WO2022225001A1 - トリアジン環含有重合体、及びパターン形成用組成物 - Google Patents

トリアジン環含有重合体、及びパターン形成用組成物 Download PDF

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WO2022225001A1
WO2022225001A1 PCT/JP2022/018396 JP2022018396W WO2022225001A1 WO 2022225001 A1 WO2022225001 A1 WO 2022225001A1 JP 2022018396 W JP2022018396 W JP 2022018396W WO 2022225001 A1 WO2022225001 A1 WO 2022225001A1
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carbon atoms
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triazine ring
containing polymer
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直樹 中家
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Nissan Chemical Corp
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Nissan Chemical Corp
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Priority to KR1020237039857A priority patent/KR20230174253A/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638—Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/0644—Poly(1,3,5)triazines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

Definitions

  • the present invention relates to a triazine ring-containing polymer and a pattern forming composition.
  • liquid crystal displays organic electroluminescence (EL) displays, touch panels, optical semiconductor (light emitting diode (LED), etc.) elements, solid-state imaging elements, organic thin film solar cells, dye-sensitized solar cells, organic thin film transistors (TFT), etc.
  • high-performance polymer materials have come to be required. Specific properties required include 1) heat resistance, 2) transparency, 3) high refractive index, 4) high solubility, 5) low volume shrinkage, 6) high temperature and high humidity resistance, and 7) high film hardness. etc.
  • a polymer containing a repeating unit having a triazine ring and an aromatic ring has a high refractive index, and the polymer alone has high heat resistance, high transparency, high refractive index, high solubility, It has already been found that it can achieve low volume shrinkage and is suitable as a film-forming composition for producing electronic devices (Patent Document 1).
  • organic electroluminescence displays generally have a problem of low light extraction efficiency, that is, the efficiency with which generated light exits the device.
  • various techniques have been developed in the past. , techniques using high refractive index layers and high refractive index patterns are known. Many negative photosensitive compositions have been proposed for this high refractive index pattern, and the present applicant has also reported various materials capable of forming a negative high refractive index pattern (Patent Documents 2-4).
  • the pattern is formed by leaving the part that is cured by the light irradiated from above, so the shape after development generally tends to be inversely tapered, and undercuts are likely to occur.
  • the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a triazine ring-containing polymer which is excellent in solvent resistance and capable of forming a pattern having a high refractive index and excellent transparency.
  • the present inventors have found that a portion of the triazine ring terminal is blocked with an amino group having a cross-linking group, and the other portion is a hydroxyl-substituted arylamino group. It has been found that a fine pattern having excellent solvent resistance, a high refractive index and excellent transparency can be formed by using a triazine ring-containing polymer sealed with .
  • the present invention [1] containing a repeating unit structure represented by the following formula (1), having at least one triazine ring terminal, part of the triazine ring terminal being blocked with an amino group having a bridging group; part of is capped with a hydroxyl-substituted arylamino group.
  • R and R′ independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group; Q is a ring structure having 3 to 30 carbon atoms; represents a valence group.* represents a bond.
  • Q in formula (1) represents at least one selected from the group represented by formulas (2) to (13) and formulas (102) to (115). Ring-containing polymer.
  • R 1 to R 92 are each independently a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, an alkyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 10 carbon atoms, represents a halogenated alkyl group or an alkoxy group having 1 to 10 carbon atoms
  • R 93 and R 94 each represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms
  • W 1 and W 2 are each independently a single bond
  • CR 95 R 96 R 95 and R 96 are each independently a hydrogen atom, a C 1-10 alkyl group (provided that these may form a ring), or represents a halogenated alkyl group having 1 to 10 carbon atoms.
  • C ⁇ O, O, S, SO, SO 2 , or NR 97 R 97 is represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms
  • R 1 and R 2 independently represent a single bond or an alkylene group having 1 to 10 carbon atoms.
  • Y 1 and Y 2 independently represent a single bond or an alkylene group having 1 to 10 carbon atoms.
  • ) represents a group represented by * represents a bond.
  • R 1 and R 2 each independently represent an alkylene group having 1 to 5 carbon atoms which may have a branched structure. * represents a bond. .
  • R 1 to R 92 and R 98 to R 101 in formulas (2) to (13) are each independently a hydrogen atom, a halogen atom, or a halogenated alkyl group having 1 to 10 carbon atoms; The triazine ring-containing polymer according to [2].
  • R 102 is a hydroxymethyl group, a 2-hydroxyethyl group, a (meth)acryloyloxymethyl group, a (meth)acryloyloxyethyl group, and formulas (i-2) to (i-5) below;
  • An electronic device comprising a substrate and the cured product of [17] formed on the substrate.
  • An optical member comprising a substrate and the cured product of [17] formed on the substrate.
  • the pattern-forming composition according to any one of [11] to [16] is applied to a substrate, the organic solvent is evaporated, light is irradiated through a pattern-formed mask, and then developed. , and further baking.
  • the triazine ring-containing polymer of the present invention has excellent solvent resistance and gives a fine pattern having a high refractive index and excellent transparency.
  • the composition of the present invention is masked, exposed to light, cured, developed with an alkali, and baked to give a fine pattern having excellent solvent resistance, high refractive index and excellent transparency.
  • the pattern produced from the composition of the present invention can exhibit the characteristics of solvent resistance, high heat resistance, high refractive index, and low volume shrinkage due to the triazine ring-containing polymer.
  • FIG. 4 is an optical microscope photograph of a patterned film produced in Example 4-1.
  • 4 is an electron micrograph of a patterned film produced in Example 4-1.
  • the triazine ring-containing polymer according to the present invention contains a repeating unit structure represented by the following formula (1).
  • a triazine ring-containing polymer is, for example, a so-called hyperbranched polymer.
  • a hyperbranched polymer is a highly branched polymer having an irregularly branched structure.
  • the term "irregular" as used herein means that the branch structure is more irregular than that of a dendrimer, which is a highly branched polymer having a regular branch structure.
  • a triazine ring-containing polymer which is a hyperbranched polymer, has a structure larger than the repeating unit structure represented by formula (1), and each of the three bonds of the repeating unit structure represented by formula (1) has , and a structure (structure X) in which repeating unit structures represented by formula (1) are bonded.
  • structure X is distributed throughout the triazine ring-containing polymer except for the terminals.
  • the repeating unit structure may consist essentially of the repeating unit structure represented by formula (1).
  • R and R′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, but from the viewpoint of further increasing the refractive index, both are hydrogen atoms. preferable.
  • the number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 to 20. Considering that the heat resistance of the polymer is further improved, the number of carbon atoms in the alkyl group is 1 to 10. More preferably, 1 to 3 are even more preferable.
  • the structure of the alkyl group is not particularly limited, and may be, for example, linear, branched, cyclic, or a combination of two or more thereof.
  • alkyl groups are methyl, ethyl, n-propyl, isopropyl, cyclopropyl, n-butyl, isobutyl, s-butyl, t-butyl, cyclobutyl, 1-methyl-cyclopropyl, 2-methyl-cyclopropyl.
  • n-pentyl 1-methyl-n-butyl, 2-methyl-n-butyl, 3-methyl-n-butyl, 1,1-dimethyl-n-propyl, 1,2-dimethyl-n-propyl, 2 , 2-dimethyl-n-propyl, 1-ethyl-n-propyl, cyclopentyl, 1-methyl-cyclobutyl, 2-methyl-cyclobutyl, 3-methyl-cyclobutyl, 1,2-dimethyl-cyclopropyl, 2,3- dimethyl-cyclopropyl, 1-ethyl-cyclopropyl, 2-ethyl-cyclopropyl, n-hexyl, 1-methyl-n-pentyl, 2-methyl-n-pentyl, 3-methyl-n-pentyl, 4-methyl -n-pentyl, 1,1-dimethyl-n-butyl, 1,2-dimethyl-n-butyl, 1,3-dimethyl-n-butyl,
  • the number of carbon atoms in the alkoxy group is not particularly limited, it is preferably 1 to 20, and in consideration of further increasing the heat resistance of the polymer, the number of carbon atoms in the alkoxy group is more preferably 1 to 10. 1 to 3 are even more preferred.
