WO2022260658A1 - Film antireflet et anti-éblouissement et procédé de fabrication d'un film antireflet et antireflet - Google Patents

Film antireflet et anti-éblouissement et procédé de fabrication d'un film antireflet et antireflet Download PDF

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Publication number
WO2022260658A1
WO2022260658A1 PCT/US2021/036444 US2021036444W WO2022260658A1 WO 2022260658 A1 WO2022260658 A1 WO 2022260658A1 US 2021036444 W US2021036444 W US 2021036444W WO 2022260658 A1 WO2022260658 A1 WO 2022260658A1
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WIPO (PCT)
Prior art keywords
layer
reflective
organic particles
protruding
glare
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PCT/US2021/036444
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English (en)
Inventor
Shaopeng ZHU
Rong Wu
Wei Zhang
Oliver Chen
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Applied Materials, Inc.
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Priority to PCT/US2021/036444 priority Critical patent/WO2022260658A1/fr
Publication of WO2022260658A1 publication Critical patent/WO2022260658A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Definitions

  • Embodiments of the present disclosure relate to an anti-reflective and anti-glare film and a method for manufacturing an anti-reflective and anti-glare film.
  • BACKGROUND ART [0002]
  • displays have become omnipresent in our lives, showing up in a wide array of unlikely places – from refrigerators to windshields to helmets. Displays now enhance our lives by helping us plan, experience, monitor, organize, and create in all kinds of new ways. Accordingly, the use of displays in different applications has been increased considerably.
  • the anti-reflective layers permit a contour of the lighting apparatus to become visible, so the visibility of the display lowers in that regard. Further, the application of such anti-reflective layers is expensive and technically difficult and needs a high control of the thickness uniformity of the layers of the anti-reflective layers. On the other hand, when an anti-glare layer is used, the diffused reflected light causes the reflecting portion to appear white and cause degradation of the visibility of the display. Further, the application of an anti-glare layer on a film pertaining to the displays results in a poor anti-reflective performance. [0007] In view of the above, further improvements for displays are desired.
  • an anti-reflective and anti-glare film is provided.
  • the anti-reflective and anti-glare protective shield includes a substrate, an anti-glare layer over the substrate, and at least one anti-reflective layer over the anti-glare layer.
  • the anti-glare layer comprises an organic layer and protruding organic particles. Further, each of the protruding organic particles partially protrude from the organic layer in a direction away from the substrate and the organic layer. Moreover, a refractive index of the protruding organic particles and a refractive index of the organic layer are substantially the same. [0010] According to another aspect of the present disclosure, a method for manufacturing an anti-reflective and anti-glare film is provided.
  • the method includes: providing a substrate, providing an anti-glare layer material on the substrate to form an anti-glare layer including an organic layer and protruding organic particles, and depositing at least a first layer material on the anti-glare layer to form at least one anti-reflective layer. Further, each of the protruding organic particles protrude from the organic layer in a direction away from the substrate and the organic layer. Moreover, a refractive index of the protruding organic particles and a refractive index of the organic layer are substantially the same.
  • Figure 1A shows a schematic cross-sectional view of an anti- reflective and anti-glare film according to embodiments described herein
  • Figure 1B shows a schematic cross-sectional view and a corresponding schematic enlarged cross-sectional view of an anti-reflective and anti-glare film according to embodiments described herein
  • Figures 2A and 2B show SEM (Scanning Electron Microscopy) images of an anti-reflective and anti-glare film according to embodiments described herein
  • Figures 2C and 2D show respectively an anti-reflective and anti-glare film having a specular reflection thereon according to embodiments described herein and a
  • the present disclosure overcomes the above-mentioned drawbacks by providing a film having combined anti-reflection and anti-glare properties and a method for manufacturing the anti-reflective and anti-glare film.
  • the anti-reflective and anti-glare film of the present disclosure includes an anti-glare layer comprising an organic layer and organic particles, particularly protruding organic particles, wherein each of the protruding organic particles partially protrude from the organic layer in a direction away from the substrate and the organic layer, and a refractive index of the organic particles, particularly of the protruding organic particles, and a refractive index of the organic layer are substantially the same, the performance of the anti- glare layer is improved by reducing the amount of sparkling of light (also called lens effect) and reflected light due to, for instance, internal scattering of the anti-glare layer.
  • the term “substantially” is understood particularly when referring to a refractive index of the organic particles, particularly protruding organic particles, and a refractive index of the organic layer to allow for a deviation of a difference between the refractive index of the organic particles, particularly protruding organic particles, and the refractive index of the organic layer ⁇ 0.05 or below, and particularly ⁇ 0.02 or below.
  • the term “anti-reflective layer stack” as used herein refers to a group of layers that provide an anti-reflective property to a film against reflections of light, particularly specular reflections. An anti-reflective layer or an anti- reflective layer stack as described herein can be flexible and/or transparent.
  • an anti-glare layer as described herein can be flexible and/or transparent.
  • the term “organic layer” may be understood as a layer made of an organic material, which is particularly formed on a substrate surface.
  • the term “organic layer” may be also understood as a layer made of an organic layer material that fills recessed features formed in a substrate surface and/or overcoats a top surface of raised features formed on a substrate surface. Further, the term “organic layer” may refer to a layer that levels or flattens (in terms of planarization) the surface of a substrate, in particular a flexible substrate.
  • the term “organic layer material” may refer to a material composition that forms an organic layer.
  • the term “organic layer material” may refer to a material composition that is provided (e.g. coated or applied) on a substrate, particularly on a substrate surface, and forms an organic layer.
  • a material composition that is provided (e.g. coated or applied) on a substrate, particularly on a substrate surface, and forms an organic layer.
  • the term “dispersed” may be understood as a state in which particles, particularly organic particles, may be homogenously distributed or spread in an organic layer.
  • the term “agglomerate” may be understood as a state in which particles, particularly organic particles, may be held together by weak physical interactions ultimately leading to at least a group of particles, particularly a group of organic particles, in a specific region of a layer, e.g. the organic layer.
