WO2022244969A1 - Procédé de préparation d'un composé à base de lactone de méthylène - Google Patents
Procédé de préparation d'un composé à base de lactone de méthylène Download PDFInfo
- Publication number
- WO2022244969A1 WO2022244969A1 PCT/KR2022/004436 KR2022004436W WO2022244969A1 WO 2022244969 A1 WO2022244969 A1 WO 2022244969A1 KR 2022004436 W KR2022004436 W KR 2022004436W WO 2022244969 A1 WO2022244969 A1 WO 2022244969A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- based compound
- phosphine
- metal
- methylene lactone
- formula
- Prior art date
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 87
- -1 methylene lactone Chemical class 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 claims abstract description 28
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 64
- 229910052751 metal Inorganic materials 0.000 claims description 57
- 239000002184 metal Substances 0.000 claims description 57
- 238000006243 chemical reaction Methods 0.000 claims description 49
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 35
- 150000003839 salts Chemical class 0.000 claims description 32
- 150000004714 phosphonium salts Chemical class 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 20
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 18
- 239000000243 solution Substances 0.000 claims description 18
- 238000011065 in-situ storage Methods 0.000 claims description 17
- 239000007795 chemical reaction product Substances 0.000 claims description 16
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 16
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 239000003960 organic solvent Substances 0.000 claims description 13
- 229920002866 paraformaldehyde Polymers 0.000 claims description 13
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 claims description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 10
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 9
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 8
- 150000007530 organic bases Chemical class 0.000 claims description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 7
- 239000007983 Tris buffer Substances 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 7
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 claims description 6
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 6
- 125000001475 halogen functional group Chemical group 0.000 claims description 6
- 150000007529 inorganic bases Chemical class 0.000 claims description 6
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 claims description 6
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 6
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical group [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 claims description 6
- 238000005292 vacuum distillation Methods 0.000 claims description 6
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 5
- 239000012312 sodium hydride Substances 0.000 claims description 5
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 4
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910000103 lithium hydride Inorganic materials 0.000 claims description 4
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 4
- UPDNYUVJHQABBS-UHFFFAOYSA-N phenoxy(diphenyl)phosphane Chemical compound C=1C=CC=CC=1OP(C=1C=CC=CC=1)C1=CC=CC=C1 UPDNYUVJHQABBS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 claims description 3
- 125000004207 3-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(OC([H])([H])[H])=C1[H] 0.000 claims description 3
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 claims description 3
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 150000001558 benzoic acid derivatives Chemical class 0.000 claims description 3
- 229930188620 butyrolactone Natural products 0.000 claims description 3
- 229910052744 lithium Inorganic materials 0.000 claims description 3
