WO2023017702A1 - 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法 - Google Patents

感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法 Download PDF

Info

Publication number
WO2023017702A1
WO2023017702A1 PCT/JP2022/027517 JP2022027517W WO2023017702A1 WO 2023017702 A1 WO2023017702 A1 WO 2023017702A1 JP 2022027517 W JP2022027517 W JP 2022027517W WO 2023017702 A1 WO2023017702 A1 WO 2023017702A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
atom
sensitive
groups
general formula
Prior art date
Application number
PCT/JP2022/027517
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
修平 山口
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to KR1020247004350A priority Critical patent/KR20240031384A/ko
Priority to JP2023541376A priority patent/JPWO2023017702A1/ja
Publication of WO2023017702A1 publication Critical patent/WO2023017702A1/ja

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Definitions

  • the present invention relates to an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and an electronic device manufacturing method. More specifically, the present invention provides an ultra-microlithography process applicable to ultra LSI (Large Scale Integration) and high-capacity microchip manufacturing processes, nanoimprint mold manufacturing processes, high-density information recording medium manufacturing processes, and the like.
  • the present invention relates to an actinic ray- or radiation-sensitive resin composition, an actinic ray- or radiation-sensitive film, a pattern forming method, and an electronic device manufacturing method which are preferably used in other photofabrication processes.
  • immersion liquid a liquid with a high refractive index
  • Patent Documents 1 and 2 describe a resist composition containing a nitrogen-containing compound having an iodine atom as a quencher.
  • LWR performance refers to performance that can reduce the LWR of a pattern.
  • An actinic ray- or radiation-sensitive resin composition comprising a resin (A) whose polarity increases under the action of an acid and a compound represented by the following general formula (DA1).
  • X1 represents a sulfur atom or NQ3 .
  • Q3 represents a hydrogen atom, an organic group, -OH or -NH2 .
  • Q1 represents a hydrogen atom or a substituent.
  • X2 represents a linking group Xz or a single bond.
  • the linking group Xz is a divalent linking group consisting of at least one atom selected from the group consisting of carbon atoms, oxygen atoms, nitrogen atoms and sulfur atoms.
  • the nitrogen atom may be bonded to a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group
  • the sulfur atom may be bonded to a hydrocarbon group.
  • Ar a1 represents an aromatic group.
  • Q2 represents a hydrogen atom or an alkyl group.
  • Q 1 and Q 2 may combine to form a ring.
  • At least one selected from the group consisting of Q 1 and Q 2 and Q 3 may combine to form a ring.
  • k represents an integer of 1 to 5;
  • m represents an integer of 1 to 3;
  • X 1 , X 2 , Q 1 , Q 2 , Q 3 and Ar a1 may be the same or different when there are a plurality of them. However, when n represents 0, the following condition (i) or (ii) is satisfied.
  • X2 represents the above linking group Xz.
  • X 2 in the general formula (DA1) represents a divalent linking group or a single bond represented by any of the following formulas (X2-1) to (X2-11). Actinic ray or radiation sensitive resin composition.
  • Q4 and Q5 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • X3 and X4 each independently represent a single bond, a hydrocarbon group, an oxygen atom or NQ6 .
  • Q6 represents a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • X5 represents an oxygen atom, a sulfur atom or NG1 .
  • X 6 represents -SG 2 or -NG 3 G 4 .
  • G 1 , G 3 and G 4 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • G2 represents a hydrocarbon group.
  • the resin (A) is selected from the group consisting of repeating units represented by the following general formula (3), repeating units represented by the following general formula (6), and repeating units represented by the following general formula (7).
  • Each of R 5 to R 7 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L2 represents a divalent linking group.
  • Each of R 8 to R 10 independently represents an alkyl group, cycloalkyl group, aryl group, aralkyl group or alkenyl group. Two of R 8 to R 10 may combine to form a ring.
  • R 22 to R 24 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L4 represents a single bond or a divalent linking group.
  • Ar 1 represents an aromatic group.
  • R 25 to R 27 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
  • R 26 and R 27 may combine to form a ring.
  • R24 or R25 may be linked to Ar1 .
  • R 28 to R 30 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L5 represents a single bond or a divalent linking group.
  • R 31 and R 32 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
  • R33 represents an alkyl group, cycloalkyl group, aryl group, aralkyl group or alkenyl group.
  • R 32 and R 33 may combine to form a ring.
  • R 101 , R 102 and R 103 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • LA represents a single bond or a divalent linking group.
  • Ar A represents an aromatic group.
  • k represents an integer of 1 to 5; However, R 102 may be bonded to Ar 2 A , and when R 102 and Ar 2 are bonded, R 102 represents a single bond or an alkylene group.
  • DA1 represents 1 or 2.
  • a pattern forming method comprising: [12] A method for manufacturing an electronic device, including the pattern forming method according to [11].
  • the present invention it is possible to provide an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in EL performance and LWR performance and capable of reducing development defects. Further, the present invention can provide an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and an electronic device manufacturing method using the actinic ray-sensitive or radiation-sensitive resin composition.
  • FIG. 1 is an NMR chart of compound (D-1) obtained in Synthesis Example 2.
  • actinic ray or “radiation” refers to, for example, the emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV: Extreme Ultraviolet), X-rays, soft X-rays, and electron It means a line (EB: Electron Beam) or the like.
  • light means actinic rays or radiation.
  • exposure means, unless otherwise specified, not only the emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays, X-rays, and EUV exposure, but also electron beams and ion beams. It also includes drawing with particle beams such as beams.
  • the bonding direction of the divalent groups described in this specification is not limited unless otherwise specified.
  • Y when Y is -COO-, Y may be -CO-O- or -O-CO- may Further, the above compound may be "X--CO--O--Z" or "X--O--CO--Z.”
  • (meth)acrylate represents at least one of acrylate and methacrylate.
  • (Meth)acrylic acid represents at least one of acrylic acid and methacrylic acid.
  • the weight average molecular weight (Mw), number average molecular weight (Mn), and dispersity (also referred to as molecular weight distribution) (Mw/Mn) of the resin are measured by GPC (Gel Permeation Chromatography) equipment (HLC manufactured by Tosoh Corporation). -8120 GPC) by GPC measurement (solvent: tetrahydrofuran, flow rate (sample injection volume): 10 ⁇ L, column: TSK gel Multipore HXL-M manufactured by Tosoh Corporation, column temperature: 40 ° C., flow rate: 1.0 mL / min, detector: It is defined as a polystyrene conversion value by a differential refractive index detector (Refractive Index Detector).
  • GPC Gel Permeation Chromatography
  • an "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • organic group refers to a group containing at least one carbon atom.
  • substituents in this specification, the type of substituents, the position of the substituents, and the number of substituents when "may have a substituent" are not particularly limited.
  • the number of substituents can be, for example, one, two, three, or more.
  • substituents include monovalent nonmetallic atomic groups excluding hydrogen atoms, and can be selected from the following substituents T, for example.
  • the substituent T includes halogen atoms such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; alkoxy groups such as a methoxy group, an ethoxy group and a tert-butoxy group; an aryloxy group such as a phenoxy group and a p-tolyloxy group; alkoxycarbonyl groups such as methoxycarbonyl group, butoxycarbonyl group and phenoxycarbonyl group; acyloxy groups such as acetoxy group, propionyloxy group and benzoyloxy group; acetyl group, benzoyl group, isobutyryl group, acryloyl group, methacryloyl group and methoxalyl group, etc.
  • halogen atoms such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom
  • alkoxy groups such as a me
  • an acyl group an alkylsulfanyl group such as a methylsulfanyl group and a tert-butylsulfanyl group; an arylsulfanyl group such as a phenylsulfanyl group and a p-tolylsulfanyl group; aryl group (e.g., 6 to 20 carbon atoms); heteroaryl group; hydroxyl group; carboxy group; formyl group; sulfo group; silyl groups; amino groups; monoalkylamino groups; dialkylamino groups; arylamino groups, nitro groups;
  • the acid dissociation constant (pKa) represents the pKa in an aqueous solution. , is a calculated value. All pKa values described herein are calculated using this software package.
  • Software Package 1 Advanced Chemistry Development (ACD/Labs) Software V8.14 for Solaris (1994-2007 ACD/Labs).
  • pKa can also be obtained by molecular orbital calculation.
  • a specific method for this is a method of calculating the H 2 + dissociation free energy in the solvent based on the thermodynamic cycle.
  • water is usually used as the solvent, and DMSO (dimethylsulfoxide) is used when the pKa cannot be obtained with water.
  • the H + dissociation free energy can be calculated by, for example, DFT (density functional theory), but various other methods have been reported in literature and the like, and the method is not limited to this. Note that there are a plurality of software that can implement DFT, and Gaussian16 is an example.
  • the pKa in the present specification refers to a value obtained by calculating a value based on a database of Hammett's substituent constants and known literature values using Software Package 1, as described above. If it cannot be calculated, a value obtained by Gaussian 16 based on DFT (density functional theory) is adopted.
  • the actinic ray-sensitive or radiation-sensitive resin composition of the present invention (also referred to as “the composition of the present invention”) comprises a resin (A) whose polarity increases under the action of an acid, and a resin represented by the following general formula (DA1). It is an actinic ray-sensitive or radiation-sensitive resin composition containing the compound.
  • X1 represents a sulfur atom or NQ3 .
  • Q3 represents a hydrogen atom, an organic group, -OH or -NH2 .
  • Q1 represents a hydrogen atom or a substituent.
  • X2 represents a linking group Xz or a single bond.
  • the linking group Xz is a divalent linking group consisting of at least one atom selected from the group consisting of carbon atoms, oxygen atoms, nitrogen atoms and sulfur atoms.
  • the nitrogen atom may be bonded to a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group
  • the sulfur atom may be bonded to a hydrocarbon group.
  • Ar a1 represents an aromatic group.
  • Q2 represents a hydrogen atom or an alkyl group.
  • Q 1 and Q 2 may combine to form a ring.
  • At least one selected from the group consisting of Q 1 and Q 2 and Q 3 may combine to form a ring.
  • k represents an integer of 1 to 5;
  • m represents an integer of 1 to 3;
  • X 1 , X 2 , Q 1 , Q 2 , Q 3 and Ar a1 may be the same or different when there are a plurality of them. However, when n represents 0, the following condition (i) or (ii) is satisfied.
  • Condition (i): X2 represents a single bond and Ar a1 represents an aromatic heterocyclic group.
  • X2 represents the above linking group Xz.
  • the composition of the present invention is preferably a resist composition, and may be a positive resist composition or a negative resist composition. Moreover, it may be a resist composition for alkali development or a resist composition for organic solvent development.
  • the composition of the present invention is preferably a positive resist composition.
  • the composition of the present invention is preferably a resist composition for alkali development.
  • the composition of the present invention is preferably a chemically amplified resist composition, more preferably a chemically amplified positive resist composition.
  • the composition of the present invention contains a compound represented by general formula (DA1).
  • the compound represented by the general formula (DA1) is a nitrogen-containing compound having an aromatic group substituted with an iodine atom, and has a polar group around the nitrogen atom that does not reduce the basicity of the nitrogen atom. Due to such a structure, the compound represented by the general formula (DA1) is highly basic and has sufficiently high ability to quench the generated acid, so it is considered to have good LWR performance.
  • a polar group has a high effect of suppressing acid diffusion due to hydrogen bonding, resulting in good EL performance. Furthermore, it is believed that the hydrophilicity of the polar group improves the solubility in an aqueous developer such as an alkaline developer, which is a typical developer, so that development defects can be suppressed.
  • X1 represents a sulfur atom or NQ3 .
  • X 1 preferably represents NQ 3 .
  • Q3 represents a hydrogen atom, an organic group, -OH or -NH2 .
  • the organic group is not particularly limited, but an organic group having 1 to 20 carbon atoms is preferable, and an organic group having 1 to 10 carbon atoms is more preferable.
  • the organic group is preferably an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, a heterocyclic group, -OQ 3a or -NQ 3b Q 3c .
  • Q 3a represents an organic group.
  • Q3b represents an organic group.
  • Q3c represents a hydrogen atom or an organic group.
  • the alkyl group may be linear or branched. Moreover, the said alkyl group may have a substituent.
  • the above alkyl group is preferably an alkyl group having 1 to 10 carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group and t-butyl group, and 1 to 6 carbon atoms. is more preferred.
  • the cycloalkyl group when Q3 represents a cycloalkyl group may be a monocyclic cycloalkyl group or a polycyclic cycloalkyl group.
  • the cycloalkyl group preferably has 3 to 20 carbon atoms, more preferably 4 to 15 carbon atoms, and still more preferably 5 to 10 carbon atoms.
  • the cycloalkyl group may have a substituent.
  • the cycloalkyl group is preferably a monocyclic cycloalkyl group such as cyclopentyl group or cyclohexyl group, or a polycyclic cycloalkyl group such as norbornyl group, tetracyclodecanyl group, tetracyclododecanyl group or adamantyl group.
  • the aryl group when Q3 represents an aryl group may be a monocyclic aryl group or a polycyclic aryl group. Moreover, the aryl group may have a substituent. As the aryl group, an aryl group having 6 to 20 carbon atoms is preferable, and an aryl group having 6 to 10 carbon atoms is more preferable, and examples thereof include a phenyl group, a naphthyl group and an anthryl group.
  • the alkenyl group may be linear or branched. Moreover, the said alkenyl group may have a substituent.
  • the alkenyl group an alkenyl group having 2 to 10 carbon atoms such as a vinyl group is preferable, and an alkenyl group having 2 to 6 carbon atoms is more preferable.
  • the heterocyclic group is preferably an aromatic heterocyclic group or a non-aromatic heterocyclic group.
  • the aromatic heterocyclic group is an aromatic heterocyclic group containing at least one heteroatom selected from the group consisting of a nitrogen atom, a sulfur atom and an oxygen atom.
  • a cyclic group is preferred, and an aromatic heterocyclic group containing one or more nitrogen atoms is more preferred.
  • the aromatic heterocyclic group includes, for example, five-membered ring aromatic heterocyclic compounds containing one or more nitrogen atoms such as pyrrole, imidazole, pyrazole, oxazole, isoxazole, thiazole, isothiazole, triazole, etc.
  • Removed groups, and groups obtained by removing one hydrogen atom from six-membered aromatic heterocyclic compounds containing one or more nitrogen atoms such as pyridine, pyrazine, pyrimidine, pyridazine, triazine, thiazine, and oxazine.
  • the aromatic heterocyclic group is such that the five-membered aromatic heterocyclic compound or the six-membered aromatic heterocyclic compound is the five-membered aromatic heterocyclic compound, the six-membered aromatic heterocyclic compound, Aromatic hydrocarbons (e.g., benzene, naphthalene, etc.), cycloalkanes (e.g., cyclopentane, cyclohexane, etc.), and non-aromatic heterocyclic compounds (e.g., five-membered non-aromatic heterocyclic compounds described later, six-membered rings It may be a group obtained by removing one hydrogen atom from a compound condensed with at least one member selected from the group consisting of non-aromatic heterocyclic compounds (eg, indole, quinoline, isoquinoline, etc.).
  • the aromatic heterocyclic group may have a substituent.
  • a carbon atom contained as a ring member in the aromatic heterocyclic group may be substitute
  • the non-aromatic heterocyclic group includes at least one heteroatom selected from the group consisting of a nitrogen atom, a sulfur atom and an oxygen atom. are preferred, and non-aromatic heterocyclic groups containing one or more nitrogen atoms are more preferred.
  • Non-aromatic heterocyclic groups include, for example, groups obtained by removing one hydrogen atom from five-membered ring non-aromatic heterocyclic compounds containing one or more nitrogen atoms such as pyrrolidine, pyrroline, 2-oxazolidone, and morpholine, A group obtained by removing one hydrogen atom from a six-membered ring non-aromatic heterocyclic compound containing one or more nitrogen atoms, such as piperidine and piperazine.
  • the five-membered non-aromatic heterocyclic compound or the six-membered non-aromatic heterocyclic compound is the five-membered non-aromatic heterocyclic compound or the six-membered non-aromatic It may be a group obtained by removing one hydrogen atom from a compound condensed with at least one member selected from the group consisting of group heterocyclic compounds and cycloalkanes (eg, cyclopentane, cyclohexane, etc.).
  • the non-aromatic heterocyclic group may have a substituent.
  • Q3 preferably represents a hydrogen atom or an organic group, more preferably a hydrogen atom, an alkyl group, an alkenyl group or an aryl group.
  • Q1 represents a hydrogen atom or a substituent.
  • the substituent is not particularly limited, but is preferably an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, a heterocyclic group, a cyano group, a nitro group or an amino group.
  • Q 1 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or a heterocyclic group
  • the description, specific examples and preferred ranges of each group are as follows: or the same as those described for each group when representing a heterocyclic group.
  • the amino group when Q 1 represents an amino group may have a substituent.
  • the amino group is preferably represented by -NQ 1a Q 1b .
  • Q 1a and Q 1b each independently represent a hydrogen atom or a substituent, and Q 1a and Q 1b may combine to form a ring.
  • the substituent is not particularly limited, but an organic group is preferred. Examples of the organic group include alkyl groups, cycloalkyl groups, alkenyl groups, aryl groups, heterocyclic groups, and groups represented by the following general formula (na1).
  • alkyl group, cycloalkyl group, alkenyl group, aryl group, and heterocyclic group described above are for the case where Q3 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, or a heterocyclic group. It is the same as described for each group.
  • * represents the bonding position with the nitrogen atom of the amino group represented by Q1 .
  • Xq represents O, S or NQ7 .
  • Q7 , Q8 and Q9 each independently represent a hydrogen atom, an amino group, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or a heterocyclic group. At least two selected from the group consisting of Q 7 , Q 8 and Q 9 may combine to form a ring.
  • Xq preferably represents NQ7 .
  • Q 7 , Q 8 and Q 9 represent an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or a heterocyclic group
  • the description, specific examples and preferred ranges of each group are as follows:
  • Q 3 is an alkyl group, a cycloalkyl group , an alkenyl group, an aryl group or a heterocyclic group are the same as those described for each group.
  • the ring formed may be an aromatic ring or a non-aromatic ring.
  • the rings may be monocyclic (eg, five- or six-membered rings) or polycyclic.
  • the ring may contain at least one member selected from the group consisting of an oxygen atom and a sulfur atom.
