WO2023083586A1

WO2023083586A1 - Beam-shaping device and lithography apparatus

Info

Publication number: WO2023083586A1
Application number: PCT/EP2022/079497
Authority: WO
Inventors: Matthias Blaicher
Original assignee: Nanoscribe Holding Gmbh
Priority date: 2021-11-10
Filing date: 2022-10-24
Publication date: 2023-05-19
Also published as: DE102021129223B3; EP4430454A1

Abstract

The invention relates to a beam-shaping device (10) for the variable adjustment of a beam shape of a light beam (12), comprising a plurality of beam-shaping optical elements (14-1, 14-2, 14-3, 14-4, 14-5), which are each designed to alter a beam shape of an input light beam (18), wherein at least a subset of the beam-shaping optical elements are configured to generate a different beam shape, and additionally comprising a beam deflection device (22) which is configured to selectively guide a light beam (12), radiated into the beam-shaping device, to only one of the beam-shaping optical elements, and to define an output beam path (40) for an output light beam (20) exiting said beam-shaping optical element. The invention also relates to a lithography apparatus comprising a beam shaping device.

Description

Title : Beam shaping device as well

Li thographi © device

Description

The invention relates to a beam shaping device according to claim 1 and a lithography device comprising such a beam shaping device according to claim 22 .

In the lithography techniques considered in the present context, a structure is written in particular in that an exposure dose is radiated into a lithography material in a focus area of a light beam, in particular a laser beam, and thus a structure area or "voxel" is defined . For example, it is conceivable that the lithography material is cured or polymerized locally in the focus area. In order to write a two- or three-dimensional overall structure, the focal area is relocated (scanned) within the lithographic material such that a plurality of

Volume elements ("voxels") are defined, which complement each other to form the overall structure.

A corresponding technique using the physical principle of two-photon polymerisation or multi-photon polymerisation in general is described in DE 10 2017 110 241 A1, for example. Techniques of this type are used in particular in the production of microstructures or nanostructures in areas in which high precision and at the same time freedom of design for the structure to be produced are desired.

In the techniques described, it is desirable to be able to change an exposure dose and/or a voxel shape, in particular a voxel size, as a function of a scan position of the focus area in the lithographic material. For this purpose, for example known acousto-optical modulators that make it possible to variably change an exposure dose. In addition, it is known to change the size of the focus area by changing the beam shape of the light beam and thus the illumination of the lens, which focuses the light beam to the focus area, by means of diaphragms.

However, such a method is comparative inefficient, since light output is lost as a result of absorption by the apertures.

The invention is concerned with the task of being able to set a beam shape of a light beam variably, quickly and with a comparatively small loss of light output.

This object is achieved by a beam shaping device having the features of claim 1. The beam shaping device is designed to variably set a beam shape of a light beam, in particular to increase or decrease a beam cross section, for example a beam diameter. In this respect, the beam-shaping device can be set up to change a beam shape of an output beam emerging from the beam-shaping device in a variably adjustable manner in comparison to an input beam radiated into the beam-shaping device. In particular, the light beam can be a laser beam.

The beam shaping device comprises a plurality of beam shaping optics. The beam-shaping optics are each designed to symmetrically or asymmetrically change a beam shape, in particular a beam cross section, of an input light beam radiated into the beam-shaping optics. In particular, the beam-shaping optics can be designed to expand the light beam symmetrically or asymmetrically (ie to increase a beam cross section) or to taper (ie to reduce a beam cross section). In this respect, the beam-shaping optics are designed in such a way that a light beam has a different beam shape after passing through a beam-shaping optic than before, in particular a different, preferably smaller or larger, beam cross-section.

At least a subset of the beam-shaping optics, in particular all beam-shaping optics, are set up to generate a different beam shape, in particular a different beam cross-section. In this respect, the beam-shaping device comprises in particular a plurality of beam-shaping optics, wherein at least a subset of these beam-shaping optics is configured differently such that a light beam has a different beam shape depending on which of these beam-shaping optics it has passed through. It is conceivable that the beam-shaping device only has beam-shaping optics that have a beam-widening effect. It is also conceivable that the beam-shaping device has one or more beam-shaping optics, which have a beam-widening effect, and one or more beam-shaping optics, which have a beam-rejuvenating effect.

The beam shaping device also includes a beam deflection device. The beam deflection device is set up to a in the Beam shaping device irradiated light beam selectively only one of the beam shaping optics to feed, ie to direct to one of the beam shaping optics. The beam deflection device is designed in particular to move the light beam back and forth between the beam-shaping optics (and thus switch through the different beam-shaping optics).

The beam deflection device is also set up to define an output beam path (e.g. to a downstream focusing optics or scanning device of a lithography device) for an output light beam that emerges from that beam-shaping optics to which the input light beam was supplied. The beam-shaping device is preferably designed in such a way that the output beam path has a constant propagation direction independently of the selected beam-shaping optics (that is, independently of which beam-shaping optics the input light beam was supplied to).

The proposed beam shaping device makes it possible to variably change a beam shape of a light beam in a simple and quick manner, in that the light beam is sequentially directed onto different beam shaping optics by means of the beam deflection device. In particular, the beam shaping device makes it possible to selectively enlarge or reduce a beam cross section, preferably in several stages or steplessly. Compared to beam shaping using There is little loss of light output with the proposed beam shaping.

An advantageous area of application of such a beam shaping device is laser lithography, in particular 3D laser lithography based on multi-photon absorption, in which, as mentioned above, a light beam is focused in a focus area by a focusing lens. The proposed beam shaping device now makes it possible, by changing a beam shape of the light beam, to variably change an illumination of the focusing lens and thus to change a voxel size and/or a voxel shape (illumination changes numerical aperture). This can significantly reduce process times when writing structures. For example, in order to reduce a writing time, it can be advantageous to write the (structureless) interior of a structure to be written with "large" voxels and to write edge regions in which greater structural accuracy is required with "small" voxels.

