WO2022124808A1 - Dispositif de traitement de gaz utilisant des microbulles et équipement de traitement de gaz le comprenant - Google Patents

Dispositif de traitement de gaz utilisant des microbulles et équipement de traitement de gaz le comprenant Download PDF

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Publication number
WO2022124808A1
WO2022124808A1 PCT/KR2021/018601 KR2021018601W WO2022124808A1 WO 2022124808 A1 WO2022124808 A1 WO 2022124808A1 KR 2021018601 W KR2021018601 W KR 2021018601W WO 2022124808 A1 WO2022124808 A1 WO 2022124808A1
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gas
space
oxidizing agent
aqueous solution
treated
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PCT/KR2021/018601
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English (en)
Korean (ko)
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정재억
김명순
정형진
정여진
Original Assignee
정재억
김명순
정형진
정여진
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Priority claimed from KR1020200171878A external-priority patent/KR102276558B1/ko
Priority claimed from KR1020210026526A external-priority patent/KR102302919B1/ko
Priority claimed from KR1020210072055A external-priority patent/KR20220163646A/ko
Priority claimed from KR1020210088530A external-priority patent/KR102330690B1/ko
Application filed by 정재억, 김명순, 정형진, 정여진 filed Critical 정재억
Publication of WO2022124808A1 publication Critical patent/WO2022124808A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/30—Controlling by gas-analysis apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/56—Nitrogen oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/60—Simultaneously removing sulfur oxides and nitrogen oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/79—Injecting reactants

Definitions

  • the present invention relates to a gas processing technology, and more particularly, to a gas processing facility that forms and processes gas in the form of microbubbles in a processing liquid.
  • Flue desulfurization is the removal of sulfur oxides (mainly sulfur dioxide) contained in combustion exhaust gases. Sulfur dioxide contained in exhaust gas emitted from factories, thermal power plants, and incinerators is a toxic gas that is a major cause of air pollution.
  • Flue gas desulfurization is classified into a dry method and a wet method according to the type and type of use of an absorption treatment agent for exhaust gas.
  • the dry method is a method of removing sulfur dioxide by adsorbing or reacting particles or powders such as activated carbon and carbonate in contact with exhaust gas to adsorb or react.
  • equipment such as absorption towers or scrubbing dust collectors are not required, the equipment cost is low, and thus it is mainly used in small facilities.
  • the wet method is a method of removing exhaust gas by contacting it with a liquid absorption treatment agent such as ammonia water, sodium hydroxide solution, and lime milk.
  • a liquid absorption treatment agent such as ammonia water, sodium hydroxide solution, and lime milk.
  • Calcium carbonate is widely used, and a general wet flue gas desulfurization facility has a structure in which sulfur dioxide is removed by spraying a slurry in which lime is dispersed in water to exhaust gas, and the slurry is sprayed downwardly into the body of the absorption tower.
  • a general wet flue gas desulfurization facility has a structure in which the slurry is sprayed downwardly into the space through which the exhaust gas passes, so that the slurry has a short holding time and contact time with the exhaust gas is short. Because of this, high concentrations of sulfur dioxide are difficult to treat.
  • Biogas is automatically obtained by fermenting organic wastes having a high biomass content, such as livestock manure, food waste, and sewage treatment plant sludge, and has recently been spotlighted as an alternative fuel to fossil fuels.
  • Biogas is produced by decomposing organic materials when organic waste is subjected to anaerobic digestion in the absence of oxygen, usually methane (CH 4 : about 45-60%) and carbon dioxide (CO 2 : about 25-50%), It is composed of nitrogen (N 2 : 0-10%) and a trace amount of hydrogen sulfide (H 2 S) and ammonia (NH 2 ).
  • biogas is used after removing as much as possible the remaining components other than methane through pretreatment.
  • biogas is pretreated into low gas, heavy gas and high gas.
  • Low-quality gas is used as fuel for boilers, etc. with only the moisture in biogas removed, and heavy gas is a cogeneration that produces electricity and heat with moisture, hydrogen sulfide (H 2 S), and siloxane substances removed from biogas.
  • H 2 S hydrogen sulfide
  • siloxane substances removed from biogas It is used as a fuel for a generator, and the high quality gas is one in which the methane concentration of biogas is 95% or more.
  • Nitrogen oxide refers to a compound consisting of nitrogen and oxygen, or mixtures thereof. Nitrogen oxide is generated by oxidizing nitrogen at a high temperature, and is a representative air pollutant emitted from various combustion processes and pyrolysis processes along with sulfur oxides along with industrialization.
  • a selective catalytic reduction method using a metal oxide-based catalyst or a method of decomposing nitrogen oxides using activated carbon or activated carbon fiber is used.
  • the selective catalytic reduction method has a disadvantage that the reaction temperature must be at least 300° C. or higher, and the decomposition method using activated carbon has a low reaction efficiency.
  • sulfur dioxide SO 2
  • SO 2 sulfur dioxide
  • nitrogen oxide is mainly generated by a reaction between basic oxygen and nitrogen present in the atmosphere at a high temperature where various processes are performed, and is mainly emitted in the form of nitrogen monoxide (NO).
  • NO nitrogen monoxide
  • the desulfurization apparatuses are wet flue gas desulfurization apparatuses, and in the wet desulfurization process, the exhaust gas is brought into gas-liquid contact with an absorption fluid containing an alkali such as lime, and thus sulfur dioxide is absorbed and removed from the exhaust gas.
  • an absorption fluid containing an alkali such as lime
  • sulfur dioxide is absorbed and removed from the exhaust gas.
  • the contact method of the spray method is widely used.
  • Another object of the present invention is to provide a gas treatment facility capable of efficiently removing nitrogen oxides, sulfur oxides, hydrogen sulfide and dust contained in gas using microbubbles.
  • a floor plate dividing an inner space into a lower space and an upper space, and a gas injection for injecting a gas to be treated from the lower space to the upper space a nozzle; and a collision plate disposed in the upper space to collide with the gas to be processed, which is injected from the gas injection nozzle, and the gas to be processed, which is injected from the gas injection nozzle, collides with the collision plate to collide with the upper space.
  • a gas introduction space communicating with an intake port, a reaction space communicating with an exhaust port, and the gas introduction space and the reaction space a reactor providing a connection space in communication with the gas introduction space and the reaction space from below; and a gas flow fan configured to flow the gas to be treated so that the gas to be treated passes sequentially through the intake port, the gas introduction space, the connection space, the reaction space, and the exhaust port
  • the reactor includes: and a gas processing unit positioned above the connection space and located below the exhaust port for processing by reacting a processing target component included in the processing target gas with a processing component included in a processing liquid
  • the gas processing unit includes: a bottom plate dividing an inner space into a lower space and an upper space; and a gas injection nozzle for injecting the gas to be processed into the upper space into the upper space;
  • one or a plurality of reactors are provided to be connected in sequence along the height direction, and hydrogen sulfide gas contained in the gas to be treated is removed and discharged.
  • a gas processing module a gas introduction module having a lower gas introduction tank disposed below the lowermost reactor among the reactors; and a gas flow fan for flowing the gas to be treated so that the gas to be treated passes sequentially through the lower gas introduction tank and the reactors from bottom to top, wherein each of the reactors includes a process in which the hydrogen sulfide gas contains a hydrogen sulfide removal agent It provides a gas processing space to be removed by reaction with a liquid, and a lower gas introduction space communicating with the lowermost reactor is formed in the lower gas introduction tank, and the lowermost reactor is the gas to be treated introduced from the lower gas introduction space and a gas injection nozzle for injecting into the gas processing space along the height direction, and among the plurality of reactors, the remaining reactors except for
  • the gas to be processed is treated by the gas to be processed by the gas injection nozzle of each reactor to be injected into the corresponding gas processing space
  • the processing target gas is formed as microbubbles in the processing liquid, and the hydrogen sulfide in the processing target gas
  • a hydrogen sulphide removal facility is provided, from which the gas is degassed.
  • a gas supply module for supplying a target gas; It is provided on the upper side of the gas supply module to receive the gas to be processed from the gas supply module upward, and to react nitrogen monoxide contained in the gas to be processed with an oxidizing agent aqueous solution containing an oxidizing agent to convert the nitrogen monoxide to nitrogen dioxide a nitrogen monoxide reaction module for oxidizing; a gas flow fan for allowing the gas to be processed in the gas supply module to flow upwardly through the nitrogen monoxide reaction module; It is connected to the nitrogen monoxide reaction module to supply the oxidizing agent aqueous solution to the upper part of the nitrogen monoxide reaction module when the gas to be treated is supplied upward to the nitrogen monoxide reaction module, and overflowed from the nitrogen monoxide reaction module and discharged
  • An oxidizing agent aqueous solution supply module for accommodating the oxidizing agent aqueous solution; an oxidizing agent pH sensor provided in at least one of
  • a gas supply module for supplying a target gas; It is provided on the upper side of the gas supply module to receive the gas to be processed from the gas supply module upward, and to react nitrogen monoxide contained in the gas to be processed with an oxidizing agent aqueous solution containing an oxidizing agent to convert the nitrogen monoxide to nitrogen dioxide a nitrogen monoxide reaction module for oxidizing; It is provided on the upper side of the nitrogen monoxide reaction module, receives the gas to be treated that has passed through the nitrogen monoxide reaction module to the upper side, and reacts the nitrogen dioxide contained in the gas to be treated with an aqueous reducing agent containing a reducing agent to generate the nitrogen dioxide a nitrogen dioxide reaction module for reducing and removing; a gas flow fan for allowing the gas to be treated in the gas supply module to pass sequentially upward through the nitrogen monoxide reaction module and the nitrogen dioxide reaction module; It is connected to the nitrogen monoxide reaction module to supply
  • an oxidation treatment unit for oxidizing nitrogen monoxide contained in the exhaust gas to be treated by inputting an oxidizing agent to the exhaust gas to be treated;
  • a gas introduction space communicating with an intake port through which the oxidation treatment gas discharged from the oxidation treatment unit is introduced, a reaction space communicating with an exhaust port through which gas is discharged, and a reaction space provided with a gas treatment unit;
  • a gas treatment tank providing a gas introduction space and a connection space communicating with the reaction space, and treating a component to be treated including nitrogen dioxide in the oxidation treatment gas;
  • an exhaust fan for discharging gas from the gas treatment tank, wherein the gas flows sequentially through the gas introduction space, the connection space, and the reaction space in the gas treatment tank by the operation of the exhaust fan to the exhaust port is discharged through
  • the gas processing unit includes a bottom plate dividing the inner space of the gas processing unit into a lower space and an upper space for accommodating treated water, and the gas introduced into the
  • an oxidizing agent is added to the exhaust gas to be treated and the sulfur dioxide contained in the exhaust gas to be treated is removed by reacting with the oxidizing agent;
  • a gas introduction space communicating with an intake port through which the oxidation treatment gas discharged from the oxidation treatment unit is introduced, a reaction space communicating with an exhaust port through which gas is discharged, and a reaction space provided with a gas treatment unit;
  • a gas treatment tank providing a gas introduction space and a connection space communicating with the reaction space, and treating a component to be treated including nitrogen dioxide in the oxidation treatment gas; and an exhaust fan for discharging gas from the gas treatment tank, wherein the gas flows sequentially through the gas introduction space, the connection space, and the reaction space in the gas treatment tank by the operation of the exhaust fan to the exhaust port is discharged through
  • the gas processing unit includes a bottom plate dividing the inner space of the gas processing unit into a lower space and an upper space for accommodating treated water, and the gas introduced into the
  • the treated water includes a treatment component that reacts with the component to be treated
  • the exhaust When the fan starts to operate, the gas in the lower space is injected into the upper space, and the treated water is supplied to the upper space and stored in the upper space, but due to the gas in the lower space injected into the upper space, the upper space
  • the treated water stored in the space is prevented from flowing downward through the gas injection nozzles due to gravity, and when the collision plate is submerged by the treated water, the gas injected from the gas injection nozzle collides with the collision plate for the treatment
  • An exhaust gas complex treatment facility is provided, which increases the contact time and contact area between the gas and the treated water by forming microbubbles in water.
  • an oxidizing agent is added to the exhaust gas to be treated to oxidize nitrogen monoxide contained in the exhaust gas to be treated, and an oxidation treatment unit in which sulfur dioxide is removed by reaction with the oxidizing agent;
  • a gas introduction space communicating with an intake port through which the oxidation treatment gas discharged from the oxidation treatment unit is introduced, a reaction space communicating with an exhaust port through which gas is discharged, and a reaction space provided with a gas treatment unit;
  • a gas treatment tank providing a gas introduction space and a connection space communicating with the reaction space, and treating a component to be treated including nitrogen dioxide in the oxidation treatment gas; and an exhaust fan for discharging gas from the gas treatment tank, wherein the gas flows sequentially through the gas introduction space, the connection space, and the reaction space in the gas treatment tank by the operation of the exhaust fan to the exhaust port is discharged through
  • the gas processing unit includes a bottom plate dividing the inner space of the gas processing unit into a lower space
  • the treated water includes a treatment component that reacts with the component to be treated
  • the exhaust When the fan starts to operate, the gas in the lower space is injected into the upper space, and the treated water is supplied to the upper space and stored in the upper space, but due to the gas in the lower space injected into the upper space, the upper space
  • the treated water stored in the space is prevented from flowing downward through the gas injection nozzles due to gravity, and when the collision plate is submerged by the treated water, the gas injected from the gas injection nozzle collides with the collision plate for the treatment
  • An exhaust gas complex treatment facility is provided, which increases the contact time and contact area between the gas and the treated water by forming microbubbles in water.
  • the present invention includes a gas flow fan that uses enough power to flow the gas to be treated in the reactor, overall power consumption can be reduced.
  • the operation performance of the exhaust gas purification device is improved by spraying water or compressed air into a nozzle that forms microbubbles by spraying the gas to be treated in the reactor to prevent clogging of the nozzle by solids generated during the reaction. is improved
  • the nozzle that forms microbubbles by injecting the gas to be treated into the treatment liquid and the solid that is generated and deposited during the reaction in the space in which the treatment liquid is accommodated is discharged by the solid content discharging means, so the operating performance of the exhaust gas purification device is improved do.
  • the present invention uses iron (II) chloride (ferrous chloride) (FeCl 2 ) or iron (III) chloride (ferric chloride) (FeCl 3 ), which does not react with hydrogen sulfide with carbon dioxide, as a hydrogen sulfide removal agent.
  • iron (II) chloride ferrrous chloride
  • FeCl 2 iron chloride
  • FeCl 3 iron (III) chloride
  • the amount of the drug can be reduced.
  • the present invention is configured to pass the gas to be treated sequentially through the nitrogen monoxide reaction module and the nitrogen dioxide reaction module, in the nitrogen monoxide reaction module, nitrogen monoxide (NO) contained in the gas to be treated is nitrogen dioxide (NO 2 ) is oxidized to, and in the nitrogen dioxide reaction module, nitrogen dioxide (NO 2 ) generated in the nitrogen monoxide reaction module may be removed.
  • nitrogen monoxide (NO) contained in the gas to be treated is nitrogen dioxide (NO 2 ) is oxidized to, and in the nitrogen dioxide reaction module, nitrogen dioxide (NO 2 ) generated in the nitrogen monoxide reaction module may be removed.
  • the present invention measures the pH of the oxidizing agent aqueous solution by using the principle that the pH of the oxidizing agent aqueous solution changes by changing the oxidizing agent included in the oxidizing agent aqueous solution according to the amount of nitrogen monoxide (NO) included in the gas to be treated.
  • NO nitrogen monoxide
  • the present invention is provided with a gas flow fan using enough power to flow the gas to be treated in the nitrogen monoxide reaction module and the nitrogen dioxide reaction module, overall power consumption can be reduced.
  • dust such as fine dust included in the gas to be treated may be removed from the treatment liquid by contact with the treatment liquid such as an oxidizing agent aqueous solution.
  • oxidizing agent aqueous solution and the reducing agent aqueous solution are appropriately selected, other components (eg, sulfide) included in the gas to be treated may be removed.
  • nitrogen monoxide contained in the exhaust gas to be treated reacts with an oxidizing agent to be oxidized to nitrogen dioxide, and after the oxidation treatment gas discharged from the oxidation treatment tank flows into the gas treatment tank, the gas rises in the reaction space of the gas treatment tank In the process of passing through the treatment unit, it comes into contact with the treated water in the form of microbubbles, and the reduction treatment with the reducing agent and the neutralization absorption treatment with the neutralizing agent are performed. Dedusting, desulfurization and dedusting treatment can proceed efficiently.
