WO2022153601A1 - 粘着シート - Google Patents
粘着シート Download PDFInfo
- Publication number
- WO2022153601A1 WO2022153601A1 PCT/JP2021/034168 JP2021034168W WO2022153601A1 WO 2022153601 A1 WO2022153601 A1 WO 2022153601A1 JP 2021034168 W JP2021034168 W JP 2021034168W WO 2022153601 A1 WO2022153601 A1 WO 2022153601A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pressure
- sensitive adhesive
- adhesive layer
- weight
- resin
- Prior art date
Links
- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims abstract description 243
- 239000010410 layer Substances 0.000 claims abstract description 117
- 229920005601 base polymer Polymers 0.000 claims abstract description 38
- 239000000853 adhesive Substances 0.000 claims description 104
- 230000001070 adhesive effect Effects 0.000 claims description 104
- 239000000463 material Substances 0.000 claims description 70
- 239000012790 adhesive layer Substances 0.000 claims description 38
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 239000003822 epoxy resin Substances 0.000 claims description 16
- 229920000647 polyepoxide Polymers 0.000 claims description 16
- 229920000058 polyacrylate Polymers 0.000 claims description 15
- 125000005907 alkyl ester group Chemical group 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 9
- XOQUTYDTROZTID-UHFFFAOYSA-N 2-[(4-tert-butylphenyl)-[(4-tert-butylphenyl)-(oxiran-2-yl)methoxy]methyl]oxirane Chemical compound C1=CC(C(C)(C)C)=CC=C1C(C1OC1)OC(C=1C=CC(=CC=1)C(C)(C)C)C1OC1 XOQUTYDTROZTID-UHFFFAOYSA-N 0.000 claims description 4
- 229920005989 resin Polymers 0.000 abstract description 134
- 239000011347 resin Substances 0.000 abstract description 134
- 239000004065 semiconductor Substances 0.000 abstract description 28
- 239000000758 substrate Substances 0.000 abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 63
- 229920001971 elastomer Polymers 0.000 description 56
- -1 polyethylene terephthalate Polymers 0.000 description 55
- 239000005060 rubber Substances 0.000 description 55
- 239000003431 cross linking reagent Substances 0.000 description 49
- 239000002585 base Substances 0.000 description 40
- 239000000178 monomer Substances 0.000 description 39
- 238000007789 sealing Methods 0.000 description 39
- 229920000642 polymer Polymers 0.000 description 35
- 229920000103 Expandable microsphere Polymers 0.000 description 29
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 24
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 24
- 239000000203 mixture Substances 0.000 description 24
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 24
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 20
- 229920001296 polysiloxane Polymers 0.000 description 19
- 239000003795 chemical substances by application Substances 0.000 description 17
- 229920001577 copolymer Polymers 0.000 description 17
- 150000001875 compounds Chemical class 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 16
- 239000000523 sample Substances 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 150000003505 terpenes Chemical class 0.000 description 14
- 235000007586 terpenes Nutrition 0.000 description 14
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 13
- 239000012948 isocyanate Substances 0.000 description 13
- 239000000654 additive Substances 0.000 description 12
- 150000002513 isocyanates Chemical class 0.000 description 12
- 230000000996 additive effect Effects 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 229920000098 polyolefin Polymers 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 9
- 239000000945 filler Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 239000003208 petroleum Substances 0.000 description 9
- 229920005862 polyol Polymers 0.000 description 9
- 150000003077 polyols Chemical class 0.000 description 9
- 239000004745 nonwoven fabric Substances 0.000 description 8
- 229920002050 silicone resin Polymers 0.000 description 8
- 229920002379 silicone rubber Polymers 0.000 description 8
- 239000004945 silicone rubber Substances 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000003566 sealing material Substances 0.000 description 7
- 229920001342 Bakelite® Polymers 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 150000002894 organic compounds Chemical class 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000004014 plasticizer Substances 0.000 description 6
- 229920001195 polyisoprene Polymers 0.000 description 6
- 239000004814 polyurethane Substances 0.000 description 6
- 229920002635 polyurethane Polymers 0.000 description 6
- 229920013730 reactive polymer Polymers 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000005062 Polybutadiene Substances 0.000 description 5
- 229920006243 acrylic copolymer Polymers 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- 150000002576 ketones Chemical class 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- 229920002857 polybutadiene Polymers 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 description 5
- 229920006132 styrene block copolymer Polymers 0.000 description 5
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 229920002367 Polyisobutene Polymers 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 230000003712 anti-aging effect Effects 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000004088 foaming agent Substances 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 229920001519 homopolymer Polymers 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 4
- 150000002978 peroxides Chemical class 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 4
- 229920003051 synthetic elastomer Polymers 0.000 description 4
- 239000005061 synthetic rubber Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 3
- 239000013032 Hydrocarbon resin Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 229920006223 adhesive resin Polymers 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 229920005549 butyl rubber Polymers 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- 229920006270 hydrocarbon resin Polymers 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 239000004005 microsphere Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- KANZWHBYRHQMKZ-UHFFFAOYSA-N 2-ethenylpyrazine Chemical compound C=CC1=CN=CC=N1 KANZWHBYRHQMKZ-UHFFFAOYSA-N 0.000 description 2
- ROGIWVXWXZRRMZ-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1 ROGIWVXWXZRRMZ-UHFFFAOYSA-N 0.000 description 2
- VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 2
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 244000043261 Hevea brasiliensis Species 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000001099 ammonium carbonate Substances 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 229920003052 natural elastomer Polymers 0.000 description 2
- 229920001194 natural rubber Polymers 0.000 description 2
- CRSOQBOWXPBRES-UHFFFAOYSA-N neopentane Chemical compound CC(C)(C)C CRSOQBOWXPBRES-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000008520 organization Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000013464 silicone adhesive Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229960002317 succinimide Drugs 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- WTARULDDTDQWMU-RKDXNWHRSA-N (+)-β-pinene Chemical compound C1[C@H]2C(C)(C)[C@@H]1CCC2=C WTARULDDTDQWMU-RKDXNWHRSA-N 0.000 description 1
- WTARULDDTDQWMU-IUCAKERBSA-N (-)-Nopinene Natural products C1[C@@H]2C(C)(C)[C@H]1CCC2=C WTARULDDTDQWMU-IUCAKERBSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- KYPOHTVBFVELTG-OWOJBTEDSA-N (e)-but-2-enedinitrile Chemical compound N#C\C=C\C#N KYPOHTVBFVELTG-OWOJBTEDSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- XTKZBPGQKMDFMC-UHFFFAOYSA-N 1-butyl-3-methylidenepyrrolidine-2,5-dione Chemical compound CCCCN1C(=O)CC(=C)C1=O XTKZBPGQKMDFMC-UHFFFAOYSA-N 0.000 description 1
- BGKQCHAKBLWCDU-UHFFFAOYSA-N 1-cyclohexyl-3-methylidenepyrrolidine-2,5-dione Chemical compound O=C1C(=C)CC(=O)N1C1CCCCC1 BGKQCHAKBLWCDU-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- GXDLZONOWLZMTG-UHFFFAOYSA-N 1-dodecyl-3-methylidenepyrrolidine-2,5-dione Chemical compound CCCCCCCCCCCCN1C(=O)CC(=C)C1=O GXDLZONOWLZMTG-UHFFFAOYSA-N 0.000 description 1
- SJLLJZNSZJHXQN-UHFFFAOYSA-N 1-dodecylpyrrole-2,5-dione Chemical compound CCCCCCCCCCCCN1C(=O)C=CC1=O SJLLJZNSZJHXQN-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- DCRYNQTXGUTACA-UHFFFAOYSA-N 1-ethenylpiperazine Chemical compound C=CN1CCNCC1 DCRYNQTXGUTACA-UHFFFAOYSA-N 0.000 description 1
- PBGPBHYPCGDFEZ-UHFFFAOYSA-N 1-ethenylpiperidin-2-one Chemical compound C=CN1CCCCC1=O PBGPBHYPCGDFEZ-UHFFFAOYSA-N 0.000 description 1
- PBDXUGSZYRYWMI-UHFFFAOYSA-N 1-ethyl-3-heptylidenepyrrolidine-2,5-dione Chemical compound CCCCCCC=C1CC(=O)N(CC)C1=O PBDXUGSZYRYWMI-UHFFFAOYSA-N 0.000 description 1
- BMZZOWWYEBTMBX-UHFFFAOYSA-N 1-ethyl-3-methylidenepyrrolidine-2,5-dione Chemical compound CCN1C(=O)CC(=C)C1=O BMZZOWWYEBTMBX-UHFFFAOYSA-N 0.000 description 1
- CSCSROFYRUZJJH-UHFFFAOYSA-N 1-methoxyethane-1,2-diol Chemical compound COC(O)CO CSCSROFYRUZJJH-UHFFFAOYSA-N 0.000 description 1
- QSWFISOPXPJUCT-UHFFFAOYSA-N 1-methyl-3-methylidenepyrrolidine-2,5-dione Chemical compound CN1C(=O)CC(=C)C1=O QSWFISOPXPJUCT-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- NQDOCLXQTQYUDH-UHFFFAOYSA-N 1-propan-2-ylpyrrole-2,5-dione Chemical compound CC(C)N1C(=O)C=CC1=O NQDOCLXQTQYUDH-UHFFFAOYSA-N 0.000 description 1
- IQEWHTMQTSAPLG-UHFFFAOYSA-N 10-hydroxydecyl prop-2-enoate Chemical compound OCCCCCCCCCCOC(=O)C=C IQEWHTMQTSAPLG-UHFFFAOYSA-N 0.000 description 1
- KQSMCAVKSJWMSI-UHFFFAOYSA-N 2,4-dimethyl-1-n,1-n,3-n,3-n-tetrakis(oxiran-2-ylmethyl)benzene-1,3-diamine Chemical compound CC1=C(N(CC2OC2)CC2OC2)C(C)=CC=C1N(CC1OC1)CC1CO1 KQSMCAVKSJWMSI-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- HJEORQYOUWYAMR-UHFFFAOYSA-N 2-[(2-butylphenoxy)methyl]oxirane Chemical compound CCCCC1=CC=CC=C1OCC1OC1 HJEORQYOUWYAMR-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- AGXAFZNONAXBOS-UHFFFAOYSA-N 2-[[3-(oxiran-2-ylmethyl)phenyl]methyl]oxirane Chemical compound C=1C=CC(CC2OC2)=CC=1CC1CO1 AGXAFZNONAXBOS-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 1
- PGMMQIGGQSIEGH-UHFFFAOYSA-N 2-ethenyl-1,3-oxazole Chemical compound C=CC1=NC=CO1 PGMMQIGGQSIEGH-UHFFFAOYSA-N 0.000 description 1
- MZNSQRLUUXWLSB-UHFFFAOYSA-N 2-ethenyl-1h-pyrrole Chemical compound C=CC1=CC=CN1 MZNSQRLUUXWLSB-UHFFFAOYSA-N 0.000 description 1
- ZDHWTWWXCXEGIC-UHFFFAOYSA-N 2-ethenylpyrimidine Chemical compound C=CC1=NC=CC=N1 ZDHWTWWXCXEGIC-UHFFFAOYSA-N 0.000 description 1
- RVBFWXYFXKDVKG-UHFFFAOYSA-N 2-ethoxyprop-2-enenitrile Chemical compound CCOC(=C)C#N RVBFWXYFXKDVKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- KZFSWIGPRLSJBV-UHFFFAOYSA-N 2-methylidenebutanedioic acid 2-methylprop-2-enenitrile prop-2-enenitrile Chemical compound C(C(=C)CC(=O)O)(=O)O.C(C(=C)C)#N.C(C=C)#N KZFSWIGPRLSJBV-UHFFFAOYSA-N 0.000 description 1
- AUZRCMMVHXRSGT-UHFFFAOYSA-N 2-methylpropane-1-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CC(C)CS(O)(=O)=O AUZRCMMVHXRSGT-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- YYIOIHBNJMVSBH-UHFFFAOYSA-N 2-prop-2-enoyloxynaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=C(OC(=O)C=C)C=CC2=C1 YYIOIHBNJMVSBH-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- BLJHFERYMGMXSC-UHFFFAOYSA-N 3-[3-(hydrazinesulfonyl)phenyl]sulfonylbenzenesulfonohydrazide Chemical compound NNS(=O)(=O)C1=CC=CC(S(=O)(=O)C=2C=C(C=CC=2)S(=O)(=O)NN)=C1 BLJHFERYMGMXSC-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- RDRWAAIUFCYJPH-UHFFFAOYSA-N 3-methylidene-1-octylpyrrolidine-2,5-dione Chemical compound CCCCCCCCN1C(=O)CC(=C)C1=O RDRWAAIUFCYJPH-UHFFFAOYSA-N 0.000 description 1
- FKAWETHEYBZGSR-UHFFFAOYSA-N 3-methylidenepyrrolidine-2,5-dione Chemical compound C=C1CC(=O)NC1=O FKAWETHEYBZGSR-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- GRRGMQBIAJCOBQ-UHFFFAOYSA-N 4-(thiatriazol-5-yl)morpholine Chemical compound C1COCCN1C1=NN=NS1 GRRGMQBIAJCOBQ-UHFFFAOYSA-N 0.000 description 1
- NBOCQTNZUPTTEI-UHFFFAOYSA-N 4-[4-(hydrazinesulfonyl)phenoxy]benzenesulfonohydrazide Chemical compound C1=CC(S(=O)(=O)NN)=CC=C1OC1=CC=C(S(=O)(=O)NN)C=C1 NBOCQTNZUPTTEI-UHFFFAOYSA-N 0.000 description 1
