WO2022261998A1

WO2022261998A1 - Ultra-smooth planarization polishing method and apparatus

Info

Publication number: WO2022261998A1
Application number: PCT/CN2021/101915
Authority: WO
Inventors: 潘继生; 阎秋生; 蔡志航; 洪志清; 陈海阳; 梁智镔
Original assignee: 广东工业大学; 广东纳诺格莱科技有限公司
Priority date: 2021-06-17
Filing date: 2021-06-23
Publication date: 2022-12-22
Also published as: CN113305650A; CN113305650B

Abstract

The present invention relates to an ultra-smooth planarization polishing method and apparatus. The apparatus comprises a base, a Z-axis driving mechanism, a revolution driving mechanism, an autorotation driving mechanism, a dynamic magnetic field generating mechanism, a deflection driving mechanism, and a polishing disc used for containing a magnetorheological fluid. The Z-axis driving mechanism is mounted on the base; an output end of the Z-axis driving mechanism is connected to the revolution driving mechanism; an output end of the revolution driving mechanism is connected to the autorotation driving mechanism; a clamping disc used for clamping a workpiece is provided at an output end of the autorotation driving mechanism; the polishing disc is fixed on the base and is located below the revolution driving mechanism and the autorotation driving mechanism; the dynamic magnetic field generating mechanism is provided below the polishing disc, and a dynamic magnetic field is formed in the polishing disc; the deflection driving mechanism is mounted on the base; and the dynamic magnetic field generating mechanism is connected to an output end of the deflection driving mechanism. The present invention effectively avoids the problem that a machining effect difference exists between the center and edge of a workpiece due to the fact that a linear speed zero point exists at the center of the workpiece.

Description

An ultra-smooth planarization polishing method and device

technical field

The invention belongs to the technical field of ultra-precision machining, and more specifically relates to an ultra-smooth planarization polishing method and device.

Background technique

With the rapid development of science and technology and information technology in today's society, the semiconductor industry has been continuously promoted, and the semiconductor industry has become an important driving force for the economic development of various countries. With the development of next-generation information technologies such as 5G communications, cloud computing, and artificial intelligence, the demand for semiconductor components is increasing year by year, which requires efficient processing of ultra-smooth and non-damaging semiconductor wafers with surface roughness reaching the nanometer level to meet market demand. Taking the LED epitaxial sapphire substrate as an example, it is generally required that the total thickness deviation is less than 10 μm, and the surface roughness should be less than 0.3nm. Therefore, planarization processing has become an indispensable process for semiconductor substrates, and its processing quality and precision directly determine the performance of semiconductor devices.

Magnetorheological polishing technology is a new type of optical surface processing method proposed by Kordonski W.I. and his collaborators in the 1990s based on the magnetorheological effect. The "flexible polishing film" with low fluidity removes a small amount of material on the surface of the workpiece, which has the advantages that traditional polishing does not have, such as no sub-surface damage and suitable for curved surface processing, and has broad application prospects.

In order to improve the polishing efficiency of magnetorheology, the Chinese patent CN200610132495.9 proposes a grinding and polishing method and polishing device based on magnetorheological effect, but the magnetorheological effect polishing pad formed by the static magnetic field lacks self-dressing and abrasive renewal. The sharp mechanism, the viscoelasticity of the magnetorheological fluid under the action of the magnetic field makes the polishing pad formed by the static magnetic field force and distort the surface of the workpiece after processing, making it difficult to maintain the stable performance of the processed workpiece.

Aiming at the problem of processing uniformity, Chinese patent CN201510801886.4 proposes a dynamic magnetic field self-sharpening polishing device and polishing method for a magnetorheological flexible polishing pad. The dynamic movement of the magnetic poles is realized through a multi-magnetic pole synchronous rotation drive mechanism, making flexible polishing The pad can maintain a constant polishing pressure on the workpiece for a long time, but the movement of each magnetic pole of the device is driven by an independent shaft, so that the magnetic poles cannot be densely arranged under the polishing area, resulting in low processing efficiency.

In order to increase the magnetic pole density and improve the processing efficiency, the Chinese patent CN201710662467.6 proposes a magneto-rheological plane polishing device. The workpiece rotates through the polishing disc and the workpiece rotates to generate relative motion. However, because the polishing disc speed is limited by centrifugal force, polishing requires Higher workpiece rotation speed can achieve high-efficiency machining, which makes the center of the workpiece have a relative linear velocity zero point and uneven distribution of linear velocity during workpiece polishing, which will lead to differences in the effect of the central area and the edge area of the workpiece after processing. At the same time, the device generates the required magnetic field for polishing by placing a magnetic field generator under the polishing area, but the rotation of the magnetic field generator and the rotation of the polishing disc make the relative motion between the two larger, so that the flexible polishing pad does not Stable, but also easy to cause wear on the surface of the polishing disc.

Contents of the invention

In order to overcome at least one defect in the above-mentioned prior art, the present invention provides an ultra-smooth and planarized polishing method and device, which can effectively avoid the problem that there is a linear velocity zero point at the center of the workpiece, resulting in a difference in processing effect between the center and the edge of the workpiece.

