WO2022160146A1 - 掩膜版及其制备方法、掩膜版组件 - Google Patents

掩膜版及其制备方法、掩膜版组件 Download PDF

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Publication number
WO2022160146A1
WO2022160146A1 PCT/CN2021/074045 CN2021074045W WO2022160146A1 WO 2022160146 A1 WO2022160146 A1 WO 2022160146A1 CN 2021074045 W CN2021074045 W CN 2021074045W WO 2022160146 A1 WO2022160146 A1 WO 2022160146A1
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WO
WIPO (PCT)
Prior art keywords
welding
area
display area
wrinkle
opening
Prior art date
Application number
PCT/CN2021/074045
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English (en)
French (fr)
Inventor
毕娜
Original Assignee
京东方科技集团股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US17/608,159 priority Critical patent/US20230255055A1/en
Priority to PCT/CN2021/074045 priority patent/WO2022160146A1/zh
Priority to CN202180000080.9A priority patent/CN115398026B/zh
Publication of WO2022160146A1 publication Critical patent/WO2022160146A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present disclosure relates to, but is not limited to, the field of display technology, and more particularly, to a mask, a method for preparing the same, and a mask assembly.
  • the precision metal mask plays an important role, especially in the production process of the OLED display panel, which directly determines whether the organic light-emitting material can be accurately evaporated on the corresponding OLED substrate.
  • the red, green and blue light-emitting materials are evaporated onto the corresponding positions of the substrate by using a fine metal mask (Fine Metal Mask, FMM).
  • FMM Fine Metal Mask
  • the traditional metal mask manufacturing process adopts wet etching to make pixel openings on the metal sheet.
  • the isotropic nature of wet etching makes it difficult to precisely control the width of the pixel opening, and at the same time, due to the limitation of the thickness of the metal sheet, this method is difficult to realize the fabrication of high-resolution metal masks.
  • QHD Quadrater High Definition
  • PPI Planar High Definition
  • Electroforming fine metal mask (Electroforming Mask, EFM) is made by depositing a metal thin film on a metal electrode using an electroplating process, and forming a pixel pattern on the plated film. Compared with the current etching method, the fine metal mask prepared by electroforming can be made thinner and can achieve UHD (Ultra High Definition) (3840 ⁇ 2160) resolution.
  • UHD Ultra High Definition
  • the fine metal mask formed by electroforming is too thin, only a few microns to tens of microns thick, in the process of laser welding to the metal frame, it is easy to weld through the metal frame of the fine metal mask, reducing the good quality Rate.
  • a mask includes a display area and welding areas located on opposite sides in a first direction of the display area, the welding area at least includes a thickened part, and a set welding area is arranged on the thickened part, and the welding area is The thickness of the welding area is set to be greater than the thickness of the display area, and in the horizontal direction of the display area, the thickened portion protrudes from the surface of at least one side of the display area.
  • a portion of the thickened portion protruding from the surface of the display area includes a first welding surface parallel to the surface of the display area and a first welding surface parallel to the surface of the display area.
  • the first welding surface is connected to a second welding surface on one side of the display area, and the second welding surface includes a plurality of protruding parts and recessed parts arranged at intervals.
  • the protruding portion and/or the concave portion is in the shape of a sharp angle, a semi-circular arc or a U shape.
  • the inner angle formed between the second welding surface and the surface of the display area is greater than 90 degrees and less than 180 degrees.
  • the set area of the welding zone is 10-50 times the area of the welding spot required for welding of the welding zone.
  • the set welding areas are arranged along the second direction of the thickened portion to form a set welding area row, and the set welding areas adjacent to the set welding area row are staggered. , the first direction is different from the second direction.
  • first anti-wrinkle openings are provided between adjacent set welding areas in the set welding area column.
  • the curvature of the edge of the first anti-wrinkle opening on the side of the set welding area and the edge of the set welding area on the side of the first anti-wrinkle opening is the same.
  • the display area includes a pixel opening area and a transition area, the transition area is located on a side of the pixel opening area close to the welding area, and a second anti-wrinkle area is provided on the transition area hole.
  • the pixel opening area is provided with pixel openings, and the second anti-wrinkle openings are the same as the pixel openings.
  • the thickened part is provided with a third anti-wrinkle opening, and the third anti-wrinkle opening is located on the side of the thickened part close to the display area.
  • the thickened portion is provided with a plurality of the third anti-wrinkle openings, and the third anti-wrinkle openings are arranged along the first direction of the display area to form a third anti-wrinkle hole Row of wrinkled holes.
  • the size of the third anti-wrinkle openings in the third row of anti-wrinkle openings gradually decreases along a direction close to the display area; and/or, the third anti-wrinkle openings
  • the spacing between adjacent third anti-wrinkle openings in the hole row gradually decreases along a direction close to the display area.
  • the thickened portion is provided with a plurality of the third anti-wrinkle openings, and the size of the third anti-wrinkle openings gradually decreases along a direction close to the display area; and /or, the spacing between adjacent third anti-wrinkle openings gradually decreases along a direction close to the display area.
  • the thickened portion in the thickness direction of the thickened portion, includes a first electroformed layer and a second electroformed layer that are superimposed and arranged, and the second electroformed layer at least partially protrudes from the thickened portion. the display area.
  • the thickness of the first electroformed layer is 5 to 30 um, and the thickness of the second electroformed layer is 2 to 30 um.
  • a reticle assembly includes a frame and the above-mentioned reticle, and a welding area of the reticle is connected to the frame by welding.
  • a method for preparing a mask comprising:
  • a display area is formed and a welding area is formed on opposite sides of the first direction of the display area, the welding area at least includes a thickened part, and a set welding area is arranged on the thickened part, and the thickness of the set welding area is Greater than the thickness of the display area, in the horizontal direction of the display area, the thickened portion protrudes from the surface of at least one side of the display area.
  • FIG. 1 is a schematic structural diagram of a mask according to an exemplary embodiment of the present disclosure
  • Fig. 2 is the sectional view of A-A' direction in Fig. 1;
  • Fig. 3 is the enlarged view of a place in Fig. 1;
  • FIG. 4 is a schematic structural diagram of a mask according to an exemplary embodiment of the present disclosure.
