WO2022111092A1 - 书写用面板及其制备方法、书写板 - Google Patents

书写用面板及其制备方法、书写板 Download PDF

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Publication number
WO2022111092A1
WO2022111092A1 PCT/CN2021/123344 CN2021123344W WO2022111092A1 WO 2022111092 A1 WO2022111092 A1 WO 2022111092A1 CN 2021123344 W CN2021123344 W CN 2021123344W WO 2022111092 A1 WO2022111092 A1 WO 2022111092A1
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WIPO (PCT)
Prior art keywords
substrate
spacers
liquid crystal
writing panel
array
Prior art date
Application number
PCT/CN2021/123344
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English (en)
French (fr)
Inventor
武晓娟
王家星
葛杨
赵宇
王建
闫浩
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US17/923,708 priority Critical patent/US11940701B2/en
Priority to DE112021002751.4T priority patent/DE112021002751T5/de
Publication of WO2022111092A1 publication Critical patent/WO2022111092A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133305—Flexible substrates, e.g. plastics, organic film
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G02F1/13718—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on a change of the texture state of a cholesteric liquid crystal
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a writing panel, a preparation method thereof, and a writing board.
  • liquid crystal display technology in many fields such as education and business applications, the application of liquid crystal writing boards is becoming more and more extensive.
  • the liquid crystal writing board mainly uses the bistable properties of liquid crystal molecules to display and/or erase the content on the liquid crystal writing board. In order to improve the user experience, it is necessary to improve the uniformity of the handwriting width of the liquid crystal writing board.
  • a writing panel comprising an array substrate, a flexible substrate disposed opposite to the array substrate, a liquid crystal layer disposed between the array substrate and the flexible substrate, disposed close to the array substrate A plurality of columnar spacers on one side of the liquid crystal layer.
  • the array substrate includes a substrate, and a pixel driving circuit layer disposed on the substrate, and the pixel driving circuit layer includes a plurality of thin film transistors and a plurality of signal lines.
  • the orthographic projection of each spacer on the substrate does not overlap with the orthographic projections of the plurality of thin film transistors and the plurality of signal lines on the substrate.
  • the writing panel has a plurality of pixel regions, each pixel region is provided with a plurality of the spacers, and the plurality of the spacers are arranged in an array.
  • the row direction in which the plurality of spacers are arranged in an array is a first direction
  • the column direction in which the plurality of spacers are arranged in an array is a second direction.
  • the distance between two spacers adjacent to each other along the first direction is substantially equal to the distance between two adjacent spacers along the second direction.
  • the writing panel has a plurality of pixel regions, each pixel region is provided with a plurality of the spacers, and the plurality of the spacers are arranged in an array.
  • the row direction in which the plurality of spacers are arranged in an array is a first direction
  • the column direction in which the plurality of spacers are arranged in an array is a second direction.
  • the distance between the two nearest spacers in the two adjacent pixel regions along the first direction, and the two nearest spacers in the two adjacent pixel regions along the second direction The distances between objects are approximately equal.
  • the writing panel has a plurality of pixel regions, each pixel region is provided with a plurality of the spacers, and the plurality of the spacers are arranged in an array.
  • the row direction in which the plurality of spacers are arranged in an array is a first direction
  • the column direction in which the plurality of spacers are arranged in an array is a second direction.
  • the distance between two adjacent spacers along the first direction is substantially equal to the distance between two adjacent spacers along the second direction.
  • the array substrate further includes an alignment film disposed on a side of the pixel driving circuit layer close to the liquid crystal layer.
  • the alignment film is configured such that liquid crystal molecules in the liquid crystal layer have a pretilt angle.
  • the array substrate further includes a first electrode layer disposed on a side of the pixel driving circuit layer close to the liquid crystal layer;
  • the flexible substrate includes a flexible substrate, and is disposed on the flexible substrate the second electrode layer on the side close to the liquid crystal layer.
  • the array substrate includes an alignment film, and the alignment film is disposed on a side of the first electrode layer close to the liquid crystal layer.
  • the alignment film is in direct contact with the first electrode layer.
  • the array substrate further includes a first passivation layer disposed on a side of the first electrode layer close to the liquid crystal layer.
  • the array substrate includes an alignment film, and the alignment film is disposed on a side of the first passivation layer close to the liquid crystal layer.
  • the height of the spacer ranges from 1.0 ⁇ m to 10 ⁇ m.
  • the spacer is cylindrical in shape, and the diameter of the orthographic projection of one end of the spacer close to the array substrate on the substrate ranges from 3 ⁇ m to 25 ⁇ m.
  • the number of spacers disposed in each square millimeter area ranges from 10 to 1000.
  • one end of the spacer close to the substrate is fixedly connected to the surface of the array substrate.
  • the material of the liquid crystal layer includes cholesteric liquid crystal.
  • the hardness of the array substrate is greater than that of the flexible substrate.
  • a writing board comprising the display substrate according to any of the above embodiments, and a base layer disposed on a side of the array substrate away from the flexible substrate.
  • the base layer is configured to block light from entering the writing panel from a side of the array substrate away from the flexible substrate.
  • a method for preparing a writing panel including: preparing an array substrate; the array substrate includes a substrate, and a pixel driving circuit layer disposed on the substrate, the pixel driving circuit layer including multiple a thin film transistor and multiple signal lines.
  • a plurality of columnar spacers are formed on the side of the pixel driving circuit layer away from the substrate; the orthographic projection of the plurality of spacers on the substrate is consistent with the plurality of thin film transistors and all the spacers. Orthographic projections of the plurality of signal lines on the substrate do not overlap.
  • a liquid crystal layer is formed on the side of the pixel driving circuit layer away from the substrate. The array substrate and the flexible substrate are assembled into boxes.
  • the preparation method further includes: before forming a plurality of column spacers on a side of the pixel driving circuit layer away from the substrate, before the pixel driving circuit layer is away from the substrate A first electrode layer is formed on one side.
  • the preparation method further includes: after forming a plurality of column spacers on a side of the pixel driving circuit layer away from the substrate, after the first electrode layer is away from the substrate An alignment film is formed on one side of the electrode, and the alignment film is in direct contact with the first electrode layer.
  • the preparation method further includes: before forming a plurality of column spacers on a side of the pixel driving circuit layer away from the substrate, before the first electrode layer is away from the substrate A first passivation layer is formed on one side.
  • the preparation method further includes: before forming a plurality of column spacers on a side of the pixel driving circuit layer away from the substrate, before the first electrode layer is away from the substrate A first passivation layer is formed on one side. After forming a plurality of column spacers on the side of the pixel driving circuit layer away from the substrate, an alignment film is formed on the side of the first passivation layer away from the substrate.
  • FIG. 1 is a cross-sectional view of a writing board in the related art
  • FIG. 2 is a top view of a writing panel according to some embodiments.
  • FIG. 3 is a partial cross-sectional view of the writing panel in FIG. 2 along section line O-O';
  • FIG. 4 is a partial cross-sectional view of another writing panel according to some embodiments.
  • FIG. 5 is a partial cross-sectional view of yet another writing panel according to some embodiments.
  • FIG. 6 is a graph showing the relationship between the width of handwriting and the height of the spacer for a writing panel according to some embodiments
  • FIG. 7 is a graph of the width of the writing of the writing panel versus the support area of the spacer, according to some embodiments.
  • FIG. 8 is a graph showing the relationship between the width of handwriting and the distribution density of spacers of a writing panel according to some embodiments.
  • FIG. 9 is a partial cross-sectional view of a writing pad according to some embodiments.
  • 10A is a flow chart of a method of fabricating a display substrate according to some embodiments.
  • 10B is a flowchart of another method of fabricating a display substrate according to some embodiments.
  • 11 to 19 are diagrams of steps of a method for fabricating a display substrate according to some embodiments.
  • FIG. 20 is a step diagram of another method for fabricating a display substrate according to some embodiments.
  • FIG. 21 is a step diagram of yet another method for fabricating a display substrate according to some embodiments.
  • first and second are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Thus, a feature defined as “first” or “second” may expressly or implicitly include one or more of that feature.
  • plural means two or more.
  • connection and “electrically connected” and their derivatives may be used.
  • electrically connected may be used in describing some embodiments to indicate that two or more components are in direct physical or electrical contact with each other.
  • the embodiments disclosed herein are not necessarily limited by the content herein.
  • a and/or B includes the following three combinations: A only, B only, and a combination of A and B.
  • Exemplary embodiments are described herein with reference to cross-sectional and/or plan views that are idealized exemplary drawings.
  • the thickness of layers and regions are exaggerated for clarity. Accordingly, variations from the shapes of the drawings due to, for example, manufacturing techniques and/or tolerances, are contemplated.
  • example embodiments should not be construed as limited to the shapes of the regions shown herein, but to include deviations in shapes due, for example, to manufacturing. For example, an etched area shown as a rectangle will typically have curved features.
  • the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the actual shape of a region of a device and are not intended to limit the scope of example embodiments.
  • the writing board 100' includes two flexible substrates 1', and a liquid crystal layer 2' disposed between the two flexible substrates 1'.
