WO2022182110A1

WO2022182110A1 - Plate member alignment apparatus and plate member stacking system comprising same

Info

Publication number: WO2022182110A1
Application number: PCT/KR2022/002621
Authority: WO
Inventors: 이문구; 서창훈; 손병언; 양재영
Original assignee: 아주대학교산학협력단
Priority date: 2021-02-25
Filing date: 2022-02-23
Publication date: 2022-09-01
Also published as: KR102415588B1

Abstract

Provided is a plate member alignment apparatus for aligning a first plate member. The plate member alignment apparatus according to an embodiment of the present invention comprises: a first support unit having a first mounting surface on which one surface of a first plate member is mounted to face upward; a second support unit which has one surface facing the first mounting surface and is movable in a vertical direction; a plurality of first magnets arranged to be spaced apart along the circumference of the first support unit; and a plurality of second magnets arranged to be spaced apart along the circumference of the second support unit, wherein the plurality of second magnets are arranged between the plurality of first magnets as the second support unit moves toward the first support unit, and the first plate member may be aligned to be parallel to the one surface of the second support unit by the repulsive force generated between the plurality of first magnets and the plurality of second magnets, as the second support unit moves toward the first support unit.

Description

Plate member aligning device and plate member stacking system having same

The present invention relates to a plate member aligning device and a plate member stacking system having the same, and more particularly, to a plate member aligning device for aligning a first plate member and a plate for stacking the aligned first plate member on a second plate member It relates to a member lamination system.

In the semiconductor industry, the degree of integration of a semiconductor chip is an important factor determining the performance of a semiconductor. At this time, in order to improve the degree of integration of semiconductor chips, adhesion, control, and operation software technologies are comprehensively applied after precise alignment of wafers among semiconductor processing equipment.

Among these technologies, a bonding technique after precision alignment, that is, wafer level bonding, is a technique for bonding two wafers by precisely aligning them on a nanometer scale.

In general, wafer-level bonding controls the 6 degrees of freedom of the upper chuck to which the upper wafer is fixed and the lower chuck to which the lower wafer is fixed in order to align the upper and lower wafers with nanometer scale very precisely. . Therefore, even now, ultra-precision control technology that can be applied to a semiconductor process is being actively researched.

However, the conventional technology for wafer-level bonding focuses on increasing the control precision of the transfer system having each of the 6 degrees of freedom, so there is a technical limitation of precise control and a complex structural design is required, which increases the manufacturing cost. There is a limit that cannot but rise

These limitations are not only directly related to the yield and productivity of semiconductor chips in the process, but also affect marketability according to price formation.

Accordingly, in the wafer level bonding industry, there is a demand for an apparatus capable of providing high precision while simple control of the apparatus for the process.

The present invention provides a plate member aligning device capable of passively aligning a first support portion disposed on a lower side only by vertical movement of a second support portion disposed on an upper side using the repulsive force of a magnet, and a plate member stacking system having the same. There is a purpose.

Another object of the present invention is to provide a plate member aligning device capable of more precisely aligning a first support portion corresponding to a second support portion through a trapezoidal shape of a magnet, and a plate member stacking system having the same.

Another object of the present invention is to provide a plate member aligning apparatus capable of aligning the first support part by rotating it in all rotational directions by supporting the first support part at three points, and a plate member stacking system having the same.

Another object of the present invention is to provide a plate member aligning device capable of aligning a first support part by moving it in all translational motion directions by an elastic member, and a plate member stacking system having the same.

The problems of the present invention are not limited to the problems mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.

In order to solve the above problems, a plate member aligning device according to an aspect of the present invention is a plate member aligning device for aligning a first plate member, and a first seating surface on which one surface of the first plate member is seated upward. A first support having a; a second support part having a surface opposite to the first seating surface and movable in the vertical direction; a plurality of first magnets spaced apart from each other along the circumference of the first support; a plurality of second magnets spaced apart along the periphery of the second support; including, wherein the plurality of second magnets are disposed between the plurality of first magnets as the second support part moves toward the first support part, and the first plate member is configured such that the second support part moves toward the first support part. As it moves toward the first support part, a repulsive force generated between the plurality of first magnets and the plurality of second magnets may be aligned to be parallel to the one surface of the second support part.

In this case, the plurality of first magnets are formed to protrude toward the second support portion rather than the first seating surface of the first support portion, and the plurality of second magnets are formed to protrude toward the first support portion rather than the one surface of the second support portion. It may be formed to protrude.

