WO2022213730A1 - 一种清洁基站和清洁系统 - Google Patents
一种清洁基站和清洁系统 Download PDFInfo
- Publication number
- WO2022213730A1 WO2022213730A1 PCT/CN2022/076809 CN2022076809W WO2022213730A1 WO 2022213730 A1 WO2022213730 A1 WO 2022213730A1 CN 2022076809 W CN2022076809 W CN 2022076809W WO 2022213730 A1 WO2022213730 A1 WO 2022213730A1
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- WO
- WIPO (PCT)
- Prior art keywords
- cleaning
- cleaning device
- base station
- water blocking
- main body
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 287
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 124
- 230000000903 blocking effect Effects 0.000 claims abstract description 77
- 239000010865 sewage Substances 0.000 claims abstract description 53
- 238000002347 injection Methods 0.000 claims description 17
- 239000007924 injection Substances 0.000 claims description 17
- 238000009434 installation Methods 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 7
- 230000007423 decrease Effects 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 2
- 239000008400 supply water Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 241001417527 Pempheridae Species 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L11/24—Floor-sweeping machines, motor-driven
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L11/28—Floor-scrubbing machines, motor-driven
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L9/00—Details or accessories of suction cleaners, e.g. mechanical means for controlling the suction or for effecting pulsating action; Storing devices specially adapted to suction cleaners or parts thereof; Carrying-vehicles specially adapted for suction cleaners
Definitions
- the present application relates to the technical field of cleaning facilities, and in particular, to a cleaning base station and a cleaning system.
- the cleaning equipment usually includes a host and a cleaning piece. After the ground or other cleaning objects are cleaned by the cleaning piece, the cleaning equipment needs to be moved to the cleaning base station, and the cleaning piece is cleaned by the cleaning base station. In the related art, when the cleaning base station cleans the cleaning equipment, sewage may enter the host and cause damage to the host of the cleaning equipment.
- the embodiments of the present application are expected to provide a cleaning base station and a cleaning system, so as to reduce the possibility that sewage enters the host of the cleaning device and causes damage to the host of the cleaning device.
- a cleaning base station including:
- the main body of the base station is surrounded by the cleaning device to form a sewage cavity and a working cavity, the sewage cavity is located below the working cavity, and the main body of the base station is formed with a guiding part and a water blocking part, and along the guiding direction, the The guide portion is located on the side of the water blocking portion away from the cleaning device, and the water blocking portion protrudes from the top surface of the guide portion.
- the shape of the water blocking portion is a long strip, and the water blocking portion is extended along the width direction of the base station main body.
- the base station main body is formed with a positioning part; the number of the water blocking parts is multiple, and the plurality of the water blocking parts are arranged at intervals along the width direction of the base station main body, and two adjacent water blocking parts are arranged.
- the positioning portion is provided between the water portions, the positioning portion has a first positioning groove, and the lowest position of the first positioning groove is lower than the highest position of the water blocking portion.
- the water blocking portion has a buffer surface, and the buffer surface is located on a side of the water blocking portion away from the cleaning device, and along the direction in which the water blocking portion is away from the cleaning device, the buffer The height of the face gradually decreases.
- the base station body includes:
- a tray is installed on the lower base, the tray and the cleaning device are enclosed to form the sewage cavity, and the water blocking part and the guide part are both formed on the tray.
- the working chamber includes a accommodating chamber and a cleaning tank
- the cleaning device includes:
- a baffle plate is arranged along the periphery of the cleaning device, and the baffle plate and the main body of the cleaning device are surrounded by the cleaning tank and a first opening and a second opening communicating with the cleaning tank, the first opening and The second openings are all communicated with the accommodating cavity, the first openings are located above the cleaning tank, and the second openings are located on the side of the cleaning tank facing the water blocking member.
- the base station body is formed with an installation hole
- the cleaning base station further includes a water injection pipe and a sealing ring sleeved on the water injection pipe, the water injection pipe is penetrated through the installation hole, and the water injection pipe is configured as Water is supplied to the cleaning device, and the sealing ring is used for sealing between the water injection pipe and the main body of the base station.
- a second aspect of the embodiments of the present application provides a cleaning system, including:
- a cleaning device includes an interconnected host and a cleaning member, when the cleaning device moves to a target position, the cleaning device is configured to clean the cleaning member, and the host is at least partially located above the guide portion .
- a third aspect of the embodiments of the present application provides a cleaning system, including:
- Cleaning equipment including interconnected hosts and cleaning parts
- the working chamber includes an accommodating chamber and a cleaning tank
- the cleaning device includes a cleaning device main body and a baffle plate
- the baffle plate is arranged along the circumference of the cleaning device
- the baffle plate is surrounded by the cleaning device main body
- the cleaning tank and the first opening and the second opening communicating with the cleaning tank, the first opening and the second opening are both in communication with the accommodating cavity, and the first opening is located above the cleaning tank , the second opening is located on the side of the cleaning tank facing the water blocking member; when the cleaning device moves to the target position, the cleaning device is configured to clean the cleaning member, and the host at least partially
- the baffle is located above the guide portion, the baffle has a first surface, the first surface is located on the top of the baffle, and the cleaning member is located below the first surface.
- a fourth aspect of the embodiments of the present application provides a cleaning system, including:
- the cleaning base station of any one of the above, the cleaning device is formed with a second positioning groove
- a cleaning device includes an interconnected host and a cleaning piece, the host includes an interconnected body and a driven wheel, the cleaning piece is connected with the body, and when the cleaning device moves to a target position, the cleaning device is configured as For cleaning the cleaning piece, the body is at least partially located above the guide portion, the driven wheel is located in the second positioning groove, and the water blocking portion abuts against the bottom of the body.
