WO2008049389A1 - Device for machining a workpiece by means of laser radiation - Google Patents

Device for machining a workpiece by means of laser radiation Download PDF

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Publication number
WO2008049389A1
WO2008049389A1 PCT/DE2007/001815 DE2007001815W WO2008049389A1 WO 2008049389 A1 WO2008049389 A1 WO 2008049389A1 DE 2007001815 W DE2007001815 W DE 2007001815W WO 2008049389 A1 WO2008049389 A1 WO 2008049389A1
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Prior art keywords
partial
partial beams
focusing
beams
workpiece
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PCT/DE2007/001815
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German (de)
French (fr)
Inventor
Gennadij Kusnezow
Andreas Boenke
Marc Hüske
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Lpkf Laser & Electronics Ag
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Publication of WO2008049389A1 publication Critical patent/WO2008049389A1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • B23K26/0676—Dividing the beam into multiple beams, e.g. multifocusing into dependently operating sub-beams, e.g. an array of spots with fixed spatial relationship or for performing simultaneously identical operations

Definitions

  • the invention relates to a device for processing a workpiece by means of laser radiation with a beam splitter for generating at least two substantially parallel partial beams and at least one focusing optics for focusing each partial beam in a common focusing plane, wherein in the beam path of at least two partial beams a reflector for deflecting the respective Partial beam is arranged in a common plane parallel to the focusing plane in the direction of opposing, arranged between the reflectors deflecting surfaces and wherein the deflecting surfaces are each arranged inclined relative to the focusing plane by an angle of 45 °.
  • Such a device serves in practice the simultaneous, for example, parallel, machining of the workpiece by means of parallel partial beams.
  • a partially transmissive mirror is used as a beam splitter, which is arranged downstream of a reflector in the beam path of at least one sub-beam, so as to produce a parallel beam path.
  • each partial beam is focused in a common focusing plane on the workpiece.
  • a generic device is known for example from US 61 03 990 A.
  • devices with a beam splitter are also described in EP 06 24 424 A1 and in US 69 27 109 B1.
  • the desired, in particular stepless, adjustability of the spacing of the partial beams proves to be problematic.
  • the reflector can be made movable relative to the beam path of the other sub-beam, so as to produce the desired distance.
  • the invention has for its object to provide a simple way to change the distance of the partial beams and thereby avoid a change in the focusing plane due to the change in distance of the parallel partial beams, so that the control effort can be kept low.
  • a device in which the deflecting surfaces assigned to the respective sub-beams are arranged to be movable relative to the respective reflector, perpendicular to the focusing plane.
  • the invention is based on the idea that the parallel partial beams are first deflected by the respective reflector by 90 ° in a common plane and then deflected by deflection at the inclined by 45 ° deflection again by 90 ° to the focusing plane, so the parallelism is restored.
  • the inventive concept is now that the reflector is movable together with the respective focusing optics perpendicular to the focusing plane, so that the beam path between the reflector and a deflection point on the deflection can be changed. At the same time this also changes the Beam path between the deflection point on the deflection surface and the workpiece plane by the same amount, but with opposite signs, so that the beam path and thus the focusing plane are unchanged.
  • each partial beam can be arranged in the beam path in front of or behind the reflector, wherein the distance of the deflection surfaces relative to the workpiece for adjusting the focus position could be adjustable.
  • the deflection surfaces could be designed as separate components independently of each other and optionally adjustable.
  • a modification of the present invention in which the deflection surfaces are designed as outer surfaces of a common deflection element, in particular of a 90 ° deflection prism, in order to ensure an invariable relative position of the deflection surfaces, which enclose an angle of 90 ° to one another, is particularly simple , At the same time the design effort for the preparation of the device is reduced.
  • the distance of the focusing optics and the reflector in the beam path of each sub-beam is basically immutable, with an adjustability can be provided.
  • the focusing optics respectively assigned to the two sub-beams and the reflector are designed as a structural unit which can be moved by means of a drive so as to avoid the design complexity.
  • a modification is not excluded in application of a kinematic reversal, in which the deflection surfaces together with the workpiece holder form a movable, in particular perpendicular to the focusing plane movable unit.
  • a particularly practical embodiment of the invention can be achieved in that the two focusing optics and the two reflectors of the two partial beams are designed to be jointly movable by means of a drive.
  • the focusing optics respectively assigned to the partial beams and the respective associated reflector are designed to be movable relative to each other, in particular adjustable, so as to be able to set a change of the focusing plane.
  • the focusing optics associated with the partial beams may be arranged to be movable independently of or in relation to the reflectors.
  • the focusing optics has a focusing lens, in particular a plano-convex lens, and thus permits a cost-effective construction.
  • a retardation plate is arranged in the beam path in front of the beam splitter having a polarizer.
  • a ⁇ / 4 plate can be arranged in the beam path in front of the beam splitter to produce circularly polarized light so as to ensure substantially equal power components of both partial beams.
  • initially circularly polarized light is generated by means of the ⁇ / 4 plate arranged in the beam path in front of the beam splitter, so that a uniform distribution of the light can be ensured in the two partial beams due to the splitting which can be generated by means of the optical element.
  • the beam splitting takes place practically in that the beam splitter has a polarizer.