In concrete terms, it was recognized within the scope of the invention that when an illumination of the focusing lens is changed concentrically to the optical axis, a voxel size in the irradiation direction (Z length) can be changed. For this purpose, at least a subset of the beam-shaping optics can be set up to shape a beam cross section, in particular a beam diameter, of the light beam symmetrically, in particular concentrically reduce or enlarge. It was also recognized that when the focusing lens is illuminated with a light beam having an asymmetrical beam shape, for example with a light beam having a slit-like beam shape, a voxel size can be changed laterally to the irradiation direction. For this purpose, at least a subset of the beam-shaping optics can be set up to change a beam cross section, in particular a beam diameter, asymmetrically, in particular to reduce or enlarge it. For example, one or more beam shaping optics can be set up to generate a slit-like beam shape. The proposed beam shaping device makes it possible in particular to change a beam shape comparatively quickly, so that a voxel size can be variably adjusted during a writing process, i.e. during the shifting of the focus area ("on-the-fly") and thus a defined voxel size is generated for each scan position can be.

In particular, at least a subset of the beam-shaping optics, in particular all beam-shaping optics, each comprise at least one optical element (or an effective optical surface), which has a beam-widening or beam-rejuvenating effect. For example, the at least one optical element can be a reflective, absorbing or refracting optical element. The at least one optical element can be a lens or a mirror. The at least one optical element can also be a diffractive element, for example a switchable digital mirror device (DMD) . This makes it possible to change the amplitude and/or the phase of the light beam. The at least one optical element can also be an acousto-optical element. The at least one optical element can be fixed in place. It is also conceivable that the at least one optical element is arranged to be translationally displaceable or rotatable relative to the beam path of the light beam, in particular when the beam-shaping device is used as intended, it moves, vibrates, or rotates. This makes it possible to change a beam shape and thus a voxel size particularly quickly. The beam-shaping optics preferably each comprise at least two optical elements (or active optical surfaces) which together (ie when the light beam interacts with the at least two optical elements, in particular sequentially) have a beam-widening or beam-narrowing effect. The at least one optical element or the at least two optical elements can be designed to change a beam cross section symmetrically, in particular concentrically to a main beam axis, or asymmetrically, in particular to enlarge or reduce it. In order to achieve an asymmetric beam shape, the at least one optical element or the at least two optical elements, for example. include asymmetrical mirror surfaces or cylindrical lenses.

As part of an advantageous embodiment, one or more of the beam-shaping optics can include a first optical element, which is designed as an optical collecting element, and a second optical element, which is designed as an optical diffusing element. The optical converging element can be, for example, a converging lens or a converging mirror. The diverging optical element can be, for example, a diverging lens or a diverging mirror.

As part of an alternative advantageous embodiment, one or more of the beam-shaping optics can have a first and a second optical element, with the first and the second optical element being designed as an optical collecting element, in particular as a collecting lens or collecting mirror.

Advantageously, the beam-shaping optics can each include or consist of a pair of reflection surfaces with a first reflection surface and a second reflection surface. The first and second reflection surfaces of a pair of reflection surfaces are preferably arranged in such a way that an input light beam radiated into the beam-shaping device first impinges on the first reflection surface and then on the second reflection surface. In this respect, the beam deflection device can be designed to direct an input light beam radiated into the beam shaping device onto the first reflection surface of one of the beam shaping optics. The first and the second reflection surface of a pair of reflection surfaces are in particular designed and arranged in such a way that a light beam impinging on the first reflection surface of the pair of reflection surfaces comes from the first reflection surface is deflected along a radiation path onto the second reflection surface of this reflection surface pair. The second reflection surface is preferably designed to direct the light beam back onto the beam deflection device. The reflection surfaces can be provided, for example, by mirror surfaces or mirror surface sections. The first and second reflection surfaces are preferably fixed, ie in particular not pivotable.

In an advantageous further development, the above-mentioned at least one optical element having a beam-widening or beam-narrowing effect or the at least two optical elements having a joint beam-widening or beam-narrowing effect can be arranged in a beam path between the first and the second reflection surface. Then it is possible that the first and the second reflection surface itself do not have a beam-widening or beam-reducing effect. For example, the first and/or the second reflection surface can each be provided by a plane mirror.

In concrete terms, first an optical scattering element and then an optical collecting element can be arranged in a beam path from the first reflection surface to the second reflection surface. The optical diverging element is preferably arranged within a focal length of the optical collecting element (reverse Galileo arrangement). Such an arrangement has a beam-widening effect. It is also conceivable that the optical collecting element is arranged first and then the optical scattering element. Such an embodiment has a beam-converging effect.

Within the scope of a further configuration, first a first optical collecting element and then a second optical collecting element can be arranged in a beam path from the first reflection surface to the second reflection surface. The first optical collecting element and the second optical collecting element are preferably arranged at a distance from one another which corresponds to the sum of a focal length of the first optical collecting element and a focal length of the second optical collecting element (Kepler arrangement). Depending on the focal lengths of the first and second optical collecting elements, such a configuration can have a beam-widening effect (focal length of the first optical collecting element is smaller than the focal length of the second optical collecting element) or beam narrowing (focal length of the first optical collecting element is larger than the focal length of the second optical collecting element).

It is also possible for the first and the second reflection surface to be designed in such a way that a beam shape of the light beam can be changed symmetrically or asymmetrically by sequential interaction of the light beam with the first and the second reflection surface, in particular a beam cross section can be enlarged or reduced. In this respect, the first reflection surface can form a first effective optical surface and the second reflection surface can form a second effective optical surface. which together have a jet widening or jet narrowing effect. In such a configuration, in particular, no further optical elements having a beam-widening or beam-narrowing effect are required or provided between the first and the second reflection surface. In particular, the first and/or the second reflection surface can be curved, paraboloid-shaped, aspherical or designed as a free-form surface.

