WO2023078872A1 - Procédé et dispositif de génération de plasma à énergie pulsée accrue au moyen de décharges électriques inhibées diélectriquement - Google Patents
Procédé et dispositif de génération de plasma à énergie pulsée accrue au moyen de décharges électriques inhibées diélectriquement Download PDFInfo
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- WO2023078872A1 WO2023078872A1 PCT/EP2022/080455 EP2022080455W WO2023078872A1 WO 2023078872 A1 WO2023078872 A1 WO 2023078872A1 EP 2022080455 W EP2022080455 W EP 2022080455W WO 2023078872 A1 WO2023078872 A1 WO 2023078872A1
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- charge
- electrode
- collecting element
- edge length
- collecting
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- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000004020 conductor Substances 0.000 claims abstract description 18
- 210000002381 plasma Anatomy 0.000 claims description 19
- 230000004888 barrier function Effects 0.000 claims description 16
- 230000001419 dependent effect Effects 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001465 metallisation Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 241001674048 Phthiraptera Species 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000002085 irritant Substances 0.000 description 1
- 231100000021 irritant Toxicity 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2425—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being flush with the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2437—Multilayer systems
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Definitions
- the invention relates to a method for generating plasmas by means of dielectric barrier electrical discharges and also to a device for carrying out such a method.
- Dielectrically impeded electrical discharges are electrical gas discharges in which a resulting discharge current is limited by a dielectric shielding of at least one electrode to which a voltage causing the discharges is applied. Therefore, dielectric barrier electrical discharges are only maintained with a changing voltage, but not with a DC voltage applied to the electrode.
- DE 10 2011 050 631 A1 discloses a device for generating dielectrically impeded electrical discharges with an AC high-voltage source and with a plurality of stretched metal electrode bodies coupled to the same output of the AC high-voltage source.
- the plurality of electrode bodies are individually capacitively coupled to the output of the AC high voltage source by facing a high voltage bus connected to the output with the interposition of a dielectric solid.
- the several elongated electrode bodies form the tines of a comb that can be used to combat hair lice. The hair lice are killed when they get in the area of the electric discharge filaments emanating from the tips of the stretched electrode bodies.
- DE 10 2015 108 884 A1 discloses a device for plasma treatment of an object, in particular a strip-shaped object, with an electrode and a counter-electrode made of electrically conductive material and with an alternating high-voltage generator.
- the purpose of the alternating high voltage generator is to use an alternating high voltage to induce electrical gas discharges between the electrode and the counter-electrode.
- a dielectric barrier is connected in series with the gas discharge in order to impede the gas discharge dielectrically.
- the electrode and the counter-electrode are arranged next to one another in a contact casing of a roller which is rotatably mounted for contacting the object to be treated.
- the contact jacket has a cover layer made of dielectric material that covers the electrode and the counter-electrode.
- a linear ignition electrode Arranged above the electrode and above the counter-electrode is a linear ignition electrode made of electrically conductive material, which is separated from the electrode and the counter-electrode by the cover layer and is exposed on the outer circumference of the contact jacket.
- the ignition electrodes couple capacitively to the electrode or counter-electrode below them, and field peaks of the electrical field form towards them over the contact jacket. These field peaks ensure reliable ignition of the gas discharges between the areas of the contact jacket defined by the ignition electrodes. Due to the current flowing through the gas discharges, the field peaks on the ignition electrodes balance out so that their presence does not prevent the gas discharges from being evenly distributed over the contact jacket.
- DE 10 2006 011 312 A1 discloses a device for plasma treatment with an electrode, in front of which a dielectric shield is arranged, and an alternating high voltage source in order to apply an alternating high voltage to the electrode.
- the AC high voltage induces dielectric barrier gas discharges to generate a plasma in a gas at atmospheric pressure located in front of the dielectric shield.
- the electrode has a two-dimensional extended surface over which the AC high voltage applied to the electrode from the AC high voltage source sustains the plasma across the surface of the electrode.
- the surface of the electrode and/or a surface of the dielectric shield has tips facing the gas in front of the dielectric shield. The peaks are provided in an areal distribution.
- the AC high voltage applied to the electrode from the AC high voltage source has a steep voltage rise of at least 5,000 V/ps.