  • substrate or “flexible substrate” as used herein can particularly embrace flexible substrates such as a web or a foil.
  • substantially inflexible is understood to distinguish over “flexible”. Specifically, a substantially inflexible substrate can have a certain degree of flexibility, e.g.
  • a glass plate having a thickness of 0.9 mm or below, such as 0.5 mm or below, wherein the flexibility of the substantially inflexible substrate is small in comparison to the flexible substrates.
  • the term “flexible” may also refer to being capable of being formed into a roll.
  • a flexible substrate or web as used within the embodiments described herein can typically be characterized in that the flexible substrate is bendable.
  • the term “web” may be synonymously used with the term “strip”, the term “tape”, or the term “flexible substrate”.
  • the web as described in embodiments herein, may be a foil or another flexible substrate.
  • c the speed of light in vacuum
  • v the speed of light in the material.
  • FIG. 1A shows a schematic cross-sectional view of an anti- reflective and anti-glare film 10 according to embodiments described herein.
  • the anti-reflective and anti-glare film 10 includes a substrate 11, particularly a transparent substrate.
  • the anti-reflective and anti-glare film 10 includes an anti-glare layer 20 over the substrate 11.
  • the anti-reflective and anti-glare film 10 includes at least one anti-reflective layer 50 over the anti-glare layer 20.
  • the anti-glare layer 20 may include an organic layer 30 and organic particles, particularly protruding organic particles 40.
  • the at least one anti-reflective layer 50 can be a single anti-reflective layer.
  • the at least one anti- reflective layer 50 can be an anti-reflective layer stack.
  • the at least one anti-reflective layer 50 can be directly disposed or deposited on the anti-glare layer 20.
  • the single anti-reflective layer may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the single anti-reflective layer of the at least one anti-reflective layer 50 may include at least one of SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and/or combinations thereof.
  • Figure 1B shows a schematic cross-sectional view and a corresponding schematic enlarged cross-sectional view of an anti-reflective and anti-glare film 100 according to an embodiment described herein.
  • the anti-reflective and anti-glare film 100 includes a substrate 110, particularly a transparent substrate.
  • substrate as used herein can particularly embrace flexible substrates such as a web or a foil.
  • the present disclosure is not limited thereto, and the term “substrate” may also embrace inflexible substrates, e.g., slices of transparent crystal such as sapphire or the like, or a glass plate.
  • the substrate 110 may comprise at least one material selected from the group consisting of polycarbonate, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyacrylate and/or derivatives of polyacrylate, polymethacrylate and/or derivatives of polymethacrylate, cyclo olefin polymer, polyethylene naphthalate, polyethylene terephthalate glycol, polyethylene terephthalate, polyimide, and combinations thereof.
  • the substrate 110 may have a thickness equal to or smaller than 500 ⁇ m, particularly a thickness equal or smaller than 400 ⁇ m and more particularly a thickness equal to or smaller than 300 ⁇ m.
  • the substrate 110 may have a thickness equal to or higher than 10 ⁇ m, particularly a thickness equal to or higher than 30 ⁇ m, and more particularly a thickness equal to or higher than 50 ⁇ m.
  • the substrate 110 may have a thickness of 10 ⁇ m or above and of 500 ⁇ m or below, particularly a thickness of 30 ⁇ m or above and of 400 ⁇ m or below, and more particularly a thickness of 50 ⁇ m or above and of 300 ⁇ m or below.
  • the term “transparent” as used herein can particularly include the capability of a structure to transmit light with relatively low scattering, so that, for example, light transmitted therethrough can be seen in a substantially clear manner.
  • the anti-reflective and anti- glare film 100 includes an anti-glare layer 120 over the substrate 110.
  • the anti-reflective and anti-glare film 100 includes an anti- reflective layer stack 150 over the anti-glare layer 120.
  • the anti-glare layer 120 can be directly in contact with the substrate 110.
  • the anti-reflective layer stack 150 can be directly in contact with the anti-glare layer 120.
  • the anti-reflective and anti-glare film 100 may include a seed layer between the anti-glare layer 120 and the anti-reflective layer stack 150. Accordingly, the seed layer may be deposited on the anti-glare layer 120, e.g. by chemical vapor deposition or physical vapor deposition, for example sputtering or evaporation. Some examples of materials of the seed layer can be SiOx, TiOx, NbOx, SiNx, and/or combinations thereof.
  • the seed layer may have a thickness of between 0 and 5 nm.
  • the anti-glare layer 120 includes an organic layer 130 and organic particles, particularly protruding organic particles 140.
  • the organic layer 130 may have a thickness equal to or smaller than 15 ⁇ m, particularly a thickness equal to or smaller than 12 ⁇ m and more particularly a thickness equal to or smaller than 9 ⁇ m.
  • the organic layer 130 may have a thickness equal to or higher than 1 ⁇ m, particularly a thickness equal to or higher than 4 ⁇ m, and more particularly a thickness equal to or higher than 7 ⁇ m.
  • the organic layer 130 may have a thickness of 1 ⁇ m or above and of 15 ⁇ m or below, particularly a thickness of 4 ⁇ m or above and of 12 ⁇ m or below, and more particularly a thickness of 7 ⁇ m or above and of 9 ⁇ m or below.
  • the term “thickness” as used herein with particular reference to the thickness of the organic layer 130 is to be understood as the closest distance between two opposite surfaces of the organic layer 130, wherein particularly each of the two opposite surfaces of the organic layer 130 is in contact with a substrate or a further layer.
  • the anti-glare layer 120 can have a sufficiently high degradation temperature to remain stable during subsequent processing (e.g. providing the anti-reflective layer stack 150), which can involve extreme temperatures.
  • the organic layer material may comprise at least one cross-linkable polymer, particularly selected from the group consisting of a polyacrylic resin, an acrylic-urethane resin, an epoxy acrylic resin, a melamine resin, an amino resin, a polyurethane resin, a polyester resin, a polysiloxane resin, and combinations thereof.