In order to solve the above-mentioned technical problems, the technical solution adopted in the present invention is: an ultra-smooth planarization polishing method, comprising the following steps:

Set up a dynamic magnetic field generating mechanism, select the appropriate diameter of the magnetic poles and the arrangement of the magnetic poles according to the structure of the workpiece to be processed, and install the magnetic poles on the magnet installation eccentric disk on the dynamic magnetic field generating mechanism through a plurality of magnetic pole disks according to the selected law;

Configure magnetorheological polishing fluid, and add the configured magnetorheological polishing fluid to the polishing disc;

A yaw driving mechanism for driving the dynamic magnetic field generating mechanism to generate deflection motion and a yaw auxiliary mechanism for limiting the rotational movement of the eccentric disk on which the magnet is installed are provided. With the cooperation of the yaw auxiliary mechanism, the eccentric disk mounted on the magnet performs regular yaw without overall rotation, and the eccentric disk mounted on the magnet moves regularly to generate a dynamic magnetic field in the polishing disk;

Set up a revolution drive mechanism and an autorotation drive mechanism, the revolution drive mechanism is connected with the autorotation drive mechanism, and drives the autorotation drive mechanism to undergo revolution movement; the workpiece to be processed is installed on the autorotation drive mechanism, and the revolution drive mechanism and the autorotation drive mechanism drive the workpiece to perform revolution at the same time Movement and rotation movement;

The Z-axis drive mechanism is set, and the Z-axis drive mechanism is connected with the revolution drive mechanism to drive the revolution drive mechanism to move up and down along the Z-axis; adjust the distance between the workpiece and the polishing disc, so that the workpiece contacts the polishing pad formed in the polishing disc and reaches The processing gap can realize the uniform polishing of the surface of the workpiece to be processed.

The present invention also provides an ultra-smooth and flattening polishing device, which includes a base, a Z-axis drive mechanism for driving the workpiece to move up and down, a revolution drive mechanism for driving the workpiece to perform a revolution movement, and an autorotation mechanism for driving the workpiece to perform an autorotation movement. A driving mechanism, a moving magnetic field generating mechanism, a yaw driving mechanism for driving the moving magnetic field generating mechanism to deflect, and a polishing disc for containing magnetorheological fluid; the Z-axis driving mechanism is installed on the base, Z The output end of the shaft drive mechanism is connected to the revolution drive mechanism, the output end of the revolution drive mechanism is connected to the rotation drive mechanism, and the output end of the rotation drive mechanism is provided with a clamping disc for clamping the workpiece; The polishing disc is fixed on the base, and is located under the revolution drive mechanism and the rotation drive mechanism; the dynamic magnetic field generating mechanism is arranged under the polishing disc, and forms a dynamic magnetic field in the polishing disc; the yaw drive mechanism Installed on the base, the moving magnetic field generating mechanism is connected with the output end of the yaw driving mechanism.

In one of the embodiments, the revolving drive mechanism includes a revolving installation box, a revolving motor, a revolving small pulley, a revolving synchronous belt, a revolving large pulley, and a revolving main shaft; the revolving installation box and the Z-axis The output end of the drive mechanism is connected; the revolving motor is installed on the top of the revolving installation box, the revolving small pulley is connected to the output shaft of the revolving motor, and the revolving main shaft is arranged along the Z-axis direction and is rotatable Installed in the revolution installation box, one end of the revolution main shaft is fixedly connected with the revolution large pulley, and the other end is an output end for connecting with the rotation drive mechanism; the revolution synchronous belt surrounds the revolution small pulley and the revolution Large pulley perimeter.

In one of the embodiments, the autorotation drive mechanism includes an autorotation installation box, an autorotation motor, a small autorotation pulley, an autorotation synchronous belt, a large autorotation pulley, and an autorotation main shaft; The main shaft is fixedly connected, the autorotation motor is installed in the autorotation installation box, and the output shaft of the autorotation motor is connected with the small rotation pulley; the autorotation main shaft is arranged along the Z-axis direction and is rotatably installed in the autorotation installation box; One end of the self-rotation main shaft is fixedly connected with the large self-rotation pulley, and the other end is fixedly connected with the chucking disc; the self-rotation synchronous belt surrounds the outer periphery of the small self-rotation pulley and the large self-rotation pulley.

In one of the embodiments, the revolving main shaft is a hollow structure; the revolving main shaft is rotatably connected with the revolving installation box through an angular contact ball bearing; connect.

In one of the embodiments, the Z-axis drive mechanism includes a Z-axis motor, a Z-axis small pulley, a Z-axis timing belt, a Z-axis large pulley, a Z-axis screw, a screw seat, and an upper ball screw support seat and the lower ball screw support seat; the Z-axis motor is installed on the base, and the Z-axis small pulley is connected with the output shaft of the Z-axis motor; the Z-axis screw is arranged along the Z-axis direction , one end is rotatably connected to the base through the upper ball screw support seat, and the other end is rotatably connected to the base through the lower ball screw support seat; the Z-axis large pulley is fixedly connected to one end of the Z-axis screw rod, and the The Z-axis timing belt surrounds the outer circumference of the Z-axis small pulley and the Z-axis large pulley; the screw seat is rotatably set on the Z-axis screw, and the revolution installation box is fixedly connected with the screw seat .

In one of the embodiments, it also includes a balance cylinder, guide rails are provided along the Z-axis direction on both sides of the revolving installation box, and a guide rail pressing plate is provided along the Z-axis direction on the base, and the guide rails and the guide rails The pressure plate is slidingly connected; the balance cylinder is arranged along the Z-axis direction, the balance cylinder is fixed on the base, and the piston rod of the balance cylinder is fixedly connected to the top of the revolving installation box through the connection plate.

In one of the embodiments, the yaw drive mechanism includes a yaw motor, a small yaw pulley, a yaw synchronous belt, a large yaw pulley, and an eccentric main shaft; the yaw motor is installed on the base , the output shaft of the yaw motor is connected to the small yaw pulley, the eccentric main shaft is arranged along the Z-axis direction, and is rotationally connected to the base through angular contact ball bearings, and the bottom end of the eccentric main shaft is connected to the large yaw pulley, The end with eccentricity on the top is connected with the dynamic magnetic field generating mechanism, and the eccentric rotation of the eccentric main shaft drives the dynamic magnetic field generating mechanism to rotate eccentrically; the yaw synchronous belt wraps around the outer periphery of the small yaw pulley and the large yaw pulley.