- JILPJDVXYVTZDQ-UHFFFAOYSA-N lithium methoxide Chemical compound [Li+].[O-]C JILPJDVXYVTZDQ-UHFFFAOYSA-N 0.000 claims description 3
- LZWQNOHZMQIFBX-UHFFFAOYSA-N lithium;2-methylpropan-2-olate Chemical compound [Li+].CC(C)(C)[O-] LZWQNOHZMQIFBX-UHFFFAOYSA-N 0.000 claims description 3
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 claims description 3
- 229910001507 metal halide Inorganic materials 0.000 claims description 3
- 150000005309 metal halides Chemical class 0.000 claims description 3
- 229910001960 metal nitrate Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Inorganic materials [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 claims description 3
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 3
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 3
- QAPGHLJQIVDTPT-UHFFFAOYSA-N tris(3-chlorophenyl)phosphane Chemical compound ClC1=CC=CC(P(C=2C=C(Cl)C=CC=2)C=2C=C(Cl)C=CC=2)=C1 QAPGHLJQIVDTPT-UHFFFAOYSA-N 0.000 claims description 3
- CCXTYQMZVYIQRP-UHFFFAOYSA-N tris(3-methoxyphenyl)phosphane Chemical compound COC1=CC=CC(P(C=2C=C(OC)C=CC=2)C=2C=C(OC)C=CC=2)=C1 CCXTYQMZVYIQRP-UHFFFAOYSA-N 0.000 claims description 3
- LFNXCUNDYSYVJY-UHFFFAOYSA-N tris(3-methylphenyl)phosphane Chemical compound CC1=CC=CC(P(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 LFNXCUNDYSYVJY-UHFFFAOYSA-N 0.000 claims description 3
- IQKSLJOIKWOGIZ-UHFFFAOYSA-N tris(4-chlorophenyl)phosphane Chemical compound C1=CC(Cl)=CC=C1P(C=1C=CC(Cl)=CC=1)C1=CC=C(Cl)C=C1 IQKSLJOIKWOGIZ-UHFFFAOYSA-N 0.000 claims description 3
- UYUUAUOYLFIRJG-UHFFFAOYSA-N tris(4-methoxyphenyl)phosphane Chemical compound C1=CC(OC)=CC=C1P(C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 UYUUAUOYLFIRJG-UHFFFAOYSA-N 0.000 claims description 3
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 claims description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 2
- JAWGVVJVYSANRY-UHFFFAOYSA-N cobalt(3+) Chemical compound [Co+3] JAWGVVJVYSANRY-UHFFFAOYSA-N 0.000 claims description 2
- AZVCGYPLLBEUNV-UHFFFAOYSA-N lithium;ethanolate Chemical compound [Li+].CC[O-] AZVCGYPLLBEUNV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- WSWCOQWTEOXDQX-MQQKCMAXSA-M (E,E)-sorbate Chemical compound C\C=C\C=C\C([O-])=O WSWCOQWTEOXDQX-MQQKCMAXSA-M 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 claims 1
- 229940075554 sorbate Drugs 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 6
- 239000000126 substance Substances 0.000 description 25
- 239000002585 base Substances 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 239000012535 impurity Substances 0.000 description 9
- 238000005481 NMR spectroscopy Methods 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- GSLDEZOOOSBFGP-UHFFFAOYSA-N alpha-methylene gamma-butyrolactone Chemical compound C=C1CCOC1=O GSLDEZOOOSBFGP-UHFFFAOYSA-N 0.000 description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 239000011592 zinc chloride Substances 0.000 description 3
- 235000005074 zinc chloride Nutrition 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 2
- SXAMGRAIZSSWIH-UHFFFAOYSA-N 2-[3-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,2,4-oxadiazol-5-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NOC(=N1)CC(=O)N1CC2=C(CC1)NN=N2 SXAMGRAIZSSWIH-UHFFFAOYSA-N 0.000 description 2
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 2
- ZRPAUEVGEGEPFQ-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]pyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2 ZRPAUEVGEGEPFQ-UHFFFAOYSA-N 0.000 description 2
- YJLUBHOZZTYQIP-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=N2 YJLUBHOZZTYQIP-UHFFFAOYSA-N 0.000 description 2
- LFJJGHGXHXXDFT-UHFFFAOYSA-N 3-bromooxolan-2-one Chemical compound BrC1CCOC1=O LFJJGHGXHXXDFT-UHFFFAOYSA-N 0.000 description 2
- CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 229910052747 lanthanoid Inorganic materials 0.000 description 2
