TWI791302B - Touch panel and method of manufacturing the same - Google Patents

Touch panel and method of manufacturing the same Download PDF

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TWI791302B
TWI791302B TW110137778A TW110137778A TWI791302B TW I791302 B TWI791302 B TW I791302B TW 110137778 A TW110137778 A TW 110137778A TW 110137778 A TW110137778 A TW 110137778A TW I791302 B TWI791302 B TW I791302B
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touch panel
layer
electrode layer
film substrate
panel according
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TW202316248A (en
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許良珍
張羽
吳菲朕
高超
林義忠
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大陸商宸美(廈門)光電有限公司
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Abstract

A touch panel includes a thin-film substrate, a first conductive layer, and a second conductive layer. The thin-film substrate has a display region and a peripheral region defined thereon, has a first surface and a second surface opposite to each other, and has a thickness. The first conductive layer is disposed on the first surface and includes a plurality of first traces disposed in the peripheral region. The second conductive layer is disposed on the second surface and includes a plurality of second traces disposed in the peripheral region. The thin-film substrate has at least one groove at an interlaced region between one of the first traces and the second traces. The groove is in one of the first surface and the second surface and has a depth. The depth is between about 2.5 µm and about one-half of the thickness.

Description

觸控面板及其製造方法Touch panel and manufacturing method thereof

本揭露是有關於一種觸控面板及其製造方法。The disclosure relates to a touch panel and a manufacturing method thereof.

隨著觸控模組的多元發展,其已成熟應用在工業電子以及消費電子產品上。結合各式應用於中大尺寸產品搭載的觸控產品將越來越普遍。With the diversified development of the touch module, it has been maturely applied in industrial electronics and consumer electronics products. It will become more and more common to combine various touch products used in medium and large-sized products.

目前主流的電容式觸控技術之一為薄膜式(Film Type)。薄膜式觸控面板係將觸控層(例如氧化銦錫(ITO))製作於之兩片薄膜上,外層再添加例如玻璃之蓋板進行保護,所以又稱為GFF(Glass-Film-Film)結構。然而,採用前述GFF結構的觸控顯示裝置總共需要三張光學膠(Optical Clear Adhesive, OCA)層,因此會有光學差與成本高等問題;於因應下一世代超薄薄膜觸控快速生產需求,如何針對超薄薄膜觸控導入一快速圖案化製程更為重要。One of the current mainstream capacitive touch technologies is Film Type. Thin-film touch panel is a touch layer (such as indium tin oxide (ITO)) made on two films, and the outer layer is protected by a cover such as glass, so it is also called GFF (Glass-Film-Film) structure. However, the touch display device using the aforementioned GFF structure requires a total of three Optical Clear Adhesive (OCA) layers, so there will be problems such as optical difference and high cost; in response to the rapid production needs of the next generation of ultra-thin film touch, How to introduce a rapid patterning process for ultra-thin film touch is more important.

因此,如何提出一種可解決上述問題的觸控面板及其製造方法,是目前業界亟欲投入研發資源解決的問題之一。Therefore, how to propose a touch panel and its manufacturing method that can solve the above-mentioned problems is one of the problems that the industry is eager to devote research and development resources to solve.

有鑑於此,本揭露之一目的在於提出一種可有解決上述問題的觸控面板與觸控面板及其製造方法。In view of this, one purpose of the present disclosure is to provide a touch panel, a touch panel and a manufacturing method thereof that can solve the above problems.

為了達到上述目的,依據本揭露之一實施方式,一種觸控面板包含薄膜基材、第一導體層以及第二導體層。薄膜基材上定義顯示區以及周邊區,並具有相對的第一表面以及第二表面,以及厚度。第一導體層設置於第一表面,並包含複數個第一走線設置於周邊區。第二導體層設置於第二表面,並包含複數個第二走線設置於該周邊區。薄膜基材在第一走線中之一者與第二走線之間的交錯區具有溝槽。溝槽於第一表面與第二表面中之一者上,並具有一深度。深度介於約2.5 µm與約厚度的二分之一之間。In order to achieve the above object, according to an embodiment of the present disclosure, a touch panel includes a film substrate, a first conductor layer and a second conductor layer. The film substrate defines a display area and a peripheral area, and has opposite first and second surfaces, and a thickness. The first conductor layer is disposed on the first surface, and includes a plurality of first traces disposed on the peripheral area. The second conductor layer is disposed on the second surface, and includes a plurality of second traces disposed on the peripheral area. The film substrate has grooves in the intersection area between one of the first traces and the second traces. The groove is on one of the first surface and the second surface and has a depth. The depth is between about 2.5 µm and about one-half the thickness.

於本揭露的一或多個實施方式中,第一走線包含複數個接腳結構以及接地線。第一走線中之前述者為接地線。In one or more implementations of the present disclosure, the first trace includes a plurality of pin structures and a ground wire. The aforementioned ones in the first traces are ground wires.

於本揭露的一或多個實施方式中,溝槽位於第一表面上,並與接地線的邊緣在垂直於第一表面的方向上對齊。In one or more embodiments of the present disclosure, the groove is located on the first surface and aligned with the edge of the ground line in a direction perpendicular to the first surface.

於本揭露的一或多個實施方式中,溝槽與接地線在垂直於第一表面的方向上錯開。In one or more embodiments of the present disclosure, the groove and the ground line are staggered in a direction perpendicular to the first surface.

於本揭露的一或多個實施方式中,第一導體層進一步包含第一金屬層以及第一電極層。第一電極層與第一金屬層係依序疊合於第一表面上,且於周邊區中共同形成第一走線。第二導體層進一步包含第二金屬層以及第二電極層。第二電極層與第二金屬層係依序疊合於第二表面上,且於周邊區中共同形成第二走線。In one or more embodiments of the present disclosure, the first conductor layer further includes a first metal layer and a first electrode layer. The first electrode layer and the first metal layer are sequentially stacked on the first surface, and jointly form a first wiring in the peripheral area. The second conductor layer further includes a second metal layer and a second electrode layer. The second electrode layer and the second metal layer are sequentially stacked on the second surface, and jointly form a second wiring in the peripheral area.

於本揭露的一或多個實施方式中,第一電極層於顯示區中包含複數個第一軸向電極。第二電極層於顯示區中包含複數個第二軸向電極。In one or more embodiments of the present disclosure, the first electrode layer includes a plurality of first axial electrodes in the display area. The second electrode layer includes a plurality of second axial electrodes in the display area.

於本揭露的一或多個實施方式中,第一電極層與第二電極層中之至少一者為奈米銀線電極層。In one or more embodiments of the present disclosure, at least one of the first electrode layer and the second electrode layer is a silver nanowire electrode layer.

於本揭露的一或多個實施方式中,溝槽位於第一表面上。第一走線中之兩相鄰者之間具有間隙。溝槽與間隙在垂直於第一表面的方向上對齊。In one or more embodiments of the present disclosure, the trench is located on the first surface. There is a gap between two adjacent ones of the first traces. The trenches and gaps are aligned in a direction perpendicular to the first surface.