- the water blocking part protrudes from the top surface of the guide part to block water, even if the water level in the cleaning device is higher than the top surface of the guide part, it is difficult for the water in the sewage cavity to pass over
- the water blocking part overflows from the sewage cavity to the guide part, and the possibility of sewage splashing into the host above the guide part is low, which reduces the possibility of sewage entering the host and causing damage to the host of the cleaning equipment.
- FIG. 1 is a schematic structural diagram of a cleaning system according to an embodiment of the application.
- FIG. 2 is a schematic structural diagram of a cleaning base station according to an embodiment of the present application.
- Fig. 3 is the sectional view at position A-A in Fig. 2;
- Fig. 4 is an enlarged view at position B in Fig. 3;
- FIG. 5 is a schematic structural diagram of a cleaning device according to an embodiment of the application.
- FIG. 6 is a perspective view of a cleaning base station according to an embodiment of the present application.
- FIG. 7 is an exploded view of a cleaning base station according to an embodiment of the present application.
- FIG. 8 is a schematic structural diagram of a tray according to an embodiment of the application.
- FIG. 9 is a schematic structural diagram of a cleaning device according to an embodiment of the application.
- cleaning base station 100 cleaning device 1; cleaning device main body 11; baffle plate 12; first surface 121; first opening 13; second opening 14; second positioning groove 15; part 17; second positioning surface 18; base station main body 2; guide part 21; top surface 211; water blocking part 22; buffer surface 221; positioning part 23; first positioning groove 231; first positioning surface 232; lower base 24; Upper base 25; Tray 26; Mounting part 261; Mounting hole 27; Third opening 28; Sewage chamber 3; Working chamber 4; Receiving chamber 41; Cleaning tank 42; Drive wheel 2012; cleaning member 202.
- orientation or positional relationship are based on the orientation or positional relationship shown in FIG. 1 . It should be understood that these orientation terms are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a reference to the present application. limits.
- the width direction of the base station main body is the direction indicated by the arrow R2 in the figure.
- the guiding direction is the direction in which the cleaning device moves into or out of the cleaning base station through the guiding portion. Referring to FIG. 1 and FIG. 3 , the guiding direction is the direction indicated by the arrow R1 in the figures.
- a cleaning base station usually includes a cleaning device and a base station main body.
- the cleaning device is installed on the base station main body.
- the cleaning device and the base station main body are surrounded by a sewage cavity and a working cavity.
- the sewage cavity is located below the working cavity.
- the sewage in the sewage cavity may overflow to the guide part from between the cleaning device and the main body of the base station due to the effect of the communicator.
- the cleaning equipment moves to the target position to clean the cleaning parts through the cleaning device.
- the main body of the cleaning equipment usually has a part above the guide part, and the sewage overflowing from the sewage cavity to the guide part may cause the sewage to splash into the upper part of the guide part. Inside the main unit of the cleaning device, causing damage to the main unit of the cleaning device.
- the cleaning system includes a cleaning base station 100 and a cleaning device 200 .
- the cleaning base station 100 is configured to clean the cleaning device 200.
- the cleaning device 200 according to the embodiment of the present application, please refer to FIG. 1 , including a main unit and a cleaning member 202 that are connected to each other.
- the cleaning member 202 is configured to clean the object to be cleaned.
- the cleaning device 200 may be a mopping machine, and the cleaning member 202 may be a mopping roller or a mopping rag.
- the cleaning device 200 may be a sweeper, and the cleaning element 202 is configured to clean the ground.
- the cleaning device 200 may also be an all-in-one mopping and sweeping machine.
- the cleaning device 200 may also be a vacuum cleaner.
- the host includes a main body 2011 and a driven wheel that are connected to each other, and the cleaning member 202 is connected to the main body 2011 .
- the cleaning element is located on the side of the main body 2011 facing the driven wheel.
- the host further includes a driving wheel 2012 connected to the main body 2011 , the driving wheel 2012 is configured to drive the main body 2011 to move, and the main body 2011 drives the driven wheel and the cleaning member 202 to move.
- the driving wheel 2012 and the driven wheel are arranged in the guiding direction.
- the cleaning base station 100 including a cleaning device 1 and a base station main body 2 , and the cleaning device 1 is surrounded by a sewage chamber 3 and a working chamber 4 , and the sewage chamber 3 is located below the working chamber 4 .
- the base station main body 2 is formed with a guide part 21 and a water blocking part 22.
- the guiding part 21 is located on the side of the water blocking part 22 away from the cleaning device 1, and the water blocking part 22 protrudes from the guide part 21.
- Top surface 211 is formed with a guide part 21 and a water blocking part 22 .
- the cleaning device 1 when the cleaning device 200 moves to the target position, the cleaning device 1 is configured to clean the cleaning member 202 , and the host is at least partially located above the guide portion 21 .
- the water blocking portion 22 protrudes from the top surface 211 of the guide portion 21 to block water, even if the water level in the cleaning device 1 is higher than the top surface 211 of the guide portion 21, the sewage chamber 3 It is difficult for the water to overflow from the sewage chamber 3 to the guide part 21 over the water blocking part 22, and the possibility of sewage splashing into the main body above the guide part 21 is low, which reduces the possibility of the sewage entering the main body and causing damage to the main body of the cleaning device 200. .
