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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Abstract
상태 시뿐만 아니라, 장기 내열 시험 후에 있어서도 도금층의 밀착성을 유지할 수 있는 적층체를 제공한다. 지지체와, 상기 지지체 상에, 프라이머층, 금속 입자층 및 금속 도금층을 순차 구비한 적층체로서, 상기 프라이머층이 중량 평균 분자량이 10,000 내지 100,000인 페녹시 수지를 포함하는, 적층체로 한다.A laminate capable of maintaining adhesion of a plating layer not only in its original state but also after a long-term heat resistance test is provided. A laminate is provided sequentially with a support, a primer layer, a metal particle layer, and a metal plating layer on the support, wherein the primer layer contains a phenoxy resin having a weight average molecular weight of 10,000 to 100,000.
Description
본 발명은 적층체에 관한 것이고, 보다 상세하게는 전자파 실드, 프린트 배선판, 집적 회로, 유기 트랜지스터 등의 전자 기기에 적합하게 사용할 수 있는 적층체 및 그것을 사용한 전자 기기에 관한 것이다.The present invention relates to a laminate, and more specifically, to a laminate that can be suitably used in electronic devices such as electromagnetic wave shields, printed wiring boards, integrated circuits, and organic transistors, and to electronic devices using the same.
전자 기기의 소형화, 고속화에 의해, 프린트 배선판의 고속화, 고성능화가 요구되고 있으며, 이 요구에 따르기 위해서, 표면이 평활하며 충분히 얇은 도전층(금속층)을 갖는 프린트 배선판이 요구되고 있다. 또한, 이 프린트 배선판을 구성하는 것으로서 플렉시블 동장 적층판(이하, 「FCCL」이라고 약기함)이 알려져 있다. FCCL은, 주로 내열성 고분자 필름과 구리박을 에폭시 수지계 접착제로 접합하는 방법으로 제조되고 있다.As electronic devices become smaller and faster, there is a demand for faster and higher performance printed wiring boards. In order to meet this demand, printed wiring boards with a smooth surface and a sufficiently thin conductive layer (metal layer) are required. Additionally, a flexible copper clad laminate (hereinafter abbreviated as “FCCL”) is known as a component of this printed wiring board. FCCL is mainly manufactured by bonding a heat-resistant polymer film and copper foil with an epoxy resin adhesive.
구리박을 사용한 FCCL에서는, 롤상으로 감긴 구리박을 인출하면서 표면에 에폭시 수지계 접착제를 도공하고, 추가로 구리박을 고분자 필름에 접합시키는 점에서, 취급상, 구리박을 충분히 얇게 할 수 없다. 추가로, 고분자 필름과의 밀착성을 높이기 위해 구리박 표면을 조면화할 필요가 있고, 프린트 배선판의 고밀도화, 고성능화를 도모하기 위해 필요한 주파수(GHz 대역), 고전송 속도(수십Gbps) 영역에서 전송 손실을 발생시킨다는 문제가 있었다.In FCCL using copper foil, an epoxy resin-based adhesive is applied to the surface while the copper foil wound in a roll is pulled out, and the copper foil is further bonded to the polymer film, so the copper foil cannot be sufficiently thin for handling purposes. In addition, it is necessary to roughen the surface of the copper foil to increase adhesion to the polymer film, and to achieve high density and high performance of printed wiring boards, transmission loss is required in the frequency (GHz band) and high transmission speed (several tens of Gbps) regions. There was a problem that caused .
한편, FCCL의 구리층을 박막화하는 방법으로서, 고분자 필름의 표면에 금속 박막을 증착 또는 스퍼터법에 의해 형성한 후, 그 금속 박막 상에 전해 구리 도금법, 무전해 도금법, 혹은 양자를 조합한 방법으로 구리를 형성하는 방법이, 종래부터 제안되어 있다(예를 들어, 특허문헌 1). 그러나, 이 방법에서는, 금속 박막을 형성하기 위해서, 증착법 또는 스퍼터법을 사용하기 때문에, 대규모의 진공 설비가 필요해져, 설비상 기재 사이즈가 한정되는 등의 문제가 있었다.Meanwhile, as a method of thinning the copper layer of FCCL, a metal thin film is formed on the surface of the polymer film by deposition or sputtering, and then the metal thin film is formed by electrolytic copper plating, electroless plating, or a combination of both. Methods for forming copper have conventionally been proposed (for example, Patent Document 1). However, in this method, since a vapor deposition or sputtering method is used to form a metal thin film, large-scale vacuum equipment is required, and there is a problem in that the size of the base material is limited due to the equipment.
또한, FCCL의 구리층을 박막화하는 다른 방법으로서, 예를 들어 특허문헌 2에는, 지지체와 금속 도금층 사이에 마련하는 도금 하지층으로서, 무기 나노 입자와 프탈로시아닌계의 배위자와 용매(분산매)를 포함하는 조성물을 사용하여, 지지체와 도금층의 밀착성을 향상시키는 것이 제안되어 있다. 또한, 특허문헌 3에는, 지지체 상에, 프라이머층으로서 아미노트리아진환을 갖는 화합물을 함유하는 층을 마련하고, 해당 프라이머층 상에 금속 나노 입자층을 마련함으로써, 지지체와 금속 도금층의 밀착성이 향상되는 것이 제안되어 있다. 또한, 특허문헌 4에는, 지지체와 도금층 사이에, 금속 입자 및 특정한 에폭시 화합물과 블록 폴리이소시아네이트의 반응물을 함유하는 금속 입자층을 개재시킴으로써, 지지체와 도금층의 밀착성이 향상되는 것이 제안되어 있다.In addition, as another method of thinning the copper layer of FCCL, for example, Patent Document 2 discloses that the plating base layer provided between the support and the metal plating layer includes inorganic nanoparticles, a phthalocyanine-based ligand, and a solvent (dispersion medium). It has been proposed to use the composition to improve the adhesion between the support and the plating layer. In addition, Patent Document 3 states that by providing a layer containing a compound having an aminotriazine ring as a primer layer on a support and providing a metal nanoparticle layer on the primer layer, the adhesion between the support and the metal plating layer is improved. It is proposed. In addition, Patent Document 4 proposes that the adhesion between the support and the plating layer is improved by interposing a metal particle layer containing metal particles and a reaction product of a specific epoxy compound and blocked polyisocyanate between the support and the plating layer.
상기한 특허문헌 1 내지 4에 있어서 제안되어 있는 적층 구조는 모두, 상태(常態) 시, 즉 도금층의 형성 후에 상온 환경 하에서 지지체와 도금층의 밀착성을 향상시키는 것이다. 그러나, 금번, 본 발명자들이, 예를 들어 150℃에서 300시간으로 하는 장기 내열 시험을 행한 바, 상태 시에는 우수한 밀착성을 갖고 있어도 장기 내열 시험 후에 있어서는 현저하게 밀착성이 저하된다는 새로운 과제가 존재하는 것이 판명되었다.All of the laminated structures proposed in the above-mentioned Patent Documents 1 to 4 improve the adhesion between the support and the plating layer in a room temperature environment in the normal state, that is, after formation of the plating layer. However, this time, the present inventors conducted a long-term heat resistance test at, for example, 150°C for 300 hours, and found that even if the adhesive had excellent adhesion in the original state, a new problem existed that the adhesion was significantly reduced after the long-term heat resistance test. It turned out.
따라서, 본 발명의 목적은, 상태 시뿐만 아니라, 장기 내열 시험 후에 있어서도 도금층의 밀착성을 유지할 수 있는 적층체를 제공하는 것이다.Therefore, the object of the present invention is to provide a laminate that can maintain the adhesion of the plating layer not only in the normal state but also after a long-term heat resistance test.
상기 과제에 대하여 본 발명자들은, 프라이머층에 고분자량의 페녹시 수지를 사용함으로써, 프라이머층의 신도를 높이고, 추가로 탄성률을 향상시킴으로써, 도금 실시 직후(상태)의 도금층의 밀착성을 개선할 수 있다는 지견을 얻었다. 또한, 고분자량의 페녹시 수지를 사용함으로써, 장기 내열 시험 중에 프라이머층 중의 폴리머의 분해 등의 열화가 억제됨으로써, 장기 내열 시험 후에 있어서도 도금층의 밀착성을 유지할 수 있다는 지견을 얻었다. 본 발명은 이러한 지견에 기초하여 완성된 것이다. 즉, 본 발명의 요지는 이하와 같다.In relation to the above problem, the present inventors have found that by using a high molecular weight phenoxy resin in the primer layer, the elongation of the primer layer can be increased and the elastic modulus can be further improved, thereby improving the adhesion of the plating layer immediately after plating (state). I gained knowledge. In addition, it was discovered that by using a high molecular weight phenoxy resin, deterioration such as decomposition of the polymer in the primer layer was suppressed during the long-term heat resistance test, and thus the adhesion of the plating layer could be maintained even after the long-term heat resistance test. The present invention was completed based on this knowledge. That is, the gist of the present invention is as follows.
[1] 지지체와, 상기 지지체 상에, 프라이머층, 금속 입자층 및 금속 도금층을 순차 구비한 적층체로서, 상기 프라이머층이 중량 평균 분자량이 10,000 내지 100,000인 페녹시 수지를 포함하는, 적층체.[1] A laminate comprising a support and a primer layer, a metal particle layer, and a metal plating layer sequentially on the support, wherein the primer layer contains a phenoxy resin having a weight average molecular weight of 10,000 to 100,000.
[2] 상기 프라이머층이 에폭시 수지를 추가로 포함하는, [1]에 기재된 적층체.[2] The laminate according to [1], wherein the primer layer further contains an epoxy resin.
[3] 상기 프라이머층이 상기 페녹시 수지와 상기 에폭시 수지를, 질량 기준에 있어서 90:10 내지 10:90의 비율로 포함하는, [2]에 기재된 적층체.[3] The laminate according to [2], wherein the primer layer contains the phenoxy resin and the epoxy resin in a ratio of 90:10 to 10:90 on a mass basis.
[4] 상기 프라이머층이, 추가로 아미노트리아진환을 갖는 화합물을 포함하는, [1] 내지 [3] 중 어느 것에 기재된 적층체.[4] The laminate according to any one of [1] to [3], wherein the primer layer further contains a compound having an aminotriazine ring.
[5] 상기 아미노트리아진환을 갖는 화합물이, 아미노트리아진 변성 노볼락 수지인, [4]에 기재된 적층체.[5] The laminate according to [4], wherein the compound having the aminotriazine ring is an aminotriazine-modified novolak resin.
[6] 상기 금속 입자층이, 금속 입자와 양이온성기를 갖는 화합물을 포함하는, [1] 내지 [5] 중 어느 것에 기재된 적층체.[6] The laminate according to any one of [1] to [5], wherein the metal particle layer contains metal particles and a compound having a cationic group.
[7] 상기 양이온성기를 갖는 화합물은, 염기성 질소 원자 함유기를 갖는 화합물인, [6]에 기재된 적층체.[7] The laminate according to [6], wherein the compound having the cationic group is a compound having a basic nitrogen atom-containing group.
[8] 상기 지지체가 가요성 수지 재료로 이루어지는, [1] 내지 [7] 중 어느 것에 기재된 적층체.[8] The laminate according to any one of [1] to [7], wherein the support is made of a flexible resin material.
[9] 전자 기기에 사용되는, [1] 내지 [8] 중 어느 것에 기재된 적층체.[9] The laminate according to any one of [1] to [8], which is used in electronic devices.
[10] 전자 기기가 프린트 배선판 및 전자파 실드로부터 선택되는, [9]에 기재된 적층체.[10] The laminate according to [9], wherein the electronic device is selected from a printed wiring board and an electromagnetic wave shield.
[11] [1] 내지 [10] 중 어느 것에 기재된 적층체를 구비한 전자 기기.[11] An electronic device including the laminate according to any one of [1] to [10].
본 발명에 따르면, 지지체와 프라이머층과 금속 입자층과 금속 도금층을 순차 구비한 적층체에 있어서, 프라이머층으로서 중량 평균 분자량이 10,000 내지 100,000인 페녹시 수지를 사용함으로써, 상태 시뿐만 아니라, 장기 내열 시험 후에 있어서도 금속 도금층의 밀착성을 유지할 수 있다.According to the present invention, in a laminate sequentially provided with a support, a primer layer, a metal particle layer, and a metal plating layer, a phenoxy resin with a weight average molecular weight of 10,000 to 100,000 is used as the primer layer, thereby enabling heat resistance testing not only in the normal state but also in long-term heat resistance tests. Even later, the adhesion of the metal plating layer can be maintained.
[적층체][Laminate]
본 발명에 의한 적층체는, 지지체와, 상기 지지체 상에, 프라이머층, 금속 입자층 및 금속 도금층을 순차 구비하고 있다. 이하, 본 발명의 적층체를 구성하는 각 요소에 대하여 설명한다.The laminate according to the present invention includes a support, and on the support, a primer layer, a metal particle layer, and a metal plating layer in that order. Hereinafter, each element constituting the laminate of the present invention will be described.
<지지체><Support>
지지체로서는, 후기하는 프라이머층, 금속 입자층, 금속 도금층을 순차 적층할 수 있는 기계적 강도를 구비하고 있는 재료라면 특별히 제한없이 사용할 수 있고, 예를 들어 예를 들어 폴리이미드 수지, 폴리아미드이미드 수지, 폴리아미드 수지, 폴리에틸렌테레프탈레이트 수지, 폴리부틸렌테레프탈레이트 수지, 폴리에틸렌나프탈레이트 수지, 폴리카보네이트 수지, 아크릴로니트릴-부타디엔-스티렌(ABS) 수지, 폴리스티렌, 시클로올레핀 폴리머, 액정 폴리머, 폴리에테르에테르케톤, 폴리페닐렌술피드 수지, 폴리페닐술폰, 폴리페닐렌에테르, 폴리(메타)아크릴산메틸 등의 아크릴 수지, 폴리불화비닐리덴 수지, 폴리염화비닐 수지, 폴리염화비닐리덴 수지, 폴리비닐알코올 수지, 폴리에틸렌 수지, 폴리프로필렌 수지, 우레탄 수지, 실리콘, 실리콘 카바이드, 질화갈륨, 사파이어, 세라믹스, 유리, 유리 에폭시 수지, 유리 폴리이미드, 종이 페놀, 다이아몬드 라이크 카본, 알루미나, 폴리에스테르 섬유, 폴리아미드 섬유, 폴리아라미드 섬유 등의 합성 섬유, 카본 파이버 등의 무기 섬유, 셀룰로오스 나노파이버 등의 천연 섬유 등을 들 수 있다. 이들 지지체는 절연성의 것이 바람직하고, 다공질의 것을 사용할 수 있다. 또한, 지지체는 단일 재료를 포함하는 것이어도 되고, 복수 재료를 적층한 것이어도 된다.As the support, any material that has the mechanical strength to sequentially stack the primer layer, metal particle layer, and metal plating layer described later can be used without particular restrictions, for example, polyimide resin, polyamideimide resin, poly Amide resin, polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polycarbonate resin, acrylonitrile-butadiene-styrene (ABS) resin, polystyrene, cycloolefin polymer, liquid crystal polymer, polyether ether ketone, Acrylic resins such as polyphenylene sulfide resin, polyphenylene sulfone, polyphenylene ether, and poly(meth)methyl acrylate, polyvinylidene fluoride resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyvinyl alcohol resin, and polyethylene resin. , polypropylene resin, urethane resin, silicon, silicon carbide, gallium nitride, sapphire, ceramics, glass, glass epoxy resin, glass polyimide, paper phenol, diamond-like carbon, alumina, polyester fiber, polyamide fiber, polyaramid fiber. These include synthetic fibers such as synthetic fibers, inorganic fibers such as carbon fiber, and natural fibers such as cellulose nanofibers. These supports are preferably insulating, and porous ones can be used. Additionally, the support may contain a single material or may be a laminate of multiple materials.