  • FIG. 1 is a view showing a schematic configuration of a gas processing apparatus using microbubbles according to an embodiment of the present invention.
  • FIG. 2 is a diagram illustrating the configuration of a reactor and a processing liquid supply unit in the gas processing apparatus shown in FIG. 1 .
  • FIG. 3 is a view showing a schematic configuration of a gas processing apparatus using microbubbles according to another embodiment of the present invention.
  • FIG. 4 is a diagram illustrating the configuration of a reactor and a processing liquid supply unit in the gas processing apparatus illustrated in FIG. 3 .
  • FIG. 5 is a view showing the configuration of a solid content discharging means in the gas processing apparatus shown in FIG. 3 .
  • FIG. 6 is a configuration diagram illustrating an example of a wet flue gas desulfurization facility in which the gas processing apparatus shown in FIG. 3 is used as an exhaust gas desulfurization facility.
  • FIG. 7 is a view showing a schematic configuration of a gas treatment facility according to another embodiment of the present invention, and shows the configuration of a hydrogen sulfide removal facility.
  • FIG. 8 is a view showing the schematic configuration of a gas treatment module, a gas introduction module, and a treatment liquid supply module in the hydrogen sulfide removal facility shown in FIG. 7 .
  • FIG. 9 is a diagram illustrating a detailed configuration of a gas introduction module, a first reactor, and a first processing liquid supply device in the configuration illustrated in FIG. 8 .
  • FIG. 10 is a diagram illustrating specific configurations of a second reactor, a second processing liquid supply device, a third reactor, and a third processing liquid supply device in the configuration illustrated in FIG. 8 .
  • FIG. 11 is a diagram specifically illustrating the configuration of the gas processing module shown in FIG. 8 .
  • FIG. 12 is a view showing a schematic configuration of a gas treatment facility according to another embodiment of the present invention, and shows the configuration of a nitrogen oxide removal facility.
  • FIG. 13 is a view showing a state in which the gas flow fan is operated in the nitrogen oxide removal facility shown in FIG. 12 .
  • FIG. 14 is a view showing a state before the gas flow fan is operated in the nitrogen oxide removal facility shown in FIG. 12 .
  • 15 is a diagram schematically showing the configuration of a gas treatment facility according to another embodiment of the present invention, and shows the configuration of the exhaust gas complex treatment facility.
  • FIG. 16 is a view schematically showing an embodiment of an oxidation treatment unit in the exhaust gas complex treatment facility shown in FIG. 15 .
  • FIG. 17 is a view schematically showing another embodiment of the oxidation treatment unit in the exhaust gas complex treatment facility shown in FIG. 15 .
  • FIG. 18 is a view showing the microbubble gas treatment tank in the exhaust gas complex treatment facility shown in FIG. 15 together with a treatment water circulation unit for dedusting, a treatment water circulation unit for reduction, and a treatment water circulation unit for absorption. It shows the state in which processing is in progress.
  • FIG. 19 is a view showing a microbubble gas treatment tank in the exhaust gas complex treatment facility shown in FIG. 1 , and shows a state before processing of the exhaust gas is performed.
  • the gas processing apparatus 100a includes a reactor 110 in which a removal reaction for a component to be treated contained in an exhaust gas G1 to be treated by a treatment liquid occurs, and a gas G1 to be treated.
  • a gas flow fan 105 for flowing exhaust gas to pass through the reactor 110 and a treatment liquid supply unit 120 for supplying a treatment liquid to the reactor 110 are provided.
  • the gas treatment apparatus 100a may be usefully used to remove nitrogen oxides, sulfur oxides, hydrogen sulfide, dust, and odor causing substances included in exhaust gas.
  • the reactor 110 removes the treatment target component included in the incoming treatment target gas G1 by reacting the treatment liquid with the treatment component.
  • 2 shows the configuration of the reactor 110 .
  • the reactor 110 includes a partition wall 111 extending downward from the ceiling in the internal space 110a. The lower end of the partition wall 111 is spaced apart from the floor in the inner space 110a of the reactor 110 .
  • the internal space 110a of the reactor 110 is divided into a gas introduction space 110b, a reaction space 110c, and a connection space 110d by the partition wall 111 .
  • the gas introduction space 110b and the reaction space 110c are two spaces separated with the partition wall 111 interposed therebetween.
  • the connection space 110d is a space formed between the lower end of the partition wall 111 and the bottom of the inner space 110a of the reactor 110, and is located below the gas introduction space 110b and the reaction space 110c to introduce gas. It communicates with the space 110b and the reaction space 110c, respectively.
  • a drain pipe 111d is connected to the bottom 110e of the connection space 110d, and a drain valve 111e for opening and closing the drain pipe 111d is provided in the drain pipe 111d.
  • the bottom 110e of the connection space 110d and the lower end of the partition wall 111 are spaced apart from each other, and a gas movement passage 1111 through which gas can move between the bottom 110e of the connection space 110d and the lower end of the partition wall 111 . ) is formed.
  • An intake port 111a communicating with the gas introduction space 110b is positioned at an upper end of the gas introduction space 110b.
  • the gas G1 to be treated is introduced into the gas introduction space 110b through the intake port 111a.
  • An exhaust port 111b communicating with the reaction space 110c is positioned at an upper end of the reaction space 110c.
  • the final processing gas G3 is discharged from the reaction space 110c through the exhaust port 111b.
  • the reaction space 110c includes a first gas processing unit 112a and a second gas processing unit 112b that are sequentially disposed from bottom to top in the height direction between the gas passage 1111 and the exhaust port 111b.
  • An intermediate gas passage 112c for communicating the first gas processing unit 112a and the second gas processing unit 112b is formed between the first gas processing unit 112a and the second gas processing unit 112b.
  • the gas G2 discharged from the first gas processing unit 112a through the intermediate gas passage 112c flows into the second gas processing unit 112b.
  • the first gas processing unit 112a includes a first bottom plate 113a positioned above the gas movement passage 1111 , a first atomizing part 114a provided on the first bottom plate 113a , and a first It includes a water level control unit 117a, a plurality of first blocking plates 118a, a first eliminator 119a, and a first fluid ejection unit 130a for ejecting a fluid.
  • the first bottom plate 113a has a plate shape that is generally horizontally installed in the first processing unit 112a and is positioned above the gas passage 1111 .
  • the first processing unit 112a is divided into a first lower space 1121a and a first upper space 1122a with the first bottom plate 113a interposed therebetween, and the exhaust gas to be treated is disposed in the first upper space 1122a (
  • a first treatment liquid L1 including a treatment component that reacts with the treatment target component included in G1) to remove the treatment target component is stored.
  • a first atomizing part 114a is installed on the first bottom plate 113a.
  • the first atomizing unit 114a injects the processing target gas G1 existing in the first lower space 1121a to the first upper space 1122a in which the first processing liquid L1 is stored.
  • the processing target gas G1 injected by the first atomizing unit 114a forms micro-bubbles B in the first processing liquid L1.
  • the first atomizing part 114a includes a first gas injection nozzle 115a that injects the gas to be processed G1 into the first upper space 1122a, and a first gas injection nozzle 115a located at the end of the first gas injection nozzle 115a.
  • a collision plate 116a is provided.
  • the microbubbles B formed by the first atomizing part 114a Due to the microbubbles B formed by the first atomizing part 114a, a contact area between the gas and the first processing liquid L1 in the first upper space 1122a increases. In addition, since the microbubbles B rise more slowly than general bubbles in the first treatment liquid L1, they stay for a longer time. Accordingly, in the first upper space 1122a , the reaction efficiency of the processing target component included in the processing target exhaust gas G1 and the processing component included in the first processing liquid L1 is remarkably increased.
  • the first gas injection nozzle 115a is formed to protrude upward from the first bottom plate 113a and is positioned in the first upper space 112a.
  • the target gas G1 of the first lower space 1121a is sprayed upwardly into the first upper space 1122a by the first gas injection nozzle 115a.
  • a section is formed in the first gas injection nozzle 115a in which the inner passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows through the first gas injection nozzle 115a.
  • a first collision plate 116a is positioned adjacent to an end of the first gas injection nozzle 115a.
  • the first collision plate 116a is positioned in the first upper space 1122a so as to be adjacent to the end of the first gas injection nozzle 115a.
  • the gas injected from the first gas injection nozzle 115a collides with the first collision plate 116a to form microbubbles B.
  • the first collision plate 116a is described as having a two-stage structure in which two 1161a and 1162a are sequentially disposed along the height direction, but the present invention is not limited thereto. It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the first upper collision plate 1162a positioned above is larger to cover the entirety of the first lower collision plate 1161a positioned below, and there is at least one between the first upper collision plates 1162a.
  • the first passage 1163a is formed.
  • the installation height of the first collision plate 116a may be changed so that the distance from the first gas injection nozzle 115a may be adjusted.
  • the first water level adjusting unit 117a is located on the side of the first upper space 1122a and controls the water level of the first treatment liquid L1 through overflow in the first upper space 1122a.
  • the first water level adjusting unit 117a includes a first water level adjusting water tank 1172a communicating with the first upper space 1122a through the first water level adjusting opening 1171a formed in the sidewall of the first upper space 1122a. do.
  • the first water level control opening 1171a is positioned to correspond to the level control height of the first treatment liquid L1.
  • the first treatment liquid L1 overflowed from the first upper space 1122a is stored in the first water level control water tank 1172a.
  • the first treatment liquid L1 stored in the first water level control water tank 1172a is discharged and supplied to the treatment liquid supply unit 120 .
  • the plurality of first blocking plates 118a are disposed in layers above the water level of the first treatment liquid L1 set in the first upper space 1122a. The rapid rise of the first treatment liquid L1 stored in the first upper space 1122a is blocked by the plurality of first blocking plates 118a.
  • the first eliminator 119a is positioned above the first blocking plate 118a positioned at the top among the plurality of first blocking plates 118a in the first upper space 1122a to remove water droplets.
  • the first eliminator 119a is positioned below the intermediate gas passage 112c.
  • the first eliminator 119a is made of a synthetic resin material.
  • the second gas processing unit 112b is disposed directly above the first gas processing unit 112a, and is installed on the second bottom plate 113b and the second bottom plate 113b positioned above the intermediate gas passage 112c.
  • a second atomizing part 114b, a second water level adjusting part 117b, a plurality of second blocking plates 118b, and a second eliminator 119b are provided.
  • the second gas processing unit 112b performs secondary processing on the primary processing gas G2 discharged from the first gas processing unit 112a through the intermediate gas passage 112c, and as the final processing gas G3, the exhaust port ( 111b).
  • the second bottom plate 113b is generally horizontally installed in the second gas processing unit 112b and is positioned above the intermediate gas passage 112c.
  • the second processing unit 112b is divided into a second lower space 1121b and a second upper space 1122b with the second bottom plate 113b interposed therebetween, and the primary processing gas ( A second treatment liquid L2 containing a treatment component that reacts with the treatment target component included in G2) to remove the treatment target component is stored.
  • the second atomizing part 114b is installed on the second bottom plate 113b.
  • the second atomizing unit 114b injects the primary processing gas G2 existing in the second lower space 1121b to the second upper space 1122b in which the second processing liquid L2 is stored.
  • the primary processing gas G2 injected by the second atomizing unit 114b forms micro-bubbles B in the second processing liquid L2.
  • the second atomizing part 114b includes a second gas injection nozzle 115b that injects the primary processing gas G2 into the second upper space 1122b, and a second gas injection nozzle 115b located at the end of the second gas injection nozzle 115b. 2
  • the collision plate 116b is provided.
  • the microbubbles B formed by the second atomizing part 114b Due to the microbubbles B formed by the second atomizing part 114b, a contact area between the gas and the second processing liquid L2 in the second upper space 1122b increases. In addition, since the microbubbles B rise more slowly than general bubbles in the second treatment liquid L2, they stay for a longer time. Accordingly, in the second upper space 1122b , the reaction efficiency between the processing target component included in the primary processing gas G2 and the processing component included in the second processing liquid L2 is remarkably increased.
  • the second gas injection nozzle 115b is formed to protrude upward from the second bottom plate 113b and is positioned in the second upper space 112b.
  • the primary processing gas G2 of the second lower space 1121b is sprayed upwardly into the second upper space 1122b by the second gas injection nozzle 115b.
  • a section is formed in the second gas injection nozzle 115b in which the inner passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows through the second gas injection nozzle 115b.
  • a second collision plate 116b is positioned adjacent to an end of the second gas injection nozzle 115b.
  • the second collision plate 116b is positioned in the second upper space 1122b so as to be adjacent to the end of the second gas injection nozzle 115b.
  • the gas injected from the second gas injection nozzle 115b collides with the second collision plate 116b to form microbubbles B.
  • the second collision plate 116b is described as having a two-stage structure in which two 1161b and 1162b are sequentially disposed along the height direction, but the present invention is not limited thereto. It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the second upper collision plate 1162b located above is larger to cover the entire second lower collision plate 1161b located below, and at least one Preferably, the second passage 1163b is formed.
  • the installation height of the second collision plate 116b may be changed so that the distance from the second gas injection nozzle 115b may be adjusted.
  • the second water level adjusting unit 117b is located on the side of the second upper space 1122b and controls the water level of the second treatment liquid L2 through overflow in the second upper space 1122b.
  • the second water level control unit 117b includes a second water level control water tank 1172b that communicates with the second upper space 1122b through the second water level control opening 1171b formed in the sidewall of the second upper space 1122b. do.
  • the second water level control opening 1171b is positioned to correspond to the level control height of the second treatment liquid L2.
  • the second treatment liquid L2 overflowed from the second upper space 1122b is stored in the second water level control water tank 1172b.
  • the second treatment liquid L2 stored in the second water level control water tank 1172b is discharged and supplied to the treatment liquid supply unit 120 .
  • the plurality of second blocking plates 118b are disposed in layers above the water level of the second treatment liquid L2 set in the second upper space 1122b. The rapid rise of the second processing liquid L2 stored in the second upper space 1122b is blocked by the plurality of second blocking plates 118b.
  • the second eliminator 119b is positioned above the second blocking plate 118b positioned at the top among the plurality of second blocking plates 118b in the second upper space 1122b to remove water droplets.
  • the second eliminator 119b is located below the exhaust port 111b.
  • the second eliminator 119b is made of a synthetic resin material.
  • the reactor 110 is described as including the first gas processing unit 112a and the second gas processing unit 112b which are continuously arranged from bottom to top along the height direction, but unlike this, the first gas processing unit 112a ), or three or more gas processing units may be continuously arranged along the height direction, which is also within the scope of the present invention.
  • the gas flow fan 105 flows the exhaust gas so that the gas G1 to be treated passes through the reactor 110 .
  • the gas flow fan 105 is described as an exhaust fan located downstream of the reactor 110 with respect to the exhaust gas flow direction, but the present invention is not limited thereto.
  • the gas flow fan 105 may be located upstream of the reactor 110 with respect to the exhaust gas flow direction, and this is also within the scope of the present invention.
  • the treatment liquid supply unit 120 circulates and supplies the treatment liquids L1 and L2 to the reactor 110 .
  • the treatment liquid supply unit 120 includes a first treatment liquid supply device 120a that circulates and supplies the first treatment liquid L1 to the first gas treatment unit 112a of the reactor 110 , and a second gas of the reactor 110 .
  • a second processing liquid supply device 120b for circulating and supplying the second processing liquid L2 to the processing unit 112b is provided.
  • the first treatment liquid supply device 120a transfers the first treatment liquid L1 drained from the first water level control water tank 1171a of the first water level control unit 117a of the reactor 110 to the first upper space 1122a. circulated to supply
  • the first treatment liquid supply device 120a includes a first treatment liquid storage tank 123a in which the first treatment liquid L1 drained from the first water level control water tank 1171a through the first treatment liquid drain line 124a is stored.
  • a first treatment liquid supply pump 128a for flowing the first treatment liquid L1 of 123a into the first upper space 1122a through the first treatment liquid supply line 125a is provided.
  • the second treatment liquid supply device 120b transfers the second treatment liquid L2 drained from the second water level control water tank 1171b of the second water level control unit 117b of the reactor 110 to the second upper space 1122b. circulated to supply
  • the second treatment liquid supply device 120b includes a second treatment liquid storage tank 123b in which the second treatment liquid L2 drained from the second water level control water tank 1171b through the second treatment liquid drain line 124b is stored.