  • the ring may have a substituent.
  • Q 7 , Q 8 and Q 9 preferably represent a hydrogen atom or an alkyl group.
  • the description of the ring when Q 1a and Q 1b combine to form a ring is the one described when at least two selected from the group consisting of Q 7 , Q 8 and Q 9 combine to form a ring. is similar to
  • Q 1 preferably represents a substituent containing a nitrogen atom.
  • X2 represents a linking group Xz or a single bond.
  • the linking group Xz is a divalent linking group consisting of at least one atom selected from the group consisting of carbon atoms, oxygen atoms, nitrogen atoms and sulfur atoms.
  • the nitrogen atom may be bonded to a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group
  • the sulfur atom may be bonded to a hydrocarbon group.
  • X2 does not consist only of divalent hydrocarbon groups. Also, X2 does not consist of a divalent hydrocarbon group and at least one selected from an ester bond and an ether bond.
  • X 2 preferably represents a divalent linking group or a single bond represented by any one of formulas (X2-1) to (X2-11) below.
  • Q4 and Q5 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • X3 and X4 each independently represent a single bond, a hydrocarbon group, an oxygen atom or NQ6 .
  • Q6 represents a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • X5 represents an oxygen atom, a sulfur atom or NG1 .
  • X 6 represents -SG 2 or -NG 3 G 4 .
  • G 1 , G 3 and G 4 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • G2 represents a hydrocarbon group.
  • *1 represents the bonding position with the nitrogen atom in general formula (DA1)
  • *2 represents the bonding position with Ara1 in general formula (DA1).
  • Q 4 and Q 5 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • Q4 and Q5 represent an alkyl group, an aryl group, or an aromatic heterocyclic group
  • the description, specific examples, and preferred ranges of each group are those when Q3 represents an alkyl group, an aryl group, or an aromatic heterocyclic group. are the same as those described for each group.
  • X3 and X4 each independently represent a single bond, hydrocarbon group, oxygen atom or NQ6 .
  • the hydrocarbon group is preferably a hydrocarbon group having 1 to 20 carbon atoms, more preferably a hydrocarbon group having 1 to 10 carbon atoms.
  • the hydrocarbon group is preferably an alkyl group, a cycloalkyl group, an alkenyl group or an aryl group.
  • the description, specific examples and preferred range of the above alkyl group, cycloalkyl group, alkenyl group or aryl group are the same as those described for each group when Q3 represents an alkyl group, cycloalkyl group, alkenyl group or aryl group. is.
  • Q6 represents a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • the description, specific examples and preferred ranges of each group when Q6 represents an alkyl group, an aryl group or an aromatic heterocyclic group are the respective groups when Q3 represents an alkyl group, an aryl group or an aromatic heterocyclic group. is the same as described for
  • X5 represents an oxygen atom, a sulfur atom or NG1 .
  • G1 represents a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group. Description, specific examples and preferred ranges of each group when G 1 represents an alkyl group, an aryl group or an aromatic heterocyclic group refer to each group when Q 3 represents an alkyl group, an aryl group or an aromatic heterocyclic group is the same as described for X5 preferably represents an oxygen atom.
  • X 6 represents -SG 2 or -NG 3 G 4 .
  • G2 represents a hydrocarbon group.
  • G3 and G4 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aromatic heterocyclic group.
  • the description, specific examples and preferred range of the hydrocarbon group represented by G 2 are the same as those described when X 3 and X 4 represent the hydrocarbon group.
  • the description, specific examples and preferred ranges of each group when G3 and G4 represent an alkyl group, an aryl group or an aromatic heterocyclic group are those when Q3 represents an alkyl group, an aryl group or an aromatic heterocyclic group. are the same as those described for each group.
  • X 6 preferably represents -NG 3 G 4 .
  • X 2 is a divalent linking group or a single bond represented by any one selected from the group consisting of the above formulas (X2-1), (X2-3), (X2-4) and (X2-11) It is more preferable to express
  • Ar a1 represents an aromatic group.
  • the aromatic group represented by Ar a1 is preferably an aryl group or an aromatic heterocyclic group. Specific examples and preferred ranges when Ar a1 represents an aryl group or an aromatic heterocyclic group are the same as those described for each group when Q3 represents an aryl group or an aromatic heterocyclic group.
  • the aromatic group represented by Ara1 has k iodine atoms as substituents.
  • the aromatic group represented by Ar a1 may have a substituent in addition to k iodine atoms. Examples of the substituent include the substituent T described above.
  • Ar a1 preferably represents an aromatic heterocyclic group containing a nitrogen atom.
  • n in the general formula (DA1) represents 0 and satisfies the above condition (ii)
  • the description, specific examples and preferred range of the linking group Xz represented by X 2 are as described above, but X 2 is the above formula It is particularly preferred to represent a divalent linking group represented by (X2-11).
  • Q2 represents a hydrogen atom or an alkyl group. Specific examples and preferred ranges when Q 2 represents an alkyl group are the same as those described when Q 3 represents an alkyl group.
  • Q 1 and Q 2 may combine to form a ring.
  • a ring in which Q 1 and Q 2 combine to form a ring is also referred to as “ring Qr”.
  • Ring Qr may be monocyclic or polycyclic. In the case of a monocyclic ring, a 5- or 6-membered ring is preferred.
  • the ring Qr contains at least one nitrogen atom as a ring member, and may further contain at least one ring member selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom.
  • Ring Qr may be an aromatic ring or a non-aromatic ring.
  • the aromatic ring includes, for example, the five-membered aromatic heterocyclic compound containing one or more nitrogen atoms described in the case where Q3 represents an aromatic heterocyclic group, A six-membered aromatic heterocyclic compound containing one or more, the five-membered aromatic heterocyclic compound, or the six-membered aromatic heterocyclic compound is the five-membered aromatic heterocyclic compound, the six-membered aromatic heterocyclic compound A ring structure possessed by a compound condensed with at least one selected from the group consisting of ring compounds, aromatic hydrocarbons, cycloalkanes, and non-aromatic heterocyclic compounds.
  • the non-aromatic ring when the ring Qr is a non-aromatic ring includes, for example, the five-membered ring non-aromatic heterocyclic compounds containing one or more nitrogen atoms described when Q 3 represents a non-aromatic heterocyclic group,
  • a six-membered non-aromatic heterocyclic compound containing one or more nitrogen atoms, the five-membered non-aromatic heterocyclic compound, or the six-membered non-aromatic heterocyclic compound is the five-membered non-aromatic heterocyclic compound , the above-mentioned six-membered non-aromatic heterocyclic compounds, and compounds condensed with at least one selected from the group consisting of cycloalkanes.
  • Ring Qr may have a substituent.
  • At least one selected from the group consisting of Q 1 and Q 2 and Q 3 may combine to form a ring.
  • Q1 and Q3 may combine to form a ring, or Q2 and Q3 may combine to form a ring.
  • a ring in which at least one selected from the group consisting of Q 1 and Q 2 and Q 3 combine to form a ring is also referred to as “ring Qs”.
  • the description, specific examples and preferred range of the ring Qs are the same as those described for the ring Qr.
  • k represents an integer of 1 to 5, preferably an integer of 1 to 3.
  • I in Ik in general formula (DA1) is an iodine atom.
  • m represents an integer of 1 to 3, preferably 1 or 2.
  • n and p each independently represent an integer of 0 to 2.
  • n represents 1 or 2
  • n represents 0, the above condition (ii) is satisfied
  • X 2 is represented by the above formula (X2-11) It preferably represents a divalent linking group.
  • the pKa of the conjugate acid of the compound represented by the general formula (DA1) is preferably 0.1 or more, more preferably 2 or more from the viewpoint of quenching the acid, and further preferably 3 to 15. 3.5 to 12 is particularly preferred. It is particularly preferred that n in the general formula (DA1) represents 1 or 2 and the pKa of the conjugate acid of the compound represented by the general formula (DA1) is 2 or more.
  • the molecular weight of the compound represented by the general formula (DA1) is not particularly limited, it is preferably 2000 or less, more preferably 1500 or less, and particularly preferably 1000 or less.
  • the compound represented by general formula (DA1) is preferably a nonionic compound.
  • the compounds represented by general formula (DA1) may be used singly or in combination of two or more.
  • the content of the compound represented by the general formula (DA1) (the total if multiple types exist) is based on the total solid content of the composition of the present invention, 0.001 to 40 % by mass is preferable, 0.01 to 30% by mass is more preferable, and 0.1 to 20% by mass is even more preferable.
  • solid content intends the component except the solvent in a composition, and if it is a component other than a solvent, even if it is a liquid component, it will be considered as solid content.
  • the method for synthesizing the compound represented by the general formula (DA1) is not particularly limited, but for example, it may be synthesized by condensing an iodine-containing aromatic carboxylic acid derivative, a sulfonic acid derivative, an isocyanate, an isothiocyanate, or the like with a corresponding nitrogen-containing compound. (Examples of synthetic routes are shown below.
  • X 1 , Q 1 , n, Q 2 , p, Ar a1 and k are respectively X 1 , Q 1 , n, Q 2 , has the same meaning as p, Ar a1 and k, Y represents a hydroxy group, an alkoxy group, an aryloxy group, an acyloxy group, a sulfooxy group or a halogen atom, and Z represents an oxygen atom or a sulfur atom). It can also be synthesized by iodination of the corresponding aromatic compound. With regard to iodination, for example, reference can be made to "Suzuki Futomi Supervised, Manac Co., Ltd. Research Institute, Organic Synthetic Reagents and Synthetic Methods of Bromine and Iodine Compounds (2017). Maruzen Publishing" and the like.
  • Resin (A) is a resin that is decomposed by the action of an acid to increase its polarity.
  • the resin (A) preferably contains a group that is decomposed by the action of an acid to increase its polarity (also referred to as an "acid-decomposable group"), and more preferably contains a repeating unit having an acid-decomposable group.
  • the resin (A) becomes more polar under the action of an acid, increases its solubility in an alkaline developer, and decreases its solubility in an organic solvent.
  • a positive pattern is typically formed when an alkaline developer is employed as the developer, and an organic developer is typically used as the developer. When employed, a negative pattern is formed.
  • the acid-decomposable group is preferably a group that is decomposed by the action of an acid to form a polar group.
  • the acid-decomposable group preferably has a structure in which the polar group is protected with a leaving group that leaves under the action of an acid. That is, the resin (A) preferably has a repeating unit having a group that is decomposed by the action of an acid to form a polar group.
  • the polar group is preferably an alkali-soluble group such as a carboxy group, a phenolic hydroxyl group, a fluorinated alcohol group, a sulfonic acid group, a phosphoric acid group, a sulfonamide group, a sulfonylimide group, (alkylsulfonyl) (alkylcarbonyl) methylene group, (alkylsulfonyl)(alkylcarbonyl)imide group, bis(alkylcarbonyl)methylene group, bis(alkylcarbonyl)imide group, bis(alkylsulfonyl)methylene group, bis(alkylsulfonyl)imide group, tris(alkylcarbonyl) ) methylene group, acidic groups such as tris(alkylsulfonyl)methylene group, alcoholic hydroxyl group, and the like.
  • alkali-soluble group such as a carboxy group, a
  • the polar group is preferably a carboxy group, a phenolic hydroxyl group, a fluorinated alcohol group (preferably a hexafluoroisopropanol group), or a sulfonic acid group, more preferably a carboxy group or a phenolic hydroxyl group.
  • the acid-decomposable group is preferably a group that is decomposed by the action of an acid to form a carboxyl group or a group that is decomposed by the action of an acid to form a phenolic hydroxyl group.
  • the resin (A) contains a repeating unit having at least one acid-decomposable group selected from the group consisting of a group that decomposes under the action of an acid to yield a carboxyl group and a group that decomposes under the action of an acid to yield a phenolic hydroxyl group. It is preferable to have
  • Examples of the leaving group that leaves by the action of an acid include groups represented by formulas (Y1) to (Y4).
  • Formula (Y1) -C(Rx 1 )(Rx 2 )(Rx 3 )
  • Formula (Y3) —C(R 36 )(R 37 )(OR 38 )
  • Rx 1 to Rx 3 each independently represent an alkyl group (linear or branched), a cycloalkyl group (monocyclic or polycyclic), an aryl group (monocyclic or polycyclic), an aralkyl group (linear or branched), or an alkenyl group (linear or branched).
  • Rx 1 to Rx 3 are alkyl groups (linear or branched)
  • at least two of Rx 1 to Rx 3 are preferably methyl groups.
  • Rx 1 to Rx 3 preferably each independently represent a linear or branched alkyl group, and Rx 1 to Rx 3 each independently represent a linear alkyl group. is more preferred.
  • Two of Rx 1 to Rx 3 may combine with each other to form a ring (either monocyclic or polycyclic).
  • the alkyl group of Rx 1 to Rx 3 is preferably an alkyl group having 1 to 5 carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group and t-butyl group.
  • the cycloalkyl groups represented by Rx 1 to Rx 3 include monocyclic cycloalkyl groups such as cyclopentyl and cyclohexyl groups, and polycyclic groups such as norbornyl, tetracyclodecanyl, tetracyclododecanyl and adamantyl groups. is preferred.
  • the aryl group represented by Rx 1 to Rx 3 is preferably an aryl group having 6 to 10 carbon atoms, such as phenyl group, naphthyl group and anthryl group.
  • the aralkyl group represented by Rx 1 to Rx 3 is preferably a group in which one hydrogen atom in the alkyl group represented by Rx 1 to Rx 3 is substituted with an aryl group having 6 to 10 carbon atoms (preferably a phenyl group), For example, a benzyl group and the like can be mentioned.
  • a vinyl group is preferable as the alkenyl group for Rx 1 to Rx 3 .
  • the ring formed by combining two of Rx 1 to Rx 3 is preferably a cycloalkyl group.
  • the cycloalkyl group formed by combining two of Rx 1 to Rx 3 includes a monocyclic cycloalkyl group such as a cyclopentyl group or a cyclohexyl group, a norbornyl group, a tetracyclodecanyl group, and a tetracyclododecanyl group. or a polycyclic cycloalkyl group such as an adamantyl group, and more preferably a monocyclic cycloalkyl group having 5 to 6 carbon atoms.
  • the cycloalkyl group formed by combining two of Rx 1 to Rx 3 is, for example, a group in which one of the methylene groups constituting the ring has a heteroatom such as an oxygen atom, a heteroatom such as a carbonyl group, or a vinylidene group may be substituted.
  • these cycloalkyl groups one or more ethylene groups constituting the cycloalkane ring may be replaced with a vinylene group.
  • Rx 1 is a methyl group or an ethyl group
  • Rx 2 and Rx 3 combine to form the above-described cycloalkyl group. is preferred.
  • R 36 to R 38 each independently represent a hydrogen atom or a monovalent organic group.
  • R 37 and R 38 may combine with each other to form a ring.
  • Monovalent organic groups include alkyl groups, cycloalkyl groups, aryl groups, aralkyl groups, alkenyl groups, and the like. It is also preferred that R 36 is a hydrogen atom.
  • the alkyl group, cycloalkyl group, aryl group, and aralkyl group may contain a heteroatom such as an oxygen atom and/or a group having a heteroatom such as a carbonyl group.
  • one or more methylene groups are replaced with a heteroatom such as an oxygen atom and/or a group having a heteroatom such as a carbonyl group.
  • R 38 may combine with another substituent of the main chain of the repeating unit to form a ring.
  • the group formed by bonding R 38 and another substituent of the main chain of the repeating unit to each other is preferably an alkylene group such as a methylene group.
  • L 1 and L 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a group combining these (for example, a group combining an alkyl group and an aryl group).
  • M represents a single bond or a divalent linking group.
  • Q is an alkyl group optionally containing a heteroatom, a cycloalkyl group optionally containing a heteroatom, an aryl group optionally containing a heteroatom, an amino group, an ammonium group, a mercapto group, a cyano group, an aldehyde group, or a group in which these are combined (for example, a group in which an alkyl group and a cycloalkyl group are combined).
  • Alkyl and cycloalkyl groups may, for example, have one of the methylene groups replaced by a heteroatom such as an oxygen atom or a heteroatom-bearing group such as a carbonyl group.
  • L 1 and L 2 is preferably a hydrogen atom, and the other is preferably an alkyl group, a cycloalkyl group, an aryl group, or a combination of an alkylene group and an aryl group. At least two of Q, M, and L1 may combine to form a ring (preferably a 5- or 6-membered ring).
  • L2 is preferably a secondary or tertiary alkyl group, more preferably a tertiary alkyl group.
  • Secondary alkyl groups include isopropyl, cyclohexyl and norbornyl groups, and tertiary alkyl groups include tert-butyl and adamantane groups.
  • the Tg (glass transition temperature) and the activation energy are increased, so that the film strength can be ensured and fogging can be suppressed.
  • Ar represents an aromatic ring group.
  • Rn represents an alkyl group, a cycloalkyl group, or an aryl group.
  • Rn and Ar may combine with each other to form a non-aromatic ring.
  • Ar is more preferably an aryl group.
  • the ring member atoms adjacent to the ring member atoms directly bonded to the polar group (or residue thereof) do not have halogen atoms such as fluorine atoms as substituents.
  • the leaving group that leaves by the action of an acid also includes a 2-cyclopentenyl group having a substituent (such as an alkyl group) such as a 3-methyl-2-cyclopentenyl group, and a 1,1,4 , 4-tetramethylcyclohexyl group having a substituent (such as an alkyl group) may also be used.
  • a 2-cyclopentenyl group having a substituent such as an alkyl group
  • a 1,1,4 , 4-tetramethylcyclohexyl group having a substituent such as an alkyl group
  • the resin (A) is selected from the group consisting of repeating units represented by the following general formula (3), repeating units represented by the following general formula (6), and repeating units represented by the following general formula (7). It is preferred to have at least one
  • Each of R 5 to R 7 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L2 represents a divalent linking group.
  • Each of R 8 to R 10 independently represents an alkyl group, cycloalkyl group, aryl group, aralkyl group or alkenyl group. Two of R 8 to R 10 may combine to form a ring.
  • R 22 to R 24 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L4 represents a single bond or a divalent linking group.
  • Ar 1 represents an aromatic group.
  • R 25 to R 27 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
  • R 26 and R 27 may combine to form a ring.
  • R24 or R25 may be linked to Ar1 .
  • R 28 to R 30 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • L5 represents a single bond or a divalent linking group.
  • R 31 and R 32 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.
  • R33 represents an alkyl group, cycloalkyl group, aryl group, aralkyl group or alkenyl group.
  • R 32 and R 33 may combine to form a ring.
  • the repeating unit represented by formula (3) is described below.
  • the repeating unit represented by formula (3) is a repeating unit having an acid-decomposable group.
  • the alkyl group represented by R 5 , R 6 and R 7 may be linear or branched. Although the number of carbon atoms in the alkyl group is not particularly limited, it is preferably 1-5, more preferably 1-3.
  • Cycloalkyl groups represented by R 5 , R 6 and R 7 include monocyclic cycloalkyl groups such as cyclopentyl group and cyclohexyl group, norbornyl group, tetracyclodecanyl group, tetracyclododecanyl group, and polycyclic cycloalkyl groups such as adamantyl groups are preferred.
