WO2023121016A1 - Système de traitement écologique et procédé de traitement pour gaz de processus de rejet industriel, à l'aide d'un procédé de tourbillonnement - Google Patents

Système de traitement écologique et procédé de traitement pour gaz de processus de rejet industriel, à l'aide d'un procédé de tourbillonnement Download PDF

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Publication number
WO2023121016A1
WO2023121016A1 PCT/KR2022/018609 KR2022018609W WO2023121016A1 WO 2023121016 A1 WO2023121016 A1 WO 2023121016A1 KR 2022018609 W KR2022018609 W KR 2022018609W WO 2023121016 A1 WO2023121016 A1 WO 2023121016A1
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Prior art keywords
process gas
unit
outer cylinder
discharge
eco
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PCT/KR2022/018609
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English (en)
Korean (ko)
Inventor
김승곤
이은경
고창복
서동명
김남수
곽영태
Original Assignee
한국에너지기술연구원
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Publication of WO2023121016A1 publication Critical patent/WO2023121016A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C9/00—Combinations with other devices, e.g. fans, expansion chambers, diffusors, water locks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B01D47/063—Spray cleaning with two or more jets impinging against each other
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/005—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C3/00—Apparatus in which the axial direction of the vortex flow following a screw-thread type line remains unchanged ; Devices in which one of the two discharge ducts returns centrally through the vortex chamber, a reverse-flow vortex being prevented by bulkheads in the central discharge duct
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C5/00—Apparatus in which the axial direction of the vortex is reversed
    • B04C5/20—Apparatus in which the axial direction of the vortex is reversed with heating or cooling, e.g. quenching, means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C3/00—Apparatus in which the axial direction of the vortex flow following a screw-thread type line remains unchanged ; Devices in which one of the two discharge ducts returns centrally through the vortex chamber, a reverse-flow vortex being prevented by bulkheads in the central discharge duct
    • B04C2003/003—Shapes or dimensions of vortex chambers

