WO2022245087A1 - Strap and manufacturing method therefor - Google Patents
Strap and manufacturing method therefor Download PDFInfo
- Publication number
- WO2022245087A1 WO2022245087A1 PCT/KR2022/006997 KR2022006997W WO2022245087A1 WO 2022245087 A1 WO2022245087 A1 WO 2022245087A1 KR 2022006997 W KR2022006997 W KR 2022006997W WO 2022245087 A1 WO2022245087 A1 WO 2022245087A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- base
- strap
- core portion
- core part
- core
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 16
- 239000010935 stainless steel Substances 0.000 claims abstract description 16
- 238000004381 surface treatment Methods 0.000 claims description 20
- 230000003746 surface roughness Effects 0.000 claims description 8
- -1 Nimonie Inorganic materials 0.000 claims description 4
- 229910000701 elgiloys (Co-Cr-Ni Alloy) Inorganic materials 0.000 claims description 4
- 229910001293 incoloy Inorganic materials 0.000 claims description 4
- 229910001026 inconel Inorganic materials 0.000 claims description 4
- 229910001247 waspaloy Inorganic materials 0.000 claims description 4
- 239000002585 base Substances 0.000 description 83
- 238000000034 method Methods 0.000 description 18
- 239000000463 material Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 238000005096 rolling process Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 5
- 239000010949 copper Substances 0.000 description 4
- 230000014509 gene expression Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910003336 CuNi Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
Definitions
- the present disclosure relates to a strap and a manufacturing method thereof, and more particularly, to a strap including a core portion and a manufacturing method thereof.
- a plasma processing apparatus is used to deposit a thin film on a substrate used for a semiconductor, a solar panel, or a liquid crystal display (LCD).
- Plasma processing devices are devices that process substrates using techniques including etching, physical vapor deposition (PVD), chemical vapor deposition (CVD), ion implantation, and resist removal.
- a plasma processing apparatus includes a reaction chamber including an upper electrode and a lower electrode. A substrate is positioned between the upper electrode and the lower electrode, and plasma is generated in a space between the electrodes to excite the processing gas into a plasma state, thereby processing the substrate in the reaction chamber.
- RF power is applied to one of both electrodes and the other electrode is grounded.
- a conventional PE (Plasma Enhanced) type plasma processing apparatus RF power is applied to an upper electrode, and a bracket installed on a lower surface of a lower electrode is fixed through an RF strap to be grounded by a grounding means at the bottom of the chamber.
- the lower electrode which also serves to load the substrate, continuously moves up and down according to supply of the substrate, plasma treatment, and transport of the substrate to the outside.
- the RF strap which is a grounding means for electrically connecting the bracket attached to the lower surface of the lower electrode and the bottom of the chamber, is repeatedly bent and unfolded according to the repetitive lifting operation of the lower electrode.
- Embodiments disclosed herein provide a strap in which a plurality of members including a core portion are joined, and a manufacturing method thereof.
- the RF grounding characteristics due to the low electrical conductivity due to the use of stainless steel based materials and the life shortening problem due to plasma etching, which is a problem in the RF strap exposed to the plasma environment The degradation problem can be solved at the same time.
- a strap according to an embodiment of the present disclosure includes a first member including a first base having a lower surface and a first core portion engraved on the lower surface, and a second base having an upper surface and a second core portion engraved on the upper surface. It includes a second member, and at least some of the lower surface and the upper surface are surface-treated, and the first and second members are bonded so that the first core portion and the second core portion face each other to form a joint surface between the upper and lower surfaces,
- the first base and the second base are made of stainless steel, Elgiloy, Hasteloy, Astroloy, Inconel, Rene, Udimet, Corresponds to Waspaloy, Nimonie, Incoloy, Pyromet, or Discaloy.
- the first member and the second member have structures corresponding to each other.
- surface roughness is increased by surface treatment.
- the first core portion corresponds to Cu or BeCu
- the thickness of the strap is 300 ⁇ m or less
- the width is 100 mm or less.
- a strap according to another embodiment of the present disclosure includes a first member including a first base having a lower surface and a first core portion formed intaglio on the lower surface, and a second member including a second base having an upper surface, and And at least a part of the upper surface is surface-treated, the first member and the second member are bonded so that the first core portion and the upper surface face each other to form a joint surface between the upper surface and the lower surface, and the first base and the second base are made of stainless steel. corresponds to
- a strap manufacturing method includes forming a first member on the lower surface of a first base with a first core portion engraved thereon, forming a second member on an upper surface of a second base with a second core portion engraved thereon. and bonding the first member and the second member so that the first core part and the second core part face each other, and the first base and the second base correspond to stainless steel.
- surface treatment of at least a portion of the lower surface of the first member and the upper surface of the second member is further included.
- surface roughness is increased by surface treatment.
- the first member and the second member have structures corresponding to each other.
- a strap manufacturing method includes forming a first member having a first core portion engraved on a lower surface of a first base, forming a second member including a second base having an upper surface, and bonding the first member and the second member so that the first core portion and the upper surface thereof face each other, wherein the first base and the second base correspond to stainless steel.
- the width, thickness, or length of the strap can be adjusted by bonding the first member and the second member when manufacturing the strap, it is possible to manufacture a strap suitable for use or use environment.
- the base made of a material with high durability covers the core part made of a material having excellent conductivity, so that the high conductivity of the strap is maintained and the corrosion resistance and plasma resistance can be improved. have.
- FIG. 1 is a perspective view of a strap according to an embodiment of the present disclosure.
- Figure 2 is a perspective view of a first member and a second member formed intaglio according to an embodiment of the present disclosure.
- FIG 3 is a perspective view of a member according to various embodiments of the present disclosure.
- FIG. 4 is a perspective view of a first member and a second member subjected to surface treatment according to an embodiment of the present disclosure.
- FIG 5 shows a state in which a first member and a second member are bonded according to an embodiment of the present disclosure.
- FIG. 6 is a perspective view of a strap according to another embodiment of the present disclosure.
- FIG. 7 is a flowchart illustrating an example of a method of manufacturing a strap according to an embodiment of the present disclosure.
- FIG. 8 is a flowchart illustrating an example of a method of manufacturing a strap according to another embodiment of the present disclosure.
- an upper portion of a figure may be referred to as a “top” or “upper side” of a configuration shown in the figure, and a lower portion thereof may be referred to as a “lower” or “lower side”.
- the portion between the upper and lower portions or the upper and lower portions of the illustrated configuration in the drawings may be referred to as “side” or “side”.
- Relative terms such as “upper” and “upper” may be used to describe relationships between components shown in the drawings, and the present disclosure is not limited by such terms.
- a direction toward an internal space of a structure may be referred to as “inside” and a direction protruding into an open external space may be referred to as “outside.”
- Relative terms such as “inner” and “outer” may be used to describe relationships between components shown in the drawings, and the present disclosure is not limited by such terms.
- references to "A and/or B" herein means A, or B, or A and B.
- strap 100 may be formed in a flat plate shape.
- the strap 100 may correspond to a rectangular parallelepiped plate having a pair of opposite surfaces having a large area.
- the strap 100 may be formed of one or more materials selected to be suitable for its use or use environment.
- the strap 100 may be formed in a width (y-axis direction), thickness (z-axis direction), and length (x-axis direction) suitable for a purpose or use environment.
- the strap 100 may include a first member 110 and a second member 120 .
- the first member 110 may include a first base 112 and a first core part 114
- the second member 120 may include a second base 122 and a second core part 124.
- the first member 110 and the second member 120 may have structures corresponding to each other.
- the first base 112 may form a basic outer shape of the first member 110 .
- the first member 110 may also be formed in a flat plate shape.
- the first base 112 may be configured to have a lower surface.
- the first core part 114 may be formed on the lower surface of the first base 112 .
- the first core part 114 may be engraved on the lower surface of the first base 112 .
- one surface of the first core part 114 may be located on the same plane as the lower surface of the first base 112, and the rest except for one surface of the first core part 114 is the first base. (112).
- the second base 122 may form a basic outline of the second member 120 .
- the second member 120 may also be formed in a flat plate shape.
- the second base 122 may be configured to have a top surface.
- the second core part 124 may be formed on the upper surface of the second base 122 .
- the second core part 124 may be engraved on the lower surface of the second base 122 .
- one surface of the second core part 124 may be located on the same plane as the upper surface of the second base 122, and the rest except for one surface of the second core part 124 is the second base. (122).
- first base 112 , the first core portion 114 , the second base 122 , and the second core portion 124 may vary depending on the purpose and use environment of the strap 100 .
- the first base 112 and the second base 122 may be made of a material that maintains durability in a plasma environment.
- the first base 112 and the second base 122 may be made of stainless steel, Elgiloy, Hasteloy, Astroloy, Inconel, René (Rene), Udimet, Waspaloy, Nimonie, Incoloy, Pyromet, Discaloy, and the like.
- the first base 112 and the second base 122 may correspond to STS304.
- the first base 112 and the second base 122 may correspond to different materials among the above materials.
- the first core portion 114 and/or the second core portion 124 may be made of at least one of Cu, BeCu, CuFe, CuNi, CuCr, and CuW.
- the strap 100 may have a thickness of 300 ⁇ m or less in the z-axis direction and a width of 100 mm or less in the y-axis direction. In the case of designing such a thickness, elasticity and durability of the strap can be maintained together while maintaining high conductivity of the core portion.
- the core part is broken or the thickness of the core part is not sufficiently secured, so that sufficient conductivity for use in the RF strap is not secured. problems may arise.
- the thickness of the RF strap is too thick, a phenomenon in which elasticity of the RF strap for use in a plasma process equipment is not secured also occurs.
- the first base 112 and the second base 122 are made of stainless steel, for example, STS304, and the first core part 114 and the second core part 124 are made of copper or a copper alloy.
