WO2023218943A1 - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
WO2023218943A1
WO2023218943A1 PCT/JP2023/016282 JP2023016282W WO2023218943A1 WO 2023218943 A1 WO2023218943 A1 WO 2023218943A1 JP 2023016282 W JP2023016282 W JP 2023016282W WO 2023218943 A1 WO2023218943 A1 WO 2023218943A1
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WO
WIPO (PCT)
Prior art keywords
terminal
power terminal
semiconductor device
semiconductor element
power
Prior art date
Application number
PCT/JP2023/016282
Other languages
French (fr)
Japanese (ja)
Inventor
沢水 神田
Original Assignee
ローム株式会社
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Publication of WO2023218943A1 publication Critical patent/WO2023218943A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N

Definitions

  • the present disclosure relates to a semiconductor device.
  • Patent Document 1 discloses an example of a semiconductor device equipped with two power semiconductor elements (for example, IGBT).
  • the semiconductor device is used in a power conversion device such as an inverter.
  • the semiconductor device is surface mounted on a wiring board.
  • the semiconductor device disclosed in Patent Document 1 includes a plurality of power supply terminals and a plurality of control terminals.
  • a plurality of power supply terminals and a plurality of control terminals protrude outside from a housing that covers the two power semiconductor elements.
  • a portion protruding outward from the housing is bent into a gull wing shape to enable surface mounting.
  • the semiconductor device has parasitic inductance. Therefore, among multiple power supply terminals, there is a concern that power loss at the terminal where DC current flows will increase due to mutual induction between the terminal where AC current flows and the adjacent terminal where DC current flows. .
  • An object of the present disclosure is to provide a semiconductor device that is improved over conventional ones.
  • an object of the present disclosure is to provide a semiconductor device that can reduce parasitic inductance in the device while reducing the size of the device.
  • a semiconductor device provided by a first aspect of the present disclosure includes a first semiconductor element, a second semiconductor element, a first power terminal and a first signal terminal electrically connected to the first semiconductor element, and a first semiconductor element and a first signal terminal that are electrically connected to the first semiconductor element. a second power terminal and a second signal terminal that are electrically connected to the element; a third power terminal that is electrically conductive to the first semiconductor element and the second semiconductor element; and a seal that covers the first semiconductor element and the second semiconductor element. and a resin.
  • the sealing resin has a bottom surface facing in a first direction, and first and second side surfaces facing oppositely to each other in a second direction perpendicular to the first direction.
  • Each of the first power terminal, the second power terminal, and the third power terminal has a first mounting surface facing the same side as the bottom surface in the first direction.
  • Each of the first signal terminal and the second signal terminal has a second mounting surface facing the same side as the bottom surface in the first direction.
  • the positions of the first mounting surface and the second mounting surface in the first direction are closer to the bottom surface than to the first semiconductor element and the second semiconductor element.
  • the first power terminal and the second power terminal protrude from the first side surface.
  • the third power terminal protrudes from the second side surface.
  • Each of the first signal terminal and the second signal terminal protrudes from either the first side surface or the second side surface.
  • the first power terminal and the second power terminal are separated from each other in a third direction orthogonal to the first direction and the second direction.
  • FIG. 1 is a plan view of a semiconductor device according to a first embodiment of the present disclosure.
  • FIG. 2 is a bottom view of the semiconductor device shown in FIG. 1.
  • FIG. 3 is a bottom view corresponding to FIG. 2, through which the sealing resin is seen.
  • FIG. 4 is a front view of the semiconductor device shown in FIG. 1.
  • FIG. 5 is a rear view of the semiconductor device shown in FIG. 1.
  • FIG. 6 is a right side view of the semiconductor device shown in FIG. 1.
  • FIG. 7 is a cross-sectional view taken along line VII-VII in FIG.
  • FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG.
  • FIG. 9 is a cross-sectional view taken along line IX-IX in FIG.
  • FIG. 10 is a partially enlarged view of FIG.
  • FIG. 11 is a plan view of a semiconductor device according to a second embodiment of the present disclosure.
  • FIG. 12 is a bottom view of the semiconductor device shown in FIG. 11.
  • FIG. 13 is a bottom view corresponding to FIG. 12, through which the sealing resin is seen.
  • FIG. 14 is a front view of the semiconductor device shown in FIG. 11.
  • FIG. 15 is a rear view of the semiconductor device shown in FIG. 11.
  • FIG. 16 is a plan view of a semiconductor device according to a third embodiment of the present disclosure.
  • FIG. 17 is a bottom view of the semiconductor device shown in FIG. 16.
  • FIG. 18 is a bottom view corresponding to FIG. 17, in which the sealing resin is seen through.
  • FIG. 19 is a front view of the semiconductor device shown in FIG. 16.
  • FIG. 16 is a front view of the semiconductor device shown in FIG. 16.
  • FIG. 20 is a rear view of the semiconductor device shown in FIG. 16.
  • FIG. 21 is a plan view of a semiconductor device according to a fourth embodiment of the present disclosure.
  • 22 is a bottom view of the semiconductor device shown in FIG. 21.
  • 23 is a front view of the semiconductor device shown in FIG. 21.
  • FIG. 24 is a rear view of the semiconductor device shown in FIG. 21.
  • FIG. 25 is a right side view of the semiconductor device shown in FIG. 21.
  • FIG. 26 is a cross-sectional view taken along line XXVI-XXVI in FIG. 22.
  • FIG. 27 is a plan view of a semiconductor device according to a fifth embodiment of the present disclosure.
  • FIG. 28 is a bottom view of the semiconductor device shown in FIG. 27.
  • FIG. 29 is a plan view of a semiconductor device according to a sixth embodiment of the present disclosure.
  • FIG. 30 is a bottom view of the semiconductor device shown in FIG. 29.
  • a semiconductor device A10 according to a first embodiment of the present disclosure will be described based on FIGS. 1 to 10.
  • the semiconductor device A10 is used in electronic equipment including a power conversion circuit such as an inverter.
  • the semiconductor device A10 includes a support member 10, two semiconductor elements 20, a plurality of power terminals 30, a plurality of first signal terminals 31, a plurality of second signal terminals 32, two conductive members 40, and two gate wires 41, 2.
  • the detection wire 42 and the sealing resin 50 are provided.
  • FIG. 3 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown by an imaginary line (two-dot chain line).
  • first direction z the normal direction of the bottom surface 52 of the sealing resin 50, which will be described later, will be referred to as a "first direction z.”
  • second direction x One direction perpendicular to the first direction z
  • third direction y A direction perpendicular to both the first direction z and the second direction x is referred to as a "third direction y.”
  • the semiconductor device A10 converts the DC power supply voltage applied to the first power terminal 30A and the second power terminal 30B (see FIGS. 1 and 2) among the plurality of power terminals 30 into AC power using the two semiconductor elements 20. Convert.
  • the converted AC power is input from a third power terminal 30C (see FIGS. 1 and 2) among the plurality of power terminals 30 to a power supply target such as a motor.
  • the semiconductor device A10 is surface mounted on a wiring board.
  • the sealing resin 50 covers the two semiconductor elements 20, as shown in FIGS. 2, 7, and 8. Furthermore, the sealing resin 50 covers the support member 10 excluding the heat dissipation layer 16, the two conductive members 40, the two gate wires 41, and the two detection wires 42.
  • the sealing resin 50 has electrical insulation properties.
  • the sealing resin 50 is made of a material containing, for example, a black epoxy resin. As shown in FIGS. 1 and 2, the sealing resin 50 has a top surface 51, a bottom surface 52, a first side surface 53, a second side surface 54, and two third side surfaces 55.
  • the outer edge 501 shown in FIG. 1 corresponds to the outline of the sealing resin 50 when viewed in the first direction z.
  • the top surface 51 and the bottom surface 52 face oppositely to each other in the first direction z.
  • first side surface 53 and the second side surface 54 face opposite to each other in the second direction x.
  • the first side surface 53 and the second side surface 54 are connected to the top surface 51 and the bottom surface 52.
  • Each of the first side surface 53 and the second side surface 54 includes a region connected to the bottom surface 52 and facing in the second direction x, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
  • the two third side surfaces 55 face oppositely to each other in the third direction y.
  • the two third side surfaces 55 are connected to the top surface 51 and the bottom surface 52.
  • Each of the two third side surfaces 55 includes a region connected to the bottom surface 52 and facing in the third direction y, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
  • the support member 10 has two semiconductor elements 20 mounted thereon, as shown in FIGS. 3 and 9. As shown in FIGS. 1 and 3, the support member 10 includes an insulating layer 11, a first conductive layer 12, a second conductive layer 13, a third conductive layer 14, a plurality of pad layers 15, and a heat dissipation layer 16.
  • the insulating layer 11 is located between the first conductive layer 12 and the second conductive layer 13 and the heat dissipation layer 16 in the first direction z.
  • the material for the insulating layer 11 is preferably one with relatively high thermal conductivity. Therefore, the insulating layer 11 is made of a material containing aluminum nitride (AlN) in its composition, for example.
  • AlN aluminum nitride
  • the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 are connected to the heat dissipation layer 16 with respect to the insulating layer 11 in the first direction z. located on the opposite side.
  • the first conductive layer 12 and the second conductive layer 13 are located between the two semiconductor elements 20 and the insulating layer 11 in the first direction z.
  • Each of the first conductive layer 12 , the second conductive layer 13 , the third conductive layer 14 , and the plurality of pad layers 15 is electrically connected to at least one of the two semiconductor elements 20 .
  • the compositions of the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 include copper (Cu).
  • the first conductive layer 12 is located on one side in the third direction y.
  • the second conductive layer 13 is located next to the first conductive layer 12 in the third direction y.
  • the third conductive layer 14 is sandwiched between the first conductive layer 12 and the second conductive layer 13 in the third direction y.
  • the plurality of pad layers 15 are located on the opposite side of the third conductive layer 14 with respect to the first conductive layer 12 and the second conductive layer 13 in the second direction x.
  • the plurality of pad layers 15 are arranged along the third direction y.
  • the heat dissipation layer 16 is located on the opposite side of the first conductive layer 12 and the second conductive layer 13 with respect to the insulating layer 11 in the first direction z.
  • the heat dissipation layer 16 is exposed from the top surface 51 of the sealing resin 50.
  • the composition of the heat dissipation layer 16 includes copper.
  • the heat dissipation layer 16 completely overlaps each of the two semiconductor elements 20. As shown in FIG.
  • the two semiconductor elements 20 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. As shown in FIGS. 3 and 9, the two semiconductor elements 20 are individually conductively bonded to the first conductive layer 12 and the second conductive layer 13 of the support member 10 via a bonding layer 29. Bonding layer 29 is, for example, solder. In addition, the bonding layer 29 may be a sintered metal containing silver (Ag) or the like.
  • the two semiconductor elements 20 are n-channel type MOSFETs (Metal-Oxide-Semiconductor Field-Effect Transistors) with a vertical structure.
  • the two semiconductor elements 20 include compound semiconductor substrates.
  • the main material of the compound semiconductor substrate is silicon carbide (SiC).
  • silicon (Si) may be used as the main material of the compound semiconductor substrate.
  • the two semiconductor elements 20 may be other switching elements such as IGBTs (Insulated Gate Bipolar Transistors).
  • IGBTs Insulated Gate Bipolar Transistors
  • each of the two semiconductor elements 20 has a first electrode 21, a second electrode 22, and a gate electrode 23.
  • the first electrode 21 is provided facing either the first conductive layer 12 or the second conductive layer 13 of the support member 10 .
  • a current corresponding to the power before being converted by the semiconductor element 20 flows through the first electrode 21 . That is, the first electrode 21 corresponds to a drain electrode.
  • the second electrode 22 is provided on the opposite side to the first electrode 21 in the first direction z. A current corresponding to the power converted by the semiconductor element 20 flows through the second electrode 22 . That is, the second electrode 22 corresponds to a source electrode.
  • the gate electrode 23 is provided on the opposite side to the first electrode 21 in the first direction z, and is located away from the second electrode 22.
  • a gate voltage for driving the semiconductor element 20 is applied to the gate electrode 23 .
  • the area of the gate electrode 23 is smaller than the area of the second electrode 22 when viewed in the first direction z.
  • the two semiconductor elements 20 include a first semiconductor element 20A and a second semiconductor element 20B.
  • the first electrode 21 of the first semiconductor element 20A is conductively bonded to the first conductive layer 12 of the support member 10 via the bonding layer 29. Thereby, the first semiconductor element 20A is electrically connected to the first conductive layer 12.
  • the first electrode 21 of the second semiconductor element 20B is conductively bonded to the second conductive layer 13 via the bonding layer 29. Thereby, the second semiconductor element 20B is electrically connected to the second conductive layer 13.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. located between. As shown in FIG. 2, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the bottom surface 52.
  • each of the plurality of power terminals 30, each of the plurality of first signal terminals 31, and each of the plurality of second signal terminals 32 are sealed with a sealing resin. It intersects with the outer edge 501 of 50.
  • each of the plurality of power terminals 30 , each of the plurality of first signal terminals 31 , and each of the plurality of second signal terminals 32 protrudes from the support member 10 .
  • the compositions of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 include copper.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal leads.
  • the plurality of power terminals 30 include a first power terminal 30A, a second power terminal 30B, and a third power terminal 30C.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53 of the sealing resin 50.
  • the third power terminal 30C protrudes from the second side surface 54 of the sealing resin 50.
  • the first power terminal 30A, the second power terminal 30B, and the third power terminal 30C are located on opposite sides of the two semiconductor elements 20 in the second direction x.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the second power terminal 30B is located next to the first power terminal 30A in the third direction y.
  • the first power terminal 30A is conductively bonded to the first conductive layer 12 of the support member 10. Thereby, the first power terminal 30A is electrically connected to the first semiconductor element 20A.
  • the second power terminal 30B is conductively bonded to the third conductive layer 14 of the support member 10.
  • the third power terminal 30C is conductively bonded to the second conductive layer 13 of the support member 10. Thereby, the third power terminal 30C is electrically connected to the second semiconductor element 20B.
  • the plurality of first signal terminals 31 are located on the opposite side from the plurality of second signal terminals 32 with respect to the third power terminal 30C in the third direction y. As shown in FIGS. 2 and 7, the plurality of first signal terminals 31 protrude from the second side surface 54 of the sealing resin 50.
  • the plurality of first signal terminals 31 include a first gate terminal 31A, a first detection terminal 31B, and a second detection terminal 31C. Each of the plurality of first signal terminals 31 is electrically connected to the first semiconductor element 20A.
  • the first gate terminal 31A is located closest to the third power terminal 30C.
  • the first detection terminal 31B is located between the first gate terminal 31A and the second detection terminal 31C in the third direction y.
  • the first gate terminal 31A and the first detection terminal 31B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10.
  • the second detection terminal 31C is conductively bonded to the first conductive layer 12 of the support member 10.
  • a gate voltage for driving the first semiconductor element 20A is applied to the first gate terminal 31A.
  • a voltage equal to the potential applied to the second electrode 22 of the first semiconductor element 20A is applied to the first detection terminal 31B.
  • a voltage equal to the potential applied to the first electrode 21 of the first semiconductor element 20A is applied to the second detection terminal 31C.
  • the plurality of second signal terminals 32 protrude from the second side surface 54 of the sealing resin 50.
