CN210052016U - Photomask and exposure device - Google Patents

Abstract

The utility model relates to a light shield and exposure device, the light shield includes: a glass substrate, a circuit layer and an anti-fingerprint film laminated in this order; the circuit layer and the anti-fingerprint film are jointly formed with a plurality of graphic units and an invalid area surrounding the graphic units; the invalid area is provided with an exposed area which is not covered by the anti-fingerprint film, so that at least part of the circuit layer is exposed, and static electricity is led out conveniently. The technical effects are as follows: the exposed area which is not covered by the anti-fingerprint film is arranged in the invalid area, so that the circuit layer at the position can be exposed, in the exposure process, the exposed area is contacted with the conductive clamping part of the exposure device, static electricity on the photomask is led into the exposure device from the exposed area through the circuit layer, and the exposure device is grounded, so that the static electricity is led into the ground, the static electricity accumulated in the photomask is reduced, the anti-fingerprint film and the circuit layer are prevented from being damaged as much as possible, and the service life of the photomask is prolonged.

Description

Photomask and exposure device

Technical Field

The utility model relates to the field of semiconductor technology, especially, relate to a light shield and exposure device.

Background

In the field of semiconductor technology, a photomask is a very important patterning tool for transferring pattern units in the photomask to a target substrate at a ratio of 1:1 to form a conductive pattern on the target substrate. The pattern transfer process mainly comprises gluing, exposure, development and stripping, so that a conductive pattern on a target substrate can be obtained. Generally, a double-sided touch panel is manufactured by a vacuum contact double-sided exposure method.

In the traditional process of preparing the double-sided touch panel, a mode of exposing two sides simultaneously by an upper light cover and a lower light cover is adopted, specifically, the upper light cover and the lower light cover clamp touch materials in the middle and vacuumize to expose, the closed environment in the exposure process is ensured, the two sides are exposed simultaneously, and the touch materials roll for one step length after opening and closing of one upper light cover and one lower light cover. When the touch material is exposed, the upper and lower light shields contact with the touch material, and static electricity is generated in the process.

In implementing the conventional technique, the inventors found that at least the following technical problems exist: the static accumulation is more in the exposure process, and the photomask is easy to be damaged.

SUMMERY OF THE UTILITY MODEL

Accordingly, it is necessary to provide a mask and an exposure apparatus for solving the problems that static electricity is accumulated more during exposure and the mask is easily damaged.

A photomask, comprising: a glass substrate, a circuit layer and an anti-fingerprint film laminated in this order; wherein the circuit layer and the anti-fingerprint film are jointly formed with a plurality of graphic units and an invalid area surrounding the graphic units; the invalid area is provided with an exposed area which is not covered by the fingerprint-proof film, so that at least part of the circuit layer is exposed, and static electricity is led out conveniently.

The technical scheme at least has the following technical effects: the photomask that this technical scheme provided, prevent that the fingerprint membrane can play the effect of preventing the fingerprint in multiple exposure and transportation, be equipped with the naked district that is not covered by preventing the fingerprint membrane in the invalid area, so set up, can make the circuit layer of this position expose, in the exposure process, the naked district contacts with exposure device's electrically conductive clamping part, make the static on the photomask pass through the circuit layer, import into exposure device from the naked district, handle through exposure device ground connection, thereby with static leading-in earth, reduce the static that accumulates in the photomask, avoid hitting as far as possible and hinder fingerprint membrane and circuit layer, improve the life of photomask.

In one embodiment, a gap is formed between adjacent pattern units, each pattern unit is surrounded by a ground wire loop, each ground wire loop is connected with the adjacent ground wire loop, and the ground wire loop is formed on the side of the circuit layer, which faces away from the glass substrate.

