WO2023214470A1 - Coated portion peripheral edge processing device - Google Patents

Coated portion peripheral edge processing device Download PDF

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Publication number
WO2023214470A1
WO2023214470A1 PCT/JP2022/028318 JP2022028318W WO2023214470A1 WO 2023214470 A1 WO2023214470 A1 WO 2023214470A1 JP 2022028318 W JP2022028318 W JP 2022028318W WO 2023214470 A1 WO2023214470 A1 WO 2023214470A1
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WIPO (PCT)
Prior art keywords
substrate
peripheral edge
coated
rotary table
coating
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PCT/JP2022/028318
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French (fr)
Japanese (ja)
Inventor
慎也 福井
貞雄 夏
一史 三浦
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中外炉工業株式会社
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Publication of WO2023214470A1 publication Critical patent/WO2023214470A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling

Definitions

  • the present invention relates to a coating area peripheral edge processing device that dries the peripheral edge area of a coating area on the surface of a substrate coated with a coating liquid.
  • a coating area peripheral edge processing device that dries the peripheral edge area of a coating area on the surface of a substrate coated with a coating liquid.
  • the peripheral edge of the coating portion on the surface of the substrate can be easily dried, and the coating on the surface of the substrate can be easily dried.
  • the feature is that even if the shape of the part is different and the position of the periphery of the coated part changes, the periphery of the coated part on the surface of the substrate can be easily dried by heating. be.
  • Patent Document 1 a heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, and this heating contact member is brought into contact with the lower surface of the substrate. It has been proposed that this heating contact member heats and dries the entire periphery of the coated portion on the surface of the substrate, thereby suppressing the widening of the periphery where the film thickness has increased. There is.
  • the heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, and this heating contact member is brought into contact with the lower surface of the substrate to perform heating. Because the contact member heats and dries the entire circumference of the coated area on the surface of the substrate, if the size or shape of the coated area on the surface of the substrate differs, the coated area may be It is necessary to prepare heating contact members of different sizes and shapes, and the cost of preparing a large number of heating contact members becomes extremely high. The operation of setting it in contact with the bottom surface of the substrate was also very troublesome and time consuming.
  • a heating contact member shaped along the peripheral edge of the coating portion on the surface of the substrate is provided on the surface of the holding portion that holds the substrate coated with the coating liquid, and the heating contact member is provided on the surface of the holding portion that holds the substrate coated with the coating liquid.
  • the heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, as in the above-mentioned Patent Documents 1 and 2.
  • the contact member In order to provide the contact member on the surface of the holder that holds the substrate coated with the coating liquid, there are many holders equipped with heating contact members that correspond to the size and shape of the coating part applied to the surface of the substrate.
  • the cost of preparing such a holding part is very high, and the peripheral edge of the coated part of the substrate is placed on top of such a holding part due to heating contact on the surface of the holding part.
  • An object of the present invention is to solve the above-mentioned problems when drying the peripheral edge of a coated portion on the surface of a substrate coated with a coating liquid.
  • the substrate coated with the coating liquid when drying the peripheral edge of the coated portion on the surface of the substrate coated with the coating liquid, in particular, the substrate coated with the coating liquid is placed on a rotary table and rotated. This makes it possible to easily dry the peripheral edge of the coated area on the surface of the substrate coated with the coating liquid, and also because the shape of the coated area on the surface of the substrate is different.
  • An object of the present invention is to heat the peripheral edge of the coated portion on the surface of the substrate so that it can be easily dried even when the position changes.
  • the coating area peripheral edge processing apparatus dries the peripheral edge of the coating area on the surface of the substrate coated with the coating liquid.
  • the substrate is placed on the rotary table such that the peripheral edge of the coated part of the substrate is located on the outer circumferential side of the rotary table, and the substrate located on the outer circumferential side of the rotary table is A heating element that heats the peripheral edge of the coating section is placed at least under the substrate so as not to contact the substrate, and while the substrate is rotated by the rotary table, the heating element is positioned on the outer peripheral side of the rotary table. The peripheral edge of the coated portion of the substrate was heated and dried by the heating element.
  • the substrate coated with the coating liquid is rotated by a rotary table, and the peripheral edge of the coated part of the substrate located on the outer peripheral side of the rotary table is heated.
  • a heating contact member is prepared that contacts the entire periphery of the coated part coated on the surface of the substrate and has a size that matches the size of the coated part.
  • the substrate is rotated so as to correspond to the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table.
  • a moving device is provided for moving the heating body in a direction toward and away from the center of the rotary table.
  • the entire periphery of the coated area can be heated and dried simply by moving the heating body in the direction toward and away from the center of the rotary table.
  • the coated part coated on the surface of the board There is no need to prepare a number of heating contact members that match the size and shape of the peripheral edge and bring them into contact with the bottom surface of the substrate, and the substrate coated with the coating liquid can be heated by the above-mentioned moving device while being rotated by the rotary table.
  • the body can be moved according to the size and shape of the periphery of the coated part coated on the surface of the substrate, making it possible to easily adjust the periphery of coated parts of various sizes and shapes at low cost. It will be possible to dry it.
  • a position detection means for detecting the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table is provided, and the position detection means detects the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table. It is preferable that the heating body is moved by the moving device based on the position of the peripheral edge of the coated part. In this way, even if the peripheral edge of the coated part coated on the surface of the substrate differs not only in size but also in shape, the position detection means can detect the peripheral edge of the coated part on the surface of the substrate.
  • the heating element By accurately detecting the position, the heating element can be moved accurately according to the size and shape of the periphery of the coating part coated on the surface of the substrate using the above-mentioned moving device. This makes it possible to accurately dry the periphery of the coated area.
  • the second heating body that heats the peripheral edge of the coating section located on the outer peripheral side of the rotary table is placed above the substrate so that it does not come into contact with the substrate. It can also be arranged as follows. In this way, the peripheral edge of the coated portion of the substrate located on the outer peripheral side of the rotary table is heated by the second heating element in addition to the heating element described above, and can be dried more quickly.
  • this second heating body can be moved in the same manner as the heating body described above in accordance with the size and shape of the peripheral edge of the coating portion coated on the surface of the substrate, and furthermore, this second heating body can be moved It is also possible to move the body to a position slightly shifted from the heating body to efficiently heat and dry an appropriate position on the periphery of the coated area.
  • the substrate is rotated by the rotary table, and the peripheral edge of the coating part located on the outer peripheral side of the rotary table is heated by the heating body.
  • the operation of drying the peripheral portion of the coated portion of the substrate is performed in a reduced pressure chamber.
  • a plate-shaped heater may be provided at the upper or lower side of the vacuum chamber.
  • the substrate is placed on the rotary table so that the peripheral edge of the coated part of the substrate is located on the outer peripheral side of the rotary table, and the substrate is placed on the rotary table.
  • the substrate is rotated by a rotary table, and the peripheral edge of the coated part of the substrate located on the outer peripheral side of the rotary table is heated and dried by a heating element placed below the substrate so as not to come into contact with the substrate. Therefore, as in the past, a large number of heating contact members that match the size of the peripheral edge of the coated area coated on the surface of the substrate are prepared, and a number of heating contact members that match the size of the peripheral edge of the coated area are prepared.
  • FIG. 1 is a schematic cross-sectional explanatory diagram showing a state in which a coating section peripheral edge treatment device according to an embodiment of the present invention is used.
  • a coating section peripheral edge treatment device according to an embodiment of the present invention is used.
  • a rectangular substrate whose surface is coated with a coating liquid in a circular shape is arranged such that the peripheral edge of the coating part is located on the outer peripheral side of the rotary table.
  • FIG. 2 is a schematic plan explanatory view showing a state in which the substrate is placed on a rotary table and rotated, and the peripheral edge of the coated portion is heated and dried by a heating element provided under the substrate; .
  • FIG. 3 is a schematic plan view showing a state in which the substrate is moved in a direction of separation and the peripheral edge of the coated portion, which has become irregular on the surface of the substrate, is heated and dried by the heating element.
  • FIG. 1 It is a schematic cross-sectional explanatory view which showed the example of a change of the coating part peripheral edge processing device based on the said embodiment.
  • a circular substrate whose surface is coated with a coating liquid in a circular shape is arranged such that the peripheral edge of the coating part is located on the outer peripheral side of the rotary table.
  • a schematic diagram showing an example in which the substrate is placed on a rotary table and rotated, and the peripheral edge of the circular coated area is heated and dried by a heating element provided under the substrate.