  • the structure of the alkyl moiety is not particularly limited, and may be, for example, linear, branched, cyclic, or a combination of two or more thereof.
  • alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy, n-pentoxy, 1-methyl-n-butoxy, 2-methyl-n -butoxy, 3-methyl-n-butoxy, 1,1-dimethyl-n-propoxy, 1,2-dimethyl-n-propoxy, 2,2-dimethyl-n-propoxy, 1-ethyl-n-propoxy, n -hexyloxy, 1-methyl-n-pentyloxy, 2-methyl-n-pentyloxy, 3-methyl-n-pentyloxy, 4-methyl-n-pentyloxy, 1,1-dimethyl-n-butoxy, 1,2-dimethyl-n-butoxy, 1,3-dimethyl-n-butoxy, 2,2-dimethyl-n-butoxy, 2,3-dimethyl-n-butoxy, 3,3-dimethyl-n-butoxy, 1-ethoxy,
  • the number of carbon atoms in the aryl group is not particularly limited, it is preferably 6 to 40. In consideration of further increasing the heat resistance of the polymer, the number of carbon atoms in the aryl group is more preferably 6 to 16. 6 to 13 are even more preferred.
  • the aryl group includes an aryl group having a substituent. Examples of substituents include halogen atoms, alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, nitro groups, and cyano groups.
  • aryl groups include phenyl, o-chlorophenyl, m-chlorophenyl, p-chlorophenyl, o-fluorophenyl, p-fluorophenyl, o-methoxyphenyl, p-methoxyphenyl, p-nitrophenyl, p-cyanophenyl, ⁇ -naphthyl, ⁇ -naphthyl, o-biphenylyl, m-biphenylyl, p-biphenylyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, 2-phenanthryl, 3-phenanthryl, 4 -phenanthryl, 9-phenanthryl groups and the like.
  • the aralkyl group includes an aralkyl group having a substituent.
  • substituents include halogen atoms, alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, nitro groups, and cyano groups.
  • Specific examples include benzyl, p-methylphenylmethyl, m-methylphenylmethyl, o-ethylphenylmethyl, m-ethylphenylmethyl, p-ethylphenylmethyl, 2-propylphenylmethyl, 4-isopropylphenylmethyl, 4-isobutylphenylmethyl, ⁇ -naphthylmethyl group and the like.
  • Q in formula (1) is not particularly limited as long as it is a divalent group having 3 to 30 carbon atoms and having a ring structure.
  • the ring structure may be an aromatic ring structure or an alicyclic structure.
  • the above Q preferably represents at least one selected from the group represented by formulas (2) to (13).
  • R 1 to R 92 above each independently represent a hydrogen atom, a halogen atom, a carboxy group, a sulfo group, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, or a halogen atom having 1 to 10 carbon atoms.
  • R 93 and R 94 each represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms
  • W 1 and W 2 are each independently a single bond
  • CR 95 R 96 R 95 and R 96 are each independently a hydrogen atom, a C 1-10 alkyl group (provided that these may form a ring), or represents a halogenated alkyl group having 1 to 10 carbon atoms.
  • C ⁇ O, O, S, SO, SO 2 , or NR 97 R 97 is represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a phenyl group).
  • Halogen atoms include fluorine, chlorine, bromine and iodine atoms. Examples of the alkyl group and alkoxy group are the same as those described above.
  • the halogenated alkyl group having 1 to 10 carbon atoms is obtained by substituting at least one hydrogen atom in the alkyl group having 1 to 10 carbon atoms with a halogen atom, and specific examples thereof include trifluoromethyl , 2,2,2-trifluoroethyl, perfluoroethyl, 3,3,3-trifluoropropyl, 2,2,3,3,3-pentafluoropropyl, 2,2,3,3-tetrafluoropropyl , 2,2,2-trifluoro-1-(trifluoromethyl)ethyl, perfluoropropyl, 4,4,4-trifluorobutyl, 3,3,4,4,4-pentafluorobutyl, 2,2 , 3,3,4,4,4-heptafluorobutyl, perfluorobutyl, 2,2,3,3,4,4,5,5,5-nonafluoropentyl, 2,2,3,3,4 , 4,5,5-octafluoropenty
  • a perfluoroalkyl group having 1 to 10 carbon atoms is preferred, particularly 1 to 5 carbon atoms, in consideration of enhancing the solubility of the triazine ring-containing polymer in low-polar solvents while maintaining the refractive index. is more preferred, and a trifluoromethyl group is even more preferred.
  • X 1 and X 2 each independently represent a single bond, an alkylene group having 1 to 10 carbon atoms, or a group represented by formula (14).
  • the structures of these alkyl groups, halogenated alkyl groups, alkoxy groups, and alkylene groups are not particularly limited, and may be, for example, linear, branched, cyclic, or combinations of two or more thereof.
  • R 98 to R 101 each independently represent a hydrogen atom, a halogen atom, a carboxy group, a sulfo group, an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, or a representing 10 alkoxy groups
  • Y 1 and Y 2 independently represent a single bond or an alkylene group having 1 to 10 carbon atoms.
  • halogen atoms, alkyl groups, halogenated alkyl groups and alkoxy groups include the same halogen atoms, alkyl groups, halogenated alkyl groups and alkoxy groups for R 1 to R 92 .
  • the structures of the alkyl groups and alkoxy groups in R 98 to R 101 are not particularly limited, and may be, for example, linear, branched, cyclic, or combinations of two or more thereof.
  • the structure of the alkylene group in Y 1 and Y 2 is not particularly limited, and may be, for example, linear, branched, cyclic, or a combination of two or more thereof.
  • Examples of alkylene groups having 1 to 10 carbon atoms include methylene, ethylene, propylene, trimethylene, tetramethylene and pentamethylene groups.
  • the structure of the alkylene group is not particularly limited, and may be linear, branched, cyclic, or a combination of two or more thereof.
  • Q is preferably at least one represented by formulas (2) and (5) to (13), and formulas (2), (5), (7), (8), (11) to (13) ) is more preferred.
  • Specific examples of the aryl groups represented by formulas (2) to (13) include, but are not limited to, those represented by the following formulas.
  • Ph represents a phenyl group. * represents a bond.
  • Q is more preferably an aryl group represented by the following formula, since a polymer with a higher refractive index can be obtained.
  • Q is preferably an m-phenylene group.
  • Q in formula (1) represents at least one selected from the group represented by formulas (102) to (115), for example. * represents a bond.
  • R 1 and R 2 above independently represent an optionally branched alkylene group having 1 to 5 carbon atoms.
  • alkylene groups include methylene, ethylene, propylene, trimethylene, tetramethylene, and pentamethylene groups. is preferred, and an alkylene group having 1 to 2 carbon atoms, more preferably a methylene or ethylene group, most preferably a methylene group.
  • the triazine ring-containing polymer of the present invention has at least one triazine ring terminal, and a part of this triazine ring terminal is blocked with an amino group having a cross-linking group.
  • the triazine ring-containing polymer of the present invention has at least one triazine ring terminal, and this terminal triazine ring usually has two halogen atoms that can be substituted with the amino group having the above-mentioned bridging group.