- CFZDMXAOSDDDRT-UHFFFAOYSA-N 4-ethenylmorpholine Chemical compound C=CN1CCOCC1 CFZDMXAOSDDDRT-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- OCIFJWVZZUDMRL-UHFFFAOYSA-N 6-hydroxyhexyl prop-2-enoate Chemical compound OCCCCCCOC(=O)C=C OCIFJWVZZUDMRL-UHFFFAOYSA-N 0.000 description 1
- JSZCJJRQCFZXCI-UHFFFAOYSA-N 6-prop-2-enoyloxyhexanoic acid Chemical compound OC(=O)CCCCCOC(=O)C=C JSZCJJRQCFZXCI-UHFFFAOYSA-N 0.000 description 1
- JSCDRVVVGGYHSN-UHFFFAOYSA-N 8-hydroxyoctyl prop-2-enoate Chemical compound OCCCCCCCCOC(=O)C=C JSCDRVVVGGYHSN-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920001651 Cyanoacrylate Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- MWRWFPQBGSZWNV-UHFFFAOYSA-N Dinitrosopentamethylenetetramine Chemical compound C1N2CN(N=O)CN1CN(N=O)C2 MWRWFPQBGSZWNV-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 1
- GQWNECFJGBQMBO-UHFFFAOYSA-N Molindone hydrochloride Chemical compound Cl.O=C1C=2C(CC)=C(C)NC=2CCC1CN1CCOCC1 GQWNECFJGBQMBO-UHFFFAOYSA-N 0.000 description 1
- 240000000907 Musa textilis Species 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 150000004008 N-nitroso compounds Chemical class 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- WTARULDDTDQWMU-UHFFFAOYSA-N Pseudopinene Natural products C1C2C(C)(C)C1CCC2=C WTARULDDTDQWMU-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- ZFWBYVVTGDOQQF-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl] 2-methylbut-2-enoate Chemical compound CC=C(C)C(=O)OC1CCC(CO)CC1 ZFWBYVVTGDOQQF-UHFFFAOYSA-N 0.000 description 1
- CZCSLHYZEQSUNV-UHFFFAOYSA-N [Na].OB(O)O Chemical compound [Na].OB(O)O CZCSLHYZEQSUNV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 229920006271 aliphatic hydrocarbon resin Polymers 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000002521 alkyl halide group Chemical group 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- XCPQUQHBVVXMRQ-UHFFFAOYSA-N alpha-Fenchene Natural products C1CC2C(=C)CC1C2(C)C XCPQUQHBVVXMRQ-UHFFFAOYSA-N 0.000 description 1
- MVNCAPSFBDBCGF-UHFFFAOYSA-N alpha-pinene Natural products CC1=CCC23C1CC2C3(C)C MVNCAPSFBDBCGF-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- CAMXVZOXBADHNJ-UHFFFAOYSA-N ammonium nitrite Chemical compound [NH4+].[O-]N=O CAMXVZOXBADHNJ-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N anhydrous trimellitic acid Natural products OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- LSNDGFYQJRXEAR-UHFFFAOYSA-N benzenesulfonamidourea Chemical compound NC(=O)NNS(=O)(=O)C1=CC=CC=C1 LSNDGFYQJRXEAR-UHFFFAOYSA-N 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005250 beta ray Effects 0.000 description 1
- 229930006722 beta-pinene Natural products 0.000 description 1
- KBWLNCUTNDKMPN-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) hexanedioate Chemical compound C1OC1COC(=O)CCCCC(=O)OCC1CO1 KBWLNCUTNDKMPN-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000005354 coacervation Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 1
- 229940099364 dichlorofluoromethane Drugs 0.000 description 1
- RXKJFZQQPQGTFL-UHFFFAOYSA-N dihydroxyacetone Chemical compound OCC(=O)CO RXKJFZQQPQGTFL-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- OIAUFEASXQPCFE-UHFFFAOYSA-N formaldehyde;1,3-xylene Chemical compound O=C.CC1=CC=CC(C)=C1 OIAUFEASXQPCFE-UHFFFAOYSA-N 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- LCWMKIHBLJLORW-UHFFFAOYSA-N gamma-carene Natural products C1CC(=C)CC2C(C)(C)C21 LCWMKIHBLJLORW-UHFFFAOYSA-N 0.000 description 1
- 238000002523 gelfiltration Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- DZCCLNYLUGNUKQ-UHFFFAOYSA-N n-(4-nitrosophenyl)hydroxylamine Chemical compound ONC1=CC=C(N=O)C=C1 DZCCLNYLUGNUKQ-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical class C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- AAYRWMCIKCRHIN-UHFFFAOYSA-N propane-1-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CCCS(O)(=O)=O AAYRWMCIKCRHIN-UHFFFAOYSA-N 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellityc acid Natural products OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N sec-butylidene Natural products CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
- 150000003349 semicarbazides Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- VOVUARRWDCVURC-UHFFFAOYSA-N thiirane Chemical compound C1CS1 VOVUARRWDCVURC-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
- 229940029284 trichlorofluoromethane Drugs 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Definitions
- the present invention relates to an adhesive sheet.
- the semiconductor chips may be resin-sealed in order to prevent damage to the semiconductor chips, expand metal wiring, and the like.
- the semiconductor chip may be resin-sealed on the adhesive sheet from the viewpoint of workability and the like.
- a plurality of semiconductor chips are arranged on an adhesive sheet as a predetermined temporary fixing material, and the semiconductor chips are collectively resin-sealed on the adhesive sheet.
- the pressure-sensitive adhesive sheet is peeled off from the resin that seals the semiconductor chip.
- the present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is an adhesive sheet that can be used as a temporary fixing material when sealing a semiconductor chip with a resin, and the adhesive sheet is peeled off.
- An object of the present invention is to provide an adhesive sheet capable of preventing an appearance defect of a sealing resin after an operation.
- the pressure-sensitive adhesive sheet of the present invention comprises a base material and a pressure-sensitive adhesive layer arranged on at least one side of the base material, the pressure-sensitive adhesive layer contains a pressure-sensitive adhesive, and the pressure-sensitive adhesive has a Sp value of 19.5.
- J / cm 3 Includes a base polymer that is 1/2 to 25 (J / cm 3 ) 1/2 .
- the pressure-sensitive adhesive sheet is the base material, the pressure-sensitive adhesive layer arranged on one side of the base material, and the second base material arranged on the side opposite to the pressure-sensitive adhesive layer. With a pressure-sensitive adhesive layer.
- the pressure-sensitive adhesive is an acrylic pressure-sensitive adhesive.
- the acrylic pressure-sensitive adhesive has a base polymer having an alkyl ester having 6 or less carbon atoms as a side chain as a base polymer, and an alkyl ester having 6 or less carbon atoms as the side chain.
- the content ratio of the constituent units to have is 50% by weight or more with respect to all the constituent units constituting the acrylic polymer.
- the contact angle of the pressure-sensitive adhesive layer with respect to 4-tertiary butylphenylglycidyl ether is 47 ° or less.
- the adhesive force at 23 ° C. to the epoxy resin when the epoxy resin is cured on the pressure-sensitive adhesive layer is preferably 8N / 20 mm or more.
- the shear adhesive force at 150 ° C. when the pressure-sensitive adhesive layer is attached to the silicon chip is 400 g or more.
- an adhesive sheet that can be used as a temporary fixing material when sealing a semiconductor chip with a resin, and which can prevent an appearance defect of the sealing resin after the adhesive sheet peeling operation. can do.
- FIG. 1 of the pressure-sensitive adhesive sheet is a schematic cross-sectional view of the pressure-sensitive adhesive sheet according to one embodiment of the present invention.
- the pressure-sensitive adhesive sheet 100 includes a base material 10 and a pressure-sensitive adhesive layer (first pressure-sensitive adhesive layer) 20 arranged on at least one side of the base material 10.
- the pressure-sensitive adhesive sheet of the present invention can be suitably used as a temporary fixing material when sealing a semiconductor chip with a resin. More specifically, in the pressure-sensitive adhesive sheet of the present invention, semiconductor chips are arranged on the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet, the semiconductor chips are covered with a resin (usually an epoxy resin), and the sealing resin is cured. Can be used as a temporary fixing material for the semiconductor chip when the semiconductor chip is resin-sealed. After sealing the semiconductor chip with resin, when performing a predetermined post-process (for example, backside grinding of the sealing resin, pattern formation, bump formation, chip formation (cutting)), the adhesive sheet is a sealing resin and a semiconductor. It can be peeled off from the structure composed of the chip.
- a resin usually an epoxy resin
- the pressure-sensitive adhesive layer contains a pressure-sensitive adhesive.
- the pressure-sensitive adhesive contains a base polymer having a Sp value of 19.5 (J / cm 3 ) 1/2 to 25 (J / cm 3 ) 1/2 .
- a pressure-sensitive adhesive layer having a high affinity with the sealing resin can be formed. If a pressure-sensitive adhesive sheet having such an adhesive layer is attached to a sealing resin and subjected to a resin sealing step, the sealing resin and the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet are brought into contact with each other by heating and pressurizing during the step.
- a mixed layer containing the pressure-sensitive adhesive layer component and the sealing resin component is preferably formed between them.
- the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet is peeled off from the base material and remains in the sealing resin due in part to the formation of the mixed layer.
- the effect of preventing the flow mark becomes remarkable.
- the adhesion of the wiring formed in the structure including the semiconductor chip can be improved. Furthermore, it is possible to reduce the step between the surface of the sealing resin and the semiconductor chip after peeling.
- the flow mark is caused by the variation in the thickness of the mixed layer formed by mixing the low molecular weight component of the sealing resin and the pressure-sensitive adhesive component of the pressure-sensitive adhesive layer, and is used for temporary fixing of the resin sealing.
- the pressure-sensitive adhesive sheet development of a pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer having a low affinity with a sealing resin (for example, a pressure-sensitive adhesive layer containing a pressure-sensitive adhesive having a low Sp value) is being studied.
- the present invention is characterized in that flow marks can be prevented by forming a pressure-sensitive adhesive layer having a high affinity with a sealing resin, based on a completely different idea from the conventional pressure-sensitive adhesive sheet. ..
- FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention.
- the pressure-sensitive adhesive sheet 200 further includes a second pressure-sensitive adhesive layer 30 on the side opposite to the pressure-sensitive adhesive layer 20 of the base material 10. That is, the pressure-sensitive adhesive sheet 200 includes a pressure-sensitive adhesive layer 20, a base material 10, and a second pressure-sensitive adhesive layer 30 in this order.
- the second pressure-sensitive adhesive layer 30 By providing the second pressure-sensitive adhesive layer 30, when the resin is sealed on the pedestal, the second pressure-sensitive adhesive layer 30 side is attached to the pedestal, and the pressure-sensitive adhesive sheet 200 is arranged with good fixing property. Can be done.
- the second pressure-sensitive adhesive layer comprises thermally expandable microspheres.
- the thermally expandable microspheres can expand at a predetermined temperature.
- the heat-expandable microspheres expand by heating to a predetermined temperature or higher, and the adhesive surface (that is, the surface of the second pressure-sensitive adhesive layer) becomes uneven. Adhesive strength decreases or disappears.
- the necessary stickiness is exhibited for the difference in fixing the pressure-sensitive adhesive sheet (for example, fixing it to the pedestal), and when the pressure-sensitive adhesive sheet is peeled off (for example, for example). When peeling from the pedestal), the adhesive strength is reduced or eliminated by heating, and good peelability is exhibited.