- the cleaning device 1 when the cleaning device 200 moves to the target position, the cleaning device 1 is configured to clean the cleaning element 202 , and the body 2011 is at least partially located above the guide portion 21 .
- the water blocking portion 22 protrudes from the top surface 211 of the guide portion 21 to block water, the possibility of sewage splashing into the body 2011 above the guide portion 21 is low, which reduces the entry of sewage into the body. 2011 causes the possibility of damage to the body 2011 of the cleaning device 200.
- the height of the water blocking portion 22 can be adjusted according to actual needs, so as to prevent the sewage in the sewage chamber 3 from overflowing to the guide portion 21 as much as possible.
- the cleaning device 1 is detachably connected to the base station main body 2 .
- the shape of the water blocking portion 22 is a long strip, and the water blocking portion 22 extends along the width direction of the base station main body 2 .
- the water blocking portion 22 can block water in the entire width direction of the base station main body 2 , thereby reducing the possibility of the sewage in the sewage chamber 3 overflowing to the guide portion 21 as much as possible.
- the number of the water blocking parts 22 may be multiple, and the multiple water blocking parts 22 are arranged at intervals along the width direction of the base station main body 2 .
- the number of the water blocking portions 22 is three.
- the water blocking portion 22 has a buffer surface 221 , and the buffer surface 221 is located on the side of the water blocking portion 22 away from the cleaning device 1 , along the water blocking portion 22 away from the cleaning device 1 .
- the height of the buffer surface 221 gradually decreases in the direction of the cleaning device 1 .
- the base station body 2 is formed with a positioning portion 23 , and a positioning portion 23 is provided between two adjacent water blocking portions 22 , and the positioning portion 23 has a first positioning groove 231 .
- the lowest position of the positioning groove 231 is lower than the highest position of the water blocking portion 22 .
- the first positioning groove 231 is mainly used for positioning the driving wheel 2012 of the cleaning device 200 . When the cleaning device 200 moves to the target position, the driving wheel 2012 is located in the first positioning groove 231 .
- the lower lowest position of the first positioning groove 231 is favorable for the driving wheel 2012 to fall at a relatively lower position, and the higher position of the water blocking portion 22 reduces the gap between the water blocking portion 22 and the bottom of the main body 2011 of the cleaning device 1 as much as possible , which is beneficial to prevent the sewage in the sewage chamber 3 from overflowing to the guide portion 21 .
- the driving wheel 2012 When the cleaning device 200 moves to the target position, the driving wheel 2012 is located in the first positioning groove 231, and at the position of the first positioning groove 231, the driving wheel 2012 can play a role of blocking water to a certain extent.
- the positioning portion 23 has a first positioning surface 232 surrounding a first positioning groove 231 .
- the variation rule of the height of the first positioning surface 232 is: along the guiding direction, the height of the first positioning surface 232 gradually decreases and then gradually increases.
- the number of positioning portions 23 corresponds to the number of driving wheels 2012 , and each driving wheel 2012 is provided with one positioning portion 23 .
- the number of positioning parts 23 is two, and the cleaning device 200 is provided with two driving wheels 2012 .
- the base station main body 2 is formed with a third opening 28 , and the third opening 28 communicates with the working chamber 4 .
- the cleaning device 200 enters the working chamber 4 from the third opening 28 via the guide portion 21 .
- the water blocking portion 22 is located on the side of the cleaning device 1 facing the third opening 28 .
- the base station main body 2 includes a lower base 24 , an upper base 25 and a tray 26 .
- the upper base 25 is connected with the lower base 24, and the upper base 25, the lower base 24 and the cleaning device 1 are surrounded to form a working chamber 4.
- the tray 26 is installed on the lower base 24 , and the tray 26 and the cleaning device 1 are surrounded to form a sewage chamber 3 .
- the water entering the gap between the cleaning device 1 and the tray 26 is blocked by the water blocking part 22 and it is difficult to overflow to the guiding part 21 over the water blocking part 22, and the main body 2011 of the cleaning device 200 may enter the sewage and cause damage. smaller.
- the tray 26 is installed on the lower base 24 and surrounds the cleaning device 1 to form a sewage chamber 3 , which facilitates taking the tray 26 out of the lower base 24 to clean the sewage chamber 3 .
- the tray 26 is installed on the lower base 24, and the tray 26 and the lower base 24 are detachable.
- the cleaning device 1 is detachably connected to the tray 26 .
- the tray 26 carries the cleaning device 1 .
- the lower base 24 and the upper base 25 are detachably connected. With such a structure, the upper base 25 and the lower base 24 can be separated to clear the space surrounded by the lower base 24 and the upper base 25 .
- the upper base 25 and the lower base 24 may be integrally formed.
- the tray 26 has a mounting portion 261 , and the mounting portion 261 is located on the side of the water blocking portion 22 away from the guiding portion 21 along the guiding direction.
- the installation part 261 and the cleaning device 1 are surrounded by a sewage chamber 3 .
- the cleaning device 1 is mounted in the mounting portion 261 .
- the guide portion 21 has a guide surface connected to the top surface 211 , and the guide surface is located on the side of the top surface 211 away from the water blocking portion 22 , along the direction of the water blocking portion 22 away from the cleaning device 1 , The height of the guide surface gradually decreases.
- the water injection pipe 5 sometimes supplies hot water to the cleaning device 1 , so that water vapor is formed in the working chamber 4 .
- the base station body 2 is formed with a mounting hole 27
- the cleaning base station 100 further includes a water injection pipe 5 and a sealing ring sleeved on the water injection pipe 5 , and the water injection pipe 5 is penetrated through the water injection pipe 5 .