In one of the embodiments, the moving magnetic field generating mechanism includes a magnet mounting eccentric disk, a plurality of magnetic pole disks, magnetic poles, and a yaw auxiliary small shaft for limiting the rotation of the magnet mounting eccentric disk; the magnet mounting eccentric A first mounting hole is provided at the center of the disk bottom, and one end of the eccentric spindle with eccentric moment is installed in the first mounting hole through an angular contact ball bearing; the magnet mounting eccentric disk is located below the polishing disk , the magnetic pole disc is installed on the top of the eccentric disc for magnet installation, and the magnetic pole rule is installed in the magnetic pole disc; along the circumference of the first installation hole, a plurality of eccentric auxiliary discs are arranged at intervals, and the eccentric auxiliary disc is provided with There is a second installation hole; one end of the yaw auxiliary small shaft is fixed on the base, and the other end is sleeved with an angular contact ball bearing, which is located in the second installation hole; and the yaw auxiliary small shaft is connected to the second installation The central axis of the hole has an eccentricity.

In one of the embodiments, the moving magnetic field generating mechanism includes a magnet mounting eccentric disk, a plurality of magnetic pole disks, magnetic poles, and an eccentric auxiliary shaft with an eccentricity for limiting the rotation of the magnet mounting eccentric disk; The shaft center of the bottom of the magnet installation eccentric disc is provided with a mounting through hole, and the support block at the bottom of the polishing disc is provided with a third mounting hole. One end of the eccentric main shaft with eccentric moment passes through the mounting through hole and the third mounting hole. The holes are rotationally connected by angular contact ball bearings, and the eccentric main shaft located in the installation through hole is also rotationally connected with the installation through hole by tapered roller bearings; the magnet installation eccentric disc is located below the polishing disc, and the magnetic pole disc is installed The magnet is installed on the top of the eccentric disk, and the magnetic poles are regularly installed in the magnetic pole disk; a plurality of fourth installation holes are arranged at intervals around the circumference of the installation through hole; The hole position corresponds to the fifth mounting hole; one end of the eccentric auxiliary shaft is rotationally connected to the fifth mounting hole through an angular contact ball bearing, and the other end is rotationally connected to the fourth mounting hole through an angular contact ball bearing.

In one of the embodiments, the eccentricity between the yaw auxiliary small shaft and the second mounting hole is the same as the eccentricity of the eccentric main shaft; the eccentricity of the eccentric auxiliary shaft is the same as the eccentricity of the eccentric main shaft; The magnetic pole disks have a fan-shaped structure, and a plurality of magnetic pole disks are spaced apart from each other to form a circular arrangement in the eccentric disk for magnet installation; magnetic poles are arranged in each magnetic pole disk, and the arrangement of the magnets in each magnetic pole disk is the same.

Compared with the prior art, the beneficial effect is:

1. A kind of ultra-smooth and flattening polishing device and polishing method provided by the present invention adopts the polishing method in which the polishing disc is stationary while the workpiece is simultaneously orbited and rotated along the polishing area, so as to avoid the possibility that the polishing liquid in the polishing disc is easily thrown out. The problem, on the other hand, can improve the unevenness of the linear velocity on the surface of the workpiece by increasing the speed at which the workpiece revolves along the polishing area, and solve the problem that there is a zero point of the relative linear velocity at the center of the workpiece. At the same time, because the polishing disc is still, the precision of the polishing disc and the stability of the magnetorheological flexible polishing pad are guaranteed during the polishing process of large-sized workpieces.

2. An ultra-smooth and flattening polishing device provided by the present invention drives the dynamic magnetic field generating mechanism to move through the yaw generating mechanism to generate a dynamic magnetic field. At the same time, by setting the eccentric auxiliary shaft or the yaw auxiliary small shaft, the magnet is installed with an eccentric disk Only do regular yaw motion without overall rotation, so that the shape of the flexible polishing pad is continuously restored; at the same time, the yaw motion makes the magnetic poles only perform small regular motions, so that the processing performance of the magneto-rheological flexible polishing pad can be maintained. At the same time, the wear on the surface of the polishing disc is minimized; in addition, the magnetic poles are mounted on the eccentric disc through the magnet to perform the overall yaw movement, so the magnetic poles can be densely arranged under the polishing disc, resulting in more intensive and better processing performance. Pad, improve processing efficiency.

Description of drawings

FIG. 1 is a structural schematic view of the overall structure of the present invention at a first viewing angle.

Fig. 2 is a structural schematic diagram of the second viewing angle of the overall structure of the present invention.

FIG. 3 is a structural schematic diagram of the dynamic magnetic field generating mechanism and the yaw driving mechanism of the present invention.

Fig. 4 is another structural schematic diagram of the dynamic magnetic field generating mechanism and the yaw driving mechanism of the present invention.

Fig. 5 is a partially enlarged schematic diagram of A in Fig. 3 of the present invention.

Fig. 6 is a partially enlarged schematic diagram of B in Fig. 4 of the present invention.

Fig. 7 is a schematic diagram of the structure of the magnetic pole arrangement in the present invention.

Fig. 8 is a schematic diagram of the yaw movement of the dynamic magnetic field generating mechanism of the present invention.