또한, 지지체로서는, 예를 들어 폴리에스테르 섬유, 폴리아미드 섬유, 아라미드 섬유 등의 합성 섬유, 면, 마 등의 천연 섬유 등을 포함하는 기재를 사용할 수도 있다. 상기 섬유에는, 미리 가공이 실시되어 있어도 된다.Additionally, as the support, a substrate containing, for example, synthetic fibers such as polyester fibers, polyamide fibers, and aramid fibers, and natural fibers such as cotton and hemp, may be used. The fiber may have been previously processed.
지지체로서는, 일반적으로 전기 회로 등의 도전성 패턴을 형성할 때의 지지체로서 사용되는 경우가 많은, 폴리이미드 수지, 폴리에틸렌테레프탈레이트, 폴리에틸렌나프탈레이트, 유리, 셀룰로오스 나노파이버 등을 포함하는 지지체가 바람직하다.As the support, a support containing polyimide resin, polyethylene terephthalate, polyethylene naphthalate, glass, cellulose nanofiber, etc., which are often used as a support when forming conductive patterns such as electric circuits, is preferred.
지지체는 상기 중에서도, 적층체에 유연성을 부여하고, 절곡 가능한 최종 제품을 얻기 위해서 가요성 수지 재료를 포함하는 것이 바람직하다. 구체적으로는, 1축 또는 2축 연신하거나 함으로써 형성된 필름상 또는 시트상의 형태인 것이 바람직하다. 필름상 또는 시트상의 지지체로서는, 예를 들어 폴리이미드 필름, 폴리에틸렌테레프탈레이트 필름, 폴리에틸렌나프탈레이트 필름, 폴리부틸렌테레프탈레이트 필름 등을 들 수 있다.Among the above, the support preferably contains a flexible resin material in order to provide flexibility to the laminate and obtain a final product that can be bent. Specifically, it is preferable that it is in the form of a film or sheet formed by uniaxial or biaxial stretching. Examples of the film-shaped or sheet-shaped support include polyimide film, polyethylene terephthalate film, polyethylene naphthalate film, and polybutylene terephthalate film.
지지체의 형상이 필름상 또는 시트상인 경우, 특별히 두께가 한정되는 것은 아니지만, 유연성이나 절곡성을 고려하면, 통상 1 내지 5,000㎛ 정도이고, 1 내지 500㎛인 것이 보다 바람직하고, 1 내지 200㎛인 것이 보다 바람직하다.When the shape of the support is film or sheet, the thickness is not particularly limited, but considering flexibility and bendability, it is usually about 1 to 5,000 ㎛, more preferably 1 to 500 ㎛, and 1 to 200 ㎛. It is more preferable.
지지체 표면은, 후기하는 프라이머층과의 밀착성을 보다 높이기 위해서, 필요에 따라서 평활성을 상실하지 않을 정도의 미세한 요철을 형성하거나, 히드록실기, 카르보닐기, 카르복실기 등의 관능기의 도입을 위해 표면 처리되어 있어도 된다. 예를 들어, 코로나 방전 처리 등의 플라스마 방전 처리, 자외선 처리 등의 건식 처리, 물, 산·알칼리 등의 수용액 또는 유기 용제 등을 사용하는 습식 처리 등의 방법을 들 수 있다.In order to further increase adhesion to the primer layer described later, the surface of the support may, if necessary, be treated to form fine irregularities without losing smoothness or to introduce functional groups such as hydroxyl, carbonyl, and carboxyl groups. do. For example, methods such as plasma discharge treatment such as corona discharge treatment, dry treatment such as ultraviolet treatment, and wet treatment using water, an aqueous solution such as an acid or an alkali, or an organic solvent, etc. can be mentioned.
<프라이머층><Primer layer>
프라이머층은, 상기한 지지체와 후기하는 금속 입자층의 밀착성을 향상시키는 기능을 갖는 것이다. 본 발명에 있어서, 프라이머층은 중량 평균 분자량이 10,000 내지 100,000인 범위에 있는 페녹시 수지를 필수 성분으로서 포함한다. 본 발명에 있어서는, 프라이머층에 고분자량의 페녹시 수지를 사용함으로써, 폴리머의 신도를 향상시키고, 추가로 탄성률을 향상시킴으로써, 지지체와 금속 도금층의 밀착성을 향상시킬 수 있다. 또한, 고분자량의 페녹시 수지의 사용에 의해, 장기 내열 시험 중의 열에 의한 폴리머의 분해 등의 열화를 억제할 수 있는 점에서, 장기 내열 시험 후에 있어서도, 금속 도금층의 밀착성을 유지할 수 있다.The primer layer has the function of improving the adhesion between the support described above and the metal particle layer described later. In the present invention, the primer layer contains as an essential component a phenoxy resin having a weight average molecular weight in the range of 10,000 to 100,000. In the present invention, by using a high molecular weight phenoxy resin in the primer layer, the elongation of the polymer can be improved and the elastic modulus can be further improved, thereby improving the adhesion between the support and the metal plating layer. In addition, by using a high molecular weight phenoxy resin, deterioration such as decomposition of the polymer due to heat during the long-term heat resistance test can be suppressed, so the adhesion of the metal plating layer can be maintained even after the long-term heat resistance test.
페녹시 수지는 2가의 페놀 화합물과 에피클로로히드린의 반응, 또는 2가의 에폭시 화합물과 2가의 페놀 화합물을 반응시켜 얻어지는, 폴리히드록시폴리에테르이다. 2가의 페놀 화합물로서는 비스페놀류를 들 수 있다. 페녹시 수지로서는, 예를 들어 비스페놀 A 구조(골격)를 갖는 페녹시 수지, 비스페놀 F 구조를 갖는 페녹시 수지, 비스페놀 S 구조를 갖는 페녹시 수지, 비스페놀 M 구조를 갖는 페녹시 수지, 비스페놀 P 구조를 갖는 페녹시 수지, 비스페놀 Z 구조를 갖는 페녹시 수지 등을 들 수 있다. 그 밖에도, 노볼락 구조, 안트라센 구조, 플루오렌 구조, 디시클로펜타디엔 구조, 노르보르넨 구조, 나프탈렌 구조, 비페닐 구조, 아다만탄 구조 등의 골격 구조를 갖는 페녹시 수지 등을 들 수 있다. 이들 페녹시 수지는 1종을 단독으로 사용해도 되고, 2종 이상을 혼합하여 사용해도 된다. 이들 중에서도 비스페놀 구조를 갖는 것이 바람직하고, 비스페놀 A 골격, 비스페놀 F 골격, 비스페놀 S 골격이 보다 바람직하다. 또한, 페녹시 수지의 말단은 페놀성 수산기, 에폭시기 등의 어느 관능기여도 된다.Phenoxy resin is a polyhydroxypolyether obtained by reacting a dihydric phenol compound with epichlorohydrin, or by reacting a dihydric epoxy compound with a dihydric phenol compound. Bisphenols are examples of divalent phenol compounds. Examples of the phenoxy resin include a phenoxy resin with a bisphenol A structure (skeleton), a phenoxy resin with a bisphenol F structure, a phenoxy resin with a bisphenol S structure, a phenoxy resin with a bisphenol M structure, and a bisphenol P structure. A phenoxy resin having a , a phenoxy resin having a bisphenol Z structure, etc. can be mentioned. In addition, phenoxy resins having skeletal structures such as novolak structure, anthracene structure, fluorene structure, dicyclopentadiene structure, norbornene structure, naphthalene structure, biphenyl structure, and adamantane structure can be mentioned. . These phenoxy resins may be used individually, or two or more types may be mixed. Among these, those having a bisphenol structure are preferable, and bisphenol A skeleton, bisphenol F skeleton, and bisphenol S skeleton are more preferred. Additionally, the terminal of the phenoxy resin may be any functional group such as a phenolic hydroxyl group or an epoxy group.
본 발명에 있어서, 사용하는 페녹시 수지의 중량 평균 분자량은 10,000 내지 100,000의 범위이다. 분자량이 10,000 이상이면 장기 내열 시험 후의 도금 밀착력이 높아지고, 또한 분자량이 100,000 이하이면 유기 용제에 대한 용해성이 향상되고, 프라이머층을 형성할 때의 도공액 점도가 적당해지기 때문에, 핸들링이 양호해진다. 페녹시 수지의 바람직한 중량 평균 분자량은 20,000 내지 50,000이며, 보다 바람직하게는 22,000 내지 50,000이다. 또한, 페녹시 수지의 중량 평균 분자량은 상기 반응에 있어서, 에폭시 수지와 페놀 수지의 몰비나 반응 시간에 의해 조정할 수 있다. 또한, 본 명세서에 있어서, 중량 평균 분자량은 후술하는 겔 투과 크로마토그래피(GPC)로 측정한, 표준 폴리스티렌으로 환산한 값을 채용하였다. GPC의 측정에는, 측정 장치로서 고속 GPC 장치(HLC-8420GPC, 도소 가부시키가이샤제)를 사용하고, 칼럼은 TSKgelG5000HxL/G4000HxL/G3000HxL/G2000HxL(도소 가부시키가이샤제)을 직렬로 연결하여 사용하고, 용리액으로서 테트라히드로푸란을 사용하고, RI 검출기를 사용하여 측정하였다. 또한, 페녹시 수지란, 일반적으로 고분자량의 에폭시 수지를 의미하지만, 본 명세서에 있어서 「에폭시 수지」란, 중량 평균 분자량이 10,000 미만인 것을 의미하는 것으로 하고, 상기한 페녹시 수지와는 구별되는 것으로 한다.In the present invention, the weight average molecular weight of the phenoxy resin used is in the range of 10,000 to 100,000. If the molecular weight is 10,000 or more, the plating adhesion after a long-term heat resistance test increases, and if the molecular weight is 100,000 or less, the solubility in organic solvents improves and the coating solution viscosity when forming the primer layer becomes appropriate, thereby improving handling. The preferred weight average molecular weight of the phenoxy resin is 20,000 to 50,000, more preferably 22,000 to 50,000. Additionally, the weight average molecular weight of the phenoxy resin can be adjusted by the molar ratio or reaction time of the epoxy resin and phenol resin in the above reaction. In addition, in this specification, the weight average molecular weight was measured by gel permeation chromatography (GPC) described later and converted to standard polystyrene. For GPC measurement, a high-speed GPC device (HLC-8420GPC, manufactured by Tosoh Corporation) is used as the measuring device, and TSKgelG5000HxL/G4000HxL/G3000HxL/G2000HxL (manufactured by Tosoh Corporation) are used in series as columns. Tetrahydrofuran was used as an eluent, and measurement was performed using an RI detector. In addition, a phenoxy resin generally means a high molecular weight epoxy resin, but in this specification, “epoxy resin” means a weight average molecular weight of less than 10,000, and is distinguished from the above-mentioned phenoxy resin. do.
상기한 페녹시 수지로서 시판되는 것을 사용해도 되고, 예를 들어 미쓰비시 케미컬 가부시키가이샤제의 1256, 4250(모두 비스페놀 A 골격 함유 페녹시 수지), 4275(비스 A/비스 F 혼합 타입), YL6794, YL7213, YL7290, YL7482, YL7553, YX8100(비스페놀 S 골격 함유 페녹시 수지), X6954(비스페놀아세토페논 골격 함유 페녹시 수지, YX7200(시클로헥산 골격 함유 페녹시 수지), 닛테츠 케미컬&머티리얼 가부시키가이샤제의 YP-70(비스페놀 F형 페녹시 수지), ZX-1356-2(비스페놀 A 및 비스페놀 F 골격 함유 페녹시 수지), YPB-40PXM40(브롬 함유 페녹시 수지), ERF-001M30(인 함유 페녹시 수지), FX-280, FX-293, FX-310(플루오렌 골격 함유 페녹시 수지), Gabriel Phenoxies사제의 PKHA, PKHB, PKHB+, PKHC, PKHH, PKHJ, PKFE 등을 들 수 있다.As the above-mentioned phenoxy resin, commercially available ones may be used, for example, 1256, 4250 (all phenoxy resins containing bisphenol A skeleton), 4275 (bis A/bis F mixed type), YL6794, manufactured by Mitsubishi Chemical Corporation. YL7213, YL7290, YL7482, YL7553, YX8100 (phenoxy resin containing bisphenol S skeleton), YP-70 (bisphenol F type phenoxy resin), ZX-1356-2 (phenoxy resin containing bisphenol A and bisphenol F skeleton), YPB-40PXM40 (phenoxy resin containing bromine), ERF-001M30 (phenoxy resin containing phosphorus resin), FX-280, FX-293, FX-310 (phenoxy resin containing a fluorene skeleton), PKHA, PKHB, PKHB+, PKHC, PKHH, PKHJ, PKFE, etc. manufactured by Gabriel Phenoxies.
본 발명에 있어서 프라이머층에는, 상기한 페녹시 수지와 병용하여 에폭시 수지가 포함되어 있는 것이 바람직하다. 페녹시 수지와 에폭시 수지를 병용함으로써, 한층 더 상태 시 및 장기 내열 시험 후의 금속 도금층 밀착성이 향상된다.In the present invention, it is preferable that the primer layer contains an epoxy resin in combination with the phenoxy resin described above. By using a phenoxy resin and an epoxy resin together, the adhesion of the metal plating layer is further improved as-is and after a long-term heat resistance test.
에폭시 수지로서는, 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 비페닐형 에폭시 수지, 크레졸노볼락형 에폭시 수지, 페놀노볼락형 에폭시 수지, 비스페놀 A 노볼락형 에폭시 수지, 알코올에테르형 에폭시 수지, 테트라 브롬 비스페놀 A형 에폭시 수지, 나프탈렌형 에폭시 수지, 9,10-디히드로-9-옥사-10-포스파페난트렌-10-옥사이드 유도체 유래의 구조를 갖는 인 함유 에폭시 화합물, 디시클로펜타디엔 유도체 유래의 구조를 갖는 에폭시 수지, 에폭시화 대두유 등의 유지의 에폭시화물 등을 들 수 있다. 이들 에폭시 수지는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다.As the epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, cresol novolak type epoxy resin, phenol novolak type epoxy resin, bisphenol A novolak type epoxy resin, alcohol ether type epoxy resin, Tetrabromobisphenol A-type epoxy resin, naphthalene-type epoxy resin, phosphorus-containing epoxy compound having a structure derived from 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide derivative, dicyclopentadiene derivative Examples include epoxy resins with derived structures and epoxidized products of fats and oils such as epoxidized soybean oil. These epoxy resins may be used individually, or two or more types may be used in combination.
페녹시 수지와 병용하는 에폭시 수지로서는, 금속 도금층의 밀착성을 보다 향상시킬 수 있는 점에서, 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 비페닐형 에폭시 수지, 크레졸노볼락형 에폭시 수지, 페놀노볼락형 에폭시 수지, 비스페놀 A 노볼락형 에폭시 수지 등의 방향족 에폭시 수지가 바람직하고, 특히, 비스페놀 A형 에폭시 수지가 바람직하다.Epoxy resins used in combination with phenoxy resins include bisphenol A-type epoxy resins, bisphenol F-type epoxy resins, biphenyl-type epoxy resins, cresol novolak-type epoxy resins, and phenol epoxy resins, since they can further improve the adhesion of the metal plating layer. Aromatic epoxy resins such as rockfish-type epoxy resin and bisphenol A novolak-type epoxy resin are preferable, and bisphenol A-type epoxy resin is especially preferable.