- the tips of the electrode can be realized by forming the electrode from an electrically conductive powder, for example a bronze powder.
- DE 10 2013 112 316 A1 discloses a piezoelectric transformer with a surface structure that has protruding surface structure segments. The width of each surface structure segment is smaller than the width of the piezoelectric transformer.
- the surface structure is designed in such a way that a gas discharge caused by the transformer in conjunction with a counter-electrode starts at a large number of discharge initiation points on the surface structure.
- a device for generating a gas discharge with a piezoelectric transformer and a discharge structure is known from DE 10 2019 122 930 A1.
- the discharge structure influences the resulting electric field, and in this way the shape of a generated gas discharge or plasma discharge is determined.
- the known device can be designed to ignite plasma by a dielectric barrier discharge or by a corona discharge.
- the discharge structure can have an outer metallization and an element made of metal that is, for example, needle-shaped, blade-shaped, wire-shaped or brush-shaped. The above element affects the field distribution of the electric field. If the protruding element is pointed, there will be a strong field increase at the tip of the protruding element. Gas is discharged in a point form at this point.
- some of the bristles may be conductive and some of the bristles may be non-conductive.
- the conductive bristles also cause a field increase at their tips.
- Non-conductive bristles can be used to mechanically work a surface.
- DE 21 2018 000 015 U1 discloses a device for generating a non-thermal atmospheric pressure plasma with a housing in which a piezoelectric transformer is arranged.
- the housing has a coating to destroy an irritant gas.
- An opening of the housing is closed by a coupling plate comprising a non-conductive material.
- the interface plate forms a dielectric barrier whereby plasma can be ignited on the outside of the interface plate.
- Metallization is arranged on the side of the coupling plate which points away from the piezoelectric transformer. The metallization affects the field generated by the piezoelectric transformer. In this way, the plasma ignited on the outside of the coupling plate can form to be influenced.
- the plasma can be bundled or fanned out by appropriate shaping or metallization.
- the invention is based on the object of demonstrating a method and a device for generating plasmas by means of dielectrically impeded electrical discharges in which pulse energies of the plasma, i. H. Duration and/or current intensities of the discharge currents flowing in individual spatial areas with each rapid increase in the voltage are increased compared to known methods and devices.
- the object of the invention is achieved by a method having the features of independent patent claim 1 and by a device having the features of independent patent claim 10 .
- Preferred embodiments of the method according to the invention and the device according to the invention are defined in the dependent patent claims.
- At least one charge-collecting element made of an electrically conductive material is arranged in and/or on a flat outer surface of a dielectric shielding of an electrode.
- the charge collecting element has an electrically conductive collecting area of at least 1 mm 2 along the outer surface.
- a virtual rectangle of the smallest area, which encloses the charge accumulation element along the outer edge has an edge length ratio of its larger edge length to its smaller edge length of no more than 2.5:1.
- the larger edge length of the virtual rectangle with the smallest area is not greater than 10 mm; the area of the minimum area virtual rectangle is not more than 20% of an electrode area of the electrode extending along the outer surface; and the charge collecting element projects normal to the outer surface by no more than the minor edge length of the outer surface of the electrode dielectric shield.
- the outer surface of the dielectric shield is placed parallel to an object surface to be treated. is one minimum free distance between the surface or the charge-collecting element and the object surface at least 0.5 mm and at most 20 mm.
- a discharge filament emanates from the charge-collecting element with significantly increased pulse energy compared to a charge-collecting element that is not present.
- the electrical conductivity of the charge-collecting element on its collecting surface facing the working gas means that the current flowing through the discharge filament is stronger and/or flows longer than without the charge-collecting element. This effect is visually observable when the dielectric barrier electrical discharges are induced against a transparent counter electrode through which the outer surface of the dielectric shield can be viewed.
- a significantly brighter discharge filament then goes from the charging element, i. H. a discharge filament with significantly higher pulse energy, the standard of comparison being those discharge filaments which emanate from the dielectric barrier shielding next to the charge-collecting element.
- the increase in pulse energy of the discharge filament by the method of the invention is at least 100%, often at least 300% and often at least 700%.