  • a second processing liquid supply pump 128b for flowing the second processing liquid L2 of 123b into the second upper space 1122b through the second processing liquid supply line 125b is provided.
  • the water level of the first processing liquid L1 in the first gas processing unit 112a and the second gas processing unit 112b The water level of the second treatment liquid L2 of A1 is below A1 and A2 is below, respectively. That is, in the state before the operation of the gas processing apparatus 100a, the water level of the first processing liquid L1 is located below the end of the first gas injection nozzle 115a, and the water level of the second processing liquid L1 is the second 2 It is located below the end of the gas injection nozzle (115a).
  • the first processing liquid L1 does not leak downward through the first gas injection nozzle 115a and the second processing liquid L2 does not leak downward through the second gas injection nozzle 115b.
  • the gas flow fan 105 operates in this state, the gas of the first lower space 1121a is injected into the first upper space 1122a through the first gas injection nozzle 115a, and the second gas injection nozzle ( The gas of the second lower space 1121b is injected into the second upper space 1122b through 115b.
  • the first treatment liquid L1 is supplied by the first treatment liquid supply device 120a to the first upper space 1121a so that the water level of the first treatment liquid L1 is microbubbles B as shown. ) is sufficiently high to be formed, and the water level is properly maintained by the first water level adjusting unit 117a, and the second treatment liquid L2 is also used in the second upper space 1121b by the second treatment liquid supply device 120b. .
  • the gas treatment apparatus 200a includes a reactor 210 in which a removal reaction for a treatment target component included in a treatment target exhaust gas G1 by a treatment liquid occurs, and the treatment target exhaust gas G1 .
  • a gas flow fan 105 for flowing the exhaust gas through the reactor 210 a treatment liquid supply unit 120 for supplying a treatment liquid to the reactor 210 , and an injection for supplying an injection fluid to the reactor 210 .
  • the fluid supply unit 130 and the solid content discharge means 140 for discharging the solid content accumulated in the reactor 210 to the outside of the reactor (110) is provided.
  • the reactor 210 removes the treatment target component included in the incoming treatment target gas G1 by reacting the treatment liquid with the treatment component.
  • 4 shows the configuration of the reactor 210 .
  • the reactor 210 further includes a first fluid injection unit 130a and a second fluid injection unit 130b to the reactor 110 illustrated in FIG. 2 . That is, the reactor 210 includes all the configurations of the reactor 110 shown in FIG. 2 in addition to the first fluid injection unit 130a and the second fluid injection unit 130b.
  • the configuration indicated by the same reference numerals as in FIG. 2 means the same configuration of the reactor 110 shown in FIG.
  • the rest of the configuration is the same as that of the reactor 110 shown in FIG. 2 , so a detailed description thereof will be omitted. Only the first fluid ejection unit 130a and the second fluid ejection unit 130b will be described in detail.
  • the first fluid ejection unit 130a includes a plurality of first fluid ejection nozzles 131a for injecting a fluid such as compressed air or industrial water in the inner space of the first gas processing unit 112a. Some of the plurality of first fluid ejection nozzles 131a inject a fluid into the first gas ejection nozzle 115a in the first lower space 1121a, and another portion in the first upper space 1122a The fluid is injected to the outside of the first gas injection nozzle 115a. High-pressure gas such as compressed air or industrial water supplied from the injection fluid supply unit 130 is injected from the plurality of first fluid injection nozzles (131a). The first gas injection nozzle 115a is prevented from being blocked by solids by the fluid injected from the plurality of first fluid injection nozzles 131a positioned adjacent to the first gas injection nozzle 115a.
  • the second fluid ejection unit 130b includes a plurality of second fluid ejection nozzles 131b for injecting a fluid such as compressed air or industrial water in the inner space of the second gas processing unit 112b. Some of the plurality of second fluid ejection nozzles 131b inject a fluid into the second gas ejection nozzle 115b in the second lower space 1121b, and another portion in the second upper space 1122b The fluid is injected to the outside of the second gas injection nozzle 115b. High-pressure gas such as compressed air or industrial water supplied from the injection fluid supply unit 130 is injected from the plurality of second fluid injection nozzles (131b). The second gas injection nozzle 115b is prevented from being blocked by solids by the fluid injected from the plurality of second fluid injection nozzles 131b positioned adjacent to the second gas injection nozzle 115b.
  • the gas flow fan 105 flows the exhaust gas such that the exhaust gas G1 to be treated passes through the reactor 210 . Since the gas flow fan 105 has the same configuration as the gas flow fan 105 shown in FIG. 1 , a detailed description thereof will be omitted.
  • the treatment liquid supply unit 120 circulates and supplies the treatment liquids L1 and L2 to the reactor 110 . Since the processing liquid supply unit 120 has the same configuration as the processing liquid supply unit 120 illustrated in FIGS. 1 and 2 , a detailed description thereof will be omitted.
  • the injection fluid supply unit 130 includes a plurality of first fluid injection nozzles 131a included in the first fluid injection unit 130a and a plurality of first fluid injection nozzles 131a included in the second fluid injection unit 130b. 2
  • a high-pressure gas such as compressed air or a fluid such as industrial water is supplied to the fluid injection nozzles 131b.
  • the solids discharging means 140 discharges the solids deposited in the reactor 110 to the outside of the reactor 110 .
  • 5 shows the configuration of the solid content discharge means (140).
  • the solid content discharging means 140 includes a solid content transfer device 141 for transferring the solids deposited in the reactor 110 to the outside of the reactor 110, and a solid content transfer device 141 by the reactor ( A solid content drop discharge unit 145 for dropping and discharging the solids transferred to the outside of 110) is provided.
  • the solid content transfer device 141 transfers the solid content deposited in the reactor 110 to the outside of the reactor 110 .
  • the solid content transfer device 141 includes a first upper space 1122a provided in the first gas processing unit 112a of the reactor 110 and a second gas processing unit 112b of the reactor 110 as shown in FIG. 3 . It is connected to the second upper space (1122b) provided in the installed. 5 shows a state in which the solid content transfer device 141 is connected to and installed in the first upper space 1122a of the first gas processing unit 112a. Referring to FIG.
  • the solids conveying device 141 is a screw feeder of a conventional structure, and a conveying pipe 141, a conveying screw 143 rotating in the conveying pipe 141, and a conveying screw A screw driver 144 for rotating 143 is provided.
  • the transfer pipe 141 is formed to extend substantially horizontally to the outside of the reactor 110 at a position adjacent to the first bottom plate 113a in the first upper space 1122a.
  • the transfer screw 143 is located in the transfer pipe 141 and rotates by the screw driver 144 .
  • One end of the transfer screw 143 protrudes into the first upper space 1122a and is located adjacent to the top of the first bottom plate 113a.
  • the screw driver 144 rotates the transfer screw 143 .
  • the transfer screw 143 is rotated by the screw driver 144 , the solids deposited on the first bottom plate 113a are transferred to the outside through the transfer pipe 141 .
  • the solid content drop discharge unit 145 drops and discharges the solid content transferred to the outside of the reactor 110 by the solid content transfer device 141 .
  • the solid content drop discharge unit 145 includes a solid content discharge pipe 146 extending vertically and a discharge valve 147 installed on the solid content discharge pipe 146 .
  • the solid content discharge pipe 146 communicates with the transfer pipe 141 of the solid content transfer device 141 and extends downward from the transfer pipe 141 .
  • the discharge valve 147 is installed on the solids discharge pipe 146 to control the discharge of solids through the solids discharge pipe 146 .
  • a rotary valve excellent in water tightness is used as the discharge valve 147 .
  • FIG. 6 is a block diagram showing an example of a wet flue gas desulfurization facility in which the gas processing device 200a shown in FIG. 3 is used as an exhaust gas desulfurization device.
  • the wet flue gas desulfurization facility 100 is a facility for reducing the sulfur dioxide (SO 2 ) content of the exhaust gas G1, and performs desulfurization treatment on the exhaust gas G1 according to an embodiment of the present invention.
  • the water separated by the first solid-liquid separator 160 and the second solid-liquid separator 170 is stored, and a water storage tank 180 for supplying a portion of the stored water to the calcium carbonate supply unit 145 is included.
  • the gas processing apparatus 200a is the gas processing apparatus 200a having the configuration shown in FIGS. 3 and 4 , a detailed description thereof will be omitted.
  • the first processing liquid L1 used in the gas processing device 200a includes calcium carbonate (CaCO 3 ) supplied from the calcium carbonate supply unit 145 , and the first gas processing unit 112a includes a product containing calcium carbonate. 1
  • the desulfurization reaction as shown in the following [Scheme 3] occurs mainly by the treatment liquid (L1).
  • calcium carbonate (CaCO 3 ) supplied from the calcium carbonate supply unit 145 is included in the second processing liquid L2 used in the gas processing device 200a, and the second gas processing unit 112b also contains calcium carbonate.
  • the reaction as shown in [Scheme 3] and [Scheme 4] above occurs by the second treatment liquid L2.
  • Solid content such as dihydrate gypsum is generated by the desulfurization reaction as in Reaction Formulas 3 and 4 above, and this solid content blocks the first and second gas injection nozzles 115a and 115b, and the first and second fluid injection nozzles The first and second gas injection nozzles 115a and 115b are prevented from being blocked by solids by the fluid injected from the 131a and 131b.
  • the calcium carbonate supply unit 145 stores a calcium carbonate slurry that is water in which calcium carbonate (CaCO 3 ) is dispersed and mixed, and supplies the stored calcium carbonate slurry to the gas processing device 200a for desulfurization. Specifically, in this embodiment, the calcium carbonate supply unit 145 supplies the calcium carbonate slurry to the first treatment liquid supply line 125a of the first treatment liquid supply device (120a in FIG. 4 ) and the second treatment liquid supply device (see FIG. 4 ). It will be described as supplying to the second treatment liquid supply line 125b of 120b). The calcium carbonate supply unit 145 receives water from the water storage tank 180 .
  • the solid content discharged from the gas processing device 200a is stored in the solid content storage unit 149 .
  • the solid content storage unit 149 stores the solid content discharged from the desulfurization reactor 110 unit by the solid content discharge means (140 in FIGS. 3 and 5).
  • the oxidation reaction tank 150 calcium sulfite discharged from the first and second treatment liquid storage tanks ( 123a and 123b in FIGS. 4 ) provided in the treatment liquid supply unit ( 120 in FIGS. 3 and 4 ) of the gas treatment apparatus 200a is removed.
  • an oxidation reaction as in [Reaction Formula 4] occurs, and gypsum dihydrate (CaSO 4 ⁇ 2H 2 O) is generated according to the oxidation reaction.
  • An air supply unit 151 for oxidation reaction is installed in the oxidation reaction tank 150 .
  • Dihydrate gypsum in the oxidation reaction tank 150 is discharged as a primary gypsum slurry and is supplied to the first solid-liquid separator 160 .
  • the first solid-liquid separator 160 first separates water from the primary gypsum slurry discharged from the oxidation reaction tank 150 .
  • the first solid-liquid separator 160 is a hydrocyclone device.
  • the water separated in the first solid-liquid separator 160 is supplied to the water storage tank 180 , and the remaining secondary gypsum steel is supplied to the second solid-liquid separator 170 .
  • the second solid-liquid separator 170 secondarily separates water from the secondary gypsum slurry discharged from the first solid-liquid separator 160 .
  • the second solid-liquid separator 170 is a vacuum belt filter (VBF).
  • the water separated in the second solid-liquid separator 170 is advanced to the water storage tank 180 .
  • the intermediate storage tank 175 selectively stores the primary gypsum slurry discharged from the first solid-liquid separator 160 before supplying it to the second solid-liquid separator 170 .
  • the water storage tank 180 stores water separated from the first solid-liquid separator 160 and the second solid-liquid separator 170 , and supplies a portion of the stored water to the calcium carbonate supply unit 145 .
  • the gas treatment module 310 removes hydrogen sulfide contained in the gas to be treated (G in ) flowing in from the gas introduction module 350 by reacting with the hydrogen sulfide removing agent contained in the treatment liquids L1, L2, and L3 to remove the exhaust gas. It is discharged as (G out ).
  • the gas processing module 310 includes a plurality of reactors 320 , 330 , and 340 that are sequentially arranged from bottom to top along the height direction. In this embodiment, the gas treatment module 310 is described as having three reactors 320, 330, 340, but unlike this, it may have two or four or more reactors arranged in sequence along the height direction, , which is also within the scope of the present invention.
  • the lowermost reactor 320 among the three reactors 320, 330, 340 is referred to as a first reactor
  • the uppermost reactor among the three reactors 320, 330, 340 ( 340) is referred to as a third reactor
  • a reactor 330 positioned between the first reactor 320 and the third reactor 340 among the three reactors 320, 330, and 340 is referred to as a second reactor.
  • the three reactors 320 , 330 , 340 have substantially the same configuration.
  • the first reactor 320 provides a first gas processing space 321 in which the first processing liquid L1 is stored to a predetermined height.
  • the first reactor 320 includes a first bottom plate 322 , a first ceiling plate 323 , a first side wall 324 , and a first atomizing part 325 installed on the first bottom plate 322 . and a first water level adjusting unit 327 , a plurality of first blocking plates 3281 and 3282 , and a first eliminator 329 .
  • the first reactor 320 treats the hydrogen sulfide contained in the gas to be treated (G in ) with the first treatment liquid (L1) and discharges it as the primary treatment gas (G1).
  • the first bottom plate 322 has a generally flat plate shape, and forms the bottom of the first gas processing space 321 .
  • a first atomizing part 325 is installed on the first bottom plate 322 .
  • the first ceiling plate 323 has a generally flat plate shape and is spaced apart from the first floor plate 322 to form a ceiling of the first gas processing space 321 .
  • a first processing gas outlet 3231 is formed in the first ceiling plate 323 .
  • the primary processing gas G1 is discharged upward toward the second reactor 330 through the first processing gas outlet 3231 .
  • the first sidewall 324 connects the edge of the first bottom plate 322 and the edge of the first ceiling plate 323 to form a sidewall of the first gas processing space 321 .
  • a first water level adjusting unit 327 is installed on the first sidewall 324 .
  • the first atomizing unit 325 injects the processing target gas G in existing under the first bottom plate 322 to the first gas processing space 321 in which the first processing liquid L1 is stored.
  • the processing target gas G in injected by the first atomizing unit 325 forms micro-bubbles B in the first processing liquid L1 .
  • the first atomizing unit 325 is located at the end of the first gas injection nozzle 3251 and the first gas injection nozzle 3251 for injecting the gas to be processed (G in ) into the first gas processing space 321 .
  • a first collision plate 326 is provided. Due to the microbubbles B formed by the first atomizing part 325 , a contact area between the gas and the first processing liquid L1 in the first gas processing space 321 is increased.
  • the microbubbles B rise more slowly than general bubbles in the first treatment liquid L1, they stay for a longer time. Accordingly, in the first gas treatment space 321 , the reaction efficiency of the hydrogen sulfide contained in the exhaust gas G in to be treated and the hydrogen sulfide removal chemical contained in the first treatment liquid L1 is remarkably increased.
  • the first gas injection nozzle 3251 is formed to protrude upward from the first bottom plate 322 and is positioned in the first gas processing space 321 .
  • the gas to be processed (G in ) existing under the first bottom plate 322 is sprayed upward in the height direction into the first gas processing space 321 by the first gas injection nozzle 3251 .
  • a section is formed in the first gas injection nozzle 3251 in which the inner passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows through the first gas injection nozzle 3251 .
  • a first collision plate 326 is positioned adjacent to an end of the first gas injection nozzle 3251 .
  • An inlet of the first gas injection nozzle 3251 forms a gas inlet of the entire gas processing module 310 .
  • the first collision plate 326 is positioned in the first gas processing space 321 so as to be adjacent to the end of the first gas injection nozzle 3251 .
  • the gas injected from the first gas injection nozzle 3251 collides with the first collision plate 326 to form microbubbles B in the first processing liquid L1 .
  • the first collision plate 326 is described as having a two-stage structure in which two 3261 and 3262 are sequentially arranged along the height direction as shown, but the present invention is not limited thereto, and 1 It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the first upper collision plate 3262 located above is larger to cover the entirety of the first lower collision plate 3261 located below, and at least one Preferably, the first passage 3263 is formed.