  • the plurality of second signal terminals 32 include a second gate terminal 32A, a third detection terminal 32B, and a fourth detection terminal 32C.
  • Each of the plurality of second signal terminals 32 is electrically connected to the second semiconductor element 20B.
  • the second gate terminal 32A is located closest to the third power terminal 30C.
  • the third detection terminal 32B is located between the second gate terminal 32A and the fourth detection terminal 32C in the third direction y.
  • the second gate terminal 32A and the third detection terminal 32B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10.
  • the fourth detection terminal 32C is electrically conductively bonded to the first conductive layer 12 of the support member 10.
  • a gate voltage for driving the second semiconductor element 20B is applied to the second gate terminal 32A.
  • a voltage equal to the potential applied to the second electrode 22 of the second semiconductor element 20B is applied to the third detection terminal 32B.
  • a voltage equal to the potential applied to the first electrode 21 of the second semiconductor element 20B is applied to the fourth detection terminal 32C.
  • each of the plurality of power terminals 30 has a first mounting surface 33.
  • the position of the first mounting surface 33 in the first direction z is closer to the bottom surface 52 of the sealing resin 50 than to the first semiconductor element 20A and the second semiconductor element 20B.
  • the first mounting surface 33 is exposed from the bottom surface 52.
  • the first mounting surface 33 extends in the second direction x.
  • the first mounting surface 33 includes a region protruding from either the first side surface 53 or the second side surface 54 of the sealing resin 50.
  • each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 has a second mounting surface 34.
  • the position of the second mounting surface 34 in the first direction z is closer to the bottom surface 52 of the sealing resin 50 than to the first semiconductor element 20A and the second semiconductor element 20B.
  • the second mounting surface 34 is exposed from the bottom surface 52.
  • the second mounting surface 34 extends in the second direction x.
  • the second mounting surface 34 includes a region protruding from the second side surface 54 of the sealing resin 50.
  • FIG. 7 As shown in FIG. 3, FIG. 7, and FIG. It has a section 36 and an intermediate section 37.
  • FIG. 3 As shown in FIG. 3, FIG. 7, and FIG. Conductively bonded.
  • the joint portion 35 is sandwiched between the sealing resin 50 and the support member 10.
  • the mounting portion 36 is separated from the joining portion 35 in the first direction z.
  • the mounting portion 36 is exposed from the bottom surface 52 of the sealing resin 50.
  • the intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
  • the mounting portion 36 is located on the opposite side of the joint portion 35 with respect to the intermediate portion 37 in the second direction x.
  • Each mounting portion 36 of the plurality of power terminals 30 includes a first mounting surface 33 .
  • Each mounting portion 36 of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 includes a second mounting surface 34.
  • the intermediate portion 37 is inclined with respect to the mounting portion 36 such that the further away from the mounting portion 36 in the first direction z, the closer to the joint portion 35 in the second direction x.
  • the two conductive members 40 are individually conductively bonded to the two semiconductor elements 20 and the second conductive layer 13 and the third conductive layer 14 of the support member 10.
  • the two conductive members 40 include a first member 40A and a second member 40B.
  • Each of the first member 40A and the second member 40B consists of a plurality of wires.
  • the composition of the plurality of wires includes aluminum (Al).
  • the composition of the plurality of wires may include copper.
  • each of the first member 40A and the second member 40B may be a metal clip instead of the plurality of wires.
  • the first member 40A is conductively bonded to the second electrode 22 of the first semiconductor element 20A and the second conductive layer 13 of the support member 10. Thereby, the first semiconductor element 20A is electrically connected to the second semiconductor element 20B and the third power terminal 30C among the plurality of power terminals 30.
  • the second member 40B is conductively bonded to the second electrode 22 of the second semiconductor element 20B and the third conductive layer 14 of the support member 10. Thereby, the second power terminal 30B among the plurality of power terminals 30 is electrically connected to the second semiconductor element 20B.
  • the first power terminal 30A among the plurality of power terminals 30 is electrically connected to the first semiconductor element 20A.
  • the third power terminal 30C is electrically connected to the second semiconductor element 20B. Therefore, the third power terminal 30C is electrically connected to the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A corresponds to the positive electrode (P terminal). Therefore, in the first power terminal 30A, a direct current flows from the outside toward the first semiconductor element 20A.
  • the second power terminal 30B corresponds to a negative electrode (N terminal). Therefore, in the second power terminal 30B, a direct current flows outward from the second semiconductor element 20B.
  • one of the two gate wires 41 has the gate electrode 23 of the first semiconductor element 20A and the first gate terminal 31A of the plurality of pad layers 15 of the support member 10 conductive. It is conductively bonded to the bonded pad layer 15. Thereby, the first gate terminal 31A is electrically connected to the gate electrode 23 of the first semiconductor element 20A.
  • the other gate wire 41 of the two gate wires 41 is connected to the gate electrode 23 of the second semiconductor element 20B and the pad layer 15 to which the second gate terminal 32A among the plurality of pad layers 15 of the support member 10 is conductively bonded. conductively bonded to the Thereby, the second gate terminal 32A is electrically connected to the gate electrode 23 of the second semiconductor element 20B.
  • the composition of the two gate wires 41 includes gold (Au).
  • one of the two detection wires 42 is connected to the second electrode 22 of the first semiconductor element 20A and the first detection terminal 31B among the plurality of pad layers 15 of the support member 10. It is conductively bonded to the pad layer 15 which is conductively bonded. Thereby, the first detection terminal 31B is electrically connected to the second electrode 22 of the first semiconductor element 20A.
  • the other detection wire 42 of the two detection wires 42 is a pad layer 15 to which the second electrode 22 of the second semiconductor element 20B and the third detection terminal 32B among the plurality of pad layers 15 of the support member 10 are electrically bonded. and are electrically conductively bonded to each other. Thereby, the third detection terminal 32B is electrically connected to the second electrode 22 of the second semiconductor element 20B.
  • the composition of the two sensing wires 42 includes aluminum.
  • the semiconductor device A10 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A10 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the first signal terminal 31 of each of the first power terminal 30A, the second power terminal 30B, and the third power terminal 30C is exposed from the bottom surface 52 of the sealing resin 50.
  • the first mounting surface 33 extends in the second direction x and includes a region protruding from either the first side surface 53 or the second side surface 54 of the sealing resin 50.
  • the semiconductor device A10 further includes a support member 10 on which a first semiconductor element 20A and a second semiconductor element 20B are mounted.
  • the support member 10 is exposed from the top surface 51 of the sealing resin 50.
  • the first semiconductor element 20A, the second semiconductor element 20B, the first power terminal 30A, the second power terminal 30B, the third power terminal 30C, the first signal terminal 31, and the second signal terminal 32 are sealed in the first direction z. It is located between the bottom surface 52 of the resin 50 and the support member 10.
  • the support member 10 has the heat dissipation layer 16 exposed from the top surface 51.
  • Each of the first power terminal 30A, the second power terminal 30B, and the third power terminal 30C has a joint portion 35, a mounting portion 36, and an intermediate portion 37.
  • the joint portion 35 is joined to the support member 10.
  • the mounting portion 36 is separated from the joint portion 35 in the first direction z and is exposed from the bottom surface 52 of the sealing resin 50.
  • the intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
  • the joint portion 35 is sandwiched between the sealing resin 50 and the support member 10.
  • FIGS. 11 to 15 A semiconductor device A20 according to a second embodiment of the present disclosure will be described based on FIGS. 11 to 15.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • FIG. 13 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown with imaginary lines.
  • the configuration of the plurality of second signal terminals 32 is different from the configuration of the semiconductor device A10.
  • the second gate terminal 32A among the plurality of second signal terminals 32 protrudes from the first side surface 53 of the sealing resin 50.
  • the second gate terminal 32A is located next to the second power terminal 30B among the plurality of power terminals 30 in the third direction y.
  • the third detection terminal 32B and the fourth detection terminal 32C are located on the opposite side of the second gate terminal 32A with respect to the two semiconductor elements 20 in the second direction x.
  • the fourth detection terminal 32C is located closest to the third power terminal 30C among the plurality of power terminals 30.
  • the gate voltage for driving the second semiconductor element 20B of the two semiconductor elements 20 is applied to the second gate terminal 32A. Therefore, in the second gate terminal 32A, a current flows from the outside toward the gate electrode 23 of the second semiconductor element 20B. Therefore, the direction of the current flowing through the second gate terminal 32A is opposite to the direction of the current flowing through the second power terminal 30B.
  • the dimension in the third direction y of the second power terminal 30B is larger than the dimension in the third direction y of each of the plurality of second signal terminals 32 including the second gate terminal 32A. .
  • the semiconductor device A20 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A20 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the semiconductor device A20 even in the semiconductor device A20, it is possible to reduce the parasitic inductance in the semiconductor device A20 while reducing the size of the semiconductor device A20. Furthermore, the semiconductor device A20 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • the second gate terminal 32A as the second signal terminal 32 protrudes from the first side surface 53 of the sealing resin 50.
  • the current flowing through the second signal terminal 32 is opposite to that flowing through the second power terminal 30B.
  • the second signal terminal 32 is located next to the second power terminal 30B in the third direction y.
  • FIGS. 16 to 20 A semiconductor device A30 according to a third embodiment of the present disclosure will be described based on FIGS. 16 to 20.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • FIG. 18 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown with imaginary lines.
  • the configuration of the plurality of first signal terminals 31 is different from the configuration of the semiconductor device A20 described above.
  • the first gate terminal 31A among the plurality of first signal terminals 31 protrudes from the first side surface 53 of the sealing resin 50.
  • the first gate terminal 31A is located next to the second power terminal 30B among the plurality of power terminals 30 in the third direction y.
  • the first power terminal 30A among the plurality of power terminals 30 is located on the opposite side of the second power terminal 30B with respect to the first gate terminal 31A in the third direction y.
  • the first detection terminal 31B and the second detection terminal 31C are located on the opposite side of the first gate terminal 31A with respect to the two semiconductor elements 20 in the second direction x.
  • the first detection terminal 31B is located closest to the third power terminal 30C among the plurality of power terminals 30.
  • the gate voltage for driving the first semiconductor element 20A of the two semiconductor elements 20 is applied to the first gate terminal 31A. Therefore, in the first gate terminal 31A, a current flows from the outside toward the gate electrode 23 of the first semiconductor element 20A. Therefore, the direction of the current flowing through the first gate terminal 31A is opposite to the direction of the current flowing through the second power terminal 30B.
  • the dimension in the third direction y of the second power terminal 30B is larger than the dimension in the third direction y of each of the plurality of first signal terminals 31 including the first gate terminal 31A. .
  • the second gate terminal 32A among the plurality of second signal terminals 32 is located on the opposite side of the first power terminal 30A with respect to the second power terminal 30B in the third direction y, and It is located next to the second power terminal 30B in the third direction y.
  • the semiconductor device A30 includes a first power terminal 30A and a first signal terminal 31 that are electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 that are electrically electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A30 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the semiconductor device A30 even in the semiconductor device A30, it is possible to reduce the parasitic inductance in the semiconductor device A30 while reducing the size of the semiconductor device A30. Furthermore, the semiconductor device A30 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • the first gate terminal 31A as the first signal terminal 31 protrudes from the first side surface 53 of the sealing resin 50.
  • the current flowing through the first signal terminal 31 is opposite to that flowing through the second power terminal 30B.
  • the first signal terminal 31 is located next to the second power terminal 30B in the third direction y.
  • the second gate terminal 32A as the second signal terminal 32 protrudes from the first side surface 53 of the sealing resin 50.
  • the current flowing through the second signal terminal 32 is opposite to that flowing through the second power terminal 30B.
  • the second signal terminal 32 is located on the opposite side of the first signal terminal 31 with respect to the second power terminal 30B in the third direction y, and is located next to the second power terminal 30B in the third direction y. With this configuration, the second signal terminal 32 achieves the same effects as in the case of the semiconductor device A20.
  • FIGS. 21 to 26 A semiconductor device A40 according to a fourth embodiment of the present disclosure will be described based on FIGS. 21 to 26.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
  • each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is shaped like a gull wing when viewed from the bottom surface 50 of the sealing resin 50. It is bent towards.
  • the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
  • each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is exposed only from the second side surface 54 of the sealing resin 50.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is visible in the third direction y. It is bent toward the bottom surface 52 of the sealing resin 50 in a gull-wing shape.
  • the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
  • the semiconductor device A40 includes a first power terminal 30A and a first signal terminal 31 that are electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 that are electrically electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A40 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the semiconductor device A40 even in the semiconductor device A40, it is possible to reduce the parasitic inductance in the semiconductor device A40 while reducing the size of the semiconductor device A40. Furthermore, the semiconductor device A40 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • a semiconductor device A50 according to a fifth embodiment of the present disclosure will be described based on FIGS. 27 and 28.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A20.
  • each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is attached to the bottom surface 52 of the sealing resin 50 in a gull wing shape when viewed in the third direction y. It is bent towards.
  • the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
  • each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is connected to a first side surface 53 of the sealing resin 50 and a second side surface 54 of the sealing resin 50. exposed only from either.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is It is bent toward the bottom surface 52 of the sealing resin 50 in a gullwing shape.
  • the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
  • the semiconductor device A50 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A50 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the semiconductor device A50 even in the semiconductor device A50, it is possible to reduce the parasitic inductance in the semiconductor device A50 while reducing the size of the semiconductor device A50. Furthermore, the semiconductor device A50 has the same configuration as the semiconductor device A20, and thus has the same effects as the semiconductor device A20.
  • FIGS. 29 and 30 A semiconductor device A60 according to a sixth embodiment of the present disclosure will be described based on FIGS. 29 and 30.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A30.
  • each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is attached to the bottom surface 52 of the sealing resin 50 in a gull wing shape when viewed in the third direction y. It is bent towards.
  • the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
  • each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is connected to a first side surface 53 of the sealing resin 50 and a second side surface 54 of the sealing resin 50. exposed only from either.
  • the portion of the mounting portion 36 exposed from the sealing resin 50 is It is bent toward the bottom surface 52 of the sealing resin 50 in a gullwing shape.
  • the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
  • the semiconductor device A60 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor
  • the third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B.
  • the semiconductor device A60 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B.
  • the position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B.
  • the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53.
  • the third power terminal 30C protrudes from the second side surface 54.
  • the first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y.
  • the semiconductor device A60 even in the semiconductor device A60, it is possible to reduce the parasitic inductance in the semiconductor device A60 while reducing the size of the semiconductor device A60. Furthermore, the semiconductor device A60 has the same configuration as the semiconductor device A30, and thus has the same effects as the semiconductor device A30.
  • Appendix 2 The first mounting surface is exposed from the bottom surface, The semiconductor device according to supplementary note 1, wherein the first mounting surface extends in the second direction and includes a region protruding from either the first side surface or the second side surface.
  • Appendix 3 The second mounting surface is exposed from the bottom surface, The semiconductor device according to appendix 2, wherein the second mounting surface extends in the second direction and includes a region protruding from either the first side surface or the second side surface.
  • Appendix 4. The semiconductor device according to appendix 2 or 3, wherein the second power terminal is located next to the first power terminal in the third direction. Appendix 5.
  • the second signal terminal protrudes from the first side surface, The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal, The semiconductor device according to appendix 4, wherein the second signal terminal is located next to the second power terminal in the third direction.