  • coated part peripheral edge processing device according to an embodiment of the present invention will be specifically described based on the accompanying drawings. It should be noted that the coated part peripheral edge processing device according to the present invention is not limited to that shown in the embodiments below, and can be implemented with appropriate modifications within the scope of the gist of the invention.
  • the substrate 10 in drying the peripheral part 11a of the coating part 11 on the surface of the substrate 10 coated with the coating liquid, as shown in FIG. 20, the substrate 10 is placed on a rotary table 32 having an outer diameter smaller than the outer diameter of the coating section 11, which is provided at the tip of a rotating shaft 31 rotated by a rotating device 30.
  • the coating portion 11 is placed such that the peripheral edge portion 11a of the coating portion 11 on the surface of the rotary table 32 protrudes from the outer circumferential side of the rotary table 32.
  • the peripheral edge of the coating part 11 located on the outer peripheral side of the rotary table 32 is located on the lower side of the substrate 10 located on the outer peripheral side of the rotary table 32.
  • a rod-shaped heating body H for heating the rotary table 11a is arranged so as not to contact the substrate 10, and the heating body H is moved by a moving device 40 in a direction toward or away from the center 32 of the rotary table. ing.
  • the figure shows a rod-shaped heating element H, it may be of any shape as long as it can be heated at its tip.
  • a lower heater 21 is provided at the lower part of the reduced pressure chamber 20, and an upper heater 22 is provided at the upper part of the reduced pressure chamber 20, so that the inside of the reduced pressure chamber 20 is heated.
  • the pressure is reduced by a pressure reducing means (not shown), and the interior of the reduced pressure chamber 20 is heated by the lower heater 21 and the upper heater 22 to dry the coated portion 11 on the surface of the substrate 10 coated with the coating liquid. That's what I do.
  • a detection camera 41 is installed in the decompression chamber 20 as a position detection means 41 for detecting the position of the peripheral edge part 11a of the coating part 11 coated on the substrate 10.
  • the detection camera 41 detects the position of the peripheral edge part 11a of the coated part 11 coated on the substrate 10 through the cylindrical monitoring window 23a provided on the ceiling part 23. I have to.
  • a cutout 44 is provided in the upper heater 22 at a position where the upper heater 22 overlaps the monitoring window 23a.
  • the position of the peripheral edge part 11a of the coating part 11 detected by this detection camera 41 is output to the control device 42, and the control device 42
  • the moving device 40 is controlled to move the heating body H in a direction approaching or away from the center 32 of the rotary table, so that the heating body H corresponds to the peripheral edge 11a of the coating section 11. It is controlled so that it is located under the substrate 10.
  • a substrate 10 in which a coating liquid is circularly applied to the surface of a square substrate 10 to form a circular coating portion 11 on the surface is used.
  • the substrate 10 is placed on the rotary table 32 so that the entire peripheral edge 11a of the coating section 11 protrudes to the outer circumferential side of the rotary table 32, and the detection camera 41 detects the substrate 10.
  • the position of the peripheral edge 11a of the coating section 11 is detected, and based on the detection result, the control device 42 controls the moving device 40 to move the heating body H relative to the center 32 of the rotary table.
  • the heater H is moved toward and away from the substrate 10 so as to be positioned under the substrate 10 corresponding to the peripheral edge 11a of the circularly coated portion 11.
  • the rotating table 32 is rotated by the rotating device 30, and the peripheral edge 11a of the coating portion 11 on the substrate 10 is heated and dried from the lower side of the substrate 10 by the heating body H. Do it like this.
  • the peripheral edge 11a of the coating section 11 on the substrate 10 can be efficiently heated and dried by one rod-shaped heating element H, and the coating can be applied to the surface of the substrate as in the conventional method.
  • a heating contact member that matches the size of the periphery of the coated part is brought into contact with the bottom surface of the substrate to heat and dry the entire periphery of the coated part on the surface of the substrate, Less equipment is needed to heat and dry the entire circumference of the peripheral edge 11a of the coating section 11, and costs are also reduced.
  • the control device 42 controls the moving device 40 to move the heating body H toward and away from the center 32 of the rotary table.
  • the shape of the coating portion 11 to be coated on the surface of the substrate 10 is a shape other than a circle, for example, as shown in FIGS. 3(A) and 3(B), a square-shaped substrate In the substrate 10 in which a substantially rectangular coated portion 11 is formed on the surface of the substrate 10, in heating and drying the peripheral portion 11a of the substantially rectangular coated portion 11, the surface of the substrate 10 is heated and dried.
  • the substrate 10 is placed on the rotary table 32 so that the entire peripheral edge 11a of the approximately rectangular coating portion 11 protrudes to the outer circumferential side of the rotary table 32.
  • the detection camera 41 detects the position of the peripheral edge 11a of the approximately rectangular coating portion 11 on the surface of the substrate 10, and based on the detection result, the control device 42 controls the moving device 40.
  • the heating body H is controlled to move toward and away from the center 32 of the rotary table.
  • the moving device 40 is controlled by the control device 42 as described above, and the direction in which the heating body H approaches or moves away from the center 32 of the rotating table is controlled.
  • the heating body H is always guided to a position corresponding to the peripheral edge 11a of the approximately rectangular coating portion 11, and the heating body The peripheral edge portion 11a of the coated portion 11, which has a substantially rectangular shape, is heated and dried by H.
  • the detection camera 41 is used, but instead of using the detection camera 41, the shape of the peripheral edge 11a of the coating section 11 is programmed in the control device 42 in advance, Accordingly, the moving device 40 may be controlled by the control device 42.
  • the shape of the coating portion 11 to be coated on the surface of the substrate 10 may be a circular shape as shown in FIG. 2 or a substantially square shape as shown in FIGS. 3(A) and (B).
  • the present invention is not limited to this, and the coated portion 11 may be coated in various shapes.
  • the coating liquid is supplied from a coating nozzle to which the coating liquid is supplied.
  • a cylindrical coating liquid supply body having coating liquid storage recesses formed in a predetermined pattern on its outer circumferential surface is provided so as to be positioned above the slit-shaped discharge port, and this coating liquid supply body is rotated.
  • a coating device may be used in which the coating liquid is supplied from the coating liquid storage recess through the slit-shaped discharge port onto the surface of the object to be coated.
  • the outer circumferential side of the rotary table 32 when heating and drying the peripheral edge part 11a of the coated part 11 coated on the surface of the substrate 10, the outer circumferential side of the rotary table 32 is heated and dried.
  • the rod-shaped heating element H which heats the peripheral edge 11a of the coating section 11 located on the outer circumferential side of the rotary table 32, is placed on the lower side of the substrate 10 located at the bottom of the substrate 10 so as not to come into contact with the substrate 10.
  • the second heating element H2 that heats the peripheral edge 11a of the coating section 11 on the substrate 10 located on the outer peripheral side of the rotary table 32 is arranged so as not to come into contact with the substrate 10.
  • the peripheral edge 11a of the coating section 11 of the substrate 10 located on the outer circumferential side of the rotary table 32 is heated by this second heating element H2 in addition to the heating element H described above. It is possible to heat and dry from both sides.
  • the second heating body H2 is moved by the moving device 43 in the direction of approaching and away from the center 32 of the rotary table, and as in the case of the heating body H, the second heating body H2 is used for the detection.
  • the position of the peripheral edge 11a of the coating section 11 detected by the camera 41 is output to the control device 42, and the control device 42 controls the moving device 43, and the moving device 43 controls the second heating body H2.
  • the second heating element H2 may be moved to a position slightly shifted from the heating element H to efficiently heat the appropriate position of the peripheral edge 11a of the coating section 11. It is also possible to let it dry.
  • the coating liquid was applied to the surface of the rectangular substrate 10, but the shape of the substrate 10 is not particularly limited.
  • a circular substrate 10 is used in which a coating liquid is applied in a circular manner to the surface of the circular substrate 10 to form a circular coated portion 11 on the surface.
  • the substrate 10 is placed on the rotary table 32 such that the entire peripheral edge 11a of the circular coating portion 11 on the surface of the substrate 10 protrudes to the outer circumferential side of the rotary table 32.
  • the heating element H is placed under the substrate 10 corresponding to the peripheral edge 11a of the coated portion 11 coated in a circular shape, and in this state, the rotary table 32 is rotated by the rotating device 30.
  • the peripheral edge portion 11a of the coating portion 11 on the substrate 10 may be heated from below the substrate 10 by the heating body H to dry it.
  • the peripheral edge 11a of the circular coated portion 11 is heated by the heating element H to form the substrate 10.
  • the heating body H can be provided at a fixed position without being moved, so the moving device 40 as described above, the detection camera 41, There is no need to provide the control device 42.