In this case, the plurality of first magnets are arranged such that an axis extending from the N pole toward the S pole faces one circumferential direction of the first support, and the plurality of second magnets extend from the N pole toward the S pole. The axis may be disposed to face the other circumferential direction of the first support part.

In this case, the plurality of first magnets may be formed to have a cross-sectional area narrower toward the second support portion, and the plurality of second magnets may be formed to have a cross-sectional area narrower toward the first support portion.

In this case, the plurality of first magnets may be formed to have a narrow cross-sectional area in the radial direction, and the plurality of second magnets may be formed to have a cross-sectional area to become wider in the radial direction.

In this case, a side opposite to the first seating surface of the first support part may further include a mount in which the other side of the first support part is accommodated in a hemispherical shape.

At this time, at least three spherical support members disposed at predetermined intervals along the circumference so that one side supports the outer peripheral surface of the first support part opposite to the first seating surface; Further comprising, the support member may be seated in a seating groove formed on the inner circumferential surface of the mount of the other side of the mount.

At this time, the stopper for limiting the rotation angle when the first support is aligned; may further include.

In this case, the stopper may include a groove portion that protrudes in a radial direction from the outer circumferential surface of the first support portion and is formed to surround one side of the support member.

At this time, an elastic member disposed to surround the outer circumferential surface of the mount so as to be elastically deformable according to the translational motion of the mount; and a housing in which the elastic member is accommodated. may further include.

In this case, a second seating surface is formed on the one surface of the second support part on which one surface of the second plate member corresponding to the first plate member is seated downward, and the first plate member has the second support part. As it moves toward the first support part, it may be aligned parallel to the second plate member by a repulsive force generated between the plurality of first magnets and the plurality of second magnets.

On the other hand, as a plate member stacking system having a plate member aligning device according to an embodiment of the present invention, the second support portion is the second plate in a state in which the first plate member is aligned parallel to the second plate member. The second plate member may be pressed toward the first support portion so that the member is laminated on the first plate member.

The plate member aligning device and the plate member stacking system having the same according to an embodiment of the present invention passively align the first support part disposed on the lower side only by the vertical movement of the second support part disposed on the upper side using the repulsive force of a magnet. can do it

In addition, the plate member aligning device and the plate member stacking system having the same according to an embodiment of the present invention may more precisely align the first support portion to the second support portion through the trapezoidal shape of the magnet.

In addition, the plate member aligning device and the plate member stacking system having the same according to an embodiment of the present invention may align the first support portion by rotating the first support portion in all rotational directions by supporting the first support portion at three points.

In addition, the plate member aligning device and the plate member stacking system having the same according to an embodiment of the present invention may be aligned by moving the first support part in all translational directions by an elastic member.

It should be understood that the effects of the present invention are not limited to the above-described effects, and include all effects that can be inferred from the configuration of the invention described in the description or claims of the present invention.

1 is a perspective view of a plate member aligning device according to an embodiment of the present invention.

2 is an exploded perspective view of a plate member aligning device according to an embodiment of the present invention.

3 is a cross-sectional view of a mount, an elastic member, and a housing of the plate member aligning device according to an embodiment of the present invention.

4 is a view viewed from the top of the first support portion of the plate member aligning device according to an embodiment of the present invention.

5 is a view viewed from the bottom of the second support portion of the plate member aligning device according to an embodiment of the present invention.

6 is an enlarged side view of the first magnet and the second magnet of the plate member aligning device according to an embodiment of the present invention.

7 is an enlarged cross-sectional view of the first magnet and the second magnet of the plate member aligning device according to an embodiment of the present invention.

Figure 8 (a) is a view showing a state in which the support member is arranged in the center of the stopper by expanding the stopper of the plate member aligning device according to an embodiment of the present invention, Figure 8 (b) is an embodiment of the present invention It is a view showing a state in which the rotation of the first support part is restricted by expanding the stopper of the plate member aligning device according to FIG.

Figure 9 (a) is a view showing a state in which the plate member aligning device according to an embodiment of the present invention is not aligned in the rotational movement direction, Figure 9 (b) is a plate member aligning device according to an embodiment of the present invention It is a view showing a state in which the first support part is rotated and aligned.

Figure 10 (a) is a view showing a state in which the plate member aligning device according to an embodiment of the present invention is not aligned in the translational motion direction, Figure 10 (b) is a plate member aligning device according to an embodiment of the present invention It is a view showing a state in which the first support part is moved and aligned.

11 is a side view illustrating a state in which the second support part of the plate member aligning device according to an embodiment of the present invention is moved toward the first support part.

Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. The present invention may be embodied in many different forms and is not limited to the embodiments described herein. Unless otherwise defined, terms used in the embodiments of the present invention may be interpreted as meanings commonly known to those of ordinary skill in the art.

In order to clearly explain the present invention in the drawings, parts irrelevant to the description are omitted, and the same reference numerals are assigned to the same or similar components throughout the specification. Hereinafter, a direction toward the upper portion of the plate member aligning device shown in the drawings will be described as an upper direction, and a lower direction will be defined as a lower direction.

Terms such as 'first' and 'second' may be used to describe various elements, but the elements should not be limited by the above terms. The above term may be used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, a 'first component' may be termed a 'second component', and similarly, a 'second component' may also be termed a 'first component'. can

The present invention provides a plate member aligning device for precisely arranging and aligning a plate member at a reference position, and by using such a plate member aligning device to align one plate member to face the other plate member and press the two plate members to A plate member lamination system capable of laminating is provided.

In particular, as an embodiment of the present invention, the plate member aligning device may be included in a wafer stacking facility that needs to align the wafers in order to minimize the occurrence of defective products in the process of stacking a plurality of semiconductor wafers, but must be used in the stacking facility However, it can be used in various technical fields requiring alignment of the plate member.

However, for convenience of description, below, with reference to the drawings, the plate member aligning device according to an embodiment of the present invention will be described as being used in a plate member stacking system, more specifically, a wafer stacking facility.

1 is a perspective view of a plate member aligning device according to an embodiment of the present invention. 2 is an exploded perspective view of a plate member aligning device according to an embodiment of the present invention. 3 is a cross-sectional view of a mount, an elastic member, and a housing of the plate member aligning device according to an embodiment of the present invention.

As shown in FIG. 1 , the plate member aligning device 1 according to an embodiment of the present invention includes a first support portion 10 , a second support portion 30 , a mount 50 , a support member 60 , An elastic member 80 and a housing 90 are provided.

The first support portion 10 is a component for supporting the first plate member 2 . To this end, the first support portion 10 may have a hemispherical shape with a flat upper surface. A flat first seating surface 11 is formed on the upper side of the hemispherical first support portion 10 . A plate-shaped first plate member 2 is placed on the first seating surface 11, so that one surface of the first plate member is seated on the first seating surface 11 so as to face the upper side when viewed in FIG. 1 . can be

In this case, the first plate member 2 may be formed in a disk shape having a predetermined thickness, as shown in FIG. 2 . The first plate member 2 may be, for example, a semiconductor wafer or a substrate for performing a lithography process on one surface thereof.

The first plate member 2 is seated and fixed so as to be detachable from the first seating surface 11 , but there is no limitation in the fixing method. For example, a plurality of fine suction ports (not shown) are formed on the first seating surface 11 , and the lower surface of the first plate member 2 is adsorbed and fixed, or an electric field formed on the first seating surface 11 . Accordingly, the lower surface of the first plate member 2 may be electrostatically attached and fixed.

As shown in Figure 2, according to an embodiment of the present invention, the lower side of the first support portion 10 is formed in the shape of a sphere. That is, the first support portion 10 is formed in the shape of a hemisphere.

However, as shown in FIG. 2 , the lower end of the first support part 10 is partially removed depending on the position where the support member 60 to be described later is disposed, so that the first seating surface 11 and the lower end surface are incomplete in a parallel form. It may be formed in a hemispherical shape. Accordingly, it is possible to lower the manufacturing cost of the first support portion 10 and reduce the size of the plate member aligning device (1).

At this time, as shown in FIG. 2 , the lower side of the first support part 10 is accommodated in the mount 50 . The mount 50 is formed to have a hemispherical mount inner circumferential surface 51 corresponding to the spherical shape of the lower side of the first support part 10 to accommodate the first support part 10 .

Accordingly, the first support portion 10 is capable of rotational movement in all directions along the mount inner circumferential surface 51 of the mount 50 with respect to the mount 50 .

The mount 50 may be formed to have a predetermined thickness, as shown in FIG. 2 , such that the mount outer circumferential surface 55 is spaced apart from the mount inner circumferential surface 51 at regular intervals. Accordingly, the first supporting part 10 can easily perform a translational movement by the deformation of the elastic member 80, which will be described later. However, if the mount outer circumferential surface 55 is formed to correspond to the lower side of the first support portion 10 , the shape of the mount outer circumferential surface 55 is not limited.

At this time, the first support portion 10 is supported by the support member 60 to be spaced apart from the mount inner peripheral surface 51 of the mount 50 .