  • Appendix 6. The semiconductor device according to appendix 5, wherein a dimension of the second power terminal in the third direction is larger than a dimension of the second signal terminal in the third direction.
  • the first signal terminal protrudes from the first side surface, The direction of the current flowing through the first signal terminal is opposite to the direction of the current flowing through the second power terminal, The semiconductor device according to appendix 2 or 3, wherein the first signal terminal is located next to the second power terminal in the third direction.
  • the semiconductor device wherein a dimension of the second power terminal in the third direction is larger than a dimension of the first signal terminal in the third direction.
  • Appendix 9 The second signal terminal protrudes from the first side surface, The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal, The second signal terminal is located on the opposite side of the first signal terminal with respect to the second power terminal in the third direction, and is located next to the second power terminal in the third direction.
  • the semiconductor device according to appendix 8. Appendix 10.
  • Appendix 14. The semiconductor device according to attachment 13, wherein the first signal terminal and the second signal terminal are joined to the support member.
  • the support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction, the first semiconductor element is conductively bonded to the first conductive layer, 15.
  • Appendix 16. the first power terminal is conductively bonded to the first conductive layer; 16.
  • the semiconductor device according to appendix 15 wherein the third power terminal is conductively bonded to the second conductive layer.
  • Appendix 17. The support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer, 17.
  • the semiconductor device according to appendix 15 or 16 wherein the heat dissipation layer is exposed from the top surface.

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Abstract

A semiconductor device according to the present invention comprises a first semiconductor element, a second semiconductor element, first to third power terminals, first and second signal terminals, and a sealing resin. The first power terminal and the first signal terminal are electrically connected to the first semiconductor element. The second power terminal and the second signal terminal are electrically connected to the second semiconductor element. The third power terminal is electrically connected to the first semiconductor element and the second semiconductor element. The sealing resin has a first lateral surface and a second lateral surface, which face opposite directions in a second direction. The first power terminal and the second power terminal protrude from the first lateral surface. The third power terminal protrudes from the second lateral surface. The first power terminal and the second power terminal are separated from each other in a third direction.

Description

半導体装置semiconductor equipment
 本開示は、半導体装置に関する。 The present disclosure relates to a semiconductor device.
 特許文献1には、2つのパワー半導体素子(たとえばIGBT)が搭載された半導体装置の一例が開示されている。当該半導体装置は、インバータなどの電力変換装置に用いられる。当該半導体装置は、配線基板に表面実装される。 Patent Document 1 discloses an example of a semiconductor device equipped with two power semiconductor elements (for example, IGBT). The semiconductor device is used in a power conversion device such as an inverter. The semiconductor device is surface mounted on a wiring board.
 特許文献1に開示されている半導体装置は、複数の電源端子、および複数の制御端子を備える。複数の電源端子、および複数の制御端子は、2つのパワー半導体素子を覆うハウジングから外部に突出している。これらの端子の各々において、ハウジングから外部に突出した部分は、表面実装が可能となるようにガルウィング状に曲げ加工されている。ここで、当該半導体装置の小型化を図ろうとすると、複数の電源端子の相互間隔がより縮小される。一方、当該半導体装置は、寄生インダクタンスを有する。したがって、複数の電源端子のうち、交流の電流が流れる端子と、その隣に位置する直流の電流が流れる端子との相互誘導により、直流が流れる端子における電力損失がより大きくなることが懸念される。 The semiconductor device disclosed in Patent Document 1 includes a plurality of power supply terminals and a plurality of control terminals. A plurality of power supply terminals and a plurality of control terminals protrude outside from a housing that covers the two power semiconductor elements. In each of these terminals, a portion protruding outward from the housing is bent into a gull wing shape to enable surface mounting. Here, when attempting to miniaturize the semiconductor device, the mutual spacing between the plurality of power supply terminals is further reduced. On the other hand, the semiconductor device has parasitic inductance. Therefore, among multiple power supply terminals, there is a concern that power loss at the terminal where DC current flows will increase due to mutual induction between the terminal where AC current flows and the adjacent terminal where DC current flows. .
特開2012-244176号公報Japanese Patent Application Publication No. 2012-244176
 本開示は、従来よりも改良が施された半導体装置を提供することを一の課題とする。特に本開示は、上記事情に鑑み、装置の小型化を図りつつ、当該装置における寄生インダクタンスの低減を図ることが可能な半導体装置を提供することを一の課題とする。 An object of the present disclosure is to provide a semiconductor device that is improved over conventional ones. In particular, in view of the above circumstances, an object of the present disclosure is to provide a semiconductor device that can reduce parasitic inductance in the device while reducing the size of the device.
 本開示の第1の側面によって提供される半導体装置は、第1半導体素子と、第2半導体素子と、前記第1半導体素子に導通する第1電力端子および第1信号端子と、前記第2半導体素子に導通する第2電力端子および第2信号端子と、前記第1半導体素子および前記第2半導体素子に導通する第3電力端子と、前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備える。前記封止樹脂は、第1方向を向く底面と、前記第1方向に対して直交する第2方向において互いに反対側を向く第1側面および第2側面と、を有する。前記第1電力端子、前記第2電力端子および前記第3電力端子の各々は、前記第1方向において前記底面と同じ側を向く第1実装面を有する。前記第1信号端子および前記第2信号端子の各々は、前記第1方向において前記底面と同じ側を向く第2実装面を有する。前記第1方向における前記第1実装面および前記第2実装面の各々の位置は、前記第1半導体素子および前記第2半導体素子からよりも前記底面からの方が近くである。前記第1電力端子および前記第2電力端子は、前記第1側面から突出している。前記第3電力端子は、前記第2側面から突出している。前記第1信号端子および前記第2信号端子の各々は、前記第1側面および前記第2側面のいずれかから突出している。前記第1電力端子および前記第2電力端子は、前記第1方向および前記第2方向に対して直交する第3方向において互いに離れている。 A semiconductor device provided by a first aspect of the present disclosure includes a first semiconductor element, a second semiconductor element, a first power terminal and a first signal terminal electrically connected to the first semiconductor element, and a first semiconductor element and a first signal terminal that are electrically connected to the first semiconductor element. a second power terminal and a second signal terminal that are electrically connected to the element; a third power terminal that is electrically conductive to the first semiconductor element and the second semiconductor element; and a seal that covers the first semiconductor element and the second semiconductor element. and a resin. The sealing resin has a bottom surface facing in a first direction, and first and second side surfaces facing oppositely to each other in a second direction perpendicular to the first direction. Each of the first power terminal, the second power terminal, and the third power terminal has a first mounting surface facing the same side as the bottom surface in the first direction. Each of the first signal terminal and the second signal terminal has a second mounting surface facing the same side as the bottom surface in the first direction. The positions of the first mounting surface and the second mounting surface in the first direction are closer to the bottom surface than to the first semiconductor element and the second semiconductor element. The first power terminal and the second power terminal protrude from the first side surface. The third power terminal protrudes from the second side surface. Each of the first signal terminal and the second signal terminal protrudes from either the first side surface or the second side surface. The first power terminal and the second power terminal are separated from each other in a third direction orthogonal to the first direction and the second direction.
 上記構成によれば、半導体装置の小型化を図りつつ、当該半導体装置における寄生インダクタンスの低減を図ることが可能となる。 According to the above configuration, it is possible to reduce the parasitic inductance in the semiconductor device while reducing the size of the semiconductor device.
 本開示のその他の特徴および利点は、添付図面に基づき以下に行う詳細な説明によって、より明らかとなろう。 Other features and advantages of the present disclosure will become more apparent from the detailed description given below with reference to the accompanying drawings.
図1は、本開示の第1実施形態にかかる半導体装置の平面図である。FIG. 1 is a plan view of a semiconductor device according to a first embodiment of the present disclosure. 図2は、図1に示す半導体装置の底面図である。FIG. 2 is a bottom view of the semiconductor device shown in FIG. 1. 図3は、図2に対応する底面図であり、封止樹脂を透過している。FIG. 3 is a bottom view corresponding to FIG. 2, through which the sealing resin is seen. 図4は、図1に示す半導体装置の正面図である。FIG. 4 is a front view of the semiconductor device shown in FIG. 1. 図5は、図1に示す半導体装置の背面図である。FIG. 5 is a rear view of the semiconductor device shown in FIG. 1. 図6は、図1に示す半導体装置の右側面図である。FIG. 6 is a right side view of the semiconductor device shown in FIG. 1. 図7は、図2のVII-VII線に沿う断面図である。FIG. 7 is a cross-sectional view taken along line VII-VII in FIG. 図8は、図2のVIII-VIII線に沿う断面図である。FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG. 図9は、図2のIX-IX線に沿う断面図である。FIG. 9 is a cross-sectional view taken along line IX-IX in FIG. 図10は、図7の部分拡大図である。FIG. 10 is a partially enlarged view of FIG. 7. 図11は、本開示の第2実施形態にかかる半導体装置の平面図である。FIG. 11 is a plan view of a semiconductor device according to a second embodiment of the present disclosure. 図12は、図11に示す半導体装置の底面図である。FIG. 12 is a bottom view of the semiconductor device shown in FIG. 11. 図13は、図12に対応する底面図であり、封止樹脂を透過している。FIG. 13 is a bottom view corresponding to FIG. 12, through which the sealing resin is seen. 図14は、図11に示す半導体装置の正面図である。FIG. 14 is a front view of the semiconductor device shown in FIG. 11. 図15は、図11に示す半導体装置の背面図である。FIG. 15 is a rear view of the semiconductor device shown in FIG. 11. 図16は、本開示の第3実施形態にかかる半導体装置の平面図である。FIG. 16 is a plan view of a semiconductor device according to a third embodiment of the present disclosure. 図17は、図16に示す半導体装置の底面図である。FIG. 17 is a bottom view of the semiconductor device shown in FIG. 16. 図18は、図17に対応する底面図であり、封止樹脂を透過している。FIG. 18 is a bottom view corresponding to FIG. 17, in which the sealing resin is seen through. 図19は、図16に示す半導体装置の正面図である。FIG. 19 is a front view of the semiconductor device shown in FIG. 16. 図20は、図16に示す半導体装置の背面図である。FIG. 20 is a rear view of the semiconductor device shown in FIG. 16. 図21は、本開示の第4実施形態にかかる半導体装置の平面図である。FIG. 21 is a plan view of a semiconductor device according to a fourth embodiment of the present disclosure. 図22は、図21に示す半導体装置の底面図である。22 is a bottom view of the semiconductor device shown in FIG. 21. 図23は、図21に示す半導体装置の正面図である。23 is a front view of the semiconductor device shown in FIG. 21. 図24は、図21に示す半導体装置の背面図である。FIG. 24 is a rear view of the semiconductor device shown in FIG. 21. 図25は、図21に示す半導体装置の右側面図である。FIG. 25 is a right side view of the semiconductor device shown in FIG. 21. 図26は、図22のXXVI-XXVI線に沿う断面図である。FIG. 26 is a cross-sectional view taken along line XXVI-XXVI in FIG. 22. 図27は、本開示の第5実施形態にかかる半導体装置の平面図である。FIG. 27 is a plan view of a semiconductor device according to a fifth embodiment of the present disclosure. 図28は、図27に示す半導体装置の底面図である。FIG. 28 is a bottom view of the semiconductor device shown in FIG. 27. 図29は、本開示の第6実施形態にかかる半導体装置の平面図である。FIG. 29 is a plan view of a semiconductor device according to a sixth embodiment of the present disclosure. 図30は、図29に示す半導体装置の底面図である。FIG. 30 is a bottom view of the semiconductor device shown in FIG. 29.
 本開示を実施するための形態について、添付図面に基づいて説明する。 A mode for carrying out the present disclosure will be described based on the accompanying drawings.
 第1実施形態:
 図1~図10に基づき、本開示の第1実施形態にかかる半導体装置A10について説明する。半導体装置A10は、インバータなど電力変換回路を備える電子機器などに使用される。半導体装置A10は、支持部材10、2つの半導体素子20、複数の電力端子30、複数の第1信号端子31、複数の第2信号端子32、2つの導電部材40、2つのゲートワイヤ41、2つの検出ワイヤ42、および封止樹脂50を備える。ここで、図3は、理解の便宜上、封止樹脂50を透過している。図3では、透過した封止樹脂50の外形線を想像線(二点鎖線)で示している。
First embodiment:
A semiconductor device A10 according to a first embodiment of the present disclosure will be described based on FIGS. 1 to 10. The semiconductor device A10 is used in electronic equipment including a power conversion circuit such as an inverter. The semiconductor device A10 includes a support member 10, two semiconductor elements 20, a plurality of power terminals 30, a plurality of first signal terminals 31, a plurality of second signal terminals 32, two conductive members 40, and two gate wires 41, 2. The detection wire 42 and the sealing resin 50 are provided. Here, in FIG. 3, for convenience of understanding, the sealing resin 50 is shown. In FIG. 3, the outline of the transparent sealing resin 50 is shown by an imaginary line (two-dot chain line).
 半導体装置A10の説明においては、便宜上、後述する封止樹脂50の底面52の法線方向を「第1方向z」と呼ぶ。第1方向zに対して直交する1つの方向を「第2方向x」と呼ぶ。第1方向zおよび第2方向xの双方に対して直交する方向を「第3方向y」と呼ぶ。 In the description of the semiconductor device A10, for convenience, the normal direction of the bottom surface 52 of the sealing resin 50, which will be described later, will be referred to as a "first direction z." One direction perpendicular to the first direction z is called a "second direction x." A direction perpendicular to both the first direction z and the second direction x is referred to as a "third direction y."
 半導体装置A10は、複数の電力端子30のうち第1電力端子30Aおよび第2電力端子30B(図1および図2参照)に印加された直流の電源電圧を、2つの半導体素子20により交流電力に変換する。変換された交流電力は、複数の電力端子30のうち第3電力端子30C(図1および図2参照)からモータなどの電力供給対象に入力される。半導体装置A10は、配線基板に表面実装される。 The semiconductor device A10 converts the DC power supply voltage applied to the first power terminal 30A and the second power terminal 30B (see FIGS. 1 and 2) among the plurality of power terminals 30 into AC power using the two semiconductor elements 20. Convert. The converted AC power is input from a third power terminal 30C (see FIGS. 1 and 2) among the plurality of power terminals 30 to a power supply target such as a motor. The semiconductor device A10 is surface mounted on a wiring board.
 封止樹脂50は、図2、図7および図8に示すように、2つの半導体素子20を覆っている。さらに封止樹脂50は、放熱層16を除く支持部材10、2つの導電部材40、2つのゲートワイヤ41、および2つの検出ワイヤ42を覆っている。封止樹脂50は、電気絶縁性を有する。封止樹脂50は、たとえば黒色のエポキシ樹脂を含む材料からなる。図1および図2に示すように、封止樹脂50は、頂面51、底面52、第1側面53、第2側面54、および2つの第3側面55を有する。図1に示す外縁501は、第1方向zに視た封止樹脂50の外形線に相当する。 The sealing resin 50 covers the two semiconductor elements 20, as shown in FIGS. 2, 7, and 8. Furthermore, the sealing resin 50 covers the support member 10 excluding the heat dissipation layer 16, the two conductive members 40, the two gate wires 41, and the two detection wires 42. The sealing resin 50 has electrical insulation properties. The sealing resin 50 is made of a material containing, for example, a black epoxy resin. As shown in FIGS. 1 and 2, the sealing resin 50 has a top surface 51, a bottom surface 52, a first side surface 53, a second side surface 54, and two third side surfaces 55. The outer edge 501 shown in FIG. 1 corresponds to the outline of the sealing resin 50 when viewed in the first direction z.
