WO2023159421A1 - 盖板结构、制备方法、显示装置及可显示的穿戴设备 - Google Patents
盖板结构、制备方法、显示装置及可显示的穿戴设备 Download PDFInfo
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- WO2023159421A1 WO2023159421A1 PCT/CN2022/077662 CN2022077662W WO2023159421A1 WO 2023159421 A1 WO2023159421 A1 WO 2023159421A1 CN 2022077662 W CN2022077662 W CN 2022077662W WO 2023159421 A1 WO2023159421 A1 WO 2023159421A1
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- WO
- WIPO (PCT)
- Prior art keywords
- cover plate
- microstructure
- platform
- light
- sunken
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title 1
- 238000002360 preparation method Methods 0.000 claims abstract description 12
- 238000005530 etching Methods 0.000 claims description 56
- 239000010410 layer Substances 0.000 claims description 52
- 239000012788 optical film Substances 0.000 claims description 19
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 17
- 238000005498 polishing Methods 0.000 claims description 13
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 9
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 9
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 9
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 239000011241 protective layer Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 239000012790 adhesive layer Substances 0.000 claims description 5
- 159000000001 potassium salts Chemical class 0.000 claims description 3
- 159000000000 sodium salts Chemical class 0.000 claims description 3
- 238000007789 sealing Methods 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 11
- 238000009434 installation Methods 0.000 abstract description 2
- 125000004429 atom Chemical group 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000003666 anti-fingerprint Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005381 potential energy Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- -1 KCI Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
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- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
Definitions
- the present disclosure relates to the field of display technology, in particular to a cover structure, a preparation method, a display device, and a displayable wearable device.
- the middle frame and the module of the whole machine are generally formed by pasting the edge of the middle frame and the cover plate.
- the whole process from the factory of the cover plate to the assembly of the module and then to the whole machine factory takes a long time, and factors such as poor control of pollutants cause the dyne value of the cover plate
- the drop is irreversible, and it is difficult to guarantee the high waterproof requirements of the whole machine.
- an embodiment of the present disclosure provides a cover structure applied to a display device, including:
- a cover plate the cover plate has a light-transmitting area and a peripheral edge area surrounding the light-transmitting area, the edge area on one side of the cover plate has a sunken platform, and the sunken platform surrounds the light-transmitting area
- the surface of the platform has a first microstructure, and the first microstructure includes at least one of a first protrusion and a first groove.
- the surface of the light-transmitting region on one side of the cover plate has a second microstructure, and the second microstructure includes at least one of a second protrusion and a second groove.
- the dyne value of the surface of the light-transmitting region on one side of the cover plate is greater than or equal to 32A.
- the surface of the light-transmitting area on one side of the cover is provided with an optical film layer.
- K 2 Si F 6 is included in the first microstructure.
- an ink layer is provided on the other side of the cover plate corresponding to the sink platform.
- an embodiment of the present disclosure provides a method for preparing a cover structure, including:
- a sunken platform is formed in an edge region of one side of the base body, and the sunken platform is arranged around the circumference of the light-transmitting region;
- a first microstructure is formed on the surface of the mesa, and the first microstructure includes at least one of a first protrusion and a first groove.
- the step of forming a first microstructure on the surface of the sunken platform includes:
- the etching solution includes hydrofluoric acid, concentrated sulfuric acid, ammonium bifluoride and ammonium sulfate.
- the step of etching the surface of the sinking platform with an etching solution to form the first microstructure it also includes:
- the method further includes: removing the protection layer.
- the mass ratio of hydrofluoric acid, concentrated sulfuric acid, ammonium bifluoride and ammonium sulfate in the etching solution is (2-4):(2-4):(4-7):(0.5-2).
- the etching solution also includes:
- the inorganic salts include at least one of sodium salts and potassium salts, and the mass fraction of the inorganic salts in the etching solution is 3%-30%.
- a second microstructure is formed on the surface of the light-transmitting region on one side of the base, and the second microstructure includes at least one of a second protrusion and a second groove.
- the step of etching the surface of the sinking platform with an etching solution to form the first microstructure it also includes:
- An ink layer is formed on the other side of the substrate in a region corresponding to the sink platform.
- an embodiment of the present disclosure provides a display device, including a cover structure, and the cover structure includes:
- a cover plate the cover plate has a light-transmitting area and a peripheral edge area surrounding the light-transmitting area, the edge area on one side of the cover plate has a sunken platform, and the sunken platform surrounds the light-transmitting area
- the surface of the platform has a first microstructure, and the first microstructure includes at least one of a first protrusion and a first groove.
- a frame body the frame body has a ring-shaped matching hole, and a limiting platform is provided on the inner side wall of the matching hole, and the limiting platform is arranged along the circumferential direction of the matching hole, and the frame body passes through the matching hole Sleeved on the cover plate, the limiting platform is arranged opposite to the sunken platform, and an adhesive layer is provided between the surface of the sunken platform and the side surface of the limiting platform facing the sunken platform .
- the surface of the light-transmitting region on one side of the cover plate has a second microstructure, and the second microstructure includes at least one of a second protrusion and a second groove; and/or
- the dyne value of the surface of the light-transmitting region on one side of the cover plate is greater than or equal to 32A; and/or
- the surface of the light-transmitting area on one side of the cover is provided with an optical film layer; and/or
- An ink layer is provided on the other side of the cover plate corresponding to the sink platform.
- an embodiment of the present disclosure provides a displayable wearable device, including a cover structure, and the cover structure includes:
- a cover plate the cover plate is circular, the cover plate has a light-transmitting area and a peripheral edge area surrounding the light-transmitting area, the edge area on one side of the cover plate has an annular sunken platform, The sunken platform is arranged around the circumference of the light-transmitting region, and the surface of the sunken platform has a first microstructure, and the first microstructure includes at least one of a first protrusion and a first groove.
