WO2023171297A1 - Electrochemical cell - Google Patents

Electrochemical cell Download PDF

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Publication number
WO2023171297A1
WO2023171297A1 PCT/JP2023/005517 JP2023005517W WO2023171297A1 WO 2023171297 A1 WO2023171297 A1 WO 2023171297A1 JP 2023005517 W JP2023005517 W JP 2023005517W WO 2023171297 A1 WO2023171297 A1 WO 2023171297A1
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WO
WIPO (PCT)
Prior art keywords
main surface
electrode layer
metal support
electrolyte layer
layer
Prior art date
Application number
PCT/JP2023/005517
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French (fr)
Japanese (ja)
Inventor
春香 千葉
俊之 中村
玄太 寺澤
誠 大森
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日本碍子株式会社
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Publication of WO2023171297A1 publication Critical patent/WO2023171297A1/en

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/23—Carbon monoxide or syngas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B13/00—Diaphragms; Spacing elements
    • C25B13/02—Diaphragms; Spacing elements characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C25B9/23—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/60—Constructional parts of cells
    • C25B9/63—Holders for electrodes; Positioning of the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/10—Fuel cells with solid electrolytes
    • H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/10—Fuel cells with solid electrolytes
    • H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
    • H01M8/1213—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Definitions

  • the present invention relates to an electrochemical cell.
  • the electrochemical cell described in Patent Document 1 includes a cell main body in which a first electrode layer, an electrolyte layer, and a second electrode layer are laminated in this order on the main surface of a metal support.
  • the electrolyte layer covers the first electrode layer, and its ends are connected to the main surface of the cell body.
  • An object of the present invention is to provide an electrochemical cell that can suppress damage to an electrolyte layer.
  • An electrochemical cell includes a cell main body and a metal support.
  • the cell body includes a first electrode layer, a second electrode layer, and an electrolyte layer disposed between the first electrode layer and the second electrode layer.
  • the metal support has a main surface that supports the cell body and a plurality of supply holes.
  • the electrolyte layer has a first end that covers the first side of the main surface. The first end becomes thinner as it approaches the first side in a direction parallel to the main surface.
  • FIG. 1 is a plan view of an electrolysis cell according to an embodiment.
  • FIG. 2 is a sectional view taken along line AA in FIG.
  • FIG. 3 is a partially enlarged view of FIG. 2.
  • FIG. 4 is a partially enlarged view of FIG. 2.
  • FIG. 5 is a cross-sectional view of an electrolyte layer according to modification example 4.
  • FIG. 1 is a plan view of an electrolytic cell 1 according to an embodiment.
  • FIG. 2 is a sectional view taken along line AA in FIG.
  • the electrolytic cell 1 is an example of an "electrochemical cell" according to the present invention.
  • the electrolytic cell 1 is formed into a plate shape.
  • the electrolytic cell 1 is formed into a rectangle extending in the longitudinal direction (Y-axis direction) in plan view.
  • the electrolytic cell 1 includes a cell main body 10, a metal support 20, and a channel member 30.
  • the cell main body 10 includes a hydrogen electrode layer 6 (cathode), an electrolyte layer 7, a reaction prevention layer 8, and an oxygen electrode layer 9 (anode).
  • the hydrogen electrode layer 6, the electrolyte layer 7, the reaction prevention layer 8, and the oxygen electrode layer 9 are laminated in this order from the metal support 20 side.
  • the hydrogen electrode layer 6, the electrolyte layer 7, and the oxygen electrode layer 9 are essential structures, and the reaction prevention layer 8 is an optional structure.
  • Hydrogen electrode layer 6 is arranged between metal support 20 and electrolyte layer 7. Hydrogen electrode layer 6 is supported by metal support 20 . Specifically, the hydrogen electrode layer 6 is arranged on the first main surface 20S of the metal support 20. The hydrogen electrode layer 6 covers a region of the first main surface 20S of the metal support 20 where the plurality of supply holes 21 are provided. The hydrogen electrode layer 6 may enter into each supply hole 21 .
  • the hydrogen electrode layer 6 is an example of the "first electrode layer" according to the present invention.
  • Raw material gas is supplied to the hydrogen electrode 6 through each supply hole 21 .
  • the source gas contains at least H 2 O.
  • the hydrogen electrode 6 When the source gas contains only H 2 O, the hydrogen electrode 6 generates H 2 from the source gas according to the electrochemical reaction of water electrolysis shown in equation (1) below.
  • ⁇ Hydrogen electrode 6 H 2 O + 2e - ⁇ H 2 + O 2 - (1)
  • the hydrogen electrode 6 extracts H 2 and CO from the raw material gas according to the electrochemical reaction of co-electrolysis shown in the following equations (2), (3), and (4). and O 2- is produced.
  • ⁇ Hydrogen electrode 6 CO 2 +H 2 O+4e - ⁇ CO+H 2 +2O 2-...
  • ⁇ Electrochemical reaction of H 2 O H 2 O + 2e - ⁇ H 2 + O 2 - (3)
  • ⁇ Electrochemical reaction of CO 2 CO 2 +2e - ⁇ CO + O 2 -... (4)
  • the hydrogen electrode layer 6 is made of a porous material having electron conductivity.
  • the hydrogen electrode layer 6 may have oxide ion conductivity.
  • the hydrogen electrode layer 6 is made of, for example, 8 mol% yttria-stabilized zirconia (8YSZ), calcia-stabilized zirconia (CSZ), scandia-stabilized zirconia (ScSZ), gadolinium-doped ceria (GDC), samarium-doped ceria (SDC), (La ,Sr)(Cr, Mn)O3, (La,Sr)TiO3, Sr2(Fe,Mo)2O6 , ( La , Sr) VO3 , (La,Sr) FeO3 , and among these It can be composed of a mixed material combining two or more of them, or a composite of one or more of these and NiO.
  • the porosity of the hydrogen electrode layer 6 is not particularly limited, but can be, for example, 5% or more and 70% or less.
  • the thickness of the hydrogen electrode layer 6 is not particularly limited, but may be, for example, 1 ⁇ m or more and 100 ⁇ m or less.
  • the method for forming the hydrogen electrode layer 6 is not particularly limited, and may include a baking method, a spray coating method (thermal spray method, aerosol deposition method, aerosol gas deposition method, powder jet deposition method, particle jet deposition method, cold spray method, etc.) ), PVD method (sputtering method, pulsed laser deposition method, etc.), CVD method, etc. can be used.
  • a baking method a spray coating method (thermal spray method, aerosol deposition method, aerosol gas deposition method, powder jet deposition method, particle jet deposition method, cold spray method, etc.)
  • PVD method sputtering method, pulsed laser deposition method, etc.
  • CVD method etc.
  • Electrolyte layer 7 is arranged between hydrogen electrode layer 6 and oxygen electrode layer 9. Electrolyte layer 7 covers the entire hydrogen electrode layer 6 . In this embodiment, the electrolyte layer 7 is disposed between the hydrogen electrode layer 6 and the reaction prevention layer 8, and is connected to the hydrogen electrode layer 6 and the reaction prevention layer 8, respectively.
  • the outer peripheral portion of the electrolyte layer 7 is joined to the first main surface 20S of the metal support 20. This ensures airtightness between the hydrogen electrode layer 6 side and the oxygen electrode layer 9 side, so there is no need to separately seal between the metal support 20 and the electrolyte layer 7. Note that the outer peripheral portion of the electrolyte layer 7 is a portion of the electrolyte layer 7 that is connected to the first main surface 20S of the metal support 20.
  • the electrolyte layer 7 has a first end 71 and a second end 72.
  • the first and second ends 71 and 72 are both ends of the electrolyte layer 7 in the transverse direction (X-axis direction).
  • Each of the first and second ends 71 and 72 extends along the longitudinal direction.
  • the first end portion 71 is a portion of the outer peripheral portion of the electrolyte layer 7 that extends along the first side L1 of the first main surface 20S.
  • the second end portion 72 is a portion of the outer peripheral portion of the electrolyte layer 7 that extends along the second side L2 of the first main surface 20S.
  • the configurations of the first and second end portions 71 and 72 will be described later.
  • the electrolyte layer 7 transmits O 2 ⁇ generated in the hydrogen electrode layer 6 to the oxygen electrode layer 9.
  • the electrolyte layer 7 is made of a dense material having oxide ion conductivity.
  • the electrolyte layer 7 can be made of, for example, 8YSZ, LSGM (lanthanum gallate), GDC (gadolinium doped ceria), or the like.
  • the electrolyte layer 7 is made of a dense material that has ionic conductivity and no electronic conductivity.
  • the electrolyte layer 7 can be made of, for example, YSZ (8YSZ), GDC, ScSZ, SDC, LSGM (lanthanum gallate), or the like.
  • the porosity of the electrolyte layer 7 is not particularly limited, but can be, for example, 0.1% or more and 7% or less.
  • the thickness of the electrolyte layer 7 is not particularly limited, but may be, for example, 1 ⁇ m or more and 100 ⁇ m or less.
  • the method for forming the electrolyte layer 7 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
  • Reaction prevention layer 8 is arranged between electrolyte layer 7 and oxygen electrode layer 9.
  • the reaction prevention layer 8 is arranged on the opposite side of the hydrogen electrode layer 6 with the electrolyte layer 7 in between.
  • the reaction prevention layer 8 is connected to the electrolyte layer 7.
  • the reaction prevention layer 8 has a function of suppressing the formation of a reaction layer with high electrical resistance due to reaction between the electrolyte layer 7 and the oxygen electrode layer 9.
  • the reaction prevention layer 8 is made of an oxide ion conductive material.
  • the reaction prevention layer 8 can be made of GDC, SDC, or the like.