Reference signs: 1, base; 11, guide rail pressure plate; 2, Z-axis drive mechanism; 21, Z-axis motor; 22, Z-axis small pulley; 23, Z-axis timing belt; 24, Z-axis large pulley; 25. Z-axis screw; 26. Screw seat; 27. Upper ball screw support seat; 28. Lower ball screw support seat; 3. Revolving drive mechanism; 31. Revolving installation box; 32. Revolving motor; 33 , small revolution pulley; 34, revolution synchronous belt; 35, large revolution pulley; 36, revolution main shaft; 37, guide rail; 4, rotation drive mechanism; 41, rotation installation box; 42, rotation motor; 43, rotation small Pulley; 44. Self-rotating synchronous belt; 45. Large self-rotating pulley; 46. Self-rotating main shaft; 47. Clamping disc; 5. Dynamic magnetic field generating mechanism; 51. Magnet mounting eccentric disc; 52. Magnetic pole disc; Auxiliary small shaft; 54, eccentric auxiliary disc; 55, eccentric auxiliary shaft; 56, magnetic pole; 6, yaw driving mechanism; 61, yaw motor; 62, yaw small pulley; 63, yaw synchronous belt; 64, 65. Eccentric main shaft; 66. Shaft sleeve; 7. Polishing disc; 71. Support block; 8. Angular contact ball bearing; 9. Tapered roller bearing.

detailed description

The accompanying drawings are for illustrative purposes only, and should not be construed as limiting the present invention; in order to better illustrate this embodiment, certain components in the accompanying drawings will be omitted, enlarged or reduced, and do not represent the size of the actual product; for those skilled in the art It is understandable that some well-known structures and descriptions thereof may be omitted in the drawings. The positional relationship described in the drawings is for illustrative purposes only, and should not be construed as limiting the present invention.

As shown in Figures 1 to 8, an ultra-smooth and flattening polishing device includes a base 1, a Z-axis drive mechanism 2 for driving the workpiece to move up and down, a revolution drive mechanism 3 for driving the workpiece to perform revolution motion, and An autorotation drive mechanism 4 for driving the workpiece to rotate, a dynamic magnetic field generator 5, a yaw drive mechanism 6 for driving the dynamic magnetic field generator 5 to deflect, and a polishing disc 7 for containing magnetorheological fluid; Z The shaft drive mechanism 2 is installed on the base 1, the output end of the Z-axis drive mechanism 2 is connected with the revolution drive mechanism 3, the output end of the revolution drive mechanism 3 is connected with the rotation drive mechanism 4, and the output end of the rotation drive mechanism 4 is provided with a The clamping disc 47 for clamping the workpiece; the polishing disc 7 is fixed on the base 1, and is located below the revolution drive mechanism 3 and the rotation drive mechanism 4; the dynamic magnetic field generating mechanism 5 is arranged under the polishing disc 7, and A dynamic magnetic field is formed in 7; the yaw driving mechanism 6 is installed on the base 1, and the dynamic magnetic field generating mechanism 5 is connected to the output end of the yaw driving mechanism 6. In the present invention, the polishing disk 7 is fixed on the base 1, and the dynamic magnetic field generating mechanism 5 is driven by the yaw driving mechanism 6 to perform regular motion to form a dynamic magnetic field in the polishing disk 7, which avoids the movement of the polishing disk 7 in the prior art The problem that the polishing liquid is easily thrown out also ensures the accuracy of the polishing disc 7 and the stability of the magnetorheological flexible polishing pad when large-scale workpieces are processed; in addition, the workpiece is driven by the revolution drive mechanism 3 and the rotation drive mechanism 4 Simultaneous revolution and rotation can improve the uneven distribution of linear velocity on the surface of the workpiece and the zero point of linear velocity at the center of the workpiece by increasing the revolution speed of the workpiece along the polishing area, avoiding the problem of machining accuracy differences between the center and edge of the workpiece ; The Z-axis drive mechanism 2 is used to adjust the distance between the workpiece and the polishing disc 7, so as to select an appropriate distance value to ensure that the workpiece and the polishing pad are in contact with each other to reach the processing gap.

In one of the embodiments, as shown in Figure 1 and Figure 2, the revolution driving mechanism 3 includes a revolution installation box 31, a revolution motor 32, a revolution small pulley 33, a revolution synchronous belt 34, a revolution large pulley 35, and a revolution Main shaft 36; Revolving installation box 31 is connected with the output end of Z-axis drive mechanism 2; The direction of the Z axis is arranged and rotatably installed in the revolution installation box 31. One end of the revolution main shaft 36 is fixedly connected with the revolution belt pulley 35, and the other end is an output end for connecting with the rotation drive mechanism 4; the revolution synchronous belt 34 It surrounds the outer periphery of the small revolving pulley 33 and the large revolving pulley 35 . The revolving motor 32 is started, the small revolving pulley 33 rotates, and the revolving large pulley 35 and the revolving main shaft 36 are driven to rotate through the revolving synchronous belt 34, and the revolving main shaft 36 is connected with the rotation drive mechanism 4, thereby driving the rotation drive mechanism 4 and the workpiece to revolve together sports.

In one of the embodiments, as shown in Figures 1 and 2, the autorotation drive mechanism 4 includes an autorotation installation box 41, an autorotation motor 42, a small autorotation pulley 43, an autorotation timing belt 44, a large autorotation pulley 45, and an autorotation main shaft 46; the top of the rotation installation box 41 is fixedly connected with the revolution main shaft 36, the rotation motor 42 is installed in the rotation installation box 41, the output shaft of the rotation motor 42 is connected with the rotation small pulley 43; the rotation main shaft 46 is arranged along the Z-axis direction , and rotatably installed in the rotation installation box 41; one end of the rotation main shaft 46 is fixedly connected with the large rotation pulley 45, and the other end is fixedly connected with the chucking disc 47; the rotation timing belt 44 surrounds the rotation small pulley 43 and the rotation Big pulley 45 peripheries. The rotation motor 42 starts, drives the rotation small pulley 43 motions, drives the rotation large pulley 45 and the rotation main shaft 46 to rotate by the rotation synchronous belt 44, and the chucking disc 47 is connected with the rotation main shaft 46, thereby realizes workpiece rotation. In order to improve processing efficiency, a plurality of autorotation motors 42, autorotation small pulleys 43, autorotation timing belts 44, autorotation large pulleys 45, autorotation main shafts 46 and chucking discs 47 can be set in the autorotation installation box body 41; A plurality of clamping disks 47 are formed to undergo autorotation, so that multiple workpieces can be processed at the same time, and work efficiency is improved.