The support member 60 may be formed in a spherical shape as shown in FIG. 3 . At this time, at least three support members 60 are provided so that the first support part 10 can rotate in all directions along the mount inner circumferential surface 51 in a state where the first support part 10 is accommodated in the mount 50 . . However, hereinafter, for convenience of description, the three support members 60 will be described as being disposed.

The three support members 60 may be arranged circumferentially with the same spacing. For example, as shown in FIG. 2 , it may be disposed at intervals of 120 degrees on the circumference of the middle part of the lower side outer circumferential surface 13 of the first support part 10 .

Accordingly, one side of the support member 60 comes into contact with the outer peripheral surface 13 of the first support part 10 . When the first support part 10 rotates within the mount 50, the support member 60 rotates together and the first support part 10 rotates relatively with the mount 50 while being spaced apart from the mount inner circumferential surface 51. be able to

The support member 60 may be formed of a rigid material capable of withstanding the weight of the first support part 10 and the repulsive force between the plurality of first magnets 20 and the plurality of second magnets 40 to be described later. .

As shown in FIG. 3 , the other side of the support member 60 , that is, the mount inner circumferential surface 51 side is seated in the seating groove 53 formed in the mount inner circumferential surface 51 . Accordingly, the spherical support member 60 protrudes from the mount inner circumferential surface 51 only at one end that supports the first support part 10 in a state of being seated in the seating groove 53 . (See Fig. 8)

At this time, as shown in FIG. 3 , the seating groove 53 is concave so that at least half of the volume of the spherical support member 60 is disposed inside the seating groove 53 . In addition, the seating groove 53 may be formed in the same spherical shape as the support member 60 so that the support member 60 is not easily separated from the seating groove 53 . (See Fig. 8)

Since the support member 60 rotates together in a state in contact with the first support part 10 so that the first support part 10 can rotate within the mount 50 as described above, the support member 60 has a seating groove. (53) It can be easily rotated in any direction from the inside.

In a state in which the first support part 10 is inserted into the mount 50 and supported by the support member 60 , the elastic member 80 is provided to surround the mount outer circumferential surface 55 of the mount 50 .

The elastic member 80 is formed of a material that can be elastically changed and restored again so that the first support portion 10 can be translated together with the mount 50 .

The shape of the elastic member 80 is not limited, and in particular, the thickness of the elastic member 80 may be designed differently according to the range in which the first supporting part 10 can move in translation.

A housing 90 is disposed around the elastic member 80 . The housing 90 not only provides a limit to which the elastic member 80 can elastically deform, but also fixes the periphery of the elastic member 80 during the translational movement of the first support portion 10 to the first support portion. (10) to prevent unexpected movements.

The shape of the housing 90 is not limited and may be integrally formed with the frame of the wafer lamination facility.

Meanwhile, as shown in FIG. 3 , the second support part 30 is disposed on the upper side of the first support part 10 and moves in the vertical direction.

To this end, the second support 30 may be provided with a support 32 at an upper end thereof. Although not shown in the drawing, the support 32 may be connected to a member providing power to move the second support part 30 up and down, for example, a motor.

The lower surface of the second support part 30 is provided with a surface 31 opposite to the first seating surface 11, at this time, the one surface 31 is a second seating surface on which the second plate member 4 is seated ( 31) can be.

The second plate member 4 is seated and fixed to be detachable from the second seating surface 31 like the first plate member 2 , but there is no limitation in the fixing method. A description thereof will be omitted since it is the same as the above-described first seating surface 11 .

The second plate member 4 is formed to correspond to the first plate member 2 in order to be laminated on the first plate member 2 . That is, it is formed in a disk shape having a predetermined thickness, and may be a semiconductor wafer like the first plate member 2 .

Terminals electrically connected to the upper surface of the first plate member 2 and the lower surface of the second plate member 4 may be formed, and the second plate member 4 is laminated to the first plate member 2 . can be connected to each other.

4 is a view viewed from the top of the first support portion of the plate member aligning device according to an embodiment of the present invention. 5 is a view viewed from the bottom of the second support portion of the plate member aligning device according to an embodiment of the present invention. 6 is an enlarged side view of the first magnet and the second magnet of the plate member aligning device according to an embodiment of the present invention. 7 is an enlarged cross-sectional view of the first magnet and the second magnet of the plate member aligning device according to an embodiment of the present invention.

As the scale of the terminals formed on the first plate member 2 and the second plate member 4 decreases, it is necessary to precisely align the second plate member 4 to the first plate member 2 when laminating it. , For this, as shown in FIG. 3 , the plate member aligning device 1 according to an embodiment of the present invention includes a plurality of first magnets 20 and a plurality of second magnets 40 .