  • the porosity of the reaction prevention layer 8 is not particularly limited, but may be, for example, 0.1% or more and 50% or less.
  • the thickness of the reaction prevention layer 8 is not particularly limited, but may be, for example, 1 ⁇ m or more and 50 ⁇ m or less.
  • the method for forming the reaction prevention layer 8 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
  • the oxygen electrode layer 9 is arranged on the opposite side of the hydrogen electrode layer 6 with respect to the electrolyte layer 7. In this embodiment, since the electrolytic cell 1 includes the reaction prevention layer 8, the oxygen electrode layer 9 is connected to the reaction prevention layer 8. If the electrolytic cell 1 does not include the reaction prevention layer 8, the oxygen electrode layer 9 is connected onto the electrolyte layer 7.
  • the oxygen electrode layer 9 is an example of the "second electrode layer” according to the present invention.
  • the oxygen electrode layer 9 generates O 2 from O 2 ⁇ transmitted from the hydrogen electrode layer 6 through the electrolyte layer 7 according to the chemical reaction of equation (2) below.
  • ⁇ Oxygen electrode layer 9 2O 2- ⁇ O 2 +4e - (2)
  • the oxygen electrode layer 9 is made of a porous material having oxide ion conductivity and electron conductivity.
  • the oxygen electrode layer 9 is made of, for example, (La,Sr)(Co,Fe) O3 , (La,Sr) FeO3 , La(Ni,Fe) O3 , (La,Sr) CoO3 , and (Sm,Sr). ) CoO 3 and an oxide ion conductive material (GDC, etc.).
  • the porosity of the oxygen electrode layer 9 is not particularly limited, but can be, for example, 20% or more and 60% or less.
  • the thickness of the oxygen electrode layer 9 is not particularly limited, but may be, for example, 1 ⁇ m or more and 100 ⁇ m or less.
  • the method of forming the oxygen electrode layer 9 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
  • the metal support 20 supports the cell main body 10 .
  • the metal support 20 is formed into a plate shape.
  • the metal support 20 may have a flat plate shape or a curved plate shape.
  • the thickness of the metal support 20 is not particularly limited as long as it can maintain the strength of the electrolytic cell 1, and may be, for example, 0.1 mm or more and 2.0 mm or less.
  • the metal support 20 has a plurality of supply holes 21, a first main surface 20S, and a second main surface 20T.
  • the first main surface 20S is an example of the "main surface” according to the present invention.
  • Each supply hole 21 penetrates the metal support 20 from the first main surface 20S to the second main surface 20T. Each supply hole 21 opens to the first main surface 20S and the second main surface 20T. Each supply hole 21 is formed in a region of the first main surface 20S that is joined to the hydrogen electrode layer 6. Each supply hole 21 is connected to a flow path 30a formed between the metal support 20 and the flow path member 30.
  • Each supply hole 21 can be formed by mechanical processing (for example, punching process), laser processing, chemical processing (for example, etching process), or the like.
  • each supply hole 21 may be a pore within the porous metal. Therefore, each supply hole 21 does not need to be formed perpendicular to the first main surface 20S and the second main surface 20T.
  • the cell main body portion 10 is joined to the first main surface 20S.
  • the flow path member 30 is joined to the second main surface 20T.
  • the first main surface 20S is provided on the opposite side of the second main surface 20T.
  • FIG. 1 shows four sides defining the first main surface 20S.
  • the first main surface 20S is defined by a first side L1, a second side L2, a third side L3, and a fourth side L4.
  • the first main surface 20S is a region of the outer surface of the metal support 20 surrounded by the first side L1, the second side L2, the third side L3, and the fourth side L4.
  • the planar shape of the first main surface 20S is a rectangle extending in the longitudinal direction.
  • the first side L1 and the second side L2 are parallel to each other.
  • Each of the first and second sides L1 and L2 is a long side of the first main surface 20S.
  • Each of the first and second sides L1 and L2 is parallel to the longitudinal direction.
  • the third side L3 and the fourth side L4 are parallel to each other.
  • Each of the third and fourth sides L3 and L4 is a short side of the first main surface 20S.
  • Each of the third and fourth sides L3 and L4 is parallel to the lateral direction. Note that in this specification, "parallel" is a concept that includes not only parallel in the strict sense but also substantially parallel (with an inclination of 10 degrees or less).
  • the metal support 20 is made of a metal material.
  • the metal support 20 is made of an alloy material containing Cr (chromium).
  • Examples of such metal materials include Fe--Cr alloy steel (such as stainless steel) and Ni--Cr alloy steel.
  • the content of Cr in the metal support 20 is not particularly limited, but can be 4% by mass or more and 30% by mass or less.
  • the metal support 20 may contain Ti (titanium) or Zr (zirconium).
  • the content of Ti in the metal support 20 is not particularly limited, but can be set to 0.01 mol% or more and 1.0 mol% or less.
  • the content of Zr in the metal support 20 is not particularly limited, but can be set to 0.01 mol% or more and 0.4 mol% or less.
  • the metal support 20 may contain Ti as TiO 2 (titania) or Zr as ZrO 2 (zirconia).
  • the metal support 20 may have an oxide film formed by oxidation of the constituent elements of the metal support 20 on its surface.
  • a typical example of the oxide film is a chromium oxide film.
  • the oxide film partially or completely covers the surface of the metal support 20. Further, the oxide film may partially or entirely cover the inner wall surface of each supply hole 21.
  • the flow path member 30 is joined to the second main surface 20T of the metal support 20.
  • the channel member 30 forms a channel 30a between it and the metal support 20.
  • a raw material gas is supplied to the flow path 30a.
  • the raw material gas supplied to the flow path 30a is supplied to the hydrogen electrode layer 6 of the cell main body 10 via each supply hole 21 of the metal support 20.
  • the flow path member 30 can be made of an alloy material, for example.
  • the flow path member 30 may be formed of the same material as the metal support 20.
  • the channel member 30 may be substantially integral with the metal support 20.
  • the flow path member 30 has a frame 31 and an interconnector 32.
  • the frame body 31 is an annular member that surrounds the sides of the flow path 30a.
  • the frame 31 is joined to the second main surface 20T of the metal support 20.
  • the interconnector 32 is a plate-like member for electrically connecting the electrolytic cell 1 to an external power source or other electrolytic cells in series.
  • the interconnector 32 is joined to the frame 31.
  • the frame 31 and the interconnector 32 are separate members, but the frame 31 and the interconnector 32 may be integrated.
  • FIG. 3 is a partially enlarged view of FIG. 2.
  • the first end 71 is connected to the first main surface 20S of the metal support 20.
  • the first end portion 71 covers the first side L1 of the first main surface 20S. That is, the first end portion 71 covers the region of the first main surface 20S exposed from the hydrogen electrode layer 6 to the end. Thereby, heat radiation from the metal support 20 can be suppressed, so that the heat retention of the electrolytic cell 1 can be improved.
  • the first end portion 71 becomes thinner as it approaches the first side L1 in the lateral direction parallel to the first main surface 20S.
  • the first end 71 has a tip 71a that covers the first side L1, and the thickness of the tip 71a gradually decreases as it approaches the first side L1 in the lateral direction. . This can prevent damage (corner cracks, cracks, etc.) from occurring on the outer edge of the tip portion 71a.
  • the electrolytic cell 1 which has a rectangular planar shape, thermally expands and contracts more in the longitudinal direction than in the transverse direction. Therefore, a larger thermal stress is likely to be applied to a portion along the longitudinal direction of the outer peripheral portion of the electrolyte layer 7 than to a portion along the transverse direction. Therefore, by making the thickness of the first end portion 71 thinner as it approaches the first side L1, the portion of the electrolyte layer 7 that is particularly easily damaged can be effectively protected.
  • the tip portion 71a is a portion of the electrolyte layer 7 between the first reference line P1 and the second reference line P2.
  • the first reference line P1 is a straight line that passes through the first side L1 and is perpendicular to the first main surface 20S.
  • the second reference line P2 is a straight line located 4 ⁇ m inside from the first reference line P1 and parallel to the first reference line P1.
  • the thickness of the tip 71a means the height of the tip 71a in the direction perpendicular to the first main surface 20S (Z-axis direction).
  • the thickness of the tip portion 71a has a maximum value at a position where it intersects with the second reference line P2, and a minimum value at a position where it intersects with the first reference line P1.
  • the thickness of the tip portion 71a may be continuously reduced as it approaches the first side L1, or may be reduced in stages as it approaches the first side L1.
  • the outer surface of the tip portion 71a is curved convexly toward the side opposite to the first major surface 20S, but is curved convexly toward the first major surface 20S. It may be generally straight or wholly or partially curved.
  • the thickness of the portion of the first end 71 other than the tip 71a is not particularly limited.
  • the thickness of the portion other than the tip 71a may be substantially uniform, and may become smaller as it approaches the tip 71a, or may increase as it approaches the tip 71a.
  • the thickness of the tip portion 71a gradually decreases as it approaches the first side L1.
  • the configuration shown in FIG. 3 is preferably observed in all cross sections of the tip 71a, but it is sufficient if it can be observed in at least one cross section of the tip 71a. If the configuration shown in FIG. 3 can be observed even in one cross section, the heat retention of the electrolytic cell 1 can be improved at least in that portion, and damage to the outer edge of the portion can be suppressed.
  • FIG. 4 is a partially enlarged view of FIG. 2.
  • the second end 72 is connected to the first main surface 20S of the metal support 20.
  • the second end portion 72 covers the second side L2 of the first main surface 20S. That is, the second end portion 72 covers the region of the first main surface 20S exposed from the hydrogen electrode layer 6 to the end. Thereby, heat radiation from the metal support 20 can be suppressed, so that the heat retention of the electrolytic cell 1 can be improved.