  • Another likewise particularly promising modification is achieved when the laser radiation is divided by means of a prism, for example Wollaston prism, into two divergent partial beams.
  • a prism for example Wollaston prism
  • another prism is arranged such that the divergent beams exit from the prism as parallel partial beams.
  • the distance of the parallel partial beams is now adjustable by the variable distance of the prism relative to the Wollaston prism.
  • the beam splitter has a diffractive optical element which makes it possible to divide a coupled-in beam arbitrarily, in this case into two equal branches.
  • the power components of the two partial beams are designed to be adjustable in order to be able to ensure a match in particular.
  • the device is designed to generate a parallel to the two outer sub-beams third sub-beam, which is equally spaced therefrom, so as to simplify the machining of the workpiece by means of the three sub-beams.
  • FIG. 1 shows a device for processing a workpiece by means of two parallel partial beams.
  • Fig. 2 shows an apparatus for processing a workpiece by means of three parallel partial beams.
  • FIG. 1 shows in a schematic diagram a device 1 for processing a workpiece 2 by means of two parallel partial beams 3, 4 of a laser radiation 5.
  • the laser radiation 5 by means of an executed as a polarizer optical element 6, which is a ⁇ / 4 plate. 7 is connected upstream of the generation of circularly polarized light, split into the two partial beams 3, 4 equal power density.
  • a reflector 8, 9 is arranged, through which the respective partial beam 3, 4 in a common plane 10 parallel to a matching with the surface of the workpiece 2 focusing plane 11 in the direction of opposing deflection surfaces 12, 13 of a joint deflecting element 14 is deflected.
  • a focusing optics 15, 16 arranged in the beam path of each partial beam 3, 4 is provided together with the respective reflector 8, 9 of the same sub-beam 3, 4 relative to the deflection surface 12, 13 perpendicular to the focusing plane 11 from the position shown yi arranged in a dashed position y 2 by the difference ⁇ y vertically movable.
  • the focusing optics 15, 16 and the reflector 8, 9 are immovable to each other, wherein both partial beams 3, 4 are designed to be movable together by means of a drive, not shown.
  • Figure 2 shows a device 18 for machining a workpiece 2 by means of the already shown in Figure 1 partial beams 3, 4 and a third, to the partial beams 3, 4 partial beam 19.
  • the laser radiation 5 by means of the optical element 6 in the three Partial beams 3, 4, 19 of equal power density split.
  • the focusing optics 20 arranged in the beam path of the partial beam 19 are movable independently of the focusing optics 15, 16 assigned to the partial beams 3, 4. This mobility is basically only the possibly required change in the focal distance.
  • the partial beam 19 also forms the axis of symmetry of the outer partial beams 3, 4, so that the respective distance A 3 , A 4 of the outer partial beams 3, 4 of the partial beam 19 is independent of the set beam spacing.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

The invention relates to a device (1) for machining a workpiece (2) by means of parallel partial beams (3, 4) of a laser radiation (5). Arranged in the beam path of each partial beam (3, 4) is a reflector (8, 9) that deflects the respective partial beam (3, 4) into a common plane (10) parallel to a focusing plane (11) - corresponding to the surface of the workpiece (2) - in the direction of mutually opposite deflection surfaces (12, 13) of a common deflection element (14). The deflection surfaces (12, 13) are in each case arranged in a manner inclined by an angle (ß = 45°) with respect to the focusing plane (11), such that the partial beams (3, 4) are focused onto the workpiece (2) in parallel fashion. In order to enable the distance (A1, A2) between the parallel partial beams (3, 4) on the workpiece (2) without any change in the focusing plane (11), an assigned focusing optical unit (15, 16) in the beam path of each partial beam (3, 4) is arranged such that it can be moved vertically together with the respective reflector (8, 9) of the same partial beam (3, 4) relative to the deflection surface (12, 13) perpendicular to the focusing plane (11) into different positions (y1, y2) by a difference magnitude (Δy). The respective distance (A1, A2) between the partial beams (3, 4) thereby changes by a corresponding matching difference magnitude (Δx) with respect to a central position (17) between the partial beams (3, 4) such that the ray path is unchanged independently of the position (y1, y2).

Description

Vorrichtung zur Bearbeitung eines Werkstücks mittels Laserstrahlung Device for processing a workpiece by means of laser radiation
Die Erfindung betrifft eine Vorrichtung zur Bearbeitung eines Werkstücks mittels Laserstrahlung mit einem Strahlteiler zur Erzeugung von zumindest zwei im Wesentlichen parallelen Teilstrahlen und mit zumindest einer Fokussieroptik zum Fokussieren jedes Teilstrahls in eine gemeinsame Fokussierebene, wobei im Strahlengang von zumindest zwei Teilstrahlen ein Reflektor zur Umlenkung des jeweiligen Teilstrahls in eine gemeinsame Ebene parallel zu der Fokussierebene in Richtung auf einander gegenüberliegende, zwischen den Reflektoren angeordnete Umlenkflächen angeordnet ist und wobei die Umlenkflächen jeweils gegenüber der Fokussierebene um einen Winkel von 45° geneigt angeordnet sind.The invention relates to a device for processing a workpiece by means of laser radiation with a beam splitter for generating at least two substantially parallel partial beams and at least one focusing optics for focusing each partial beam in a common focusing plane, wherein in the beam path of at least two partial beams a reflector for deflecting the respective Partial beam is arranged in a common plane parallel to the focusing plane in the direction of opposing, arranged between the reflectors deflecting surfaces and wherein the deflecting surfaces are each arranged inclined relative to the focusing plane by an angle of 45 °.