- 150000002602 lanthanoids Chemical class 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XQBKPBWQJVRMOJ-UHFFFAOYSA-N 1-bis(3-chlorophenyl)phosphoryl-3-chlorobenzene Chemical compound ClC1=CC=CC(P(=O)(C=2C=C(Cl)C=CC=2)C=2C=C(Cl)C=CC=2)=C1 XQBKPBWQJVRMOJ-UHFFFAOYSA-N 0.000 description 1
- XBBCBCRCOAMIPB-UHFFFAOYSA-N 1-bis(3-methoxyphenyl)phosphoryl-3-methoxybenzene Chemical compound COC1=CC=CC(P(=O)(C=2C=C(OC)C=CC=2)C=2C=C(OC)C=CC=2)=C1 XBBCBCRCOAMIPB-UHFFFAOYSA-N 0.000 description 1
- RJUIEUJUSTTWFW-UHFFFAOYSA-N 1-bis(3-methylphenyl)phosphoryl-3-methylbenzene Chemical compound CC1=CC=CC(P(=O)(C=2C=C(C)C=CC=2)C=2C=C(C)C=CC=2)=C1 RJUIEUJUSTTWFW-UHFFFAOYSA-N 0.000 description 1
- GJBIMMKVOGMMLP-UHFFFAOYSA-N 1-bis(4-chlorophenyl)phosphoryl-4-chlorobenzene Chemical compound C1=CC(Cl)=CC=C1P(=O)(C=1C=CC(Cl)=CC=1)C1=CC=C(Cl)C=C1 GJBIMMKVOGMMLP-UHFFFAOYSA-N 0.000 description 1
- SPKBYIYIZQARNX-UHFFFAOYSA-N 1-bis(4-methylphenyl)phosphoryl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1P(=O)(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 SPKBYIYIZQARNX-UHFFFAOYSA-N 0.000 description 1
- BSRTYNDWQXVCKR-UHFFFAOYSA-N 2,2-dichlorobutane Chemical compound CCC(C)(Cl)Cl BSRTYNDWQXVCKR-UHFFFAOYSA-N 0.000 description 1
- WWSJZGAPAVMETJ-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-ethoxypyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OCC WWSJZGAPAVMETJ-UHFFFAOYSA-N 0.000 description 1
- FYELSNVLZVIGTI-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-5-ethylpyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1CC)CC(=O)N1CC2=C(CC1)NN=N2 FYELSNVLZVIGTI-UHFFFAOYSA-N 0.000 description 1
- FLOKBGAYTGLYGR-UHFFFAOYSA-N 3-bromo-5-methyloxolan-2-one Chemical compound CC1CC(Br)C(=O)O1 FLOKBGAYTGLYGR-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- YOZBGKNUPRZMAN-UHFFFAOYSA-N P(=O)(=O)[P] Chemical compound P(=O)(=O)[P] YOZBGKNUPRZMAN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 240000005924 Stenocarpus sinuatus Species 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000000843 anti-fungal effect Effects 0.000 description 1
- 230000000259 anti-tumor effect Effects 0.000 description 1
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- CIJWIJSYZZLMGD-UHFFFAOYSA-N diphenylphosphoryloxybenzene Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)OC1=CC=CC=C1 CIJWIJSYZZLMGD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- AMWRITDGCCNYAT-UHFFFAOYSA-L manganese oxide Inorganic materials [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 230000001766 physiological effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007867 post-reaction treatment Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- BFLSLERVRLOFCX-UHFFFAOYSA-N tulipanin B Natural products OC1COC(=O)C1=C BFLSLERVRLOFCX-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/335—Heterocyclic compounds having oxygen as the only ring hetero atom, e.g. fungichromin
- A61K31/365—Lactones
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/56—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/58—One oxygen atom, e.g. butenolide
Definitions
- the present invention relates to an improved process for the preparation of methylene lactone-based compounds and similar derivatives.
- MBL Alpha methylene gamma butyrolactone
- Tulipalin A is a natural product contained in tulip flowers.
- MBL is a ⁇ -butyrolactone compound having an exomethylene group and is an important compound in the pharmaceutical industry because it has various physiological activities such as antitumor, antibacterial, and antifungal properties.
- Japanese Patent Laid-open Publication No. 2001-247560 discloses alpha-methylene-gamma-butyrolactone by reacting gamma butyrolactone and methanol under a manganese/magnesium oxide (Mn/MgO) catalyst.
- Mn/MgO manganese/magnesium oxide
- a method for preparing rolactone is disclosed.
- this method has a limitation in that it is difficult to use commercially because the conversion rate to formaldehyde is low.