  • the second end portion 72 becomes thinner as it approaches the second side L2 in the lateral direction parallel to the first main surface 20S.
  • the second end 72 has a tip 72a that covers the second side L2, and the thickness of the tip 72a gradually decreases as it approaches the second side L2 in the lateral direction. .
  • This can prevent damage (corner breaks, cracks, etc.) from occurring on the outer edge of the tip portion 72a.
  • large thermal stress is easily applied to the second end 72. Therefore, by making the thickness of the second end 72 thinner as it approaches the second side L2, part of the electrolyte layer 7 is Particularly vulnerable parts can be effectively protected.
  • the tip portion 72a is a portion of the electrolyte layer 7 between the third reference line P3 and the fourth reference line P4.
  • the third reference line P3 is a straight line that passes through the second side L2 and is perpendicular to the first main surface 20S.
  • the fourth reference line P4 is a straight line located 4 ⁇ m inside from the third reference line P3 and parallel to the third reference line P3.
  • the thickness of the tip 72a means the height of the tip 72a in the direction perpendicular to the first main surface 20S.
  • the thickness of the tip portion 72a has a maximum value at a position where it intersects with the fourth reference line P4, and a minimum value at a position where it intersects with the third reference line P3.
  • the thickness of the tip portion 72a may be continuously reduced as it approaches the second side L2, or may be reduced in stages as it approaches the second side L2.
  • the outer surface of the tip portion 72a is curved convexly toward the opposite side of the first major surface 20S; It may be generally straight or wholly or partially curved.
  • the thickness of the portion of the second end 72 other than the tip 72a is not particularly limited.
  • the thickness of the portion other than the tip 72a may be substantially uniform, and may become smaller as it approaches the tip 72a, or may increase as it approaches the tip 72a.
  • the thickness of the tip portion 72a gradually decreases as it approaches the second side L2.
  • the configuration shown in FIG. 4 is preferably observed in all cross sections of the tip 72a, but it is sufficient if it can be observed in at least one cross section of the tip 72a. If the structure shown in FIG. 4 can be observed even in one cross section, the heat retention of the electrolytic cell 1 can be improved at least in that part, and damage to the outer edge of the part can be suppressed.
  • the electrolytic cell 1 is formed into a rectangular shape extending in the longitudinal direction in plan view, but the electrolytic cell 1 is not limited to this.
  • the electrolytic cell 1 may be formed in a square shape when viewed from above, or may be formed into a rectangular shape extending in the lateral direction when viewed from above.
  • the planar shape of the first main surface 20S of the metal support 20 is a rectangle extending in the longitudinal direction, but it is not limited to this.
  • the planar shape of the first main surface 20S of the metal support 20 may be a square or a rectangle extending in the lateral direction.
  • the third and fourth ends 73 and 74 (see FIG. 1) extending along the transverse direction of the outer circumference of the electrolyte layer 7 may have the same configuration as the first and second ends 71 and 72, Alternatively, the first and second ends 71 and 72 may have different configurations.
  • the third and fourth ends 73 and 74 have the same configuration as the first and second ends 71 and 72, the heat retention of the electrolytic cell 1 can be further improved, and the electrolyte layer 7 Damage to the outer edge can be further suppressed.
  • the first end 71 of the electrolyte layer 7 may have a protrusion 71b.
  • the protrusion 71b is a portion of the first end 71 that protrudes outside the first main surface 20S of the metal support 20. That is, the protruding portion 71b is a portion of the first end portion 71 located outside the first reference line P1 (on the opposite side of the second reference line P2).
  • the protruding portion 71b is continuous with the tip portion 71a.
  • the protrusion 71b is integral with the tip 71a.
  • the protruding portion 71b covers at least a portion of the side surface 20U of the metal support 20. Thereby, the side surface 20U can be covered with the protruding portion 71b, so that heat radiation from the metal support 20 can be further suppressed.
  • the tip 71a of the first end 71 is defined by the first and second reference lines P1 and P2.
  • the second end 72 of the electrolyte layer 7 may also have a protrusion.
  • the hydrogen electrode layer 6 functions as a cathode and the oxygen electrode layer 9 functions as an anode, but even if the hydrogen electrode layer 6 functions as an anode and the oxygen electrode layer 9 functions as a cathode, good.
  • the constituent materials of the hydrogen electrode layer 6 and the oxygen electrode layer 9 are exchanged, and the raw material gas is caused to flow over the outer surface of the hydrogen electrode layer 6.
  • the electrolytic cell 1 has been described as an example of an electrochemical cell, but the electrochemical cell is not limited to an electrolytic cell.
  • An electrochemical cell consists of an element with a pair of electrodes arranged so that an electromotive force is generated from the overall redox reaction, and an element that converts chemical energy into electrical energy. It is a generic term. Therefore, electrochemical cells include, for example, fuel cells that use oxide ions or protons as carriers.

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Abstract

An electrochemical cell (1) comprises a cell body (10) and a metal support (20). The metal support (20) has a first main surface (20S) that supports the cell body (10). An electrolyte layer (7) has a first end section (71) that covers a first edge (L1) of the first main surface (20S). The first end section (71) becomes thinner towards the first edge (L1) in a direction parallel to the first main surface (20S).

Description

電気化学セルelectrochemical cell
　本発明は、電気化学セルに関する。 The present invention relates to an electrochemical cell.
　電気化学セル（電解セル、燃料電池など）において、金属支持体によってセル本体部を支持する構造が知られている。例えば、特許文献１に記載された電気化学セルは、第１電極層、電解質層、及び第２電極層がこの順で金属支持体の主面上に積層されたセル本体部を備える。電解質層は第１電極層を覆っており、その端部はセル本体部の主面に接続されている。 In electrochemical cells (electrolytic cells, fuel cells, etc.), a structure in which the cell body is supported by a metal support is known. For example, the electrochemical cell described in Patent Document 1 includes a cell main body in which a first electrode layer, an electrolyte layer, and a second electrode layer are laminated in this order on the main surface of a metal support. The electrolyte layer covers the first electrode layer, and its ends are connected to the main surface of the cell body.
特開２０２０－１５５３３７号JP2020-155337
　電気化学セルの保温性を向上させるには、金属支持体の主面を電解質層の端部で覆うことによって金属支持体からの放熱を抑制することが有効である。しかしながら、電解質層の端部を金属支持体の主面の端まで形成すると、電解質層の端部に損傷（角割れ、クラックなど）が生じやすい。 In order to improve the heat retention of an electrochemical cell, it is effective to suppress heat radiation from the metal support by covering the main surface of the metal support with the end of the electrolyte layer. However, if the end of the electrolyte layer is formed up to the end of the main surface of the metal support, damage (corner cracks, cracks, etc.) is likely to occur at the end of the electrolyte layer.
　本発明の課題は、電解質層の損傷を抑制可能な電気化学セルを提供することにある。 An object of the present invention is to provide an electrochemical cell that can suppress damage to an electrolyte layer.
　本発明の一側面に係る電気化学セルは、セル本体部と、金属支持体とを備える。セル本体部は、第１電極層、第２電極層、及び第１電極層と第２電極層との間に配置される電解質層を有する。金属支持体は、セル本体部を支持する主面、及び複数の供給孔を有する。電解質層は、主面の第１辺を覆う第１端部を有する。第１端部は、主面と平行な方向において第１辺に近づくほど薄くなっている。 An electrochemical cell according to one aspect of the present invention includes a cell main body and a metal support. The cell body includes a first electrode layer, a second electrode layer, and an electrolyte layer disposed between the first electrode layer and the second electrode layer. The metal support has a main surface that supports the cell body and a plurality of supply holes. The electrolyte layer has a first end that covers the first side of the main surface. The first end becomes thinner as it approaches the first side in a direction parallel to the main surface.
　本発明によれば、電解質層の損傷を抑制可能な電気化学セルを提供することができる。 According to the present invention, it is possible to provide an electrochemical cell that can suppress damage to an electrolyte layer.
図１は、実施形態に係る電解セルの平面図である。FIG. 1 is a plan view of an electrolysis cell according to an embodiment. 図２は、図１のＡ－Ａ断面図である。FIG. 2 is a sectional view taken along line AA in FIG. 図３は、図２の部分拡大図である。FIG. 3 is a partially enlarged view of FIG. 2. 図４は、図２の部分拡大図である。FIG. 4 is a partially enlarged view of FIG. 2. 図５は、変形例４に係る電解質層の断面図である。FIG. 5 is a cross-sectional view of an electrolyte layer according to modification example 4.
　（電解セル１）
　図１は、実施形態に係る電解セル１の平面図である。図２は、図１のＡ－Ａ断面図である。電解セル１は、本発明に係る「電気化学セル」の一例である。 (Electrolysis cell 1)
FIG. 1 is a plan view of an electrolytic cell 1 according to an embodiment. FIG. 2 is a sectional view taken along line AA in FIG. The electrolytic cell 1 is an example of an "electrochemical cell" according to the present invention.
　電解セル１は、板状に形成される。電解セル１は、平面視において長手方向（Ｙ軸方向）に延びる長方形に形成される。 The electrolytic cell 1 is formed into a plate shape. The electrolytic cell 1 is formed into a rectangle extending in the longitudinal direction (Y-axis direction) in plan view.
　図２に示すように、電解セル１は、セル本体部１０、金属支持体２０、及び流路部材３０を備える。 As shown in FIG. 2, the electrolytic cell 1 includes a cell main body 10, a metal support 20, and a channel member 30.