In some embodiments, the revolving main shaft 36 is a hollow structure to facilitate the connection between the rotation motor 42 and the electric slip ring; the revolving main shaft 36 is rotatably connected to the revolving installation box 31 through an angular contact ball bearing 8; the revolving main shaft 46 is connected through an angular contact ball bearing 8 is rotationally connected with the rotation installation casing 41.

In another embodiment, as shown in Figures 1 and 2, the Z-axis driving mechanism 2 includes a Z-axis motor 21, a Z-axis small pulley 22, a Z-axis timing belt 23, a Z-axis large pulley 24, a Z-axis wire Rod 25, screw seat 26, upper ball screw support seat 27 and lower ball screw support seat 28; Z-axis motor 21 is installed on the base 1, Z-axis small pulley 22 is connected with the output shaft of Z-axis motor 21 ; The Z-axis screw rod 25 is arranged along the Z-axis direction, one end is rotationally connected with the base 1 through the upper ball screw support seat 27, and the other end is rotationally connected with the base 1 through the lower ball screw support seat 28; the Z-axis large pulley 24 is fixedly connected to one end of the Z-axis screw rod 25, and the Z-axis timing belt 23 surrounds the outer circumference of the Z-axis small pulley 22 and the Z-axis large pulley 24; The revolving installation box 31 is fixedly connected with the screw seat 26 . The Z-axis motor 21 starts, drives the Z-axis small pulley 22 to rotate, drives the Z-axis large pulley 24 and the Z-axis screw 25 to rotate through the Z-axis timing belt 23, and the screw seat 26 is connected with the revolution installation box 31, and the Z-axis The screw mandrel 25 rotates to drive the screw mandrel base 26 to rotate, but due to the limitation of the base 1, the screw mandrel base 26 and the revolving installation box 31 cannot rotate with the Z-axis screw mandrel 25, so that the screw mandrel base 26 can move along the Z axis. The shaft screw mandrel 25 moves up and down.

In some embodiments, as shown in FIG. 2 , a balance cylinder is also included, and guide rails 37 are provided along the Z-axis direction on both sides of the revolving installation box 31 , and a guide rail pressing plate 11 is provided on the base 1 along the Z-axis direction. The guide rail 37 is slidingly connected with the guide rail pressing plate 11; the balance cylinder is arranged along the Z-axis direction, the balance cylinder is fixed on the base 1, and the piston rod of the balance cylinder is fixedly connected with the top of the revolving installation box 31 through a connecting plate. Setting the balance cylinder can improve the stability of the device and reduce the vibration of the revolving installation box 31 during work.

In one of the embodiments, as shown in FIGS. 1 to 4 , the yaw driving mechanism 6 includes a yaw motor 61 , a small yaw pulley 62 , a yaw synchronous belt 63 , a large yaw pulley 64 and an eccentric main shaft 65 The yaw motor 61 is installed on the base 1, the output shaft of the yaw motor 61 is connected with the yaw small pulley 62, the eccentric main shaft 65 is arranged along the Z-axis direction, and is rotationally connected with the base 1 through the angular contact ball bearing 8 , one end of the bottom of the eccentric main shaft 65 is connected with the large yaw pulley 64, and one end with the eccentric distance at the top is connected with the dynamic magnetic field generating mechanism 5, and the eccentric rotation of the eccentric main shaft 65 drives the dynamic magnetic field generating mechanism 5 to rotate eccentrically; the yaw synchronous belt 63 surrounds the outer periphery of the yaw small pulley 62 and the yaw large pulley 64. The yaw motor 61 is started to drive the yaw small pulley 62 to rotate, and the yaw synchronous belt 63 drives the yaw large pulley 64 and the eccentric main shaft 65 to rotate, and the eccentric main shaft 65 is connected with the dynamic magnetic field generating mechanism 5 to drive the dynamic magnetic field to generate Mechanism 5 moves and produces dynamic magnetic field; Due to the end that eccentric main shaft 65 is connected with dynamic magnetic field generating mechanism 5, there is an eccentric distance, that is, eccentric main shaft 65 is divided into two sections, and two sections are arranged on different axes, and have eccentric distance; When the main shaft 65 rotates, it can drive the dynamic magnetic field generating mechanism 5 to perform eccentric rotation.

In one of the embodiments, as shown in Fig. 1, Fig. 2, Fig. 3, Fig. 5 and Fig. 7, the dynamic magnetic field generating mechanism 5 includes a magnet mounting eccentric disc 51, a plurality of magnetic pole discs 52, magnetic poles 56, and a The eccentric disc 51 is installed with a magnet to rotate the yaw auxiliary small shaft 53; the shaft center at the bottom of the eccentric disc 51 is provided with a first installation hole, and the end with the eccentric moment of the eccentric main shaft 65 is rotated and installed on the In the first installation hole; the magnet installation eccentric disk 51 is positioned at the below of the polishing disc 7, and the magnetic pole disk 52 is installed on the magnet installation eccentric disk 51 top, as shown in Figure 7, the magnetic pole 56 law is installed in the magnetic pole disk 52; Along the first A plurality of eccentric auxiliary disks 54 are provided at circumferential intervals around the installation hole, and a second installation hole is provided in the eccentric auxiliary disk 54; one end of the yaw auxiliary small shaft 53 is fixed on the base 1, and the other end is sleeved with a corner It is in contact with the ball bearing 8 and is located in the second mounting hole; and there is an eccentricity between the yaw auxiliary small shaft 53 and the central axis of the second mounting hole. The eccentric disc 51 mounted on the magnet is connected to the eccentric main shaft 65, which is driven to rotate eccentrically by the eccentric main shaft 65, and due to the setting of the yaw auxiliary small shaft 53, the rotational movement of the eccentric disc 51 mounted on the magnet is limited, and only regular yaw movement, as shown in Figure 5. The angular contact ball bearing 8 sleeved on the yaw auxiliary small shaft 53 can reduce the contact area, reduce friction, and reduce heat generation.