Eine solche Vorrichtung dient in der Praxis der zeitgleichen, beispielsweise parallelen, Bearbeitung des Werkstücks mittels paralleler Teilstrahlen. Bei einer einfachen Bauform wird als Strahlteiler ein teildurchlässiger Spiegel eingesetzt, dem im Strahlengang zumindest eines Teilstrahls ein Reflektor nachgeordnet ist, um so einen parallelen Strahlengang zu erzeugen. Mittels einer Fokussieroptik wird jeder Teilstrahl in eine gemeinsame Fokussierebene auf das Werkstück fokussiert.Such a device serves in practice the simultaneous, for example, parallel, machining of the workpiece by means of parallel partial beams. In a simple design, a partially transmissive mirror is used as a beam splitter, which is arranged downstream of a reflector in the beam path of at least one sub-beam, so as to produce a parallel beam path. By means of focusing optics, each partial beam is focused in a common focusing plane on the workpiece.
Eine gattungsgemäße Vorrichtung ist beispielsweise durch die US 61 03 990 A bekannt. Weiterhin sind Vorrichtungen mit einem Strahlteiler auch in der EP 06 24 424 A1 sowie in der US 69 27 109 B1 beschrieben. Als problematisch erweist sich in der Praxis die gewünschte, insbesondere stufenlose, Einstellbarkeit des Abstands der Teilstrahlen. Hierzu kann der Reflektor gegenüber dem Strahlengang des anderen Teilstrahls verfahrbar ausgeführt sein, um so den gewünschten Abstand zu erzeugen.A generic device is known for example from US 61 03 990 A. Furthermore, devices with a beam splitter are also described in EP 06 24 424 A1 and in US 69 27 109 B1. In practice, the desired, in particular stepless, adjustability of the spacing of the partial beams proves to be problematic. For this purpose, the reflector can be made movable relative to the beam path of the other sub-beam, so as to produce the desired distance.
Als nachteilig erweist sich bei diesem Lösungsvorschlag die mit der Abstandsänderung zugleich verbundene Änderung der Mittellage der beiden Teilstrahlen, die durch eine überlagerte Bewegung der gesamten Vorrichtung ausgeglichen werden muss.A disadvantage is found in this proposed solution with the change in distance simultaneously associated change of the central position of the two partial beams, which must be compensated by a superimposed movement of the entire device.
Der Erfindung liegt die Aufgabe zugrunde, eine einfache Möglichkeit zur Änderung des Abstandes der Teilstrahlen zu schaffen und dabei eine Änderung der Fokussier- ebene aufgrund der Abstandsänderung der parallelen Teilstrahlen zu vermeiden, sodass der Steuerungsaufwand gering gehalten werden kann.The invention has for its object to provide a simple way to change the distance of the partial beams and thereby avoid a change in the focusing plane due to the change in distance of the parallel partial beams, so that the control effort can be kept low.
Diese Aufgabe wird erfindungsgemäß mit einer Vorrichtung gemäß den Merkmalen des Anspruchs 1 gelöst. Die Unteransprüche betreffen besonders zweckmäßige Weiterbildungen der Erfindung.This object is achieved with a device according to the features of claim 1. The subclaims relate to particularly expedient developments of the invention.
Erfindungsgemäß ist also eine Vorrichtung vorgesehen, bei welcher die den jeweiligen Teilstrahlen zugeordneten Umlenkflächen relativ zu dem jeweiligen Reflektor senkrecht zur Fokussierebene beweglich angeordnet sind. Hierdurch wird es in überraschend einfacher Weise möglich, den Abstand der beiden äußeren Teilstrahlen, insbesondere stufenlos und nahezu unbegrenzt, zu verändern, ohne dass damit zugleich eine Änderung der Fokussierebene verbunden ist, sodass insbesondere eine zeitgleiche Nachführung der Vorrichtung relativ zu dem Werkstück entbehrlich ist. Der Erfindung liegt dabei der Gedanke zugrunde, dass die parallelen Teilstrahlen zunächst mittels des jeweiligen Reflektors um 90° in eine gemeinsame Ebene umgelenkt werden und anschließend durch Umlenkung an der um 45° geneigten Umlenk- fläche erneut um 90° auf die Fokussierebene umgelenkt werden, sodass die Parallelität wiederhergestellt ist. Der Erfindungsgedanke liegt nun darin, dass der Reflektor gemeinsam mit der jeweiligen Fokussieroptik senkrecht zu der Fokussierebene verfahrbar ist, sodass der Strahlweg zwischen dem Reflektor und einem Umlenkpunkt auf der Umlenkfläche verändert werden kann. Zugleich ändert sich dadurch auch der Strahlweg zwischen dem Umlenkpunkt auf der Umlenkfläche und der Werkstückebene um denselben Betrag, jedoch mit umgekehrten Vorzeichen, sodass der Strahlweg und damit die Fokussierebene unverändert sind.According to the invention, therefore, a device is provided in which the deflecting surfaces assigned to the respective sub-beams are arranged to be movable relative to the respective reflector, perpendicular to the focusing plane. This makes it possible in a surprisingly simple manner, the distance between the two outer partial beams, in particular infinitely and almost infinitely, to change without causing a change in the focusing plane is connected at the same time, so that in particular a simultaneous tracking of the device relative to the workpiece is unnecessary. The invention is based on the idea that the parallel partial beams are first deflected by the respective reflector by 90 ° in a common plane and then deflected by deflection at the inclined by 45 ° deflection again by 90 ° to the focusing plane, so the parallelism is restored. The inventive concept is now that the reflector is movable together with the respective focusing optics perpendicular to the focusing plane, so that the beam path between the reflector and a deflection point on the deflection can be changed. At the same time this also changes the Beam path between the deflection point on the deflection surface and the workpiece plane by the same amount, but with opposite signs, so that the beam path and thus the focusing plane are unchanged.