　［セル本体部１０］
　セル本体部１０は、水素極層６（カソード）、電解質層７、反応防止層８、及び酸素極層９（アノード）を有する。水素極層６、電解質層７、反応防止層８、及び酸素極層９は、この順で金属支持体２０側から積層されている。水素極層６、電解質層７、及び酸素極層９は必須の構成であり、反応防止層８は任意の構成である。 [Cell body part 10]
The cell main body 10 includes a hydrogen electrode layer 6 (cathode), an electrolyte layer 7, a reaction prevention layer 8, and an oxygen electrode layer 9 (anode). The hydrogen electrode layer 6, the electrolyte layer 7, the reaction prevention layer 8, and the oxygen electrode layer 9 are laminated in this order from the metal support 20 side. The hydrogen electrode layer 6, the electrolyte layer 7, and the oxygen electrode layer 9 are essential structures, and the reaction prevention layer 8 is an optional structure.
　［水素極層６］
　水素極層６は、金属支持体２０と電解質層７との間に配置される。水素極層６は、金属支持体２０によって支持される。詳細には、水素極層６は、金属支持体２０の第１主面２０Ｓ上に配置される。水素極層６は、金属支持体２０の第１主面２０Ｓのうち複数の供給孔２１が設けられた領域を覆う。水素極層６は、各供給孔２１内に入り込んでいてよい。水素極層６は、本発明に係る「第１電極層」の一例である。 [Hydrogen pole layer 6]
Hydrogen electrode layer 6 is arranged between metal support 20 and electrolyte layer 7. Hydrogen electrode layer 6 is supported by metal support 20 . Specifically, the hydrogen electrode layer 6 is arranged on the first main surface 20S of the metal support 20. The hydrogen electrode layer 6 covers a region of the first main surface 20S of the metal support 20 where the plurality of supply holes 21 are provided. The hydrogen electrode layer 6 may enter into each supply hole 21 . The hydrogen electrode layer 6 is an example of the "first electrode layer" according to the present invention.
　水素極６には、各供給孔２１を介して原料ガスが供給される。原料ガスは、少なくともＨ２Ｏを含む。 Raw material gas is supplied to the hydrogen electrode 6 through each supply hole 21 . The source gas contains at least H 2 O.
　原料ガスがＨ２Ｏのみを含む場合、水素極６は、下記（１）式に示す水電解の電気化学反応に従って、原料ガスからＨ２を生成する。
　・水素極６：Ｈ２Ｏ＋２ｅ－→Ｈ２＋Ｏ２－・・・（１） When the source gas contains only H 2 O, the hydrogen electrode 6 generates H 2 from the source gas according to the electrochemical reaction of water electrolysis shown in equation (1) below.
・Hydrogen electrode 6: H 2 O + 2e - → H 2 + O 2 - (1)
　原料ガスがＨ２Ｏに加えてＣＯ２を含む場合、水素極６は、下記（２）、（３）、（４）式に示す共電解の電気化学反応に従って、原料ガスからＨ２、ＣＯ及びＯ２－を生成する。
　・水素極６：ＣＯ２＋Ｈ２Ｏ＋４ｅ－→ＣＯ＋Ｈ２＋２Ｏ２－・・・（２）
　・Ｈ２Ｏの電気化学反応：Ｈ２Ｏ＋２ｅ－→Ｈ２＋Ｏ２－・・・（３）
　・ＣＯ２の電気化学反応：ＣＯ２＋２ｅ－→ＣＯ＋Ｏ２－・・・（４） When the raw material gas contains CO 2 in addition to H 2 O, the hydrogen electrode 6 extracts H 2 and CO from the raw material gas according to the electrochemical reaction of co-electrolysis shown in the following equations (2), (3), and (4). and O 2- is produced.
・Hydrogen electrode 6: CO 2 +H 2 O+4e - →CO+H 2 +2O 2-... (2)
・Electrochemical reaction of H 2 O: H 2 O + 2e - → H 2 + O 2 - (3)
・Electrochemical reaction of CO 2 : CO 2 +2e - → CO + O 2 -... (4)
　水素極層６は、電子伝導性を有する多孔質材料によって構成される。水素極層６は、酸化物イオン伝導性を有していてよい。水素極層６は、例えば、８ｍｏｌ％イットリア安定化ジルコニア（８ＹＳＺ）、カルシア安定化ジルコニア（ＣＳＺ）、スカンジア安定化ジルコニア（ＳｃＳＺ）、ガドリニウムドープセリア（ＧＤＣ）、サマリウムドープセリア（ＳＤＣ）、（Ｌａ，Ｓｒ）（Ｃｒ，Ｍｎ）Ｏ３、（Ｌａ，Ｓｒ）ＴｉＯ３、Ｓｒ２（Ｆｅ,Ｍｏ）２Ｏ６、（Ｌａ，Ｓｒ）ＶＯ３、（Ｌａ，Ｓｒ）ＦｅＯ３、及びこれらのうち２つ以上を組み合わせた混合材料、或いは、これらのうち１つ以上とＮｉＯとの複合物によって構成することができる。 The hydrogen electrode layer 6 is made of a porous material having electron conductivity. The hydrogen electrode layer 6 may have oxide ion conductivity. The hydrogen electrode layer 6 is made of, for example, 8 mol% yttria-stabilized zirconia (8YSZ), calcia-stabilized zirconia (CSZ), scandia-stabilized zirconia (ScSZ), gadolinium-doped ceria (GDC), samarium-doped ceria (SDC), (La ,Sr)(Cr, Mn)O3, (La,Sr)TiO3, Sr2(Fe,Mo)2O6 , ( La , Sr) VO3 , (La,Sr) FeO3 , and among these It can be composed of a mixed material combining two or more of them, or a composite of one or more of these and NiO.
　水素極層６の気孔率は特に制限されないが、例えば５％以上７０％以下とすることができる。水素極層６の厚みは特に制限されないが、例えば１μｍ以上１００μｍ以下とすることができる。 The porosity of the hydrogen electrode layer 6 is not particularly limited, but can be, for example, 5% or more and 70% or less. The thickness of the hydrogen electrode layer 6 is not particularly limited, but may be, for example, 1 μm or more and 100 μm or less.
　水素極層６の形成方法は特に制限されず、焼成法、スプレーコーティング法（溶射法、エアロゾルデポジション法、エアロゾルガスデポジッション法、パウダージェットデポジッション法、パーティクルジェットデポジション法、コールドスプレー法など）、ＰＶＤ法（スパッタリング法、パルスレーザーデポジション法など）、ＣＶＤ法などを用いることができる。 The method for forming the hydrogen electrode layer 6 is not particularly limited, and may include a baking method, a spray coating method (thermal spray method, aerosol deposition method, aerosol gas deposition method, powder jet deposition method, particle jet deposition method, cold spray method, etc.) ), PVD method (sputtering method, pulsed laser deposition method, etc.), CVD method, etc. can be used.
　［電解質層７］
　電解質層７は、水素極層６及び酸素極層９の間に配置される。電解質層７は、水素極層６の全体を覆う。本実施形態において、電解質層７は、水素極層６及び反応防止層８の間に配置され、水素極層６及び反応防止層８それぞれに接続される。 [Electrolyte layer 7]
Electrolyte layer 7 is arranged between hydrogen electrode layer 6 and oxygen electrode layer 9. Electrolyte layer 7 covers the entire hydrogen electrode layer 6 . In this embodiment, the electrolyte layer 7 is disposed between the hydrogen electrode layer 6 and the reaction prevention layer 8, and is connected to the hydrogen electrode layer 6 and the reaction prevention layer 8, respectively.
　電解質層７の外周部は、金属支持体２０の第１主面２０Ｓに接合される。これによって、水素極層６側と酸素極層９側との間の気密性を確保できるため、金属支持体２０と電解質層７との間を別途封止する必要がない。なお、電解質層７の外周部とは、電解質層７のうち、金属支持体２０の第１主面２０Ｓに接続される部分である。 The outer peripheral portion of the electrolyte layer 7 is joined to the first main surface 20S of the metal support 20. This ensures airtightness between the hydrogen electrode layer 6 side and the oxygen electrode layer 9 side, so there is no need to separately seal between the metal support 20 and the electrolyte layer 7. Note that the outer peripheral portion of the electrolyte layer 7 is a portion of the electrolyte layer 7 that is connected to the first main surface 20S of the metal support 20.
　図１に示すように、電解質層７は、第１端部７１及び第２端部７２を有する。第１及び第２端部７１，７２は、短手方向（Ｘ軸方向）における電解質層７の両端部である。第１及び第２端部７１，７２それぞれは、長手方向に沿って延びる。 As shown in FIG. 1, the electrolyte layer 7 has a first end 71 and a second end 72. The first and second ends 71 and 72 are both ends of the electrolyte layer 7 in the transverse direction (X-axis direction). Each of the first and second ends 71 and 72 extends along the longitudinal direction.
　第１端部７１は、電解質層７の外周部のうち、第１主面２０Ｓの第１辺Ｌ１に沿って延びる部分である。第２端部７２は、電解質層７の外周部のうち、第１主面２０Ｓの第２辺Ｌ２に沿って延びる部分である。第１及び第２端部７１，７２の構成については後述する。 The first end portion 71 is a portion of the outer peripheral portion of the electrolyte layer 7 that extends along the first side L1 of the first main surface 20S. The second end portion 72 is a portion of the outer peripheral portion of the electrolyte layer 7 that extends along the second side L2 of the first main surface 20S. The configurations of the first and second end portions 71 and 72 will be described later.
　電解質層７は、水素極層６において生成されたＯ２－を酸素極層９に伝達させる。電解質層７は酸化物イオン伝導性を有する緻密質材料によって構成される。電解質層７は、例えば、８ＹＳＺ、ＬＳＧＭ（ランタンガレート）、ＧＤＣ（ガドリニウムドープセリア）などによって構成することができる。 The electrolyte layer 7 transmits O 2− generated in the hydrogen electrode layer 6 to the oxygen electrode layer 9. The electrolyte layer 7 is made of a dense material having oxide ion conductivity. The electrolyte layer 7 can be made of, for example, 8YSZ, LSGM (lanthanum gallate), GDC (gadolinium doped ceria), or the like.