  • Halogen atoms represented by R 5 , R 6 and R 7 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom or an iodine atom.
  • the alkyl group contained in the alkoxycarbonyl group represented by R 5 , R 6 and R 7 may be linear or branched. Although the number of carbon atoms in the alkyl group contained in the alkoxycarbonyl group is not particularly limited, it is preferably 1-5, more preferably 1-3.
  • Divalent linking groups represented by L 2 include -CO-, -O-, -S-, -SO-, -SO 2 -, hydrocarbon groups (e.g., alkylene groups, cycloalkylene groups, alkenylene groups , an arylene group, etc.), and a linking group in which a plurality of these are linked.
  • hydrocarbon groups e.g., alkylene groups, cycloalkylene groups, alkenylene groups , an arylene group, etc.
  • the alkyl groups represented by R 8 to R 10 may be linear or branched. Although the number of carbon atoms in the alkyl group is not particularly limited, it is preferably 1-5, more preferably 1-3. In the alkyl group represented by R 8 to R 10 , the methylene group may be substituted with at least one of -CO- and -O-. Cycloalkyl groups represented by R 8 to R 10 include monocyclic cycloalkyl groups such as cyclopentyl group and cyclohexyl group, norbornyl group, tetracyclodecanyl group, tetracyclododecanyl group, and adamantyl group. is preferred.
  • a phenyl group is preferable as the aryl group represented by R 8 to R 10 .
  • the aralkyl group represented by R 8 to R 10 one hydrogen atom in the alkyl group represented by R 8 to R 10 is replaced by an aryl group having 6 to 10 carbon atoms (preferably a phenyl group). Substituted groups are preferred, and examples thereof include benzyl groups and the like.
  • a vinyl group is preferred as the alkenyl group represented by R 8 to R 10 .
  • a cycloalkyl group is preferable as the ring formed by combining two of R 8 to R 10 .
  • the cycloalkyl group formed by combining two of R 8 to R 10 includes a monocyclic cycloalkyl group such as a cyclopentyl group or a cyclohexyl group, a norbornyl group, a tetracyclodecanyl group, and a tetracyclododecanyl group. or a polycyclic cycloalkyl group such as an adamantyl group, and more preferably a monocyclic cycloalkyl group having 5 to 6 carbon atoms.
  • a monocyclic cycloalkyl group such as a cyclopentyl group or a cyclohexyl group, a norbornyl group, a tetracyclodecanyl group, and a tetracyclododecanyl group.
  • a polycyclic cycloalkyl group such as an adamantyl group, and more preferably a monocyclic
  • a cycloalkyl group formed by bonding two of R 8 to R 10 is, for example, a group in which one of the methylene groups constituting the ring has a heteroatom such as an oxygen atom, a heteroatom such as a carbonyl group, or a vinylidene group may be substituted.
  • one or more ethylene groups constituting the cycloalkane ring may be replaced with a vinylene group.
  • Each group in the general formula (3) may have a substituent, and examples of the substituent include the substituent T described above.
  • the repeating unit represented by formula (6) is described below.
  • the repeating unit represented by formula (6) is a repeating unit having an acid-decomposable group.
  • R 22 , R 23 and R 24 have the same meanings as R 5 , R 6 and R 7 in general formula (3), and the preferred embodiments are also the same.
  • L 4 represents a divalent linking group
  • examples of the divalent linking group include —CO—, —O—, —S—, —SO—, —SO 2 —, hydrocarbon groups (e.g., alkylene groups, a cycloalkylene group, an alkenylene group, an arylene group, etc.), and a linking group in which a plurality of these are linked.
  • the aromatic group represented by Ar 1 is not particularly limited, but includes, for example, a phenylene group and a naphthylene group, preferably a phenylene group.
  • Examples of the alkyl group, cycloalkyl group, aryl group, aralkyl group and alkenyl group represented by R 25 to R 27 include the alkyl group represented by R 8 to R 10 in the above general formula (3), cyclo Examples include groups similar to alkyl groups, aryl groups, aralkyl groups, and alkenyl groups.
  • the alkyl group, cycloalkyl group, aryl group, aralkyl group, and alkenyl group represented by R 25 to R 27 may have a substituent. mentioned.
  • the rings formed by combining R 26 and R 27 , Ar 1 and R 24 , and R 25 and Ar 1 are preferably cycloalkyl groups.
  • the cycloalkyl group formed by combining R 26 and R 27 , Ar 1 and R 24 , and R 25 and Ar 1 is a cyclopentyl group, a monocyclic cycloalkyl group such as a cyclohexyl group, or a norbornyl group. , a tetracyclodecanyl group, a tetracyclododecanyl group, or an adamantyl group are preferable, and monocyclic cycloalkyl groups having 5 to 6 carbon atoms are more preferable.
  • one of the methylene groups constituting the ring is a hetero atom such as an oxygen atom, a carbonyl It may be substituted with a group having a heteroatom such as a group, or a vinylidene group.
  • one or more ethylene groups constituting the cycloalkane ring may be replaced with a vinylene group.
  • the repeating unit represented by formula (7) is described below.
  • the repeating unit represented by formula (7) is a repeating unit having an acid-decomposable group.
  • R 28 , R 29 , R 30 and L 5 are synonymous with R 22 , R 23 , R 24 and L 4 in formula (6), and the preferred embodiments are also the same.
  • the alkyl group, cycloalkyl group, aryl group, aralkyl group and alkenyl group represented by R 31 , R 32 and R 33 are represented by R 8 to R 10 in general formula (3) above. Examples include groups similar to alkyl groups, cycloalkyl groups, aryl groups, aralkyl groups, and alkenyl groups.
  • the alkyl group, cycloalkyl group, aryl group, aralkyl group and alkenyl group represented by R 31 , R 32 and R 33 may have a substituent.
  • the ring formed by combining R32 and R33 is preferably a cycloalkyl group.
  • the cycloalkyl group formed by combining R 32 and R 33 includes a monocyclic cycloalkyl group such as a cyclopentyl group or a cyclohexyl group, a norbornyl group, a tetracyclodecanyl group, a tetracyclododecanyl group, Alternatively, a polycyclic cycloalkyl group such as an adamantyl group is preferable, and a monocyclic cycloalkyl group having 5 to 6 carbon atoms is more preferable.
  • one of the methylene groups constituting the ring is a group having a heteroatom such as an oxygen atom, a heteroatom such as a carbonyl group, or a vinylidene group. may be replaced.
  • one or more ethylene groups constituting the cycloalkane ring may be replaced with a vinylene group.
  • the repeating unit having an acid-decomposable group may or may not contain a halogen atom, but preferably does not contain a halogen atom.
  • the content of repeating units having an acid-decomposable group is preferably 5 mol% or more, more preferably 10 mol% or more, and 15 mol% or more, relative to all repeating units in the resin (A). is more preferable.
  • the content of repeating units having an acid-decomposable group is preferably 95 mol% or less, more preferably 90 mol% or less, and 85 mol% of all repeating units in the resin (A). % or less is particularly preferred.
  • repeating units having an acid-decomposable group are shown below, but are not limited thereto.
  • Xa 1 represents any one of H, CH 3 , CF 3 and CH 2 OH
  • Rxa and Rxb each independently represents a linear or branched alkyl group having 1 to 5 carbon atoms. show.
  • Resin (A) preferably has a repeating unit represented by the following general formula (A2).
  • R 101 , R 102 and R 103 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.
  • LA represents a single bond or a divalent linking group.
  • Ar A represents an aromatic group.
  • k represents an integer of 1 to 5; However, R 102 may be bonded to Ar 2 A , and when R 102 and Ar 2 are bonded, R 102 represents a single bond or an alkylene group.
  • R 101 , R 102 and R 103 in general formula (A2) represent an alkyl group
  • the alkyl group is not particularly limited, but is preferably an alkyl group having 1 to 20 carbon atoms, and an alkyl group having 1 to 8 carbon atoms. is more preferred, and an alkyl group having 1 to 3 carbon atoms is even more preferred.
  • Specific examples of the alkyl group include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-butyl group, hexyl group, 2-ethylhexyl group, octyl group and dodecyl group.
  • R 101 , R 102 and R 103 in general formula (A2) represent a cycloalkyl group
  • the cycloalkyl group may be monocyclic or polycyclic.
  • monocyclic cycloalkyl groups having 3 to 8 carbon atoms such as cyclopropyl group, cyclopentyl group and cyclohexyl group are preferable.
  • R 101 , R 102 and R 103 in general formula (A2) represent a halogen atom
  • examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, with a fluorine atom being preferred.
  • alkyl group contained in the alkoxycarbonyl group when R 101 , R 102 and R 103 in general formula (A2) represent an alkoxycarbonyl group are R 1 , R 2 and R It is the same as the alkyl group when 3 represents an alkyl group.
  • each group described above can further have one or more substituents, it may have one or more additional substituents.
  • substituents include, but are not limited to, alkyl groups, cycloalkyl groups, aryl groups, amino groups, amido groups, ureido groups, urethane groups, hydroxyl groups, carboxy groups, halogen atoms, alkoxy groups, thioether groups, Examples include acyl groups, acyloxy groups, alkoxycarbonyl groups, cyano groups, and nitro groups.
  • Further substituents preferably have 8 or less carbon atoms.
  • R 101 and R 102 in general formula (A2) are preferably hydrogen atoms.
  • R 103 in general formula (A2) is preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom.
  • Ar 2 A in general formula (A2) represents an aromatic group, and more specifically represents a (k+1)-valent aromatic group.
  • the divalent aromatic group when k is 1 is, for example, a phenylene group, a tolylene group, a naphthylene group, an arylene group having 6 to 18 carbon atoms such as an anthracenylene group, or a thiophene ring, a furan ring, a pyrrole ring, A divalent aromatic group containing a hetero ring such as a benzothiophene ring, a benzofuran ring, a benzopyrrole ring, a triazine ring, an imidazole ring, a benzimidazole ring, a triazole ring, a thiadiazole ring and a thiazole ring is preferred.
  • the said aromatic group may have a substituent.
  • Specific examples of the (k+1)-valent aromatic group when k is an integer of 2 or more include the above specific examples of the divalent aromatic group, excluding any (k-1) hydrogen atoms.
  • a group formed by The (k+1)-valent aromatic group may further have a substituent.
  • Substituents that the (k+1)-valent aromatic group may have are not particularly limited, but examples include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, sec-butyl group, hexyl group, 2 - alkyl groups such as ethylhexyl group, octyl group and dodecyl group; alkoxy groups such as methoxy group, ethoxy group, hydroxyethoxy group, propoxy group, hydroxypropoxy group and butoxy group; aryl groups such as phenyl group;
  • Ar 2 A preferably represents an aromatic group having 6 to 18 carbon atoms, more preferably a benzene ring group, a naphthalene ring group or a biphenylene ring group.
  • LA in general formula (A2) represents a single bond or a divalent linking group.
  • L A represents a divalent linking group
  • the divalent linking group is not particularly limited. group.
  • R64 above represents a hydrogen atom or an alkyl group.
  • the alkylene group is not particularly limited, but is preferably an alkylene group having 1 to 8 carbon atoms such as a methylene group, ethylene group, propylene group, butylene group, hexylene group and octylene group.
  • R 64 represents an alkyl group
  • examples of the alkyl group include methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, hexyl, 2-ethylhexyl, octyl and dodecyl.
  • Alkyl groups having 20 or less carbon atoms, such as groups, are preferred, and alkyl groups having 8 or less carbon atoms are preferred.
  • the repeating unit represented by formula (A2) preferably has a hydroxystyrene structure. That is, Ar A preferably represents a benzene ring group. k preferably represents an integer of 1 to 3, more preferably 1 or 2.
  • repeating unit represented by formula (A2) Specific examples of the repeating unit represented by formula (A2) are shown below. In the structural formulas of the following specific examples, a represents 1, 2 or 3. Further, as specific examples of the repeating unit represented by the general formula (A2), the descriptions in paragraphs [0068] to [0072] of WO 2018/193954 can be referred to, and the contents thereof are incorporated herein.
  • the content of the repeating unit represented by the general formula (A2) is not particularly limited, but all repeating units in the resin (A) It is preferably 5 mol % or more, more preferably 10 mol % or more, and even more preferably 20 mol % or more.
  • the content of the repeating unit represented by the general formula (A2) is preferably 90 mol% or less, more preferably 85 mol% or less, relative to all repeating units in the resin (A). , 80 mol % or less.
  • the resin (A) may contain repeating units other than the repeating units described above.
  • the content of the other repeating units is not particularly limited, but is 1 mol% or more and 60% of the total repeating units in the resin (A). It is preferably mol % or less, more preferably 3 mol % or more and 50 mol % or less, and even more preferably 5 mol % or more and 40 mol % or less.
  • Resin (A) may further have a repeating unit having an acid group in addition to the repeating units described above.
  • the acid group for example, a carboxy group, a fluorinated alcohol group (preferably a hexafluoroisopropanol group), a sulfonic acid group, a sulfonamide group, an isopropanol group and the like are preferable.
  • a fluorinated alcohol group preferably a hexafluoroisopropanol group
  • a sulfonic acid group preferably sulfonic acid group
  • a sulfonamide group an isopropanol group and the like are preferable.
  • an isopropanol group and the like are preferable.
  • the hexafluoroisopropanol group one or more (preferably 1 to 2) fluorine atoms may be substituted with groups other than fluorine atoms (eg, alkyloxycarbonyl group, etc.).
  • —C(CF 3 )(OH)—CF 2 — thus formed is also preferred as an acid group.
  • one or more of the fluorine atoms may be substituted with a group other than a fluorine atom to form a ring containing -C(CF 3 )(OH)-CF 2 -.
  • the repeating unit having an acid group the description in paragraph [0205] of WO 2019/054282 can be referred to, the contents of which are incorporated herein.
  • the repeating unit having an acid group is not limited to these.
  • the resin (A) may further have a repeating unit that has a fluorine atom or an iodine atom and does not exhibit acid decomposability.
  • repeating units that have a fluorine atom or an iodine atom and do not exhibit acid decomposability are shown below, but are not limited to these.
  • Resin (A) may further have a repeating unit having a lactone group, a sultone group, or a carbonate group, in addition to the repeating units described above.
  • the lactone group or sultone group may have a lactone structure or sultone structure.
  • the lactone structure or sultone structure is preferably a 5- to 7-membered ring lactone structure or a 5- to 7-membered ring sultone structure.
  • the resin (A) has a lactone structure represented by any of the following general formulas (LC1-1) to (LC1-21), or a lactone structure represented by any of the following general formulas (SL1-1) to (SL1-3). It is preferable to have a repeating unit having a lactone group or a sultone group obtained by extracting one or more hydrogen atoms from the ring member atoms of the sultone structure. Also, a lactone group or a sultone group may be directly bonded to the main chain. For example, ring member atoms of a lactone group or a sultone group may constitute the main chain of resin (A).
  • the lactone structure or sultone structure portion may have a substituent (Rb 2 ).
  • Preferred substituents (Rb 2 ) include an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 4 to 7 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 8 carbon atoms, and a carboxy group. , a halogen atom, a hydroxyl group, a cyano group, an acid-decomposable group, and the like.
  • n2 represents an integer from 0 to 4; When n2 is 2 or more, multiple Rb2 may be different, and multiple Rb2 may combine to form a ring.
  • repeating unit having a lactone structure for example, the description in paragraph [0088] of WO 2018/193954 can be considered, and the contents thereof are incorporated herein.
  • repeating units having a lactone structure are not limited to these.
  • a cyclic carbonate group is preferable as the carbonate group.
  • Resin (A) may have a repeating unit having a photoacid-generating group.
  • the repeating unit having a photoacid-generating group descriptions in paragraphs [0090] to [0096] of International Publication No. 2018/193954 can be referred to, and the contents thereof are incorporated herein.
  • the resin (A) has various repeating units for the purpose of adjusting, for example, dry etching resistance, suitability for standard developer, substrate adhesion, resist profile, resolution, heat resistance, sensitivity, and the like. may be Other repeating units other than those described above can be referred to in paragraphs [0097] to [0100] and [0102] to [0133] of International Publication No. WO 2018/193954, the contents of which are incorporated herein. .
  • Resin (A) can be synthesized according to a conventional method (for example, radical polymerization).
  • the weight average molecular weight of resin (A) is not particularly limited, but is preferably 1,000 to 200,000, more preferably 2,000 to 30,000, even more preferably 3,000 to 20,000.
  • the dispersity (molecular weight distribution) of the resin (A) is usually 1.0 to 5.0, preferably 1.0 to 3.0, more preferably 1.0 to 2.5. , 1.0 to 2.0.
  • the content of the resin (A) in the composition of the present invention is not particularly limited, but is preferably 50 to 99.9% by mass, preferably 60 to 99.0%, based on the total solid content of the composition of the present invention. % by mass is more preferred.
  • solid content intends the component except the solvent in a composition, and if it is a component other than a solvent, even if it is a liquid component, it will be considered as solid content.
  • the resin (A) contained in the composition of the present invention may be of only one type, or may be of two or more types.
  • the actinic ray-sensitive or radiation-sensitive resin composition of the present invention preferably contains a compound (photoacid generator) that generates an acid upon exposure to actinic rays or radiation.
  • a compound that generates an acid upon exposure to actinic rays or radiation is also referred to as "compound (B)” or "photoacid generator (B)".
  • Compound (B) may be in the form of a low-molecular-weight compound, or may be in the form of being incorporated into a part of a polymer (for example, resin (A)). Moreover, the form of a low-molecular-weight compound and the form incorporated into a part of a polymer (for example, resin (A)) may be used together.
  • the molecular weight of compound (B) is preferably 3,000 or less, more preferably 2,000 or less, and even more preferably 1,000 or less. Although the lower limit is not particularly limited, 100 or more is preferable.
  • compound (B) When the compound (B) is in the form of being incorporated into a part of the polymer, it may be incorporated into a part of the resin (A) or into a resin different from the resin (A).
  • Compound (B) is preferably a low-molecular-weight compound.
  • Examples of the compound (B) include compounds (onium salts) represented by “M + X ⁇ ”, and compounds that generate an organic acid upon exposure are preferred.
  • Examples of the organic acid include sulfonic acid (aliphatic sulfonic acid, aromatic sulfonic acid, camphorsulfonic acid, etc.), carboxylic acid (aliphatic carboxylic acid, aromatic carboxylic acid, aralkyl carboxylic acid, etc.), carbonyl Sulfonylimidic acids, bis(alkylsulfonyl)imidic acids, and tris(alkylsulfonyl)methide acids.
  • sulfonic acid aliphatic sulfonic acid, aromatic sulfonic acid, camphorsulfonic acid, etc.
  • carboxylic acid aliphatic carboxylic acid, aromatic carboxylic acid, aralkyl carboxylic acid, etc.
  • carbonyl Sulfonylimidic acids bis(alkylsulf
  • the molecular weight of the generated acid of compound (B) is preferably 240 or more, more preferably 250 or more, still more preferably 260 or more, particularly preferably 270 or more, and 280 or more. is most preferred.
  • M + represents an organic cation.
  • the structure of the organic cation is not particularly limited. Also, the valence of the organic cation may be 1 or 2 or more.
  • a cation represented by the following general formula (ZaI) hereinafter also referred to as “cation (ZaI)”
  • cation (ZaII) a cation represented by the following general formula (ZaII)
  • ZaII cation (ZaII)
  • R 201 , R 202 and R 203 each independently represent an organic group.