  • the amino group having the bridging group may be bonded to the same triazine ring terminal, and when there are a plurality of triazine ring terminals, each may be bonded to a different triazine ring terminal.
  • a hydroxyaryl group (hydroxyl-substituted aryl group) is not included in the cross-linking group in the present invention.
  • the number of cross-linking groups in the amino group having a cross-linking group is not particularly limited, and can be any number, but considering the balance between solvent resistance and solubility in organic solvents, 1 to 4 is preferred, 1 to 2 is more preferred, and 1 is even more preferred.
  • the amino group having a cross-linking group has a plurality of cross-linking groups
  • the plurality of cross-linking groups may have the same structure or different structures.
  • An amino group having a cross-linking group is represented, for example, by the following formula (X). (In the formula, Z represents a group having a cross-linking group. * represents a bond.)
  • Z may be the bridging group itself.
  • the bridging group is attached to the amino group through an arylene group.
  • the amino group having a cross-linking group is more preferably represented by the following formula (15), particularly preferably represented by the following formula (16).
  • R 102 represents a cross-linking group. * represents a bond.
  • R 102 has the same meaning as above. * represents a bond.
  • cross-linking groups examples include hydroxyl-containing groups, vinyl-containing groups, epoxy-containing groups, oxetane-containing groups, carboxy-containing groups, sulfo-containing groups, thiol-containing groups, and (meth)acryloyl-containing groups.
  • (Meth)acryloyl-containing groups are preferred in consideration of improving the heat resistance of the coalescence and the solvent resistance (crack resistance) of the resulting film.
  • the hydroxy-containing group includes a hydroxy group, a hydroxyalkyl group, and the like, preferably a hydroxyalkyl group having 1 to 10 carbon atoms, more preferably a hydroxyalkyl group having 1 to 5 carbon atoms, and a hydroxy group having 1 to 3 carbon atoms. Alkyl groups are even more preferred.
  • Hydroxyalkyl groups having 1 to 10 carbon atoms include hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, 4-hydroxybutyl, 5-hydroxypentyl, 6-hydroxyhexyl, 7-hydroxyheptyl, 8-hydroxyoctyl, 9-hydroxynonyl, 10-hydroxydecyl, 2-hydroxy-1-methylethyl, 2-hydroxy-1,1-dimethylethyl, 3-hydroxy-1-methylpropyl, 3-hydroxy-2-methylpropyl, 3- Hydroxy-1,1-dimethylpropyl, 3-hydroxy-1,2-dimethylpropyl, 3-hydroxy-2,2-dimethylpropyl, 4-hydroxy-1-methylbutyl, 4-hydroxy-2-methylbutyl, 4-hydroxy 1-Hydroxyethyl, 1-Hydroxypropyl, 2-Hydroxypropyl, 1-Hydroxybutyl, 2-Hydroxybutyl, 1 -Hydroxy groups such as hydroxyhexyl, 2-
  • the carbon atom to which the hydroxy group is bonded is a primary carbon atom.
  • a hydroxyalkyl group having 1 to 3 carbon atoms is more preferred, a hydroxymethyl group and a 2-hydroxyethyl group are more preferred, and a 2-hydroxyethyl group is most preferred.
  • Examples of the (meth)acryloyl-containing group include (meth)acryloyl groups, (meth)acryloyloxyalkyl groups, groups represented by the following formula (i), and the like, having an alkylene group having 1 to 10 carbon atoms ( A meth)acryloyloxyalkyl group and a group represented by the following formula (i) are preferred, and a group represented by the following formula (i) is more preferred.
  • a 1 represents an alkylene group having 1 to 10 carbon atoms
  • a 2 is a single bond or the following formula (j)
  • A3 represents an (a+1) -valent aliphatic hydrocarbon group which may be substituted with a hydroxy group
  • A4 represents a hydrogen atom or a methyl group
  • a represents 1 or 2 and * represents a bond.
  • alkylene group contained in the (meth)acryloyloxyalkyl group having an alkylene group (alkanediyl group) having 1 to 10 carbon atoms examples include methylene, ethylene, trimethylene, propane-1,2-diyl, tetramethylene and butane-1. ,3-diyl, butane-1,2-diyl, 2-methylpropane-1,3-diyl, pentamethylene, hexamethylene, heptamethylene, octamethylene, nonamethylene and decamethylene groups.
  • those having an alkylene group having 1 to 5 carbon atoms are preferable, those having an alkylene group having 1 to 3 carbon atoms are preferable, and 1 carbon atom, in consideration of improving heat resistance and high temperature and high humidity resistance. or 2 alkylene groups are more preferred.
  • (meth)acryloyloxyalkyl group examples include, for example, (meth)acryloyloxymethyl group, 2-(meth)acryloyloxyethyl group, 3-(meth)acryloyloxypropyl group, 4-(meth)acryloyl An oxybutyl group is mentioned.
  • a 1 is an alkylene group having 1 to 10 carbon atoms, preferably an alkylene group having 1 to 5 carbon atoms, more preferably a methylene group, an ethylene group or a propylene group.
  • alkylene group having 1 to 10 carbon atoms include the same alkylene groups included in the above (meth)acryloyloxyalkyl group.
  • A2 represents a single bond or a group represented by formula (j), preferably a group represented by formula (j).
  • a 3 is an (a+1)-valent aliphatic hydrocarbon group which may be substituted with a hydroxy group, and specific examples thereof include an alkylene group having 1 to 5 carbon atoms and the following formula (k-1) ⁇ (k - 3) (In the formula, * is the same as above.)
  • An alkylene group having 1 to 5 carbon atoms is preferred, an alkylene group having 1 to 3 carbon atoms is more preferred, and a methylene group and an ethylene group are even more preferred.
  • Examples of the alkylene group for A 3 include alkylene groups having 1 to 5 carbon atoms among the alkylene groups exemplified for A 1 .
  • a represents 1 or 2, but 1 is preferred.
  • Suitable embodiments of the group represented by formula (i) include those represented by the following formula (i-1).
  • More preferred embodiments of the group represented by formula (i) include those represented by formulas (i-2) to (i-5) below.
  • vinyl-containing groups include alkenyl groups with 2 to 10 carbon atoms having a vinyl group at the end. Specific examples include ethenyl, 1-propenyl, allyl, isopropenyl, 1-butenyl, 2-butenyl, 2-pentenyl groups and the like.
  • Epoxy-containing groups include epoxy, glycidyl, and glycidyloxy groups. Specific examples include glycidylmethyl, 2-glycidylethyl, 3-glycidylpropyl and 4-glycidylbutyl groups.
  • Oxetane-containing groups include oxetan-3-yl, (oxetan-3-yl)methyl, 2-(oxetan-3-yl)ethyl, 3-(oxetan-3-yl)propyl, 4-(oxetan-3- yl) butyl group and the like.
  • carboxy-containing groups include carboxy groups and carboxyalkyl groups having 2 to 10 carbon atoms.
  • the carbon atom to which the carboxy group is bonded is preferably a secondary carbon atom, and specific examples include carboxymethyl, 2-carboxyethyl, 3-carboxypropyl and 4- A carboxybutyl group and the like can be mentioned.
  • the sulfo-containing group includes a sulfo group and a sulfoalkyl group having 1 to 10 carbon atoms.
  • the carbon atom to which the sulfo group is bonded is preferably a primary carbon atom, and specific examples are sulfomethyl, 2-sulfoethyl, 3-sulfopropyl and 4-sulfobutyl groups. etc.
  • thiol-containing groups include thiol groups and mercaptoalkyl groups having 1 to 10 carbon atoms.