- a plurality of discharge filaments running parallel to one another can also emanate from the charge-collecting element at the same time.
- each of these discharge filaments typically has an increased pulse energy.
- the number of discharge filaments per unit area emanating from the charge collecting element is significantly smaller than that of such discharge filaments which emanate from the outer surface of the dielectric shielding of the electrode without or also next to the charge collecting element. The sum of the discharge currents flowing over the entirety of the discharge filaments is therefore at most only slightly influenced by the charge collecting element.
- the geometric references made to the charge accumulating element mean that the charge accumulating element has a localized shape with low aspect ratio on the outer surface of the dielectric shield, which is essentially spot-shaped. In this case, however, it is not crucial that the charge-collecting element has a specific shape, for example a circular shape.
- the charge collecting element can also be triangular, square, square, polygonal, star-shaped, #-shaped, or generally grid-shaped. Accordingly, it is also not crucial that the charge collecting element has an uninterrupted electrically conductive collecting surface.
- the charge-collecting element is significantly smaller than the electrode area of the electrode arranged on the rear side facing away from the charge-collecting element in the dielectric shielding. These compact dimensions are of approximately the same order of magnitude as the minimum free distance between the outer surface of the dielectric shield or the charge collecting element and the object surface to be treated.
- the varying voltage to be applied to create the dielectric barrier electrical discharges in the working gas between the outer surface and the object surface corresponds to what is usual for generating plasmas from dielectric barrier electrical discharges. There should be a steep rise in voltage with each change in voltage, and the voltage changes should follow each other quickly enough to ignite and sustain the plasma as desired.
- the electrically conductive collecting surface of the charge collecting element determines the area along the outer surface of the dielectric shielding via which charge carriers can be collected with the aid of the electrical conductivity of the charge collecting element and fed into the discharge filament to increase its pulse energy. From an electrically conductive collecting area of 1 mm 2 , a considerable increase in the pulse energy of the discharge filament emanating from the charge collecting element occurs in this way.
- the charge collecting element has a closed electrically conductive collection area of at least 3 mm 2 and more preferably at least 6 mm 2 along the outer surface of the dielectric shield. The possible pulse energy of the discharge filament increases with increasing collection area. At the same time, however, the probability that more than one discharge filament emanates from the charge-collecting element also increases.
- a maximum increase in pulse energy is achieved when the collecting surface is not only closed, ie without gaps, but is also particularly compact, ie has a small edge length ratio of preferably no more than 2:1 and even more preferably no more than 1.5:1 . Aspect ratios at 1:1, such as circles and squares, are most preferred.
- the larger edge length of the virtual triangle with the smallest area, which encloses the charge-collecting element along the outer surface is preferably no greater than 8 mm and even more preferably no greater than 6 mm. If this upper limit is observed, the entire charge collected with the charge-collecting element can flow into the discharge filament, so that its pulse energy is increased to the maximum.
- larger charge-collecting elements on the other hand, as already explained, there is a tendency for a plurality of discharge filaments to emanate from the charge-collecting element, which then also have higher pulse energies than without the charge-collecting element.
- the charge collecting element does not protrude by more than 50% of the smaller edge length of the virtual rectangle normal to the outer surface of the dielectric shielding.
- the charge collecting element is flush with the outer surface of the dielectric shield. This reduces the tendency for charge filaments to form at the outer edge of the charge collecting element, which can be at the expense of a central discharge filament with maximum pulse energy.
- the minimum free distance between the outer surface of the dielectric shield or the charge collecting element and the object surface is preferably at least 1 mm and at most 10 mm, more preferably at least 2 mm and at most 5 mm.
- the working gas can have atmospheric pressure.
- the working gas can be an inert gas, air or pure nitrogen.
- a distance of the charge collecting element to an edge of the planar outer surface of the dielectric shielding of the electrode is preferably at least 50% of the minimum free distance between the outer surface or the charge collecting element and the object surface. Even more preferably, the distance from the charge collecting element to the edge of the planar outer surface of the dielectric shield is at least as great as this minimum free distance.