As part of an advantageous embodiment, the first and the second reflection surface of each beam-shaping optic can be curved, in particular paraboloid-shaped, wherein the first reflection surface is convex and the second reflection surface is concave (then the beam-shaping optic has a beam-widening effect) or wherein the first reflection surface is concave and the second reflection surface is convex (then the beam-shaping optics have a beam-converging effect).

Within the scope of a further embodiment, a beam widening or narrowing can be achieved in that the first and the second reflection surface are designed in the shape of a paraboloid, the first and the second reflection surface being defined by different paraboloid functions. In this respect, the first and the second reflection surface can be defined by functions with different paraboloid parameters and/or different exponents. In particular, the first and the second reflection surface have different focal lengths. The first and second reflection surfaces are preferably arranged relative to one another in such a way that a focal point of the first reflection surface and a focal point of the second reflection surface coincide locally. Is e.g. a focal length of the first paraboloidal reflection surface smaller/greater than a focal length of the second paraboloidal reflection surface, a beam widening/beam narrowing can be achieved.

Expediently, the first reflection surface can be provided by a first parabolic mirror and the second reflection surface can be provided by a second parabolic mirror. The first parabolic mirror can then form a first optical element and the second parabolic mirror can form a second optical element, which together have a beam-widening or beam-converging effect.

It is also conceivable for the first reflection surface and/or the second reflection surface to be designed as a free-form surface. It is also conceivable that one of the reflection surfaces is provided by a parabolic mirror and the other reflection surface is provided by a free-form surface.

In order to be able to switch back and forth between the individual beam shaping optics and thus be able to variably set a beam shape, it can be advantageous if the beam deflection device is set up to do so To shift input light beam along a scan path. In this respect, the beam deflection device can be designed to change a propagation direction of the input light beam in such a way that the input light beam follows a scanning path. The beam-shaping optics, in particular the first and/or second reflection surfaces (for example the parabolic mirrors), can then be arranged sequentially along this scanning path. By shifting the input light beam along the scan path, it is then possible to select which beam-shaping optics are to be illuminated and hence which beam shape is to be produced. The scan path can, for example, run linearly, curved, circularly or in the form of a segment of a circle. It is conceivable that the beam-shaping optics are provided by assemblies that are designed separately from one another. In this respect, the beam-shaping optics can be arranged in segments along the scanning path. For example, it is conceivable that the beam-shaping optics are each provided by a mirror component, in particular a one-piece mirror component, which provides the first and the second reflection surface.

It can also be advantageous if the first reflection surfaces are provided by first surface sections of a first free-form surface and/or the second reflection surfaces are provided by second surface sections of a second free-form surface. It is conceivable that the first free-form surface and the second free-form surface are provided by components that are separate from one another. It is also conceivable that the first and the second free-form surface by a common Free form surface are provided. In this respect, the first or second reflection surfaces can be formed by a coherent component. Such a beam shaping device has a compact design and is also robust with respect to mechanical shocks. The first and/or the second free-form surface can preferably extend along the scanning path of the beam deflection device, in particular continuously without interruption. In this respect, the beam deflection device can be designed to displace the input light beam along the first free-form surface. It can be particularly advantageous if those surface sections that provide the first reflection surfaces merge continuously, preferably along the scanning path, and/or if those surface sections that provide the second reflection surfaces continuously, preferably along the scanning path, merge . Such an embodiment makes it possible to change a jet shape continuously, in particular steplessly, for example to enlarge or reduce a jet cross section steplessly.

Within the scope of an advantageous embodiment, the beam deflection device can comprise at least one mirror, in particular a galvanometer mirror, which can be pivoted about a pivot axis. In concrete terms, the beam deflection device can have a first beam deflection surface and a second beam deflection surface. The first and / or the second beam deflection can in particular by a mirror, preferably a galvanometer mirrors , be provided . The first beam deflection surface can be set up to deflect an input light beam striking it, in particular directly, onto the first reflection surface of one of the beam-shaping optics. The second beam deflection surface can be set up to define an output beam path for an output light beam deflected by the second reflection surface of this beam-shaping optics. In this respect, the beam deflection surfaces and the reflection surfaces can be arranged in such a way that an input light beam striking the first beam deflection surface is deflected onto the first reflection surface of one of the beam-shaping optics, the light beam is deflected from the first reflection surface onto the second reflection surface and finally from the second reflection surface is deflected onto the second beam deflection surface.

In order to switch between the beam-shaping optics, the first beam deflection surface , in particular the first mirror or galvanometer mirror , can be pivoted about a first pivot axis in such a way that the input light beam can be selectively deflected onto one of the first reflection surfaces of the beam-shaping optics by pivoting the first beam deflection surface about the first pivot axis is . In this respect, the beam deflection device can comprise a first mirror, in particular a galvanometer mirror, which can be pivoted about a first pivot axis for switching through the beam-shaping optics and provides the first beam deflection surface. Such The beam deflection device makes it possible to switch back and forth particularly quickly between the beam-shaping optics and thus to quickly change a beam shape. This can be particularly advantageous for applications in the field of lithography, in order to change a beam shape during a scanning process, so to speak “on-the-fly”, and thus to generate a defined beam shape for each scan position.

Advantageously, the second beam deflection surface, in particular the second mirror or second galvanometer mirrors to be pivotable about a second pivot axis. In this respect, the beam deflection device can comprise a second mirror, in particular a galvanometer mirror, which can be pivoted about a second pivot axis and provides the second beam deflection surface. This makes it possible to variably change the exit beam path or to use the second beam deflection surface, e.g. depending on a selected beam shaping optics, to be aligned in such a way that the output beam path or a direction of propagation of the output beam away from the second beam deflection surface remains constant. In particular, the first and the second pivot axis are collinear, preferably identical.

It is conceivable that the first and the second mirror can be pivoted independently of one another. For example, it is conceivable that a pivoting movement of the first mirror and a pivoting movement of the second mirror are each driven by their own drive device, in particular a motor. are drivable. However, it can also be advantageous if a pivoting movement of the first beam deflection surface and a pivoting movement of the second beam deflection surface are synchronized. This makes it possible to always keep the first and the second beam deflection surface in a constant alignment relative to one another and thus—regardless of which beam shaping optics is selected—to keep the output beam path constant.