  • the mercaptoalkyl group having 1 to 10 carbon atoms is preferably one in which the carbon atom to which the thiol group is bonded is a primary carbon atom, and specific examples are mercaptomethyl, 2-mercaptoethyl, 3-mercaptopropyl and 4- A mercaptobutyl group and the like can be mentioned.
  • An amino group having a (meth)acryloyloxyalkyl group can be obtained by a method using a corresponding (meth)acryloyloxyalkylamino compound, or by introducing an amino group having a hydroxyalkyl group into a triazine ring-containing polymer, followed by addition of the above hydroxyalkyl It can be introduced by a method of acting a (meth)acrylic acid halide or glycidyl (meth)acrylate on a hydroxy group contained in the group.
  • An amino group having a group represented by formula (i) can be obtained by a method using an amino compound having a desired cross-linking group, or by introducing an amino group having a hydroxyalkyl group into a triazine ring-containing polymer, followed by addition of the above hydroxy It can be introduced by a method of reacting a (meth)acrylic acid ester compound having an isocyanate group represented by the following formula (i') with a hydroxy group contained in an alkyl group.
  • the (meth)acryloyloxyalkylamino compound examples include, for example, an ester compound obtained by reacting a hydroxy group of the above hydroxyalkylamino compound with a (meth)acrylic acid halide or glycidyl (meth)acrylate.
  • the (meth)acrylic acid halide examples include (meth)acrylic acid chloride, (meth)acrylic acid bromide and (meth)acrylic acid iodide.
  • (meth)acrylic acid ester compound having an isocyanate group represented by the above formula (i′) include, for example, 2-isocyanatoethyl acrylate, 2-isocyanatoethyl methacrylate and 1,1-(bis Acryloyloxymethyl)ethyl isocyanate may be mentioned.
  • 2-isocyanatoethyl acrylate is preferred from the viewpoint of a simple synthesis method.
  • ⁇ Hydroxyl group-substituted arylamino group> part of the triazine ring terminal is capped with a hydroxyl-substituted arylamino group from the viewpoint of improving the solubility of the film or cured film obtained by using it in an alkaline developer. is stopped.
  • the hydroxyl group is a hydroxyl group directly bonded to an aryl group, and is a so-called phenolic hydroxyl group.
  • Examples of the aryl group include the same groups as those exemplified above, and a phenyl group is particularly preferred.
  • the hydroxyl-substituted arylamino group is preferably a hydroxyl-substituted phenylamino group represented by formula (17), and a phenylamino group having a hydroxyl group at the meta-position of the amino group represented by formula (18). is more preferred.
  • * represents a bond.
  • * represents a bond.
  • the molar ratio (S 1 :S 2 ) of the amino group (S 1 ) having a cross-linking group and the hydroxyl group-substituted arylamino group (S 2 ) in the triazine ring-containing polymer is not particularly limited, but curability and residue suppression are not particularly limited. from the point of view, 0.5:0.5 to 0.1:0.9 is preferable, and 0.4:0.6 to 0.2:0.8 is more preferable.
  • the triazine ring-containing polymer of the present invention has at least one triazine ring terminal, and the triazine ring at this terminal usually has a halogen atom that can be substituted with the amino group having the crosslinking group and the hydroxyl group-substituted arylamino group. I have two. If the triazine ring-containing polymer of the present invention has both the amino group having the cross-linking group and the hydroxyl group-substituted arylamino group as groups for blocking the terminal of the triazine ring, The mode is not particularly limited.
  • Examples of embodiments in which the amino group having a cross-linking group and the hydroxyl group-substituted arylamino group block the terminal of the triazine ring include the following embodiments.
  • One triazine ring terminal is blocked with two above-mentioned amino groups having a bridging group, and the other triazine ring terminal is blocked with two above-mentioned hydroxyl group-substituted arylamino groups.
  • One triazine ring terminal is capped with one above-mentioned amino group having a cross-linking group and one above-mentioned hydroxyl group-substituted arylamino group.
  • Both sealing modes of (1) and (2) are present in the triazine ring-containing polymer.
  • the weight average molecular weight of the triazine ring-containing polymer in the present invention is not particularly limited, but is preferably 500 to 500,000, more preferably 500 to 100,000. is preferably 2,000 or more from the viewpoint of lowering the ,000 or less is more preferable, and 10,000 or less is more preferable.
  • the weight average molecular weight in the present invention is the average molecular weight obtained by standard polystyrene conversion by gel permeation chromatography (hereinafter referred to as GPC) analysis.
  • the triazine ring-containing polymer (hyperbranched polymer) of the present invention can be produced according to the method disclosed in International Publication No. 2010/128661 mentioned above.
  • a triazine ring-containing polymer having structure (25) and structure (26) was prepared by reacting triazine compound (21) and diamino compound (22) in a suitable organic solvent. After that, it can be obtained by reacting an amino compound (23) having a group (Z) having a bridging group and a hydroxyl group-substituted arylamino compound (24), which are terminal blocking agents.
  • X represents a halogen atom independently of each other
  • Q represents a divalent group having 3 to 30 carbon atoms having a ring structure
  • Z represents a group having a bridging group.
  • the charging ratio of the diamino compound (22) is arbitrary as long as the desired polymer can be obtained. is preferred, and 0.7 to 5 equivalents is more preferred.
  • the diamino compound (22) may be added neat or in the form of a solution dissolved in an organic solvent, but the latter method is preferred in consideration of ease of operation and ease of control of the reaction.
  • the reaction temperature may be appropriately set within the range from the melting point to the boiling point of the solvent used, preferably about -30 to 150°C, more preferably -10 to 100°C.
  • a triazine ring-containing polymer having structure (36) and structure (38) is reacted with a triazine compound (31) and a diamino compound (32) in a suitable organic solvent, and then treated with a terminal blocking agent.
  • An arylamino compound (33) having a certain hydroxyalkyl group (A 1 ') and a hydroxyl group-substituted arylamino compound (34) are reacted to obtain a triazine ring-containing polymer having structure (35) and structure (36).
  • (first step) and then reacting a (meth)acrylic acid ester compound (37) having an isocyanate group on the hydroxy groups of the hydroxyalkyl groups contained in the triazine ring-containing polymer (second step).
  • X independently represents a halogen atom
  • Q represents a divalent group having 3 to 30 carbon atoms and having a ring structure
  • a 1 ' is a hydroxyalkyl group having 1 to 10 carbon atoms
  • a 3 represents an (a+1)-valent aliphatic hydrocarbon group which may be substituted with a hydroxy group
  • a 4 represents a hydrogen atom or a methyl group
  • a 1 has 1 to 10 carbon atoms. represents the alkylene group of.
  • the charging ratio and addition method of the diamino compound (32) in the first step, and the reaction temperature in the reaction until obtaining the triazine ring-containing polymer having structure (35) and structure (36) are as follows: 1 can be the same.
  • the charging ratio of the (meth)acrylic acid ester compound (37) having an isocyanate group to the triazine ring-containing polymer having the structure (35) and the structure (36) was hydroxyalkyl group (A 1 ' ) and the isocyanate group, preferably 0.1 to 10 equivalents, more preferably 0.5 to 5 equivalents, more preferably 0.7 to 3 equivalents, still more preferably 0.9 to 1.5 equivalents.
  • the feed ratio is Preferably 1.0 to 10 equivalents, more preferably 1.0 to 5 equivalents of the (meth)acrylic acid ester compound (37) with respect to 1 equivalent of the arylamino compound (33) having a hydroxyalkyl group, More preferably 1.0 to 3 equivalents, more preferably 1.0 to 1.5 equivalents.