- Fig. 1 is a structural schematic diagram of cover plate structure
- Figure 2 is a top view of the cover plate
- Figure 3a is a side view of the cover
- Figure 3b is another side view of the cover
- Fig. 4 is a schematic diagram of the cooperation between the cover plate and the frame
- Fig. 5 is another schematic diagram of the cooperation between the cover plate and the frame
- Fig. 6 is a schematic structural diagram of the frame
- Figure 7a is the surface structure of the sink platform etched by the KCI etching solution with a mass fraction of 0%;
- Figure 7b is the surface structure of the sink platform etched by the KCI etchant with a mass fraction of 7%;
- Fig. 7c is the surface structure of the sink platform etched by the KCI etchant with a mass fraction of 14%;
- Fig. 7d is the surface structure of the sink platform etched by KCI etching solution with a mass fraction of 20%;
- Figure 7e is the surface structure of the sink platform etched by the KCI etchant with a mass fraction of 25%;
- Fig. 8a is a schematic diagram of the surface structure of the sunken platform after etching by the etching solution
- Fig. 8b is another schematic diagram of the surface structure of the sunken platform after etching by the etching solution
- Fig. 9 is a schematic diagram of Young's equation contact angle
- Fig. 10 is a schematic diagram of the contact angle of the Wenzel equation.
- Cover plate 10 sunken platform 11; first protrusion 12; first groove 13;
- Frame body 30 Limit platform 31 ; matching hole 32 .
- cover plate structure provided by the embodiments of the present disclosure will be described in detail below through specific embodiments and application scenarios as shown in FIG. 1 to FIG. 10 .
- the cover plate structure of the embodiment of the present disclosure is applied to a display device.
- the cover plate structure includes: a cover plate 10 , the cover plate 10 has a light-transmitting area and circumferentially arranged edges surrounding the light-transmitting area In the area, the cover plate 10 can be made of glass material, and the cover plate 10 can be round or square, and the specific shape can be selected according to actual conditions.
- the edge area of one side of the cover plate 10 has a sunken platform 11 , that is, the thickness of the area where the sunken platform 11 is located on the cover plate 10 is smaller than the thickness of the light-transmitting area of the cover plate 10 .
- the sunken platform 11 is arranged around the circumference of the light-transmitting area.
- the cover plate 10 can be circular, and the sunken platform 11 can be ring-shaped.
- the surface of the sunken platform 11 has a first microstructure, and the first microstructure includes a first protrusion 12 and At least one of the first grooves 13, for example, the first microstructure may include first protrusions 12, and both the first protrusions 12 and the first grooves 13 may have a plurality, and may be evenly distributed on the surface of the sink platform 11, Through the first microstructure, the dyne value of the surface of the sink platform 11 can be effectively increased, so that the sink platform 11 and the frame body 30 can be more tightly matched, and the airtightness can be effectively guaranteed.
- the cover plate 10 has a light-transmitting area, and the display module can display in this area through the light-transmitting area.
- the surface of the sink platform 11 has a first microstructure, the first microstructure includes at least one of the first protrusion 12 and the first groove 13, and is provided on the sink platform 11
- the first microstructure can increase the dyne value of the surface of the sunken platform 11, so that the sunken platform 11 and the frame body 30 can be more tightly matched, which can effectively ensure the sealing performance, improve the waterproof effect, and prevent the sealing caused by the pollution of the sunken platform surface Bad effect problem.
- the surface of the light-transmitting region on one side of the cover plate 10 may have a second microstructure, and the second microstructure may include at least one of a second protrusion and a second groove.
- the second microstructure may include a second protrusion, and there may be multiple second protrusions and second grooves, which may be evenly distributed on the surface of the light-transmitting region on one side of the cover plate 10, and the second microstructure may effectively Increasing the dyne value of the surface of the light-transmitting area on one side of the cover plate 10 can make the optical film layer closely adhere to the surface of the light-transmitting area on one side of the cover plate 10 .
- the dyne value of the surface of the light-transmitting area on one side of the cover 10 may be greater than or equal to 32A, so that the optical film layer is closely attached to the surface of the light-transmitting area on one side of the cover 10, Guaranteed to be stable and firm.
- an optical film layer 20 may be provided on the surface of the light-transmitting area on one side of the cover plate 10, and the optical film layer 20 may include an anti-fingerprint film layer or an anti-reflection layer,
- the optical film layer 20 can be an anti-reflection layer to reduce reflection of light.
- K 2 SiF 6 may be included in the first microstructure, for example, the first microstructure includes a first protrusion 12 and a first groove 13, and the first protrusion 12 may be made of K 2 SiF 6 Composition, K 2 SiF 6 is relatively stable and not easily damaged, and having K 2 SiF 6 in the first microstructure can make the first microstructure stable and not easily damaged.
- an ink layer 21 may be provided on the other side of the cover plate 10 corresponding to the countertop 11 , and the ink layer 21 may serve as a light-shielding layer to prevent light from passing through.
- a base is provided, the base has a light-transmitting area and an edge area surrounding the circumference of the light-transmitting area, the base can be a glass material, the base can be round or square, and the specific shape can be selected according to actual conditions;
- the area can make the display module display in this area;
- a sunken platform 11 is formed at an edge area on one side of the base body, and the sunken platform 11 is arranged around the circumference of the light-transmitting area; for example, the base body may be circular, and the sunken platform 11 may be ring-shaped.
- a first microstructure is formed on the surface of the platform 11, and the first microstructure may include at least one of the first protrusion 12 and the first groove 13.
- the step of forming the first microstructure on the surface of the sink platform 11 may include:
- the etching solution may include hydrofluoric acid, concentrated sulfuric acid, ammonium bifluoride and ammonium sulfate.
- the solvent in the etching solution can be deionized water or other solvents, which can be selected according to actual conditions. After the chemical reaction of the etching solution, microcracks will not be generated, and the strength of the sink platform 11 will not be affected in any way.
- the step of etching the surface of the platform 11 with an etching solution to form the first microstructure it may further include:
- a protective layer is formed on the light-transmitting area on one side of the substrate; the protective layer can prevent the etching liquid from damaging the light-transmitting area on one side of the substrate, and the protective layer can be paraffin or acid-resistant protective film;
- the step of etching the surface of the sink platform 11 with the etchant to form the first microstructure it further includes: removing the protective layer.
- the mass ratio of hydrofluoric acid, concentrated sulfuric acid, ammonium bifluoride and ammonium sulfate in the etching solution is (2-4):(2-4):(4-7):(0.5-2).