  • Fig. 5 is the sectional view of B-B' direction in Fig. 4;
  • Fig. 6 is an enlarged view at b in Fig. 4;
  • FIG. 7 is a first structural schematic diagram of a second welding surface in an exemplary embodiment of the present disclosure.
  • FIG. 8 is a second structural schematic diagram of a second welding surface in an exemplary embodiment of the present disclosure.
  • FIG. 9 is a third structural schematic diagram of a second welding surface in an exemplary embodiment of the present disclosure.
  • FIG. 10 is a fourth structural schematic diagram of the second welding surface in an exemplary embodiment of the present disclosure.
  • FIG. 11 is a first structural schematic diagram of the second anti-wrinkle opening and the third anti-wrinkle opening in an exemplary embodiment of the present disclosure
  • FIG. 12 is a second structural schematic diagram of the second anti-wrinkle opening and the third anti-wrinkle opening in an exemplary embodiment of the present disclosure
  • FIG. 13 is a third structural schematic diagram of the second anti-wrinkle opening and the third anti-wrinkle opening in an exemplary embodiment of the present disclosure
  • FIG. 14 is a schematic diagram after forming a first photoresist in an exemplary embodiment of the disclosure.
  • FIG. 15 is a schematic diagram after forming a first photoresist portion and a second photoresist portion in an exemplary embodiment of the disclosure
  • FIG. 16 is a schematic diagram after forming a first electroformed film in an exemplary embodiment of the disclosure.
  • 17 is a schematic diagram after forming a second photoresist in an exemplary embodiment of the disclosure.
  • FIG. 18 is a schematic diagram after forming a second electroformed film in an exemplary embodiment of the disclosure.
  • FIG. 19 is a schematic diagram of simulation of reticle web wrinkles according to an exemplary embodiment of the present disclosure.
  • the terms “installed”, “connected” and “connected” should be construed broadly unless otherwise expressly specified and limited. For example, it may be a fixed connection, or a detachable connection, or an integral connection; it may be a mechanical connection, or an electrical connection; it may be a direct connection, or an indirect connection through an intermediate piece, or an internal communication between two elements.
  • installed may be a fixed connection, or a detachable connection, or an integral connection; it may be a mechanical connection, or an electrical connection; it may be a direct connection, or an indirect connection through an intermediate piece, or an internal communication between two elements.
  • parallel refers to a state where the angle formed by two straight lines is -10° or more and 10° or less, and therefore, also includes a state where the angle is -5° or more and 5° or less.
  • perpendicular refers to a state in which the angle formed by two straight lines is 80° or more and 100° or less, and therefore includes a state in which an angle of 85° or more and 95° or less is included.
  • Fig. 1 is a schematic structural diagram of a mask according to an exemplary embodiment of the disclosure
  • Fig. 2 is a cross-sectional view in the direction of A-A' in Fig. 1
  • Fig. 3 is an enlarged view at a in Fig. 1 .
  • the mask according to the embodiment of the present disclosure includes a display area 1 and welding areas 2 located on opposite sides of the display area 1 in the first direction.
  • the thick part 21 is provided with a set welding area 5.
  • the thickness of the welding area 5 is set to be greater than the thickness of the display area 1.
  • the thickened part 21 protrudes from the surface of at least one side of the display area 1, and also That is to say, in the thickness direction of the display area 1, the surface of at least one side of the thickened portion 21 is higher than the surface of at least one side of the display area 1, and the surface of at least one side of the thickened portion 21 is the same as the surface of at least one side of the display area 1.
  • the surface is on the same side.
  • the first direction may be the length direction of the display area.
  • the welding area 5 is set as the area where the welding area 2 and the frame are welded, the welding area 5 is set as the reserved area near the welding point, and the welding area 5 is not set to be opened. During welding, it is assumed that a part of the welding area 5 is melted and adhered to the frame. According to the welding precision of the welding equipment and the size parameters of the welding spot, the area of the welding zone 5 is preset.
  • the molten part of the welding zone is set to be approximately circular, and the boundary of the welding zone is set to be approximately circular, but it is not limited to a circle, and other shapes can also be used, such as regular or irregular shapes such as rectangles and diamonds. .
  • the mask is a mask used in the evaporation process of organic light-emitting materials.
  • the display area 1 is provided with a plurality of pixel openings. In the process of preparing the OLED display panel, the display area 1 is used for evaporation of organic light-emitting materials. , to form the red R, green G, and blue B pixels of the OLED display panel.
  • the mask plate needs to be subjected to a netting process to remove the mask plate.
  • the membrane plate is stretched and welded to the frame (English Frame) to assemble into a mask plate assembly.
  • the inventor's research found that the thickness of the electroforming fine metal mask (EFM) is too thin, only a few microns to tens of microns. In the process of stretching the mask and welding it to the frame, it is easy to There is a situation where the frame is welded through, reducing the yield.
  • EFM electroforming fine metal mask
  • the present disclosure forms a thickened portion 21 by thickening the welding area 2 , and sets the predetermined welding area 5 on the thickened portion 21 , so that the thickness of the predetermined welding area is greater than that of the display area, so as to ensure the Under the condition that the thickness of the display area 1 is unchanged, it is avoided that the welding area 2 is too thin, which leads to the occurrence of the frame welding through, the yield is improved, and the welding firmness of the welding area 2 is enhanced.
  • the welding area may be all thickened portions, or may be partially thickened portions.
  • the thickened part may be located on the side of the welding area close to the display area.
  • the thickened portion 21 includes a first electroforming layer 201 and a second electroforming layer 202 that are superimposed.
  • the second electroformed layer 202 In the horizontal direction of the display area 1 , the second electroformed layer 202 at least partially protrudes from the surface of one side of the display area 1 .
  • the second electroforming layer 202 is provided with a predetermined welding area 5 .
  • the welding area is thickened by the second electroforming layer 202 , so as to prevent the welding area 2 from being too thin, which may cause the frame to be welded through, and enhance the welding firmness of the welding area 2 .
  • the first electroformed layer 201 and the second electroformed layer 202 are combined to form the thickened portion 21 .
  • the thickness of the first electroforming layer 201 may be 5 to 30 um, and the thickness of the second electroforming layer 202 may be 2 to 30 um.