於本揭露的一或多個實施方式中,溝槽位於第二表面上。第二走線中之兩相鄰者之間具有間隙。溝槽與間隙在垂直於第二表面的方向上對齊。In one or more embodiments of the present disclosure, the trench is located on the second surface. There is a gap between two adjacent ones of the second traces. The trenches and gaps are aligned in a direction perpendicular to the second surface.

於本揭露的一或多個實施方式中,溝槽位於第二表面上,並與第二走線中之一者的邊緣在垂直於第二表面的方向上對齊。In one or more embodiments of the present disclosure, the trench is located on the second surface and is aligned with an edge of one of the second traces in a direction perpendicular to the second surface.

於本揭露的一或多個實施方式中,薄膜基材的厚度介於約12.5 µm與約125 µm之間。In one or more embodiments of the present disclosure, the thickness of the film substrate is between about 12.5 μm and about 125 μm.

於本揭露的一或多個實施方式中,觸控面板進一步包含一保護層。保護層覆蓋第一走線。In one or more embodiments of the present disclosure, the touch panel further includes a protection layer. The protection layer covers the first trace.

於本揭露的一或多個實施方式中,保護層呈框型,並覆蓋第一走線遠離薄膜基材的一側以及第一走線的內緣。In one or more implementations of the present disclosure, the protection layer is frame-shaped and covers the side of the first wiring away from the film substrate and the inner edge of the first wiring.

為了達到上述目的,依據本揭露之一實施方式,一種觸控面板的製造方法包含:於薄膜基材的第一表面上形成第一導體層,其中薄膜基材具有厚度,且其上定義顯示區以及周邊區;以及對第一導體層進行雷射蝕刻製程,以於周邊區中形成複數個第一走線,並於第一表面上形成具有深度之至少一溝槽,其中深度介於約2.5 µm與約厚度的二分之一之間。In order to achieve the above object, according to an embodiment of the present disclosure, a method for manufacturing a touch panel includes: forming a first conductor layer on a first surface of a film substrate, wherein the film substrate has a thickness and defines a display area thereon and the peripheral area; and performing a laser etching process on the first conductor layer to form a plurality of first traces in the peripheral area, and to form at least one groove with a depth on the first surface, wherein the depth is between about 2.5 Between µm and about half the thickness.

於本揭露的一或多個實施方式中,於薄膜基材的第一表面上形成第一導體層的步驟包含:於薄膜基材的第一表面上形成第一電極層於顯示區中;以及於第一電極層上形成第一金屬層。對第一導體層進行雷射蝕刻製程的步驟係蝕刻第一金屬層與第一電極層,致使第一金屬層與第一電極層於周邊區中共同形成第一走線。In one or more embodiments of the present disclosure, the step of forming a first conductor layer on the first surface of the film substrate includes: forming a first electrode layer in the display area on the first surface of the film substrate; and A first metal layer is formed on the first electrode layer. The step of performing the laser etching process on the first conductor layer is to etch the first metal layer and the first electrode layer, so that the first metal layer and the first electrode layer jointly form a first wiring in the peripheral area.

於本揭露的一或多個實施方式中,觸控面板的製造方法進一步包含:於薄膜基材的第二表面上形成第二導體層,其中第一表面與第二表面分別位於薄膜基材的相反兩側;以及對第二導體層進行雷射蝕刻製程,以於周邊區中形成複數個第二走線。In one or more embodiments of the present disclosure, the manufacturing method of the touch panel further includes: forming a second conductor layer on the second surface of the film substrate, wherein the first surface and the second surface are respectively located on the second surface of the film substrate. opposite sides; and performing laser etching process on the second conductor layer to form a plurality of second traces in the peripheral area.

於本揭露的一或多個實施方式中,對第二導體層進行雷射蝕刻製程的步驟係晚於對第一導體層進行雷射蝕刻製程的步驟,並使得第一走線的電阻值增加約5%以內。In one or more embodiments of the present disclosure, the step of performing the laser etching process on the second conductor layer is later than the step of performing the laser etching process on the first conductor layer, which increases the resistance value of the first wiring. Within about 5%.

於本揭露的一或多個實施方式中,對第一導體層進行雷射蝕刻製程的步驟係晚於對第二導體層進行雷射蝕刻製程的步驟,並使得第二走線的電阻值增加約5%以內。In one or more embodiments of the present disclosure, the step of performing the laser etching process on the first conductor layer is later than the step of performing the laser etching process on the second conductor layer, which increases the resistance of the second wiring. Within about 5%.

於本揭露的一或多個實施方式中,於薄膜基材的第二表面上形成第二導體層的步驟包含:於薄膜基材的第二表面上形成第二電極層於顯示區中;以及於第二電極層上形成第二金屬層。對第二導體層進行雷射蝕刻製程的步驟係蝕刻第二金屬層與第二電極層,致使第二金屬層與第二電極層於周邊區中共同形成第二走線。In one or more embodiments of the present disclosure, the step of forming the second conductor layer on the second surface of the film substrate includes: forming a second electrode layer in the display area on the second surface of the film substrate; and A second metal layer is formed on the second electrode layer. The step of performing the laser etching process on the second conductor layer is to etch the second metal layer and the second electrode layer, so that the second metal layer and the second electrode layer jointly form a second wiring in the peripheral area.

於本揭露的一或多個實施方式中,溝槽位於薄膜基材在第一走線中之一者與第二走線之間的交錯區。In one or more implementations of the present disclosure, the trench is located in an intersection area of the film substrate between one of the first traces and the second trace.

綜上所述,於本揭露的觸控面板中,兩導體層分別設置於薄膜基材的相對兩表面上,並藉由雙面雷射蝕刻而在顯示區與周邊區中分別製作出電極與走線。因此,本揭露的觸控面板相較於習知之GFF結構少了一張光學膠(Optical Clear Adhesive, OCA)層以及一張基材,因此可以節省成本。另外,本揭露於薄膜基材有效利用雷射蝕刻乾淨周邊區走線圖案,以形成彼此間無短路的走線。同時,本揭露具有優異雷射控制技術使薄膜基材即使吸收能量形成淺層溝槽,藉由控制溝槽深度與薄膜基材厚度間關係以確保不影響薄膜基材的力學結構。本揭露的深度控制技術取決於本揭露雷射製程能有效控制溝槽深度及基材厚度之間的數學關係(即下文中的D<1/2T),以確保薄膜基材保有足夠力學結構。並且,本揭露教導了因應薄膜基材厚度去調控溝槽深度技術思想,提供超薄雙面快速雷射製程量產突破性。To sum up, in the touch panel of the present disclosure, the two conductor layers are respectively disposed on opposite surfaces of the film substrate, and electrodes and electrodes are formed in the display area and the peripheral area by double-sided laser etching, respectively. Traces. Therefore, compared with the conventional GFF structure, the touch panel of the present disclosure has one less Optical Clear Adhesive (OCA) layer and one substrate, thus saving cost. In addition, the present disclosure effectively utilizes laser etching to clean the wiring patterns in the peripheral area of the film substrate, so as to form wirings without short circuit between each other. At the same time, the present disclosure has excellent laser control technology so that even if the film substrate absorbs energy to form shallow grooves, the mechanical structure of the film substrate is not affected by controlling the relationship between the depth of the groove and the thickness of the film substrate. The depth control technology of the present disclosure depends on the laser process of the present disclosure being able to effectively control the mathematical relationship between the groove depth and the thickness of the substrate (ie, D<1/2T hereinafter), so as to ensure that the film substrate maintains a sufficient mechanical structure. Moreover, this disclosure teaches the technical idea of adjusting the groove depth according to the thickness of the film substrate, and provides a breakthrough in the mass production of the ultra-thin double-sided fast laser process.