- the installation hole 27 and the water injection pipe 5 are configured to supply water to the cleaning device 1 , and the water injection pipe 5 and the base station main body 2 are sealed by a sealing ring.
- Such a structure can prevent water or water vapor in the working chamber 4 from entering the installation space of the components in the base station main body 2 through the installation holes 27, and prevent the components in the base station main body 2 from being damaged by water ingress.
- the mounting hole 27 is formed in the lower base 24 .
- the tray 26 further includes an anti-skid strip disposed on the guide surface.
- the working chamber 4 includes a accommodating chamber 41 and a cleaning chamber.
- the cleaning device 1 includes a cleaning device main body 11 and a baffle 12 .
- the baffle 12 is arranged along the circumference of the cleaning device 1 , and the baffle 12 and the main body 11 of the cleaning device are surrounded by a cleaning tank 42 and a first opening 13 and a second opening 14 communicating with the cleaning tank 42 , the first opening 13 and the second opening 14 Both are communicated with the accommodating cavity 41 , the first opening 13 is located above the cleaning tank 42 , and the second opening 14 is located on the side of the cleaning tank 42 facing the water blocking portion 22 .
- the baffle 12 can separate the cleaning tank 42 from the inner wall of the working chamber 4 of the base station main body 2 to a certain extent, preventing the cleaning element 202 from being cleaned during the cleaning process.
- the second opening 14 facilitates water supply to the washing tank 42 into which the cleaning device 200 is moved from the first opening 13 .
- the third opening 28 communicates with the accommodating cavity 41 , and the cleaning device 200 enters the accommodating cavity 41 through the third opening 28 .
- the height of the baffle 12 is greater than or equal to 10 mm.
- the height of the baffle plate 12 is set so that the baffle plate 12 can substantially block the water splashed in the cleaning tank 42 during the cleaning process of the cleaning member 202 .
- the baffle 12 has a first surface 121 , the first surface 121 is located on the top of the baffle 12 , when the cleaning device 200 moves to the target position, the cleaning member 202 is located on the first surface 121 below.
- the height of the baffle plate 12 is high enough, so that the baffle plate 12 can substantially block the water splashed in the cleaning tank 42 during the cleaning process of the cleaning member 202.
- the cleaning device 1 is formed with a second positioning groove 15.
- the driven wheel of the cleaning device 200 is located in the second positioning groove 15, and the water blocking portion 22 abuts against the bottom of the main body 2011 .