Definitions

  • the present invention relates to an eco-friendly treatment system and method for industrial discharge process gas using a swirling method. More specifically, it relates to a swirling electric treatment technology for environmentally friendly treatment of process gases emitted from the semiconductor and display industries.
  • Semiconductor products created by semiconductor technology that plays such a role have reached the stage of integrating several to millions of semiconductor elements, such as transistors, capacitances, and resistors, for example, on a silicon substrate.
  • a silicon wafer is manufactured into a semiconductor device by repeatedly performing processes such as photography, diffusion, etching, chemical vapor deposition, and metal deposition. It is to supply required process gases to the inside of the process chamber so that these process gases react on the wafer.
  • Process gases used in this way are usually highly toxic, such as toxic, flammable, and corrosive, and when these process gases leak outside without a separate purification process, they cause serious environmental pollution and safety accidents.
  • a scrubber system for decomposing or purifying the discharged process gas in a safe state is installed on a process gas discharge line connected to an exhaust duct in each manufacturing facility.
  • the process gas decomposition method of this scrubber system is a combustion method using the properties of the process gas, that is, the property of reacting explosively when in contact with general air, the property of burning by heating, and the property of dissolving in water. It is divided into a wet method, a dry method using a property that reacts with a gas treatment agent, and a method in which dry and wet methods are combined with the combustion method.
  • the present invention has been made to solve the above conventional problems, and according to an embodiment of the present invention, process gases N 2 O, NF 3 , SiH 4 and the like discharged during the CVD process in the semiconductor and display industries are converted into electricity.
  • the purpose is to provide an eco-friendly treatment system and treatment method for industrial discharge process gas using a swirling method, which can decompose with high efficiency through a heating method and also treat by-products (HF, HCl, SiO 2, etc.) generated after decomposition with high efficiency. there is.
  • a first object of the present invention is a system for processing industrial discharged process gas, in which a heater is installed, and the process gas is introduced to pyrolyze so that a swirling flow is generated, and the primary process gas and by-product particles are separated and discharged. heat regeneration reaction unit; and a wet processing unit which introduces the primary processing gas so as to generate a swirling flow and injects water into the primary processing gas to separate and discharge the by-product adsorption treatment water and the processing gas. It can be achieved as an eco-friendly treatment system for industrial exhaust process gas.
  • the heat regeneration reaction unit consists of a cyclone reactor, an outer cylinder having a particle discharge unit at the bottom and a process gas inlet at the top for introducing the process gas in the internal normal direction; an inner cylinder provided inside the outer cylinder and having a first process gas discharge unit for discharging a first process gas to an upper side; And a heater provided in the space between the inner cylinder and the outer cylinder; including, the process gas flowing in the normal direction into the space between the inner cylinder and the outer cylinder generates swirling flow, thereby increasing contact time with the heater.
  • the outer cylinder has a body having the process gas inlet on one side of the upper side, a cone provided between the body and the particle discharge unit, and an oxidizer injection unit for injecting an oxidant into the inside of the cone.
  • the oxidizing agent preheated to 200 °C or more is injected into the oxidizing agent injection unit.
  • the heater housing may further include a heater housing disposed on an outer surface of the inner cylinder at a specific interval, and the heater may be positioned in a space between the heater housing and the outer surface of the inner cylinder.
  • the body includes a heat insulator, and the lower end of the body and the upper end of the cone may be flange-coupled.
  • the wet processing unit is composed of a wet spray cyclone, an outer cylinder having a discharge portion through which by-product adsorption treatment water is discharged, and a primary processing gas inlet at an upper portion through which the primary processing gas is introduced in an internal normal direction; an inner cylinder provided inside the outer cylinder and having a process gas discharge part discharging process gas to the upper side; and a spray-type water spraying unit provided in the space between the inner and outer cylinders to inject water into the primary process gas, wherein the primary process gas flowing in a normal direction into the space between the inner and outer cylinders generates a swirling flow. It can be characterized by increasing the adsorption time with the sprayed water.
  • the outer cylinder has a body having the primary processing gas inlet on one side of the upper side, a cone provided between the body and the outlet, and the water injection unit may be provided on the upper side of the body.
  • a second object of the present invention is a method for treating industrial discharge process gas, wherein the inside is heated by a heater in a heat regeneration reactor composed of a cyclone reactor, and the preheated oxidant is injected into the heat regeneration reactor through an oxidizer injection unit.
  • the process gas flowing in the normal direction into the space between the inner cylinder and the outer cylinder of the heat regeneration reaction unit generates a swirling flow to increase the contact time with the heater
  • the cooling and adsorption step The primary treatment gas flowing in the normal direction into the space between the inner cylinder and the outer cylinder of the wet treatment unit may generate a swirling flow and increase adsorption time with sprayed water.