  • the thickened portion may include two or more electroformed layers superimposed on each other.
  • the thickened portion may include three, four or five electroformed layers, which will not be described herein again.
  • the first electroforming layer 201 and the display area 1 are prepared by the same electroforming process using the same material. First, the first electroforming film is formed through the first electroforming process, and then, the second electroforming film is formed on the first electroforming layer 201 in the welding area through the second electroforming process, and finally, the first electroforming film is formed.
  • the cast film forms the display area 1 and the first electroformed layer 201 respectively; the second electroformed film forms the second electroformed layer 202 .
  • the welding area 2 is prone to wrinkles 20, and the wrinkles 20 is passed to the pixel opening in display area 1, as shown in Figure 19.
  • the folds of the mesh will reduce the accuracy of the deposition pixel position, increase the shadow of the deposition, and even have the risk of color mixing.
  • FIG. 4 is a schematic structural diagram of a mask according to an exemplary embodiment of the present disclosure
  • FIG. 5 is a cross-sectional view in the direction B-B' in FIG. 4
  • FIG. 6 is an enlarged view at b in FIG. 4 .
  • the part of the thickened portion 21 protruding from the surface of the display area 1 includes the same distance from the surface of the display area 1 .
  • the parallel first welding surface 3 and the second welding surface 4 located on the side of the first welding surface 3 close to the display area 1 .
  • the second welding surface 4 includes a plurality of protruding parts 401 and concave parts 402 arranged at intervals.
  • the protruding parts 401 and the concave parts 402 make the second welding surface 4 form a wave shape, which can effectively evenly spread the mask,
  • the stress distribution of the plate reduces the risk of wrinkling in the welding area 2, thereby reducing the risk of false welding in the welding area 2 and the risk of reducing the accuracy of the mesh.
  • the thickened portion 21 is connected to the display area 1 .
  • the second welding surface 4 connects the first welding surface 3 to the display area 1 , that is, one end of the second welding surface 4 is connected to the second welding surface 4 , and the other end of the second welding surface 4 is connected to the display area 1 .
  • the second welding surface 4 forms a thickness boundary between the thickened portion 21 and the display area 1 .
  • the inner angle formed between the second welding surface 4 and the surface of the display area 1 is greater than 90 degrees and less than 180 degrees, that is, the second welding surface 4 and the display area 1 are inclined to form an obtuse angle, thereby avoiding the welding process of the welding area 2.
  • the resulting wrinkles affect the pixel openings in display area 1 .
  • the welding area may include a thickened portion and a transition portion connecting the thickened portion with the display area, and the second welding surface connects the first welding surface with the transition portion of the welding area.
  • FIG. 7 is a first structural schematic diagram of a second welding surface in an exemplary embodiment of the present disclosure
  • FIG. 8 is a second structural schematic diagram of a second welding surface in an exemplary embodiment of the present disclosure
  • FIG. 9 is a second structural schematic diagram in an exemplary embodiment of the present disclosure Schematic diagram 3 of the structure of the welding surface
  • FIG. 10 is a schematic diagram 4 of the structure of the second welding surface in an exemplary embodiment of the present disclosure.
  • the protrusions 401 and/or the recesses 402 may be of various shapes.
  • the protruding portion 401 and the recessed portion 402 are both sharp-angled, and the bending directions of the protruding portion 401 and the recessed portion 402 are opposite, as shown in FIG.
  • both the protruding portion 401 and the recessed portion 402 are semi-circular arc shapes, and the bending directions of the protruding portion 401 and the recessed portion 402 are opposite, as shown in FIG. 7 .
  • both the protruding portion 401 and the recessed portion 402 are U-shaped, and the bending directions of the protruding portion 401 and the recessed portion 402 are opposite, as shown in FIG. 8 .
  • the protruding portion 401 includes a first bent edge and a second bent edge disposed opposite to each other, and a straight edge connecting the first bent edge and the second bent edge.
  • the recessed portion 402 includes a first straight side and a second straight side disposed opposite to each other, and a V-shaped side connecting the first straight side and the second straight side, as shown in FIG. 9 .
  • the protruding portion 401 includes a first curved side and a second curved side disposed opposite to each other, and a straight side connecting the first curved side and the second curved side.
  • the recessed portion 402 includes a first straight side and a second straight side disposed opposite to each other, and a circular arc side connecting the first straight side and the second straight side, as shown in FIG. 10 .
  • a predetermined welding area 5 is provided on the first welding surface 3 .
  • the welding area 5 is set as the area where the thickened portion 21 is welded with the frame.
  • the welding points required for welding in the welding zone 2 are located in the set welding zone 5.
  • the welding area 5 can be set to have various shapes, for example, the welding area 5 is set to be a regular shape or an irregular shape such as a circle, a rectangle, and a rhombus.
  • the welding area 5 is set to be circular, the welding spot required for welding in the welding area 2 is circular, and the area of the welding area 5 is set to be 10 to 50 times the area of the welding spot required for welding in the welding area. , so that the welding area 2 reserves enough space for the welding point, so as to avoid the diffusion of the area of the welding area 2 from the melting of the welding point, which affects the area other than the welding area 5.
  • the set welding areas 5 are arranged along the second direction of the thickened portion 21 to form a set welding area column, and the set welding areas 5 in the adjacent set welding area columns are staggered to avoid adjacent ones.
  • the set pad 5 in the set pad column affects each other when welding.
  • the first direction is different from the second direction.
  • the second direction may be the width direction of the display area.
  • a first anti-wrinkle opening 6 is provided between the adjacent set welding areas 5 in the set welding area row.
  • the first anti-wrinkling opening 6 Warpage or shrinkage deformation that occurs during the molten formation of point metal.
  • the first anti-wrinkle openings may have various shapes, for example, the first anti-wrinkle openings may be regular or irregular shapes such as circle, rectangle, diamond, ellipse, and the like.
  • the welding area is set to be circular, and the edge of the first anti-wrinkle opening close to the set welding area has the same curvature as the edge of the set welding area close to the first anti-wrinkle opening, so that Reduce the warpage or shrinkage deformation of the welding point metal during the welding of the welding area.
  • the display area 1 includes a pixel opening area 101 and a transition area 102.
  • the transition area 102 is located on the side of the pixel opening area 101 close to the welding area 2.