  • Substrate 11 Coating section 11a: Peripheral section 20: Decompression chamber 21: Lower heater 22: Upper heater 23: Ceiling section 23a: Monitoring window 30: Rotating device 31: Rotating shaft 32: Rotating table 40: Moving device 41: Detection camera (position detection means) 42: Control device 43: Moving device 44: Notch H: Heating body H2: Second heating body

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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

In drying a peripheral edge portion 11a of a coated portion 11 on the surface of a substrate 10 to which a coating liquid is applied, the substrate is mounted on a rotating table such that the peripheral edge portion of the coated portion of the substrate is positioned at the outer peripheral side of a rotating table 32, and a heating element H which heats the peripheral edge portion of the coated portion of the substrate that is positioned at the outer peripheral side of the rotating table is disposed below the substrate so as not to contact the substrate. The substrate is rotated by the rotating table, and the outer peripheral edge portion of the coated portion of the substrate that is positioned at the outer peripheral side of the rotating table is dried by heating with the heating element.

Description

塗工部周縁処理装置Coating section peripheral treatment device
　本発明は、塗液が塗工された基板の表面における塗工部の周縁部を乾燥させる塗工部周縁処理装置に関するものである。特に、塗液が塗工された基板を回転テーブルの上に載置させて回転させながら、基板の表面における塗工部の周縁部を簡単に乾燥できるようにすると共に、基板の表面における塗工部の形状が異なって、塗工部の周縁部の位置が変化する場合においても、基板の表面における塗工部の周縁部を加熱させて簡単に乾燥できるようにした点に特徴を有するものである。 The present invention relates to a coating area peripheral edge processing device that dries the peripheral edge area of a coating area on the surface of a substrate coated with a coating liquid. In particular, while the substrate coated with the coating liquid is placed on a rotary table and rotated, the peripheral edge of the coating portion on the surface of the substrate can be easily dried, and the coating on the surface of the substrate can be easily dried. The feature is that even if the shape of the part is different and the position of the periphery of the coated part changes, the periphery of the coated part on the surface of the substrate can be easily dried by heating. be.
　従来から、塗液が塗工された基板の表面における塗工部を乾燥させるようにした場合、塗工部の周縁部の膜厚が中央部の膜厚より大きくになることが知られている。 It has long been known that when the coated area on the surface of a substrate coated with a coating liquid is dried, the film thickness at the periphery of the coated area becomes larger than at the center. .
　そして、このように塗工部の周縁部の膜厚が中央部の膜厚より大きくなると、周縁部と中央部とにおける基板の特性が異なり、膜厚が大きくなった周縁部の幅が広くなると、塗液が塗工された基板の有効利用面積が縮小して、歩留まりが悪くなる等の問題があった。 When the film thickness at the periphery of the coated area becomes larger than that at the center, the characteristics of the substrate differ between the periphery and the center, and the width of the periphery where the film is thick becomes wider. However, there have been problems in that the effective usable area of the substrate coated with the coating liquid is reduced, resulting in poor yield.
　このため、従来においては、特許文献１に示されるように、加熱接触部材を基板の表面における塗工部の周縁部に沿った形状に調整し、この加熱接触部材を基板の下面に接触させて、この加熱接触部材により基板の表面における塗工部の周縁部の全周を加熱させて乾燥させ、膜厚が大きくなった周縁部の幅が広がるのを抑制するようにしたものが提案されている。 For this reason, conventionally, as shown in Patent Document 1, a heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, and this heating contact member is brought into contact with the lower surface of the substrate. It has been proposed that this heating contact member heats and dries the entire periphery of the coated portion on the surface of the substrate, thereby suppressing the widening of the periphery where the film thickness has increased. There is.
　また、特許文献２においては、前記のように加熱接触部材により基板の表面における塗工部の周縁部の全周を加熱させて乾燥させるにあたり、塗工部の周縁部における盛り上がりを測定する盛り上がり測定センサーを設け、この盛り上がり測定センサーによって塗工部の周縁部における盛り上がりを測定しながら、前記の加熱接触部材による塗工部の周縁部の全周にわたる加熱を制御して、塗工部の周縁部における盛り上がりを抑制するようにしたものが提案されている。 Furthermore, in Patent Document 2, when the entire circumference of the peripheral edge of the coated area on the surface of the substrate is heated and dried by the heating contact member as described above, bulge measurement is performed to measure the bulge at the periphery of the coated area. A sensor is provided, and while measuring the bulge at the peripheral edge of the coated area using the bulge measurement sensor, the heating of the entire periphery of the coated area by the heating contact member is controlled to measure the bulge at the periphery of the coated area. A method has been proposed that suppresses the rise in the temperature.
　しかし、特許文献１、２に示されるものは、加熱接触部材を基板の表面における塗工部の周縁部に沿った形状に調整し、この加熱接触部材を基板の下面に接触させて、この加熱接触部材により基板の表面における塗工部の周縁部の全周を加熱させて乾燥させるため、基板の表面に塗工された塗工部の大きさや形状が異なる場合、このように塗工部の大きさや形状が異なった加熱接触部材を準備することが必要になり、多数の加熱接触部材を準備するコストが非常に高くつくと共に、加熱接触部材を、塗工部の周縁部に沿うようにして基板の下面に接触させるようにセットする操作も非常に面倒で、時間を要するという問題があった。 However, in the methods shown in Patent Documents 1 and 2, the heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, and this heating contact member is brought into contact with the lower surface of the substrate to perform heating. Because the contact member heats and dries the entire circumference of the coated area on the surface of the substrate, if the size or shape of the coated area on the surface of the substrate differs, the coated area may be It is necessary to prepare heating contact members of different sizes and shapes, and the cost of preparing a large number of heating contact members becomes extremely high. The operation of setting it in contact with the bottom surface of the substrate was also very troublesome and time consuming.
　また、特許文献３においては、基板の表面における塗工部の周縁部に沿った形状になった加熱接触部材を、塗液が塗工された基板を保持する保持部の表面に設け、この加熱接触部材によって保持部に保持された基板の表面における塗工部の周縁部の全周を加熱させた後、前記の保持部を支持する回転軸により前記の基板を回転させて、塗工部の周縁部における塗液を、さらに塗工部の周縁側に流動させて、膜厚が大きくなった周縁部の幅を狭くするようにしたものが提案されている。 Furthermore, in Patent Document 3, a heating contact member shaped along the peripheral edge of the coating portion on the surface of the substrate is provided on the surface of the holding portion that holds the substrate coated with the coating liquid, and the heating contact member is provided on the surface of the holding portion that holds the substrate coated with the coating liquid. After heating the entire periphery of the coated part on the surface of the substrate held by the holding part by the contact member, the substrate is rotated by a rotating shaft that supports the holding part, and the coated part is heated. A method has been proposed in which the coating liquid at the peripheral edge further flows toward the peripheral edge of the coated area to narrow the width of the peripheral edge where the film thickness is increased.
　しかし、この特許文献３に示されるものも、前記の特許文献１、２のものと同様に、加熱接触部材を基板の表面における塗工部の周縁部に沿った形状に調整して、この加熱接触部材を塗液が塗工された基板を保持する保持部の表面に設けるため、基板の表面に塗工された塗工部の大きさや形状に対応した加熱接触部材を設けた数多くの保持部を準備することが必要になり、このような保持部を準備するコストが非常に高くつくと共に、このような保持部の上に、基板を塗工部の周縁部が保持部の表面における加熱接触部材に合致するようにしてセットする操作も非常に面倒で、時間を要するという問題があった。 However, in the device shown in Patent Document 3, the heating contact member is adjusted to a shape along the peripheral edge of the coated portion on the surface of the substrate, as in the above-mentioned Patent Documents 1 and 2. In order to provide the contact member on the surface of the holder that holds the substrate coated with the coating liquid, there are many holders equipped with heating contact members that correspond to the size and shape of the coating part applied to the surface of the substrate. The cost of preparing such a holding part is very high, and the peripheral edge of the coated part of the substrate is placed on top of such a holding part due to heating contact on the surface of the holding part. There was also a problem in that the operation of setting the parts so as to match them was very troublesome and time consuming.
特開２０１９－１１４３７８号公報JP 2019-114378 Publication 特許第６９６７６３７号公報Patent No. 6967637 特開２０２１－８４０６４号公報JP 2021-84064 Publication
　本発明は、塗液が塗工された基板の表面における塗工部の周縁部を乾燥させる場合における前記のような問題を解決することを課題とするものである。 An object of the present invention is to solve the above-mentioned problems when drying the peripheral edge of a coated portion on the surface of a substrate coated with a coating liquid.