- the pressure-sensitive adhesive sheet of the present invention has an adhesive force at 23 ° C., preferably 0.05 N / 20 mm to 1 N / 20 mm, more preferably 0.1 N / 20 mm to 10 N when the pressure-sensitive adhesive layer is attached to polyethylene terephthalate.
- / 20 mm more preferably 0.1N / 20mm to 5N / 20mm, particularly preferably 0.2N / 20mm to 2N / 20mm, and most preferably 0.2N / 20mm to 1N / 20mm.
- an adherend for example, a semiconductor chip
- an adhesive sheet having less adhesive residue at the time of peeling can be obtained.
- adheresive strength at 23 ° C. when the adhesive layer is attached to polyethylene terephthalate refers to adhesion of an adhesive sheet (width 20 mm x length 100 mm) to a polyethylene terephthalate film (thickness 25 ⁇ m).
- the agent layers are bonded (bonding conditions: 1 reciprocation of a 2 kg roller), left at an ambient temperature of 23 ° C. for 30 minutes, and then the sample is subjected to a tensile test (peeling speed: 300 mm / min, peeling angle 180 °). Adhesive strength to be measured.
- the pressure-sensitive adhesive sheet of the present invention has an adhesive force at 23 ° C., preferably 8N / 20mm or more, more preferably 8N / 20mm to 20N / 20mm, when the epoxy resin is cured on the pressure-sensitive adhesive layer. It is more preferably 8N / 20mm to 15 / 20mm.
- Adhesive force at 23 ° C. against the epoxy resin when the epoxy resin is cured on the pressure-sensitive adhesive layer is an index showing the adhesion between the pressure-sensitive adhesive sheet and the sealing resin.
- the adhesive strength is within the above range, an adhesive sheet suitable as a temporary fixing material for sealing a semiconductor chip with a resin can be obtained.
- peeling force when peeling the epoxy resin from the pressure-sensitive adhesive layer of the obtained sample obtained by applying the company's product name “G730”) and then curing the epoxy resin.
- the adhesive force is measured by subjecting the sample having a width of 20 mm and a length of 100 mm to a tensile test (peeling speed: 300 mm / min, peeling angle 180 °).
- the pressure-sensitive adhesive sheet of the present invention has a shear adhesive force at 150 ° C. at 150 ° C. when the pressure-sensitive adhesive layer is attached to the silicon chip, preferably 400 g or more, more preferably 400 g to 2000 g, and further preferably 700 g to 1500 g. be.
- the adhesive has a high cohesive force, has a preferable adhesive force even at a high temperature (for example, a heating step for curing the sealing resin), and is arranged on the adhesive sheet. It is possible to prevent misalignment of the adherend (for example, a semiconductor chip). Further, it is possible to prevent the formation of a gap (gap between the adhesive sheet / sealing resin) in which the sealing resin penetrates.
- the shear adhesive force is applied to the silicon chip (size: 5 mm x 5 mm mirror surface is vertically attached to the adhesive layer so that the chip angle does not hit, and then heated at 130 ° C. for 30 minutes to adhere to the surface of the silicon chip adhesive. After that, it can be measured by reading the maximum breaking load from the load-displacement curve obtained by applying an external force in the horizontal direction with the chip at a shear rate of 500 ⁇ m / sec in an environment of 150 ° C.
- the thickness of the pressure-sensitive adhesive sheet of the present invention is preferably 3 ⁇ m to 300 ⁇ m, more preferably 20 ⁇ m to 200 ⁇ m, and further preferably 50 ⁇ m to 150 ⁇ m.
- the thickness of the adhesive layer is preferably 1 ⁇ m to 300 ⁇ m, more preferably 2 ⁇ m to 300 ⁇ m, further preferably 2 ⁇ m to 200 ⁇ m, still more preferably 3 ⁇ m to 100 ⁇ m, still more preferably 4 ⁇ m. It is ⁇ 80 ⁇ m, and particularly preferably 5 ⁇ m to 50 ⁇ m. Within such a range, an adhesive layer having a flat surface is formed, and an adhesive sheet that does not easily cause flow marks can be obtained.
- the contact angle of the pressure-sensitive adhesive layer with respect to 4-tertiary butylphenylglycidyl ether is preferably 47 ° or less, more preferably 25 ° to 47 °, and even more preferably 28 ° to 45 °. Within such a range, an adhesive layer having a high affinity with the sealing resin can be formed.
- the elastic modulus of the pressure-sensitive adhesive layer by the nanoindentation method at 25 ° C. is preferably less than 100 MPa, more preferably 0.1 MPa to 50 MPa, and further preferably 0.1 MPa to 10 MPa. Within such a range, an adhesive sheet having an appropriate adhesive strength can be obtained.
- the elastic modulus by the nanoindentation method is the load-bearing-pushing depth obtained by continuously measuring the load on the indenter and the pushing depth when the indenter is pushed into the sample during loading and unloading.
- the elastic modulus by the nanoindentation method means the elastic modulus measured as described above under the measurement conditions of load: 1 mN, load / unloading speed: 0.1 mN / s, and holding time: 1 s.
- the tensile elastic modulus of the pressure-sensitive adhesive layer at 25 ° C. is preferably less than 100 MPa, more preferably 0.1 MPa to 50 MPa, and even more preferably 0.1 MPa to 10 MPa. Within such a range, an adhesive sheet having an appropriate adhesive strength can be obtained.
- the tensile elastic modulus can be measured according to JIS K 7161: 2008.
- the probe tack value of the pressure-sensitive adhesive layer is preferably 50 g / 5 mm ⁇ or more, more preferably 75 g / 5 mm ⁇ or more, and further preferably 100 g / 5 mm ⁇ or more. Within such a range, the displacement of the adherend (for example, the semiconductor chip) arranged on the adhesive sheet can be prevented.
- the measurement conditions for the probe tack value are: probe processing speed: 30 mm / min, test speed: 30 mm / min, adhesion load: 100 gf, adhesion holding time: 1 second, probe area: 5 mm ⁇ SUS.
- any suitable pressure-sensitive adhesive can be used as long as the effects of the present invention can be obtained.
- the pressure-sensitive adhesive include an acrylic pressure-sensitive adhesive, a rubber-based pressure-sensitive adhesive, and a silicone-based pressure-sensitive adhesive. Among them, an acrylic pressure-sensitive adhesive may be preferably used. Further, as the pressure-sensitive adhesive, an active energy ray-curable pressure-sensitive adhesive may be used.
- the pressure-sensitive adhesive contains a base polymer having an sp value in the above range. The base polymer means a polymer that can be a factor in developing the adhesiveness of the pressure-sensitive adhesive.
- the Sp value of the base polymer is 19.5 (J / cm 3 ) 1/2 to 25 (J / cm 3 ) 1/2 .
- the Sp value of the base polymer is preferably 20 (J / cm 3 ) 1/2 to 24 (J / cm 3 ) 1/2 , and more preferably 20.5 (J / cm 3 ) 1/2 to 23. .5 (J / cm 3 ) 1/2 .
- the Sp value of the base polymer is calculated by the Fedors method (Hideki Yamamoto, "Sp Value Basics / Applications and Calculation Methods", Information Organization Publishing Co., Ltd., April 3, 2006, pp. 66-67). Can be done.
- the SP value is calculated by calculating the SP value of each homopolymer of each structural unit constituting the copolymer, and the mole fraction of each structural unit is added to each of these SP values. It is calculated by adding up the products multiplied by the fraction.
- the acrylic pressure-sensitive adhesive includes, for example, an acrylic pressure-sensitive adhesive based on an acrylic polymer (homopolymer or copolymer) using one or more (meth) acrylic acid alkyl esters as a monomer component. And so on.
- (meth) acrylic acid alkyl ester examples include methyl (meth) acrylic acid, ethyl (meth) acrylic acid, propyl (meth) acrylic acid, isopropyl (meth) acrylic acid, and butyl (meth) acrylic acid.
- the acrylic polymer preferably has an alkyl ester having 6 or less carbon atoms as a side chain, more preferably has an alkyl ester having 4 or less carbon atoms, and has an alkyl ester having 2 or less carbon atoms. Is even more preferable. If an acrylic polymer having a short side chain is used, an adhesive layer having a high affinity with the sealing material can be formed.
- the content ratio of the structural unit having an alkyl ester having 6 or less carbon atoms (preferably 4 or less, more preferably 2 or less) as a side chain is based on all the structural units constituting the acrylic polymer.
- It is preferably 50% by weight or more, more preferably 60% by weight or more, further preferably 60% by weight to 100% by weight, particularly preferably 60% by weight to 90% by weight, and most preferably. It is 60% by weight to 80% by weight. Within such a range, an adhesive layer having a high affinity with the sealing material can be formed.
- the acrylic pressure-sensitive adhesive may contain a plurality of types of acrylic polymers, but the content ratio of the acrylic polymer having an alkyl SL having 6 or less carbon atoms (preferably 4 or less, more preferably 2 or less) in the side chain. Is preferably 30 parts by weight to 100 parts by weight, more preferably 70 parts by weight to 100 parts by weight, and further preferably 90 parts by weight to 100 parts by weight with respect to 100 parts by weight of the total acrylic polymer. .. In one embodiment, the content ratio of the acrylic polymer having an alkyl SL having 6 or less carbon atoms in the side chain is 100 parts by weight with respect to 100 parts by weight of the total acrylic polymer.
- the acrylic polymer is a unit corresponding to other monomer components copolymerizable with the (meth) acrylic acid alkyl ester, if necessary, for the purpose of modifying cohesive force, heat resistance, crosslinkability, etc. May include.
- monomer components include carboxyl group-containing monomers such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid; maleic anhydride and icotanic anhydride.
- Acid anhydride monomers such as (meth) hydroxyethyl acrylate, (meth) hydroxypropyl acrylate, (meth) hydroxybutyl acrylate, (meth) hydroxyhexyl acrylate, (meth) hydroxyoctyl acrylate, (meth) Hydromer group-containing monomers such as hydroxydecyl acrylate, hydroxylauryl (meth) acrylate, and (4-hydroxymethylcyclohexyl) methylmethacrylate; styrene sulfonic acid, allyl sulfonic acid, 2- (meth) acrylamide-2-methylpropan sulfonic acid.
- Maleimide-based monomers such as N-cyclohexyl maleimide, N-isopropyl maleimide, N-lauryl maleimide, N-phenylmaleimide; N-methylitaconimide, N-ethylitaconimide, N-butylitaconimide, N-octylitaconimide , N-2-ethylhexylitaconimide, N-cyclohexylitaconimide, N-laurylitaconimide and other itaconimide-based monomers; Succinimide-based monomers such as N- (meth) acryloyl-8-oxyoctamethylene succinimide; vinyl acetate, vinyl propionate, N-vinylpyrrolidone, methylvinylpyro Vinyls such as lidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperazin, vinylpyrazine, vinylpyrrole, vinylimidazole, vinylo
- Acrylic acid ester-based monomers having the above; hexanediol di (meth) acrylate, (poly) ethylene glycol di (meth) acrylate, (poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol Polyfunctional monomers such as di (meth) acrylate, trimethylolpropantri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, epoxy acrylate, polyester acrylate, urethane acrylate; isoprene, butadiene, Olefin-based monomers such as isobutylene; vinyl ether-based monomers such as vinyl ether and the like can be mentioned.
- a carboxyl group-containing monomer particularly preferably acrylic acid
- a hydroxyl group-containing monomer particularly preferably hydroxyethyl (meth) acrylate
- the content of the structural unit derived from the carboxyl group-containing monomer is preferably 40% by weight or less, more preferably 0.1% by weight to 10% by weight, based on all the structural units constituting the acrylic polymer. More preferably, it is 0.5% by weight to 5% by weight, and particularly preferably 1% by weight to 4% by weight.
- the content of the structural unit derived from the hydroxyl group-containing monomer is preferably 0.09% by weight to 40% by weight, more preferably 0.1% by weight, based on all the structural units constituting the acrylic polymer. It is from 20% by weight, more preferably 0.5% by weight to 10% by weight, and particularly preferably 1% by weight to 7% by weight.
- the acrylic pressure-sensitive adhesive may contain any suitable additive, if necessary.
- the additive include a cross-linking agent, a tackifier, a plasticizer (for example, a trimellitic acid ester-based plasticizer, a pyromellitic acid ester-based plasticizer, etc.), a pigment, a dye, a filler, an antiaging agent, and a conductive material.
- a plasticizer for example, a trimellitic acid ester-based plasticizer, a pyromellitic acid ester-based plasticizer, etc.
- a pigment for example, a trimellitic acid ester-based plasticizer, a pyromellitic acid ester-based plasticizer, etc.
- a pigment for example, a trimellitic acid ester-based plasticizer, a pyromellitic acid ester-based plasticizer, etc.