  • R 204 and R 205 each independently represent an organic group.
  • the general formulas (ZaI) and (ZaII) are described in detail below.
  • At least one of R 201 , R 202 and R 203 in the general formula (ZaI) is an aryl group, or
  • At least one of R 204 and R 205 in formula (ZaII) is preferably an aryl group.
  • the aryl group may have a substituent, and the substituent is preferably a halogen atom (preferably a fluorine atom or an iodine atom) or an organic group.
  • At least one of R 201 , R 202 and R 203 in general formula (ZaI) has an acid-decomposable group, or at least one of R 204 and R 205 in general formula (ZaII) is It is also preferred to have an acid-decomposable group.
  • the acid-decomposable group is the same as in resin (A).
  • at least one of R 201 , R 202 and R 203 in general formula (ZaI) has an acid-decomposable group
  • at least one of R 201 , R 202 and R 203 contains an acid-decomposable group.
  • An aryl group substituted with an organic group is preferred.
  • At least one of R 204 and R 205 in general formula (ZaII) has an acid-decomposable group
  • at least one of R 204 and R 205 is an aryl group substituted with an organic group containing an acid-decomposable group. is preferably
  • the number of carbon atoms in the organic groups as R 201 , R 202 and R 203 is generally 1-30, preferably 1-20. Also, two of R 201 to R 203 may combine to form a ring structure, and the ring may contain an oxygen atom, a sulfur atom, an ester group, an amide group, or a carbonyl group. Examples of the group formed by combining two of R 201 to R 203 include an alkylene group (eg, a butylene group and a pentylene group) and —CH 2 —CH 2 —O—CH 2 —CH 2 —. mentioned.
  • alkylene group eg, a butylene group and a pentylene group
  • Preferred embodiments of the organic cation in formula (ZaI) include cation (ZaI-1), cation (ZaI-2), and organic cations represented by formula (ZaI-3b) (cation (ZaI-3b) ), and an organic cation represented by the formula (ZaI-4b) (cation (ZaI-4b)).
  • Cation (ZaI-1) is an arylsulfonium cation in which at least one of R 201 to R 203 in formula (ZaI) above is an aryl group.
  • R 201 to R 203 may be aryl groups, or part of R 201 to R 203 may be aryl groups and the rest may be alkyl groups or cycloalkyl groups.
  • one of R 201 to R 203 may be an aryl group, and the remaining two of R 201 to R 203 may combine to form a ring structure, in which an oxygen atom, a sulfur atom, It may contain an ester group, an amide group, or a carbonyl group.
  • the group formed by bonding two of R 201 to R 203 includes, for example, one or more methylene groups substituted with an oxygen atom, a sulfur atom, an ester group, an amide group and/or a carbonyl group. alkylene groups (eg, butylene group, pentylene group, and —CH 2 —CH 2 —O—CH 2 —CH 2 —).
  • Arylsulfonium cations include, for example, triarylsulfonium cations, diarylalkylsulfonium cations, aryldialkylsulfonium cations, diarylcycloalkylsulfonium cations, and aryldicycloalkylsulfonium cations.
  • the aryl group contained in the arylsulfonium cation is preferably a phenyl group or a naphthyl group, more preferably a phenyl group.
  • the aryl group may be an aryl group having a heterocyclic structure having an oxygen atom, a nitrogen atom, a sulfur atom, or the like. Heterocyclic structures include pyrrole, furan, thiophene, indole, benzofuran, and benzothiophene residues.
  • the arylsulfonium cation has two or more aryl groups, the two or more aryl groups may be the same or different.
  • the alkyl group or cycloalkyl group optionally possessed by the arylsulfonium cation is a linear alkyl group having 1 to 15 carbon atoms, a branched alkyl group having 3 to 15 carbon atoms, or 3 to 15 carbon atoms. is preferred, and a methyl group, ethyl group, propyl group, n-butyl group, sec-butyl group, t-butyl group, cyclopropyl group, cyclobutyl group or cyclohexyl group is more preferred.
  • the substituents that the aryl group, alkyl group and cycloalkyl group of R 201 to R 203 may have are each independently an alkyl group (eg, 1 to 15 carbon atoms), a cycloalkyl group (eg, carbon 3 to 15), aryl groups (eg, 6 to 14 carbon atoms), alkoxy groups (eg, 1 to 15 carbon atoms), cycloalkylalkoxy groups (eg, 1 to 15 carbon atoms), halogen atoms (eg, fluorine and iodine), hydroxyl, carboxy, ester, sulfinyl, sulfonyl, alkylthio and phenylthio groups are preferred.
  • alkyl group eg, 1 to 15 carbon atoms
  • a cycloalkyl group eg, carbon 3 to 15
  • aryl groups eg, 6 to 14 carbon atoms
  • alkoxy groups eg, 1 to 15 carbon
  • the substituent may further have a substituent, and the alkyl group preferably has a halogen atom as a substituent to form a halogenated alkyl group such as a trifluoromethyl group.
  • the above substituents form an acid-decomposable group by any combination.
  • the acid-decomposable group is intended to be a group that is decomposed by the action of an acid to generate a polar group, and preferably has a structure in which the polar group is protected by a leaving group that is eliminated by the action of an acid.
  • the polar group and leaving group are as described above.
  • Cation (ZaI-2) is a cation in which R 201 to R 203 in formula (ZaI) each independently represents an organic group having no aromatic ring.
  • Aromatic rings also include aromatic rings containing heteroatoms.
  • the organic group having no aromatic ring as R 201 to R 203 generally has 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms.
  • R 201 to R 203 are each independently preferably an alkyl group, a cycloalkyl group, an allyl group or a vinyl group, and a linear or branched 2-oxoalkyl group, 2-oxocycloalkyl group or alkoxy
  • a carbonylmethyl group is more preferred, and a linear or branched 2-oxoalkyl group is even more preferred.
  • the alkyl groups and cycloalkyl groups of R 201 to R 203 are, for example, linear alkyl groups having 1 to 10 carbon atoms or branched alkyl groups having 3 to 10 carbon atoms (e.g., methyl group, ethyl group, propyl group, , butyl group, and pentyl group), and cycloalkyl groups having 3 to 10 carbon atoms (eg, cyclopentyl group, cyclohexyl group, and norbornyl group).
  • R 201 to R 203 may be further substituted with a halogen atom, an alkoxy group (eg, 1-5 carbon atoms), a hydroxyl group, a cyano group, or a nitro group. It is also preferred that the substituents of R 201 to R 203 each independently form an acid-decomposable group by any combination of substituents.
  • the cation (ZaI-3b) is a cation represented by the following formula (ZaI-3b).
  • R 1c to R 5c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an alkylcarbonyloxy group, a cycloalkylcarbonyloxy group, a halogen atom, or a hydroxyl group , represents a nitro group, an alkylthio group, or an arylthio group.
  • R 6c and R 7c each independently represent a hydrogen atom, an alkyl group (eg, t-butyl group), a cycloalkyl group, a halogen atom, a cyano group, or an aryl group.
  • R x and R y each independently represent an alkyl group, a cycloalkyl group, a 2-oxoalkyl group, a 2-oxocycloalkyl group, an alkoxycarbonylalkyl group, an allyl group, or a vinyl group. It is also preferred that the substituents of R 1c to R 7c , R x and R y independently form an acid-decomposable group by any combination of substituents.
  • R 1c to R 5c , R 5c and R 6c , R 6c and R 7c , R 5c and R x , and R x and R y may combine with each other to form a ring.
  • the rings may each independently contain an oxygen atom, a sulfur atom, a ketone group, an ester bond, or an amide bond.
  • Examples of the ring include aromatic or non-aromatic hydrocarbon rings, aromatic or non-aromatic hetero rings, and polycyclic condensed rings in which two or more of these rings are combined.
  • the ring includes a 3- to 10-membered ring, preferably a 4- to 8-membered ring, more preferably a 5- or 6-membered ring.
  • Examples of groups formed by bonding two or more of R 1c to R 5c , R 6c and R 7c , and R x and R y include alkylene groups such as a butylene group and a pentylene group. A methylene group in this alkylene group may be substituted with a heteroatom such as an oxygen atom.
  • the group formed by combining R 5c and R 6c and R 5c and R x is preferably a single bond or an alkylene group.
  • Alkylene groups include methylene and ethylene groups.
  • R 1c to R 5c , R 6c , R 7c , R x , R y , and two or more of R 1c to R 5c , R 5c and R 6c , R 6c and R 7c , R 5c and R x , and the ring formed by combining each other with R x and R y may have a substituent.
  • the cation (ZaI-4b) is a cation represented by the following formula (ZaI-4b).
  • a halogen atom e.g., fluorine atom, iodine atom, etc.
  • R 14 is a hydroxyl group, a halogen atom (e.g., fluorine atom, iodine atom, etc.), an alkyl group, a halogenated alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylcarbonyl group, an alkylsulfonyl group, a cycloalkylsulfonyl group, or a cycloalkyl represents a group containing a group (either a cycloalkyl group itself or a group partially containing a cycloalkyl group). These groups may have a substituent. When two or more R 14 are present, each independently represents the above group such as a hydroxyl group.
  • a halogen atom e.g., fluorine atom, iodine atom, etc.
  • Each R 15 independently represents an alkyl group, a cycloalkyl group, or a naphthyl group. Two R 15 may be joined together to form a ring. When two R 15 are combined to form a ring, the ring skeleton may contain a heteroatom such as an oxygen atom or a nitrogen atom. In one aspect, two R 15 are alkylene groups, preferably joined together to form a ring structure. The ring formed by combining the alkyl group, the cycloalkyl group, the naphthyl group, and the two R 15 groups may have a substituent.
  • the alkyl groups of R 13 , R 14 and R 15 may be linear or branched.
  • the number of carbon atoms in the alkyl group is preferably 1-10.
  • the alkyl group is more preferably a methyl group, an ethyl group, an n-butyl group, a t-butyl group, or the like. It is also preferred that the substituents of R 13 to R 15 , R x and R y each independently form an acid-decomposable group by any combination of substituents.
  • R 204 and R 205 each independently represent an organic group, preferably an aryl group, an alkyl group or a cycloalkyl group.
  • the aryl group for R 204 and R 205 is preferably a phenyl group or a naphthyl group, more preferably a phenyl group.
  • the aryl group for R 204 and R 205 may be an aryl group having a heterocyclic ring having an oxygen atom, a nitrogen atom, a sulfur atom, or the like.
  • Skeletons of heterocyclic aryl groups include, for example, pyrrole, furan, thiophene, indole, benzofuran, and benzothiophene.
  • the alkyl group and cycloalkyl group of R 204 and R 205 are linear alkyl groups having 1 to 10 carbon atoms or branched alkyl groups having 3 to 10 carbon atoms (e.g., methyl, ethyl, propyl, butyl or a pentyl group), or a cycloalkyl group having 3 to 10 carbon atoms (eg, a cyclopentyl group, a cyclohexyl group, or a norbornyl group).
  • the aryl group, alkyl group and cycloalkyl group of R 204 and R 205 may each independently have a substituent.
  • substituents that the aryl group, alkyl group and cycloalkyl group of R 204 and R 205 may have include an alkyl group (eg, 1 to 15 carbon atoms) and a cycloalkyl group (eg, 3 to 15), aryl groups (eg, 6 to 15 carbon atoms), alkoxy groups (eg, 1 to 15 carbon atoms), halogen atoms, hydroxyl groups, and phenylthio groups. It is also preferred that the substituents of R 204 and R 205 each independently form an acid-decomposable group by any combination of substituents.
  • X ⁇ represents an organic anion.
  • the organic anion is not particularly limited, and includes organic anions having a valence of 1, 2 or more.
  • an anion having a significantly low ability to cause a nucleophilic reaction is preferred, and a non-nucleophilic anion is more preferred.
  • non-nucleophilic anions examples include sulfonate anions (aliphatic sulfonate anions, aromatic sulfonate anions, camphorsulfonate anions, etc.), carboxylate anions (aliphatic carboxylate anions, aromatic carboxylate anions, , and aralkylcarboxylate anions), sulfonylimide anions, bis(alkylsulfonyl)imide anions, and tris(alkylsulfonyl)methide anions.
  • the aliphatic moiety in the aliphatic sulfonate anion and the aliphatic carboxylate anion may be a linear or branched alkyl group or a cycloalkyl group, and may be a straight chain having 1 to 30 carbon atoms. Alternatively, a branched alkyl group or a cycloalkyl group having 3 to 30 carbon atoms is preferred.
  • the alkyl group may be, for example, a fluoroalkyl group (which may have a substituent other than a fluorine atom, or may be a perfluoroalkyl group).
  • the aryl group in the aromatic sulfonate anion and the aromatic carboxylate anion is preferably an aryl group having 6 to 14 carbon atoms, such as a phenyl group, a tolyl group, and a naphthyl group.
  • the alkyl group, cycloalkyl group, and aryl group listed above may have a substituent.
  • the substituent is not particularly limited, but specifically includes a nitro group, a halogen atom such as a fluorine atom or a chlorine atom, a carboxy group, a hydroxyl group, an amino group, a cyano group, an alkoxy group (preferably having 1 to 15 carbon atoms), an alkyl group (preferably having 1 to 10 carbon atoms), a cycloalkyl group (preferably having 3 to 15 carbon atoms), an aryl group (preferably having 6 to 14 carbon atoms), an alkoxycarbonyl group (preferably having 2 to 7 carbon atoms), Acyl group (preferably with 2 to 12 carbon atoms), alkoxycarbonyloxy group (preferably with 2 to 7 carbon atoms), alkylthio group (preferably with 1 to 15 carbon atoms), alkylsulfonyl group (preferably with 1 to 15 carbon atoms)
  • aralkyl group in the aralkylcarboxylate anion an aralkyl group having 7 to 14 carbon atoms is preferable.
  • Aralkyl groups having 7 to 14 carbon atoms include, for example, benzyl, phenethyl, naphthylmethyl, naphthylethyl and naphthylbutyl groups.
  • Sulfonylimide anions include, for example, saccharin anions.
  • alkyl group in the bis(alkylsulfonyl)imide anion and the tris(alkylsulfonyl)methide anion an alkyl group having 1 to 5 carbon atoms is preferable.
  • substituents of these alkyl groups include halogen atoms, halogen-substituted alkyl groups, alkoxy groups, alkylthio groups, alkyloxysulfonyl groups, aryloxysulfonyl groups, and cycloalkylaryloxysulfonyl groups.
  • a fluorine atom or an alkyl group substituted with a fluorine atom is preferred.
  • the alkyl groups in the bis(alkylsulfonyl)imide anion may combine with each other to form a ring structure. This increases the acid strength.
  • non-nucleophilic anions include, for example, phosphorous fluorides (eg, PF 6 ⁇ ), boron fluorides (eg, BF 4 ⁇ ), and antimony fluorides (eg, SbF 6 ⁇ ).
  • non-nucleophilic anions examples include aliphatic sulfonate anions in which at least the ⁇ -position of sulfonic acid is substituted with fluorine atoms, aromatic sulfonate anions in which fluorine atoms or groups having fluorine atoms are substituted, and alkyl groups in which fluorine atoms are present.
  • a bis(alkylsulfonyl)imide anion substituted with or a tris(alkylsulfonyl)methide anion in which an alkyl group is substituted with a fluorine atom is preferred.
  • perfluoroaliphatic sulfonate anions preferably having 4 to 8 carbon atoms
  • benzenesulfonate anions having a fluorine atom are more preferable, nonafluorobutanesulfonate anions, perfluorooctanesulfonate anions, pentafluoro A benzenesulfonate anion or a 3,5-bis(trifluoromethyl)benzenesulfonate anion is more preferred.
  • non-nucleophilic anions include anions represented by the following formula (AN4).
  • R 1 to R 3 each independently represent an organic group or a hydrogen atom.
  • L represents a divalent linking group.
  • L represents a divalent linking group.
  • divalent linking groups include -O-CO-O-, -COO-, -CONH-, -CO-, -O-, -S-, -SO-, -SO 2 -, alkylene groups ( preferably 1 to 6 carbon atoms), a cycloalkylene group (preferably 3 to 15 carbon atoms), an alkenylene group (preferably 2 to 6 carbon atoms), and a divalent linking group combining a plurality of these.
  • the divalent linking group includes -O-CO-O-, -COO-, -CONH-, -CO-, -O-, -SO 2 -, and -O-CO-O-alkylene group- , -COO-alkylene group-, or -CONH-alkylene group- is preferred, and -O-CO-O-, -O-CO-O-alkylene group-, -COO-, -CONH-, -SO 2 - , or -COO-alkylene group- is more preferred.
  • L is preferably, for example, a group represented by the following formula (AN4-2). * a - (CR 2a 2 ) X - Q- (CR 2b 2 ) Y - * b (AN4-2)
  • * a represents the bonding position with R3 in formula (AN4).
  • * b represents the bonding position with —C(R 1 )(R 2 )— in formula (AN4).
  • X and Y each independently represent an integer of 0-10, preferably an integer of 0-3.
  • R 2a and R 2b each independently represent a hydrogen atom or a substituent. When multiple R 2a and R 2b are present, the multiple R 2a and R 2b may be the same or different. However, when Y is 1 or more, R 2b in CR 2b 2 directly bonded to —C(R 1 )(R 2 )— in formula (AN4) is other than a fluorine atom.
  • Q is * A -O-CO-O-* B , * A -CO-* B , * A -CO-O-* B , * A -O-CO-* B , * A -O-* B , * A -S-* B or * A - SO2- * B .
  • Q is * A -O-CO- O-* B , * A -CO-* B , * A -O-CO-* B , * A -O-* B , * A -S-* B , or * A - SO2- * B show.
  • * A represents the bonding position on the R 3 side in formula (AN4)
  • * B represents the bonding position on the —SO 3 — side in formula (AN4).
  • R 1 to R 3 each independently represent an organic group.
  • the above organic group is not limited as long as it has 1 or more carbon atoms. It may be a branched chain alkyl group) or a cyclic group.
  • the organic group may or may not have a substituent.
  • the organic group may or may not have a heteroatom (oxygen atom, sulfur atom, and/or nitrogen atom, etc.). Examples of the above organic groups also include substituents that are not electron-withdrawing groups.
  • substituents that are not electron-withdrawing groups include hydrocarbon groups, hydroxyl groups, oxyhydrocarbon groups, oxycarbonyl hydrocarbon groups, amino groups, hydrocarbon-substituted amino groups, and hydrocarbon-substituted amide groups. be done.
  • substituents that are not electron-withdrawing groups independently include -R', -OH, -OR', -OCOR', -NH 2 , -NR' 2 , -NHR', or -NHCOR ' is preferred.
  • R' is a monovalent hydrocarbon group.
  • Examples of the monovalent hydrocarbon group represented by R' include alkyl groups such as methyl, ethyl, propyl, and butyl; alkenyl groups such as ethenyl, propenyl, and butenyl; ethynyl monovalent linear or branched hydrocarbon groups such as alkynyl groups such as groups, propynyl groups, and butynyl groups; cyclopropyl groups, cyclobutyl groups, cyclopentyl groups, cyclohexyl groups, norbornyl groups, and adamantyl groups Cycloalkyl group; monovalent alicyclic hydrocarbon group such as cycloalkenyl group such as cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, and norbornenyl group; phenyl group, tolyl group, xylyl group, mesityl group, naphthyl group, methyl aryl groups such as
  • R 3 is preferably an organic group having a cyclic structure.
  • the cyclic structure may be monocyclic or polycyclic, and may have a substituent.
  • the ring in the organic group containing a cyclic structure is preferably directly bonded to L in formula (AN4).
  • the organic group having a cyclic structure may or may not have a heteroatom (oxygen atom, sulfur atom, and/or nitrogen atom, etc.), for example. Heteroatoms may replace one or more of the carbon atoms that form the ring structure.
  • the organic group having a cyclic structure is preferably, for example, a hydrocarbon group having a cyclic structure, a lactone ring group, or a sultone ring group.
  • the organic group having a cyclic structure is preferably a hydrocarbon group having a cyclic structure.
  • the above hydrocarbon group having a cyclic structure is preferably a monocyclic or polycyclic cycloalkyl group. These groups may have a substituent.
  • the cycloalkyl group may be monocyclic (such as cyclohexyl group) or polycyclic (such as adamantyl group), and preferably has 5 to 12 carbon atoms.
  • Examples of the lactone group and sultone group include structures represented by the above formulas (LC1-1) to (LC1-21) and structures represented by formulas (SL1-1) to (SL1-3). , preferably a group obtained by removing one hydrogen atom from a ring member atom constituting a lactone structure or a sultone structure.
  • an anion represented by the following formula (AN1) is also preferable.
  • o represents an integer of 1-3.
  • p represents an integer from 0 to 10;
  • q represents an integer from 0 to 10;
  • Xf represents a fluorine atom or an organic group.
  • the organic group may be an organic group substituted with at least one fluorine atom, or may be an organic group having no fluorine atom.
  • the number of carbon atoms in the organic group (preferably alkyl group) is preferably 1-10, more preferably 1-4.
  • As the organic group (preferably alkyl group) substituted with at least one fluorine atom a perfluoroalkyl group is preferred.