- Korean Patent Registration No. KR 10-1427092 introduces a method of making enolate, an intermediate suggested by Murray, using sodium ethoxide and ethyl formate, but this technology is also difficult to apply to mass production due to poor filterability. is hard
- the present invention was made to solve the problems of the prior art, and does not require expensive manufacturing equipment such as a high-pressure reactor, and the reaction and post-reaction treatment are simple, and the intermediate manufacturing process is unnecessary, while reducing the process cost accordingly. , It is an object to provide a method for producing a methylene lactone-based compound in high yield.
- a method for preparing a methylene lactone-based compound involves mixing and reacting an alpha halo lactone-based compound, a phosphine-based compound, and an organic solvent, followed by cooling to obtain phospho-phosphorus represented by Formula 1 below.
- Step 1 of preparing a nium salt A second step of preparing a solution containing a methylene lactone-based compound and a phosphine-based oxide by mixing the phosphonium salt, a base, paraformaldehyde or formaldehyde, and an organic solvent, and then reacting in situ; A third step of adding a metal salt to the solution of step 2 and reacting the phosphine oxide with the metal salt to form a complex; and a fourth step of obtaining a methylene lactone-based compound represented by Formula 2 below by removing the complex from the solution in step 3 and then performing a concentration process and a vacuum distillation process.
- R 1 to R 3 are each independently a C 3 ⁇ C 4 straight-chain alkyl group, a phenyl group, a 3-chlorophenyl group, a 3-methylphenyl group, a 4-methylphenyl group, a 3-methoxyphenyl group, a 4-methoxyphenyl group A oxyphenyl group or a phenoxy group, X is -F, -Cl, -Br or -I, Y is And, R 4 is a hydrogen atom or a C 1 ⁇ C 5 linear alkyl group.
- R 4 in Formula 2 is a hydrogen atom or a C 1 to C 5 linear alkyl group.
- the alpha halo lactone-based compound in step 1 may include a lactone-based compound represented by Formula 3 below.
- R 4 in Formula 3 is a hydrogen atom or a C 1 to C 5 linear alkyl group, and X is -F, -Cl, -Br or -I.
- the alpha halo lactone-based compound of step 1 may include alpha halo butyrolactone or alpha halo valerolactone.
- the phosphine-based compound of step 1 is tris (C 3-4 alkyl) phosphine, triphenylphosphine, tris (3-chlorophenyl) phosphine, tris (4-chlorophenyl) phosphine Pyne, tris(3-methylphenyl)phosphine, tris(4-methylphenyl)phosphine, tris(3-methoxyphenyl)phosphine, tris(4-methoxy-phenyl)phosphine, phenoxydiphenylphosphine and It may include at least one selected from diphenoxyphenylphosphine.
- the organic solvent in step 1 includes at least one selected from acetonitrile, tetrahydrofuran, dimethylformamide, dimethyl sulfoxide, dimethylacetamide, acetone, and N-methylpyrrolidone. can do.
- the reaction in the first step, may be performed after mixing the alpha halolactone-based compound and the phosphine-based compound in a weight ratio of 1:0.9 to 3.0.
- the first step of the reaction may be performed at 60 to 80 ° C. for 8 to 16 hours.
- the base in step 2 may include at least one selected from organic bases and inorganic bases.
- the organic base may include at least one selected from triethylamine, diisopropylethylamine, dimethylamine and diethylamine.
- the inorganic base is sodium t-butoxide, potassium t-butoxide, sodium hydride, sodium methoxide, sodium ethoxide, lithium hydride, lithium hydroxide, lithium t-butoxide Side, lithium methoxide, lithium ethoxide, sodium hydroxide and potassium hydroxide may include at least one selected from.
- the organic solvent in step 2 includes at least one selected from acetonitrile, tetrahydrofuran, dimethylformamide, dimethyl sulfoxide, dimethylacetamide, acetone, and N-methylpyrrolidone. can do.
- the in-situ reaction in the second step is performed after mixing 30 to 100 parts by weight of the base and 15 to 50 parts by weight of paraformaldehyde or formaldehyde with respect to 100 parts by weight of the upper phase phosphonium salt. can be performed.
- the two-step in-situ reaction may be performed at 60 to 80° C. for 1 to 4 hours.