- the thickness of the strap 100 in the z-axis direction is 300 ⁇ m or less
- the width of the strap 100 in the y-axis direction is 100 mm or less, thereby solving the above problems.
- the first core part 114 and the second core part 124 are made of copper or a copper alloy
- the first base 112 and the second base 122 are made of Elgiloy or Hastelloy. Hasteloy, Aastroloy, Inconel, Rene, Udimet, Waspaloy, Nimonie, Incoloy, Pyromet ), it can also be applied when it corresponds to Discaloy, etc.
- At least a portion of the lower surface of the first base 112 and the upper surface of the second base 122 may be surface-treated.
- the lower surface 116 of the first base 112 may be surface-treated
- the upper surface 126 of the second base 122 may be surface-treated.
- Surface roughness of the surfaces 116 and 126 of the first base 112 and/or the second base 122 subjected to surface treatment may increase.
- methods such as physical polishing, heat treatment or cooling treatment, and solution treatment may be used to treat the surface of the first base 112 and/or the second base 122 .
- surface roughness of the first base 112 and/or the second base 122 may be increased by using at least one of a chemical etching method and a physical scratching method for surface treatment.
- the chemical etching method may use at least one of an organic solvent cleaning method, a basic solution cleaning method, and an acid solution cleaning method
- a physical scratching method may include a shot blasting method and a wire brushing method.
- at least one of wire abrasion, sand blasting, and machining may be used.
- the durability of the RF strap can be remarkably improved by surface treatment and then rolling treatment on the surface of the base.
- the strap 100 may have a form in which the first member 110 and the second member 120 are joined. Specifically, as shown in FIG. 1, the strap 100 has a first core portion 114 and a second core portion 124 facing each other so that the first member 110 and the second member 120 are bonded. can be in the form In this case, the strap 100 may be formed with a bonding surface 130 where the lower surface of the first base 112 and the upper surface of the second base 122 come into contact.
- the first member 110 includes the first base 112 and the first core portion 114
- the second member 120 includes the second base 122 and the second core portion ( 124), but is not limited thereto.
- the second member 120 of the strap 100 may include only the second base 122 without the second core portion 124 .
- only one of the two members of the strap 100 may include a core portion (see FIG. 6 ).
- Figure 2 is a perspective view of the first member 210 and the second member 220 formed intaglio according to an embodiment of the present disclosure.
- the first member 210 shown in FIG. 2 (a) and the second member 220 shown in FIG. 2 (b) are the first member 110 and the second member 120 shown in FIG. 1, respectively. can be matched.
- the first member 210 includes a first base 230 and a first core part 240
- the second member 220 includes a second base 250 and a second core.
- a portion 260 may be included.
- the first base 230, the first core part 240, the second base 250 and the second core part 260 shown in FIG. 2 are the first base 112 shown in FIG. 1, the first The core portion 114, the second base 122, and the second core portion 124 may correspond to each other.
- the first core portion 240 may be formed intaglio.
- the second core part 260 may be formed intaglio at the central part of the upper surface of the second base 250 of the second member 220 .
- the intaglio formation may correspond to inlay cladding.
- the first member 210 includes the first base 230 and the first core part 240, and the second member 220 includes the second base 250 and the second core part 260, but is limited thereto. It doesn't work.
- the second member 220 of the strap may include only the second base 250 without the second core part 260 .
- the first member 210 of the strap may include only the first base 230 without the first core portion 240 .
- the strap may have the structure of the strap shown in FIG. 6 .
- FIG. 3 is a perspective view of a member according to various embodiments of the present disclosure.
- the member 310 shown in FIG. 3(a) or the member 320 shown in FIG. 3(b) is the first member 210 shown in FIG. 2(a) and/or shown in FIG. 2(b) may correspond to the second member 220.
- the core portion may be divided into two or more.
- the core part of the member 310 may be composed of two core parts 312 and 314 divided along the x-axis direction of the strap.
- the core portion of the member 320 may be composed of two core portions 322 and 324 divided along the y-axis direction of the strap.
- the divided core parts may be spaced apart from each other as shown in FIG. 3(c).
- the above-described core portion is shown as being divided into two, respectively, but is not limited thereto.
- the core portion may include core portions of different materials divided into an arbitrary number suitable for the use and/or use environment of the strap.
- FIG 4 is a perspective view of the first member 210 and the second member 220 subjected to surface treatment according to an embodiment of the present disclosure.
- Members obtained by surface treatment of the members disclosed in FIGS. 2(a) and 2(b) may correspond to the members shown in FIGS. 4(a) and 4(b), respectively.
- the lower surface of the first member 210 and the upper surface of the second member 220 are treated so that the lower surface of the first member 210 and the upper surface of the second member 220 can be easily bonded.
- the lower surface of the first member 210 and the upper surface of the second member 220 are made of a material that is not easily bonded (eg, stainless steel), the first member 210 and the second member 220 ) may be difficult to connect. Accordingly, the lower surface of the first member 210 and/or the upper surface of the second member 220 may be surface treated to facilitate bonding.
- the lower surface of the first member 210 and the upper surface of the second member 220 are bonded to each other through surface treatment.
- the roughness of the lower surface of the first member 210 and the upper surface of the second member 220 may be increased.
- a buffer layer may be inserted between the first member 210 and the second member 220 to increase adhesion between the members.
- the present disclosure is not limited thereto.
- the core portion may be engraved on the member.
- the surface treatment of the member brings about an effect of improving the bonding force during bonding between the members described in FIG. 5 .
- the following data is data when both members are made of stainless steel, and it can be confirmed that the surface roughness of at least the members must be 10 ⁇ m or more.
- the plasma environment durability test was conducted by installing the strap on a plasma device, repeating the bending and unfolding motion 300 times (based on 10 years of use of the device), and then checking the durability of the strap.
- FIG 5 shows a state in which the first member 210 and the second member 220 are bonded according to an embodiment of the present disclosure.
- a method such as rolling or pressure welding may be used to press the first member 210 and the second member 220 .
- the first member and the second member may be passed between rotating rolls and pressed.
- the first member and The second member can be simply pressed in the vertical direction.
- Rolling process conditions according to an embodiment are as follows.
- FIG. 7 is a flowchart illustrating an example of a method of manufacturing a strap according to an embodiment of the present disclosure.
- a first member having a first core part engraved on the lower surface of the first base is formed (S710).
- a second member having a second core part engraved on the upper surface of the second base is formed (S720).
- the first base and the second base may correspond to stainless steel.
- At least a part of the lower surface of the first member and the upper surface of the second member is subjected to surface treatment (S730).
- Surface roughness can be increased by surface treatment.
- the first member and the second member are bonded so that the first core portion and the second core portion face each other (S740).
- the first member and the second member may be joined by applying pressure to the first member and the second member in the direction of the arrow shown in FIG. 5 while the first member and the second member face each other.
- FIG. 8 is a flowchart illustrating an example of a method of manufacturing a strap according to another embodiment of the present disclosure.
- a first member having a first core part engraved on the lower surface of the first base is formed (S810).
- a second member including a second base having an upper surface is formed (S820).
- the first base and the second base correspond to stainless steel.
- At least a part of the lower surface of the first member and the upper surface of the second member is subjected to surface treatment (S830). Surface roughness can be increased by surface treatment.
- the first member and the second member are joined so that the first core portion and the upper surface face each other (S840).
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Purses, Travelling Bags, Baskets, Or Suitcases (AREA)
Abstract
A strap according to one embodiment of the present disclosure comprises: a first member including a first base having a lower surface, and a first core part engraved in the lower surface; and a second member including a second base having an upper surface, and a second core part engraved in the upper surface, wherein at least a portion of the lower surface and the upper surface is surface-treated, the first member is bonded to the second member so that the first core part faces the second core part, and thus a junction surface is formed between the upper surface and the lower surface, and the first base and the second base correspond to stainless steel.
Description
본 개시는 스트랩(strap) 및 그 제조 방법에 관한 것으로, 보다 상세하게는 코어부를 포함하는 스트랩 및 그 제조 방법에 관한 것이다.The present disclosure relates to a strap and a manufacturing method thereof, and more particularly, to a strap including a core portion and a manufacturing method thereof.
[과제고유번호] 2121008 [Assignment identification number] 2121008
[과제번호] E2121008 [Assignment number] E2121008
[부처명] 경기도 [Name of department] Gyeonggi-do
[과제관리(전문)기관명] (재)경기도경제과학진흥원 [Task management (professional) organization name] Gyeonggi Province Economic Science Promotion Agency
[연구사업명] 2021년 소부장 기업 육성 지원사업 [Research project name] 2021 small-manufacturing company development support project
[연구과제명] 반도체 플라즈마 공정장비 전자파 대책용 RF 스트랩 개발 [Research project title] Development of RF strap for electromagnetic wave countermeasures for semiconductor plasma process equipment
[기여율] 1/1 [Contribution rate] 1/1
[과제수행기관명] (주)에스엠티 [Name of project performing organization] SMT Co., Ltd.