- the mass ratio of hydrofluoric acid, concentrated sulfuric acid, ammonium bifluoride and ammonium sulfate in the etching solution is 3:3:6:1
- the solvent in the etching solution can be deionized water
- hydrofluoric acid: concentrated sulfuric acid : ammonium bifluoride: ammonium sulfate: water can be 3:3:6:1:16.
- the etching solution may also include: inorganic salts, the inorganic salts may include at least one of sodium salts and potassium salts, such as KCI, the mass of the inorganic salts in the etching solution The score is 3%-30%.
- hydrofluoric acid concentrated sulfuric acid: ammonium bifluoride: ammonium sulfate: water can be 3:3:6:1:16, and then add different mass fractions (0%, 7%, 14%, 20% , 25%) of KCI, prepare different etchant, and the surface structure after etching by the etchant of different mass fraction of KCI can be shown in Fig. 7a to Fig. 7e.
- the millimeter-scale island structure was formed, and the island structure gradually formed with the increase of KCI, and when the KCI exceeded 20%, the island structure was connected into a whole.
- the formation process can be shown in Figure 7a to Figure 7e, and finally K 2 SiF 6 precipitates are formed on the surface, as shown in Figure 8a and Figure 8b, c represents F atoms, d represents KF, a and b represent the formed on the surface
- the K 2 SiF 6 precipitate forms a surface with the first microstructure, and the roughness of the surface of the sink platform 11 can be controlled by the concentration of the etching solution.
- the surface of the sink platform 11 is etched by the etching solution to form deposits, which improves the surface roughness, increases the surface energy and dyne value, and ensures the strength of the cover plate.
- ⁇ c is the contact angle (water drop angle) as shown in Figure 9 below;
- ⁇ SG , ⁇ SL , and ⁇ LG correspond to solid-gas, solid-liquid, and liquid-gas interfacial tensions.
- Wenzel equation is proposed on the basis of Young's equation, which considers the solid-liquid contact angle under the rough interface. The equation is as follows:
- the contact situation can be shown in Figure 10, where ⁇ represents the interfacial tension, and ⁇ w represents the contact angle. It can be seen from the equation that when ⁇ c is less than 90°( ⁇ /2), the object exhibits hydrophilicity; when ⁇ (surface roughness ⁇ 1) When it increases, the cos ⁇ w value increases and ⁇ w decreases, and the macroscopic performance is more hydrophilic. When ⁇ c is greater than 90°( ⁇ /2), the object exhibits hydrophobicity; when ⁇ (surface roughness ⁇ 1) increases, the cos ⁇ w value decreases and ⁇ w increases, and the macroscopic performance is more hydrophobic.
- Surface energy principle Surface energy is a measure of the breaking of chemical bonds between molecules when creating the surface of a substance.
- surface atoms have more energy than atoms inside the material (because the internal atoms interact in space with the surrounding atoms in a state of force balance). According to the principle of the lowest energy, atoms will spontaneously tend to the interior of the material rather than the surface. It can also be simply understood that because the bond energy of the surface layer atoms towards the outside is not compensated, the surface particles have additional potential energy than the body particles, which is called surface energy.
- the surface energy of the object is high, it means that external particles are urgently needed to balance the excess bond energy on the surface, and the macroscopic performance is adsorption of other substances; capillarity, etc. If the surface of the cover plate absorbs dirt, the dirty particles make up for the excess bond energy of the surface particles of the cover plate, so the macroscopic performance is that the surface dyne value of the cover plate decreases, and the surface dyne value of the cover plate will decrease after cleaning. Return to the previous state (since there is no external bond to compensate for the bond energy of the cover, resulting in an increase in surface energy). Without changing the intrinsic properties and shape of the substance, increasing the surface energy can make more atoms on the surface of the object (and increase the surface roughness).
- the Wenzel equation explains that if the surface is hydrophilic, appropriately increasing the surface roughness can make the surface more hydrophilic (for the cover plate, the raw material itself is a hydrophilic substance, and the water drop angle is generally less than 20°). From a macroscopic point of view, the more hydrophilic and surface active the better, the higher the surface energy.
- the principle of surface energy points out that if the surface energy is to be increased without changing the constituent elements of the substance, more atoms are required to be on the surface (increasing the surface potential energy) and increasing the surface roughness. Based on the above two theories, it can be concluded that to increase the solid surface energy (and high factor value) can be made rougher by changing the microstructure of the solid surface (roughness here is relative to the microcosm).
- it may further include: forming a second microstructure on the surface of the light-transmitting region on one side of the substrate, the second microstructure including at least one of a second protrusion and a second groove.
- the second microstructure can include a second protrusion, and there can be multiple second protrusions and second grooves, which can be evenly distributed on the surface of the light-transmitting area on one side of the cover plate 10.
- the second microstructure can effectively Increasing the dyne value of the surface of the light-transmitting area on one side of the cover plate 10 can make the optical film layer closely adhere to the surface of the light-transmitting area on one side of the cover plate 10 .
- the second microstructure can be formed on the surface of the light-transmitting region on one side of the substrate by the above etching solution.
- the etchant can be applied to the surface of the platform 11 and the surface of the light-transmitting region on one side of the substrate at the same time to form a microstructure.
- the step of etching the surface of the platform 11 with an etching solution to form the first microstructure it further includes:
- the surface of the countertop 11 is polished. Polishing can make the surface of the countertop 11 smoother and reduce the generation of cracks.
- Micro-cracks on the surface of the sink platform 11 can be eliminated by polishing to prevent the strength of the cover plate from decreasing.
- Table 1 shows the strength test results of the surface of the sink platform 11 at different polishing times.
- micro-cracks on the surface of the countertop 11 can be eliminated by polishing, and the strength of the cover plate can be improved.
- the surface of the sink platform 11 will not produce microcracks after the chemical reaction.
- the surface of the sink platform 11 is polished, and the formation of the first microstructure by etching with the etchant will not cause cracks and will not affect the strength. influential.
- the preparation method may also include:
- An ink layer 21 is formed on the other side of the substrate in a region corresponding to the platform 11 .
- the ink layer 21 can be used as a light-shielding layer to prevent light from passing through.
- an ink layer 21 can be formed on the other side of the substrate corresponding to the sink platform 11, and the ink can be formed by silk screen printing. Layer 21.