  • At least one Xf is preferably a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, more preferably a fluorine atom or CF 3 , and even more preferably both Xf's are fluorine atoms.
  • R4 and R5 each independently represent a hydrogen atom, a fluorine atom, an alkyl group, or an alkyl group substituted with at least one fluorine atom. When multiple R 4 and R 5 are present, each of R 4 and R 5 may be the same or different.
  • the alkyl groups represented by R 4 and R 5 preferably have 1 to 4 carbon atoms. The above alkyl group may have a substituent. Hydrogen atoms are preferred as R 4 and R 5 .
  • Specific examples and preferred aspects of the alkyl group substituted with at least one fluorine atom are the same as the specific examples and preferred aspects of Xf in formula (AN1).
  • L represents a divalent linking group.
  • divalent linking groups include -O-CO-O-, -COO-, -CONH-, -CO-, -O-, -S-, -SO-, -SO 2 -, alkylene groups ( preferably 1 to 6 carbon atoms), a cycloalkylene group (preferably 3 to 15 carbon atoms), an alkenylene group (preferably 2 to 6 carbon atoms), and a divalent linking group combining a plurality of these.
  • the divalent linking group includes -O-CO-O-, -COO-, -CONH-, -CO-, -O-, -SO 2 -, and -O-CO-O-alkylene group- , -COO-alkylene group-, or -CONH-alkylene group- is preferred, and -O-CO-O-, -O-CO-O-alkylene group-, -COO-, -CONH-, -SO 2 - , or -COO-alkylene group- is more preferred.
  • W represents an organic group containing a cyclic structure.
  • a cyclic organic group is preferable.
  • Cyclic organic groups include, for example, alicyclic groups, aryl groups, and heterocyclic groups.
  • the alicyclic group may be monocyclic or polycyclic.
  • Monocyclic alicyclic groups include, for example, monocyclic cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, and a cyclooctyl group.
  • the polycyclic alicyclic group includes, for example, a norbornyl group, a tricyclodecanyl group, a tetracyclodecanyl group, a tetracyclododecanyl group, and a polycyclic cycloalkyl group such as an adamantyl group.
  • alicyclic groups having a bulky structure with 7 or more carbon atoms such as norbornyl, tricyclodecanyl, tetracyclodecanyl, tetracyclododecanyl, and adamantyl groups, are preferred.
  • Aryl groups may be monocyclic or polycyclic.
  • the aryl group include phenyl group, naphthyl group, phenanthryl group, and anthryl group.
  • a heterocyclic group may be monocyclic or polycyclic. Especially, when it is a polycyclic heterocyclic group, diffusion of acid can be further suppressed. Moreover, the heterocyclic group may or may not have aromaticity. Heterocyclic rings having aromaticity include, for example, furan ring, thiophene ring, benzofuran ring, benzothiophene ring, dibenzofuran ring, dibenzothiophene ring, and pyridine ring.
  • Non-aromatic heterocycles include, for example, a tetrahydropyran ring, a lactone ring, a sultone ring, and a decahydroisoquinoline ring.
  • the heterocyclic ring in the heterocyclic group is preferably a furan ring, a thiophene ring, a pyridine ring, or a decahydroisoquinoline ring.
  • the cyclic organic group may have a substituent.
  • substituents include alkyl groups (either linear or branched, preferably having 1 to 12 carbon atoms), cycloalkyl groups (monocyclic, polycyclic, and spirocyclic). any group, preferably having 3 to 20 carbon atoms), aryl group (preferably having 6 to 14 carbon atoms), hydroxyl group, alkoxy group, ester group, amide group, urethane group, ureido group, thioether group, sulfonamide and sulfonate ester groups.
  • carbonyl carbon may be sufficient as carbon (carbon which contributes to ring formation) which comprises a cyclic
  • two or more substituents may bond together to form a ring.
  • two alkoxy groups, or a hydroxyl group and an alkoxy group may combine to form a ring having a cyclic acetal structure.
  • This ring may have a substituent.
  • substituents include alkyl groups (1 to 4 carbon atoms), halogen atoms, hydroxyl groups, alkoxy groups (1 to 4 carbon atoms), carboxyl groups, and alkoxycarbonyl groups (2 to 6 carbon atoms).
  • Examples of anions represented by formula (AN1) include SO 3 ⁇ —CF 2 —CH 2 —OCO-(L) q′ —W, SO 3 ⁇ —CF 2 —CHF—CH 2 —OCO-(L) q ' -W, SO 3 - -CF 2 -COO-(L) q' -W, SO 3 - -CF 2 -CF 2 -CH 2 -CH 2 -(L) q -W, or SO 3 - - CF 2 —CH(CF 3 )—OCO—(L) q′ —W is preferred.
  • L, q and W are the same as in formula (AN1).
  • q' represents an integer from 0 to 10;
  • AN1 As the anion represented by the formula (AN1), the following aspects (AN2) and (AN3) are also preferred.
  • Preferred aspects of q, L, and W are the same as described above.
  • Two Xf's bonded to the carbon atom Z1 are preferably hydrogen atoms. At least one of the two Xf's bonded to the carbon atom Z2 is preferably a fluorine atom or a fluorine atom-containing organic group, more preferably both are a fluorine atom or a fluorine atom-containing organic group, and both are fluorine An alkyl group substituted with is more preferred.
  • one of the two Xf's each independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; It represents a hydrogen atom or an organic group having no fluorine atom.
  • Preferred embodiments of o, p, q, R 4 , R 5 , L and W are the same as those described above.
  • the non-nucleophilic anion may be a benzenesulfonate anion, preferably a benzenesulfonate anion substituted with a branched alkyl group or cycloalkyl group.
  • an aromatic sulfonate anion represented by the following formula (AN5) is also preferable.
  • Ar represents an aryl group (such as a phenyl group), and may further have a substituent other than the sulfonate anion and -(D-B) group.
  • substituents which may be further included include, for example, a fluorine atom and a hydroxyl group.
  • n represents an integer of 0 or more. n is preferably 1 to 4, more preferably 2 to 3, and still more preferably 3.
  • D represents a single bond or a divalent linking group.
  • Divalent linking groups include ether groups, thioether groups, carbonyl groups, sulfoxide groups, sulfone groups, sulfonate ester groups, ester groups, and groups consisting of combinations of two or more thereof.
  • B represents a hydrocarbon group
  • B is an aliphatic hydrocarbon structure.
  • B is more preferably an isopropyl group, a cyclohexyl group, or an optionally substituted aryl group (such as a tricyclohexylphenyl group).
  • B may further have a substituent represented by "-(L) q -W".
  • L, q and W have the same meanings as L, q and W in formula (AN1) above, and specific examples and preferred ranges are also the same.
  • Disulfonamide anions are also preferred as non-nucleophilic anions.
  • a disulfonamide anion is, for example, an anion represented by N ⁇ (SO 2 —R q ) 2 .
  • R q represents an optionally substituted alkyl group, preferably a fluoroalkyl group, more preferably a perfluoroalkyl group.
  • Two R q may combine with each other to form a ring.
  • the group formed by bonding two R q together is preferably an optionally substituted alkylene group, preferably a fluoroalkylene group, more preferably a perfluoroalkylene group.
  • the alkylene group preferably has 2 to 4 carbon atoms.
  • Non-nucleophilic anions also include anions represented by the following formulas (d1-1) to (d1-4).
  • R 51 represents a hydrocarbon group (eg, an aryl group such as a phenyl group) optionally having a substituent (eg, hydroxyl group).
  • Z 2c represents an optionally substituted hydrocarbon group having 1 to 30 carbon atoms (provided that the carbon atom adjacent to S is not substituted with a fluorine atom).
  • the above hydrocarbon group for Z 2c may be linear or branched, and may have a cyclic structure.
  • the carbon atom in the hydrocarbon group (preferably the carbon atom that is a ring member atom when the hydrocarbon group has a cyclic structure) may be carbonyl carbon (--CO-).
  • Examples of the hydrocarbon group include a group having an optionally substituted norbornyl group.
  • a carbon atom forming the norbornyl group may be a carbonyl carbon.
  • Z 2c —SO 3 ⁇ in formula (d1-2) is preferably different from the anion represented by formula (AN4), (AN1) or (AN5) above.
  • Z 2c is preferably other than an aryl group.
  • atoms at the ⁇ - and ⁇ -positions with respect to —SO 3 — in Z 2c are preferably atoms other than carbon atoms having a fluorine atom as a substituent.
  • the ⁇ -position atom and/or the ⁇ -position atom with respect to —SO 3 — is preferably a ring member atom in a cyclic group.
  • R 52 represents an organic group (preferably a hydrocarbon group having a fluorine atom)
  • Y 3 represents a linear, branched or cyclic alkylene group, an arylene group, or represents a carbonyl group
  • Rf represents a hydrocarbon group
  • R 53 to R 54 each represent an organic group (preferably a hydrocarbon group having a fluorine atom). R 53 to R 54 may combine with each other to form a ring.
  • the organic anions may be used singly or in combination of two or more.
  • the resist composition contains two or more compounds (B), or that the compound (B) is at least one selected from the group consisting of the following compound (I) and the following compound (II). .
  • Compound (B) is also preferably at least one selected from the group consisting of compound (I) and compound (II) below.
  • Compound (I) is a compound having one or more structural moieties X shown below and one or more structural moieties Y shown below, wherein the first acidic It is a compound that generates an acid containing a site and a second acidic site described below derived from the structural site Y described below.
  • Structural site X Structural site consisting of an anionic site A 1 ⁇ and a cation site M 1 + and forming a first acidic site represented by HA 1 upon exposure to actinic rays or radiation
  • Structural site Y anionic site A structural moiety consisting of A 2 ⁇ and a cation site M 2 + and forming a second acidic site represented by HA 2 upon exposure to actinic rays or radiation: a cation site M 1 + and a cation site M 2 + each independently represents an organic cation, and specific examples and preferred ranges are the same as those of the organic cation represented by M + above.
  • the compound (I) satisfies the following condition I.
  • Condition I A compound PI obtained by replacing the cation site M 1 + in the structural site X and the cation site M 2 + in the structural site Y in the compound (I) with H + in the structural site X and the acid dissociation constant a1 derived from the acidic site represented by HA 1 obtained by replacing the cation site M 1 + with H + , and replacing the cation site M 2 + in the structural site Y with H + It has an acid dissociation constant a2 derived from the acidic site represented by HA2 , and the acid dissociation constant a2 is greater than the acid dissociation constant a1.
  • compound PI corresponds to "a compound having HA 1 and HA 2 ".
  • the acid dissociation constant a1 and the acid dissociation constant a2 of the compound PI are such that when the acid dissociation constant of the compound PI is determined, the compound PI has "A 1 - and HA 2 is the acid dissociation constant a1, and the pKa when the above "compound having A 1 - and HA 2 " becomes "the compound having A 1 - and A 2 - " is the acid dissociation constant. constant a2.
  • compound (I) is, for example, a compound that generates an acid having two first acidic sites derived from the structural site X and one second acidic site derived from the structural site Y.
  • compound PI is a "compound with two HA 1 and one HA 2 ".
  • the acid dissociation constant when the "compound having A 1 - , one HA 1 and one HA 2 " becomes “the compound having two A 1 - and one HA 2 " is the acid dissociation constant a1 correspond to Also, the acid dissociation constant when "a compound having two A 1 - and one HA 2 -" becomes "a compound having two A 1 - and A 2 - " corresponds to the acid dissociation constant a2.
  • the acid dissociation constant when the compound PI becomes "a compound having one A 1 - , one HA 1 and one HA 2 " is aa, and "one A 1 - and one HA 1 and 1
  • the relationship between aa and ab satisfies aa ⁇ ab, where ab is the acid dissociation constant when a compound having two HA2 's becomes a compound having two A1- and one HA2 . .
  • the acid dissociation constant a1 and the acid dissociation constant a2 are determined by the method for measuring the acid dissociation constant described above.
  • the above compound PI corresponds to an acid generated when compound (I) is irradiated with actinic rays or radiation.
  • the structural moieties X may be the same or different.
  • Two or more of A 1 ⁇ and two or more of M 1 + may be the same or different.
  • a 1 ⁇ and A 2 ⁇ , and M 1 + and M 2 + may be the same or different, but A 1 ⁇ and A 2 ⁇ may be the same or different.
  • Each A 2 - is preferably different.
  • the difference (absolute value) between the acid dissociation constant a1 (the maximum value when there are multiple acid dissociation constants a1) and the acid dissociation constant a2 is preferably 0.1 or more, and preferably 0.5 or more. More preferably, 1.0 or more is even more preferable.
  • the upper limit of the difference (absolute value) between the acid dissociation constant a1 (the maximum value if there are a plurality of acid dissociation constants a1) and the acid dissociation constant a2 is not particularly limited, but is, for example, 16 or less.
  • the acid dissociation constant a2 is, for example, 20 or less, preferably 15 or less.
  • the lower limit of the acid dissociation constant a2 is preferably -4.0 or more.
  • the acid dissociation constant a1 is preferably 2.0 or less, more preferably 0 or less.
  • the lower limit of the acid dissociation constant a1 is preferably ⁇ 20.0 or more.
  • the anion site A 1 - and the anion site A 2 - are structural sites containing negatively charged atoms or atomic groups, for example, formulas (AA-1) to (AA-3) and formula (BB -1) to (BB-6).
  • the anion site A 1 - is preferably one capable of forming an acidic site with a small acid dissociation constant, and more preferably one of the formulas (AA-1) to (AA-3). AA-1) and (AA-3) are more preferred.
  • the anion site A 2 - is preferably one capable of forming an acidic site having a larger acid dissociation constant than the anion site A 1 - , and is represented by any one of formulas (BB-1) to (BB-6). is more preferred, and either formula (BB-1) or (BB-4) is even more preferred.
  • * represents a bonding position.
  • compound (I) is not particularly limited, but includes, for example, compounds represented by formulas (Ia-1) to (Ia-5) described below.
  • the compound represented by formula (Ia-1) generates an acid represented by HA 11 -L 1 -A 12 H upon exposure to actinic rays or radiation.
  • M 11 + and M 12 + each independently represent an organic cation.
  • a 11 - and A 12 - each independently represent a monovalent anionic functional group.
  • L 1 represents a divalent linking group.
  • M 11 + and M 12 + may be the same or different.
  • a 11 - and A 12 - may be the same or different, but are preferably different.
  • the acid dissociation constant a2 derived from the acidic site represented by HA11 is greater than the acid dissociation constant a1 derived from the acidic site represented by HA11 .
  • the preferred values of the acid dissociation constant a1 and the acid dissociation constant a2 are as described above. Also, the acid generated from compound PIa and the compound represented by formula (Ia-1) upon exposure to actinic rays or radiation is the same. At least one of M 11 + , M 12 + , A 11 ⁇ , A 12 ⁇ , and L 1 may have an acid-decomposable group as a substituent.
  • the monovalent anionic functional group represented by A 11 - intends a monovalent group containing the above-described anion site A 1 - .
  • the monovalent anionic functional group represented by A 12 - intends a monovalent group containing the above-mentioned anion site A 2 - .
  • the monovalent anionic functional groups represented by A 11 - and A 12 - include any of the above formulas (AA-1) to (AA-3) and formulas (BB-1) to (BB-6). It is preferably a monovalent anionic functional group containing an anion site, selected from the group consisting of formulas (AX-1) to (AX-3) and formulas (BX-1) to (BX-7) is more preferably a monovalent anionic functional group.
  • monovalent anionic functional groups represented by A 11 - monovalent anionic functional groups represented by any one of formulas (AX-1) to (AX-3) are preferred. preferable.
  • monovalent anionic functional group represented by A 12 - a monovalent anionic functional group represented by any one of formulas (BX-1) to (BX-7) is preferable.
  • a monovalent anionic functional group represented by any one of the formulas (BX-1) to (BX-6) is more preferable.
  • R A1 and R A2 each independently represent a monovalent organic group. * represents a binding position.
  • Monovalent organic groups represented by R A1 include a cyano group, a trifluoromethyl group, and a methanesulfonyl group.
  • the monovalent organic group represented by RA2 is preferably a linear, branched or cyclic alkyl group or aryl group.
  • the number of carbon atoms in the alkyl group is preferably 1-15, more preferably 1-10, even more preferably 1-6.
  • the above alkyl group may have a substituent.
  • the substituent is preferably a fluorine atom or a cyano group, more preferably a fluorine atom.
  • the alkyl group has a fluorine atom as a substituent, it may be a perfluoroalkyl group.
  • the aryl group is preferably a phenyl group or a naphthyl group, more preferably a phenyl group.
  • the aryl group may have a substituent.
  • the substituent is preferably a fluorine atom, an iodine atom, a perfluoroalkyl group (for example, preferably having 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms), or a cyano group, a fluorine atom, an iodine atom, a perfluoroalkyl group, or a cyano group.
  • Fluoroalkyl groups are more preferred.
  • R 2 B represents a monovalent organic group.
  • * represents a binding position.
  • the monovalent organic group represented by RB is preferably a linear, branched or cyclic alkyl group or aryl group.
  • the number of carbon atoms in the alkyl group is preferably 1-15, more preferably 1-10, even more preferably 1-6.
  • the above alkyl group may have a substituent. Although the substituent is not particularly limited, the substituent is preferably a fluorine atom or a cyano group, more preferably a fluorine atom. When the alkyl group has a fluorine atom as a substituent, it may be a perfluoroalkyl group.
  • the carbon atom that is the bonding position in the alkyl group (for example, in the case of formulas (BX-1) and (BX-4), the carbon atom directly bonded to -CO- indicated in the formula in the alkyl group is applicable.
  • the carbon atom directly bonded to -SO 2 - specified in the formula in the alkyl group corresponds, and in the case of formula (BX-6),
  • the carbon atom directly bonded to N-- in the formula. has a substituent, it is preferably a substituent other than a fluorine atom or a cyano group.
  • the carbon atom of the alkyl group may be substituted with carbonyl carbon.
  • the aryl group is preferably a phenyl group or a naphthyl group, more preferably a phenyl group.
  • the aryl group may have a substituent.
  • substituents include a fluorine atom, an iodine atom, a perfluoroalkyl group (eg, preferably having 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms), a cyano group, an alkyl group (eg, 1 to 10 carbon atoms).
  • an alkoxy group eg, preferably 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms.
  • an alkoxycarbonyl group eg, 2 to 10 carbon atoms are preferred, and those having 2 to 6 carbon atoms are more preferred.
  • the divalent linking group represented by L 1 is not particularly limited, and includes -CO-, -NR-, -CO-, -O-, -S-, -SO-, —SO 2 —, an alkylene group (preferably having 1 to 6 carbon atoms, which may be linear or branched), a cycloalkylene group (preferably having 3 to 15 carbon atoms), an alkenylene group (preferably having 2 to 6 carbon atoms), ), a divalent aliphatic heterocyclic group (preferably a 5- to 10-membered ring having at least one N atom, O atom, S atom, or Se atom in the ring structure, more preferably a 5- to 7-membered ring, 5 ⁇ 6-membered ring is more preferable.), a divalent aromatic heterocyclic group (at least one N atom, O atom, S atom, or Se atom in the ring structure is preferably a 5- to 10-membered ring, 5- A 7
  • the above R includes a hydrogen atom or a monovalent organic group.
  • the monovalent organic group is not particularly limited, for example, an alkyl group (preferably having 1 to 6 carbon atoms) is preferable.
  • the alkylene group, the cycloalkylene group, the alkenylene group, the divalent aliphatic heterocyclic group, the divalent aromatic heterocyclic group, and the divalent aromatic hydrocarbon ring group have a substituent. You may have Substituents include, for example, halogen atoms (preferably fluorine atoms).
  • the divalent linking group represented by L1 is preferably a divalent linking group represented by formula (L1).
  • L 111 represents a single bond or a divalent linking group.