In another embodiment, as shown in FIG. 4 and FIG. 6 , the moving magnetic field generating mechanism 5 includes a magnet mounting eccentric disk 51, a plurality of magnetic pole disks 52, magnetic poles 56, and a mechanism for limiting the rotation of the magnet mounting eccentric disk 51, There is an eccentric auxiliary shaft 55 with an eccentric distance; the shaft center at the bottom of the magnet installation eccentric disc 51 is provided with an installation through hole, and the support block 71 at the bottom of the polishing disc 7 is provided with a third mounting hole, and the eccentric main shaft 65 has an eccentric moment. One end passes through the installation through hole and the third installation hole is rotatably connected through the tapered roller bearing 9, and the eccentric main shaft 65 located in the installation through hole is also rotatably connected with the installation through hole through the angular contact ball bearing 8; the magnet installation eccentric disk 51 is located at Below the polishing disc 7, as shown in Figure 7, the magnetic pole plate 52 is installed on the top of the magnet installation eccentric plate 51, and the magnetic pole 56 is regularly installed in the magnetic pole plate 52; Mounting hole; the base 1 is provided with a fifth mounting hole corresponding to the position of the fourth mounting hole; one end of the eccentric auxiliary shaft 55 is rotationally connected with the fifth mounting hole through an angular contact ball bearing 8, and the other end is through an angular contact ball bearing 8 is rotationally connected with the fourth mounting hole. In this embodiment, the eccentric auxiliary shaft 55 is used to limit the rotation of the magnet mounted eccentric disk 51, which is the same as the working principle of setting the yaw auxiliary small shaft 53 in the above embodiment; in this embodiment, the eccentric auxiliary shaft 55 itself has an eccentricity, The eccentric auxiliary shaft 55 is also divided into two sections, and the two sections are arranged on different axes to form an eccentric distance; and in the above-mentioned embodiment, when the eccentric auxiliary small shaft 53 is installed with the second mounting hole, it is connected with the second mounting hole. There is an eccentricity. Both methods can limit the rotational movement of the eccentric disc 51 on which the magnet is installed; the yaw auxiliary small shaft 53 requires low precision and generates less heat during movement; and the eccentric auxiliary shaft 55 requires high precision, but the load The magnet mounted eccentric disk 51 is more stable. In addition, the edge of the polishing disc 7 is fixed on the base 1, and the support block 71 at the bottom of the polishing disc 7 is not connected with the base 1. The support block 71 is used to be connected with the eccentric main shaft 65 to support the polishing The role of disc 7.

In some embodiments, the eccentricity between the yaw auxiliary small shaft 53 and the second mounting hole is the same as the eccentricity of the eccentric main shaft 65; the eccentricity of the eccentric auxiliary shaft 55 is the same as the eccentricity of the eccentric main shaft 65; as shown in Figure 7 As shown, the magnetic pole disk 52 is a fan-shaped structure, and a plurality of magnetic pole disks 52 are arranged in a circle in the magnet installation eccentric disk 51 at intervals; each magnetic pole disk 52 is provided with a magnetic pole 56, and each magnetic pole disk 52 The arrangement of the magnets is the same.

In another embodiment, the present invention also provides a dynamic magnetic field magneto-rheological ultra-smooth planarization polishing method, using the polishing device described in the above embodiment, comprising the following steps:

The workpiece to be processed is installed in the clamping disc 47, the diameter of the magnetic pole 56 and the arrangement of the magnetic pole 56 are selected according to the structure of the workpiece to be processed, and the magnetic pole 56 is installed on the magnet through a plurality of magnetic pole plates 52 according to the selected rule. Install the eccentric disc 51; in the present embodiment, the workpiece is selected as a single crystal 6H-SiC substrate; select a permanent magnet with a diameter of 30 mm to be evenly arranged below the polishing area, that is, the magnet is installed in the eccentric disc 51;

Configure a magnetorheological fluid with a diamond abrasive particle concentration of 10%, a particle size of 7 microns, and a carbonyl iron powder concentration of 16%; and add the configured magnetorheological polishing fluid to the polishing disc 7;

Start the yaw driving mechanism 6 used to drive the yaw movement of the dynamic magnetic field generating mechanism 5 to drive the eccentric main shaft 65 to rotate at a rotation speed of 10 r/min; The eccentric disk 51 performs regular deflection instead of overall rotation, and the magnet mounts the eccentric disk 51 to move regularly so as to generate a dynamic magnetic field in the polishing disk 7;

Start the revolution drive mechanism 3 and the autorotation drive mechanism 4, and drive the workpiece to perform revolution motion and autorotation motion simultaneously; the revolution speed is 150r/min, and the autorotation speed is 10r/min;

Start the Z-axis driving mechanism 2, adjust the distance between the workpiece and the polishing disc 7, make the workpiece contact with the polishing pad formed in the polishing disc 7 and reach the processing gap, the gap is 0.8mm, and realize the uniform polishing of the surface of the workpiece to be processed.

In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and therefore should not be construed as limitations on the invention.

In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

In the present invention, unless otherwise clearly specified and limited, terms such as "installation", "connection", "connection" and "fixation" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , or integrated; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise specified limit. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.

In the present invention, unless otherwise clearly specified and limited, the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.

In the description of this specification, descriptions with reference to the terms "one embodiment", "some embodiments", "example", "specific examples", or "some examples" mean that specific features described in connection with the embodiment or example , structure, material or characteristic is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics may be combined in any suitable manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine different embodiments or examples and features of different embodiments or examples described in this specification without conflicting with each other.