- the surface of the sink platform 11 can be polished first, a protective layer is formed in the light-transmitting area on one side of the substrate, and the surface of the sink platform 11 is etched with an etching solution to form a first microstructure, Then remove the protective layer.
- an optical film layer 20 may be formed on the surface of the light-transmitting region on one side of the substrate, and the optical film layer 20 may include an anti-fingerprint film layer or an anti-reflection layer.
- the optical film layer 20 may be Anti-reflection layer to reduce reflection of light.
- the second microstructure can be formed on the surface of the light-transmitting region on one side of the substrate by the above etching solution.
- the microstructure is conducive to improving the compactness of the coating.
- the surface drop angle of the substrate before coating can be less than 20°. The smaller the surface drop angle and the more hydrophilic, the better the compactness of the coating.
- An ink layer 21 is formed on the other side of the substrate corresponding to the countertop 11, and the ink layer 21 can be formed by silk screen printing, and the surface water droplet angle in the area where the ink layer 21 is formed can be less than 20°.
- the dyne value of the light-transmitting region may be greater than or equal to 32A, and the surface structure microstructure of the light-transmitting region on one side of the substrate helps to increase the dyne value.
- An embodiment of the present disclosure provides a display device, including a cover structure.
- the cover structure includes: a cover 10 , the cover 10 has a light-transmitting area and an edge area surrounding the light-transmitting area, and one side of the cover 10
- the edge area of the platform has a sunken platform 11, the sunken platform 11 is arranged around the circumference of the light-transmitting area, the surface of the sunken platform 11 has a first microstructure, and the first microstructure includes at least one of the first protrusion 12 and the first groove 13 kind.
- the dyne value of the surface of the sunken platform 11 can be increased, so that the sunken platform 11 and the frame body 30 can be matched more tightly, which can effectively ensure the sealing performance, improve the waterproof effect, and prevent the The problem of poor sealing effect caused by pollution.
- the display device may further include: a frame body 30, the frame body 30 has an annular matching hole 32, and the inner side wall of the matching hole 32 has a limiting platform 31, Limiting platform 31 is arranged along the circumferential direction of matching hole 32, and limiting platform 31 can be ring-shaped, and frame body 30 is sleeved on the cover plate 10 through matching hole 32, and limiting platform 31 is oppositely arranged with sinking platform 11, and sinking platform 11 An adhesive layer is provided between the surface of the limiting platform 31 and the side surface of the sinking platform 11, and the surface of the sinking platform 11 can be bonded to the side surface of the limiting platform 31 facing the sinking platform 11 through the adhesive layer, This makes the platform 11 and the frame body 30 more tightly matched, which can effectively ensure the sealing performance and improve the waterproof effect.
- the surface of the light-transmitting region on one side of the cover plate 10 has a second microstructure, and the second microstructure includes at least one of a second protrusion and a second groove.
- the second microstructure may include a second protrusion, and there may be multiple second protrusions and second grooves, which may be evenly distributed on the surface of the light-transmitting region on one side of the cover plate 10, and the second microstructure may effectively Increasing the dyne value of the surface of the light-transmitting area on one side of the cover plate 10 can make the optical film layer closely adhere to the surface of the light-transmitting area on one side of the cover plate 10 .
- the dyne value of the surface of the light-transmitting area on one side of the cover 10 is greater than or equal to 32A, so that the optical film layer can be closely attached to the surface of the light-transmitting area on one side of the cover 10 to ensure stability and firmness.
- the surface of the light-transmitting area on one side of the cover plate 10 is provided with an optical film layer 20, and the optical film layer 20 may include an anti-fingerprint film layer or an anti-reflection layer, for example, the optical film layer 20 may be an anti-reflection layer , to reduce light reflection.
- the first microstructure includes a first protrusion 12 and a first groove 13
- the first protrusion 12 may be composed of K 2 SiF 6 , and K 2 SiF 6 It is relatively stable and not easy to be damaged, and having K 2 SiF 6 in the first microstructure can make the first microstructure stable and not easy to be damaged.
- an ink layer 21 is provided on the other side of the cover plate 10 corresponding to the countertop 11 , and the ink layer 21 can be used as a light-shielding layer to prevent light from passing through.
- An embodiment of the present disclosure provides a wearable device that can be displayed, including a cover structure.
- the cover structure includes: a cover 10, the cover 10 is circular, and the cover 10 has a light-transmitting area and a circumferential arrangement around the light-transmitting area.
- the edge area of one side of the cover plate 10 has an annular sunken platform 11, the sunken platform 11 is arranged around the circumference of the light-transmitting area, the surface of the sunken platform 11 has a first microstructure, and the first microstructure includes a first at least one of the protrusion and the first groove.
- the dyne value of the surface of the sunken platform 11 can be increased, so that the sunken platform 11 and the frame body 30 can be more closely matched, which can effectively ensure the airtightness of the equipment, improve the waterproof effect, and prevent the sunken platform 11 from sinking.
- the wearable device may further include: a frame body 30, the frame body 30 has an annular fitting hole 32, and the inner side wall of the fitting hole 32 has a limiting platform 31, and the limiting platform 31 is along the circumference of the fitting hole 32.
- the limiting platform 31 can be ring-shaped, the frame body 30 is sleeved on the cover plate 10 through the matching hole 32, the limiting platform 31 is arranged opposite to the sinking platform 11, and the surface of the sinking platform 11 and the limiting platform 31 face the sinking platform 11
- An adhesive layer is provided between the side surfaces of the sink platform 11, and the surface of the sinking platform 11 can be bonded to the side surface of the limiting platform 31 facing the sinking platform 11 through the bonding layer, so that the sinking platform 11 and the frame body 30 can cooperate more Tight, can effectively ensure the sealing and improve the waterproof effect.