  • the installation height of the first collision plate 326 may be changed so that the distance from the first gas injection nozzle 3251 may be adjusted.
  • the first water level adjusting unit 327 is installed on the first sidewall 324 and controls the water level of the first treatment liquid L1 through overflow in the first gas treatment space 321 .
  • the first water level adjusting unit 327 is a first water level adjusting water tank communicating with the first gas treating space 321 through the first water level adjusting opening 3241 formed in the sidewall 324 of the first gas treating space 321 . (3271) is provided.
  • the first water level control opening 3271 is positioned to correspond to the level control height of the first treatment liquid L1.
  • the first processing liquid L1 overflowed from the first gas processing space 321 is stored in the first water level control water tank 3272 .
  • the first treatment liquid L1 stored in the first water level control water tank 3272 is discharged and supplied to the treatment liquid supply unit (360 in FIG. 7 ).
  • the first eliminator 329 is positioned above the first blocking plate 3282 positioned at the top among the plurality of first blocking plates 3281 and 3282 in the first gas processing space 321 to remove water droplets. .
  • the first eliminator 329 is located below the first processing gas outlet 3231 .
  • the first eliminator 329 is made of a synthetic resin material.
  • the second reactor 330 is disposed directly above the first reactor 320 , and a second gas processing space 331 in which the second processing liquid L2 is stored to a predetermined height. ) is provided.
  • the second reactor 330 includes a second bottom plate 332 , a second ceiling plate 333 , a second sidewall 334 , and a second atomizing part 335 installed on the second bottom plate 332 . and a second water level adjusting unit 337 , a plurality of second blocking plates 3381 and 3382 , and a second eliminator 339 .
  • the second reactor 330 treats hydrogen sulfide contained in the primary processing gas G1 discharged from the first reactor 320 with the second processing liquid L2 and discharges it as the secondary processing gas G2.
  • the second bottom plate 332 has a generally flat plate shape, and forms the bottom of the second gas processing space 331 .
  • a second atomizing part 335 is installed on the second bottom plate 332 .
  • the second ceiling plate 333 has a generally flat plate shape, and is spaced apart from the second floor plate 332 to form a ceiling of the second gas processing space 331 .
  • a second processing gas outlet 3331 is formed in the second ceiling plate 333 .
  • the secondary processing gas G2 is discharged upward toward the third reactor 340 through the second processing gas outlet 3331 .
  • the second sidewall 334 connects the edge of the second bottom plate 332 and the edge of the second ceiling plate 333 to form a sidewall of the second gas processing space 331 .
  • a second water level control unit 337 is installed on the second sidewall 334 .
  • the second atomizing unit 335 injects the primary processing gas G1 existing under the second bottom plate 332 to the second gas processing space 331 in which the second processing liquid L2 is stored.
  • the primary processing gas G1 injected by the second atomizing unit 335 forms micro-bubbles B in the second processing liquid L2 .
  • the second atomizing unit 135 is located at the end of the second gas injection nozzle 3351 for injecting the primary processing gas G1 into the second gas processing space 331 , and the second gas injection nozzle 3351 .
  • a second collision plate 336 is provided. Due to the microbubbles B formed by the second atomizing part 335 , a contact area between the gas and the second processing liquid L2 in the second gas processing space 331 is increased.
  • the microbubbles B rise more slowly than general bubbles in the second treatment liquid L2, they stay for a longer time. Accordingly, in the second gas processing space 331 , the reaction efficiency of the hydrogen sulfide included in the primary processing gas G1 and the hydrogen sulfide removal chemical included in the second processing liquid L2 is remarkably increased.
  • the second gas injection nozzle 3351 is formed to protrude upward from the second bottom plate 332 and is positioned in the second gas processing space 331 .
  • the primary processing gas G1 existing under the second bottom plate 332 is sprayed upward in the height direction into the second gas processing space 331 by the second gas injection nozzle 3351 .
  • a section is formed in the second gas injection nozzle 3351 in which the internal passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows through the second gas injection nozzle 3351 .
  • a second collision plate 336 is positioned adjacent to an end of the second gas injection nozzle 3351 .
  • the second collision plate 336 is positioned in the second gas processing space 331 so as to be adjacent to the end of the second gas injection nozzle 3351 .
  • the gas injected from the second gas injection nozzle 3351 collides with the second collision plate 336 to form microbubbles B in the second processing liquid L2 .
  • the second collision plate 336 is described as having a two-stage structure in which two 3361 and 3362 are sequentially disposed along the height direction, but the present invention is not limited thereto. It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the second upper collision plate 3362 located above is larger to cover the entire second lower collision plate 3361 located below, and at least one A second passage 3363 is preferably formed.
  • the installation height of the second collision plate 336 may be changed so that the distance from the second gas injection nozzle 3351 may be adjusted.
  • the second water level adjusting unit 337 is installed on the second sidewall 334 and controls the level of the second treatment liquid L2 through overflow in the second gas treatment space 331 .
  • the second water level control unit 337 is a second water level control water tank communicating with the second gas processing space 331 through the second water level control opening 3341 formed in the sidewall 334 of the second gas processing space 331 . (3371) is provided.
  • the second water level control opening 3371 is positioned to correspond to the level control height of the second treatment liquid L2.
  • the second processing liquid L2 overflowed from the second gas processing space 331 is stored in the second water level control water tank 3372 .
  • the second treatment liquid L2 stored in the second water level control water tank 3372 is discharged and supplied to the treatment liquid supply unit (360 in FIG. 7 ).
  • the plurality of second blocking plates 3381 and 3382 are disposed in layers above the water level of the second processing liquid L2 set in the second gas processing space 331 .
  • the rapid rise of the second processing liquid L2 stored in the second gas processing space 331 is blocked by the plurality of second blocking plates 3381 and 3382 .
  • the second eliminator 339 is positioned above the second blocking plate 3382 positioned at the top among the plurality of second blocking plates 3381 and 3382 in the second gas processing space 331 to remove water droplets. .
  • the second eliminator 339 is positioned below the second processing gas outlet 3331 .
  • the second eliminator 339 is made using a synthetic resin material.
  • the third reactor 340 is disposed directly above the second reactor 330 , and a third gas processing space 341 in which the third processing liquid L3 is stored to a predetermined height. ) is provided.
  • the third reactor 340 includes a third bottom plate 342 , a third ceiling plate 343 , a third side wall 344 , and a third atomizing part 345 installed on the third bottom plate 342 . and a third water level adjusting unit 347 , a plurality of third blocking plates 3481 and 3482 , and a third eliminator 349 .
  • the third reactor 340 treats hydrogen sulfide contained in the secondary processing gas G2 discharged from the second reactor 330 with the third processing liquid L3 and discharges it as an exhaust gas G out .
  • the third bottom plate 342 has a generally flat plate shape, and forms the bottom of the third gas processing space 341 .
  • a third atomizing part 345 is installed on the third bottom plate 342 .
  • the third ceiling plate 343 has a generally flat plate shape and is spaced apart from the third floor plate 342 to form a ceiling of the third gas processing space 341 .
  • a third processing gas discharge port 3431 which is a gas discharge port of the entire gas processing module 310 is formed in the third ceiling plate 343 .
  • the tertiarily processed exhaust gas G out is discharged from the gas processing module 310 through the third processing gas outlet 3431 .
  • the third sidewall 344 connects the edge of the third bottom plate 342 and the edge of the third ceiling plate 343 to form a sidewall of the third gas processing space 341 .
  • a third water level control unit 347 is installed on the third sidewall 344 .
  • the third atomizing unit 345 injects the secondary processing gas G2 existing under the third bottom plate 142 to the third gas processing space 341 in which the third processing liquid L3 is stored.
  • the secondary processing gas G2 injected by the third atomizing unit 345 forms micro-bubbles B in the third processing liquid L3 .
  • the third atomizing unit 345 is located at the end of the third gas injection nozzle 3451 for injecting the secondary processing gas G2 into the third gas processing space 341 , and the third gas injection nozzle 3451 .
  • a third collision plate 346 is provided. Due to the microbubbles B formed by the third atomizing part 345 , a contact area between the gas and the third processing liquid L3 in the third gas processing space 341 is increased.
  • the microbubbles B rise more slowly than general bubbles in the third treatment liquid L3, they stay for a longer time. Accordingly, in the third gas processing space 341 , the reaction efficiency of the hydrogen sulfide included in the secondary processing gas G2 and the hydrogen sulfide removal chemical included in the third processing liquid L3 is remarkably increased.
  • the third gas injection nozzle 3451 is formed to protrude upward from the third bottom plate 333 and is positioned in the third gas processing space 341 .
  • the secondary processing gas G2 existing under the third bottom plate 342 is sprayed upward in the height direction into the third gas processing space 341 by the third gas injection nozzle 3451 .
  • a section is formed in the third gas injection nozzle 3451 in which the internal passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows through the third gas injection nozzle 3451 .
  • a third collision plate 346 is positioned adjacent to an end of the third gas injection nozzle 3451 .
  • the third collision plate 346 is positioned in the third gas processing space 341 so as to be adjacent to the end of the third gas injection nozzle 3451 .
  • the gas injected from the third gas injection nozzle 3451 collides with the third collision plate 346 to form microbubbles B in the third processing liquid L3.
  • the third collision plate 346 is described as having a two-stage structure in which two 3461 and 3462 are sequentially disposed along the height direction, but the present invention is not limited thereto, and 1 It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the upper third upper impact plate 3462 is larger to cover the entirety of the third lower impact plate 3461 positioned below, and at least one A third passage 3463 is preferably formed.
  • the installation height of the third collision plate 346 may be changed so that the distance from the third gas injection nozzle 3451 may be adjusted.
  • the third water level control unit 347 is installed on the third sidewall 344 and controls the water level of the third processing liquid L3 through overflow in the third gas processing space 341 .
  • the third water level adjusting unit 347 is a third water level adjusting water tank communicating with the third gas treating space 341 through the third water level adjusting opening 3441 formed in the sidewall 344 of the third gas treating space 341 . (3471) is provided.
  • the third water level control opening 3471 is positioned to correspond to the level control height of the third treatment liquid L3.
  • the third processing liquid L3 overflowed from the third gas processing space 341 is stored in the third water level control water tank 3472 .
  • the third treatment liquid L3 stored in the third water level control water tank 3472 is discharged and supplied to the treatment liquid supply unit (360 in FIG. 7 ).
  • the plurality of third blocking plates 3481 and 3482 are disposed in layers above the water level of the third processing liquid L3 set in the third gas processing space 341 .
  • the sudden rise of the third processing liquid L3 stored in the third gas processing space 341 is blocked by the plurality of third blocking plates 3481 and 3482 .
  • the third eliminator 349 is positioned above the third blocking plate 3482 positioned at the top among the plurality of third blocking plates 3481 and 3482 in the third gas processing space 341 to remove water droplets. .
  • the third eliminator 349 is positioned below the third processing gas outlet 3431 .
  • the third eliminator 349 is made of a synthetic resin material.
  • the gas flow fan 308 flows the exhaust gas so that the gas to be processed (G in ) passes through the gas introduction module 350 and the gas processing module 310 in sequence.
  • the gas flow fan 308 is downstream of the gas processing module 310 with respect to the exhaust gas flow direction (on the exhaust pipe 302 through which the exhaust gas G out discharged from the gas processing module 310 flows) It is described as an exhaust fan located in the , but the present invention is not limited thereto.
  • the gas flow fan 308 may be located upstream of the gas introduction module 350 or upstream of the gas treatment module 310 with respect to the exhaust gas flow direction, which is also within the scope of the present invention.
  • the gas introduction module 350 guides the target gas G in to the gas processing module 310 .
  • the gas introduction module 350 includes a first gas introduction tank 351 , a second gas introduction tank 355 positioned below the gas treatment module 310 and spaced apart from the first gas introduction tank 351 ; A connection pipe 359 connecting the first gas introduction tank 351 and the second gas introduction tank 355 is provided.
  • the first gas introduction tank 351 is spaced apart from the side of the gas processing module 310 and provides a first gas introduction space 352 therein.
  • a gas inlet pipe 301 through which the target gas G in flows is connected to the ceiling 353 of the first gas introduction tank 351 .
  • the gas to be treated (G in ) is introduced into the first gas introduction space 352 through the gas inlet pipe 301 .
  • the gas to be treated (G in ) in the first gas introduction space 352 flows into the second gas introduction tank 355 through the connection pipe 359 .
  • the first processing liquid L1 is supplied to the first gas introduction space 352 by the processing liquid supply module 360 .
  • the unreacted first processing liquid L1 is stored at the bottom of the first gas introduction space 352 .
  • the first processing liquid L1 stored in the bottom of the first gas introduction space 352 is discharged and supplied to the processing liquid supply unit 360 of FIG. 7 .
  • the first gas introduction tank 351 has a configuration corresponding to the side gas introduction tank described in the claims.
  • the second gas introduction tank 355 is located directly below the gas processing module 310 and is spaced apart from the first gas introduction tank 351 .
  • the second gas introduction tank 355 is coupled to the gas treatment module 310 so as to be positioned below the first reactor 320 of the gas treatment module 310 .
  • the second gas introduction tank 355 provides a second gas introduction space 356 therein.
  • a passageway 358 communicating with the first gas injection nozzle 3251 of the first reactor 320 is formed on the ceiling 357 of the second gas introduction tank 355 .
  • the target gas G in of the second gas introduction space 356 flows into the first reactor 320 through the passage 358 .
  • the second gas introduction space 356 communicates with the first gas introduction space 352 through a connection pipe 359 .
  • the unreacted first processing liquid L1 is stored at the bottom of the second gas introduction space 356 .
  • the first processing liquid L1 stored in the bottom of the second gas introduction space 356 is discharged and supplied to the processing liquid supply unit (360 in FIG. 7 ).
  • the second gas introduction tank 355 has a configuration corresponding to the lower gas introduction tank described in the claims.
  • connection pipe 359 generally extends along a horizontal direction to connect the first gas introduction tank 351 and the second gas introduction tank 355 .
  • the first gas introduction space 352 and the second gas introduction space 356 communicate with each other by the connecting pipe 359 .
  • the target gas G in of the first gas introduction space 352 flows into the second gas introduction space 356 through the connection pipe 359 .
  • the connection pipe 359 is positioned sufficiently higher than the bottom of the first gas introduction space 352 and the bottom of the second gas introduction space 356 to be connected to the first gas introduction space 352 and the second gas introduction space 356 .
  • the stored first treatment liquid L1 is prevented from being present in the connection pipe 159 .
  • the gas circulation module 304 recirculates a portion of the exhaust gas G out discharged from the gas processing module 310 to the gas introduction module 350 . Accordingly, a sufficient amount of gas to form microbubbles in each of the first, second, and third reactors 320 , 330 , and 340 may be supplied.
  • the third reactor 120, the third reactor 130 and the third reactor 3 In the reactor 140 the gas flow velocity in the gas injection nozzles 3251, 3351, and 3451 is not sufficient, so atomizing may not occur in the atomizing units 325, 335, and 345, in this case
  • the gas flow rate in the gas injection nozzles 3251 , 3351 , and 3451 may be increased by recirculating the gas using the gas circulation module 304 , and the gas processing efficiency may also be improved.
  • the gas circulation module 304 includes a gas circulation pipe 305 connected to the gas inlet pipe 301 by branching at a point located downstream of the gas flow fan 308 in the gas discharge pipe 303 , and a gas circulation pipe 305 . ) is provided with an on-off valve 306 for opening and closing.
  • the processing liquid supply module 350 circulates and supplies the processing liquids L1 , L2 , and L3 to the gas processing module 310 .
  • the treatment liquid supply unit 350 includes a first treatment liquid supply device 370 , which circulates and supplies the first treatment liquid L1 to the first reactor 320 and the first gas introduction tank 351 , and the second reactor 330 . ) to the second treatment liquid supply device 380 for circulatingly supplying the second treatment liquid L2 to the ? ) is provided.
  • the first treatment liquid supply device 370 includes the first treatment liquid L1 and the first and second The first processing liquid L1 drained from the gas introduction tanks 351 and 355 is circulated and supplied to the first gas processing space 321 and the first gas introduction space 352 .
  • the first treatment liquid supply device 370 includes the first treatment liquid L1 drained from the first gas introduction tank 351 through the 1A treatment liquid drain line 371 and the second treatment liquid L1 drained from the second gas introduction tank 355 .