A pivoting movement of the first beam deflection surface and a pivoting movement of the second beam deflection surface can preferably be positively coupled. For example, it is conceivable that the first beam deflection surface is provided by a first mirror and the second beam deflection surface is provided by a second mirror, both mirrors being pivotable by a common drive device. It is also conceivable that the first and the second beam deflection surface are provided by a common mirror which can be pivoted about a mirror pivot axis. In particular, the first and the second beam deflection surface can be provided by a mirror surface of the common mirror, which is preferably continuous without interruption. Such an embodiment is structurally simple and robust.

In an embodiment with swiveling mirrors, it can be particularly advantageous if the beam-shaping optics, in particular the pairs of reflection surfaces or the pairs of parabolic mirrors, are arranged along a circumference around the first pivot axis or the mirror pivot axis.

In particular, the first and the second pivot axis or the mirror pivot axis are oriented orthogonally to a respective axis of curvature of the first and/or second reflection surface, in particular an axis of curvature of the first and/or second parabolic mirror. By pivoting the mirrors, the light beam is not shifted along a curvature of the reflection surface, but orthogonally to it.

Within the scope of a preferred configuration, the beam-shaping optics, in particular the first and the second reflection surface of a pair of reflection surfaces, can be designed in such a way that an output beam direction of an output light beam reflected by the second reflection surface is parallel to an input beam direction of an input beam impinging on the first reflection surface runs . The output beam direction and the input beam direction preferably lie within a plane which contains the first and the second pivot axis or the mirror pivot axis (telecentric arrangement). In this respect, the beam-shaping device can be designed in such a way that—regardless of which beam-shaping optics is selected—a beam section running between the second reflection surface and the second beam deflection surface and a beam section running between the first beam deflection surface and the first reflection surface face each other run parallel and are arranged within a plane containing the first and the second pivot axis or the mirror pivot axis.

As mentioned above, the beam shaping device can be part of a lithography device. In this respect, the invention also relates to a lithography device according to claim 22, comprising a beam shaping device as described above. The beam-shaping device can be further developed, as described above in connection with the beam-shaping device as such. The lithography device is designed to produce a three-dimensional target structure in a lithography material. The lithography device comprises a light source for emitting a light beam. In particular, the light source can be designed as a laser light source for emitting a laser beam. The lithography device also includes a beam guidance device for defining a beam path for the light beam from the light source to the lithography material. For example, the beam guiding device can comprise a plurality of optical elements (eg lenses, mirrors, etc.). In addition, the lithography device includes focusing optics for focusing the light beam in a focal area. In order to shift the focus area of the light beam relative to the lithography material, the lithography device also includes a scanning device. The scanning device can include a deflection device (e.g., deflection mirror) for changing a position of the Be focus area of the light beam in the lithographic material. In particular, the scanning device is arranged along a propagation direction of the light beam between the beam-shaping device and the focusing optics.

As mentioned above, in such a lithography device with a beam-shaping device, illumination of the focusing optics can be variably adjusted and thus a voxel shape and/or voxel size can be changed, in particular as a function of a scan position of the focus area.

The lithography device can also include a positioning device for displacing and positioning a substrate. In particular, the positioning device is designed to displace the substrate in all three spatial directions (X, Y, Z), preferably also to tilt it about at least one axis of inclination parallel to the X-Y plane.

The lithography device can advantageously also comprise a control device for controlling the lithography device. The control device is preferably set up to control the beam-shaping device, in particular the beam deflection device, in such a way that the light beam emitted by the light source is added to predetermined beam-shaping optics depending on a scanning position of the focus area. In this respect, the control device can be designed to To control the beam-shaping device in such a way as to change the beam shape of the light beam as a function of a scanning position. Advantageously, the control device can also be set up to change a light output, in particular a laser output, as a function of the scanning position (and thus as a function of the selected beam-shaping optics or the beam shape), preferably in such a way that the light intensity radiated into the lithographic material is constant remains . In other words, the control device can be set up to synchronize beam shape and light output as a function of a scanning position. For this purpose, the lithography device, for example. include an acousto-optical modulator that can be controlled by the control device and is set up to change a light output of the light beam emitted by the light source. The control device can preferably be set up in such a way that a light output is changed in proportion to a voxel size, in particular a larger light output is set for a larger voxel size.

It can happen that a position of the focus center of the focus area (focus position) changes slightly depending on a selected beam shaping device. For example, as a result of aberration effects, there can be an axial displacement of the focal point along the optical axis of the light beam (z-axis). In order to compensate for such shifts, the lithography device can include an adjustment device which is designed to to set a focus position of the focus area along the optical axis of the light beam (z-axis or height axis), in particular depending on a selected beam-shaping optics. In this respect, the setting device can be set up to set a relative position of the focus area and substrate along the optical axis of the light beam. The setting device is preferably synchronized with the beam deflection device in such a way that a predetermined focus position is set depending on a selected beam-shaping optics, in particular depending on a pivoting position of the first mirror or the common mirror of the beam deflecting device about the respective pivoting axis. For example, the adjustment device can include a fast membrane mirror or an acousto-optical deflector for changing a focus position. It is also conceivable that the adjustment device includes a fast z-drive for moving the focusing optics, in particular the focusing lens, e.g. B. in the form of a voice coil (voice coil actuator). Alternatively or additionally, it is basically also conceivable that the adjustment device is a traversing device for changing a z-position of the substrate or Lithographic material includes.

The invention is explained in more detail below with reference to the figures. Show it :

Fig. 1 Sketched representation of an embodiment of a beam shaping device; 2 outlined representation of a further embodiment of a beam shaping device;

3-7 schematic illustrations for explaining different configurations of a beam shaping optics of the beam shaping device;

8 simplified schematic representation of a further embodiment of the beam shaping device; and FIG. 9 simplified schematic representation of a lithography device.