  • the reaction temperature in the reaction is the same as the reaction temperature in the reaction for obtaining the triazine ring-containing polymer having structure (35) and structure (36), but the (meth)acryloyl group should not undergo polymerization during the reaction. 30 to 80°C is preferred, 40 to 70°C is more preferred, and 50 to 60°C is even more preferred.
  • the reaction may be carried out in the presence of a polymerization inhibitor in order to prevent the (meth)acryloyl group from polymerizing during the reaction.
  • Polymerization inhibitors include, for example, N-methyl-N-nitrosoaniline, N-nitrosophenylhydroxyamine or salts thereof, benzoquinones, phenolic polymerization inhibitors, phenothiazine and the like.
  • N-nitrosophenylhydroxyamine or salts thereof are preferable in terms of excellent polymerization inhibition effect.
  • Examples of N-nitrosophenylhydroxyamine salts include N-nitrosophenylhydroxyamine ammonium salts and N-nitrosophenylhydroxyamine aluminum salts.
  • benzoquinones include p-benzoquinone and 2-methyl-1,4-benzoquinone.
  • Phenolic polymerization inhibitors include, for example, hydroquinone, p-methoxyphenol, 4-t-butylcatechol, 2-t-butylhydroquinone, 2,6-di-t-butyl-4-methylphenol and the like.
  • the amount of the polymerization inhibitor used is not particularly limited, but for example, it is 1 to 200 ppm in mass ratio with respect to the (meth)acrylic acid ester compound having an isocyanate group represented by the formula (i'). or 10 to 100 ppm.
  • organic solvent various solvents commonly used in this type of reaction can be used, such as tetrahydrofuran, dioxane, dimethylsulfoxide; N,N-dimethylformamide, N-methyl-2-pyrrolidone, tetramethylurea, hexamethylphosphoramide, N,N-dimethylacetamide, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, N-methyl-2-piperidone, N,N'- Dimethylethylene urea, N,N,N',N'-tetramethylmalonic acid amide, N-methylcaprolactam, N-acetylpyrrolidine, N,N-diethylacetamide, N-ethyl-2-pyrrolidone, N,N-dimethyl Amide solvents such as propionic acid amide, N,N-dimethylisobutyramide, N-methylformamide, N,N'-dimethyl
  • N,N-dimethylformamide, dimethylsulfoxide, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, and mixtures thereof are preferred, and N,N-dimethylacetamide, N-methyl-2-pyrrolidone, 3-methoxy-N,N-dimethylpropanamide, and 3-butoxy-N,N-dimethylpropanamide are particularly preferred. is.
  • various bases commonly used during or after polymerization may be added.
  • this base include potassium carbonate, potassium hydroxide, sodium carbonate, sodium hydroxide, sodium hydrogen carbonate, sodium ethoxide, sodium acetate, lithium carbonate, lithium hydroxide, lithium oxide, potassium acetate, magnesium oxide, oxide calcium, barium hydroxide, trilithium phosphate, trisodium phosphate, tripotassium phosphate, cesium fluoride, aluminum oxide, ammonia, n-propylamine, trimethylamine, triethylamine, diisopropylamine, diisopropylethylamine, N-methylpiperidine, 2,2,6,6-tetramethyl-N-methylpiperidine, pyridine, 4-dimethylaminopyridine, N-methylmorpholine, 2-aminoethanol, ethyldiethanolamine, diethylaminoethanol and the like.
  • the amount of the base to be added is preferably 1 to 100 equivalents, more preferably 1 to 10 equivalents, relative to 1 equivalent of the triazine compound (18).
  • These bases may be used in the form of an aqueous solution. Although it is preferable that no raw material components remain in the resulting polymer, some of the raw materials may remain as long as the effects of the present invention are not impaired. After completion of the reaction, the product can be easily purified by a reprecipitation method or the like.
  • a known method may be adopted as a terminal capping method using an amino compound having a cross-linking group and a hydroxyl group-substituted arylamino compound.
  • the amount of the terminal blocking agent used is preferably about 0.05 to 10 equivalents, more preferably 0.1 to 5 equivalents, relative to 1 equivalent of halogen atoms derived from the surplus triazine compound that was not used in the polymerization reaction. Preferably, 0.5 to 2 equivalents is even more preferred.
  • the reaction solvent and reaction temperature the same conditions as described in the reaction of Scheme 1 or the reaction of the first step of Scheme 2 can be mentioned. ) may be prepared at the same time.
  • an unsubstituted amino compound having no cross-linking group may be used and the terminal may be blocked with three or more groups.
  • terminal blocking may be performed using an arylamino compound having a specific heteroatom-containing substituent.
  • an arylamino compound having a specific heteroatom-containing substituent By endcapping with an arylamino group having a specific heteroatom-containing substituent, the refractive index of the resulting film can be further increased.
  • Particular heteroatom-containing substituents include cyano groups, alkylamino groups, arylamino groups, nitro groups, alkylmercapto groups, arylmercapto groups, alkoxycarbonyl groups, alkoxycarbonyloxy groups.
  • the arylamino group having a specific heteroatom-containing substituent includes those represented by the following formula (41).
  • Y is a "specific heteroatom-containing substituent" and is a cyano group, an alkylamino group, an arylamino group, a nitro group, an alkylmercapto group, an arylmercapto group, an alkoxycarbonyl group or an alkoxycarbonyloxy group.
  • m represents an integer of 1 to 5; When m is 2 or more, Y may be the same or different. * represents a bond.
  • Y is preferably a cyano group or a nitro group.
  • m is preferably 1.
  • Y is preferably substituted at the para- or meta-position.
  • the ratio of the amino compound having a bridging group to the arylamino compound having a specific heteroatom-containing substituent is From the viewpoint of exhibiting in a well-balanced manner, 0.1 to 1.0 mol of an arylamino compound having a specific heteroatom-containing substituent is preferable, and 0.1 to 0.5 mol is more preferred, and 0.1 to 0.3 mol is even more preferred.
  • the pattern-forming composition of the present invention contains at least the triazine ring-containing polymer of the present invention and, if necessary, a cross-linking agent and the like.
  • the content of the triazine ring-containing polymer in the pattern forming composition is not particularly limited, but is preferably 1 to 50% by mass, more preferably 5 to 30% by mass.
  • the cross-linking agent used in the present invention is particularly limited as long as it is a compound capable of forming a cross-linked structure by causing a cross-linking reaction alone or together with the triazine ring-containing polymer described above. not a thing Examples of such compounds include melamine-based compounds having cross-linking substituents such as methylol groups and methoxymethyl groups (e.g., phenoplast compounds, aminoplast compounds, etc.), substituted urea-based compounds, cross-linking groups such as epoxy groups and oxetane groups.
  • Compounds containing forming substituents e.g., polyfunctional epoxy compounds, polyfunctional oxetane compounds, etc.
  • compounds containing blocked isocyanate groups compounds having acid anhydride groups, compounds having (meth)acrylic groups, and the like.
  • compounds containing epoxy groups, blocked isocyanate groups, and (meth)acrylic groups are preferable.
  • compounds containing blocked isocyanate groups and photocurable without the use of initiators are preferable.
  • a polyfunctional epoxy compound and/or a polyfunctional (meth)acrylic compound, which gives a composition having a high molecular weight, are preferred.
  • the polyfunctional epoxy compound is not particularly limited as long as it has two or more epoxy groups in one molecule. Specific examples thereof include tris(2,3-epoxypropyl) isocyanurate, 1,4-butanediol diglycidyl ether, 1,2-epoxy-4-(epoxyethyl) cyclohexane, glycerol triglycidyl ether, and diethylene glycol diglycidyl.
  • YH-434 and YH434L manufactured by Nippon Steel Chemical & Materials Co., Ltd.
  • Epolead GT-401 which is an epoxy resin having a cyclohexene oxide structure.