 図4~図9に示すように、頂面51および底面52は、第1方向zにおいて互いに反対側を向く。 As shown in FIGS. 4 to 9, the top surface 51 and the bottom surface 52 face oppositely to each other in the first direction z.
 図1、図2および図6に示すように、第1側面53および第2側面54は、第2方向xにおいて互いに反対側を向く。第1側面53および第2側面54は、頂面51および底面52につながっている。第1側面53および第2側面54の各々は、底面52につながり、かつ第2方向xを向く領域と、頂面51につながり、かつ頂面51に対して傾斜した領域とを含む。 As shown in FIGS. 1, 2, and 6, the first side surface 53 and the second side surface 54 face opposite to each other in the second direction x. The first side surface 53 and the second side surface 54 are connected to the top surface 51 and the bottom surface 52. Each of the first side surface 53 and the second side surface 54 includes a region connected to the bottom surface 52 and facing in the second direction x, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
 図1、図2、図4および図5に示すように、2つの第3側面55は、第3方向yにおいて互いに反対側を向く。2つの第3側面55は、頂面51および底面52につながっている。2つの第3側面55の各々は、底面52につながり、かつ第3方向yを向く領域と、頂面51につながり、かつ頂面51に対して傾斜した領域とを含む。 As shown in FIGS. 1, 2, 4, and 5, the two third side surfaces 55 face oppositely to each other in the third direction y. The two third side surfaces 55 are connected to the top surface 51 and the bottom surface 52. Each of the two third side surfaces 55 includes a region connected to the bottom surface 52 and facing in the third direction y, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
 支持部材10は、図3および図9に示すように、2つの半導体素子20を搭載している。図1および図3に示すように、支持部材10は、絶縁層11、第1導電層12、第2導電層13、第3導電層14、複数のパッド層15、および放熱層16を有する。 The support member 10 has two semiconductor elements 20 mounted thereon, as shown in FIGS. 3 and 9. As shown in FIGS. 1 and 3, the support member 10 includes an insulating layer 11, a first conductive layer 12, a second conductive layer 13, a third conductive layer 14, a plurality of pad layers 15, and a heat dissipation layer 16.
 図1および図3に示すように、絶縁層11は、第1方向zにおいて第1導電層12および第2導電層13と放熱層16との間に位置する。絶縁層11の材料は、熱伝導率が比較的高いものが好ましい。そこで絶縁層11は、たとえば窒化アルミニウム(AlN)を組成に含む材料からなる。図7~図9に示すように、第1方向zに対して直交する方向における絶縁層11の端部は、第1方向zにおいて封止樹脂50に挟まれている。 As shown in FIGS. 1 and 3, the insulating layer 11 is located between the first conductive layer 12 and the second conductive layer 13 and the heat dissipation layer 16 in the first direction z. The material for the insulating layer 11 is preferably one with relatively high thermal conductivity. Therefore, the insulating layer 11 is made of a material containing aluminum nitride (AlN) in its composition, for example. As shown in FIGS. 7 to 9, the ends of the insulating layer 11 in the direction perpendicular to the first direction z are sandwiched between the sealing resin 50 in the first direction z.
 図1および図3に示すように、第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15は、第1方向zにおいて絶縁層11を基準として放熱層16とは反対側に位置する。第1導電層12および第2導電層13は、第1方向zにおいて2つの半導体素子20と絶縁層11との間に位置する。第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15の各々は、2つの半導体素子20の少なくともいずれかに導通している。第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15の組成は、銅(Cu)を含む。第1導電層12は、第3方向yの一方側に位置する。第2導電層13は、第3方向yにおいて第1導電層12の隣に位置する。第3導電層14は、第3方向yにおいて第1導電層12と第2導電層13との間に挟まれている。複数のパッド層15は、第2方向xにおいて第1導電層12および第2導電層13を基準として第3導電層14とは反対側に位置する。複数のパッド層15は、第3方向yに沿って配列されている。 As shown in FIGS. 1 and 3, the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 are connected to the heat dissipation layer 16 with respect to the insulating layer 11 in the first direction z. located on the opposite side. The first conductive layer 12 and the second conductive layer 13 are located between the two semiconductor elements 20 and the insulating layer 11 in the first direction z. Each of the first conductive layer 12 , the second conductive layer 13 , the third conductive layer 14 , and the plurality of pad layers 15 is electrically connected to at least one of the two semiconductor elements 20 . The compositions of the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 include copper (Cu). The first conductive layer 12 is located on one side in the third direction y. The second conductive layer 13 is located next to the first conductive layer 12 in the third direction y. The third conductive layer 14 is sandwiched between the first conductive layer 12 and the second conductive layer 13 in the third direction y. The plurality of pad layers 15 are located on the opposite side of the third conductive layer 14 with respect to the first conductive layer 12 and the second conductive layer 13 in the second direction x. The plurality of pad layers 15 are arranged along the third direction y.
 図9に示すように、放熱層16は、第1方向zにおいて絶縁層11を基準として第1導電層12および第2導電層13とは反対側に位置する。放熱層16は、封止樹脂50の頂面51から露出している。放熱層16の組成は、銅を含む。図1に示すように、放熱層16は、2つの半導体素子20の各々の全体に重なっている。 As shown in FIG. 9, the heat dissipation layer 16 is located on the opposite side of the first conductive layer 12 and the second conductive layer 13 with respect to the insulating layer 11 in the first direction z. The heat dissipation layer 16 is exposed from the top surface 51 of the sealing resin 50. The composition of the heat dissipation layer 16 includes copper. As shown in FIG. 1, the heat dissipation layer 16 completely overlaps each of the two semiconductor elements 20. As shown in FIG.
 2つの半導体素子20は、図9に示すように、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。図3および図9に示すように、2つの半導体素子20は、支持部材10の第1導電層12および第2導電層13に接合層29を介して個別に導電接合されている。接合層29は、たとえばハンダである。この他、接合層29は、銀(Ag)などを含む焼結金属でもよい。半導体装置A10においては、2つの半導体素子20は、nチャンネル型であり、かつ縦型構造のMOSFET(Metal-Oxide-Semiconductor Field-Effect Transistor)である。2つの半導体素子20は、化合物半導体基板を含む。当該化合物半導体基板の主材料は、炭化ケイ素(SiC)である。この他、当該化合物半導体基板の主材料として、ケイ素(Si)を用いてもよい。この他、2つの半導体素子20は、IGBT(Insulated Gate Bipolar Transistor)などの他のスイッチング素子でもよい。さらに半導体装置A10における半導体素子20の個数は一例であり、その個数は自在に設定できる。 As shown in FIG. 9, the two semiconductor elements 20 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. As shown in FIGS. 3 and 9, the two semiconductor elements 20 are individually conductively bonded to the first conductive layer 12 and the second conductive layer 13 of the support member 10 via a bonding layer 29. Bonding layer 29 is, for example, solder. In addition, the bonding layer 29 may be a sintered metal containing silver (Ag) or the like. In the semiconductor device A10, the two semiconductor elements 20 are n-channel type MOSFETs (Metal-Oxide-Semiconductor Field-Effect Transistors) with a vertical structure. The two semiconductor elements 20 include compound semiconductor substrates. The main material of the compound semiconductor substrate is silicon carbide (SiC). In addition, silicon (Si) may be used as the main material of the compound semiconductor substrate. In addition, the two semiconductor elements 20 may be other switching elements such as IGBTs (Insulated Gate Bipolar Transistors). Furthermore, the number of semiconductor elements 20 in the semiconductor device A10 is just an example, and the number can be set freely.
 図10に示すように、2つの半導体素子20の各々は、第1電極21、第2電極22およびゲート電極23を有する。第1電極21は、支持部材10の第1導電層12および第2導電層13のいずれかに対向して設けられている。第1電極21には、半導体素子20により変換される前の電力に対応する電流が流れる。すなわち、第1電極21は、ドレイン電極に相当する。 As shown in FIG. 10, each of the two semiconductor elements 20 has a first electrode 21, a second electrode 22, and a gate electrode 23. The first electrode 21 is provided facing either the first conductive layer 12 or the second conductive layer 13 of the support member 10 . A current corresponding to the power before being converted by the semiconductor element 20 flows through the first electrode 21 . That is, the first electrode 21 corresponds to a drain electrode.
 図10に示すように、第2電極22は、第1方向zにおいて第1電極21とは反対側に設けられている。第2電極22には、半導体素子20により変換された後の電力に対応する電流が流れる。すなわち、第2電極22は、ソース電極に相当する。 As shown in FIG. 10, the second electrode 22 is provided on the opposite side to the first electrode 21 in the first direction z. A current corresponding to the power converted by the semiconductor element 20 flows through the second electrode 22 . That is, the second electrode 22 corresponds to a source electrode.
 図10に示すように、ゲート電極23は、第1方向zにおいて第1電極21とは反対側に設けられ、かつ第2電極22から離れて位置する。ゲート電極23には、半導体素子20が駆動するためのゲート電圧が印加される。図3に示すように、第1方向zに視て、ゲート電極23の面積は、第2電極22の面積よりも小である。 As shown in FIG. 10, the gate electrode 23 is provided on the opposite side to the first electrode 21 in the first direction z, and is located away from the second electrode 22. A gate voltage for driving the semiconductor element 20 is applied to the gate electrode 23 . As shown in FIG. 3, the area of the gate electrode 23 is smaller than the area of the second electrode 22 when viewed in the first direction z.
 図3および図9に示すように、2つの半導体素子20は、第1半導体素子20Aおよび第2半導体素子20Bを含む。第1半導体素子20Aの第1電極21は、接合層29を介して支持部材10の第1導電層12に導電接合されている。これにより、第1半導体素子20Aは、第1導電層12に導通している。第2半導体素子20Bの第1電極21は、接合層29を介して第2導電層13に導電接合されている。これにより、第2半導体素子20Bは、第2導電層13に導通している。 As shown in FIGS. 3 and 9, the two semiconductor elements 20 include a first semiconductor element 20A and a second semiconductor element 20B. The first electrode 21 of the first semiconductor element 20A is conductively bonded to the first conductive layer 12 of the support member 10 via the bonding layer 29. Thereby, the first semiconductor element 20A is electrically connected to the first conductive layer 12. The first electrode 21 of the second semiconductor element 20B is conductively bonded to the second conductive layer 13 via the bonding layer 29. Thereby, the second semiconductor element 20B is electrically connected to the second conductive layer 13.
 複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、図7および図8に示すように、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。図2に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、底面52から露出している。 As shown in FIGS. 7 and 8, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. located between. As shown in FIG. 2, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the bottom surface 52.
 図1に示すように、第1方向zに視て、複数の電力端子30の各々と、複数の第1信号端子31の各々と、複数の第2信号端子32の各々とが、封止樹脂50の外縁501と交差している。第1方向zに視て、複数の電力端子30の各々と、複数の第1信号端子31の各々と、複数の第2信号端子32の各々とは、支持部材10からはみ出している。複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の組成は、銅を含む。半導体装置A10においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、金属リードである。 As shown in FIG. 1, when viewed in the first direction z, each of the plurality of power terminals 30, each of the plurality of first signal terminals 31, and each of the plurality of second signal terminals 32 are sealed with a sealing resin. It intersects with the outer edge 501 of 50. When viewed in the first direction z, each of the plurality of power terminals 30 , each of the plurality of first signal terminals 31 , and each of the plurality of second signal terminals 32 protrudes from the support member 10 . The compositions of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 include copper. In the semiconductor device A10, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal leads.
 図1~図3に示すように、複数の電力端子30は、第1電力端子30A、第2電力端子30Bおよび第3電力端子30Cを含む。図2、図7および図8に示すように、第1電力端子30Aおよび第2電力端子30Bは、封止樹脂50の第1側面53から突出している。図2に示すように、第3電力端子30Cは、封止樹脂50の第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bと、第3電力端子30Cとは、第2方向xにおいて2つの半導体素子20を基準として互いに反対側に位置する。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。半導体装置A10においては、第2電力端子30Bは、第3方向yにおいて第1電力端子30Aの隣に位置する。 As shown in FIGS. 1 to 3, the plurality of power terminals 30 include a first power terminal 30A, a second power terminal 30B, and a third power terminal 30C. As shown in FIGS. 2, 7, and 8, the first power terminal 30A and the second power terminal 30B protrude from the first side surface 53 of the sealing resin 50. As shown in FIG. 2, the third power terminal 30C protrudes from the second side surface 54 of the sealing resin 50. The first power terminal 30A, the second power terminal 30B, and the third power terminal 30C are located on opposite sides of the two semiconductor elements 20 in the second direction x. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. In the semiconductor device A10, the second power terminal 30B is located next to the first power terminal 30A in the third direction y.
 図3および図7に示すように、第1電力端子30Aは、支持部材10の第1導電層12に導電接合されている。これにより、第1電力端子30Aは、第1半導体素子20Aに導通している。図3および図8に示すように、第2電力端子30Bは、支持部材10の第3導電層14に導電接合されている。図3に示すように、第3電力端子30Cは、支持部材10の第2導電層13に導電接合されている。これにより、第3電力端子30Cは、第2半導体素子20Bに導通している。 As shown in FIGS. 3 and 7, the first power terminal 30A is conductively bonded to the first conductive layer 12 of the support member 10. Thereby, the first power terminal 30A is electrically connected to the first semiconductor element 20A. As shown in FIGS. 3 and 8, the second power terminal 30B is conductively bonded to the third conductive layer 14 of the support member 10. As shown in FIGS. As shown in FIG. 3, the third power terminal 30C is conductively bonded to the second conductive layer 13 of the support member 10. Thereby, the third power terminal 30C is electrically connected to the second semiconductor element 20B.
 図1~図3に示すように、複数の第1信号端子31は、第3方向yにおいて第3電力端子30Cを基準として複数の第2信号端子32とは反対側に位置する。図2および図7に示すように、複数の第1信号端子31は、封止樹脂50の第2側面54から突出している。複数の第1信号端子31は、第1ゲート端子31A、第1検出端子31Bおよび第2検出端子31Cを含む。複数の第1信号端子31の各々は、第1半導体素子20Aに導通している。複数の第1信号端子31のうち第1ゲート端子31Aが、第3電力端子30Cから最も近くに位置する。第1検出端子31Bは、第3方向yにおいて第1ゲート端子31Aと第2検出端子31Cとの間に位置する。 As shown in FIGS. 1 to 3, the plurality of first signal terminals 31 are located on the opposite side from the plurality of second signal terminals 32 with respect to the third power terminal 30C in the third direction y. As shown in FIGS. 2 and 7, the plurality of first signal terminals 31 protrude from the second side surface 54 of the sealing resin 50. The plurality of first signal terminals 31 include a first gate terminal 31A, a first detection terminal 31B, and a second detection terminal 31C. Each of the plurality of first signal terminals 31 is electrically connected to the first semiconductor element 20A. Among the plurality of first signal terminals 31, the first gate terminal 31A is located closest to the third power terminal 30C. The first detection terminal 31B is located between the first gate terminal 31A and the second detection terminal 31C in the third direction y.