- the metal salt of step 3 is a metal halide, metal sulfate, metal nitrate, metal perchlorate, metal bicarbonate, metal carbonate, metal acetate, metal citrate, metal benzoate salt, a hydrate or These organic sorbates may be included.
- the metal of the metal salt may be an alkali metal, an alkaline earth metal, a transition metal or a lanthanide metal.
- the metal salt in step 3 may be added in an amount of 1.50 to 3.00 equivalents per 1 equivalent of the phosphine compound in step 1.
- the methylene lactone-based compound represented by Formula 2 having a yield of 70% or more and a purity of 98% or more can be prepared through the above-described preparation method.
- the manufacturing method of the present invention can effectively purify (or remove) reaction byproducts generated during the manufacturing process in the same manufacturing process without a separate purification process, and a separate intermediate synthesis process through an in-situ synthesis process. And since a drying process is not performed, a methylene lactone-based compound with a high yield and high purity can be produced with high productivity and commerciality, while the manufacturing process is simple.
- the present invention relates to an invention in which the purification (or removal) of impurities is easier than in the conventional methylene lactone-based compound manufacturing process, suitable for producing high-purity methylene lactone-based compounds in high yield, and advantageous for large-scale synthesis processes, phosphonium salts Step 1 to prepare;
- the phosphonium salt in step 1 is a process of mixing and reacting an alpha halolactone-based compound and a phosphine-based compound, followed by cooling to obtain a phosphonium salt represented by Formula 1 below.
- each of R 1 to R 3 is independently a C 3 to C 4 straight-chain alkyl group, a phenyl group, a 3-chlorophenyl group, a 3-methylphenyl group, a 4-methylphenyl group, a 3-methoxyphenyl group, a 4- A methoxyphenyl group or a phenoxy group, preferably each of R 1 to R 3 is independently a C 3 to C 4 straight-chain alkyl group, a phenyl group or a phenoxy group, more preferably each of R 1 to R 3 is independently C It is a 3 -C 4 straight-chain alkyl group or a phenyl group.
- X in Formula 1 is -F, -Cl, -Br or -I, preferably -Cl, -Br or -I, more preferably -Br.
- Y in Formula 1 is to be.
- R 4 is a hydrogen atom or a C 1 to C 5 linear alkyl group, preferably a hydrogen atom or a C 1 to C 2 linear alkyl group.
- the alpha halo lactone-based compound of step 1 may include a lactone-based compound represented by Formula 3 below.
- R 4 in Formula 3 is a hydrogen atom or a C 1 to C 5 straight-chain alkyl group, preferably a hydrogen atom or a C 1 to C 2 straight-chain alkyl group.
- X is -F, -Cl, -Br or -I, preferably X is -Cl, -Br or -I.
- alpha halo lactone-based compound of step 1 may include alpha halo butyrolactone or alpha halo valerolactone.
- the phosphine-based compound of step 1 is tris (C 3 ⁇ 4 alkyl) phosphine, triphenylphosphine, tris (3-chlorophenyl) phosphine, tris (4-chlorophenyl) phosphine, tris (3- methylphenyl)phosphine, tris(4-methylphenyl)phosphine, tris(3-methoxyphenyl)phosphine, tris(4-methoxy-phenyl)phosphine, phenoxydiphenylphosphine and diphenoxyphenylphosphine It includes at least one selected from among, preferably at least one selected from tris (C 3 ⁇ 4 alkyl) phosphine, triphenylphosphine, phenoxydiphenylphosphine and diphenoxyphenylphosphine, More preferably, at least one selected from tris(C 3-4 alkyl)phosphine and trip
- the organic solvent in step 1 may include at least one selected from acetonitrile, tetrahydrofuran, dimethylformamide, dimethylsulfoxide, dimethylacetamide, acetone, and N-methylpyrrolidone.
- the alpha halolactone compound and the phosphine compound are mixed at a weight ratio of 1:0.9 to 3.0, preferably at a weight ratio of 1:1.2 to 2.5, and more preferably at a weight ratio of 1:1.5 to 2.0.