In the following description and in the figures, the same reference symbols are used for identical or corresponding features.

FIG. 1 shows an embodiment of a beam-shaping device, which is denoted overall by reference numeral 10 . The beam shaping device 10 is designed to variably set a beam shape, in particular a beam cross section, of a light beam denoted in its entirety by reference numeral 12 .

The beam shaping device 10 comprises a plurality, five in the example shown, beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5. The beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 are each designed to symmetrically or asymmetrically change a beam shape of an input light beam 18 radiated into the beam-shaping device 10 along a beam-in direction 16, in particular the light beam 18 expand or to rejuvenate (explained in detail below). By way of example and preferably, the beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 are set up to generate a different beam shape, in particular a different beam cross section. In this respect, a beam shape of an output light beam 20 leaving the beam shaping device 10 can be different, depending on which of the beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 the light beam 12 has passed through.

In order to be able to switch back and forth between the beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5, the beam-shaping device 10 also includes a beam deflection device 22, which is designed to selectively direct the input light beam 18 to only one of the beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5.

In the example shown in FIG. 1, the beam deflection device 22 comprises a first mirror 24, in particular in the form of a galvanometer mirror 24, which provides a first beam deflection surface 26 (cf. FIG. 3), and a second mirror 28, in particular in the form of a galvanometer mirror 28, which provides a second beam deflection surface 30 (see FIG. 3). The first mirror 24 can be pivoted about a first pivot axis 34 by means of a first drive 32 . The second mirror 28 can be pivoted about a second pivot axis 38 by means of a second drive 36 . As can be seen from Fig. 1, the first pivot axis 34 and the second pivot axis 38 are arranged collinear.

The first mirror 24 is designed to deflect the input light beam 18 onto one of the beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5. The second mirror 28 is designed to deflect the output light beam 20 leaving these beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 and to define an output beam path 40 for this output light beam 20 (cf. Fig. 1) . In this respect, the second mirror 28 serves to deflect the output light beam 20 into a predetermined emission direction 42 . By way of example and preferably, the beam-shaping device 10 is designed in such a way that the emission direction 42 runs parallel to the irradiation direction 16 (cf. FIG. 1).

By pivoting the first mirror 24 about the first pivot axis 34, the input light beam 18 can be displaced along a scan path 44 (in the example along a circumference about the pivot axis 34). As can be seen from Fig. 1, the beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 are arranged along this scan path 44 (i.e. along a circumference around the first pivot axis 34), so that by pivoting the first mirror 34 of the input light beam 18 between the beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 can be shifted back and forth. As described in detail below, the beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 each have a first reflection surface 46 and a second reflection surface 48, which together form a reflection surface pair 50. The reflection surfaces 46, 48 are designed in such a way that a light beam 12 striking the first reflection surface 46 is deflected onto the second reflection surface 48.

FIG. 1 shows the beam-shaping device 10 in an exemplary configuration in which the first mirror 24 is pivoted about the pivot axis 34 in such a way that the input light beam 18 impinges on the first beam-shaping optics 14-1. A beam path of the light beam 12 in the beam shaping device 10 is explained below on the basis of this configuration.

As can be seen from FIG. 1 , the input light beam 18 incident on the first mirror 24 is directed by the first mirror 24 onto the first reflection surface 46 of the beam shaping optics 14 - 1 , which in turn deflects the light beam 12 onto the second reflection surface 48 . In the example shown, the light beam 12 is expanded in the process, ie a beam cross section is enlarged (explained in more detail below). The second reflection surface 48 then deflects the light beam 12 (output light beam 20) onto the second mirror 28, which deflects the light beam 12 in the emission direction 42. The reflective surfaces 46, 48 are designed in particular in such a way that an output beam direction 49 of the output light beam 20 reflected by the second reflective surface 48 is parallel to an input beam direction 47 of the input light beam 18 radiated onto the first reflective surface 46 (cf. also Figures 3 to 7). . By way of example and preferably, the output beam direction 49 and the input beam direction 47 lie in a plane (corresponding to the plane of the drawing in FIGS. 3 to 7) which also contains the first pivot axis 34 and the second pivot axis 38 (telecentric arrangement).

By way of example and preferably, a pivoting movement of the first mirror 24 about the first pivot axis 34 is synchronized with a pivoting movement of the second mirror 28 about the second pivot axis 38 so that a position of the first mirror 34 and the second mirror 38 relative to one another remains the same. In this respect, regardless of which of the beam-shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 is selected, the emission direction 42 can be kept constant (angle of incidence equal to angle of incidence).

It is also possible for the first beam deflection surface 26 and the second beam deflection surface 30 to be provided by a common mirror 52 which can be pivoted about a mirror pivot axis 56 by means of a drive device 54 . Such an embodiment is shown in FIG. 2 . Otherwise, the configuration according to FIG. 2 of the embodiment according to FIG. 1 . The beam shaping optics 14-1, 14-2, 14-3, 14-4, 14-5 can fundamentally be constructed differently. Various exemplary configurations (types) of beam-shaping optics 14 are described below with reference to FIGS. It is conceivable that the beam-shaping device 10 exclusively has beam-shaping optics 14 of the same type, which differ only in their specific configuration. It is also conceivable that the beam shaping device 10 has beam shaping optics 14 of different types.

FIG. 3 shows a schematic representation for explaining a first configuration of the beam-shaping optics 14 (framed by dashed lines in FIG. 3). In the example, the beam shaping optics 14 are designed to widen the light beam 12 , ie to enlarge a beam cross section (indicated by the double arrow 58 in FIG. 3 ) of the input light beam 18 . In this respect, a beam cross section (indicated by the double arrow 60 in Fig. 3) of the output light beam 20 emerging from the beam shaping optics 14 is larger than the beam cross section 58 of the input light beam 18.