- a dye for example, a trimellitic acid ester-based plasticizer, a pyromellitic acid ester-based plastic
- cross-linking agent contained in the acrylic pressure-sensitive adhesive examples include an isocyanate-based cross-linking agent, an epoxy-based cross-linking agent, a melamine-based cross-linking agent, a peroxide-based cross-linking agent, a urea-based cross-linking agent, and a metal alkoxide-based cross-linking agent.
- examples thereof include metal chelate-based cross-linking agents, metal salt-based cross-linking agents, carbodiimide-based cross-linking agents, oxazoline-based cross-linking agents, aziridine-based cross-linking agents, and amine-based cross-linking agents.
- an isocyanate-based cross-linking agent or an epoxy-based cross-linking agent is preferable.
- isocyanate-based cross-linking agent contained in the acrylic pressure-sensitive adhesive include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; alicyclics such as cyclopentylene diisocyanate, cyclohexylene diisocyanate, and isophorone diisocyanate.
- isocyanates aromatic isocyanates such as 2,4-tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane / tolylene diisocyanate trimer adduct (manufactured by Nippon Polyurethane Industry Co., Ltd., product) Name "Coronate L”), Trimethylol propane / hexamethylene diisocyanate trimeric adduct (manufactured by Nippon Polyurethane Industry Co., Ltd., trade name "Coronate HL”), isocyanurate of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry Co., Ltd., product) Isocyanate adducts such as the name "Coronate HX”); etc.
- aromatic isocyanates such as 2,4-tolylene diisocyanate, 4,4'-diphenylmethane
- the content of the isocyanate-based cross-linking agent can be set to an arbitrary appropriate amount according to the desired adhesive strength, and is typically 0.1 part by weight to 20 parts by weight with respect to 100 parts by weight of the base polymer. It is more preferably 0.5 parts by weight to 10 parts by weight.
- Examples of the epoxy-based cross-linking agent contained in the acrylic pressure-sensitive adhesive include N, N, N', N'-tetraglycidyl-m-xylene diamine, diglycidyl aniline, and 1,3-bis (N, N-).
- the content of the epoxy-based cross-linking agent can be set to an arbitrary appropriate amount according to the desired adhesive strength, and is typically 0.01 parts by weight to 10 parts by weight with respect to 100 parts by weight of the base polymer. It is more preferably 0.03 part by weight to 5 parts by weight.
- any appropriate pressure-sensitive adhesive is used.
- a tackifier resin is used.
- the tackifier resin include rosin-based tackifier resins (eg, unmodified rosin, modified rosin, rosinphenol-based resins, rosin ester-based resins, etc.) and terpene-based tackifier resins (eg, terpene-based resins, terpenes).
- Phenolic resins styrene-modified terpene resins, aromatic-modified terpene resins, hydrogenated terpene resins
- hydrocarbon-based tackifier resins eg, aliphatic hydrocarbon resins, aliphatic cyclic hydrocarbon resins, aromatics
- Hydrocarbon resins for example, styrene resins, xylene resins, etc.
- aliphatic / aromatic petroleum resins for example, styrene resins, xylene resins, etc.
- aliphatic / aromatic petroleum resins aliphatic / alicyclic petroleum resins, hydrogenated hydrocarbon resins, kumaron resins, kumaron indens Resins, etc.
- phenol-based tackifier resins eg, alkylphenol-based resins, xyleneformaldehyde-based resins, resoles, novolak, etc.
- a rosin-based tackifier resin a terpene-based tackifier resin, or a hydrocarbon-based tackifier resin (styrene-based resin, etc.) is preferable.
- the tackifier may be used alone or in combination of two or more.
- the amount of the tackifier added is preferably 5 parts by weight to 100 parts by weight, and more preferably 10 parts by weight to 50 parts by weight with respect to 100 parts by weight of the base polymer.
- a resin having a high softening point or a glass transition temperature (Tg) is used as the tackifier resin.
- Tg glass transition temperature
- a resin having a high softening point or glass transition temperature (Tg) By using a resin having a high softening point or glass transition temperature (Tg), a pressure-sensitive adhesive layer capable of exhibiting high adhesiveness is formed even in a high-temperature environment (for example, in a high-temperature environment during processing during semiconductor chip encapsulation). can do.
- the softening point of the tackifier is preferably 100 ° C. to 180 ° C., more preferably 110 ° C. to 180 ° C., and even more preferably 120 ° C. to 180 ° C.
- the glass dislocation temperature (Tg) of the tackifier is preferably 100 ° C. to 180 ° C., more preferably 110 ° C. to 180 ° C., and even more preferably 120 ° C. to 180 ° C.
- the acrylic pressure-sensitive adhesive may further contain a reaction aid.
- a reaction aid By adding the reaction aid, it is expected that the effect of preventing the adhesive residue due to the cohesive failure of the pressure-sensitive adhesive when the pressure-sensitive adhesive sheet is peeled off after resin sealing is further improved.
- an isocyanate-based cross-linking agent for example, a tin-based organic compound, a titanium-based organic compound, an iron-based organic compound, an amine (TEDA, etc.) -based organic compound and the like are used.
- a tin-based organic compound examples thereof include "OL-1" manufactured by Tokyo Fine Chemicals Co., Ltd. and "Tetraethylenediamine” manufactured by Tosoh Co., Ltd.
- the content ratio of the reaction aid is preferably 0.001 part by weight to 0.5 part by weight, more preferably 0.005 part by weight to 0.1 part by weight, based on 100 parts by weight of the base polymer. More preferably, it is 0.01 parts by weight to 0.07 parts by weight.
- any suitable pressure-sensitive adhesive can be used as long as the effects of the present invention can be obtained.
- the rubber-based pressure-sensitive adhesive include natural rubber; polyisoprene rubber, butadiene rubber, styrene-butadiene (SB) rubber, styrene-isoprene (SI) rubber, styrene-isoprene-styrene block copolymer (SIS) rubber, and styrene.
- SBS styrene-ethylene-butylene-styrene block copolymer
- SEBS styrene-ethylene-butylene-styrene block copolymer
- SEPS styrene-ethylene-propylene-styrene block copolymer
- SEP block copolymer
- Polyisobutylene rubber, polyisoprene rubber or butyl rubber is particularly preferably used as the base polymer constituting the rubber-based pressure-sensitive adhesive. By using these rubbers, it is possible to form an adhesive layer having excellent semiconductor chip retention at room temperature and excellent peelability. In addition, a pressure-sensitive adhesive layer having a low affinity with the sealing material can be formed.
- styrene / ethylene / propylene block copolymer (SEP) rubber As the base polymer constituting the rubber-based pressure-sensitive adhesive, styrene / ethylene / propylene block copolymer (SEP) rubber, styrene / ethylene / butylene / styrene block copolymer (SEBS) rubber, styrene / isoprene / styrene block co-weight.
- SIS styrene-butadiene-styrene block copolymer
- propylene rubber may also be preferably used.
- the base polymer (rubber) having a styrene-derived structural unit the content ratio of the styrene-derived structural unit is preferably 15% by weight or more with respect to all the structural units in the base polymer.
- the rubber-based pressure-sensitive adhesive may contain any suitable additive, if necessary.
- the additive include a cross-linking agent, a vulcanizing agent, a tackifier, a plasticizer, a pigment, a dye, a filler, an antiaging agent, a conductive material, an antistatic agent, an ultraviolet absorber, a light stabilizer, and peeling adjustment.
- the additive include agents, softeners, surfactants, flame retardants, antioxidants and the like.
- any appropriate pressure-sensitive adhesive is used.
- a tackifier resin is used.
- the tackifier resin include rosin-based tackifier resins, rosin derivative resins, petroleum-based resins, terpene-based resins, and ketone-based resins.
- the amount of the tackifier added is preferably 5 parts by weight to 100 parts by weight, and more preferably 10 parts by weight to 50 parts by weight with respect to 100 parts by weight of the base polymer.
- the rosin-based resin contained in the rubber-based pressure-sensitive adhesive examples include gum rosin, wood rosin, and tall rosin.
- the rosin-based resin stabilized rosin obtained by disproportionating or hydrogenating any suitable rosin may be used.
- the rosin-based resin it was obtained by modifying a polymerized rosin, which is a multimer (typically a dimer) of an arbitrary appropriate rosin, or an arbitrary appropriate rosin (for example, modification with an unsaturated acid). Modified rosin may be used.
- Examples of the rosin derivative resin contained in the rubber-based pressure-sensitive adhesive include an esterified product of the rosin-based resin, a phenol-modified product of the rosin-based resin, and an esterified product of the phenol-modified rosin-based resin.
- Examples of the petroleum-based resin contained in the rubber-based pressure-sensitive adhesive include aliphatic petroleum resins, aromatic petroleum resins, copolymer petroleum resins, alicyclic petroleum resins, and hydrides thereof. ..
- terpene resin contained in the rubber adhesive examples include ⁇ -pinene resin, ⁇ -pinene resin, aromatic-modified terpene resin, and terpene phenol resin.
- Examples of the ketone resin contained in the rubber-based pressure-sensitive adhesive include a ketone resin obtained by condensing ketones (for example, an aliphatic ketone or an alicyclic ketone) with formaldehyde.
- Examples of the cross-linking agent contained in the rubber-based pressure-sensitive adhesive include isocyanate-based cross-linking agents.
- Examples of the vulcanizing agent contained in the rubber-based pressure-sensitive adhesive include a sulfur-based vulcanizing agent, a quinoid-based vulcanizing agent, and a quinone-dioxime-based vulcanizing agent. If the rubber-based pressure-sensitive adhesive contains a cross-linking agent and / or a vulcanizing agent, a pressure-sensitive adhesive layer having high cohesiveness and less adhesive residue can be formed.
- the total content of the cross-linking agent and the vulcanizing agent is typically 0.1 parts by weight to 20 parts by weight, more preferably 0.1 parts by weight to 10 parts by weight, based on 100 parts by weight of the base polymer. be.
- a rubber-based pressure-sensitive adhesive (Rub1) containing the base polymer (rubber), a hydroxyl group-containing polyolefin, and a cross-linking agent a capable of reacting with the hydroxyl group of the hydroxyl group polyolefin is used.
- the base polymer is not directly crosslinked, but the base polymer and the crosslinked hydroxyl group-containing polyolefin are entangled, so that so-called pseudo-crosslinking is performed.
- a pressure-sensitive adhesive layer having high cohesiveness and less adhesive residue can be formed.
- the base polymer (rubber) used in this embodiment the above-mentioned synthetic rubber is preferably used.
- an isocyanate-based cross-linking agent is preferably used as the base polymer (rubber) used in this embodiment.
- the blending amount of the hydroxyl group-containing polyolefin is preferably 0.5 parts by weight or more, more preferably 1 part by weight, based on 100 parts by weight of the total of the base polymer (rubber), the hydroxyl group-containing polyolefin and the cross-linking agent a. It is 0.0 parts by weight or more. Within such a range, a highly cohesive pressure-sensitive adhesive layer can be formed. Further, when the pressure-sensitive adhesive sheet includes a base material layer, the adhesiveness (anchoring force) between the base material layer and the pressure-sensitive adhesive layer can be enhanced. That is, when the blending amount of the hydroxyl group-containing polyolefin is in the above range, an adhesive sheet with a small amount of adhesive residue can be obtained.
- the blending amount of the cross-linking agent a is preferably 0.5 parts by weight or more, more preferably 1 part by weight, based on 100 parts by weight of the total of the base polymer (rubber), the hydroxyl group-containing polyolefin and the cross-linking agent a. It is 0.0 parts by weight or more. Within such a range, a highly cohesive pressure-sensitive adhesive layer can be formed. Further, when the pressure-sensitive adhesive sheet includes a base material layer, the adhesiveness (anchoring force) between the base material layer and the pressure-sensitive adhesive layer can be enhanced. That is, if the blending amount of the cross-linking agent a is in the above range, an adhesive sheet with a small amount of adhesive residue can be obtained.
- hydroxyl group-containing polyolefin a resin having excellent compatibility with the synthetic rubber is preferably used.
- the hydroxyl group-containing polyolefin include polyethylene-based polyols, polypropylene-based polyols, polybutadiene polyols, hydrogenated polybutadiene polyols, polyisoprene polyols, and hydrogenated polyisoprene polyols.
- hydrogenated polyisoprene polyols, polyisoprene polyols, and polybutadiene polyols are preferable from the viewpoint of compatibility with the synthetic rubber.
- the number average molecular weight (Mn) of the hydroxyl group-containing polyolefin is preferably 500 to 500,000, more preferably 1,000 to 200,000, and further preferably 1,200 to 150,000.