 図3に示すように、第1ゲート端子31Aおよび第1検出端子31Bは、支持部材10の複数のパッド層15のいずれか2つのパッド層15に個別に導電接合されている。第2検出端子31Cは、支持部材10の第1導電層12に導電接合されている。第1ゲート端子31Aには、第1半導体素子20Aを駆動するためのゲート電圧が印加される。第1検出端子31Bには、第1半導体素子20Aの第2電極22に印加される電位と等電位の電圧が印加される。第2検出端子31Cには、第1半導体素子20Aの第1電極21に印加される電位と等電位の電圧が印加される。 As shown in FIG. 3, the first gate terminal 31A and the first detection terminal 31B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10. The second detection terminal 31C is conductively bonded to the first conductive layer 12 of the support member 10. A gate voltage for driving the first semiconductor element 20A is applied to the first gate terminal 31A. A voltage equal to the potential applied to the second electrode 22 of the first semiconductor element 20A is applied to the first detection terminal 31B. A voltage equal to the potential applied to the first electrode 21 of the first semiconductor element 20A is applied to the second detection terminal 31C.
 図2および図8に示すように、複数の第2信号端子32は、封止樹脂50の第2側面54から突出している。図1~図3に示すように、複数の第2信号端子32は、第2ゲート端子32A、第3検出端子32Bおよび第4検出端子32Cを含む。複数の第2信号端子32の各々は、第2半導体素子20Bに導通している。複数の第2信号端子32のうち第2ゲート端子32Aが、第3電力端子30Cから最も近くに位置する。第3検出端子32Bは、第3方向yにおいて第2ゲート端子32Aと第4検出端子32Cとの間に位置する。 As shown in FIGS. 2 and 8, the plurality of second signal terminals 32 protrude from the second side surface 54 of the sealing resin 50. As shown in FIGS. 1 to 3, the plurality of second signal terminals 32 include a second gate terminal 32A, a third detection terminal 32B, and a fourth detection terminal 32C. Each of the plurality of second signal terminals 32 is electrically connected to the second semiconductor element 20B. Among the plurality of second signal terminals 32, the second gate terminal 32A is located closest to the third power terminal 30C. The third detection terminal 32B is located between the second gate terminal 32A and the fourth detection terminal 32C in the third direction y.
 図3に示すように、第2ゲート端子32Aおよび第3検出端子32Bは、支持部材10の複数のパッド層15のいずれか2つのパッド層15に個別に導電接合されている。第4検出端子32Cは、支持部材10の第1導電層12に導電接合されている。第2ゲート端子32Aには、第2半導体素子20Bを駆動するためのゲート電圧が印加される。第3検出端子32Bには、第2半導体素子20Bの第2電極22に印加される電位と等電位の電圧が印加される。第4検出端子32Cには、第2半導体素子20Bの第1電極21に印加される電位と等電位の電圧が印加される。 As shown in FIG. 3, the second gate terminal 32A and the third detection terminal 32B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10. The fourth detection terminal 32C is electrically conductively bonded to the first conductive layer 12 of the support member 10. A gate voltage for driving the second semiconductor element 20B is applied to the second gate terminal 32A. A voltage equal to the potential applied to the second electrode 22 of the second semiconductor element 20B is applied to the third detection terminal 32B. A voltage equal to the potential applied to the first electrode 21 of the second semiconductor element 20B is applied to the fourth detection terminal 32C.
 図2、図7および図8に示すように、複数の電力端子30の各々は、第1実装面33を有する。第1方向zにおける第1実装面33の位置は、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1実装面33は、底面52から露出している。第1実装面33は、第2方向xに延びている。第1実装面33は、封止樹脂50の第1側面53および第2側面54のいずれかから突出する領域を含む。 As shown in FIGS. 2, 7, and 8, each of the plurality of power terminals 30 has a first mounting surface 33. The position of the first mounting surface 33 in the first direction z is closer to the bottom surface 52 of the sealing resin 50 than to the first semiconductor element 20A and the second semiconductor element 20B. The first mounting surface 33 is exposed from the bottom surface 52. The first mounting surface 33 extends in the second direction x. The first mounting surface 33 includes a region protruding from either the first side surface 53 or the second side surface 54 of the sealing resin 50.
 図2、図7および図8に示すように、複数の第1信号端子31、および複数の第2信号端子32の各々は、第2実装面34を有する。第1方向zにおける第2実装面34の位置は、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第2実装面34は、底面52から露出している。第2実装面34は、第2方向xに延びている。第2実装面34は、封止樹脂50の第2側面54から突出する領域を含む。 As shown in FIGS. 2, 7, and 8, each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 has a second mounting surface 34. The position of the second mounting surface 34 in the first direction z is closer to the bottom surface 52 of the sealing resin 50 than to the first semiconductor element 20A and the second semiconductor element 20B. The second mounting surface 34 is exposed from the bottom surface 52. The second mounting surface 34 extends in the second direction x. The second mounting surface 34 includes a region protruding from the second side surface 54 of the sealing resin 50.
 図3、図7および図8に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々は、第1実装面33、接合部35、実装部36および中間部37を有する。 As shown in FIG. 3, FIG. 7, and FIG. It has a section 36 and an intermediate section 37.
 図3、図7および図8に示すように、接合部35は、支持部材10の第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15のいずれかに導電接合されている。接合部35は、封止樹脂50と支持部材10とに挟まれている。実装部36は、第1方向zにおいて接合部35から離れている。実装部36は、封止樹脂50の底面52から露出している。中間部37は、接合部35と実装部36とを連結している。 As shown in FIG. 3, FIG. 7, and FIG. Conductively bonded. The joint portion 35 is sandwiched between the sealing resin 50 and the support member 10. The mounting portion 36 is separated from the joining portion 35 in the first direction z. The mounting portion 36 is exposed from the bottom surface 52 of the sealing resin 50. The intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
 図3、図7および図8に示すように、実装部36は、第2方向xにおいて中間部37を基準として接合部35とは反対側に位置する。複数の電力端子30の各々の実装部36は、第1実装面33を含む。複数の第1信号端子31、および複数の第2信号端子32の各々の実装部36は、第2実装面34を含む。中間部37は、第1方向zにおいて実装部36から離れるほど、第2方向xにおいて接合部35に近づく向きとなるように、実装部36に対して傾斜している。 As shown in FIGS. 3, 7, and 8, the mounting portion 36 is located on the opposite side of the joint portion 35 with respect to the intermediate portion 37 in the second direction x. Each mounting portion 36 of the plurality of power terminals 30 includes a first mounting surface 33 . Each mounting portion 36 of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 includes a second mounting surface 34. The intermediate portion 37 is inclined with respect to the mounting portion 36 such that the further away from the mounting portion 36 in the first direction z, the closer to the joint portion 35 in the second direction x.
 2つの導電部材40は、図3に示すように、2つの半導体素子20と、支持部材10の第2導電層13および第3導電層14とに個別に導電接合されている。2つの導電部材40は、第1部材40Aおよび第2部材40Bを含む。第1部材40Aおよび第2部材40Bの各々は、複数のワイヤからなる。当該複数のワイヤの組成は、アルミニウム(Al)を含む。この他、当該複数のワイヤの組成は、銅を含むものでもよい。さらに第1部材40Aおよび第2部材40Bの各々は、複数のワイヤに替えて金属製のクリップでもよい。 As shown in FIG. 3, the two conductive members 40 are individually conductively bonded to the two semiconductor elements 20 and the second conductive layer 13 and the third conductive layer 14 of the support member 10. The two conductive members 40 include a first member 40A and a second member 40B. Each of the first member 40A and the second member 40B consists of a plurality of wires. The composition of the plurality of wires includes aluminum (Al). In addition, the composition of the plurality of wires may include copper. Furthermore, each of the first member 40A and the second member 40B may be a metal clip instead of the plurality of wires.
 図3に示すように、第1部材40Aは、第1半導体素子20Aの第2電極22と、支持部材10の第2導電層13とに導電接合されている。これにより、第1半導体素子20Aは、第2半導体素子20Bと、複数の電力端子30のうち第3電力端子30Cとに導通している。図3に示すように、第2部材40Bは、第2半導体素子20Bの第2電極22と、支持部材10の第3導電層14とに導電接合されている。これにより、複数の電力端子30のうち第2電力端子30Bは、第2半導体素子20Bに導通している。 As shown in FIG. 3, the first member 40A is conductively bonded to the second electrode 22 of the first semiconductor element 20A and the second conductive layer 13 of the support member 10. Thereby, the first semiconductor element 20A is electrically connected to the second semiconductor element 20B and the third power terminal 30C among the plurality of power terminals 30. As shown in FIG. 3, the second member 40B is conductively bonded to the second electrode 22 of the second semiconductor element 20B and the third conductive layer 14 of the support member 10. Thereby, the second power terminal 30B among the plurality of power terminals 30 is electrically connected to the second semiconductor element 20B.
 さらに先述のとおり、複数の電力端子30のうち第1電力端子30Aは、第1半導体素子20Aに導通している。第3電力端子30Cは、第2半導体素子20Bに導通している。したがって、第3電力端子30Cは、第1半導体素子20Aおよび第2半導体素子20Bに導通している。以上より、半導体装置A10においては、2つの半導体素子20と、複数の電力端子30とにより、ハーフブリッジ回路が構成されていることがいえる。この場合において、第1電力端子30Aが正極(P端子)に相当する。したがって、第1電力端子30Aにおいては、外部から第1半導体素子20Aに向けた直流の電流が流れる。さらに、第2電力端子30Bが負極(N端子)に相当する。したがって、第2電力端子30Bにおいては、第2半導体素子20Bから外部に向けた直流の電流が流れる。 Further, as described above, the first power terminal 30A among the plurality of power terminals 30 is electrically connected to the first semiconductor element 20A. The third power terminal 30C is electrically connected to the second semiconductor element 20B. Therefore, the third power terminal 30C is electrically connected to the first semiconductor element 20A and the second semiconductor element 20B. From the above, it can be said that in the semiconductor device A10, the two semiconductor elements 20 and the plurality of power terminals 30 constitute a half-bridge circuit. In this case, the first power terminal 30A corresponds to the positive electrode (P terminal). Therefore, in the first power terminal 30A, a direct current flows from the outside toward the first semiconductor element 20A. Further, the second power terminal 30B corresponds to a negative electrode (N terminal). Therefore, in the second power terminal 30B, a direct current flows outward from the second semiconductor element 20B.
 図3に示すように、2つのゲートワイヤ41のうち一方のゲートワイヤ41は、第1半導体素子20Aのゲート電極23と、支持部材10の複数のパッド層15のうち第1ゲート端子31Aが導電接合されたパッド層15とに導電接合されている。これにより、第1ゲート端子31Aは、第1半導体素子20Aのゲート電極23に導通している。2つのゲートワイヤ41のうち他方のゲートワイヤ41は、第2半導体素子20Bのゲート電極23と、支持部材10の複数のパッド層15のうち第2ゲート端子32Aが導電接合されたパッド層15とに導電接合されている。これにより、第2ゲート端子32Aは、第2半導体素子20Bのゲート電極23に導通している。2つのゲートワイヤ41の組成は、金(Au)を含む。 As shown in FIG. 3, one of the two gate wires 41 has the gate electrode 23 of the first semiconductor element 20A and the first gate terminal 31A of the plurality of pad layers 15 of the support member 10 conductive. It is conductively bonded to the bonded pad layer 15. Thereby, the first gate terminal 31A is electrically connected to the gate electrode 23 of the first semiconductor element 20A. The other gate wire 41 of the two gate wires 41 is connected to the gate electrode 23 of the second semiconductor element 20B and the pad layer 15 to which the second gate terminal 32A among the plurality of pad layers 15 of the support member 10 is conductively bonded. conductively bonded to the Thereby, the second gate terminal 32A is electrically connected to the gate electrode 23 of the second semiconductor element 20B. The composition of the two gate wires 41 includes gold (Au).
 図3に示すように、2つの検出ワイヤ42のうち一方の検出ワイヤ42は、第1半導体素子20Aの第2電極22と、支持部材10の複数のパッド層15のうち第1検出端子31Bが導電接合されたパッド層15とに導電接合されている。これにより、第1検出端子31Bは、第1半導体素子20Aの第2電極22に導通している。2つの検出ワイヤ42のうち他方の検出ワイヤ42は、第2半導体素子20Bの第2電極22と、支持部材10の複数のパッド層15のうち第3検出端子32Bが導電接合されたパッド層15とに導電接合されている。これにより、第3検出端子32Bは、第2半導体素子20Bの第2電極22に導通している。2つの検出ワイヤ42の組成は、アルミニウムを含む。 As shown in FIG. 3, one of the two detection wires 42 is connected to the second electrode 22 of the first semiconductor element 20A and the first detection terminal 31B among the plurality of pad layers 15 of the support member 10. It is conductively bonded to the pad layer 15 which is conductively bonded. Thereby, the first detection terminal 31B is electrically connected to the second electrode 22 of the first semiconductor element 20A. The other detection wire 42 of the two detection wires 42 is a pad layer 15 to which the second electrode 22 of the second semiconductor element 20B and the third detection terminal 32B among the plurality of pad layers 15 of the support member 10 are electrically bonded. and are electrically conductively bonded to each other. Thereby, the third detection terminal 32B is electrically connected to the second electrode 22 of the second semiconductor element 20B. The composition of the two sensing wires 42 includes aluminum.
 次に、半導体装置A10の作用効果について説明する。 Next, the effects of the semiconductor device A10 will be explained.
 半導体装置A10は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A10は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。本構成をとることにより、配線基板に対する半導体装置A10の表面実装が可能となる。 The semiconductor device A10 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A10 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. By adopting this configuration, surface mounting of the semiconductor device A10 on the wiring board becomes possible.
 第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。本構成をとることにより、第3電力端子30Cに流れる交流電流の影響を抑制しつつ、第1電力端子30Aおよび第2電力端子30Bに作用する相互誘導の効果を向上させることができる。したがって、本構成によれば、半導体装置A10において、半導体装置A10の小型化を図りつつ、半導体装置A10における寄生インダクタンスの低減を図ることが可能となる。 The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. By adopting this configuration, it is possible to improve the effect of mutual induction acting on the first power terminal 30A and the second power terminal 30B while suppressing the influence of the alternating current flowing through the third power terminal 30C. Therefore, according to this configuration, it is possible to reduce the parasitic inductance in the semiconductor device A10 while reducing the size of the semiconductor device A10.
 第1電力端子30A、第2電力端子30Bおよび第3電力端子30Cの各々の第1信号端子31は、封止樹脂50の底面52から露出している。第1実装面33は、第2方向xに延びており、かつ封止樹脂50の第1側面53および第2側面54のいずれかから突出する領域を含む。本構成をとることにより、半導体装置A10の小型化を図った場合であっても、半導体装置A10を配線基板に実装する際、ハンダに対する第1実装面33がより拡大する。これにより、配線基板に対する半導体装置A10の接合強度の増加を図ることが可能となる。 The first signal terminal 31 of each of the first power terminal 30A, the second power terminal 30B, and the third power terminal 30C is exposed from the bottom surface 52 of the sealing resin 50. The first mounting surface 33 extends in the second direction x and includes a region protruding from either the first side surface 53 or the second side surface 54 of the sealing resin 50. With this configuration, even if the semiconductor device A10 is made smaller, the first mounting surface 33 for solder can be further enlarged when the semiconductor device A10 is mounted on a wiring board. This makes it possible to increase the bonding strength of the semiconductor device A10 to the wiring board.