　電解質層７は、イオン伝導性を有し且つ電子伝導性を有さない緻密な材料によって構成される。電解質層７は、例えば、ＹＳＺ（８ＹＳＺ）、ＧＤＣ、ＳｃＳＺ、ＳＤＣ、ＬＳＧＭ（ランタンガレート）などによって構成することができる。 The electrolyte layer 7 is made of a dense material that has ionic conductivity and no electronic conductivity. The electrolyte layer 7 can be made of, for example, YSZ (8YSZ), GDC, ScSZ, SDC, LSGM (lanthanum gallate), or the like.
　電解質層７の気孔率は特に制限されないが、例えば０．１％以上７％以下とすることができる。電解質層７の厚みは特に制限されないが、例えば１μｍ以上１００μｍ以下とすることができる。 The porosity of the electrolyte layer 7 is not particularly limited, but can be, for example, 0.1% or more and 7% or less. The thickness of the electrolyte layer 7 is not particularly limited, but may be, for example, 1 μm or more and 100 μm or less.
　電解質層７の形成方法は特に制限されず、焼成法、スプレーコーティング法、ＰＶＤ法、ＣＶＤ法などを用いることができる。 The method for forming the electrolyte layer 7 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
　［反応防止層８］
　反応防止層８は、電解質層７及び酸素極層９の間に配置される。反応防止層８は、電解質層７を介して水素極層６の反対側に配置される。本実施形態において、反応防止層８は、電解質層７に接続される。反応防止層８は、電解質層７と酸素極層９とが反応して電気抵抗の大きい反応層が形成されることを抑制する機能を有する。 [Reaction prevention layer 8]
Reaction prevention layer 8 is arranged between electrolyte layer 7 and oxygen electrode layer 9. The reaction prevention layer 8 is arranged on the opposite side of the hydrogen electrode layer 6 with the electrolyte layer 7 in between. In this embodiment, the reaction prevention layer 8 is connected to the electrolyte layer 7. The reaction prevention layer 8 has a function of suppressing the formation of a reaction layer with high electrical resistance due to reaction between the electrolyte layer 7 and the oxygen electrode layer 9.
　反応防止層８は、酸化物イオン伝導性材料によって構成される。反応防止層８は、ＧＤＣ、ＳＤＣなどによって構成することができる。 The reaction prevention layer 8 is made of an oxide ion conductive material. The reaction prevention layer 8 can be made of GDC, SDC, or the like.
　反応防止層８の気孔率は特に制限されないが、例えば０．１％以上５０％以下とすることができる。反応防止層８の厚みは特に制限されないが、例えば１μｍ以上５０μｍ以下とすることができる。 The porosity of the reaction prevention layer 8 is not particularly limited, but may be, for example, 0.1% or more and 50% or less. The thickness of the reaction prevention layer 8 is not particularly limited, but may be, for example, 1 μm or more and 50 μm or less.
　反応防止層８の形成方法は特に制限されず、焼成法、スプレーコーティング法、ＰＶＤ法、ＣＶＤ法などを用いることができる。 The method for forming the reaction prevention layer 8 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
　［酸素極層９］
　酸素極層９は、電解質層７を基準として水素極層６の反対側に配置される。本実施形態では、電解セル１が反応防止層８を備えているため、酸素極層９は反応防止層８に接続される。電解セル１が反応防止層８を備えていない場合、酸素極層９は電解質層７上に接続される。酸素極層９は、本発明に係る「第２電極層」の一例である。 [Oxygen electrode layer 9]
The oxygen electrode layer 9 is arranged on the opposite side of the hydrogen electrode layer 6 with respect to the electrolyte layer 7. In this embodiment, since the electrolytic cell 1 includes the reaction prevention layer 8, the oxygen electrode layer 9 is connected to the reaction prevention layer 8. If the electrolytic cell 1 does not include the reaction prevention layer 8, the oxygen electrode layer 9 is connected onto the electrolyte layer 7. The oxygen electrode layer 9 is an example of the "second electrode layer" according to the present invention.
　酸素極層９は、下記（２）式の化学反応に従って、水素極層６から電解質層７を介して伝達されるＯ２－からＯ２を生成する。
　・酸素極層９：２Ｏ２－→Ｏ２＋４ｅ－・・・（２） The oxygen electrode layer 9 generates O 2 from O 2− transmitted from the hydrogen electrode layer 6 through the electrolyte layer 7 according to the chemical reaction of equation (2) below.
・Oxygen electrode layer 9: 2O 2- →O 2 +4e - (2)
　酸素極層９は、酸化物イオン伝導性及び電子伝導性を有する多孔質材料によって構成される。酸素極層９は、例えば（Ｌａ，Ｓｒ）（Ｃｏ，Ｆｅ）Ｏ３、（Ｌａ，Ｓｒ）ＦｅＯ３、Ｌａ（Ｎｉ，Ｆｅ）Ｏ３、（Ｌａ，Ｓｒ）ＣｏＯ３、及び（Ｓｍ，Ｓｒ）ＣｏＯ３のうち１つ以上と酸化物イオン伝導材料（ＧＤＣなど）との複合物によって構成することができる。 The oxygen electrode layer 9 is made of a porous material having oxide ion conductivity and electron conductivity. The oxygen electrode layer 9 is made of, for example, (La,Sr)(Co,Fe) O3 , (La,Sr) FeO3 , La(Ni,Fe) O3 , (La,Sr) CoO3 , and (Sm,Sr). ) CoO 3 and an oxide ion conductive material (GDC, etc.).
　酸素極層９の気孔率は特に制限されないが、例えば２０％以上６０％以下とすることができる。酸素極層９の厚みは特に制限されないが、例えば１μｍ以上１００μｍ以下とすることができる。 The porosity of the oxygen electrode layer 9 is not particularly limited, but can be, for example, 20% or more and 60% or less. The thickness of the oxygen electrode layer 9 is not particularly limited, but may be, for example, 1 μm or more and 100 μm or less.
　酸素極層９の形成方法は特に制限されず、焼成法、スプレーコーティング法、ＰＶＤ法、ＣＶＤ法などを用いることができる。 The method of forming the oxygen electrode layer 9 is not particularly limited, and a baking method, a spray coating method, a PVD method, a CVD method, etc. can be used.
　［金属支持体２０］
　金属支持体２０は、セル本体部１０を支持する。金属支持体２０は、板状に形成される。金属支持体２０は、平板状であってもよいし、曲板状であってもよい。金属支持体２０は電解セル１の強度を保つことができればよく、その厚みは特に制限されないが、例えば０．１ｍｍ以上２．０ｍｍ以下とすることができる。 [Metal support 20]
The metal support 20 supports the cell main body 10 . The metal support 20 is formed into a plate shape. The metal support 20 may have a flat plate shape or a curved plate shape. The thickness of the metal support 20 is not particularly limited as long as it can maintain the strength of the electrolytic cell 1, and may be, for example, 0.1 mm or more and 2.0 mm or less.
　金属支持体２０は、複数の供給孔２１、第１主面２０Ｓ、及び第２主面２０Ｔを有する。第１主面２０Ｓは、本発明に係る「主面」の一例である。 The metal support 20 has a plurality of supply holes 21, a first main surface 20S, and a second main surface 20T. The first main surface 20S is an example of the "main surface" according to the present invention.
　各供給孔２１は、第１主面２０Ｓから第２主面２０Ｔまで金属支持体２０を貫通する。各供給孔２１は、第１主面２０Ｓ及び第２主面２０Ｔに開口する。各供給孔２１は、第１主面２０Ｓのうち水素極層６に接合される領域に形成される。各供給孔２１は、金属支持体２０と流路部材３０との間に形成される流路３０ａに繋がる。 Each supply hole 21 penetrates the metal support 20 from the first main surface 20S to the second main surface 20T. Each supply hole 21 opens to the first main surface 20S and the second main surface 20T. Each supply hole 21 is formed in a region of the first main surface 20S that is joined to the hydrogen electrode layer 6. Each supply hole 21 is connected to a flow path 30a formed between the metal support 20 and the flow path member 30.
　各供給孔２１は、機械加工（例えば、パンチング加工）、レーザ加工、或いは、化学加工（例えば、エッチング加工）などによって形成することができる。或いは、金属支持体２０が多孔質金属によって構成される場合、各供給孔２１は多孔質金属内の気孔であってよい。従って、各供給孔２１は、第１主面２０Ｓ及び第２主面２０Ｔに垂直に形成されていなくてよい。 Each supply hole 21 can be formed by mechanical processing (for example, punching process), laser processing, chemical processing (for example, etching process), or the like. Alternatively, if the metal support 20 is made of porous metal, each supply hole 21 may be a pore within the porous metal. Therefore, each supply hole 21 does not need to be formed perpendicular to the first main surface 20S and the second main surface 20T.
　第１主面２０Ｓには、セル本体部１０が接合される。第２主面２０Ｔには、流路部材３０が接合される。第１主面２０Ｓは、第２主面２０Ｔの反対側に設けられる。 The cell main body portion 10 is joined to the first main surface 20S. The flow path member 30 is joined to the second main surface 20T. The first main surface 20S is provided on the opposite side of the second main surface 20T.
　ここで、図１には、第１主面２０Ｓを規定する４辺が図示されている。第１主面２０Ｓは、第１辺Ｌ１、第２辺Ｌ２、第３辺Ｌ３、及び第４辺Ｌ４によって規定される。第１主面２０Ｓは、金属支持体２０の外表面のうち、第１辺Ｌ１、第２辺Ｌ２、第３辺Ｌ３、及び第４辺Ｌ４によって囲まれた領域である。 Here, FIG. 1 shows four sides defining the first main surface 20S. The first main surface 20S is defined by a first side L1, a second side L2, a third side L3, and a fourth side L4. The first main surface 20S is a region of the outer surface of the metal support 20 surrounded by the first side L1, the second side L2, the third side L3, and the fourth side L4.