에폭시 수지의 에폭시 당량은, 밀착성을 보다 향상시킬 수 있는 점에서, 100 내지 5,000g/당량인 것이 바람직하고, 120 내지 2,000g/당량인 것이 보다 바람직하고, 120 내지 250g/당량인 것이 더욱 바람직하다.The epoxy equivalent of the epoxy resin is preferably 100 to 5,000 g/equivalent, more preferably 120 to 2,000 g/equivalent, and even more preferably 120 to 250 g/equivalent, since adhesion can be further improved. .
프라이머층 중의 페녹시 수지에 더하여 에폭시 수지가 더 포함되는 경우, 페녹시 수지와 에폭시 수지의 배합 비율은, 질량 기준에 있어서 90:10 내지 10:90인 것이 바람직하고, 85:15 내지 15:80인 것이 보다 바람직하다.When an epoxy resin is further included in addition to the phenoxy resin in the primer layer, the mixing ratio of the phenoxy resin and the epoxy resin is preferably 90:10 to 10:90, and 85:15 to 15:80 on a mass basis. It is more preferable to be
또한, 본 발명에 있어서, 프라이머층은, 아미노트리아진환을 갖는 화합물을 포함하는 것이 바람직하다. 아미노트리아진환을 갖는 화합물은 저분자량의 화합물이어도, 보다 고분자량의 수지 등의 화합물이어도 된다.Furthermore, in the present invention, it is preferable that the primer layer contains a compound having an aminotriazine ring. The compound having an aminotriazine ring may be a low molecular weight compound or a higher molecular weight compound such as a resin.
아미노트리아진환을 갖는 저분자량의 화합물로서는, 아미노트리아진환을 갖는 각종 첨가제를 사용할 수 있다. 시판품으로서는, 아미노트리아진환과 수산기를 갖는 화합물인 VT, VD-3, VD-4(모두 시코쿠 가세이 가부시키가이샤)이나, 아미노트리아진환과 에톡시실릴기를 갖는 화합물인 VD-5(시코쿠 가세이 가부시키가이샤) 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상 병용해도 된다.As a low molecular weight compound having an aminotriazine ring, various additives having an aminotriazine ring can be used. Commercially available products include VT, VD-3, and VD-4 (all manufactured by Shikoku Kasei Co., Ltd.), which are compounds having an aminotriazine ring and a hydroxyl group, and VD-5 (all manufactured by Shikoku Kasei Co., Ltd.), which is a compound having an aminotriazine ring and an ethoxysilyl group. Gaisha), etc. These may be used individually or in combination of two or more types.
아미노트리아진환을 갖는 저분자량의 화합물의 사용량으로서는, 상기한 수지 성분 100질량부에 대하여 0.1 내지 50질량부가 바람직하고, 0.5 내지 10질량부가 보다 바람직하다.The amount of the low molecular weight compound having an aminotriazine ring to be used is preferably 0.1 to 50 parts by mass, more preferably 0.5 to 10 parts by mass, per 100 parts by mass of the resin component.
아미노트리아진환을 갖는 수지로서는, 수지의 폴리머쇄 중에 아미노트리아진환이 공유 결합으로 도입되어 있는 것을 들 수 있다. 구체적으로는 아미노트리아진 변성 노볼락 수지가 바람직하다.Resins having an aminotriazine ring include those in which the aminotriazine ring is introduced by a covalent bond into the polymer chain of the resin. Specifically, aminotriazine-modified novolak resin is preferable.
아미노트리아진 변성 노볼락 수지는, 아미노트리아진환 구조와 페놀 구조가 메틸렌기를 통해 결합된 노볼락 수지이다. 아미노트리아진 변성 노볼락 수지는, 예를 들어 멜라민, 벤조구아나민, 아세토구아나민 등의 아미노트리아진 화합물과, 페놀, 크레졸, 부틸페놀, 비스페놀 A, 페닐페놀, 나프톨, 레조르신 등의 페놀 화합물과, 포름알데히드를, 알킬아민 등의 약 알칼리성 촉매의 존재 하 또는 무촉매로, 중성 부근에서 공축합 반응시키거나, 메틸에테르화멜라민 등의 아미노트리아진 화합물의 알킬에테르화물과, 페놀 화합물을 반응시킴으로써 얻을 수 있다.Aminotriazine-modified novolac resin is a novolak resin in which an aminotriazine ring structure and a phenol structure are bonded through a methylene group. Aminotriazine-modified novolak resins include, for example, aminotriazine compounds such as melamine, benzoguanamine, and acetoguanamine, and phenol compounds such as phenol, cresol, butylphenol, bisphenol A, phenylphenol, naphthol, and resorcin. and formaldehyde are cocondensed in the vicinity of neutrality in the presence of a weakly alkaline catalyst such as an alkylamine or without a catalyst, or an alkyl etherified product of an aminotriazine compound such as methyl etherified melamine is reacted with a phenol compound. You can get it by doing it.
아미노트리아진 변성 노볼락 수지는 메틸올기를 실질적으로 갖지 않는 것이 바람직하다. 또한, 아미노트리아진 변성 노볼락 수지에는, 그 제조 시에 부생성물로서 발생하는 아미노트리아진 구조만이 메틸렌 결합된 분자, 페놀 구조만이 메틸렌 결합된 분자 등이 포함되어 있어도 상관없다. 또한, 약간량의 미반응 원료가 포함되어 있어도 된다.It is preferable that the aminotriazine-modified novolac resin has substantially no methylol group. Additionally, the aminotriazine-modified novolak resin may contain molecules in which only the aminotriazine structure is methylene-bonded, molecules in which only the phenol structure is methylene-bonded, etc., which are generated as by-products during its production. Additionally, a small amount of unreacted raw materials may be contained.
페놀 구조로서는, 예를 들어 페놀 잔기, 크레졸 잔기, 부틸페놀 잔기, 비스페놀 A 잔기, 페닐페놀 잔기, 나프톨 잔기, 레조르신 잔기 등을 들 수 있다. 또한, 여기서의 잔기란, 방향환의 탄소에 결합되어 있는 수소 원자가 적어도 하나가 빠진 구조를 의미한다. 예를 들어, 페놀의 경우에는, 히드록시페닐기를 의미한다.Examples of the phenol structure include phenol residue, cresol residue, butylphenol residue, bisphenol A residue, phenylphenol residue, naphthol residue, and resorcin residue. Additionally, the residue here means a structure in which at least one hydrogen atom bonded to the carbon of the aromatic ring is missing. For example, in the case of phenol, it means a hydroxyphenyl group.
트리아진 구조로서는, 예를 들어 멜라민, 벤조구아나민, 아세토구아나민 등의 아미노트리아진 화합물 유래의 구조를 들 수 있다.Examples of the triazine structure include structures derived from aminotriazine compounds such as melamine, benzoguanamine, and acetoguanamine.
페놀 구조 및 트리아진 구조는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다. 또한, 밀착성을 보다 향상시킬 수 있는 점에서, 페놀 구조로서는 페놀 잔기가 바람직하고, 트리아진 구조로서는 멜라민 유래의 구조가 바람직하다.The phenol structure and the triazine structure may be used individually or in combination of two or more types. Moreover, since adhesion can be further improved, a phenol residue is preferable as the phenol structure, and a structure derived from melamine is preferable as the triazine structure.
또한, 아미노트리아진 변성 노볼락 수지의 수산기가는, 밀착성을 보다 향상시킬 수 있는 점에서, 50 내지 200mgKOH/g인 것이 바람직하고, 80 내지 180mgKOH/g인 것이 보다 바람직하다.In addition, the hydroxyl value of the aminotriazine-modified novolak resin is preferably 50 to 200 mgKOH/g, and more preferably 80 to 180 mgKOH/g, since adhesion can be further improved.
아미노트리아진 변성 노볼락 수지는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다. 또한, 에폭시 수지와 아미노트리아진 변성 노볼락 수지를 병용하여 사용하는 경우에는, 밀착성 향상의 관점에서, 아미노트리아진 변성 노볼락 수지 중의 페놀성 수산기(x)과 에폭시 수지 중의 에폭시기(y)의 몰비(y/x)는, 0.1 내지 5의 범위인 것이 바람직하고, 0.2 내지 3의 범위인 것이 보다 바람직하다.Aminotriazine-modified novolak resins may be used individually, or two or more types may be used in combination. In addition, when using an epoxy resin and an aminotriazine-modified novolak resin in combination, from the viewpoint of improving adhesion, the molar ratio of the phenolic hydroxyl group (x) in the aminotriazine-modified novolac resin and the epoxy group (y) in the epoxy resin is (y/x) is preferably in the range of 0.1 to 5, and more preferably in the range of 0.2 to 3.
프라이머층은, 상기한 에폭시 수지나 아미노트리아진환을 갖는 화합물에 더하여, 필요에 따라서 추가로 가교제가 포함되어 있어도 된다. 가교제로서는, 다가 카르복실산을 사용하는 것이 바람직하다. 다가 카르복실산으로서는, 예를 들어 무수트리멜리트산, 무수피로멜리트산, 무수말레산, 숙신산 등을 들 수 있다. 이들 가교제는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다. 또한, 이들 가교제 중에서도, 밀착성을 보다 향상시킬 수 있는 점에서, 무수트리멜리트산이 바람직하다.In addition to the above-described epoxy resin and the compound having an aminotriazine ring, the primer layer may further contain a crosslinking agent as needed. As a crosslinking agent, it is preferable to use polyhydric carboxylic acid. Examples of polyhydric carboxylic acids include trimellitic anhydride, pyromellitic anhydride, maleic anhydride, and succinic acid. These crosslinking agents may be used individually, or two or more types may be used in combination. Moreover, among these crosslinking agents, trimellitic anhydride is preferable because it can further improve adhesion.
또한, 에폭시기와 각종 경화제의 반응을 촉진시키기 위해서, 경화 촉매를 사용해도 된다. 상기 경화 촉매로서는, 제3급 아민, 이미다졸 화합물, 유기 포스핀, 루이스산 촉매 등을 들 수 있다.Additionally, a curing catalyst may be used to promote the reaction between the epoxy group and various curing agents. Examples of the curing catalyst include tertiary amines, imidazole compounds, organic phosphines, and Lewis acid catalysts.
제3급 아민으로서는, 예를 들어 트리메틸아민, 트리에틸아민, 트리프로필아민, 트리부틸아민, 트리아밀아민, 트리헥실아민, 트리옥틸아민, 트리라우릴아민, 디메틸에틸아민, 디메틸프로필아민, 디메틸부틸아민, 디메틸아밀아민, 디메틸헥실아민, 디메틸시클로헥실아민, 디메틸옥틸아민, 디메틸라우릴아민, 트리알릴아민, 테트라메틸에틸렌디아민, 트리에틸렌디아민(트리에틸렌테트라민: TETA), N-메틸모르폴린, 4,4'-(옥시디-2,1-에탄디일)비스-모르폴린, N,N-디메틸벤질아민, 피리딘, 피콜린, 디메틸아미노메틸페놀, 트리스디메틸아미노메틸페놀, 트리에탄올아민, N,N'-디메틸피페라진, 테트라메틸부탄디아민, 비스(2,2-모르폴리노에틸)에테르, 비스(디메틸아미노에틸)에테르, N,N',N"-트리스(디메틸아미노프로필)헥사히드로-s-트리아진, N,N',N"-트리스(디메틸아미노에틸)헥사히드로-s-트리아진, N,N',N"-트리스(2-히드록시에틸)헥사히드로-s-트리아진, 2,4-디아미노-6-[2'-메틸이미다졸릴-(1')]-에틸-s-트리아진, 1,8-디아자비시클로[5.4.0]운데센-1,1,4-디아자비시클로[2.2.2]옥탄, 1,8-디아자비시클로[5.4.0]운데크-7-엔(DBU) 등을 들 수 있다.Tertiary amines include, for example, trimethylamine, triethylamine, tripropylamine, tributylamine, triamylamine, trihexylamine, trioctylamine, trilaurylamine, dimethylethylamine, dimethylpropylamine, and dimethylamine. Butylamine, dimethylamylamine, dimethylhexylamine, dimethylcyclohexylamine, dimethyloctylamine, dimethyllaurylamine, triallylamine, tetramethylethylenediamine, triethylenediamine (triethylenetetramine: TETA), N-methylmor Pauline, 4,4'-(oxydi-2,1-ethanediyl)bis-morpholine, N,N-dimethylbenzylamine, pyridine, picoline, dimethylaminomethylphenol, trisdimethylaminomethylphenol, triethanolamine, N,N'-dimethylpiperazine, tetramethylbutanediamine, bis(2,2-morpholinoethyl)ether, bis(dimethylaminoethyl)ether, N,N',N"-tris(dimethylaminopropyl)hexa Hydro-s-triazine, N,N',N"-tris(dimethylaminoethyl)hexahydro-s-triazine, N,N',N"-tris(2-hydroxyethyl)hexahydro-s- Triazine, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine, 1,8-diazabicyclo[5.4.0]undecene-1 , 1,4-diazabicyclo[2.2.2]octane, 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU), etc.
이미다졸 화합물로서는, 예를 들어 1-벤질-2-이미다졸(1B2MZ), 2-에틸-4-이미다졸, 2-운데르이미다졸, 1,2-디메틸이미다졸, 1-벤질-2-페닐이미다졸, 2-메틸이미다졸, 2-에틸-4-메틸이미다졸(2E4MZ), 2-페닐-4-메틸-5-히드록시메틸이미다졸(2P4MHZ), 2,3-디히드로-1H-피롤로[1,2-a]벤즈이미다졸(TBZ) 등을 들 수 있다.Examples of imidazole compounds include 1-benzyl-2-imidazole (1B2MZ), 2-ethyl-4-imidazole, 2-underimidazole, 1,2-dimethylimidazole, and 1-benzyl-2. -phenylimidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole (2E4MZ), 2-phenyl-4-methyl-5-hydroxymethylimidazole (2P4MHZ), 2,3 -dihydro-1H-pyrrolo[1,2-a]benzimidazole (TBZ), etc. can be mentioned.
유기 포스핀으로서는, 예를 들어 트리페닐포스핀(TPP), 트리페닐포스핀-트리페닐보레이트, 트리스(p-메톡시페닐)포스핀, 테트라페닐포스포늄·테트라페닐보레이트 등을 들 수 있다.Examples of organic phosphine include triphenylphosphine (TPP), triphenylphosphine-triphenyl borate, tris(p-methoxyphenyl)phosphine, and tetraphenylphosphonium/tetraphenyl borate.
루이스산 촉매로서는, 예를 들어 3불화붕소아민 착체, 3염화붕소아민 착체, 3불화붕소에틸아민 착체 등의 루이스산 촉매 등을 들 수 있다.Examples of the Lewis acid catalyst include Lewis acid catalysts such as boronamine trifluoride complex, boronamine trichloride complex, and boronethylamine trifluoride complex.