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Abstract
一种盖板结构、制备方法、显示装置及可显示的穿戴设备，盖板结构包括：盖板（10），盖板（10）具有透光区域和围绕透光区域的周向设置的边缘区域，盖板（10）的一侧的边缘区域具有沉台（11），沉台（11）围绕透光区域的周向设置，沉台（11）的表面具有第一微结构，第一微结构包括第一突起（12）和第一凹槽（13）中的至少一种。在盖板结构中，通过透光区域使得显示模组在透光区域进行显示，通过沉台（11）便于盖板（10）与框体（30）的配合安装，沉台（11）的表面具有第一微结构，第一微结构包括第一突起（12）和第一凹槽（13）中的至少一种，通过在沉台（11）设置第一微结构可以增加沉台（11）表面的达因值，使得沉台（11）与框体（30）配合时更加紧密，可以有效保证密封性，防止由于沉台（11）表面的污染而导致的密封效果不好的问题。
Description
本公开涉及显示技术领域，具体涉及一种盖板结构、制备方法和显示装置及可显示的穿戴设备。
当前穿戴产品都有极高的防水要求，这就导致整机与模组装配过程中需要更好的密封性。整机中框与模组一般通过中框边缘与盖板粘贴而成，盖板出厂到模组组装再到整机厂整个过程时间长，污染物不好控制等因素造成盖板的达因值下降且不可逆，很难保证整机高防水要求。
发明内容
第一方面，本公开实施例提供了一种盖板结构，应用于显示装置，包括：
盖板，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
可选地，所述盖板的一侧的透光区域的表面具有第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种。
可选地，所述盖板的一侧的透光区域的表面的达因值大于或等于32A。
可选地，所述盖板的一侧的透光区域的表面设有光学膜层。
可选地，所述第一微结构中具有K
2Si F
6。
可选地，所述盖板的另一侧与所述沉台对应的区域设有油墨层。
第二方面，本公开实施例提供了一种盖板结构的制备方法，包括：
提供基体，所述基体具有透光区域和围绕所述透光区域的周向设置的边缘区域；
在所述基体的一侧的边缘区域形成沉台，所述沉台围绕所述透光区域的周向设置；
在所述沉台的表面形成第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
可选地，在所述沉台的表面形成第一微结构的步骤包括：
在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构；
所述刻蚀液中包括氢氟酸、浓硫酸、氟化氢铵和硫酸铵。
可选地，在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还包括：
在所述基体的一侧的透光区域形成保护层；
在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之后还包括：去除所述保护层。
可选地，所述刻蚀液中氢氟酸、浓硫酸、氟化氢铵和硫酸铵的质量比为(2-4)：(2-4)：(4-7)：(0.5-2)。
可选地，所述刻蚀液中还包括：
无机盐，所述无机盐包括钠盐和钾盐中的至少一种，所述无机盐在所述刻蚀液中的质量分数为3％-30％。
可选地，还包括：
在所述基体的一侧的透光区域的表面形成第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种。
可选地，在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还包括：
对所述沉台的表面进行抛光。
可选地，还包括：
在所述基体的另一侧与所述沉台对应的区域形成油墨层。
第三方面，本公开实施例提供了一种显示装置，包括盖板结构，所述盖板结构包括：
盖板，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
可选地，还包括：
框体，所述框体具有环形的配合孔，所述配合孔的内侧壁上具有限位台，所述限位台沿所述配合孔的周向设置，所述框体通过所述配合孔套设在所述盖板上，所述限位台与所述沉台相对设置，所述沉台的表面与所述限位台朝向所述沉台的一侧表面之间设有粘接层。
可选地，所述盖板的一侧的透光区域的表面具有第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种；和/或
所述盖板的一侧的透光区域的表面的达因值大于或等于32A；和/或
所述盖板的一侧的透光区域的表面设有光学膜层；和/或
所述第一微结构中具有K
2SiF
6；和/或
所述盖板的另一侧与所述沉台对应的区域设有油墨层。
第四方面，本公开实施例提供了一种可显示的穿戴设备，包括盖板结构，所述盖板结构包括：
盖板，所述盖板为圆形，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有环形的沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
图1为盖板结构的一个结构示意图；
图2为盖板的一个俯视图；
图3a为盖板的一个侧视图；
图3b为盖板的另一个侧视图；
图4为盖板与框体配合的一个示意图；
图5为盖板与框体配合的另一个示意图；
图6为框体的一个结构示意图；
图7a为质量分数0％的KCI刻蚀液刻蚀后的沉台的表面结构；
图7b为质量分数7％的KCI刻蚀液刻蚀后的沉台的表面结构；
图7c为质量分数14％的KCI刻蚀液刻蚀后的沉台的表面结构；
图7d为质量分数20％的KCI刻蚀液刻蚀后的沉台的表面结构；
图7e为质量分数25％的KCI刻蚀液刻蚀后的沉台的表面结构；
图8a为刻蚀液刻蚀后的沉台的一个表面结构示意图；
图8b为刻蚀液刻蚀后的沉台的另一个表面结构示意图；
图9为杨氏方程接触角示意图；
图10为Wenzel方程接触角示意图。
附图标记
盖板10；沉台11；第一突起12；第一凹槽13；
光学膜层20；油墨层21；
框体30；限位台31；配合孔32。
下面结合附图1至图10所示，通过具体的实施例及其应用场景对本公开实施例提供的盖板结构进行详细地说明。