　すなわち、本発明においては、塗液が塗工された基板の表面における塗工部の周縁部を乾燥させるにあたり、特に、塗液が塗工された基板を回転テーブルの上に載置させて回転させながら、塗液が塗工された基板の表面における塗工部の周縁部を簡単に乾燥できるようにすると共に、基板の表面における塗工部の形状が異なって、塗工部の周縁部の位置が変化する場合においても、基板の表面における塗工部の周縁部を加熱させて簡単に乾燥できるようにすることを課題とするものである。 That is, in the present invention, when drying the peripheral edge of the coated portion on the surface of the substrate coated with the coating liquid, in particular, the substrate coated with the coating liquid is placed on a rotary table and rotated. This makes it possible to easily dry the peripheral edge of the coated area on the surface of the substrate coated with the coating liquid, and also because the shape of the coated area on the surface of the substrate is different. An object of the present invention is to heat the peripheral edge of the coated portion on the surface of the substrate so that it can be easily dried even when the position changes.
　本発明に係る塗工部周縁処理装置においては、前記のような課題を解決するため、塗液が塗工された基板の表面における塗工部の周縁部を乾燥させる塗工部周縁処理装置において、前記の基板における塗工部の周縁部が回転テーブルの外周側に位置するようにして、前記の基板を回転テーブルの上に載置させると共に、前記の回転テーブルの外周側に位置する基板における塗工部の周縁部を加熱させる加熱体を、少なくとも前記の基板の下側に基板と接触しないように配置させ、前記の回転テーブルにより前記の基板を回転させると共に、回転テーブルの外周側に位置する基板における塗工部の周縁部を、前記の加熱体により加熱させて乾燥させるようにした。 In order to solve the above-mentioned problems, the coating area peripheral edge processing apparatus according to the present invention dries the peripheral edge of the coating area on the surface of the substrate coated with the coating liquid. , the substrate is placed on the rotary table such that the peripheral edge of the coated part of the substrate is located on the outer circumferential side of the rotary table, and the substrate located on the outer circumferential side of the rotary table is A heating element that heats the peripheral edge of the coating section is placed at least under the substrate so as not to contact the substrate, and while the substrate is rotated by the rotary table, the heating element is positioned on the outer peripheral side of the rotary table. The peripheral edge of the coated portion of the substrate was heated and dried by the heating element.
　そして、本発明に係る塗工部周縁処理装置のように、塗液が塗工された基板を回転テーブルにより回転させると共に、回転テーブルの外周側に位置する基板における塗工部の周縁部を加熱体により加熱させて乾燥させるようにすると、従来のように、基板の表面に塗工された塗工部の周縁部の全周に接触し、その大きさに合った加熱接触部材を準備し、塗工部の周縁部に合った加熱接触部材を基板の下面に接触させて、基板の表面における塗工部の周縁部の全周を加熱させて乾燥させるというような大がかりな部品を必要とせず、簡単な構造にできて、製作にかかるコストが軽減される。 Then, as in the coated part peripheral edge treatment device according to the present invention, the substrate coated with the coating liquid is rotated by a rotary table, and the peripheral edge of the coated part of the substrate located on the outer peripheral side of the rotary table is heated. When drying is performed by heating with a body, as in the past, a heating contact member is prepared that contacts the entire periphery of the coated part coated on the surface of the substrate and has a size that matches the size of the coated part. There is no need for large-scale parts such as bringing a heating contact member that fits the periphery of the coated part into contact with the bottom surface of the substrate to heat and dry the entire periphery of the coated part on the surface of the board. , it has a simple structure and the manufacturing cost is reduced.
　また、本発明に係る塗工部周縁処理装置においては、前記の回転テーブルにより基板を回転させながら、前記の回転テーブルの外周側に位置する塗工部の周縁部の位置に対応するようにして、前記の加熱体を回転テーブルの中心に対して近接・離間する方向に移動させる移動装置を設けることが好ましい。このようにすると、基板の表面における円形状に塗工された塗工部の外径が異なる場合、従来は、大きさの異なる加熱接触部材を数多く準備して、交換する手間が必要であったが、このようにすると、加熱体を回転テーブルの中心に対して近接・離間する方向に移動させるだけで、塗工部の周縁部の全周を加熱させて乾燥させることができるようになる。また、基板の表面に塗工された塗工部の周縁部の外径だけではなく、その大きさや形状が異なる場合においても、従来のように、基板の表面に塗工された塗工部の周縁部の大きさや形状に合った加熱接触部材を数多く準備して、基板の下面に接触させる必要がなく、塗液が塗工された基板を回転テーブルにより回転させながら、前記の移動装置によって加熱体を基板の表面に塗工された塗工部の周縁部の大きさや形状に合わせて移動させることができ、様々な大きさや形状になった塗工部の周縁部を、低コストで簡単に乾燥させることができるようになる。 Further, in the coating part peripheral edge processing apparatus according to the present invention, while the substrate is rotated by the rotary table, the substrate is rotated so as to correspond to the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table. Preferably, a moving device is provided for moving the heating body in a direction toward and away from the center of the rotary table. In this way, if the outer diameters of the circularly coated parts on the surface of the substrate differ, it was conventionally necessary to prepare and replace many heating contact members of different sizes. However, in this case, the entire periphery of the coated area can be heated and dried simply by moving the heating body in the direction toward and away from the center of the rotary table. In addition, even when the outer diameter of the peripheral edge of the coated part coated on the surface of the substrate differs, as well as the size and shape, the coated part coated on the surface of the board There is no need to prepare a number of heating contact members that match the size and shape of the peripheral edge and bring them into contact with the bottom surface of the substrate, and the substrate coated with the coating liquid can be heated by the above-mentioned moving device while being rotated by the rotary table. The body can be moved according to the size and shape of the periphery of the coated part coated on the surface of the substrate, making it possible to easily adjust the periphery of coated parts of various sizes and shapes at low cost. It will be possible to dry it.
　また、本発明に係る塗工部周縁処理装置においては、前記の回転テーブルの外周側に位置する塗工部の周縁部の位置を検知する位置検知手段を設け、前記の位置検知手段によって検知された塗工部の周縁部の位置に基づいて、前記の移動装置によって前記の加熱体を移動させることが好ましい。このようにすると、前記のように基板の表面に塗工された塗工部の周縁部の大きさだけではなく、その形状が異なる場合においても、この位置検知手段によって塗工部の周縁部の位置を正確に検知して、加熱体を前記の移動装置により基板の表面に塗工された塗工部の周縁部の大きさや形状に合わせて正確に移動させることができ、様々な大きさや形状になった塗工部の周縁部を正確に乾燥させることができるようになる。 Further, in the coating part peripheral edge processing apparatus according to the present invention, a position detection means for detecting the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table is provided, and the position detection means detects the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table. It is preferable that the heating body is moved by the moving device based on the position of the peripheral edge of the coated part. In this way, even if the peripheral edge of the coated part coated on the surface of the substrate differs not only in size but also in shape, the position detection means can detect the peripheral edge of the coated part on the surface of the substrate. By accurately detecting the position, the heating element can be moved accurately according to the size and shape of the periphery of the coating part coated on the surface of the substrate using the above-mentioned moving device. This makes it possible to accurately dry the periphery of the coated area.
　また、本発明に係る塗工部周縁処理装置においては、前記の回転テーブルの外周側に位置する塗工部の周縁部を加熱させる第２加熱体を、前記の基板の上側に基板と接触しないように配置させることもできる。このようにすると、回転テーブルの外周側に位置する基板における塗工部の周縁部を、前記の加熱体に加えてこの第２加熱体により加熱させ、より速やかに乾燥できるようになる。また、この第２加熱体を、前記の加熱体と同様にして、基板の表面に塗工された塗工部の周縁部の大きさや形状に合わせて移動させることもでき、さらにこの第２加熱体を、前記の加熱体と少しずれた位置に移動させて、塗工部の周縁部の適切な位置を効率よく加熱させて乾燥させるようにすることもできる。 Further, in the coating section peripheral edge treatment device according to the present invention, the second heating body that heats the peripheral edge of the coating section located on the outer peripheral side of the rotary table is placed above the substrate so that it does not come into contact with the substrate. It can also be arranged as follows. In this way, the peripheral edge of the coated portion of the substrate located on the outer peripheral side of the rotary table is heated by the second heating element in addition to the heating element described above, and can be dried more quickly. In addition, this second heating body can be moved in the same manner as the heating body described above in accordance with the size and shape of the peripheral edge of the coating portion coated on the surface of the substrate, and furthermore, this second heating body can be moved It is also possible to move the body to a position slightly shifted from the heating body to efficiently heat and dry an appropriate position on the periphery of the coated area.