  • the polyfunctional (meth)acrylic compound is not particularly limited as long as it has two or more (meth)acrylic groups in one molecule.
  • Specific examples include ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A dimethacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated Trimethylolpropane trimethacrylate, ethoxylated glycerin triacrylate, ethoxylated glycerin trimethacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetramethacrylate, ethoxylated dipentaerythritol hexaacrylate, polyglycerin monoethylene oxide polyacrylate, polygly
  • the polyfunctional (meth) acrylic compound is available as a commercial product, specific examples thereof include NK Ester A-200, A-400, A-600, A-1000, A- 9300 (tris(2-acryloyloxyethyl) isocyanurate), A-9300-1CL, A-TMPT, UA-53H, 1G, 2G, 3G, 4G, 9G, 14G, 23G, ABE-300, A-BPE-4, A-BPE-6, A-BPE-10, A-BPE-20, A-BPE-30, BPE-80N, BPE- 100N, BPE-200, BPE-500, BPE-900, BPE-1300N, A-GLY-3E, A-GLY-9E, A-GLY-20E, A-TMPT-3EO, A-TMPT-9EO, AT-20E, ATM-4E, ATM-35E, A-DPH, A-TMPT, A-DCP, A-HD-N, TMPT, DCP, NPG, HD-
  • the compound having an acid anhydride group is not particularly limited as long as it is a carboxylic acid anhydride obtained by dehydration condensation of two molecules of carboxylic acid.
  • Specific examples thereof include phthalic anhydride and tetrahydrophthalic anhydride. , hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, nadic anhydride, methyl nadic anhydride, maleic anhydride, succinic anhydride, octyl succinic anhydride, dodecenyl succinic anhydride, etc.
  • the compound containing a blocked isocyanate group has two or more blocked isocyanate groups in one molecule in which the isocyanate group (--NCO) is blocked with an appropriate protective group, and when exposed to a high temperature during thermosetting, ,
  • the protective group (blocking portion) is thermally dissociated and the resulting isocyanate group is not particularly limited as long as it causes a urethane bond reaction with the phenolic hydroxyl group of the triazine ring-containing polymer of the present invention.
  • Examples include compounds having two or more groups represented by the following formulas in one molecule (these groups may be the same or different).
  • Rb represents the organic group of the block portion.
  • Such a compound can be obtained, for example, by reacting a compound having two or more isocyanate groups in one molecule with an appropriate blocking agent.
  • compounds having two or more isocyanate groups in one molecule include polyisocyanates such as isophorone diisocyanate, 1,6-hexamethylene diisocyanate, methylenebis(4-cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, and dimers thereof. , trimers, and reaction products thereof with diols, triols, diamines, or triamines.
  • blocking agents include alcohols such as methanol, ethanol, isopropanol, n-butanol, 2-ethoxyhexanol, 2-N,N-dimethylaminoethanol, 2-ethoxyethanol and cyclohexanol; phenol, o-nitrophenol , p-chlorophenol, o-, m- or p-cresol, etc.; lactams, such as ⁇ -caprolactam; Pyrazoles such as pyrazole, 3,5-dimethylpyrazole and 3-methylpyrazole; Thiols such as dodecanethiol and benzenethiol.
  • alcohols such as methanol, ethanol, isopropanol, n-butanol, 2-ethoxyhexanol, 2-N,N-dimethylaminoethanol, 2-ethoxyethanol and cyclohexanol
  • Compounds containing a blocked isocyanate group are also available as commercial products, and specific examples thereof include Takenate (registered trademark) B-830, B-815N, B-842N, B-870N, B-874N, B-882N, B-7005, B-7030, B-7075, B-5010 (manufactured by Mitsui Chemicals, Inc.), Duranate (registered trademark) 17B-60PX, TPA-B80E, MF-B60X, MF-K60X, E402-B80T (manufactured by Asahi Kasei Corporation), Karenz MOI-BM (registered trademark) (manufactured by Showa Denko K.K.), TRIXENE (registered trademark) BI7950, 7951, 7960, No. 7961, No. 7982, No. 7990, No. 7991, No. 7992 (all manufactured by Baxenden Chemical) and the like.
  • the aminoplast compound is not particularly limited as long as it has two or more methoxymethylene groups in one molecule.
  • Cymel series such as tetramethoxymethylbenzoguanamine 1123 (manufactured by Nippon Cytec Industries Co., Ltd.), methylated melamine resin Nicalac (registered trademark) MW-30HM, MW-390, MW-100LM, the same Melamine compounds such as Nicalac series such as MX-750LM and methylated urea resins such as MX-270, MX-280 and MX-290 (manufactured by Sanwa Chemical Co., Ltd.).
  • the oxetane compound is not particularly limited as long as it has two or more oxetanyl groups in one molecule. , manufactured by Toagosei Co., Ltd.) and the like.
  • the phenoplast compound has two or more hydroxymethylene groups in one molecule, and when exposed to high temperatures during thermosetting, it undergoes a dehydration condensation reaction with the phenolic hydroxyl groups of the triazine ring-containing polymer of the present invention. The cross-linking reaction proceeds.
  • phenoplast compounds include 2,6-dihydroxymethyl-4-methylphenol, 2,4-dihydroxymethyl-6-methylphenol, bis(2-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, Bis(4-hydroxy-3-hydroxymethyl-5-methylphenyl)methane, 2,2-bis(4-hydroxy-3,5-dihydroxymethylphenyl)propane, bis(3-formyl-4-hydroxyphenyl)methane , bis(4-hydroxy-2,5-dimethylphenyl)formylmethane, ⁇ , ⁇ -bis(4-hydroxy-2,5-dimethylphenyl)-4-formyltoluene, and the like.
  • Phenoplast compounds are also commercially available, and specific examples thereof include 26DMPC, 46DMOC, DM-BIPC-F, DM-BIOC-F, TM-BIP-A, BISA-F, and BI25X-DF. , BI25X-TPA (manufactured by Asahi Yukizai Co., Ltd.) and the like.
  • a polyfunctional (meth)acrylic compound is preferable because it can suppress a decrease in the refractive index due to the addition of a cross-linking agent and the curing reaction proceeds rapidly. Therefore, dipentaerythritol hexaacrylate and its EO adduct are preferred.
  • examples of such polyfunctional (meth)acrylic compounds include NK Ester A-DPH and NK Ester A-DPH-12E (both manufactured by Shin-Nakamura Chemical Co., Ltd.).
  • the above-mentioned cross-linking agents may be used alone or in combination of two or more.
  • the content of the cross-linking agent in the pattern forming composition is preferably 1 to 200 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer, but considering solvent resistance, the lower limit is preferably 2 parts by mass, It is more preferably 5 parts by mass, and considering controlling the refractive index and the residue in the unexposed area, the upper limit is preferably 150 parts by mass, more preferably 100 parts by mass, and even more preferably 90 parts by mass. Department.
  • the pattern forming composition of the present invention may contain an organic solvent.
  • organic solvents include toluene, p-xylene, o-xylene, m-xylene, ethylbenzene, styrene, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, ethylene glycol monomethyl ether, propylene glycol, propylene glycol monoethyl ether, ethylene.
  • Glycol monoethyl ether ethylene glycol monoisopropyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, propylene glycol monobutyl ether, ethylene glycol monobutyl ether, diethylene glycol diethyl ether, dipropylene glycol monomethyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, diethylene glycol monoethyl ether, triethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol, 1-octanol, ethylene glycol, hexylene glycol, trimethylene glycol, 1-methoxy -2-butanol, cyclohexanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, propylene
  • the solid content concentration in the composition is not particularly limited as long as it does not affect storage stability, and may be appropriately set according to the thickness of the desired film. Specifically, from the viewpoint of solubility and storage stability, the solid content concentration is preferably 0.1 to 50% by mass, more preferably 0.1 to 40% by mass.