  • processing gases N 2 O, NF 3 , SiH 4 , etc. discharged during a CVD process in the semiconductor and display industries are electrically heated. It decomposes with high efficiency through decomposition and has the effect of treating by-products (HF, HCl, SiO 2 , etc.) generated after decomposition with high efficiency.
  • energy consumption reduction and high efficiency treatment efficiency are achieved by maximizing the contact time of the incoming process gas with a high temperature part through a swirling type reactor. It can be secured, and it has an effect of actively solving reactor clogging due to particles generated after processing particulate gas such as SiH 4 , which is the most problematic in the CVD process.
  • FIG. 1 is a block diagram of an eco-friendly treatment system for industrial discharge process gas using a turning method according to an embodiment of the present invention
  • FIG. 2a is a cross-sectional perspective view of a heat regeneration reaction unit according to an embodiment of the present invention
  • Figure 2b is a flow chart of a heat regeneration reaction unit processing method according to an embodiment of the present invention.
  • FIG. 3a is a front view of a heat regeneration reaction unit according to an embodiment of the present invention.
  • Figure 3b is a partial perspective view of the heat regeneration reaction unit on the upper side according to an embodiment of the present invention.
  • Figure 3c is a partial cross-sectional perspective view of the heat regeneration reaction unit on the upper side according to an embodiment of the present invention.
  • Figure 4a is a front view of the heat regeneration reaction unit on the lower side according to an embodiment of the present invention.
  • Figure 4b is a partial cross-sectional perspective view of the heat regeneration reaction unit on the lower side according to an embodiment of the present invention
  • Figure 5a is a cross-sectional perspective view of a wet processing unit according to an embodiment of the present invention.
  • 5B is a flowchart of a processing method of a wet processing unit according to an embodiment of the present invention.
  • Flange 20 Heat regeneration reactor inner cylinder 21: Primary processing gas discharge unit
  • the configuration, function, and treatment method of the industrial discharge process gas eco-friendly treatment system using a swing method according to an embodiment of the present invention will be described.
  • it is a rotation-type electrical treatment technology for environmentally friendly processing of process gases discharged from industries such as semiconductors and displays.
  • FIG. 1 is a schematic diagram of an eco-friendly treatment system for industrial discharge process gas using a swing method according to an embodiment of the present invention.
  • the eco-friendly treatment system 1 for industrial discharge process gas using the swirling method includes a heat regeneration reaction unit 100 and a wet processing unit 200 as a whole.
  • the heat regeneration reaction unit 100 has a heater 30 installed therein, and is configured to pyrolyze by introducing a process gas so as to generate a swirling flow, and to separate and discharge primary processing gas and by-product particles.
  • the wet processing unit 200 is configured to introduce primary processing gas so as to generate a swirling flow, spray and spray water with the primary processing gas to separate and discharge by-product adsorption treatment water and processing gas.
  • Figure 2a shows a cross-sectional perspective view of the heat regeneration reaction unit according to an embodiment of the present invention.
  • Figure 2b shows a flow chart of the processing method of the heat regeneration reaction unit according to an embodiment of the present invention
  • Figure 3a is a front view of the heat regeneration reaction unit according to an embodiment of the present invention
  • Figure 3b is a partial perspective view of the heat recovery reaction unit on the upper side according to an embodiment of the present invention
  • Figure 3c is a top side according to an embodiment of the present invention It shows a perspective view of a partial cross-section of the heat regeneration reaction unit.
  • Figure 4a is a front view of the heat regeneration reaction unit on the lower side according to an embodiment of the present invention
  • Figure 4b shows a partial cross-sectional perspective view of the heat regeneration reaction unit on the lower side according to an embodiment of the present invention.
  • the heat regeneration reaction unit 100 is configured in the form of a cyclone reactor. That is, it includes an outer cylinder 10 and an inner cylinder 20, and process gas flows in a normal direction into the space between the outer cylinder 10 and the inner cylinder 20 to generate swirl flow and flow.
  • the outer cylinder 10 is configured to have a particle discharge part 13 at the bottom and a process gas inlet 14 for introducing process gas in the inner normal direction at the top. That is, the outer cylinder 10 has a body 11 having a process gas inlet 14 on one side of the upper side, and a cone 12 provided between the body 11 and the particle discharge unit 13 at the lower end. , One side of the cone 12 is configured to have an oxidizing agent injection unit 15 for injecting an oxidizing agent into the inside. In addition, a method in which the cone 12 and the body 11 are fastened through the flange 17 may be applied. In addition, the oxidizing agent preheated to 200° C. or higher is injected into the oxidizing agent injection unit 15. And the outer cylinder body 11 is preferably configured to include a heat insulating material (16).
  • the inner cylinder 20 is provided inside the outer cylinder 10 and is configured to have a primary process gas discharge unit 21 for discharging the primary process gas to the upper side.
  • a heater 30 is installed in the space between the inner cylinder 20 and the outer cylinder 10 . Therefore, the process gas flowing in the normal direction into the space between the inner cylinder 20 and the outer cylinder 10 generates a swirling flow, thereby maximizing the contact time with the heater 30 .
