Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
  • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
  • C07F7/02—Silicon compounds
  • C07F7/08—Compounds having one or more C—Si linkages
  • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
  • C09K3/00—Materials not provided for elsewhere
  • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/12—Organic material

Definitions

• the two or more chains A When two or more chains A are bonded to a reactive silyl group via a linking group, the two or more chains A may be bonded to the same atom constituting the linking group, or may be bonded to different atoms. good.
• the two or more reactive silyl groups When two or more reactive silyl groups are bonded to chain Z and chain A via a linking group, the two or more reactive silyl groups may be bonded to the same atom constituting the linking group, or may be different from each other. May be bonded to atoms. From the viewpoint of ease of synthesis, two or more reactive silyl groups are preferably bonded to different atoms constituting the linking group.
• the number of chains Z in the compound of the present disclosure may be 1 or more, and from the viewpoint of obtaining a surface treated layer with excellent wear resistance, the number is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1.
• the compound of the present disclosure may have only a polydialkylsiloxane residue as the chain Z, may have only an alkylene chain having 10 or more carbon atoms, or may have a polydialkylsiloxane residue and an alkylene chain having 10 or more carbon atoms. It may have both chains. From the viewpoint of ease of synthesis, it is preferable that the chain Z is only a polydialkylsiloxane residue or only an alkylene chain having 10 or more carbon atoms.
• the compound of the present disclosure is preferably a compound represented by the following formula (1) from the viewpoint of forming a surface treatment layer that has both water repellency and oil repellency.
• linking group that is a combination of two or more of the above linking groups include an ester bond, a thioester bond, an amide bond, and a sulfonamide bond.
• Combinations of the above substituents and linking groups include a combination of a hydroxy group, a carbonyl group, and an alkylene group (for example, a combination of a carboxy group and an alkylene group), a combination of an amino group and a carbonyl group, and a combination of an amino group and a carbonyl group.
• the divalent linking groups represented by L 3 and L 4 include alkylene groups, carbonyl groups, ether bonds, thioether bonds, sulfonyl groups, -NR 4 -, -SiR 4 2 -, and combinations of two or more of these.
• the following groups are mentioned.
• the above R 4 is a hydrogen atom or a hydrocarbon group.
• examples of the group that is a combination of two or more of the above-mentioned groups include an ester bond, a thioester bond, an amide bond, a sulfonamide bond, a combination of an alkylene group and an ether bond, and the like.
• the alkylene group represented by L 6 may be either linear or branched, with linear being preferred.
• the number of carbon atoms in the alkylene group is, for example, 1 to 6, preferably 1 to 4, and more preferably 2 to 3.
• L 5 is a carbon atom or a group in which the remaining bond is bonded to a hydrogen atom or a substituent
• L 6 is preferably a single bond or an alkylene group having 1 to 4 carbon atoms, and more preferably a single bond.
• two or more (-Si(R 1 ) n L 2 3-n ) contained in the compound represented by formula (1) may be the same or different from each other. Good too.
• Q a is a single bond or a divalent linking group
• X 31 is a group having a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a 2- to 8-valent organopolysiloxane residue, or a (h+i+1)-valent ring
• Q b is a single bond or a divalent linking group
• R 31 is a hydrogen atom, a hydroxyl group or an alkyl group
• h is an integer of 1 or more
• i is an integer of 0 or more
• the definitions and specific examples of R 1 , L 2 , and n are the same as the definitions and specific examples of each symbol in the reactive silyl group.
• Examples of groups combining two or more of the above include -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R d )- , -N(R d )C(O)-, -N(R d )C(O)N(R d )-, -N(R d )C(O)O-, -OC(O)N( R d )-, -SO 2 N(R d )-, -N(R d )SO 2 -, -C(O)N(R d )-, -N(R d )C(O )-, an alkylene group having an etheric oxygen atom, an alkylene group having -OC(O)-, an alkylene group having -C(O)O-, a -C(O)S-alkylene group, - Examples include an alkylene group having SO 2 N(R
• Q b2 is an alkylene group or a group having a divalent organopolysiloxane residue, an ether oxygen atom, or -NH- between carbon atoms of an alkylene group having 2 or more carbon atoms.
• the number of carbon atoms in the alkylene group represented by Q b2 is preferably 1 to 30, more preferably 1 to 20, even more preferably 2 to 20, may be 2 to 10, or may be 2 to 6. . Examples include 2, 3, 8, 9, and 11. Further, the number of carbon atoms may be 1 to 10.
• group (3-1A-5) include the following groups.
• * represents the bonding position with L 6 in formula (3-1).
• Z c is a (w3+w4+1)-valent hydrocarbon group.
• w3 is an integer of 4 or more.
• w4 is an integer greater than or equal to 0.
• the definitions and preferred ranges of Q e , s4, Q a4 , t4, Q b4 , and u4 are the same as the definitions of each symbol in group (3-1A-4).
• the number of carbon atoms in the alkyl group of R e1 , R e2 or R e3 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2 from the viewpoint of ease of producing compound (3-2).
• the number of carbon atoms in the alkyl group portion of the acyloxy group of R e2 is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2, from the viewpoint of ease of producing compound (3-2).
• h1 is preferably from 2 to 6, more preferably from 2 to 4, and even more preferably from 2 to 4, from the viewpoint of facilitating the production of compound (3-2) and from the viewpoint of further improving the abrasion resistance of the surface treatment layer.
• h2 is preferably 2 to 6, more preferably 2 to 4, even more preferably 2 or 3, from the viewpoint of easy production of compound (3-2) and from the viewpoint of further excellent wear resistance of the surface treatment layer. .
• Examples of the compound (3-2) include compounds of the following formula.
• the compound of the following formula is preferred from the viewpoints of easy industrial production, ease of handling, and superior abrasion resistance of the surface treatment layer.
• R t in the compound of the following formula is (T 1 -Z-L 3 ) or (T 2 -AL 4 ) in the above-mentioned formula (3-2), and at least one of the two or more R t One is (T 1 -Z-L 3 ), and at least one other is (T 2 -A-L 4 ).
• the content of the liquid medium is preferably 60 to 99.999% by mass, more preferably 80 to 99.99% by mass, and even more preferably 90 to 99.9% by mass, based on the total amount of the composition of the present disclosure.
• the content of the liquid medium may be 90-99.99% by weight, 95-99% by weight, based on the total amount of the composition of the present disclosure. It may be .98% by mass, 97 to 99.97% by mass, or 98 to 99.95% by mass.
• the composition of the present disclosure may contain only one type of liquid medium, or may contain two or more types.
• Group 1 elements of the periodic table mean lithium, sodium, potassium, rubidium, and cesium.
• Group 1 elements lithium, sodium, and potassium are used because they enable the surface treatment layer to be formed more uniformly on the underlayer without defects, and from the viewpoint of suppressing variations in the composition of the underlayer between samples.
• the underlayer may contain two or more types of Group 1 elements.

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Cited By (5)

Citations (8)

• 2023
  • 2023-04-04 WO PCT/JP2023/013998 patent/WO2023204021A1/ja not_active Ceased
  • 2023-04-04 JP JP2024516176A patent/JPWO2023204021A1/ja active Pending

Patent Citations (8)

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