　第１主面２０Ｓの平面形状は、長手方向に延びる長方形である。第１辺Ｌ１と第２辺Ｌ２は、互いに平行である。第１及び第２辺Ｌ１，Ｌ２それぞれは、第１主面２０Ｓの長辺である。第１及び第２辺Ｌ１，Ｌ２それぞれは、長手方向と平行である。第３辺Ｌ３と第４辺Ｌ４は、互いに平行である。第３及び第４辺Ｌ３，Ｌ４それぞれは、第１主面２０Ｓの短辺である。第３及び第４辺Ｌ３，Ｌ４それぞれは、短手方向と平行である。なお、本明細書において、「平行」とは、厳密な意味で平行な場合だけでなく、実質的に平行（傾きが１０度以内）といえる場合をも含む概念である。 The planar shape of the first main surface 20S is a rectangle extending in the longitudinal direction. The first side L1 and the second side L2 are parallel to each other. Each of the first and second sides L1 and L2 is a long side of the first main surface 20S. Each of the first and second sides L1 and L2 is parallel to the longitudinal direction. The third side L3 and the fourth side L4 are parallel to each other. Each of the third and fourth sides L3 and L4 is a short side of the first main surface 20S. Each of the third and fourth sides L3 and L4 is parallel to the lateral direction. Note that in this specification, "parallel" is a concept that includes not only parallel in the strict sense but also substantially parallel (with an inclination of 10 degrees or less).
　金属支持体２０は、金属材料によって構成される。例えば、金属支持体２０は、Ｃｒ（クロム）を含有する合金材料によって構成される。このような金属材料としては、Ｆｅ－Ｃｒ系合金鋼（ステンレス鋼など）やＮｉ－Ｃｒ系合金鋼などが挙げられる。金属支持体２０におけるＣｒの含有率は特に制限されないが、４質量％以上３０質量％以下とすることができる。 The metal support 20 is made of a metal material. For example, the metal support 20 is made of an alloy material containing Cr (chromium). Examples of such metal materials include Fe--Cr alloy steel (such as stainless steel) and Ni--Cr alloy steel. The content of Cr in the metal support 20 is not particularly limited, but can be 4% by mass or more and 30% by mass or less.
　金属支持体２０は、Ｔｉ（チタン）やＺｒ（ジルコニウム）を含有していてもよい。金属支持体２０におけるＴｉの含有率は特に制限されないが、０．０１ｍｏｌ％以上１．０ｍｏｌ％以下とすることができる。金属支持体２０におけるＺｒの含有率は特に制限されないが、０．０１ｍｏｌ％以上０．４ｍｏｌ％以下とすることができる。金属支持体２０は、ＴｉをＴｉＯ２（チタニア）として含有していてもよいし、ＺｒをＺｒＯ２（ジルコニア）として含有していてもよい。 The metal support 20 may contain Ti (titanium) or Zr (zirconium). The content of Ti in the metal support 20 is not particularly limited, but can be set to 0.01 mol% or more and 1.0 mol% or less. The content of Zr in the metal support 20 is not particularly limited, but can be set to 0.01 mol% or more and 0.4 mol% or less. The metal support 20 may contain Ti as TiO 2 (titania) or Zr as ZrO 2 (zirconia).
　金属支持体２０は、金属支持体２０の構成元素が酸化することによって形成される酸化皮膜を表面に有していてよい。酸化皮膜としては、例えば酸化クロム膜が代表的である。酸化皮膜は、金属支持体２０の表面を部分的又は全体的に覆う。また、酸化皮膜は、各供給孔２１の内壁面を部分的又は全体的に覆っていてもよい。 The metal support 20 may have an oxide film formed by oxidation of the constituent elements of the metal support 20 on its surface. A typical example of the oxide film is a chromium oxide film. The oxide film partially or completely covers the surface of the metal support 20. Further, the oxide film may partially or entirely cover the inner wall surface of each supply hole 21.
　［流路部材３０］
　流路部材３０は、金属支持体２０の第２主面２０Ｔに接合される。流路部材３０は、金属支持体２０との間に流路３０ａを形成する。流路３０ａには、原料ガスが供給される。流路３０ａに供給された原料ガスは、金属支持体２０の各供給孔２１を介して、セル本体部１０の水素極層６に供給される。 [Flow path member 30]
The flow path member 30 is joined to the second main surface 20T of the metal support 20. The channel member 30 forms a channel 30a between it and the metal support 20. A raw material gas is supplied to the flow path 30a. The raw material gas supplied to the flow path 30a is supplied to the hydrogen electrode layer 6 of the cell main body 10 via each supply hole 21 of the metal support 20.
　流路部材３０は、例えば、合金材料によって構成することができる。流路部材３０は、金属支持体２０と同様の材料によって形成されていてよい。この場合、流路部材３０は、金属支持体２０と実質的に一体であってよい。 The flow path member 30 can be made of an alloy material, for example. The flow path member 30 may be formed of the same material as the metal support 20. In this case, the channel member 30 may be substantially integral with the metal support 20.
　流路部材３０は、枠体３１及びインターコネクタ３２を有する。枠体３１は、流路３０ａの側方を取り囲む環状部材である。枠体３１は、金属支持体２０の第２主面２０Ｔに接合される。インターコネクタ３２は、電解セル１を外部電源又は他の電解セルと電気的に直列に接続するための板状部材である。インターコネクタ３２は、枠体３１に接合される。 The flow path member 30 has a frame 31 and an interconnector 32. The frame body 31 is an annular member that surrounds the sides of the flow path 30a. The frame 31 is joined to the second main surface 20T of the metal support 20. The interconnector 32 is a plate-like member for electrically connecting the electrolytic cell 1 to an external power source or other electrolytic cells in series. The interconnector 32 is joined to the frame 31.
　このように、本実施形態に係る流路部材３０では、枠体３１及びインターコネクタ３２が別部材となっているが、枠体３１及びインターコネクタ３２は一体であってよい。 In this way, in the flow path member 30 according to the present embodiment, the frame 31 and the interconnector 32 are separate members, but the frame 31 and the interconnector 32 may be integrated.
　［電解質層７の第１端部７１の構成］
　次に、電解質層７の第１端部７１の構成について説明する。図３は、図２の部分拡大図である。 [Configuration of first end 71 of electrolyte layer 7]
Next, the configuration of the first end portion 71 of the electrolyte layer 7 will be explained. FIG. 3 is a partially enlarged view of FIG. 2.
　図３に示すように、第１端部７１は、金属支持体２０の第１主面２０Ｓに接続される。第１端部７１は、第１主面２０Ｓの第１辺Ｌ１を覆う。すなわち、第１端部７１は、第１主面２０Ｓのうち水素極層６から露出した領域を端まで覆っている。これによって、金属支持体２０からの放熱を抑制できるため、電解セル１の保温性を向上させることができる。 As shown in FIG. 3, the first end 71 is connected to the first main surface 20S of the metal support 20. The first end portion 71 covers the first side L1 of the first main surface 20S. That is, the first end portion 71 covers the region of the first main surface 20S exposed from the hydrogen electrode layer 6 to the end. Thereby, heat radiation from the metal support 20 can be suppressed, so that the heat retention of the electrolytic cell 1 can be improved.
　図３に示すように、第１端部７１は、第１主面２０Ｓと平行な短手方向において第１辺Ｌ１に近づくほど薄くなっている。詳細には、第１端部７１は、第１辺Ｌ１を覆う先端部７１ａを有しており、先端部７１ａの厚みは、短手方向において第１辺Ｌ１に近づくに従って徐々に小さくなっている。これによって、先端部７１ａの外縁に損傷（角割れ、クラックなど）が生じることを抑制できる。 As shown in FIG. 3, the first end portion 71 becomes thinner as it approaches the first side L1 in the lateral direction parallel to the first main surface 20S. Specifically, the first end 71 has a tip 71a that covers the first side L1, and the thickness of the tip 71a gradually decreases as it approaches the first side L1 in the lateral direction. . This can prevent damage (corner cracks, cracks, etc.) from occurring on the outer edge of the tip portion 71a.
　ここで、平面形状が長方形である電解セル１は、短手方向に比べて長手方向において大きく熱伸縮する。そのため、電解質層７の外周部のうち長手方向に沿った部分には短手方向に沿った部分に比べて大きな熱応力がかかりやすい。従って、第１端部７１の厚みを第１辺Ｌ１に近づくほど薄くすることによって、電解質層７のうち特に損傷しやすい部分を効果的に保護することができる。 Here, the electrolytic cell 1, which has a rectangular planar shape, thermally expands and contracts more in the longitudinal direction than in the transverse direction. Therefore, a larger thermal stress is likely to be applied to a portion along the longitudinal direction of the outer peripheral portion of the electrolyte layer 7 than to a portion along the transverse direction. Therefore, by making the thickness of the first end portion 71 thinner as it approaches the first side L1, the portion of the electrolyte layer 7 that is particularly easily damaged can be effectively protected.
　先端部７１ａは、電解質層７のうち第１基準線Ｐ１と第２基準線Ｐ２との間の部分である。第１基準線Ｐ１は、第１辺Ｌ１を通り、かつ、第１主面２０Ｓに垂直な直線である。第２基準線Ｐ２は、第１基準線Ｐ１から４μｍ内側に位置し、かつ、第１基準線Ｐ１と平行な直線である。 The tip portion 71a is a portion of the electrolyte layer 7 between the first reference line P1 and the second reference line P2. The first reference line P1 is a straight line that passes through the first side L1 and is perpendicular to the first main surface 20S. The second reference line P2 is a straight line located 4 μm inside from the first reference line P1 and parallel to the first reference line P1.