[연구기간] 2021.05.01 ~ 2021.12.31 [Research period] 2021.05.01 ~ 2021.12.31
일반적으로 반도체, 태양광 패널 또는 액정 디스플레이(LCD) 등에 사용되는 기판 상에 박막을 증착하기 위해 플라즈마 처리 장치가 이용된다. 플라즈마 처리 장치는 에칭, 물리 기상 증착(PVD), 화학 기상 증착(CVD), 이온 주입, 레지스트 제거를 포함하는 기술을 이용하여 기판을 처리하는 장치이다. 플라즈마 처리 장치는 상부 전극 및 하부 전극을 포함하는 반응 챔버를 포함한다. 상부 전극과 하부 전극 사이에 기판을 위치시키고, 양 전극 사이의 공간에 플라즈마를 발생시켜 처리 가스를 플라즈마 상태로 여기하여 반응 챔버에서 기판을 처리한다.In general, a plasma processing apparatus is used to deposit a thin film on a substrate used for a semiconductor, a solar panel, or a liquid crystal display (LCD). Plasma processing devices are devices that process substrates using techniques including etching, physical vapor deposition (PVD), chemical vapor deposition (CVD), ion implantation, and resist removal. A plasma processing apparatus includes a reaction chamber including an upper electrode and a lower electrode. A substrate is positioned between the upper electrode and the lower electrode, and plasma is generated in a space between the electrodes to excite the processing gas into a plasma state, thereby processing the substrate in the reaction chamber.
기판을 처리하는 과정에서, 양 전극 중 어느 한 전극에는 RF 전원이 인가되고 다른 전극은 접지된다. 종래의 PE(Plasma Enhanced) 방식의 플라즈마 처리 장치에는 상부 전극에 RF 전원이 인가되고, 하부 전극의 하면에 설치된 브라켓은 RF 스트랩을 통해 고정됨으로써 챔버 바닥의 접지 수단에 의해 접지된다. 이 경우, 기판을 적재하는 역할도 수행하는 하부 전극은 기판의 공급, 플라즈마 처리, 기판의 외부 반출에 따라 계속적으로 상하 운동을 한다. 이에 따라, 하부 전극의 하면에 부착된 브라켓과 챔버 바닥을 전기적으로 연결하는 접지 수단인 RF 스트랩은 하부 전극의 반복적인 승강 동작에 따라 휘어지고 펴짐이 반복된다.In the course of processing the substrate, RF power is applied to one of both electrodes and the other electrode is grounded. In a conventional PE (Plasma Enhanced) type plasma processing apparatus, RF power is applied to an upper electrode, and a bracket installed on a lower surface of a lower electrode is fixed through an RF strap to be grounded by a grounding means at the bottom of the chamber. In this case, the lower electrode, which also serves to load the substrate, continuously moves up and down according to supply of the substrate, plasma treatment, and transport of the substrate to the outside. Accordingly, the RF strap, which is a grounding means for electrically connecting the bracket attached to the lower surface of the lower electrode and the bottom of the chamber, is repeatedly bent and unfolded according to the repetitive lifting operation of the lower electrode.
본 명세서에서 개시되는 실시예들은, 코어부를 포함하는 복수의 부재가 접합된 스트랩 및 그 제조 방법을 제공한다.Embodiments disclosed herein provide a strap in which a plurality of members including a core portion are joined, and a manufacturing method thereof.
본 명세서에서 개시되는 실시예들에 따르면, 플라즈마 환경에 노출되는 RF 스트랩에서 문제가 되는 플라즈마 에칭에 의한 수명 단축문제와 스테인리스 스틸(stainless steel) 계통 소재들을 사용함에 따른 낮은 전기전도도로 인한 RF 그라운딩 특성 저하문제를 동시에 해결할 수 있다.According to the embodiments disclosed herein, the RF grounding characteristics due to the low electrical conductivity due to the use of stainless steel based materials and the life shortening problem due to plasma etching, which is a problem in the RF strap exposed to the plasma environment The degradation problem can be solved at the same time.
본 개시의 일 실시예에 따른 스트랩은, 하면을 가지는 제1 베이스 및 하면에 음각 형성된 제1 코어부를 포함하는 제1 부재, 및 상면을 가지는 제2 베이스 및 상면에 음각 형성된 제2 코어부를 포함하는 제2 부재를 포함하고, 하면 및 상면 중 적어도 일부는 표면처리되고, 제1 코어부와 제2 코어부가 서로 마주보도록 제1 부재 및 제2 부재가 접합되어 상면과 하면 간의 접합면이 형성되고, 제1 베이스 및 제2 베이스는 스테인리스 스틸(stainless steel), 엘질로이(Elgiloy), 하스텔로이(Hasteloy), 애스트롤로이(Aastroloy), 인코넬(Inconel), 르네(Rene), 유디메트(Udimet), 와스팔로이(Waspaloy), 니모니(Nimonie), 인콜로이(Incoloy), 파이로메트(Pyromet), 디스칼로이(Discaloy) 중 하나에 해당한다.A strap according to an embodiment of the present disclosure includes a first member including a first base having a lower surface and a first core portion engraved on the lower surface, and a second base having an upper surface and a second core portion engraved on the upper surface. It includes a second member, and at least some of the lower surface and the upper surface are surface-treated, and the first and second members are bonded so that the first core portion and the second core portion face each other to form a joint surface between the upper and lower surfaces, The first base and the second base are made of stainless steel, Elgiloy, Hasteloy, Astroloy, Inconel, Rene, Udimet, Corresponds to Waspaloy, Nimonie, Incoloy, Pyromet, or Discaloy.
일 실시예에 따르면, 제1 부재 및 제2 부재는 서로 대응하는 구조를 가진다.According to one embodiment, the first member and the second member have structures corresponding to each other.
일 실시예에 따르면, 표면처리에 의해 표면의 거칠기(roughness)가 증가한다.According to one embodiment, surface roughness is increased by surface treatment.
일 실시예에 따르면, 제1 코어부는 Cu 또는 BeCu에 해당하고, 스트랩의 두께는 300μm 이하이고, 폭은 100mm 이하이다.According to one embodiment, the first core portion corresponds to Cu or BeCu, the thickness of the strap is 300 μm or less, and the width is 100 mm or less.
본 개시의 다른 실시예에 따른 스트랩은, 하면을 가지는 제1 베이스 및 하면에 음각 형성된 제1 코어부를 포함하는 제1 부재, 및 상면을 가지는 제2 베이스를 포함하는 제2 부재를 포함하고, 하면 및 상면 중 적어도 일부는 표면처리되고, 제1 코어부와 상면이 서로 마주보도록 제1 부재 및 제2 부재가 접합되어 상면과 하면 간의 접합면이 형성되고, 제1 베이스 및 제2 베이스는 스테인리스 스틸에 해당한다.A strap according to another embodiment of the present disclosure includes a first member including a first base having a lower surface and a first core portion formed intaglio on the lower surface, and a second member including a second base having an upper surface, and And at least a part of the upper surface is surface-treated, the first member and the second member are bonded so that the first core portion and the upper surface face each other to form a joint surface between the upper surface and the lower surface, and the first base and the second base are made of stainless steel. corresponds to
본 개시의 다른 실시예에 따른 스트랩 제조 방법은, 제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성하는 단계, 제2 베이스의 상면에 제2 코어부가 음각 형성된 제2 부재를 형성하는 단계, 및 제1 코어부와 제2 코어부가 서로 마주보도록 제1 부재 및 제2 부재를 접합하는 단계를 포함하고, 제1 베이스 및 제2 베이스는 스테인리스 스틸에 해당한다.A strap manufacturing method according to another embodiment of the present disclosure includes forming a first member on the lower surface of a first base with a first core portion engraved thereon, forming a second member on an upper surface of a second base with a second core portion engraved thereon. and bonding the first member and the second member so that the first core part and the second core part face each other, and the first base and the second base correspond to stainless steel.
일 실시예에 따르면, 접합하는 단계 이전에, 제1 부재의 하면 및 제2 부재의 상면 중 적어도 일부를 표면처리하는 단계를 더 포함한다.According to one embodiment, prior to the joining step, surface treatment of at least a portion of the lower surface of the first member and the upper surface of the second member is further included.
일 실시예에 따르면, 표면처리에 의해 표면의 거칠기가 증가한다.According to one embodiment, surface roughness is increased by surface treatment.
일 실시예에 따르면, 제1 부재 및 제2 부재는 서로 대응하는 구조를 가진다.According to one embodiment, the first member and the second member have structures corresponding to each other.
본 개시의 다른 실시예에 따른 스트랩 제조 방법은, 제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성하는 단계, 상면을 가지는 제2 베이스를 포함하는 제2 부재를 형성하는 단계, 및 제1 코어부와 상면이 서로 마주보도록 제1 부재 및 제2 부재를 접합하는 단계를 포함하고, 제1 베이스 및 제2 베이스는 스테인리스 스틸에 해당한다.A strap manufacturing method according to another embodiment of the present disclosure includes forming a first member having a first core portion engraved on a lower surface of a first base, forming a second member including a second base having an upper surface, and bonding the first member and the second member so that the first core portion and the upper surface thereof face each other, wherein the first base and the second base correspond to stainless steel.
본 개시의 다양한 실시예들에 따르면, 스트랩 제조 시 제1 부재와 제2 부재를 접합시킴으로써 스트랩의 폭, 두께 또는 길이 조절이 가능하므로, 용도 또는 사용환경에 적합한 스트랩 제조가 가능하다.According to various embodiments of the present disclosure, since the width, thickness, or length of the strap can be adjusted by bonding the first member and the second member when manufacturing the strap, it is possible to manufacture a strap suitable for use or use environment.
또한, 본 개시의 다양한 실시예들에 따르면, 탄성이 오래 동안 유지되는 스트랩 제조가 가능하다.In addition, according to various embodiments of the present disclosure, it is possible to manufacture a strap whose elasticity is maintained for a long time.
또한, 본 개시의 다양한 실시예들에 따르면, 우수한 도전성을 갖는 소재로 이루어진 코어부를 내구성이 높은 소재로 구성된 베이스가 커버함으로써, 스트랩의 높은 도전성은 유지함과 동시에 내부식성, 내플라즈마성이 개선될 수 있다.In addition, according to various embodiments of the present disclosure, the base made of a material with high durability covers the core part made of a material having excellent conductivity, so that the high conductivity of the strap is maintained and the corrosion resistance and plasma resistance can be improved. have.