- the charge collecting element is located in a central area of the outer surface of the dielectric shield of the electrode. In this case, the charge collecting element regularly overlaps completely with the electrode surface of the electrode in a projection normal to the outer surface. In other words, the charge-collecting element is entirely present and not also partially adjacent to the electrode.
- An electrical conductivity of the electrically conductive material of the charge collecting element is at least 3 ⁇ 10 2 A/Vm along the outer surface. An electrical conductivity of this level is also achieved, for example, by semiconductors or semi-metals. An electrical conductivity of the electrically conductive material along the outer surface of at least 1 ⁇ 10 6 A/Vm is preferred, as is achieved by most metals and is clearly exceeded by noble metals such as copper or silver. The electrical conductivity of the electrically conductive material determines the effectiveness of the collection of charge carriers by the charge collecting element and thus also the maximum area from which charge carriers can be introduced into a discharge filament with the aid of the charge collecting element.
- the electrically conductive material is to be selected in such a way that it sufficiently withstands the effects of the increased pulse energy from the discharge filaments emanating from it. For this reason too, the use of a noble metal such as copper or silver or a copper- or silver-based alloy may be preferred.
- not only a single but also a plurality of charge collecting elements made of the electrically conductive material can be arranged in and/or on the planar outer surface of the dielectric shielding of the electrode.
- the distances between the multiple charge collecting elements are at least 75% and preferably at least 150% of the minimum free distance between the outer surface of the dielectric shielding or the charge collecting element and the object surface.
- the electrically conductive collecting surfaces of the plurality of charge collecting elements together cover no more than 50% of the electrode area of the electrode extending along the outer surface. In other words, no charge collecting elements are arranged over at least 50% of the electrode area.
- a voltage source of the inventive apparatus provides a varying voltage for application to the electrode to cause dielectric barrier electrical discharges in a working gas between the outer surface and an object surface to be treated.
- Alignment elements of the device can be designed to align the outer surface parallel to the object surface, with a minimum free distance between the outer surface or the charge-collecting element and the object surface of at least 0.5 mm and a maximum of 20 mm, preferably at least 1 mm and a maximum of 10 mm and more more preferably at least 2 mm and at most 5 mm.
- charge collecting elements made of the electrically conductive material can also be arranged in and/or on the flat outer surface of the dielectric shielding of the electrode, with the distances between the charge collecting elements being at least as large as the smaller edge length of the virtual rectangles and with the charge collecting elements preferably being of the same design and /or are distributed uniformly along the outer surface in one or both main directions of extension of the outer surface.
- the charge-collecting elements can be distributed over the object surface in a two-dimensional array and thus fulfill their function of increasing the pulse energy of discharge filaments distributed over the entire object surface.
- the distances between the charge-collecting elements relative to the free distance between the outer surface and the dielectric shielding or the charge-collecting elements and the object surface are at least 0.7 times and preferably at least 1.5 times as large as this free distance.
- charge-collecting elements can also be arranged closer together if the distance from the object surface is smaller, without an undesired creeping discharge occurring between adjacent charge-collecting elements.
- Each charge collecting element preferably has a maximum thickness normal to the outer surface of the dielectric shield of no more than the minor edge length of the virtual rectangle, preferably no more than 50% the minor edge length, and even more preferably no more than 25% the minor edge length.
- the charge collecting elements can be comparatively thin and the formation of the electric field between the dielectric shield and a surface to be treated essentially by their electrical conductivity rather than by a reduction the minimum distance to the object surface or a reduction of the dielectric shielding in front of the electrode.
- FIG. 1 schematically shows a device according to the invention in a side view when treating an object surface.
- FIG. 2 shows a detail of an embodiment of the device that is modified compared to FIG.
- FIG. 3 shows the detail according to FIG. 2 of a further embodiment of the device that is modified compared to FIG.
- FIG. 4 is a view of an outer surface of a dielectric shield of an electrode of the device of FIG. 1 having a circular charge collecting element.
- FIG. 5 shows a distribution of discharge filaments over the surface of the charge collecting element according to FIG. 4.
- Figure 6 shows the outer surface with dielectric shielding of another embodiment of the device with a triangular charge collecting element.
- FIG. 7 shows the distribution of discharge filaments over the surface of the charge collecting element according to FIG. 6.