如图1至图6所示，本公开实施例的盖板结构，应用于显示装置，盖板结构包括：盖板10，盖板10具有透光区域和围绕透光区域的周向设置的边缘区域，盖板10可以为玻璃材料，盖板10可以为圆形或方形，具体的形状可以根据实际选择。盖板10的一侧的边缘区域具有沉台11，也即是盖板10上沉台11所在区域的厚度小于盖板10的透光区域的厚度。沉台11围绕透光区域的周向设置，比如，盖板10可以为圆形，沉台11可以为环形，沉台11的表面具有第一微结构，第一微结构包括第一突起12和第一凹槽13中的至少一种，比如，第一微结构可以包括第一突起12，第一突起12和第一凹槽13可以均具有多个，可以均匀分布在沉台11的表面，通过第一微结构可以有效提高沉台11的表面的达因值，使得沉台11与框体30配合时更加紧密，可以有效保证密封性。
在本公开实施例的盖板结构中，盖板10具有透光区域，通过透光区域可以使得显示模组在该区域进行显示，沉台11围绕透光区域的周向设置，通过沉台11便于盖板10与框体30的配合安装，沉台11的表面具有第一微结构， 第一微结构包括第一突起12和第一凹槽13中的至少一种，通过在沉台11设置第一微结构可以增加沉台11的表面的达因值，使得沉台11与框体30配合时更加紧密，可以有效保证密封性，提高防水效果，防止由于沉台表面的污染而导致的密封效果不好的问题。
在一些实施例中，盖板10的一侧的透光区域的表面可以具有第二微结构，第二微结构可以包括第二突起和第二凹槽中的至少一种。比如，第二微结构可以包括第二突起，第二突起和第二凹槽可以均具有多个，可以均匀分布在盖板10的一侧的透光区域的表面，通过第二微结构可以有效提高盖板10的一侧的透光区域的表面的达因值，可以使得光学膜层紧贴在盖板10的一侧的透光区域的表面。
在另一些实施例中，盖板10的一侧的透光区域的表面的达因值可以大于或等于32A，可以使得光学膜层紧贴在盖板10的一侧的透光区域的表面，保证稳定牢固。
在本公开的实施例中，如图3b所示，盖板10的一侧的透光区域的表面可以设有光学膜层20，光学膜层20可以包括抗指纹的膜层或减反层，比如，光学膜层20可以为减反层，以减少光线的反射。
可选地，如图1所示，第一微结构中可以具有K
2SiF
6，比如，第一微结构包括第一突起12和第一凹槽13，第一突起12可以由K
2SiF
6构成，K
2SiF
6比较稳定，不容易损坏，第一微结构中具有K
2SiF
6可以使得第一微结构稳定，不易出现损坏。
可选地，如图3b所示，盖板10的另一侧与沉台11对应的区域可以设有油墨层21，油墨层21可以作为遮光层，可以防止光线透过。
本公开实施例的盖板结构的制备方法，包括：
提供基体，所述基体具有透光区域和围绕所述透光区域的周向设置的边缘区域，基体可以为玻璃材料，基体可以为圆形或方形，具体的形状可以根据实际选择；通过透光区域可以使得显示模组在该区域进行显示；
在所述基体的一侧的边缘区域形成沉台11，沉台11围绕所述透光区域的周向设置；比如，基体可以为圆形，沉台11可以为环形。在沉台11的表面形成第一微结构，第一微结构可以包括第一突起12和第一凹槽13中的至少 一种。通过在沉台11设置第一微结构可以增加沉台11的表面的达因值，使得沉台11与框体30配合时更加紧密，可以有效保证密封性，提高防水效果，防止由于沉台表面的污染而导致的密封效果不好的问题。
在一些实施例中，在沉台11的表面形成第一微结构的步骤可以包括：
在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构；
所述刻蚀液中可以包括氢氟酸、浓硫酸、氟化氢铵和硫酸铵。刻蚀液中的溶剂可以用去离子水，也可以利用其他的溶剂，具体可以根据实际的情况选择。通过刻蚀液化学反应后不会产生微裂纹，不会对沉台11的强度有任何影响。
在另一些实施例中，在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还可以包括：
在基体的一侧的透光区域形成保护层；通过保护层可以防止刻蚀液损坏基体的一侧的透光区域，保护层可以为石蜡或耐酸保护膜；
在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之后还包括：去除保护层。
可选地，所述刻蚀液中氢氟酸、浓硫酸、氟化氢铵和硫酸铵的质量比为(2-4)：(2-4)：(4-7)：(0.5-2)。比如，所述刻蚀液中氢氟酸、浓硫酸、氟化氢铵和硫酸铵的质量比为3∶3∶6∶1，刻蚀液中的溶剂可以用去离子水，氢氟酸∶浓硫酸∶氟化氢铵∶硫酸铵∶水可以为3∶3∶6∶1∶16。可选地，所述刻蚀液中还可以包括：无机盐，所述无机盐可以包括钠盐和钾盐中的至少一种，比如KCI，所述无机盐在所述刻蚀液中的质量分数为3％-30％。刻蚀液制备过程中，氢氟酸∶浓硫酸∶氟化氢铵∶硫酸铵∶水可以为3∶3∶6∶1∶16，再加入不同质量分数(0％、7％、14％、20％、25％)的KCI，制备不同的刻蚀液，不同质量分数的KCI的刻蚀液刻蚀后的表面结构可以如图7a至图7e所示。未加入KCI时，形成毫米级岛状结构，随着KCI增加岛状结构逐渐形成，KCI超过20％时，岛状结构连成一体。形成过程可以如图7a至图7e所示，最终在表面形成K
2SiF
6沉淀物，如图8a和图8b中所示，c表示F原子，d表示KF，a和b表示在表面形成的K
2SiF
6沉淀物，构造具有第一微结构的表面，可以通过刻蚀液的浓度控制沉台11的表面的粗糙度。沉台11 的表面通过刻蚀液刻蚀后形成沉淀物，使得表面粗糙度有所提高，同时增加表面能及提高达因值且保证盖板的强度。
接触理论中的Wenzel方程，该方程原理如下：
杨氏方程提出理想刚性光滑表面，接触角计算公式：
γ
SG＝γ
SL+γ
LG.cosθ
C
其中，θc为接触角(水滴角)如下图9所示；γ
SG、γ
SL、γ
LG对应固-气、固-液、液-气界面张力。实际情况不存在理想光滑界面，因此在杨氏方程基础上提出Wenzel方程，该方程考虑粗糙界面下固-液接触角情况。方程如下：
cosθ
W＝γ.cosθ
C
接触情况可以如图10所示，γ表示界面张力，θw表示接触角，通过方程可以看出当θc小于90°(π/2)时，物体表现出亲水性；当γ(表面粗糙度≥1)增大时，cosθw值增大θw减小，宏观表现为越亲水。当θc大于90°(π/2)时，物体表现出疏水性；当γ(表面粗糙度≥1)增大时，cosθw值减小θw增大，宏观表现为越疏水。
表面能原理：表面能是创造物质表面时对分子间化学键破坏的度量。在固体物理理论中，表面原子比物质内部的原子具有更多的能量(因为内部原子在空间上与周围原子相互作用处于受力平衡状态)。根据能量最低原理，原子会自发的趋于物质内部而不是表面。也可以简单理解为，由于表面层原子朝向外面的键能没有得到补偿，使得表面质点比体内质点具有额外的势能，称为表面能。如果物体表面能较高说明急需外部质点平衡其表面多余的键能，宏观表现为吸附其他物质；毛细现象等。如果盖板的表面吸附了脏污，那么脏污质点弥补了盖板的表面质点多余的键能，这样宏观表现为盖板的表面达因值降低，清洁后盖板的表面达因值又会回到之前状态(因为没有外部键能弥补盖板的键能，导致表面能增加)。在不改变物质固有特性及外形情况下， 要想提高表面能可以使更多原子处于物体表面(及增加表面粗糙度)。