- a relatively good seal can be formed between the water blocking portion 22 and the main body 2011 of the cleaning device 200 through the abutment between the water blocking portion 22 and the bottom of the main body 2011, and the water blocking portion 22 can better block the sewage cavity. 3.
- the overflowed water reduces the possibility that the water in the sewage chamber 3 overflows from the sewage chamber 3 to the guide portion 21.
- the cleaning device 200 has a second positioning surface 18 surrounding the second positioning groove 15 , and the change rule of the second positioning surface 18 is: along the guiding direction, the second positioning surface 18 The height of the face 18 gradually decreases and then gradually increases.
- the driving wheel 2012 drives the body 2011 of the cleaning device 200 to move backward, the second positioning surface 18 will lift the driven wheel, and the body 2011 of the cleaning device 200 will follow the driven wheel.
- the cleaning device 1 further includes a rail bearing platform 16 connected to the main body 11 of the cleaning device.
- the rail bearing platform 16 is configured to carry a driven wheel of the cleaning device 200 , and the driven wheel is located on the rail bearing platform. 16 on the move.
- the second positioning groove 15 is formed on the rail support base 16 .
- the main body 11 of the cleaning device is further formed with a protruding portion 17 , and the protruding portion 17 is configured to rub against the cleaning member 202 so as to better clean the cleaning member 202 .
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- Engineering & Computer Science (AREA)
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- Cleaning By Liquid Or Steam (AREA)
Abstract
一种清洁基站（100）和清洁系统，清洁系统包括清洁基站（100）和清洁设备（200）。清洁基站（100）包括清洗装置（1）以及基站主体（2），基站主体（2）与清洗装置（1）围设成污水腔（3）和工作腔（4），污水腔（3）位于工作腔（4）的下方，基站主体（2）形成有导引部（21）和挡水部（22），沿导引方向，导引部（21）位于挡水部（22）背离清洗装置（1）的一侧，挡水部（22）凸出于导引部（21）的顶表面（211）。由于挡水部（22）凸出于导引部（21）的顶表面（211）起到挡水的作用，即使清洗装置（1）中的水位高于导引部（21）的顶表面（211），污水腔（3）中的水难以越过挡水部（22）从污水腔（3）溢出至导引部（21），污水溅入导引部（21）上方主机内的可能性较低，降低了污水进入主机造成清洁设备（200）主机损坏的可能性。
Description
相关申请的交叉引用
本申请基于申请号为202120700073.7、申请日为2021年04月07日的中国专利申请提出，并要求该中国专利申请的优先权，该中国专利申请的全部内容在此引入本申请作为参考。
本申请涉及清洁设施技术领域，尤其涉及一种清洁基站和清洁系统。
清洁设备通常包括主机和清洁件，通过清洁件对地面或其它的清洁对象进行清洁处理后，清洁设备需要移动至清洁基站，通过清洁基站对清洁件进行清洗。相关技术中，当清洁基站对清洁设备进行清洗的过程中，污水有可能会进入到主机造成清洁设备的主机损坏。
发明内容
有鉴于此，本申请实施例期望提供一种清洁基站和清洁系统，降低污水进入清洁设备的主机造成清洁设备的主机损坏的可能性。
为达到上述目的，本申请实施例一方面提供一种清洁基站，包括：
清洗装置；以及
基站主体，与所述清洗装置围设成污水腔和工作腔，所述污水腔位于所述工作腔的下方，所述基站主体形成有导引部和挡水部，沿导引方向，所述导引部位于所述挡水部背离所述清洗装置的一侧，所述挡水部凸出于所述导引部的顶表面。
一实施例中，所述挡水部的形状呈长条状，所述挡水部沿所述基站主体的宽度方向延伸设置。
一实施例中，所述基站主体形成有定位部；所述挡水部的数量为多个，多个所述挡水部沿所述基站主体的宽度方向间隔设置，相邻两个所述挡水部之间设置有所述定位部，所述定位部具有第一定位槽，所述第一定位槽的最低位置低于所述挡水部的最高位置。
一实施例中，所述挡水部具有缓冲面，所述缓冲面位于所述挡水部背离所述清洗装置的一侧，沿所述挡水部背离所述清洗装置的方向，所述缓冲面的高度逐渐降低。
一实施例中，所述基站主体包括：
下基座；
上基座，与所述下基座连接，所述上基座、所述下基座以及所述清洗装置围设成所述工作腔；以及