以上所述僅係用以闡述本揭露所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本揭露之具體細節將在下文的實施方式及相關圖式中詳細介紹。The above description is only used to explain the problems to be solved by the present disclosure, the technical means to solve the problems, and the effects thereof, etc. The specific details of the present disclosure will be introduced in detail in the following implementation methods and related drawings.

以下將以圖式揭露本揭露之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本揭露。也就是說,在本揭露部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。The following will disclose multiple implementations of the present disclosure with diagrams, and for the sake of clarity, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present disclosure. That is to say, in some embodiments of the present disclosure, these practical details are unnecessary. In addition, for the sake of simplifying the drawings, some well-known structures and components will be shown in a simple and schematic manner in the drawings.

請參照第1A圖,其為繪示根據本揭露一實施方式之電子裝置100的示意圖。如第1A圖所示,於本實施方式中,電子裝置100包含觸控面板200以及顯示器300。觸控面板200設置於顯示器300上。觸控面板200包含薄膜基材210、第一導體層220、第二導體層230、黏固層241、242、遮光層250以及蓋板260。薄膜基材210具有相對的第一表面211以及第二表面212。第一導體層220設置且接觸於第一表面211。第二導體層230設置且接觸於第二表面212。蓋板260經由黏固層241黏固於第二導體層230遠離薄膜基材210的一側。顯示器300經由黏固層242黏固於第一導體層220遠離薄膜基材210的一側。遮光層250設置於蓋板260與第二導體層230之間。Please refer to FIG. 1A , which is a schematic diagram illustrating an electronic device 100 according to an embodiment of the present disclosure. As shown in FIG. 1A , in this embodiment, the electronic device 100 includes a touch panel 200 and a display 300 . The touch panel 200 is disposed on the display 300 . The touch panel 200 includes a film substrate 210 , a first conductor layer 220 , a second conductor layer 230 , adhesive layers 241 , 242 , a light shielding layer 250 and a cover plate 260 . The film substrate 210 has a first surface 211 and a second surface 212 opposite to each other. The first conductive layer 220 is disposed on and contacts the first surface 211 . The second conductive layer 230 is disposed on and contacts the second surface 212 . The cover plate 260 is adhered to the side of the second conductor layer 230 away from the film substrate 210 via the adhesive layer 241 . The display 300 is adhered to the side of the first conductor layer 220 away from the film substrate 210 via the adhesive layer 242 . The light shielding layer 250 is disposed between the cover plate 260 and the second conductive layer 230 .

於一些實施方式中,薄膜基材210的材料包含聚對苯二甲酸乙二酯(PET),但本揭露並不以此為限。In some embodiments, the material of the film substrate 210 includes polyethylene terephthalate (PET), but the disclosure is not limited thereto.

於一些實施方式中,蓋板260的材料包含玻璃,但本揭露並不以此為限。In some embodiments, the material of the cover plate 260 includes glass, but the disclosure is not limited thereto.

於一些實施方式中,黏固層241、242中之至少一者可為光學膠(Optical Clear Adhesive, OCA)層,但本揭露並不以此為限。In some embodiments, at least one of the adhesive layers 241 and 242 may be an optical clear adhesive (OCA) layer, but the present disclosure is not limited thereto.

藉由前述結構配置,本實施方式的觸控面板200相較於習知之GFF結構可減少了一張OCA層以及一張基材,因此可以節省成本。此外,本揭露使用超薄型薄膜基材210以使整體厚度可以極薄化。 With the aforementioned structural configuration, compared with the conventional GFF structure, the touch panel 200 of this embodiment can reduce one OCA layer and one substrate, thus saving cost. In addition, the present disclosure uses an ultra-thin film substrate 210 so that the overall thickness can be extremely thin.

請參照第2圖以及第3圖。第2圖為繪示第1A圖中之觸控面板200的部分元件的正視圖。第3圖為繪示第2圖中之觸控面板200的局部放大圖。如第1A圖至第3圖所示,於本實施方式中,薄膜基材210上定義顯示區Z1以及周邊區Z2。第一導體層220包含第一電極層221以及第一金屬層222。第一電極層221設置於顯示區Z1中。第一電極層221與第一金屬層222係依序疊合於第一表面211上,且於周邊區Z2中共同形成複數個第一走線TR1。第二導體層230包含第二電極層231以及第二金屬層232。第二電極層231設置於顯示區Z1中。第二電極層231與第二金屬層232係依序疊合於第二表面212上,且於周邊區Z2中共同形成複數個第二走線TR2。遮光層250位於周邊區Z2,並配置以由上方對第一走線TR1與第二走線TR2進行遮光。 Please refer to Figure 2 and Figure 3. FIG. 2 is a front view showing some elements of the touch panel 200 in FIG. 1A. FIG. 3 is a partially enlarged view showing the touch panel 200 in FIG. 2 . As shown in FIG. 1A to FIG. 3 , in this embodiment, a display area Z1 and a peripheral area Z2 are defined on the film substrate 210 . The first conductive layer 220 includes a first electrode layer 221 and a first metal layer 222 . The first electrode layer 221 is disposed in the display area Z1. The first electrode layer 221 and the first metal layer 222 are stacked on the first surface 211 in sequence, and jointly form a plurality of first traces TR1 in the peripheral zone Z2. The second conductor layer 230 includes a second electrode layer 231 and a second metal layer 232 . The second electrode layer 231 is disposed in the display area Z1. The second electrode layer 231 and the second metal layer 232 are stacked on the second surface 212 in sequence, and jointly form a plurality of second traces TR2 in the peripheral zone Z2. The light shielding layer 250 is located in the peripheral zone Z2 and configured to shield the first trace TR1 and the second trace TR2 from above.