  • the pressure acts on the liquid crystal layer 2' in the writing board 100', so that the texture of the liquid crystal molecules in the liquid crystal layer 2' changes, from weak scattering of natural light to selective The state of visible light is reflected, so that handwriting is displayed on the writing board 100'.
  • the writing panel 100 has a writing area 10 , and in some embodiments, the writing panel 100 further has a writing area 10 located in the writing area A peripheral area 11 on at least one side.
  • the writing area 10 has a plurality of pixel regions P, and each pixel region P is provided with a sub-pixel.
  • the above-mentioned plurality of pixel regions P are arranged in a matrix form as an example for description.
  • the writing area 10 is also provided with a plurality of gate lines GL (Gate Line) extending along the row direction X in which the plurality of pixel regions P are arranged, and a plurality of data lines DL (Gate Line) extending in the column direction Y in which the plurality of pixel regions P are arranged. Data Line).
  • One row of sub-pixels may be connected to one gate line GL, and one column of sub-pixels may be connected to one data line DL.
  • the writing panel 100 includes an array substrate 1 and a flexible substrate 2 disposed opposite to the array substrate 1 .
  • the array substrate 1 includes a substrate 101 and a pixel driving circuit layer 102 disposed on the substrate 101 .
  • the pixel driving circuit layer 102 includes a plurality of thin film transistors T and a plurality of signal lines L, each thin film transistor T includes a gate electrode T1, a gate insulating layer T2, an active layer T3, a source electrode T4 and a drain electrode T5, the source electrode T4 and the drain electrode T5.
  • the drain electrodes T5 are in contact with the active layers T3, respectively.
  • the plurality of signal lines L at least include the above-mentioned plurality of gate lines GL and a plurality of data lines DL, and each gate line GL is electrically connected to the gate T1 of the thin film transistor T, so as to transmit a gate voltage signal to the gate T1;
  • the line DL is electrically connected to one of the source T4 or the drain T5 of the thin film transistor T to transmit a data voltage signal to one of the source T4 or the drain T5.
  • FIG. 2 shows a situation in which the data line DL is electrically connected to the drain electrode T5 of the thin film transistor T. As shown in FIG.
  • the writing panel 100 further includes a liquid crystal layer 3 disposed between the array substrate 1 and the flexible substrate 2 .
  • the writing panel 100 further includes a plurality of columnar spacers 4 disposed on the side of the array substrate 1 close to the liquid crystal layer 3 , and the orthographic projection of each spacer 4 on the substrate 101 is the same as the Orthographic projections of the plurality of thin film transistors T and the plurality of signal lines L on the substrate 101 do not overlap.
  • the writing panel 100 includes an array substrate 1 and a flexible substrate 2 disposed opposite to each other, and a liquid crystal layer 3 is disposed between the array substrate 1 and the flexible substrate 2 .
  • the diameter of the spherical spacer 4 and the distribution density of the spacer 4 in the writing panel 100 cannot be precisely controlled.
  • a plurality of columnar spacers 4 are arranged on the side of the substrate 1 close to the liquid crystal layer 3, and the shape of the spacers 4 is set to be columnar, which is beneficial to control the dimensional accuracy of the spacers 4 and the use of the spacers 4 on the writing panel.
  • the range of layer 3 is the same or approximately the same, improving the uniformity of the written handwriting.
  • each spacer 4 on the substrate 101 does not overlap with the orthographic projection of the plurality of thin film transistors T and the plurality of signal lines L on the substrate 101 , that is, the spacer 4 is on the array substrate 1
  • the thin film transistors T and the signal lines L are staggered, so that the film layer under the spacers 4 is flat and the thickness is more uniform.
  • the hardness of the array substrate 1 is greater than that of the flexible substrate 2 to ensure the structural strength of the array substrate 1 , and a plurality of columnar spacers 4 are disposed on the array substrate 1 to ensure that the array substrate 1 has a pair of spacers. 4 stable supports.
  • one end of the spacer 4 close to the substrate 101 is fixedly connected to the surface of the array substrate 1 , which can improve the stability of the spacer 4 on the array substrate 1 .
  • some embodiments of the present disclosure also provide the following distribution modes of the spacers 4:
  • each pixel region P is provided with a plurality of spacers 4 , and the plurality of spacers 4 are arranged in an array.
  • the row direction in which the plurality of spacers 4 are arranged in an array is referred to as the first direction U, and the column direction in which the plurality of spacers 4 are arranged in an array is called the second direction V.
  • the first direction U is parallel to the row direction X in which the plurality of pixel regions P are arranged
  • the second direction V is parallel to the column direction Y in which the plurality of pixel regions P are arranged.
  • the distance S1 between two adjacent spacers 4 along the first direction U is equal to the distance S2 between the two adjacent spacers 4 along the second direction V or roughly equal.
  • the “distance between the two spacers 4 ” may be the vertical distance between the central axes of the two spacers 4 .
  • the distance S3 between the two nearest spacers 4 in the two adjacent pixel regions P along the first direction U is adjacent to the adjacent spacers 4 along the second direction V
  • the distance S4 between the two closest spacers 4 in the two pixel regions P is equal or approximately equal.
  • the distance between two adjacent spacers 4 along the first direction U is the same as the distance between two adjacent spacers 4 along the second direction V equal or approximately equal distances.
  • the distance between two spacers 4 adjacent to each other along the first direction U refers to, regardless of the division of the pixel area P, any adjacent two spacers along the first direction U 4 distances between.
  • the distance between two adjacent spacers 4 along the first direction U may refer to the above-mentioned distance S1 or distance S3.
  • the distance between two adjacent spacers 4 along the second direction V means that, regardless of the division of the pixel area P, the distance between any two adjacent spacers 4 along the second direction V is distance between.
  • the distance between two adjacent spacers 4 along the second direction V may refer to the above-mentioned distance S2 or distance S4.
  • the uniformity of the distribution of the spacers 4 in each area of the writing panel 100 can be improved.
  • the array substrate 1 further includes a first electrode layer 104 disposed on the side of the pixel driving circuit layer 102 close to the liquid crystal layer 3 .
  • the flexible substrate 2 includes a flexible substrate 201 and a second electrode layer 202 disposed on the side of the flexible substrate 201 close to the liquid crystal layer 3 .
  • the flexible substrate 2 is used to withstand the pressure of writing, and the pressure directly acts on the flexible substrate 201 of the flexible substrate 2 during writing.
  • the pressure acts on the liquid crystal layer 3 in the writing panel 100, so that the texture of the liquid crystal molecules in the liquid crystal layer 3 changes, and the state of weak scattering of natural light The state is transformed into a state of selectively reflecting visible light, so that handwriting is displayed on the writing panel 100 .
  • the voltage applied to the first electrode layer 104 and the second electrode layer 202 may be referred to as an "erase voltage".
  • the first electrode layer 104 includes a plurality of bulk electrodes arranged independently of each other.
  • the second electrode layer 202 is a planar electrode covering the entire writing area 10 of the flexible substrate 201 .
  • the material of the first electrode layer 104 and/or the second electrode layer 202 may include transparent metal oxide conductive materials such as indium tin oxide (Indium Tin Oxide, ITO for short).
  • transparent metal oxide conductive materials such as indium tin oxide (Indium Tin Oxide, ITO for short).
  • the material of the flexible substrate 201 includes polyethylene terephthalate (Polyethylene terephthalate, PET for short).
  • the material of the liquid crystal layer 3 includes cholesteric liquid crystal.
  • the texture of the liquid crystal molecules in the liquid crystal layer 3 changes, from the state of weak scattering of natural light to the state of selective reflection of visible light.
  • the texture of the cholesteric liquid crystal molecules is a focal conic texture; when the cholesteric liquid crystal molecules are in a state of selectively reflecting visible light, the cholesteric liquid crystal molecules are in a state of selectively reflecting visible light.
  • the texture of the molecule is a planar texture.
  • the array substrate 1 further includes an alignment film 106 disposed on the side of the pixel driving circuit layer 102 close to the liquid crystal layer 3 .
  • the alignment film 106 is configured to make the liquid crystal molecules in the liquid crystal layer 3 have a pre-tilt angle, so that the arrangement of the liquid crystal molecules is more regular. It is easy to generate rotation and restore the original texture. Therefore, appropriately reducing the magnitude of the erasing voltage can also realize the erasing of handwriting, thereby reducing the power consumption of the writing panel 100 .
  • the alignment film 106 is disposed on the side of the first electrode layer 104 close to the liquid crystal layer 3 .
  • the alignment film 106 is in direct contact with the first electrode layer 104 .
  • the alignment film 106 not only enables the liquid crystal molecules in the liquid crystal layer 3 to have a pretilt angle, but also protects the first electrode layer 104 .
  • the first electrode layer 104 and the second electrode layer 202 are insulated to prevent the writing panel 100 from being deformed by pressure, and the first electrode layer 104 and the second electrode layer 202 are electrically connected and short-circuited.