托盘，安装于所述下基座，所述托盘与所述清洗装置围设成所述污水腔，所述挡水部和所述导引部均形成于所述托盘。
一实施例中，所述工作腔包括容纳腔和清洗槽，所述清洗装置包括：
清洗装置主体；以及
挡板，沿所述清洗装置的周围设置，所述挡板与所述清洗装置主体围设成所述清洗槽以及连通所述清洗槽的第一开口和第二开口，所述第一开口和所述第二开口均与所述容纳腔连通，所述第一开口位于所述清洗槽的上方，所述第二开口位于所述清洗槽朝向所述挡水部件的一侧。
一实施例中，所述基站主体形成有安装孔，所述清洁基站还包括注水管以及套设于所述注水管的密封圈，所述注水管穿设于安装孔，所述注水管配置为向所述清洗装置供水，所述注水管与所述基站主体之间通过所述密封圈密封。
本申请实施例第二方面提供一种清洁系统，包括：
上述任一种的清洁基站；以及
清洁设备，包括相互连接的主机以及清洁件，当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述主机至少部分地位于所述导引部的上方。
本申请实施例第三方面提供一种清洁系统，包括：
上述对应的清洁基站；以及
清洁设备，包括相互连接的主机以及清洁件；
其中，所述工作腔包括容纳腔和清洗槽，所述清洗装置包括清洗装置主体和挡板，所述挡板沿所述清洗装置的周围设置，所述挡板与所述清洗装置主体围设所述清洗槽以及连通所述清洗槽的第一开口和第二开口，所述第一开口和所述第二开口均与所述容纳腔连通，所述第一开口位于所述清洗槽的上方，所述第二开口位于所述清洗槽朝向所述挡水部件的一侧；当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述主机至少部分地位于所述导引部的上方，所述挡板具有第一表面，所述第一表面位于所述挡板的顶部，所述清洁件位于所述第一表面的下方。
本申请实施例第四方面提供一种清洁系统，包括：
上述任一种的清洁基站，所述清洗装置形成有第二定位槽；以及
清洁设备，包括相互连接的主机以及清洁件，所述主机包括相互连接的本体以及从动轮，所述清洁件与所述本体连接，当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述本体至少部分地位于所述导引部的上方，所述从动轮位于所述第二定位槽内，所述挡水部抵接于所述本体的底部。
本申请实施例的清洁基站，由于挡水部凸出于导引部的顶表面起到挡 水的作用，即使清洗装置中的水位高于导引部的顶表面，污水腔中的水难以越过挡水部从污水腔溢出至导引部，污水溅入导引部上方主机内的可能性较低，降低了污水进入主机造成清洁设备的主机损坏的可能性。
图1为本申请实施例的清洁系统的结构示意图；
图2为本申请实施例的清洁基站的结构示意图；
图3为图2中位置A-A处的剖视图；
图4为图3中位置B处的放大视图；
图5为本申请实施例的清洗装置的结构示意图；
图6为本申请实施例的清洁基站的立体图；
图7为本申请实施例的清洁基站的爆炸视图；
图8为本申请实施例的托盘的结构示意图；
图9为本申请实施例的清洗装置的结构示意图；
附图标记说明：清洁基站100；清洗装置1；清洗装置主体11；挡板12；第一表面121；第一开口13；第二开口14；第二定位槽15；承轨台16；凸出部17；第二定位面18；基站主体2；导引部21；顶表面211；挡水部22；缓冲面221；定位部23；第一定位槽231；第一定位面232；下基座24；上基座25；托盘26；安装部261；安装孔27；第三开口28；污水腔3；工作腔4；容纳腔41；清洗槽42；注水管5；清洁设备200；本体2011；驱动轮2012；清洁件202。
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的技术特征可以相互组合，具体实施方式中的详细描述应理解为本申请宗旨的解释说明，不应视为对本申请的不当限制。
在本申请实施例的描述中，“上”、“下”、“顶”、“底”、方位或位置关系为基于附图1所示的方位或位置关系。需要理解的是，这些方位术语仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
在本申请实施例的描述中，以图2为参考，基站主体的宽度方向为图中箭头R2所示的方向。
在本申请实施例的描述中，导引方向为清洁设备经导引部移入或移出清洁基站的方向。以图1和图3为参考，导引方向为图中箭头R1所示的方向。
作为本申请创造性构思的一部分，在描述本申请的实施例之前，需对相关技术中，污水从清洁设备底部进入清洁设备的原因进行分析，通过合理的分析得到本申请实施例的技术方案。
相关技术中，清洁基站通常包括清洗装置和基站主体，清洗装置安装于基站主体，清洗装置和基站主体围设成污水腔和工作腔，污水腔位于工作腔的下方，清洁设备通常包括相互连接的主机和清洁件，当需要对清洁设备的清洁件进行清洗，可以向清洗装置内注入一定量的水以便将清洁件放入清洗装置内进行清洗，污水流入清洗装置底部的污水腔。当清洗装置内的水位较高，清洗装置内的水位高于导引部的顶表面，由于连通器效应，污水腔中的污水有可能从清洗装置和基站主体之间溢出至导引部。清洁设备移动到目标位置通过清洗装置对清洁件进行清洗，清洁设备的主机通常会有一部分位于导引部的上方，污水从污水腔溢出至导引部有可能使得污水溅入导引部上方的清洁设备的主机内，对清洁设备的主机造成损坏。
鉴于此，本申请实施例提供一种清洁系统，请参阅图1，清洁系统包括清洁基站100和清洁设备200。当清洁设备200移动到目标位置，清洁基站 100配置为对清洁设备200进行清洗。
本申请实施例的清洁设备200，请参阅图1，包括相互连接的主机以及清洁件202。清洁件202配置为对被清洁对象进行清洁。
一实施例中，清洁设备200可以为拖地机，清洁件202可以为拖地滚筒或拖地抹布。
一实施例中，清洁设备200可以为扫地机，清洁件202配置为对地面进行清扫。
一实施例中，清洁设备200还可以为拖扫一体机。
一实施例中，清洁设备200还可以为吸尘器。
一实施例中，请参阅图1，主机包括相互连接的本体2011和从动轮，清洁件202与本体2011连接。
一实施例中，请参阅图1，清洗件位于本体2011朝向从动轮的一侧。
一实施例中，请参阅图1，主机还包括与本体2011连接的驱动轮2012，驱动轮2012配置为驱动本体2011移动，本体2011带动从动轮和清洁件202移动。驱动轮2012和从动轮沿导引方向排列。
本申请实施例的清洁基站100，请参阅图2～图9，包括清洗装置1和基站主体2，与清洗装置1围设成污水腔3和工作腔4，污水腔3位于工作腔4的下方，基站主体2形成有导引部21和挡水部22，沿导引方向，导引部21位于挡水部22背离清洗装置1的一侧，挡水部22凸出于导引部21的顶表面211。