본 개시의 효과는 이상에서 언급한 효과로 제한되지 않으며, 언급되지 않은 다른 효과들은 청구범위의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.Effects of the present disclosure are not limited to the effects mentioned above, and other effects not mentioned will be clearly understood by those skilled in the art from the description of the claims.
도 1은 본 개시의 일 실시예에 따른 스트랩의 사시도이다.1 is a perspective view of a strap according to an embodiment of the present disclosure.
도 2는 본 개시의 일 실시예에 따라 음각 형성된 제1 부재 및 제2 부재의 사시도이다.Figure 2 is a perspective view of a first member and a second member formed intaglio according to an embodiment of the present disclosure.
도 3은 본 개시의 다양한 실시예에 따른 부재의 투시사시도이다.3 is a perspective view of a member according to various embodiments of the present disclosure.
도 4는 본 개시의 일 실시예에 따라 표면처리된 제1 부재 및 제2 부재의 사시도이다.4 is a perspective view of a first member and a second member subjected to surface treatment according to an embodiment of the present disclosure.
도 5는 본 개시의 일 실시예에 따라 제1 부재 및 제2 부재가 접합되는 모습을 나타낸다.5 shows a state in which a first member and a second member are bonded according to an embodiment of the present disclosure.
도 6은 본 개시의 또 다른 실시예에 따른 스트랩의 사시도이다.6 is a perspective view of a strap according to another embodiment of the present disclosure.
도 7은 본 개시의 일 실시예에 따른 스트랩 제조방법의 예시를 나타내는 흐름도이다.7 is a flowchart illustrating an example of a method of manufacturing a strap according to an embodiment of the present disclosure.
도 8은 본 개시의 또 다른 실시예에 따른 스트랩 제조방법의 예시를 나타내는 흐름도이다.8 is a flowchart illustrating an example of a method of manufacturing a strap according to another embodiment of the present disclosure.
이하, 본 개시의 실시를 위한 구체적인 내용을 첨부된 도면을 참조하여 상세히 설명한다. 다만, 이하의 설명에서는 본 개시의 요지를 불필요하게 흐릴 우려가 있는 경우, 널리 알려진 기능이나 구성에 관한 구체적 설명은 생략하기로 한다.Hereinafter, specific details for the implementation of the present disclosure will be described in detail with reference to the accompanying drawings. However, in the following description, if there is a risk of unnecessarily obscuring the gist of the present disclosure, detailed descriptions of well-known functions or configurations will be omitted.
첨부된 도면에서, 동일하거나 대응하는 구성요소에는 동일한 참조부호가 부여되어 있다. 또한, 이하의 실시예들의 설명에 있어서, 동일하거나 대응되는 구성요소를 중복하여 기술하는 것이 생략될 수 있다. 그러나, 구성요소에 관한 기술이 생략되어도, 그러한 구성요소가 어떤 실시예에 포함되지 않는 것으로 의도되지는 않는다.In the accompanying drawings, identical or corresponding elements are given the same reference numerals. In addition, in the description of the following embodiments, overlapping descriptions of the same or corresponding components may be omitted. However, omission of a description of a component does not intend that such a component is not included in an embodiment.
본 개시에서 사용되는 용어에 대해 간략히 설명하고, 개시된 실시예에 대해 구체적으로 설명하기로 한다. 본 명세서에서 사용되는 용어는 본 개시에서의 기능을 고려하면서 가능한 현재 널리 사용되는 일반적인 용어들을 선택하였으나, 이는 관련 분야에 종사하는 기술자의 의도 또는 판례, 새로운 기술의 출현 등에 따라 달라질 수 있다. 또한, 특정한 경우는 출원인이 임의로 선정한 용어도 있으며, 이 경우 해당되는 발명의 설명 부분에서 상세히 그 의미를 기재할 것이다. 따라서, 본 개시에서 사용되는 용어는 단순한 용어의 명칭이 아닌, 그 용어가 가지는 의미와 본 개시의 전반에 걸친 내용을 토대로 정의되어야 한다.Terms used in this disclosure will be briefly described, and the disclosed embodiments will be described in detail. The terms used in this specification have been selected from general terms that are currently widely used as much as possible while considering the functions in the present disclosure, but they may vary according to the intention of a person skilled in the related field, a precedent, or the emergence of new technologies. In addition, in a specific case, there is also a term arbitrarily selected by the applicant, and in this case, the meaning will be described in detail in the description of the invention. Therefore, the terms used in the present disclosure should be defined based on the meaning of the terms and the general content of the present disclosure, not simply the names of the terms.
본 개시에서, 단수의 표현은 문맥상 명백하게 단수인 것으로 특정하지 않는 한, 복수의 표현을 포함한다. 또한, 복수의 표현은 문맥상 명백하게 복수인 것으로 특정하지 않는 한, 단수의 표현을 포함한다.In this disclosure, expressions in the singular number include plural expressions unless the context clearly dictates that they are singular. Also, plural expressions include singular expressions unless the context clearly specifies that they are plural.
본 개시에서, 어떤 부분이 어떤 구성요소를 포함한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있음을 의미한다.In the present disclosure, when a part includes a certain component, this means that it may further include other components without excluding other components unless otherwise stated.
본 개시에서, 도면의 위쪽은 그 도면에 도시된 구성의 "상부" 또는 "상측", 그 아래쪽은 "하부" 또는 "하측"이라고 지칭할 수 있다. 또한, 도면에 있어서 도시된 구성의 상부와 하부의 사이 또는 상부와 하부를 제외한 나머지 부분은 "측부" 또는 "측면"이라고 지칭할 수 있다. 이러한 "상부", "상측" 등과 같은 상대적인 용어는, 도면에 도시된 구성들 간의 관계를 설명하기 위하여 사용될 수 있으며, 본 개시는 그러한 용어에 의해 한정되지 않는다.In the present disclosure, an upper portion of a figure may be referred to as a “top” or “upper side” of a configuration shown in the figure, and a lower portion thereof may be referred to as a “lower” or “lower side”. In addition, the portion between the upper and lower portions or the upper and lower portions of the illustrated configuration in the drawings may be referred to as “side” or “side”. Relative terms such as “upper” and “upper” may be used to describe relationships between components shown in the drawings, and the present disclosure is not limited by such terms.
본 개시에서, 한 구조물의 내부 공간으로 향하는 방향을 "내측", 개방된 외부 공간으로 돌출된 방향을 "외측"이라고 지칭할 수 있다. 이러한 "내측", "외측" 등과 같은 상대적인 용어는, 도면에 도시된 구성들 간의 관계를 설명하기 위하여 사용될 수 있으며, 본 개시는 그러한 용어에 의해 한정되지 않는다.In the present disclosure, a direction toward an internal space of a structure may be referred to as “inside” and a direction protruding into an open external space may be referred to as “outside.” Relative terms such as “inner” and “outer” may be used to describe relationships between components shown in the drawings, and the present disclosure is not limited by such terms.
본 명세서에서 "A 및/또는 B"의 기재는 A, 또는 B, 또는 A 및 B를 의미한다.Reference to "A and/or B" herein means A, or B, or A and B.
본원 명세서에서, 어떤 부분이 다른 부분과 연결되어 있다고 할 때, 이는 직접적으로 연결되어 있는 경우 뿐 아니라, 그 중간에 다른 구성을 사이에 두고 연결되어 있는 경우도 포함한다.In the present specification, when a part is said to be connected to another part, this includes not only the case where it is directly connected, but also the case where it is connected with another component in between.
개시된 실시예의 이점 및 특징, 그리고 그것들을 달성하는 방법은 첨부되는 도면과 함께 후술되어 있는 실시예들을 참조하면 명확해질 것이다. 그러나, 본 개시는 이하에서 개시되는 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 구현될 수 있으며, 단지 본 실시예들은 본 개시가 완전하도록 하고, 본 개시가 통상의 기술자에게 발명의 범주를 완전하게 알려주기 위해 제공되는 것일 뿐이다.Advantages and features of the disclosed embodiments, and methods of achieving them, will become apparent with reference to the following embodiments in conjunction with the accompanying drawings. However, the present disclosure is not limited to the embodiments disclosed below and may be implemented in various different forms, but only the present embodiments make the present disclosure complete, and the present disclosure does not extend the scope of the invention to those skilled in the art. It is provided only for complete information.
도 1은 본 개시의 일 실시예에 따른 스트랩(100)의 사시도이다. 일 실시예에서, 스트랩(100)은 평판형으로 형성될 수 있다. 예를 들어 도 1에 도시된 바와 같이, 스트랩(100)은 한 쌍의 대향 면이 넓은 면적을 갖도록 형성된 직육면체 형태의 판에 해당할 수 있다. 일 실시예에서, 스트랩(100)은 그 용도 또는 사용 환경에 적합하도록 선정된 하나 이상의 소재로 형성될 수 있다. 예를 들어, 스트랩(100)은 용도 또는 사용 환경에 적합한 폭(y축 방향), 두께(z축 방향), 길이(x축 방향)로 형성될 수 있다.1 is a perspective view of a strap 100 according to one embodiment of the present disclosure. In one embodiment, strap 100 may be formed in a flat plate shape. For example, as shown in FIG. 1 , the strap 100 may correspond to a rectangular parallelepiped plate having a pair of opposite surfaces having a large area. In one embodiment, the strap 100 may be formed of one or more materials selected to be suitable for its use or use environment. For example, the strap 100 may be formed in a width (y-axis direction), thickness (z-axis direction), and length (x-axis direction) suitable for a purpose or use environment.