According to the technical scheme, after the anti-fingerprint film is damaged, the grounding wire ring can adsorb more static electricity, the static electricity is led into the exposure device from the exposed area through the circuit layer, and the static electricity is led into the ground through the grounding treatment of the exposure device. The grounding wire rings are arranged around the graphic units, and the adjacent grounding wire rings are connected with each other, so that all the grounding wire rings are integrated, and static electricity is led out more intensively.

In one embodiment, two adjacent ground wire loops have at least one common edge.

The technical scheme can connect the adjacent grounding wire rings together, so that all the grounding wire rings form a whole.

In one embodiment, two adjacent ground wire loops are connected by a first connecting wire.

The technical scheme can connect the adjacent grounding wire rings together, so that all the grounding wire rings form a whole.

In one embodiment, the graphic unit has a wiring region having a metal PIN terminal connected to the adjacent ground wire loop by a second connection line.

According to the technical scheme, after static electricity enters the wiring area of the graphic unit, the metal PIN end is connected with the grounding wire ring, the static electricity entering the wiring area is led into the grounding wire ring through the second connecting wire, and then is led out to the ground through the wire layer, the exposed area and the exposure device.

In one embodiment, the graphic unit has a routing region, and the routing region has a routing corner that is at least one of an arc corner, a right angle corner, and an obtuse angle corner.

According to the technical scheme, the original tip corner in the wiring area of the graphic unit is changed into the arc corner, the right-angle corner or the obtuse-angle corner, so that tip discharge formed in the wiring area is avoided, and damage to the graphic unit is reduced.

In one embodiment, a plurality of point discharge blocks are formed on one side of the circuit layer of the invalid region close to the anti-fingerprint film.

According to the technical scheme, the point discharge block is formed on the circuit layer of the invalid area, and the point discharge block can release static electricity after the fingerprint film is prevented from being damaged.

In one embodiment, the exposed area is disposed near the edge of the inactive area.

Above-mentioned technical scheme can make things convenient for electrically conductive clamping part centre gripping naked district in the exposure process.

In one embodiment, the circuit layer includes a chromium layer formed on the glass substrate and a chromium oxide layer formed on the chromium layer.

According to the technical scheme, the circuit layer comprises the chromium layer and the chromium oxide layer, the chromium layer is high in light shielding performance and etching performance, and the chromium oxide layer can reduce or even avoid diffraction of light.

An exposure apparatus comprising: the mask of any of the above embodiments, defined as a first mask, the first mask having a first graphics unit; another mask as described in any of the above embodiments, defined as a second mask, the second mask having a second pattern unit; and the operating platform is provided with a conductive clamping part for clamping the exposed area of the first photomask and the exposed area of the second photomask.

The technical scheme at least has the following technical effects: the exposure device provided by the technical scheme adopts the photomask provided by any embodiment, the fingerprint-proof film can play a role of fingerprint prevention in multiple exposure and transfer processes, the invalid area is provided with the exposed area which is not covered by the fingerprint-proof film, so that the circuit layer at the position can be exposed, and in the exposure process, the exposed area is contacted with the conductive clamping part of the exposure device, so that static electricity on the photomask is led into the exposure device from the exposed area through the circuit layer, and is grounded through the exposure device, thereby leading the static electricity into the ground, reducing the static electricity accumulated in the photomask, avoiding damaging the fingerprint-proof film and the circuit layer as much as possible, and prolonging the service life of the photomask.

Drawings

Fig. 1 is a schematic structural diagram of a mask according to an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of a mask according to another embodiment of the present invention;

FIG. 3 is a schematic illustration of a stack of the photomasks shown in FIGS. 1 and 2;

FIG. 4 is an enlarged partial schematic view of A shown in FIGS. 1 and 2;

FIG. 5 is a schematic diagram of the structure of the graphic element shown in FIGS. 1 and 2;

FIG. 6 is an enlarged partial view of B shown in FIG. 5;

fig. 7 is a schematic structural view of an exposure apparatus according to an embodiment of the present invention;

fig. 8 is a plan view of the exposure apparatus shown in fig. 7.