　先端部７１ａの厚みとは、第１主面２０Ｓに垂直な方向（Ｚ軸方向）における先端部７１ａの高さを意味する。先端部７１ａの厚みは、第２基準線Ｐ２と交差する位置で最大値となり、第１基準線Ｐ１と交差する位置で最小値となる。先端部７１ａの厚みは、第１辺Ｌ１に近づくに従って連続的に小さくなっていてよく、或いは、第１辺Ｌ１に近づくに従って段階的に小さくなっていてよい。 The thickness of the tip 71a means the height of the tip 71a in the direction perpendicular to the first main surface 20S (Z-axis direction). The thickness of the tip portion 71a has a maximum value at a position where it intersects with the second reference line P2, and a minimum value at a position where it intersects with the first reference line P1. The thickness of the tip portion 71a may be continuously reduced as it approaches the first side L1, or may be reduced in stages as it approaches the first side L1.
　従って、図３において、先端部７１ａの外表面は、第１主面２０Ｓの反対側に向かって凸状に湾曲しているが、第１主面２０Ｓ側に向かって凸状に湾曲していてよく、直線状であってよく、或いは、全体的又は部分的に屈曲していてよい。 Therefore, in FIG. 3, the outer surface of the tip portion 71a is curved convexly toward the side opposite to the first major surface 20S, but is curved convexly toward the first major surface 20S. It may be generally straight or wholly or partially curved.
　先端部７１ａの厚みが第１辺Ｌ１に近づくに従って徐々に小さくなっている限り、第１端部７１のうち先端部７１ａ以外の部分の厚みは特に限られない。先端部７１ａ以外の部分の厚みは、実質的に均一であってよく、先端部７１ａに近づくほど小さくなっていてよく、或いは、先端部７１ａに近づくほど大きくなっていてよい。 As long as the thickness of the tip 71a gradually decreases as it approaches the first side L1, the thickness of the portion of the first end 71 other than the tip 71a is not particularly limited. The thickness of the portion other than the tip 71a may be substantially uniform, and may become smaller as it approaches the tip 71a, or may increase as it approaches the tip 71a.
　以上、図３に示した一断面において、先端部７１ａの厚みが第１辺Ｌ１に近づくに従って徐々に小さくなっていることを説明した。図３に示した構成は、先端部７１ａの全ての断面において観察されることが好ましいが、先端部７１ａの少なくとも一断面において観察できればよい。図３に示した構成が一断面でも観察されるのであれば、少なくとも当該部分では電解セル１の保温性を向上させることができるとともに、当該部分の外縁に損傷が生じることを抑制できる。 It has been explained above that in the cross section shown in FIG. 3, the thickness of the tip portion 71a gradually decreases as it approaches the first side L1. The configuration shown in FIG. 3 is preferably observed in all cross sections of the tip 71a, but it is sufficient if it can be observed in at least one cross section of the tip 71a. If the configuration shown in FIG. 3 can be observed even in one cross section, the heat retention of the electrolytic cell 1 can be improved at least in that portion, and damage to the outer edge of the portion can be suppressed.
　［電解質層７の第２端部７２の構成］
　次に、電解質層７の第２端部７２の構成について説明する。図４は、図２の部分拡大図である。 [Configuration of second end 72 of electrolyte layer 7]
Next, the configuration of the second end portion 72 of the electrolyte layer 7 will be described. FIG. 4 is a partially enlarged view of FIG. 2.
　図４に示すように、第２端部７２は、金属支持体２０の第１主面２０Ｓに接続される。第２端部７２は、第１主面２０Ｓの第２辺Ｌ２を覆う。すなわち、第２端部７２は、第１主面２０Ｓのうち水素極層６から露出した領域を端まで覆っている。これによって、金属支持体２０からの放熱を抑制できるため、電解セル１の保温性を向上させることができる。 As shown in FIG. 4, the second end 72 is connected to the first main surface 20S of the metal support 20. The second end portion 72 covers the second side L2 of the first main surface 20S. That is, the second end portion 72 covers the region of the first main surface 20S exposed from the hydrogen electrode layer 6 to the end. Thereby, heat radiation from the metal support 20 can be suppressed, so that the heat retention of the electrolytic cell 1 can be improved.
　図４に示すように、第２端部７２は、第１主面２０Ｓと平行な短手方向において第２辺Ｌ２に近づくほど薄くなっている。詳細には、第２端部７２は、第２辺Ｌ２を覆う先端部７２ａを有しており、先端部７２ａの厚みは、短手方向において第２辺Ｌ２に近づくに従って徐々に小さくなっている。これによって、先端部７２ａの外縁に損傷（角割れ、クラックなど）が生じることを抑制できる。上述した第１端部７１と同様、第２端部７２には大きな熱応力がかかりやすいため、第２端部７２の厚みを第２辺Ｌ２に近づくほど薄くすることによって、電解質層７のうち特に損傷しやすい部分を効果的に保護することができる。 As shown in FIG. 4, the second end portion 72 becomes thinner as it approaches the second side L2 in the lateral direction parallel to the first main surface 20S. Specifically, the second end 72 has a tip 72a that covers the second side L2, and the thickness of the tip 72a gradually decreases as it approaches the second side L2 in the lateral direction. . This can prevent damage (corner breaks, cracks, etc.) from occurring on the outer edge of the tip portion 72a. Similar to the first end 71 described above, large thermal stress is easily applied to the second end 72. Therefore, by making the thickness of the second end 72 thinner as it approaches the second side L2, part of the electrolyte layer 7 is Particularly vulnerable parts can be effectively protected.
　先端部７２ａは、電解質層７のうち第３基準線Ｐ３と第４基準線Ｐ４との間の部分である。第３基準線Ｐ３は、第２辺Ｌ２を通り、かつ、第１主面２０Ｓに垂直な直線である。第４基準線Ｐ４は、第３基準線Ｐ３から４μｍ内側に位置し、かつ、第３基準線Ｐ３と平行な直線である。 The tip portion 72a is a portion of the electrolyte layer 7 between the third reference line P3 and the fourth reference line P4. The third reference line P3 is a straight line that passes through the second side L2 and is perpendicular to the first main surface 20S. The fourth reference line P4 is a straight line located 4 μm inside from the third reference line P3 and parallel to the third reference line P3.
　先端部７２ａの厚みとは、第１主面２０Ｓに垂直な方向における先端部７２ａの高さを意味する。先端部７２ａの厚みは、第４基準線Ｐ４と交差する位置で最大値となり、第３基準線Ｐ３と交差する位置で最小値となる。先端部７２ａの厚みは、第２辺Ｌ２に近づくに従って連続的に小さくなっていてよく、或いは、第２辺Ｌ２に近づくに従って段階的に小さくなっていてよい。 The thickness of the tip 72a means the height of the tip 72a in the direction perpendicular to the first main surface 20S. The thickness of the tip portion 72a has a maximum value at a position where it intersects with the fourth reference line P4, and a minimum value at a position where it intersects with the third reference line P3. The thickness of the tip portion 72a may be continuously reduced as it approaches the second side L2, or may be reduced in stages as it approaches the second side L2.
　従って、図４において、先端部７２ａの外表面は、第１主面２０Ｓの反対側に向かって凸状に湾曲しているが、第１主面２０Ｓ側に向かって凸状に湾曲していてよく、直線状であってよく、或いは、全体的又は部分的に屈曲していてよい。 Therefore, in FIG. 4, the outer surface of the tip portion 72a is curved convexly toward the opposite side of the first major surface 20S; It may be generally straight or wholly or partially curved.
　先端部７２ａの厚みが第２辺Ｌ２に近づくに従って徐々に小さくなっている限り、第２端部７２のうち先端部７２ａ以外の部分の厚みは特に限られない。先端部７２ａ以外の部分の厚みは、実質的に均一であってよく、先端部７２ａに近づくほど小さくなっていてよく、或いは、先端部７２ａに近づくほど大きくなっていてよい。 As long as the thickness of the tip 72a gradually decreases as it approaches the second side L2, the thickness of the portion of the second end 72 other than the tip 72a is not particularly limited. The thickness of the portion other than the tip 72a may be substantially uniform, and may become smaller as it approaches the tip 72a, or may increase as it approaches the tip 72a.
　以上、図４に示した一断面において、先端部７２ａの厚みが第２辺Ｌ２に近づくに従って徐々に小さくなっていることを説明した。図４に示した構成は、先端部７２ａの全ての断面において観察されることが好ましいが、先端部７２ａの少なくとも一断面において観察できればよい。図４に示した構成が一断面でも観察されるのであれば、少なくとも当該部分では電解セル１の保温性を向上させることができるとともに、当該部分の外縁に損傷が生じることを抑制できる。 It has been explained above that in the cross section shown in FIG. 4, the thickness of the tip portion 72a gradually decreases as it approaches the second side L2. The configuration shown in FIG. 4 is preferably observed in all cross sections of the tip 72a, but it is sufficient if it can be observed in at least one cross section of the tip 72a. If the structure shown in FIG. 4 can be observed even in one cross section, the heat retention of the electrolytic cell 1 can be improved at least in that part, and damage to the outer edge of the part can be suppressed.
　（実施形態の変形例）
　以上、本発明の実施形態について説明したが、本発明はこれらに限定されるものではなく、本発明の趣旨を逸脱しない限りにおいて種々の変更が可能である。 (Modified example of embodiment)
Although the embodiments of the present invention have been described above, the present invention is not limited to these, and various changes can be made without departing from the spirit of the present invention.