  • the pattern forming composition of the present invention can also contain an initiator suitable for each cross-linking agent.
  • an initiator may be used.
  • a photoacid generator or a photobase generator can be used.
  • the photoacid generator may be appropriately selected from known ones and used.
  • onium salt derivatives such as diazonium salts, sulfonium salts and iodonium salts can be used.
  • aryldiazonium salts such as phenyldiazonium hexafluorophosphate, 4-methoxyphenyldiazonium hexafluoroantimonate, and 4-methylphenyldiazonium hexafluorophosphate; diphenyliodonium hexafluoroantimonate, bis(4-methylphenyl) diaryliodonium salts such as iodonium hexafluorophosphate, bis(4-tert-butylphenyl)iodonium hexafluorophosphate; triphenylsulfonium hexafluoroantimonate, tris(4-methoxyphenyl)sulfonium hexafluorophosphate, diphenyl-4-thiophenoxy phenylsulfonium hexafluoroantimonate, diphenyl-4-thiophenoxyphenylsulfonium hex
  • onium salts may be commercially available products, and specific examples include San-Aid SI-60, SI-80, SI-100, SI-60L, SI-80L, SI-100L, SI-L145, SI- L150, SI-L160, SI-L110, SI-L147 (manufactured by Sanshin Chemical Industry Co., Ltd.), UVI-6950, UVI-6970, UVI-6974, UVI-6990, UVI-6992 (manufactured by Union Carbide company), CPI-100P, CPI-100A, CPI-200K, CPI-200S (manufactured by San-Apro Co., Ltd.), Adeka Optomer SP-150, SP-151, SP-170, SP-171 (manufactured by San-Apro Co., Ltd.) Asahi Denka Kogyo Co., Ltd.), Irgacure 261 (BASF), CI-2481, CI-2624, CI-2639, CI-2064
  • the photobase generator it may be appropriately selected from known ones and used. etc. can be used. Specific examples include 2-nitrobenzylcyclohexylcarbamate, triphenylmethanol, O-carbamoylhydroxylamide, O-carbamoyloxime, [[(2,6-dinitrobenzyl)oxy]carbonyl]cyclohexylamine, bis[[(2 -nitrobenzyl)oxy]carbonyl]hexane 1,6-diamine, 4-(methylthiobenzoyl)-1-methyl-1-morpholinoethane, (4-morpholinobenzoyl)-1-benzyl-1-dimethylaminopropane, N- (2-nitrobenzyloxycarbonyl)pyrrolidine, hexaamminecobalt (III) tris(triphenylmethylborate), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone, 2,6-dimethyl
  • a photoacid or base generator When a photoacid or base generator is used, it is preferably used in an amount of 0.1 to 15 parts by weight, more preferably 1 to 10 parts by weight, per 100 parts by weight of the polyfunctional epoxy compound. If necessary, an epoxy resin curing agent may be blended in an amount of 1 to 100 parts by mass with respect to 100 parts by mass of the polyfunctional epoxy compound.
  • a photoradical polymerization initiator when using a polyfunctional (meth)acrylic compound, a photoradical polymerization initiator can be used.
  • the radical photopolymerization initiator it may be appropriately selected and used from known ones. is mentioned.
  • a photocleavable photoradical polymerization initiator is preferred.
  • the photo-cleavable photoradical polymerization initiator is described in Latest UV Curing Techniques (page 159, published by: Kazuhiro Takasusu, published by: Technical Information Institute, 1991).
  • radical photopolymerization initiators include, for example, BASF trade name: Irgacure 127, 184, 369, 379, 379EG, 651, 500, 754, 819, 903, 907, 784, 2959, CGI1700, CGI1750, CGI1850 , CG24-61, OXE01, OXE02, OXE03, OXE04, Darocure 1116, 1173, MBF, manufactured by BASF Product name: Lucirin TPO, manufactured by UCB Product name: Ebecryl P36, manufactured by Fratezuri Lamberti Product name: Ezacure KIP150, KIP65LT, KIP100F, KT37, KT55, KTO46, KIP75/B and the like.
  • BASF trade name Irgacure 127, 184, 369, 379, 379EG, 651, 500, 754, 819, 903, 907, 784, 2959, CGI1700, CGI1750, CGI1850 ,
  • a photoradical polymerization initiator When using a photoradical polymerization initiator, it is preferable to use it in the range of 0.1 to 200 parts by weight with respect to 100 parts by weight of the polyfunctional (meth) acrylate compound, and to use it in the range of 1 to 150 parts by weight. is more preferred.
  • the pattern-forming composition of the present invention may contain other components other than the triazine ring-containing polymer, cross-linking agent and solvent, such as leveling agents, surfactants and silane coupling agents, as long as the effects of the present invention are not impaired.
  • polymerization inhibitors such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, and polyoxyethylene oleyl ether; polyoxyethylene octylphenol ether, polyoxyethylene nonylphenol; Polyoxyethylene alkylallyl ethers such as ethers; polyoxyethylene/polyoxypropylene block copolymers; sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, sorbitan tristearate sorbitan fatty acid esters such as; Nonionic surfactants such as sorbitan fatty acid
  • surfactants may be used alone or in combination of two or more.
  • the amount of the surfactant used is preferably 0.0001 to 5 parts by mass, more preferably 0.001 to 1 part by mass, and 0.01 to 0.5 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer. Even more preferable.
  • the composition may be coated on a substrate, then heated as necessary to evaporate the solvent, and then heated or irradiated with light to form a desired cured film.
  • a fine pattern can be formed by light irradiation through a mask having a desired pattern formed thereon, followed by development with a developer.
  • a cured product can be obtained by using the pattern forming composition of the present invention.
  • the method for applying the composition is arbitrary, and examples thereof include spin coating, dipping, flow coating, inkjet, jet dispenser, spraying, bar coating, gravure coating, slit coating, and roll coating. method, transfer printing method, brush coating method, blade coating method, air knife coating method, and the like can be used.
  • the base material silicon, glass coated with indium tin oxide (ITO), glass coated with indium zinc oxide (IZO), polyethylene terephthalate (PET), plastic, glass, quartz, and ceramics. etc., and a flexible base material having flexibility can also be used.
  • the calcination temperature is not particularly limited for the purpose of evaporating the solvent, and can be carried out at, for example, 70 to 400°C.
  • the baking time may be any time for the solvent to evaporate, and for example, 1 to 600 seconds can be adopted.
  • the baking method is not particularly limited. For example, a hot plate or an oven may be used to evaporate under an appropriate atmosphere such as air, an inert gas such as nitrogen, or vacuum.
  • the sintering temperature and sintering time may be selected in accordance with the process steps of the target electronic device, and the sintering conditions may be selected such that the physical properties of the obtained film are suitable for the required characteristics of the electronic device.
  • the conditions for light irradiation are not particularly limited either, and suitable irradiation energy and time may be adopted according to the triazine ring-containing polymer and cross-linking agent to be used.
  • Development after exposure can be carried out, for example, by immersing the exposed resin in an organic solvent developer or an aqueous developer.
  • organic solvent developer include PGME, PGMEA, a mixed solvent of PGME and PGMEA, NMP, ⁇ -butyrolactone, DMSO, etc.
  • aqueous developer include sodium carbonate, potassium carbonate, Alkaline aqueous solutions such as sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, and the like are included.
  • the composition of the present invention may further contain an oxirane ring-containing compound and a photocurable catalyst.