- the number average molecular weight can be measured according to ASTM D2503.
- the hydroxyl value (mgKOH / g) of the hydroxyl group-containing polyolefin is preferably 5 to 95, more preferably 10 to 80.
- the hydroxyl value can be measured according to JIS K1557: 1970.
- silicone-based pressure-sensitive adhesive any suitable pressure-sensitive adhesive can be used as long as the effects of the present invention can be obtained.
- a silicone-based pressure-sensitive adhesive for example, a silicone-based pressure-sensitive adhesive containing a silicone rubber containing an organopolysiloxane or a silicone resin as a base polymer is preferably used.
- a base polymer constituting the silicone-based pressure-sensitive adhesive a base polymer obtained by cross-linking the above-mentioned silicone rubber or silicone resin may be used.
- sicone rubber means a polymer (for example, viscosity 1000Pa ⁇ s) in which diorganosiloxane (D unit) as a main component is linearly connected, and is "silicone resin”.
- D unit diorganosiloxane
- Sicone resin means a polymer composed of triorganosylhemioxane (M unit) and silicate (Q unit) as main components
- silicone rubber examples include organopolysiloxane containing dimethylsiloxane as a constituent unit.
- a functional group for example, a vinyl group
- the weight average molecular weight of the organopolysiloxane is preferably 100,000 to 1,000,000, more preferably 150,000 to 500,000.
- the weight average molecular weight can be measured by GPC (solvent: THF).
- silicone resin examples include an organopolysiloxane containing at least one structural unit selected from R 3 SiO 1/2 structural unit, SiO 2 structural unit, RSiO 3/2 structural unit and R 2 SiO structural unit. (R is a monovalent hydrocarbon group or hydroxyl group).
- the above silicone rubber and silicone resin can be used in combination.
- the weight ratio (rubber: resin) of the silicone rubber to the silicone resin in the silicone adhesive is preferably 100: 0 to 100: 220, more preferably 100: 0 to 100: 180, and further preferably 100: It is 10 to 100: 100.
- the silicone rubber and the silicone resin may be contained in the silicone-based pressure-sensitive adhesive as a mere mixture, or may be contained in the silicone-based pressure-sensitive adhesive in the form of a partial condensation of the silicone rubber and the silicone resin.
- the rubber: resin ratio can also be determined from the ratio of the Q unit (resin) and the D unit (rubber) obtained by measuring the composition of the silicone pressure-sensitive adhesive by 29 Si-NMR.
- the silicone-based pressure-sensitive adhesive may contain any suitable additive, if necessary.
- the additive include a cross-linking agent, a vulcanizing agent, a tackifier, a plasticizer, a pigment, a dye, a filler, an antiaging agent, a conductive material, an antistatic agent, an ultraviolet absorber, a light stabilizer, and peeling adjustment.
- the additive include agents, softeners, surfactants, flame retardants, antioxidants and the like.
- the silicone-based pressure-sensitive adhesive contains a cross-linking agent.
- the cross-linking agent include a siloxane-based cross-linking agent and a peroxide-based cross-linking agent.
- the peroxide-based cross-linking agent any suitable cross-linking agent can be used.
- the peroxide-based cross-linking agent include benzoyl peroxide, t-butylperoxybenzoate, and dicumyl peroxide.
- the siloxane-based cross-linking agent include polyorganohydrogensiloxane.
- the polyorganohydrogensiloxane preferably has two or more hydrogen atoms bonded to silicon atoms. Further, the polyorganohydrogensiloxane preferably has an alkyl group, a phenyl group, or an alkyl halide group as a functional group bonded to a silicon atom.
- an active energy ray-curable pressure-sensitive adhesive that can be cured (increased elastic modulus) by irradiation with active energy rays may be used. If an active energy ray-curable adhesive is used, an adhesive sheet that has low elasticity, high flexibility, and excellent handleability at the time of sticking, and can reduce the adhesive force by irradiating with active energy rays in situations where peeling is required, can be obtained. Obtainable.
- the active energy ray examples include gamma ray, ultraviolet ray, visible ray, infrared ray (heat ray), radio wave, alpha ray, beta ray, electron beam, plasma flow, ionization ray, particle beam and the like.
- the term "adhesive layer” means a pressure-sensitive adhesive layer before the pressure-sensitive adhesive is cured and the adhesive strength is lowered.
- Examples of the resin material constituting the active energy ray-curable pressure-sensitive adhesive include an ultraviolet curing system (written by Kiyomi Kato, published by the General Technology Center, (1989)), a photocuring technology (edited by the Technical Information Association (2000)), and the like. Examples thereof include resin materials described in JP-A-2003-292916, Patent No. 4151850 and the like. More specifically, a resin material (R1) containing a polymer serving as a base material and an active energy ray-reactive compound (monomer or oligomer), a resin material (R2) containing an active energy ray-reactive polymer, and the like can be mentioned.
- polymer serving as the base material examples include natural rubber, polyisobutylene rubber, styrene / butadiene rubber, styrene / isoprene / styrene block copolymer rubber, recycled rubber, butyl rubber, polyisobutylene rubber, and nitrile rubber (NBR).
- NBR nitrile rubber
- examples include rubber-based polymers; silicone-based polymers; acrylic-based polymers. These polymers may be used alone or in combination of two or more.
- the polymer serving as the base material preferably, the polymer exemplified as the base polymer of the acrylic pressure-sensitive adhesive, the rubber-based pressure-sensitive adhesive or the silicone-based pressure-sensitive adhesive can be preferably used from the viewpoint of compatibility with the sealing material.
- the active energy ray-reactive compound examples include a photoreactive monomer or oligomer having a functional group having a carbon-carbon multiple bond such as an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, and an acetylene group.
- Specific examples of the photoreactive monomer or oligomer include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, and dipenta.
- the active energy ray-reactive compound a monomer such as epoxidized butadiene, glycidyl methacrylate, acrylamide, vinyl siloxane; or an oligomer composed of the monomer may be used.
- the resin material (R1) containing these compounds can be cured by high-energy rays such as ultraviolet rays and electron beams.
- the active energy ray-reactive compound a mixture of an organic salt such as an onium salt and a compound having a plurality of heterocycles in the molecule may be used.
- the organic salt is cleaved by irradiation with active energy rays (for example, ultraviolet rays and electron beams) to generate ions, which act as a starting species to induce a ring-opening reaction of a heterocycle to form a three-dimensional network structure.
- active energy rays for example, ultraviolet rays and electron beams
- examples of the organic salts include iodonium salt, phosphonium salt, antimonium salt, sulfonium salt, borate salt and the like.
- the heterocycle in the compound having a plurality of heterocycles in the molecule include oxylane, oxetane, oxolane, thiirane, and aziridine.
- the content ratio of the active energy ray-reactive compound is preferably 0. It is 1 part by weight to 500 parts by weight, more preferably 1 part by weight to 300 parts by weight, and further preferably 10 parts by weight to 200 parts by weight. Within such a range, an adhesive layer having a low affinity with the sealing material can be formed.
- the resin material (R1) containing the polymer serving as the base material and the active energy ray-reactive compound may contain any suitable additive, if necessary.
- the additive include an active energy ray polymerization initiator, an active energy ray polymerization accelerator, a cross-linking agent, a plasticizer, a vulcanizing agent and the like.
- the active energy ray polymerization initiator any suitable initiator can be used depending on the type of active energy ray to be used.
- the active energy ray polymerization initiator may be used alone or in combination of two or more.
- the content ratio of the active energy ray polymerization initiator is preferably 0.1 with respect to 100 parts by weight of the polymer as the base material. It is 10 parts by weight to 10 parts by weight, and more preferably 1 part by weight to 5 parts by weight.
- the active energy ray-reactive polymer examples include polymers having a functional group having a carbon-carbon multiple bond such as an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, and an acetylene group.
- Specific examples of the polymer having an active energy ray-reactive functional group include a polymer composed of a polyfunctional (meth) acrylate.
- the polymer composed of the polyfunctional (meth) acrylate preferably has an alkyl ester having 4 or more carbon atoms, more preferably has an alkyl ester having 6 or more carbon atoms, and an alkyl having 8 or more carbon atoms.
- an ester it is particularly preferable to have an alkyl ester having 8 to 20 carbon atoms, and most preferably to have an alkyl ester having 8 to 18 carbon atoms.
- a polymer having a long side chain can be used to form a pressure-sensitive adhesive layer that has a low affinity for the encapsulating material.
- the content ratio of the structural unit having an alkyl ester having 4 or more carbon atoms as a side chain is preferably 30% by weight or more, more preferably 50% by weight, based on all the structural units constituting the polymer. % Or more, more preferably 70% by weight to 100% by weight, and particularly preferably 80% by weight to 100% by weight. Within such a range, an adhesive layer having a low affinity with the sealing material can be formed.
- the resin material (R2) containing the active energy ray-reactive polymer may further contain the active energy ray-reactive compound (monomer or oligomer).
- the resin material (R2) containing the active energy ray-reactive polymer may contain any suitable additive, if necessary. Specific examples of the additive are the same as those of the additive that can be contained in the resin material (R1) containing the polymer as the base material and the active energy ray-reactive compound.
- the content ratio of the active energy ray polymerization initiator is preferably 0.1 part by weight to 10 parts by weight with respect to 100 parts by weight of the active energy ray-reactive polymer. It is more preferably 1 part by weight to 5 parts by weight.
- Base material examples include resin sheets, non-woven fabrics, papers, metal foils, woven fabrics, rubber sheets, foam sheets, and laminates thereof (particularly, laminates containing resin sheets).
- the resin constituting the resin sheet include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), polyethylene (PE), polypropylene (PP), ethylene-propylene copolymer, and ethylene-.
- Vinyl acetate copolymer (EVA), polyamide (nylon), total aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyphenylene sulfide (PPS), fluororesin, polyether ether ketone (PEEK) ) Etc.
- EVA Vinyl acetate copolymer
- nylon polyamide
- aramid total aromatic polyamide
- PI polyimide
- PVC polyvinyl chloride
- PPS polyphenylene sulfide
- fluororesin polyether ether ketone
- Etc. Polyether ether ketone
- the non-woven fabric include non-woven fabrics made of natural fibers having heat resistance such as non-woven fabrics containing Manila hemp; synthetic resin non-woven fabrics such as polypropylene resin non-woven fabrics, polyethylene resin non-woven fabrics and ester resin non-woven fabrics.
- the metal foil include copper foil, stainless steel foil, aluminum foil and the like.
- paper include Japanese paper and kraft paper.
- the thickness of the base material can be set to an arbitrary appropriate thickness according to the desired strength or flexibility, the purpose of use, and the like.
- the thickness of the base material is preferably 1000 ⁇ m or less, more preferably 1 ⁇ m to 1000 ⁇ m, further preferably 1 ⁇ m to 500 ⁇ m, particularly preferably 3 ⁇ m to 300 ⁇ m, and most preferably 5 ⁇ m to 250 ⁇ m.
- the base material may be surface-treated.
- the surface treatment include corona treatment, chromic acid treatment, ozone exposure, flame exposure, high-voltage impact exposure, ionizing radiation treatment, coating treatment with an undercoat agent, and the like.
- the organic coating material examples include the materials described in Plastic Hard Coat Material II (CMC Publishing, (2004)).
- Urethane-based polymers are preferably used, and polyacrylic urethane, polyester urethane, or precursors thereof are more preferably used. This is because it is easy to apply and apply to the base material, and various types can be industrially selected and obtained at low cost.
- the urethane-based polymer is, for example, a polymer composed of a reaction mixture of an isocyanato monomer and an alcoholic hydroxyl group-containing monomer (for example, a hydroxyl group-containing acrylic compound or a hydroxyl group-containing ester compound).
- the organic coating material may contain a chain extender such as polyamine, an antiaging agent, an oxidation stabilizer and the like as optional additives.
- the thickness of the organic coating layer is not particularly limited, but for example, about 0.1 ⁇ m to 10 ⁇ m is suitable, about 0.1 ⁇ m to 5 ⁇ m is preferable, and about 0.5 ⁇ m to 5 ⁇ m is more preferable.
- the second adhesive layer can be an adhesive layer composed of any suitable adhesive.
- the second pressure-sensitive adhesive layer further comprises thermally expandable microspheres.
- the pressure-sensitive adhesive contained in the second pressure-sensitive adhesive layer may be a curable pressure-sensitive adhesive (for example, an active energy ray-curable pressure-sensitive adhesive) or a pressure-sensitive pressure-sensitive adhesive.
