WO2022127170A1 - Structure de métasurface optique flexible de gros calibre et procédé de traitement associé - Google Patents
Structure de métasurface optique flexible de gros calibre et procédé de traitement associé Download PDFInfo
- Publication number
- WO2022127170A1 WO2022127170A1 PCT/CN2021/113819 CN2021113819W WO2022127170A1 WO 2022127170 A1 WO2022127170 A1 WO 2022127170A1 CN 2021113819 W CN2021113819 W CN 2021113819W WO 2022127170 A1 WO2022127170 A1 WO 2022127170A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- flexible optical
- processing
- optical metasurface
- metasurface structure
- diameter
- Prior art date
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
Abstract
L'invention concerne une structure de métasurface optique flexible de gros calibre et un procédé de traitement associé. Le procédé de traitement consiste à : (S110) graver un motif prédéfini sur un substrat (7) pour former une plaque de matrice (6); (S120) revêtir la plaque de matrice (6) d'un adhésif durcissant aux ultraviolets (2) mélangé à des nanoparticules à indice de réfraction élevé (3), recouvrir un substrat flexible (1), et effectuer un durcissement à la lumière ultraviolette (8) tout en appliquant de la pression sur l'adhésif durcissant aux ultraviolets (2); et (S130) après le durcissement et le moulage, séparer le substrat flexible (1) de la plaque de matrice (6) pour obtenir une structure de métasurface optique flexible de gros calibre (9). Ce procédé simple et efficace met en œuvre la préparation d'une structure de métasurface optique flexible de gros calibre à haute précision (9), et il est applicable au domaine du traitement de dispositifs de surface à métasurface flexible de grande superficie.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011507346.2 | 2020-12-18 | ||
| CN202011507346.2A CN112558419A (zh) | 2020-12-18 | 2020-12-18 | 一种大口径柔性光学超构表面结构的加工方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2022127170A1 true WO2022127170A1 (fr) | 2022-06-23 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/CN2021/113819 WO2022127170A1 (fr) | 2020-12-18 | 2021-08-20 | Structure de métasurface optique flexible de gros calibre et procédé de traitement associé |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN112558419A (fr) |
| WO (1) | WO2022127170A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115360496A (zh) * | 2022-08-30 | 2022-11-18 | 合肥工业大学 | 基于金属辅助化学刻蚀的太赫兹高度差腔体器件的制备方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112558419A (zh) * | 2020-12-18 | 2021-03-26 | 中国科学院光电技术研究所 | 一种大口径柔性光学超构表面结构的加工方法 |
| CN112965254A (zh) * | 2021-03-31 | 2021-06-15 | 歌尔股份有限公司 | 光波导镜片叠合结构及其制作方法 |
| CN114047566A (zh) * | 2021-12-03 | 2022-02-15 | 上海理工大学 | 一种基于光刻胶材料的超构表面 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101881925A (zh) * | 2010-06-02 | 2010-11-10 | 中国科学院长春光学精密机械与物理研究所 | 一种在三维任意曲面上复制微纳结构的方法 |
| CN103076645A (zh) * | 2013-01-21 | 2013-05-01 | 清华大学 | 贴片式云纹光栅的制作方法 |
| US20130241092A1 (en) * | 2012-03-15 | 2013-09-19 | Tokyo Ohka Kogyo Co., Ltd. | Film-forming composition for optical imprint and method for producing optical member |
| CN107910421A (zh) * | 2017-10-13 | 2018-04-13 | 上海隆因诺光电有限公司 | 一种通过压印光刻技术制备led支架的材料及方法 |
| US20200249568A1 (en) * | 2019-02-05 | 2020-08-06 | Facebook Technologies, Llc | Curable formulation with high refractive index and its application in surface relief grating using nanoimprinting lithography |
| CN112558419A (zh) * | 2020-12-18 | 2021-03-26 | 中国科学院光电技术研究所 | 一种大口径柔性光学超构表面结构的加工方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201213240A (en) * | 2010-09-27 | 2012-04-01 | Chung Shan Inst Of Science | High refractive index TiO2 nano-composite optical film and production process thereof |
| WO2017111546A1 (fr) * | 2015-12-23 | 2017-06-29 | 한국과학기술원 | Structure nanocomposite de métamatériau à indice de réfraction élevé à bande large |
| CN107561857A (zh) * | 2017-09-20 | 2018-01-09 | 南方科技大学 | 一种基于纳米压印制备光学超构表面的方法 |
| CN109161020B (zh) * | 2018-07-01 | 2022-11-29 | 北京化工大学 | 一种高折射率纳米复合有机硅封装胶材的制备方法 |
| US20200247073A1 (en) * | 2019-02-05 | 2020-08-06 | Facebook Technologies, Llc | Curable formulation with high refractive index and its application in surface relief grating using nanoimprinting lithography |
-
2020
- 2020-12-18 CN CN202011507346.2A patent/CN112558419A/zh active Pending
-
2021
- 2021-08-20 WO PCT/CN2021/113819 patent/WO2022127170A1/fr active Application Filing
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101881925A (zh) * | 2010-06-02 | 2010-11-10 | 中国科学院长春光学精密机械与物理研究所 | 一种在三维任意曲面上复制微纳结构的方法 |
| US20130241092A1 (en) * | 2012-03-15 | 2013-09-19 | Tokyo Ohka Kogyo Co., Ltd. | Film-forming composition for optical imprint and method for producing optical member |
| CN103076645A (zh) * | 2013-01-21 | 2013-05-01 | 清华大学 | 贴片式云纹光栅的制作方法 |
| CN107910421A (zh) * | 2017-10-13 | 2018-04-13 | 上海隆因诺光电有限公司 | 一种通过压印光刻技术制备led支架的材料及方法 |
| US20200249568A1 (en) * | 2019-02-05 | 2020-08-06 | Facebook Technologies, Llc | Curable formulation with high refractive index and its application in surface relief grating using nanoimprinting lithography |
| WO2020163334A1 (fr) * | 2019-02-05 | 2020-08-13 | Facebook Technologies, Llc | Formulation durcissable à indice de réfraction élevé, et son application dans un réseau à relief de surface par lithographie par nano-impression |
| CN112558419A (zh) * | 2020-12-18 | 2021-03-26 | 中国科学院光电技术研究所 | 一种大口径柔性光学超构表面结构的加工方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115360496A (zh) * | 2022-08-30 | 2022-11-18 | 合肥工业大学 | 基于金属辅助化学刻蚀的太赫兹高度差腔体器件的制备方法 |
| CN115360496B (zh) * | 2022-08-30 | 2023-09-29 | 合肥工业大学 | 基于金属辅助化学刻蚀的太赫兹高度差腔体器件的制备方法 |
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| Publication number | Publication date |
|---|---|
| CN112558419A (zh) | 2021-03-26 |
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