도 1에 도시된 바와 같이, 스트랩(100)은 제1 부재(110) 및 제2 부재(120)를 포함할 수 있다. 이 경우, 제1 부재(110)는 제1 베이스(112) 및 제1 코어부(114)를 포함할 수 있고, 제2 부재(120)는 제2 베이스(122) 및 제2 코어부(124)를 포함할 수 있다. 일 실시예에서, 제1 부재(110)와 제2 부재(120)는 서로 대응하는 구조를 가질 수 있다.As shown in FIG. 1 , the strap 100 may include a first member 110 and a second member 120 . In this case, the first member 110 may include a first base 112 and a first core part 114, and the second member 120 may include a second base 122 and a second core part 124. ) may be included. In one embodiment, the first member 110 and the second member 120 may have structures corresponding to each other.
제1 부재(110)에서, 제1 베이스(112)는 제1 부재(110)의 기초 외형을 형성할 수 있다. 예를 들어, 제1 베이스(112)가 평판형으로 형성될 경우, 제1 부재(110)도 평판형으로 형성될 수 있다. 일 실시예에서, 제1 베이스(112)는 하면을 갖도록 구성될 수 있다. 이 경우, 제1 베이스(112)의 하면에는 제1 코어부(114)가 형성될 수 있다. 도 1에 도시된 바와 같이, 제1 코어부(114)는 제1 베이스(112)의 하면에 음각 형성될 수 있다. 이 경우, 제1 코어부(114)의 일 면은 제1 베이스(112)의 하면과 동일 평면 상에 위치할 수 있고, 제1 코어부(114)의 일 면을 제외한 나머지 부분은 제1 베이스(112)에 의해 둘러싸일 수 있다.In the first member 110 , the first base 112 may form a basic outer shape of the first member 110 . For example, when the first base 112 is formed in a flat plate shape, the first member 110 may also be formed in a flat plate shape. In one embodiment, the first base 112 may be configured to have a lower surface. In this case, the first core part 114 may be formed on the lower surface of the first base 112 . As shown in FIG. 1 , the first core part 114 may be engraved on the lower surface of the first base 112 . In this case, one surface of the first core part 114 may be located on the same plane as the lower surface of the first base 112, and the rest except for one surface of the first core part 114 is the first base. (112).
제2 부재(120)에서, 제2 베이스(122)는 제2 부재(120)의 기초 외형을 형성할 수 있다. 예를 들어, 제2 베이스(122)가 평판형으로 형성될 경우, 제2 부재(120)도 평판형으로 형성될 수 있다. 일 실시예에서, 제2 베이스(122)는 상면을 갖도록 구성될 수 있다. 이 경우, 제2 베이스(122)의 상면에는 제2 코어부(124)가 형성될 수 있다. 도 1에 도시된 바와 같이, 제2 코어부(124)는 제2 베이스(122)의 하면에 음각 형성될 수 있다. 이 경우, 제2 코어부(124)의 일 면은 제2 베이스(122)의 상면과 동일 평면 상에 위치할 수 있고, 제2 코어부(124)의 일 면을 제외한 나머지 부분은 제2 베이스(122)에 의해 둘러싸일 수 있다.In the second member 120 , the second base 122 may form a basic outline of the second member 120 . For example, when the second base 122 is formed in a flat plate shape, the second member 120 may also be formed in a flat plate shape. In one embodiment, the second base 122 may be configured to have a top surface. In this case, the second core part 124 may be formed on the upper surface of the second base 122 . As shown in FIG. 1 , the second core part 124 may be engraved on the lower surface of the second base 122 . In this case, one surface of the second core part 124 may be located on the same plane as the upper surface of the second base 122, and the rest except for one surface of the second core part 124 is the second base. (122).
제1 베이스(112), 제1 코어부(114), 제2 베이스(122) 및 제2 코어부(124)의 재질은 스트랩(100)의 용도 및 사용 환경에 따라 달라질 수 있다. 일 실시예에서, 스트랩(100)이 플라즈마 공정 설비에 사용되는 RF 스트랩일 경우, 제1 베이스(112) 및 제2 베이스(122)는 플라즈마 환경에서 내구성을 유지하는 재질로 구성될 수 있다. 예를 들어, 제1 베이스(112) 및 제2 베이스(122)는 스테인리스 스틸(stainless steel), 엘질로이(Elgiloy), 하스텔로이(Hasteloy), 애스트롤로이(Aastroloy), 인코넬(Inconel), 르네(Rene), 유디메트(Udimet), 와스팔로이(Waspaloy), 니모니(Nimonie), 인콜로이(Incoloy), 파이로메트(Pyromet), 디스칼로이(Discaloy) 등에 해당할 수 있다. 구체적으로, 제1 베이스(112) 및 제2 베이스(122)는 STS304에 해당할 수 있다. 제1 베이스(112) 및 제2 베이스(122)는 상술한 재질 중 서로 다른 재질에 해당할 수 있다.Materials of the first base 112 , the first core portion 114 , the second base 122 , and the second core portion 124 may vary depending on the purpose and use environment of the strap 100 . In one embodiment, when the strap 100 is an RF strap used in a plasma process equipment, the first base 112 and the second base 122 may be made of a material that maintains durability in a plasma environment. For example, the first base 112 and the second base 122 may be made of stainless steel, Elgiloy, Hasteloy, Astroloy, Inconel, René (Rene), Udimet, Waspaloy, Nimonie, Incoloy, Pyromet, Discaloy, and the like. Specifically, the first base 112 and the second base 122 may correspond to STS304. The first base 112 and the second base 122 may correspond to different materials among the above materials.
일 실시예에서, RF 스트랩으로 이용하기 위해, 제1 코어부(114) 및/또는 제2 코어부(124)는 Cu, BeCu, CuFe, CuNi, CuCr, CuW 중 적어도 어느 하나로 제조될 수 있다. 이 경우, 스트랩(100)의 z축 방향 두께는 300 μm 이하이고, y축 방향 폭은 100 mm 이하일 수 있다. 이와 같은 두께로 설계할 경우, 코어부의 높은 도전성도 유지하면서 스트랩의 탄력성 및 내구성을 함께 유지할 수 있다. In one embodiment, for use as an RF strap, the first core portion 114 and/or the second core portion 124 may be made of at least one of Cu, BeCu, CuFe, CuNi, CuCr, and CuW. In this case, the strap 100 may have a thickness of 300 μm or less in the z-axis direction and a width of 100 mm or less in the y-axis direction. In the case of designing such a thickness, elasticity and durability of the strap can be maintained together while maintaining high conductivity of the core portion.
예컨대, 코어부를 베이스부에 음각 형성한 후 2 개의 부재를 압연 공정을 이용하여 접합하는 과정에서, 코어부가 끊기거나 코어부의 두께가 충분히 확보되지 않아 RF 스트랩에 사용하기 위한 충분한 코어부의 도전성을 확보하지 못하는 문제가 발생할 수 있다. 또한, RF 스트랩의 두께가 너무 두꺼울 경우 플라즈마 공정 설비에서 사용하기 위한 RF 스트랩의 탄성이 확보되지 않는 현상도 발생한다. For example, in the process of bonding the two members using a rolling process after forming the core part intaglio on the base part, the core part is broken or the thickness of the core part is not sufficiently secured, so that sufficient conductivity for use in the RF strap is not secured. problems may arise. In addition, when the thickness of the RF strap is too thick, a phenomenon in which elasticity of the RF strap for use in a plasma process equipment is not secured also occurs.
제1 베이스(112) 및 제2 베이스(122)를 스테인리스 스틸(stainless steel), 예컨대 STS304로 제조하고, 제1 코어부(114) 및 제2 코어부(124)는 구리 내지 구리합금으로 제조할 경우, 스트랩(100)의 z축 방향 두께는 300 μm 이하, 스트랩(100)의 y축 방향 폭은 100mm 이하로 제조함으로써 상술한 문제들을 해결할 수 있다. 이와 같은 수치는 제1 코어부(114) 및 제2 코어부(124)는 구리 내지 구리합금으로 제조하고, 제1 베이스(112) 및 제2 베이스(122)를 엘질로이(Elgiloy), 하스텔로이(Hasteloy), 애스트롤로이(Aastroloy), 인코넬(Inconel), 르네(Rene), 유디메트(Udimet), 와스팔로이(Waspaloy), 니모니(Nimonie), 인콜로이(Incoloy), 파이로메트(Pyromet), 디스칼로이(Discaloy) 등에 해당할 때에도 적용될 수 있다The first base 112 and the second base 122 are made of stainless steel, for example, STS304, and the first core part 114 and the second core part 124 are made of copper or a copper alloy. In this case, the thickness of the strap 100 in the z-axis direction is 300 μm or less, and the width of the strap 100 in the y-axis direction is 100 mm or less, thereby solving the above problems. These figures indicate that the first core part 114 and the second core part 124 are made of copper or a copper alloy, and the first base 112 and the second base 122 are made of Elgiloy or Hastelloy. Hasteloy, Aastroloy, Inconel, Rene, Udimet, Waspaloy, Nimonie, Incoloy, Pyromet ), it can also be applied when it corresponds to Discaloy, etc.
일 실시예에서, 제1 베이스(112)의 하면과 제2 베이스(122)의 상면 중 적어도 일부는 표면처리될 수 있다. 예를 들어, 도 1에 도시된 바와 제1 베이스(112)의 하면(116)은 표면처리될 수 있고, 제2 베이스(122)의 상면(126)은 표면처리될 수 있다. 표면처리되는 제1 베이스(112) 및/또는 제2 베이스(122)의 일 면(116, 126)은 표면의 거칠기(roughness)가 증가할 수 있다. 일 실시예에서, 제1 베이스(112) 및/또는 제2 베이스(122)의 표면처리를 위해 물리적 연마, 열처리 또는 냉각처리, 용액처리 등의 방법이 사용될 수 있다.In one embodiment, at least a portion of the lower surface of the first base 112 and the upper surface of the second base 122 may be surface-treated. For example, as shown in FIG. 1 , the lower surface 116 of the first base 112 may be surface-treated, and the upper surface 126 of the second base 122 may be surface-treated. Surface roughness of the surfaces 116 and 126 of the first base 112 and/or the second base 122 subjected to surface treatment may increase. In one embodiment, methods such as physical polishing, heat treatment or cooling treatment, and solution treatment may be used to treat the surface of the first base 112 and/or the second base 122 .