Wherein:

100. mask 110, glass substrate 120, circuit layer

122. Chromium layer 124, chromium oxide layer 130, fingerprint-proof film

140. Graphic unit 142, wiring region 144, metal PIN terminal

146. Second connecting line 148, arc-shaped corner 150 and dead zone

152. Bare area 154, tip discharge block 160, ground wire loop

162. First connecting wire

200. An exposure device 210, a first mask 220, a second mask

230. Conductive clamping part 240, feeding roller 250 and raw material

260. Vacuum-pumping line pipe

Detailed Description

In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, as those skilled in the art will be able to make similar modifications without departing from the spirit and scope of the present invention.

It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

In the traditional vacuum contact type double-sided exposure process, static electricity is easily generated by friction between an upper photomask and a lower photomask and raw materials of products and air, and because the photomasks are continuously operated, the exposure time is about 26 seconds to 35 seconds, so that the static electricity generated by friction is always accumulated, more and more static electricity stays in the photomasks, a discharge phenomenon easily occurs, a circuit layer of the photomasks is damaged, and the accuracy of a graphic unit is influenced.

To this end, referring to fig. 1 to 3, an embodiment of the present invention provides a mask 100, including: a glass substrate 110, a wiring layer 120, and an anti-fingerprint film 130 laminated in this order; wherein the circuit layer 120 and the anti-fingerprint film 130 jointly form a plurality of graphic units 140 and an inactive area 150 surrounding the plurality of graphic units 140; the non-effective area 150 is provided with an exposed area 152, and the exposed area 152 is not covered by the anti-fingerprint film 130, so that at least part of the circuit layer 120 is exposed to facilitate electrostatic discharge. It will be appreciated that a plurality of graphic elements 140 form an active area surrounded by an inactive area 150. The graphic unit 140 includes a pattern formed by the underlying wiring layer 120, and a portion of the anti-fingerprint film 130 covering the pattern.

Specifically, the inactive area 150 is not exposed during the exposure process, and the active area formed by the graphic unit 140 surrounded by the inactive area 150 can be exposed to transfer the corresponding pattern in the graphic unit 140 onto the target substrate. The photomask 100 has a plurality of graphic units 140, the number of the graphic units 140 is equal to the number of the formed products, and the exposed product raw material needs to be cut and frame-removed after being developed and stripped to obtain a plurality of independent products, that is, one photomask 100 can expose a plurality of products at one time. Typically, the graphic units 140 are arranged in an array for easy cutting. For example, the mask 100 has six graphic units 140, which are divided into two rows, and each row has three graphic units 140.

The anti-fingerprint film 130(AF film) is made of fluorine-silicon compound, has no conductivity, and can play a role in preventing fingerprints in multiple exposure and transfer processes. Because the anti-fingerprint film 130 is an insulator and cannot lead out static electricity, the non-effective area 150 is provided with an exposed area 152 which is not covered by the anti-fingerprint film 130, so that the circuit layer 120 at the position can be exposed, in the exposure process, the exposed area 152 is contacted with the conductive clamping part of the exposure device, so that the static electricity on the photomask 100 is led into the exposure device from the exposed area 152 through the circuit layer 120, and the exposure device is grounded, so that the static electricity is led into the ground, the static electricity accumulated in the photomask 100 is reduced, the anti-fingerprint film 130 and the circuit layer 120 are prevented from being damaged as much as possible, and the service life of the photomask 100 is prolonged.

In addition, the exposed region 152 is disposed near the edge of the inactive region 150 for holding the mask 100 during the exposure process. The position of the exposed region 152 is the same as the position of the conductive clamping portion in the exposure device, for example, two exposed regions 152 are respectively provided at intervals at two long side edges of the inactive region 150.