  • the transition area 102 is provided with a second anti-wrinkle opening 7.
  • the second anti-wrinkle opening 7 is used to prevent the wrinkle generated during welding of the welding area 2 from being transmitted to the pixel opening area 101, thereby affecting the opening precision of the pixel opening area.
  • the transition area 102 is provided with a plurality of second anti-wrinkle openings 7 , and the size, shape and/or density of the second anti-wrinkle openings 7 are the same as the size of the pixel openings in the pixel opening area 101 , Same shape and/or density.
  • the size, shape and/or density of the second anti-wrinkle apertures may also be different from the size, shape and/or density of the pixel apertures in the pixel aperture area.
  • the display area 1 is connected to the thickened portion 21 , and the transition area 102 connects the pixel opening area 101 with the second welding surface 4 , that is, one end of the transition area 102 is connected to the pixel opening area 101 , and the transition area 102 The other end is connected to the second welding surface 4 .
  • the first welding surface 3 is provided with a third anti-wrinkle opening 8 , and the third anti-wrinkle opening 8 is located on the side of the first welding surface 3 close to the second welding surface 4 .
  • the third anti-wrinkle opening 8 is used to prevent the wrinkle generated during the welding of the welding area 2 from being transmitted to the pixel opening area 101, thereby affecting the opening precision of the pixel opening area.
  • the size of the third anti-wrinkle apertures 8 in the third row of anti-wrinkle apertures gradually decreases along a direction close to the display area 1; and/or, the size of the third anti-wrinkle apertures
  • the spacing between the adjacent third anti-wrinkle openings 8 is gradually reduced along the direction close to the display area 1, so as to avoid wrinkles generated during welding of the welding area 2 from affecting the opening precision of the pixel opening area.
  • the size, shape and/or density of the third anti-wrinkle apertures are the same as the size, shape and/or density of the pixel apertures in the pixel aperture area.
  • FIG. 11 is a first structural schematic diagram of the second wrinkle-proof opening and the third wrinkle-proof opening in an exemplary embodiment of the disclosure
  • FIG. 12 is the second wrinkle-proof opening and the third wrinkle-proof opening in an exemplary embodiment of the disclosure.
  • the second structure diagram of the hole is the third structure diagram of the second wrinkle-proof opening and the third wrinkle-proof opening in an exemplary embodiment of the present disclosure.
  • the second anti-crease apertures 7 and the third anti-crease apertures 8 may take various shapes.
  • the second anti-wrinkle hole 7 and the third anti-wrinkle hole 8 are diamond-shaped, as shown in FIG. 11 .
  • the second anti-wrinkle openings 7 and the third anti-wrinkle openings 8 are elliptical, as shown in FIG. 12 .
  • the second anti-wrinkle openings 7 and the third anti-wrinkle openings 8 are rectangular, as shown in FIG. 13 .
  • the method for preparing a mask according to an exemplary embodiment of the present disclosure includes:
  • a photoresist portion is left in the conductive substrate 10 where the hole needs to be opened.
  • the first photoresist portion 12 is left in the display area 1
  • the second photoresist portion 13 is left in the welding area 2 .
  • the height of the photoresist portion is adjusted so that the height of the second photoresist portion 13 is greater than the height of the first photoresist portion 12 , as shown in FIG. 15 .
  • the conductive substrate 10 having the above structure is placed in the electroforming solution, the conductive substrate 10 is used as the electroforming cathode, and the electroforming material is used as the electroforming anode, and the conductive substrate 10 is subjected to a certain temperature and current density. After electroforming, the electroforming material forms a first electroforming film 14 on the conductive substrate 10 , as shown in FIG. 16 .
  • the electroforming material can be iron, nickel, cobalt and other metals.
  • the conductive substrate 10 having the above structure is placed in the electroforming solution, the conductive substrate 10 is used as the electroforming cathode, and the electroforming material is used as the electroforming anode, and the conductive substrate 10 is subjected to a certain temperature and current density.
  • the electroforming is performed to form the second electroforming thin film 16 on the first electroforming thin film 14 .
  • the cross section of the second electroformed film 16 is a positive trapezoid, which is complementary to the inverted trapezoidal cross-section of the second photoresist 15 .
  • the outer angle formed between the surfaces of the cast film 14 on the side away from the conductive substrate 10 may be 45-70°.
  • the surface of the second electroformed film 16 on the side away from the conductive substrate 10 is flush with the surface of the second photoresist 15 on the side away from the conductive substrate 10 , as shown in FIG. 18 .
  • the conductive substrate 10 having the above structure is taken out from the electroforming solution, and after cleaning, the first photoresist portion 12 is removed to form pixel openings in the display area 1; the second photoresist portion 13 is removed to A first anti-wrinkle opening, a second anti-wrinkle opening and a third anti-wrinkle opening are formed in the welding zone 2, so that the first electroformed film forms the first electroformed layer, and the second electroformed film forms the second electroformed layer . Finally, the first electroforming layer and the second electroforming layer are separated from the conductive substrate to form a mask, as shown in FIG. 5 .
  • the present disclosure provides a reticle assembly, including a frame and the aforementioned reticle, and a welding area of the reticle is connected to the frame by welding.
  • the present disclosure provides a method for preparing a mask, comprising:
  • a display area is formed and a welding area is formed on opposite sides of the first direction of the display area, the welding area at least includes a thickened part, and a set welding area is arranged on the thickened part, and the thickness of the set welding area is Greater than the thickness of the display area, in the horizontal direction of the display area, the thickened portion protrudes from the surface of at least one side of the display area.