Wenzel方程中解释了若表面亲水，适当增加表面粗糙度可以使得其表面更加亲水(对于盖板来说其原材本身是亲水物质，水滴角一般在小于20°)。从宏观角度来看越亲水及表面活性越好，表面能也越高。表面能原理中指出若要在不改变物质组成元素情况下提高表面能及需要更多的原子处于表面(增加表面势能)及增加表面粗糙度。综上两个理论，可以得出想要提高固体表面能(及高达因值)可以通过改变固体表面微结构使之表面更粗糙(此处粗糙是相对于微观来讲)。
可选地，还可以包括：在所述基体的一侧的透光区域的表面形成第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种。比如，第二微结构可以包括第二突起，第二突起和第二凹槽均可以具有多个，可以均匀分布在盖板10的一侧的透光区域的表面，通过第二微结构可以有效提高盖板10的一侧的透光区域的表面的达因值，可以使得光学膜层紧贴在盖板10的一侧的透光区域的表面。
可以通过上述刻蚀液在所述基体的一侧的透光区域的表面形成第二微结构。可以将刻蚀液同时作用在沉台11的表面以及基体的一侧的透光区域的表面从而形成微结构。
在本公开的实施例中，在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还包括：
对沉台11的表面进行抛光。通过抛光可以使得沉台11的表面更平顺，减少裂纹的产生。
通过抛光可以消除沉台11的表面的微裂纹，防止导致盖板的强度下降，如表1是沉台11的表面在不同抛光时间的强度测试结果。
表1不同抛光时间的盖板强度测试结果
| 抛光时间 | 挤压(最小值) | 落球(0.2J/五次) |
| 抛光0min | 692.35 | 第四次落球NG |
| 抛光5min | 805.15 | OK |
| 抛光10min | 827.68 | OK |
| 抛光20min | 881.61 | OK |
| 抛光30min | 900.23 | OK |
可见，通过抛光可以消除沉台11的表面的微裂纹，提高盖板的强度。沉台11的表面通过化学反应后不会产生微裂纹。在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构之前对沉台11的表面进行抛光，通过刻蚀液进行刻蚀形成第一微结构不会产生裂纹，不会对强度有影响。
在一些实施例中，制备方法还可以包括：
在所述基体的另一侧与沉台11对应的区域形成油墨层21。油墨层21可以作为遮光层，可以防止光线透过。在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之后，可以在所述基体的另一侧与沉台11对应的区域形成油墨层21，可以通过丝印来形成油墨层21。
在一些实施例中，可以先对沉台11的表面进行抛光，在基体的一侧的透光区域形成保护层，在沉台11的表面通过刻蚀液进行刻蚀以形成第一微结构，然后去除保护层。
在本公开的实施例中，在基体的一侧的透光区域的表面可以形成光学膜层20，光学膜层20可以包括抗指纹的膜层或减反层，比如，光学膜层20可以为减反层，以减少光线的反射。
可以通过上述刻蚀液在所述基体的一侧的透光区域的表面形成第二微结构，基体原材本身是亲水物质，在所述基体的一侧的透光区域的表面形成第二微结构有利于提高镀膜致密性，镀膜前基体的表面水滴角可以小于20°，表面水滴角越小及越亲水，镀膜致密性越好。在基体的另一侧与沉台11对应的区域形成油墨层21，可以通过丝印形成油墨层21，在形成油墨层21的区域表面水滴角可以小于20。透光区域的达因值可以大于或等于32A，在基体的一侧的透光区域的表面构造微结构有助于提高达因值。
本公开实施例提供一种显示装置，包括盖板结构，盖板结构包括：盖板10，盖板10具有透光区域和围绕透光区域的周向设置的边缘区域，盖板10的一侧的边缘区域具有沉台11，沉台11围绕透光区域的周向设置，沉台11的表面具有第一微结构，第一微结构包括第一突起12和第一凹槽13中的至少一种。通过在沉台11设置第一微结构可以增加沉台11的表面的达因值，使得沉台11与框体30配合时更加紧密，可以有效保证密封性，提高防水效果，防止由于沉台表面的污染而导致的密封效果不好的问题。
在本公开的实施例中，如图4至图6所示，显示装置还可以包括：框体30，框体30具有环形的配合孔32，配合孔32的内侧壁上具有限位台31，限位台31沿配合孔32的周向设置，限位台31可以为环形，框体30通过配合孔32套设在盖板10上，限位台31与沉台11相对设置，沉台11的表面与限位台31朝向沉台11的一侧表面之间设有粘接层，通过粘接层可以将沉台11的表面与限位台31朝向沉台11的一侧表面粘接，使得沉台11与框体30配合时更加紧密，可以有效保证密封性，提高防水效果。
在一些实施例中，盖板10的一侧的透光区域的表面具有第二微结构，第二微结构包括第二突起和第二凹槽中的至少一种。比如，第二微结构可以包括第二突起，第二突起和第二凹槽可以均具有多个，可以均匀分布在盖板10的一侧的透光区域的表面，通过第二微结构可以有效提高盖板10的一侧的透光区域的表面的达因值，可以使得光学膜层紧贴在盖板10的一侧的透光区域的表面。
可选地，盖板10的一侧的透光区域的表面的达因值大于或等于32A，可以使得光学膜层紧贴在盖板10的一侧的透光区域的表面，保证稳定牢固。
可选地，盖板10的一侧的透光区域的表面设有光学膜层20，光学膜层20可以包括抗指纹的膜层或减反层，比如，光学膜层20可以为减反层，以减少光线的反射。
可选地，第一微结构中可以具有K
2SiF
6，比如，第一微结构包括第一突起12和第一凹槽13，第一突起12可以由K
2SiF
6构成，K
2SiF
6比较稳定，不容易损坏，第一微结构中具有K
2SiF
6可以使得第一微结构稳定，不易出现损坏。
可选地，盖板10的另一侧与沉台11对应的区域设有油墨层21，油墨层21可以作为遮光层，可以防止光线透过。
本公开实施例提供一种可显示的穿戴设备，包括盖板结构，盖板结构包括：盖板10，盖板10为圆形，盖板10具有透光区域和围绕透光区域的周向设置的边缘区域，盖板10的一侧的边缘区域具有环形的沉台11，沉台11围绕透光区域的周向设置，沉台11的表面具有第一微结构，第一微结构包括第一突起和第一凹槽中的至少一种。通过在沉台11设置第一微结构可以增加沉 台11的表面的达因值，使得沉台11与框体30配合时更加紧密，可以有效保证设备的密封性，提高防水效果，防止由于沉台表面的污染而导致的密封效果不好的问题。