The technical scheme at least has the following technical effects: according to the photomask 100 provided by the technical scheme, the fingerprint-proof film 130 can play a role in fingerprint prevention in multiple exposure and transfer processes, the invalid area 150 is provided with the exposed area 152 which is not covered by the fingerprint-proof film 130, so that the circuit layer 120 at the position can be exposed, in the exposure process, the exposed area 152 is in contact with the conductive clamping part of the exposure device, static electricity on the photomask 100 is led into the exposure device from the exposed area 152 through the circuit layer 120, the static electricity is led into the ground through the grounding treatment of the exposure device, the static electricity accumulated in the photomask 100 is reduced, the fingerprint-proof film 130 and the circuit layer 120 are prevented from being damaged as much as possible, and the service life of the photomask 100 is prolonged.

In some embodiments, with continued reference to fig. 1 and fig. 2, a gap exists between adjacent pattern units 140, a ground loop 160 is disposed around each pattern unit 140, each ground loop 160 is connected to the adjacent ground loop 160, and the ground loop 160 is formed on a side of the circuit layer 120 facing away from the glass substrate 110. The ground wire loop 160 is typically made of copper. After the anti-fingerprint film 130 is exposed and damaged for multiple times, the grounding wire loop 160 is exposed, and more static electricity generated by the friction between the mask 100 and air and products can be introduced into the exposure device from the grounding wire loop 160 through the circuit layer 120 from the exposed area 152, and the static electricity is introduced into the ground through the grounding treatment of the exposure device. The ground wire loop 160 is provided around the pattern unit 140, and the adjacent ground wire loops 160 are connected to each other, so that all the ground wire loops 160 are integrated to lead out static electricity more intensively.

Further, with continued reference to fig. 1, two adjacent ground wire loops 160 have at least one common edge. In other words, the common edge is used to form both a first of the two adjacent ground wire loops 160 and a second of the two adjacent ground wire loops 160. For example, if there are four adjacent ground loops 160 around one ground loop 160, then the one ground loop 160 and the four ground loops 160 share four wires. With this arrangement, the ground wire loop 160 can be saved in raw material, and the adjacent ground wire loops 160 can be connected together so that all the ground wire loops 160 are integrated.

Alternatively, with continued reference to fig. 2, two adjacent ground wire loops 160 are connected by a first connecting wire 162. The first connecting line 162 is typically made of copper. The first connecting line 162 may be one, two, three, or even more. The length of the first connection line 162 at different positions may be different, which is not limited. For example, the ground wire loop 160 located at the center needs to be connected to all the ground wire loops 160 around, and the first connection line 162 between the ground wire loops 160 located at a relatively short distance is short, and the first connection line 162 between the ground wire loops 160 located at a relatively long distance is long. With this arrangement, adjacent ground loops 160 can be connected together such that all of the ground loops 160 form a single unit.

In some embodiments, with continued reference to fig. 4, the graphic unit 140 has a wiring region 142, the wiring region 142 has a metal PIN terminal 144, and the metal PIN terminal 144 is connected to the adjacent ground wire loop 160 through a second connection line 146. In this embodiment, the metal PIN terminals 144 refer to metal PINs, which may be called metal PINs, for connecting to an external circuit. The second connecting lines 146 are usually made of copper. The second connecting line 146 may be one, two, three, or even more. The second connection line 146 connecting the metal PIN end 144 and the ground loop 160 is provided in this embodiment, so that after the static electricity enters the wiring region 142 of the graphic unit 140, the static electricity entering the wiring region 142 is further led into the ground loop 160 through the second connection line 146 by connecting the metal PIN end 144 and the ground loop 160, and then led out to the ground through the circuit layer 120, the exposed region 152 and the exposure device, thereby preventing the graphic unit 140 from being damaged by the static electricity accumulation.