  • a cross-linkable polymer particularly selected from the group consisting of a polyacrylic resin, an acrylic-urethane resin, an epoxy acrylic resin, a melamine resin, an amino resin, a polyurethane resin, a polyester resin, a polysiloxane resin, and combinations thereof.
  • the organic layer material may comprise monomers, particularly selected from the group consisting of urethane acrylates, isobornyl acrylate, dipentaerythritol pentaacrylates, epoxy acrylates blended with styrene, di-trimethylolpropane tetraacrylates, diethylene glycol diacrylates, 1,3-butylene glycol diacrylate, pentaacrylate esters, pentaerythritol tetraacrylates, pentaerythritol triacrylates, ethoxylated (3) trimethylolpropane triacrylates, ethoxylated (3) trimethylolpropane triacrylates, alkoxylated trifunctional acrylate esters, dipropylene glycol diacrylates, neopentyl glycol diacrylates, ethoxylated (4) bisphenol a dimethacrylates, cyclohexane dimethanol diacrylate esters, isobornyl
  • the organic layer material may also comprise monomers, particularly selected from the group consisting of vinyl ethers, vinyl naphthylene, acrylonitrile, and mixtures thereof, and/or acrylate oligomers.
  • the organic layer may include an organic layer material selected from the group consisting of poly(vinyl alcohol), poly(vinyl pyrrolidone), ethylene oxide polymers, polyurethanes, urethane- acrylic copolymers, acrylic polymers, particularly UV-crosslinked acrylic polymers, styrene-acrylic copolymers, vinyl polymers, polyesters, silicone polymers, and combinations thereof.
  • the organic particles, particularly the protruding organic particles 140 may include a material selected from the group consisting of poly(methyl methacrylate), poly(butyl methacrylate), copolymers of methyl acrylate, copolymers of butyl methacrylate, and combinations thereof.
  • the organic particles, particularly the protruding organic particles 140 may include a crosslinked material selected from the group consisting of crosslinked poly(methyl methacrylate), crosslinked poly(butyl methacrylate), crosslinked copolymers of methyl acrylate, crosslinked copolymers of butyl methacrylate, and combinations thereof.
  • Organic particles, particularly the protruding organic particles 140 can be manufactured by various procedures.
  • the anti-glare layer 120 may also include dispersed organic particles, e.g. completely surrounded by an organic layer material in the organic layer 130, and/or agglomerated organic particles completely surrounded by an organic layer material in the organic layer 130.
  • the size (e.g., dimensions) of the organic particles described herein can be determined by dynamic light scattering, disc centrifugation, particle tracking analysis, tunable resistive pulse sensing, atomic force microscopy, and/or electron microscopy. These methods for determining the particle size distribution are known in the art.
  • the size of the organic particles of the anti-glare layer 120 can be determined by dynamic light scattering according to ISO 13320:2020, e.g., Particle size analysis — Laser diffraction methods. This norm considers the particles as being spherical and, therefore, particle size is reported as a volume equivalent sphere diameter.
  • the organic particles, particularly the protruding organic particles 140 may have a maximum D10 particle diameter of 5 ⁇ m, particularly a maximum D10 particle diameter of 4 ⁇ m, and more particularly a maximum D10 particle diameter of 2.5 ⁇ m.
  • the organic particles, particularly the protruding organic particles 140 may have a minimum D10 particle diameter of 0.8 ⁇ m, particularly a minimum D10 particle diameter of 1 ⁇ m, and more particularly a minimum D10 particle diameter of 1.5 ⁇ m. In some embodiments, the organic particles, particularly the protruding organic particles 140, may have a minimum D10 particle diameter of 0.8 ⁇ m and a maximum D10 particle diameter of 5 ⁇ m, particularly a minimum D10 particle diameter of 1 ⁇ m and a maximum D10 particle diameter of 4 ⁇ m, and more particularly a minimum D10 particle diameter of 1.5 ⁇ m and a maximum D10 particle diameter of 2.5 ⁇ m.
  • the organic particles, particularly the protruding organic particles 140 may have a maximum D50 particle diameter of 5 ⁇ m, particularly a maximum D50 particle diameter of 4 ⁇ m, and more particularly a maximum D50 particle diameter of 2.5 ⁇ m. In some embodiments, the organic particles, particularly the protruding organic particles 140, may have a minimum D50 particle diameter of 0.8 ⁇ m, particularly a minimum D50 particle diameter of 1 ⁇ m, and more particularly a minimum D50 particle diameter of 1.5 ⁇ m.
  • the organic particles, particularly the protruding organic particles 140 may have a minimum D50 particle diameter of 0.8 ⁇ m and a maximum D50 particle diameter of 5 ⁇ m, particularly a minimum D50 particle diameter of 1 ⁇ m and a maximum D50 particle diameter of 4 ⁇ m, and more particularly a minimum D50 particle diameter of 1.5 ⁇ m and a maximum D50 particle diameter of 2.5 ⁇ m.
  • the organic particles, particularly the protruding organic particles 140 may have a maximum D90 particle diameter of 5 ⁇ m, particularly a maximum D90 particle diameter of 4 ⁇ m, and more particularly a maximum D90 particle diameter of 2.5 ⁇ m.
  • the organic particles, particularly the protruding organic particles 140 may have a minimum D90 particle diameter of 0.8 ⁇ m, particularly a minimum D90 particle diameter of 1 ⁇ m, and more particularly a minimum D90 particle diameter of 1.5 ⁇ m. In some embodiments, the organic particles, particularly the protruding organic particles 140, may have a minimum D90 particle diameter of 0.8 ⁇ m and a maximum D90 particle diameter of 5 ⁇ m, particularly a minimum D90 particle diameter of 1 ⁇ m and a maximum D90 particle diameter of 4 ⁇ m, and more particularly a minimum D90 particle diameter of 1.5 ⁇ m and a maximum D90 particle diameter of 2.5 ⁇ m.
  • the term “D10” refers to the particle diameter in a particle size distribution, wherein 10% of the particles in the particle size distribution have a lower particle diameter and 90% of the particles in the particle size distribution have a higher particle diameter.