At this time, as shown in FIG. 5 , the plurality of first magnets 20 are spaced apart along the circumference of the first support 10 , and as shown in FIG. 6 , the plurality of second magnets 40 are It is disposed spaced apart along the periphery of the second support (30).

The number of the plurality of first magnets 20 is not limited and may be designed differently depending on the size of the first support part 10 . The number of the plurality of second magnets 40 is formed to correspond to the number of the plurality of first magnets 20 .

Accordingly, as shown in FIG. 6 , the plurality of second magnets 40 are disposed between the plurality of first magnets 20 as the second support part 30 moves to the lower side, which is the first support part 10 side. are placed

The plurality of first magnets 20 may be disposed spaced apart from each other at the same interval as shown in FIG. 4 , but there is no limitation on the location where each of the first magnets 20 is disposed. However, the plurality of second magnets 40 are disposed opposite to the arrangement of the plurality of first magnets 20 as shown in FIG. 5 in order to be disposed between the plurality of first magnets 20 .

At this time, as shown in FIG. 3 , the plurality of first magnets 20 may be formed to protrude toward the second support part rather than the first seating surface of the first support part 10 . In addition, the plurality of second magnets 40 are provided on the second seating surface 31 of the second support part 30 so that the plurality of second magnets 40 can be disposed between the plurality of first magnets 20 . It may be formed to more protrude toward the first support part 10 .

However, the plurality of first magnets 20 and the plurality of second magnets 40 are alternately arranged, and accordingly, the first plate member 2 and the second seating surface 31 seated on the first seating surface 11 . If the second plate member 4 seated on the ) can be stacked in contact with each other, the shapes of the plurality of first magnets 20 and the plurality of second magnets 40 are not limited.

On the other hand, as shown in FIG. 3 , the axis extending from the N pole toward the S pole of the plurality of first magnets 20 is directed in one direction around the first support part 10 , for example, in the counterclockwise direction in the drawing. and the plurality of second magnets 40 are arranged so that an axis extending from the N pole toward the S pole faces in a clockwise direction around the first support portion 10 .

At this time, as shown in FIG. 4 , a repulsive force is applied to each other during a process in which the plurality of second magnets 40 are disposed between the plurality of first magnets 20 .

Accordingly, the first support portion 10 is passively aligned by the repulsive force acting on the plurality of first magnets 20 while the second support portion 30 descends. That is, as shown in FIGS. 6 and 7 , the plurality of first magnets 20 and the plurality of second magnets 40 finally reach a steady state in which the forces are balanced, at this time the first support part ( The first seating surface 11 of 10) and the second seating surface 31 of the second support part 30 are aligned in parallel in the vertical direction.

Therefore, since there is no need to use a separate driving member to align the first support part 10 to the second support part 30, an error that may occur due to the technical limitation of the essential precision control required when the driving member is used is eliminated. can be reduced

Furthermore, when the repulsive force is used, the plurality of first magnets 20 and the plurality of second magnets 40 are in contact with each other because the first support part 10 is aligned to correspond to the second support part 30 in a state where they do not come into contact with each other. It is possible to reduce the error that may occur due to the impact.

Meanwhile, as shown in FIG. 6 , the plurality of first magnets 20 and the plurality of second magnets 40 have a cross-sectional area toward the upper side in order to be more precisely aligned by the repulsive force. This is formed to be narrower, and the plurality of second magnets 40 may be formed in a trapezoidal shape such that the cross-sectional area becomes narrower toward the lower side.

At this time, as shown in FIG. 6 , as one side surface of the plurality of first magnets 20 , the first surface 21 forms an angle θ1 with the first seating surface 11 of the first support part 10 and An angle θ2 between the second surface 23 and the first seating surface 11 of the first support part 10 as the other side surface of the plurality of first magnets 20 may be formed to be the same. That is, the first magnet 20 may be formed in an isosceles trapezoid when viewed from the side as shown in FIG. 4 .

In addition, an angle ( The angle θ4 between θ3 and the fourth surface 43 disposed opposite to the second surface 23 as the other side of the plurality of second magnets 40 and the second seating surface 31 is formed to be the same can be Accordingly, when the second magnet 40 is viewed from the side as shown in FIG. 4 , it may be formed in an isosceles trapezoid arranged in reverse.

At this time, the plurality of second magnets 40 have angles θ1 and θ2 formed by the first surface 21 and the second surface 23 with the first seating surface 11 so as to correspond to the plurality of first magnets 20 . ) and the angles θ3 and θ4 formed by the third surface 41 and the fourth surface 43 with the second seating surface 31 may be formed to be the same.