  • It may include a heater housing 31 disposed at a specific interval on the outer surface of the inner cylinder 20, and a plurality of heaters 30 may be installed in the space between the heater housing 31 and the outer surface of the inner cylinder 20 in the form of a rod.
  • Process gas is a process gas emitted from industries such as semiconductors and displays, and corresponds to N 2 O, NF 3 , and SiH 4 .
  • This process gas is introduced into the heat regeneration reactor to generate a swirling flow and is oxidized while maximizing the contact time with the high-temperature part.
  • particle by-products such as SiO 2 are discharged through the particle discharge unit 13.
  • the primary processing gas and some particles are discharged through the primary processing gas discharge unit 21 at the upper end of the inner cylinder 20 .
  • the heat regeneration reactor 100 composed of a cyclone reactor is internally heated by the heater 30, and heat is regenerated through the oxidizer injection unit 15
  • the preheated oxidizing agent is injected into the reactor 100 (S1).
  • the heated temperature corresponds to the oxidizable temperature of the process gas, and the oxidizing agent preheated to 200° C. or higher is injected.
  • process gas is introduced through the process gas inlet 14 provided at the upper end of the outer cylinder 10 of the heat regeneration reactor 100 (S2).
  • the introduced process gas flows in a swirling flow between the outer cylinder 10 and the inner cylinder 20 and is thermally decomposed (S3). That is, the process gas generates a swirling flow and is oxidized while maximizing the contact time with the high-temperature part.
  • the primary processing gas is discharged through the primary processing gas discharge unit 21 at the top of the inner cylinder 20, and the by-product particles are separated and discharged through the particle discharge unit 13 at the bottom of the outer cylinder 10 (S4) .
  • the process gas treatment efficiency is 97% or more for NF 3 and 99% or more for SiH 4
  • the dust collection efficiency of SiO 2 as a by-product particle is 80% or more
  • the cyclone pressure The loss is less than 20mmAq, and the energy reduction compared to the prior art is more than 50%.
  • the heat regeneration reactor 100 has a low operating cost, can process high-temperature gas, has a low pressure loss and a simple structure, so it is easy to handle, treats high dust gas, and has a high dust collection rate. It has the advantage of being able to save energy through recycling.
  • FIG. 5A is a cross-sectional perspective view of a wet processing unit according to an embodiment of the present invention.
  • Figure 5b shows a flow chart of the processing method of the wet processing unit according to an embodiment of the present invention.
  • the wet treatment unit 200 is configured in the form of a wet spray cyclone.
  • the outer cylinder 40 has a discharge part 43 at the lower part through which by-product adsorption treatment water is discharged, and a primary process gas is introduced at the upper end in the internal normal direction. It has a body 41 provided with a processing gas inlet 44, and has a cone 42 between the body 41 and the outlet 43.
  • the inner cylinder 50 is provided inside the outer cylinder 40 and has a process gas discharge unit 51 for discharging the process gas to the upper side.
  • water injection units 45 provided on the upper side of the body in the space between the inner cylinder 50 and the outer cylinder 40, water is sprayed to the primary processing gas flowing while generating a swirling flow in a spray manner. It consists of
  • the primary processing gas flowing in the normal direction into the space between the inner cylinder 50 and the outer cylinder 40 generates a swirling flow, so that the adsorption time with the sprayed water can be increased.
  • particles such as SiO 2 which are by-products in the primary processing gas, and HF, HCl, F 2 , etc. are cooled by water in a state in which the contact time with water sprayed in a spray method is increased by generating a swirling flow, It will be adsorbed, and this by-product adsorption treatment water is discharged through the discharge part 43 at the bottom of the outer cylinder 40 and collected in the wet tank.
  • the primary treatment gas discharged through the primary treatment gas discharge unit 21 of the heat regeneration reactor 100 is composed of a wet spray cyclone. It is introduced through the primary processing gas inlet 44 at the top of the outer cylinder 40 of the wet processing unit 200 (S5).
  • water is sprayed through the water spraying unit 45 into the space between the outer cylinder 40 and the inner cylinder 50 of the wet processing unit 200 (S6), and is introduced through the primary processing gas inlet 44
  • the primary processing gas flows in a swirling flow method and is adsorbed to the cooled and sprayed water (S7).
  • processing gas is discharged through the processing gas discharge unit 51 at the upper part of the inner cylinder 50 of the wet processing unit 200, and the by-products are adsorbed and processed through the discharge unit 43 at the lower end of the outer cylinder 40 of the wet processing unit 200
  • the water is separated and discharged (S8).
  • the process gas treatment efficiency is 99% or more for NF, HCl, F 2 , the dust collection efficiency of SiO 2 as a by-product particle is 95% or more, the cyclone differential pressure is 10 mmAq or less, and the discharge
  • the temperature of the part is 30 °C or less, the water used can be reduced by about 50% compared to the prior art, and the amount of water discharged can be reduced by about 80%.
  • the wet treatment unit 200 can increase the water-soluble gas treatment efficiency by increasing the gas-liquid contact time, reduce the amount of water used, reduce the operating cost, and increase the dust collection rate. It has the advantage of being high and having a small installation area.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
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  • Biomedical Technology (AREA)
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  • Thermal Sciences (AREA)
  • Treating Waste Gases (AREA)