　また、本発明に係る塗工部周縁処理装置においては、前記の回転テーブルにより前記の基板を回転させると共に、回転テーブルの外周側に位置する塗工部の周縁部を前記の加熱体により加熱させて、前記の基板における塗工部の周縁部を乾燥させる操作を減圧室内で行うことが好ましい。このように、減圧室内で前記の操作を行うようにすると、基板における塗工部が減圧下で速やかに乾燥できるようになる。また、基板における塗工部を速やかに乾燥させるため、この減圧室内の上部側や下部側に板状のヒーターを設けることもできる。 Further, in the coating part peripheral edge treatment device according to the present invention, the substrate is rotated by the rotary table, and the peripheral edge of the coating part located on the outer peripheral side of the rotary table is heated by the heating body. Preferably, the operation of drying the peripheral portion of the coated portion of the substrate is performed in a reduced pressure chamber. By performing the above-described operation in a reduced pressure chamber in this manner, the coated portion of the substrate can be quickly dried under reduced pressure. Further, in order to quickly dry the coated portion of the substrate, a plate-shaped heater may be provided at the upper or lower side of the vacuum chamber.
　本発明における塗工部周縁処理装置においては、前記のように基板における塗工部の周縁部が回転テーブルの外周側に位置するようにして、基板を回転テーブルの上に載置させて、前記の基板を回転テーブルにより回転させると共に、回転テーブルの外周側に位置する基板における塗工部の周縁部を、基板の下側に基板と接触しないように配置させた加熱体により加熱させて乾燥させるようにしたため、従来のように、基板の表面に塗工された塗工部の周縁部の大きさに合った加熱接触部材を多数準備し、塗工部の周縁部に合った加熱接触部材をそれぞれ基板の下面に接触させて、基板の表面における塗工部の周縁部の全周を加熱させて乾燥させる必要がなくなり、基板の表面における塗工部の周縁部の大きさ（外径）や形状が異なる場合においても、塗工部の周縁部の全周を簡単に乾燥させることができるようになる。 In the coated part peripheral edge processing apparatus of the present invention, as described above, the substrate is placed on the rotary table so that the peripheral edge of the coated part of the substrate is located on the outer peripheral side of the rotary table, and the substrate is placed on the rotary table. The substrate is rotated by a rotary table, and the peripheral edge of the coated part of the substrate located on the outer peripheral side of the rotary table is heated and dried by a heating element placed below the substrate so as not to come into contact with the substrate. Therefore, as in the past, a large number of heating contact members that match the size of the peripheral edge of the coated area coated on the surface of the substrate are prepared, and a number of heating contact members that match the size of the peripheral edge of the coated area are prepared. It is no longer necessary to contact the bottom surface of the substrate and heat and dry the entire circumference of the coated portion on the surface of the substrate, and the size (outer diameter) of the circumference of the coated portion on the surface of the substrate Even when the shapes are different, it becomes possible to easily dry the entire periphery of the coated part.
本発明の一実施形態に係る塗工部周縁処理装置を使用する状態を示した概略断面説明図である。FIG. 1 is a schematic cross-sectional explanatory diagram showing a state in which a coating section peripheral edge treatment device according to an embodiment of the present invention is used. 前記の実施形態に係る塗工部周縁処理装置において、表面に塗液が円形状に塗工された四角形状の基板を、塗工部の周縁部が回転テーブルの外周側に位置するようにして回転テーブルの上に載置させて回転させ、塗工部の周縁部を基板の下に設けた加熱体により塗工部の周縁部を加熱させて乾燥させる状態を示した概略平面説明図である。In the coating part peripheral edge treatment device according to the above embodiment, a rectangular substrate whose surface is coated with a coating liquid in a circular shape is arranged such that the peripheral edge of the coating part is located on the outer peripheral side of the rotary table. FIG. 2 is a schematic plan explanatory view showing a state in which the substrate is placed on a rotary table and rotated, and the peripheral edge of the coated portion is heated and dried by a heating element provided under the substrate; . 前記の実施形態に係る塗工部周縁処理装置において、（Ａ），（Ｂ）は、表面に塗液が円形以外の略四角形状に塗工された四角形状の基板を、略四角形状になった塗工部の周縁部が回転テーブルの外周側に位置するようにして回転テーブルの上に載置させて回転させると共に、基板の下に設けた加熱体を回転テーブルの中心に対して近接・離間する方向に移動させ、基板に表面における不定形になった塗工部の周縁部を前記の加熱体により加熱させて乾燥させる状態を示した概略平面説明図である。In the coated part peripheral edge treatment device according to the embodiment, (A) and (B) convert a square substrate whose surface is coated with a coating liquid into a substantially square shape other than a circle into a substantially square shape. The substrate is placed on the rotary table and rotated so that the peripheral edge of the coated part is located on the outer circumferential side of the rotary table, and the heating element provided under the substrate is placed close to the center of the rotary table. FIG. 3 is a schematic plan view showing a state in which the substrate is moved in a direction of separation and the peripheral edge of the coated portion, which has become irregular on the surface of the substrate, is heated and dried by the heating element. 前記の実施形態に係る塗工部周縁処理装置の変更例を示した概略断面説明図である。It is a schematic cross-sectional explanatory view which showed the example of a change of the coating part peripheral edge processing device based on the said embodiment. 前記の実施形態に係る塗工部周縁処理装置において、表面に塗液が円形状に塗工された円形状の基板を、塗工部の周縁部が回転テーブルの外周側に位置するようにして回転テーブルの上に載置させて回転させ、円形状になった塗工部の周縁部を基板の下に設けた加熱体により塗工部の周縁部を加熱させて乾燥させる例を示した概略平面説明図である。In the coating part peripheral edge processing device according to the embodiment, a circular substrate whose surface is coated with a coating liquid in a circular shape is arranged such that the peripheral edge of the coating part is located on the outer peripheral side of the rotary table. A schematic diagram showing an example in which the substrate is placed on a rotary table and rotated, and the peripheral edge of the circular coated area is heated and dried by a heating element provided under the substrate. FIG.
　以下、本発明の実施形態に係る塗工部周縁処理装置を添付図面に基づいて具体的に説明する。なお、本発明に係る塗工部周縁処理装置は、下記の実施形態に示したものに限定されず、発明の要旨を変更しない範囲において、適宜変更して実施できるものである。 Hereinafter, a coating section peripheral edge processing device according to an embodiment of the present invention will be specifically described based on the accompanying drawings. It should be noted that the coated part peripheral edge processing device according to the present invention is not limited to that shown in the embodiments below, and can be implemented with appropriate modifications within the scope of the gist of the invention.
　本発明の実施形態に係る塗工部周縁処理装置においては、塗液が塗工された基板１０の表面における塗工部１１の周縁部１１ａを乾燥させるにあたり、図１に示すように、減圧室２０内において、回転装置３０によって回転する回転軸３１の先端に設けられた前記の塗工部１１の外径よりも小さな外径になった回転テーブル３２の上に前記の基板１０を、基板１０の表面における塗工部１１の周縁部１１ａが回転テーブル３２の外周側に飛び出して位置するようにして載置させている。 In the coating part peripheral edge treatment device according to the embodiment of the present invention, in drying the peripheral part 11a of the coating part 11 on the surface of the substrate 10 coated with the coating liquid, as shown in FIG. 20, the substrate 10 is placed on a rotary table 32 having an outer diameter smaller than the outer diameter of the coating section 11, which is provided at the tip of a rotating shaft 31 rotated by a rotating device 30. The coating portion 11 is placed such that the peripheral edge portion 11a of the coating portion 11 on the surface of the rotary table 32 protrudes from the outer circumferential side of the rotary table 32.
　そして、この実施形態に係る塗工部周縁処理装置においては、回転テーブル３２の外周側に位置する基板１０の下側において、回転テーブル３２の外周側に位置する前記の塗工部１１の周縁部１１ａを加熱させる棒状の加熱体Ｈを、基板１０と接触しないように配置させると共に、この加熱体Ｈを、移動装置４０により回転テーブルの３２中心に対して近接・離間する方向に移動させるようにしている。 In the coating part peripheral edge treatment device according to this embodiment, the peripheral edge of the coating part 11 located on the outer peripheral side of the rotary table 32 is located on the lower side of the substrate 10 located on the outer peripheral side of the rotary table 32. A rod-shaped heating body H for heating the rotary table 11a is arranged so as not to contact the substrate 10, and the heating body H is moved by a moving device 40 in a direction toward or away from the center 32 of the rotary table. ing.