  • the divalent linking group represented by L 111 is not particularly limited, and may be, for example, —CO—, —NH—, —O—, —SO—, —SO 2 —, or have a substituent.
  • Alkylene group preferably having 1 to 6 carbon atoms, which may be linear or branched
  • optionally substituted cycloalkylene group preferably having 3 to 15 carbon atoms
  • substituted An aryl group preferably having 6 to 10 carbon atoms
  • a divalent linking group combining a plurality of these groups may be mentioned.
  • the substituent is not particularly limited, and examples thereof include halogen atoms.
  • Each Xf 1 independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom.
  • the number of carbon atoms in this alkyl group is preferably 1-10, more preferably 1-4.
  • a perfluoroalkyl group is preferable as the alkyl group substituted with at least one fluorine atom.
  • Each Xf2 independently represents a hydrogen atom, an alkyl group optionally having a fluorine atom as a substituent, or a fluorine atom.
  • the number of carbon atoms in this alkyl group is preferably 1-10, more preferably 1-4.
  • Xf2 preferably represents a fluorine atom or an alkyl group substituted with at least one fluorine atom, more preferably a fluorine atom or a perfluoroalkyl group.
  • Xf 1 and Xf 2 are each independently preferably a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, more preferably a fluorine atom or CF 3 .
  • both Xf 1 and Xf 2 are more preferably fluorine atoms.
  • * represents a binding position.
  • a 21a - and A 21b - each independently represent a monovalent anionic functional group.
  • the monovalent anionic functional groups represented by A 21a - and A 21b - are meant to be monovalent groups containing the above-described anionic site A 1 - .
  • the monovalent anionic functional groups represented by A 21a - and A 21b - are not particularly limited.
  • Anionic functional groups are included.
  • a 22 - represents a divalent anionic functional group.
  • the divalent anionic functional group represented by A 22 - intends a divalent group containing the above-described anion site A 2 - .
  • Examples of the divalent anionic functional group represented by A 22 - include divalent anionic functional groups represented by formulas (BX-8) to (BX-11) shown below.
  • M 21a + , M 21b + , and M 22 + each independently represent an organic cation.
  • the organic cations represented by M 21a + , M 21b + , and M 22 + are synonymous with M 1 + described above, and the preferred embodiments are also the same.
  • L21 and L22 each independently represent a divalent organic group.
  • the site-derived acid dissociation constant a2 is greater than the acid dissociation constant a1-1 derived from A 21a H and the acid dissociation constant a1-2 derived from the acidic site represented by A 21b H.
  • the acid dissociation constant a1-1 and the acid dissociation constant a1-2 correspond to the acid dissociation constant a1 described above.
  • a 21a - and A 21b - may be the same or different.
  • M 21a + , M 21b + , and M 22 + may be the same or different.
  • At least one of M 21a + , M 21b + , M 22 + , A 21a ⁇ , A 21b ⁇ , L 21 and L 22 may have an acid-decomposable group as a substituent.
  • a 31a - and A 32 - each independently represent a monovalent anionic functional group.
  • the definition of the monovalent anionic functional group represented by A 31a - is synonymous with A 21a - and A 21b - in formula (Ia-2) described above, and the preferred embodiments are also the same.
  • the monovalent anionic functional group represented by A 32 - intends a monovalent group containing the above-mentioned anion site A 2 - .
  • the monovalent anionic functional group represented by A 32 - is not particularly limited, and is, for example, a monovalent anionic functional group selected from the group consisting of the above formulas (BX-1) to (BX-7). is mentioned.
  • a 31b - represents a divalent anionic functional group.
  • the divalent anionic functional group represented by A 31b - intends a divalent group containing the above-mentioned anionic site A 1 - .
  • Examples of the divalent anionic functional group represented by A 31b - include a divalent anionic functional group represented by formula (AX-4) shown below.
  • M 31a + , M 31b + , and M 32 + each independently represent a monovalent organic cation.
  • the organic cations represented by M 31a + , M 31b + , and M 32 + are synonymous with M 1 + described above, and the preferred embodiments are also the same.
  • L 31 and L 32 each independently represent a divalent organic group.
  • an acidic compound represented by A 32 H The acid dissociation constant a2 derived from the site is greater than the acid dissociation constant a1-3 derived from the acidic site represented by A 31a H and the acid dissociation constant a1-4 derived from the acidic site represented by A 31b H. .
  • the acid dissociation constant a1-3 and the acid dissociation constant a1-4 correspond to the acid dissociation constant a1 described above.
  • a 31a - and A 32 - may be the same or different.
  • M 31a + , M 31b + , and M 32 + may be the same or different. At least one of M 31a + , M 31b + , M 32 + , A 31a ⁇ , A 32 ⁇ , L 31 and L 32 may have an acid-decomposable group as a substituent.
  • a 41a ⁇ , A 41b ⁇ , and A 42 ⁇ each independently represent a monovalent anionic functional group.
  • the definitions of the monovalent anionic functional groups represented by A 41a - and A 41b - are the same as those of A 21a - and A 21b - in formula (Ia-2) described above.
  • the definition of the monovalent anionic functional group represented by A 42 - is the same as that of A 32 - in formula (Ia-3) described above, and the preferred embodiments are also the same.
  • M 41a + , M 41b + , and M 42 + each independently represent an organic cation.
  • L41 represents a trivalent organic group.
  • an acidic compound represented by A 42 H The acid dissociation constant a2 derived from the site is greater than the acid dissociation constant a1-5 derived from the acidic site represented by A 41a H and the acid dissociation constant a1-6 derived from the acidic site represented by A 41b H. .
  • the acid dissociation constant a1-5 and the acid dissociation constant a1-6 correspond to the acid dissociation constant a1 described above.
  • a 41a ⁇ , A 41b ⁇ , and A 42 ⁇ may be the same or different.
  • M 41a + , M 41b + , and M 42 + may be the same or different. At least one of M 41a + , M 41b + , M 42 + , A 41a ⁇ , A 41b ⁇ , A 42 ⁇ , and L 41 may have an acid-decomposable group as a substituent.
  • the divalent organic groups represented by L 21 and L 22 in formula (Ia-2) and L 31 and L 32 in formula (Ia-3) are not particularly limited, for example, —CO— , —NR—, —O—, —S—, —SO—, —SO 2 —, an alkylene group (preferably having 1 to 6 carbon atoms, which may be linear or branched), a cycloalkylene group (preferably 3 to 15 carbon atoms), alkenylene groups (preferably 2 to 6 carbon atoms), divalent aliphatic heterocyclic groups (at least one N atom, O atom, S atom, or Se atom in the ring structure 5 A to 10-membered ring is preferred, a 5- to 7-membered ring is more preferred, and a 5- to 6-membered ring is even more preferred.), a divalent aromatic heterocyclic group (at least one N atom, O atom, S atom, or Se A 5- to 10-membered ring having an atom in the
  • the above R includes a hydrogen atom or a monovalent organic group.
  • the monovalent organic group is not particularly limited, for example, an alkyl group (preferably having 1 to 6 carbon atoms) is preferable.
  • the alkylene group, the cycloalkylene group, the alkenylene group, the divalent aliphatic heterocyclic group, the divalent aromatic heterocyclic group, and the divalent aromatic hydrocarbon ring group have a substituent. You may have Substituents include, for example, halogen atoms (preferably fluorine atoms).
  • Examples of divalent organic groups represented by L 21 and L 22 in formula (Ia-2) and L 31 and L 32 in formula (Ia-3) are represented by the following formula (L2): It is also preferred that it is a divalent organic group that
  • q represents an integer of 1-3. * represents a binding position.
  • Each Xf independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom.
  • the number of carbon atoms in this alkyl group is preferably 1-10, more preferably 1-4.
  • a perfluoroalkyl group is preferable as the alkyl group substituted with at least one fluorine atom.
  • Xf is preferably a fluorine atom or a C 1-4 perfluoroalkyl group, more preferably a fluorine atom or CF 3 . In particular, it is more preferable that both Xf are fluorine atoms.
  • LA represents a single bond or a divalent linking group.
  • the divalent linking group represented by L A is not particularly limited, and examples thereof include -CO-, -O-, -SO-, -SO 2 -, alkylene groups (preferably having 1 to 6 carbon atoms, straight-chain may be in the form of a branched chain), a cycloalkylene group (preferably having 3 to 15 carbon atoms), a divalent aromatic hydrocarbon ring group (preferably a 6- to 10-membered ring, more preferably a 6-membered ring), and Divalent linking groups in which a plurality of these are combined are included.
  • the alkylene group, the cycloalkylene group, and the divalent aromatic hydrocarbon ring group may have a substituent. Substituents include, for example, halogen atoms (preferably fluorine atoms).
  • Examples of the divalent organic group represented by formula (L2) include *-CF 2 -*, *-CF 2 -CF 2 -*, *-CF 2 -CF 2 -CF 2 -*, *- Ph-O- SO2 - CF2- *, *-Ph-O- SO2 - CF2 - CF2- *, *-Ph-O- SO2 - CF2 - CF2 - CF2- *, and , *—Ph—OCO—CF 2 —*.
  • Ph is an optionally substituted phenylene group, preferably a 1,4-phenylene group.
  • an alkyl group eg, preferably having 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms
  • an alkoxy group eg, preferably having 1 to 10 carbon atoms, 1 to 1 carbon atoms, 6 is more preferable
  • an alkoxycarbonyl group eg, preferably having 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.
  • L 31 and L 32 in formula (Ia-3) represent a divalent organic group represented by formula (L2)
  • the bond (*) on the L A side in formula (L2) is Bonding with A 31a - and A 32 - in formula (Ia-3) is preferred.
  • a 51a ⁇ , A 51b ⁇ , and A 51c ⁇ each independently represent a monovalent anionic functional group.
  • the monovalent anionic functional groups represented by A 51a ⁇ , A 51b ⁇ , and A 51c ⁇ are intended to be monovalent groups containing the above-described anion site A 1 ⁇ .
  • the monovalent anionic functional groups represented by A 51a ⁇ , A 51b ⁇ , and A 51c ⁇ are not particularly limited, but are, for example, the group consisting of the above formulas (AX-1) to (AX-3) A selected monovalent anionic functional group can be mentioned.
  • a 52a - and A 52b - represent divalent anionic functional groups.
  • the divalent anionic functional groups represented by A 52a - and A 52b - are intended to be divalent groups containing the above-described anionic site A 2 - .
  • the divalent anionic functional group represented by A 22 - includes, for example, divalent anionic functional groups selected from the group consisting of the above formulas (BX-8) to (BX-11).
  • M 51a + , M 51b + , M 51c + , M 52a + , and M 52b + each independently represent an organic cation.
  • the organic cations represented by M 51a + , M 51b + , M 51c + , M 52a + , and M 52b + are synonymous with M 1 + described above, and preferred embodiments are also the same.
  • L51 and L53 each independently represent a divalent organic group.
  • the divalent organic groups represented by L 51 and L 53 have the same meanings as L 21 and L 22 in formula (Ia-2) above, and the preferred embodiments are also the same.
  • L52 represents a trivalent organic group.
  • the trivalent organic group represented by L 52 has the same definition as L 41 in formula (Ia-4) above, and the preferred embodiments are also the same.
  • the acid dissociation constant a2-1 derived from the acidic site represented by A 52a H and the acid dissociation constant a2-2 derived from the acidic site represented by A 52b H are the acid dissociation constant a1- derived from A 51a H. 1, greater than the acid dissociation constant a1-2 derived from the acidic site represented by A 51b H and the acid dissociation constant a1-3 derived from the acidic site represented by A 51c H.
  • the acid dissociation constants a1-1 to a1-3 correspond to the acid dissociation constant a1 described above, and the acid dissociation constants a2-1 and a2-2 correspond to the acid dissociation constant a2 described above.
  • a 51a ⁇ , A 51b ⁇ , and A 51c ⁇ may be the same or different.
  • a 52a - and A 52b - may be the same or different.
  • M 51a + , M 51b + , M 51c + , M 52a + , and M 52b + may be the same or different.
  • At least one of M 51b + , M 51c + , M 52a + , M 52b + , A 51a ⁇ , A 51b ⁇ , A 51c ⁇ , L 51 , L 52 and L 53 is an acid-decomposable group as a substituent. may have a sexual group.
  • Compound (II) is a compound having two or more of the above structural moieties X and one or more of the following structural moieties Z, wherein the first acidic It is an acid-generating compound containing two or more sites and an acid-generating compound containing the structural site Z described above.
  • Structural site Z nonionic site capable of neutralizing acid
  • the preferred range of the acid dissociation constant a1 derived from the acidic site represented by is the same as the acid dissociation constant a1 in the above compound PI.
  • the compound (II) is a compound that generates an acid having two of the first acidic sites derived from the structural site X and the structural site Z
  • the compound PII is "two HA 1 It corresponds to "a compound having When the acid dissociation constant of this compound PII is determined, the acid dissociation constant when the compound PII is "a compound having one A 1 - and one HA 1 " and "one A 1 - and one HA
  • the acid dissociation constant when the "compound having 1 " becomes "the compound having two A 1 - " corresponds to the acid dissociation constant a1.
  • the acid dissociation constant a1 is obtained by the method for measuring the acid dissociation constant described above.
  • the above compound PII corresponds to an acid generated when compound (II) is irradiated with actinic rays or radiation.
  • the two or more structural sites X may be the same or different.
  • Two or more of A 1 ⁇ and two or more of M 1 + may be the same or different.
  • the nonionic site capable of neutralizing the acid in the structural site Z is not particularly limited.
  • a site containing a group capable of electrostatically interacting with protons or a functional group having electrons is preferred.
  • a group capable of electrostatically interacting with protons or a functional group having electrons is a functional group having a macrocyclic structure such as a cyclic polyether, or a lone pair of electrons that does not contribute to ⁇ conjugation.
  • a functional group having a nitrogen atom is included.
  • a nitrogen atom having a lone pair of electrons that does not contribute to ⁇ -conjugation is, for example, a nitrogen atom having a partial structure represented by the following formula.
  • Partial structures of functional groups having electrons or groups capable of electrostatically interacting with protons include, for example, a crown ether structure, an azacrown ether structure, a primary to tertiary amine structure, a pyridine structure, an imidazole structure, and a pyrazine structure. Among them, primary to tertiary amine structures are preferred.
  • the compound (II) is not particularly limited, but includes, for example, compounds represented by the following formulas (IIa-1) and (IIa-2).
  • a 61a - and A 61b - have the same meanings as A 11 - in formula (Ia-1) above, and preferred embodiments are also the same.
  • M 61a + and M 61b + have the same meanings as M 11 + in formula (Ia-1) described above, and the preferred embodiments are also the same.
  • L 61 and L 62 have the same definitions as L 1 in formula (Ia-1) above, and the preferred embodiments are also the same.
  • R 2X represents a monovalent organic group.
  • the monovalent organic group represented by R 2X is not particularly limited . - may be substituted with one or a combination of two or more selected from the group consisting of an alkyl group (preferably having 1 to 10 carbon atoms, may be linear or branched), a cycloalkyl group (preferably has 3 to 15 carbon atoms), or an alkenyl group (preferably 2 to 6 carbon atoms).
  • the alkylene group, the cycloalkylene group, and the alkenylene group may have a substituent. Examples of substituents include, but are not particularly limited to, halogen atoms (preferably fluorine atoms).
  • the acid derived from the acidic site represented by A 61a H The dissociation constant a1-7 and the acid dissociation constant a1-8 derived from the acidic site represented by A 61b H correspond to the acid dissociation constant a1 described above.
  • the compound PIIa-1 obtained by replacing the cation sites M 61a + and M 61b + in the structural site X in the structural site X in the compound (IIa-1) with H + is HA 61a -L 61 -N(R 2X ) -L 62 -A 61b H.
  • compound PIIa-1 is the same as the acid generated from the compound represented by formula (IIa-1) upon exposure to actinic rays or radiation.
  • At least one of M 61a + , M 61b + , A 61a ⁇ , A 61b ⁇ , L 61 , L 62 and R 2X may have an acid-decomposable group as a substituent.
  • a 71a ⁇ , A 71b ⁇ , and A 71c ⁇ have the same meanings as A 11 ⁇ in formula (Ia-1) above, and preferred embodiments are also the same.
  • M 71a + , M 71b + , and M 71c + have the same meanings as M 11 + in formula (Ia-1) above, and preferred embodiments are also the same.
  • L 71 , L 72 , and L 73 have the same meanings as L 1 in formula (Ia-1) above, and preferred embodiments are also the same.
  • a compound PIIa-2 obtained by replacing the cation sites M 71a + , M 71b + , and M 71c + in the structural site X of the compound (IIa-1) with H + is HA 71a -L 71 -N(L 73 -A 71c H) -L 72 -A 71b H.
  • compound PIIa-2 is the same as the acid generated from the compound represented by formula (IIa-2) upon exposure to actinic rays or radiation.
  • At least one of M 71a + , M 71b + , M 71c + , A 71a ⁇ , A 71b ⁇ , A 71c ⁇ , L 71 , L 72 and L 73 has an acid-decomposable group as a substituent. You may have
  • Examples of the compound (B) include, for example, paragraphs [0135] to [0171] of WO2018/193954, paragraphs [0077] to [0116] of WO2020/066824, and WO2017/154345. It is also preferred to use the photoacid generators disclosed in paragraphs [0018] to [0075] and [0334] to [0335] of .
  • the content of compound (B) in the composition of the present invention is not particularly limited, but is preferably 0.1% by mass or more, more preferably 1% by mass or more, based on the total solid content of the composition of the present invention. 5% by mass or more is more preferable. Moreover, the content of the compound (B) is preferably 70% by mass or less, more preferably 60% by mass or less, and even more preferably 50% by mass or less, relative to the total solid content of the composition of the present invention. Compound (B) may be used alone or in combination of two or more.
  • composition of the present invention can further contain other acid diffusion control agents in addition to the compound represented by general formula (DA1).
  • the acid diffusion control agent traps the acid generated from the photoacid generator or the like during exposure, and acts as a quencher that suppresses the reaction of the resin (A) in the unexposed area due to excess generated acid.
  • the acid diffusion control agent include basic compounds (DA), basic compounds (DB) whose basicity is reduced or lost by irradiation with actinic rays or radiation, and acid generated from the photoacid generator (B).
  • R 200 , R 201 and R 202 may be the same or different and each independently represents a hydrogen atom, an alkyl group (preferably having 1 to 20 carbon atoms), a cycloalkyl group (preferably having 3 to 20 carbon atoms) or an aryl represents a group (6 to 20 carbon atoms).
  • R 201 and R 202 may combine with each other to form a ring.
  • R 203 , R 204 , R 205 and R 206 may be the same or different and each independently represent an alkyl group having 1 to 20 carbon atoms.
  • the alkyl groups in general formulas (A) and (E) may be substituted or unsubstituted.
  • the substituted alkyl group is preferably an aminoalkyl group having 1 to 20 carbon atoms, a hydroxyalkyl group having 1 to 20 carbon atoms, or a cyanoalkyl group having 1 to 20 carbon atoms. More preferably, the alkyl groups in formulas (A) and (E) are unsubstituted.
  • the basic compound (DA) is preferably thiazole, benzothiazole, oxazole, benzoxazole, guanidine, aminopyrrolidine, pyrazole, pyrazoline, piperazine, aminomorpholine, aminoalkylmorpholine, piperidine, or compounds having these structures.
  • a basic compound (DB) whose basicity is reduced or lost by irradiation with actinic rays or radiation (hereinafter also referred to as "compound (DB)”) has a proton acceptor functional group, and actinic rays or It is a compound whose proton acceptor property is reduced or lost, or whose proton acceptor property is changed to acidic by being decomposed by irradiation with radiation.