이들 경화 촉매 중에서도, 밀착성을 보다 향상시킬 수 있는 점에서, 제3급 아민, 이미다졸 화합물을 사용하는 것이 바람직하고, 이미다졸 화합물을 사용하는 것이 보다 바람직하다. 또한, 이들 경화 촉매는 1종으로 사용하는 것도 2종 이상 병용할 수도 있다. 또한, 상기 경화 촉매의 적합한 배합량은 고형분 환산으로, 프라이머층에 포함되는 전체 수지의 합계량 100질량부에 대하여, 0.3 내지 20질량부가 바람직하고, 0.5 내지 15질량부가 보다 바람직하다.Among these curing catalysts, it is preferable to use a tertiary amine and an imidazole compound, and it is more preferable to use an imidazole compound since the adhesion can be further improved. In addition, these curing catalysts can be used alone or in combination of two or more types. In addition, the suitable compounding amount of the curing catalyst is preferably 0.3 to 20 parts by mass, more preferably 0.5 to 15 parts by mass, based on 100 parts by mass of the total amount of all resins contained in the primer layer, in terms of solid content.
또한, 프라이머층은 필요에 따라서, 상기한 이외의 성분으로서, 기타 수지가 포함되어 있어도 된다. 기타 수지로서는, 예를 들어 우레탄 수지, 아크릴 수지, 이미드 수지, 아미드 수지, 멜라민 수지, 페놀 수지, 요소포름알데히드 수지, 페놀을 블록화제로서 사용한 블록 폴리이소시아네이트, 폴리비닐알코올, 폴리비닐피롤리돈 등을 들 수 있다. 이들 바인더 수지는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다.Additionally, the primer layer may, if necessary, contain other resins as components other than those mentioned above. Other resins include, for example, urethane resin, acrylic resin, imide resin, amide resin, melamine resin, phenol resin, urea-formaldehyde resin, blocked polyisocyanate using phenol as a blocking agent, polyvinyl alcohol, and polyvinylpyrrolidone. etc. can be mentioned. These binder resins may be used individually, or two or more types may be used together.
또한, 상기 프라이머층을 형성할 때에는, 지지체에의 도공 시에 도공하기 쉬운 점도로 하기 위해서, 상기 성분에 더하여 유기 용제를 배합하는 것이 바람직하다. 유기 용제로서는, 예를 들어 톨루엔, 아세트산에틸, 메틸에틸케톤, 메틸이소부틸케톤, 시클로헥사논, 이소프로필알코올 등을 들 수 있다.In addition, when forming the primer layer, it is preferable to mix an organic solvent in addition to the above components in order to provide a viscosity that is easy to apply when coating on a support. Examples of organic solvents include toluene, ethyl acetate, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and isopropyl alcohol.
유기 용제의 사용량은, 지지체에 도공할 때에 사용하는 도공 방법, 프라이머층의 소망으로 하는 두께에 의해, 적절히 조정할 수 있다.The amount of the organic solvent used can be appropriately adjusted depending on the coating method used when coating the support and the desired thickness of the primer layer.
또한, 프라이머층을 형성하는 도공액에는, 필요에 따라서 피막 형성 보조제, 레벨링제, 증점제, 발수제, 소포제, 산화 방지제 등의 공지된 첨가제를 적절히 첨가하여 사용해도 된다.Additionally, known additives such as film forming aids, leveling agents, thickeners, water repellent agents, anti-foaming agents, and antioxidants may be added to the coating solution for forming the primer layer as needed.
프라이머층은, 지지체의 표면 일부 또는 전부에 상기한 성분을 포함하는 도공액을 도포하고, 도공액 중에 포함되는 유기 용제를 가열 내지 건조시켜 제거함으로써 형성할 수 있다.The primer layer can be formed by applying a coating solution containing the above-described components to part or all of the surface of the support and removing the organic solvent contained in the coating solution by heating or drying it.
도공 방법으로서는, 특별히 제한되는 것은 아니라 종래 공지된 도포법을 적용할 수 있고, 예를 들어 그라비아 방식, 코팅 방식, 스크린 방식, 롤러 방식, 로터리 방식, 스프레이 방식, 모세관 방식 등의 방법을 들 수 있다.The coating method is not particularly limited, and conventionally known coating methods can be applied, for example, gravure method, coating method, screen method, roller method, rotary method, spray method, capillary method, etc. .
지지체의 표면에 도공액을 도포한 후, 그 도포막에 포함되는 유기 용제를 제거하는 방법으로서는, 예를 들어 건조기를 사용하여 건조시키고, 유기 용제를 휘발시키는 방법이 일반적이다. 건조 온도로서는, 사용한 유기 용제를 휘발시키는 것이 가능하고, 또한 지지체에 열변형 등의 악영향을 주지 않는 범위의 온도로 설정하면 된다.After applying the coating liquid to the surface of the support, a common method of removing the organic solvent contained in the coating film is, for example, drying using a dryer and volatilizing the organic solvent. The drying temperature may be set to a temperature within a range that allows volatilization of the organic solvent used and does not adversely affect the support, such as thermal deformation.
프라이머층 두께는 본 발명의 적층체를 사용하는 용도에 의해 적절히 조정해도 되지만, 지지체와 후술하는 금속 입자층과의 밀착성을 보다 향상시키는 범위가 바람직하고, 프라이머층의 두께는 10nm 내지 1㎛인 것이 바람직하고, 10nm 내지 500nm인 것이 보다 바람직하다. 프라이머층의 두께는 지지체에의 도공액의 도포량에 의해 조정할 수 있다.The thickness of the primer layer may be adjusted appropriately depending on the intended use of the laminate of the present invention, but is preferably in a range that further improves the adhesion between the support and the metal particle layer described later, and the thickness of the primer layer is preferably 10 nm to 1 μm. And, it is more preferable that it is 10 nm to 500 nm. The thickness of the primer layer can be adjusted by the amount of coating liquid applied to the support.
프라이머층의 표면은, 후기하는 금속 입자층과의 밀착성의 관점에서, 필요에 따라서 코로나 방전 처리법 등의 플라스마 방전 처리법, 자외선 처리법 등의 건식 처리법, 물이나 산성 또는 알칼리성 약액, 유기 용제 등을 사용한 습식 처리법에 의해, 표면 처리가 행해져 있어도 된다.From the viewpoint of adhesion to the metal particle layer, which will be described later, the surface of the primer layer can be treated, if necessary, by plasma discharge treatment such as corona discharge treatment, dry treatment such as ultraviolet treatment, or wet treatment using water, an acidic or alkaline chemical solution, organic solvent, etc. Surface treatment may be performed.
<금속 입자층><Metal particle layer>
금속 입자층은 상기한 프라이머층 상에 마련되는 것이며, 후기하는 금속 도금층을 형성하기 위해 마련되는 층이다. 금속 입자층은, 금속 입자와 유기 화합물의 복합체를 포함하는 층인 것이 바람직하다. 본 발명에 있어서는, 금속 입자층은, 금속 입자와 양이온성기를 갖는 화합물을 포함하는 것이 보다 바람직하다.The metal particle layer is provided on the above-mentioned primer layer and is a layer provided to form the metal plating layer described later. The metal particle layer is preferably a layer containing a composite of metal particles and an organic compound. In the present invention, it is more preferable that the metal particle layer contains a compound having metal particles and a cationic group.
금속 입자를 구성하는 금속으로서는, 전이 금속 또는 그 화합물을 들 수 있고, 이들 중에서도 이온성의 전이 금속이 바람직하다. 이온성의 전이 금속으로서는, 구리, 은, 금, 니켈, 팔라듐, 백금, 코발트 등을 들 수 있고, 후기하는 금속 도금층의 형성성의 관점에서는, 은이 바람직하다. 또한, 본 발명에 있어서 금속 입자란, 상기한 금속을 포함하는 입자상 또는 섬유상의 것을 말하는 것으로 한다.Metals constituting the metal particles include transition metals or their compounds, and among these, ionic transition metals are preferable. Ionic transition metals include copper, silver, gold, nickel, palladium, platinum, and cobalt, and silver is preferable from the viewpoint of formability of a metal plating layer, which will be described later. In addition, in the present invention, metal particles shall refer to particulate or fibrous particles containing the above-mentioned metal.
입자상의 금속을 사용하는 경우에는, 저항값을 보다 저감시킬 수 있는 관점에서, 평균 입자 직경이 1 내지 100nm인 것이 바람직하고, 1 내지 50nm인 것이 보다 바람직하다. 또한, 본 명세서에 있어서, 평균 입자 직경은, 금속 입자를 분산 양용매로 희석하여, 동적 광 산란법에 의해 측정한 체적 평균값(D50)을 의미한다. 또한, 섬유상의 금속을 사용하는 경우도, 저항값을 보다 저감시킬 수 있는 관점에서, 섬유의 직경이 5 내지 100nm인 것이 바람직하고, 5 내지 50nm인 것이 보다 바람직하다. 또한, 섬유 길이는 0.1 내지 100㎛인 것이 바람직하고, 0.1 내지 30㎛인 것이 보다 바람직하다.When using particulate metal, the average particle diameter is preferably 1 to 100 nm, and more preferably 1 to 50 nm, from the viewpoint of further reducing the resistance value. In addition, in this specification, the average particle diameter means the volume average value (D50) measured by diluting metal particles with a good dispersion solvent and measuring them by a dynamic light scattering method. Also, when using fibrous metal, the fiber diameter is preferably 5 to 100 nm, and more preferably 5 to 50 nm, from the viewpoint of further reducing the resistance value. Additionally, the fiber length is preferably 0.1 to 100 μm, and more preferably 0.1 to 30 μm.
금속 입자와 병용하여 사용되는 유기 화합물로서, 양이온성기를 갖는 화합물을 바람직하게 사용할 수 있다. 양이온성기를 갖는 화합물은, 상기한 금속 입자를 양호하게 분산시킴과 함께, 프라이머층의 구성 성분에 포함되는 관능기, 예를 들어 에폭시 수지에 포함되는 에폭시기와 반응하여, 프라이머층과 금속 입자층의 계면의 밀착성을 더욱 향상시키는 기능을 갖는 점에서 바람직하다. 또한, 양이온성기를 갖는 화합물은, 동일하게 금속 입자층 중에 포함되는 금속 입자에 표면 처리된 것이어도 된다.As an organic compound used in combination with metal particles, a compound having a cationic group can be preferably used. The compound having a cationic group not only disperses the above-described metal particles well, but also reacts with the functional group contained in the constituents of the primer layer, for example, the epoxy group contained in the epoxy resin, and forms a layer at the interface between the primer layer and the metal particle layer. It is desirable because it has the function of further improving adhesion. Additionally, the compound having a cationic group may be surface-treated on the metal particles included in the metal particle layer.
양이온성기를 갖는 화합물로서는, 염기성 질소 원자 함유기를 갖는 화합물을 바람직하게 사용할 수 있고, 예를 들어 폴리에틸렌이민, 폴리프로필렌이민 등의 폴리알킬렌이민, 폴리알킬렌이민에 폴리옥시알킬렌이 부가된 화합물 등을 사용할 수 있다. 폴리알킬렌이민에 폴리옥시알킬렌이 부가된 화합물은, 금속 입자의 수분산 안정성을 향상시킬 수 있는 점에서 바람직하다.As the compound having a cationic group, a compound having a basic nitrogen atom-containing group can be preferably used, for example, polyalkylene imine such as polyethylene imine and polypropylene imine, and a compound in which polyoxyalkylene is added to polyalkylene imine. etc. can be used. A compound in which polyoxyalkylene is added to polyalkylene imine is preferable because it can improve the water dispersion stability of metal particles.
폴리옥시알킬렌으로서는, 예를 들어 폴리옥시에틸렌, 폴리(옥시에틸렌-옥시프로필렌) 등의 랜덤 구조 또는 블록 구조를 사용할 수 있다. 폴리옥시알킬렌으로서는, 금속 입자의 수분산 안정성의 관점에서, 옥시에틸렌 단위를 갖는 것을 사용하는 것이 바람직하고, 폴리옥시알킬렌 전체에 대하여, 옥시에틸렌 단위를 10 내지 90질량%의 범위에서 갖는 것을 사용하는 것이 바람직하다.As polyoxyalkylene, for example, random or block structures such as polyoxyethylene and poly(oxyethylene-oxypropylene) can be used. As polyoxyalkylene, it is preferable to use a polyoxyalkylene having an oxyethylene unit from the viewpoint of water dispersion stability of the metal particles, and a polyoxyalkylene having an oxyethylene unit in the range of 10 to 90% by mass based on the total polyoxyalkylene. It is desirable to use
폴리알킬렌이민에 폴리옥시알킬렌이 부가된 화합물로서는, 예를 들어 폴리에틸렌이민을 포함하는 구조와, 폴리에틸렌옥사이드 구조 등의 폴리옥시알킬렌 구조를 갖는 것을 사용할 수 있다.As a compound obtained by adding polyoxyalkylene to polyalkyleneimine, for example, those having a structure containing polyethyleneimine and a polyoxyalkylene structure such as a polyethylene oxide structure can be used.
폴리에틸렌이민 및 폴리옥시알킬렌은, 직쇄상의 결합된 것이어도 되고, 폴리에틸렌이민을 포함하는 주쇄에 대하여, 그 측쇄에 폴리옥시알킬렌이 그래프트되어 결합된 것이어도 된다.Polyethyleneimine and polyoxyalkylene may be bonded in a straight chain, or may be bonded by grafting polyoxyalkylene to the side chain of the main chain containing polyethyleneimine.
폴리알킬렌이민에 폴리옥시알킬렌이 부가된 화합물로서는, 구체적으로는 폴리에틸렌이민과 폴리옥시에틸렌의 공중합체, 그 주쇄 중에 존재하는 이미노기의 일부와, 에틸렌옥사이드가 부가 반응하여 얻어진 화합물 등을 사용할 수 있다. 그들은 블록 구조를 갖고 있는 것이 바람직하다.As a compound in which polyoxyalkylene is added to polyalkyleneimine, specifically, a copolymer of polyethyleneimine and polyoxyethylene, a compound obtained by addition reaction of a part of the imino group present in the main chain and ethylene oxide, etc. can be used. You can. They preferably have a block structure.
폴리알킬렌이민에 폴리옥시알킬렌이 부가된 화합물로서는, 폴리알킬렌이민이 갖는 아미노기와, 폴리옥시에틸렌글리콜이 갖는 수산기와, 에폭시 수지가 갖는 에폭시기를 반응시킴으로써 얻어진 것을 사용할 수도 있다.As a compound obtained by adding polyoxyalkylene to polyalkyleneimine, one obtained by reacting the amino group of polyalkyleneimine, the hydroxyl group of polyoxyethylene glycol, and the epoxy group of epoxy resin can also be used.
폴리알킬렌이민으로서는, 시판품을 사용해도 되고, 예를 들어 에포민(등록 상표)을 사용할 수 있고, SP-003, SP-006, SP-012, SP-018, SP-200, P-1000(이상, 가부시키가이샤 닛폰 쇼쿠바이)을 사용할 수 있다.As the polyalkylene imine, a commercial product may be used, for example, Eformin (registered trademark), SP-003, SP-006, SP-012, SP-018, SP-200, P-1000 ( Above, you can use Kabushikigaisha Nippon Shokubai.
금속 입자층에는, 상기한 금속 입자에 더하여 에폭시 수지가 포함되어 있어도 된다. 에폭시 수지로서는, 상기 프라이머층에 있어서 설명한 것과 마찬가지의 것을 사용할 수 있지만, 양이온성기를 갖는 화합물로서 염기성 질소 원자 함유기를 갖는 화합물을 사용하는 경우에는, 에폭시 수지가 염기성 질소 원자 함유기를 갖는 화합물과 반응되어버리는 것을 억제하는 관점에서, 지방족 에폭시 수지를 바람직하게 사용할 수 있고, 그 중에서도 지환식 에폭시 수지를 보다 바람직하게 사용할 수 있다.The metal particle layer may contain an epoxy resin in addition to the metal particles described above. As the epoxy resin, one similar to that described for the above primer layer can be used. However, when using a compound having a basic nitrogen atom-containing group as the compound having a cationic group, the epoxy resin reacts with the compound having a basic nitrogen atom-containing group. From the viewpoint of suppressing waste, aliphatic epoxy resins can be preferably used, and among them, alicyclic epoxy resins can be used more preferably.