- Figure 8 shows the outer surface of the dielectric shield of another embodiment of the device with a square charge collecting element.
- FIG. 9 shows a distribution of discharge filaments over the surface of the charge collecting element according to FIG. 8.
- Figure 10 shows the outer surface of the dielectric shield of another embodiment of the device having multiple circular charge collecting elements.
- Fig. 11 shows the outer surface of the dielectric shield of another embodiment of the device with multiple triangular charge collecting elements
- Figure 12 shows the outer surface of the dielectric shield of another embodiment of the device with multiple square charge collecting elements.
- the device 1 shown in FIG. 1 serves to generate plasmas by means of dielectrically impeded electrical discharges.
- the device 1 has an electrode 2 which is provided with a dielectric shield 3 made of a dielectric 4 .
- An outer surface 5 of the dielectric shielding 3 is arranged at a free distance 6 parallel to an object surface 7 of an object 8 to be treated.
- aligning elements 21 of the device 1 that are shown only schematically in FIG. 1 are provided.
- a voltage source 9 is provided in order to apply a changing voltage, for example an AC voltage or a pulsed DC voltage, to the electrode 2 .
- this changing voltage can be provided by the voltage source 9 relative to earth or ground, with the object 8 serving as a capacitive counter-electrode to the electrode 2 .
- the object 8 is connected to the voltage source 9 as a counter-electrode 10 to the electrode 2 .
- the changing voltage applied between the electrode 2 and the counter-electrode 10 causes the desired dielectric barrier electric discharges in a working gas 11 located between the outer surface 5 and the object surface 7, for example an inert gas, nitrogen or air.
- Cold physical plasmas are generated by the gas discharges, in which reactive species form, with which the object surface 7 is treated.
- the dielectric barrier electric discharges 12 appear in the form of discharge filaments 13 extending between the outer surface 5 and the object surface 7.
- charge collecting elements 14 are embedded in the outer surface 5 in such a way that they end with the outer surface 5 .
- the charge collecting elements 14 consist of electrically conductive material 15 and collect charge carriers via an electrically conductive collecting surface 20 extending along the outer surface 5 , which amplify the discharge filament 13 emanating from the respective charge collecting element 14 .
- the collection area 20 of each charge collection element 14 is 1 mm 2 ; the collecting surface 20 can but does not have to be closed, ie without gaps.
- the area spanned by a non-closed electrically conductive collecting surface 20 of the charge collecting element 14 is also comparatively small and amounts to a maximum of 20% of an electrode surface 19 of the electrode 2 extending along the outer surface 5.
- FIG. 2 shows that this can partially protrude beyond the outer surface 5.
- FIG. The line collecting element 14 shown in FIG. 3 is arranged on the outer surface 5 . However, the projection of the charge collecting element 14 above the outer surface 5 is small.
- the rectangle 16 is the virtual rectangle of the smallest area that encloses the charge collecting element 14 along the outer surface 5 .
- an edge ratio of edge lengths 17 and 18 of the virtual rectangle 16 is 1:1.
- the two edge lengths 17 and 18 are the same here.
- the edge length ratio is a maximum of 2.5:1.
- the larger edge length is not greater than 10 mm.
- an area of the virtual rectangle 16 is not larger than 20% of an electrode area 19 of the electrode 2 extending along the outer surface 5, see also FIG Charge-collecting element 14 protrudes normal to outer surface 5 by no more than the smaller edge length.
- FIG. 5 shows, in a top view of the circular charge-collecting element 14 according to FIG.
- Whether only one discharge filament 13 or several discharge filaments form is not only a question of the dimensions of the charge collecting element 14, in particular its electrically conductive collecting surface 20 along the outer surface 5, but also the free distance 16 to the surface 7 to be treated.
- multiple discharge filaments 13 are distributed relatively evenly across the collection surface 20 of the charge collection member 14.
- the edge lengths 17 and 18 of the virtual rectangle 16 can be the same or different. In the case of an equilateral triangle, the edge length 18 according to FIG. 6 would be smaller than the edge length 17.
- FIG. 7 shows a possible distribution of several discharge filaments 13 over the collecting surface 20 of the charge collecting element 14 according to FIG. 6.