The first magnet 20 and the second magnet 40 are not only formed in the shape of an isosceles trapezoid when viewed from the side as shown in FIG. 6, but also have an isosceles trapezoid when viewed from the top as shown in FIG. may be formed in the shape of

In more detail, as shown in FIG. 7 , the plurality of first magnets 20 are formed to have a narrower cross-sectional area in the radial direction from the center O1 of the first support part 10 . That is, the angle θ5 between the first surface 21 and the line extending from the center O1 of the first seating surface 11 and the center O1 of the second surface 23 and the first seating surface 11 The angle θ6 between the lines extending from ) is formed equally.

In addition, as shown in FIG. 7 , the plurality of second magnets 40 are formed to have a larger cross-sectional area in the radial direction from the center O2 of the second support part 30 . That is, the angle θ7 between the line extending from the center O2 of the second seating surface 31 to the third surface 41 disposed opposite to the first surface 21 and the second surface 23 and An angle θ8 between lines extending from the center O2 of the second seating surface 31 to the fourth surface 43 disposed opposite to each other may be formed to be the same.

By forming the first magnet 20 and the second magnet 40 to correspond to each other as above, the plurality of first magnets 20 and the plurality of second magnets 40 are brought closer to each other, and even if the repulsive force acts, the first support part ( 10) can reach the force equilibrium state more stably and quickly. In addition, the first seating surface 11 and the second seating surface 31 may be more precisely aligned in a state in which the second support part 30 moves toward the first support part 10 as much as possible.

On the other hand, the plurality of first magnets 20 are the first support portion 10 to more precisely align the first plate member 2 seated on the first seating surface 11 to face the second support portion 30 . It may be coupled to be rotatable in the circumferential direction from the side of the. At this time, although not shown in the drawings, the plurality of first magnets 20 may be rotated by a precisely controlled motor.

Accordingly, by rotating and adjusting the plurality of first magnets 20 according to the direction in which the reference point of the first plate member 2 faces, the first plate member 2 maintains the direction desired by the user, and the second support part (30) can be aligned.

Conversely, in order to more precisely align the first plate member 2 seated on the first seating surface 11 with the plurality of second magnets 40 to face the second support 30 , the second support part 30 . It may be coupled to be rotatable in the circumferential direction from the side of the. However, the description thereof overlaps with the description of the plurality of first magnets 20, and thus will be omitted below.

As shown in FIGS. 8 (a) and (b), the plate member aligning apparatus 1 according to an embodiment of the present invention may further include a stopper 70 .

The stopper 70 limits the rotation angle of the first support 10 . Accordingly, it is impossible to rotate the first support part 10 at a relatively constant angle or more with respect to the mount 50 in a state supported by the support member 60 .

To explain this in more detail, the stopper 70 allows the second support part 30 to freely move in a clockwise or counterclockwise direction inside the mount 50 as the second support part 30 descends toward the first support part 10 . By preventing rotation, an attractive force acts between the first magnet 20 and the second magnet 40 to prevent coupling.

To this end, the stopper 70 is formed to protrude in the radial direction from the outer peripheral surface 13 of the first support portion 10, as shown in FIG. 8 (a). At this time, the stopper 70 is formed to correspond to the positions of the three support members 60 , respectively. However, if more than three support members 60 are provided, as the number of support members 60 increases, the number of stoppers 70 corresponding thereto is also formed, and at positions where the support members 60 are disposed, respectively. formed to correspond.

The stopper 70 protrudes in the shape of a column. At this time, it may be formed in a cylindrical shape as shown in FIG. 3, but is not limited thereto.

A concave groove 71 is formed on the end surface of the stopper 70 in the protruding direction. The shape of the groove portion 71 may be formed in a spherical end shape, but if the movement of the support member 60 can be restricted, the shape is not limited. However, hereinafter, for convenience of description, the groove portion 71 is defined as being formed in the shape of the end of the sphere.

As shown in FIG. 8 ( a ), one side of the support member 60 is seated in the groove portion 71 . At this time, the groove portion 71 may be formed to have an inner diameter of the groove portion 71 larger than the diameter of the support member 60 so that one side of the spherical support member 60 can move inside the groove portion 71 .

As shown in FIG. 8 (b), as the stopper 70 is provided, when the first support part 10 rotates in a specific direction inside the mount 50, the support member 60 is a groove part of the stopper 70. (71) It moves from the inner center to the edge. At this time, the support member 60 cannot leave the groove part 71, so the angle at which the first support part 10 can rotate is limited.