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Abstract

一种掩膜版及其制备方法、掩膜版组件。掩膜版包括显示区以及位于所述显示区第一方向相对两侧的焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。

Description

掩膜版及其制备方法、掩膜版组件 技术领域
本公开涉及但不限于显示技术领域，尤指一种掩膜版及其制备方法、掩膜版组件。
背景技术
在显示面板的制备过程中，精密金属掩膜板起着重要的作用，尤其在OLED显示面板的制备过程中，直接决定有机发光材料是否能够准确无误地蒸镀到相应的OLED基板上。
在形成像素过程中，通过使用精细金属掩膜板(Fine Metal Mask，FMM)，将红、绿、蓝发光材料蒸镀到基板相应位置上。传统的金属掩膜板制造工艺采用湿法刻蚀，在金属薄板上制作像素开孔。然而，湿法蚀刻的各向同性特点使得像素开孔宽度难以精确控制，同时由于金属薄板厚度的限制，这种方法很难实现高分辨率金属掩膜板的制作。
QHD(Quarter High Definition)图像质量为每英寸
Figure PCTCN2021074045-appb-000001
像素(PPI)，像素大小约为
Figure PCTCN2021074045-appb-000002
对于UHD(Ultra High Definition)级别或更高的超高分辨率则像素尺寸更小。精细金属掩膜板越厚越难实现高分辨率。
电铸精细金属掩膜板(Electroforming Mask,EFM)是通过使用电镀工艺，在金属电极上沉积金属薄膜，并在在该镀膜上形成像素图案而制成。相比目前的蚀刻方式，电铸方式制备精细金属掩膜板可以制作得更薄，并可实现UHD(Ultra High Definition)(3840×2160)的分辨率。
由于电铸形成精细金属掩膜板过薄，仅为几微米至几十微米厚，激光焊接到金属框架的过程中，很容易出现将精细金属掩膜板的金属框架焊穿的情况，降低良率。
发明内容
以下是对本文详细描述的主题的概述。本概述并非是为了限制权利要求的保护范围。
一种掩膜版，包括显示区以及位于所述显示区第一方向相对两侧的焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。
在示例性实施方式中，在所述显示区的水平方向上，所述加厚部凸出所述显示区所述表面的部分包括与所述显示区所述表面平行的第一焊接面以及与所述第一焊接面靠近所述显示区一侧连接的第二焊接面，所述第二焊接面包括间隔设置的多个凸出部和凹进部。
在示例性实施方式中，所述凸出部和/或所述凹进部为尖角形、半圆弧形或U形。
在示例性实施方式中，所述第二焊接面与所述显示区所述表面之间形成的内角大于90度小于180度。
在示例性实施方式中，所述设定焊接区的面积为所述焊接区焊接所需焊点面积的10～50倍。
在示例性实施方式中，所述设定焊接区沿着所述加厚部的第二方向排布形成设定焊接区列，相邻所述设定焊接区列中的设定焊接区交错设置，所述第一方向与所述第二方向不同。
在示例性实施方式中，所述设定焊接区列中相邻设定焊接区之间设置有第一防皱开孔。
在示例性实施方式中，所述第一防皱开孔靠近所述设定焊接区一侧的边沿与所述设定焊接区靠近所述第一防皱开孔一侧的边沿的曲率相同。
在示例性实施方式中，所述显示区包括像素开孔区以及过渡区，所述过渡区位于所述像素开孔区靠近所述焊接区一侧，所述过渡区上设置有第二防皱开孔。
在示例性实施方式中，所述像素开孔区上设置有像素开孔，所述第二防 皱开孔与所述像素开孔相同。
在示例性实施方式中，所述加厚部上设置有第三防皱开孔，所述第三防皱开孔位于所述加厚部靠近所述显示区一侧。
在示例性实施方式中，所述加厚部上设置有多个所述第三防皱开孔，所述第三防皱开孔沿着所述显示区的第一方向排布形成第三防皱开孔行。
在示例性实施方式中，所述第三防皱开孔行中的第三防皱开孔的尺寸沿着靠近所述显示区的方向逐渐变小；和/或，所述第三防皱开孔行中的相邻第三防皱开孔之间的间距沿着靠近所述显示区的方向逐渐变小。
在示例性实施方式中，所述加厚部上设置有多个所述第三防皱开孔，所述第三防皱开孔的尺寸沿着靠近所述显示区的方向逐渐变小；和/或，相邻第三防皱开孔之间的间距沿着靠近所述显示区的方向逐渐变小。
在示例性实施方式中，在所述加厚部的厚度方向，所述加厚部包括叠加设置的第一电铸层和第二电铸层，所述第二电铸层至少部分凸出所述显示区。
在示例性实施方式中，所述第一电铸层的厚度为5至30um，所述第二电铸层的厚度为2至30um。
一种掩膜版组件，包括框架以及上述掩膜版，所述掩膜版的焊接区与所述框架焊接相连。
一种掩膜版的制备方法，包括：
形成显示区以及在所述显示区第一方向相对两侧形成焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。
在阅读并理解了附图和详细描述后，可以明白其他方面。
附图说明
附图用来提供对本公开技术方案的进一步理解，并且构成说明书的一部 分，与本公开的实施例一起用于解释本公开的技术方案，并不构成对本公开技术方案的限制。附图中各部件的形状和大小不反映真实比例，目的只是示意说明本公开内容。
图1为本公开示例性实施例一种掩膜版的结构示意图；
图2为图1中A-A’方向的剖视图；
图3为图1中a处的放大图；
图4为本公开示例性实施例一种掩膜版的结构示意图；
图5为图4中B-B’方向的剖视图；
图6为图4中b处的放大图；
图7为本公开示例性实施例中第二焊接面的结构示意图一；
图8为本公开示例性实施例中第二焊接面的结构示意图二；
图9为本公开示例性实施例中第二焊接面的结构示意图三；
图10为本公开示例性实施例中第二焊接面的结构示意图四；
图11为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图一；
图12为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图二；