- the reaction can be carried out.
- the mixing amount of the phosphine-based compound is less than 0.9 weight ratio, there may be a problem in that the yield of the desired final reaction product is low, and when it is used in excess of 3.0 weight ratio, a large amount of impurities are generated by the unreacted phosphine-type compound, resulting in the desired final reaction product. There may be a problem with low purity.
- the reaction of the first step is carried out with slow stirring at 60 ⁇ 80 °C for 8 ⁇ 16 hours, preferably 60 ⁇ 75 °C for 8 ⁇ 14 hours, more preferably 65 ⁇ 72 °C for 9 ⁇ 13 hours
- the reaction temperature is less than 60 °C, the reaction time takes too long and there is a problem of poor commerciality, and if it exceeds 80 °C, the phosphonium salt synthesis time is short, but a large amount of unwanted reaction products (impurities) may be generated. It is preferable to carry out the reaction within the above range.
- step 2 is a process of synthesizing a methylene lactone-based compound through an in-situ reaction, in which the phosphonium salt, base, paraformaldehyde or formaldehyde and an organic solvent obtained in step 1 are mixed. Then, when an in-situ reaction is performed, a methylene lactone-based compound and a phosphine-based oxide are formed.
- step 1 alpha-bromo butyrolactone is used as an alpha halolactone-based compound and triphenylphosphine is used as a phosphine-based compound to prepare a phosphonium salt.
- phosphonium salt and a base are reacted, phosphonium ylide is synthesized, and phosphonium ylide reacts with aldehyde to synthesize a methylene lactone-based compound.
- An in-situ reaction is performed in the second step will perform
- a phosphine-based oxide is formed as an addition reaction product as a reaction product in addition to the methylene lactone-based compound.
- the phosphine-based oxide is an oxide of a phosphine-based compound used in step 1, for example, tris (C 3-4 alkyl) phosphine oxide, triphenylphosphine oxide, tris (3-chlorophenyl) phosphine oxide, Tris (4-chlorophenyl) phosphine oxide, tris (3-methylphenyl) phosphine oxide, tris (4-methylphenyl) phosphine oxide, tris (3-methoxyphenyl) phosphine oxide, tris (4-methoxy- Phenyl) may include at least one selected from phosphine oxide, phenoxydiphenylphosphine oxide and diphenoxyphenylphosphine oxide.
- the base may include at least one selected from organic bases and inorganic bases.
- the organic base may include at least one selected from triethylamine, diisopropylethylamine, dimethylamine and diethylamine, and preferably one selected from triethylamine, dimethylamine and diethylamine. may contain more than
- the inorganic base is sodium t-butoxide, potassium t-butoxide, sodium hydride, sodium methoxide, sodium ethoxide, lithium hydride, lithium hydroxide, lithium t-butoxide, lithium methoxide, lithium It may contain at least one selected from among ethoxide, sodium hydroxide and potassium hydroxide, preferably sodium methoxide, sodium ethoxide, lithium hydride, lithium hydroxide, sodium hydroxide and potassium hydroxide It may include one or more selected from rockside.
- the amount of the base may be 30 to 100 parts by weight, preferably 30 to 60 parts by weight, more preferably 40 to 55 parts by weight, based on 100 parts by weight of the phosphonium salt. If it is less than 30 parts by weight, there may be a problem in that the synthesis yield of the methylene lactone-based compound is low due to the small amount of ylide synthesis, and if the amount of base used exceeds 100 parts by weight, the unreacted base acts as an impurity due to excessive use, resulting in methylene lactone-based Since there may be a problem of lowering the purity of the compound, it is good to use it within the above range.
- the amount of paraformaldehyde or formaldehyde used is 15 to 50 parts by weight, preferably 15 to 30 parts by weight, more preferably 18 to 30 parts by weight based on 100 parts by weight of the phosphonium salt. , If the amount thereof is less than 15 parts by weight, there may be a problem in that the synthesis yield for the methylene lactone-based compound is lowered, and if the amount thereof exceeds 50 parts by weight, the unreacted aldehyde acts as an impurity rather than the methylene lactone-based compound. Since there may be a problem of lowering the purity, it is good to use it within the above range.