지방족 에폭시 수지로서는, 예를 들어 네오펜틸글리콜디글리시딜에테르, 디메틸올시클로헥산디글리시딜에테르, 1,4-시클로헥산디글리시딜에테르, 1,3-시클로헥산디글리시딜에테르, 1,2-시클로헥산디글리시딜에테르, 디메틸올디시클로펜타디엔디글리시딜에테르, 헥사히드로프탈산디글리시딜에스테르, 헥사히드로테레프탈산디글리시딜에스테르, 1,4-부탄디올디글리시딜에테르, 1,6-헥산디올디글리시딜에테르 등의 비환식 지방족 에폭시 수지나, 3',4'-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카르복실레이트, ε-카프로락톤 변성 3',4'-에폭시시클로헥실메틸3,4-에폭시시클로헥산카르복실레이트, 리모넨디옥시드, 디시클로펜타디엔디옥시드, 수소 첨가 비스페놀 A형 디글리시딜에테르 등의 지환식 에폭시 수지를 들 수 있다. 이들 지방족 에폭시 수지는 1종 단독으로 사용해도 되고, 2종 이상을 병용해도 된다.Examples of aliphatic epoxy resins include neopentyl glycol diglycidyl ether, dimethylol cyclohexane diglycidyl ether, 1,4-cyclohexane diglycidyl ether, and 1,3-cyclohexane diglycidyl ether. , 1,2-cyclohexane diglycidyl ether, dimethylol dicyclopentadiene diglycidyl ether, hexahydrophthalic acid diglycidyl ester, hexahydroterephthalic acid diglycidyl ester, 1,4-butanediol diglycidyl. Acyclic aliphatic epoxy resins such as ether and 1,6-hexanediol diglycidyl ether, 3',4'-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, and ε-caprolactone modified 3. Alicyclic epoxy resins such as ',4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate, limonenedioxide, dicyclopentadienedioxide, and hydrogenated bisphenol A type diglycidyl ether are included. there is. These aliphatic epoxy resins may be used individually or in combination of two or more types.
본 발명에 있어서는, 금속 입자층 형성용 도공액 중에 있어서의 염기성 질소 원자 함유기를 갖는 화합물과의 반응 억제나, 후기하는 용제와의 상용성의 관점에서, 지환식 에폭시 수지가 바람직하고, 특히, 3',4'-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카르복실레이트, ε-카프로락톤 변성 3',4'-에폭시시클로헥실메틸3,4-에폭시시클로헥산카르복실레이트를 바람직하게 사용할 수 있다.In the present invention, from the viewpoint of inhibition of reaction with a compound having a basic nitrogen atom-containing group in the coating solution for forming a metal particle layer and compatibility with solvents described later, alicyclic epoxy resins are preferred, especially 3', 4'-Epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate and ε-caprolactone modified 3',4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate can be preferably used. .
상기한 에폭시 수지로서 시판되는 것을 사용해도 되고, 예를 들어 ADEKA RESIN EP-4080S, 동 EP-4085S, 동 EP-4088S(이상, 가부시키가이샤 ADEKA제), 셀록사이드 2021P, 셀록사이드 2081, 셀록사이드 2083, 셀록사이드 2085, 셀록사이드 8010, EHPE 3150, EPOLEAD PB 3600, EPOLEAD PB 4700(이상, 가부시키가이샤 다이셀제), 데나콜 EX-121, 동 EX-211, 동 EX-212, 동 EX-212L, 동 EX-214, 동 EX-214L, 동 EX-216, 동 EX-216L, 동 EX-252, 동 EX-252L, 동 EX-321, 동 EX-321L, 동 EX-830, 동 EX-830L, 동 EX-850, 동 EX-850L(이상, 나가세 켐텍스 가부시키가이샤제), 쇼프리 CDMDG, 동 PETG(이상, 쇼와 덴코 가부시키가이샤제) 등이다.As the above-mentioned epoxy resin, commercially available ones may be used, for example, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA Corporation), Celoxide 2021P, Celoxide 2081, Celoxide. 2083, Celoxide 2085, Celoxide 8010, EHPE 3150, EPOLEAD PB 3600, EPOLEAD PB 4700 (above, manufactured by Daicel Corporation), Denacol EX-121, EX-211, EX-212, EX-212L. , EX-214, EX-214L, EX-216, EX-216L, EX-252, EX-252L, EX-321, EX-321L, EX-830, EX-830L. , EX-850, EX-850L (manufactured by Nagase Chemtex Co., Ltd.), Showfree CDMDG, PETG (manufactured by Showa Denko Co., Ltd.), etc.
금속 입자층은, 상기한 성분을 적당한 용제에 용해 내지 분산시켜 도공액을 조제하고, 프라이머층 상에 도포하여 도막을 형성하고, 도막을 건조시켜 용제를 제거함으로써 형성할 수 있다.The metal particle layer can be formed by dissolving or dispersing the above components in a suitable solvent to prepare a coating solution, applying it on a primer layer to form a coating film, and drying the coating film to remove the solvent.
금속 입자층 형성용 도공액에 사용되는 용제로서는, 예를 들어 증류수, 이온 교환수, 순수, 초순수 등의 수성 매체 이외에도, 알코올, 에테르, 에스테르 및 케톤 등의 유기 용제를 사용할 수 있다.As a solvent used in the coating solution for forming a metal particle layer, for example, in addition to aqueous media such as distilled water, ion-exchanged water, pure water, and ultrapure water, organic solvents such as alcohol, ether, ester, and ketone can be used.
알코올로서는, 예를 들어 메탄올, 에탄올, n-프로판올, 이소프로필알코올, n-부탄올, 이소부틸알코올, sec-부탄올, tert-부탄올, 헵탄올, 헥산올, 옥탄올, 노난올, 데칸올, 운데칸올, 도데칸올, 트리데칸올, 테트라데칸올, 펜타데칸올, 스테아릴알코올, 알릴알코올, 시클로헥산올, 테르피네올, 테르피네올, 디히드로테르피네올, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노부틸에테르, 테트라에틸렌글리콜모노부틸에테르, 프로필렌글리콜모노메틸에테르, 디프로필렌글리콜모노메틸에테르, 트리프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노프로필에테르, 디프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 디프로필렌글리콜모노부틸에테르, 트리프로필렌글리콜모노부틸에테르 등을 사용할 수 있다.Examples of alcohol include methanol, ethanol, n-propanol, isopropyl alcohol, n-butanol, isobutyl alcohol, sec-butanol, tert-butanol, heptanol, hexanol, octanol, nonanol, decanol, and undecorate. Canol, dodecanol, tridecanol, tetradecanol, pentadecanol, stearyl alcohol, allyl alcohol, cyclohexanol, terpineol, terpineol, dihydroterpineol, ethylene glycol monomethyl ether, ethylene glycol Monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether , tripropylene glycol monomethyl ether, propylene glycol monopropyl ether, dipropylene glycol monopropyl ether, propylene glycol monobutyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monobutyl ether, etc. can be used.
도공액에는, 물성 조정을 위하여, 아세톤, 시클로헥사논, 메틸에틸케톤 등의 케톤 용제를 조합하여 사용할 수 있다. 그 밖에도, 아세트산에틸, 아세트산부틸, 3-메톡시부틸아세테이트, 3-메톡시-3-메틸-부틸아세테이트 등의 에스테르 용제, 톨루엔 등의 탄화수소 용제, 특히 탄소수가 8 이상인 탄화수소 용제를 사용할 수 있다.For the coating solution, a combination of ketone solvents such as acetone, cyclohexanone, and methyl ethyl ketone can be used to adjust the physical properties. In addition, ester solvents such as ethyl acetate, butyl acetate, 3-methoxybutyl acetate, and 3-methoxy-3-methyl-butyl acetate, hydrocarbon solvents such as toluene, and especially hydrocarbon solvents with 8 or more carbon atoms can be used.
탄소수가 8 이상인 탄화수소 용제는, 예를 들어 옥탄, 노난, 데칸, 도데칸, 트리데칸, 테트라데칸, 시클로옥탄, 크실렌, 메시틸렌, 에틸벤젠, 도데실벤젠, 테트랄린, 트리메틸벤젠시클로헥산 등의 비극성 용제를, 필요에 따라서 조합하여 사용할 수도 있다. 또한, 혼합 용제인 미네랄 스피릿 및 솔벤트 나프타 등을 병용할 수도 있다.Hydrocarbon solvents with a carbon number of 8 or more include, for example, octane, nonane, decane, dodecane, tridecane, tetradecane, cyclooctane, xylene, mesitylene, ethylbenzene, dodecylbenzene, tetralin, trimethylbenzenecyclohexane, etc. Non-polar solvents may be used in combination as needed. Additionally, mixed solvents such as mineral spirits and solvent naphtha may be used together.
기타 용매로서는, 예를 들어 2-에틸1,3-헥산디올, 에틸렌글리콜, 디에틸렌글리콜, 트리에틸렌글리콜, 폴리에틸렌글리콜, 프로필렌글리콜, 디프로필렌글리콜, 1,2-부탄디올, 1,4-부탄디올, 2,3-부탄디올, 글리세린, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 에틸렌글리콜모노에틸에테르아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노부틸에테르아세테이트 등을 사용할 수 있다.Other solvents include, for example, 2-ethyl 1,3-hexanediol, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, 1,2-butanediol, 1,4-butanediol, 2,3-butanediol, glycerin, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol mono Butyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, etc. can be used.
금속 입자층 형성용 도공액에는, 프라이머층에 도포할 때의 젖음성 등을 향상시키는 관점에서, 필요에 따라서 계면 활성제, 소포제, 레올로지 조정제 등이 포함되어 있어도 된다.The coating liquid for forming a metal particle layer may contain a surfactant, an antifoaming agent, a rheology modifier, etc. as needed from the viewpoint of improving wettability, etc. when applying to the primer layer.
금속 입자층 형성용 도공액 중에 포함되는 금속 입자의 함유량은, 도공액 전체에 대하여 1 내지 90질량%인 것이 바람직하고, 5 내지 60질량%인 것이 보다 바람직하고, 10 내지 40질량%인 것이 더욱 바람직하다. 또한, 양이온성기를 갖는 화합물의 함유량은, 도공액 전체에 대하여 0.01 내지 10질량%인 것이 바람직하고, 0.05 내지 5질량%인 것이 보다 바람직하다. 또한, 도공액을 도포 건조시켜 금속 입자층을 형성한 경우(즉, 용제를 제거한 경우)에 있어서, 에폭시 수지는 금속 입자층 중에 0.01 내지 10질량% 포함되어 있는 것이 바람직하고, 0.05 내지 5질량% 포함되어 있는 것이 보다 바람직하다.The content of metal particles contained in the coating solution for forming a metal particle layer is preferably 1 to 90% by mass, more preferably 5 to 60% by mass, and even more preferably 10 to 40% by mass, based on the entire coating solution. do. Moreover, the content of the compound having a cationic group is preferably 0.01 to 10% by mass, and more preferably 0.05 to 5% by mass, based on the entire coating liquid. In addition, when the coating solution is applied and dried to form a metal particle layer (i.e., when the solvent is removed), the epoxy resin is preferably contained in an amount of 0.01 to 10% by mass, and is preferably 0.05 to 5% by mass in the metal particle layer. It is more desirable to have
금속 입자층은 프라이머층의 표면 전체에 마련된 층이어도 되고, 프라이머층의 표면의 일부에 마련된 층이어도 된다. 프라이머층의 표면의 일부에 금속 입자층을 형성하는 경우로서는, 구체적으로는 프라이머층의 표면에 획선되어 형성된 세선상의 층을 들 수 있다. 상기 세선상의 층은 본 발명에 의한 적층체를 프린트 배선판 등에 사용하는 경우에 적합하다. 이 경우, 세선상의 층(패턴)의 폭(선 폭)은 대략 0.01 내지 200㎛ 정도, 바람직하게는 0.01 내지 150㎛ 정도이다.The metal particle layer may be a layer provided on the entire surface of the primer layer, or may be a layer provided on a part of the surface of the primer layer. Examples of forming a metal particle layer on a part of the surface of the primer layer include, specifically, a thin line-like layer formed by strokes on the surface of the primer layer. The fine wire-like layer is suitable when the laminate according to the present invention is used for a printed wiring board or the like. In this case, the width (line width) of the thin line layer (pattern) is approximately 0.01 to 200 μm, preferably approximately 0.01 to 150 μm.
금속 입자층은, 저저항이며 도전성이 우수한 도전성 패턴을 형성하기 위해서, 0.01 내지 100㎛의 두께를 갖는 것인 것이 바람직하다. 또한, 금속 입자층이 세선상의 것인 경우, 그 두께(높이)는 0.05 내지 50㎛의 범위인 것이 바람직하다. 금속 입자층의 두께는 프라이머층에의 도공액의 도포량에 의해 조정할 수 있다.The metal particle layer preferably has a thickness of 0.01 to 100 μm in order to form a conductive pattern with low resistance and excellent conductivity. Additionally, when the metal particle layer is in the form of fine wires, its thickness (height) is preferably in the range of 0.05 to 50 μm. The thickness of the metal particle layer can be adjusted by the amount of coating liquid applied to the primer layer.
금속 입자층 형성용 도공액을 프라이머층에 도포하는 방법으로서는, 예를 들어 볼록판 반전 인쇄법 등의 반전 인쇄법을 비롯하여, 잉크젯 인쇄법, 스크린 인쇄법, 오프셋 인쇄법, 그라비아 인쇄법, 스핀 코팅법, 스프레이 코팅법, 바 코팅법, 다이 코팅법, 슬릿 코팅법, 롤 코팅법, 딥 코팅법 등을 들 수 있다. 또한, 전자 회로 등의 고밀도화를 실현할 때에 요구되는 대략 0.01 내지 100㎛ 정도의 세선상으로 도포(인쇄)하는 경우에는, 잉크젯 인쇄법을 채용하는 것이 바람직하다.Methods for applying the coating liquid for forming a metal particle layer to the primer layer include, for example, reverse printing methods such as relief plate reverse printing, inkjet printing, screen printing, offset printing, gravure printing, and spin coating. Examples include spray coating, bar coating, die coating, slit coating, roll coating, and dip coating. In addition, when applying (printing) in a thin line shape of approximately 0.01 to 100 μm, which is required when realizing increased density of electronic circuits, etc., it is preferable to adopt the inkjet printing method.
<금속 도금층><Metal plating layer>
본 발명의 적층체를 구성하는 금속 도금층은, 예를 들어 적층체를 프린트 배선판이나 전자파 실드 등에 사용하는 경우에, 장기간에 걸쳐 단선 등을 발생하지 않고, 양호한 통전성을 유지 가능한 신뢰성이 높은 배선 패턴을 형성하는 것을 목적으로 하여 마련되는 층이다.The metal plating layer constituting the laminate of the present invention provides a highly reliable wiring pattern that can maintain good conductivity without causing disconnection over a long period of time, for example, when the laminate is used for a printed wiring board or electromagnetic wave shield. It is a layer prepared for the purpose of forming a layer.