- FIG. 9 shows a possible distribution of discharge filaments 13 over the collecting surface 20 of the square charge collecting element 14 according to FIG. 8.
- Fig. 10 shows several regularly arranged circular charge-collecting elements 14. If the size of the collecting surfaces 20 and the distances between the landing-collecting elements 14 are matched to the free distance 6 according to Fig. 1, each of the charge-collecting elements 14 can have a single discharge filament with maximum pulse energy per rise the voltage from the voltage source 9 emanate.
- 11 shows a plurality of triangular charge-collecting elements distributed over the outer surface 5, the outer surface 5 here, unlike in FIGS. 4, 6, 8 and 10, not being circular but having rounded square dimensions.
- the outer surface 5 according to FIG. 12 also has such rounded square dimensions, over which a plurality of square charge collecting elements 14 are distributed here.
- the individual charge-collecting elements can be formed from copper foil which is bonded to the dielectric 4 made from alumina ceramics, and it can be embedded in the outer surface 5 .
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- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
La présente invention concerne un procédé de génération de plasma au moyen de décharges électriques inhibées diélectriquement (12), dans lequel un élément collecteur de charge constitué d'un matériau électroconducteur (15) est disposé sur une surface extérieure plane (5) d'un blindage diélectrique (3) d'une électrode (2). L'élément collecteur de charge (14) présente une surface collectrice (20) électroconductrice d'au moins 1 mm2 le long de la surface extérieure (5), un faible rapport d'extension et un diamètre maximal de 10 mm. La surface de collecte (20) est bien plus petite que la surface d'électrode (19) de l'électrode (2) située derrière la surface de collecte. L'élément collecteur de charge (14) dépasse au plus légèrement de la surface externe (5). La surface extérieure (5) est disposée à une distance libre minimale (6) comprise entre 0,5 mm et 20 mm sur une surface d'objet à traiter. Une tension variable est appliquée à l'électrode (2) afin de produire des décharges électriques inhibées diélectriquement (12) dans un gaz de travail entre la surface extérieure (5) et la surface de l'objet (7), un filament de décharge (13) avec une énergie pulsée accrue émanant de l'élément collecteur de charge (14).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102021128964.5 | 2021-11-08 | ||
DE102021128964.5A DE102021128964B3 (de) | 2021-11-08 | 2021-11-08 | Verfahren und Vorrichtung zur Erzeugung von Plasmen mit erhöhter Pulsenergie durch dielektrisch behinderte elektrische Entladungen |
Publications (1)
Publication Number | Publication Date |
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WO2023078872A1 true WO2023078872A1 (fr) | 2023-05-11 |
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PCT/EP2022/080455 WO2023078872A1 (fr) | 2021-11-08 | 2022-11-01 | Procédé et dispositif de génération de plasma à énergie pulsée accrue au moyen de décharges électriques inhibées diélectriquement |
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DE (1) | DE102021128964B3 (fr) |
WO (1) | WO2023078872A1 (fr) |
Citations (12)
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DE102006011312A1 (de) | 2006-03-11 | 2007-10-04 | Fachhochschule Hildesheim/Holzminden/Göttingen | Vorrichtung zur Plasmabehandlung unter Atmosphärendruck |
DE102008030913A1 (de) * | 2008-07-02 | 2010-01-07 | Reinhausen Plasma Gmbh | Wundschnellverband |
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DE102011050631A1 (de) | 2011-05-25 | 2012-11-29 | Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen | Vorrichtungen zur Erzeugung elektrischer Entladungen geringer Energie, insbesondere zur Bekämpfung von Haarläusen |
US20150371829A1 (en) * | 2013-02-04 | 2015-12-24 | Creative Technology Corporation | Plasma generator |
DE102013112316A1 (de) | 2013-11-08 | 2015-05-13 | Epcos Ag | Piezoelektrischer Transformator und Gegenelektrode |
DE102015108884A1 (de) | 2015-06-04 | 2016-12-08 | Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen | Vorrichtung zur Plasmabehandlung von insbesondere bandförmigen Objekten |
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DE212018000015U1 (de) | 2017-03-14 | 2018-10-02 | Epcos Ag | Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas und Wirkraum |
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