　なお、図では、前記の加熱体Ｈとして棒状のものを示しているが、その先端部で加熱できるものであれば、どのような形状のものであってもよい。 Although the figure shows a rod-shaped heating element H, it may be of any shape as long as it can be heated at its tip.
　また、この実施形態に係る塗工部周縁処理装置においては、前記の減圧室２０内の下部に下部ヒーター２１を設けると共に、減圧室２０内の上部に上部ヒーター２２を設け、減圧室２０内を減圧手段（図示せず）によって減圧させると共に、前記の下部ヒーター２１と上部ヒーター２２とによって減圧室２０内を加熱させ、塗液が塗工された基板１０の表面の塗工部１１を乾燥させるようにしている。 In addition, in the coating part peripheral edge treatment device according to this embodiment, a lower heater 21 is provided at the lower part of the reduced pressure chamber 20, and an upper heater 22 is provided at the upper part of the reduced pressure chamber 20, so that the inside of the reduced pressure chamber 20 is heated. The pressure is reduced by a pressure reducing means (not shown), and the interior of the reduced pressure chamber 20 is heated by the lower heater 21 and the upper heater 22 to dry the coated portion 11 on the surface of the substrate 10 coated with the coating liquid. That's what I do.
　また、この実施形態に係る塗工部周縁処理装置においては、基板１０に塗工された塗工部１１の周縁部１１ａの位置を検知する位置検知手段４１として、検知用カメラ４１を減圧室２０の天井部２３の上に設け、天井部２３に設けた筒状の監視窓２３ａを通して、この検知用カメラ４１により基板１０に塗工された塗工部１１における周縁部１１ａの位置を検知するようにしている。なお、前記の上部ヒーター２２が前記の監視窓２３ａと重なる位置においては、上部ヒーター２２に切欠き４４を設けている。 In addition, in the coating part peripheral edge processing apparatus according to this embodiment, a detection camera 41 is installed in the decompression chamber 20 as a position detection means 41 for detecting the position of the peripheral edge part 11a of the coating part 11 coated on the substrate 10. The detection camera 41 detects the position of the peripheral edge part 11a of the coated part 11 coated on the substrate 10 through the cylindrical monitoring window 23a provided on the ceiling part 23. I have to. Note that a cutout 44 is provided in the upper heater 22 at a position where the upper heater 22 overlaps the monitoring window 23a.
　そして、この実施形態に係る塗工部周縁処理装置においては、この検知用カメラ４１によって検知された塗工部１１の周縁部１１ａの位置を制御装置４２に出力し、この制御装置４２により前記の移動装置４０を制御して、移動装置４０により、前記の加熱体Ｈを回転テーブルの３２中心に対して近接・離間する方向に移動させ、加熱体Ｈが塗工部１１の周縁部１１ａに対応する基板１０の下に位置するように制御している。 In the coating part peripheral edge processing device according to this embodiment, the position of the peripheral edge part 11a of the coating part 11 detected by this detection camera 41 is output to the control device 42, and the control device 42 The moving device 40 is controlled to move the heating body H in a direction approaching or away from the center 32 of the rotary table, so that the heating body H corresponds to the peripheral edge 11a of the coating section 11. It is controlled so that it is located under the substrate 10.
　ここで、図２に示すように、正方形状になった基板１０の表面に塗液が円形状に塗工されて、表面に円形状の塗工部１１が形成された基板１０を用い、この実施形態に係る塗工部周縁処理装置により、基板１０の表面に円形状に塗工された塗工部１１の周縁部１１ａを加熱・乾燥させるにあたっては、基板１０の表面における円形状になった塗工部１１の周縁部１１ａの全部が回転テーブル３２の外周側に飛び出して位置するようにして、前記の基板１０を回転テーブル３２の上に載置させ、前記の検知用カメラ４１によって基板１０における塗工部１１の周縁部１１ａの位置を検知し、この検知結果に基づいて、前記の制御装置４２により前記の移動装置４０を制御して、加熱体Ｈを回転テーブルの３２中心に対して近接・離間する方向に移動させ、前記の加熱体Ｈを円形状に塗工された塗工部１１の周縁部１１ａに対応する基板１０の下に位置させるようにする。 Here, as shown in FIG. 2, a substrate 10 in which a coating liquid is circularly applied to the surface of a square substrate 10 to form a circular coating portion 11 on the surface is used. In heating and drying the peripheral edge part 11a of the coated part 11 coated in a circular shape on the surface of the substrate 10 by the coating part peripheral edge treatment device according to the embodiment, The substrate 10 is placed on the rotary table 32 so that the entire peripheral edge 11a of the coating section 11 protrudes to the outer circumferential side of the rotary table 32, and the detection camera 41 detects the substrate 10. The position of the peripheral edge 11a of the coating section 11 is detected, and based on the detection result, the control device 42 controls the moving device 40 to move the heating body H relative to the center 32 of the rotary table. The heater H is moved toward and away from the substrate 10 so as to be positioned under the substrate 10 corresponding to the peripheral edge 11a of the circularly coated portion 11.
　そして、この状態で、前記の回転装置３０によって回転テーブル３２を回転させて、前記の加熱体Ｈにより基板１０における塗工部１１の周縁部１１ａを、基板１０の下側から加熱させて乾燥させるようにする。 In this state, the rotating table 32 is rotated by the rotating device 30, and the peripheral edge 11a of the coating portion 11 on the substrate 10 is heated and dried from the lower side of the substrate 10 by the heating body H. Do it like this.
　このようにすると、１つの棒状の加熱体Ｈにより基板１０における塗工部１１の周縁部１１ａを効率よく加熱させて乾燥させることができるようになり、従来のように、基板の表面に塗工された塗工部の周縁部の大きさに合った加熱接触部材を基板の下面に接触させて、基板の表面における塗工部の周縁部の全周を加熱させて乾燥させる場合に比べて、塗工部１１の周縁部１１ａの全周を加熱させて乾燥させるための設備が少なくてすみ、コストも軽減される。 In this way, the peripheral edge 11a of the coating section 11 on the substrate 10 can be efficiently heated and dried by one rod-shaped heating element H, and the coating can be applied to the surface of the substrate as in the conventional method. Compared to the case where a heating contact member that matches the size of the periphery of the coated part is brought into contact with the bottom surface of the substrate to heat and dry the entire periphery of the coated part on the surface of the substrate, Less equipment is needed to heat and dry the entire circumference of the peripheral edge 11a of the coating section 11, and costs are also reduced.
　また、基板１０の表面に円形状に塗工された塗工部１１の径が異なる場合においても、前記のように検知用カメラ４１によって基板１０における塗工部１１の周縁部１１ａの位置を検知し、この検知結果に基づいて、前記の制御装置４２により前記の移動装置４０を制御して、加熱体Ｈを回転テーブルの３２中心に対して近接・離間する方向に移動させ、前記の加熱体Ｈを円形状に塗工された塗工部１１の周縁部１１ａに対応する基板１０の下に位置するように調整することにより、径が異なる円形状の塗工部１１の周縁部１１ａを、前記の加熱体Ｈにより加熱させて乾燥させることが簡単に行えるようになる。 Further, even if the diameters of the circularly coated portions 11 on the surface of the substrate 10 are different, the position of the peripheral edge portion 11a of the coated portion 11 on the substrate 10 is detected by the detection camera 41 as described above. Based on this detection result, the control device 42 controls the moving device 40 to move the heating body H toward and away from the center 32 of the rotary table. By adjusting H so that it is located under the substrate 10 corresponding to the peripheral edge 11a of the circular coated part 11, the peripheral edge 11a of the circular coated part 11 with different diameters can be It becomes possible to easily perform heating and drying using the heating element H described above.