5 Die Fokussieroptik jedes Teilstrahls kann dabei im Strahlengang vor oder hinter dem Reflektor angeordnet sein, wobei der Abstand der Umlenkflächen relativ zu dem Werkstück zur Anpassung der Fokuslage justierbar sein könnte. Besonders zweckmäßig ist hingegen eine Ausführungsform der Erfindung, bei der die Umlenkflächen relativ zu einer Werkstückaufnahme unbeweglich ausgeführt sind, sodass währendo der Bearbeitung des Werkstücks keine Veränderung der Fokussierebene auftritt.The focusing optics of each partial beam can be arranged in the beam path in front of or behind the reflector, wherein the distance of the deflection surfaces relative to the workpiece for adjusting the focus position could be adjustable. Particularly useful, however, is an embodiment of the invention in which the deflection surfaces are designed to be immovable relative to a workpiece holder, so that during the processing of the workpiece no change in the focusing plane occurs.
Die Umlenkflächen könnten als separate Bauelemente unabhängig voneinander ausgeführt und gegebenenfalls justierbar sein. Besonders einfach ist jedoch eine Abwandlung der vorliegenden Erfindung, bei der die Umlenkflächen als Außenflä-5 chen eines gemeinsamen Umlenkelements, insbesondere eines 90°-Ablenkprismas ausgeführt sind, um so eine unveränderliche Relativposition der Umlenkflächen sicherzustellen, die dabei zueinander einen Winkel von 90° einschließen. Zugleich wird der konstruktive Aufwand zur Herstellung der Vorrichtung reduziert. o Der Abstand der Fokussieroptik und des Reflektors im Strahlengang jedes Teilstrahls ist grundsätzlich unveränderlich, wobei eine Justierbarkeit vorgesehen sein kann. Besonders sinnvoll ist es dabei, wenn die den beiden Teilstrahlen jeweils zugeordnete Fokussieroptik und der Reflektor als eine mittels eines Antriebs bewegliche Baueinheit ausgeführt sind, um so den konstruktiven Aufwand zu vermeiden. Selbstver-5 ständlich ist dabei in Anwendung einer kinematischen Umkehrung eine Abwandlung nicht ausgeschlossen, bei welcher die Umlenkflächen gemeinsam mit der Werkstückaufnahme eine bewegliche, insbesondere senkrecht zu der Fokussierebene verfahrbare Einheit bilden. o Durch eine unabhängige Bewegung der Reflektoren jedes Teilstrahls kann bedarfsweise lediglich der Abstand eines einzigen Teilstrahls gegenüber einer Mittellage verändert werden. Sofern bei jedem der vorgesehenen Einsatzzwecke die Einhaltung der unveränderlichen Mittellage zwischen den Teilstrahlen erwünscht ist, lässt sich eine besonders praxisgerechte Ausgestaltung der Erfindung dadurch erreichen, dass die beiden Fokussieroptiken und die beiden Reflektoren der beiden Teilstrahlen mittels eines Antriebs gemeinsam beweglich ausgeführt sind.The deflection surfaces could be designed as separate components independently of each other and optionally adjustable. However, a modification of the present invention in which the deflection surfaces are designed as outer surfaces of a common deflection element, in particular of a 90 ° deflection prism, in order to ensure an invariable relative position of the deflection surfaces, which enclose an angle of 90 ° to one another, is particularly simple , At the same time the design effort for the preparation of the device is reduced. o The distance of the focusing optics and the reflector in the beam path of each sub-beam is basically immutable, with an adjustability can be provided. It is particularly useful in this case if the focusing optics respectively assigned to the two sub-beams and the reflector are designed as a structural unit which can be moved by means of a drive so as to avoid the design complexity. Of course, a modification is not excluded in application of a kinematic reversal, in which the deflection surfaces together with the workpiece holder form a movable, in particular perpendicular to the focusing plane movable unit. o By an independent movement of the reflectors of each sub-beam, only the distance of a single sub-beam relative to a central position can be changed as needed. If compliance with the fixed center position between the partial beams is desired for each of the intended purposes, a particularly practical embodiment of the invention can be achieved in that the two focusing optics and the two reflectors of the two partial beams are designed to be jointly movable by means of a drive.