图13为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图三；
图14为本公开示例性实施例中形成第一光刻胶后的示意图；
图15为本公开示例性实施例中形成第一光刻胶部和第二光刻胶部后的示意图；
图16为本公开示例性实施例中形成第一电铸薄膜后的示意图；
图17为本公开示例性实施例中形成第二光刻胶后的示意图；
图18为本公开示例性实施例中形成第二电铸薄膜后的示意图；
图19为本公开示例性实施例掩膜版张网褶皱模拟示意图。
具体实施方式
本文中的实施方式可以以多个不同形式来实施。所属技术领域的普通技术人员可以很容易地理解一个事实，就是实现方式和内容可以在不脱离本公开的宗旨及其范围的条件下被变换为各种各样的形式。因此，本公开不应该被解释为仅限定在下面的实施方式所记载的内容中。在不冲突的情况下，本公开中的实施例及实施例中的特征可以相互任意组合。
在附图中，有时为了明确起见，可能夸大表示了构成要素的大小、层的厚度或区域。因此，本公开的任意一个实现方式并不一定限定于图中所示尺寸，附图中部件的形状和大小不反映真实比例。此外，附图示意性地示出了理想的例子，本公开的任意一个实现方式不局限于附图所示的形状或数值等。
本文中的“第一”、“第二”、“第三”等序数词是为了避免构成要素的混同而设置，而不是为了在数量方面上进行限定的。
在本文中，为了方便起见，使用“中部”、“上”、“下”、“前”、“后”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示方位或位置关系的词句以参照附图说明构成要素的位置关系，仅是为了便于描述实施方式和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。构成要素的位置关系可根据描述的构成要素的方向进行适当地改变。因此，不局限于在文中说明的词句，根据情况可以适当地更换。
在本文中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解。例如，可以是固定连接，或可拆卸连接，或一体地连接；可以是机械连接，或电连接；可以是直接相连，或通过中间件间接相连，或两个元件内部的连通。对于本领域的普通技术人员而言，可以根据情况理解上述术语在本公开中的含义。
在本文中，“平行”是指两条直线形成的角度为-10°以上且10°以下的状态，因此，也包括该角度为-5°以上且5°以下的状态。另外，“垂直”是指两条 直线形成的角度为80°以上且100°以下的状态，因此，也包括85°以上且95°以下的角度的状态。
本文中的“约”，是指不严格限定界限，允许工艺和测量误差范围内的数值。
图1为本公开示例性实施例一种掩膜版的结构示意图；图2为图1中A-A’方向的剖视图；图3为图1中a处的放大图。如图1、图2和图3所示，本公开实施例掩膜版包括显示区1以及位于显示区1第一方向相对两侧的焊接区2，焊接区2至少包括加厚部21，加厚部21上设置有设定焊接区5设定焊接区5的厚度大于显示区1的厚度，在显示区1的水平方向上，加厚部21凸出显示区1至少一侧的表面，也就是说，在显示区1的厚度方向上，加厚部21至少一侧的表面高于显示区1至少一侧的表面，且加厚部21至少一侧的表面与显示区1至少一侧的表面位于同侧。其中，第一方向可以为显示区的长度方向。设定焊接区5为焊接区2与框架进行焊接的区域，设定焊接区5为焊点附近预留的区域，设定焊接区5不进行开孔。在焊接时，设定焊接区5的部分熔融与框架粘连。根据焊接设备的焊接精度和焊点尺寸参数，预设设定焊接区5的面积。
本公开中，设定焊接区熔融的部分近似为圆形，设定焊接区的边界近似为圆形，但不限于圆形，也可以采用其他形状，比如，矩形、菱形等规则或不规则形状。
本公开中掩膜版是有机发光材料蒸镀工艺中使用的掩膜板，显示区1上开设有多个像素开孔，在制备OLED显示面板过程中，显示区1用于蒸镀有机发光材料，以形成OLED显示面板的红R、绿G、蓝B像素。在有机发光材料蒸镀过程中，为了让掩膜板与OLED基板完全贴合，使得有机发光材料准确地蒸镀在OLED基板上的相应位置，需要对掩膜板进行张网工艺，以将掩膜板拉伸后焊接到框架(英文Frame)以组装成掩膜板组件。
经过发明人的研究发现，电铸精细金属掩膜板(Electroforming Mask,EFM)厚度过薄，仅为几微米至几十微米，在将掩膜板拉伸后焊接到框架的过程中，很容易出现将框架焊穿的情况，降低良率。
鉴于此，本公开通过将焊接区2加厚，形成加厚部21，使设定焊接区5设置在加厚部21上，进而使设定焊接区的厚度大于显示区的厚度，从而在保证显示区1厚度不变的情况下，避免焊接区2过薄，导致框架焊穿的情况发生，提高良率，并增强焊接区2的焊接牢固程度。
在示例性实施方式中，焊接区可以全部为加厚部，也可以部分为加厚部。在焊接区部分为加厚部时，加厚部可以位于焊接区靠近显示区一侧。
如图1、图2和图3所示，在加厚部21的厚度方向，加厚部21包括叠加设置的第一电铸层201和第二电铸层202。在显示区1的水平方向上，第二电铸层202至少部分凸出显示区1一侧的表面。第二电铸层202上设置有设定焊接区5。本公开实施例通过第二电铸层202对焊接区进行加厚，以避免焊接区2过薄，导致框架焊穿的情况发生，并增强焊接区2的焊接牢固程度。其中，第一电铸层201和第二电铸层202组合形成加厚部21。
在示例性实施方式中，第一电铸层201的厚度可以为5至30um，第二电铸层202的厚度可以为2至30um。
在一些实施例中，加厚部可以包括两层以上叠加设置的电铸层，比如，加厚部可以包括三层、四层或五层电铸层，本公开在此不再赘述。
在示例性实施方式中，第一电铸层201与显示区1通过同一电铸工艺采用相同材料制备而成。先通过第一次电铸工艺形成第一电铸薄膜，然后，再通过第二次电铸工艺，在焊接区的第一电铸层201上形成第二电铸薄膜，最后，使第一电铸薄膜分别形成显示区1和第一电铸层201；使第二电铸薄膜形成第二电铸层202。