금속 도금층은 상기한 금속 입자층 상에 형성되는 층이지만, 그 형성 방법으로서는, 도금 처리에 의해 형성하는 방법이 바람직하다. 이 도금 처리로서는, 간편하게 금속 도금층을 형성할 수 있는 전해 도금법, 무전해 도금법 등의 습식 도금법을 들 수 있다. 또한, 이들 도금법을 2개 이상 조합해도 된다. 예를 들어, 무전해 도금을 실시한 후, 전해 도금을 실시하여, 금속 도금층을 형성해도 된다.The metal plating layer is a layer formed on the above-mentioned metal particle layer, but a method of forming it by plating is preferable. Examples of this plating treatment include wet plating methods such as electrolytic plating and electroless plating that can easily form a metal plating layer. Additionally, two or more of these plating methods may be combined. For example, after electroless plating, electrolytic plating may be performed to form a metal plating layer.
무전해 도금법은, 예를 들어 금속 입자층을 구성하는 금속에, 무전해 도금액을 접촉시킴으로써, 무전해 도금액 중에 포함되는 구리 등의 금속을 석출시켜 금속 피막을 포함하는 무전해 도금층을 형성하는 방법이다. 무전해 도금액으로서는, 예를 들어 구리, 은, 금, 니켈, 크롬, 코발트, 주석 등의 금속과, 환원제와, 수성 매체, 유기 용제 등의 용매를 함유하는 것을 들 수 있다.The electroless plating method is a method of forming an electroless plating layer including a metal film by, for example, contacting the metal constituting the metal particle layer with an electroless plating solution to precipitate metals such as copper contained in the electroless plating solution. Examples of electroless plating solutions include those containing metals such as copper, silver, gold, nickel, chromium, cobalt, and tin, a reducing agent, and solvents such as an aqueous medium and an organic solvent.
환원제로서는, 예를 들어 디메틸아미노보란, 차아인산, 차아인산나트륨, 디메틸아민보란, 히드라진, 포름알데히드, 수소화붕소나트륨, 페놀 등을 들 수 있다.Examples of the reducing agent include dimethylaminoborane, hypophosphorous acid, sodium hypophosphite, dimethylamineborane, hydrazine, formaldehyde, sodium borohydride, and phenol.
무전해 도금액으로서는, 필요에 따라서 아세트산, 포름산 등의 모노카르복실산; 말론산, 숙신산, 아디프산, 말레산, 푸마르산 등의 디카르복실산 화합물; 말산, 락트산, 글리콜산, 글루콘산, 시트르산 등의 히드록시카르복실산 화합물; 글리신, 알라닌, 이미노디아세트산, 아르기닌, 아스파르트산, 글루탐산 등의 아미노산 화합물; 이미노디아세트산, 니트릴로트리아세트산, 에틸렌디아민디아세트산, 에틸렌디아민테트라아세트산, 디에틸렌트리아민펜타 아세트산 등의 아미노폴리카르복실산 화합물 등의 유기산, 또는 이들 유기산의 가용성염(나트륨염, 칼륨염, 암모늄염 등), 에틸렌디아민, 디에틸렌트리아민, 트리에틸렌테트라민 등의 아민 화합물 등의 착화제를 함유하는 것을 사용할 수 있다.As the electroless plating solution, if necessary, monocarboxylic acids such as acetic acid and formic acid; Dicarboxylic acid compounds such as malonic acid, succinic acid, adipic acid, maleic acid, and fumaric acid; Hydroxycarboxylic acid compounds such as malic acid, lactic acid, glycolic acid, gluconic acid, and citric acid; Amino acid compounds such as glycine, alanine, iminodiacetic acid, arginine, aspartic acid, and glutamic acid; Organic acids such as aminopolycarboxylic acid compounds such as iminodiacetic acid, nitrilotriacetic acid, ethylenediaminediacetic acid, ethylenediaminetetraacetic acid, and diethylenetriaminepentaacetic acid, or soluble salts of these organic acids (sodium salt, potassium salt, ammonium salt) etc.), those containing complexing agents such as amine compounds such as ethylenediamine, diethylenetriamine, and triethylenetetramine can be used.
전해 도금법은, 예를 들어 금속 입자층을 구성하는 금속, 또는 무전해 처리에 의해 형성된 무전해 도금층(피막)의 표면에, 전해 도금액을 접촉한 상태에서 통전함으로써, 전해 도금액 중에 포함되는 구리 등의 금속을, 캐소드에 설치한 금속 입자층을 구성하는 금속 입자 또는 무전해 처리에 의해 형성된 무전해 도금층의 표면에 석출시켜, 전해 도금층을 형성하는 방법이다.The electrolytic plating method, for example, applies electricity to the surface of the metal constituting the metal particle layer or the electroless plating layer (film) formed by electroless treatment while the electrolytic plating solution is in contact, thereby plating metals such as copper contained in the electrolytic plating solution. This is a method of forming an electrolytic plating layer by depositing it on the surface of the metal particles constituting the metal particle layer provided on the cathode or the electroless plating layer formed by electroless treatment.
전해 도금액으로서는, 예를 들어 구리, 니켈, 크롬, 코발트, 주석 등의 금속의 황화물과, 황산과, 수성 매체를 함유하는 것 등을 들 수 있다. 구체적으로는, 황산구리와 황산과 수성 매체를 함유하는 것을 들 수 있다.Examples of electrolytic plating solutions include those containing sulfides of metals such as copper, nickel, chromium, cobalt, and tin, sulfuric acid, and an aqueous medium. Specifically, those containing copper sulfate, sulfuric acid, and an aqueous medium can be mentioned.
금속 도금층의 형성 방법으로서는, 금속 도금층의 막 두께를, 박막으로부터 후막까지 소망으로 하는 막 두께로 제어하기 쉬운 점에서, 무전해 도금을 실시한 후, 전해 도금을 실시하는 방법이 바람직하다.As a method of forming a metal plating layer, a method of performing electroless plating followed by electrolytic plating is preferable because it is easy to control the film thickness of the metal plating layer to a desired film thickness from a thin film to a thick film.
금속 도금층의 막 두께는 1 내지 50㎛인 것이 바람직하다. 금속 도금층의 막 두께는, 금속 도금층의 형성할 때의 도금 처리 공정에서의 처리 시간, 전류 밀도, 도금용 첨가제의 사용량 등을 제어함으로써 조정할 수 있다.The film thickness of the metal plating layer is preferably 1 to 50 μm. The film thickness of the metal plating layer can be adjusted by controlling the processing time, current density, amount of plating additive used, etc. in the plating process when forming the metal plating layer.
<적층체의 용도><Use of laminate>
본 발명에 의한 적층체는, 표면에 형성된 금속 도금층이 상태 하에서 박리되지 않을 뿐만 아니라, 150℃라는 고온 하에 장시간 놓인 경우에도 금속 도금층의 밀착성이 유지된다. 그 때문에, 전자 회로, 집적 회로 등에 사용되는 회로 형성용 기판의 형성, 유기 태양 전지, 전자 서적 단말기, 유기 EL, 유기 트랜지스터, 플렉시블 프린트 기판, RFID 등을 구성하는 주변 배선의 형성, 플라스마 디스플레이의 전자파 실드의 배선 등 중, 특히 내구성이 요구되는 용도에 적합하게 사용할 수 있다. 특히 상기 도금 처리가 실시된 도전성 패턴은, 장기간에 걸쳐 단선 등을 일으키지 않고, 양호한 통전성을 유지 가능한 신뢰성이 높은 배선 패턴을 형성할 수 있는 점에서, 예를 들어 플렉시블 프린트 배선판(FPC)이나 전자파 실드 등의 전자 기기 용도에 사용하는 것이 가능하다.In the laminate according to the present invention, not only does the metal plating layer formed on the surface not peel off under certain conditions, but the adhesion of the metal plating layer is maintained even when placed at a high temperature of 150°C for a long time. Therefore, the formation of circuit formation substrates used in electronic circuits, integrated circuits, etc., the formation of peripheral wiring constituting organic solar cells, electronic book terminals, organic EL, organic transistors, flexible printed circuit boards, RFID, etc., and the electromagnetic waves of plasma displays. It can be used especially for applications requiring durability, such as shield wiring. In particular, the conductive pattern to which the above-described plating treatment has been applied can form a highly reliable wiring pattern that can maintain good current conductivity without causing disconnection or the like over a long period of time, and is therefore used in, for example, flexible printed circuit boards (FPC) or electromagnetic wave shields. It is possible to use it for electronic devices such as:
본 발명의 실시 형태로서, 지지체의 한쪽 면에, 프라이머층, 금속 입자층 및 금속 도금층을 순차 구비한 적층체를 예시하여 설명했지만, 본 발명의 다른 실시 형태로서, 지지체의 반대측 면에도, 프라이머층, 금속 입자층 및 금속 도금층을 순차 구비한 적층체로 해도 된다.As an embodiment of the present invention, a laminate having a primer layer, a metal particle layer, and a metal plating layer sequentially provided on one side of the support has been described as an example. However, as another embodiment of the present invention, a primer layer is also provided on the opposite side of the support, It may be a laminate provided sequentially with a metal particle layer and a metal plating layer.
실시예Example
이하, 실시예에 의해 본 발명을 보다 구체적으로 설명하지만, 본 발명이 실시예에 한정되는 것은 아니다. 또한, 이하에 있어서 「부」 및 「%」라고 하는 것은, 특별히 언급하지 않는 한 모두 질량 기준이다.Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to the examples. In addition, in the following, “part” and “%” are all based on mass unless otherwise specified.
<페녹시 수지의 준비><Preparation of phenoxy resin>
하기와 같이 하여, 페녹시 수지 (P-1) 내지 (P-3)의 3종의 페녹시 수지를 합성하였다.As follows, three types of phenoxy resins (P-1) to (P-3) were synthesized.
[합성예 1: 페녹시 수지 (P-1)][Synthesis Example 1: Phenoxy Resin (P-1)]
교반기, 온도계, 질소 취입관 및 냉각관을 구비한 반응 장치에, 비스페놀 A형 에폭시 수지(DIC 가부시키가이샤제 에피클론 EXA-850CRP, 고형분 100질량%, 에폭시 당량 173g/eq)를 100질량부, 비스페놀 A를 65질량부(에폭시기의 몰수(E1)와 페놀성 수산기의 몰수(F1)의 비(E1/F1)=1.01), 반응 용매로서 시클로헥사논을 15부 투입하여, 질소 분위기 하에서 100℃까지 승온시켰다. 이어서, 촉매로서 메틸트리페닐포스포늄브로마이드를 0.1부 넣은 후, 내온을 140℃까지 상승시켰다. 반응이 진행됨에 수반하여 반응액이 증점되기 시작하였으므로, 시클로헥사논 72부를 수회로 나누어 적절히 추가함으로써 교반기의 토크를 일정하게 하면서 반응을 행하였다. 또한, 반응 온도는 불휘발분이 80% 이상이면 140 내지 145℃에서 행하고, 그 이후에는 환류 온도에서 행하였다. 반응 도중에 샘플을 채취하여, GPC로 평균 분자량을 측정하였다. 중량 평균 분자량이 20,000이 될 때까지 반응을 계속하였다. 상기 분자량인 것을 확인한 후, 반응을 종료하였다. 이어서, 시클로헥사논을 첨가하여 교반함으로써, 고형분 15질량%의 페녹시 수지 (P-1)을 얻었다.In a reaction apparatus equipped with a stirrer, thermometer, nitrogen blowing pipe, and cooling pipe, 100 parts by mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100% by mass, epoxy equivalent weight 173 g/eq), 65 parts by mass of bisphenol A (ratio of the number of moles of the epoxy group (E1) to the number of moles of the phenolic hydroxyl group (F1) (E1/F1) = 1.01) and 15 parts of cyclohexanone as a reaction solvent were added, and the mixture was heated at 100°C under a nitrogen atmosphere. The temperature was raised to Next, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the reaction solution began to thicken, so 72 parts of cyclohexanone was added in several portions as appropriate, and the reaction was carried out while keeping the torque of the stirrer constant. In addition, the reaction temperature was 140 to 145°C when the non-volatile content was 80% or more, and thereafter, the reaction was performed at reflux temperature. Samples were collected during the reaction, and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 20,000. After confirming that the molecular weight was above, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-1) with a solid content of 15% by mass.
[합성예 2: 페녹시 수지 (P-2)][Synthesis Example 2: Phenoxy Resin (P-2)]
교반기, 온도계, 질소 취입관 및 냉각관을 구비한 반응 장치에, 비스페놀 A형 에폭시 수지(DIC 가부시키가이샤제 에피클론 EXA-850CRP, 고형분 100질량%, 에폭시 당량 173g/eq)를 100질량부, 비스페놀 A를 65질량부(에폭시기의 몰수(E1)와 페놀성 수산기의 몰수(F1)의 비(E1/F1)=1.01), 반응 용매로서 시클로헥사논을 15부 투입하여, 질소 분위기 하에서 100℃까지 승온시켰다. 이어서, 촉매로서 메틸트리페닐포스포늄브로마이드를 0.1부 넣은 후, 내온을 140℃까지 상승시켰다. 반응이 진행됨에 수반하여 반응액이 증점되기 시작하였으므로, 시클로헥사논 72부를 수회로 나누어 적절히 추가함으로써 교반기의 토크를 일정하게 하면서 반응을 행하였다. 또한, 반응 온도는 불휘발분이 80% 이상이면 140 내지 145℃에서 행하고, 그 이후에는 환류 온도에서 행하였다. 반응 도중에 샘플을 채취하여, GPC로 평균 분자량을 측정하였다. 중량 평균 분자량이 45,000이 될 때까지 반응을 계속하였다. 상기 분자량인 것을 확인한 후, 반응을 종료하였다. 이어서, 시클로헥사논을 첨가하여 교반함으로써, 고형분 15질량%의 페녹시 수지 (P-2)를 얻었다.In a reaction apparatus equipped with a stirrer, thermometer, nitrogen blowing pipe, and cooling pipe, 100 parts by mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100% by mass, epoxy equivalent weight 173 g/eq), 65 parts by mass of bisphenol A (ratio of the number of moles of the epoxy group (E1) to the number of moles of the phenolic hydroxyl group (F1) (E1/F1) = 1.01) and 15 parts of cyclohexanone as a reaction solvent were added, and the mixture was heated at 100°C under a nitrogen atmosphere. The temperature was raised to Next, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the reaction solution began to thicken, so 72 parts of cyclohexanone was added in several portions as appropriate, and the reaction was carried out while keeping the torque of the stirrer constant. In addition, the reaction temperature was 140 to 145°C when the non-volatile content was 80% or more, and thereafter, the reaction was performed at reflux temperature. Samples were collected during the reaction, and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 45,000. After confirming that the molecular weight was the above, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-2) with a solid content of 15% by mass.