  • the array substrate 1 further includes a first passivation layer 105 disposed on the side of the first electrode layer 104 close to the liquid crystal layer 3 to protect the first electrode layer 104 , and The first electrode layer 104 and the second electrode layer 202 are insulated to prevent the writing panel 100 from being deformed under pressure, so that the first electrode layer 104 and the second electrode layer 202 are electrically connected and short-circuited.
  • the first passivation layer 105 is disposed on the side of the first electrode layer 104 close to the liquid crystal layer 3 , and the alignment film 106 It is disposed on the side of the first passivation layer 105 close to the liquid crystal layer 3 .
  • the height of the spacer 4 (ie the dimension of the spacer 4 in the direction E perpendicular to the substrate 101 ) is measured at different sizes to measure the width of the handwriting of the writing panel 100 .
  • FIG. 6 is a graph showing the relationship between the width of the handwriting and the height of the spacer 4. It can be seen that with the increase of the height of the spacer 4, the thickness of the liquid crystal layer 3 increases, and when the pressure acts on the liquid crystal layer 3, a texture change occurs. Liquid crystal molecules flow more easily to the peripheral area, thereby expanding the area of liquid crystal molecules where the texture changes occur, increasing the width of the handwriting. Similarly, as the height of the spacer 4 decreases, the width of the handwriting decreases.
  • the height C of the spacer 4 ranges from 1.0 ⁇ m to 10 ⁇ m, for example, the height C can be 1.0 ⁇ m, 4.0 ⁇ m, 5.5 ⁇ m, 8.0 ⁇ m ⁇ m or 10 ⁇ m.
  • the height C of the spacer 4 ranges from 1.5 ⁇ m to 5 ⁇ m, for example, the height C may be 1.5 ⁇ m, 2.0 ⁇ m, 3.25 ⁇ m, 4.0 ⁇ m or 5 ⁇ m.
  • the height C of the spacer 4 ranges from 1.9 ⁇ m to 2.5 ⁇ m, for example, the height C can be 1.9 ⁇ m, 2.0 ⁇ m, 2.2 ⁇ m, 2.3 ⁇ m ⁇ m or 2.5 ⁇ m.
  • the writing pressure will at least act on the liquid crystal layer 3 and the spacer 4 , that is, both the liquid crystal layer 3 and the spacer 4 can bear part of the writing pressure.
  • the width of the handwriting of the writing panel 100 is measured under the condition that the supporting area of the simulated spacer 4 is in different sizes.
  • FIG. 7 is a graph showing the relationship between the width of the handwriting and the support area of the spacer 4 . It can be seen that as the support area of the spacer 4 increases, the width of the handwriting decreases. This is because as the supporting area of the spacer 4 increases, the pressure on the spacer 4 increases, and the pressure on the liquid crystal layer 3 decreases.
  • the proportion of the pressure on the liquid crystal layer 3 decreases, Therefore, the area of the liquid crystal molecules that can undergo texture change is reduced, so that the width of the handwriting is reduced.
  • the supporting area of the spacer 4 decreases, the width of the handwriting increases.
  • the area of the orthographic projection of the end of the spacer 4 close to the array substrate 1 on the substrate 101 is the “support area of the spacer 4 ”.
  • the shape of the spacer 4 is cylindrical, and the diameter D of the orthographic projection of the end of the spacer 4 close to the array substrate 1 on the substrate 101 ranges from 3 ⁇ m to 25 ⁇ m.
  • the diameter D may be 3 ⁇ m, 10 ⁇ m, 14 ⁇ m, 20 ⁇ m or 25 ⁇ m.
  • the support area of the spacer 4 ranges from 7.07 ⁇ m 2 to 490.87 ⁇ m 2 , for example, the support area may be 7.07 ⁇ m 2 , 78.54 ⁇ m 2 , 153.94 ⁇ m 2 , 314.16 ⁇ m 2 or 490.87 ⁇ m 2 .
  • the shape of the spacer 4 is cylindrical, and the diameter D of the orthographic projection of the end of the spacer 4 close to the array substrate 1 on the substrate 101 ranges from 7 ⁇ m to 15 ⁇ m, for example, The diameter D may be 7 ⁇ m, 10 ⁇ m, 11 ⁇ m, 13 ⁇ m or 15 ⁇ m. That is, the support area of the spacer 4 ranges from 38.48 ⁇ m 2 to 176.71 ⁇ m 2 , for example, the support area may be 38.48 ⁇ m 2 , 78.54 ⁇ m 2 , 95.03 ⁇ m 2 , 132.73 ⁇ m 2 or 176.71 ⁇ m 2 .
  • the shape of the spacer 4 is cylindrical, and the diameter D of the orthographic projection of the end of the spacer 4 close to the array substrate 1 on the substrate 101 ranges from 9 ⁇ m to 13 ⁇ m, for example , the diameter D can be 9 ⁇ m, 10 ⁇ m, 11 ⁇ m, 12 ⁇ m or 13 ⁇ m. That is, the support area of the spacer 4 ranges from 63.62 ⁇ m 2 to 132.73 ⁇ m 2 , for example, the support area may be 63.62 ⁇ m 2 , 78.20 ⁇ m 2 , 98.18 ⁇ m 2 , 118.25 ⁇ m 2 or 132.73 ⁇ m 2 .
  • the shape of the spacer 4 may be cylindrical, but limited by the patterning process used to prepare the spacer 4, the shape of the obtained spacer 4 is usually a truncated cone, that is, the spacer 4
  • the diameter of the orthographic projection of the end close to the array substrate 1 on the substrate 101 is greater than the diameter of the orthographic projection of the end of the spacer 4 away from the array substrate 1 on the substrate 101 . That is, the area of the orthographic projection of the end of the spacer 4 close to the array substrate 1 on the substrate 101 is greater than the orthographic projection area of the end of the spacer 4 away from the array substrate 1 on the substrate 101 .
  • the width of the handwriting of the writing panel 100 is measured under the condition that the distribution density of the simulated spacer 4 is different in size.
  • FIG. 8 is a graph showing the relationship between the width of the handwriting and the distribution density of the spacers 4 . It can be seen that as the distribution density of the spacers 4 increases, the width of the handwriting decreases. This is because as the distribution density of the spacers 4 increases, the sharing effect of the spacers 4 on the pressure increases, and the pressure on the liquid crystal layer 3 decreases. That is, when the same magnitude of pressure acts on the writing panel 100, the proportion of the pressure on the liquid crystal layer 3 decreases, so that the area of the liquid crystal molecules that can undergo texture change decreases, and the width of the handwriting decreases. Similarly, as the distribution density of the spacers 4 decreases, the width of the handwriting increases.
  • the “distribution density of spacers 4 ” refers to, in a plane parallel to the substrate 101 , the distribution density of spacers 4 arranged in an area per square millimeter quantity.
  • the number of spacers 4 arranged in each square millimeter area ranges from 10 to 1000, for example, the number may be 10 , 100, 505, 800 or 1000.
  • the number of spacers 4 arranged in each square millimeter area ranges from 20 to 200, for example, the number may be 20, 80 110, 160 or 200.
  • the number of spacers 4 arranged in each square millimeter area ranges from 50 to 100, for example, the number may be 50, 60, 75, 85, 90 or 100.
  • the height C of the spacers 4 is 2.3 ⁇ m
  • the diameter D of the orthographic projection of one end of the spacers 4 close to the array substrate 1 on the substrate 101 is 13 ⁇ m
  • the distribution density of the spacers 4 is every By setting 50 in the area of square millimeter, the width of the handwriting can be controlled to be equal to or close to 3.8mm.
  • the height C of the spacers 4 is 1.9 ⁇ m
  • the diameter D of the orthographic projection of the end of the spacers 4 close to the array substrate 1 on the substrate 101 is 9 ⁇ m
  • the distribution density of the spacers 4 is every 100 spacers 4 are arranged in the area of square millimeter, and the width of the handwriting can be controlled to be equal to or close to 3.3mm.
  • the height C of the spacers 4 is 2.3 ⁇ m
  • the diameter D of the orthographic projection of the end of the spacers 4 close to the array substrate 1 on the substrate 101 is 9 ⁇ m
  • the distribution density of the spacers 4 is every 100 spacers 4 are arranged in the area of square millimeter, and the width of the handwriting can be controlled to be equal to or close to 3.6mm.
  • the width of the handwriting has a deviation of ⁇ 0.5mm, and there may be a larger deviation, for example, the width of the handwriting has a deviation of ⁇ 1.0mm.
  • the writing pad 500 includes the writing panel 100 of any of the above embodiments, and a base layer 501 disposed on the side of the array substrate 1 away from the flexible substrate 2 .
  • the base layer 501 is configured to block light from entering the writing panel 100 from the side of the array substrate 1 away from the flexible substrate 2 .
  • the liquid crystal molecules in the liquid crystal layer 3 have no texture change and are in a state of weak scattering of natural light, and the writing area 10 of the writing panel 100 exhibits the color of the base layer 501 .
  • the regions in the liquid crystal layer 3 where the texture of the liquid crystal molecules changes selectively reflects visible light to present handwriting, and the regions in the liquid crystal layer 3 where the liquid crystal molecules do not have texture changes weakly scatter the natural light, so that the writing region 10 corresponds to the liquid crystal layer.