  • the term “D50” refers to the particle diameter in a particle size distribution, wherein 50% of the particles in the particle size distribution have a lower particle diameter and 50% of the particles in the particle size distribution have a higher particle diameter.
  • the term “D50” is also known as the median diameter.
  • the term “D90” refers to the particle diameter in a particle size distribution, wherein 90% of the particles in the particle size distribution have a lower particle diameter and 10% of the particles in the particle size distribution have a higher particle diameter.
  • the D10 particle diameter of the organic particles, particularly of the protruding organic particles 140 can be less than 100% of the thickness of the organic layer 130, particularly less than 80% of the thickness of the organic layer 130, and more particularly less than 60% of the thickness of the organic layer 130.
  • the D50 particle diameter of the organic particles, particularly of the protruding organic particles 140 can be less than 100% of the thickness of the organic layer 130, particularly less than 80% of the thickness of the organic layer 130, and more particularly less than 60% of the thickness of the organic layer 130.
  • the D90 particle diameter of the organic particles, particularly of the protruding organic particles 140 can be less than 200% of the thickness of the organic layer 130, particularly less than 150% of the thickness of the organic layer 130, and more particularly less than 110% of the thickness of the organic layer 130.
  • the organic particles, particularly the protruding organic particles 140 can be spherical.
  • the term "spherical” is to be understood to include arcuate surfaces. Further, the term “spherical” means a surface of an organic particle, particularly of a protruding organic particle, that has a curvature in any direction.
  • the term “spherical” may refer to a spherical, oval, elliptical surface.
  • the term “spherical” in connection with an organic particle or a protruding organic particle does not mean that all organic particles or protruding organic particles 140 are spherical, it means that most organic particles or protruding organic particles 140, such as more than 90%, preferably 95%, most preferably 99% of the organic particles or protruding organic particles 140 are essentially spherical.
  • the term “spherical” refers to a perfectly round geometric surface.
  • each of the protruding organic particles 140 may partially protrude from the organic layer 130 in a direction away from the substrate 110 and the organic layer 130.
  • a portion of the protruding organic particles 140 may have a protruding height 160 equal to or smaller than one third of a D10 particle diameter of the protruding organic particles 140, particularly equal to or smaller than one quarter of a D10 particle diameter of the protruding organic particles 140, and more particularly equal to or smaller than one fifth of a D10 particle diameter of the protruding organic particles 140.
  • a portion of the protruding organic particles 140 may have a protruding height 160 equal to or smaller than one third of a D50 particle diameter of the protruding organic particles 140, particularly equal to or smaller than one quarter of a D50 particle diameter of the protruding organic particles 140, and more particularly equal to or smaller than one fifth of a D50 particle diameter of the protruding organic particles 140.
  • a portion of the protruding organic particles 140 may have a protruding height 160 equal to or smaller than one third of a D90 particle diameter of the protruding organic particles 140, particularly equal to or smaller than one quarter of a D90 particle diameter of the protruding organic particles 140, and more particularly equal to or smaller than one fifth of a D90 particle diameter of the protruding organic particles 140.
  • the portion of the protruding organic particles 140 can be equal to or higher than 60 % of a total number of the protruding organic particles 140, particularly equal to or higher than 70 % of a total number of the protruding organic particles 140, and more particularly equal to or higher than 80 % of a total number of the protruding organic particles 140. Since the portion of the protruding organic particles 140 and the protruding height 160 of the protruding organic particles 140 are controlled, a more uniform anti-glare layer 120 is obtained, which facilitates the later deposition of the anti-reflective layer stack 150, e.g.
  • protruding height in the present disclosure may be understood as the height of protruding sections of protruding organic particles 140 above a surface of an organic layer 130, e.g. from which each of the protruding organic particles 140 partially protrude in a direction away from the substrate 110 and the organic layer 130.
  • protruding height in the present disclosure may be also understood with reference to Figure 1B as a value of the closest distances between a single point 162 in each protruding section of protruding organic particles 140 above and farthest away from a surface of an organic layer and a reference secant plane 164 including a flat portion of the surface of the organic layer 130 around each protruding section of the protruding organic particles 140 and above which each protruding section of the protruding organic particles 140 extends.
  • the protruding height 160 can be determined by using a variety of suitable methods for inspecting the surface of films such as stylus profilometry, atomic force microscopy, scanning electron microscopy, scatterometer, and interferometry methods.
  • a refractive index of the organic layer 130 and a refractive index of the organic particles, particularly protruding organic particles 140 can be substantially the same.
  • the refractive index of particles, layers or films can be determined as described, for instance, in ISO 13320:2020, e.g., Particle size analysis — Laser diffraction methods or in ISO 489:1999 Plastics – Determination of refractive index.
  • a surface of the substrate 110 onto which the anti-glare layer 120 is provided e.g.
  • the anti-reflective layer stack 150 over the anti-glare layer 120 of the present embodiments may include a number of layers formed (e.g. by deposition) one on top of another.
  • a suitable reactive or non-reactive atmosphere e.g., plasma, glow discharge, corona discharge, dielectric barrier discharge or atmospheric pressure discharge
  • chemical pretreatment e.g., flame pretreatment
  • flame pretreatment e.g., flame pretreatment
  • the anti-reflective layer stack 150 over the anti-glare layer 120 of the present embodiments may include a number of layers formed (e.g. by deposition) one on top of another.
  • the anti-reflective layer stack 150 can be directly disposed or deposited on the anti-glare layer 120.
  • the layers of the anti-reflective layer stack 150 can be directly disposed or deposited on each other.
  • the single anti-reflective layer of the at least one anti-reflective layer 50 or at least one of the layers of the anti-reflective layer stack 150 may have a thickness of more than 5 nm, particularly a thickness of more than 20 nm, and more particularly a thickness of more than 30 nm. In some embodiments, the single anti-reflective layer of the at least one anti-reflective layer 50 or at least one of the layers of the anti-reflective layer stack 150 may have a thickness of less than 120 nm, particularly a thickness of less than 100 nm, and more particularly a thickness of less than 80 nm.