如图3所示，本公开掩膜版在张网和焊接过程中，由于焊接区2和显示区1厚度的差异和非拉伸方向收缩率的差异，焊接区2易产生褶皱20，并且褶皱20会传递到显示区1中的像素开孔，如图19所示。张网褶皱会导致蒸镀像素位置精度降低和蒸镀阴影增大，甚至有混色风险。
图4为本公开示例性实施例一种掩膜版的结构示意图；图5为图4中B-B’方向的剖视图；图6为图4中b处的放大图。如图4、图5和图6所示，本公开示例性实施例掩膜版中，在显示区1的水平方向上，加厚部21凸出显示 区1表面的部分包括与显示区1表面平行的第一焊接面3以及位于第一焊接面3靠近显示区1一侧的第二焊接面4。第二焊接面4包括间隔设置的多个凸出部401和凹进部402，凸出部401和凹进部402使第二焊接面4形成波浪状，可有效平均张网过程中，掩膜板的应力分布，降低焊接区2褶皱风险，进而降低焊接区2虚焊的风险以及避免张网精度降低的风险。
在示例性实施方式中，加厚部21与显示区1连接。第二焊接面4将第一焊接面3与显示区1连接，即第二焊接面4的一端与第二焊接面4连接，第二焊接面4的另一端与显示区1连接。第二焊接面4形成加厚部21与显示区1的厚度分界线。其中，第二焊接面4与显示区1的表面之间形成的内角大于90度小于180度，即第二焊接面4与显示区1倾斜设置，并形成钝角，从而避免焊接区2焊接过程中产生的褶皱影响显示区1中的像素开孔。
在一些实施方式中，焊接区可以包括加厚部以及将加厚部与显示区连接的过渡部，第二焊接面将第一焊接面与焊接区的过渡部连接。
图7为本公开示例性实施例中第二焊接面的结构示意图一；图8为本公开示例性实施例中第二焊接面的结构示意图二；图9为本公开示例性实施例中第二焊接面的结构示意图三；图10为本公开示例性实施例中第二焊接面的结构示意图四。在示例性实施方式中，凸出部401和/或凹进部402可以为多种形状。比如，凸出部401和凹进部402均为尖角形，且凸出部401和凹进部402的弯曲方向相反，如图6所示。或者，凸出部401和凹进部402均为半圆弧形，且凸出部401和凹进部402的弯曲方向相反，如图7所示。或者，凸出部401和凹进部402均为U形，且凸出部401和凹进部402的弯曲方向相反，如图8所示。或者，凸出部401包括相对设置的第一弯折边和第二弯折边，以及将第一弯折边和第二弯折边连接的直边。凹进部402包括相对设置的第一直边和第二直边，以及将第一直边和第二直边连接的V形边，如图9所示。或者，凸出部401包括相对设置的第一弯曲边和第二弯曲边，以及将第一弯曲边和第二弯弯曲边连接的直边。凹进部402包括相对设置的第一直边和第二直边，以及将第一直边和第二直边连接的圆弧边，如图10所示。
如图6所示，第一焊接面3上设置有设定焊接区5。设定焊接区5为加厚部21与框架焊接的区域。焊接区2焊接所需的焊点位于设定焊接区5中。 设定焊接区5可以为多种形状，比如，设定焊接区5为圆形、矩形、菱形等规则形状或不规则形状。
在示例性实施方式中，设定焊接区5为圆形，焊接区2焊接所需的焊点为圆形，设定焊接区5的面积为焊接区焊接所需焊点面积的10～50倍，以使焊接区2为焊点预留足够的空间，避免焊点熔融焊接区2的区域扩散，影响设定焊接区5以外的区域。
如图6所示，设定焊接区5沿着加厚部21的第二方向排布形成设定焊接区列，相邻设定焊接区列中的设定焊接区5交错设置，避免相邻设定焊接区列中的设定焊接区5焊接时互相影响。其中，第一方向与第二方向不同。第二方向可以为显示区的宽度方向。
如图6所示，设定焊接区列中相邻设定焊接区5之间设置有第一防皱开孔6，第一防皱开孔6用于降低设定焊接区5焊接时，焊点金属熔融形成过程中产生的翘曲或收缩变形。
在示例性实施方式中，第一防皱开孔可以为多种形状，比如，第一防皱开孔可以为圆形、矩形、菱形、椭圆形等规则形状或不规则形状。
如图6所示，设定焊接区为圆形，第一防皱开孔靠近设定焊接区一侧的边沿与设定焊接区靠近第一防皱开孔一侧的边沿的曲率相同，以降低设定焊接区焊接时，焊点金属熔融形成过程中产生的翘曲或收缩变形。
如图6所示，显示区1包括像素开孔区101以及过渡区102，过渡区102位于像素开孔区101靠近焊接区2一侧，过渡区102上设置有第二防皱开孔7，第二防皱开孔7用于避免焊接区2焊接时产生的褶皱传递到像素开孔区101，影响像素开孔区的开孔精度。
如图6所示，过渡区102上设置有多个第二防皱开孔7，第二防皱开孔7的尺寸、形状和/或密度与像素开孔区101中像素开孔的尺寸、形状和/或密度相同。
在一些实施方式中，第二防皱开孔的尺寸、形状和/或密度与像素开孔区中像素开孔的尺寸、形状和/或密度也可以不相同。
如图6所示，显示区1与加厚部21连接，过渡区102将像素开孔区101与第二焊接面4连接，即过渡区102的一端与像素开孔区101连接，过渡区102的另一端与第二焊接面4连接。
如图6所示，第一焊接面3上设置有第三防皱开孔8，第三防皱开孔8位于第一焊接面3靠近第二焊接面4一侧。第三防皱开孔8用于避免焊接区2焊接时产生的褶皱传递到像素开孔区101，影响像素开孔区的开孔精度。
在示例性实施方式中，第三防皱开孔行中的第三防皱开孔8的尺寸沿着靠近显示区1的方向逐渐变小；和/或，第三防皱开孔行中的相邻第三防皱开孔8之间的间距沿着靠近显示区1的方向逐渐变小，从而避免焊接区2焊接时产生的褶皱影响像素开孔区的开孔精度。
在一些实施方式中，第三防皱开孔的尺寸、形状和/或密度与像素开孔区中像素开孔的尺寸、形状和/或密度相同。
图11为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图一；图12为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图二；图13为本公开示例性实施例中第二防皱开孔和第三防皱开孔的结构示意图三。在示例性实施方式中，第二防皱开孔7和第三防皱开孔8可以采用多种形状。比如，第二防皱开孔7和第三防皱开孔8为菱形，如图11所示。或者，第二防皱开孔7和第三防皱开孔8为椭圆形，如图12所示。或者，第二防皱开孔7和第三防皱开孔8为矩形，如图13所示。
图14至图18为本公开示例性实施例掩膜版的制备过程示意图。本公开示例性实施例掩膜版的制备方法，包括：