[합성예 3: 페녹시 수지 (P-3)][Synthesis Example 3: Phenoxy Resin (P-3)]
교반기, 온도계, 질소 취입관 및 냉각관을 구비한 반응 장치에, 비스페놀 A형 에폭시 수지(DIC 가부시키가이샤제 에피클론 EXA-850CRP, 고형분 100질량%, 에폭시 당량 173g/eq)을 100질량부, 비스페놀 A를 65질량부(에폭시기의 몰수(E1)와 페놀성 수산기의 몰수(F1)의 비(E1/F1)=1.01), 반응 용매로서 시클로헥사논을 15부 투입하여, 질소 분위기 하에서 100℃까지 승온시켰다. 이어서, 촉매로서 메틸트리페닐포스포늄브로마이드를 0.1부 넣은 후, 내온을 140℃까지 상승시켰다. 반응이 진행됨에 수반하여 반응액이 증점되기 시작하였으므로, 시클로헥사논 72부를 수회로 나누어 적절히 추가함으로써 교반기의 토크를 일정하게 하면서 반응을 행하였다. 또한, 반응 온도는 불휘발분이 80% 이상이면 140 내지 145℃에서 행하고, 그 이후에는 환류 온도에서 행하였다. 반응 도중에 샘플을 채취하여, GPC로 평균 분자량을 측정하였다. 중량 평균 분자량이 100,000이 될 때까지 반응을 계속하였다. 상기 분자량인 것을 확인한 후, 반응을 종료하였다. 이어서, 시클로헥사논을 첨가하여 교반함으로써, 고형분 15질량%의 페녹시 수지 (P-3)을 얻었다.In a reaction apparatus equipped with a stirrer, thermometer, nitrogen blowing pipe, and cooling pipe, 100 parts by mass of bisphenol A type epoxy resin (Epiclon EXA-850CRP manufactured by DIC Corporation, solid content 100% by mass, epoxy equivalent weight 173 g/eq), 65 parts by mass of bisphenol A (ratio of the number of moles of the epoxy group (E1) to the number of moles of the phenolic hydroxyl group (F1) (E1/F1) = 1.01) and 15 parts of cyclohexanone as a reaction solvent were added, and the mixture was heated at 100°C under a nitrogen atmosphere. The temperature was raised to Next, after adding 0.1 part of methyltriphenylphosphonium bromide as a catalyst, the internal temperature was raised to 140°C. As the reaction progressed, the reaction solution began to thicken, so 72 parts of cyclohexanone was added in several portions as appropriate, and the reaction was carried out while keeping the torque of the stirrer constant. In addition, the reaction temperature was 140 to 145°C when the non-volatile content was 80% or more, and thereafter, the reaction was performed at reflux temperature. Samples were collected during the reaction, and the average molecular weight was measured by GPC. The reaction was continued until the weight average molecular weight reached 100,000. After confirming that the molecular weight was above, the reaction was terminated. Next, cyclohexanone was added and stirred to obtain a phenoxy resin (P-3) with a solid content of 15% by mass.
[합성예 4: 변성 노볼락 수지 C][Synthesis Example 4: Modified Novolak Resin C]
온도계, 냉각관, 분류관, 교반기를 설치한 플라스크에, 페놀 750질량부, 멜라민 75질량부, 41.5질량% 포르말린 346질량부 및 트리에틸아민 1.5질량부를 첨가하여, 발열에 주의하면서 100℃까지 승온시켰다. 환류 하 100℃에서 2시간 반응시킨 후, 상압 하에서 물을 제거하면서 180℃까지 2시간에 걸쳐 승온시켰다. 이어서, 감압 하에서 미반응된 페놀을 제거하여, 노볼락 수지 C로서 아미노트리아진 변성 노볼락 수지를 얻었다. 수산기 당량은 120g/당량이었다.Add 750 parts by mass of phenol, 75 parts by mass of melamine, 346 parts by mass of 41.5% formalin, and 1.5 parts by mass of triethylamine to a flask equipped with a thermometer, cooling tube, flow distribution tube, and stirrer, and raise the temperature to 100°C, paying attention to heat generation. I ordered it. After reacting at 100°C under reflux for 2 hours, the temperature was raised to 180°C over 2 hours while removing water under normal pressure. Next, unreacted phenol was removed under reduced pressure to obtain an aminotriazine-modified novolak resin as novolak resin C. The hydroxyl equivalent weight was 120 g/equivalent.
<프라이머층 형성용 도공액의 조제><Preparation of coating solution for forming primer layer>
[조제예 1: 프라이머층 형성용 도공액 (1)의 조제][Preparation Example 1: Preparation of coating solution (1) for forming primer layer]
합성예 1에서 얻어진 페녹시 수지 (P-1)을, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (1)을 얻었다.The phenoxy resin (P-1) obtained in Synthesis Example 1 was diluted with cyclohexanone so that the non-volatile content was 2% by mass, and mixed uniformly to obtain a coating liquid for forming a primer layer (1).
[조제예 2: 프라이머층 형성용 도공액 (2)의 조제][Preparation Example 2: Preparation of coating solution (2) for forming primer layer]
합성예 2에서 얻어진 페녹시 수지 (P-2)를, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (2)를 얻었다.The phenoxy resin (P-2) obtained in Synthesis Example 2 was diluted with cyclohexanone so that the non-volatile content was 2% by mass, and mixed uniformly to obtain a coating liquid for forming a primer layer (2).
[조제예 3: 프라이머층 형성용 도공액 (3)의 조제][Preparation Example 3: Preparation of coating solution (3) for forming primer layer]
합성예 3에서 얻어진 페녹시 수지 (P-3)을, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (3)을 얻었다.The phenoxy resin (P-3) obtained in Synthesis Example 3 was diluted with cyclohexanone so that the non-volatile content was 2% by mass, and mixed uniformly to obtain a coating liquid for forming a primer layer (3).
[조제예 4: 프라이머층 형성용 도공액 (4)의 조제][Preparation Example 4: Preparation of coating solution (4) for forming primer layer]
합성예 1에서 얻어진 페녹시 수지 (P-1)을 533질량부, 에폭시 수지 A(DIC 가부시키가이샤제 「EPICLON 850-S」; 비스페놀 A형 에폭시 수지, 에폭시기 당량 188g/당량) 17질량부, 노볼락 수지 B(DIC 가부시키가이샤제 「PHENOLITE TD-2131」, 수산기 당량 104g/당량) 3질량부, 및 경화 촉매 1로서 시코쿠 가세이 가부시키가이샤제 「TBZ」 0.5질량부를 혼합하고, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (4)를 얻었다.533 parts by mass of the phenoxy resin (P-1) obtained in Synthesis Example 1, 17 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent 188 g/equivalent), 3 parts by mass of novolac resin B (“PHENOLITE TD-2131” manufactured by DIC Corporation, hydroxyl equivalent 104 g/equivalent) and 0.5 parts by mass of “TBZ” manufactured by Shikoku Kasei Corporation as curing catalyst 1 were mixed, and cyclohexanone was added. was diluted so that the non-volatile content was 2% by mass, and mixed uniformly to obtain a coating liquid (4) for forming a primer layer.
[조제예 5: 프라이머층 형성용 도공액 (5)의 조제][Preparation Example 5: Preparation of coating solution (5) for forming primer layer]
합성예 2에서 얻어진 페녹시 수지 (P-2)를 267질량부, 에폭시 수지 A(DIC 가부시키가이샤제 「EPICLON 850-S」; 비스페놀 A형 에폭시 수지, 에폭시기 당량 188g/당량) 60질량부, 및 경화 촉매 1로서 시코쿠 가세이 가부시키가이샤제 「TBZ」 0.5질량부를 혼합하고, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (5)를 얻었다.267 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 2, 60 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent 188 g/equivalent), and 0.5 parts by mass of "TBZ" manufactured by Shikoku Kasei Co., Ltd. as the curing catalyst 1, diluted with cyclohexanone so that the non-volatile content is 2% by mass, and mixed uniformly to obtain a coating solution for forming a primer layer (5 ) was obtained.
[조제예 6: 프라이머층 형성용 도공액 (6)의 조제][Preparation Example 6: Preparation of coating solution (6) for forming primer layer]
합성예 1에서 얻어진 페녹시 수지 (P-2)를 133질량부, 에폭시 수지 A(DIC 가부시키가이샤제 「EPICLON 850-S」; 비스페놀 A형 에폭시 수지, 에폭시기 당량 188g/당량) 70질량부, 합성예 4에서 얻어진 변성 노볼락 수지 C 10질량부, 및 경화 촉매 2로서 시코쿠 가세이 가부시키가이샤제 「2E4MZ」 5질량부를 혼합하고, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (6)을 얻었다.133 parts by mass of the phenoxy resin (P-2) obtained in Synthesis Example 1, 70 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent 188 g/equivalent), 10 parts by mass of the modified novolak resin C obtained in Synthesis Example 4 and 5 parts by mass of "2E4MZ" manufactured by Shikoku Chemicals Co., Ltd. as the curing catalyst 2 were mixed, and diluted using cyclohexanone so that the nonvolatile content was 2% by mass. , and uniformly mixed to obtain a coating liquid (6) for forming a primer layer.
[조제예 7: 프라이머층 형성용 도공액 (7)의 조제][Preparation Example 7: Preparation of coating solution (7) for forming primer layer]
합성예 3에서 얻어진 페녹시 수지 (P-3)을 67질량부, 에폭시 수지 A(DIC 가부시키가이샤제 「EPICLON 850-S」; 비스페놀 A형 에폭시 수지, 에폭시기 당량 188g/당량) 76질량부, 노볼락 수지 B(DIC 가부시키가이샤제 「PHENOLITE TD-2131」, 수산기 당량 104g/당량) 14질량부, 및 경화 촉매 1로서 시코쿠 가세이 가부시키가이샤제 「TBZ」 0.5질량부를 혼합하고, 시클로헥사논을 사용하여 불휘발분이 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 프라이머층 형성용 도공액 (7)을 얻었다.67 parts by mass of the phenoxy resin (P-3) obtained in Synthesis Example 3, 76 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent 188 g/equivalent), 14 parts by mass of novolac resin B (“PHENOLITE TD-2131” manufactured by DIC Corporation, hydroxyl equivalent 104 g/equivalent) and 0.5 parts by mass of “TBZ” manufactured by Shikoku Kasei Corporation as curing catalyst 1 were mixed, and cyclohexanone was added. was diluted so that the non-volatile matter was 2% by mass, and mixed uniformly to obtain a coating liquid for forming a primer layer (7).
[조제예 8: 프라이머층 형성용 도공액 (8)의 조제][Preparation Example 8: Preparation of coating solution (8) for forming primer layer]
합성예 4에서 얻어진 변성 노볼락 수지 C 65질량부에, 에폭시 수지 A(DIC 가부시키가이샤제 「EPICLON 850-S」; 비스페놀 A형 에폭시 수지, 에폭시기 당량 188g/당량) 35질량부를 혼합 후, 메틸에틸케톤으로 불휘발분 2질량%가 되도록 희석하고, 균일하게 혼합함으로써, 아미노트리아진 변성 노볼락 수지와 에폭시 수지의 혼합 수지 용액을 얻었다.After mixing 35 parts by mass of epoxy resin A (“EPICLON 850-S” manufactured by DIC Corporation; bisphenol A type epoxy resin, epoxy group equivalent 188 g/equivalent) with 65 parts by mass of modified novolak resin C obtained in Synthesis Example 4, methyl It was diluted with ethyl ketone to a non-volatile content of 2% by mass and mixed uniformly to obtain a mixed resin solution of aminotriazine-modified novolac resin and epoxy resin.
<금속 입자층 형성용 도공액의 조제><Preparation of coating solution for forming metal particle layer>
질소 분위기 하에 메톡시폴리에틸렌글리콜(수평균 분자량 2,000) 20질량부, 피리딘 8.0질량부 및 클로로포름 20ml를 포함하는 혼합물에, p-톨루엔술폰산클로라이드 9.6질량부를 포함하는 클로로포름(30ml) 용액을, 빙랭 교반하면서 30분간 적하한 후, 욕조 온도 40℃에서 4시간 교반하고, 클로로포름 50ml를 혼합하였다.Under a nitrogen atmosphere, a solution of chloroform (30 ml) containing 9.6 parts by mass of p-toluenesulfonic acid chloride was added to a mixture containing 20 parts by mass of methoxypolyethylene glycol (number average molecular weight 2,000), 8.0 parts by mass of pyridine, and 20 ml of chloroform, while cooling on ice and stirring. After adding dropwise for 30 minutes, the mixture was stirred at a bath temperature of 40°C for 4 hours, and 50 ml of chloroform was mixed.
이어서, 얻어진 생성물을, 5질량% 염산 수용액 100ml로 세정하고, 이어서 포화 탄산수소나트륨 수용액 100ml로 세정하고, 이어서 포화 식염수 용액 100ml로 세정한 후, 무수황산마그네슘을 사용하여 건조시키고, 여과, 감압 농축하여, 헥산으로 수회 세정한 후, 여과하여 80℃에서 감압 건조시킴으로써, p-톨루엔술포닐옥시기를 갖는 메톡시폴리에틸렌글리콜을 얻었다.Next, the obtained product was washed with 100 ml of a 5 mass% aqueous hydrochloric acid solution, then washed with 100 ml of a saturated aqueous sodium bicarbonate solution, then washed with 100 ml of a saturated saline solution, dried using anhydrous magnesium sulfate, filtered, and concentrated under reduced pressure. After washing with hexane several times, it was filtered and dried under reduced pressure at 80°C to obtain methoxypolyethylene glycol having a p-toluenesulfonyloxy group.
p-톨루엔술포닐옥시기를 갖는 메톡시폴리에틸렌글리콜 5.39질량부, 폴리에틸렌이민(알드리치사제, 분자량 25,000) 20질량부, 탄산칼륨 0.07질량부 및 N,N-디메틸아세트아미드 100ml를 혼합하여, 질소 분위기 하에 100℃에서 6시간 교반하였다.5.39 parts by mass of methoxypolyethylene glycol having a p-toluenesulfonyloxy group, 20 parts by mass of polyethyleneimine (manufactured by Aldrich, molecular weight 25,000), 0.07 parts by mass of potassium carbonate, and 100 ml of N,N-dimethylacetamide were mixed under a nitrogen atmosphere. It was stirred at 100°C for 6 hours.
이어서, 아세트산에틸과 헥산의 혼합 용액(아세트산에틸/헥산의 체적비=1/2) 300ml를 첨가하고, 실온에서 강력 교반한 후, 생성물의 고형물을 여과하였다. 그 고형물을, 아세트산에틸과 헥산의 혼합 용액(아세트산에틸/헥산의 체적비=1/2) 100ml를 사용하여 세정한 후, 감압 건조시킴으로써, 폴리에틸렌이민에 폴리에틸렌글리콜이 결합된 화합물을 얻었다.Next, 300 ml of a mixed solution of ethyl acetate and hexane (volume ratio of ethyl acetate/hexane = 1/2) was added, and after vigorous stirring at room temperature, the solid product was filtered. The solid was washed with 100 ml of a mixed solution of ethyl acetate and hexane (volume ratio of ethyl acetate/hexane = 1/2) and then dried under reduced pressure to obtain a compound in which polyethylene glycol is bonded to polyethyleneimine.
얻어진 폴리에틸렌이민에 폴리에틸렌글리콜이 결합된 화합물을 0.592질량부 포함하는 수용액 138.8질량부와, 산화은 10질량부를 혼합하여, 25℃에서 30분간 교반하였다. 이어서, 디메틸에탄올아민 46질량부를 교반하면서 서서히 첨가하고, 25℃에서 30분간 교반하였다. 계속해서, 10질량% 아스코르브산 수용액 15.2질량부를 교반하면서 서서히 첨가하여 20시간 교반을 계속함으로써 은의 분산체를 얻었다.138.8 parts by mass of an aqueous solution containing 0.592 parts by mass of the obtained polyethyleneimine and polyethylene glycol bonded compound and 10 parts by mass of silver oxide were mixed and stirred at 25°C for 30 minutes. Next, 46 parts by mass of dimethylethanolamine was gradually added while stirring, and stirred at 25°C for 30 minutes. Subsequently, 15.2 parts by mass of a 10% by mass ascorbic acid aqueous solution was gradually added while stirring, and stirring was continued for 20 hours to obtain a silver dispersion.