  • the single anti-reflective layer of the at least one anti-reflective layer 50 or at least one of the layers of the anti-reflective layer stack 150 may have a thickness in the range of 5 nm and 120 nm, particularly in the range of 20 nm to 100 nm, and more particularly in the range of 30 nm to 80 nm. Thicknesses and/or optical properties of the individual layers of the anti- reflective layer stack 150 can be different.
  • the anti-reflective layer stack 150 of the present disclosure may include alternating layers, particularly alternating layers comprising different materials.
  • the layers of the anti-reflective layer stack 150 may include a low refractive index material and a high refractive index material in an alternating manner.
  • At least one of the layers of the anti-reflective layer stack 150 can be dielectric layers. According to some embodiments, which can be combined with other embodiments described herein, the first layer 150a, the second layer 150b, the third layer 150c, and the fourth layer 150d can be dielectric layers. In some embodiments, all of the layers of the anti-reflective layer stack 150 can be dielectric layers. [0072]
  • the present disclosure provides at least one anti-reflective layer 50, e.g. being a single anti-reflective layer, and/or an anti-reflective layer stack 150 with anti-reflection properties.
  • an anti- reflective layer stack may include two layers, which may be referred as NO.
  • the anti-reflective layer stack may include a first layer and a second layer arranged in this order.
  • the first layer may have a refractive index of about at least 1.9, particularly of about 2
  • the second layer may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the first layer of the anti-reflective layer stack may include at least one of SiNx, NbOx, SiN, SiOxNy, AlxOy, AlOxNy, TiOx TaOx, an organic material such as a polymer material, and/or combinations thereof
  • the second layer of the anti- reflective layer stack may include at least one of SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and/or combinations thereof.
  • an anti-reflective layer stack may include two layers in the following order TiOx/SiOx. [0073]
  • an anti-reflective layer stack may include three layers.
  • the anti-reflective layer stack may include a first layer, a second layer, and a third layer arranged in this order.
  • the first layer may have a refractive index between the second layer and the third layer.
  • the first layer may have a refractive index of about at least 1.9, particularly of about 2
  • the third layer may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the first layer of the anti- reflective layer stack may include at least one of SiNx, , SiN, SiOxNy, Al X Oy, AlOxNy, an organic material such as a polymer material, and/or combinations thereof
  • the second layer of the anti-reflective layer stack may include at least one of TiOx, NbOx, an organic material such as a polymer material, and/or combinations thereof
  • the third layer of the anti-reflective layer stack may include at least one of SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and/or combinations thereof.
  • the first layer may include or be made of SiNx
  • the second layer may include or be made of TiOx
  • the third layer may include or be made of MgFx.
  • an anti-reflective layer stack may include three layers in the following order Si X N Y /TiOx/SiOx or Al X O Y /TiOx/SiOx. [0074] According to some embodiments, an anti-reflective layer stack may include four layers, five layers or six layers, as exemplarily shown in Figures 1B, 3, and 4, respectively.
  • an uppermost layer of the anti-reflective layer stack may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • An anti-reflective layer stack 150 with four layers may be referred to as NONO
  • an anti-reflective layer stack 350 with five layers may be referred to as ONONO
  • an anti-reflective layer stack 450 with six layers may be referred to as NONONO.
  • the symbols N and O may denote a material of the layers of the anti- reflective layer stack 150.
  • the symbol N denotes the material or layer with a high refractive index (e.g., TiOx) and the symbol O denotes the material or layer with a low refractive index (e.g., SiOx).
  • the present disclosure is not limited to TiOx and SiOx, and that any suitable materials having the high refractive index of at least 1.9 and the low refractive index of less than 1.7 could be used for the layers with the high refractive index and the layers with the low refractive index, respectively.
  • materials of the layers of the anti-reflective layer stack 150 can be insulating materials with high and low refractive indexes, for example SiOx, TiOx, NbOx, SiNx, SiOxNy, AlxOy, AlOxNy, TaOx, an organic material such as a polymer material, and combinations thereof.
  • an extinction coefficient of the materials with the high refractive index and the low refractive index can be small.
  • the index of refraction and the extinction coefficient are the real part and the imaginary part, respectively, of the complex index of refraction. Particularly, when light passes through a medium, some part of the light will be absorbed.
  • the anti-reflective layer stack 150 includes at least a first layer 150a, a second layer 150b, a third layer 150c, and a fourth layer 150d arranged in this order.
  • the first layer 150a and the third layer 150c have a refractive index of at least 1.9, and the second layer 150b and the fourth layer 150d have a refractive index of less than 1.7.
  • the first layer 150a and the third layer 150c may include or be made of TiOx
  • the second layer 150b and the fourth layer 150d may include or be made of SiO 2
  • the first layer 150a and the third layer 150c having a refractive index of at least 1.9 and the second layer 150b and the fourth layer 150d having a refractive index of less than 1.7 provide an anti-reflective layer stack 150 having an anti-reflection function and, together with the anti-glare layer 120, provide combined anti-reflection and anti-glare functions.
  • a light transmittance of the anti-reflective layer stack 150 can be about 94%, particularly in a wavelength range of about 400 nm to 700 nm.
  • Figures 2A and 2B show SEM (Scanning Electron Microscopy, HV: 12.50 kV, WD: 13.0 mm or 12.8 mm, LFD detector) images of an anti-reflective and anti-glare film according to embodiments described herein. Accordingly, arrows in the SEM images of Figures 2A and 2B point to protruding organic particles with properties as those described according to embodiments of the present disclosure.
  • Figures 2C and 2D show respectively an anti-reflective and anti-glare film having a specular reflection thereon obtained according to embodiments described herein and a comparative example of a film having a specular reflection thereon.
  • the film in Figure 2D includes an anti-glare layer including protruding organic particles with a protruding height higher than the one described according to embodiments of the present disclosure, which results in a higher sparkling of light in comparison with a sparkling of light from the anti-reflective and anti-glare film obtained according to embodiments described herein and a blurred vision of the reflected light. Accordingly, the sparkling of light in Figure 2C is reduced and a milky vision of the reflected light is obtained.