詳細來說,第一電極層221包含複數個第一軸向電極221a。第二電極層231包含複數個第二軸向電極231a。前述「第一軸向」與「第二軸向」例如分別為相互垂直的兩軸(例如Y軸與X軸)。換言之,第一軸向電極221a為沿著第一軸向延伸的導電線路,並間隔排列。第二軸向電極231a為沿著第二軸延伸的導電線路,並間隔排列。另外,第一走線TR1包含複數個接腳結構TR1a,且第二走線TR2包含複數個接腳結構TR2a。接腳結構TR1a、TR2a位於薄膜基材210的同一側邊,並配置以與軟性電路板(圖未示)連接。藉此,觸控面板200受觸控而產生的觸控訊號即可從第一電極層221與第二電極層231分別經由第一走線TR1與第二走線TR2傳遞至軟性電路板。In detail, the first electrode layer 221 includes a plurality of first axial electrodes 221a. The second electrode layer 231 includes a plurality of second axial electrodes 231a. The aforementioned “first axis” and “second axis” are, for example, two axes perpendicular to each other (eg, Y axis and X axis). In other words, the first axis electrodes 221a are conductive lines extending along the first axis and arranged at intervals. The second axial electrodes 231a are conductive lines extending along the second axis and arranged at intervals. In addition, the first trace TR1 includes a plurality of pin structures TR1a, and the second trace TR2 includes a plurality of pin structures TR2a. The pin structures TR1a and TR2a are located on the same side of the film substrate 210 and configured to connect with a flexible circuit board (not shown). In this way, the touch signal generated by the touch panel 200 can be transmitted from the first electrode layer 221 and the second electrode layer 231 to the flexible circuit board through the first trace TR1 and the second trace TR2 respectively.

於一些實施方式中,第一電極層221與第二電極層231中之至少一者為可以是奈米銀線(silver nano wires, SNW;又稱AgNW)電極層,但本揭露並不以此為限。第一電極層221與第二電極層231中之前述至少一者為可包含基質和摻雜於其內之奈米銀線。奈米銀線於基質中相互搭接形成導電網路。基質是指含奈米銀線的溶液在經過塗佈與加熱烘乾等製程所形成的非奈米銀線物質。奈米銀線散佈或嵌入於基質中,且部分地從基質中突出。基質可以保護奈米銀線免受腐蝕、磨損等外界環境的影響。於一些實施方式中,基質係可壓縮的。In some embodiments, at least one of the first electrode layer 221 and the second electrode layer 231 may be a nano silver wire (silver nano wires, SNW; also known as AgNW) electrode layer, but this disclosure does not limit. The foregoing at least one of the first electrode layer 221 and the second electrode layer 231 may include a matrix and silver nanowires doped therein. The silver nanowires overlap each other in the matrix to form a conductive network. The matrix refers to the non-nano-silver wire material formed by coating, heating and drying the solution containing the nano-silver wire. The silver nanowires are scattered or embedded in the matrix, and partly protrude from the matrix. The matrix can protect the silver nanowires from external environment such as corrosion and abrasion. In some embodiments, the matrix is compressible.

請參照第1B圖,其為繪示根據本揭露一實施方式之電子裝置100’的示意圖。相較於第1A圖所示之實施方式,本實施方式之電子裝置100’進一步包含保護層270。保護層270覆蓋第一走線TR1。具體來說,保護層270呈框型,並覆蓋第一走線TR1遠離薄膜基材210的一側以及第一走線TR1的內緣。第一走線TR1與黏固層242由保護層270隔開。當顯示器300的周邊區小於薄膜基材210上定義的周邊區Z2時,第一走線TR1會外露到顯示器300外面影響環測效果,例如水氣等。因此,靠近顯示器300之第一走線TR1需要藉由保護層270來避免上述問題。Please refer to FIG. 1B , which is a schematic diagram illustrating an electronic device 100' according to an embodiment of the present disclosure. Compared with the embodiment shown in FIG. 1A, the electronic device 100' of this embodiment further includes a protective layer 270. The protective layer 270 covers the first trace TR1. Specifically, the protection layer 270 is frame-shaped, and covers the side of the first trace TR1 away from the film substrate 210 and the inner edge of the first trace TR1 . The first trace TR1 is separated from the adhesive layer 242 by the protection layer 270 . When the peripheral area of the display 300 is smaller than the peripheral area Z2 defined on the film substrate 210 , the first trace TR1 will be exposed to the outside of the display 300 and affect the ring-test effect, such as moisture and the like. Therefore, the first trace TR1 close to the display 300 needs to use the protection layer 270 to avoid the above problems.

請參照第4A圖以及第4B圖。第4A圖為繪示第3圖中之觸控面板200沿著線段4A-4A的局部剖面圖。第4B圖為繪示第3圖中之觸控面板200沿著線段4B-4B的局部剖面圖。如第4A圖與第4B圖所示,於本實施方式中,薄膜基材210具有複數個溝槽214。溝槽214分布於第一表面211與第二表面212上。需說明的是,薄膜基材210在第一走線TR1與第二走線TR2之間具有交錯區213。舉例來說,前述交錯區213係薄膜基材210被第一走線TR1及第二走線TR2在垂直於第一表面211或第二表面212的方向A(即垂直投影方向)上的投影的重疊區域及鄰近區域。溝槽214至少位於此交錯區213。Please refer to Figure 4A and Figure 4B. FIG. 4A is a partial cross-sectional view of the touch panel 200 along line 4A- 4A in FIG. 3 . FIG. 4B is a partial cross-sectional view of the touch panel 200 along line 4B-4B in FIG. 3 . As shown in FIG. 4A and FIG. 4B , in this embodiment, the film substrate 210 has a plurality of grooves 214 . The grooves 214 are distributed on the first surface 211 and the second surface 212 . It should be noted that the film substrate 210 has an interlaced region 213 between the first trace TR1 and the second trace TR2. For example, the aforementioned interlaced area 213 is the projection of the film substrate 210 by the first trace TR1 and the second trace TR2 in the direction A (ie, the vertical projection direction) perpendicular to the first surface 211 or the second surface 212 Overlapping and adjacent areas. The trench 214 is located at least in the interlaced region 213 .

如第3圖與第4A圖所示,於本實施方式中,第一走線TR1進一步包含至少一接地線TR1’。溝槽214中之一者位於第一表面211上,並與接地線TR1’的邊緣E1在垂直於第一表面211的方向A上對齊。此溝槽214與接地線TR1’在垂直於第一表面211的方向A上錯開。此溝槽214具有深度D。深度D介於約2.5 µm與約厚度T的二分之一之間。如第3圖所示,前述交錯區213係薄膜基材210被接地線TR1’及第二走線TR2在垂直於第一表面211或第二表面212的方向A上的投影的重疊區域及鄰近區域。As shown in FIG. 3 and FIG. 4A, in this embodiment, the first trace TR1 further includes at least one ground trace TR1'. One of the trenches 214 is located on the first surface 211 and aligned with the edge E1 of the ground line TR1' in a direction A perpendicular to the first surface 211. The trench 214 is offset from the ground line TR1' in the direction A perpendicular to the first surface 211. The trench 214 has a depth D. The depth D is between about 2.5 µm and about one-half the thickness T. As shown in FIG. 3, the aforesaid interlaced area 213 is the overlapping area and the adjacent area where the film substrate 210 is projected by the ground line TR1' and the second trace TR2 in the direction A perpendicular to the first surface 211 or the second surface 212. area.