In some embodiments, with continued reference to fig. 5 and 6, the graphic unit 140 has a routing region 142, and a line corner of the routing region 142 is at least one of an arc corner 148, a right-angle corner, and an obtuse-angle corner. It is understood that the wire corners in wire-routing region 142 may all be curved corners 148, or all be right angle corners, or all be obtuse angle corners, or a combination of several types. In this embodiment, the original tip corner in the routing region 142 of the graphic unit 140 is changed to the arc corner 148, the right angle corner, or the obtuse angle corner, so as to avoid the formation of tip discharge in the routing region 142 and reduce the damage to the graphic unit 140. For example, fig. 6 illustrates a curved corner 148.

In some embodiments, with continued reference to fig. 1 and 2, the circuit layer 120 of the inactive area 150 has a plurality of tip discharge blocks 154 formed on a side thereof adjacent to the anti-fingerprint film 130. In this embodiment, the plurality of point discharge blocks 154 are disposed on the side of the circuit layer 120 of the invalid region 150 close to the anti-fingerprint film 130, so that after the anti-fingerprint film 130 is damaged by multiple exposures, the point discharge blocks 154 are exposed, and therefore the point discharge blocks 154 can generate a point discharge phenomenon when there is more static electricity, and further release the static electricity into the air, thereby reducing the damage to the mask 100.

In other embodiments, with continued reference to fig. 3, the circuit layer 120 includes a chromium layer 122 formed on the glass substrate 110 and a chromium oxide layer 124 formed on the chromium layer 122. The chromium oxide layer 124 and the chromium layer 122 have the same pattern, and the chromium oxide layer 124 is formed above the chromium layer 122, that is, the mask 100 includes the glass substrate 110, the chromium layer 122, the chromium oxide layer 124 and the fingerprint-proof film 130 stacked in sequence. For example, the thickness of the glass substrate 110 may be 3 to 5 mm, the thickness of the chrome layer 122 may be 0.085 μm, the thickness of the chrome oxide layer 124 may be 0.015 μm, and the thickness of the anti-fingerprint film 130 may be 0.02 μm, and the thicknesses of the layers may be adjusted according to the design of the mask 100. The chrome layer 122 has strong light-shielding and etching properties, and the chrome oxide layer 124 can reduce or even prevent light diffraction.

With continuing reference to fig. 7 and 8, an embodiment of the present invention further provides an exposure apparatus 200, including: the mask 100 of any of the above embodiments is defined as a first mask 210, the first mask 210 having a first graphic unit 140; another mask 100 as described in any of the above embodiments is defined as a second mask 220, the second mask 220 having a second graphic unit 140; the stage has a conductive clamping portion 230 for clamping the exposed region 152 of the first mask 210 and the exposed region 152 of the second mask 220.

Specifically, the first mask 210 and the second mask 220 are different mainly in that the first graphic unit 140 and the second graphic unit 140, and generally the first graphic unit 140 and the second graphic unit 140 correspond to different patterns, respectively, and of course, the first graphic unit 140 and the second graphic unit 140 may correspond to the same pattern according to the design of the product.

The stage may have a plurality of conductive clamping portions 230, the positions of the conductive clamping portions 230 correspond to the positions of the exposed regions 152, and the exposed regions 152 of the first mask 210 and the exposed regions 152 of the second mask 220 are clamped. The two exposed areas 152 at the same stacking position can be clamped by the same conductive clamping portion 230 similar to a U shape, or can be clamped by two independent conductive clamping portions 230. The conductive clip 230 is conductive, and is generally made of metal. The conductive clip 230 is grounded to conduct static electricity to the ground.

In addition, the exposure apparatus 200 further includes a feed roller 240 for rolling the raw material 250; and a vacuum line tube 260 for forming a vacuum between the mask 100 and the material.