  • the area of the liquid crystal molecules without texture change exhibits the color of the base layer 501.
  • the color of the base layer 501 is dark, such as black, so that the area of the writing panel 100 corresponding to the liquid crystal molecules in the liquid crystal layer 3 that has not undergone texture changes appears black, thereby improving the image quality of the handwriting on the writing panel 100. contrast.
  • the orthographic projection of each spacer 4 on the substrate 101 is connected to a plurality of thin film transistors T and a plurality of signal lines L on the substrate.
  • the orthographic projections on 101 do not overlap, which is beneficial to control the dimensional accuracy of the spacer 4 and the distribution density of the spacer 4 in the writing panel 100, so as to improve the cell thickness uniformity of the writing panel 100 and the The uniformity of the distribution in the writing panel 100 improves the handwriting uniformity of the writing panel 500 .
  • Embodiments of the present disclosure also provide a method for preparing a writing panel, as shown in FIG. 10A , including the following S10 to S40:
  • the array substrate 1 includes a substrate 101, and a pixel driving circuit layer 102 disposed on the substrate 101.
  • the pixel driving circuit layer 102 includes a plurality of thin film transistors T and a plurality of signal lines L.
  • the gate electrode T1 , the gate insulating layer T2 , the active layer T3 , the source electrode T4 and the drain electrode T5 of the thin film transistor T are sequentially formed on the substrate 101 .
  • the plurality of signal lines L include a plurality of gate lines GL and a plurality of data lines DL.
  • the gate lines GL are electrically connected to the gate electrode T1 and are arranged in the same layer (the gate line GLL is shielded by the gate electrode T1 in FIG.
  • the data line DL is connected to the source
  • One of the electrode T4 or the drain electrode T5 is electrically connected and disposed in the same layer (the data line DL is shielded by the source electrode T4 or the drain electrode T5 in FIG. 11 ).
  • the preparation method of the writing panel further includes:
  • a second passivation layer 103 is formed on the side of the source electrode T4 and the drain electrode T5 away from the substrate 101 .
  • a plurality of via holes H are opened on the second passivation layer 103 for exposing at least a part of the source electrode T4 or the drain electrode T5 ( FIG. 12 shows the case where the via hole H exposes a part of the source electrode T4 ).
  • the preparation method of the writing panel further includes:
  • a first electrode layer 104 is formed on the side of the pixel driving circuit layer 102 away from the substrate 101 .
  • the first electrode layer 104 is electrically connected to one of the source electrode T4 or the drain electrode T5 which is not electrically connected to the data line DL through the via hole in the second passivation layer 103 (FIG. 13 shows that the first electrode layer 104 is electrically connected to the data line DL).
  • the source electrode T4 is electrically connected, that is, the drain electrode T5 is electrically connected to the data line DL).
  • a patterning process is used to form a plurality of columnar spacers 4 on the side of the pixel driving circuit layer 102 away from the substrate 101 .
  • a spacer layer 40 is formed on the side of the pixel driving circuit layer 102 away from the substrate 101 ; as shown in FIG. 15 , a patterning process is used to pattern the spacer layer 40 to form a plurality of spacers item 4.
  • patterning the spacer layer 40 to form a plurality of spacers 4 may include:
  • a photoresist layer is formed on the side of the spacer layer 40 away from the substrate 101, and the pattern of the photoresist layer can be substantially the same as the overall arrangement pattern of the spacers 4 shown in FIG. 2;
  • the photoresist layer is etched to form a plurality of spacers 4 .
  • the material of the spacer layer 40 may include resin R1 and/or resin R2.
  • the preparation method of the writing panel further includes:
  • an alignment film 106 is formed on the side of the first electrode layer 104 away from the substrate 101 , and the alignment film 106 is in direct contact with the first electrode layer 104 .
  • the step of forming the alignment film 106 includes coating an alignment film liquid containing polyimide (PI) on the side of the first electrode layer 104 away from the substrate 101 , and the alignment film liquid is cured to form an alignment film. 106.
  • PI polyimide
  • a sealing glue (seal) is applied on the array substrate 1, and liquid crystal containing a polymerizable monomer is dripped in a box enclosed by the sealing glue to form a liquid crystal layer 3. .
  • FIG. 18 is a partial cross-sectional view of a step diagram of preparing the liquid crystal layer 3 , and the position of the sealing glue is not shown.