  • an anti-reflective layer stack 350 or 450 may include one or more further layers over the fourth layer 350d or 450d, particularly a fifth layer 350e or 450e or a fifth layer 450e and a sixth layer 450f as shown in Figures 3 and 4, respectively.
  • an anti-reflective and anti-glare film 300 according to further embodiments of the present disclosure is depicted.
  • the anti-reflective layer stack 350 of Figure 3 is similar to the anti-reflective layer stack 150 of Figure 1B with the difference being that the anti-reflective layer stack 350 of the anti-reflective and anti-glare film 300 may be referred to as ONONO.
  • the anti-reflective and anti-glare film 300 includes an anti-glare layer 320 over the substrate 310. Further, the anti-reflective and anti-glare film 300 includes an anti-reflective layer stack 350 over the anti-glare layer 320. Furthermore, the anti-glare layer 320 includes an organic layer 330 and organic particles, particularly protruding organic particles 340. Accordingly, an uppermost layer of the anti-reflective layer stack 350 may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the first layer 350a, the third layer 350c, and the fifth layer 350e may include or be made of SiO 2
  • the second layer 350b and the fourth layer 350d may include or be made of SiNx.
  • an anti-reflective and anti-glare film 400 according to further embodiments of the present disclosure is depicted.
  • the anti-reflective layer stack 450 is similar to the anti-reflective layer stack 150 of Figure 1B, with the difference being that a fifth layer 450e and a sixth layer 450f are arranged over the fourth layer 450d.
  • the anti-reflective and anti- glare film 400 includes an anti-glare layer 420 over the substrate 410.
  • the anti-reflective and anti-glare film 400 includes an anti-reflective layer stack 450 over the anti-glare layer 420.
  • the anti-glare layer 420 includes an organic layer 430 and organic particles, particularly protruding organic particles 440.
  • the anti-reflective layer stack 350 of the anti-reflective and anti- glare film 400 may be referred to as NONONO.
  • an uppermost layer of the anti-reflective layer stack 450 may have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the first layer 450a, the third layer 450c and the fifth layer 450e may include or be made of TiOx, and the second layer 450b, the fourth layer 450d and the sixth layer 450f may include or be made of SiO 2 .
  • the even numbered layers of the anti- reflective layer stack 350 have the refractive index of at least 1.9, and the odd numbered layers of the anti-reflective layer stack 350 have the refractive index of less than 1.7.
  • the odd numbered layers of the anti- reflective layer stack 150 or 450 have the refractive index of at least 1.9, and the even numbered layers of the anti-reflective layer stack 150 or 450 have the refractive index of less than 1.7.
  • the terms “odd” and “even” as used throughout this application refer to parity in mathematics, i.e. that an integer is even if it is evenly divisible by two and odd if it is not even.
  • the odd numbered layers of the anti-reflective layer stack 350 or 450 can be the first, third, fifth etc. layers
  • the even numbered layers of the anti-reflective layer stack 350 or 450 can be the second, fourth, sixth, etc. layers.
  • the first layer to the sixth layer of the anti-reflective layer stack 150, 350 or 450, the odd numbered layers of the anti-reflective layer stack 150, 350 or 450 and the even numbered layers of the anti-reflective layer stack 150, 350 or 450 as referred to in this application are the layers of the anti-reflective layer stack 150, 350 or 450 providing the anti-reflection functions, i.e., the layers of the anti-reflective layer stack 150, 350 or 450 having the refractive index of at least 1.9 or the refractive index of less than 1.7.
  • the numbering excludes any other layers that could additionally be provided, such as seed layers, hard coatings, adhesive layers and the like.
  • Thicknesses, materials and/or other properties of the anti-glare layer 320 or 420, layers of the anti-reflective layer stack 350 or 450 and/or substrate 310 or 410 are those described for any other embodiment of the present disclosure such as those described with reference to Figure 1B.
  • the odd numbered layers of the anti-reflective layer stack, particularly of the anti-reflective layer stack 150 or 450 can have a refractive index of about at least 1.9, particularly of about 2.
  • the even numbered layers of the layer stack, particularly of the anti-reflective layer stack 150 or 450 can have a refractive index of less than 1.7, particularly a refractive index of less than 1.5, and more particularly of about 1.46.
  • the odd numbered layers of the anti-reflective layer stack include at least one of SiNx, NbOx, SiN, SiOxNy, AlxOy, AlOxNy, TiOx TaOx, an organic material such as a polymer material, and/or combinations thereof
  • the even numbered layers of the layer stack, particularly of the anti-reflective layer stack 150 or 450 include at least one of SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and/or combinations thereof.
  • the first layer 150a or 450a e.g.
  • a first dielectric layer can have a high refractive index.
  • an anti-reflective layer stack particularly the anti-reflective layer stack 150, 350 or 450, having improved anti-reflection characteristics can be provided.
  • layers of the anti-reflective layer stack, particularly of the anti-reflective layer stack 150, 350 or 450, having the lower refractive indexes can be provided by depositing layers containing SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and/or combinations thereof, or the like.
  • layers of the anti-reflective layer stack particularly of the anti-reflective layer stack 150, 350 or 450, having the higher refractive indexes (e.g. the odd numbered layers) can be provided by depositing layers containing NbOx, SiNx, SiN, SiOxNy, AlxOy, AlOxNy, TiOx, TaOx, an organic material such as a polymer material, and/or combinations thereof, or the like.
  • the layers of the anti-reflective layer stack can be manufactured by chemical vapor deposition or physical vapor deposition, for example sputtering or evaporation.
  • Some examples can be insulating materials with high and low refractive indexes, for example SiOx, SiN, TiOx, NbOx, SiNx, SiOxNy, AlxOy, AlOxNy, TaOx, an organic material such as a polymer material, and/or combinations thereof and/or TiO 2 , ZnO, CuO, Ag-TiO 2 , and combinations thereof.