Although the embodiments of the present invention have been shown and described above, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present invention, those skilled in the art can make the above-mentioned The embodiments are subject to changes, modifications, substitutions and variations.

Apparently, the above-mentioned embodiments of the present invention are only examples for clearly illustrating the present invention, rather than limiting the implementation of the present invention. For those of ordinary skill in the art, other changes or changes in different forms can also be made on the basis of the above description. It is not necessary and impossible to exhaustively list all the implementation manners here. All modifications, equivalent replacements and improvements made within the spirit and principles of the present invention shall be included within the protection scope of the claims of the present invention.

Claims

An ultra-smooth planarization polishing method, is characterized in that, comprises the following steps:

A dynamic magnetic field generating mechanism (5) is set, the diameter of the appropriate magnetic pole (56) and the arrangement rule of the magnetic pole (56) are selected according to the structure of the workpiece to be processed, and the magnetic pole (56) is passed through a plurality of magnetic pole plates (52) according to the selected rule. ) is installed in the magnet installation eccentric disc (51) on the moving magnetic field generating mechanism (5);

Configuring a magnetorheological polishing fluid, and adding the configured magnetorheological polishing fluid to the polishing disc (7);

A yaw driving mechanism (6) for driving the dynamic magnetic field generating mechanism (5) to generate deflection motion and a yaw auxiliary mechanism for limiting the rotational motion of the eccentric disk (51) on which the magnet is installed are provided, and the yaw drive mechanism (6) drives The eccentric main shaft (65) rotates, thereby driving the movement of the eccentric disc (51) mounted on the magnet. With the cooperation of the yaw auxiliary mechanism, the eccentric disc (51) mounted on the magnet performs regular deflection without overall rotation, and the eccentric disc (51) mounted on the magnet (51) Regular movement thereby generates a dynamic magnetic field in the polishing disc (7);

A revolution drive mechanism (3) and an autorotation drive mechanism (4) are provided, and the revolution drive mechanism (3) is connected with the autorotation drive mechanism (4) to drive the autorotation drive mechanism (4) to undergo a revolution motion; the workpiece to be processed is mounted on the autorotation drive mechanism (4) On the upper part, the workpiece is driven by the revolution drive mechanism (3) and the rotation drive mechanism (4) to perform revolution movement and rotation movement at the same time;