  • the array substrate 1 and the flexible substrate 2 can be assembled into boxes by rolling.
  • the preparation method of the writing panel further includes:
  • an alignment film 106 is formed on the side of the first electrode layer 104 away from the substrate 101 .
  • the alignment film 106 can make the liquid crystal molecules in the liquid crystal layer 3 have a pre-tilt angle, which can reduce the magnitude of the erasing voltage or increase the
  • the alignment film 106 also plays the role of protecting the first electrode layer 104, insulating the first electrode layer 104 and the second electrode layer 202, and preventing the writing panel 100 from being deformed by pressure and causing the first electrode layer 104 to be deformed.
  • An electrode layer 104 is electrically connected to the second electrode layer 202 and short-circuited.
  • the embodiments of the present disclosure also provide another method for preparing a writing panel, which is different from S10 to S40 of the above-mentioned preparation method for a writing panel in that S22 is not included, and before S20, the method for preparing a writing panel also further Include the following steps:
  • a first passivation layer 105 is formed on the side of the first electrode layer 104 away from the substrate 101 .
  • the first passivation layer 105 protects the first electrode layer 104 and insulates the first electrode layer 104 from the second electrode layer 202 to prevent the writing panel 100 from being deformed by pressure.
  • the first electrode layer 104 and the second electrode layer 202 are electrically connected and short-circuited.
  • the embodiments of the present disclosure also provide another method for preparing a writing panel, which is different from S10 to S40 of the above-mentioned preparation method for a writing panel in that, before S20, the method for preparing a writing panel further includes the following steps:
  • a first passivation layer 105 is formed on the side of the first electrode layer 104 away from the substrate 101 .
  • the first passivation layer 105 and the alignment film 106 are sequentially formed on the side of the first electrode layer 104 away from the substrate 101 .
  • the first passivation layer 105 and the alignment film 106 can jointly protect the first The function of the electrode layer 104 is achieved, and the first electrode layer 104 and the second electrode layer 202 are insulated.

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Abstract

书写用面板(100)，包括阵列基板(1)，与所述阵列基板(1)相对设置的柔性基板(2)，设置于所述阵列基板(1)与所述柔性基板(2)之间的液晶层(3)，设置于所述阵列基板(1)靠近所述液晶层(3)的一面上的多个柱状的隔垫物(4)。其中，所述阵列基板(1)包括衬底(101)，以及设置于所述衬底(101)上的像素驱动电路层(102)，所述像素驱动电路层(102)包括多个薄膜晶体管(T)和多条信号线(L)。每个隔垫物(4)在所述衬底(101)上的正投影，与所述多个薄膜晶体管(T)和所述多条信号线(L)在所述衬底(101)上的正投影不重叠，提高书写笔迹的均一性。包括书写用面板的书写板以及书写用面板的制备方法。

Description

书写用面板及其制备方法、书写板
本申请要求于2020年11月25日提交的、申请号为202011341890.4的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本公开涉及显示技术领域，尤其涉及一种书写用面板及其制备方法、书写板。
背景技术
随着液晶显示技术的发展，在教育、商务应用等多个领域，液晶书写板的应用越来越广泛。
目前，液晶书写板主要应用了液晶分子的双稳态特性，实现显示和/或擦除液晶书写板上的内容。为提高用户体验，需要提高液晶书写板的笔迹宽度的均一性。
发明内容
一方面，提供一种书写用面板，包括阵列基板，与所述阵列基板相对设置的柔性基板，设置于所述阵列基板与所述柔性基板之间的液晶层，设置于所述阵列基板靠近所述液晶层的一面上的多个柱状的隔垫物。
其中，所述阵列基板包括衬底，以及设置于所述衬底上的像素驱动电路层，所述像素驱动电路层包括多个薄膜晶体管和多条信号线。每个隔垫物在所述衬底上的正投影，与所述多个薄膜晶体管和所述多条信号线在所述衬底上的正投影不重叠。
在一些实施例中，所述书写用面板具有多个像素区域，每个像素区域内设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列。多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向。在一个所述像素区域内，沿所述第一方向相邻的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个隔垫物之间的距离大致相等。
在一些实施例中，所述书写用面板具有多个像素区域，每个像素区域内设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列。多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向。沿所述第一方向相邻的两个像素区域中距离最近的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个像素区域内距离最近的两个隔垫物之间的距离大致相等。
在一些实施例中，所述书写用面板具有多个像素区域，每个像素区域内 设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列。多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向。沿所述第一方向相邻的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个隔垫物之间的距离大致相等。
在一些实施例中，所述阵列基板还包括设置于所述像素驱动电路层靠近所述液晶层一侧的配向膜。所述配向膜被配置为使所述液晶层中的液晶分子具有预倾角。
在一些实施例中，所述阵列基板还包括设置于所述像素驱动电路层靠近所述液晶层一侧的第一电极层；所述柔性基板包括柔性衬底，以及设置于所述柔性衬底靠近所述液晶层一侧的第二电极层。
在一些实施例中，所述阵列基板包括配向膜，所述配向膜设置于所述第一电极层靠近所述液晶层的一侧。
在一些实施例中，所述配向膜与所述第一电极层直接接触。
在一些实施例中，所述阵列基板还包括设置于所述第一电极层靠近所述液晶层一侧的第一钝化层。
在一些实施例中，所述阵列基板包括配向膜，所述配向膜设置于所述第一钝化层靠近所述液晶层的一侧。
在一些实施例中，沿垂直于所述衬底的方向，所述隔垫物的高度范围为1.0μm～10μm。
在一些实施例中，所述隔垫物的形状为圆柱状，所述隔垫物靠近所述阵列基板的一端在所述衬底上的正投影的直径范围为3μm～25μm。
在一些实施例中，在平行于所述衬底的平面内，每平方毫米的区域内所设置的隔垫物的数量范围为10个～1000个。
在一些实施例中，所述隔垫物靠近所述衬底的一端与所述阵列基板的表面固定连接。
在一些实施例中，所述液晶层的材料包括胆甾相液晶。
在一些实施例中，所述阵列基板的硬度大于所述柔性基板的硬度。
另一方面，提供一种书写板，包括如上面任一实施例所述的显示基板，以及设置于所述阵列基板远离所述柔性基板一侧的基底层。所述基底层被配置为，阻挡光线从所述阵列基板远离所述柔性基板的一侧进入所述书写用面板。
另一方面，提供一种书写用面板的制备方法，包括：制备阵列基板；所述阵列基板包括衬底，以及设置于所述衬底上的像素驱动电路层，所述像素 驱动电路层包括多个薄膜晶体管和多条信号线。在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物；所述多个隔垫物在所述衬底上的正投影，与所述多个薄膜晶体管和所述多条信号线在所述衬底上的正投影不重叠。在所述像素驱动电路层远离所述衬底的一侧形成液晶层。将所述阵列基板与柔性基板对盒。