一实施例中，当清洁设备200移动到目标位置，清洗装置1配置为对清洁件202进行清洗，主机至少部分地位于导引部21的上方。
可以理解的是，由于挡水部22凸出于导引部21的顶表面211起到挡水的作用，即使清洗装置1中的水位高于导引部21的顶表面211，污水腔3中的水难以越过挡水部22从污水腔3溢出至导引部21，污水溅入导引部 21上方主机内的可能性较低，降低了污水进入主机造成清洁设备200的主机损坏的可能性。
一实施例中，当清洁设备200移动到目标位置，清洗装置1配置为对清洁件202进行清洗，本体2011至少部分地位于导引部21的上方。
可以理解的是，由于挡水部22凸出于导引部21的顶表面211起到挡水的作用，污水溅入导引部21上方本体2011内的可能性较低，降低了污水进入本体2011造成清洁设备200的本体2011损坏的可能性。
一实施例中，挡水部22的高度可根据实际需要调整，以尽可能地防止污水腔3中的污水溢出至导引部21。
一实施例中，清洗装置1与基站主体2可拆卸地连接。
一实施例中，请参阅图6和图8，挡水部22的形状呈长条状，挡水部22沿基站主体2的宽度方向延伸设置。如此结构形式，挡水部22能够在基站主体2的整个宽度方向上进行挡水，尽可能地减少污水腔3中的污水溢出至导引部21的可能性。
一实施例中，请参阅图6和图8，挡水部22的数量可以为多个，多个挡水部22沿基站主体2的宽度方向间隔设置。
一实施例中，请参阅图6和图8，挡水部22的数量为三个。
一实施例中，请参阅图3、图4、图6和图8，挡水部22具有缓冲面221，缓冲面221位于挡水部22背离清洗装置1的一侧，沿挡水部22背离清洗装置1的方向，缓冲面221的高度逐渐降低。如此结构形式，在清洁设备200移动过程中，当清洁设备200的从动轮行经挡水部22，从动轮会被挡水逐渐抬起并向清洗装置1移动，在一定程度上减少了挡水部22对清洁设备200的从动轮造成的冲击，起到缓冲的作用。
一实施例中，请参阅图6和图8，基站主体2形成有定位部23，相邻两个挡水部22之间设置有定位部23，定位部23具有第一定位槽231，第 一定位槽231的最低位置低于挡水部22的最高位置。如此结构形式，第一定位槽231主要用于对清洁设备200的驱动轮2012进行定位，当清洁设备200移动到目标位置，驱动轮2012位于第一定位槽231内。第一定位槽231的最低位置较低有利于驱动轮2012落在相对较低的位置，挡水部22的位置较高使得挡水部22与清洗装置1的本体2011底部的间隙尽可能地减少，有利于防止污水腔3中的污水溢出至导引部21。
当清洁设备200移动到目标位置，驱动轮2012位于第一定位槽231内，在第一定位槽231所在位置处，驱动轮2012能够在一定程度上起到挡水的作用。
一实施例中，请参阅图6和图8，定位部23具有围设成第一定位槽231的第一定位面232。第一定位面232的高度的变化规律为：沿导引方向，第一定位面232的高度逐渐降低再逐渐升高。如此结构形式，当清洁设备200移动至目标位置，驱动轮2012位于第一定位槽231内与第一定位面232抵接，有利于将清洁设备200稳定在目标位置。
一实施例中，定位部23的数量与驱动轮2012的数量相对应，每个驱动轮2012设置一个定位部23。
一实施例中，请参阅图6和图8，定位部23的数量为两个，清洁设备200设置有两个驱动轮2012。
一实施例中，请参阅图3，基站主体2形成有第三开口28，第三开口28与工作腔4连通。清洁设备200经导引部21从第三开口28进入工作腔4。
一实施例中，请参阅图3，挡水部22位于清洗装置1朝向第三开口28的一侧。
一实施例中，请参阅图6，基站主体2包括下基座24、上基座25以及托盘26。上基座25与下基座24连接，上基座25、下基座24以及清洗装 置1围设成工作腔4。托盘26安装于下基座24，托盘26与清洗装置1围设成污水腔3，挡水部22与导引部21均形成于托盘26。如此结构形式，当清洗装置1的水位高于导引部21的顶表面211，污水可能从污水腔3溢出进入清洗装置1与托盘26之间的间隙，由于挡水部22起到挡水的作用，进入清洗装置1与托盘26之间的间隙内的水受到挡水部22的阻挡难以越过挡水部22溢出至导引部21，清洁设备200的本体2011进入污水而致损的可能性较小。托盘26安装于下基座24并与清洗装置1围设成污水腔3，有利于将托盘26从下基座24取出以便对污水腔3进行清理。
需要解释的是，托盘26安装于下基座24，托盘26与下基座24之间是可以拆卸地。
一实施例中，清洗装置1与托盘26可拆卸连接。
一实施例中，托盘26承载清洗装置1。
一实施例中，下基座24与上基座25可拆卸地连接。如此结构形式，可以将上基座25与下基座24拆分开以便对下基座24和上基座25围设成的空间进行清理。
一实施例中，上基座25与下基座24可以一体成型。
一实施例中，请参阅图8，托盘26具有安装部261，沿导引方向，安装部261位于挡水部22背离导引部21的一侧。安装部261与清洗装置1围设成污水腔3。清洁装置1安装于安装部261内。
一实施例中，请参阅图8，导引部21具有与顶表面211连接的引导面，引导面位于顶表面211背离挡水部22一侧，沿挡水部22背离清洗装置1的方向，引导面的高度逐渐降低。
可以理解的是，注水管5有时候会向清洗装置1供热水，使工作腔4内形成水蒸汽。一实施例中，请参阅图3、图6以及图7，基站主体2形成有安装孔27，清洁基站100还包括注水管5以及套设于注水管5的密封圈， 注水管5穿设于安装孔27，注水管5配置为向清洗装置1供水，注水管5与基站主体2之间通过密封圈密封。如此结构形式，能够防止工作腔4内的水或水蒸汽通过安装孔27进入基站主体2内元器件的安装空间，避免基站主体2内的元器件进水而损坏。
一实施例中，请参阅图7，安装孔27形成于下基座24。
一实施例中，请参阅图8，托盘26还包括设置在引导面上的防滑条。
一实施例中，请参阅图3～图5，工作腔4包括容纳腔41和清洗腔。清洗装置1包括清洗装置主体11以及挡板12。挡板12沿清洗装置1的周围设置，挡板12与清洗装置主体11围设成清洗槽42以及连通清洗槽42的第一开口13和第二开口14，第一开口13和第二开口14均与容纳腔41连通，第一开口13位于清洗槽42的上方，第二开口14位于清洗槽42朝向挡水部22件的一侧。如此结构形式，当清洁件202在清洗槽42内进行清洗，挡板12能够在一定程度上将清洗槽42与基站主体2的工作腔4的内壁分隔开，防止清洁件202在清洗过程中将水溅到工作腔4的内壁并从工作腔4的内壁渗入基站主体2内元器件的安装空间，减小清洁件202清洗过程中，基站主体2渗水而受损的可能性。第二开口14便于向清洗槽42供水，清洁设备200从第一开口13移入清洗槽42。