　また、基板１０の表面に塗工させる塗工部１１の形状が、円形以外の形状になっている場合、例えば、図３（Ａ），（Ｂ）に示すように、正方形状になった基板１０の表面に略四角形状になった塗工部１１が形成された基板１０において、略四角形状に塗工された塗工部１１の周縁部１１ａを加熱・乾燥させるにあたっては、基板１０の表面における略四角形状になった塗工部１１の周縁部１１ａの全部が回転テーブル３２の外周側に飛び出して位置するようにして、前記の基板１０を回転テーブル３２の上に載置させ、前記の検知用カメラ４１によって、基板１０の表面における略四角形状になった塗工部１１の周縁部１１ａの位置を検知し、この検知結果に基づいて、前記の制御装置４２により前記の移動装置４０を制御して、加熱体Ｈを回転テーブルの３２中心に対して近接・離間する方向に移動させるようにする。 Further, when the shape of the coating portion 11 to be coated on the surface of the substrate 10 is a shape other than a circle, for example, as shown in FIGS. 3(A) and 3(B), a square-shaped substrate In the substrate 10 in which a substantially rectangular coated portion 11 is formed on the surface of the substrate 10, in heating and drying the peripheral portion 11a of the substantially rectangular coated portion 11, the surface of the substrate 10 is heated and dried. The substrate 10 is placed on the rotary table 32 so that the entire peripheral edge 11a of the approximately rectangular coating portion 11 protrudes to the outer circumferential side of the rotary table 32. The detection camera 41 detects the position of the peripheral edge 11a of the approximately rectangular coating portion 11 on the surface of the substrate 10, and based on the detection result, the control device 42 controls the moving device 40. The heating body H is controlled to move toward and away from the center 32 of the rotary table.
　そして、前記の回転装置３０によって回転テーブル３２を回転させながら、前記のように制御装置４２により移動装置４０を制御し、前記の加熱体Ｈを回転テーブルの３２中心に対して近接・離間する方向に移動させて、図３（Ａ），（Ｂ）に示すように、常に、前記の加熱体Ｈを略四角形状になった塗工部１１の周縁部１１ａに対応する位置に導き、加熱体Ｈにより略四角形状になった塗工部１１の周縁部１１ａを加熱させて乾燥させるようにする。 Then, while the rotating table 32 is rotated by the rotating device 30, the moving device 40 is controlled by the control device 42 as described above, and the direction in which the heating body H approaches or moves away from the center 32 of the rotating table is controlled. As shown in FIGS. 3(A) and 3(B), the heating body H is always guided to a position corresponding to the peripheral edge 11a of the approximately rectangular coating portion 11, and the heating body The peripheral edge portion 11a of the coated portion 11, which has a substantially rectangular shape, is heated and dried by H.
　なお、この実施形態においては、検知用カメラ４１を用いたが、検知用カメラ４１を使用せずに、塗工部１１の周縁部１１ａの形状を、予め制御装置４２にプログラミングしておき、これに従って、制御装置４２により移動装置４０を制御するようにしてもよい。 In this embodiment, the detection camera 41 is used, but instead of using the detection camera 41, the shape of the peripheral edge 11a of the coating section 11 is programmed in the control device 42 in advance, Accordingly, the moving device 40 may be controlled by the control device 42.
　なお、基板１０の表面に塗工させる塗工部１１の形状は、図２に示したような円形状のものや、図３（Ａ），（Ｂ）に示したような略四角形状のものに限定されず、様々な形状になった塗工部１１が塗工されたものであってもよい。 The shape of the coating portion 11 to be coated on the surface of the substrate 10 may be a circular shape as shown in FIG. 2 or a substantially square shape as shown in FIGS. 3(A) and (B). The present invention is not limited to this, and the coated portion 11 may be coated in various shapes.
　ここで、基板１０の表面に様々な形状になった塗工部１１を塗工させるにあたっては、例えば、特許第６８４７５６０号公報に示されるように、塗液が供給される塗布用ノズルの塗液導入部内において、所定パターン形状になった塗液収容凹部が外周面に形成された円柱状の塗液供給体を、スリット状吐出口の上に位置するように設け、この塗液供給体を回転させて、塗液を前記の塗液収容凹部内からスリット状吐出口を通して被塗布体の表面に供給させるようにした塗布装置を用いることができる。 Here, in order to coat the surface of the substrate 10 with the coating parts 11 having various shapes, for example, as shown in Japanese Patent No. 6847560, the coating liquid is supplied from a coating nozzle to which the coating liquid is supplied. In the introduction part, a cylindrical coating liquid supply body having coating liquid storage recesses formed in a predetermined pattern on its outer circumferential surface is provided so as to be positioned above the slit-shaped discharge port, and this coating liquid supply body is rotated. A coating device may be used in which the coating liquid is supplied from the coating liquid storage recess through the slit-shaped discharge port onto the surface of the object to be coated.
　また、この実施形態に係る塗工部周縁処理装置においては、基板１０の表面に塗工された塗工部１１の周縁部１１ａを加熱・乾燥させるにあたって、前記のように回転テーブル３２の外周側に位置する基板１０の下側において、回転テーブル３２の外周側に位置する塗工部１１の周縁部１１ａを加熱させる棒状の加熱体Ｈを、基板１０と接触しないように配置させるようにしただけであるが、図４に示すように、回転テーブル３２の外周側に位置する基板１０における塗工部１１の周縁部１１ａを加熱させる第２加熱体Ｈ２を、前記の基板１０と接触しないようにして基板１０の上側に配置させ、回転テーブル３２の外周側に位置する基板１０における塗工部１１の周縁部１１ａを、前記の加熱体Ｈに加えてこの第２加熱体Ｈ２により基板１０の上下両方から加熱させて乾燥させるようにすることができる。 In addition, in the coated part peripheral edge treatment device according to this embodiment, when heating and drying the peripheral edge part 11a of the coated part 11 coated on the surface of the substrate 10, the outer circumferential side of the rotary table 32 is heated and dried. The rod-shaped heating element H, which heats the peripheral edge 11a of the coating section 11 located on the outer circumferential side of the rotary table 32, is placed on the lower side of the substrate 10 located at the bottom of the substrate 10 so as not to come into contact with the substrate 10. However, as shown in FIG. 4, the second heating element H2 that heats the peripheral edge 11a of the coating section 11 on the substrate 10 located on the outer peripheral side of the rotary table 32 is arranged so as not to come into contact with the substrate 10. The peripheral edge 11a of the coating section 11 of the substrate 10 located on the outer circumferential side of the rotary table 32 is heated by this second heating element H2 in addition to the heating element H described above. It is possible to heat and dry from both sides.
　また、前記のこの第２加熱体Ｈ２を、移動装置４３により回転テーブルの３２中心に対して近接・離間する方向に移動させるようにし、前記の加熱体Ｈの場合と同様に、前記の検知用カメラ４１によって検知された塗工部１１の周縁部１１ａの位置を制御装置４２に出力し、この制御装置４２により前記の移動装置４３を制御して、移動装置４３により前記の第２加熱体Ｈ２を回転テーブルの３２中心に対して近接・離間する方向に移動させ、第２加熱体Ｈ２が常に塗工部１１の周縁部１１ａに対応する基板１０の上に位置するように制御することができる。さらに、乾燥状態や塗工状態によっては、この第２加熱体Ｈ２を、前記の加熱体Ｈと少しずれた位置に移動させて、塗工部１１の周縁部１１ａの適切な位置を効率よく加熱させて乾燥させるようにすることもできる。 In addition, the second heating body H2 is moved by the moving device 43 in the direction of approaching and away from the center 32 of the rotary table, and as in the case of the heating body H, the second heating body H2 is used for the detection. The position of the peripheral edge 11a of the coating section 11 detected by the camera 41 is output to the control device 42, and the control device 42 controls the moving device 43, and the moving device 43 controls the second heating body H2. can be controlled so that the second heating element H2 is always positioned above the substrate 10 corresponding to the peripheral edge 11a of the coating section 11 by moving the heating element H2 toward or away from the center 32 of the rotary table. . Furthermore, depending on the drying state or coating state, the second heating element H2 may be moved to a position slightly shifted from the heating element H to efficiently heat the appropriate position of the peripheral edge 11a of the coating section 11. It is also possible to let it dry.
　また、前記の実施形態においては、四角形状になった基板１０の表面に塗液を塗工させたものを示したが、基板１０の形状は特に限定されない。 Furthermore, in the embodiment described above, the coating liquid was applied to the surface of the rectangular substrate 10, but the shape of the substrate 10 is not particularly limited.
　例えば、図５に示すように、円形状になった基板１０の表面に塗液が円形状に塗工されて、表面に円形状の塗工部１１が形成された円形状の基板１０を用い、この基板１０の表面における円形状になった塗工部１１の周縁部１１ａの全部が回転テーブル３２の外周側に飛び出して位置するようにして、前記の基板１０を回転テーブル３２の上に載置させ、円形状に塗工された塗工部１１の周縁部１１ａに対応する基板１０の下に加熱体Ｈを位置させ、この状態で、前記の回転装置３０によって回転テーブル３２を回転させて、基板１０における塗工部１１の周縁部１１ａを、前記の加熱体Ｈにより基板１０の下側から加熱させて乾燥させるようにすることもできる。 For example, as shown in FIG. 5, a circular substrate 10 is used in which a coating liquid is applied in a circular manner to the surface of the circular substrate 10 to form a circular coated portion 11 on the surface. The substrate 10 is placed on the rotary table 32 such that the entire peripheral edge 11a of the circular coating portion 11 on the surface of the substrate 10 protrudes to the outer circumferential side of the rotary table 32. The heating element H is placed under the substrate 10 corresponding to the peripheral edge 11a of the coated portion 11 coated in a circular shape, and in this state, the rotary table 32 is rotated by the rotating device 30. Alternatively, the peripheral edge portion 11a of the coating portion 11 on the substrate 10 may be heated from below the substrate 10 by the heating body H to dry it.