在一些实施例中，所述制备方法还包括：在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述像素驱动电路层远离所述衬底的一侧形成第一电极层。
在一些实施例中，所述制备方法还包括：在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之后，在所述第一电极层远离所述衬底的一侧形成配向膜，所述配向膜与所述第一电极层直接接触。
在一些实施例中，所述制备方法还包括：在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述第一电极层远离所述衬底的一侧形成第一钝化层。
在一些实施例中，所述制备方法还包括：在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述第一电极层远离所述衬底的一侧形成第一钝化层。在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之后，在所述第一钝化层远离所述衬底的一侧形成配向膜。
附图说明
为了更清楚地说明本公开中的技术方案，下面将对本公开一些实施例中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本公开的一些实施例的附图，对于本领域普通技术人员来讲，还可以根据这些附图获得其他的附图。此外，以下描述中的附图可以视作示意图，并非对本公开实施例所涉及的产品的实际尺寸、方法的实际流程、信号的实际时序等的限制。
图1为相关技术中的书写板的剖面图；
图2为根据一些实施例的书写用面板的俯视图；
图3为图2中的书写用面板沿剖面线O-O＇的局部剖面图；
图4为根据一些实施例的另一种书写用面板的局部剖面图；
图5为根据一些实施例的又一种书写用面板的局部剖面图；
图6为根据一些实施例的书写用面板的笔迹宽度与隔垫物的高度的关系曲线图；
图7为根据一些实施例的书写用面板的笔迹宽度与隔垫物的支撑面 积的关系曲线图；
图8为根据一些实施例的书写用面板的笔迹宽度与隔垫物的分布密度的关系曲线图；
图9为根据一些实施例的书写板的局部剖面图；
图10A为根据一些实施例的显示基板的一种制备方法的流程图；
图10B为根据一些实施例的显示基板的另一种制备方法的流程图；
图11～图19为根据一些实施例的一种显示基板的制备方法的各步骤图；
图20为根据一些实施例的另一种显示基板的制备方法的步骤图；
图21为根据一些实施例的又一种显示基板的制备方法的步骤图。
具体实施方式
下面将结合附图，对本公开一些实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开所提供的实施例，本领域普通技术人员所获得的所有其他实施例，都属于本公开保护的范围。
除非上下文另有要求，否则，在整个说明书和权利要求书中，术语“包括(comprise)”及其其他形式例如第三人称单数形式“包括(comprises)”和现在分词形式“包括(comprising)”被解释为开放、包含的意思，即为“包含，但不限于”。在说明书的描述中，术语“一个实施例(one embodiment)”、“一些实施例(some embodiments)”、“示例性实施例(exemplary embodiments)”、“示例(example)”、“特定示例(specific example)”或“一些示例(some examples)”等旨在表明与该实施例或示例相关的特定特征、结构、材料或特性包括在本公开的至少一个实施例或示例中。上述术语的示意性表示不一定是指同一实施例或示例。此外，所述的特定特征、结构、材料或特点可以以任何适当方式包括在任何一个或多个实施例或示例中。
以下，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本公开实施例的描述中，除非另有说明，“多个”的含义是两个或两个以上。
在描述一些实施例时，可能使用了“连接”和“电连接”及其衍伸的表达。例如，描述一些实施例时可能使用了术语“电连接”以表明两个或两个以上部件彼此间有直接物理接触或电接触。这里所公开的实施例并不必然限制于本文内容。
“A和/或B”，包括以下三种组合：仅A，仅B，及A和B的组合。
本文中“被配置为”的使用意味着开放和包容性的语言，其不排除适用于或被配置为执行额外任务或步骤的设备。
另外，“基于”的使用意味着开放和包容性，因为“基于”一个或多个所述条件或值的过程、步骤、计算或其他动作在实践中可以基于额外条件或超出所述的值。
如本文所使用的那样，“大致”包括所阐述的值以及处于特定值的可接受偏差范围内的平均值，其中所述可接受偏差范围如由本领域普通技术人员考虑到正在讨论的测量以及与特定量的测量相关的误差(即，测量系统的局限性)所确定。
本文参照作为理想化示例性附图的剖视图和/或平面图描述了示例性实施方式。在附图中，为了清楚，放大了层和区域的厚度。因此，可设想到由于例如制造技术和/或公差引起的相对于附图的形状的变动。因此，示例性实施方式不应解释为局限于本文示出的区域的形状，而是包括因例如制造而引起的形状偏差。例如，示为矩形的蚀刻区域通常将具有弯曲的特征。因此，附图中所示的区域本质上是示意性的，且它们的形状并非旨在示出设备的区域的实际形状，并且并非旨在限制示例性实施方式的范围。
在相关技术中，如图1所示，书写板100＇包括两个柔性基板1＇，以及设置于两个柔性基板1＇之间的液晶层2＇。当使用书写笔或铅笔等书写时，压力作用于书写板100＇内的液晶层2＇，使得液晶层2＇中的液晶分子的织构发生了变化，由对自然光弱散射的状态转变为选择性反射可见光的状态，从而在书写板100＇上呈现笔迹。
然而，受限于两个柔性基板1＇的设置结构以及材料特性，仅能采用塑料球或玻璃球作为间隔物3＇控制书写板100＇的盒厚。并且，受限于设备的精度及制备工艺，塑料球和玻璃球的直径大小存在误差，且无法精确控制塑料球或玻璃球在书写板100＇内的分布密度，塑料球或玻璃球在书写板100＇内的分布不均匀，使得不同区域内的塑料球或玻璃球作用于书写板100＇的支撑力不相同，进而导致压力作用于书写板100＇上不同区域所影响的液晶层2＇的范围不相同，使得在书写板100＇上呈现的笔迹的均一性较差。
为解决上述问题，本公开的一些实施例提供了一种书写用面板，如图2所示，书写用面板100具有书写区10，在一些实施例中，书写用面板100还具有位于书写区10至少一侧的周边区11。书写区10内具有多个像素区域P， 每个像素区域P内设置有一个子像素。
为了方便说明，本公开中上述多个像素区域P是以矩阵形式排列为例进行的说明。此时，沿多个像素区域P排列的行方向X，排列成一排的子像素称为一行子像素；沿多个像素区域P排列的列方向Y，排列成一排的子像素称为一列子像素。
书写区10内还设置有沿多个像素区域P排列的行方向X延伸的多条栅线GL(Gate Line)，以及沿多个像素区域P排列的列方向Y延伸的多条数据线DL(Data Line)。一行子像素可以与一条栅线GL连接，一列子像素可以与一根数据线DL连接。
如图3所示，书写用面板100包括阵列基板1，以及与阵列基板1相对设置的柔性基板2。
其中，阵列基板1包括衬底101，以及设置于衬底101上的像素驱动电路层102。
像素驱动电路层102包括多个薄膜晶体管T和多条信号线L，每个薄膜晶体管T包括栅极T1、栅绝缘层T2、有源层T3、源极T4及漏极T5，源极T4和漏极T5分别与有源层T3接触。
多条信号线L至少包括上述的多条栅线GL和多条数据线DL，每条栅线GL与薄膜晶体管T的栅极T1电连接，以向栅极T1传输栅电压信号；每条数据线DL与薄膜晶体管T的源极T4或漏极T5中的一者电连接，以向源极T4或漏极T5中的一者传输数据电压信号。图2中示出了数据线DL与薄膜晶体管T的漏极T5电连接的情形。
如图3所示，书写用面板100还包括设置于阵列基板1与柔性基板2之间的液晶层3。
如图3所示，书写用面板100还包括设置于阵列基板1靠近液晶层3的一面上的多个柱状的隔垫物4，每个隔垫物4在衬底101上的正投影，与多个薄膜晶体管T和多条信号线L在衬底101上的正投影不重叠。
本公开的上述实施例，书写用面板100包括相对设置的阵列基板1和柔性基板2，阵列基板1与柔性基板2之间设置有液晶层3。相比于将隔垫物4的形状设置为球状，无法精确控制球状的隔垫物4的直径以及隔垫物4在书写用面板100内的分布密度，本公开的书写用面板100通过在阵列基板1靠近液晶层3的一面上设置多个柱状的隔垫物4，并将隔垫物4的形状设置为柱状，有利于控制隔垫物4的尺寸精度以及隔垫物4在书写用面板100内的分布密度，以提高书写用面板100的盒厚均一性以及隔垫物4在书写用面板100 内的分布的均匀性，从而使压力作用于书写用面板100上不同区域所影响的液晶层3的范围相同或大致相同，提高了书写笔迹的均一性。
并且，每个隔垫物4在衬底101上的正投影，与多个薄膜晶体管T和多条信号线L在衬底101上的正投影不重叠，即隔垫物4在阵列基板1上错开薄膜晶体管T和信号线L设置，使位于隔垫物4下方的膜层较平坦且厚度较一致，在多个隔垫物4的高度(即隔垫物4在沿垂直于衬底101的方向E上的尺寸)相同的情况下，有利于提高书写用面板100的盒厚均一性，进一步提高了书写笔迹的均一性。
在一些实施例中，阵列基板1的硬度大于柔性基板2的硬度，保证阵列基板1的结构强度，多个柱状的隔垫物4设置于阵列基板1上，可保证阵列基板1对隔垫物4的稳定支撑。
在一些实施例中，如图3所示，隔垫物4靠近衬底101的一端与阵列基板1的表面固定连接，可提高隔垫物4在阵列基板1上的稳定性。
为提高隔垫物4在书写用面板100内的分布的均匀性，本公开的一些实施例还提供了以下几种隔垫物4的分布方式：
在一些实施例中，如图2所示，每个像素区域P内设置有多个隔垫物4，该多个隔垫物4呈阵列式排列。称该多个隔垫物4阵列式排列的行方向为第一方向U，多个隔垫物4阵列式排列的列方向为第二方向V。
示例性地，如图2所示，第一方向U与多个像素区域P排列的行方向X平行，第二方向V与多个像素区域P排列的列方向Y平行。
在一个像素区域P内，沿第一方向U相邻的两个隔垫物4之间的距离S1，与，沿第二方向V相邻的两个隔垫物4之间的距离S2相等或大致相等。
需要说明的是，“两个隔垫物4之间的距离”可以是两个隔垫物4的中轴线之间的垂直距离。
通过上述隔垫物4的排布方式，提高了隔垫物4在每个像素区域P内的分布的均匀性。
在一些实施例中，如图2所示，沿第一方向U相邻的两个像素区域P中距离最近的两个隔垫物4之间的距离S3，与，沿第二方向V相邻的两个像素区域P内距离最近的两个隔垫物4之间的距离S4相等或大致相等。
通过上述隔垫物4的排布方式，在相邻两个像素区域P相互接近的区域内，提高了隔垫物4在此区域内分布的均匀性。
在一些实施例中，如图2所示，沿第一方向U相邻的两个隔垫物4之间的距离，与，沿第二方向V相邻的两个隔垫物4之间的距离相等或大致相等。
需要说明的是，“沿第一方向U相邻的两个隔垫物4之间的距离”是指，不考虑像素区域P的划分，沿第一方向U任意相邻的两个隔垫物4之间的距离。例如，“沿第一方向U相邻的两个隔垫物4之间的距离”可以是指上述距离S1或距离S3。
同理，“沿第二方向V相邻的两个隔垫物4之间的距离”是指，不考虑像素区域P的划分，沿第二方向V任意相邻的两个隔垫物4之间的距离。例如，“沿第二方向V相邻的两个隔垫物4之间的距离”可以是指上述距离S2或距离S4。
通过上述隔垫物4的排布方式，可提高隔垫物4在书写用面板100的各个区域内的分布的均匀性。