Eine andere vorteilhafte Abwandlung der Erfindung wird erreicht, indem die den Teil- strahlen jeweils zugeordnete Fokussieroptik und der jeweils zugeordnete Reflektor relativ zueinander beweglich, insbesondere einstellbar ausgeführt sind, um so eine Änderung der Fokussierebene einstellen zu können. Hierdurch könnte beispielsweise eine unebene, wellige Oberflächenbeschaffenheit des Werkstücks problemlos ausgeglichen werden. Hierzu können die den Teilstrahlen zugeordneten Fokussieropti- ken unabhängig oder gemeinsam relativ zu den Reflektoren beweglich angeordnet sein.Another advantageous modification of the invention is achieved in that the focusing optics respectively assigned to the partial beams and the respective associated reflector are designed to be movable relative to each other, in particular adjustable, so as to be able to set a change of the focusing plane. As a result, for example, an uneven, wavy surface texture of the workpiece could be easily compensated. For this purpose, the focusing optics associated with the partial beams may be arranged to be movable independently of or in relation to the reflectors.
Bei einer speziellen Ausgestaltung der vorliegenden Erfindung hat die Fokussieroptik eine Fokussierlinse, insbesondere eine Plankonvexlinse und gestattet so einen kos- tengünstigen Aufbau.In a special embodiment of the present invention, the focusing optics has a focusing lens, in particular a plano-convex lens, and thus permits a cost-effective construction.
Weiterhin erweist es sich als zweckmäßig, wenn im Strahlengang vor dem einen Polarisator aufweisenden Strahlteiler ein Verzögerungsplättchen angeordnet ist. Beispielsweise kann im Strahlengang vor dem Strahlteiler ein λ/4-Plättchen zur Erzeu- gung zirkulär polarisierten Lichts angeordnet sein, um so im Wesentlichen gleiche Leistungsanteile beider Teilstrahlen sicherzustellen. Hierdurch wird zunächst mittels des im Strahlengang vor dem Strahlteiler angeordneten λ/4-Plättchens zirkulär polarisiertes Licht erzeugt, so dass eine gleichmäßige Verteilung des Lichtes aufgrund der mittels des optischen Elements erzeugbaren Aufspaltung in die beiden Teilstrah- len sichergestellt werden kann. Die Strahlaufspaltung erfolgt dabei praxisgerecht dadurch, dass der Strahlteiler einen Polarisator aufweist.Furthermore, it proves useful if a retardation plate is arranged in the beam path in front of the beam splitter having a polarizer. For example, a λ / 4 plate can be arranged in the beam path in front of the beam splitter to produce circularly polarized light so as to ensure substantially equal power components of both partial beams. As a result, initially circularly polarized light is generated by means of the λ / 4 plate arranged in the beam path in front of the beam splitter, so that a uniform distribution of the light can be ensured in the two partial beams due to the splitting which can be generated by means of the optical element. The beam splitting takes place practically in that the beam splitter has a polarizer.
Eine andere ebenfalls besonders Erfolg versprechende Abwandlung wird dann erreicht, wenn die Laserstrahlung mittels eines Prismas, beispielsweise Wollaston- Prismas, in zwei divergierende Teilstrahlen aufgeteilt wird. Im Strahlengang beider Teilstrahlen ist hierbei ein weiteres Prisma derart angeordnet, dass die divergierenden Strahlen aus dem Prisma jeweils als parallele Teilstrahlen austreten. Der Abstand der parallelen Teilstrahlen ist nun durch den veränderlichen Abstand des Prismas gegenüber dem Wollaston Prisma einstellbar. Eine andere mögliche Variante ergibt sich, wenn der Strahlteiler ein diffraktives optisches Element aufweist, das es ermöglicht einen eingekoppelten Strahl beliebig, in diesem Fall auf zwei gleiche Zweige, aufzuteilen.Another likewise particularly promising modification is achieved when the laser radiation is divided by means of a prism, for example Wollaston prism, into two divergent partial beams. In the beam path of both partial beams in this case another prism is arranged such that the divergent beams exit from the prism as parallel partial beams. The distance of the parallel partial beams is now adjustable by the variable distance of the prism relative to the Wollaston prism. Another possible variant results if the beam splitter has a diffractive optical element which makes it possible to divide a coupled-in beam arbitrarily, in this case into two equal branches.
Die Leistungsanteile der beiden Teilstrahlen sind dabei einstellbar ausgeführt, um so insbesondere eine Übereinstimmung sicherstellen zu können.The power components of the two partial beams are designed to be adjustable in order to be able to ensure a match in particular.
Zudem ist es besonders praxisgerecht, wenn die Vorrichtung zur Erzeugung eines zu den beiden äußeren Teilstrahlen parallelen dritten Teilstrahls ausgeführt ist, der zu diesen gleich beabstandet ist, um so die Bearbeitung des Werkstücks mittels der drei Teilstrahlen zu vereinfachen.Moreover, it is particularly practical if the device is designed to generate a parallel to the two outer sub-beams third sub-beam, which is equally spaced therefrom, so as to simplify the machining of the workpiece by means of the three sub-beams.