- the organic solvent of the second step is selected from tetrahydrofuran, diethyl ether, 1,4-dioxane, toluene, acetonitrile, dichloromethane, ethyldichloroethane, diisopropyl ether, t-butylmethyl ether and ethyl acetate It may include one or more, preferably one or more selected from tetrahydrofuran, 1,4-dioxane, and acetonitrile.
- the second-step in-situ reaction is carried out at 60 to 80 ° C for 1 to 4 hours, preferably at 60 to 75 ° C for 1 to 3 hours, more preferably at 65 to 75 ° C for 1 to 3 hours. It is preferable, and if the reaction temperature is less than 60 °C, the synthesis time of the methylene lactone-based compound is too long and there may be a problem with low yield, and if the reaction temperature exceeds 80 °C, unwanted impurities are generated and there is a problem of low purity. Therefore, it is preferable to perform the in-situ reaction in the above temperature range.
- step 3 is a process of synthesizing a complex (or complex) by reacting the phosphine-based oxide, which is an addition reaction product of step 2, with a metal salt.
- the metal salt is a metal halide (e.g., fluoride, chloride, bromide or iodide), metal sulfate, metal nitrate, metal perchlorate, metal bicarbonate, metal carbonate, metal acetate, metal citrate, metal benzoate salt , hydrates thereof or organic sorbates thereof.
- a metal halide e.g., fluoride, chloride, bromide or iodide
- the metal of the metal salt may include an alkali metal, an alkaline earth metal, a transition metal or a lanthanide metal, and preferably, the metal of the metal salt is lithium, sodium, potassium, magnesium, calcium, barium, strontium, samirium (III ), zinc, iron(II), iron(III), manganese(II), cobalt(II), cobalt(III), nickel, copper(I) or copper(II).
- the metal salt may include at least one selected from zinc chloride and magnesium chloride.
- the amount of the metal salt added per equivalent of the phosphine-based compound based on the phosphine-based compound used in the first step may be used in a weight ratio of 0.25 to 5.0, preferably 1.5 to 3.0.
- the equivalence ratio of the metal salt input is less than 0.25 equivalence ratio, the complex is not sufficiently formed, and the remaining phosphine oxide acts as an impurity, which may cause a problem of low purity of the desired final product.
- the residual metal salt acts as an impurity, there may be a problem of lowering the purity of the species product, so it is good to use it within the above range.
- reaction of the phosphine-based oxide and the metal salt in the third step is 0 to 130 ° C, preferably 20 to 120 ° C, more preferably 20 to 40 ° C for 5 to 24 hours, preferably 6 to 18 hours while stirring slowly. can be done over time.
- Step 4 is a process for obtaining a methylene lactone-based compound represented by Formula 2 below by removing the complex formed in the reaction solution in Step 3 and performing a concentration and vacuum distillation process.
- R 4 in Formula 2 is a hydrogen atom or a C 1 to C 5 straight-chain alkyl group, preferably a hydrogen atom or a C 1 to C 2 straight-chain alkyl group.
- step 3 As a method for removing the complex synthesized in step 4 in step 3, methods such as filtration, decantation, and/or centrifugation generally used in the art may be used.
- each of the four-step concentration process and vacuum distillation process can be performed by a general concentration and vacuum distillation method used in the art.
- the methylene lactone-based compound represented by Formula 2 prepared by performing the above process has a yield of 60% or more, preferably a yield of 70% or more, more preferably 70 to 95% when calculated based on Equation 1 below A methylene lactone-based compound can be obtained in a yield of
- the methylene lactone-based compound represented by Formula 2 or Formula 3 prepared by performing the above process has a purity of 98% or more, preferably 98.5% to 99.9%, more preferably 98.8 to 99.9% when analyzed by chromatography.
- a methylene lactone-based compound can be obtained with a high purity of %.