在一些实施例中，如图3所示，阵列基板1还包括设置于像素驱动电路层102靠近液晶层3一侧的第一电极层104。
柔性基板2包括柔性衬底201，以及设置于柔性衬底201靠近液晶层3一侧的第二电极层202。柔性基板2用于承受书写的压力，书写时压力直接作用在柔性基板2的柔性衬底201上。
上文提到，当使用书写笔或铅笔等书写时，压力作用于书写用面板100内的液晶层3，使得液晶层3中的液晶分子的织构发生了变化，由对自然光弱散射的状态转变为选择性反射可见光的状态，从而在书写用面板100上呈现笔迹。在擦除笔迹时，分别向第一电极层104和第二电极层202施加电压，在第一电极层104与第二电极层202之间形成电场，液晶层3中的液晶分子受电场力作用产生转动而恢复原来的织构，即由选择性反射可见光的状态恢复为对自然光弱散射的状态，从而实现了对书写用面板100上笔迹的擦除。因此，向第一电极层104和第二电极层202所施加的电压可称为“擦除电压”。
示例性地，如图2和图3所示，第一电极层104包括多个相互独立设置的块状电极。第二电极层202为覆盖柔性衬底201的整个书写区10的面状电极。
示例性地，第一电极层104和/或第二电极层202的材料可包括氧化铟锡(Indium Tin Oxide，简称ITO)等透明的金属氧化物导电材料。
示例性地，柔性衬底201的材料包括聚对苯二甲酸乙二醇酯(Polyethylene terephthalate，简称PET)。
在一些实施例中，液晶层3的材料包括胆甾相液晶。根据前文所述，压力作用于书写用面板100内的液晶层3，液晶层3中的液晶分子的织构发生了变化，由对自然光弱散射的状态转变为选择性反射可见光的状态，在胆甾相 液晶分子处于对自然光弱散射的状态的情况下，胆甾相液晶分子的织构为焦锥织构；在胆甾相液晶分子处于选择性反射可见光的状态的情况下，胆甾相液晶分子的织构为平面织构。
在一些实施例中，如图4和图5所示，阵列基板1还包括设置于像素驱动电路层102靠近液晶层3一侧的配向膜106。配向膜106被配置为使液晶层3中的液晶分子具有预倾角，使液晶分子的排列更有规律，这样，在擦除笔迹时，液晶层3中的大部分液晶分子受电场力作用，更容易产生转动而恢复原来的织构，因此，适当降低擦除电压的大小也可以实现笔迹的擦除，从而减小了书写用面板100的功耗。另一方面，在擦除电压的大小不变的情况下，由于液晶层3中的液晶分子具有预倾角，在擦除笔迹时，液晶层3中的大部分液晶分子受电场力作用，以更快的速度恢复原来的织构，从而可提高笔迹擦除的响应速度。
在一些实施例中，如图4和图5所示，配向膜106设置于第一电极层104靠近液晶层3的一侧。
示例性地，如图5所示，配向膜106与第一电极层104直接接触，配向膜106除可使液晶层3中的液晶分子具有预倾角外，还起到保护第一电极层104的作用，并且使第一电极层104与第二电极层202之间绝缘，避免书写用面板100受压力变形使得第一电极层104与第二电极层202电连接而发生短路。
在一些实施例中，如图3所示，阵列基板1还包括设置于第一电极层104靠近液晶层3一侧的第一钝化层105，起到保护第一电极层104的作用，并且使第一电极层104与第二电极层202之间绝缘，避免书写用面板100受压力变形使得第一电极层104与第二电极层202电连接而发生短路。
在另一些实施例中，如图4所示，在阵列基板1还包括配向膜106的情况下，第一钝化层105设置于第一电极层104靠近液晶层3的一侧，配向膜106设置于第一钝化层105靠近液晶层3的一侧。
此外，为实现对书写用面板100的笔迹的宽度的控制，本公开的一些实施例进行了以下模拟实验：
在一些实施例中，模拟隔垫物4的高度(即隔垫物4在沿垂直于衬底101的方向E上的尺寸)在不同大小的情况下，测量书写用面板100的笔迹的宽度。图6为笔迹的宽度与隔垫物4的高度的关系曲线图，可见随着隔垫物4的高度的增加，液晶层3的厚度增加，压力作用于液晶层3时，发生织构变化的液晶分子更容易流向周边区域，从而扩大了发生织构变化的液晶分子的 区域，使笔迹的宽度增加。同理，随着隔垫物4的高度的减小，使笔迹的宽度减小。
示例性地，如图3所示，沿垂直于衬底101的方向E，隔垫物4的高度C范围为1.0μm～10μm，例如，高度C可为1.0μm、4.0μm、5.5μm、8.0μm或10μm。
例如，如图3所示，沿垂直于衬底101的方向E，隔垫物4的高度C范围为1.5μm～5μm，例如，高度C可为1.5μm、2.0μm、3.25μm、4.0μm或5μm。
进一步的，如图3所示，沿垂直于衬底101的方向E，隔垫物4的高度C范围为1.9μm～2.5μm，例如，高度C可为1.9μm、2.0μm、2.2μm、2.3μm或2.5μm。
在书写用面板100上进行书写时，书写压力至少会作用于液晶层3和隔垫物4上，即液晶层3和隔垫物4均能够承受部分书写压力。
在此基础上，在一些实施例中，模拟隔垫物4的支撑面积在不同大小的情况下，测量书写用面板100的笔迹的宽度。图7为笔迹的宽度与隔垫物4的支撑面积的关系曲线图，可见随着隔垫物4的支撑面积增加，笔迹的宽度减小。这是由于随着隔垫物4的支撑面积增加，隔垫物4的所承受的压力增大，液晶层3所承受的压力减小。即，当相同大小的压力作用于书写用面板100时，液晶层3所承受的压力占比(即液晶层3所承受的压力占作用于书写用面板100上的总压力的比值)减小，从而可发生织构变化的液晶分子的区域减小，使笔迹的宽度减小。同理，随着隔垫物4的支撑面积的减小，使笔迹的宽度增加。
需要说明的是，如图3所示，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的面积即为“隔垫物4的支撑面积”。
示例性地，如图2和图3所示，隔垫物4的形状为圆柱状，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D范围为3μm～25μm，例如，直径D可为3μm、10μm、14μm、20μm或25μm。即，隔垫物4的支撑面积的范围为7.07μm 2～490.87μm 2，例如，支撑面积可为7.07μm 2、78.54μm 2、153.94μm 2、314.16μm 2或490.87μm 2。
例如，如图2和图3所示，隔垫物4的形状为圆柱状，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D范围为7μm～15μm，例如，直径D可为7μm、10μm、11μm、13μm或15μm。即，隔垫物4的支撑面积的范围为38.48μm 2～176.71μm 2，例如，支撑面积可为38.48μm 2、78.54 μm 2、95.03μm 2、132.73μm 2或176.71μm 2。
进一步的，如图2和图3所示，隔垫物4的形状为圆柱状，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D范围为9μm～13μm，例如，直径D可为9μm、10μm、11μm、12μm或13μm。即，隔垫物4的支撑面积的范围为63.62μm 2～132.73μm 2，例如，支撑面积可为63.62μm 2、78.20μm 2、98.18μm 2、118.25μm 2或132.73μm 2。
需要说明的是，隔垫物4的形状可以为圆柱状，但受限于制备隔垫物4所采用的构图工艺，所得到的隔垫物4的形状通常为圆台状，即隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径，大于隔垫物4远离阵列基板1的一端在衬底101上的正投影的直径。也即，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的面积，大于隔垫物4远离阵列基板1的一端在衬底101上的正投影的面积。
在一些实施例中，模拟隔垫物4的分布密度在不同大小的情况下，测量书写用面板100的笔迹的宽度。图8为笔迹的宽度与隔垫物4的分布密度的关系曲线图，可见随着隔垫物4的分布密度增加，笔迹的宽度减小。这是由于随着隔垫物4的分布密度增加，隔垫物4对压力的分担作用增大，液晶层3所承受的压力减小。即，当相同大小的压力作用于书写用面板100时，液晶层3所承受的压力占比减小，从而可发生织构变化的液晶分子的区域减小，使笔迹的宽度减小。同理，随着隔垫物4的分布密度的减小，使笔迹的宽度增加。
需要说明的是，如图2和图3所示，“隔垫物4的分布密度”是指，在平行于衬底101的平面内，每平方毫米的区域内所设置的隔垫物4的数量。
示例性地，如图2所示，在平行于衬底101的平面内，每平方毫米的区域内所设置的隔垫物4的数量范围为10个～1000个，例如，数量可为10个、100个、505个、800个或1000个。
例如，如图2所示，在平行于衬底101的平面内，每平方毫米的区域内所设置的隔垫物4的数量范围为20个～200个，例如，数量可为20个、80个、110个、160个或200个。
进一步的，如图2所示，在平行于衬底101的平面内，每平方毫米的区域内所设置的隔垫物4的数量范围为50个～100个，例如，数量可为50个、60个、75个、85个、90个或100个。
在一些实施例中，隔垫物4的高度C为2.3μm，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D为13μm，隔垫物4的分布密度为 每平方毫米的区域内设置50个，可将笔迹的宽度控制在等于或接近于3.8mm。
在一些实施例中，隔垫物4的高度C为1.9μm，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D为9μm，隔垫物4的分布密度为每平方毫米的区域内设置100个隔垫物4，可将笔迹的宽度控制在等于或接近于3.3mm。
在一些实施例中，隔垫物4的高度C为2.3μm，隔垫物4靠近阵列基板1的一端在衬底101上的正投影的直径D为9μm，隔垫物4的分布密度为每平方毫米的区域内设置100个隔垫物4，可将笔迹的宽度控制在等于或接近于3.6mm。
需要说明的是，受限于隔垫物4的制备工艺，笔迹的宽度存在±0.5mm的偏差，也可能会有更大的偏差，例如，笔迹的宽度存在±1.0mm的偏差。
本公开的一些实施例提供了一种书写板，如图9所示，书写板500包括上述任意实施例的书写用面板100，以及设置于阵列基板1远离柔性基板2一侧的基底层501。基底层501被配置为，阻挡光线从阵列基板1远离柔性基板2的一侧进入书写用面板100。在未进行书写时，液晶层3中的液晶分子未发生织构变化而处于对自然光弱散射的状态，书写用面板100的书写区10呈现基底层501的颜色。在进行书写时，液晶层3中液晶分子发生织构变化的区域选择性反射可见光而呈现笔迹，液晶层3中液晶分子未发生织构变化的区域对自然光弱散射，使书写区10对应液晶层3中未发生织构变化的液晶分子的区域呈现基底层501的颜色。
示例性地，基底层501的颜色为深色，例如黑色，使书写用面板100对应液晶层3中未发生织构变化的液晶分子的区域呈现黑色，从而提高书写用面板100的笔迹的画面的对比度。
本公开的上述书写板500，通过将隔垫物4的形状设置为柱状，每个隔垫物4在衬底101上的正投影，与多个薄膜晶体管T和多条信号线L在衬底101上的正投影不重叠，有利于控制隔垫物4的尺寸精度以及隔垫物4在书写用面板100内的分布密度，以提高书写用面板100的盒厚均一性以及隔垫物4在书写用面板100内的分布的均匀性，从而提高了书写板500的笔迹均一性。
本公开的实施例还提供了一种书写用面板的制备方法，如图10A所示，包括如下S10～S40：