In the example, the first reflection surface 46 and the second reflection surface 48 are paraboloid-shaped. By way of example and preferably, the first reflection surface 46 is provided by a first parabolic mirror 62 and the second reflection surface 48 is provided by a second parabolic mirror 64 . The first parabolic mirror 62 has a first focal length fi with a first focal point 66 and the second parabolic mirror 64 has a second focal length fi with a second focal point 68 .

The parabolic mirrors 62, 64 are defined by different paraboloid functions. Specifically, the first parabolic mirror 62 has a smaller focal length fi than the second parabolic mirror 64 . As from Fig. 3, the parabolic mirrors 62, 64 are arranged in such a way that the focal points 66, 68 coincide at a common point.

In such an arrangement, the input light beam 18 is deflected by the first beam deflection surface 26 onto the first reflection surface 46 (first parabolic mirror 62). The light beam 12 is then deflected from the first reflection surface 46 onto the second reflection surface 48 (second parabolic mirror 64) and is expanded in the process. The second reflection surface 48 then deflects the light beam 12 onto the second beam deflection surface 30 which finally deflects the light beam 12 into the emission direction 42 . In the case of configurations that are not shown, it is also possible for the first parabolic mirror 62 to have a greater focal length fi than the second parabolic mirror 64 . In such a configuration, a beam cross-section of the light beam 12 is then reduced as it passes through the beam-shaping optics 14 . As can be seen from Fig. 3, the first and the second reflection surface 46, 48 are designed in such a way that a first beam section 70 of the light beam 12 running between the first beam deflection surface 26 and the first reflection surface 46 and a first beam section 70 of the light beam 12 running between the second reflection surface 48 and the second beam deflection surface 30 running second beam section 72 parallel to each other and lie in the plane. The first and the second pivot axis 34, 38 run orthogonally to a respective axis of curvature (in Fig. 3 orthogonal to the plane of the drawing) of the first and second reflection surface 46, 48.

FIG. 4 shows a further configuration of the beam-shaping optics 14, in which the first reflection surface 46 is convexly curved with respect to the light beam 12 and the second reflection surface 48 is concavely curved. By way of example and preference, the first and second reflective surfaces 46, 48 are provided by corresponding mirrors 74, 76. As can be seen from FIG. 4, the light beam 12 is widened as it passes through the beam-shaping optics 14 . Otherwise, the configuration according to FIG. 4 corresponds to the configuration according to FIG. 3. In configurations that are not shown, it is also possible for the first reflection surface 46 to be concavely curved and the second reflection surface 48 to be convexly curved. The light beam 12 is then narrowed as it passes through the beam shaping optics 14 . In the configurations shown in FIGS. 3 and 4, the first reflection surface 46 or the first parabolic mirror 62 or the mirror 74 a first optical element 78 and the second reflection surface 48 or. the second parabolic mirror 64 or the mirror 76 form a second optical element 80 which together have a beam-widening effect.

In the configurations shown in FIGS. 5 to 7, the first reflection surface 46 is provided by a first flat mirror 82 and the second reflection surface 48 by a second flat mirror 84 . In such an arrangement, the light beam 12 is redirected by the first beam turning surface 26 onto the first plane mirror 82 which redirects the light beam 12 onto the second plane mirror 84 . The second planar mirror 84 then directs the light beam 12 onto the second beam deflecting surface 30 (mirror 28).

In the example, the planar mirrors 82 , 84 themselves do not have the effect of expanding or narrowing the beam. Instead, in the configurations according to FIGS. 5 to 7, further optical elements are arranged in a beam path 86 between the first reflection surface 46 and the second reflection surface 48 . By way of example, the planar mirrors 82 , 84 are arranged in a fixed manner.

In the embodiment shown in Figure 5 is in the

Beam path 86 between the first and second

Reflective surface 46, 48 a single optical element 88 arranged, which has a beam-widening or beam-rejuvenating effect. For example, the optical element 88 can be a diffractive, reflective, absorbing, or refracting optical element.

In the embodiment shown in Figure 6, the beam is expanded by the interaction of an optical dispersing element 90 (first optical element 78), e.g. in the form of a dispersing lens 92, and an optical collecting element 94 (second optical element 80), e.g. in the form of an optical collecting lens 96, scored. As shown in FIG. 6, the scattering element 90 is arranged first and then the collecting element 94 in the beam path 86 from the first reflection surface 46 to the second reflecting surface 48. The scattering element 90 is arranged within a focal length f of the collecting element 94. In this configuration, the light beam 12 is expanded as it passes through the beam-shaping optics 14 . It is also possible for the scattering element 90 and the collecting element 94 to be interchanged, so that the collecting element 94 and then the scattering element 90 are arranged in the beam path 86 from the first reflection surface 46 to the second reflection surface 48 . Then the beam-shaping optics 14 have a beam-shaping effect.

Figure 7 shows a further embodiment of the beam shaping optics 14, in which in the beam path 86 between the first and second reflection surface 46, 48 a first collecting element 98 (first optical element 78), e.g. in the form of a collecting lens 96, and a second Collecting element 100 (second optical element 80), for example. In the form of a converging lens 96, are arranged. The first collection element 98 has a first focal length f'i and the second collection element 100 has a second focal length f ₂ . As can be seen from FIG. 7, the first and second collection elements 98, 100 are arranged at a distance d from one another, which corresponds to the sum of the first and second focal lengths f'i, f'2. In the example, the focal length f′i of the first collecting element 98 is smaller than the focal length f′2 of the second collecting element 100. In this respect, the light beam 12 is expanded as it passes through the beam-shaping optics 14. In configurations that are not shown, it is also conceivable that the focal length f′i of the first collecting element 98 is greater than the focal length f ₂ of the second collecting element 100. Such a beam-shaping optical system 14 then has a beam-rejuvenating effect.