얻어진 은의 분산체에 이소프로필알코올 200ml와 헥산 200ml의 혼합 용제를 첨가하여 2분간 교반한 후, 3000rpm으로 5분간 원심 농축을 행하였다. 상청을 제거한 후, 침전물에 이소프로필알코올 50ml와 헥산 50ml의 혼합 용제를 첨가하여 2분간 교반한 후, 3000rpm으로 5분간 원심 농축을 행하였다. 상청을 제거한 후, 침전물에 추가로 물 20질량부를 첨가하여 2분간 교반하고, 감압 하 유기 용제를 제거하였다. 추가로 물 10질량부를 첨가하여 교반 분산시킨 후, 해당 분산체를 -40℃의 냉동기에 1주야 방치하여 동결시키고, 이것을 동결 건조기(도쿄 리카 기카이 가부시키가이샤제 FDU-2200)로 24시간 처리함으로써, 회녹색의 금속 광택이 있는 플레이크상의 덩어리를 포함하는 양이온성 은 입자를 얻었다.A mixed solvent of 200 ml of isopropyl alcohol and 200 ml of hexane was added to the obtained silver dispersion, stirred for 2 minutes, and then concentrated by centrifugation at 3000 rpm for 5 minutes. After removing the supernatant, a mixed solvent of 50 ml of isopropyl alcohol and 50 ml of hexane was added to the precipitate, stirred for 2 minutes, and then concentrated by centrifugation at 3000 rpm for 5 minutes. After removing the supernatant, 20 parts by mass of water was added to the precipitate, stirred for 2 minutes, and the organic solvent was removed under reduced pressure. After further adding 10 parts by mass of water and stirring and dispersing, the dispersion was frozen by leaving it in a freezer at -40°C for 1 week, and then treated with a freeze dryer (FDU-2200, manufactured by Tokyo Rika Kikai Co., Ltd.) for 24 hours. By doing so, cationic silver particles containing flake-like masses with a gray-green metallic luster were obtained.
얻어진 양이온성 은 입자의 분말을, 에틸렌글리콜 45질량부와, 이온 교환수 55질량부의 혼합 용매에 분산시켜, 양이온성 은 입자의 함유량이 5질량%인 금속 입자층 형성용 도공액을 조제하였다.The obtained powder of cationic silver particles was dispersed in a mixed solvent of 45 parts by mass of ethylene glycol and 55 parts by mass of ion-exchanged water, and a coating liquid for forming a metal particle layer having a content of cationic silver particles of 5% by mass was prepared.
<적층체 (1) 내지 (8)의 제작><Production of laminates (1) to (8)>
폴리이미드 필름(도레이 듀퐁 가부시키가이샤제 「캡톤 150EN-A」; 두께 38㎛)의 표면에, 상기에서 얻어진 각 프라이머층 형성용 도공액 (1) 내지 (8)을, 탁상형 소형 코터(K 프린팅 프로파, RK 프린트 코트 인스트루먼트 가부시키가이샤)를 사용하여, 건조 후의 도막 두께가 300nm로 되도록 도공하였다. 이어서, 열풍 건조기를 사용하여 155℃에서 5분간 건조시킴으로써, 폴리이미드 필름의 표면에 프라이머층을 형성하였다.Each primer layer forming coating solution (1) to (8) obtained above was applied to the surface of a polyimide film (“Kapton 150EN-A” manufactured by Toray DuPont Co., Ltd.; thickness 38 μm) using a tabletop small coater (K). Using Printing Propa, RK Print Coat Instrument Co., Ltd., it was applied so that the thickness of the coating film after drying was 300 nm. Next, a primer layer was formed on the surface of the polyimide film by drying at 155°C for 5 minutes using a hot air dryer.
계속해서, 프라이머층의 표면에, 상기에서 얻어진 금속 입자층 형성용 도공액을, 바 코터를 사용하여, 건조 후의 도막 두께가 100nm로 되도록 도공하였다. 이어서, 140℃에서 5분간 건조시킴으로써, 금속 입자층을 형성하였다.Subsequently, the coating liquid for forming a metal particle layer obtained above was applied to the surface of the primer layer using a bar coater so that the film thickness after drying was 100 nm. Next, the metal particle layer was formed by drying at 140°C for 5 minutes.
상기와 같이 하여 형성한 금속 입자층을 캐소드측으로 설정하고, 인 함유 구리를 애노드측으로 설정하고, 황산구리를 함유하는 전해 도금액을 사용하여 전류 밀도 2A/dm2로 18분간 전해 도금을 행함으로써, 금속 입자층 상에 구리 도금층(막 두께 8㎛)을 형성하였다. 전해 도금액으로서는, 황산구리 70g/L, 황산 200g/L, 염소 이온 50mg/L, 첨가제(톱루티나 SF-M, 오꾸노 세야꾸 고교 가부시키가이샤) 5ml/L를 사용하였다.The metal particle layer formed as described above is set to the cathode side, phosphorus-containing copper is set to the anode side, and electrolytic plating is performed for 18 minutes at a current density of 2 A/dm 2 using an electrolytic plating solution containing copper sulfate, thereby forming a layer on the metal particle layer. A copper plating layer (8 μm thickness) was formed. As the electrolytic plating solution, 70 g/L of copper sulfate, 200 g/L of sulfuric acid, 50 mg/L of chlorine ion, and 5 ml/L of additive (Toprutina SF-M, Okuno Seiyaku Kogyo Co., Ltd.) were used.
이와 같이 하여, 지지체, 프라이머층, 금속 입자층 및 금속 도금층이 순차 적층된 적층체 (1) 내지 (8)을 얻었다. 또한, 프라이머층 형성용 도공액의 번호와 적층체의 번호는 대응하고, 예를 들어 프라이머층 형성용 도공액 (1)은 적층체 (1)에 대응한다.In this way, laminates (1) to (8) in which the support, primer layer, metal particle layer, and metal plating layer were sequentially laminated were obtained. In addition, the number of the coating solution for forming a primer layer corresponds to the number of the laminate. For example, the coating solution for forming a primer layer (1) corresponds to the laminate (1).
<밀착성 평가(상태 시)><Adhesion evaluation (in condition)>
상기에서 얻어진 각 적층체에 대해서, 실온 환경 하에서 Nordson DAGE사제 4000Plus를 사용하여 박리 강도를 측정하였다. 또한, 측정에 사용하는 리드 폭은 5mm, 그 필의 각도는 90°로 하였다. 또한, 필 강도는, 금속 도금층의 두께가 두꺼워질수록 높은 값을 나타내는 경향이 있지만, 본 명세서에 있어서 필 강도의 측정은, 금속 도금층의 두께 8㎛에 있어서의 측정값을 기준으로 하여 실시하였다.For each laminate obtained above, the peel strength was measured using 4000Plus manufactured by Nordson DAGE in a room temperature environment. Additionally, the lead width used for measurement was 5 mm, and the peel angle was 90°. In addition, the peel strength tends to show a higher value as the thickness of the metal plating layer becomes thicker, but in this specification, the peel strength was measured based on the measured value at a thickness of 8 μm of the metal plating layer.
측정한 가열 전의 박리 강도의 값으로부터, 하기 기준에 따라서 밀착성을 평가하였다.From the measured peel strength before heating, adhesion was evaluated according to the following criteria.
A: 박리 강도의 값이 600N/m 이상이다.A: The peel strength value is 600 N/m or more.
B: 박리 강도의 값이 450N/m 이상 600N/m 미만이다.B: The peel strength value is 450 N/m or more and less than 600 N/m.
C: 박리 강도의 값이 250N/m 이상 450N/m 미만이다.C: The peel strength value is 250 N/m or more and less than 450 N/m.
D: 박리 강도의 값이 250N/m 미만이다.D: The peel strength value is less than 250 N/m.
평가 결과는 하기 표 1에 나타내는 대로였다.The evaluation results were as shown in Table 1 below.
<밀착성 평가(장기 내열 시험)><Adhesion evaluation (long-term heat resistance test)>
상기에서 얻어진 각 적층체에 대해서, 각각 150℃로 설정한 건조기 내에 300시간 보관하여 가열하였다. 가열 후, 각 적층체를 실온까지 냉각시키고, 상기와 마찬가지의 방법으로 필 강도를 측정하였다.Each laminate obtained above was stored and heated in a dryer set at 150°C for 300 hours. After heating, each laminate was cooled to room temperature, and the peeling strength was measured in the same manner as above.
측정한 가열 전후의 필 강도값을 사용하여, 가열 전후에서의 유지율을 산출하고, 하기 기준에 따라서 내열성의 유지 정도를 평가하였다.Using the measured peeling strength values before and after heating, the retention rate before and after heating was calculated, and the degree of heat resistance retention was evaluated according to the following criteria.
A: 유지율이 80% 이상이다.A: The retention rate is over 80%.
B: 유지율이 60% 이상 80% 미만이다.B: The retention rate is 60% or more and less than 80%.
C: 유지율이 30% 이상 60% 미만이다.C: The retention rate is 30% or more and less than 60%.
D: 유지율이 30% 미만이다.D: The retention rate is less than 30%.
평가 결과는 하기 표 1에 나타내는 대로였다.The evaluation results were as shown in Table 1 below.
표 1에 나타낸 밀착성 평가 결과로부터도 명백한 바와 같이, 프라이머층으로서 특정한 분자량을 갖는 페녹시 수지를 사용한 적층체(적층체 (1) 내지 (7))는, 모두 상태 시에서의 박리 강도가 450N/m 이상이며, 장기 내열 시험 후에 있어서도, 상태 시의 박리 강도의 80% 이상의 유지율을 갖고 있다. 즉, 상태 시도 장기 내열 시험 후의 어느 밀착성 평가도 우수한 것을 알 수 있다.As is clear from the adhesion evaluation results shown in Table 1, the laminates (laminated bodies (1) to (7)) using a phenoxy resin having a specific molecular weight as the primer layer all have a peeling strength of 450N/ m or more, and has a retention rate of 80% or more of the peeling strength as-is even after a long-term heat resistance test. In other words, it can be seen that all adhesion evaluations after the state trial and long-term heat resistance test are excellent.
이에 비해, 프라이머층으로서 페녹시 수지를 사용하지 않는 적층체(적층체(8))에서는, 상태 시에서의 박리 강도는 높기는 하지만 장기 내열성 시험 후에는 유지율이 8%밖에 되지 않아, 안정된 밀착성을 갖지 않는다. 즉, 실시예와 비교하여, 장기 내열 시험 후의 밀착성 평가에 열악한 것을 알 수 있다.In contrast, in the laminate (laminated body 8) that does not use a phenoxy resin as a primer layer, the peeling strength in the as-is state is high, but the retention rate is only 8% after the long-term heat resistance test, and stable adhesion is not achieved. don't have That is, compared to the examples, it can be seen that the adhesion evaluation after the long-term heat resistance test is poor.
Claims (11)
상기 프라이머층이 에폭시 수지를 추가로 포함하는, 적층체.According to paragraph 1,
A laminate wherein the primer layer further includes an epoxy resin.
상기 프라이머층이 상기 페녹시 수지와 상기 에폭시 수지를, 질량 기준에 있어서 90:10 내지 10:90의 비율로 포함하는, 적층체.According to paragraph 2,
A laminate wherein the primer layer contains the phenoxy resin and the epoxy resin in a ratio of 90:10 to 10:90 on a mass basis.
상기 프라이머층이, 추가로 아미노트리아진환을 갖는 화합물을 포함하는, 적층체.According to paragraph 1,
A laminate in which the primer layer further contains a compound having an aminotriazine ring.
상기 아미노트리아진환을 갖는 화합물이 아미노트리아진 변성 노볼락 수지인, 적층체.According to clause 4,
A laminate wherein the compound having the aminotriazine ring is an aminotriazine-modified novolak resin.
상기 금속 입자층이, 금속 입자와 양이온성기를 갖는 화합물을 포함하는, 적층체.According to paragraph 1,
A laminate in which the metal particle layer contains metal particles and a compound having a cationic group.
상기 양이온성기를 갖는 화합물은 염기성 질소 원자 함유기를 갖는 화합물인, 적층체.According to clause 6,
A laminate wherein the compound having the cationic group is a compound having a basic nitrogen atom-containing group.
상기 지지체가 가요성 수지 재료로 이루어지는, 적층체.According to paragraph 1,
A laminate wherein the support is made of a flexible resin material.
전자 기기에 사용되는, 적층체.According to any one of claims 1 to 8,
Laminate used in electronic devices.
전자 기기가 프린트 배선판 및 전자파 실드로부터 선택되는, 적층체.According to clause 9,
A laminate in which the electronic device is selected from printed wiring boards and electromagnetic wave shields.
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KR20240037880A true KR20240037880A (en) | 2024-03-22 |
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KR1020237043520A KR20240037880A (en) | 2021-07-15 | 2022-07-15 | Laminates and electronic devices having laminates |
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KR (1) | KR20240037880A (en) |
CN (1) | CN117561164A (en) |
TW (1) | TW202327876A (en) |
WO (1) | WO2023286872A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015118044A (en) | 2013-12-19 | 2015-06-25 | 住友金属鉱山株式会社 | Method for determining adhesion strength of metal thin film/polyimide laminate and metalized polyimide film substrate using the same |
JP2017218664A (en) | 2016-06-10 | 2017-12-14 | 株式会社C−Ink | Plating base composition and plating base formed of the same |
WO2019013038A1 (en) | 2017-07-10 | 2019-01-17 | Dic株式会社 | Laminated body, printed wiring board using same, flexible printed wiring board, and molded article |
JP2020059185A (en) | 2018-10-09 | 2020-04-16 | Dic株式会社 | Laminate, electronic device, and manufacturing method therefor |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6418435B2 (en) * | 2014-02-21 | 2018-11-07 | Dic株式会社 | Laminate, conductive pattern and electronic circuit |
JP6460383B2 (en) * | 2014-12-11 | 2019-01-30 | Dic株式会社 | Conductive laminate and method for producing the same |
JP2019014188A (en) * | 2017-07-10 | 2019-01-31 | Dic株式会社 | Laminate, and printed wiring board, flexible printed wiring board and molded article using the same |
KR102364792B1 (en) * | 2017-07-10 | 2022-02-18 | 디아이씨 가부시끼가이샤 | Laminate, printed wiring board, flexible printed wiring board and molded article using the same |
-
2022
- 2022-07-15 TW TW111126625A patent/TW202327876A/en unknown
- 2022-07-15 KR KR1020237043520A patent/KR20240037880A/en active Search and Examination
- 2022-07-15 WO PCT/JP2022/027941 patent/WO2023286872A1/en active Application Filing
- 2022-07-15 CN CN202280042830.3A patent/CN117561164A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015118044A (en) | 2013-12-19 | 2015-06-25 | 住友金属鉱山株式会社 | Method for determining adhesion strength of metal thin film/polyimide laminate and metalized polyimide film substrate using the same |
JP2017218664A (en) | 2016-06-10 | 2017-12-14 | 株式会社C−Ink | Plating base composition and plating base formed of the same |
WO2019013038A1 (en) | 2017-07-10 | 2019-01-17 | Dic株式会社 | Laminated body, printed wiring board using same, flexible printed wiring board, and molded article |
JP2020059185A (en) | 2018-10-09 | 2020-04-16 | Dic株式会社 | Laminate, electronic device, and manufacturing method therefor |
Also Published As
Publication number | Publication date |
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TW202327876A (en) | 2023-07-16 |
CN117561164A (en) | 2024-02-13 |
WO2023286872A1 (en) | 2023-01-19 |
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