  • the first treatment liquid L1 drained through the 1B treatment liquid drain line 372 and the first treatment liquid L1 drained from the first water level control water tank 3272 through the 1C treatment liquid drain line 374 are The first treatment liquid storage tank 373 is stored, the first treatment liquid main supply line 375 extending from the first treatment liquid storage tank 373 , and the first treatment liquid main supply line 375 branching from the first treatment liquid storage tank 373 .
  • the first treatment liquid L1 of the first treatment liquid storage tank 373 is installed on the 375 , the first treatment liquid main supply line 375 , the first treatment liquid branch line 1 3751 , and the first treatment liquid
  • the first processing liquid supply pump 378 for flowing into the first gas processing space 321 and the first gas introduction space 352 through the branch line 2 3752 and the first processing liquid branch line 1 3751 are connected.
  • a first opening/closing valve 3753 for opening and closing and a second opening/closing valve 3754 for opening and closing the first processing liquid branch line 2 3752 are provided.
  • the second treatment liquid supply device 380 transfers the second treatment liquid L2 drained from the second water level control water tank 3372 of the second water level control unit 337 of the second reactor 330 to the second gas treatment space. Circulating supply to (331).
  • the second treatment liquid supply device 380 is a second treatment liquid storage tank 383 in which the second treatment liquid L2 drained from the second water level control water tank 3372 through the second treatment liquid drain line 384 is stored. and a second processing liquid supply line 385 extending from the second processing liquid storage tank 383 to the second gas processing space 331 , and the second processing liquid supply line 385 installed on the second processing liquid supply line 385 .
  • a second processing liquid supply pump 388 for flowing the second processing liquid L2 of the storage tank 383 into the second gas processing space 331 through the second processing liquid supply line 385 is provided.
  • the third treatment liquid supply device 390 transfers the third treatment liquid L3 drained from the third water level control water tank 3472 of the third water level control unit 347 of the third reactor 340 to the third gas treatment space. Circulating supply to (341).
  • the third treatment liquid supply device 390 is a third treatment liquid storage tank 393 in which the third treatment liquid L3 drained from the third water level control water tank 3472 through the third treatment liquid drain line 394 is stored. and a third processing liquid supply line 395 extending from the third processing liquid storage tank 393 to the third gas processing space 341 , and the third processing liquid supply line 395 installed on the third processing liquid supply line 395 .
  • a third processing liquid supply pump 398 for flowing the third processing liquid L3 of the storage tank 393 into the third gas processing space 341 through the third processing liquid supply line 395 is provided.
  • the water level of the first treatment liquid L1 in the first reactor 320 is located below the end of the first gas injection nozzle 3251, and the second reactor ( In 330 , the water level of the second treatment liquid L2 is located below the end of the second gas injection nozzle 3351 , and the water level of the third treatment liquid L3 in the third reactor 340 is the third gas injection It is located below the end of the nozzle 3451. Accordingly, the first processing liquid L1 does not leak downward through the first gas injection nozzle 3251 , and the second processing liquid L2 does not leak downward through the second gas injection nozzle 3351 , 3 The processing liquid L3 does not leak downward through the third gas injection nozzle 3451 .
  • the gas in the second gas introduction space 356 is injected into the first gas processing space 321 through the first gas injection nozzle 3251 ,
  • the gas of the first gas processing space 331 is injected into the second gas processing space 331 through the second gas injection nozzle 3351 , and the second gas processing space 331 through the third gas injection nozzle 3451 .
  • of gas is injected into the third gas processing space 341 , so that the processing liquids L1 , L2 , and L3 are suppressed from falling to the lower portions of the gas injection nozzles 3251 , 3351 , and 3451 .
  • the first processing liquid L1 is supplied by the first processing liquid supply device 370 to the first gas processing space 321 so that the water level of the first processing liquid L1 becomes microbubbles ( B) It becomes sufficiently high to be formed, and the water level is properly maintained by the first water level adjusting unit 327 , and the second treatment liquid is also provided by the second treatment liquid supply device 380 into the second gas treatment space 331 .
  • the third processing liquid L3 is also supplied by the third processing liquid supply device 390 to the gas processing space 341 , so that the water level of the third processing liquid L3 is not formed as microbubbles B as shown.
  • the water level is properly maintained by the third water level adjusting unit 347 .
  • the hydrogen sulfide removal agent contained in the treatment liquids (L1, L2, L3) is iron (II) chloride (ferrous chloride) (FeCl 2 ) or iron (III) chloride (chloride) that does not react with carbon dioxide. Ferric) (FeCl 3 ) It is described as being. Reaction formulas for hydrogen sulfide removal by the reaction of hydrogen sulfide and iron (III) chloride are shown in Schemes 5, 6, and 7 below.
  • the gas to be treated may be any gas containing nitrogen oxide.
  • the nitrogen oxides include nitrogen monoxide (NO) and nitrogen dioxide (NO 2 ).
  • the nitrogen oxide removal equipment includes a gas supply module 10, a nitrogen monoxide reaction module 20, a nitrogen dioxide reaction module 30, a gas flow fan 40, an oxidizing agent aqueous solution supply module 400, It includes a reducing agent aqueous solution supply module 500, an oxidizing agent pH sensor 600 and a control unit (not shown).
  • the gas supply module 10 the nitrogen monoxide reaction module 20, and the nitrogen dioxide reaction module 30 are arranged to communicate upwardly in multiple stages, the gas supply module 10 It is provided so that the target gas supplied through the process passes through the nitrogen monoxide reaction module 20 and the nitrogen dioxide reaction module 30 in sequence.
  • the nitrogen monoxide reaction module 20 is described as an example as one, but it is not limited thereto, and it is of course possible that two or more are connected in multiple stages in the vertical direction.
  • nitrogen dioxide reaction module 30 is described as one example, but is not limited thereto, and it is of course possible that two or more are connected in multiple stages in the vertical direction.
  • the gas supply module 10 is a module for supplying a process target gas introduced from the outside to the nitrogen monoxide reaction module 20 .
  • the gas supply module 10 includes two first and second gas supply tanks 11 and 12 , and a gas connection pipe 13 .
  • the first gas supply tank 11 and the second gas supply tank 12 are spaced apart from each other by a predetermined distance in the horizontal direction, and are connected through the gas connection pipe 13 .
  • the nitrogen monoxide reaction module 20 is provided in communication with the upper side of the second gas supply tank 12 .
  • the present invention is not limited thereto, and it is of course possible that the gas supply module 10 includes one gas supply tank.
  • the first gas supply tank 11 forms a space in which the gas to be treated is introduced and accommodated, and an inlet pipe 11a through which the gas to be treated is introduced is connected to an upper portion of the first gas supply tank 11 .
  • a portion of the oxidizing agent aqueous solution is accommodated in the lower portion of the first gas supply tank 11 .
  • An aqueous solution discharge path 400 for draining the accommodated aqueous solution to the outside is connected to the lower portion of the first gas supply tank 11 .
  • the second gas supply tank 12 forms a space in which the gas to be treated introduced through the gas connection pipe 13 is accommodated, and an upper surface thereof is connected to the nitrogen monoxide reaction module 20 .
  • An oxidizing agent aqueous solution is partially accommodated in the lower portion of the second gas supply tank 12 .
  • the aqueous solution discharge passage 400 to be described later is connected to a lower portion of the second gas supply tank 12 .
  • the gas flow fan 40 is a fan for allowing the gas to be treated to flow upwardly through the nitrogen monoxide reaction module 20 and the nitrogen dioxide reaction module 30 in sequence.
  • the gas flow fan 40 will be described as an example provided in a gas discharge pipe connected to the discharge port 31b of the nitrogen dioxide reaction module 30 .
  • the present invention is not limited thereto, and the installation position of the gas flow fan 40 may be variously changed and applied.
  • the nitrogen monoxide reaction module 20 is provided above the gas supply module 10 to receive the gas to be processed from the gas supply module 10 upward, and nitrogen monoxide contained in the gas to be processed. (NO) is reacted with an oxidizing agent aqueous solution containing an oxidizing agent, and is oxidized to nitrogen dioxide (NO 2 ).
  • the nitrogen monoxide reaction module 20 includes a nitrogen monoxide reaction tank 21 , a first gas injection nozzle 22 , a first collision plate 23 , a first blocking plate 24 , and a first water level control unit 25 . and a first eliminator 26 .
  • the nitrogen monoxide reactor 21 has a first inlet 21a through which the gas to be treated flows upwardly is formed on a bottom surface thereof, and a first outlet 21b through which the gas to be treated is discharged upwardly is formed on an upper surface of the nitrogen monoxide reactor 21 .
  • the nitrogen monoxide reaction tank 21 forms a space in which the process target gas and the oxidizing agent aqueous solution react.
  • the nitrogen monoxide reactor 21 receives an oxidizing agent aqueous solution from an oxidizing agent aqueous solution supply passage 120 to be described later.
  • the first gas injection nozzle 22 is formed to protrude upward from the inlet 21a, and upwardly injects the gas to be treated, introduced through the inlet 21a, into the nitrogen monoxide reactor 21. to be.
  • the first gas injection nozzle 22 is formed to protrude by a predetermined height from the bottom surface of the nitrogen monoxide reactor 21 .
  • the first gas injection nozzle 22 is formed such that the injection port becomes narrower toward the end to increase the speed of the gas.
  • the first collision plate 23 is disposed within the nitrogen monoxide reactor 21 to be spaced apart from the upper end of the first gas injection nozzle 22 by a predetermined distance, and is injected from the first gas injection nozzle 22 . It is a plate formed so that the gas to be processed collides.
  • the first collision plate 23 causes the gas to be treated, which is injected from the first gas injection nozzle 22 , to collide and diffuse while forming microbubbles in the oxidizing agent aqueous solution.
  • a plurality of the first collision plates 23 are disposed to be spaced apart from each other in a horizontal or vertical direction.
  • At least one of the plurality of first collision plates 23 is opposite to the upper end of the first gas ejection nozzle 22 at a height spaced upward by a predetermined distance from the upper end of the first gas ejection nozzle 22 .
  • the first collision plate 23 is described as an example that is arranged in a two-stage structure in the vertical direction, but is not limited thereto, and it is of course possible to have a single-stage or three-stage or more structure.
  • the first blocking plate 24 is installed under the first eliminator 26 in the upper part of the nitrogen monoxide reactor 21 , and the oxidizing agent aqueous solution accommodated in the nitrogen monoxide reactor 21 is applied to the first It is a plate that blocks the rise to the eliminator 26 side.
  • the first blocking plate 24 is disposed higher than the water level of the oxidizing agent aqueous solution accommodated in the nitrogen monoxide reactor 21 .
  • the first blocking plate 24 protrudes from the side surface of the nitrogen monoxide reactor 21 in the horizontal direction, and a plurality of first blocking plates 24 are vertically spaced apart from each other by a predetermined distance.
  • the first water level control unit 25 is a first water level control water tank installed in communication with the first water level control hole 25a formed on the side of the nitrogen monoxide reaction tank 21 .
  • the first water level adjusting unit 25 temporarily accommodates the oxidizing agent aqueous solution overflowed from the first water level adjusting hole 25a, thereby raising the water level of the oxidizing agent aqueous solution inside the nitrogen monoxide reaction tank 21 to a certain height or more. It can be adjusted so that it does not rise to A first oxidizing agent aqueous solution supply passage 141 to be described later is connected to a lower portion of the first water level control unit 25 .
  • the first eliminator 26 is installed between the first blocking plates 24 and the first outlet 21b at the upper portion of the nitrogen monoxide reaction tank 21, and the nitrogen monoxide reaction tank 21 It is a device that removes air bubbles generated in The first eliminator 26 is made of a synthetic resin material.
  • the nitrogen dioxide reaction module 30 is disposed above the nitrogen monoxide reaction module 20 , and receives the gas to be treated that has passed through the nitrogen monoxide reaction module 20 upwardly.
  • the nitrogen dioxide reaction module 30 is a module for reducing and removing nitrogen dioxide (NO 2 ) by reacting nitrogen dioxide (NO 2 ) contained in the gas to be treated with an aqueous reducing agent solution containing a reducing agent.
  • the nitrogen dioxide reaction module 30 includes a nitrogen dioxide reaction tank 31 , a second gas injection nozzle 32 , a second collision plate 33 , a second blocking plate 34 , a second water level adjusting unit 35 and a second 2 includes an eliminator (36).
  • the nitrogen dioxide reactor 31 has a second inlet 31a through which the gas to be treated flows upwardly is formed on its bottom surface, and a second outlet 31b through which the gas to be treated is discharged upwardly is formed on its upper surface.
  • An opening/closing part may be installed in the second inlet 31a, and the opening/closing part may shield the second inlet 31a when the gas flow fan is stopped.
  • the nitrogen dioxide reaction tank 31 may be separately provided with a reducing agent aqueous solution discharging means for discharging the reducing agent aqueous solution accommodated therein to the outside when the operation of the gas flow fan is stopped.
  • the nitrogen dioxide reaction tank 31 forms a space in which the processing target gas and the reducing agent aqueous solution react.
  • the nitrogen dioxide reaction tank 31 receives a reducing agent aqueous solution from a reducing agent aqueous solution supply passage 520 to be described later.
  • the second gas injection nozzle 32 is formed to protrude upward from the second inlet 31a, and the gas to be treated introduced through the second inlet 31a is directed upward into the nitrogen dioxide reactor 31 . It is a spray nozzle.
  • the second gas injection nozzle 32 is formed to protrude by a predetermined height from the bottom surface of the nitrogen dioxide reactor 31 .
  • the second gas injection nozzle 32 is formed such that the injection port becomes narrower toward the end to increase the speed of the gas.
  • the second collision plate 33 is disposed to be spaced a predetermined distance from the upper end of the second gas injection nozzle 32 in the nitrogen dioxide reaction tank 31 , and is injected from the second gas injection nozzle 32 . It is a plate formed so that the gas to be processed collides.
  • the second collision plate 33 collides with the gas to be treated, injected from the second gas injection nozzle 32 , to form and diffuse microbubbles in the reducing agent aqueous solution.
  • a plurality of the second collision plates 33 are disposed to be spaced apart from each other in a horizontal or vertical direction.
  • At least one of the plurality of second collision plates 33 is opposite to the upper end of the second gas injection nozzle 32 at a height spaced upward by a predetermined distance from the upper end of the second gas injection nozzle 32 .
  • the second collision plate 33 is described as an example that is arranged in a two-stage structure in the vertical direction, but is not limited thereto.
  • the second blocking plate 34 is installed below the second eliminator 36 in the upper part of the nitrogen dioxide reaction tank 31, and the reducing agent aqueous solution accommodated in the nitrogen dioxide reaction tank 31 is converted into the second eliminator. It is a plate that blocks the rise to the eater 36 side.
  • the second blocking plate 34 is disposed higher than the water level of the reducing agent aqueous solution accommodated in the nitrogen dioxide reaction tank 31 .
  • the second blocking plate 34 protrudes from the side surface of the nitrogen dioxide reactor 31 in the horizontal direction, and a plurality of the second blocking plates 34 are vertically spaced apart from each other by a predetermined distance.
  • the second water level control unit 35 is a second water level control water tank installed in communication with the second water level control hole 35a formed on the side of the nitrogen dioxide reaction tank 31 .
  • the second water level adjusting unit 35 temporarily accommodates the reducing agent aqueous solution overflowed from the second water level adjusting hole 35a, thereby raising the water level of the reducing agent aqueous solution inside the nitrogen dioxide reaction tank 31 to a certain height or higher. It can be adjusted so that it does not rise.
  • a reducing agent aqueous solution discharge passage 240 to be described later is connected to a lower portion of the second water level control unit 35 .
  • the second eliminator 36 is installed between the second blocking plates 34 and the second outlet 31b at the upper part of the nitrogen dioxide reaction tank 31, and is generated in the nitrogen dioxide reaction tank 31 It is a device that removes air bubbles.
  • the second eliminator 36 is made of a synthetic resin material.
  • the oxidizing agent aqueous solution supply module 400 is connected to the nitrogen monoxide reaction module 20, and when the gas to be treated is supplied to the nitrogen monoxide reaction tank 21, the oxidizing agent aqueous solution is supplied to the nitrogen monoxide reaction tank 21 is a module for accommodating the oxidizing agent aqueous solution that overflows from the nitrogen monoxide reactor 21 and is discharged.