如第4B圖所示,於本實施方式中,第一走線TR1中之兩相鄰者之間具有間隙G。溝槽214中之一者位於第一表面211上,並與第一走線TR1中之一者的邊緣E1在垂直於第一表面211的方向A上對齊。第一電極層221具有通槽221b連通於溝槽214與間隙G之間。這些溝槽214的深度D皆符合前述尺寸限制。As shown in FIG. 4B , in this embodiment, there is a gap G between two adjacent ones of the first traces TR1 . One of the trenches 214 is located on the first surface 211 and is aligned with the edge E1 of one of the first traces TR1 in a direction A perpendicular to the first surface 211 . The first electrode layer 221 has a through groove 221 b communicating between the trench 214 and the gap G. As shown in FIG. The depths D of the trenches 214 all meet the aforementioned size constraints.

相同或相似地,第二走線TR2中之兩相鄰者之間具有間隙G。溝槽214中之一者位於第二表面212上,並與第二走線TR2中之一者的邊緣E2在垂直於第二表面212的方向A上對齊。第二電極層231具有通槽231b連通於溝槽214與間隙G之間。這些溝槽214的深度D皆符合前述尺寸限制。Same or similar, there is a gap G between two adjacent ones of the second traces TR2. One of the trenches 214 is located on the second surface 212 and is aligned with the edge E2 of one of the second traces TR2 in a direction A perpendicular to the second surface 212 . The second electrode layer 231 has a through groove 231 b communicating between the trench 214 and the gap G. As shown in FIG. The depths D of the trenches 214 all meet the aforementioned size constraints.

於實際應用中,本實施方式的觸控面板200可藉由雙面雷射蝕刻而在顯示區Z1與周邊區Z2中分別製作出電極、走線。並且,為了蝕刻乾淨第一走線TR1及第二走線TR2(由於第一走線TR1實質上係由第一電極層221與第一金屬層222疊合而成,而第二走線TR2實質上係由第二電極層231與第二金屬層232疊合而成),前述雷射蝕刻使用較強能量蝕刻乾淨亦同時於薄膜基材210上形成溝槽214(吸收雷射能量所致),因此可有效減少製造時間。In practical application, the touch panel 200 of this embodiment can respectively produce electrodes and wires in the display area Z1 and the peripheral area Z2 by double-sided laser etching. Moreover, in order to etch the first trace TR1 and the second trace TR2 (since the first trace TR1 is essentially formed by overlapping the first electrode layer 221 and the first metal layer 222, and the second trace TR2 is essentially The above is composed of the second electrode layer 231 and the second metal layer 232), the aforementioned laser etching uses strong energy to etch clean and at the same time forms the groove 214 on the film substrate 210 (caused by the absorption of laser energy) , so the manufacturing time can be effectively reduced.

需說明的是,深度D不超過厚度T的二分之一的限制是為了避免分別位於第一表面211與第二表面212上的溝槽214在方向A上對齊而造成薄膜基材210於力學結構支撐不足以產生破裂的問題。此深度D控制技術取決於本揭露雷射製程能有效控制溝槽214深度D及基材厚度T之間的數學關係(即D<1/2T),以確保薄膜基材210保有足夠力學結構。並且,本揭露教導了因應薄膜基材210厚度T去調控溝槽214深度D技術思想,提供超薄雙面快速雷射製程量產突破性。It should be noted that the restriction that the depth D does not exceed one-half of the thickness T is to prevent the grooves 214 respectively located on the first surface 211 and the second surface 212 from being aligned in the direction A and causing the film substrate 210 to be mechanically unstable. Insufficient structural support creates cracking problems. The depth D control technology depends on the laser process of the present disclosure being able to effectively control the mathematical relationship between the depth D of the trench 214 and the thickness T of the substrate (ie D<1/2T), so as to ensure that the film substrate 210 maintains a sufficient mechanical structure. Moreover, this disclosure teaches the technical idea of adjusting the depth D of the trench 214 according to the thickness T of the film substrate 210 , and provides a breakthrough in mass production of the ultra-thin double-sided fast laser process.

藉由前述結構配置,本實施方式的觸控面板200可利用溝槽214有效地增加走線之間發生短路的困難度。不僅如此,溝槽214還可增加薄膜基材210的可撓性,進而增加使用壽命。With the aforementioned structural configuration, the touch panel 200 of this embodiment can use the groove 214 to effectively increase the difficulty of short circuit between the wires. Not only that, the groove 214 can also increase the flexibility of the film substrate 210, thereby increasing the service life.

於一些實施方式中,薄膜基材210的厚度T介於約12.5 µm與約125 µm之間,但本揭露並不以此為限。In some embodiments, the thickness T of the film substrate 210 is between about 12.5 μm and about 125 μm, but the disclosure is not limited thereto.

請參照第5圖,其為繪示根據本揭露一實施方式之觸控面板的製造方法的流程圖。本實施方式之製造方法至少包含步驟S101至步驟S104。以下配合第1A圖至第4B圖說明。Please refer to FIG. 5 , which is a flowchart illustrating a manufacturing method of a touch panel according to an embodiment of the present disclosure. The manufacturing method of this embodiment includes at least step S101 to step S104. The following will be described in conjunction with Figures 1A to 4B.

步驟S101:於薄膜基材210的第一表面211上形成第一導體層220,其中薄膜基材210具有厚度T,且其上定義顯示區Z1以及周邊區Z2。Step S101 : forming a first conductive layer 220 on the first surface 211 of the film substrate 210 , wherein the film substrate 210 has a thickness T and defines a display zone Z1 and a peripheral zone Z2 thereon.

步驟S102:於薄膜基材210的第二表面212上形成第二導體層230,其中第一表面211與第二表面212分別位於薄膜基材210的相反兩側。Step S102 : forming a second conductor layer 230 on the second surface 212 of the film substrate 210 , wherein the first surface 211 and the second surface 212 are respectively located on opposite sides of the film substrate 210 .

步驟S103:對第一導體層220進行雷射蝕刻製程,以於周邊區Z2中形成複數個第一走線TR1,並於第一表面211上形成具有深度D之溝槽214,其中深度D介於約2.5 µm與約厚度T的二分之一之間。Step S103: Perform a laser etching process on the first conductor layer 220 to form a plurality of first traces TR1 in the peripheral zone Z2, and form a trench 214 with a depth D on the first surface 211, wherein the depth D is between Between about 2.5 µm and about half of the thickness T.

於一些實施方式中,步驟S101包含:於薄膜基材210的第一表面211上形成第一電極層221於顯示區Z1中;以及於第一電極層221上形成第一金屬層222。並且,步驟S103係蝕刻第一金屬層222與第一電極層221,致使第一金屬層222與第一電極層221於周邊區Z2中共同形成第一走線TR1。In some embodiments, step S101 includes: forming a first electrode layer 221 in the display area Z1 on the first surface 211 of the film substrate 210 ; and forming a first metal layer 222 on the first electrode layer 221 . Moreover, step S103 is to etch the first metal layer 222 and the first electrode layer 221 , so that the first metal layer 222 and the first electrode layer 221 jointly form the first trace TR1 in the peripheral zone Z2 .