 半導体装置A10は、第1半導体素子20Aおよび第2半導体素子20Bを搭載する支持部材10をさらに備える。支持部材10は、封止樹脂50の頂面51から露出している。第1半導体素子20A、第2半導体素子20B、第1電力端子30A、第2電力端子30B、第3電力端子30C、第1信号端子31および第2信号端子32は、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。本構成をとることにより、半導体装置A10においては、第1方向zにおいて半導体装置A10が実装される配線基板が位置する側とは反対側から放熱を図ることが可能となる。 The semiconductor device A10 further includes a support member 10 on which a first semiconductor element 20A and a second semiconductor element 20B are mounted. The support member 10 is exposed from the top surface 51 of the sealing resin 50. The first semiconductor element 20A, the second semiconductor element 20B, the first power terminal 30A, the second power terminal 30B, the third power terminal 30C, the first signal terminal 31, and the second signal terminal 32 are sealed in the first direction z. It is located between the bottom surface 52 of the resin 50 and the support member 10. With this configuration, in the semiconductor device A10, heat can be dissipated from the side opposite to the side where the wiring board on which the semiconductor device A10 is mounted is located in the first direction z.
 上記の場合において、支持部材10は、頂面51から露出する放熱層16を有する。本構成をとることにより、半導体装置A10の放熱効率をさらに向上させることができる。 In the above case, the support member 10 has the heat dissipation layer 16 exposed from the top surface 51. By adopting this configuration, the heat dissipation efficiency of the semiconductor device A10 can be further improved.
 第1電力端子30A、第2電力端子30Bおよび第3電力端子30Cの各々は、接合部35、実装部36および中間部37を有する。接合部35は、支持部材10に接合されている。実装部36は、第1方向zにおいて接合部35から離れており、かつ封止樹脂50の底面52から露出している。中間部37は、接合部35と実装部36とを連結している。接合部35は封止樹脂50と支持部材10とに挟まれている。本構成をとることにより、複数の電力端子30が底面52から脱落することを防止できる。 Each of the first power terminal 30A, the second power terminal 30B, and the third power terminal 30C has a joint portion 35, a mounting portion 36, and an intermediate portion 37. The joint portion 35 is joined to the support member 10. The mounting portion 36 is separated from the joint portion 35 in the first direction z and is exposed from the bottom surface 52 of the sealing resin 50. The intermediate portion 37 connects the joint portion 35 and the mounting portion 36. The joint portion 35 is sandwiched between the sealing resin 50 and the support member 10. By adopting this configuration, it is possible to prevent the plurality of power terminals 30 from falling off the bottom surface 52.
 第2実施形態:
 図11~図15に基づき、本開示の第2実施形態にかかる半導体装置A20について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。ここで、図13は、理解の便宜上、封止樹脂50を透過している。図13では、透過した封止樹脂50の外形線を想像線で示している。
Second embodiment:
A semiconductor device A20 according to a second embodiment of the present disclosure will be described based on FIGS. 11 to 15. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted. Here, in FIG. 13, for convenience of understanding, the sealing resin 50 is shown. In FIG. 13, the outline of the transparent sealing resin 50 is shown with imaginary lines.
 半導体装置A20においては、複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A20, the configuration of the plurality of second signal terminals 32 is different from the configuration of the semiconductor device A10.
 図11~図13に示すように、複数の第2信号端子32のうち第2ゲート端子32Aは、封止樹脂50の第1側面53から突出している。図14に示すように、第2ゲート端子32Aは、第3方向yにおいて複数の電力端子30のうち第2電力端子30Bの隣に位置する。複数の第2信号端子32のうち第3検出端子32Bおよび第4検出端子32Cは、第2方向xにおいて2つの半導体素子20を基準として第2ゲート端子32Aとは反対側に位置する。図15に示すように、第3検出端子32Bおよび第4検出端子32Cのうち第4検出端子32Cが、複数の電力端子30のうち第3電力端子30Cから最も近くに位置する。 As shown in FIGS. 11 to 13, the second gate terminal 32A among the plurality of second signal terminals 32 protrudes from the first side surface 53 of the sealing resin 50. As shown in FIG. 14, the second gate terminal 32A is located next to the second power terminal 30B among the plurality of power terminals 30 in the third direction y. Among the plurality of second signal terminals 32, the third detection terminal 32B and the fourth detection terminal 32C are located on the opposite side of the second gate terminal 32A with respect to the two semiconductor elements 20 in the second direction x. As shown in FIG. 15, of the third detection terminal 32B and the fourth detection terminal 32C, the fourth detection terminal 32C is located closest to the third power terminal 30C among the plurality of power terminals 30.
 先述のとおり、第2ゲート端子32Aには、2つの半導体素子20のうち第2半導体素子20Bを駆動するためのゲート電圧が印加される。このため、第2ゲート端子32Aにおいては、外部から第2半導体素子20Bのゲート電極23に向けた電流が流れる。したがって、第2ゲート端子32Aに流れる電流の向きは、第2電力端子30Bに流れる電流の向きとは逆である。 As described above, the gate voltage for driving the second semiconductor element 20B of the two semiconductor elements 20 is applied to the second gate terminal 32A. Therefore, in the second gate terminal 32A, a current flows from the outside toward the gate electrode 23 of the second semiconductor element 20B. Therefore, the direction of the current flowing through the second gate terminal 32A is opposite to the direction of the current flowing through the second power terminal 30B.
 図11および図14に示すように、第2電力端子30Bの第3方向yにおける寸法は、第2ゲート端子32Aを含む複数の第2信号端子32の各々の第3方向yにおける寸法よりも大きい。 As shown in FIGS. 11 and 14, the dimension in the third direction y of the second power terminal 30B is larger than the dimension in the third direction y of each of the plurality of second signal terminals 32 including the second gate terminal 32A. .
 次に、半導体装置A20の作用効果について説明する。 Next, the effects of the semiconductor device A20 will be explained.
 半導体装置A20は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A20は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。したがって、本構成によれば、半導体装置A20においても、半導体装置A20の小型化を図りつつ、半導体装置A20における寄生インダクタンスの低減を図ることが可能となる。さらに半導体装置A20は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A20 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A20 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. Therefore, according to this configuration, even in the semiconductor device A20, it is possible to reduce the parasitic inductance in the semiconductor device A20 while reducing the size of the semiconductor device A20. Furthermore, the semiconductor device A20 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A20においては、第2信号端子32としての第2ゲート端子32Aは、封止樹脂50の第1側面53から突出している。第2信号端子32に流れる電流は、第2電力端子30Bとは逆である。第2信号端子32は、第3方向yにおいて第2電力端子30Bの隣に位置する。本構成をとることにより、第2信号端子32と第2電力端子30Bとの間には、相互誘導が作用する。したがって、第2信号端子32における寄生インダクタンスを低減することが可能となる。第2信号端子32が第2ゲート端子32Aである場合、第2半導体素子20Bの駆動にかかるスイッチング損失の低減を図ることができる。 In the semiconductor device A20, the second gate terminal 32A as the second signal terminal 32 protrudes from the first side surface 53 of the sealing resin 50. The current flowing through the second signal terminal 32 is opposite to that flowing through the second power terminal 30B. The second signal terminal 32 is located next to the second power terminal 30B in the third direction y. By adopting this configuration, mutual induction acts between the second signal terminal 32 and the second power terminal 30B. Therefore, it is possible to reduce the parasitic inductance at the second signal terminal 32. When the second signal terminal 32 is the second gate terminal 32A, it is possible to reduce switching loss associated with driving the second semiconductor element 20B.
 第3実施形態:
 図16~図20に基づき、本開示の第3実施形態にかかる半導体装置A30について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。ここで、図18は、理解の便宜上、封止樹脂50を透過している。図18では、透過した封止樹脂50の外形線を想像線で示している。
Third embodiment:
A semiconductor device A30 according to a third embodiment of the present disclosure will be described based on FIGS. 16 to 20. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted. Here, in FIG. 18, for convenience of understanding, the sealing resin 50 is shown. In FIG. 18, the outline of the transparent sealing resin 50 is shown with imaginary lines.
 半導体装置A30においては、複数の第1信号端子31の構成が、先述した半導体装置A20の当該構成と異なる。 In the semiconductor device A30, the configuration of the plurality of first signal terminals 31 is different from the configuration of the semiconductor device A20 described above.
 図16~図18に示すように、複数の第1信号端子31のうち第1ゲート端子31Aは、封止樹脂50の第1側面53から突出している。図19に示すように、第1ゲート端子31Aは、第3方向yにおいて複数の電力端子30のうち第2電力端子30Bの隣に位置する。半導体装置A30においては、複数の電力端子30のうち第1電力端子30Aは、第3方向yにおいて第1ゲート端子31Aを基準として第2電力端子30Bとは反対側に位置する。複数の第1信号端子31のうち第1検出端子31Bおよび第2検出端子31Cは、第2方向xにおいて2つの半導体素子20を基準として第1ゲート端子31Aとは反対側に位置する。図20に示すように、第1検出端子31Bおよび第2検出端子31Cのうち第1検出端子31Bが、複数の電力端子30のうち第3電力端子30Cから最も近くに位置する。 As shown in FIGS. 16 to 18, the first gate terminal 31A among the plurality of first signal terminals 31 protrudes from the first side surface 53 of the sealing resin 50. As shown in FIG. 19, the first gate terminal 31A is located next to the second power terminal 30B among the plurality of power terminals 30 in the third direction y. In the semiconductor device A30, the first power terminal 30A among the plurality of power terminals 30 is located on the opposite side of the second power terminal 30B with respect to the first gate terminal 31A in the third direction y. Among the plurality of first signal terminals 31, the first detection terminal 31B and the second detection terminal 31C are located on the opposite side of the first gate terminal 31A with respect to the two semiconductor elements 20 in the second direction x. As shown in FIG. 20, of the first detection terminal 31B and the second detection terminal 31C, the first detection terminal 31B is located closest to the third power terminal 30C among the plurality of power terminals 30.
 先述のとおり、第1ゲート端子31Aには、2つの半導体素子20のうち第1半導体素子20Aを駆動するためのゲート電圧が印加される。このため、第1ゲート端子31Aにおいては、外部から第1半導体素子20Aのゲート電極23に向けた電流が流れる。したがって、第1ゲート端子31Aに流れる電流の向きは、第2電力端子30Bに流れる電流の向きとは逆である。 As described above, the gate voltage for driving the first semiconductor element 20A of the two semiconductor elements 20 is applied to the first gate terminal 31A. Therefore, in the first gate terminal 31A, a current flows from the outside toward the gate electrode 23 of the first semiconductor element 20A. Therefore, the direction of the current flowing through the first gate terminal 31A is opposite to the direction of the current flowing through the second power terminal 30B.
 図16および図19に示すように、第2電力端子30Bの第3方向yにおける寸法は、第1ゲート端子31Aを含む複数の第1信号端子31の各々の第3方向yにおける寸法よりも大きい。 As shown in FIGS. 16 and 19, the dimension in the third direction y of the second power terminal 30B is larger than the dimension in the third direction y of each of the plurality of first signal terminals 31 including the first gate terminal 31A. .
 図19に示すように、複数の第2信号端子32のうち第2ゲート端子32Aは、第3方向yにおいて第2電力端子30Bを基準として第1電力端子30Aとは反対側に位置し、かつ第3方向yにおいて第2電力端子30Bの隣に位置する。 As shown in FIG. 19, the second gate terminal 32A among the plurality of second signal terminals 32 is located on the opposite side of the first power terminal 30A with respect to the second power terminal 30B in the third direction y, and It is located next to the second power terminal 30B in the third direction y.
 次に、半導体装置A30の作用効果について説明する。 Next, the effects of the semiconductor device A30 will be explained.
 半導体装置A30は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A30は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。したがって、本構成によれば、半導体装置A30においても、半導体装置A30の小型化を図りつつ、半導体装置A30における寄生インダクタンスの低減を図ることが可能となる。さらに半導体装置A30は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A30 includes a first power terminal 30A and a first signal terminal 31 that are electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 that are electrically electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A30 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. Therefore, according to this configuration, even in the semiconductor device A30, it is possible to reduce the parasitic inductance in the semiconductor device A30 while reducing the size of the semiconductor device A30. Furthermore, the semiconductor device A30 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A30においては、第1信号端子31としての第1ゲート端子31Aは、封止樹脂50の第1側面53から突出している。第1信号端子31に流れる電流は、第2電力端子30Bとは逆である。第1信号端子31は、第3方向yにおいて第2電力端子30Bの隣に位置する。本構成をとることにより、第1信号端子31と第2電力端子30Bとの間には、相互誘導が作用する。したがって、第1信号端子31における寄生インダクタンスを低減することが可能となる。第1信号端子31が第1ゲート端子31Aである場合、第1半導体素子20Aの駆動にかかるスイッチング損失の低減を図ることができる。 In the semiconductor device A30, the first gate terminal 31A as the first signal terminal 31 protrudes from the first side surface 53 of the sealing resin 50. The current flowing through the first signal terminal 31 is opposite to that flowing through the second power terminal 30B. The first signal terminal 31 is located next to the second power terminal 30B in the third direction y. By adopting this configuration, mutual induction acts between the first signal terminal 31 and the second power terminal 30B. Therefore, it is possible to reduce the parasitic inductance at the first signal terminal 31. When the first signal terminal 31 is the first gate terminal 31A, it is possible to reduce switching loss associated with driving the first semiconductor element 20A.
 さらに半導体装置A30においては、第2信号端子32としての第2ゲート端子32Aは、封止樹脂50の第1側面53から突出している。第2信号端子32に流れる電流は、第2電力端子30Bとは逆である。第2信号端子32は、第3方向yにおいて第2電力端子30Bを基準として第1信号端子31とは反対側に位置し、かつ第3方向yにおいて第2電力端子30Bの隣に位置する。本構成をとることにより、第2信号端子32は、半導体装置A20の場合と同様の作用効果を奏する。 Furthermore, in the semiconductor device A30, the second gate terminal 32A as the second signal terminal 32 protrudes from the first side surface 53 of the sealing resin 50. The current flowing through the second signal terminal 32 is opposite to that flowing through the second power terminal 30B. The second signal terminal 32 is located on the opposite side of the first signal terminal 31 with respect to the second power terminal 30B in the third direction y, and is located next to the second power terminal 30B in the third direction y. With this configuration, the second signal terminal 32 achieves the same effects as in the case of the semiconductor device A20.