일 실시예에서, 제1 베이스(112) 및/또는 제2 베이스(122)의 표면처리를 위해 화학적인 에칭 방법 및 물리적인 스크래칭 방법 중 적어도 하나를 이용해 표면 표면 거칠기를 증가시킬 수 있다. 구체적으로, 화학적인 에칭 방법은 유기 용제 클리닝법, 염기성 용액 클리닝법 및 산성 용액 클리닝법 중 적어도 하나를 이용할 수 있고, 물리적인 스크래칭 방법은 쇼트 블라스팅법(shot blasting), 와이어 브러슁법(wire brushing), 와이어 마모법(wire abrasion), 샌드 블라스팅법(sand blasting) 및 기계가공법 (machining) 중 적어도 하나를 이용할 수 있다.In one embodiment, surface roughness of the first base 112 and/or the second base 122 may be increased by using at least one of a chemical etching method and a physical scratching method for surface treatment. Specifically, the chemical etching method may use at least one of an organic solvent cleaning method, a basic solution cleaning method, and an acid solution cleaning method, and a physical scratching method may include a shot blasting method and a wire brushing method. , at least one of wire abrasion, sand blasting, and machining may be used.
예컨대, 2 개의 부재가 접합되어 형성된 RF 스트랩이 플라즈마 환경에서 사용될 경우, RF 스트랩이 반복적으로 접혔다가 펴지는 과정에서 부재가 분리되는 등 내구성이 문제될 수 있다. 그에 따라, 베이스의 표면을 표면처리한 후 압연처리함으로써 RF 스트랩의 내구도를 현저히 향상시킬 수 있다.For example, when an RF strap formed by bonding two members is used in a plasma environment, durability may be a problem, such as separation of the members during repeated folding and unfolding of the RF strap. Accordingly, the durability of the RF strap can be remarkably improved by surface treatment and then rolling treatment on the surface of the base.
일 실시예에서, 스트랩(100)은 제1 부재(110)와 제2 부재(120)가 접합된 형태일 수 있다. 구체적으로 도 1에 도시된 바와 같이, 스트랩(100)은 제1 코어부(114)와 제2 코어부(124)가 서로 마주보도록 제1 부재(110) 및 제2 부재(120)가 접합된 형태일 수 있다. 이 경우, 스트랩(100)에는 제1 베이스(112)의 하면과 제2 베이스(122)의 상면이 접하는 접합면(130)이 형성될 수 있다.In one embodiment, the strap 100 may have a form in which the first member 110 and the second member 120 are joined. Specifically, as shown in FIG. 1, the strap 100 has a first core portion 114 and a second core portion 124 facing each other so that the first member 110 and the second member 120 are bonded. can be in the form In this case, the strap 100 may be formed with a bonding surface 130 where the lower surface of the first base 112 and the upper surface of the second base 122 come into contact.
이상 상술한 스트랩(100)은 제1 부재(110)가 제1 베이스(112) 및 제1 코어부(114)를, 제2 부재(120)가 제2 베이스(122) 및 제2 코어부(124)를 포함하나, 이에 한정되지 않는다. 예를 들어, 스트랩(100)의 제2 부재(120)는 제2 코어부(124) 없이 제2 베이스(122)만을 포함할 수 있다. 다른 예에서, 스트랩(100)의 2 개의 부재 중 어느 하나에만 코어부가 포함될 수 있다(도 6 참고).In the above-described strap 100, the first member 110 includes the first base 112 and the first core portion 114, and the second member 120 includes the second base 122 and the second core portion ( 124), but is not limited thereto. For example, the second member 120 of the strap 100 may include only the second base 122 without the second core portion 124 . In another example, only one of the two members of the strap 100 may include a core portion (see FIG. 6 ).
도 2는 본 개시의 일 실시예에 따라 음각 형성된 제1 부재(210) 및 제2 부재(220)의 사시도이다. 도 2(a)에 도시된 제1 부재(210) 및 도 2(b)에 도시된 제2 부재(220)는 도 1에 도시된 제1 부재(110) 및 제2 부재(120)와 각각 대응될 수 있다. 도 2에 도시된 바와 같이, 제1 부재(210)는 제1 베이스(230) 및 제1 코어부(240)를 포함하고, 제2 부재(220)는 제2 베이스(250) 및 제2 코어부(260)를 포함할 수 있다. 도 2에 도시된 제1 베이스(230), 제1 코어부(240), 제2 베이스(250) 및 제2 코어부(260)는, 도 1에 도시된 제1 베이스(112), 제1 코어부(114), 제2 베이스(122) 및 제2 코어부(124)와 각각 대응될 수 있다.Figure 2 is a perspective view of the first member 210 and the second member 220 formed intaglio according to an embodiment of the present disclosure. The first member 210 shown in FIG. 2 (a) and the second member 220 shown in FIG. 2 (b) are the first member 110 and the second member 120 shown in FIG. 1, respectively. can be matched. As shown in FIG. 2 , the first member 210 includes a first base 230 and a first core part 240, and the second member 220 includes a second base 250 and a second core. A portion 260 may be included. The first base 230, the first core part 240, the second base 250 and the second core part 260 shown in FIG. 2 are the first base 112 shown in FIG. 1, the first The core portion 114, the second base 122, and the second core portion 124 may correspond to each other.
일 실시예에 따르면, 제1 부재(210)의 제1 베이스(230)의 하면 중앙부에 제1 코어부(240)가 음각 형성될 수 있다. 제2 부재(220)의 제2 베이스(250)의 상면 중앙부에 제2 코어부(260)가 음각 형성될 수 있다. 음각 형성은 인레이 클래딩(inlay cladding)에 해당할 수 있다.According to one embodiment, when the first base 230 of the first member 210 has a central portion, the first core portion 240 may be formed intaglio. The second core part 260 may be formed intaglio at the central part of the upper surface of the second base 250 of the second member 220 . The intaglio formation may correspond to inlay cladding.
제1 부재(210)는 제1 베이스(230) 및 제1 코어부(240)를, 제2 부재(220)는 제2 베이스(250) 및 제2 코어부(260)를 포함하나, 이에 한정되지 않는다. 예를 들어, 스트랩의 제2 부재(220)는 제2 코어부(260) 없이 제2 베이스(250)만을 포함할 수 있다. 다른 예에서, 스트랩의 제1 부재(210)는 제1 코어부(240) 없이 제1 베이스(230)만을 포함할 수 있다. 이러한 경우, 스트랩은 도 6에 도시된 스트랩의 구조를 가질 수 있다.The first member 210 includes the first base 230 and the first core part 240, and the second member 220 includes the second base 250 and the second core part 260, but is limited thereto. It doesn't work. For example, the second member 220 of the strap may include only the second base 250 without the second core part 260 . In another example, the first member 210 of the strap may include only the first base 230 without the first core portion 240 . In this case, the strap may have the structure of the strap shown in FIG. 6 .
도 3은 본 개시의 다양한 실시예에 따른 부재의 투시사시도이다. 도 3(a)에 도시된 부재(310) 또는 도 3(b)에 도시된 부재(320)는 도 2(a)에 도시된 제1 부재(210) 및/또는 도 2(b)에 도시된 제2 부재(220)와 대응될 수 있다.3 is a perspective view of a member according to various embodiments of the present disclosure. The member 310 shown in FIG. 3(a) or the member 320 shown in FIG. 3(b) is the first member 210 shown in FIG. 2(a) and/or shown in FIG. 2(b) may correspond to the second member 220.
일 실시예에서, 코어부는 2 개 이상으로 분할될 수 있다. 예컨대, 부재(310)의 코어부는 스트랩의 x축 방향을 따라 분할된 2 개의 코어부(312, 314)로 구성될 수 있다. 또한, 부재(320)의 코어부는 스트랩의 y축 방향을 따라 분할된 2 개의 코어부(322, 324)로 구성될 수 있다.In one embodiment, the core portion may be divided into two or more. For example, the core part of the member 310 may be composed of two core parts 312 and 314 divided along the x-axis direction of the strap. In addition, the core portion of the member 320 may be composed of two core portions 322 and 324 divided along the y-axis direction of the strap.
일 실시에에서, 분할된 코어부는 도 3(c)에 도시된 바와 같이 서로 이격될 수 있다.In one embodiment, the divided core parts may be spaced apart from each other as shown in FIG. 3(c).
이상 상술한 코어부는 각각 2개로 분할된 것으로 도시되었으나, 이에 한정되지 않는다. 예를 들어, 코어부는 스트랩의 용도 및/또는 사용 환경에 적합하도록 임의의 개수로 분할된 서로 다른 재질의 코어부를 포함할 수 있다.The above-described core portion is shown as being divided into two, respectively, but is not limited thereto. For example, the core portion may include core portions of different materials divided into an arbitrary number suitable for the use and/or use environment of the strap.
도 4는 본 개시의 일 실시예에 따라 표면처리된 제1 부재(210) 및 제2 부재(220)의 사시도이다.4 is a perspective view of the first member 210 and the second member 220 subjected to surface treatment according to an embodiment of the present disclosure.
도 2(a) 및 도 2(b)에 개시된 부재를 표면처리한 부재가 각각 도 4(a) 및 도 4(b)에 도시된 부재에 해당할 수 있다.Members obtained by surface treatment of the members disclosed in FIGS. 2(a) and 2(b) may correspond to the members shown in FIGS. 4(a) and 4(b), respectively.