步驟S104:對第二導體層230進行雷射蝕刻製程,以於周邊區Z2中形成複數個第二走線TR2。Step S104 : performing a laser etching process on the second conductor layer 230 to form a plurality of second traces TR2 in the peripheral zone Z2 .

於一些實施方式中,步驟S102包含:於薄膜基材210的第二表面212上形成第二電極層231於顯示區Z1中;以及於第二電極層231上形成第二金屬層232。並且,步驟S104係蝕刻第二金屬層232與第二電極層231,致使第二金屬層232與第二電極層231於周邊區Z2中共同形成第二走線TR2。In some embodiments, step S102 includes: forming a second electrode layer 231 in the display area Z1 on the second surface 212 of the film substrate 210 ; and forming a second metal layer 232 on the second electrode layer 231 . Moreover, step S104 is to etch the second metal layer 232 and the second electrode layer 231 , so that the second metal layer 232 and the second electrode layer 231 jointly form the second trace TR2 in the peripheral zone Z2 .

於本實施方式中,步驟S104係晚於步驟S103,且步驟S104使得第一導體層220的電阻值增加約5%以內。In this embodiment, step S104 is later than step S103, and step S104 increases the resistance value of the first conductive layer 220 within about 5%.

於其他實施方式中,步驟S103係晚於步驟S104,且步驟S103使得第二導體層230的電阻值增加約5%以內。In other embodiments, step S103 is later than step S104, and step S103 increases the resistance value of the second conductive layer 230 within about 5%.

下表為採用不同種類之雷射製造觸控面板200的多個實施例的表格。 區域 雷射種類 溝槽深度 阻值變化率 結果 第一走線與第二走線重疊(周邊區) IR奈秒 0 無窮大 不合格 IR皮秒 >5 µm <5% 合格 紫外皮秒 >10 µm <5% 合格 第一走線與第二走線不重疊(周邊區) IR奈秒 0 N/A 合格 IR皮秒 >5 µm N/A 合格 紫外皮秒 >10 µm N/A 合格 顯示區 IR奈秒 0 >5% 不合格 IR皮秒 >5 µm >5% 不合格 紫外皮秒 0 <5% 合格 The following table is a table of various embodiments of manufacturing the touch panel 200 using different types of lasers. area Type of laser groove depth Resistance change rate result The first trace overlaps the second trace (perimeter area) IR nanosecond 0 gigantic unqualified IR picosecond >5 µm <5% qualified UV picosecond >10 µm <5% qualified The first trace does not overlap with the second trace (perimeter area) IR nanosecond 0 N/A qualified IR picosecond >5 µm N/A qualified UV picosecond >10 µm N/A qualified display area IR nanosecond 0 >5% unqualified IR picosecond >5 µm >5% unqualified UV picosecond 0 <5% qualified

由上表可知,針對觸控面板200的不同區域,可彈性地選用IR奈秒雷射、IR皮秒雷射與紫外皮秒雷射進行加工。其中,紫外皮秒雷射可使用於觸控面板200的所有區域,因此被使用來製造觸控面板200時不需換雷射頭,因此可減少製造時間。It can be known from the above table that for different regions of the touch panel 200 , IR nanosecond laser, IR picosecond laser and ultraviolet picosecond laser can be flexibly selected for processing. Among them, the ultraviolet picosecond laser can be used in all areas of the touch panel 200 , so when used to manufacture the touch panel 200 , it is not necessary to change the laser head, thus reducing the manufacturing time.

由以上對於本揭露之具體實施方式之詳述,可以明顯地看出,於本揭露的觸控面板中,兩導體層分別設置於薄膜基材的相對兩表面上,並藉由雙面雷射蝕刻而在顯示區與周邊區中分別製作出電極與走線。因此,本揭露的觸控面板相較於習知之GFF結構少了一張OCA層以及一張基材,因此可以節省成本。另外,本揭露於薄膜基材有效利用雷射蝕刻乾淨周邊區走線圖案,以形成彼此間無短路的走線。同時,本揭露具有優異雷射控制技術使薄膜基材即使吸收能量形成淺層溝槽,藉由控制溝槽深度與薄膜基材厚度間關係以確保不影響薄膜基材的力學結構。本揭露的深度控制技術取決於本揭露雷射製程能有效控制溝槽深度及基材厚度之間的數學關係(即上文中的D<1/2T),以確保薄膜基材保有足夠力學結構。並且,本揭露教導了因應薄膜基材厚度去調控溝槽深度技術思想,提供超薄雙面快速雷射製程量產突破性。From the above detailed description of the specific embodiments of the present disclosure, it can be clearly seen that in the touch panel of the present disclosure, the two conductor layers are respectively arranged on the opposite two surfaces of the film substrate, and the two-sided laser Etching to make electrodes and wires in the display area and the peripheral area respectively. Therefore, compared with the conventional GFF structure, the touch panel of the present disclosure has one less OCA layer and one substrate, thus saving cost. In addition, the present disclosure effectively utilizes laser etching to clean the wiring patterns in the peripheral area of the film substrate, so as to form wirings without short circuit between each other. At the same time, the present disclosure has excellent laser control technology so that even if the film substrate absorbs energy to form shallow grooves, the mechanical structure of the film substrate is not affected by controlling the relationship between the depth of the groove and the thickness of the film substrate. The depth control technology of the present disclosure depends on the laser process of the present disclosure being able to effectively control the mathematical relationship between the groove depth and the thickness of the substrate (ie, D<1/2T above), so as to ensure that the film substrate maintains a sufficient mechanical structure. Moreover, this disclosure teaches the technical idea of adjusting the groove depth according to the thickness of the film substrate, and provides a breakthrough in the mass production of the ultra-thin double-sided fast laser process.

雖然本揭露已以實施方式揭露如上,然其並不用以限定本揭露,任何熟習此技藝者,在不脫離本揭露的精神和範圍內,當可作各種的更動與潤飾,因此本揭露的保護範圍當視後附的申請專利範圍所界定者為準。Although the present disclosure has been disclosed above in terms of implementation, it is not intended to limit this disclosure. Any person skilled in the art may make various changes and modifications without departing from the spirit and scope of this disclosure. Therefore, the protection of this disclosure The scope shall be defined by the scope of the appended patent application.