在一些实施例中，穿戴设备还可以包括：框体30，框体30具有环形的配合孔32，配合孔32的内侧壁上具有限位台31，限位台31沿配合孔32的周向延伸，限位台31可以为环形，框体30通过配合孔32套设在盖板10上，限位台31与沉台11相对设置，沉台11的表面与限位台31朝向沉台11的一侧表面之间设有粘接层，通过粘接层可以将沉台11的表面与限位台31朝向沉台11的一侧表面粘接，使得沉台11与框体30配合时更加紧密，可以有效保证密封性，提高防水效果。
以上所述仅是本公开的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本公开原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视本公开的保护范围。
Claims (18)
- 一种盖板结构，应用于显示装置，包括：盖板，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
- 根据权利要求1所述的盖板结构，其中，所述盖板的一侧的透光区域的表面具有第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种。
- 根据权利要求1所述的盖板结构，其中，所述盖板的一侧的透光区域的表面的达因值大于或等于32A。
- 根据权利要求1所述的盖板结构，其中，所述盖板的一侧的透光区域的表面设有光学膜层。
- 根据权利要求1所述的盖板结构，其中，所述第一微结构中具有K 2SiF 6。
- 根据权利要求1所述的盖板结构，其中，所述盖板的另一侧与所述沉台对应的区域设有油墨层。
- 一种盖板结构的制备方法，包括：提供基体，所述基体具有透光区域和围绕所述透光区域的周向设置的边缘区域；在所述基体的一侧的边缘区域形成沉台，所述沉台围绕所述透光区域的周向设置；在所述沉台的表面形成第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
- 根据权利要求7所述的制备方法，其中，在所述沉台的表面形成第一微结构的步骤包括：在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构；所述刻蚀液中包括氢氟酸、浓硫酸、氟化氢铵和硫酸铵。
- 根据权利要求8所述的制备方法，其中，在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还包括：在所述基体的一侧的透光区域形成保护层；在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之后还包括：去除所述保护层。
- 根据权利要求8所述的制备方法，其中，所述刻蚀液中氢氟酸、浓硫酸、氟化氢铵和硫酸铵的质量比为(2-4)：(2-4)：(4-7)：(0.5-2)。
- 根据权利要求10所述的制备方法，其中，所述刻蚀液中还包括：无机盐，所述无机盐包括钠盐和钾盐中的至少一种，所述无机盐在所述刻蚀液中的质量分数为3％-30％。
- 根据权利要求7所述的制备方法，其中，还包括：在所述基体的一侧的透光区域的表面形成第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种。
- 根据权利要求7所述的制备方法，其中，在所述沉台的表面通过刻蚀液进行刻蚀以形成第一微结构的步骤之前还包括：对所述沉台的表面进行抛光。
- 根据权利要求7所述的制备方法，其中，还包括：在所述基体的另一侧与所述沉台对应的区域形成油墨层。
- 一种显示装置，包括盖板结构，所述盖板结构包括：盖板，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
- 根据权利要求15所述的显示装置，其中，还包括：框体，所述框体具有环形的配合孔，所述配合孔的内侧壁上具有限位台，所述限位台沿所述配合孔的周向设置，所述框体通过所述配合孔套设在所述盖板上，所述限位台与所述沉台相对设置，所述沉台的表面与所述限位台朝向所述沉台的一侧表面之间设有粘接层。
- 根据权利要求15所述的显示装置，其中，所述盖板的一侧的透光区 域的表面具有第二微结构，所述第二微结构包括第二突起和第二凹槽中的至少一种；和/或所述盖板的一侧的透光区域的表面的达因值大于或等于32A；和/或所述盖板的一侧的透光区域的表面设有光学膜层；和/或所述第一微结构中具有K 2SiF 6；和/或所述盖板的另一侧与所述沉台对应的区域设有油墨层。
- 一种可显示的穿戴设备，包括盖板结构，所述盖板结构包括：盖板，所述盖板为圆形，所述盖板具有透光区域和围绕所述透光区域的周向设置的边缘区域，所述盖板的一侧的边缘区域具有环形的沉台，所述沉台围绕所述透光区域的周向设置，所述沉台的表面具有第一微结构，所述第一微结构包括第一突起和第一凹槽中的至少一种。
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| CN104924623A (zh) * | 2015-04-20 | 2015-09-23 | 广东欧珀移动通信有限公司 | 显示屏组件的成型工艺 |
| CN104933970A (zh) * | 2015-04-20 | 2015-09-23 | 广东欧珀移动通信有限公司 | 显示屏组件及终端 |
| CN105916317A (zh) * | 2016-06-22 | 2016-08-31 | 上海传英信息技术有限公司 | 一种显示屏与金属边框装配结构 |
| CN107809502A (zh) * | 2017-10-30 | 2018-03-16 | 广东欧珀移动通信有限公司 | 终端及壳体组件 |
| CN107948366A (zh) * | 2017-12-29 | 2018-04-20 | 广东欧珀移动通信有限公司 | 移动终端 |
| CN111446409A (zh) * | 2020-05-20 | 2020-07-24 | 天津市捷威动力工业有限公司 | 一种长耐久性锂离子电池聚合物极耳的制备方法 |
| CN114531774A (zh) * | 2022-02-21 | 2022-05-24 | 京东方科技集团股份有限公司 | 一种柔性电路板、制作方法和显示装置 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN117640804A (zh) * | 2023-10-31 | 2024-03-01 | 荣耀终端有限公司 | 粘接结构和电子设备 |
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