  • the oxirane ring-containing compound include those having one or more, preferably two or more, oxirane rings in the molecule. Specific examples include glycidyl ether type epoxy resins, glycidyl ester type epoxy resins, alicyclic epoxy Examples include resins, epoxy-modified polybutadiene resins, oxetane compounds, and the like. These may be used alone or in combination of two or more.
  • the amount of the oxirane ring-containing compound is not particularly limited, but can be about 10 to 400 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer.
  • Photocurable catalysts include photocation generators.
  • the photocation generator include triarylsulfonium salts such as triphenylsulfonium hexafluorophosphate and triphenylsulfonium hexafluoroantimonate; triarylselenium salts; diphenyliodonium hexafluorophosphate and diphenyliodonium hexafluoroantimonate. and diaryliodonium salts. These may be used alone or in combination of two or more.
  • the amount of the photocurable catalyst to be added is not particularly limited, but can be about 0.1 to 100 parts by mass with respect to 100 parts by mass of the triazine ring-containing polymer.
  • oxirane ring-containing compounds and photocurable catalysts can be blended in any order with each component constituting the composition of the present invention. Moreover, you may use the organic solvent mentioned above in that case.
  • the composition containing these by the above-described method for example, it can be cured by irradiating ultraviolet light or the like at 1 to 4000 mj/cm 2 .
  • Light irradiation may be performed using various known techniques such as a high-pressure mercury lamp, metal halide lamp, xenon lamp, LED, and laser light.
  • the film may be heated at about 110 to 180° C. before and after the exposure. Development after exposure can be carried out by immersing the exposed resin in the organic solvent developer or aqueous developer described above.
  • the cured product obtained as described above can achieve high heat resistance, high refractive index, and low volume shrinkage.
  • electronic devices and optical materials such as imaging devices, organic thin-film solar cells, dye-sensitized solar cells, organic thin-film transistors (TFTs), lenses, prism cameras, binoculars, microscopes, semiconductor exposure equipment, etc. available for
  • Apparatus OLYMPUS BX51 manufactured by Olympus Optical Co., Ltd.
  • Device JEOL JSM-7400F
  • Exposure Apparatus: Mask aligner MA6 manufactured by SUSS
  • developing Apparatus: Compact developing apparatus ADE-3000S manufactured by Actes Kyosan Co., Ltd.
  • 1,3-phenylenediamine [2] (41.05 g, 0.380 mol, manufactured by Amino-Chem) and 3-methoxy-N,N-dimethylpropanamide 583.01 g (KJCMPA -100, manufactured by KJ Chemicals Co., Ltd.) was added, and after purging with nitrogen, 1,3-phenylenediamine [2] was dissolved in KJCMPA-100 by stirring. Then, it is cooled to ⁇ 5° C. in an ethanol-dry ice bath, and 2,4,6-trichloro-1,3,5-triazine [1] (70.00 g, 0.380 mol, manufactured by Tokyo Chemical Industry Co., Ltd.).
  • Tetrahydrofuran THF, 261.4 g
  • ammonium acetate 452.5 g
  • ion-exchanged water 452.5 g
  • the solution was transferred to a separating funnel, separated into an organic layer and an aqueous layer, and the organic layer was recovered.
  • the recovered organic layer was added dropwise to a mixture of methanol (1,006 g) and ion-exchanged water (1,508 g) for reprecipitation.
  • the resulting precipitate was filtered and dried in a vacuum dryer at 150° C. for 8 hours to obtain 104.6 g of the target polymer compound [5] (hereinafter referred to as P-1).
  • Compound P-1 had a weight average molecular weight Mw of 7,973 and a polydispersity Mw/Mn of 3.5 as measured by GPC in terms of polystyrene.
  • FIG. 1 shows the measurement results of the 1 H-NMR spectrum of compound P-1.
  • P-1[5] (32.00 g) obtained in Example 1-1 and 85.01 g of cyclopentanone (CPN, manufactured by Nippon Zeon Co., Ltd.) were added to a 300 mL four-necked flask and the atmosphere was purged with nitrogen. After that, it was dissolved by stirring. Thereafter, the solution was heated until the internal temperature reached 70° C., and 0.0032 g of N-nitrosophenylhydroxyamine aluminum salt (Q-1301, manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 2-isocyanatoethyl acrylate were added.
  • CPN cyclopentanone
  • the film was developed with a 2.38% tetramethylammonium hydroxide (hereinafter abbreviated as TMAH) solution for 40 seconds, and then rinsed with ultrapure water for 30 seconds. After rinsing, the film was dried at 85° C. for 10 minutes using a hot plate to obtain a cured film.
  • the cured film obtained above was measured for refractive index, film thickness, b * , transmittance at 400 to 800 nm, and HAZE. Table 1 shows the results. As for the transmittance, an average transmittance of 400 to 800 nm was calculated.
  • the cured film obtained from the SP-1 solution has an excellent effect of maintaining a high transmittance and a low HAZE value while maintaining a high refractive index even after washing with an alkaline aqueous solution. Recognize.
  • Example 4-1 (2) Preparation of patterning film [Example 4-1]
  • the SP-1 solution prepared in Example 2-1 was spin-coated on a 50 mm ⁇ 50 mm ⁇ 0.7 mm non-alkali glass substrate with a spin coater at 200 rpm for 5 seconds and 700 rpm for 30 seconds, and using a hot plate. After temporary drying at 85 ° C. for 10 minutes, a mask with circular openings with a diameter of 10 ⁇ m arranged at intervals of 10 ⁇ m and a space (ultraviolet shielding part) corresponding to the remainder other than the openings using a mask aligner MA6 manufactured by SUSS Co., Ltd.

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004156001A (ja) * 2002-11-07 2004-06-03 Sanei Kagaku Kk フェノール性水酸基を含有するトリアジンジハライド及び芳香族（ポリ）グアナミン、並びにその組成物
WO2015098787A1 (ja) * 2013-12-24 2015-07-02 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2015098788A1 (ja) * 2013-12-24 2015-07-02 日産化学工業株式会社 トリアジン系重合体含有組成物
WO2017138547A1 (ja) * 2016-02-09 2017-08-17 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2021079977A1 (ja) * 2019-10-25 2021-04-29 日産化学株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物
WO2021079991A1 (ja) * 2019-10-25 2021-04-29 日産化学株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101950714B1 (ko) 2009-05-07 2019-02-21 닛산 가가쿠 가부시키가이샤 트리아진환 함유 중합체 및 그것을 포함하는 막 형성용 조성물
US10717818B2 (en) 2014-08-13 2020-07-21 Nissan Chemical Industries, Ltd. Polymer containing triazine ring and composition containing same
KR20170106369A (ko) 2015-01-15 2017-09-20 닛산 가가쿠 고교 가부시키 가이샤 트라이아진환 함유 중합체 및 그것을 포함하는 조성물
WO2019093203A1 (ja) 2017-11-08 2019-05-16 日産化学株式会社 トリアジン環含有重合体およびそれを含む組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004156001A (ja) * 2002-11-07 2004-06-03 Sanei Kagaku Kk フェノール性水酸基を含有するトリアジンジハライド及び芳香族（ポリ）グアナミン、並びにその組成物
WO2015098787A1 (ja) * 2013-12-24 2015-07-02 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2015098788A1 (ja) * 2013-12-24 2015-07-02 日産化学工業株式会社 トリアジン系重合体含有組成物
WO2017138547A1 (ja) * 2016-02-09 2017-08-17 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
WO2021079977A1 (ja) * 2019-10-25 2021-04-29 日産化学株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物
WO2021079991A1 (ja) * 2019-10-25 2021-04-29 日産化学株式会社 トリアジン環含有重合体およびそれを含む膜形成用組成物

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