Hereinafter, the operation of the plate member aligning device according to an embodiment of the present invention will be described in detail with reference to FIGS. 9 to 11 . At this time, Figure 9 (a) is a view showing a state in which the plate member aligning device according to an embodiment of the present invention is not aligned in the rotational movement direction, Figure 9 (b) is a plate according to an embodiment of the present invention It is a view showing a state in which the first support part of the member aligning device is rotated and aligned. Figure 10 (a) is a view showing a state in which the plate member aligning device according to an embodiment of the present invention is not aligned in the translational motion direction, Figure 10 (b) is a plate member aligning device according to an embodiment of the present invention It is a view showing a state in which the first support part is moved and aligned. 11 is a side view illustrating a state in which the second support part of the plate member aligning device according to an embodiment of the present invention is moved toward the first support part.

The first plate member 2 is seated on the first seating surface 11 of the first support part 10 and the second plate member 4 is seated on the second seating surface 31 of the second support part 30 . When the second support part 30 is sufficiently spaced apart from the first support part 10 in the state, the central axis C1 of the first support part 10 is the second support part 30 as shown in FIG. 9 (a). It may form a predetermined angle with the central axis (C2) of.

At this time, when the second support part 30 descends toward the first support part 10 , the plurality of first magnets 20 and the plurality of second magnets 40 are alternately disposed and receive a repulsive force. Accordingly, as shown in FIG. 9 (b), the first support part 10 is rotated in a state supported by the support member 60 in the mount 50 to correspond to the second support part 30, The central axis C1 of the first support part 10 and the central axis C2 of the second support part 30 coincide with each other.

On the other hand, the first plate member 2 is seated on the first seating surface 11 of the first support part 10 and the second plate member 4 is seated on the second seating surface 31 of the second support part 30 . When the second support part 30 is sufficiently spaced apart from the first support part 10 in the seated state, the central axis C1 of the first support part 10 and the second support part 30 as shown in FIG. ) may not coincide with the central axis C2 being parallel.

At this time, when the second support part 30 descends toward the first support part 10, the plurality of first magnets 20 and the plurality of second magnets 40 are alternately disposed with each other and receive a repulsive force, and thus Accordingly, as shown in FIG. 10 (b), the first support part 10 moves to correspond to the second support part 30 together with the mount 50 while the elastic member 80 surrounding the mount 50 is deformed. . Accordingly, the central axis C1 of the first support part 10 and the central axis C2 of the second support part 30 coincide with each other in a state where the first support part 10 is biased to one side.

The situation in which the central axis C1 of the first support part 10 and the central axis C2 of the second support part 30 do not coincide with each other may occur together, rather than appearing separately. As a result, as the second support part 30 approaches the first support part 10 , the first support part 10 rotates or moves by the repulsive force of the magnet and is aligned to correspond to the second support part 30 .

At this time, the descending speed of the second support part 30 may be adjusted so that the first support part 10 can continuously maintain a normal state while the second support part 30 descends.

As shown in FIG. 11 , when the second support part 30 sufficiently descends toward the first support part 10 , the upper surface of the first plate member 2 and the lower surface of the second plate member 4 come into contact with each other. The first surface 21 and the second surface 23 of the first magnet 20 are arranged to be spaced apart from each other at a fine distance on the third surface 41 and the fourth surface 43 of the second magnet 40 , respectively. .

At this time, the plate member stacking system having the plate member aligning device according to an embodiment of the present invention presses the second support part 30 toward the first support part 10 and the first plate member 2 and the second plate The members 4 can be laminated.

The types of the first plate member 2 and the second plate member 4 are not limited as long as they need to be precisely aligned and stacked. In particular, since the plate member aligning apparatus according to an embodiment of the present invention can be used as an apparatus for manufacturing a three-dimensional integrated circuit, the first plate member 2 and the second plate member 4 are formed into a three-dimensional integrated circuit. It can be used in the manufacturing process.

As an example, the first plate member 2 and the second plate member 4 may be wafers for manufacturing a three-dimensional integrated circuit. The first plate member 2 and the second plate member 4 may be wafers for a wafer-to-wafer method.