- a curable pressure-sensitive adhesive for example, an active energy ray-curable pressure-sensitive adhesive
- a pressure-sensitive pressure-sensitive adhesive examples include an acrylic pressure-sensitive adhesive and a rubber-based pressure-sensitive adhesive. As these pressure-sensitive adhesives, the pressure-sensitive adhesives described in Section B can be used.
- any suitable heat-expandable microsphere can be used as long as it is a microsphere that can expand or foam by heating.
- a microsphere in which a substance that easily expands by heating is contained in an elastic shell can be used.
- Such a heat-expandable microsphere can be produced by any suitable method, for example, a coacervation method, an interfacial polymerization method, or the like.
- substances that easily expand by heating include propane, propylene, butene, normal butane, isobutane, isopentane, neopentane, normal pentane, normal hexane, isohexane, heptane, octane, petroleum ether, methane halide, and tetraalkylsilane.
- Low boiling point liquids such as; azodicarboxylic amides that are gasified by thermal decomposition; and the like.
- nitrile monomers such as acrylonitrile, methacrylonitrile, ⁇ -chloroacrylonitrile, ⁇ -ethoxyacrylonitrile, and fumaronitrile; acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
- Carboxylic acid monomers such as citraconic acid; vinylidene chloride; vinyl acetate; methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, (Meta) acrylic acid esters such as isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, ⁇ -carboxyethyl acrylate; styrene monomers such as styrene, ⁇ -methylstyrene, chlorostyrene; acrylamide, substituted acrylamide , Acrylate monomers such as methacrylicamide and substituted methacrylicamide; and the like.
- the polymer composed of these monomers may be a homopolymer or a copolymer.
- the copolymer include vinylidene chloride-methyl methacrylate-acrylonitrile copolymer, methyl methacrylate-acrylonitrile-methacrylonitrile copolymer, methyl methacrylate-acrylonitrile copolymer, and acrylonitrile-methacrylonitrile-itaconic acid. Examples include copolymers.
- An inorganic foaming agent or an organic foaming agent may be used as the heat-expandable microspheres.
- the inorganic foaming agent include ammonium carbonate, ammonium hydrogencarbonate, sodium hydrogencarbonate, ammonium nitrite, sodium boron hydroxide, and various azides.
- the organic foaming agent include salt fluoride alkane compounds such as trichloromonofluoromethane and dichloromonofluoromethane; and azo compounds such as azobisisobutyronitrile, azodicarboxylicamide, and barium azodicarboxylate.
- Hydrazide compounds such as paratoluenesulfonyl hydrazide, diphenylsulfone-3,3'-disulfonylhydrazide, 4,4'-oxybis (benzenesulfonylhydrazide), allylbis (sulfonylhydrazide); p-toluylenesulfonyl semicarbazide, 4, Semicarbazide compounds such as 4'-oxybis (benzenesulfonyl semicarbazide); triazole compounds such as 5-morpholyl-1,2,3,4-thiatriazole; N, N'-dinitrosopentamethylenetetramine, N, N' Examples thereof include N-nitroso compounds such as -dimethyl-N, N'-dinitrosoterephthalamide; and the like.
- the particle size of the heat-expandable microspheres before heating is preferably 0.5 ⁇ m to 80 ⁇ m, more preferably 5 ⁇ m to 45 ⁇ m, still more preferably 10 ⁇ m to 20 ⁇ m, and particularly preferably 10 ⁇ m to 15 ⁇ m. .. Therefore, the average particle size of the heat-expandable microspheres before heating is preferably 6 ⁇ m to 45 ⁇ m, and more preferably 15 ⁇ m to 35 ⁇ m.
- the above particle size and average particle size are values obtained by the particle size distribution measurement method in the laser scattering method.
- the heat-expandable microspheres preferably have an appropriate strength that does not burst until the coefficient of thermal expansion is preferably 5 times or more, more preferably 7 times or more, and even more preferably 10 times or more.
- the adhesive strength can be efficiently reduced by the heat treatment.
- the content ratio of the heat-expandable microspheres in the pressure-sensitive adhesive layer can be appropriately set according to the desired decrease in adhesive strength and the like.
- the content ratio of the heat-expandable microspheres is, for example, 1 part by weight to 150 parts by weight, preferably 10 parts by weight to 130 parts by weight, based on 100 parts by weight of the base polymer forming the second pressure-sensitive adhesive layer. More preferably, it is 25 parts by weight to 100 parts by weight.
- the arithmetic surface roughness Ra of the pressure-sensitive adhesive layer before the heat-expandable microspheres expand is preferably 500 nm or less, more preferably. Is 400 nm or less, more preferably 300 nm or less. Within such a range, an adhesive sheet having excellent adhesion to the adherend can be obtained.
- the pressure-sensitive adhesive layer having excellent surface smoothness can be obtained by, for example, setting the thickness of the pressure-sensitive adhesive layer within the above range, or by applying the pressure-sensitive adhesive layer to a separator and transferring the pressure-sensitive adhesive layer when another pressure-sensitive adhesive layer is provided. Obtainable.
- the other pressure-sensitive adhesive layer may contain thermally expandable microspheres. Even when another pressure-sensitive adhesive layer contains heat-expandable microspheres, the arithmetic surface roughness Ra of the pressure-sensitive adhesive layer is preferably in the above range.
- the pressure-sensitive adhesive layer contains thermally expandable microspheres
- the pressure-sensitive adhesive layer is composed of a base polymer having a dynamic storage elastic modulus in the range of 5 kPa to 1 MPa (more preferably 10 kPa to 0.8 MPa) at 80 ° C. It is preferable to include a pressure-sensitive adhesive. With such an adhesive layer, it is possible to form an adhesive sheet which has an appropriate adhesiveness before heating and whose adhesive strength tends to decrease by heating.
- the dynamic storage elastic modulus can be measured by using a dynamic viscoelasticity measuring device (for example, trade name "ARES" manufactured by Leometrics Co., Ltd.) under measurement conditions of a frequency of 1 Hz and a heating rate of 10 ° C./min. ..
- the adhesive sheet of the present invention can be produced by any suitable method.
- the pressure-sensitive adhesive sheet of the present invention is, for example, a method of directly coating a composition containing an adhesive on a substrate, or a coating formed by coating a composition containing an adhesive on an arbitrary suitable substrate. Examples thereof include a method of transferring the layer to the substrate.
- the composition containing the pressure-sensitive adhesive may contain any suitable solvent.
- a composition containing the heat-expandable microspheres, a pressure-sensitive adhesive, and an arbitrary suitable solvent is applied to a base material to form the pressure-sensitive adhesive layer.
- the heat-expandable microspheres are embedded in the pressure-sensitive adhesive using a laminator or the like to form a pressure-sensitive adhesive layer containing the heat-expandable microspheres. It may be formed.
- any appropriate coating method can be adopted as the coating method of the adhesive and each composition. For example, it can be applied and then dried to form each layer.
- the coating method include a coating method using a multi-coater, a die coater, a gravure coater, an applicator, and the like.
- the drying method include natural drying and heat drying. The heating temperature for heat-drying can be set to any suitable temperature depending on the characteristics of the substance to be dried.
- the sp value of the polymer in the pressure-sensitive adhesive layer after the pressure-sensitive adhesive sheet is formed is determined by the Fedors method (Hideki Yamamoto, "Sp value basics / applications and calculation methods", Information Organization Publishing Co., Ltd., 2006. Calculated according to (published on April 3, 2014, pages 66-67). Specifically, the sp value is the evaporation energy ⁇ e (cal) of each atom or atomic group forming the polymer at 25 ° C. and the molar volume ⁇ V (cm 3 ) of each atom or atomic group forming the polymer at 25 ° C. ) And, it was calculated by the following formula.
- the SP value ( ⁇ e / ⁇ v) 1/2
- the SP value is calculated as the SP value of each homopolymer of each structural unit constituting the copolymer, and each structural unit is assigned to each of these SP values. It is calculated by multiplying by the mole fraction of.
- an organic solvent such as dimethylformamide (DMF), acetone, methanol, and tetrahydrofuran (THF).
- the solvent-soluble moiety thus obtained can be recovered and obtained from gel filtration permeation chromatograph (GPC), nuclear magnetic resonance spectroscopy (NMR), infrared spectroscopy (IR), and mass analysis.
- GPC gel filtration permeation chromatograph
- NMR nuclear magnetic resonance spectroscopy
- IR infrared spectroscopy
- mass analysis mass analysis.
- the contact angle was measured using a contact angle meter (manufactured by Kyowa Interface Science Co., Ltd., trade name "CX-A type") in an atmosphere of 23 ° C. and 50% RH.
- CX-A type Adhesive strength against sealing resin
- Adhesive strength at 23 ° C. against the epoxy resin when the epoxy resin is cured on the pressure-sensitive adhesive layer A 0.6 mmt framed frame spacer (inner size 100 mm x 100 mm) was placed on the surface of the adhesive layer of the adhesive sheet (size: 125 mm x 125 mm) obtained in Examples and Comparative Examples, and granules were placed inside the spacer.
- the above epoxy sealing resin (G730 manufactured by Sumitomo Bakelite Co., Ltd.) is sprayed so that the resin thickness after curing is 0.6 mmt, covered with a release liner having a silicone treatment, and then evaluated using a vacuum compression molding machine.
- the sample was compression-molded at 150 ° C. for 600 seconds at 0.3 Mpa, and then heated at 150 ° C. for 1 hour to be cured to form a sealing resin in the form of an adhesive sheet of an adhesive sheet to form a structure.
- the structure obtained as described above was cooled, and then a sample (width 20 mm ⁇ length 100 mm) was cut out from the structure, and the pressure-sensitive adhesive sheet was peeled off from the sample by a tensile tester.
- a 5 mm ⁇ 5 mm silicon chip (mirror surface) was vertically attached to the surface of the pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet with tweezers so that the tip angle was not applied to the surface layer of the pressure-sensitive adhesive. Then, it was heated at 130 ° C. for 30 minutes and brought into close contact with the surface of the silicon chip adhesive to prepare a sample for evaluation.
- a measurement terminal was set on the side surface of a 5 mm ⁇ 5 mm silicon chip at a height of 250 ⁇ m from the sticking surface using a Nordson Dage 4000 under an environmental temperature of 150 ° C., and a shear rate of 500 ⁇ m / sec.
- isocyanate-based cross-linking agent manufactured by Nippon Polyurethane Industry Co., Ltd., trade name "Coronate L
- reaction aid manufactured by Tokyo Fine Chemical Co., Ltd., trade name "OM-5"
- composition for forming an adhesive layer is applied to one side of a polytetrafluoroethylene film (manufactured by Toray Industries, Inc., trade name "Lumilar S10", thickness 38 ⁇ m) as a base material, and the base material and the pressure-sensitive adhesive layer (thickness) are coated.
- An adhesive sheet composed of 5 ⁇ m) was obtained.
- the obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- Example 2 A composition for forming a pressure-sensitive adhesive layer was prepared by further blending 10 parts by weight of a terpene phenol-based pressure-sensitive adhesive resin (manufactured by Sumitomo Bakelite Co., Ltd., trade name "Sumilite Resin PR51732") without adding a reaction aid. Obtained an adhesive sheet in the same manner as in Example 1. The obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- Example 3 A composition for forming a pressure-sensitive adhesive layer was prepared by further blending 20 parts by weight of a terpene phenol-based pressure-sensitive adhesive resin (manufactured by Yasuhara Chemical Co., Ltd., trade name "YS Polystar S145") without adding a reaction aid to prepare a pressure-sensitive adhesive layer.
- An adhesive sheet was obtained in the same manner as in Example 1 except that the thickness of the adhesive was 10 ⁇ m. The obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- Example 4 A composition for forming a pressure-sensitive adhesive layer was prepared by further blending 20 parts by weight of a terpene phenol-based pressure-sensitive adhesive resin (manufactured by Yasuhara Chemical Co., Ltd., trade name "YS Polystar T145") without adding a reaction aid to prepare a pressure-sensitive adhesive layer.
- An adhesive sheet was obtained in the same manner as in Example 1 except that the thickness of the adhesive was 10 ⁇ m. The obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- epoxy-based cross-linking agent manufactured by Mitsubishi Gas Chemicals, trade name "Tetrad C
- terpenphenol-based adhesive-imparting resin manufactured by Sumitomo Bakelite, trade name
- composition for forming an adhesive layer is applied to one side of a polytetrafluoroethylene film (manufactured by Toray Industries, Inc., trade name "Lumilar S10", thickness 38 ⁇ m) as a base material, and the base material and the pressure-sensitive adhesive layer (thickness) are coated.
- An adhesive sheet composed of 10 ⁇ m) was obtained.