  • the oxidizing agent aqueous solution supply module 400 includes an oxidizing agent aqueous solution storage tank 410, an oxidizing agent aqueous solution supply passage 420, first and second oxidizing agent aqueous solution valves 431 and 432, an oxidizing agent aqueous solution discharge passage 441, an oxidizing agent aqueous solution a pump 450 .
  • the oxidizing agent aqueous solution storage tank 410 is a tank in which the oxidizing agent aqueous solution containing the oxidizing agent is stored.
  • the oxidizing agent includes sodium hypochlorite (NaClO) and hydrogen chloride (HCl).
  • the oxidizing agent aqueous solution supply passage 420 and the oxidizing agent aqueous solution discharge passage 441 are connected to the oxidizing agent aqueous solution storage tank 410 .
  • the oxidizing agent aqueous solution supply passage 420 is a flow passage for supplying the oxidizing agent aqueous solution in the oxidizing agent aqueous solution storage tank 410 to the nitrogen monoxide reaction tank 21 .
  • the oxidizing agent aqueous solution supply passage 420 includes a first oxidizing agent aqueous solution supply passage 421 and a second oxidizing agent aqueous solution supply passage 422 .
  • the first oxidizing agent aqueous solution supply passage 421 is a flow passage for supplying the oxidizing agent aqueous solution from the oxidizing agent aqueous solution storage tank 410 to the nitrogen monoxide reaction tank 21 .
  • An oxidizing agent aqueous solution pump 450 for pumping the oxidizing agent aqueous solution and a first oxidizing agent aqueous solution valve 431 for controlling the supply of the oxidizing agent aqueous solution are installed in the fourth oxidizing agent aqueous solution supply passage 421 .
  • the second oxidizing agent aqueous solution supply passage 422 is branched from the first oxidizing agent aqueous solution supply passage 421 and supplies the oxidizing agent aqueous solution to the gas supply module 10 .
  • a second oxidizing agent aqueous solution valve 432 for intermittent supply of the oxidizing agent aqueous solution is installed in the second oxidizing agent aqueous solution supply passage 422 .
  • the oxidizing agent aqueous solution discharge passage 441 connects the first water level adjusting unit 25 and the oxidizing agent aqueous solution storage tank 410 to store the oxidizing agent aqueous solution discharged from the first water level adjusting unit 25 in the oxidizing agent aqueous solution storage tank (410).
  • An oxidizing agent pH sensor 600 is installed inside the oxidizing agent aqueous solution storage tank 410 .
  • the oxidizing agent pH sensor 600 is a sensor for measuring the pH of the oxidizing agent aqueous solution supplied from the oxidizing agent aqueous solution supply module 400 to the nitrogen monoxide reactor 21 .
  • the oxidizing agent pH sensor 600 is described as an example installed in the oxidizing agent aqueous solution storage tank 410, but is not limited thereto, and may be installed in the oxidizing agent aqueous solution supply passage 420 to be described later. And, it is of course also possible to be installed in the nitrogen dioxide reaction tank 21 of the nitrogen dioxide reaction module 30.
  • the reducing agent aqueous solution supply module 500 is connected to the nitrogen dioxide reaction module 30, and when the gas to be treated is supplied to the nitrogen dioxide reaction module 30, the reducing agent aqueous solution on the upper part of the nitrogen dioxide reaction tank 31 It is a module for supplying and accommodating the reducing agent aqueous solution overflowed from the nitrogen dioxide reactor 31 and discharged.
  • the reducing agent aqueous solution supply module 500 includes a reducing agent aqueous solution storage tank 510, a reducing agent aqueous solution supply passage 520, a reducing agent aqueous solution valve 531, a reducing agent aqueous solution discharge passage 540, and a reducing agent aqueous solution pump 550.
  • the reducing agent aqueous solution storage tank 510 is a tank in which the reducing agent aqueous solution containing the reducing agent is stored.
  • the reducing agent is sodium sulfite (Na 2 SO 3 ) or sodium sulfide (Na 2 S) is used.
  • the reducing agent aqueous solution supply passage 520 and the reducing agent aqueous solution discharge passage 540 are connected to the reducing agent aqueous solution storage tank 510 .
  • the reducing agent aqueous solution supply passage 520 is a passage for supplying the reducing agent aqueous solution in the reducing agent aqueous solution storage tank 510 to the nitrogen dioxide reaction tank 31 .
  • An oxidizing agent aqueous solution pump 550 for pumping the reducing agent aqueous solution and a reducing agent aqueous solution valve 531 for controlling the supply of the reducing agent aqueous solution are installed in the reducing agent aqueous solution supply passage 520 .
  • the reducing agent aqueous solution discharge path 540 connects the second water level control unit 35 and the reducing agent aqueous solution storage tank 510 to store the reducing agent aqueous solution discharged from the second water level control unit 35 in the reducing agent aqueous solution storage tank (510).
  • the control unit (not shown) includes the gas flow fan 40 , the oxidizing agent aqueous solution pump 450 , the reducing agent aqueous solution pump 550 , the first and second oxidizing agent aqueous solution valves 431 and 432 , the reducing agent Controls the operation of the aqueous solution valve 531 .
  • the controller (not shown) controls the oxidizing agent concentration of the oxidizing agent aqueous solution by controlling the input amount of the oxidizing agent input to the oxidizing agent aqueous solution supply module 400 according to the pH of the oxidizing agent aqueous solution measured by the oxidizing agent pH sensor 600 . do.
  • FIG. 13 shows a state in which the gas flow fan is operating
  • FIG. 14 shows a state in which the gas flow fan is stopped.
  • the oxidant aqueous solution is not supplied from the oxidizer aqueous solution storage tank 110 to the nitrogen monoxide reactor 21, and the nitrogen monoxide
  • the water level of the oxidizing agent aqueous solution in the reaction tank 21 is lower than the upper end of the first gas injection nozzle 22 .
  • the reducing agent aqueous solution is not supplied from the reducing agent aqueous solution storage tank 510 to the nitrogen dioxide reaction tank 31, and the nitrogen dioxide
  • the water level of the reducing agent aqueous solution in the reaction tank 31 is lower than the upper end of the second gas injection nozzle 32 .
  • the oxidizing agent aqueous solution in the nitrogen monoxide reactor 21 does not leak downward through the first gas injection nozzle 22 or the first inlet 21a.
  • the reducing agent aqueous solution in the nitrogen dioxide reaction tank 31 does not leak downward through the second gas injection nozzle 32 or the second inlet 31a.
  • the gas to be treated in the second gas supply tank 12 is injected upwardly into the nitrogen monoxide reactor 21 through the first gas injection nozzle 22 . . At this time, the end of the first gas injection nozzle 22 is not immersed in the oxidizing agent aqueous solution.
  • control unit (not shown) operates the oxidizing agent aqueous solution pump 450 when the gas flow fan 40 is operated.
  • the oxidizing agent aqueous solution pump 450 When the oxidizing agent aqueous solution pump 450 is operated, the oxidizing agent aqueous solution is supplied from the oxidizing agent aqueous solution storage tank 410 into the nitrogen monoxide reactor 21 through the first oxidizing agent aqueous solution supply passage 421 .
  • the oxidizing agent aqueous solution is supplied downward into the upper space of the nitrogen monoxide reactor 21 , and the gas to be treated is injected upwardly from the lower side of the nitrogen monoxide reactor 21 . That is, the supply directions of the process target gas and the oxidizing agent aqueous solution are opposite to each other.
  • the aqueous solution of the oxidizer may not be discharged downward through the first inlet 21a of the nitrogen monoxide reactor 21 by the injection pressure of the gas to be treated. That is, when the gas flow fan 40 operates, the gas to be treated is upwardly injected into the nitrogen monoxide reactor 21 from the second gas supply tank 12 , and The lower portion is filled with the gas to be processed to form a gas layer. At this time, since the aqueous solution of the oxidizer is sprayed downward from the upper side of the nitrogen monoxide reactor 21 , it is possible to prevent the aqueous solution of the oxidizer from leaking to the lower part of the nitrogen monoxide reactor 21 by the gas layer.
  • the oxidizing agent aqueous solution can maintain a state accommodated in the nitrogen monoxide reaction tank 21, the oxidizing agent aqueous solution and the gas to be treated can sufficiently react. That is, the reaction time may be increased than when the aqueous solution of the oxidizing agent flows in one direction.
  • the level of the oxidizing agent aqueous solution in the nitrogen monoxide reaction tank 21 is gradually increased.
  • the level of the oxidizing agent aqueous solution in the nitrogen monoxide reaction tank 21 may be properly maintained by the first water level control unit 25 . That is, the oxidizing agent aqueous solution overflowing in excess of the set water level in the nitrogen monoxide reaction tank 21 is discharged through the first water level control hole 25a.
  • the gas to be treated is injected from the first gas injection nozzle 22 to the nitrogen monoxide reactor 21 to form microbubbles in the oxidizing agent aqueous solution.
  • a contact area between the gas to be treated and the oxidizing agent aqueous solution is increased.
  • the residence time in the nitrogen monoxide reactor 21 is increased.
  • the nitrogen monoxide (NO) contained in the gas to be treated reacts with the oxidizing agent contained in the oxidizing agent aqueous solution, and the nitrogen monoxide (NO) is nitrogen dioxide (NO) 2 ) is an oxidation reaction that is oxidized to
  • the oxidizing agent will be described as an example using sodium hypochlorite (NaClO) and hydrogen chloride (HCl).
  • Equations for the reaction occurring inside the nitrogen monoxide reactor 21 are the same as Schemes 8 and 9.
  • nitrogen monoxide (NO) contained in the gas to be treated is oxidized to nitrogen dioxide (NO 2 ).
  • the oxidizing agent aqueous solution overflowing from the nitrogen monoxide reactor 21 is discharged to the oxidizing agent aqueous solution storage tank 410 through the oxidizing agent aqueous solution discharge passage 441, and the first and second gas supply tanks (11)
  • the aqueous solution of the oxidizing agent in (12) is also discharged to the outside through the aqueous solution discharge passage (60).
  • the optimum condition for the oxidation reaction occurring in the nitrogen monoxide reactor 21 is that the pH of the oxidizing agent aqueous solution is within the range of 4 to 5.
  • the pH of the oxidizing agent aqueous solution in the nitrogen monoxide reactor 21 should be maintained in the range of 4 to 5.
  • the pH of the oxidizing agent aqueous solution in the nitrogen monoxide reaction tank 21 changes according to the amount of nitrogen monoxide (NO) included in the gas to be treated.
  • the oxidizing agent aqueous solution overflowed from the nitrogen monoxide reactor 21 and discharged from the oxidizing agent aqueous solution storage tank 110 as well as the oxidizing agent aqueous solution discharged from the first and second gas supply tanks 11 and 12 are accommodated. Therefore, the pH of the oxidizing agent aqueous solution inside the oxidizing agent aqueous solution storage tank 110 also continuously changes.
  • the oxidizing agent pH sensor 600 measures the pH of the oxidizing agent aqueous solution in the oxidizing agent aqueous solution storage tank 410 at preset time intervals, and transmits it to the controller (not shown).
  • the control unit controls the amount of sodium hypochlorite (NaClO) added to the oxidizing agent aqueous solution storage tank 410 according to the pH measured by the oxidizing agent pH sensor 600 so that the pH of the oxidizing agent aqueous solution is 4 to control to be maintained in the range of 5.
  • NaClO sodium hypochlorite
  • the input amount of sodium hypochlorite (NaClO) may be reduced so that the pH is maintained in the range of 4 to 5.
  • the input amount of the sodium hypochlorite (NaClO) may be increased so that the pH is maintained in the range of 4 to 5.
  • the oxidizing agent aqueous solution storage tank 410 may be provided with an oxidizing agent input device (not shown) for inputting the oxidizing agent, and the control unit (not shown) is the oxidizing agent input device according to the pH measured by the oxidizing agent pH sensor 600 .
  • the control unit By controlling the operation of the oxidizing agent can be automatically controlled.
  • the present invention is not limited thereto, and if the control unit (not shown) displays the input amount of the oxidizing agent according to the pH measured by the oxidizing agent pH sensor 600 through a separate terminal, it is of course also possible for the operator to manually input it do.
  • the oxidation reaction efficiency can be improved by controlling the concentration of the oxidizing agent in the aqueous solution of the oxidizing agent that changes according to the amount of nitrogen monoxide (NO) included in the gas to be treated flowing into the nitrogen monoxide reactor 21 .
  • NO nitrogen monoxide
  • the gas to be treated that has passed through the nitrogen monoxide reactor 21 is introduced into the nitrogen dioxide reactor 31 .
  • the reducing agent aqueous solution pump 550 When the reducing agent aqueous solution pump 550 is operated, the reducing agent aqueous solution is introduced into the nitrogen dioxide reaction tank 31 from the reducing agent aqueous solution storage tank 510 through the reducing agent aqueous solution supply passage 520 .
  • the reducing agent aqueous solution is supplied downwardly to the upper part of the nitrogen dioxide reaction tank 31 , and the gas to be treated is supplied upwardly from the lower side of the nitrogen dioxide reaction tank 31 . That is, the supply directions of the gas to be treated and the reducing agent aqueous solution are opposite to each other.
  • the reducing agent aqueous solution is not discharged to the lower portion through the first inlet 31a of the nitrogen dioxide reactor 31 by the injection pressure of the gas to be treated. That is, when the gas flow fan 40 is operated, the gas to be treated is injected upwardly into the nitrogen dioxide reactor 31, and the lower portion of the nitrogen dioxide reactor 31 is filled with the gas to be treated to form a gas layer. will form At this time, since the reducing agent aqueous solution is sprayed downward from the upper side of the nitrogen dioxide reactor 31 , it is possible to prevent the reducing agent aqueous solution from leaking to the lower part of the nitrogen dioxide reactor 31 by the gas layer.
  • the reducing agent aqueous solution can maintain a state accommodated in the nitrogen dioxide reaction tank 31, it can sufficiently react with the reducing agent aqueous solution and the gas to be treated. That is, the reaction time may be increased than when the reducing agent aqueous solution flows in one direction.
  • the level of the reducing agent aqueous solution inside the nitrogen dioxide reaction tank 31 is gradually increased.
  • the level of the reducing agent aqueous solution in the nitrogen dioxide reaction tank 31 may be properly maintained by the second water level control unit 35 .
  • the gas to be treated is injected from the second gas injection nozzle 32 to the nitrogen dioxide reactor 31 to form microbubbles in the reducing agent aqueous solution.
  • the contact area between the gas to be treated and the reducing agent aqueous solution is increased.
  • the residence time in the nitrogen dioxide reactor 31 is increased.
  • a chemical reaction between the gas to be treated and the reducing agent aqueous solution occurs inside the nitrogen dioxide reaction tank 31 .
  • the chemical reaction that takes place inside the nitrogen dioxide reaction tank 31, the nitrogen dioxide (NO 2 ) generated in the nitrogen monoxide reaction tank 21 reacts with the reducing agent contained in the reducing agent aqueous solution, and the nitrogen dioxide (NO 2 ) is removed is a reduction reaction.
  • the reducing agent will be described as an example using sodium sulfite (Na 2 SO 3 ).
  • the present invention is not limited thereto, and it is of course possible to use sodium sulfide (Na 2 S) as the reducing agent.
  • nitrogen dioxide (NO 2 ) contained in the gas to be treated is reduced to nitrogen (N 2 ), and the nitrogen dioxide (NO 2 ) is removed.
  • the reducing agent aqueous solution overflowed from the nitrogen dioxide reactor 31 is discharged to the reducing agent aqueous solution storage tank 510 through the reducing agent aqueous solution discharge passage 540 .
  • the monoxide contained in the gas to be treated Nitrogen (NO) is oxidized to nitrogen dioxide (NO 2 ) by the oxidizing agent, and in the nitrogen dioxide reaction module 30 , nitrogen dioxide (NO 2 ) generated in the nitrogen monoxide reaction module 20 may be removed.
  • the pH of the oxidizing agent aqueous solution changes by changing the amount of the oxidizing agent included in the oxidizing agent aqueous solution according to the amount of nitrogen monoxide (NO) included in the processing target gas
  • the pH of the oxidizing agent aqueous solution By measuring and predicting the increase or decrease of the nitrogen monoxide (NO) according to the measured pH and increase or decrease the input amount of the oxidizing agent, the oxidation reaction efficiency can be improved.