- Example 1-1 Preparation of methylene lactone-based compound represented by Chemical Formula 2-1
- each of R 1 , R 2 , and R 3 is a phenyl group
- X is -Br
- Y is And
- R 4 is a hydrogen atom.
- R 4 in Formula 2-1 is a hydrogen atom.
- each of R 1 , R 2 , and R 3 is a phenyl group, X is -Br, and Y is , and R 4 is -CH 3 .
- R 4 in Formula 2-2 is -CH 3 .
- a methylene lactone-based compound represented by Chemical Formula 1-1 was prepared in the same manner as in Example 1, but as shown in Tables 1 and 2 below, by varying the content of the phosphine-based compound, base, etc. introduced in steps 1 to 3 Examples 3 to 10 and Comparative Examples 1 to 8 were carried out, respectively.
- a methylene lactone-based compound represented by Chemical Formula 1-1 was prepared in the same manner as in Example 2, but the content of the phosphine-based compound, base, etc. introduced in steps 1 to 3 was changed as shown in Table 1 below to obtain Example 11 was carried out.
- Comparative Example 7 in which the metal salt was used at a weight ratio of less than 0.25 in step 3, compared to Example 9, it was confirmed that there was a problem in that the purity was rapidly lowered, and the metal salt was used at a weight ratio of more than 5.00 Comparative Example In the case of 8, compared to Example 10, there was a problem that the purity was lowered.
- the method for producing the methylene lactone system described above is not limited to the configuration and method of the above-described embodiments, but all or part of each embodiment is selectively applied so that various modifications can be made. They may be configured in combination.
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Abstract
La présente invention concerne un procédé de préparation d'un composé à base de lactone de méthylène et, plus spécifiquement, par comparaison avec un procédé classique de préparation d'un composé à base de lactone de méthylène, permet la préparation d'un composé à base de lactone de méthylène spécifique avec un rendement élevé et une pureté élevée tout en simplifiant un procédé de préparation.
Applications Claiming Priority (2)
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CN116462645A (zh) * | 2023-05-06 | 2023-07-21 | 上海华默西医药科技有限公司 | 一种2-呋喃-2-基亚甲基-4-羟基丁酸酯及其制备方法和应用 |
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KR20010112387A (ko) * | 1999-03-30 | 2001-12-20 | 메리 이. 보울러 | α-메틸렌락톤 및 α-치환된 하이드로카빌리덴 락톤의제조 방법 |
KR20040081112A (ko) * | 2002-01-07 | 2004-09-20 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 초임계 유체에서의 메틸렌락톤 합성 |
JP2009007301A (ja) * | 2007-06-28 | 2009-01-15 | Mitsubishi Rayon Co Ltd | α−メチレン−γ−ブチロラクトンの製造法 |
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KR102379889B1 (ko) * | 2021-05-17 | 2022-03-29 | 자경케미칼 주식회사 | 메틸렌 락톤계 화합물의 제조방법 |
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WO2000058297A2 (fr) | 1999-03-30 | 2000-10-05 | E.I. Du Pont De Nemours And Company | PROCEDE DE PREPARATION D'α-METHYLENELACTONES |
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KR20010112387A (ko) * | 1999-03-30 | 2001-12-20 | 메리 이. 보울러 | α-메틸렌락톤 및 α-치환된 하이드로카빌리덴 락톤의제조 방법 |
JP2001247560A (ja) * | 2000-03-06 | 2001-09-11 | Nippon Shokubai Co Ltd | α−メチレン−γ−ブチロラクトン類の製造方法 |
KR20040081112A (ko) * | 2002-01-07 | 2004-09-20 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 초임계 유체에서의 메틸렌락톤 합성 |
JP2009007301A (ja) * | 2007-06-28 | 2009-01-15 | Mitsubishi Rayon Co Ltd | α−メチレン−γ−ブチロラクトンの製造法 |
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KR102379889B1 (ko) * | 2021-05-17 | 2022-03-29 | 자경케미칼 주식회사 | 메틸렌 락톤계 화합물의 제조방법 |
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