  • the proton-accepting functional group is a functional group having electrons or a group capable of electrostatically interacting with protons, for example, a functional group having a macrocyclic structure such as cyclic polyether, or a ⁇ -conjugated means a functional group having a nitrogen atom with a lone pair of electrons that does not contribute to A nitrogen atom having a lone pair of electrons that does not contribute to ⁇ -conjugation is, for example, a nitrogen atom having a partial structure represented by the following formula.
  • Preferable partial structures of proton acceptor functional groups include, for example, a crown ether structure, an azacrown ether structure, a primary to tertiary amine structure, a pyridine structure, an imidazole structure, and a pyrazine structure.
  • the compound (DB) is decomposed by exposure to actinic rays or radiation to reduce or eliminate its proton acceptor property, or to generate a compound whose proton acceptor property is changed to an acidic one.
  • the reduction or disappearance of proton acceptor property, or the change from proton acceptor property to acidity is a change in proton acceptor property due to the addition of protons to the proton acceptor functional group.
  • the acid dissociation constant pKa of the compound generated by decomposition of the compound (DB) by irradiation with actinic rays or radiation preferably satisfies pKa ⁇ 1, more preferably satisfies ⁇ 13 ⁇ pKa ⁇ 1, and ⁇ More preferably, 13 ⁇ pKa ⁇ -3 is satisfied.
  • onium salt (DC) compounds represented by the following general formulas (d1-1) to (d1-3) are preferable.
  • R 51 is an optionally substituted hydrocarbon group
  • Z 2c is an optionally substituted hydrocarbon group having 1 to 30 carbon atoms (provided that the carbon adjacent to S is not substituted with a fluorine atom)
  • R 52 is an organic group
  • Y 3 is a linear, branched or cyclic alkylene group or arylene group
  • Rf is a fluorine atom and each M + is independently an ammonium cation, a sulfonium cation, or an iodonium cation.
  • Preferred examples of the sulfonium cation or iodonium cation represented by M + include the sulfonium cations exemplified by general formula (ZI) and the iodonium cations exemplified by general formula (ZII).
  • DC onium salt
  • C-1 a compound represented by any one of the following general formulas (C-1) to (C-3) are preferable.
  • R 1 , R 2 and R 3 each independently represent a substituent having 1 or more carbon atoms.
  • L 1 represents a divalent linking group or a single bond that links the cation site and the anion site.
  • —X — represents an anionic moiety selected from —COO ⁇ , —SO 3 ⁇ , —SO 2 ⁇ , and —N ⁇ —R 4 .
  • R 1 to R 3 together represent one divalent substituent, which may be bonded to the N atom via a double bond.
  • substituents having 1 or more carbon atoms for R 1 to R 3 include an alkyl group, a cycloalkyl group, an aryl group, an alkyloxycarbonyl group, a cycloalkyloxycarbonyl group, an aryloxycarbonyl group, an alkylaminocarbonyl group, and a cycloalkylamino
  • An alkyl group, a cycloalkyl group, or an aryl group is preferred.
  • L 1 as a divalent linking group is a linear or branched alkylene group, a cycloalkylene group, an arylene group, a carbonyl group, an ether bond, an ester bond, an amide bond, a urethane bond, a urea bond, and two of these A group formed by combining more than one species and the like can be mentioned.
  • L 1 is preferably an alkylene group, an arylene group, an ether bond, an ester bond, or a group formed by combining two or more of these.
  • a low-molecular-weight compound (DD) having a nitrogen atom and a group that leaves under the action of an acid has a group that leaves under the action of an acid on the nitrogen atom. It is preferably an amine derivative having The group that leaves by the action of an acid is preferably an acetal group, a carbonate group, a carbamate group, a tertiary ester group, a tertiary hydroxyl group, or a hemiaminal ether group, more preferably a carbamate group or a hemiaminal ether group.
  • the molecular weight of the compound (DD) is preferably 100-1000, more preferably 100-700, even more preferably 100-500.
  • Compound (DD) may have a carbamate group with a protecting group on the nitrogen atom.
  • a protecting group constituting a carbamate group is represented by the following general formula (d-1).
  • Rb each independently represents a hydrogen atom, an alkyl group (preferably having 1 to 10 carbon atoms), a cycloalkyl group (preferably having 3 to 30 carbon atoms), an aryl group (preferably having 3 to 30 carbon atoms), an aralkyl group ( preferably 1 to 10 carbon atoms) or an alkoxyalkyl group (preferably 1 to 10 carbon atoms).
  • Rb's may combine with each other to form a ring.
  • the alkyl group, cycloalkyl group, aryl group, and aralkyl group represented by Rb are each independently a hydroxyl group, a cyano group, an amino group, a pyrrolidino group, a piperidino group, a morpholino group, a functional group such as an oxo group, an alkoxy group, or It may be substituted with a halogen atom.
  • Rb The same applies to the alkoxyalkyl group represented by Rb.
  • Rb is preferably a linear or branched alkyl group, cycloalkyl group or aryl group, more preferably a linear or branched alkyl group or cycloalkyl group.
  • Examples of the ring formed by connecting two Rb's to each other include alicyclic hydrocarbons, aromatic hydrocarbons, heterocyclic hydrocarbons and derivatives thereof.
  • Specific structures of the group represented by formula (d-1) include, but are not limited to, structures disclosed in paragraph [0466] of US Patent Publication No. US2012/0135348A1.
  • the compound (DD) preferably has a structure represented by the following general formula (6).
  • l represents an integer of 0 to 2
  • m represents an integer of 1 to 3
  • Ra represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group.
  • the two Ra's may be the same or different, and the two Ra's may be linked together to form a heterocyclic ring together with the nitrogen atom in the formula.
  • This heterocyclic ring may contain a heteroatom other than the nitrogen atom in the formula.
  • Rb has the same definition as Rb in formula (d-1) above, and preferred examples are also the same.
  • the alkyl group, cycloalkyl group, aryl group, and aralkyl group as Ra are each independently substituted with an alkyl group, cycloalkyl group, aryl group, and aralkyl group as Rb. It may be substituted with the same groups as the groups described above as good groups.
  • alkyl group, cycloalkyl group, aryl group, and aralkyl group (these groups may be substituted with the above groups) for Ra include the same groups as the specific examples described above for Rb. be done.
  • Specific examples of particularly preferred compounds (DD) in the present invention include, but are not limited to, compounds disclosed in paragraph [0475] of US Patent Application Publication No. 2012/0135348A1.
  • the onium salt compound (DE) having a nitrogen atom in the cation moiety is preferably a compound having a basic site containing a nitrogen atom in the cation moiety.
  • the basic moiety is preferably an amino group, more preferably an aliphatic amino group. More preferably all of the atoms adjacent to the nitrogen atom in the basic moiety are hydrogen atoms or carbon atoms.
  • an electron-withdrawing functional group a carbonyl group, a sulfonyl group, a cyano group, a halogen atom, etc.
  • Preferred specific examples of the compound (DE) include, but are not limited to, compounds disclosed in paragraph [0203] of US Patent Application Publication No. 2015/0309408A1.
  • the acid diffusion controller may be used singly or in combination of two or more.
  • the content of the other acid diffusion controller in the composition of the invention (Total if multiple types are present) is preferably 0.001 to 20% by mass, more preferably 0.01 to 15% by mass, based on the total solid content of the composition of the present invention.
  • the composition of the invention preferably contains a solvent.
  • a known resist solvent can be appropriately used as a solvent in the composition of the present invention.
  • the solvent include alkylene glycol monoalkyl ether carboxylate, alkylene glycol monoalkyl ether, alkyl lactate, alkyl alkoxypropionate, cyclic lactone (preferably having 4 to 10 carbon atoms), monoketone compound which may have a ring. (preferably having 4 to 10 carbon atoms), alkylene carbonates, alkyl alkoxyacetates, and alkyl pyruvates.
  • the description in paragraphs [0187] to [0197] of International Publication No. 2019/058890 can be referred to, and the contents thereof are incorporated herein.
  • the solid content concentration of the actinic ray-sensitive or radiation-sensitive resin composition of the present invention is generally 1.0 to 30% by mass, preferably 1.5 to 10% by mass. By setting the solid content concentration within the above range, the resist solution can be uniformly applied onto the substrate.
  • the solid content concentration is the mass percentage of the mass of other components excluding the solvent with respect to the total mass of the actinic ray-sensitive or radiation-sensitive resin composition.
  • the composition of the invention may further contain a surfactant.
  • a surfactant By containing a surfactant, when an exposure light source with a wavelength of 250 nm or less, particularly 220 nm or less is used, it is possible to form a pattern with good adhesion and less development defects with good sensitivity and resolution. Become.
  • the surfactant it is particularly preferable to use a fluorine-based and/or silicon-based surfactant.
  • the description in paragraphs [0183] to [0184] of WO2019/058890 can be considered, and the contents thereof are incorporated herein.
  • composition of the present invention contains a surfactant
  • its content is preferably greater than 0 to 2% by mass, more preferably 0.0001 to 2% by mass, based on the total solid content of the composition, More preferably, it is 0.0005 to 1% by mass.
  • the composition of the present invention contains a carboxylic acid, a carboxylic acid onium salt, a dissolution inhibiting compound having a molecular weight of 3000 or less described in Proceeding of SPIE, 2724, 355 (1996), a dye, and a plasticizer. , a photosensitizer, a light absorber, an antioxidant, and the like can be appropriately contained.
  • Carboxylic acid in particular, can be suitably used to improve performance.
  • Preferred carboxylic acids are aromatic carboxylic acids such as benzoic acid and naphthoic acid.
  • the content of the carboxylic acid is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass, based on the total solid content of the composition. It is preferably 0.01 to 3% by mass.
  • the composition of the present invention relates to an actinic ray- or radiation-sensitive resin composition that reacts with irradiation of actinic rays or radiation to change its properties. More specifically, the composition of the present invention can be used in semiconductor manufacturing processes such as IC (Integrated Circuit), circuit board manufacturing such as liquid crystals or thermal heads, manufacturing of imprint mold structures, other photofabrication processes, or The present invention relates to an actinic ray- or radiation-sensitive resin composition used for producing a lithographic printing plate or an acid-curable composition.
  • the pattern formed in the present invention can be used in an etching process, an ion implantation process, a bump electrode forming process, a rewiring forming process, MEMS (Micro Electro Mechanical Systems), and the like.
  • the present invention also relates to an actinic ray- or radiation-sensitive film (preferably a resist film) formed from the actinic ray- or radiation-sensitive composition of the present invention described above.
  • a film is formed, for example, by applying the composition of the present invention onto a support such as a substrate.
  • the thickness of the actinic ray-sensitive or radiation-sensitive film is not particularly limited, it is preferably 0.02 to 0.1 ⁇ m.
  • a suitable coating method such as spin coating, roll coating, flow coating, dip coating, spray coating, doctor coating, etc.
  • the coated film is prebaked at 60 to 150° C. for 1 to 20 minutes, preferably at 80 to 120° C. for 1 to 10 minutes to form a thin film.
  • the topcoat that may be provided on the substrate, the actinic ray-sensitive or radiation-sensitive film, the descriptions in paragraphs [0342] to [0358] of International Publication No. 2017/056832 can be referred to, and these contents are the specification of the present application. incorporated into the book.
  • the present invention a resist film forming step of forming a resist film using the actinic ray-sensitive or radiation-sensitive resin composition of the present invention; an exposure step of exposing the resist film; A developing step of developing the exposed resist film using a developer; It also relates to a patterning method comprising
  • the exposure is preferably performed using an electron beam (EB), an ArF excimer laser or extreme ultraviolet (EUV), more preferably an electron beam or extreme ultraviolet.
  • EB electron beam
  • EUV extreme ultraviolet
  • the resist film is exposed (pattern forming step).
  • the exposure amount is about 1 to 100 mJ/cm 2 , preferably about 20 to 60 mJ/cm 2 in the case of ArF excimer laser, and about 0.1 to 20 ⁇ C/cm 2 , preferably 3 to 10 ⁇ C/cm in the case of electron beam. 2 , and in the case of extreme ultraviolet rays, about 0.1 to 20 mJ/cm 2 , preferably about 3 to 15 mJ/cm 2 .
  • post-exposure heating on a hot plate preferably at 60 to 150°C for 5 seconds to 20 minutes, more preferably at 80 to 120°C for 15 seconds to 10 minutes, still more preferably at 80 to 120°C for 1 to 10 minutes.
  • Post-exposure baking is performed, followed by development, rinsing, and drying to form a pattern.
  • post-exposure heating is appropriately adjusted depending on the acid decomposability of the repeating unit having an acid decomposable group in the resin (A).
  • the post-exposure heating temperature is 110° C. or higher and the heating time is 45 seconds or longer.
  • an alkaline developer typically an alkaline aqueous solution
  • a developer containing an organic solvent also referred to as an organic developer
  • the developer is an alkaline aqueous solution
  • TMAH tetramethylammonium hydroxide
  • TBAH tetrabutylammonium hydroxide
  • Development is carried out for 0.1 to 3 minutes, preferably 0.5 to 2 minutes, by a conventional method such as dip method, puddle method or spray method. Suitable amounts of alcohols and/or surfactants may be added to the alkaline developer.
  • the unexposed portion of the film dissolves and the exposed portion is difficult to dissolve in the developer, and in the formation of a positive pattern, the exposed portion of the film is dissolved, and the unexposed portion of the film is difficult to dissolve in the developer, so that the desired pattern is formed on the substrate.
  • the alkali concentration of the alkali developer is usually 0.1 to 20 mass %.
  • the pH of the alkaline developer is usually 10.0-15.0. In particular, a 2.38% by weight aqueous solution of tetramethylammonium hydroxide is desirable.
  • Pure water may be used as the rinse solution in the rinse treatment performed after alkali development, and an appropriate amount of surfactant may be added. Further, after the development processing or the rinsing processing, a processing for removing the developer or the rinsing liquid adhering to the pattern with a supercritical fluid can be performed.
  • the developer in the above step may be a ketone solvent, an ester solvent, or an ester solvent.
  • Polar solvents such as solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents can be used.
  • the concentration of the organic solvent (in the case of multiple mixtures, the total) in the organic developer is preferably 50% by mass or more, more preferably 50 to 100% by mass, still more preferably 85 to 100% by mass, still more preferably 90 to 100% by weight, particularly preferably 95 to 100% by weight. Most preferably, it consists essentially of an organic solvent.
  • the case where it consists substantially only of the organic solvent includes the case where a small amount of surfactant, antioxidant, stabilizer, antifoaming agent, etc. are contained.
  • the organic developer is preferably a developer containing at least one organic solvent selected from the group consisting of ketone solvents, ester solvents, alcohol solvents, amide solvents and ether solvents. .
  • composition for use in the present invention does not contain impurities such as components containing metals, halogen-containing metal salts, acids, alkalis, sulfur atoms or phosphorus atoms.
  • impurities containing metal atoms include Na, K, Ca, Fe, Cu, Mn, Mg, Al, Cr, Ni, Zn, Ag, Sn, Pb, Li, and salts thereof. can.
  • the content of impurities contained in these materials is preferably 1 ppm (parts per million) or less, more preferably 1 ppb (parts per billion) or less, further preferably 100 ppt (parts per trillion) or less, particularly preferably 10 ppt or less, Most preferably, it is substantially free (below the detection limit of the measuring device).
  • impurities such as metals from various materials
  • the descriptions in paragraphs [0384] to [0402] of International Publication No. 2017/056832 can be referred to, and the contents thereof are incorporated herein.
  • the present invention also relates to a method of manufacturing an electronic device, including the pattern forming method described above.
  • the electronic device manufactured by the method for manufacturing an electronic device of the present invention is suitably mounted in electrical and electronic equipment (for example, home appliances, OA (Office Automation) related equipment, media related equipment, optical equipment, communication equipment, etc.). be done.
  • electrical and electronic equipment for example, home appliances, OA (Office Automation) related equipment, media related equipment, optical equipment, communication equipment, etc.
  • Photoacid generator (B) The structure of the photoacid generator (B) used is shown below.
  • Table 1 below shows the pKa of the conjugate acids of the acid diffusion controllers (D-1) to (D-10), (DX-1) and (DX-2).
  • FIG. 1 shows an NMR (nuclear magnetic resonance) chart (solvent: deuterated acetone) of the compound (D-1) obtained in Synthesis Example 2.
  • W-1 Megafac F176 (manufactured by Dainippon Ink and Chemicals Co., Ltd.; fluorine-based)
  • W-2 Megafac R08 (manufactured by Dainippon Ink and Chemicals Co., Ltd.; fluorine and silicon type)
  • W-3 Polysiloxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.; silicone-based)
  • W-4 Troisol S-366 (manufactured by Troy Chemical Co., Ltd.)
  • W-5 KH-20 (manufactured by Asahi Glass Co., Ltd.)
  • W-6 PolyFox PF-6320 (manufactured by OMNOVA Solutions Inc.; fluorine-based)
  • SL-1 Propylene glycol monomethyl ether acetate (PGMEA)
  • SL-2 propylene glycol monomethyl ether propionate
  • SL-3 2-heptanone
  • SL-4 ethyl lactate
  • SL-5 propylene glycol monomethyl ether
  • SL-6 cyclohexanone
  • SL-7 ⁇ -butyrolactone
  • SL-8 propylene carbonate
  • the resulting resist composition was coated on a 6-inch Si (silicon) wafer previously treated with hexamethyldisilazane (HMDS) using a spin coater Mark 8 manufactured by Tokyo Electron, and coated on a hot plate at 130° C. for 300 seconds. After drying, a resist film with a film thickness of 100 nm was obtained. Similar results can be obtained by replacing the Si wafer with a chromium substrate.
  • HMDS hexamethyldisilazane
  • the wafer coated with the resist film obtained above was subjected to pattern irradiation using an electron beam lithography system (manufactured by Advantest Co., Ltd.; F7000S, acceleration voltage 50 keV). At this time, drawing was performed so as to form a line and space of 1:1. After electron beam drawing, the sheet was heated on a hot plate at 100° C. for 60 seconds, immersed in a 2.38% by mass tetramethylammonium hydroxide (TMAH) aqueous solution for 60 seconds, rinsed with water for 30 seconds, and dried. . After that, the wafer was rotated at a rotation speed of 4000 rpm for 30 seconds, and then dried by baking at 95° C. for 60 seconds.
  • TMAH tetramethylammonium hydroxide
  • TMAH tetramethylammonium hydroxide
  • the resist compositions of Examples 1 to 14 contain a resin (A) whose polarity increases under the action of an acid, and a compound represented by the general formula (DA1). It can be seen that the performance and LWR performance are excellent and development defects can be reduced. On the other hand, the resist compositions of Comparative Examples 1 and 2 do not contain the compound represented by the general formula (DA1), and are inferior to the resist compositions of Examples in terms of EL performance, LWR performance and development defects. was