(1)选用SUS基板或者高掺杂单晶硅为导电基板10，在导电基板10的一侧表面涂覆第一光刻胶11，如图14所示。
(2)经过曝光显影，在导电基板10中需要开孔的位置留下光刻胶部。其中，显示区1中留下第一光刻胶部12，焊接区2中留下第二光刻胶部13。并且，通过调节曝光量和曝光强度，调节光刻胶部的高度，使第二光刻胶部13的高度大于第一光刻胶部12的高度，如图15所示。
(3)将具有上述结构的导电基板10置于电铸液中，以导电基板10作为 电铸阴极，将电铸材料作为电铸阳极，在一定温度、电流密度条件下，对导电基板10进行通电电铸，使电铸材料在导电基板10上形成第一电铸薄膜14，如图16所示。其中，电铸材料可以采用铁、镍、钴等金属。
(4)在第一电铸薄膜14的表面涂覆第二光刻胶薄膜，对第二光刻胶薄膜进行曝光显影，通过调节曝光量和曝光强度，使第二光刻胶薄膜形成第二光刻胶15。其中，第二光刻胶15的横截面为倒梯形，第二光刻胶15在导电基板10表面水平方向的相对两侧边与第一电铸薄膜14远离导电基板10一侧的表面之间形成的外角可以为110～135°，如图17所示。
(5)将具有上述结构的导电基板10置于电铸液中，以导电基板10作为电铸阴极，将电铸材料作为电铸阳极，在一定温度、电流密度条件下，对导电基板10进行通电电铸，在第一电铸薄膜14上形成第二电铸薄膜16。其中，第二电铸薄膜16的横截面为正梯形，与第二光刻胶15的倒梯形截面互补，第二电铸薄膜16在导电基板10表面水平方向的相对两侧边与第一电铸薄膜14远离导电基板10一侧的表面之间形成的外角可以为45～70°。第二电铸薄膜16远离导电基板10一侧的表面与第二光刻胶15远离导电基板10一侧的表面平齐，如图18所示。
(6)将具有上述结构的导电基板10从电铸液中取出，清洗后，去除第一光刻胶部12，以在显示区1形成像素开孔；去除第二光刻胶部13，以在焊接区2形成第一防皱开孔、第二防皱开孔和第三防皱开孔，使第一电铸薄膜形成第一电铸层，第二电铸薄膜形成第二电铸层。最后将第一电铸层和第二电铸层与导电基板分离，形成掩膜版，如图5所示。
本公开提供了一种掩膜版组件，包括框架以及前述的掩膜版，掩膜版的焊接区与框架焊接相连。
本公开提供了一种掩膜版的制备方法，包括：
形成显示区以及在所述显示区第一方向相对两侧形成焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。
虽然本公开所揭露的实施方式如上，但所述的内容仅为便于理解本公开而采用的实施方式，并非用以限定本公开。任何所属领域内的技术人员，在不脱离本公开所揭露的精神和范围的前提下，可以在实施的形式及细节上进行任何的修改与变化，但本申请的专利保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (17)

  1. 一种掩膜版，包括显示区以及位于所述显示区第一方向相对两侧的焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。
  2. 根据权利要求1所述的掩膜版，其中，在所述显示区的水平方向上，所述加厚部凸出所述显示区所述表面的部分包括与所述显示区所述表面平行的第一焊接面以及与所述第一焊接面靠近所述显示区一侧连接的第二焊接面，所述第二焊接面包括间隔设置的多个凸出部和凹进部。
  3. 根据权利要求2所述的掩膜版，其中，所述凸出部和/或所述凹进部为尖角形、半圆弧形或U形。
  4. 根据权利要求2所述的掩膜版，其中，所述第二焊接面与所述显示区所述表面之间形成的内角大于90度小于180度。
  5. 根据权利要求1所述的掩膜版，其中，所述设定焊接区的面积为所述焊接区焊接所需焊点面积的10～50倍。
  6. 根据权利要求1所述的掩膜版，其中，所述设定焊接区沿着所述加厚部的第二方向排布形成设定焊接区列，相邻所述设定焊接区列中的设定焊接区交错设置，所述第一方向与所述第二方向不同。
  7. 根据权利要求6所述的掩膜版，其中，所述设定焊接区列中相邻设定焊接区之间设置有第一防皱开孔。
  8. 根据权利要求7所述的掩膜版，其中，所述第一防皱开孔靠近所述设定焊接区一侧的边沿与所述设定焊接区靠近所述第一防皱开孔一侧的边沿的曲率相同。
  9. 根据权利要求1所述的掩膜版，其中，所述显示区包括像素开孔区以及过渡区，所述过渡区位于所述像素开孔区靠近所述焊接区一侧，所述过渡区上设置有第二防皱开孔。
  10. 根据权利要求9所述的掩膜版，其中，所述像素开孔区上设置有像素开孔，所述第二防皱开孔与所述像素开孔相同。
  11. 根据权利要求1所述的掩膜版，其中，所述加厚部上设置有第三防 皱开孔，所述第三防皱开孔位于所述加厚部靠近所述显示区一侧。
  12. 根据权利要求11所述的掩膜版，其中，所述加厚部上设置有多个所述第三防皱开孔，所述第三防皱开孔沿着所述显示区的第一方向排布形成第三防皱开孔行。
  13. 根据权利要求12所述的掩膜版，其中，所述第三防皱开孔行中的第三防皱开孔的尺寸沿着靠近所述显示区的方向逐渐变小；和/或，所述第三防皱开孔行中的相邻第三防皱开孔之间的间距沿着靠近所述显示区的方向逐渐变小。
  14. 根据权利要求1所述的掩膜版，其中，在所述加厚部的厚度方向，所述加厚部包括叠加设置的第一电铸层和第二电铸层，所述第二电铸层至少部分凸出所述显示区。
  15. 根据权利要求14所述的掩膜版，其中，所述第一电铸层的厚度为5至30um，所述第二电铸层的厚度为2至30um。
  16. 一种掩膜版组件，包括框架以及权利要求1至15任一项所述的掩膜版，所述掩膜版的焊接区与所述框架焊接相连。
  17. 一种掩膜版的制备方法，包括：
    形成显示区以及在所述显示区第一方向相对两侧形成焊接区，所述焊接区至少包括加厚部，所述加厚部上设置有设定焊接区，所述设定焊接区的厚度大于所述显示区的厚度，在所述显示区的水平方向上，所述加厚部凸出所述显示区至少一侧的表面。
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