  • the thickness of each of the odd numbered layers of the anti-reflective layer stack, particularly of the anti-reflective layer stack 150, 350 or 450 can be less than the thickness of each of the even numbered layers of the anti-reflective layer stack, particularly of the anti-reflective layer stack 150, 350 or 450.
  • the layers of the anti-reflective layer stack, particularly of the anti-reflective layer stack 150, 350 or 450 can be formed or arranged over each other.
  • the second layer 150b, 350b, or 450b is formed or arranged over the first layer 150a, 350a, or 450a
  • the third layer 150c, 350c or 450c is formed or arranged over the second layer 150b, 350b or 450b
  • the fourth layer 150d, 350d or 450d is formed or arranged over the third layer 150c, 350c or 450c.
  • no further layers or films are present between the layers of the layer stack.
  • further layers can be provided between at least some of the layers of the layer stack.
  • the second layer 150b, 350b or 450b is deposited over the first layer 150a, 350a or 450a, and a further layer, deposited after the second layer 150b, 350b or 450b, is thus over the second layer 150b, 350b or 450b and over the first layer 150a, 350a or 450a.
  • the term “over” is used to define an order of layers, layer stacks, and/or films wherein the starting point is the substrate, which is irrespective of whether the anti-reflective layer stack, particularly the anti-reflective layer stack 150, 350 or 450 is depicted upside down or not.
  • Methods for depositing a material for instance on an anti-glare layer may include a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, a plasma enhanced chemical vapor deposition (PECVD) process, etc.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • PECVD plasma enhanced chemical vapor deposition
  • the process is performed in a process apparatus or process chamber, where the substrate including an anti-glare layer to be coated is located.
  • a deposition material is provided in the apparatus.
  • a plurality of materials such as oxides, nitrides or carbides thereof may be used for deposition.
  • other processes like etching, structuring, annealing, or the like can be conducted in processing chambers.
  • Figure 5 shows a schematic view of an apparatus 500, e.g.
  • the apparatus 500 can include at least three chamber portions 502A, 502B and 502C. At chamber portion 502C, one or more deposition sources 530 and optionally an etching station 540 can be provided as processing tools.
  • a substrate 541 including the anti-glare layer e.g. a flexible substrate including the anti-glare layer, is provided on a first roll 764, e.g. having a winding shaft.
  • the flexible substrate including the anti-glare layer is unwound from the first roll 764 as indicated by the substrate movement direction shown by arrow 108.
  • a separation wall 701 is provided for separation of chamber portions 502A and 502B.
  • the separation wall 701 can further be provided with gap sluices 545 for having the substrate 541 including the anti-glare layer pass therethrough.
  • a vacuum flange 112 provided between the chamber portions 502B and 502C can be provided with openings to take up at least some processing tools.
  • the coating drum 5110 rotates around an axis such that the substrate 541 including the anti-glare layer moves in the direction of arrow 108.
  • the substrate 541 including the anti-glare layer is guided via one, two or more rollers from the first roll 764 to the coating drum 5110 and from the coating drum 5110 to the second roll 764’, e.g. having a winding shaft, on which the substrate 541 including the anti-glare layer is wound after processing thereof.
  • the deposition sources 530 can be configured for depositing the at least one anti-reflective layer or the layers of the anti-reflective layer stack as described in embodiments of the present disclosure.
  • At least one deposition source 530 can be adapted for deposition of the layer material having the refractive index of at least 1.9 and at least one deposition source 530 of the rest of the deposition sources 530 can be adapted for deposition of the layer material having the refractive index of less than 1.7.
  • a first deposition source can be configured for depositing the first layer
  • a second deposition source can be configured for depositing the second layer
  • a third deposition source can be configured for depositing the third layer
  • a fourth deposition source can be configured for depositing the fourth layer.
  • the first chamber portion 502A is separated in an interleaf chamber portion unit 502A1 and a substrate chamber portion unit 502A2.
  • interleaf rolls 766/766’ and interleaf rollers 105 can be provided as a modular element of the apparatus 500.
  • the apparatus 500 can further include a pre-heating unit 194 to heat the flexible substrate including the anti-glare layer.
  • a pre-treatment plasma source 192 e.g. an RF (radio frequency) plasma source can be provided to treat the substrate including the anti-glare layer with a plasma prior to entering chamber portion 502C.
  • the deposition material may be chosen according to the deposition process and the later application of the coated substrate.
  • the deposition material of the deposition sources 630 may be silicon.
  • oxide-, nitride- or carbide-layers, which can include such materials, can be deposited by providing the material from the source or by reactive deposition, i.e.
  • a method 600 for manufacturing an anti-reflective and anti-glare film includes providing a substrate (stage 610). The method further includes providing (e.g. coating or applying) an anti-glare layer material on the substrate to form an anti-glare layer including an organic layer and organic particles, particularly protruding organic particles (stage 620). Additionally, the method includes depositing at least a first layer material on the anti-glare layer to form at least one anti-reflective layer (stage 630).
  • depositing at least a first layer material on the anti-glare layer to form at least one anti-reflective layer may include alternately depositing at least a first layer material and a second layer material on the anti- glare layer to form an anti-reflective layer stack, particularly to form at least a first layer, a second layer, a third layer, and a fourth layer to be arranged in this order.
  • depositing at least a first layer material on the anti-glare layer to form at least one anti-reflective layer may include depositing a first layer material, a second layer material, and a third layer material on the anti-glare layer to form an anti-reflective layer stack, particularly to form a first layer, a second layer, and a third layer to be arranged in this order.
  • the term “anti-glare layer material” may refer to a material composition that forms an anti-glare layer. Further, in some embodiments, the term “anti-glare layer material” may refer to a material composition that is provided (e.g.
  • the anti-glare layer material can be provided (e.g. coated or applied) on the substrate by using any suitable technique.
  • the anti-glare layer material can be provided on the substrate by using a coating method, and particularly by a solution coating method, particularly selected from the group consisting of gravure coating, flow coating, curtain coating, dip coating, spray coating, and a combination thereof.