- the obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- a composition for forming an adhesive layer was prepared by mixing 3 parts by weight of the name "Coronate L") and 20 parts by weight of a rosin-based pressure-sensitive adhesive (manufactured by Arakawa Chemical Industry Co., Ltd., trade name "Pencel D125").
- composition for forming an adhesive layer is applied to one side of a polytetrafluoroethylene film (manufactured by Toray Industries, Inc., trade name "Lumilar S10", thickness 38 ⁇ m) as a base material, and the base material and the pressure-sensitive adhesive layer (thickness) are coated.
- An adhesive sheet composed of 10 ⁇ m) was obtained.
- the obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- reaction aid manufactured by Tokyo Fine Chemicals Co., Ltd., 0.05 parts by weight of product name "OL-1”
- isocyanate-based cross-linking agent manufactured by Nippon Polyurethane Industry
- composition for forming an adhesive layer is applied to one side of a polytetrafluoroethylene film (manufactured by Toray Industries, Inc., trade name "Lumilar S10", thickness 38 ⁇ m) as a base material, and the base material and the pressure-sensitive adhesive layer (thickness) are coated.
- An adhesive sheet composed of 10 ⁇ m) was obtained.
- the obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- composition for forming an adhesive layer is applied to one side of a polytetrafluoroethylene film (manufactured by Toray Industries, Inc., trade name "Lumilar S10", thickness 38 ⁇ m) as a base material, and the base material and the pressure-sensitive adhesive layer (thickness) are coated.
- An adhesive sheet composed of 10 ⁇ m) was obtained.
- the obtained adhesive sheet was subjected to the above evaluations (1) to (4). The results are shown in Table 1.
- FIG. 3 shows an SEM photograph of the observation surface in "(5) Cross-sectional observation of sealing resin" for Example 1 and Comparative Example 1.
- a resin layer containing a gray glass filler and a layer not containing a darker gray lath filler that is, an adhesive layer containing a mixed layer
- the comparative example only the resin layer containing the gray glass filler was observed.
- the results of Examples 2 to 6 were the same as those of Example 1. Further, in Comparative Example 2, the same result as in Comparative Example 1 was obtained.
- Base material Adhesive layer 30 Second adhesive layer 100, 200 Adhesive sheet
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Materials For Medical Uses (AREA)
Abstract
Description
1つの実施形態においては、上記粘着シートは、上記基材と、該基材の片側に配置された上記粘着剤層と、該基材の該粘着剤層とは反対側に配置された第2の粘着剤層とを備える。
1つの実施形態においては、上記粘着剤が、アクリル系粘着剤である。
1つの実施形態においては、上記アクリル系粘着剤が、ベースポリマーとして、側鎖として炭素数が6以下のアルキルエステルを有するベースポリマーを有し、該側鎖として炭素数が6以下のアルキルエステルを有する構成単位の含有割合が、該アクリル系ポリマーを構成する全構成単位に対して、50重量%以上である。
1つの実施形態においては、上記粘着剤層の4-ターシャリーブチルフェニルグリシジルエーテルに対する接触角が、47°以下である。
1つの実施形態においては、上記粘着剤層上でエポキシ樹脂を硬化させた際の該エポキシ樹脂に対する23℃における粘着力が、好ましくは8N/20mm以上である。
1つの実施形態においては、上記粘着剤層をシリコンチップに貼着した際の150℃におけるせん断接着力が、400g以上である。
図1は、本発明の1つの実施形態による粘着シートの概略断面図である。粘着シート100は、基材10と、基材10の少なくとも片側に配置された粘着剤層(第1の粘着剤層)20とを備える。
上記粘着剤層の厚みは、好ましくは1μm~300μmであり、より好ましくは2μm~300μmであり、さらに好ましくは2μm~200μmであり、さらに好ましくは3μm~100μmであり、さらに好ましくは4μm~80μmであり、特に好ましくは5μm~50μmである。このような範囲であれば、表面がフラットな粘着剤層が形成され、フローマークを生じさせがたい粘着シートを得ることができる。
上記粘着剤層を構成する粘着剤としては、本発明の効果が得られる限りにおいて、任意の適切な粘着剤が用いられ得る。該粘着剤としては、例えば、アクリル系粘着剤、ゴム系粘着剤、シリコーン系粘着剤等が挙げられる。なかでも、アクリル系粘着剤が好ましく用いられ得る。また、粘着剤として、活性エネルギー線硬化型粘着剤を用いてもよい。上記粘着剤は、sp値が上記範囲にあるベースポリマーを含む。なお、ベースポリマーとは、粘着剤の粘着性発現の要因となり得るポリマーを意味する。
Sp値=(ΣΔe/ΣΔv)1/2
ポリマーが共重合体である場合、そのSP値は、その共重合体を構成する各構成単位のそれぞれの単独共重合体のSP値を算出し、これらのSP値のそれぞれに各構成単位のモル分率を乗じたものを合算して算出される。
上記アクリル系粘着剤としては、例えば、(メタ)アクリル酸アルキルエステルの1種または2種以上を単量体成分として用いたアクリル系ポリマー(ホモポリマーまたはコポリマー)をベースポリマーとするアクリル系粘着剤等が挙げられる。
上記ゴム系粘着剤としては、本発明の効果が得られる限り、任意の適切な粘着剤が用いられ得る。上記ゴム系粘着剤として、例えば、天然ゴム;ポリイソプレンゴム、ブタジエンゴム、スチレン・ブタジエン(SB)ゴム、スチレン・イソプレン(SI)ゴム、スチレン・イソプレン・スチレンブロック共重合体(SIS)ゴム、スチレン・ブタジエン・スチレンブロック共重合体(SBS)ゴム、スチレン・エチレン・ブチレン・スチレンブロック共重合体(SEBS)ゴム、スチレン・エチレン・プロピレン・スチレンブロック共重合体(SEPS)ゴム、スチレン・エチレン・プロピレンブロック共重合体(SEP)ゴム、再生ゴム、ブチルゴム、ポリイソブチレンゴム、またはこれらの変性体等の合成ゴム;等をベースポリマーとするゴム系粘着剤が好ましく用いられる。これらのベースポリマー(ゴム)はsp値が低く、該ベースポリマーを用いれば、封止材料との親和性が低い粘着剤層を形成することができる。
上記シリコーン系粘着剤としては、本発明の効果が得られる限り、任意の適切な粘着剤が用いられ得る。上記シリコーン系粘着剤として、例えば、オルガノポリシロキサンを含むシリコーンゴムまたはシリコーンレジン等をベースポリマーとするシリコーン系粘着剤が好ましく用いられる。シリコーン系粘着剤を構成するベースポリマーとして、上記シリコーンゴムまたはシリコーンレジンを、架橋して得られたベースポリマーを用いてもよい。なお、本明細書において、「シリコーンゴム」とは、主成分としてのジオルガノシロキサン(D単位)が直鎖状に連なった重合体(例えば、粘度1000Pa・s)を意味し、「シリコーンレジン」とは、主成分としてのトリオルガノシルヘミオキサン(M単位)とシリケート(Q単位)から構成される重合体を意味する(「粘着剤(フィルム・テープ)の材料設計と機能性付与」、技術情報協会、2009年9月30日発刊)。
上記粘着剤として、活性エネルギー線の照射により硬化(高弾性率化)し得る活性エネルギー線硬化型粘着剤を用いてもよい。活性エネルギー線硬化型粘着剤を用いれば、貼り付け時には低弾性で柔軟性が高く取り扱い性に優れ、剥離を要する場面においては、活性エネルギー線を照射することにより粘着力を低下させ得る粘着シートを得ることができる。活性エネルギー線としては、例えば、ガンマ線、紫外線、可視光線、赤外線(熱線)、ラジオ波、アルファ線、ベータ線、電子線、プラズマ流、電離線、粒子線等が挙げられる。なお、本明細書において、単に「粘着剤層」という場合は、粘着剤が硬化して粘着力が低下する前の粘着剤層を意味する。
上記基材としては、例えば、樹脂シート、不織布、紙、金属箔、織布、ゴムシート、発泡シート、これらの積層体(特に、樹脂シートを含む積層体)等が挙げられる。樹脂シートを構成する樹脂としては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリブチレンテレフタレート(PBT)、ポリエチレン(PE)、ポリプロピレン(PP)、エチレン-プロピレン共重合体、エチレン-酢酸ビニル共重合体(EVA)、ポリアミド(ナイロン)、全芳香族ポリアミド(アラミド)、ポリイミド(PI)、ポリ塩化ビニル(PVC)、ポリフェニレンサルファイド(PPS)、フッ素系樹脂、ポリエーテルエーテルケトン(PEEK)等が挙げられる。不織布としては、マニラ麻を含む不織布等の耐熱性を有する天然繊維による不織布;ポリプロピレン樹脂不織布、ポリエチレン樹脂不織布、エステル系樹脂不織布等の合成樹脂不織布等が挙げられる。金属箔としては、銅箔、ステンレス箔、アルミニウム箔等が挙げられる。紙としては、和紙、クラフト紙等が挙げられる。
上記第2の粘着剤層は、任意の適切な粘着剤から構成される粘着剤層であり得る。1つの実施形態においては、上記のとおり、第2の粘着剤層は、熱膨張性微小球をさらに含む。
本発明の粘着シートは、任意の適切な方法により製造することができる。本発明の粘着シートは、例えば、基材上に直接、粘着剤を含む組成物を塗工する方法、または任意の適切な基体上に粘着剤を含む組成物を塗工し形成された塗工層を基材に転写する方法等が挙げられる。粘着剤を含む組成物は、任意の適切な溶媒を含み得る。
粘着シート形成後の粘着剤層中のポリマーのsp値を、フェドーズ(Fedors)の方法(山本秀樹著、「sp値 基礎・応用と計算方法」、株式会社情報機構出版、2006年4月3日発行、66~67ページ)により算出した。具体的には、該sp値は、ポリマーを形成する各原子または原子団の25℃における蒸発エネルギーΔe(cal)と、ポリマーを形成する各原子または原子団の25℃におけるモル容積ΔV(cm3)とから、以下の式により算出した。
Sp値=(ΣΔe/ΣΔv)1/2
また、ポリマーが共重合体である場合、そのSP値は、その共重合体を構成する各構成単位のそれぞれの単独共重合体のSP値を算出し、これらのSP値のそれぞれに各構成単位のモル分率を乗じたものを合算して算出される。
上記の場合、各構成単位の分析方法(ポリマーの組成分析)は、該粘着シートから粘着剤層だけを適宜採取し、ジメチルホルムアミド(DMF)、アセトン、メタノール、テトラヒドロフラン(THF)など有機溶媒に浸漬して得られる溶媒可溶部分を回収し、ゲルろ過浸透クロマトグラフ(GPC)、核磁気共鳴分光法(NMR)、赤外分光法(IR)、質量分析の分析方法から求めることができる。
(2)接触角
粘着シートを、粘着剤層が上になるようにしてスライドガラス上に置き、粘着剤層表面の4-ターシャリーブチルフェニルグリシジルエーテルに対する接触角を測定した。
粘着剤層表面に、4-ターシャリーブチルフェニルグリシジルエーテルを2μl滴下して5秒後の接触角を測定した(N=5)。接触角の測定は、接触角計(協和界面社製、商品名「CX-A型」)を用い、23℃、50%RHの雰囲気下で行った。
(3)対封止樹脂粘着力(粘着剤層上でエポキシ樹脂を硬化させた際の該エポキシ樹脂に対する23℃における粘着力)
実施例および比較例で得られた粘着シート(サイズ:125mm×125mm)の粘着剤層表面に0.6mmtの額縁状枠のスペーサー(内寸100mm×100mm)を配置し、該スペーサーの内側に顆粒上のエポキシ封止樹脂(住友ベークライト社製 G730)を硬化後の樹脂厚みが0.6mmtとなるように散布し、シリコーン処理を有する剥離ライナーをかぶせ、次いで真空圧縮成型機を用いて、該評価サンプルを150℃で600秒間、0.3Mpaで圧縮成形し、その後150℃で1時間加熱して硬化させ、粘着シートの粘着シート状に封止樹脂を形成させて、構造体を形成した。
上記のようにして得られた構造体を冷却し、その後、構造体からサンプル(幅20mm×長さ100mm)を切り出し、当該サンプルから粘着シートを引張試験機にて剥離した。引張試験機にサンプルをセットした後、23℃(常温)の環境温度下で30分間放置した。その後常温でテープを剥離した(300mm/min 180度ピール)際の試験力を耐封止樹脂粘着力とした。
(4)せん断接着力
実施例および比較例で得られた粘着シート(サイズ:20mm×20mm)を、粘着剤層とは反対側の面を所定の土台(例えば、20mm×20mmシリコンチップ)に日東電工株式会社製の両面テープNo.585を用いて貼り付けて固定し、該粘着シートの粘着剤層表面にピンセットにて5mm×5mmシリコンチップ(ミラー面)を粘着剤表面層にチップ角を当てないように垂直に貼付した。その後、130℃で30分間加熱してシリコンチップ粘着剤表面に密着させ評価用サンプルを作製した。