Die Erfindung lässt verschiedene Ausführungsformen zu. Zur weiteren Verdeutli- chung ihres Grundprinzips ist eine davon in der Zeichnung dargestellt und wird nachfolgend beschrieben. Diese zeigt jeweils in einer PrinzipskizzeThe invention allows for various embodiments. To further clarify its basic principle, one of them is shown in the drawing and will be described below. This shows each in a schematic diagram
Fig. 1 eine Vorrichtung zur Bearbeitung eines Werkstücks mittels zwei paralleler Teilstrahlen;1 shows a device for processing a workpiece by means of two parallel partial beams.
Fig. 2 eine Vorrichtung zur Bearbeitung eines Werkstücks mittels drei paralleler Teilstrahlen.Fig. 2 shows an apparatus for processing a workpiece by means of three parallel partial beams.
Figur 1 zeigt in einer Prinzipskizze eine Vorrichtung 1 zur Bearbeitung eines Werk- Stücks 2 mittels zwei paralleler Teilstrahlen 3, 4 einer Laserstrahlung 5. Hierzu wird die Laserstrahlung 5 mittels eines als ein Polarisator ausgeführten optischen Elementes 6, dem ein λ/4-Plättchen 7 zur Erzeugung zirkulär polarisierten Lichts vorgeschaltet ist, in die beiden Teilstrahlen 3, 4 gleicher Leistungsdichte aufgespaltet. In dem Strahlengang jedes Teilstrahls 3, 4 ist ein Reflektor 8, 9 angeordnet, durch den der jeweilige Teilstrahl 3, 4 in eine gemeinsame Ebene 10 parallel zu einer mit der Oberfläche des Werkstücks 2 übereinstimmenden Fokussierebene 11 in Richtung aufeinander gegenüberliegende Umlenkflächen 12, 13 eines gemeinsamen Umlenkelements 14 abgelenkt wird. Die Umlenkflächen 12, 13 sind jeweils gegenüber der Fokussierebene 11 um einen Winkel ß = 45° geneigt angeordnet, so dass die Teil- strahlen 3, 4 parallel auf das Werkstück 2 fokussiert werden. Um den Abstand A-i, A2 der parallelen Teilstrahlen 3, 4 auf dem Werkstück 2 ohne eine Änderung der Fokus- sierebene 11 zu erreichen, ist eine im Strahlengang jedes Teilstrahls 3, 4 angeordnete Fokussieroptik 15, 16 gemeinsam mit dem jeweiligen Reflektor 8, 9 desselben Teilstrahls 3, 4 relativ zu der Umlenkfläche 12, 13 senkrecht zur Fokussierebene 11 aus der dargestellten Position yi in eine gestrichelt dargestellte Position y2 um den Differenzbetrag Δy vertikal beweglich angeordnet. Der Abstand Ai, A2 der Teilstrahlen 3, 4 verändert sich dadurch um den Differenzbetrag Δx gegenüber einer Mittellage 17 zwischen den Teilstrahlen 3, 4. Aufgrund der Neigung der Umlenkflächen 12, 13 um einen Winkel ß = 45° und den zwischen ihnen eingeschlossenen Winkel α = 90° stimmen somit Δy und Δx überein, so dass der Arbeitsabstand unabhängig von der Position yi, y2 unverändert ist. Die Fokussieroptik 15, 16 und der Reflektor 8, 9 sind zueinander unbeweglich, wobei beide Teilstrahlen 3, 4 mittels eines nicht dargestellten Antriebs gemeinsam beweglich ausgeführt sind.1 shows in a schematic diagram a device 1 for processing a workpiece 2 by means of two parallel partial beams 3, 4 of a laser radiation 5. For this purpose, the laser radiation 5 by means of an executed as a polarizer optical element 6, which is a λ / 4 plate. 7 is connected upstream of the generation of circularly polarized light, split into the two partial beams 3, 4 equal power density. In the beam path of each partial beam 3, 4, a reflector 8, 9 is arranged, through which the respective partial beam 3, 4 in a common plane 10 parallel to a matching with the surface of the workpiece 2 focusing plane 11 in the direction of opposing deflection surfaces 12, 13 of a joint deflecting element 14 is deflected. The deflecting surfaces 12, 13 are each inclined relative to the focusing plane 11 by an angle β = 45 °, so that the partial rays 3, 4 are focused parallel to the workpiece 2. In order to achieve the distance Ai, A 2 of the parallel partial beams 3, 4 on the workpiece 2 without a change of the focusing level 11, a focusing optics 15, 16 arranged in the beam path of each partial beam 3, 4 is provided together with the respective reflector 8, 9 of the same sub-beam 3, 4 relative to the deflection surface 12, 13 perpendicular to the focusing plane 11 from the position shown yi arranged in a dashed position y 2 by the difference Δy vertically movable. The distance Ai, A 2 of the partial beams 3, 4 is thereby changed by the difference Δx relative to a central position 17 between the partial beams 3, 4. Due to the inclination of the deflection surfaces 12, 13 by an angle ß = 45 ° and the angle enclosed between them α = 90 ° thus coincide Δy and Δx, so that the working distance is unchanged, irrespective of the position yi, y 2 . The focusing optics 15, 16 and the reflector 8, 9 are immovable to each other, wherein both partial beams 3, 4 are designed to be movable together by means of a drive, not shown.