 第4実施形態:
 図21~図26に基づき、本開示の第4実施形態にかかる半導体装置A40について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。
Fourth embodiment:
A semiconductor device A40 according to a fourth embodiment of the present disclosure will be described based on FIGS. 21 to 26. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
 半導体装置A40においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A40, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
 図21および図22に示すように、複数の電力端子30の各々は、封止樹脂50の第1側面53、および封止樹脂50の第2側面54のいずれかのみから露出している。図23~図26に示すように、複数の電力端子30の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図22に示すように、第1方向zに視て、複数の電力端子30の各々の第1実装面33は、底面52から外方に離れている。 As shown in FIGS. 21 and 22, each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50. As shown in FIGS. 23 to 26, in each of the plurality of power terminals 30, the portion of the mounting portion 36 exposed from the sealing resin 50 is shaped like a gull wing when viewed from the bottom surface 50 of the sealing resin 50. It is bent towards. As shown in FIG. 22, the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
 図21および図22に示すように、複数の第1信号端子31、および複数の第2信号端子32の各々は、封止樹脂50の第2側面54のみから露出している。図24~図26に示すように、複数の第1信号端子31、および複数の第2信号端子32の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図22に示すように、第1方向zに視て、複数の第1信号端子31、および複数の第2信号端子32の各々の第2実装面34は、底面52から外方に離れている。 As shown in FIGS. 21 and 22, each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is exposed only from the second side surface 54 of the sealing resin 50. As shown in FIGS. 24 to 26, in each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32, the portion of the mounting portion 36 exposed from the sealing resin 50 is visible in the third direction y. It is bent toward the bottom surface 52 of the sealing resin 50 in a gull-wing shape. As shown in FIG. 22, when viewed in the first direction z, the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
 次に、半導体装置A40の作用効果について説明する。 Next, the effects of the semiconductor device A40 will be explained.
 半導体装置A40は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A40は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。したがって、本構成によれば、半導体装置A40においても、半導体装置A40の小型化を図りつつ、半導体装置A40における寄生インダクタンスの低減を図ることが可能となる。さらに半導体装置A40は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A40 includes a first power terminal 30A and a first signal terminal 31 that are electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 that are electrically electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A40 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. Therefore, according to this configuration, even in the semiconductor device A40, it is possible to reduce the parasitic inductance in the semiconductor device A40 while reducing the size of the semiconductor device A40. Furthermore, the semiconductor device A40 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 第5実施形態:
 図27および図28に基づき、本開示の第5実施形態にかかる半導体装置A50について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。
Fifth embodiment:
A semiconductor device A50 according to a fifth embodiment of the present disclosure will be described based on FIGS. 27 and 28. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
 半導体装置A50においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A20の当該構成と異なる。 In the semiconductor device A50, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A20.
 図27および図28に示すように、複数の電力端子30の各々は、封止樹脂50の第1側面53、および封止樹脂50の第2側面54のいずれかのみから露出している。半導体装置A40の場合と同様に、複数の電力端子30の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図28に示すように、第1方向zに視て、複数の電力端子30の各々の第1実装面33は、底面52から外方に離れている。 As shown in FIGS. 27 and 28, each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50. As in the case of the semiconductor device A40, in each of the plurality of power terminals 30, the portion of the mounting portion 36 exposed from the sealing resin 50 is attached to the bottom surface 52 of the sealing resin 50 in a gull wing shape when viewed in the third direction y. It is bent towards. As shown in FIG. 28, the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
 図27および図28に示すように、複数の第1信号端子31、および複数の第2信号端子32の各々は、封止樹脂50の第1側面53、および封止樹脂50の第2側面54のいずれかのみから露出している。半導体装置A40の場合と同様に、複数の第1信号端子31、および複数の第2信号端子32の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図28に示すように、第1方向zに視て、複数の第1信号端子31、および複数の第2信号端子32の各々の第2実装面34は、底面52から外方に離れている。 As shown in FIGS. 27 and 28, each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is connected to a first side surface 53 of the sealing resin 50 and a second side surface 54 of the sealing resin 50. exposed only from either. As in the case of the semiconductor device A40, in each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32, the portion of the mounting portion 36 exposed from the sealing resin 50 is It is bent toward the bottom surface 52 of the sealing resin 50 in a gullwing shape. As shown in FIG. 28, when viewed in the first direction z, the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
 次に、半導体装置A50の作用効果について説明する。 Next, the effects of the semiconductor device A50 will be explained.
 半導体装置A50は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A50は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。したがって、本構成によれば、半導体装置A50においても、半導体装置A50の小型化を図りつつ、半導体装置A50における寄生インダクタンスの低減を図ることが可能となる。さらに半導体装置A50は、半導体装置A20と共通する構成を具備することにより、半導体装置A20と同等の作用効果を奏する。 The semiconductor device A50 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A50 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. Therefore, according to this configuration, even in the semiconductor device A50, it is possible to reduce the parasitic inductance in the semiconductor device A50 while reducing the size of the semiconductor device A50. Furthermore, the semiconductor device A50 has the same configuration as the semiconductor device A20, and thus has the same effects as the semiconductor device A20.
 第6実施形態:
 図29および図30に基づき、本開示の第6実施形態にかかる半導体装置A60について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。
Sixth embodiment:
A semiconductor device A60 according to a sixth embodiment of the present disclosure will be described based on FIGS. 29 and 30. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
 半導体装置A60においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A30の当該構成と異なる。 In the semiconductor device A60, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A30.
 図29および図30に示すように、複数の電力端子30の各々は、封止樹脂50の第1側面53、および封止樹脂50の第2側面54のいずれかのみから露出している。半導体装置A40の場合と同様に、複数の電力端子30の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図30に示すように、第1方向zに視て、複数の電力端子30の各々の第1実装面33は、底面52から外方に離れている。 As shown in FIGS. 29 and 30, each of the plurality of power terminals 30 is exposed only from either the first side surface 53 of the sealing resin 50 or the second side surface 54 of the sealing resin 50. As in the case of the semiconductor device A40, in each of the plurality of power terminals 30, the portion of the mounting portion 36 exposed from the sealing resin 50 is attached to the bottom surface 52 of the sealing resin 50 in a gull wing shape when viewed in the third direction y. It is bent towards. As shown in FIG. 30, the first mounting surface 33 of each of the plurality of power terminals 30 is spaced outward from the bottom surface 52 when viewed in the first direction z.
 図29および図30に示すように、複数の第1信号端子31、および複数の第2信号端子32の各々は、封止樹脂50の第1側面53、および封止樹脂50の第2側面54のいずれかのみから露出している。半導体装置A40の場合と同様に、複数の第1信号端子31、および複数の第2信号端子32の各々において、封止樹脂50から露出する実装部36の部分は、第3方向yに視てガルウィング状に封止樹脂50の底面52に向けて屈曲している。図30に示すように、第1方向zに視て、複数の第1信号端子31、および複数の第2信号端子32の各々の第2実装面34は、底面52から外方に離れている。 As shown in FIGS. 29 and 30, each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is connected to a first side surface 53 of the sealing resin 50 and a second side surface 54 of the sealing resin 50. exposed only from either. As in the case of the semiconductor device A40, in each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32, the portion of the mounting portion 36 exposed from the sealing resin 50 is It is bent toward the bottom surface 52 of the sealing resin 50 in a gullwing shape. As shown in FIG. 30, when viewed in the first direction z, the second mounting surface 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 is spaced outward from the bottom surface 52. .
 次に、半導体装置A60の作用効果について説明する。 Next, the effects of the semiconductor device A60 will be explained.
 半導体装置A60は、第1半導体素子20Aに導通する第1電力端子30Aおよび第1信号端子31と、第2半導体素子20Bに導通する第2電力端子30Bおよび第2信号端子32と、第1半導体素子20Aおよび第2半導体素子20Bに導通する第3電力端子30Cとを備える。さらに半導体装置A60は、第1半導体素子20Aおよび第2半導体素子20Bを覆う封止樹脂50を備える。第1方向zにおける第1電力端子30A、第2電力端子30Bおよび第2電力端子30Bの各々の第1実装面33の位置と、第1方向zにおける第1信号端子31および第2信号端子32の各々の第2実装面34の位置とは、第1半導体素子20Aおよび第2半導体素子20Bからよりも封止樹脂50の底面52からの方が近い。第1電力端子30Aおよび第2電力端子30Bは、第1側面53から突出している。第3電力端子30Cは、第2側面54から突出している。第1電力端子30Aおよび第2電力端子30Bは、第3方向yにおいて互いに離れている。したがって、本構成によれば、半導体装置A60においても、半導体装置A60の小型化を図りつつ、半導体装置A60における寄生インダクタンスの低減を図ることが可能となる。さらに半導体装置A60は、半導体装置A30と共通する構成を具備することにより、半導体装置A30と同等の作用効果を奏する。 The semiconductor device A60 includes a first power terminal 30A and a first signal terminal 31 electrically connected to the first semiconductor element 20A, a second power terminal 30B and a second signal terminal 32 electrically connected to the second semiconductor element 20B, and a first semiconductor The third power terminal 30C is electrically connected to the element 20A and the second semiconductor element 20B. Further, the semiconductor device A60 includes a sealing resin 50 that covers the first semiconductor element 20A and the second semiconductor element 20B. The position of the first mounting surface 33 of each of the first power terminal 30A, the second power terminal 30B, and the second power terminal 30B in the first direction z, and the first signal terminal 31 and the second signal terminal 32 in the first direction z The position of each second mounting surface 34 is closer from the bottom surface 52 of the sealing resin 50 than from the first semiconductor element 20A and the second semiconductor element 20B. The first power terminal 30A and the second power terminal 30B protrude from the first side surface 53. The third power terminal 30C protrudes from the second side surface 54. The first power terminal 30A and the second power terminal 30B are separated from each other in the third direction y. Therefore, according to this configuration, even in the semiconductor device A60, it is possible to reduce the parasitic inductance in the semiconductor device A60 while reducing the size of the semiconductor device A60. Furthermore, the semiconductor device A60 has the same configuration as the semiconductor device A30, and thus has the same effects as the semiconductor device A30.
 本開示は、先述した実施形態に限定されるものではない。本開示の各部の具体的な構成は、種々に設計変更自在である。 The present disclosure is not limited to the embodiments described above. The specific configuration of each part of the present disclosure can be modified in various ways.
 本開示は、以下の付記に記載した実施形態を含む。 The present disclosure includes embodiments described in the appendix below.
 付記1.
 第1半導体素子と、
 第2半導体素子と、
 前記第1半導体素子に導通する第1電力端子および第1信号端子と、
 前記第2半導体素子に導通する第2電力端子および第2信号端子と、
 前記第1半導体素子および前記第2半導体素子に導通する第3電力端子と、
 前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備え、
 前記封止樹脂は、第1方向を向く底面と、前記第1方向に対して直交する第2方向において互いに反対側を向く第1側面および第2側面と、を有し、
 前記第1電力端子、前記第2電力端子および前記第3電力端子の各々は、前記第1方向において前記底面と同じ側を向く第1実装面を有し、
 前記第1信号端子および前記第2信号端子の各々は、前記第1方向において前記底面と同じ側を向く第2実装面を有し、
 前記第1方向における前記第1実装面および前記第2実装面の各々の位置は、前記第1半導体素子および前記第2半導体素子からよりも前記底面からの方が近くであり、
 前記第1電力端子および前記第2電力端子は、前記第1側面から突出しており、
 前記第3電力端子は、前記第2側面から突出しており、
 前記第1信号端子および前記第2信号端子の各々は、前記第1側面および前記第2側面のいずれかから突出しており、
 前記第1電力端子および前記第2電力端子は、前記第1方向および前記第2方向に対して直交する第3方向において互いに離れている、半導体装置。
 付記2.
 前記第1実装面は、前記底面から露出しており、
 前記第1実装面は、前記第2方向に延びており、かつ前記第1側面および前記第2側面のいずれかから突出する領域を含む、付記1に記載の半導体装置。
 付記3.
 前記第2実装面は、前記底面から露出しており、
 前記第2実装面は、前記第2方向に延びており、かつ前記第1側面および前記第2側面のいずれかから突出する領域を含む、付記2に記載の半導体装置。
 付記4.
 前記第2電力端子は、前記第3方向において前記第1電力端子の隣に位置する、付記2または3に記載の半導体装置。
 付記5.
 前記第2信号端子は、前記第1側面から突出しており、
 前記第2信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
 前記第2信号端子は、前記第3方向において前記第2電力端子の隣に位置する、付記4に記載の半導体装置。
 付記6.
 前記第2電力端子の前記第3方向における寸法は、前記第2信号端子の前記第3方向における寸法よりも大きい、付記5に記載の半導体装置。
 付記7.
 前記第1信号端子は、前記第1側面から突出しており、
 前記第1信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
 前記第1信号端子は、前記第3方向において前記第2電力端子の隣に位置する、付記2または3に記載の半導体装置。
 付記8.
 前記第2電力端子の前記第3方向における寸法は、前記第1信号端子の前記第3方向における寸法よりも大きい、付記7に記載の半導体装置。
 付記9.
 前記第2信号端子は、前記第1側面から突出しており、
 前記第2信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
 前記第2信号端子は、前記第3方向において前記第2電力端子を基準として前記第1信号端子とは反対側に位置し、かつ前記第3方向において前記第2電力端子の隣に位置する、付記8に記載の半導体装置。
 付記10.
 前記第1半導体素子および前記第2半導体素子を搭載する支持部材をさらに備え、
 前記第1半導体素子および前記第2半導体素子は、前記第1方向において前記底面と前記支持部材との間に位置する、付記1ないし9のいずれかに記載の半導体装置。
 付記11.
 前記第1電力端子、前記第2電力端子、前記第3電力端子、前記第1信号端子および前記第2信号端子は、前記第1方向において前記底面と前記支持部材との間に位置する、付記10に記載の半導体装置。
 付記12.
 前記封止樹脂は、前記第1方向において前記底面とは反対側を向く頂面を有し、
 前記支持部材は、前記頂面から露出している、付記11に記載の半導体装置。
 付記13.
 前記第1電力端子、前記第2電力端子および前記第3電力端子は、前記支持部材に接合されている、付記12に記載の半導体装置。
 付記14.
 前記第1信号端子および前記第2信号端子は、前記支持部材に接合されている、付記13に記載の半導体装置。
 付記15.
 前記支持部材は、絶縁層と、前記第1方向において前記第1半導体素子および前記第2半導体素子と前記絶縁層との間に位置する第1導電層および第2導電層と、を有し、
 前記第1半導体素子は、前記第1導電層に導電接合されており、
 前記第2半導体素子は、前記第2導電層に導電接合されている、付記13または14に記載の半導体装置。
 付記16.
 前記第1電力端子は、前記第1導電層に導電接合されており、
 前記第3電力端子は、前記第2導電層に導電接合されている、付記15に記載の半導体装置。
 付記17.
 前記支持部材は、前記絶縁層を基準として前記第1導電層および前記第2導電層とは反対側に位置する放熱層を有し、
 前記放熱層は、前記頂面から露出している、付記15または16に記載の半導体装置。
Additional note 1.
a first semiconductor element;
a second semiconductor element;
a first power terminal and a first signal terminal electrically connected to the first semiconductor element;
a second power terminal and a second signal terminal electrically connected to the second semiconductor element;
a third power terminal electrically connected to the first semiconductor element and the second semiconductor element;
a sealing resin that covers the first semiconductor element and the second semiconductor element,
The sealing resin has a bottom surface facing in a first direction, and a first side surface and a second side surface facing oppositely to each other in a second direction perpendicular to the first direction,
Each of the first power terminal, the second power terminal, and the third power terminal has a first mounting surface facing the same side as the bottom surface in the first direction,
Each of the first signal terminal and the second signal terminal has a second mounting surface facing the same side as the bottom surface in the first direction,
The positions of each of the first mounting surface and the second mounting surface in the first direction are closer from the bottom surface than from the first semiconductor element and the second semiconductor element,
The first power terminal and the second power terminal protrude from the first side surface,
The third power terminal protrudes from the second side surface,
Each of the first signal terminal and the second signal terminal protrudes from either the first side surface or the second side surface,
The semiconductor device, wherein the first power terminal and the second power terminal are separated from each other in a third direction orthogonal to the first direction and the second direction.