Abstract

La présente invention se rapporte à un système de traitement écologique et à un procédé de traitement destinés à un gaz de processus de rejet industriel, à l'aide d'un procédé de tourbillonnement, et concerne, plus particulièrement, un système de traitement écologique destiné à un gaz de processus de rejet industriel à l'aide d'un procédé de tourbillonnement, ledit système étant un système de traitement d'un gaz de processus de rejet industriel et comprenant : une unité de réaction de régénération de chaleur comportant un dispositif de chauffage installé en son sein, et destinée à permettre l'introduction du gaz de processus, à décomposer thermiquement le gaz de processus afin de produire un écoulement tourbillonnant, et à séparer et à évacuer un gaz de processus primaire et des particules de sous-produits ; et une unité de traitement par voie humide destinée à permettre l'introduction du gaz de processus primaire afin de produire un écoulement tourbillonnant, et à injecter de l'eau dans le gaz de processus primaire afin de séparer et d'évacuer l'eau de traitement d'adsorption de sous-produits et le gaz de processus.
PCT/KR2022/018609 2021-12-22 2022-11-23 Système de traitement écologique et procédé de traitement pour gaz de processus de rejet industriel, à l'aide d'un procédé de tourbillonnement WO2023121016A1 (fr)

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KR10-2021-0185428 2021-12-22
KR1020210185428A KR20230095695A (ko) 2021-12-22 2021-12-22 선회방식을 이용한 산업 배출 공정가스 친환경 처리시스템 및 처리방법

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Citations (5)

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Publication number Priority date Publication date Assignee Title
KR19990076119A (ko) * 1998-03-27 1999-10-15 윤종용 배기가스 처리장치
KR20040070753A (ko) * 2003-02-04 2004-08-11 아남반도체 주식회사 반도체 공정용 가스세정장치
KR20090004535A (ko) * 2007-06-28 2009-01-12 닛세이 코포레이션 배기가스 처리 장치
KR20140120577A (ko) * 2013-04-03 2014-10-14 씨에스케이(주) 사이클론을 이용한 반도체 폐가스 처리용 스크러버
KR20200021235A (ko) * 2018-08-20 2020-02-28 엠에이티플러스 주식회사 폐가스 처리 장치

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Publication number Priority date Publication date Assignee Title
KR100307808B1 (ko) 1999-04-07 2001-09-26 고석태 반도체장치 제조설비의 스크러버 시스템
JP2005131509A (ja) 2003-10-29 2005-05-26 Unisem Co Ltd 廃ガス処理処置及び廃ガス処理方法
KR20140122900A (ko) 2013-04-11 2014-10-21 주식회사 에스지티 파워 처리용 하이브리드 타입 스크러버

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990076119A (ko) * 1998-03-27 1999-10-15 윤종용 배기가스 처리장치
KR20040070753A (ko) * 2003-02-04 2004-08-11 아남반도체 주식회사 반도체 공정용 가스세정장치
KR20090004535A (ko) * 2007-06-28 2009-01-12 닛세이 코포레이션 배기가스 처리 장치
KR20140120577A (ko) * 2013-04-03 2014-10-14 씨에스케이(주) 사이클론을 이용한 반도체 폐가스 처리용 스크러버
KR20200021235A (ko) * 2018-08-20 2020-02-28 엠에이티플러스 주식회사 폐가스 처리 장치

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