  • the anti-glare layer material can also be provided by applying an organic layer material, e.g.
  • the anti-glare layer material may additionally comprise at least one organic solvent (e.g. ethyl acetate or butyl acetate).
  • the anti- glare layer material may additionally comprise at least one additive, such as cross-linkers and catalysts, e.g. photo-initiators.
  • removing the solvent using conventional techniques may be followed by crosslinking, for example, using an electron beam apparatus, a UV light source, an electrical discharge apparatus or another suitable apparatus.
  • the organic layer material can also be cured or crosslinked via exposure to light (e.g., DUV, i-line, g-line, and/or broad band) in addition to, or in lieu of, heating.
  • the conditions for forming the anti-glare layer can depend upon the particular organic layer material used, and may result in a dried, cured, and/or crosslinked organic layer.
  • a material composition of an anti- glare layer material can be 5 to 30 wt% of organic particles and the remainder of organic layer material, particularly 8 to 25 wt% of organic particles and the remainder of organic layer material, and more particularly 10 to 20 wt% of organic particles and the remainder of organic layer material.
  • a material composition of an anti-glare layer material can be 2.5 to 15 wt% of organic particles, 35 wt% to 48 wt% of organic layer material, and the remainder at least one organic solvent, particularly 4 to 12.5 wt% of organic particles, 37 wt% to 46 wt% of organic layer material, and the remainder at least one organic solvent, and more particularly 5 to 10 wt% of organic particles, 39 wt% to 44 wt% of organic layer material, and the remainder at least one organic solvent.
  • a mass of anti- glare layer material provided on a substrate per m 2 of substrate can be 2 g to 15 g, particularly 4 to 13 g, and more particularly 6 to 11 g.
  • providing (e.g. coating or applying) an anti-glare layer material on the substrate to form an anti-glare layer including an organic layer and organic particles, particularly protruding organic particles may include mixing an organic layer material, organic particles, and optionally at least one organic solvent.
  • providing (e.g. coating or applying) an anti-glare layer material on the substrate to form an anti-glare layer including an organic layer and organic particles may include removing at least one solvent from an anti-glare layer material, e.g. by using heating and/or vacuum.
  • the first layer has a refractive index of at least 1.9 and the second layer has a refractive index of less than 1.7.
  • a first layer material may be deposited for instance on the anti-glare layer. Then, a second layer material may be deposited on or over the first layer. Afterwards, a third layer material may be deposited on or over the second layer.
  • a fourth layer material may be deposited on or over the third layer.
  • a fifth layer material may be deposited on or over the fourth layer.
  • a sixth layer material may be deposited on or over the fifth layer.
  • the first layer material, the second layer material, the third layer material, etc. correspond to the first layer, the second layer, the third layer, etc., respectively, as described for embodiments of the present disclosure above.
  • four, five or six layers corresponding to the anti-reflective stack layer are arranged over each other, the present embodiments are not limited thereto. Any number of layers can be arranged, as it is for instance described above.
  • the at least one anti-reflective layer or the anti-reflective layer stack can be treated with a PFPE-silane solution to provide an anti-smudge effect.
  • layers of the at least one anti- reflective layer, layers of an anti-reflective layer stack or at least a first layer material and a second layer material to form an anti-reflective layer stack can be provided or deposited alternately on the anti-glare layer, e.g. by physical vapor deposition, for example sputtering or evaporation, or chemical vapor deposition.

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  • General Physics & Mathematics (AREA)
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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
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Abstract

L'invention concerne un film antireflet et anti-éblouissement et un procédé de fabrication d'un film antireflet et anti-éblouissement. Le film antireflet et anti-éblouissement comprend un substrat, une couche anti-éblouissement sur le substrat, et au moins une couche antireflet sur la couche anti-éblouissement. La couche anti-éblouissement comprend une couche organique et des particules organiques en saillie. En outre, chacune des particules organiques en saillie fait partiellement saillie à partir de la couche organique dans une direction s'éloignant du substrat et de la couche organique. De plus, un indice de réfraction des particules organiques en saillie et un indice de réfraction de la couche organique sont sensiblement les mêmes.
PCT/US2021/036444 2021-06-08 2021-06-08 Film antireflet et anti-éblouissement et procédé de fabrication d'un film antireflet et antireflet WO2022260658A1 (fr)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090262431A1 (en) * 2008-04-22 2009-10-22 Tetsuya Asakura Antiglare film, antireflection film, polarizing plate and image display device
US20100232023A1 (en) * 2007-02-14 2010-09-16 Sony Corporation Anti-glare film, method for manufacturing the same, and display device using the same
US20140127465A1 (en) * 2011-07-18 2014-05-08 Lg Chem, Ltd. Anti-glare film having improved contrast ratio and preparation method for the same
US9244205B2 (en) * 2009-10-07 2016-01-26 Nitto Denko Corporation Hard-coated antiglare film, polarizing plate and image display including the same, method for producing the same, and method for evaluating the same
US20200033506A1 (en) * 2016-09-30 2020-01-30 Jnc Corporation Anti-glare anti-reflection hard coating film, image display device, and method for producing anti-glare anti-reflection hard coating film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100232023A1 (en) * 2007-02-14 2010-09-16 Sony Corporation Anti-glare film, method for manufacturing the same, and display device using the same
US20090262431A1 (en) * 2008-04-22 2009-10-22 Tetsuya Asakura Antiglare film, antireflection film, polarizing plate and image display device
US9244205B2 (en) * 2009-10-07 2016-01-26 Nitto Denko Corporation Hard-coated antiglare film, polarizing plate and image display including the same, method for producing the same, and method for evaluating the same
US20140127465A1 (en) * 2011-07-18 2014-05-08 Lg Chem, Ltd. Anti-glare film having improved contrast ratio and preparation method for the same
US20200033506A1 (en) * 2016-09-30 2020-01-30 Jnc Corporation Anti-glare anti-reflection hard coating film, image display device, and method for producing anti-glare anti-reflection hard coating film

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