100:電子裝置 200:觸控面板 210:薄膜基材 211:第一表面 212:第二表面 213:交錯區 214:溝槽 220:第一導體層 221:第一電極層 221a:第一軸向電極 222:第一金屬層 230:第二導體層 231:第二電極層 231a:第二軸向電極 232:第二金屬層241,242:黏固層 250:遮光層 260:蓋板 270:保護層 300:顯示器 A:方向 D:深度 E1,E2:邊緣 G:間隙 T:厚度 TR1:第一走線 TR1a,TR2a:接腳結構 TR1’:接地線 TR2:第二走線 Z1:顯示區 Z2:周邊區 100: Electronic device 200: touch panel 210: film substrate 211: first surface 212: second surface 213: Staggered area 214: Groove 220: the first conductor layer 221: the first electrode layer 221a: first axial electrode 222: The first metal layer 230: second conductor layer 231: second electrode layer 231a: second axial electrode 232: second metal layer 241, 242: adhesive layer 250: shading layer 260: cover plate 270: protective layer 300: display A: Direction D: Depth E1, E2: edge G: Gap T: Thickness TR1: the first trace TR1a, TR2a: pin structure TR1': ground wire TR2: the second trace Z1: display area Z2: Surrounding area

為讓本揭露之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1A圖為繪示根據本揭露一實施方式之電子裝置的示意圖。 第1B圖為繪示根據本揭露另一實施方式之電子裝置的示意圖。 第2圖為繪示第1A圖中之觸控面板的部分元件的正視圖。 第3圖為繪示第2圖中之觸控面板的局部放大圖。 第4A圖為繪示第3圖中之觸控面板沿著線段4A-4A的局部剖面圖。 第4B圖為繪示第3圖中之觸控面板沿著線段4B-4B的局部剖面圖。 第5圖為繪示根據本揭露一實施方式之觸控面板的製造方法的流程圖。 In order to make the above and other purposes, features, advantages and embodiments of the present disclosure more comprehensible, the accompanying drawings are described as follows: FIG. 1A is a schematic diagram illustrating an electronic device according to an embodiment of the present disclosure. FIG. 1B is a schematic diagram illustrating an electronic device according to another embodiment of the present disclosure. FIG. 2 is a front view showing some components of the touch panel in FIG. 1A. FIG. 3 is a partially enlarged view showing the touch panel in FIG. 2 . FIG. 4A is a partial cross-sectional view of the touch panel in FIG. 3 along the line segment 4A-4A. FIG. 4B is a partial cross-sectional view of the touch panel in FIG. 3 along the line segment 4B-4B. FIG. 5 is a flow chart illustrating a manufacturing method of a touch panel according to an embodiment of the present disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic deposit information (please note in order of depositor, date, and number) none Overseas storage information (please note in order of storage country, institution, date, and number) none

210:薄膜基材 210: film substrate

211:第一表面 211: first surface

212:第二表面 212: second surface

213:交錯區 213: Staggered area

214:溝槽 214: Groove

221:第一電極層 221: the first electrode layer

222:第一金屬層 222: The first metal layer

231:第二電極層 231: second electrode layer

232:第二金屬層 232: second metal layer

A:方向 A: Direction

D:深度 D: Depth

E1:邊緣 E1: edge

T:厚度 T: Thickness

TR1’:接地線 TR1': ground wire

TR2:第二走線 TR2: the second trace

Claims (20)