Appendix 2.
The first mounting surface is exposed from the bottom surface,
The semiconductor device according to supplementary note 1, wherein the first mounting surface extends in the second direction and includes a region protruding from either the first side surface or the second side surface.
Appendix 3.
The second mounting surface is exposed from the bottom surface,
The semiconductor device according to appendix 2, wherein the second mounting surface extends in the second direction and includes a region protruding from either the first side surface or the second side surface.
Appendix 4.
The semiconductor device according to appendix 2 or 3, wherein the second power terminal is located next to the first power terminal in the third direction.
Appendix 5.
The second signal terminal protrudes from the first side surface,
The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal,
The semiconductor device according to appendix 4, wherein the second signal terminal is located next to the second power terminal in the third direction.
Appendix 6.
The semiconductor device according to appendix 5, wherein a dimension of the second power terminal in the third direction is larger than a dimension of the second signal terminal in the third direction.
Appendix 7.
The first signal terminal protrudes from the first side surface,
The direction of the current flowing through the first signal terminal is opposite to the direction of the current flowing through the second power terminal,
The semiconductor device according to appendix 2 or 3, wherein the first signal terminal is located next to the second power terminal in the third direction.
Appendix 8.
The semiconductor device according to appendix 7, wherein a dimension of the second power terminal in the third direction is larger than a dimension of the first signal terminal in the third direction.
Appendix 9.
The second signal terminal protrudes from the first side surface,
The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal,
The second signal terminal is located on the opposite side of the first signal terminal with respect to the second power terminal in the third direction, and is located next to the second power terminal in the third direction. The semiconductor device according to appendix 8.
Appendix 10.
further comprising a support member on which the first semiconductor element and the second semiconductor element are mounted,
The semiconductor device according to any one of appendices 1 to 9, wherein the first semiconductor element and the second semiconductor element are located between the bottom surface and the support member in the first direction.
Appendix 11.
The first power terminal, the second power terminal, the third power terminal, the first signal terminal, and the second signal terminal are located between the bottom surface and the support member in the first direction, 11. The semiconductor device according to 10.
Appendix 12.
The sealing resin has a top surface facing opposite to the bottom surface in the first direction,
The semiconductor device according to appendix 11, wherein the support member is exposed from the top surface.
Appendix 13.
The semiconductor device according to appendix 12, wherein the first power terminal, the second power terminal, and the third power terminal are joined to the support member.
Appendix 14.
The semiconductor device according to attachment 13, wherein the first signal terminal and the second signal terminal are joined to the support member.
Appendix 15.
The support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction,
the first semiconductor element is conductively bonded to the first conductive layer,
15. The semiconductor device according to appendix 13 or 14, wherein the second semiconductor element is conductively bonded to the second conductive layer.
Appendix 16.
the first power terminal is conductively bonded to the first conductive layer;
16. The semiconductor device according to appendix 15, wherein the third power terminal is conductively bonded to the second conductive layer.
Appendix 17.
The support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer,
17. The semiconductor device according to appendix 15 or 16, wherein the heat dissipation layer is exposed from the top surface.
A10,A20,A30,A40,A50,A60:半導体装置
10:支持部材    11:絶縁層
12:第1導電層    13:第2導電層
14:第3導電層    15:パッド層
16:放熱層    20:半導体素子
20A:第1半導体素子    20B:第2半導体素子
21:第1電極    22:第2電極
23:ゲート電極    29:接合層
30:電力端子    30A:第1電力端子
30B:第2電力端子    30C:第3電力端子
31:第1信号端子    31A:第1ゲート端子
31B:第1検出端子    31C:第2検出端子
32:第2信号端子    32A:第2ゲート端子
32B:第3検出端子    32C:第4検出端子
33:第1実装面    34:第2実装面
35:接合部    36:実装部
37:中間部    40:導電部材
40A:第1部材    40B:第2部材
41:ゲートワイヤ    42:検出ワイヤ
50:封止樹脂    501:外縁
51:頂面    511:周縁
52:底面    53:第1側面
54:第2側面    55:第3側面
z:第1方向    x:第2方向
y:第3方向
A10, A20, A30, A40, A50, A60: Semiconductor device 10: Support member 11: Insulating layer 12: First conductive layer 13: Second conductive layer 14: Third conductive layer 15: Pad layer 16: Heat dissipation layer 20: Semiconductor element 20A: First semiconductor element 20B: Second semiconductor element 21: First electrode 22: Second electrode 23: Gate electrode 29: Bonding layer 30: Power terminal 30A: First power terminal 30B: Second power terminal 30C: Third power terminal 31: First signal terminal 31A: First gate terminal 31B: First detection terminal 31C: Second detection terminal 32: Second signal terminal 32A: Second gate terminal 32B: Third detection terminal 32C: Fourth Detection terminal 33: First mounting surface 34: Second mounting surface 35: Joint portion 36: Mounting portion 37: Intermediate portion 40: Conductive member 40A: First member 40B: Second member 41: Gate wire 42: Detection wire 50: Sealing resin 501: Outer edge 51: Top surface 511: Peripheral edge 52: Bottom surface 53: First side surface 54: Second side surface 55: Third side surface z: First direction x: Second direction y: Third direction

Claims (17)

  1.  第1半導体素子と、
     第2半導体素子と、
     前記第1半導体素子に導通する第1電力端子および第1信号端子と、
     前記第2半導体素子に導通する第2電力端子および第2信号端子と、
     前記第1半導体素子および前記第2半導体素子に導通する第3電力端子と、
     前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備え、
     前記封止樹脂は、第1方向を向く底面と、前記第1方向に対して直交する第2方向において互いに反対側を向く第1側面および第2側面と、を有し、
     前記第1電力端子、前記第2電力端子および前記第3電力端子の各々は、前記第1方向において前記底面と同じ側を向く第1実装面を有し、
     前記第1信号端子および前記第2信号端子の各々は、前記第1方向において前記底面と同じ側を向く第2実装面を有し、
     前記第1方向における前記第1実装面および前記第2実装面の各々の位置は、前記第1半導体素子および前記第2半導体素子からよりも前記底面からの方が近くであり、
     前記第1電力端子および前記第2電力端子は、前記第1側面から突出しており、
     前記第3電力端子は、前記第2側面から突出しており、
     前記第1信号端子および前記第2信号端子の各々は、前記第1側面および前記第2側面のいずれかから突出しており、
     前記第1電力端子および前記第2電力端子は、前記第1方向および前記第2方向に対して直交する第3方向において互いに離れている、半導体装置。
    a first semiconductor element;
    a second semiconductor element;
    a first power terminal and a first signal terminal electrically connected to the first semiconductor element;
    a second power terminal and a second signal terminal electrically connected to the second semiconductor element;
    a third power terminal electrically connected to the first semiconductor element and the second semiconductor element;
    a sealing resin that covers the first semiconductor element and the second semiconductor element,
    The sealing resin has a bottom surface facing in a first direction, and a first side surface and a second side surface facing oppositely to each other in a second direction perpendicular to the first direction,
    Each of the first power terminal, the second power terminal, and the third power terminal has a first mounting surface facing the same side as the bottom surface in the first direction,
    Each of the first signal terminal and the second signal terminal has a second mounting surface facing the same side as the bottom surface in the first direction,
    The positions of each of the first mounting surface and the second mounting surface in the first direction are closer from the bottom surface than from the first semiconductor element and the second semiconductor element,
    The first power terminal and the second power terminal protrude from the first side surface,
    The third power terminal protrudes from the second side surface,
    Each of the first signal terminal and the second signal terminal protrudes from either the first side surface or the second side surface,
    The semiconductor device, wherein the first power terminal and the second power terminal are separated from each other in a third direction orthogonal to the first direction and the second direction.
  2.  前記第1実装面は、前記底面から露出しており、
     前記第1実装面は、前記第2方向に延びており、かつ前記第1側面および前記第2側面のいずれかから突出する領域を含む、請求項1に記載の半導体装置。
    The first mounting surface is exposed from the bottom surface,
    2. The semiconductor device according to claim 1, wherein the first mounting surface includes a region extending in the second direction and protruding from either the first side surface or the second side surface.
  3.  前記第2実装面は、前記底面から露出しており、
     前記第2実装面は、前記第2方向に延びており、かつ前記第1側面および前記第2側面のいずれかから突出する領域を含む、請求項2に記載の半導体装置。
    The second mounting surface is exposed from the bottom surface,
    3. The semiconductor device according to claim 2, wherein the second mounting surface includes a region extending in the second direction and protruding from either the first side surface or the second side surface.
  4.  前記第2電力端子は、前記第3方向において前記第1電力端子の隣に位置する、請求項2または3に記載の半導体装置。 4. The semiconductor device according to claim 2, wherein the second power terminal is located next to the first power terminal in the third direction.
  5.  前記第2信号端子は、前記第1側面から突出しており、
     前記第2信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
     前記第2信号端子は、前記第3方向において前記第2電力端子の隣に位置する、請求項4に記載の半導体装置。
    The second signal terminal protrudes from the first side surface,
    The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal,
    5. The semiconductor device according to claim 4, wherein the second signal terminal is located next to the second power terminal in the third direction.
  6.  前記第2電力端子の前記第3方向における寸法は、前記第2信号端子の前記第3方向における寸法よりも大きい、請求項5に記載の半導体装置。 The semiconductor device according to claim 5, wherein a dimension of the second power terminal in the third direction is larger than a dimension of the second signal terminal in the third direction.
  7.  前記第1信号端子は、前記第1側面から突出しており、
     前記第1信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
     前記第1信号端子は、前記第3方向において前記第2電力端子の隣に位置する、請求項2または3に記載の半導体装置。
    The first signal terminal protrudes from the first side surface,
    The direction of the current flowing through the first signal terminal is opposite to the direction of the current flowing through the second power terminal,
    4. The semiconductor device according to claim 2, wherein the first signal terminal is located next to the second power terminal in the third direction.
  8.  前記第2電力端子の前記第3方向における寸法は、前記第1信号端子の前記第3方向における寸法よりも大きい、請求項7に記載の半導体装置。 The semiconductor device according to claim 7, wherein a dimension of the second power terminal in the third direction is larger than a dimension of the first signal terminal in the third direction.
  9.  前記第2信号端子は、前記第1側面から突出しており、
     前記第2信号端子に流れる電流の向きは、前記第2電力端子に流れる電流の向きとは逆であり、
     前記第2信号端子は、前記第3方向において前記第2電力端子を基準として前記第1信号端子とは反対側に位置し、かつ前記第3方向において前記第2電力端子の隣に位置する、請求項8に記載の半導体装置。
    The second signal terminal protrudes from the first side surface,
    The direction of the current flowing through the second signal terminal is opposite to the direction of the current flowing through the second power terminal,
    The second signal terminal is located on the opposite side of the first signal terminal with respect to the second power terminal in the third direction, and is located next to the second power terminal in the third direction. The semiconductor device according to claim 8.
  10.  前記第1半導体素子および前記第2半導体素子を搭載する支持部材をさらに備え、
     前記第1半導体素子および前記第2半導体素子は、前記第1方向において前記底面と前記支持部材との間に位置する、請求項1ないし9のいずれかに記載の半導体装置。
    further comprising a support member on which the first semiconductor element and the second semiconductor element are mounted,
    10. The semiconductor device according to claim 1, wherein the first semiconductor element and the second semiconductor element are located between the bottom surface and the support member in the first direction.
  11.  前記第1電力端子、前記第2電力端子、前記第3電力端子、前記第1信号端子および前記第2信号端子は、前記第1方向において前記底面と前記支持部材との間に位置する、請求項10に記載の半導体装置。 The first power terminal, the second power terminal, the third power terminal, the first signal terminal, and the second signal terminal are located between the bottom surface and the support member in the first direction. The semiconductor device according to item 10.
  12.  前記封止樹脂は、前記第1方向において前記底面とは反対側を向く頂面を有し、
     前記支持部材は、前記頂面から露出している、請求項11に記載の半導体装置。
    The sealing resin has a top surface facing opposite to the bottom surface in the first direction,
    The semiconductor device according to claim 11, wherein the support member is exposed from the top surface.
  13.  前記第1電力端子、前記第2電力端子および前記第3電力端子は、前記支持部材に接合されている、請求項12に記載の半導体装置。 The semiconductor device according to claim 12, wherein the first power terminal, the second power terminal, and the third power terminal are joined to the support member.
  14.  前記第1信号端子および前記第2信号端子は、前記支持部材に接合されている、請求項13に記載の半導体装置。 The semiconductor device according to claim 13, wherein the first signal terminal and the second signal terminal are joined to the support member.
  15.  前記支持部材は、絶縁層と、前記第1方向において前記第1半導体素子および前記第2半導体素子と前記絶縁層との間に位置する第1導電層および第2導電層と、を有し、
     前記第1半導体素子は、前記第1導電層に導電接合されており、
     前記第2半導体素子は、前記第2導電層に導電接合されている、請求項13または14に記載の半導体装置。
    The support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction,
    the first semiconductor element is conductively bonded to the first conductive layer,
    15. The semiconductor device according to claim 13, wherein the second semiconductor element is conductively bonded to the second conductive layer.
  16.  前記第1電力端子は、前記第1導電層に導電接合されており、
     前記第3電力端子は、前記第2導電層に導電接合されている、請求項15に記載の半導体装置。
    the first power terminal is conductively bonded to the first conductive layer;
    16. The semiconductor device according to claim 15, wherein the third power terminal is conductively bonded to the second conductive layer.
  17.  前記支持部材は、前記絶縁層を基準として前記第1導電層および前記第2導電層とは反対側に位置する放熱層を有し、
     前記放熱層は、前記頂面から露出している、請求項15または16に記載の半導体装置。
    The support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer,
    17. The semiconductor device according to claim 15, wherein the heat dissipation layer is exposed from the top surface.
PCT/JP2023/016282 2022-05-09 2023-04-25 Semiconductor device WO2023218943A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000091493A (en) * 1998-09-16 2000-03-31 Mitsui High Tec Inc Surface-mounted semiconductor device
JP2013106503A (en) * 2011-11-17 2013-05-30 Mitsubishi Electric Corp Power conversion apparatus
JP2014033060A (en) * 2012-08-03 2014-02-20 Mitsubishi Electric Corp Power semiconductor device module
WO2018043535A1 (en) * 2016-09-02 2018-03-08 ローム株式会社 Power module, power module with drive circuit, industrial equipment, electric automobile and hybrid car

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000091493A (en) * 1998-09-16 2000-03-31 Mitsui High Tec Inc Surface-mounted semiconductor device
JP2013106503A (en) * 2011-11-17 2013-05-30 Mitsubishi Electric Corp Power conversion apparatus
JP2014033060A (en) * 2012-08-03 2014-02-20 Mitsubishi Electric Corp Power semiconductor device module
WO2018043535A1 (en) * 2016-09-02 2018-03-08 ローム株式会社 Power module, power module with drive circuit, industrial equipment, electric automobile and hybrid car

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