일 실시예에서, 제1 부재(210)의 하면과 제2 부재(220)의 상면이 표면처리됨으로써 제1 부재(210)의 하면과 제2 부재(220)의 상면은 접합이 용이할 수 있다. 예를 들어, 제1 부재(210)의 하면과 제2 부재(220)의 상면은 접합이 용이하지 않은 재질(예컨대 스테인리스 스틸)로 구성되는 경우, 제1 부재(210)와 제2 부재(220)를 접합시키는데 어려움이 있을 수 있다. 따라서, 제1 부재(210)의 하면 및/또는 제2 부재(220)의 상면은 접합이 용이하도록 표면처리될 수 있다. 예를 들어, 제1 부재(210)와 제2 부재(220)를 가압 또는 압연하는 경우, 제1 부재(210)의 하면과 제2 부재(220)의 상면이 서로 접합되도록, 표면처리를 통해 제1 부재(210)의 하면과 제2 부재(220)의 상면의 거칠기를 증가시킬 수 있다. 또는, 제1 부재(210) 및 제2 부재(220)의 사이에 부재 간의 접착력을 증가시키기 위해 버퍼층이 삽입될 수 있다.In one embodiment, the lower surface of the first member 210 and the upper surface of the second member 220 are treated so that the lower surface of the first member 210 and the upper surface of the second member 220 can be easily bonded. . For example, when the lower surface of the first member 210 and the upper surface of the second member 220 are made of a material that is not easily bonded (eg, stainless steel), the first member 210 and the second member 220 ) may be difficult to connect. Accordingly, the lower surface of the first member 210 and/or the upper surface of the second member 220 may be surface treated to facilitate bonding. For example, when pressing or rolling the first member 210 and the second member 220, the lower surface of the first member 210 and the upper surface of the second member 220 are bonded to each other through surface treatment. The roughness of the lower surface of the first member 210 and the upper surface of the second member 220 may be increased. Alternatively, a buffer layer may be inserted between the first member 210 and the second member 220 to increase adhesion between the members.
부재의 표면처리가 코어부의 음각 형성 후에 이루어지는 것으로 설명되어 있으나, 본 개시는 이에 제한되지 않는다. 예컨대, 부재의 표면처리가 이루어진 후 코어부가 부재에 음각 형성될 수 있다.Although it is described that the surface treatment of the member is performed after forming the intaglio of the core part, the present disclosure is not limited thereto. For example, after the surface treatment of the member is made, the core portion may be engraved on the member.
부재의 표면처리는 도 5에서 설명하는 부재 간의 접합 시 접합력을 향상시키는 효과를 가져온다. 하기 데이터는 양 부재가 모두 스테인리스에 해당할 때의 데이터로서, 적어도 부재의 표면 거칠기가 10 ㎛ 이상이어야 함을 확인할 수 있다.The surface treatment of the member brings about an effect of improving the bonding force during bonding between the members described in FIG. 5 . The following data is data when both members are made of stainless steel, and it can be confirmed that the surface roughness of at least the members must be 10 μm or more.
No.No. | 제1 부재 재질 거칠기 (Ra, ㎛)First member material roughness (Ra, ㎛) |
제2 부재 재질 거칠기 (Ra, ㎛)2nd member material roughness (Ra, μm) |
플라즈마 환경 내구성 테스트 통과 여부Plasma environment durability whether the test passed |
1번number 1 | 1One | 1One | FailFail |
2번No.2 | 55 | 55 | FailFail |
3번number 3 | 1010 | 1010 | PassPass |
4번4 times | 5050 | 5050 | PassPass |
5번number 5 | 100100 | 100100 | PassPass |
플라즈마 환경 내구성 테스트는 스트랩을 플라즈마 장비에 설치해서 스트랩을 300회(장비 10년 사용 기준) 반복해서 구부렸다 펴는 동작을 반복한 후 스트랩의 내구성을 확인하는 방식으로 이루어졌다.The plasma environment durability test was conducted by installing the strap on a plasma device, repeating the bending and unfolding motion 300 times (based on 10 years of use of the device), and then checking the durability of the strap.
도 5는 본 개시의 일 실시예에 따라 제1 부재(210) 및 제2 부재(220)가 접합되는 모습을 나타낸다.5 shows a state in which the first member 210 and the second member 220 are bonded according to an embodiment of the present disclosure.
일 실시예에서, 제1 부재(210)와 제2 부재(220)의 가압을 위해 압연, 압접 등의 방법이 사용될 수 있다. 예를 들어, 제1 코어부와 제2 코어부가 마주보도록 제1 부재 및 제2 부재를 포갠 상태에서, 제1 부재 및 제2 부재를 회전하는 롤(roll) 사이로 통과시켜 가압할 수 있다. 다른 예에서, 제1 부재의 하면 및 제2 부재의 상면 중 적어도 일부를 표면처리한 뒤 제1 코어부와 제2 코어부가 마주보도록 제1 부재 및 제2 부재를 포갠 상태에서, 제1 부재 및 제2 부재의 상하 방향으로 단순 가압할 수 있다.In one embodiment, a method such as rolling or pressure welding may be used to press the first member 210 and the second member 220 . For example, in a state in which the first member and the second member are overlapped so that the first core portion and the second core portion face each other, the first member and the second member may be passed between rotating rolls and pressed. In another example, after surface treatment of at least a portion of the lower surface of the first member and the upper surface of the second member, in a state in which the first and second members are overlapped so that the first core portion and the second core portion face each other, the first member and The second member can be simply pressed in the vertical direction.
일 실시예에 따른 압연 공정 조건은 다음과 같다.Rolling process conditions according to an embodiment are as follows.
압연 온도: 80℃~600℃Rolling temperature: 80℃~600℃
압연 압력: 100,000 kgf/m2 ~ 1,000,000 kgf/m2
Rolling pressure: 100,000 kgf/m 2 ~ 1,000,000 kgf/m 2
도 7은 본 개시의 일 실시예에 따른 스트랩 제조방법의 예시를 나타내는 흐름도이다.7 is a flowchart illustrating an example of a method of manufacturing a strap according to an embodiment of the present disclosure.
일 실시예에서, 제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성한다(S710). 제2 베이스의 상1면에 제2 코어부가 음각 형성된 제2 부재를 형성한다(S720). 제1 베이스 및 제2 베이스는 스테인리스 스틸에 해당할 수 있다.In one embodiment, a first member having a first core part engraved on the lower surface of the first base is formed (S710). A second member having a second core part engraved on the upper surface of the second base is formed (S720). The first base and the second base may correspond to stainless steel.
제1 부재의 하면 및 제2 부재의 상면 중 적어도 일부를 표면처리한다(S730). 표면처리에 의해 표면의 거칠기가 증가할 수 있다.At least a part of the lower surface of the first member and the upper surface of the second member is subjected to surface treatment (S730). Surface roughness can be increased by surface treatment.
제1 코어부와 제2 코어부가 서로 마주보도록 제1 부재 및 제2 부재를 접합한다(S740). 제1 부재와 제2 부재가 서로 마주본 상태에서 제1 부재와 제2 부재에 도 5에 표시된 화살표 방향으로 압력을 가해서 제1 부재 및 제2 부재를 접합할 수 있다.The first member and the second member are bonded so that the first core portion and the second core portion face each other (S740). The first member and the second member may be joined by applying pressure to the first member and the second member in the direction of the arrow shown in FIG. 5 while the first member and the second member face each other.
도 8은 본 개시의 또 다른 실시예에 따른 스트랩 제조방법의 예시를 나타내는 흐름도이다.8 is a flowchart illustrating an example of a method of manufacturing a strap according to another embodiment of the present disclosure.
일 실시예에서, 제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성한다(S810). 상면을 가지는 제2 베이스를 포함하는 제2 부재를 형성한다(S820). 제1 베이스 및 제2 베이스는 스테인리스 스틸에 해당한다. 제1 부재의 하면 및 제2 부재의 상면 중 적어도 일부를 표면처리한다(S830). 표면처리에 의해 표면의 거칠기가 증가할 수 있다. 제1 코어부와 상면이 서로 마주보도록 제1 부재 및 제2 부재를 접합한다(S840).In one embodiment, a first member having a first core part engraved on the lower surface of the first base is formed (S810). A second member including a second base having an upper surface is formed (S820). The first base and the second base correspond to stainless steel. At least a part of the lower surface of the first member and the upper surface of the second member is subjected to surface treatment (S830). Surface roughness can be increased by surface treatment. The first member and the second member are joined so that the first core portion and the upper surface face each other (S840).
상기한 본 발명의 바람직한 실시예는 예시의 목적으로 개시된 것이고, 본 발명에 대해 통상의 지식을 가진 당업자라면 본 발명의 사상과 범위 안에서 다양한 수정, 변경 및 부가가 가능할 것이며, 이러한 수정, 변경 및 부가는 특허청구 범위에 속하는 것으로 보아야 할 것이다.The preferred embodiments of the present invention described above have been disclosed for illustrative purposes, and those skilled in the art with ordinary knowledge of the present invention will be able to make various modifications, changes and additions within the spirit and scope of the present invention, and such modifications, changes and additions should be regarded as falling within the scope of the claims.