一種觸控面板,包含: 一薄膜基材,其上定義一顯示區以及一周邊區,並具有相對的一第一表面以及一第二表面,以及一厚度; 一第一導體層,設置於該第一表面,並包含複數個第一走線設置於該周邊區;以及 一第二導體層,設置於該第二表面,並包含複數個第二走線設置於該周邊區; 其中該薄膜基材在該些第一走線中之一者與該些第二走線之間的一交錯區具有至少一溝槽,該溝槽於該第一表面與該第二表面中之一者上,並具有一深度,其中該深度介於約2.5 µm與約該厚度的二分之一之間。 A touch panel, comprising: a film substrate defining a display area and a peripheral area, and having a first surface and a second surface opposite, and a thickness; a first conductor layer, disposed on the first surface, and including a plurality of first traces disposed on the peripheral region; and A second conductor layer is arranged on the second surface, and includes a plurality of second traces arranged in the peripheral area; Wherein the film substrate has at least one groove in an intersection region between one of the first wirings and the second wirings, the groove is between the first surface and the second surface one, and have a depth, wherein the depth is between about 2.5 μm and about one-half the thickness. 如請求項1所述之觸控面板,其中該些第一走線包含複數個接腳結構以及一接地線,且該些第一走線中之該者為該接地線。The touch panel according to claim 1, wherein the first wirings include a plurality of pin structures and a grounding line, and the one of the first wirings is the grounding line. 如請求項2所述之觸控面板,其中該溝槽位於該第一表面上,並與該接地線的一邊緣在垂直於該第一表面的一方向上對齊。The touch panel according to claim 2, wherein the groove is located on the first surface and is aligned with an edge of the ground line in a direction perpendicular to the first surface. 如請求項3所述之觸控面板,其中該溝槽與該接地線在垂直於該第一表面的該方向上錯開。The touch panel according to claim 3, wherein the groove and the ground line are staggered in the direction perpendicular to the first surface. 如請求項1所述之觸控面板,其中該第一導體層進一步包含一第一金屬層以及一第一電極層,其中該第一電極層與該第一金屬層係依序疊合於該第一表面上,且於該周邊區中共同形成該些第一走線,該第二導體層進一步包含一第二金屬層以及一第二電極層,其中該第二電極層與該第二金屬層係依序疊合於該第二表面上,且於該周邊區中共同形成該些第二走線。The touch panel according to claim 1, wherein the first conductor layer further comprises a first metal layer and a first electrode layer, wherein the first electrode layer and the first metal layer are stacked on the On the first surface, the first wirings are jointly formed in the peripheral area, the second conductor layer further includes a second metal layer and a second electrode layer, wherein the second electrode layer and the second metal Layers are sequentially stacked on the second surface, and jointly form the second wirings in the peripheral area. 如請求項5所述之觸控面板,其中該第一電極層於該顯示區中包含複數個第一軸向電極,且該第二電極層於該顯示區中包含複數個第二軸向電極。The touch panel according to claim 5, wherein the first electrode layer includes a plurality of first axial electrodes in the display area, and the second electrode layer includes a plurality of second axial electrodes in the display area . 如請求項5所述之觸控面板,其中該第一電極層與該第二電極層中之至少一者為奈米銀線電極層。The touch panel according to claim 5, wherein at least one of the first electrode layer and the second electrode layer is a silver nanowire electrode layer. 如請求項1所述之觸控面板,其中該溝槽位於該第一表面上,該些第一走線中之兩相鄰者之間具有一間隙,且該溝槽與該間隙在垂直於該第一表面的一方向上對齊。The touch panel according to claim 1, wherein the groove is located on the first surface, there is a gap between two adjacent ones of the first traces, and the groove is perpendicular to the gap One direction of the first surface is aligned upwards. 如請求項1所述之觸控面板,其中該溝槽位於該第二表面上,該些第二走線中之兩相鄰者之間具有一間隙,且該溝槽與該間隙在垂直於該第二表面的一方向上對齊。The touch panel as described in claim 1, wherein the groove is located on the second surface, there is a gap between two adjacent ones of the second traces, and the groove is perpendicular to the gap One direction of the second surface is aligned upwards. 如請求項1所述之觸控面板,其中該溝槽位於該第二表面上,並與該些第二走線中之一者的一邊緣在垂直於該第二表面的一方向上對齊。The touch panel according to claim 1, wherein the groove is located on the second surface and is aligned with an edge of one of the second traces in a direction perpendicular to the second surface. 如請求項1所述之觸控面板,其中該薄膜基材的該厚度介於約12.5 µm與約125 µm之間。The touch panel according to claim 1, wherein the thickness of the film substrate is between about 12.5 μm and about 125 μm. 如請求項1所述之觸控面板,進一步包含一保護層,該保護層覆蓋該些第一走線。The touch panel according to claim 1 further includes a protection layer covering the first wirings. 如請求項12所述之觸控面板,其中該保護層呈框型,並覆蓋該些第一走線遠離該薄膜基材的一側以及該些第一走線的一內緣。The touch panel according to claim 12, wherein the protective layer is frame-shaped and covers a side of the first wirings away from the film substrate and an inner edge of the first wirings. 一種觸控面板的製造方法,包含: 於一薄膜基材的一第一表面上形成一第一導體層,其中該薄膜基材具有一厚度,且其上定義一顯示區以及一周邊區;以及 對該第一導體層進行一雷射蝕刻製程,以於該周邊區中形成複數個第一走線,並於該第一表面上形成具有一深度之至少一溝槽,其中該深度介於約2.5 µm與約該厚度的二分之一之間。 A method of manufacturing a touch panel, comprising: forming a first conductor layer on a first surface of a film substrate, wherein the film substrate has a thickness and defines a display area and a peripheral area thereon; and performing a laser etching process on the first conductor layer to form a plurality of first traces in the peripheral region, and forming at least one groove with a depth on the first surface, wherein the depth is between about Between 2.5 µm and about one-half that thickness. 如請求項14所述之觸控面板的製造方法,其中該於該薄膜基材的該第一表面上形成該第一導體層的步驟包含: 於該薄膜基材的該第一表面上形成一第一電極層於該顯示區中;以及 於該第一電極層上形成一第一金屬層, 其中該對該第一導體層進行該雷射蝕刻製程的步驟係蝕刻該第一金屬層與該第一電極層,致使該第一金屬層與該第一電極層於該周邊區中共同形成該些第一走線。 The method for manufacturing a touch panel according to claim 14, wherein the step of forming the first conductor layer on the first surface of the film substrate comprises: forming a first electrode layer in the display area on the first surface of the film substrate; and forming a first metal layer on the first electrode layer, Wherein the step of performing the laser etching process on the first conductor layer is to etch the first metal layer and the first electrode layer, so that the first metal layer and the first electrode layer jointly form the first metal layer and the first electrode layer in the peripheral region. Some first traces. 如請求項14所述之觸控面板的製造方法,進一步包含: 於該薄膜基材的一第二表面上形成一第二導體層,其中該第一表面與該第二表面分別位於該薄膜基材的相反兩側;以及 對該第二導體層進行該雷射蝕刻製程,以於該周邊區中形成複數個第二走線。 The manufacturing method of the touch panel as described in claim 14, further comprising: forming a second conductor layer on a second surface of the film substrate, wherein the first surface and the second surface are respectively located on opposite sides of the film substrate; and The laser etching process is performed on the second conductor layer to form a plurality of second traces in the peripheral area. 如請求項16所述之觸控面板的製造方法,其中該對該第二導體層進行該雷射蝕刻製程的步驟係晚於該對該第一導體層進行該雷射蝕刻製程的步驟,並使得該些第一走線的一電阻值增加約5%以內。The method for manufacturing a touch panel according to claim 16, wherein the step of performing the laser etching process on the second conductor layer is later than the step of performing the laser etching process on the first conductor layer, and The resistance of the first wires is increased within about 5%. 如請求項16所述之觸控面板的製造方法,其中該對該第一導體層進行該雷射蝕刻製程的步驟係晚於該對該第二導體層進行該雷射蝕刻製程的步驟,並使得該些第二走線的一電阻值增加約5%以內。The method for manufacturing a touch panel as claimed in claim 16, wherein the step of performing the laser etching process on the first conductor layer is later than the step of performing the laser etching process on the second conductor layer, and A resistance value of the second wires is increased within about 5%. 如請求項16所述之觸控面板的製造方法,其中該於該薄膜基材的該第二表面上形成該第二導體層的步驟包含: 於該薄膜基材的該第二表面上形成一第二電極層於該顯示區中;以及 於該第二電極層上形成一第二金屬層, 其中該對該第二導體層進行該雷射蝕刻製程的步驟係蝕刻該第二金屬層與該第二電極層,致使該第二金屬層與該第二電極層於該周邊區中共同形成該些第二走線。 The method for manufacturing a touch panel according to claim 16, wherein the step of forming the second conductor layer on the second surface of the film substrate comprises: forming a second electrode layer in the display area on the second surface of the film substrate; and forming a second metal layer on the second electrode layer, Wherein the step of performing the laser etching process on the second conductor layer is to etch the second metal layer and the second electrode layer, so that the second metal layer and the second electrode layer jointly form the second metal layer and the second electrode layer in the peripheral region. some second traces. 如請求項16所述之觸控面板的製造方法,其中該溝槽位於該薄膜基材在該些第一走線中之一者與該些第二走線之間的一交錯區。The method for manufacturing a touch panel according to claim 16, wherein the groove is located in an intersecting area of the film substrate between one of the first wirings and the second wirings.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150268770A1 (en) * 2013-09-11 2015-09-24 Ronald Steven Cok Multi-layer micro-wire structure
TW201545012A (en) * 2014-05-30 2015-12-01 Tech Material Co Ltd J Manufacturing method of conductive substrate for touch device
CN108919998A (en) * 2018-06-30 2018-11-30 云谷(固安)科技有限公司 Touch panel and preparation method thereof
CN109545447A (en) * 2017-09-22 2019-03-29 南昌欧菲显示科技有限公司 Transparent conductive film, touch screen and preparation method thereof
CN111258441A (en) * 2018-12-03 2020-06-09 南昌欧菲光科技有限公司 Touch structure manufacturing method, touch structure, touch display panel and electronic equipment
US20210223883A1 (en) * 2017-07-05 2021-07-22 Boe Technology Group Co., Ltd. Flexible touch substrate, preparation method thereof and touch display device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150268770A1 (en) * 2013-09-11 2015-09-24 Ronald Steven Cok Multi-layer micro-wire structure
TW201545012A (en) * 2014-05-30 2015-12-01 Tech Material Co Ltd J Manufacturing method of conductive substrate for touch device
US20210223883A1 (en) * 2017-07-05 2021-07-22 Boe Technology Group Co., Ltd. Flexible touch substrate, preparation method thereof and touch display device
CN109545447A (en) * 2017-09-22 2019-03-29 南昌欧菲显示科技有限公司 Transparent conductive film, touch screen and preparation method thereof
CN108919998A (en) * 2018-06-30 2018-11-30 云谷(固安)科技有限公司 Touch panel and preparation method thereof
CN111258441A (en) * 2018-12-03 2020-06-09 南昌欧菲光科技有限公司 Touch structure manufacturing method, touch structure, touch display panel and electronic equipment

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