The technical scheme at least has the following technical effects: the exposure apparatus 200 provided by the present technical solution adopts the mask 100 provided by any of the above embodiments, the anti-fingerprint film 130 can play a role of anti-fingerprint in multiple exposure and transfer processes, the inactive area 150 is provided with the exposed area 152 not covered by the anti-fingerprint film 130, so as to expose the circuit layer 120 at the position, in the exposure process, the exposed area 152 contacts with the conductive clamping portion 230 of the exposure apparatus 200, so that the static electricity on the mask 100 is led into the exposure apparatus 200 from the exposed area 152 via the circuit layer 120, and the exposure apparatus 200 is subjected to grounding treatment, thereby leading the static electricity into the ground, reducing the static electricity accumulated in the mask 100, avoiding damaging the anti-fingerprint film 130 and the circuit layer 120 as much as possible, and prolonging the service life of the mask 100.

The embodiment of the utility model provides a two-sided touch-control board is still provided, include: the corner at the reversing position of the first touch control line is an arc corner, a right-angle corner or an obtuse-angle corner; the corner at the reversing position of the second touch control line is an arc corner, a right-angle corner or an obtuse-angle corner; the first touch circuit and the second touch circuit are located on two opposite surfaces. The double-sided touch panel in this embodiment can be obtained by transferring corresponding arc corners, right-angled corners or obtuse-angled corners in the graphic unit 140.

Specifically, the double-sided touch panel adopts DITO material as raw material, and the DITO material is resin. ITO patterns are made on two opposite surfaces to be used as a first touch unit and a second touch unit respectively, copper is used as a lead wire around the first touch unit and the second touch unit to form a Sense trace (induction electrode) and a Drive trace (driving electrode) respectively, the Sense trace lead wire is used for driving the first touch unit, and the Drive trace lead wire is used for driving the second touch unit.

The technical scheme at least has the following technical effects: according to the double-sided touch pad provided by the technical scheme, the original tip corner is changed into the arc corner, the right-angle corner or the obtuse-angle corner, so that tip discharge formed in a circuit is avoided, and damage to the circuit is reduced.

The technical features of the above embodiments can be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the above embodiments are not described, but should be considered as the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above examples only represent some embodiments of the present invention, and the description thereof is more specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims (10)

1. A photomask, comprising:

a glass substrate, a circuit layer and an anti-fingerprint film laminated in this order;

wherein the circuit layer and the anti-fingerprint film are jointly formed with a plurality of graphic units and an invalid area surrounding the graphic units;

the invalid area is provided with an exposed area which is not covered by the fingerprint-proof film, so that at least part of the circuit layer is exposed, and static electricity is led out conveniently.

2. The mask according to claim 1, wherein a gap is formed between adjacent pattern units, each pattern unit is surrounded by a ground wire loop, each ground wire loop is connected to the adjacent ground wire loop, and the ground wire loop is formed on a side of the circuit layer facing away from the glass substrate.

3. The optical mask of claim 2 wherein two adjacent ground wire loops have at least one common edge.

4. The optical mask according to claim 2, wherein two adjacent ground wire loops are connected by a first connecting wire.

5. The mask of claim 2, wherein the pattern unit has a wiring area having a metal PIN terminal connected to the adjacent ground wire loop by a second connection line.

6. The mask of claim 1, wherein the pattern unit has a routing area, and a line corner of the routing area is at least one of an arc corner, a right-angle corner, and an obtuse-angle corner.

7. The mask according to claim 1, wherein a plurality of point discharge blocks are formed on a side of the wiring layer of the inactive area adjacent to the anti-fingerprint film.

8. The mask of claim 1, wherein the denuded zone is disposed near an edge of the inactive zone.

9. The optical mask according to any one of claims 1 to 8, wherein the wiring layer comprises a chromium layer formed on the glass substrate and a chromium oxide layer formed on the chromium layer.

10. An exposure apparatus, comprising:

the mask of any of claims 1 to 9, defined as a first mask having a first graphics unit;

the mask of any of claims 1-9, further defined as a second mask having second graphic elements;

and the operating platform is provided with a conductive clamping part for clamping the exposed area of the first photomask and the exposed area of the second photomask.

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