S10：制备阵列基板1。阵列基板1包括衬底101，以及设置于衬底101上的像素驱动电路层102，像素驱动电路层102包括多个薄膜晶体管T和多条信号线L。
示例性地，如图11所示，在衬底101上依次形成薄膜晶体管T的栅极T1、栅绝缘层T2、有源层T3、源极T4和漏极T5。多条信号线L包括多条栅线GL和多条数据线DL，栅线GL与栅极T1电连接且同层设置(图11中栅线GLL被栅极T1遮挡)，数据线DL与源极T4或漏极T5中一者电连接且同层设置(图11中数据线DL被源极T4或漏极T5遮挡)。
在一些实施例中，如图10B所示，在S10之后，书写用面板的制备方法还包括：
S11：如图12所示，在源极T4和漏极T5远离衬底101的一侧形成第二钝化层103。第二钝化层103上开设有多个过孔H，用于暴露源极T4或漏极T5的至少一部分(图12示出了过孔H暴露源极T4的一部分的情形)。
在一些实施例中，如图10B所示，在S20之前，书写用面板的制备方法还包括：
S12：如图13所示，在像素驱动电路层102远离衬底101的一侧形成第一电极层104。第一电极层104通过第二钝化层103中的过孔，与源极T4或漏极T5中不与数据线DL电连接的一者电连接(图13示出了第一电极层104与源极T4电连接的情形，也即漏极T5与数据线DL电连接)。
S20：在像素驱动电路层102远离衬底101的一侧形成多个柱状的隔垫物4。多个隔垫物4在衬底101上的正投影，与多个薄膜晶体管T和多条信号线L在衬底101上的正投影不重叠。
示例性地，采用构图工艺，在像素驱动电路层102远离衬底101的一侧形成多个柱状的隔垫物4。例如，如图14所示，在像素驱动电路层102远离衬底101的一侧形成隔垫物层40；如图15所示，采用构图工艺，图案化隔垫物层40形成多个隔垫物4。
上述步骤中，采用构图工艺，图案化隔垫物层40形成多个隔垫物4可包括：
采用光刻工艺，在隔垫物层40远离衬底101的一侧形成光刻胶层，光刻胶层的图案可与图2示出的隔垫物4的整体排布的图案大致相同；以光刻胶层为掩膜，刻蚀隔垫物层40形成多个隔垫物4。
示例性地，隔垫物层40的材料可包括树脂R1和/或树脂R2。
在一些实施例中，如图10B所示，在S20之后，书写用面板的制备方法还包括：
S21：如图16所示，在柔性衬底201上形成第二电极层202，得到柔性基板2。
S22：如图17所示，在第一电极层104远离衬底101的一侧形成配向膜106，配向膜106与第一电极层104直接接触。
示例性地，形成配向膜106的步骤包括在第一电极层104远离衬底101的一侧涂覆含有聚酰亚胺(Polyimide，简称PI)的配向膜液体，待配向膜液体固化形成配向膜106。
S30：在像素驱动电路层102远离衬底101的一侧形成液晶层3。
示例性地，如图18所示，在阵列基板1上涂覆封接胶(seal)，并在封接胶所围成的盒体内滴注包含可聚合单体的液晶，以形成液晶层3。
需要说明的是，图18为制备液晶层3的步骤图的局部剖面图，没有示意出封接胶的位置。
S40：如图19所示，将阵列基板1与柔性基板2对盒。
示例性地，可通过滚压的方式，将阵列基板1与柔性基板2对盒。
在一些实施例中，在S40之后，书写用面板的制备方法还包括：
S41：采用紫外线(UV)照射对盒后的阵列基板1和柔性基板2，使封接胶固化，并使液晶层3中的可聚合单体反应形成聚合物网络，得到书写用面板100。
本公开的上述制备方法，在第一电极层104远离衬底101的一侧形成配向膜106，配向膜106可使液晶层3中的液晶分子具有预倾角，可降低擦除电压的大小或提高笔迹擦除的响应速度；并且，配向膜106还起到保护第一电极层104的作用，使第一电极层104与第二电极层202之间绝缘，避免书写用面板100受压力变形使得第一电极层104与第二电极层202电连接而短路。
本公开的实施例还提供了另一种书写用面板的制备方法，与上述书写用面板的制备方法的S10～S40的区别在于，不包括S22，且在S20之前，书写用面板的制备方法还包括以下步骤：
如图20所示，在第一电极层104远离衬底101的一侧形成第一钝化层105。
本公开的上述制备方法，第一钝化层105起到保护第一电极层104的作用，并且使第一电极层104与第二电极层202之间绝缘，避免书写用面板100受压力变形使得第一电极层104与第二电极层202电连接而短路。
本公开的实施例还提供了另一种书写用面板的制备方法，与上述书写用面板的制备方法的S10～S40的区别在于，在S20之前，书写用面板的制备方法还包括以下步骤：
如图21所示，在第一电极层104远离衬底101的一侧形成第一钝化层105。
本公开的上述制备方法，在第一电极层104远离衬底101的一侧依次形 成第一钝化层105和配向膜106，第一钝化层105和配向膜106可共同起到保护第一电极层104的作用，并且使第一电极层104与第二电极层202之间绝缘。
以上所述，仅为本公开的具体实施方式，但本公开的保护范围并不局限于此，任何熟悉本技术领域的技术人员在本公开揭露的技术范围内，想到变化或替换，都应涵盖在本公开的保护范围之内。因此，本公开的保护范围应以所述权利要求的保护范围为准。

Claims (22)

  1. 一种书写用面板，包括：
    阵列基板，所述阵列基板包括衬底，以及设置于所述衬底上的像素驱动电路层，所述像素驱动电路层包括多个薄膜晶体管和多条信号线；
    与所述阵列基板相对设置的柔性基板；
    设置于所述阵列基板与所述柔性基板之间的液晶层；
    设置于所述阵列基板靠近所述液晶层的一面上的多个柱状的隔垫物，每个隔垫物在所述衬底上的正投影，与所述多个薄膜晶体管和所述多条信号线在所述衬底上的正投影不重叠。
  2. 根据权利要求1所述的书写用面板，其中，所述书写用面板具有多个像素区域；
    每个像素区域内设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列；
    多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向；在一个所述像素区域内，沿所述第一方向相邻的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个隔垫物之间的距离大致相等。
  3. 根据权利要求1或2所述的书写用面板，其中，所述书写用面板具有多个像素区域；
    每个像素区域内设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列；
    多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向；沿所述第一方向相邻的两个像素区域中距离最近的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个像素区域内距离最近的两个隔垫物之间的距离大致相等。
  4. 根据权利要求1所述的书写用面板，其中，所述书写用面板具有多个像素区域；
    每个像素区域内设置有多个所述隔垫物，多个所述隔垫物呈阵列式排列；
    多个所述隔垫物阵列式排列的行方向为第一方向，多个所述隔垫物阵列式排列的列方向为第二方向；沿所述第一方向相邻的两个隔垫物之间的距离，与，沿所述第二方向相邻的两个隔垫物之间的距离大致相等。
  5. 根据权利要求1～4中任一项所述的书写用面板，其中，所述阵列基板还包括设置于所述像素驱动电路层靠近所述液晶层一侧的配向膜；
    所述配向膜被配置为使所述液晶层中的液晶分子具有预倾角。
  6. 根据权利要求1～5中任一项所述的书写用面板，其中，
    所述阵列基板还包括设置于所述像素驱动电路层靠近所述液晶层一侧的第一电极层；
    所述柔性基板包括柔性衬底，以及设置于所述柔性衬底靠近所述液晶层一侧的第二电极层。
  7. 根据权利要求6所述的书写用面板，其中，所述阵列基板包括配向膜，所述配向膜设置于所述第一电极层靠近所述液晶层的一侧。
  8. 根据权利要求7所述的书写用面板，其中，所述配向膜与所述第一电极层直接接触。
  9. 根据权利要求6或7所述的书写用面板，其中，所述阵列基板还包括设置于所述第一电极层靠近所述液晶层一侧的第一钝化层。
  10. 根据权利要求9所述的书写用面板，其中，所述阵列基板包括配向膜，所述配向膜设置于所述第一钝化层靠近所述液晶层的一侧。
  11. 根据权利要求1～10中任一项所述的书写用面板，其中，沿垂直于所述衬底的方向，所述隔垫物的高度范围为1.0μm～10μm。
  12. 根据权利要求1～11中任一项所述的书写用面板，其中，所述隔垫物的形状为圆柱状，所述隔垫物靠近所述阵列基板的一端在所述衬底上的正投影的直径范围为3μm～25μm。
  13. 根据权利要求1～12中任一项所述的书写用面板，其中，在平行于所述衬底的平面内，每平方毫米的区域内所设置的隔垫物的数量范围为10个～1000个。
  14. 根据权利要求1～13中任一项所述的书写用面板，其中，所述隔垫物靠近所述衬底的一端与所述阵列基板的表面固定连接。
  15. 根据权利要求1～14中任一项所述的书写用面板，其中，所述液晶层的材料包括胆甾相液晶。
  16. 根据权利要求1～15中任一项所述的书写用面板，其中，所述阵列基板的硬度大于所述柔性基板的硬度。
  17. 一种书写板，包括：
    如权利要求1～16中任一项所述的书写用面板；
    设置于所述阵列基板远离所述柔性基板一侧的基底层；所述基底层被配置为，阻挡光线从所述阵列基板远离所述柔性基板的一侧进入所述书写用面板。
  18. 一种书写用面板的制备方法，包括：
    制备阵列基板；所述阵列基板包括衬底，以及设置于所述衬底上的像素 驱动电路层，所述像素驱动电路层包括多个薄膜晶体管和多条信号线；
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物；所述多个隔垫物在所述衬底上的正投影，与所述多个薄膜晶体管和所述多条信号线在所述衬底上的正投影不重叠；
    在所述像素驱动电路层远离所述衬底的一侧形成液晶层；
    将所述阵列基板与柔性基板对盒。
  19. 根据权利要求18所述的制备方法，还包括：
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述像素驱动电路层远离所述衬底的一侧形成第一电极层。
  20. 根据权利要求19所述的制备方法，还包括：
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之后，在所述第一电极层远离所述衬底的一侧形成配向膜；
    所述配向膜与所述第一电极层直接接触。
  21. 根据权利要求19所述的制备方法，还包括：
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述第一电极层远离所述衬底的一侧形成第一钝化层。
  22. 根据权利要求19所述的制备方法，还包括：
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之前，在所述第一电极层远离所述衬底的一侧形成第一钝化层；
    在所述像素驱动电路层远离所述衬底的一侧形成多个柱状的隔垫物之后，在所述第一钝化层远离所述衬底的一侧形成配向膜。
PCT/CN2021/123344 2020-11-25 2021-10-12 书写用面板及其制备方法、书写板 WO2022111092A1 (zh)

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