FIG. 8 shows a schematic representation of a further configuration of the beam-shaping device 10, in which the plurality of beam-shaping optics 14 is provided by a free-form surface 102, which extends along a scan path 44 of the beam deflection device 22. In this configuration, the first reflection surfaces 46 are formed by surface sections 104 of the free-form surface 102 arranged one behind the other along the scanning path 44 . The second reflection surfaces 48 are correspondingly provided by second surface sections 106 of the free-form surface 102 arranged one behind the other along the scanning path 44 . By way of example and preferably, the first reflection surfaces 46 or first Surface sections 104 along the scan path 44 continuously into one another. By way of example and preferably, the second reflection surfaces 48 or second surface sections 106 along the scan path 44 continuously into one another. In configurations that are not shown, it is also possible that the first reflection surfaces 46 are provided by surface sections of a first free-form surface and the second reflection surfaces 48 are provided by surface sections of a second free-form surface, in particular provided separately from the first free-form surface.

the fig . FIG. 9 shows a schematic representation of a lithography device, which is denoted overall by the reference numeral 108 . The lithography device is designed for writing a structure 110 in a lithography material 112 . The lithography device 108 includes a light source 114 for emitting a light beam 12 , in particular a laser beam 12 . The lithography device 10 also includes a generally designated by the reference numeral 116 and shown in FIG. 9 only indicated beam guidance device for defining a beam path 117 for the light beam 12 from the light source 114 to the lithographic material 112 to be structured. The beam guiding device 116 can, for example, comprise a plurality of modules (not shown) which fulfill optical and/or mechanical functions. The lithography apparatus 108 also includes focusing optics 118 for focusing the light beam 12 in a focus area 120 . The focusing optics 114 include, for example, a focusing objective 122 through which the light beam 12 is radiated into the lithographic material 110 . The lithography device 108 also includes a beam shaping device 10 as described above.

In addition, the lithography device includes a scanning device 124, by means of which the focus area 120 of the light beam 12 can be displaced within a writing area 126 relative to the lithography material 120 with a precision required for structuring. In the example shown, the scanning device 124 is arranged in the propagation direction 128 of the light beam 12 between the beam shaping device 10 and the focusing optics 118 . The scanning device 124 can, for example. include a galvanometer scanner unit for controlled deflection of the light beam 12 .

As in Fig. 9 , the lithographic material 112 is provided on a substrate surface 130 of a substrate 132 . By way of example and preferably by means of a positioning device 134 , the substrate 132 can be displaced in a precise position relative to the focal region 120 of the light beam 12 .

The lithography device 108 also includes a control device (not shown), which is set up to control the lithography device 108 head for . The control device is preferably set up to control the beam-shaping device 10 in such a way that the light beam 12 is fed to predetermined beam-shaping optics 14 depending on a scanning position of the focal area 126 within the scanning area. The control device is also set up, for example, to change a light output as a function of the scanning position of the focal area 116 . For example, it is conceivable that the lithography device 108 includes an acousto-optical modulator (not shown) that can be controlled by the control device and is set up to change a light output of the light beam 12 emitted by the light source 114 .

Claims

38

Beam shaping device (10) for the variable setting of a beam shape, in particular a beam cross section (58), a light beam (12), in particular a laser beam, comprising

- A plurality of beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5), which are each designed to change a beam shape, in particular a beam cross section (58), of an input light beam (18). , wherein at least a subset of the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) is set up to generate a different beam shape;

- a beam deflection device (22), which is set up to selectively direct a light beam (12) radiated into the beam shaping device (10) to only one of the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5 ) and to define an output beam path (40) for an output light beam (20) leaving these beam-shaping optics (14-1, 14-2, 14-3, 14-4, 14-5). Beam shaping device (10) according to claim 1, wherein at least a subset of the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) is set up to 39 to generate an asymmetrical and/or slit-shaped beam shape. Beam shaping device (10) according to one of claims 1 or 2, wherein the beam shaping optics

(14-1, 14-2, 14-3, 14-4, 14-5) in each case at least one optical element (88) which acts as a beam-expanding or beam-verifying agent, or at least two optical elements (78, 80) which together have a beam-widening or beam-rejuvenating effect. Beam shaping device (10) according to claim 3, wherein the at least one optical element (88) a. is a diffractive, reflective, absorbing, ref racting or acousto-optical optical element and/or b. is arranged translationally displaceable or rotatable, in particular vibrating. Beam shaping device (10) according to claim 3, wherein a. a first optical element (78) is an optical diverging element (90), in particular a diverging lens (92) or a diverging mirror (74), and a second optical element (80) is an optical collecting element (94), in particular a collecting lens (96) or a collecting mirror (76), or b. a first and a second optical element (78, 80) each having an optical collecting element (90, 94), 40 are in particular a converging lens (92) or a converging mirror. Beam shaping device (10) according to one of the preceding claims, wherein the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) each have a reflection surface pair (50) with a first reflection surface (46) and a second reflective surface (48), the first and the second reflective surface (46, 48) of a reflective surface pair (50) being designed and arranged in such a way that a light beam (12) impinging on the first reflective surface (46) from the first reflective surface (46) is deflected onto the second reflection surface (48). Beam shaping device (10) according to Claim 6 when referring back to one of Claims 3 to 5, wherein in a beam path (86) between the first and second reflection surface (46, 48) the at least one optical element (88) or the at least two optical elements (78 , 80) are arranged, in particular wherein the first and the second reflection surface (46, 48) are flat. Beam shaping device (10) according to one of claims 6 or 7, wherein in a beam path (86) from the first reflection surface (46) to the second reflection surface (48) a. first a diffusing optical element (90) and then a collecting optical element (94). or vice versa, wherein the diffusing optical element (90) is located within a focal length (f) of the collecting optical element (94), or b. first a first optical collection element (98) and then a second optical collection element (100) is arranged, the first optical collection element (98) and the second optical collection element (10) being arranged at a distance (d) from one another which is the sum of the Focal length (f'i) of the first optical collecting element (98) and the focal length (f'2) of the second optical collecting element (100). Beam shaping device (10) according to claim 6, wherein the first and the second reflection surface (46, 48) are formed such that a beam shape of the light beam ( 12) can be changed symmetrically or asymmetrically, in particular a beam cross section (58) can be enlarged or reduced. Beam shaping device (10) according to one of