Demgegenüber zeigt Figur 2 eine Vorrichtung 18 zur Bearbeitung eines Werkstücks 2 mittels der bereits in Figur 1 dargestellten Teilstrahlen 3, 4 sowie eines dritten, zu den Teilstrahlen 3, 4 parallelen Teilstrahls 19. Hierzu wird die Laserstrahlung 5 mittels des optischen Elementes 6 in die drei Teilstrahlen 3, 4, 19 gleicher Leistungs- dichte aufgespalten. Die in dem Strahlengang des Teilstrahls 19 angeordnete Fokussieroptik 20 ist dabei unabhängig von der den Teilstrahlen 3, 4 jeweils zugeordneten Fokussieroptik 15, 16 beweglich. Diese Beweglichkeit dient grundsätzlich lediglich der gegebenenfalls erforderlichen Änderung des Fokusabstandes. Dabei bildet der Teilstrahl 19 zugleich die Symmetrieachse der äußeren Teilstrahlen 3, 4, sodass der jeweilige Abstand A3, A4 der äußeren Teilstrahlen 3, 4 von dem Teilstrahl 19 unabhängig von dem eingestellten Strahlabstand übereinstimmt. Dabei sind die Umlenkflächen 12, 13 zueinander beabstandet, sodass der Teilstrahl 19 durch eine Ausnehmung 21 in dem Umlenkelement 14 zwischen den Umlenkflächen 12, 13 ungehindert auf das Werkstück 2 in der Fokussierebene 11 gelangt. In contrast, Figure 2 shows a device 18 for machining a workpiece 2 by means of the already shown in Figure 1 partial beams 3, 4 and a third, to the partial beams 3, 4 partial beam 19. For this purpose, the laser radiation 5 by means of the optical element 6 in the three Partial beams 3, 4, 19 of equal power density split. The focusing optics 20 arranged in the beam path of the partial beam 19 are movable independently of the focusing optics 15, 16 assigned to the partial beams 3, 4. This mobility is basically only the possibly required change in the focal distance. In this case, the partial beam 19 also forms the axis of symmetry of the outer partial beams 3, 4, so that the respective distance A 3 , A 4 of the outer partial beams 3, 4 of the partial beam 19 is independent of the set beam spacing. In this case, the deflection surfaces 12, 13 spaced from each other, so that the partial beam 19 passes through a recess 21 in the deflection element 14 between the deflection surfaces 12, 13 unhindered on the workpiece 2 in the focusing plane 11.

Claims

PATENTANSPRÜCHE
1. Vorrichtung (1) zur Bearbeitung eines Werkstücks (2) mittels Laserstrahlung (5) mit einem Strahlteiler (6) zur Erzeugung von zumindest zwei im Wesentlichen parallelen Teilstrahlen (3, 4, 19) und mit zumindest einer Fokussieroptik (15, 16, 20) zum Fokussieren jedes Teilstrahls (3, 4, 19) in eine gemeinsame Fokussierebene (11), wobei im Strahlengang von zumindest zwei Teilstrahlen (3, 4, 19) ein Reflektor (8, 9) zur Umlenkung des jeweiligen Teilstrahls (3, 4, 19) in eine gemeinsame Ebene (10) parallel zu der Fokussierebene (11) in Richtung auf einander gegenüberliegende, zwischen den Reflektoren (8, 9) angeordnete Umlenkflächen (12, 13) angeordnet ist und wobei die Umlenkflächen (12, 13) jeweils gegenüber der Fokussierebene (11) um einen Winkel (ß) von 45° geneigt angeordnet sind, dadurch gekennzeichnet, dass die den jeweiligen Teilstrahlen (3, 4) zugeordneten Umlenkflächen (12, 13) relativ zu dem jeweiligen Reflektor (8, 9) senkrecht zur Fokussierebene (11) beweglich angeordnet sind.1. Device (1) for processing a workpiece (2) by means of laser radiation (5) with a beam splitter (6) for generating at least two substantially parallel partial beams (3, 4, 19) and with at least one focusing optics (15, 16, 20) for focusing each sub-beam (3, 4, 19) in a common focusing plane (11), wherein in the beam path of at least two sub-beams (3, 4, 19) a reflector (8, 9) for deflecting the respective sub-beam (3, 4, 19) is arranged in a common plane (10) parallel to the focusing plane (11) in the direction of opposing deflecting surfaces (12, 13) arranged between the reflectors (8, 9), and wherein the deflecting surfaces (12, 13) are each inclined relative to the focusing plane (11) at an angle (β) of 45 °, characterized in that the deflection surfaces (12, 13) associated with the respective sub-beams (3, 4) are relative to the respective reflector (8, 9). arrange movably perpendicular to the focusing plane (11) et are.
2. Vorrichtung (1, 18) nach Anspruch 1, dadurch gekennzeichnet, dass im Strahlengang jedes Teilstrahls (3, 4, 19) eine jeweilige Fokussieroptik (15, 16, 20) angeordnet ist.2. Device (1, 18) according to claim 1, characterized in that in the beam path of each partial beam (3, 4, 19) a respective focusing optics (15, 16, 20) is arranged.
3. Vorrichtung (1 , 18) nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass die Fokussieroptik (15, 16, 20) jedes Teilstrahls (3, 4, 19) im Strahlengang vor dem Reflektor (8, 9) angeordnet ist. 3. Device (1, 18) according to claim 1 or 2, characterized in that the focusing optics (15, 16, 20) of each partial beam (3, 4, 19) in the beam path in front of the reflector (8, 9) is arranged.