　ここで、一定した径になった円形状の塗工部１１が表面に形成された円形状の基板１０を用いて、円形状の塗工部１１の周縁部１１ａを加熱体Ｈによって基板１０の下側から加熱させて乾燥させる場合には、特に、加熱体Ｈを移動させることなく一定した位置に設けるようにすることができるため、前記のような移動装置４０や、検知用カメラ４１や、制御装置４２を設ける必要がなくなる。 Here, using a circular substrate 10 on the surface of which a circular coated portion 11 with a constant diameter is formed, the peripheral edge 11a of the circular coated portion 11 is heated by the heating element H to form the substrate 10. In the case of drying by heating from below, the heating body H can be provided at a fixed position without being moved, so the moving device 40 as described above, the detection camera 41, There is no need to provide the control device 42.
１０　　：基板
１１　　：塗工部
１１ａ　：周縁部
２０　　：減圧室
２１　　：下部ヒーター
２２　　：上部ヒーター
２３　　：天井部
２３ａ　：監視窓
３０　　：回転装置
３１　　：回転軸
３２　　：回転テーブル
４０　　：移動装置
４１　　：検知用カメラ（位置検知手段）
４２　　：制御装置
４３　　：移動装置
４４　　：切欠き
Ｈ　　　：加熱体
Ｈ２　　：第２加熱体   10: Substrate 11: Coating section 11a: Peripheral section 20: Decompression chamber 21: Lower heater 22: Upper heater 23: Ceiling section 23a: Monitoring window 30: Rotating device 31: Rotating shaft 32: Rotating table 40: Moving device 41: Detection camera (position detection means)
42: Control device 43: Moving device 44: Notch H: Heating body H2: Second heating body

Claims (5)

  1. 　塗液が塗工された基板の表面における塗工部の周縁部を乾燥させる塗工部周縁処理装置において、前記の基板における塗工部の周縁部が回転テーブルの外周側に位置するようにして、前記の基板を回転テーブルの上に載置させると共に、前記の回転テーブルの外周側に位置する基板における塗工部の周縁部を加熱させる加熱体を、少なくとも前記の基板の下側に基板と接触しないように配置させ、前記の回転テーブルにより前記の基板を回転させると共に、回転テーブルの外周側に位置する基板における塗工部の周縁部を、前記の加熱体により加熱させて乾燥させることを特徴とする塗工部周縁処理装置。 In a coating part peripheral edge processing device for drying a peripheral edge of a coating part on a surface of a substrate coated with a coating liquid, the peripheral edge of the coating part on the substrate is located on the outer peripheral side of a rotary table. , the substrate is placed on a rotary table, and a heating element for heating the peripheral edge of the coated part of the substrate located on the outer circumferential side of the rotary table is placed at least on the underside of the substrate and the substrate. The substrates are arranged so as not to contact each other, and the substrates are rotated by the rotary table, and the peripheral edge of the coated portion of the substrate located on the outer peripheral side of the rotary table is heated and dried by the heating body. Features a coating area peripheral treatment device.
  2. 　請求項１に記載の塗工部周縁処理装置において、前記の回転テーブルにより前記の基板を回転させながら、回転テーブルの外周側に位置する前記の塗工部の周縁部の位置に対応するようにして、前記の加熱体を回転テーブルの中心に対して近接・離間する方向に移動させる移動装置を設けたことを特徴とする塗工部周縁処理装置。 2. The coated part peripheral edge processing apparatus according to claim 1, wherein while the substrate is rotated by the rotary table, the substrate is rotated so as to correspond to the position of the peripheral edge of the coated part located on the outer peripheral side of the rotary table. A coating section peripheral edge processing apparatus comprising: a moving device for moving the heating body in a direction toward and away from the center of the rotary table.
  3. 　請求項２に記載の塗工部周縁処理装置において、前記の回転テーブルの外周側に位置する塗工部の周縁部の位置を検知する位置検知手段を設け、前記の位置検知手段によって検知された塗工部の周縁部の位置に基づいて、前記の移動装置によって前記の加熱体を移動させることを特徴とする塗工部周縁処理装置。 The coating part peripheral edge processing apparatus according to claim 2, further comprising a position detection means for detecting the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table, and the position detection means detects the position of the peripheral edge of the coating part located on the outer peripheral side of the rotary table. A peripheral edge processing device for a coating section, characterized in that the heating body is moved by the moving device based on the position of the peripheral edge of the coating section.
  4. 　請求項１に記載の塗工部周縁処理装置において、前記の回転テーブルの外周側に位置する基板における塗工部の周縁部を加熱させる第２加熱体を、前記の基板と接触しないようにして、基板の上側に配置させたことを特徴とする塗工部周縁処理装置。 2. The coated part peripheral edge treatment device according to claim 1, wherein the second heating body that heats the peripheral edge of the coated part of the substrate located on the outer peripheral side of the rotary table is arranged so as not to come into contact with the substrate. , a coating section peripheral edge processing device, characterized in that it is disposed above a substrate.
  5. 　請求項１～請求項４の何れか１項に記載の基板周縁処理装置において、前記の回転テーブルにより前記の基板を回転させると共に、回転テーブルの外周側に位置する塗工部の周縁部を前記の加熱体により加熱させて、前記の基板における塗工部の周縁部を乾燥させる操作を減圧室内で行うことを特徴とする塗工部周縁処理装置。  In the substrate peripheral edge processing apparatus according to any one of claims 1 to 4, the substrate is rotated by the rotary table, and the peripheral edge of the coating section located on the outer peripheral side of the rotary table is An apparatus for treating a peripheral edge of a coated part, characterized in that the operation of drying the peripheral edge of the coated part of the substrate by heating it with a heating body is performed in a vacuum chamber.​
PCT/JP2022/028318 2022-05-02 2022-07-21 Coated portion peripheral edge processing device WO2023214470A1 (en)

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JP2022075716A JP7220968B2 (en) 2022-05-02 2022-05-02 Coating edge processing device
JP2022-075716 2022-05-02

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135171A (en) * 1993-05-20 1995-05-23 Tokyo Electron Ltd Method and device of treating coated film
JP2007275697A (en) * 2006-04-03 2007-10-25 Seiko Epson Corp Spin coat apparatus and spin coat method
JP2008282513A (en) * 2007-04-11 2008-11-20 Ricoh Co Ltd Spin coater, temperature controlling method of same, optical disc production apparatus, and optical disc production method
JP2011230051A (en) * 2010-04-27 2011-11-17 Tokyo Electron Ltd Resist coating apparatus, coating development system provided with the same, and resist coating method
JP2012227461A (en) * 2011-04-22 2012-11-15 Tokyo Electron Ltd Application apparatus, application method, and storage medium
JP2021084064A (en) * 2019-11-27 2021-06-03 東レ株式会社 Substrate processing method and substrate processing apparatus
JP6967637B1 (en) * 2020-07-30 2021-11-17 中外炉工業株式会社 Edge flattening device and coating drying system including the device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135171A (en) * 1993-05-20 1995-05-23 Tokyo Electron Ltd Method and device of treating coated film
JP2007275697A (en) * 2006-04-03 2007-10-25 Seiko Epson Corp Spin coat apparatus and spin coat method
JP2008282513A (en) * 2007-04-11 2008-11-20 Ricoh Co Ltd Spin coater, temperature controlling method of same, optical disc production apparatus, and optical disc production method
JP2011230051A (en) * 2010-04-27 2011-11-17 Tokyo Electron Ltd Resist coating apparatus, coating development system provided with the same, and resist coating method
JP2012227461A (en) * 2011-04-22 2012-11-15 Tokyo Electron Ltd Application apparatus, application method, and storage medium
JP2021084064A (en) * 2019-11-27 2021-06-03 東レ株式会社 Substrate processing method and substrate processing apparatus
JP6967637B1 (en) * 2020-07-30 2021-11-17 中外炉工業株式会社 Edge flattening device and coating drying system including the device

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