  • the exhaust gas complex treatment facility 700 injects an oxidizing agent into the exhaust gas (G0) to be treated, and monoxide contained in the exhaust gas (G0) to be treated is in flow.
  • the oxidation processing unit 710 reacts nitrogen monoxide (NO) contained in the exhaust gas G0 to be treated with an oxidizing agent to oxidize it to nitrogen dioxide (NO 2 ).
  • the gas G1 discharged from the oxidation treatment unit 710 flows into the microbubble gas treatment tank 720 as a pre-oxidation treatment gas.
  • chlorine dioxide (ClO 2 ) as an oxidizing agent will be described as being used.
  • chlorine dioxide (ClO 2 ) is used as an oxidizing agent and chlorine dioxide (ClO 2 ) is added in the form of an aqueous solution
  • Reaction Equation 11 the oxidation reaction formula of nitrogen monoxide (NO) is shown in Reaction Equation 11 below.
  • chlorine dioxide ClO 2
  • sodium chlorite NaClO 2
  • Sodium chlorite NaClO 2
  • the oxidation reaction equation of nitrogen monoxide (NO) in the oxidation processing unit 710 is as shown in Scheme 13 below.
  • Sodium hypochlorite may be used as an oxidizing agent.
  • NaClO sodium hypochlorite
  • the oxidation reaction equation of nitrogen monoxide (NO) in the oxidation treatment unit 710 is as shown in Scheme 15 below.
  • Potassium permanganate (KMnO 4 ) may also be used as an oxidizing agent.
  • the oxidation reaction equation of nitrogen monoxide (NO) in the oxidation treatment unit 110 is as shown in Reaction Equation 17 below.
  • the oxidation processing unit 710 includes an oxidation reactor 701 in which nitrogen monoxide (NO) contained in the exhaust gas G0 to be treated and an oxidizing agent react, and an oxidation reactor 701 in the gas discharged from the oxidation reactor 701.
  • a reaction oxidizing agent storage tank 707 and an oxidizing agent supply pump 708 for supplying an oxidizing agent aqueous solution to the oxidation reactor 701 are provided.
  • the oxidation reactor 701 oxidizes nitrogen monoxide (NO) contained in the exhaust gas G0 to be treated using an oxidizing agent.
  • the oxidation reactor 701 includes a reaction case 702 and an oxidizing agent spray nozzle 703 .
  • the reaction case 702 provides an oxidation reaction space 702a in which nitrogen monoxide (NO) and an oxidizing agent react.
  • nitrogen monoxide (NO) reacts with an oxidizing agent and is oxidized to nitrogen dioxide (NO 2 ).
  • the oxidation reaction space 702a extends along the flow direction of the exhaust gas G0 to be treated and also serves as a passage through which the exhaust gas G0 to be treated flows.
  • the oxidizing agent spray nozzle 703 is installed in the oxidation reaction space 702a formed inside the reaction case 702 to spray the oxidizing agent aqueous solution in the form of a spray.
  • the oxidizing agent spray nozzle 703 will be described as spraying the oxidizing agent aqueous solution in the opposite direction to the flow direction of the exhaust gas (G0) to be treated.
  • the unreacted oxidizing agent that does not react with nitrogen monoxide (NO) in the oxidation reaction space 702a is discharged and stored in the unreacted oxidizing agent storage tank 707 .
  • the gas-liquid separator 704 is located downstream of the exhaust gas G0 to be treated rather than the oxidation reactor 701 in the flow direction, and separates the liquid component including the unreacted oxidizing agent from the gas discharged from the oxidation reactor 701 .
  • the gas-liquid separator 704 is described as a centrifugal separator.
  • the liquid component separated by the gas-liquid separator 704 is an oxidizing agent aqueous solution containing an unreacted oxidizing agent, and is stored in the unreacted oxidizing agent storage unit 707 .
  • An oxidizing agent aqueous solution is stored in the oxidizing agent storage tank 706 .
  • the oxidizing agent aqueous solution stored in the oxidizing agent storage tank 706 is supplied to the oxidizing agent spray nozzle 703 by the oxidizing agent supply pump 708 .
  • the oxidizing agent aqueous solution containing the unreacted oxidizing agent discharged from the oxidation reactor 701 and the gas-liquid separator 704 is stored in the unreacted oxidizing agent storage tank 707 .
  • the oxidizing agent aqueous solution stored in the unreacted oxidizing agent storage tank 707 is supplied to the oxidizing agent spray nozzle 703 by the oxidizing agent supply pump 108 .
  • the oxidizing agent supply pump 708 supplies the oxidizing agent aqueous solution stored in the oxidizing agent storage tank 706 and the oxidizing agent aqueous solution stored in the unreacted oxidizing agent storage tank 707 to the oxidizing agent spray nozzle 703 .
  • the operation of the oxidant feed pump 708 is controlled by the controller 796 to regulate the amount of oxidant input through the oxidant spray nozzle 703 .
  • any one of the oxidizing agent aqueous solution stored in the oxidizing agent storage tank 706 and the oxidizing agent aqueous solution stored in the unreacted oxidizing agent storage tank 707 may be selectively supplied to the oxidizing agent spray nozzle 703 .
  • the oxidizing agent may be in the form of a gas such as ozone (O 3 ).
  • ozone (O 3 ) When ozone (O 3 ) is used as an oxidizing agent, the oxidation reaction equation of nitrogen monoxide (NO) is as shown in Scheme 19 below.
  • sulfur dioxide (SO 2 ) may be removed as shown in Reaction Equation 20 below.
  • the oxidation processing unit 810 includes an oxidation reactor 701 in which nitrogen monoxide (NO) contained in the exhaust gas to be treated (G0) and an oxidizing agent react, and an oxidizing agent ozone (O 3 ) gas is stored.
  • An oxidizing agent storage tank 806 and an oxidizing agent supply pump 708 for supplying the ozone gas stored in the oxidizing agent storage tank 806 to the oxidation reactor 701 are provided.
  • the oxidation reactor 701 oxidizes nitrogen monoxide (NO) contained in the exhaust gas G0 to be treated using ozone gas as an oxidizing agent.
  • the oxidation reactor 701 includes a reaction case 702 and an oxidizer spray nozzle 703, and since the configuration and operation of the oxidation reactor 701 shown in FIG. 16 are substantially the same, a detailed description thereof will be omitted.
  • Ozone gas which is an oxidizing agent, is stored in the oxidizing agent storage tank 706 .
  • the ozone gas stored in the oxidizer storage tank 706 is supplied to the oxidizer spray nozzle 703 by the oxidizer supply pump 708 .
  • the oxidizer supply pump 708 supplies the ozone gas stored in the oxidizer storage tank 706 to the oxidizer spray nozzle 703 .
  • the microbubble gas processing tank 720 includes a partition wall 721 extending downward from the ceiling in the internal space 710a. The lower end of the partition wall 721 is spaced apart from the floor in the inner space 710a of the microbubble gas treatment tank 720 .
  • the internal space 710a of the microbubble gas treatment tank 720 is divided into a gas introduction space 710b, a reaction space 710c, and a connection space 710d by the partition wall 721 .
  • the gas introduction space 710b and the reaction space 710c are two spaces separated by a partition wall 721 therebetween.
  • the connection space 710d is a space formed between the bottom of the partition wall 721 and the bottom of the internal space 710a of the microbubble gas processing tank 720, and is located below the gas introduction space 710b and the reaction space 710c. positioned to communicate with the gas introduction space 710b and the reaction space 710c, respectively.
  • a drain hole 710f is formed in the bottom 710e of the connection space 710d.
  • the dedusting treated water L of the connection space 710d is discharged through the drain 710f and then reintroduced into the gas introduction space 710b by the dedusting treated water circulation unit 740 .
  • the dedusted treated water L is discharged so that the bottom 710e of the connection space 710d and the lower end of the partition 721 are spaced apart, so that the gas between the bottom 710e of the connection space 710d and the lower end of the partition 721 is A gas movement passage 710g through which the gas may move is formed.
  • An intake port 721a communicating with the gas introduction space 710b is positioned at an upper end of the gas introduction space 710b.
  • the pre-oxidation treatment gas G1 discharged from the oxidation treatment unit 710 through the intake port 721a flows into the gas introduction space 710b.
  • the dedusting treated water L circulated and supplied by the dedusting treated water circulation unit 740 and the reducing agent aqueous solution R supplied by the reducing agent supply unit 770 are introduced into the upper end of the gas introduction space 710b.
  • industrial water is supplied to the gas introduction space 710b.
  • a water tank 711 , a first water flow pipe 713 , a mixing tube 715 , and a second water flow pipe 717 are provided in the gas introduction space 710b sequentially from top to bottom.
  • the water tank 711 is located adjacent to the bottom of the intake port 721a in the gas introduction space 710b. In the water tank 711, a solution including the dedusting treated water (L) and the reducing agent aqueous solution (R) flowing into the gas introduction space 710b is temporarily stored.
  • the first water flow pipe 713 is located below the water tank 711 in the gas introduction space 710b.
  • the first water flow pipe 713 has a shape that becomes narrower downward, and a first outlet 714 for discharging the solution and gas downward is formed at the lower end of the first water flow pipe 713 .
  • the contact area between the gas and the reducing agent increases as the gas and the reducing agent flow downward along the first water flow pipe 713 toward the first outlet 714 .
  • the mixing vessel 715 is located below the first outlet 714 formed in the first water flow pipe 713 in the gas introduction space 710b.
  • the gas and the solution discharged through the first outlet 714 are temporarily stored in the mixing vessel 715 .
  • the second water flow pipe 717 is located below the mixing vessel 715 in the gas introduction space 710a.
  • the second water flow pipe 717 has a shape that becomes narrower toward the bottom, and a second outlet 718 for discharging the solution and gas downward is formed at the lower end of the second water flow pipe 717 .
  • the contact area between the gas and the reducing agent increases as the gas and the reducing agent flow down along the second water flow pipe 717 toward the second outlet 718 .
  • An exhaust port 721b communicating with the reaction space 710c is positioned at an upper end of the reaction space 710c.
  • the final processing gas G2 is discharged from the reaction space 710c through the exhaust port 721b.
  • the reaction space 710c includes a first gas processing unit 722a and a second gas processing unit 722b that are sequentially disposed from bottom to top in the height direction between the gas passage passage 711g and the exhaust port 721b.
  • An intermediate gas passage 722c for communicating the first gas processing unit 722a and the second gas processing unit 722b is formed between the first gas processing unit 722a and the second gas processing unit 722b.
  • the gas G12 discharged from the first gas processing unit 722a through the intermediate gas passage 722c flows into the second gas processing unit 722b.
  • the first gas processing unit 722a includes a first bottom plate 723a positioned above the gas movement passage 710g, a first atomizing part 724a installed on the first bottom plate 723a, and a first It includes a water level adjusting unit 727a, a plurality of first blocking plates 728a, and a first eliminator 729a.
  • the first bottom plate 723a has a plate shape, is installed substantially horizontally in the first processing unit 722a, and is positioned above the gas flow passage 710a.
  • the first processing unit 722a is separated into a first lower space 7221a and a first upper space 7222a with the first bottom plate 723a interposed therebetween, and the first upper space 7222a is provided with a first for reduction treatment.
  • One gas treated water L1 is stored.
  • a first atomizing part 724a is installed on the first bottom plate 723a.
  • the first atomizing unit 724a injects the pre-oxidation treatment gas G1 existing in the first lower space 7221a to the first upper space 7222a in which the first gas treated water L1 is stored.
  • the gas G1 injected by the first atomizing unit 724a forms micro-bubbles B in the first gas treated water L1.
  • the first atomizing part 724a includes a first gas injection nozzle 725a that injects gas G1 into the first upper space 7222a, and a first collision plate located at the end of the first gas injection nozzle 725a. (726a) is provided. Due to the microbubbles B formed by the first atomizing part 724a, the contact area between the gas and the first gas treated water L1 in the first upper space 7222a increases.
  • the microbubbles B rise more slowly than general bubbles in the first gas treated water L1, they stay for a longer time. Accordingly, in the first upper space 7222a , the reaction efficiency of the processing target component included in the processing target gas G1 and the processing target component included in the first gas treated water L1 is remarkably increased.
  • the first gas injection nozzle 725a is formed to protrude upward from the first bottom plate 723a and is positioned in the first upper space 7222a.
  • the processing target gas G1 of the first lower space 7221a is sprayed upwardly into the first upper space 7222a by the first gas injection nozzle 725a.
  • a section is formed in the first gas injection nozzle 725a in which the inner passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows along the first gas injection nozzle 725a.
  • a first collision plate 726a is positioned adjacent to an end of the first gas injection nozzle 725a.
  • the first collision plate 726a is located in the first upper space 7222a so as to be adjacent to the end of the first gas injection nozzle 725a.
  • the gas injected from the first gas injection nozzle 725a collides with the first collision plate 726a to form microbubbles B.
  • the first collision plate 126a is described as having a two-stage structure in which two 7261a and 7262a are sequentially disposed along the height direction, but the present invention is not limited thereto. It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the first upper collision plate 7262a located above is larger to cover the entirety of the first lower collision plate 7261a located below, and at least one Preferably, the first passage 7263a is formed.
  • the installation height of the first collision plate 726a may be changed so that the distance from the first gas injection nozzle 725a may be adjusted.
  • the first water level adjusting unit 727a is located on the side of the first upper space 7222a and controls the water level of the first gas treated water L1 through overflow in the second upper space 7222a.
  • the first water level adjusting unit 727a includes a first water level adjusting water tank 7272a communicating with the first upper space 7222a through the first water level adjusting opening 7271a formed in the sidewall of the first upper space 7222a. do.
  • the first water level control opening 7271a is positioned to correspond to the level control height of the first gas treated water L1.
  • the first gas treated water L1 overflowed from the first upper space 7222a is stored in the first water level control water tank 7272a.
  • the first gas treated water L1 stored in the first water level control water tank 7272a is discharged, circulated by the first gas treated water circulation unit 750 and re-supplied to the first upper space 7222a.
  • the plurality of first blocking plates 728a are arranged in layers above the water level of the first gas treated water L1 set in the first upper space 7222a. The rapid rise of the first gas treated water L1 stored in the first upper space 7222a is blocked by the plurality of first blocking plates 728a.
  • the first eliminator 729a is positioned above the first blocking plate 728a positioned at the top among the plurality of first blocking plates 728a in the first upper space 7222a to remove water droplets.
  • the second eliminator 729a is positioned below the intermediate gas passage 722c.
  • the first eliminator 729a is made of a synthetic resin material.
  • the second gas processing unit 722b is disposed directly above the first gas processing unit 722a, the second bottom plate 723b positioned above the intermediate gas passage 722c, and the second bottom plate 723b.
  • a second atomizing unit 724b, a second water level adjusting unit 727b, a plurality of second blocking plates 728b, and a second eliminator 729b are provided.
  • the second gas processing unit 722b performs secondary processing on the primary processing gas G12 discharged from the first gas processing unit 722a through the intermediate gas passage 722c, and as the final processing gas G2, the exhaust port ( 721b).
  • the second bottom plate 723b has a plate shape, is installed substantially horizontally in the second gas processing unit 722b, and is positioned above the intermediate gas passage 722c.
  • the second processing unit 722b is divided into a second lower space 7221b and a second upper space 7222b with the second bottom plate 723b interposed therebetween, and the primary processing gas (
  • the second gas treated water L2 including a treatment component that reacts with the treatment target component included in G12 to remove the treatment target component is stored.
  • a second atomizing part 724b is installed on the second bottom plate 723b.
  • the second atomizing unit 724b injects the primary treatment gas G12 existing in the second lower space 7221b to the second upper space 7222b in which the second gas treatment water L2 is stored.
  • the primary processing gas G12 injected by the second atomizing unit 724b forms micro-bubbles B in the second gas processing water L2.
  • the second atomizing part 724b includes a second gas injection nozzle 725b for injecting the primary processing gas G12 into the second upper space 7222b, and a second gas injection nozzle 725b located at the end of the second gas injection nozzle 725b. Two collision plates 726b are provided.
  • the contact area between the gas and the second gas treated water L2 in the second upper space 7222b increases.
  • the microbubbles B rise more slowly than general bubbles in the second gas treated water L2, they stay for a longer time. Accordingly, in the second upper space 7222b , the reaction efficiency between the processing target component included in the primary processing gas G12 and the processing component included in the second gas processing water L2 is remarkably increased.