一实施例中，请参阅图3，第三开口28与容纳腔41连通，清洁设备200通过第三开口28进入容纳腔41。
一实施例中，挡板12的高度大于或等于10mm。如此结构形式，挡板12高度的设置使得挡板12能够将清洁件202清洗过程中溅起的水基本上挡在清洗槽42内。
一实施例中，请参阅图5和图9，挡板12具有第一表面121，第一表面121位于挡板12的顶部，当清洁设备200移动到目标位置，清洁件202位于第一表面121的下方。如此结构形式，挡板12的高度足够高，使得挡 板12能够将清洁件202清洗过程中溅起的水基本上挡在清洗槽42内。
一实施例中，请参阅图6和图9，清洗装置1形成有第二定位槽15，当清洁设备200移动到目标位置，清洁设备200的从动轮位于第二定位槽15内，挡水部22抵接于本体2011的底部。如此结构形式，通过挡水部22与本体2011的底部抵接，使得挡水部22与清洁设备200的本体2011之间能够形成相对较好的密封，挡水部22能够较好的阻挡污水腔3溢出的水，降低污水腔3的水从污水腔3溢出至导引部21的可能性。
一实施例中，请参阅图6和图9，清洁设备200具有围设成第二定位槽15的第二定位面18，第二定位面18的变化规律为：沿导引方向，第二定位面18的高度逐渐减小再逐渐增大。如此结构形式，当清洁设备200从清洁基站100移出，驱动轮2012驱动清洁设备200的本体2011后移，第二定位面18会将从动轮抬起，清洁设备200的本体2011会随着从动轮一起抬起，使挡水部22与清洁设备200的本体2011脱离接触而不再抵接，避免挡水部22与清洁设备200的本体2011抵接发生摩擦而影响清洁设备200移出清洁基站100。
一实施例中，请参阅图6和图9，清洗装置1还包括与清洗装置主体11连接的承轨台16，承轨台16配置为承载清洁设备200的从动轮，从动轮在承轨台16上移动。第二定位槽15形成于承轨台16。
一实施例中，请参阅图6和图9，清洗装置主体11还形成有凸出部17，凸出部17配置为与清洁件202摩擦以便较好地对清洁件202进行清洗。
本申请提供的各个实施例/实施方式在不产生矛盾的情况下可以相互组合。
以上仅为本申请的较佳实施例而已，并不用于限制本申请，对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的保 护范围之内。
Claims (10)
- 一种清洁基站，包括：清洗装置；以及基站主体，与所述清洗装置围设成污水腔和工作腔，所述污水腔位于所述工作腔的下方，所述基站主体形成有导引部和挡水部，沿导引方向，所述导引部位于所述挡水部背离所述清洗装置的一侧，所述挡水部凸出于所述导引部的顶表面。
- 根据权利要求1所述的清洁基站，所述挡水部的形状呈长条状，所述挡水部沿所述基站主体的宽度方向延伸设置。
- 根据权利要求1所述的清洁基站，所述基站主体形成有定位部；所述挡水部的数量为多个，多个所述挡水部沿所述基站主体的宽度方向间隔设置，相邻两个所述挡水部之间设置有所述定位部，所述定位部具有第一定位槽，所述第一定位槽的最低位置低于所述挡水部的最高位置。
- 根据权利要求1所述的清洁基站，所述挡水部具有缓冲面，所述缓冲面位于所述挡水部背离所述清洗装置的一侧，沿所述挡水部背离所述清洗装置的方向，所述缓冲面的高度逐渐降低。
- 根据权利要求1～4任一项所述的清洁基站，所述基站主体包括：下基座；上基座，与所述下基座连接，所述上基座、所述下基座以及所述清洗装置围设成所述工作腔；以及托盘，安装于所述下基座，所述托盘与所述清洗装置围设成所述污水腔，所述挡水部和所述导引部均形成于所述托盘。
- 根据权利要求1～4任一项所述的清洁基站，所述工作腔包括容纳腔和清洗槽，所述清洗装置包括：清洗装置主体；以及挡板，沿所述清洗装置的周围设置，所述挡板与所述清洗装置主体围设成所述清洗槽以及连通所述清洗槽的第一开口和第二开口，所述第一开口和所述第二开口均与所述容纳腔连通，所述第一开口位于所述清洗槽的上方，所述第二开口位于所述清洗槽朝向所述挡水部件的一侧。
- 根据权利要求1～4任一项所述的清洁基站，所述基站主体形成有安装孔，所述清洁基站还包括注水管以及套设于所述注水管的密封圈，所述注水管穿设于安装孔，所述注水管配置为向所述清洗装置供水，所述注水管与所述基站主体之间通过所述密封圈密封。
- 一种清洁系统，包括：根据权利要求1～7任一项所述的清洁基站；以及清洁设备，包括相互连接的主机以及清洁件，当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述主机至少部分地位于所述导引部的上方。
- 一种清洁系统，包括：根据权利要求1～5任一项或权利要求7所述的清洁基站；以及清洁设备，包括相互连接的主机以及清洁件；其中，所述工作腔包括容纳腔和清洗槽，所述清洗装置包括清洗装置主体和挡板，所述挡板沿所述清洗装置的周围设置，所述挡板与所述清洗装置主体围设所述清洗槽以及连通所述清洗槽的第一开口和第二开口，所述第一开口和所述第二开口均与所述容纳腔连通，所述第一开口位于所述清洗槽的上方，所述第二开口位于所述清洗槽朝向所述挡水部件的一侧；当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述主机至少部分地位于所述导引部的上方，所述挡板具有第一表面，所述第一表面位于所述挡板的顶部，所述清洁件位于所述第一表面的下方。
- 一种清洁系统，包括：根据权利要求1～7任一项所述的清洁基站，所述清洗装置形成有第二定位槽；以及清洁设备，包括相互连接的主机以及清洁件，所述主机包括相互连接的本体以及从动轮，所述清洁件与所述本体连接，当所述清洁设备移动到目标位置，所述清洗装置配置为对所述清洁件进行清洗，所述本体至少部分地位于所述导引部的上方，所述从动轮位于所述第二定位槽内，所述挡水部抵接于所述本体的底部。
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| CN112497267A (zh) * | 2020-11-09 | 2021-03-16 | 深圳市杉川机器人有限公司 | 一种机器人基站 |
| CN215128075U (zh) * | 2021-04-07 | 2021-12-14 | 美智纵横科技有限责任公司 | 一种清洁基站和清洁系统 |
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| CN109394076A (zh) * | 2018-12-28 | 2019-03-01 | 云鲸智能科技（东莞）有限公司 | 基站 |
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