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
PCT/JP2022/027517 2021-08-12 2022-07-13 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法 WO2023017702A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020247004350A KR20240031384A (ko) 2021-08-12 2022-07-13 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법 및 전자 디바이스의 제조 방법
JP2023541376A JPWO2023017702A1 (ko) 2021-08-12 2022-07-13

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-131754 2021-08-12
JP2021131754 2021-08-12

Publications (1)

Publication Number Publication Date
WO2023017702A1 true WO2023017702A1 (ja) 2023-02-16

Family

ID=85200456

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2022/027517 WO2023017702A1 (ja) 2021-08-12 2022-07-13 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法

Country Status (4)

Country Link
JP (1) JPWO2023017702A1 (ko)
KR (1) KR20240031384A (ko)
TW (1) TW202311241A (ko)
WO (1) WO2023017702A1 (ko)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104985914A (zh) * 2015-07-10 2015-10-21 中国科学院理化技术研究所 包含两层感光层的可水显影的光聚合型平版印刷版材料及其应用
JP2018155908A (ja) * 2017-03-17 2018-10-04 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2020098330A (ja) * 2018-12-18 2020-06-25 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2021047396A (ja) * 2019-09-13 2021-03-25 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2021081708A (ja) * 2019-11-20 2021-05-27 信越化学工業株式会社 レジスト材料及びパターン形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7114242B2 (ja) 2016-12-14 2022-08-08 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP7156199B2 (ja) 2018-08-09 2022-10-19 信越化学工業株式会社 レジスト材料及びパターン形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104985914A (zh) * 2015-07-10 2015-10-21 中国科学院理化技术研究所 包含两层感光层的可水显影的光聚合型平版印刷版材料及其应用
JP2018155908A (ja) * 2017-03-17 2018-10-04 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2020098330A (ja) * 2018-12-18 2020-06-25 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2021047396A (ja) * 2019-09-13 2021-03-25 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP2021081708A (ja) * 2019-11-20 2021-05-27 信越化学工業株式会社 レジスト材料及びパターン形成方法

Also Published As

Publication number Publication date
KR20240031384A (ko) 2024-03-07
JPWO2023017702A1 (ko) 2023-02-16
TW202311241A (zh) 2023-03-16

Similar Documents

Publication Publication Date Title
JP4961324B2 (ja) 電子線、ｘ線又はｅｕｖ用ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP6613020B2 (ja) カルバメート成分を含むフォトレジスト
JP6007100B2 (ja) 感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性膜及びパターン形成方法
JP5140354B2 (ja) 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP2007293250A (ja) ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP7318129B2 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JPWO2020066342A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2023054127A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法及び電子デバイスの製造方法
WO2022209733A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
JP5520489B2 (ja) リソグラフィ用基板被覆方法、及び該方法に用いられる感活性光線または感放射線性樹脂組成物
WO2022172689A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2022172597A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、ポジ型パターン形成方法、電子デバイスの製造方法
WO2022158323A1 (ja) パターン形成方法、及び電子デバイスの製造方法
WO2021220851A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、マスクブランクス、パターン形成方法及び電子デバイスの製造方法
WO2023032794A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物
WO2023162837A1 (ja) ポジ型感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物
JP7434592B2 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2023120250A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物
WO2023145564A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法
WO2023145488A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法及び電子デバイスの製造方法
JP7373070B2 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法
WO2023017702A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法
WO2022220189A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法
WO2023017703A1 (ja) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法
WO2019044547A1 (ja) 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22855766

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2023541376

Country of ref document: JP

ENP Entry into the national phase

Ref document number: 20247004350

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 1020247004350

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 22855766

Country of ref document: EP

Kind code of ref document: A1