  • the second gas injection nozzle 725b is formed to protrude upward from the second bottom plate 723b and is positioned in the second upper space 722b.
  • the primary processing gas G12 of the second lower space 7221b is injected upwardly into the second upper space 7222b by the second gas injection nozzle 725b.
  • a section is formed in the second gas injection nozzle 725b in which the inner passage becomes narrower toward the end so that the velocity of the gas increases while the gas flows along the second gas injection nozzle 725b.
  • a second collision plate 726b is positioned adjacent to an end of the second gas injection nozzle 725b.
  • the second collision plate 726b is positioned in the second upper space 7222b so as to be adjacent to the end of the second gas injection nozzle 725b.
  • the gas injected from the second gas injection nozzle 725b collides with the second collision plate 726b to form microbubbles B.
  • the second collision plate 726b is described as having a two-stage structure in which two (7261b, 7262b) are sequentially disposed along the height direction as shown, but the present invention is not limited thereto, and 1 It is also within the scope of the present invention to have a single structure or a structure having three or more steps.
  • the upper second upper collision plate 7262b is larger to cover the entire second lower collision plate 7261b located below, and at least one It is preferable that the second passage 7263b is formed.
  • the installation height of the second collision plate 726b may be changed so that the distance from the second gas injection nozzle 725b may be adjusted.
  • the plurality of second blocking plates 728b are disposed in layers above the water level of the second gas treated water L2 set in the second upper space 7222b. The sudden rise of the third processing liquid L3 stored in the second upper space 7222b is blocked by the plurality of second blocking plates 728b.
  • the second eliminator 729b is positioned above the second blocking plate 728b located at the top among the plurality of second blocking plates 728b in the second upper space 7222b to remove water droplets.
  • the second eliminator 729b is located below the exhaust port 721b.
  • the second eliminator 729b is made of a synthetic resin material.
  • the microbubble gas processing tank 720 is described as including the first gas processing unit 722a and the second gas processing unit 722b which are continuously arranged from bottom to top along the height direction, but differently from this, the first Only the gas processing unit 722a may be provided, or three or more gas processing units may be continuously arranged along the height direction, which also falls within the scope of the present invention.
  • the exhaust fan 720a forms a flow pressure so that the gas inside the microbubble gas treatment tank 720 is discharged through the exhaust port ( 121b of FIG. 17 ).
  • the exhaust fan 720a is described as being located downstream of the microbubble gas treatment tank 720, but unlike this, it is located upstream of the microbubble gas treatment tank 720 to transfer gas to the microbubble gas treatment tank ( It may be configured to blow into the intake port 721a of 720 .
  • the dedusting treated water circulation unit 740 circulates and supplies the dedusting treated water L to the microbubble gas treatment tank 120 for the dedusting treatment. 15 and 17 , the treated water circulating unit 740 for dedusting is dedusted treated water discharged through the dedusting treated water drain line 741 extended from the drain 710f of the microbubble gas treatment tank 720 . (L) is stored in the dedusting treated water storage tank 742, and the dedusting treated water (L) stored in the dedusting treated water storage tank 741 through the dedusting treated water supply line 744 of the microbubble gas treatment tank 720 A dedusting treated water supply pump 745 for flowing into the gas introduction space 710b is provided.
  • an aeration pipe 743 for supplying air to the dedusting treated water L is installed in the dedusting treated water storage tank 741 .
  • Industrial water may be separately supplied to the dedusting treated water storage tank 741 .
  • the dedusting treated water L is circulated and supplied to the gas introduction space 710b , so that the dust contained in the gas G1 is collected and removed in the gas introduction space 710b .
  • the first gas treated water circulation unit 750 circulates and supplies the first gas treated water L1 to the microbubble gas treatment tank 720 for reduction treatment.
  • the first gas treated water circulation unit 750 removes the first gas treated water L1 discharged from the first water level control water tank 7271a of the first water level control unit 727a of the microbubble gas treatment tank 120 . 1 It is circulated and supplied to the upper space 7222a.
  • the first gas treated water circulation unit 750 is a first gas treated water in which the first gas treated water L1 drained from the first water level control water tank 7271a through the first gas treated water drain line 751 is stored.
  • a first gas treated water supply pump 755 for flowing into the space 7222a is provided.
  • a diffuser pipe 753 for supplying air to the first gas treated water L1 is installed in the first gas treated water storage tank 751 .
  • Industrial water may be separately supplied to the first gas treated water storage tank 751 .
  • the second gas treated water circulation unit 760 circulates and supplies the second gas treated water L2 to the microbubble gas treatment tank 720 for neutralization and absorption treatment.
  • the second gas-treated water circulation unit 760 removes the second gas-treated water L2 discharged from the second water level control water tank 7271b of the second water level control unit 727b of the microbubble gas treatment tank 720 . 2 It is circulated and supplied to the upper space 7222b.
  • the second gas treated water circulation unit 760 is a second gas treated water in which the second gas treated water L2 drained from the second water level control water tank 7271b through the second gas treated water drain line 761 is stored.
  • a second gas treated water supply pump 765 for flowing into the space 7222b is provided.
  • the second gas treated water storage tank 761 is provided with an air diffuser 763 for supplying air to the second gas treated water L2.
  • Industrial water may be separately supplied to the second gas-treated water storage tank 761 .
  • the reducing agent supply unit 770 supplies a reducing agent for gas treatment.
  • the reducing agent supply unit 770 includes a reducing agent storage tank 771 in which a reducing agent aqueous solution containing a reducing agent is stored, and a reducing agent aqueous solution stored in the reducing agent storage tank 771 in a microbubble gas treatment tank 720, a first gas treated water storage tank 752 ) and a reducing agent supply pump 775 for flowing to the second gas-treated water storage tank 762 .
  • the operation of the reducing agent supply pump 775 is controlled by the control unit 796 to adjust the supply amount of the reducing agent.
  • the neutralizing agent supply unit 780 supplies a neutralizing agent for gas treatment.
  • the neutralizing agent supply unit 780 includes a neutralizing agent storage tank 781 in which an aqueous neutralizing agent solution containing a neutralizing agent is stored, and a neutralizing agent aqueous solution stored in the neutralizing agent storage tank 781 in a first gas treated water storage tank 752 and a second gas treated water storage tank ( 762) with a neutralizing agent feed pump (785).
  • the operation of the neutralizing agent supply pump 785 is controlled by the control unit 796 to adjust the supply amount of the neutralizing agent.
  • the gas-liquid separator 790 separates and discharges the liquid component from the final processed gas G2 that is finally discharged through the microbubble gas processing unit 720 .
  • the measurement unit 793 measures the concentration of each of the components constituting the final processed gas G2 that has passed through the gas-liquid separator 790 after processing, and transmits the measured gas component data to the control unit 796 .
  • the gas component data measured by the measurement unit 793 and transmitted to the control unit 796 is a concentration (ppm) of nitrogen monoxide gas (NO) included in the final process gas G2 and a concentration of nitrogen dioxide gas (NO 2 ) (ppm) ) is included.
  • a Tele-Monitoring System TMS
  • TMS Tele-Monitoring System
  • the control unit 796 controls the operations of the oxidizing agent supply pump 708, the reducing agent supply pump 775, and the neutralizing agent supply pump 785 based on the gas component concentration data measured from the measurement unit 193 to control the oxidizing agent, reducing agent, and neutralizing agent supply pump 785 control the supply of
  • FIG. 19 shows the state of the microbubble gas treatment tank 720 when the exhaust fan ( 720a of FIG. 15 ) does not operate as a state before processing on the exhaust gas is performed.
  • the water level of the first gas treatment water L1 in the first gas treatment unit 722a is located below the end of the first gas injection nozzle 725a
  • the second gas treatment water level in the second gas treatment unit 722b The water level of the gas treated water L2 is located below the end of the second gas injection nozzle 725b.
  • the first gas treatment water L1 does not leak downward through the first gas injection nozzle 725a, and the second gas treatment water L2 does not leak downward through the second gas injection nozzle 725b.
  • the exhaust fan (720a in FIG. 15) operates in this state, the gas of the first lower space 7221a is injected into the first upper space 7222a through the first gas injection nozzle 725a, and the second gas is injected The gas of the second lower space 7221b is injected into the second upper space 7222b through the nozzle 725b.
  • the first gas treated water circulation unit 750 operates to supply the first gas treated water L1 to the first upper space 7222a
  • the second gas treated water circulation unit 760 operates to When the 2 gas treated water L2 is supplied to the second upper space 7222b, as shown in FIG. 18, the water level of the first gas treated water L1 in the first upper space 7222a and the second upper space ( In 7222b), the water level of the second gas treated water L2 is sufficiently high to be able to form microbubbles (B).
  • the water level of the first gas treated water L1 in the first upper space 7222a is properly maintained by the first water level adjusting unit 727a, and the second gas treated water L2 in the second upper space 7222b The water level is properly maintained by the second water level control unit 727b.
  • Nitrogen dioxide (NO 2 ) contained in the pre-oxidation treatment gas (G1) introduced into the microbubble gas processing unit 120 is denitrified according to the type of the reducing agent (R) used as shown in the following reaction equations.
  • nitrogen dioxide may be reacted with sulfur dioxide (SO 2 ) and denitrified by reduction as shown in Scheme 23 below.
  • the removal of nitrogen dioxide by the reduction treatment using the reducing agent (R) is mainly performed in the first gas treatment unit 722a and the first gas treatment water storage tank 752 of the microbubble gas treatment unit 720 .
  • Nitrogen dioxide (NO 2 ) contained in the pre-oxidation treatment gas (G1) introduced into the microbubble gas processing unit 720 is denitrified according to the following reaction equations according to the type of the neutralizing agent (C) used.
  • the removal of nitrogen dioxide by the neutralization absorption treatment using the neutralizing agent (C) is mainly performed in the second gas treatment unit 722b and the second gas treatment water storage tank 762 of the microbubble gas treatment unit 720 .
  • nitrogen dioxide may react with chlorine dioxide (ClO 2 ) used as an oxidizing agent to be denitrified by neutralization absorption as shown in Scheme 25 below.
  • Hydrogen fluoride (HF) by the neutralization absorption process of the microbubble gas processing unit 720 may be treated together as shown in the following reaction equations.
  • the removal of hydrogen fluoride (HF) by the neutralization absorption treatment using the neutralizing agent (C) is mainly performed in the second gas treatment unit 722b and the second gas treatment water storage tank 762 of the microbubble gas treatment unit 720 .
  • Sulfur dioxide (SO 2 ) contained in the pre-oxidation treatment gas (G1) introduced into the microbubble gas processing unit 720 is desulfurized according to the type of the neutralizing agent (C) used as shown in the following reaction equations.
  • the desulfurization treatment by the neutralization absorption treatment using the neutralizing agent (C) is mainly performed in the second gas treatment unit 722b and the second gas treatment water storage tank 762 of the microbubble gas treatment unit 720 .
  • the exhaust gas complex treatment facility 700 has been described as additionally removing sulfur oxides and dust together based on nitrogen oxides, but other components are also removed according to the reducing agent (R) and neutralizing agent (C) used. can do.
  • nitric acid When sodium chlorite (NaClO 2 ) is used as an oxidizing agent, nitric acid is not produced in the reaction shown in Scheme 13, but nitric acid (HNO 3 ) may be generated through the reaction shown in Scheme 39 below.
  • NaClO 2 sodium chlorite
  • HNO 3 nitric acid
  • C neutralizing agent
  • the nitrate contained in the aqueous solution is prevented from flowing into the microbubble gas processing unit 720 through the gas-liquid separator 704, and the aqueous solution stored in the unreacted oxidant storage tank 707 is supplied to the oxidation reactor 701. It is preferred that the previously contained nitrates are treated.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Treating Waste Gases (AREA)

Abstract

La présente invention concerne une partie de traitement de gaz pour un dispositif de traitement de gaz utilisant des microbulles, qui comprend : une plaque inférieure pour diviser un espace interne de celle-ci en un espace inférieur et un espace supérieur ; une buse de pulvérisation de gaz pour pulvériser un gaz à traiter de l'espace inférieur vers l'espace supérieur ; et une plaque de collision qui est disposée dans l'espace supérieur et avec laquelle le gaz à traiter, qui est pulvérisé à partir de la buse de pulvérisation de gaz, entre en collision, le gaz à traiter, qui est pulvérisé à partir de la buse de pulvérisation de gaz, entre en collision avec la plaque de collision afin de former des microbulles dans un liquide de traitement directement amené dans l'espace supérieur de sorte qu'un ingrédient à traiter, qui est contenu dans le gaz à traiter, réagisse avec un ingrédient de traitement contenu dans le liquide de traitement et soit ainsi traité ; et la buse de pulvérisation de gaz pulvérise le gaz à traiter, qui est généralement rempli dans l'espace inférieur, dans l'espace supérieur.
PCT/KR2021/018601 2020-12-10 2021-12-09 Dispositif de traitement de gaz utilisant des microbulles et équipement de traitement de gaz le comprenant WO2022124808A1 (fr)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
KR10-2020-0171878 2020-12-10
KR1020200171878A KR102276558B1 (ko) 2020-12-10 2020-12-10 마이크로버블을 이용한 배기가스 정화장치
KR20210019989 2021-02-15
KR10-2021-0019989 2021-02-15
KR1020210026526A KR102302919B1 (ko) 2021-02-15 2021-02-26 마이크로버블을 이용한 황화수소 제거 설비
KR10-2021-0026526 2021-02-26
KR1020210072055A KR20220163646A (ko) 2021-06-03 2021-06-03 마이크로버블을 이용한 질소산화물 제거 설비
KR10-2021-0072055 2021-06-03
KR1020210088530A KR102330690B1 (ko) 2021-07-06 2021-07-06 배출가스 복합 처리 설비
KR10-2021-0088530 2021-07-06

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Publication number Priority date Publication date Assignee Title
US20110283887A1 (en) * 2009-02-04 2011-11-24 Bengt Eggemar Gas cleaner
KR20120111431A (ko) * 2011-03-31 2012-10-10 현대제철 주식회사 배기가스 처리 장치
WO2015005066A1 (fr) * 2013-07-11 2015-01-15 公立大学法人大阪府立大学 Procédé et dispositif de traitement de gaz d'échappement
JP6467036B2 (ja) * 2014-08-25 2019-02-06 天津市北方恵谷科技有限公司 液体還元剤を用いる空気清浄機器、及びその動作と応用方法
KR102080270B1 (ko) * 2019-08-07 2020-02-21 정재억 마이크로 버블을 이용한 탈질 설비 및 이를 구비하는 배기가스 처리 시스템
KR102144359B1 (ko) * 2019-10-28 2020-08-13 정재억 질소산화물 및 황산화물 제거용 배기가스 처리 설비
KR102276558B1 (ko) * 2020-12-10 2021-07-12 정재억 마이크로버블을 이용한 배기가스 정화장치
KR102302919B1 (ko) * 2021-02-15 2021-09-16 정재억 마이크로버블을 이용한 황화수소 제거 설비
KR102330690B1 (ko) * 2021-07-06 2021-11-23 정재억 배출가스 복합 처리 설비

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110283887A1 (en) * 2009-02-04 2011-11-24 Bengt Eggemar Gas cleaner
KR20120111431A (ko) * 2011-03-31 2012-10-10 현대제철 주식회사 배기가스 처리 장치
WO2015005066A1 (fr) * 2013-07-11 2015-01-15 公立大学法人大阪府立大学 Procédé et dispositif de traitement de gaz d'échappement
JP6467036B2 (ja) * 2014-08-25 2019-02-06 天津市北方恵谷科技有限公司 液体還元剤を用いる空気清浄機器、及びその動作と応用方法
KR102080270B1 (ko) * 2019-08-07 2020-02-21 정재억 마이크로 버블을 이용한 탈질 설비 및 이를 구비하는 배기가스 처리 시스템
KR102144359B1 (ko) * 2019-10-28 2020-08-13 정재억 질소산화물 및 황산화물 제거용 배기가스 처리 설비
KR102276558B1 (ko) * 2020-12-10 2021-07-12 정재억 마이크로버블을 이용한 배기가스 정화장치
KR102302919B1 (ko) * 2021-02-15 2021-09-16 정재억 마이크로버블을 이용한 황화수소 제거 설비
KR102330690B1 (ko) * 2021-07-06 2021-11-23 정재억 배출가스 복합 처리 설비

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