Claims 6 or 9, wherein the first and second reflection surfaces (46, 48) are curved, in particular paraboloid-shaped, with one of the two reflection surfaces (46) being convex and wherein the other reflecting surface (48) is concave. Beam shaping device (10) according to one of claims 6 or 9, wherein the first and the second reflection surface (46, 48) are paraboloid-shaped, in particular by parabolic mirrors (62, 64) are provided, the first

Reflective surface (46) and the second reflective surface (48) are defined by different paraboloid functions, the first reflective surface (46) having a first focal point (f ₂ ) and the second reflective surface (48) having a second focal point (f ₂ ), wherein the first and the second reflection surface (46, 48) are arranged relative to one another in such a way that the first and the second focal point (f ₂ , f ₂ ) coincide. Beam shaping device (10) according to any one of claims 6 to 11, wherein the first reflection surface

(46) and/or the second reflection surface (48) are designed as a free-form surface (102). Beam shaping device (10) according to one of the preceding claims, wherein the beam deflection device (22) is set up to displace the input light beam (18) along a scan path (44), the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5), in particular the first reflection surfaces (46) and/or the second 43

Reflective surfaces (48), sequentially along the scan path (44) are arranged. Beam shaping device (10) according to any one of claims 6 to 13, wherein the first reflection surfaces

(46) by first surface sections (104), in particular continuously merging into one another, of a preferably continuous first free-form surface (102) extending in particular along the scanning path (44) and/or wherein the second reflection surfaces (48) are provided by, in particular continuously second surface sections (106) merging into one another of a preferably continuous second free-form surface (102) extending in particular along the scanning path (44). Beam shaping device (10) according to one of the preceding claims, wherein the beam deflection device (22) has a first beam deflection surface (26), in particular a first mirror (24), more particularly a first galvanometer mirror (24), and a second beam deflection surface (30), in particular a second mirror (28), more particularly a second galvanometer mirror (28), wherein the first beam deflection surface (26) is set up to direct an input light beam (18) impinging on it, in particular directly, onto the first reflection surface (46). the 44

to deflect beam-shaping optics (14-1, 14-2, 14-3, 14-4, 14-5), and wherein the second beam deflection surface (48) is set up for one of the second reflection surface (48) of this beam-shaping optics (14 -1, 14-2, 14-3, 14-4, 14-5) deflected output light beam (20) to define an output beam path (40).

16. The beam shaping device (10) according to claim 15, wherein the first beam deflection surface (26) can be pivoted about a first pivot axis (34) in such a way that pivoting the first beam deflection surface (26) about the first pivot axis (34) causes the input light beam (18) to optionally can be deflected onto one of the first reflection surfaces (46) of the beam-shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) and/or wherein the second beam deflection surface (48) can be pivoted about a second pivot axis (38) is pivotable, in particular wherein the first and the second pivot axes (34, 38) are collinear.

17. Beam shaping device (10) according to claim 16, wherein a pivoting movement of the first beam deflection surface (26) about the first pivot axis (34) and a pivoting movement of the second beam deflection surface (30) about the second pivot axis (38) are synchronized, in particular positively coupled.

18. Beam shaping device (10) according to claim 15, wherein the first and the second beam deflection surface (26, 28) by a common mirror (52), in particular by a preferably continuous mirror surface 45 of this mirror (52) are provided, the mirror (52) being pivotable about a mirror pivot axis (56). Beam shaping device (10) according to any one of claims 16 to 18, wherein the beam shaping optics

(14-1, 14-2, 14-3, 14-4, 14-5), in particular the reflective surface pairs (50), are arranged along a circumference around the first pivot axis (34) or the mirror pivot axis (56). Beam shaping device (10) according to one of Claims 16 to 19 when dependent on one of Claims 6 to 15, the first and second pivot axes (34, 38) or the mirror pivot axis (56) being aligned with a respective axis of curvature of the first and/or second reflection surface (46, 48), in particular an axis of curvature of the first and / or second parabolic mirror (62, 64), are oriented orthogonally. Beam shaping device (10) according to one of Claims 16 to 20 when referring back to Claim 6, wherein the beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) are designed in such a way that an output beam direction (49 ) an output light beam (20) reflected by the second reflection surface (48) runs parallel to an input beam direction (47) of the input beam (18) radiated onto the first reflection surface (46) and that the output beam direction (49) 46 and the input beam direction (47) lie within a plane containing the first and the second pivot axis (34, 38) or the mirror pivot axis (56). Lithography device (108) for producing a structure (110) in a lithographic material (112), comprising

- A light source (114) for emitting a light beam (12);

- A beam guiding device (116) for defining a beam path (117) for the light beam (12) from the light source (114) to the lithographic material (112);

- a beam shaping device (10) according to any one of the preceding claims;

- Focusing optics (118) for focusing the light beam (12) in a focus area (120); and

- a scanning device (124), arranged in particular along a propagation direction (128) of the light beam (12) between the beam shaping device (10) and the focusing optics (118), for shifting the focus area (126) of the light beam (12) within a scanning area. Lithography apparatus (108) according to claim 22, further comprising a controller for 47

Controlling the lithography device (108), wherein the control device is set up to control the beam shaping device (10) in such a way that the light beam (12) depending on a scanning position of the focus area (120) within the

Scanning surface of a predetermined beam shaping optics (14-1, 14-2, 14-3, 14-4, 14-5) is supplied, in particular wherein the control device is also set up to change a light output, in particular laser output, depending on the scanning position. Lithography device (108) according to one of Claims 22 or 23, also comprising an adjustment device for adjusting a focus position of the focus area (120) along the optical axis (z) of the light beam (12), in particular as a function of a selected beam shaping optics (14-1, 14 -2, 14-3, 14-4, 14-5) .