　［変形例１］
　上記実施形態において、電解セル１は、平面視において長手方向に延びる長方形に形成されることとしたが、これに限られない。電解セル１は、平面視において正方形に形成されていてよく、或いは、平面視において短手方向に延びる長方形に形成されていてよい。 [Modification 1]
In the embodiment described above, the electrolytic cell 1 is formed into a rectangular shape extending in the longitudinal direction in plan view, but the electrolytic cell 1 is not limited to this. The electrolytic cell 1 may be formed in a square shape when viewed from above, or may be formed into a rectangular shape extending in the lateral direction when viewed from above.
　［変形例２］
　上記実施形態において、金属支持体２０の第１主面２０Ｓの平面形状は、長手方向に延びる長方形であることとしたが、これに限られない。金属支持体２０の第１主面２０Ｓの平面形状は、正方形であってよく、或いは、短手方向に延びる長方形であってよい。 [Modification 2]
In the above embodiment, the planar shape of the first main surface 20S of the metal support 20 is a rectangle extending in the longitudinal direction, but it is not limited to this. The planar shape of the first main surface 20S of the metal support 20 may be a square or a rectangle extending in the lateral direction.
　［変形例３］
　電解質層７の外周部のうち短手方向に沿って延びる第３及び第４端部７３，７４（図１参照）は、第１及び第２端部７１，７２と同じ構成であってよく、或いは、第１及び第２端部７１，７２と異なる構成であってよい。第３及び第４端部７３，７４それぞれが第１及び第２端部７１，７２と同じ構成である場合には、電解セル１の保温性を更に向上させることができるとともに、電解質層７の外縁に損傷が生じることを更に抑制できる。 [Modification 3]
The third and fourth ends 73 and 74 (see FIG. 1) extending along the transverse direction of the outer circumference of the electrolyte layer 7 may have the same configuration as the first and second ends 71 and 72, Alternatively, the first and second ends 71 and 72 may have different configurations. When the third and fourth ends 73 and 74 have the same configuration as the first and second ends 71 and 72, the heat retention of the electrolytic cell 1 can be further improved, and the electrolyte layer 7 Damage to the outer edge can be further suppressed.
　［変形例４］
　図５に示すように、電解質層７の第１端部７１は、突出部７１ｂを有していてもよい。突出部７１ｂは、第１端部７１のうち金属支持体２０の第１主面２０Ｓの外側にはみ出た部分である。すなわち、突出部７１ｂは、第１端部７１のうち第１基準線Ｐ１より外側（第２基準線Ｐ２の反対側）に位置する部分である。突出部７１ｂは、先端部７１ａに連なる。突出部７１ｂは、先端部７１ａと一体である。 [Modification 4]
As shown in FIG. 5, the first end 71 of the electrolyte layer 7 may have a protrusion 71b. The protrusion 71b is a portion of the first end 71 that protrudes outside the first main surface 20S of the metal support 20. That is, the protruding portion 71b is a portion of the first end portion 71 located outside the first reference line P1 (on the opposite side of the second reference line P2). The protruding portion 71b is continuous with the tip portion 71a. The protrusion 71b is integral with the tip 71a.
　また、図５に示すように、突出部７１ｂは、金属支持体２０の側面２０Ｕのうち少なくとも一部を覆っていることが好ましい。これによって、側面２０Ｕを突出部７１ｂで被覆できるため、金属支持体２０からの放熱をさらに抑制することができる。 Further, as shown in FIG. 5, it is preferable that the protruding portion 71b covers at least a portion of the side surface 20U of the metal support 20. Thereby, the side surface 20U can be covered with the protruding portion 71b, so that heat radiation from the metal support 20 can be further suppressed.
　なお、第１端部７１が突出部７１ｂを有する場合であっても、第１端部７１の先端部７１ａは、第１及び第２基準線Ｐ１，Ｐ２によって規定される。また、図示しないが、電解質層７の第２端部７２も突出部を有していてもよい。 Note that even if the first end 71 has the protrusion 71b, the tip 71a of the first end 71 is defined by the first and second reference lines P1 and P2. Although not shown, the second end 72 of the electrolyte layer 7 may also have a protrusion.
　［変形例５］
　上記実施形態において、水素極層６はカソードとして機能し、酸素極層９はアノードとして機能することとしたが、水素極層６がアノードとして機能し、酸素極層９がカソードとして機能してもよい。この場合、水素極層６と酸素極層９の構成材料を入れ替えるとともに、水素極層６の外表面に原料ガスを流す。 [Modification 5]
In the above embodiment, the hydrogen electrode layer 6 functions as a cathode and the oxygen electrode layer 9 functions as an anode, but even if the hydrogen electrode layer 6 functions as an anode and the oxygen electrode layer 9 functions as a cathode, good. In this case, the constituent materials of the hydrogen electrode layer 6 and the oxygen electrode layer 9 are exchanged, and the raw material gas is caused to flow over the outer surface of the hydrogen electrode layer 6.
　［変形例６］
　上記実施形態では、電気化学セルの一例として電解セル１について説明したが、電気化学セルは電解セルに限られない。電気化学セルとは、電気エネルギーを化学エネルギーに変えるため、全体的な酸化還元反応から起電力が生じるように一対の電極が配置された素子と、化学エネルギーを電気エネルギーに変えるための素子との総称である。従って、電気化学セルには、例えば、酸化物イオン或いはプロトンをキャリアとする燃料電池が含まれる。 [Modification 6]
In the above embodiment, the electrolytic cell 1 has been described as an example of an electrochemical cell, but the electrochemical cell is not limited to an electrolytic cell. An electrochemical cell consists of an element with a pair of electrodes arranged so that an electromotive force is generated from the overall redox reaction, and an element that converts chemical energy into electrical energy. It is a generic term. Therefore, electrochemical cells include, for example, fuel cells that use oxide ions or protons as carriers.
１　　　セル
６　　　水素極層
７　　　電解質層
７１　　第１端部
７１ａ　先端部
７１ｂ　突出部
７２　　第２端部
７２ａ　先端部
７３　　第３端部
７４　　第４端部
８　　　反応防止層
９　　　酸素極層
１０　　セル本体部
２０　　金属支持体
２０Ｓ　第１主面
２１　　供給孔
３０　　流路部材
３０ａ　流路
Ｌ１～Ｌ４　　第１乃至第４辺
Ｐ１～Ｐ４　　第１乃至第４基準線 1 Cell 6 Hydrogen electrode layer 7 Electrolyte layer 71 First end 71a Tip 71b Projection 72 Second end 72a Tip 73 Third end 74 Fourth end 8 Reaction prevention layer 9 Oxygen electrode layer 10 Cell main body 20 Metal support 20S First main surface 21 Supply hole 30 Channel member 30a Channels L1 to L4 First to fourth sides P1 to P4 First to fourth reference lines

Claims (4)

  1. 　第１電極層、第２電極層、及び前記第１電極層と前記第２電極層との間に配置される電解質層を有するセル本体部と、
    　前記セル本体部を支持する主面、及び複数の供給孔を有する金属支持体と、
    を備え、
    　前記電解質層は、前記主面の第１辺を覆う第１端部を有し、
    　前記第１端部は、前記主面と平行な方向において前記第１辺に近づくほど薄くなっている、
    電気化学セル。     a cell main body having a first electrode layer, a second electrode layer, and an electrolyte layer disposed between the first electrode layer and the second electrode layer;
    a metal support having a main surface supporting the cell main body and a plurality of supply holes;
    Equipped with
    The electrolyte layer has a first end that covers a first side of the main surface,
    The first end portion becomes thinner as it approaches the first side in a direction parallel to the main surface.
    electrochemical cell.
  2. 　前記電解質層は、前記主面の第２辺を覆う第２端部を有し、
    　前記第２辺は、前記第１辺と平行であり、
    　前記第２端部は、前記主面と平行な方向において前記第２辺に近づくほど薄くなっている、
    請求項１に記載の電気化学セル。     The electrolyte layer has a second end covering a second side of the main surface,
    the second side is parallel to the first side,
    The second end portion becomes thinner as it approaches the second side in a direction parallel to the main surface.
    An electrochemical cell according to claim 1.
  3. 　前記主面は、長方形に形成され、
    　前記第１辺及び前記第２辺それぞれは、前記主面の長辺である、
    請求項２に記載の電気化学セル。     The main surface is formed into a rectangle,
    Each of the first side and the second side is a long side of the main surface,
    An electrochemical cell according to claim 2.
  4. 　前記電解質層は、前記主面の外側にはみ出た突出部を有し、
    　前記突出部は、前記金属支持体の側面のうち少なくとも一部を覆っている、
    請求項１乃至３のいずれかに記載の電気化学セル。     The electrolyte layer has a protrusion protruding outside the main surface,
    The protrusion covers at least a portion of the side surface of the metal support.
    An electrochemical cell according to any one of claims 1 to 3.
PCT/JP2023/005517 2022-03-08 2023-02-16 Electrochemical cell WO2023171297A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009041044A (en) * 2007-08-06 2009-02-26 Toshiba Corp Reaction cell, its production method, and reaction system
WO2020218334A1 (en) * 2019-04-24 2020-10-29 京セラ株式会社 Cell, cell stack device, module, and module accommodation device
JP2021111473A (en) * 2020-01-07 2021-08-02 東芝エネルギーシステムズ株式会社 Solid oxide electrochemical stack

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009041044A (en) * 2007-08-06 2009-02-26 Toshiba Corp Reaction cell, its production method, and reaction system
WO2020218334A1 (en) * 2019-04-24 2020-10-29 京セラ株式会社 Cell, cell stack device, module, and module accommodation device
JP2021111473A (en) * 2020-01-07 2021-08-02 東芝エネルギーシステムズ株式会社 Solid oxide electrochemical stack

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