当該評価用サンプルについて、150℃の環境温度下で、Nordson社製dage4000を用い、貼り付け面からの高さ250μm位置で5mm×5mmシリコンチップの側面に測定端子をセットし、せん断速度500μm/sec.でチップと水平方向に外力を印加することで得られる荷重-変位曲線から、最大破壊荷重を読み取り、これを150℃環境温度下におけるせん断接着強度とした。
(5)封止樹脂の断面観察
実施例・比較例で得られた粘着シートの粘着剤層表面にガラスフィラー含有顆粒封止樹脂((住友ベークライト)社製 G730)を散布し、145℃×10min×0.3MPaの条件で加圧し、樹脂層を形成した。その後150℃×4h加熱後、常温に戻し、常温でテープを剥離した(300mm/min 180度ピール)。次いで、粘着テープが樹脂に貼り付いていた部分を切断し、断面をPt/Pd合金でスパッタを行った後に、SEM(日立社製「S-3400N」、印加電圧10kV、高真空、SEモード、1000倍)にて観察した。
ガラスフィラーを含む樹脂層の上にガラスフィラーを含まない層(粘着剤層あるいは、粘着剤層成分と樹脂層成分とを含む混合相)が観察されたものを〇とし、層が形成されていないものを×とした。
アクリル系コポリマーA(ブチルアクリレート(BA)と、メタクリル酸メチル(MMA)と、ヒドロキシエチルアクリレート(HEA)とのコポリマー、BA:MMA:HEA=65:30:5(重量比))100重量部と、イソシアネート系架橋剤(日本ポリウレタン工業社製、商品名「コロネートL」)1.5重量部と、反応助剤(東京ファインケミカル社製、商品名「OM-5」)0.01重量部とを混合し、粘着剤層形成用組成物を調製した。
該粘着剤層形成用組成物を、基材としてのポリテトラフルオロエチレンフィルム(東レ社製、商品名「ルミラーS10」、厚み38μm)の片面に塗工して、基材と粘着剤層(厚み5μm)とから構成される粘着シートを得た。
得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
反応助剤を添加せず、テルペンフェノール系粘着付与樹脂(住友ベークライト社製、商品名「スミライトレジンPR51732」)10重量部をさらに配合して、粘着剤層形成用組成物を調製したこと以外は、実施例1と同様にして、粘着シートを得た。得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
反応助剤を添加せず、テルペンフェノール系粘着付与樹脂(ヤスハラケミカル社製、商品名「YSポリスターS145」)20重量部をさらに配合して、粘着剤層形成用組成物を調製し、粘着剤層の厚みを10μmとしたこと以外は、実施例1と同様にして、粘着シートを得た。得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
反応助剤を添加せず、テルペンフェノール系粘着付与樹脂(ヤスハラケミカル社製、商品名「YSポリスターT145」)20重量部をさらに配合して、粘着剤層形成用組成物を調製し、粘着剤層の厚みを10μmとしたこと以外は、実施例1と同様にして、粘着シートを得た。得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
アクリル系コポリマーB(アクリル酸2エチルヘキシル(2EHA)と、ブチルアクリレート(BA)と、アクリル酸(AA)と、ヒドロキシエチルアクリレート(HEA)とのコポリマー、2EHA:BA:AA:HEA=50:50:4:1(重量比))100重量部と、エポキシ系架橋剤(三菱ガス化学社製、商品名「テトラッドC」)5重量部と、テルペンフェノール系粘着付与樹脂(住友ベークライト社製、商品名「スミライトレジンPR12603」)20重量部とを混合し、粘着剤層形成用組成物を調製した。
該粘着剤層形成用組成物を、基材としてのポリテトラフルオロエチレンフィルム(東レ社製、商品名「ルミラーS10」、厚み38μm)の片面に塗工して、基材と粘着剤層(厚み10μm)とから構成される粘着シートを得た。
得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
アクリル系コポリマーC(アクリル酸2エチルヘキシル(2EHA)と、エチルアクリレート(EA)と、メタクリル酸メチル(MMA)と、ヒドロキシエチルアクリレート(HEA)とのコポリマー、2EHA:EA:MMA:HEA=30:65:5:5(重量比))100重量部と、反応助剤(東京ファインケミカル社製、商品名「OL-1」)0.05重量部と、イソシアネート系架橋剤(日本ポリウレタン工業社製、商品名「コロネートL」)3重量部と、ロジン系粘着付与剤(荒川化学工業社製、商品名「ペンセルD125」)20重量部とを混合し、粘着剤層形成用組成物を調製した。
該粘着剤層形成用組成物を、基材としてのポリテトラフルオロエチレンフィルム(東レ社製、商品名「ルミラーS10」、厚み38μm)の片面に塗工して、基材と粘着剤層(厚み10μm)とから構成される粘着シートを得た。
得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
アクリル系コポリマーD(アクリル酸2エチルヘキシル(2EHA)と、ヒドロキシエチルアクリレート(HEA)とのコポリマー、2EHA:HEA=100:5(重量比))100重量部と、反応助剤(東京ファインケミカル社製、商品名「OL-1」)0.05重量部と、イソシアネート系架橋剤(日本ポリウレタン工業社製、商品名「コロネートL」)1.5重量部と、テルペンフェノール系粘着付与樹脂(住友ベークライト社製、商品名「スミライトレジンPR12603」)10重量部とを混合し、粘着剤層形成用組成物を調製した。
該粘着剤層形成用組成物を、基材としてのポリテトラフルオロエチレンフィルム(東レ社製、商品名「ルミラーS10」、厚み38μm)の片面に塗工して、基材と粘着剤層(厚み10μm)とから構成される粘着シートを得た。
得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
アクリル系コポリマーE(アクリル酸2エチルヘキシル(2EHA)と、アクリル酸(AA)とのコポリマー、2EHA:AA=100:5(重量比))100重量部と、エポキシ系架橋剤(三菱ガス化学社製、商品名「テトラッドC」)0.5重量部と、テルペンフェノール系粘着付与樹脂(ヤスハラケミカル社製、商品名「YSポリスターS145」)10重量部とを混合し、粘着剤層形成用組成物を調製した。
該粘着剤層形成用組成物を、基材としてのポリテトラフルオロエチレンフィルム(東レ社製、商品名「ルミラーS10」、厚み38μm)の片面に塗工して、基材と粘着剤層(厚み10μm)とから構成される粘着シートを得た。
得られた粘着シートを上記評価(1)~(4)に供した。結果を表1に示す。
20 粘着剤層
30 第2の粘着剤層
100、200 粘着シート
Claims (7)
- 基材と、該基材の少なくとも片側に配置された粘着剤層とを備え、
該粘着剤層が、粘着剤を含み、
該粘着剤が、Sp値が19.5(J/cm3)1/2~25(J/cm3)1/2であるベースポリマーを含む、
粘着シート。 - 前記基材と、該基材の片側に配置された前記粘着剤層と、該基材の該粘着剤層とは反対側に配置された第2の粘着剤層とを備える、請求項1に記載の粘着シート。
- 前記粘着剤が、アクリル系粘着剤である、請求項1または2に記載の粘着シート。
- 前記アクリル系粘着剤が、ベースポリマーとして、側鎖として炭素数が6以下のアルキルエステルを有するベースポリマーを有し、
該側鎖として炭素数が6以下のアルキルエステルを有する構成単位の含有割合が、該アクリル系ポリマーを構成する全構成単位に対して、50重量%以上である、
請求項1から3のいずれかに記載の粘着シート。 - 前記粘着剤層の4-ターシャリーブチルフェニルグリシジルエーテルに対する接触角が、47°以下である、請求項1から4のいずれかに記載の粘着シート。
- 前記粘着剤層上でエポキシ樹脂を硬化させた際の該エポキシ樹脂に対する23℃における粘着力が、好ましくは8N/20mm以上である、請求項1から5のいずれかに記載の粘着シート。
- 前記粘着剤層をシリコンチップに貼着した際の150℃におけるせん断接着力が、400g以上である、請求項1から6のいずれかに記載の粘着シート。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022575070A JPWO2022153601A1 (ja) | 2021-01-15 | 2021-09-16 | |
KR1020237011329A KR20230058709A (ko) | 2021-01-15 | 2021-09-16 | 점착 시트 |
CN202180090650.8A CN116745377A (zh) | 2021-01-15 | 2021-09-16 | 粘合片 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-004920 | 2021-01-15 | ||
JP2021004920 | 2021-01-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2022153601A1 true WO2022153601A1 (ja) | 2022-07-21 |
Family
ID=82448155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2021/034168 WO2022153601A1 (ja) | 2021-01-15 | 2021-09-16 | 粘着シート |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022153601A1 (ja) |
KR (1) | KR20230058709A (ja) |
CN (1) | CN116745377A (ja) |
TW (2) | TW202338044A (ja) |
WO (1) | WO2022153601A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001308116A (ja) * | 2000-04-24 | 2001-11-02 | Sony Corp | チップ状電子部品及びその製造方法、並びにその製造に用いる疑似ウエーハ及びその製造方法 |
JP2008274153A (ja) * | 2007-05-01 | 2008-11-13 | Nitto Denko Corp | 車両用塗膜面に対する粘着シートの接着方法 |
JP2018193563A (ja) * | 2018-07-26 | 2018-12-06 | 日東電工株式会社 | 粘着シート |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001313350A (ja) | 2000-04-28 | 2001-11-09 | Sony Corp | チップ状電子部品及びその製造方法、並びにその製造に用いる疑似ウエーハ及びその製造方法 |
JP2016121306A (ja) * | 2014-12-25 | 2016-07-07 | 日東電工株式会社 | 粘着剤組成物、粘着シート、及び、光学部材 |
-
2021
- 2021-09-16 KR KR1020237011329A patent/KR20230058709A/ko unknown
- 2021-09-16 CN CN202180090650.8A patent/CN116745377A/zh active Pending
- 2021-09-16 WO PCT/JP2021/034168 patent/WO2022153601A1/ja active Application Filing
- 2021-09-16 JP JP2022575070A patent/JPWO2022153601A1/ja active Pending
- 2021-11-24 TW TW112121269A patent/TW202338044A/zh unknown
- 2021-11-24 TW TW110143713A patent/TWI806256B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001308116A (ja) * | 2000-04-24 | 2001-11-02 | Sony Corp | チップ状電子部品及びその製造方法、並びにその製造に用いる疑似ウエーハ及びその製造方法 |
JP2008274153A (ja) * | 2007-05-01 | 2008-11-13 | Nitto Denko Corp | 車両用塗膜面に対する粘着シートの接着方法 |
JP2018193563A (ja) * | 2018-07-26 | 2018-12-06 | 日東電工株式会社 | 粘着シート |
Also Published As
Publication number | Publication date |
---|---|
KR20230058709A (ko) | 2023-05-03 |
JPWO2022153601A1 (ja) | 2022-07-21 |
TW202338044A (zh) | 2023-10-01 |
CN116745377A (zh) | 2023-09-12 |
TWI806256B (zh) | 2023-06-21 |
TW202231815A (zh) | 2022-08-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102302043B1 (ko) | 점착 시트 | |
CN105907317B (zh) | 热剥离型粘合片 | |
TWI659084B (zh) | Adhesive sheet | |
JP6768038B2 (ja) | 粘着シート | |
JP6448333B2 (ja) | 粘着シート | |
WO2022123932A1 (ja) | 粘着シート | |
TW201946994A (zh) | 黏著片 | |
JP7155210B2 (ja) | 粘着シート | |
JP2021006634A (ja) | 粘着シート | |
WO2021024849A1 (ja) | 粘着テープ | |
WO2021024850A1 (ja) | 粘着テープ | |
WO2022153601A1 (ja) | 粘着シート | |
JP7428473B2 (ja) | 電子部品の製造方法 | |
WO2022123931A1 (ja) | 粘着シート | |
WO2022185611A1 (ja) | 粘着シート | |
WO2023286620A1 (ja) | 粘着シート | |
WO2023286619A1 (ja) | 粘着シート |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 21919492 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20237011329 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2022575070 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 202180090650.8 Country of ref document: CN |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 21919492 Country of ref document: EP Kind code of ref document: A1 |