As another example, the first plate member 2 and the second plate member 4 may be wafers for a chip-to-wafer method. That is, the second plate member 4 is laminated to the first plate member 2 with a plurality of chips fixed to the lower surface as a carrier wiper and then removed, so that the plurality of chips is ultimately stacked on the first plate member 2 . can become

As another example, the first plate member 2 and the second plate member 4 may be wafers for a chip-to-chip method. That is, both the first plate member 2 and the second plate member 4 may be used as the carrier wiper. The first plate member 2 and the second plate member 4 with a plurality of lower chips fixed to the upper surface of the first plate member 2 and the plurality of upper chips fixed to the lower surface of the second plate member 4 ) are stacked. Accordingly, by removing the first plate member 2 and the second plate member 4 after the upper chip and the lower chip are stacked, a chip having a three-dimensional integrated circuit can be manufactured.

Meanwhile, the plate member stacking system having the plate member aligning device according to an embodiment of the present invention further includes a heating member (not shown) for laminating the first plate member 2 and the second plate member 4 . can do. The heating member (not shown) may be integrally formed with the first support part 10 and the second support part 30 .

However, as an embodiment of the present invention, the plate member aligning device and the plate member stacking system having the same are not included only in the wafer stacking equipment, but can be used in a lithography process that needs to align the plate members. It will be clearly understood by those of ordinary skill in the art.

As described above, preferred embodiments according to the present invention have been described, and the fact that the present invention can be embodied in other specific forms without departing from the spirit or scope of the present invention in addition to the above-described embodiments is a fact having ordinary skill in the art. It is obvious to them. Therefore, the above-described embodiments are to be regarded as illustrative rather than restrictive, and accordingly, the present invention is not limited to the above description, but may be modified within the scope of the appended claims and their equivalents.

Claims

A plate member aligning device for aligning a first plate member, comprising:

a first support part having a first seating surface on which one surface of the first plate member is seated upward;

a second support part having a surface opposite to the first seating surface and movable in the vertical direction;

a plurality of first magnets spaced apart from each other along the circumference of the first support;

a plurality of second magnets spaced apart along the periphery of the second support; including,

The plurality of second magnets are disposed between the plurality of first magnets as the second support portion moves toward the first support portion,

The first plate member is aligned to be parallel to the one surface of the second support part by a repulsive force generated between the plurality of first magnets and the plurality of second magnets as the second support part moves toward the first support part. A plate member alignment device.
The method of claim 1,

The plurality of first magnets are formed to protrude toward the second support portion rather than the first seating surface of the first support portion,

The plurality of second magnets are formed to protrude toward the first support portion rather than the one surface of the second support portion.
The method of claim 1,

The plurality of first magnets are arranged such that an axis extending from the N pole toward the S pole faces one circumferential direction of the first support,

The plurality of second magnets are arranged such that an axis extending from the N pole toward the S pole faces the other circumferential direction of the first support portion.
The method of claim 1,

The plurality of first magnets are formed to have a narrow cross-sectional area toward the second support part,

The plurality of second magnets are formed such that a cross-sectional area becomes narrower toward the first support part.
The method of claim 1,

The plurality of first magnets are formed to have a narrow cross-sectional area in a radial direction,

The plurality of second magnets are formed to have a larger cross-sectional area in a radial direction, a plate member aligning device.
The method of claim 1,

The opposite side of the first seating surface of the first support part is formed in a hemispherical shape,

The plate member alignment device further comprising a mount in which the other side of the first support part is accommodated.
7. The method of claim 6,

at least three spherical support members arranged at predetermined intervals along the circumference so that one side of the first support part supports an outer peripheral surface of the first support part opposite to the first seating surface; further comprising,

The other side of the support member is seated in a seating groove formed on the inner circumferential surface of the mount of the mount, the plate member alignment device.
7. The method of claim 6,

a stopper for limiting a rotation angle when the first support part is aligned; Further comprising a, plate member alignment device.
9. The method of claim 8,

The stopper is provided with a groove portion that protrudes in a radial direction from the outer peripheral surface of the first support portion and is formed to surround one side of the support member, the plate member aligning device.
7. The method of claim 6,

an elastic member disposed to surround the outer circumferential surface of the mount so as to be elastically deformable according to the translational motion of the mount; and

a housing in which the elastic member is accommodated; Further comprising a, plate member alignment device.
11. The method according to any one of claims 1 to 10,

A second seating surface on which one surface of a second plate member corresponding to the first plate member is seated downward is formed on the one surface of the second support part,

The first plate member is aligned parallel to the second plate member by a repulsive force generated between the plurality of first magnets and the plurality of second magnets as the second support part moves toward the first support part, plate member alignment device.
A plate member stacking system comprising the plate member aligning device according to claim 11, comprising:

The second support part presses the second plate member toward the first support part so that the second plate member is laminated on the first plate member in a state in which the first plate member is aligned parallel to the second plate member , plate member lamination system.