본 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면, 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서, 여러 가지 치환, 변형 및 변경이 가능하므로, 본 발명은 전술한 실시예 및 첨부된 도면에 의해 한정되는 것이 아니다.Those skilled in the art to which the present invention pertains can make various substitutions, modifications, and changes without departing from the technical spirit of the present invention. is not limited by
Claims (10)
- 스트랩(strap)으로서,As a strap,하면을 가지는 제1 베이스, 및 상기 하면에 음각 형성된 제1 코어부를 포함하는 제1 부재; 및A first member including a first base having a lower surface, and a first core portion formed intaglio on the lower surface; and상면을 가지는 제2 베이스, 및 상기 상면에 음각 형성된 제2 코어부를 포함하는 제2 부재A second member including a second base having an upper surface and a second core part engraved on the upper surface를 포함하고,including,상기 하면 및 상기 상면 중 적어도 일부는 표면처리되고,At least a part of the lower surface and the upper surface is surface-treated,상기 제1 코어부와 상기 제2 코어부가 서로 마주보도록 상기 제1 부재 및 상기 제2 부재가 접합되어 상기 상면과 상기 하면 간의 접합면이 형성되고,The first core portion and the second core portion are bonded to each other so that the first member and the second member are bonded to form a joint surface between the upper surface and the lower surface,상기 제1 베이스 및 상기 제2 베이스는 스테인리스 스틸(stainless steel), 엘질로이(Elgiloy), 하스텔로이(Hasteloy), 애스트롤로이(Aastroloy), 인코넬(Inconel), 르네(Rene), 유디메트(Udimet), 와스팔로이(Waspaloy), 니모니(Nimonie), 인콜로이(Incoloy), 파이로메트(Pyromet), 디스칼로이(Discaloy) 중 하나에 해당하는, 스트랩.The first base and the second base are made of stainless steel, Elgiloy, Hasteloy, Astroloy, Inconel, Rene, Udimet ), Waspaloy, Nimonie, Incoloy, Pyromet, or Discaloy.
- 제1항에 있어서,According to claim 1,상기 제1 부재 및 상기 제2 부재는 서로 대응하는 구조를 가지는, 스트랩.The first member and the second member have structures corresponding to each other, the strap.
- 제2항에 있어서,According to claim 2,상기 표면처리에 의해 표면의 거칠기(roughness)가 증가하는, 스트랩.A strap in which surface roughness is increased by the surface treatment.
- 제1항에 있어서,According to claim 1,상기 제1 코어부는 Cu 또는 BeCu에 해당하고,The first core portion corresponds to Cu or BeCu,상기 스트랩의 두께는 300 μm 이하이고, 폭은 100 mm 이하인, 스트랩.wherein the strap has a thickness of 300 μm or less and a width of 100 mm or less.
- 스트랩으로서,As a strap,하면을 가지는 제1 베이스, 및 상기 하면에 음각 형성된 제1 코어부를 포함하는 제1 부재; 및A first member including a first base having a lower surface, and a first core portion formed intaglio on the lower surface; and상면을 가지는 제2 베이스를 포함하는 제2 부재A second member including a second base having a top surface를 포함하고,including,상기 하면 및 상기 상면 중 적어도 일부는 표면처리되고,At least a part of the lower surface and the upper surface is surface-treated,상기 제1 코어부와 상기 상면이 서로 마주보도록 상기 제1 부재 및 상기 제2 부재가 접합되어 상기 상면과 상기 하면 간의 접합면이 형성되고,The first core portion and the upper surface are bonded to each other so that the first member and the second member are bonded to form a bonding surface between the upper surface and the lower surface,상기 제1 베이스 및 상기 제2 베이스는 스테인리스 스틸에 해당하는, 스트랩.The first base and the second base correspond to stainless steel, the strap.
- 스트랩 제조 방법으로서,As a strap manufacturing method,제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성하는 단계;Forming a first member in which a first core part is engraved on the lower surface of the first base;제2 베이스의 상면에 제2 코어부가 음각 형성된 제2 부재를 형성하는 단계; 및Forming a second member in which a second core part is engraved on the upper surface of the second base; and상기 제1 코어부와 상기 제2 코어부가 서로 마주보도록 상기 제1 부재 및 상기 제2 부재를 접합하는 단계Bonding the first member and the second member so that the first core part and the second core part face each other.를 포함하고,including,상기 제1 베이스 및 상기 제2 베이스는 스테인리스 스틸에 해당하는, 스트랩 제조 방법.Wherein the first base and the second base correspond to stainless steel, strap manufacturing method.
- 제6항에 있어서,According to claim 6,상기 접합하는 단계 이전에, 상기 제1 부재의 하면 및 상기 제2 부재의 상면 중 적어도 일부를 표면처리하는 단계를 더 포함하는, 스트랩 제조 방법.Prior to the bonding step, further comprising the step of surface-treating at least a portion of the lower surface of the first member and the upper surface of the second member, the strap manufacturing method.
- 제7항에 있어서,According to claim 7,상기 표면처리에 의해 표면의 거칠기가 증가하는, 스트랩 제조 방법.Strap manufacturing method in which the roughness of the surface is increased by the surface treatment.
- 제6항에 있어서,According to claim 6,상기 제1 부재 및 상기 제2 부재는 서로 대응하는 구조를 가지는, 스트랩 제조 방법.The first member and the second member have a structure corresponding to each other, the strap manufacturing method.
- 스트랩 제조 방법으로서,As a strap manufacturing method,제1 베이스의 하면에 제1 코어부가 음각 형성된 제1 부재를 형성하는 단계;Forming a first member in which a first core part is engraved on the lower surface of the first base;상면을 가지는 제2 베이스를 포함하는 제2 부재를 형성하는 단계; 및forming a second member including a second base having an upper surface; and상기 제1 코어부와 상기 상면이 서로 마주보도록 상기 제1 부재 및 상기 제2 부재를 접합하는 단계Bonding the first member and the second member so that the first core portion and the upper surface face each other를 포함하고,including,상기 제1 베이스 및 상기 제2 베이스는 스테인리스 스틸에 해당하는, 스트랩 제조 방법.Wherein the first base and the second base correspond to stainless steel, strap manufacturing method.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2021-0064429 | 2021-05-18 | ||
KR20210064429 | 2021-05-18 | ||
KR1020210117920A KR102584206B1 (en) | 2021-05-18 | 2021-09-03 | Strap and manufacturing method thereof |
KR10-2021-0117920 | 2021-09-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2022245087A1 true WO2022245087A1 (en) | 2022-11-24 |
Family
ID=84141781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2022/006997 WO2022245087A1 (en) | 2021-05-18 | 2022-05-16 | Strap and manufacturing method therefor |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2022245087A1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100196626A1 (en) * | 2009-02-04 | 2010-08-05 | Applied Materials, Inc. | Ground return for plasma processes |
KR20140096386A (en) * | 2011-11-24 | 2014-08-05 | 램 리써치 코포레이션 | Plasma processing chamber with flexible symmetric rf return strap |
KR20160127368A (en) * | 2015-04-27 | 2016-11-04 | 김경아 | Ground Strap for manufacturing OLED and TFT-LCD Panel |
KR20170007620A (en) * | 2015-07-09 | 2017-01-19 | 강명원 | Clad metal manufacturing method |
KR20210017582A (en) * | 2019-08-09 | 2021-02-17 | 진상현 | Rough sanding method of metal plate bases jugging to increase adhesion |
-
2022
- 2022-05-16 WO PCT/KR2022/006997 patent/WO2022245087A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100196626A1 (en) * | 2009-02-04 | 2010-08-05 | Applied Materials, Inc. | Ground return for plasma processes |
KR20140096386A (en) * | 2011-11-24 | 2014-08-05 | 램 리써치 코포레이션 | Plasma processing chamber with flexible symmetric rf return strap |
KR20160127368A (en) * | 2015-04-27 | 2016-11-04 | 김경아 | Ground Strap for manufacturing OLED and TFT-LCD Panel |
KR20170007620A (en) * | 2015-07-09 | 2017-01-19 | 강명원 | Clad metal manufacturing method |
KR20210017582A (en) * | 2019-08-09 | 2021-02-17 | 진상현 | Rough sanding method of metal plate bases jugging to increase adhesion |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2017142203A1 (en) | Heating device for camera module and camera module having same | |
CN102124819A (en) | A composite showerhead electrode assembly for a plasma processing apparatus | |
WO2021085913A1 (en) | Coupling-type focus ring | |
WO2016173021A1 (en) | Display panel and display apparatus | |
WO2016163694A1 (en) | Semiconductor package and method for preparing same | |
WO2022245087A1 (en) | Strap and manufacturing method therefor | |
WO2019090832A1 (en) | Display apparatus and display panel | |
WO2015156542A1 (en) | Gas spraying apparatus and substrate processing apparatus including same | |
JP2002319692A (en) | Method of forming silicon thin film and silicon thin film solar battery | |
WO2021096010A1 (en) | Display device | |
WO2014036721A1 (en) | Liquid crystal display panel and manufacturing method therefor | |
WO2020162654A1 (en) | Coaxial cable connection structure and method | |
KR102584206B1 (en) | Strap and manufacturing method thereof | |
JP3625003B2 (en) | LCD display board | |
WO2021177620A1 (en) | Display module including glass substrate having side wirings, and display module manufacturing method | |
TW472320B (en) | Plasma etching equipment and LCD module fabricated using the same | |
WO2020222430A1 (en) | Flexible metal clad laminate, article comprising same, and method for manufacturing same flexible metal clad laminate | |
WO2017061761A1 (en) | Electrode connection part and touch screen panel comprising same | |
WO2018004225A1 (en) | Electrical connector terminal and reel carrier using same | |
CN210052016U (en) | Photomask and exposure device | |
JP2003037156A (en) | Suction plate | |
WO2016123800A1 (en) | Array substrate and liquid crystal display panel | |
WO2018062710A1 (en) | Ground clamping unit and substrate support assembly comprising same | |
WO2023063657A1 (en) | Monitoring device enabling large-scale measurement | |
JP2021158329A (en) | Stamp tool holding device and manufacturing method of element array |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22804941 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 22804941 Country of ref document: EP Kind code of ref document: A1 |