A Z-axis drive mechanism (2) is provided, and the Z-axis drive mechanism (2) is connected with the revolution drive mechanism (3), which drives the revolution drive mechanism (3) to move up and down along the Z-axis; adjusts the distance between the workpiece and the polishing disc (7) , make the workpiece contact with the polishing pad formed in the polishing disc (7) and reach the processing gap, so as to realize uniform polishing on the surface of the workpiece to be processed.
An ultra-smooth and planarized polishing device, characterized in that it includes a base (1), a Z-axis drive mechanism (2) for driving the workpiece to move up and down, a revolution drive mechanism (3) for driving the workpiece to perform revolution motion, The autorotation drive mechanism (4) used to drive the workpiece to perform autorotation motion, the dynamic magnetic field generator (5), the yaw drive mechanism (6) used to drive the dynamic magnetic field generator (5) to generate deflection motion, and the A polishing disc (7) of rheological fluid; the Z-axis drive mechanism (2) is installed on the base (1), and the output end of the Z-axis drive mechanism (2) is connected with the revolution drive mechanism (3), and the The output end of the revolution drive mechanism (3) is connected with the rotation drive mechanism (4), and the output end of the described rotation drive mechanism (4) is provided with a clamping disc (47) for clamping workpieces; (7) fixed on the base (1), and located below the revolution drive mechanism (3) and the rotation drive mechanism (4); the dynamic magnetic field generating mechanism (5) is located below the polishing disc (7), And a dynamic magnetic field is formed in the polishing disc (7); the described yaw driving mechanism (6) is installed on the base (1), and the dynamic magnetic field generating mechanism (5) and the yaw driving mechanism (6) output connection.
The ultra-smooth and flattening polishing device according to claim 2, characterized in that, the revolution drive mechanism (3) comprises a revolution installation box (31), a revolution motor (32), a revolution small pulley (33), Revolving synchronous belt (34), revolving pulley (35), and revolving main shaft (36); described revolving installation box (31) is connected with the output end of Z-axis driving mechanism (2); described revolving motor (32) installed on the top of the revolving installation box (31), the revolving small pulley (33) is connected with the output shaft of the revolving motor (32), and the revolving main shaft (36) is arranged on the Z axis along the In the revolution installation box (31), the angular contact ball bearing (8) is rotationally connected with the revolution installation box (31); one end of the revolution main shaft (36) is fixedly connected with the revolution belt pulley (35), and the other One end is an output end for connecting with the rotation drive mechanism (4); the revolving synchronous belt (34) wraps around the outer circumference of the small revolving pulley (33) and the large revolving pulley (35).
The ultra-smooth and flattening polishing device according to claim 3, characterized in that, the rotation drive mechanism (4) includes a rotation installation box (41), a rotation motor (42), a small rotation pulley (43), Rotation synchronous belt (44), rotation pulley (45), rotation main shaft (46) and clamping disc (47); The top of described rotation installation box (41) is fixedly connected with revolution main shaft (36), so The autorotation motor (42) described above is installed in the autorotation installation box (41), and the output shaft of the autorotation motor (42) is connected with the small rotation pulley (43); the described autorotation main shaft (46) is arranged on the In the rotation installation box (41), the angular contact ball bearing (8) is rotationally connected with the rotation installation box (41); one end of the rotation main shaft (46) is fixedly connected with the rotation large pulley (45), and the other One end is fixedly connected with the chucking disc (47); the described self-rotation timing belt (44) surrounds the outer periphery of the small self-rotation pulley (43) and the large self-rotation pulley (45).
The ultra-smooth and flattening polishing device according to claim 4, wherein the Z-axis driving mechanism (2) comprises a Z-axis motor (21), a Z-axis small pulley (22), a Z-axis timing belt ( 23), Z-axis large pulley (24), Z-axis screw (25), screw seat (26), upper ball screw support seat (27) and lower ball screw support seat (28); the described The Z-axis motor (21) is installed on the base (1), and the Z-axis small pulley (22) is connected with the output shaft of the Z-axis motor (21); The axial direction is set, one end is rotationally connected with the base (1) through the upper ball screw support seat (27), and the other end is rotationally connected with the base (1) through the lower ball screw support seat (28); the Z axis The large pulley (24) is fixedly connected to one end of the Z-axis screw rod (25), and the Z-axis timing belt (23) is wrapped around the outer circumference of the Z-axis small pulley (22) and the Z-axis large pulley (24) ; The screw base (26) is rotatably set on the Z-axis screw (25), and the revolution installation box (31) is fixedly connected with the screw base (26).
The ultra-smooth and flattening polishing device according to claim 5, further comprising a balance cylinder, guide rails (37) are arranged along the Z-axis direction on both sides of the revolving installation box (31), and on the base The seat (1) is provided with a guide rail pressure plate (11) along the Z-axis direction, and the guide rail (37) is slidingly connected with the guide rail pressure plate (11); the balance cylinder is arranged along the Z-axis direction, and the balance cylinder is fixed on the base (1), the piston rod of the balance cylinder is fixedly connected with the top of the revolution installation box (31) through a connecting plate.
The ultra-smooth and flattening polishing device according to claim 2, characterized in that, the yaw driving mechanism (6) comprises a yaw motor (61), a yaw small pulley (62), a yaw synchronous belt ( 63), the yaw large pulley (64) and the eccentric main shaft (65); the yaw motor (61) is installed on the base (1), and the output shaft of the yaw motor (61) and the yaw small belt The wheel (62) is connected, the eccentric main shaft (65) is arranged along the Z-axis direction, and is rotationally connected with the base (1) through the angular contact ball bearing (8), and the bottom end of the eccentric main shaft (65) is connected to the The wheel (64) is connected, and one end with an eccentricity on the top is connected with the dynamic magnetic field generating mechanism (5), and the eccentric rotation of the eccentric main shaft (65) drives the dynamic magnetic field generating mechanism (5) to rotate eccentrically; the yaw is synchronized The belt (63) surrounds the outer circumference of the yaw small pulley (62) and the yaw large pulley (64).
The ultra-smooth and flattening polishing device according to claim 7, wherein the moving magnetic field generating mechanism (5) includes a magnet mounting eccentric disk (51), a plurality of magnetic pole disks (52), magnetic poles (56), And the yaw auxiliary small shaft (53) used to limit the rotation of the eccentric disc (51) where the magnet is installed; (65) is provided with an end of eccentric moment by angular contact ball bearing (8) and is rotated in the first installation hole; Described magnet installation eccentric disc (51) is positioned at the below of polishing disc (7), and described magnetic pole The disk (52) is mounted on the top of the magnet mounting eccentric disk (51), and the magnetic poles (56) are regularly installed in the magnetic pole disk (52); a plurality of eccentric auxiliary disks are arranged at intervals along the circumference of the first mounting hole (54), a second mounting hole is provided in the eccentric auxiliary disc (54); one end of the yaw auxiliary small shaft (53) is fixed on the base (1), and the other end is sleeved with an angular contact ball bearing (8), and is located in the second mounting hole; and there is an eccentricity between the yaw auxiliary small shaft (53) and the central axis of the second mounting hole.
The ultra-smooth and flattening polishing device according to claim 7, wherein the moving magnetic field generating mechanism (5) includes a magnet mounting eccentric disk (51), a plurality of magnetic pole disks (52), magnetic poles (56), and an eccentric auxiliary shaft (55) with an eccentricity that is used to limit the rotation of the eccentric disc (51) where the magnet is installed; the shaft center at the bottom of the magnet-installed eccentric disc (51) is provided with a through hole for installation, and the polishing disc (7) The support block (71) at the bottom is provided with a third installation hole, and one end of the eccentric main shaft (65) provided with the eccentric moment passes through the installation through hole and the third installation hole through the tapered roller bearing (9 ) is rotationally connected, and the eccentric main shaft (65) located in the installation through hole is also rotationally connected with the installation through hole through an angular contact ball bearing (8); the magnet installation eccentric disc (51) is located under the polishing disc (7) , the magnetic pole disc (52) is installed on the top of the magnet installation eccentric disc (51), and the magnetic pole (56) is regularly installed in the magnetic pole disc (52); a fourth mounting hole; the base (1) is provided with a fifth mounting hole corresponding to the position of the fourth mounting hole; one end of the eccentric auxiliary shaft (55) passes through the angular contact ball bearing (8) It is rotatably connected with the fifth mounting hole, and the other end is rotatably connected with the fourth mounting hole through an angular contact ball bearing (8).
The ultra-smooth and flattening polishing device according to claim 8 or 9, characterized in that, the eccentricity between the yaw auxiliary small shaft (53) and the second mounting hole and the eccentricity of the eccentric main shaft (65) The same; the eccentricity of the eccentric auxiliary shaft (55) is the same as the eccentricity of the eccentric main shaft (65); the magnetic pole disk (52) is a fan-shaped structure, and a plurality of magnetic pole disks (52) are mutually spaced to form a circle Arranged in the eccentric disk (51) where the magnets are installed; magnetic poles (56) are arranged in each magnetic pole disk (52), and the arrangement rules of the magnets in each magnetic pole disk (52) are the same.