4. Vorrichtung (1, 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Fokussieroptik (15, 16, 20) jedes Teilstrahls (3, 4, 19) im Strahlengang hinter dem Reflektor (8, 9) angeordnet ist.4. Device (1, 18) according to at least one of the preceding claims, characterized in that the focusing optics (15, 16, 20) of each partial beam (3, 4, 19) in the beam path behind the reflector (8, 9) is arranged.
5. Vorrichtung (1, 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Umlenkflächen (12, 13) relativ zu einem Werkstück (2) unbeweglich ausgeführt sind.5. Device (1, 18) according to at least one of the preceding claims, characterized in that the deflection surfaces (12, 13) are designed to be immovable relative to a workpiece (2).
6. Vorrichtung (1, 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Umlenkflächen (12, 13) als Außenflächen eines gemeinsamen Umlenkelements (14) ausgeführt sind.6. Device (1, 18) according to at least one of the preceding claims, characterized in that the deflection surfaces (12, 13) are designed as outer surfaces of a common deflecting element (14).
7. Vorrichtung (1) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die den Teilstrahlen (3, 4) jeweils zugeordnete Fokussieroptik (15, 16) und der jeweils zugeordnete Reflektor (8, 9) als eine gemeinsam mittels eines Antriebs bewegliche Baueinheit ausgeführt sind.7. Device (1) according to at least one of the preceding claims, characterized in that the partial beams (3, 4) respectively associated focusing optics (15, 16) and the respective associated reflector (8, 9) as a common by means of a drive movable Building unit are executed.
8. Vorrichtung (1) nach Anspruch 7, dadurch gekennzeichnet, dass die beiden Baueinheiten der Teilstrahlen (3, 4) mittels eines Antriebs gemeinsam beweglich ausgeführt sind.8. Device (1) according to claim 7, characterized in that the two structural units of the partial beams (3, 4) are designed to be jointly movable by means of a drive.
9. Vorrichtung (1) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die den Teilstrahlen (3, 4) jeweils zugeordnete Fokussieroptik (15, 16) und der jeweils zugeordnete Reflektor (8, 9) relativ zueinander beweglich ausgeführt sind.9. Device (1) according to at least one of the preceding claims, characterized in that the partial beams (3, 4) respectively associated focusing optics (15, 16) and the respectively associated reflector (8, 9) are designed to be movable relative to each other.
10. Vorrichtung (1 , 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass im Strahlengang vor dem einen Polarisator aufweisenden Strahlteiler (6) ein Verzögerungsplättchen (7) angeordnet ist.10. Device (1, 18) according to at least one of the preceding claims, characterized in that in the beam path in front of the polarizer having a beam splitter (6) a delay plate (7) is arranged.
11. Vorrichtung (1 , 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Strahlteiler (6) ein Prisma aufweist. 11. Device (1, 18) according to at least one of the preceding claims, characterized in that the beam splitter (6) has a prism.
12. Vorrichtung (1 , 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Strahlteiler (6) ein diffraktives optisches Element aufweist.12. Device (1, 18) according to at least one of the preceding claims, characterized in that the beam splitter (6) has a diffractive optical element.
13. Vorrichtung (1, 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Leistungsanteile der Teilstrahlen (3, 4, 19) einstellbar ausgeführt sind.13. Device (1, 18) according to at least one of the preceding claims, characterized in that the power components of the partial beams (3, 4, 19) are designed to be adjustable.
14. Vorrichtung (1, 18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Leistungsanteile der Teilstrahlen (3, 4, 19) übereinstimmen.14. Device (1, 18) according to at least one of the preceding claims, characterized in that the power components of the partial beams (3, 4, 19) coincide.
15. Vorrichtung (18) nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Vorrichtung (18) zur Erzeugung eines zu den beiden Teilstrahlen (3, 4) parallelen dritten Teilstrahls (19) ausgeführt ist.15. Device (18) according to at least one of the preceding claims, characterized in that the device (18) for generating a to the two partial beams (3, 4) parallel third partial beam (19) is executed.
16. Vorrichtung (18) nach Anspruch 15, dadurch gekennzeichnet, dass der dritte Teilstrahl (19) zwischen den beiden Teilstrahlen (3, 4) angeordnet und zu diesen gleich beabstandet ist.16. Device (18) according to claim 15, characterized in that the third partial beam (19) between the two partial beams (3, 4) is arranged and equally spaced therefrom.
17. Vorrichtung (18) nach Anspruch 15 oder 16, dadurch gekennzeichnet, dass die Umlenkflächen (12, 13) zueinander beabstandet sind und zwischen sich den dritten Teilstrahl (19) einschließen.17. Device (18) according to claim 15 or 16, characterized in that the deflection surfaces (12, 13) are spaced from each other and enclose between them the third partial beam (19).
18. Vorrichtung (18) nach zumindest einem der Ansprüche 15 bis 16, dadurch gekennzeichnet, dass der dritte Teilstrahl (19) unabhängig von den anderen Teilstrahlen (3, 4) einstellbar ist. 18. Device (18) according to at least one of claims 15 to 16, characterized in that the third partial beam (19) is adjustable independently of the other partial beams (3, 4).
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